顔写真

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Ito Tomoko
伊藤 智子
Ito Tomoko
伊藤 智子
Institutional repository
Office of Management and Planning，Specially Appointed Assistant Professor (Full Time)
Institutional repository

Research History 7

  1. 2025/01 - Present
    Osaka University

  2. 2024/10 - Present
    大坂大学　工学研究科マテリアル生産科学専攻生産科学コース　特任助教

  3. 2023/04 - 2024/03
    大坂大学大学院　工学研究科マテリアル生産科学専攻生産科学コース　助教

  4. 2023/04 - 2024/03
    マテリアル生産科学専攻　生産科学コース　助教

  5. 2020/04 - 2023/03
    Osaka University Graduate School of Engineering Center for Atomic and Molecular Technologies　Assistant Professor

  6. 2016/04/01 - 2020/03/31
    Osaka University Graduate School of Engineering Center for Atomic and Molecular Technologies　Specially Appointed Researcher

  7. 2014/04/01 - 2016/03/31
    Osaka University Graduate School of Engineering Center for Atomic and Molecular Technologies　Specially Appointed Researcher

Education 3

  1. Osaka University　Graduate School of Engineering

    2010/04 - 2013/03

  2. 大阪大学大学院　工学研究科　マテリアル生産科学専攻生産科学コース博士前期課程

    2008/04 - 2010/03

  3. Nara Women's University　Faculty of Science　Department of Physics

    2004/04 - 2008/03

Committee Memberships 2

  1. 応用物理学会プラズマエレクトロニクス分科会　応用物理学会プラズマエレクトロニクス分科会幹事　Academic society

    2023/04 - Present

  2. 42nd International Symposium on Dry Process　Exective Committee　Academic society

    2022/04 - Present

Professional Memberships 3

  1. American Vacuum Society

  2. プラズマエレクトロニクス分科会（応用物理学会 ）

  3. 応用物理学会

Research Areas 1

  1. Energy / Applied plasma science /

Awards 3

  1. 第62 回質量分析総合討論会ベストプレゼンテーション賞優秀賞

    伊藤智子, 関本奏子, 浜口智志　日本質量分析学会　2014/05

  2. 第11回プラズマエレクトロニクス賞

    Tomoko Ito, Kazuhiro Karahashi, Masanaga Fukasawa, Tetsuya Tatsumi, Satoshi Hamaguchi　応用物理学会プラズマエレクトロニクス分科会　2012/09

  3. Young Researcher Award (The 32nd International Symposium on Dry Process)

    Tomoko Ito　第32回ドライプロセス国際シンポジウム組織委員会　2010/11

Papers 26

  1. Amine modification of calcium phosphate by low-pressure plasma for bone regeneration

    Joe Kodama, Anjar Anggraini Harumningtyas, Tomoko Ito, Miroslav Michlíček, Satoshi Sugimoto, Hidekazu Kita, Ryota Chijimatsu, Yuichiro Ukon, Junichi Kushioka, Rintaro Okada, Takashi Kamatani, Kunihiko Hashimoto, Daisuke Tateiwa, Hiroyuki Tsukazaki, Shinichi Nakagawa, Shota Takenaka, Takahiro Makino, Yusuke Sakai, David Nečas, Lenka Zajíčková, Satoshi Hamaguchi, Takashi Kaito

    Scientific Reports　Vol. 11　No. 1　p. 17870-17870　2021/12　Research paper (scientific journal)

    Publisher: Springer Science and Business Media LLC

  2. Amine plasma polymers deposited on porous hydroxyapatite artificial bone with bipolar pulsed discharges

    Anjar Anggraini Harumningtyas, Tomoko Ito, Hidekazu Kita, Joe Kodama, Takashi Kaito, Satoshi Hamaguchi

    Journal of Vacuum Science & Technology A　Vol. 42　No. 5　2024/07/24　Research paper (scientific journal)

    Publisher: American Vacuum Society

  3. Molecular dynamics simulation of amine formation in plasma-enhanced chemical vapor deposition with hydrocarbon and amino radicals

    Anjar Anggraini Harumningtyas, Tomoko Ito, Michiro Isobe, Lenka Zajíčková, Satoshi Hamaguchi

    Journal of Vacuum Science & Technology A　Vol. 41　No. 6　2023/10/06　Research paper (scientific journal)

    Publisher: American Vacuum Society

  4. Polyetheretherketone (PEEK) Implant Functionalization with Magnetron-Sputtered SrTiO3 for Regenerative Medicine

    Anjar Anggraini Harumningtyas, Tomoko Ito, Masato Ikuta, Takashi Kaito, Satoshi Hamaguchi

    Plasma Medicine　Vol. 13　No. 3　p. 53-67　2023/10　Research paper (scientific journal)

    Publisher: Begell House

  5. Foundations of atomic-level plasma processing in nanoelectronics

    Karsten Arts, Satoshi Hamaguchi, Tomoko Ito, Kazuhiro Karahashi, Harm C M Knoops, Adriaan J M Mackus, Wilhelmus M M (Erwin) Kessels

    Plasma Sources Science and Technology　Vol. 31　No. 10　p. 103002-103002　2022/10/01　Research paper (scientific journal)

    Publisher: IOP Publishing

  6. Low-energy ion irradiation effects on chlorine desorption in plasma-enhanced atomic layer deposition (PEALD) for silicon nitride

    Tomoko Ito, Hidekazu Kita, Kazuhiro Karahashi, Satoshi Hamaguchi

    Japanese Journal of Applied Physics　Vol. 61　No. SI　p. SI1011-SI1011　2022/07/01　Research paper (scientific journal)

  7. Low Energy Ion Effects in Plasma-Enhanced SiN-ALD processes

    2021/11　Research paper (international conference proceedings)

  8. Erratum: Formation and desorption of nickel hexafluoroacetylacetonate Ni(hfac)2on a nickel oxide surface in atomic layer etching processes (J. Vac. Sci. Technol. A (2020) 38 (052602) DOI: 10.1116/6.0000293)

    Abdulrahman H. Basher, Marjan Krstić, Karin Fink, Tomoko Ito, Kazuhiro Karahashi, Wolfgang Wenzel, Satoshi Hamaguchi

    Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films　Vol. 39　No. 5　2021/09/01　Research paper (scientific journal)

    Publisher: AVS Science and Technology Society

  9. Molecular dynamics simulation for reactive ion etching of Si and SiO2 by SF 5 + ions

    Erin Joy Capdos Tinacba, Tomoko Ito, Kazuhiro Karahashi, Michiro Isobe, Satoshi Hamaguchi

    Journal of Vacuum Science & Technology B　Vol. 39　No. 4　p. 043203-043203　2021/07　Research paper (scientific journal)

  10. Formation and desorption of nickel hexafluoroacetylacetonate Ni(hfac)2 on a nickel oxide surface in atomic layer etching processes

    Abdulrahman H. Basher, Marjan Krstić, Karin Fink, Tomoko Ito, Kazuhiro Karahashi, Wolfgang Wenzel, Satoshi Hamaguchi

    Journal of Vacuum Science & Technology A　Vol. 38　No. 5　p. 052602-052602　2020/09　Research paper (scientific journal)

    Publisher: American Vacuum Society

  11. Experimental and numerical analysis of the effects of ion bombardment in silicon oxide (SiO2) plasma enhanced atomic layer deposition (PEALD) processes

    Hu Li, Tomoko Ito, Kazuhiro Karahashi, Munehito Kagaya, Tsuyoshi Moriya, Masaaki Matsukuma, Satoshi Hamaguchi

    Japanese Journal of Applied Physics　Vol. 59　No. SJ　p. SJJA01-SJJA01　2020/06/01　Research paper (scientific journal)

    Publisher: IOP Publishing

  12. Stability of hexafluoroacetylacetone molecules on metallic and oxidized nickel surfaces in atomic-layer-etching processes

    Abdulrahman H. Basher, Marjan Krstić, Takae Takeuchi, Michiro Isobe, Tomoko Ito, Masato Kiuchi, Kazuhiro Karahashi, Wolfgang Wenzel, Satoshi Hamaguchi

    Journal of Vacuum Science & Technology A　Vol. 38　No. 2　p. 022610-022610　2020/03　Research paper (scientific journal)

    Publisher: American Vacuum Society

  13. XPS Study of Hexafluoroacetylacetone(hHfac) Adsorbed on Cobalt Surfaces for Atomic layer etching (ALE)

    Tomoko Ito, Kazuhiro Karahashi, Satoshi Hamaguchi

    Proceedings of 32nd International Microprocesses and Nanotechnology Conference　2019/11　Research paper (international conference proceedings)

  14. Molecular dynamics simulations of atomic-layer etching (ALE) of SiO2

    Yuki Okada, Michiro Isobe, Tomoko Ito, Kazuhiro Karahashi, Satoshi Hamaguchi

    Proceedings of the 39th International Symposium on Dry Process (DPS2017)　p. 47-48　2017/11　Research paper (international conference proceedings)

  15. Surface reactions of metal surfaces with adsorbed organic compounds by Ar+ ion irradiation,

    Tomoko Ito, Kazuhiro Karahashi, Satoshi Hamaguchi

    Proceedings of the 39th International Symposium on Dry Process (DPS2017)　p. 45-46　2017/11　Research paper (international conference proceedings)

  16. Etching yields and surface reactions of amorphous carbon by fluorocarbon ion irradiation

    Kazuhiro Karahashi, Hu Li, Kentaro Yamada, Tomoko Ito, Satoshi Numazawa, Ken Machida, Kiyoshi Ishikawa, Satoshi Hamaguchi

    Japanese Journal of Applied Physics　Vol. 56　No. 6S2　p. 06HB09-06HB09　2017/06/01　Research paper (scientific journal)

    Publisher: IOP Publishing

  17. Mass spectrometry analyses of ions generated by atmospheric-pressure plasma jets in ambient air

    Tomoko Ito, Kensaku Gotou, Kanako Sekimoto, Satoshi Hamaguchi

    Plasma Medicine　Vol. 5　No. 2-4　p. 283-298　2015/12　Research paper (scientific journal)

  18. Mass spectrometry analyses of ions generated by atmospheric-pressure plasma jets in ambient air

    Tomoko Ito, Kensaku Gotoh, Kanako Sekimoto, Satoshi Hamaguchi

    Plasma Medicine　Vol. 5　No. 2-4　p. 283-298　2015　Research paper (scientific journal)

  19. Characterization of polymer layer formation during SiO2/SiN etching by fluoro/hydrofluorocarbon plasmas

    Keita Miyake, Tomoko Ito, Michiro Isobe, Kazuhiro Karahashi, Masanaga Fukasawa, Kazunori Nagahata, Tetsuya Tatsumi, Satoshi Hamaguchi

    Japanese Journal of Applied Physics　Vol. 53　No. 3S2　p. 03DD02-03DD02　2014/01/01　Research paper (scientific journal)

    Publisher: IOP Publishing

  20. Characteristics of silicon etching by silicon chloride ions

    Tomoko Ito, Kazuhiro Karahashi, Song-Yun Kang, Satoshi Hamaguchi

    Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films　Vol. 31　No. 3　p. 031301-031301　2013/05　Research paper (scientific journal)

  21. Etching reaction of CoFeB by carbon monoxide /methyl alcohol based plasmas

    Kazuhiro Karahashi, Tomoko Ito, Satoshi Hamaguchi

    Proceedings of International Symposium on Dry Process (DPS)　p. 167-168　2012/11　Research paper (international conference proceedings)

  22. Si Damage Due to Oblique-Angle Ion Impact Relevant for Vertical Gate Etching Processes

    Tomoko Ito, Kazuhiro Karahashi, Kohei Mizotani, Michiro Isobe, Song-Yun Kang, Masanobu Honda, Satoshi Hamaguchi

    Japanese Journal of Applied Physics　Vol. 51　No. 8　p. 08HB01-08HB01　2012/08/20　Research paper (scientific journal)

    Publisher: IOP Publishing

  23. Si recess of poly-Si gate etching: damage enhanced by ion assisted oxygen diffusion

    Tomoko Ito, Kazuhiro Karahashi, Masanaga Fukasawa, Tetsuya Tatsumi and, Satoshi Hamaguchi

    Proceedings of The 32nd International Symposium on Dry Process (DPS)　p. 187-188　2011/11　Research paper (international conference proceedings)

  24. Hydrogen effects in hydrofluorocarbon plasma etching of silicon nitride: Beam study with CF+, CF2+, CHF2+, and CH2F+ ions

    Tomoko Ito, Kazuhiro Karahashi, Masanaga Fukasawa, Tetsuya Tatsumi, Satoshi Hamaguchi

    Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films　Vol. 29　No. 5　p. 050601-050601　2011/09　Research paper (scientific journal)

  25. Si Recess of Polycrystalline Silicon Gate Etching: Damage Enhanced by Ion Assisted Oxygen Diffusion

    Tomoko Ito, Kazuhiro Karahashi, Masanaga Fukasawa, Tetsuya Tatsumi, Satoshi Hamaguchi

    Japanese Journal of Applied Physics　Vol. 50　No. 8　p. 08KD02-08KD02　2011/08/22　Research paper (scientific journal)

    Publisher: IOP Publishing

  26. Evaluation of Si etching yields by Cl+Br+and HBr+ion irradiation

    Tomoko Ito, Kazuhiro Karahashi, Song-Yun Kang, Satoshi Hamaguchi

    Journal of Physics: Conference Series　Vol. 232　p. 012021-012021　2010/06/01　Research paper (scientific journal)

    Publisher: IOP Publishing

Misc. 5

  1. Experimental and theoretical approaches for the study of etching surface reactions

    唐橋一浩, 伊藤智子, 浜口智志

    応用物理　Vol. 91　No. 3　2022/03　Article, review, commentary, editorial, etc. (scientific journal)

  2. 4. Characteristics of Atomic Layer Etching Reactions for Hard to Etch Metal Materials

    伊藤智子, 唐橋一浩, 浜口智志

    プラズマ・核融合学会誌　Vol. 97　No. 9　p. 522-527　2021/09　Article, review, commentary, editorial, etc. (scientific journal)

  3. ビーム実験による原子スケールプロセスにおける表面反応解析—シリコン材料・デバイス

    唐橋 一浩, 伊藤 智子, 浜口 智志

    電子情報通信学会技術研究報告 = IEICE technical report : 信学技報　Vol. 119　No. 273　p. 11-16　2019/11

    Publisher: 電子情報通信学会

  4. プラズマ技術を用いた骨分化促進能を有する人工骨の開発

    小玉城, 杉本敏司, 伊藤智子, ANJAR Anggraini Harumningtyas, 吉川秀樹, 浜口智志, 海渡貴司

    日本整形外科学会雑誌　Vol. 93　No. 8　2019

  5. 技術解説 低温⼤気圧プラズマによる滅菌技術

    伊藤智子, 浜口智志

    機関紙「空気清浄」　Vol. 52　No. 4　p. 295-304　2014/04　Article, review, commentary, editorial, etc. (scientific journal)

Presentations 70

  1. 遷移金属におけるβジケトンによるサーマルエッチング表面反応解析

    伊藤智子, 唐橋一浩, 浜口智志

    第81回応用物理学会秋季学術講演会　2020/09/11

  2. Surface reactions of Si and SiO 2 exposed t o energetic tungsten fluoride ion beams

    Shunta Kawabata, Tomoko Ito, Song Yun Kang, Dongkyu Lee, Kazuhiro Karahashi, Satoshi Hamaguchi

    14th EU-Japan Joint Symposium on Plasma Processing (JSPP-14)　2023/04/20

  3. Thermal and Plasma-enhanced Atomic Layer Deposition of Strontium Oxide on Artificial Spinal Cage

    AnjarAnggraini Harumningtyas, Lenka Zajíčková, Marek Eliáš, Tomoko Ito, David Nečas, Lucie Janů, Eva Dvořáková, Pierre Vinchon, Masato Ikuta, Takashi Kaito, Satoshi Hamaguchi

    14th EU-Japan Joint Symposium on Plasma Processing (JSPP-14)　2023/04/18

  4. Surface analyses of β-diketone-adsorbed transition metal materials in atomic layer etching (ALE) processes

    Tomoko Ito, Abdulrahman H. Basher, Kazuhiro Karahashi, Satoshi Hamaguchi

    14th EU-Japan Joint Symposium on Plasma Processing (JSPP-14)　2023/04/21

  5. フッ化タングステンイオンによるSiおよびSiO2エッチング反応の評価

    川畑 竣大, 伊藤 智子, Kang Song-Yun, Lee Dongkyu, 唐橋 一浩, 浜口 智志

    第70回応用物理学会春季学術講演会　2023/03/17

  6. SiO2 etching reactions by high-energy WFx+ (X= 1-4) ion injection

    Tomoko Ito, Shoichi Taira, Shunta Kawabata, Erin Joy, Capdos Tinacba, Song-Yun Kang, Dongkyu Lee, Kazuhiro Karahashi and, Satoshi Hamaguchi

    DPS2022 43rd International Symposium on Dry Process　2022/11/25

  7. Atomic Layer Etching Reactions by Metal-organic Compound Formations

    Tomoko Ito, Kazuhiro Karahashi, Satoshi Hamaguchi

    TVS-2022 Annual Symposium　2022/10/28

  8. Effects of Low-Energy Ion Injection in Atomic Layer Processes

    Tomoko Ito, Kazuhiro Karahashi, Satoshi Hamaguchi

    14th International Symposium on Atomic Level Characterizations for New Materials and Devices '22　2022/10/21

  9. Surface reactions of acetylacetone (acacH) with transition metal for Atomic Layer Etching (ALE)

    Tomoko Ito, Kazuhiro Karahashi, Satoshi Hamaguchi

    35th International Microprocesses and Nanotechnology Conference　2022/10/09

  10. “Surface Reaction Mechanisms by Metal-Organic Compound Formations in Atomic Layer Etching Processes

    Tomoko Ito, A. Basher, King Abdullah, Saudi Arabia, K. Karahashi, S. Hamaguchi

    22nd International Conference on Atomic Layer Deposition (ALD 2022) featuring the 9th International Atomic Layer Etching Workshop　2022/06/28

  11. SiN のプラズマ支援 ALD における低エネルギーイオンの効果

    伊藤智子, 北英和, 鈴木歩太, 加賀谷宗仁, 松隈正明, 松崎和愛, 唐橋一浩, 浜口智志

    69 回応用物理学会春季学術講演会　2022/03/25

  12. 原子層エッチングにおける表面反応

    伊藤智子

    日本学術振興会R025委員会先進薄膜界面機能創成 第7回研究会　2022/02/21

  13. Effect of Primary Amines Formed by Low-Pressure Pulsed Plasma on Bone Regeneration and Numerical Study of Amine Formation using MD Simulation

    Tomoko Ito, Satoshi Sugimoto, Michiro Isobe, Joe Kodama, Takashi Kaito, Lenka Zajíčková, Satoshi Hamaguchi

    RUB-Japan Workshop: Bridging the Pandemic: Reigniting Cooperation on Plasma Research　2021/11/25

  14. Surface modification of Y2O3 by fluorocarbon plasmas

    Hojun Kang, Tomoko Ito, Hikaru Kokura, Hyowon Bae, Junghwan Um, Taekyun Kang, Sungil Cho, Hyunjung Park, Kazuhiro Karahashi, Satoshi Hamaguchi

    The 42nd International Symposium of Dry Process　2021/11/18

  15. Low Energy Ion Effects in Plasma-Enhanced SiN-ALD processes

    Tomoko Ito, Hidekazu Kita, Abdullah Y. Jaber, Erin Joy, Capdos Tinacba, Kazuhiro Karahashi, Satoshi Hamaguchi

    The 42nd International Symposium of Dry Process　2021/11/19

  16. Mechanisms of Atomic Layer Etching by Metal-Organic Complex Formation

    Tomoko Ito

    The 30th International Toki Conference on Plasma and Fusion Research　2021/11/17

  17. Nitridation and chlorine removal effects of nitrogen ion irradiation during plasma-enhanced Atomic Layer Deposition (PE-ALD) of silicon nitrid

    Abdullah Y. Jaber, Erin Joy, C. Tinacba, Nicolas A. Mauchamp, Michiro Isobe, Tomoko Ito, Kazuhiro Karahashi, Masaaki Matsukuma, Munehito Kagaya, Ayuta Suzuki, Kazuyoshi Matsuzaki, Satoshi Hamaguchi

    The 30th International Toki Conference on Plasma and Fusion Research　2021/11/17

  18. Mechanisms of Thermal Atomic Layer Etching (ALE) of Metal by β-Diketones

    A. H. Basher, I. Hamada, M. Krstić, T. Ito, K. Karahashi, W. Wenzel, S. Hamaguchi

    American Vacuum Society (AVS) 67th Virtual Symposium　2021/10

  19. Mechanisms of Thermal Atomic Layer Etching (ALE) for Metals

    A. H. Basher, M. Krstić, T. Takeuchi, T. Ito, K. Fink, M. Kiuchi, K. Karahashi, W. Wenzel, S. Hamaguchi

    1st Workshop on Artificial Intelligence in Plasma Science, Satellite Workshop of EU-Japan Joint Symposium on Plasma Processing　2021/09

  20. Atomic Layer Etchingの吸着層が基板ダメージ生成に与える影響

    平田 瑛子, 深沢 正永, J. U. Tercero, 伊藤 智子, 礒部 倫郎, 唐橋 一浩, 浜口 智志, 釘宮 克尚, 萩本 賢哉, 岩元 勇人

    第 82 回応用物理学会秋季学術講演会　2021/09/11

  21. 原子層プロセスにおける低エネルギーイオン照射誘起表面反応

    伊藤智子, 唐橋一 浩, 浜口智志

    第 82 回応用物理学会秋季学術講演会　2021/09/11

  22. Amine formation on the surface of porous calcium-phosphate artificial bone by low-pressure pulsed plasma polymer deposition

    Anjar Anggraini Harumningtyas, Tomoko Ito, Miroslav Michlichek, Satoshi Sugimoto, Lenka Zajickova, Joe Kodama, Takashi Kaito, Satoshi Hamaguchi

    8th International Conference on Plasma Medicine/10th International Symposium on Plasma Bioscience　2021/08/04

  23. Mechanisms of Self-Limiting Processes in Thermal Atomic Layer Etching of Nickel by β-diketones

    A. H. Basher, I. Hamada, T. Ito, K. Karahashi, S. Hamaguchi

    AVS 21st International Conference on Atomic Layer Deposition (ALD 2021)/8th International Atomic Layer Etching Workshop (ALE 2021)　2021/06

  24. Mechanisms of Thermal Atomic Layer Etching (ALE) of Nickel by Acetylacetone (acacH) Molecules

    A. H. Basher, M. Krstić, T. Takeuchi, T. Ito, M. Kiuchi, K. Karahashi, W. Wenzel, S. Hamaguchi

    SVC TechCon 2021　2020/05

  25. βジケトンを用いた遷移金属原子層エッチング(ALE) の脱離生成物計測と反応機構解明

    伊藤智子, 唐橋一浩, 浜口智志

    第68回応用物理学会春季学術講演会　2021/03/17

  26. Interactions of Si and SiO2 Surfaces with Energetic SiFx+ and SiClx+ Ion Beams

    Abdullah Jaber, Michiro Isobe, Tomoko Ito, Kazuhiro Karahashi, Satoshi Hamaguchi

    International Conference on the 8th International Conference on Microelectronics and Plasma Technology (ICMAP) and the 9th International Symposium on Functional Materials (ISFM)　2021/01

  27. Amine Formation in Carbon Polymers Deposited by Plasma Enhanced Chemical Vapour Deposition (PECVD)

    Anjar Anggraini Harumningtyas, Tomoko Ito, Michiro Isobe, Satoshi Sugimoto, Miroslav Michlichek, David Necas, Lenka Zajickova, Satoshi Hamaguchi

    Joint International Conference on the 8th International Conference on Microelectronics and Plasma Technology (ICMAP) and the 9th International Symposium on Functional Materials (ISFM)　2021/01

  28. Surface reactions of fluorinated Y2O3 by H+ and O+ ion irradiation

    Hojun Kang, Tomoko Ito, Junghwan Um, Hikaru Kokura, Taekyun Kang, Sung-Il Cho, Hyunjung Park, Kazuhiro Karahashi, Satoshi Hamaguchi

    the 68th JSAP Spring Meeting　2020/09/11

  29. Surface fluorination of Y2O3 irradiated by low energy CF3+ ion and F+ ion

    Hojun Kang, Tomoko Ito, Junghwan Um, Hikaru Kokura, Taekyun Kang, Sungil Cho, Hyunjung Park, Kazuhiro Karahashi, Satoshi Hamaguchi

    The 81st JSAP Fall Meeting　2020/09/11

  30. XPS Study of Hexafluoroacetylacetone(hHfac) Adsorbed on Cobalt Surfaces for Atomic layer etching (ALE)

    Tomoko Ito, Kazuhiro Karahashi, Satoshi Hamaguchi

    32nd International Microprocesses and Nanotechnology Conference　2019/11/29

  31. Analyses of Hexafluoroacetylacetone (Hfac) Adsorbed on Transition Metal Surfaces

    Tomoko Ito, Kazuhiro Karahashi, Satoshi Hamaguchi

    2019/07/23

  32. 原子層エッチングプロセスにおける表面反応解析

    伊藤智子, 唐橋一浩, 浜口智志

    The 4th Atomic Layer Process (ALP) Workshop　2019/06/19

  33. ヘキサフルオロアセチルアセトンによる遷移金属(Ni, Co)におけるサーマルエッチング反応解析

    伊藤智子, 唐橋一浩, 浜口智志

    第66回応用物理学会春季学術講演会　2019/03

  34. Effects of Light Ion Beam Irradiation in Plasma Etching Processes

    Kazuhiro Karahashi, Tomoko Ito, Hu Li, Michiro Isobe, Kohei Mizotani, Shunpei Shigeno, Masanaga Fukasawa, Akiko Hirata, Tetsuya Tatsumi, Satoshi Hamaguchi

    AVS 65th International Symposium & Exhibition　2018/10/23

  35. Atomic-Layer Etching (ALE) of Nickel or Nickel Oxide Films by Hexafluoroacetylacetone (HFAC) Molecules

    Abdulrahman Basher, Michiro Isobe, Tomoko Ito, Kazuhiro Karahashi, Masato Kiuchi, Takae Takeuchi, Satoshi Hamaguchi

    AVS 65th International Symposium & Exhibition　2018/10/25

  36. Mechanisms for Atomic Layer Etching of Metal Films by the Formation of Beta-diketonate Metal Complexes

    Tomoko Ito, Kazuhiro Karahashi, Satoshi Hamaguchi

    AVS 65th International Symposium & Exhibition　2018/10/25

  37. 金属原子層エッチングプロセスにおける錯体形成表面反応解析

    伊藤 智子, 唐橋 一浩, 浜口 智志

    第79回応用物理学会秋季学術講演会　2018/09/20

  38. Molecular dynamics simulation of SiO2 atomic-layer etching (ALE) by fluorocarbon and argon plasmas

    Yuki Okada, Michiro Isobe, Tomoko Ito, Kazuhiro Karahashi, Satoshi Hamaguchi

    AVS 18th International Conference on Atomic Layer Deposition (ALD 2018) and the 5th International Atomic Layer Etching Workshop (ALE 2018)　2018/07/30

  39. Etching Reactions of Halogenated Layers Induced by Irradiation of Low-energy Ions and Gas-clusters

    Kazuhiro Karahashi, Tomoko Ito, Satoshi Hamaguchi

    AVS 18th International Conference on Atomic Layer Deposition (ALD 2018) and the 5th International Atomic Layer Etching Workshop (ALE 2018)　2018/07/30

  40. Reactions of Hexafluoroacetylacetone (hfac) and Metal Surfaces under Low-energy Ion Irradiation

    Tomoko Ito, Kazuhiro Karahashi, Satoshi Hamaguchi

    AVS 18th International Conference on Atomic Layer Deposition (ALD 2018) and the 5th International Atomic Layer Etching Workshop (ALE 2018)　2018/07/30

  41. 医療におけるプラズマプロセスの開発

    伊藤智子

    「量子ビームによるナノ構造形成とその医療・バイオ応用技術」 調査専門委員会第5回委員会　2018/06/11

  42. ヘキサフルオロアセチルアセトン吸着表面金属（Ni.Cu)におけるエッチング反応

    伊藤智子, 唐橋一浩, 浜口智志

    第65回応用物理学会春季学術講演会　2018/03/19

  43. Amino Group Surface Modification of Cell Culture Polystyrene Dishes by an Inverter Plasma Process

    Satoshi Sugimoto, Tomoko Ito, Kai Kubota, Kazuma Nishiyama, Satoshi Hamaguchi

    2017/12

  44. XPS Analysis of Adsorbed Organic Compounds on Magnetic Materials Surfaces

    Tomoko Ito, Kazuhiro Karahashi, Satoshi Hamaguchi

    2017/12

  45. Molecular Dynamics Simulation of Ni Etching by CO Plasmas

    Akito Kumamoto, Nicolas A. Mauchamp, Michiro Isobe, Kohei Mizotani, Hu Li, Tomoko Ito, Kazuhiro Karahashi, S. Hamaguchi

    AVS 63rd International Symposium & Exhibition　2017/11/06

  46. Plasma-based Functionalization of Polystyrene Surfaces of Cell Culture Plates

    Kazuma Nishiyama, Tomoko Ito, Satoshi Sugimoto, Kensaku Gotoh, Michiro Isobe, Mina Okamoto, Akira Myoui, Hideki Yoshikawa, Satoshi Hamaguchi

    AVS 63rd International Symposium & Exhibition　2017/11/06

  47. Si, SiO2, and Si3N4 Etching Characteristics of Silicon Halide Ions (SiFx+, SiClx+, and SiBrx+),

    K. Karahashi, T. Ito, H. Li, Y. Muraki, M. Matsukuma, S. Hamaguchi

    AVS 64th International Symposium & Exhibition　2017/10/31

  48. Surface reactions of metal surfaces with adsorbed organic compounds by Ar+ ion irradiation

    Tomoko Ito, Kazuhiro Karahashi, Satoshi Hamaguchi

    2017/11

  49. Molecular dynamics simulations of atomic-layer etching (ALE) of SiO2

    Yuki Okada, Michiro Isobe, Tomoko Ito, Kazuhiro Karahashi, Satoshi Hamaguchi

    2017/11

  50. Ni 表面に 対する ヘキサフルオロアセチルアセトン による 表面反応の 解明

    伊藤 智子, 唐橋, 一浩, 浜口 智志

    第78回応用物理学会秋季学術講演会　2017/09/07

  51. 金属表面におけるXeF2曝露によるフッ化物層のエッチング反応

    伊藤智子, 唐橋一浩, 浜口智志

    2017/09

  52. Etching yields and surface reactions of amorphous carbon by fluorocarbon ion irradiation

    Kazuhiro Karahashi, Hu Li, Kentaro Yamada, Tomoko Ito, Satoshi Numazawa, Ken Machida, Kiyoshi Ishikawa, Satoshi Hamaguchi

    2017/05

  53. プラズマ照射によるポリスチレン細胞培養皿表面のアミノ基修飾

    伊藤智子, 西山一馬, 杉本敏司, 浜口智志

    2017/03

  54. Plasma-based Functionalization of Polystyrene Surfaces of Cell Culture Plates

    Kazuma Nishiyama, Tomoko Ito, Satoshi Sugimoto, Kensaku Gotoh, Michiro Isobe, Mina Okamoto, Akira Myoui, Hideki Yoshikawa, Satoshi Hamaguchi

    2016/11

  55. 大気中の放電による大気イオン生成および大気エアロゾルのイオン化機構の解明

    伊藤智子, 浜口智志

    2014年度第２回研究会「“自己組織化・微粒子プラズマと複雑システム」　2015/03/27

  56. Characterization of plasma-surface interaction for Si based materials by multi-beam experiments

    The 2nd International Symposium on Non-equilibrium Plasma and Complex-System Sciences (IS-NPCS)　2014/01/10

  57. Mass spectrometry of ions formed in atmospheric-pressure plasma jets

    Tomoko Ito, Kanako Sekimoto, Satoshi Hamaguchi

    International Workshop on Diagnostics and Modelling for Plasma Medicine (DMPM2014)　2014/05

  58. 高エネルギー水素イオン入射によるSi表面の増殖酸化

    伊藤智子, 溝谷浩平, 礒部倫郎, 唐橋一浩, 深沢正永, 長畑和典, 辰巳哲也, 浜口智志

    第7４回応用物理学会秋季学術講演会 「プラズマエレクトロニクス賞受賞記念講演」　2013/09/17

  59. プラズマエッチングにおけるナノメートル表面層反応機構の解明

    伊藤智子

    第156回応物Siテクノロジー研究会　2013/02/16

  60. Etching reaction of CoFeB by carbon monoxide /methyl alcohol based plasmas

    Kazuhiro Karahashi, Tomoko Ito, Satoshi Hamaguchi

    American Vacuum Society (AVS) 59th International Symposium & Exhibition　2012

  61. “Roles of hydrogen for hydrofluorocarbon (HFC) plasma etching of silicon nitride (SiN)

    Satoshi Hamaguchi, Keita Miyake, Kohei Mizotani, Michiro Isobe, Tomoko Ito, Kazuhiro Karahashi, Masanaga Fukasawa, Tetsuya Tatsumi

    American Vacuum Society (AVS) 59th International Symposium & Exhibition　2012

  62. Reactive etching or deposition properties of silicon halide ions in gate etching processes

    Tomoko Ito, Kazuhiro Karahashi, Satoshi Hamaguchi

    American Vacuum Society (AVS) 59th International Symposium & Exhibition　2012/11

  63. Mechanisms of selective etching for magnetic materials: Ni, Co and Ta etching by carbon monoxide /methyl alcohol based plasmas

    Kazuhiro Karahashi, Tomoko Ito, Satoshi Hamaguchi

    American Vacuum Society 58th International Symposium & Exhibition　2011

  64. Silicon etching characteristics by hydrogen halide ions (HCl+ and HBr+) and ions of desorbed species (SiClx+)

    Tomoko Ito, Kazuhiro Karahashi, Song-Yun Kang, Satoshi Hamaguchi

    American Vacuum Society 58th International Symposium & Exhibition　2011

  65. Etching mechanisms of Pt, Co and PtCo magnetic films by chemically reactive energetic ion injections

    Kazuhiro Karahashi, Tomoko Ito, Satoshi Hamaguchi

    American Vacuum Society 57th International Symposium & Exhibition　2011/10

  66. Characteristics of silicon nitride etching by reactive plasmas containing CHxFy ions

    Tomoko Ito, Kazuhiro Karahashi, Masanaga Fukasawa, Tetsuya Tatsumi, Satoshi Hamaguchi

    American Vacuum Society 57th International Symposium & Exhibition　2011/10

  67. Si酸化反応における水素イオン照射効果

    伊藤智子, 唐橋一浩, 深沢正永, 辰巳哲也, 浜口智志

    第58回応用物理学関係連合講演会　2011/03

  68. CHxFy＋ イオンエッチングにおける水素の効果

    伊藤智子, 唐橋一浩, 深沢正永, 辰巳哲也, 浜口智志

    第71回応用物理学術講演会　2010/09

  69. CHxFy＋イオン照射によるエッチング反応の評価

    伊藤智子, 唐橋一浩, 深沢正永, 辰巳哲也, 浜口智志

    第57回応用物理学関係連合講演会　2010/03

  70. Cl+, Br+ イオン照射によるSiエッチング反応の評価

    伊藤智子, 松本祥志, 唐橋一浩, 康 松潤, 浜口智志

    2009

Industrial Property Rights 2

  1. Artificial bone and manufacturing method of artificial bone

    Satoshi Hamaguchi, Tomoko Deguchi, Satoshi Sugimoto, Takashi Kaito, Hideki Yoshikawa, Chieko Asamori

  2. 放射性プルーム監視システムおよび放射性物質検出装置

    浜口智志, 出口智子, 竹内正人, タム・アンディ, 内田清志, 加藤万寿夫, 隅谷典久

    出願日:2014/09

Institutional Repository 2

Content Published in the University of Osaka Institutional Repository (OUKA)

  1. Etching characteristics of tungsten and tungsten compounds by energetic fluorocarbon and argon ions

    Kang Hojun, Kawabata Shunta, Ito Tomoko, Kang Song Yun, Lee Dongkyu, Lee Yuna, Karahashi Kazuhiro, Hamaguchi Satoshi

    Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films　Vol. 43　No. 4　2025/06/02

  2. Comparing the osteogenic effects of sputtered titanium- and strontium titanate (STO)-modified polyetheretherketone

    Ikuta Masato, Harumningtyas Anjar Anggraini, Ito Tomoko, Fujita Kenta, Kitahara Takayuki, Bun Masayuki, Furuichi Takuya, Hirai Hiromasa, Ukon Yuichiro, Tateiwa Daisuke, Kanie Yuya, Furuya Masayuki, Fujimori Takahito, Okada Seiji, Hamaguchi Satoshi, Kaito Takashi

    Emergent Materials　2025/02/25