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Hamaguchi Satoshi

浜口 智志

Graduate School of Engineering Division of Materials and Manufacturing Science, Professor

keyword numerical simulation,plasma chemistry,plasma physics

Education

  • 1984/09 - 1988/06, New York University, Graduate School of Arts and Science, Department of Mathematics
  • 1982/04 - 1987/03, The University of Tokyo, Graduate School of Science, Department of Physics
  • 1978/04 - 1982/03, The University of Tokyo, Faculty of Science, Department of Physics

Research Areas

  • Energy, Nuclear fusion
  • Energy, Applied plasma science
  • Energy, Basic plasma science

Papers

  • First-principles simulation of optical emission spectra for low-pressure argon plasmas and its experimental validation, Fatima Jenina Arellano,Márton Gyulai,Zoltán Donkó,Peter Hartmann,Tsanko V Tsankov,Uwe Czarnetzki,Satoshi Hamaguchi, Plasma Sources Science and Technology, 2023/12/01
  • Molecular dynamics simulation of amine formation in plasma-enhanced chemical vapor deposition with hydrocarbon and amino radicals, Anjar Anggraini Harumningtyas,Tomoko Ito,Michiro Isobe,Lenka Zajíčková,Satoshi Hamaguchi, Journal of Vacuum Science & Technology A, 2023/12/01
  • Spectroscopic analysis improvement using convolutional neural networks, N Saura,D Garrido,S Benkadda,K Ibano,Y Ueda,S Hamaguchi, Journal of Physics D: Applied Physics, Vol. 56, No. 35, 2023/08/31
  • Global numerical simulation of chemical reactions in phosphate-buffered saline (PBS) exposed to atmospheric-pressure plasmas, Enggar Alfianto,Kazumasa Ikuse,Satoshi Hamaguchi, Plasma Sources Science and Technology, 2023/08/01
  • High-throughput SiN ALE: surface reaction and ion-induced damage generation mechanisms, Satoshi Hamaguchi, Japanese Journal of Applied Physics, 2023/07/01
  • Inert-gas ion scattering at grazing incidence on smooth and rough Si and SiO2 surfaces, Charisse Marie D. Cagomoc,Michiro Isobe,Eric A. Hudson,Satoshi Hamaguchi, Journal of Vacuum Science & Technology A, 2023/03
  • Molecular dynamics study of SiO2 nanohole etching by fluorocarbon ions, Satoshi Hamaguchi, Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2023/03
  • Foundations of machine learning for low-temperature plasmas: methods and case studies, Satoshi Hamaguchi, Plasma Sources Science and Technology, 2023/02/01
  • 2022 Review of Data-Driven Plasma Science, Rushil Anirudh,Rick Archibald,M. Salman Asif,Markus M. Becker,Sadruddin Benkadda,Peer-Timo Bremer,Rick H. S. Budé,C. S. Chang,Lei Chen,R. M. Churchill,Jonathan Citrin,Jim A. Gaffney,Ana Gainaru,Walter Gekelman,Tom Gibbs,Satoshi Hamaguchi,Christian Hill,Kelli Humbird,Sören Jalas,Satoru Kawaguchi,Gon-Ho Kim,Manuel Kirchen,Scott Klasky,John L. Kline,Karl Krushelnick,Bogdan Kustowski,Giovanni Lapenta,Wenting Li,Tammy Ma,Nigel J. Mason,Ali Mesbah,Craig Michoski,Todd Munson,Izumi Murakami,Habib N. Najm,K. Erik J. Olofsson,Seolhye Park,J. Luc Peterson,Michael Probst,David Pugmire,Brian Sammuli,Kapil Sawlani,Alexander Scheinker,David P. Schissel,Rob J. Shalloo,Jun Shinagawa,Jaegu Seong,Brian K. Spears,Jonathan Tennyson,Jayaraman Thiagarajan,Catalin M. Ticoş,Jan Trieschmann,Jan van Dijk,Brian Van Essen,Peter Ventzek,Haimin Wang,Jason T. L. Wang,Zhehui Wang,Kristian Wende,Xueqiao Xu,Hiroshi Yamada,Tatsuya Yokoyama,Xinhua Zhang, IEEE Transactions on Plasma Science, Institute of Electrical and Electronics Engineers (IEEE), p. 1-89, 2023
  • Molecular dynamics simulation of oxide-nitride bilayer etching with energetic fluorocarbon ions, Charisse Marie D. Cagomoc,Michiro Isobe,Eric A. Hudson,Satoshi Hamaguchi, Journal of Vacuum Science & Technology A, American Vacuum Society, Vol. 40, No. 6, 2022/11/03
  • Foundations of atomic-level plasma processing in nanoelectronics, Karsten Arts,Satoshi Hamaguchi,Tomoko Ito,Kazuhiro Karahashi,Harm C M Knoops,Adriaan J M Mackus,Wilhelmus M M (Erwin) Kessels, Plasma Sources Science and Technology, IOP Publishing, Vol. 31, No. 10, p. 103002-103002, 2022/10/01
  • Science-based, data-driven developments in plasma processing for material synthesis and device-integration technologies, Makoto Kambara,Satoru Kawaguchi,Hae June Lee,Kazumasa Ikuse,Satoshi Hamaguchi,Takeshi Ohmori,Kenji Ishikawa, Japanese Journal of Applied Physics, IOP Publishing, 2022/09/13
  • Molecular dynamics simulation of Si trench etching with SiO2 hard masks, Nicolas A. Mauchamp,Satoshi Hamaguchi, Journal of Vacuum Science & Technology A, American Vacuum Society, Vol. 40, No. 5, 2022/08/10
  • Improving penalized semi supervised nonnegative matrix factorization result’s confidence using deep residual learning approach in spectrum analysis, Nathaniel Saura,Koh Mastumoto,Sadruddin Benkadda,Kenzo Ibano,Heun Tae Lee,Yoshio Ueda,Satoshi Hamaguchi, 2022 International Conference on Electrical, Computer and Energy Technologies (ICECET), IEEE, 2022/07/20
  • Roles of the reaction boundary layer and long diffusion of stable reactive nitrogen species (RNS) in plasma-irradiated water as an oxidizing media — numerical simulation study, Kazumasa Ikuse,Satoshi Hamaguchi, Japanese Journal of Applied Physics, IOP Publishing, Vol. 61, No. 7, p. 076002-076002, 2022/06/24
  • Low-energy ion irradiation effects on chlorine desorption in plasma-enhanced atomic layer deposition (PEALD) for silicon nitride, Tomoko Ito,Hidekazu Kita,Kazuhiro Karahashi,Satoshi Hamaguchi, Japanese Journal of Applied Physics, IOP Publishing, Vol. 61, No. SI, p. SI1011-SI1011, 2022/06/13
  • Five-step plasma-enhanced atomic layer etching of silicon nitride with a stable etched amount per cycle, Akiko Hirata,Masanaga Fukasawa,Jomar U. Tercero,Katsuhisa Kugimiya,Yoshiya Hagimoto,Kazuhiro Karahashi,Satoshi Hamaguchi,Hayato Iwamoto, Japanese Journal of Applied Physics, IOP Publishing, Vol. 61, No. 6, p. 066002-066002, 2022/05/23
  • Self-Sputtering of the Lennard-Jones Crystal, Satoshi Hamaguchi, ArXiv, 2022/02
  • Structural and electrical characteristics of ion-induced Si damage during atomic layer etching, Satoshi Hamaguchi, Japanese Journal of Applied Physics, 2022
  • The 2021 release of the Quantemol database (QDB) of plasma chemistries and reactions, Satoshi Hamaguchi, Plasma Sources Science and Technology, 2022
  • The 2022 Plasma Roadmap: low temperature plasma science and technology, Satoshi Hamaguchi, Journal of Physics D: Applied Physics, 2022
  • Self-sputtering of the Lennard-Jones crystal, Satoshi Hamaguchi, Physics of Plasmas, 2022
  • Low energy ion reactions of SiN plasma-enhanced atomic layer deposition, 伊藤智子,北英和,鈴木歩太,加賀谷宗仁,松隈正明,松崎和愛,唐橋一浩,浜口智志, 応用物理学会春季学術講演会講演予稿集(CD-ROM), Vol. 69th, 2022
  • Construction of a surrogate model for low-temperature plasma simulation using machine learning, 市川将和,幾世和将,CHEN Kuan-Lin,WU Jong-Shinn,浜口智志, 応用物理学会春季学術講演会講演予稿集(CD-ROM), Vol. 69th, 2022
  • Surface Reaction Mechanisms to Realize High-throughput SiN ALE, 平田瑛子,深沢正永,TERCERO J. U.,釘宮克尚,萩本賢哉,唐橋一浩,浜口智志,岩元勇人, 応用物理学会秋季学術講演会講演予稿集(CD-ROM), Vol. 83rd, 2022
  • Amine modification of calcium phosphate by low-pressure plasma for bone regeneration, Joe Kodama,Anjar Anggraini Harumningtyas,Tomoko Ito,Miroslav Michlíček,Satoshi Sugimoto,Hidekazu Kita,Ryota Chijimatsu,Yuichiro Ukon,Junichi Kushioka,Rintaro Okada,Takashi Kamatani,Kunihiko Hashimoto,Daisuke Tateiwa,Hiroyuki Tsukazaki,Shinichi Nakagawa,Shota Takenaka,Takahiro Makino,Yusuke Sakai,David Nečas,Lenka Zajíčková,Satoshi Hamaguchi,Takashi Kaito, Scientific Reports, Springer Science and Business Media LLC, Vol. 11, No. 1, p. 17870-17870, 2021/12
  • Molecular dynamics simulation for reactive ion etching of Si and SiO<sub>2</sub> by SF 5 + ions, Erin Joy Capdos Tinacba,Tomoko Ito,Kazuhiro Karahashi,Michiro Isobe,Satoshi Hamaguchi, Journal of Vacuum Science &amp; Technology B, American Vacuum Society, Vol. 39, No. 4, p. 043203-043203, 2021/07
  • Surface damage formation during atomic layer etching of silicon with chlorine adsorption, Erin Joy Capdos Tinacba,Michiro Isobe,Satoshi Hamaguchi, Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, A V S AMER INST PHYSICS, Vol. 39, No. 4, 2021/07/01
  • Evaluation of nickel self-sputtering yields by molecular-dynamics simulation, Nicolas A. Mauchamp,Michiro Isobe,Satoshi Hamaguchi, Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol. 39, No. 4, 2021/07/01
  • Preface to Special Topic: Invited Papers from the 2nd International Conference on Data-Driven Plasma Science, Sadruddin Benkadda,Satoshi Hamaguchi,Magali Muraglia,Deborah O'Connell, Physics of Plasmas, AIP Publishing, Vol. 28, No. 3, p. 030401-1-030401-2, 2021/03/01
  • Surface reactions induced by low-energy ion irradiation in atomic layer processes, 伊藤智子,唐橋一浩,浜口智志, 応用物理学会秋季学術講演会講演予稿集(CD-ROM), Vol. 82nd, 2021
  • Effect of Atomic Layer Etching Adsorption Layer on Substrate Damage Generation, 平田瑛子,平田瑛子,深沢正永,釘宮克尚,萩本賢哉,岩元勇人,TERCERO J. U.,礒部倫郎,伊藤智子,唐橋一浩,浜口智志, 応用物理学会秋季学術講演会講演予稿集(CD-ROM), Vol. 82nd, 2021
  • Monitoring of nonthermal plasma degradation of phthalates by ion mobility spectrometry, Ladislav Moravský,Bartosz Michalczuk,Jana Hrdá,Satoshi Hamaguchi,Štefan Matejčík, Plasma Processes and Polymers, Wiley, 2021
  • Development of a Massively Parallelized Fluid-Based Plasma Simulation Code with a Finite-Volume Method on an Unstructured Grid, Kuan Lin Chen,Meng Fan Tseng,Ming Chung Lo,Satoshi Hamaguchi,Meng Hua Hu,Yun Ming Lee,Jong Shinn Wu, IEEE Transactions on Plasma Science, Vol. 49, No. 1, p. 104-119, 2021/01
  • Characterization of descriptors in machine learning for data-based sputtering yield prediction, Hiori Kino,Kazumasa Ikuse,Hieu Chi Dam,Satoshi Hamaguchi, Physics of Plasmas, Vol. 28, No. 1, 2021/01/01
  • Mechanism of SiN etching rate fluctuation in atomic layer etching, Akiko Hirata,Masanaga Fukasawa,Katsuhisa Kugimiya,Kojiro Nagaoka,Kazuhiro Karahashi,Satoshi Hamaguchi,Hayato Iwamoto, Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol. 38, No. 6, 2020/12/01
  • 生体親和性材料の最新知見 プラズマ技術を用いた骨形成を有するアミン人工骨の開発, 海渡 貴司,小玉 城,浜口 智志, 臨床神経生理学, (一社)日本臨床神経生理学会, Vol. 48, No. 5, p. 447-447, 2020/10
  • Molecular dynamics simulation of amine groups formation during plasma processing of polystyrene surfaces, Miroslav Michlíček,Satoshi Hamaguchi,Lenka Zajíčková, Plasma Sources Science and Technology, Vol. 29, No. 10, 2020/10
  • Modeling characterisation of a bipolar pulsed discharge, Zoltán Donkó,Lenka Zajičková,Satoshi Sugimoto,Anjar Anggraini Harumningtyas,Satoshi Hamaguchi, Plasma Sources Science and Technology, Vol. 29, No. 10, 2020/10
  • Formation and desorption of nickel hexafluoroacetylacetonate Ni(hfac)<inf>2</inf>on a nickel oxide surface in atomic layer etching processes, Abdulrahman H. Basher,Marjan Krstić,Karin Fink,Tomoko Ito,Kazuhiro Karahashi,Wolfgang Wenzel,Satoshi Hamaguchi, Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol. 38, No. 5, 2020/09/01
  • Self-limiting processes in thermal atomic layer etching of nickel by hexafluoroacetylacetone, Abdulrahman H. Basher,Ikutaro Hamada,Satoshi Hamaguchi, Japanese Journal of Applied Physics, Vol. 59, No. 9, 2020/09/01
  • On-wafer monitoring and control of ion energy distribution for damage minimization in atomic layer etching processes, A. Hirata,M. Fukasawa,K. Kugimiya,K. Nagaoka,K. Karahashi,S. Hamaguchi,H. Iwamoto, Japanese Journal of Applied Physics, Vol. 59, No. SJ, 2020/06/01
  • Experimental and numerical analysis of the effects of ion bombardment in silicon oxide (SiO<inf>2</inf>) plasma enhanced atomic layer deposition (PEALD) processes, Hu Li,Tomoko Ito,Kazuhiro Karahashi,Munehito Kagaya,Tsuyoshi Moriya,Masaaki Matsukuma,Satoshi Hamaguchi, Japanese Journal of Applied Physics, IOP Publishing, Vol. 59, No. SJ, p. SJJA01-SJJA01, 2020/06/01
  • Stability of hexafluoroacetylacetone molecules on metallic and oxidized nickel surfaces in atomic-layer-etching processes, Abdulrahman H. Basher,Marjan Krstić,Takae Takeuchi,Michiro Isobe,Tomoko Ito,Masato Kiuchi,Kazuhiro Karahashi,Wolfgang Wenzel,Satoshi Hamaguchi, Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, A V S AMER INST PHYSICS, Vol. 38, No. 2, 2020/03/01
  • プラズマ技術を用いたアミン修飾による骨形成を有する人工骨の開発, 海渡貴司,小玉城,浜口智志, 中部日本整形外科災害外科学会雑誌, (一社)中部日本整形外科災害外科学会, Vol. 63, No. 秋季学会, p. 23-23, 2020
  • プラズマ技術を用いた骨形成を有するアミン人工骨の開発, 海渡貴司,小玉城,浜口智志, 臨床神経生理学(Web), Vol. 48, No. 5, 2020
  • Molecular dynamics simulation of Si and SiO<inf>2</inf> reactive ion etching by fluorine-rich ion species, Erin Joy Capdos Tinacba,Michiro Isobe,Kazuhiro Karahashi,Satoshi Hamaguchi, Surface and Coatings Technology, ELSEVIER SCIENCE SA, Vol. 380, 2019/12/25
  • Special issue: Plasmas for microfabrication, Satoshi Hamaguchi,Sumit Agarwal,Lenka Zajickova,Michael R. Wertheimer, Plasma Processes and Polymers, WILEY-V C H VERLAG GMBH, Vol. 16, No. 9, 2019/09
  • Damage recovery and low-damage etching of ITO in H<inf>2</inf>/CO plasma: Effects of hydrogen or oxygen, Akiko Hirata,Masanaga Fukasawa,Katsuhisa Kugimiya,Kazuhiro Karahashi,Satoshi Hamaguchi,Kojiro Nagaoka, Plasma Processes and Polymers, WILEY-V C H VERLAG GMBH, Vol. 16, No. 9, 2019/09/01
  • Effects of excitation voltage pulse shape on the characteristics of atmospheric-pressure nanosecond discharges, Zoltán Donkó,Satoshi Hamaguchi,Timo Gans, Plasma Sources Science and Technology, IOP PUBLISHING LTD, Vol. 28, No. 7, 2019/07/24
  • Analyses of Hexafluoroacetylacetone (Hfac) Adsorbed on Transition Metal Surfaces, Tomoko Ito,Kazuhiro Karahashi,Satoshi Hamaguchi, 2019/07
  • Complex-formation reaction analysis for atomic-layer etching of metal surfaces, Ito Tomoko,Karahashi Kazuhiro,Hamaguchi Satoshi, JSAP Annual Meetings Extended Abstracts, The Japan Society of Applied Physics, Vol. 2018.2, p. 262-262, 2019/06
  • Transition Metal (Ni, Co) Thermal Etching by Hexafluoroacetylacetone (hfac), Ito Tomoko,Kazuhiro Karahashi,Hamaguchi Satoshi, JSAP Annual Meetings Extended Abstracts, The Japan Society of Applied Physics, Vol. 2019.1, p. 1627-1627, 2019/03
  • プラズマ原子層プロセシングにおけるアセチルアセトン-酸化ニッケル表面反応のab initio DFT計算, 中村花菜,伊藤智子,唐橋一浩,浜口智志,竹内孝江,竹内孝江, 日本化学会春季年会講演予稿集(CD-ROM), Vol. 99th, 2019
  • SiN Atomic Layer Etching表面状態の変動解析, 平田瑛子,深沢正永,釘宮克尚,長岡弘二郎,唐橋一浩,浜口智志, 応用物理学会秋季学術講演会講演予稿集(CD-ROM), Vol. 80th, 2019
  • F<sup>+</sup>イオン照射によるY<sub>2</sub>O<sub>3</sub>表面層の変化, KANG Hojun,伊藤智子,UM Junghwan,KOKURA Hikaru,KANG Taekyun,CHO Sungil,PARK Hyunjung,磯部倫郎,唐橋一浩,浜口智志, 応用物理学会秋季学術講演会講演予稿集(CD-ROM), Vol. 80th, 2019
  • プラズマ技術を用いた骨分化促進能を有する人工骨の開発, 小玉城,杉本敏司,伊藤智子,ANJAR Anggraini Harumningtyas,吉川秀樹,浜口智志,海渡貴司, 日本整形外科学会雑誌, (公社)日本整形外科学会, Vol. 93, No. 8, p. S1858-S1858, 2019
  • Molybdenum capping layer effect on electromigration failure of plasma etched copper lines, Jia Quan Su,Mingqian Li,Yue Kuo,Satoshi Hamaguchi, ECS Transactions, Vol. 92, No. 5, p. 39-46, 2019
  • The future for plasma science and technology, Klaus-Dieter Weltmann,Juergen F. Kolb,Marcin Holub,Dirk Uhrlandt,Milan Simek,Kostya (Ken) Ostrikov,Satoshi Hamaguchi,Uros Cvelbar,Mirko Cernak,Bruce Locke,Alexander Fridman,Pietro Favia,Kurt Becker, PLASMA PROCESSES AND POLYMERS, WILEY-V C H VERLAG GMBH, Vol. 16, No. 1, 2019/01
  • Etching reactions by polyatomic molecular ions containing fluorine atoms, Tomoko Ito,Kazuhiro Karahashi,Takuya Hirohashi,Junichi Hashimoto,Mitsuhiro Omura,Hisataka Hayashi,Satoshi Hamaguchi, 2018/11
  • Ion energy and angular distributions in low-pressure capacitive oxygen RF discharges driven by tailored voltage waveforms, Zoltan Donko,Aranka Derzsi,Mate Vass,Julian Schulze,Edmund Schuengel,Satoshi Hamaguchi, Plasma Sources Science and Technology, IOP PUBLISHING LTD, Vol. 27, No. 10, 2018/09/18
  • Enhanced etching of tin-doped indium oxide due to surface modification by hydrogen ion injection, Hu Li,Kazuhiro Karahashi,Pascal Friederich,Karin Fink,Masanaga Fukasawa,Akiko Hirata,Kazunori Nagahata,Tetsuya Tatsumi,Wolfgang Wenzel,Satoshi Hamaguchi, Japanese Journal of Applied Physics, IOP PUBLISHING LTD, Vol. 57, No. 6, 2018/06
  • Cyclic etching of tin-doped indium oxide using hydrogen-induced modified layer, Akiko Hirata,Masanaga Fukasawa,Kazunori Nagahata,Hu Li,Kazuhiro Karahashi,Satoshi Hamaguchi,Tetsuya Tatsumi, Japanese Journal of Applied Physics, IOP PUBLISHING LTD, Vol. 57, No. 6, p. 1832-1832, 2018/06
  • The effect of photoemission on nanosecond helium microdischarges at atmospheric pressure, Zoltan Donko,Satoshi Hamaguchi,Timo Gans, Plasma Sources Science and Technology, IOP PUBLISHING LTD, Vol. 27, No. 5, 2018/05
  • SiO<sub>2</sub> and Si etching reactions by CxFy<sup> +</sup> ion bombardment, Karahashi Kazuhiro,Li Hu,Ito Tomoko,Hamaguchi Satoshi, JSAP Annual Meetings Extended Abstracts, The Japan Society of Applied Physics, Vol. 2018.1, p. 1853-1853, 2018/03
  • Effects of Low Energy Ar<sup>+</sup> Ion Irradiation on Hexafluoroacetylacetone (hfac) Adsorbed Ni and Cu Surfaces, Ito Tomoko,Karahashi Kazuhiro,Hamaguchi Satoshi, JSAP Annual Meetings Extended Abstracts, The Japan Society of Applied Physics, Vol. 2018.1, p. 1849-1849, 2018/03
  • Plasma Surface Functionalization of Biocompatible Materials, Tomoko Ito,Anjar Anggraini Harumningtyas,Satoshi Sugimoto,Satoshi Hamaguchi, 2018/03
  • Foundations of low-temperature plasma enhanced materials synthesis and etching, Gottlieb S. Oehrlein,Satoshi Hamaguchi, Plasma Sources Science and Technology, IOP PUBLISHING LTD, Vol. 27, No. 2, 2018/02
  • 低エネルギーイオンによるフッ化物層のエッチング反応, 唐橋一浩,伊藤智子,浜口智志, プラズマ・核融合学会年会(Web), Vol. 35th, 2018
  • 遷移金属に対するβ-ジケトンによる吸着表面反応の解明, 伊藤智子,唐橋一浩,浜口智志, プラズマ・核融合学会年会(Web), Vol. 35th, 2018
  • 金属原子層エッチングプロセスにおける錯体形成表面反応解析, 伊藤智子,唐橋一浩,浜口智志, 応用物理学会秋季学術講演会講演予稿集(CD-ROM), Vol. 79th, 2018
  • Preface: plasma sources for biological and biomaterial applications, Farzaneh Arefi-Khonsari,Satoshi Hamaguchi,Eric Robert, Plasma Medicine, Vol. 8, No. 1, 2018
  • Impact of non-thermal plasma surface modification on porous calcium hydroxyapatite ceramics for bone regeneration., Yu Moriguchi,Dae-Sung Lee,Ryota Chijimatsu,Khair Thamina,Kazuto Masuda,Dai Itsuki,Hideki Yoshikawa,Satoshi Hamaguchi,Akira Myoui, PloS one, PUBLIC LIBRARY SCIENCE, Vol. 13, No. 3, 2018
  • XPS Analysis of Adsorbed Organic Compounds on Magnetic Materials Surfaces, Tomoko Ito,Kazuhiro Karahashi,Satoshi Hamaguchi, 2017/12
  • Amino Group Surface Modification of Cell Culture Polystyrene Dishes by an Inverter Plasma Process, Satoshi Sugimoto,Tomoko Ito,Kai Kubota,Kazuma Nishiyama,Satoshi Hamaguchi, 2017/12
  • Editorial for achieving atomistic control in plasma–material interactions, Gottlieb S. Oehrlein,Satoshi Hamaguchi,Achim Von Keudell, Journal of Physics D: Applied Physics, IOP PUBLISHING LTD, Vol. 50, No. 49, 2017/12
  • Molecular dynamics simulations of atomic-layer etching (ALE) of SiO2, Yuki Okada,Michiro Isobe,Tomoko Ito,Kazuhiro Karahashi,Satoshi Hamaguchi, 2017/11
  • Surface reactions of metal surfaces with adsorbed organic compounds by Ar+ ion irradiation, Tomoko Ito,Kazuhiro Karahashi,Satoshi Hamaguchi, 2017/11
  • Etching reactions of fluorinated layers on metal surfaces exposed to XeF<sub>2</sub>, Karahashi Kazuhiro,Ito Tomoko,Hamaguchi Satoshi, JSAP Annual Meetings Extended Abstracts, The Japan Society of Applied Physics, Vol. 2017.2, p. 1752-1752, 2017/09
  • XPS Analyses for Adsorption Reactions of Hexafluoroacetylacetone (hfac) with Ni Surfaces, Ito Tomoko,Kazuhiro Karahashi,Satoshi Hamaguchi, JSAP Annual Meetings Extended Abstracts, The Japan Society of Applied Physics, Vol. 2017.2, p. 1750-1750, 2017/09
  • Effects of hydrogen-damaged layer on tin-doped indium oxide etching by H<inf>2</inf>/Ar plasma, Akiko Hirata,Masanaga Fukasawa,Takushi Shigetoshi,Masaki Okamoto,Kazunori Nagahata,Hu Li,Kazuhiro Karahashi,Satoshi Hamaguchi,Tetsuya Tatsumi, Japanese Journal of Applied Physics, IOP PUBLISHING LTD, Vol. 56, No. 6, 2017/06
  • Etching yields and surface reactions of amorphous carbon by fluorocarbon ion irradiation, Kazuhiro Karahashi,Hu Li,Kentaro Yamada,Tomoko Ito,Satoshi Numazawa,Ken Machida,Kiyoshi Ishikawa,Satoshi Hamaguchi, Japanese Journal of Applied Physics, IOP PUBLISHING LTD, Vol. 56, No. 6, 2017/05
  • Effects of Hydrogen Ion Irradiation on Zinc Oxide Etch, Hu Li,Kazuhiro Karahashi,Pascal Friederich,Karin Fink,Masanaga Fukasawa,Akiko Hirata,Kazunori Nagahata,Tetsuya Tatsumi,Wolfgang Wenzel,Satoshi Hamaguchi, J. Vac. Sci. Tech. A, A V S AMER INST PHYSICS, Vol. 35, No. 5, 2017/05
  • Formation of amino groups on polystyrene cell culture dish surfaces by plasma irradiation, Ito Tomoko,Kazuma Nishiyama,Satoshi Sugimoto,Satoshi Hamaguchi, JSAP Annual Meetings Extended Abstracts, The Japan Society of Applied Physics, Vol. 2017.1, p. 1795-1795, 2017/03
  • 電解水による室内臭低減に関する研究, 村上栄造,伊藤智子,浜口智志,須山喜美, 空気清浄とコンタミネーションコントロール研究大会予稿集, Vol. 34th, 2017
  • 電解水の消臭効果に関する研究, 村上栄造,伊藤智子,浜口智志,須山喜美, におい・かおり環境学会講演要旨集, (公社)におい・かおり環境協会, Vol. 30th, p. 66-69, 2017
  • Preface: Sixth International Conference on Plasma Medicine (ICPM-6), Zdenko Machala,Satoshi Hamaguchi,Gregory Fridman, Plasma Medicine, Vol. 7, No. 2, p. v-vi, 2017
  • Atmospheric-pressure plasma-irradiation inhibits mouse embryonic stem cell differentiation to mesoderm and endoderm but promotes ectoderm differentiation, Taichi Miura,Satoshi Hamaguchi,Shoko Nishihara, J. Phys. D: Appl. Phys. 49 (2016) 165401 (12pp)., IOP PUBLISHING LTD, Vol. 49, No. 16, 2016/12
  • Surface reactions of amorphous carbon layers by argon and fluorocarbon ion beams, Kazuhiro Karahashi,Hu Li,Tomoko Ito,Satoshi Hamaguchi, 2016/11
  • Molecular dynamics study on fluorine radical multilayer adsorption mechanism during Si, SiO2, and Si3N4 etching processes, Satoshi Numazawa,Ken Machida,Michiro Isobe,Satoshi Hamaguchi, Jpn. J. Appl. Phys. 55 (2016) 116204 (pp6)., IOP PUBLISHING LTD, Vol. 55, No. 11, 2016/11
  • GENERATION AND TRANSPORT OF LIQUID-PHASE REACTIVE SPECIES DUE TO PLASMA-LIQUID INTERACTION, Kazumasa Ikuse,Tomoko Ito,Satoshi Hamaguchi, 2016 43RD IEEE INTERNATIONAL CONFERENCE ON PLASMA SCIENCE (ICOPS), IEEE, 2016/04
  • Mass-selected ion beam study on etching characteristics of ZnO by methane-based plasma, Hu Li,Kazuhiro Karahashi,Masanaga Fukasawa,Kazunori Nagahata,Tetsuya Tatsumi,Satoshi Hamaguchi, Japanese Journal of Applied Physics, IOP PUBLISHING LTD, Vol. 55, No. 2, 2016/02
  • 多能性幹細胞から分化誘導した骨芽細胞系細胞の特性, 宮本諭,濱本秀一,吉田清志,岡本美奈,奥崎大介,後藤直久,浜口智志,吉川秀樹,名井陽, 再生医療, Vol. 15, 2016
  • Mass spectrometry analyses of ions generated by atmospheric-pressure plasma jets in ambient air, Tomoko Ito,Kensaku Gotou,Kanako Sekimoto,Satoshi Hamaguchi, Plasma Medicine, Vol. 5, No. 2-4, p. 283-298, 2015/12
  • Sputtering yields and surface chemical modification of tin-doped indium oxide in hydrocarbon-based plasma etching, Hu Li,Kazuhiro Karahashi,Masanaga Fukasawa,Kazunori Nagahata,Tetsuya Tatsumi,Satoshi Hamaguchi, Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, A V S AMER INST PHYSICS, Vol. 33, No. 6, 2015/11
  • Correlation between dry etching resistance of Ta masks and the oxidation states of the surface oxide layers, Makoto Satake,Masaki Yamada,Hu Li,Kazuhiro Karahashi,Satoshi Hamaguchi, JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, A V S AMER INST PHYSICS, Vol. 33, No. 5, 2015/09
  • Numerical Simulation of Atomic Layer Oxidation of Silicon by Oxygen Gas Cluster Beams, MIZOTANI Kohei,ISOBE Michiro,KARAHASHI Kazuhiro,HAMAGUCHI Satoshi, Plasma and Fusion Research, The Japan Society of Plasma Science and Nuclear Fusion Research, Vol. 10, p. 1406079-1406079, 2015/09
  • Correlation between dry etching resistance of Ta masks and the oxidation states of the surface oxide layers, Makoto Satake,Masaki Yamada,Hu Li,Kazuhiro Karahashi,Satoshi Hamaguchi, Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics, A V S AMER INST PHYSICS, Vol. 33, No. 5, 2015/09/01
  • In Focus: Plasma Medicine., David Graves,Satoshi Hamaguchi,Deborah O'Connell, Biointerphases, AMER INST PHYSICS, Vol. 10, No. 2, p. 029301-029301, 2015/06/25
  • Suboxide/subnitride formation on Ta masks during magnetic material etching by reactive plasmas, Hu Li,Yu Muraki,Kazuhiro Karahashi,Satoshi Hamaguchi, Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, A V S AMER INST PHYSICS, Vol. 33, No. 4, 2015/04
  • Molecular dynamics simulation of silicon oxidation enhanced by energetic hydrogen ion irradiation, Kohei Mizotani,Michiro Isobe,Masanaga Fukasawa,Kazunori Nagahata,Tetsuya Tatsumi,Satoshi Hamaguchi, Journal of Physics D: Applied Physics, IOP PUBLISHING LTD, Vol. 48, No. 15, 2015/04
  • Molecular dynamic simulation of damage formation at Si vertical walls by grazing incidence of energetic ions in gate etching processes, Kohei Mizotani,Michiro Isobe,Satoshi Hamaguchi, Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, A V S AMER INST PHYSICS, Vol. 33, No. 2, 2015/03
  • 大気圧プラズマジェットの質の可視化とCVDへの応用, 木内正人,木内正人,本城国明,伊藤智子,浜口智志, 表面技術協会講演大会講演要旨集, Vol. 131st, 2015
  • iPS細胞等の安定供給と臨床利用のための基盤整備に関する研究 iPS細胞からの骨・軟骨系細胞への培養技術を最適化するための基盤整備, 吉川秀樹,名井陽,宮本諭,浜口智志, 「iPS細胞等の安定供給と臨床利用のための基盤整備」に関する研究 平成26年度 総括・分担研究報告書, 2015
  • 計算と実験の融合によるプラズマ表面反応解析, 浜口智志,寒川誠二,唐橋一浩,溝谷浩平,久保田智広, 東北大学流体科学研究所共同利用・共同研究拠点流体科学研究拠点活動報告書, Vol. 2014, 2015
  • Turnover of sex chromosomes in Celebensis Group medaka fishes, Taijun Myosho,Yusuke Takehana,Satoshi Hamaguchi,Mitsuru Sakaizumi, G3: Genes, Genomes, Genetics, Genetics Society of America, Vol. 5, No. 12, p. 2685-2691, 2015
  • Ion beam experiments for the study of plasma-surface interactions, Kazuhiro Karahashi,Satoshi Hamaguchi, Journal of Physics D: Applied Physics, IOP PUBLISHING LTD, Vol. 47, No. 22, 2014/06
  • Special issue: 5th international conference on plasma medicine (ICPM5), Nara, Japan, 18-23 May 2014, Satoshi Hamaguchi, Plasma Medicine, Vol. 4, No. 1-4, 2014/04
  • Low energy indium or gallium ion implantations to SiO2 thin films for development of novel catalysts, S. Yoshimura,M. Kiuchi,Y. Nishimoto,M. Yasuda,A. Baba,S. Hamaguchi, e-Journal of Surface Science and Nanotechnology, 日本表面科学会, Vol. 12, p. 197-202, 2014/04
  • Proliferation assay of mouse embryonic stem (ES) cells exposed to atmospheric-pressure plasmas at room temperature, Taichi Miura,Ayumi Ando,Kazumi Hirano,Chika Ogura,Tatsuya Kanazawa,Masamichi Ikeguchi,Atsushi Seki,Shoko Nishihara,Satoshi Hamaguchi, Journal of Physics D: Applied Physics, IOP PUBLISHING LTD, Vol. 47, No. 44, 2014/04
  • Characterization of polymer layer formation during SiO<inf>2</inf>/SiN etching by fluoro/hydrofluorocarbon plasmas, Keita Miyake,Tomoko Ito,Michiro Isobe,Kazuhiro Karahashi,Masanaga Fukasawa,Kazunori Nagahata,Tetsuya Tatsumi,Satoshi Hamaguchi, Japanese Journal of Applied Physics, IOP PUBLISHING LTD, Vol. 53, No. 3, 2014/03
  • Low energy gallium ion injections to silicon dioxide thin films for development of novel catalysts, S. Yoshimura,M. Kiuchi,Y. Nishimoto,M. Yasuda,A. Baba,S. Hamaguchi, International Symposium on Non-equilibrium Plasma and Complex-System Sciences (IS-NPCS), 26-28 February, 2014, Icho Kaikan, Osaka University, Osaka, Japan (P-04)., 2014/02
  • 大気圧プラズマジェット照射による真鍮表面における硝酸化合物および亜硝酸化合物の生成, 伊藤智子,関本奏子,浜口智志, 質量分析総合討論会講演要旨集, Vol. 62nd, 2014
  • プラズマエッチングプロセスにおけるナノスケール表面ダメージ解析, 浜口智志,寒川誠二,唐橋一浩,溝谷浩平,久保田智広, 東北大学流体科学研究所共同利用・共同研究拠点流体科学研究拠点活動報告書, Vol. 2013, 2014
  • iPS細胞等の安定供給と臨床利用のための基盤整備 iPS細胞からの骨・軟骨系細胞への培養技術を最適化するための基盤整備, 吉川秀樹,名井陽,宮本諭,浜口智志, 「iPS細胞等の安定供給と臨床利用のための基盤整備」に関する研究 平成25年度 総括・分担研究報告書, 2014
  • ゼオライトへの低エネルギーインジウムイオン照射と触媒効果, 吉村智,木内正人,木内正人,西本能弘,安田誠,馬場章夫,浜口智志, 真空に関する連合講演会講演予稿集, Vol. 55th, 2014
  • Low energy indium or gallium iom beam injection to SiO2 thin films for development of novel catalysts, S. Yoshimura,M. Kiuchi,Y. Nishimoto,M. Yasuda,A. Baba,S. Hamaguchi, 12th International Conference on Atomically Controlled Surfaces, Interfaces and Nanostructures (ACSIN-12) & 21st International Colloquium on Scanning Probe Microscopy (ICSPM21), 2013/11
  • Dependence of catalytic properties of indium implanted SiO2 thin films on the film-substrate temperature during indium ion implantation, S. Yoshimura,K. Ikuse,M. Kiuchi,Y. Nishimoto,M. Yasuda,A. Baba,S. Hamaguchi, Nuclear Instruments and Methods in Physics Research B, Vol. 315, p. 222-226, 2013/11
  • Surface Modification of Poly(methyl methacrylate) by Hydrogen-Plasma Exposure and Its Sputtering Characteristics by Ultraviolet Light Irradiation, Satoru Yoshimura,Kazumasa Ikuse,Satoshi Sugimoto,Kensuke Murai,Kuniaki Honjo,Masato Kiuchi,Satoshi Hamaguchi, JAPANESE JOURNAL OF APPLIED PHYSICS, IOP PUBLISHING LTD, Vol. 52, No. 9, p. 090201-1--4, 2013/09
  • Grid-pattern formation of extracellular matrix on silicon by low-temperature atmospheric-pressure plasma jets for neural network biochip fabrication, Ayumi Ando,Hidetaka Uno,Tsuneo Urisu,Satoshi Hamaguchi, Applied Surface Science, ELSEVIER SCIENCE BV, Vol. 276, p. 1-6, 2013/07
  • Quantum cascade laser absorption spectroscopy with the amplitude-to-time conversion technique for atmospheric-pressure plasmas, Takayoshi Yumi,Noriaki Kimura,Satoshi Hamaguchi, JOURNAL OF APPLIED PHYSICS, AMER INST PHYSICS, Vol. 113, No. 21, 2013/06
  • Characteristics of silicon etching by silicon chloride ions, Tomoko Ito,Kazuhiro Karahashi,Song Yun Kang,Satoshi Hamaguchi, Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, A V S AMER INST PHYSICS, Vol. 31, No. 3, 2013/05
  • Oxidation of nitric oxide by atmospheric pressure plasma in a resonant plasma reactor, Takayoshi Yumii,Takashi Yoshida,Kyoji Doi,Noriaki Kimura,Satoshi Hamaguchi, JOURNAL OF PHYSICS D-APPLIED PHYSICS, IOP PUBLISHING LTD, Vol. 46, No. 13, 2013/04
  • プラズマ・ラジカルの物理とその医療応用, 浜口智志, 日本物理学会講演概要集, Vol. 68, No. 1, 2013
  • プラズマエッチングプロセスにおけるナノスケール表面ダメージ解析, 浜口智志,寒川誠二, 東北大学流体科学研究所共同利用・共同研究拠点流体科学研究拠点活動報告書, Vol. 2012, 2013
  • 低エネルギーインジウム照射SiO<sub>2</sub>の触媒効果の基板温度依存性, 吉村智,幾世和将,木内正人,木内正人,西本能弘,安田誠,馬場章夫,浜口智志, 応用物理学会春季学術講演会講演予稿集(CD-ROM), Vol. 60th, 2013
  • Taマスクの形状制御のための斜め入射イオンによるスパッタリング解析, LI Hu,唐橋一浩,浜口智志, 応用物理学会春季学術講演会講演予稿集(CD-ROM), Vol. 60th, 2013
  • 磁性体エッチングプロセスにおけるN<sup>+</sup>イオン照射効果, 村木裕,LI Hu,唐橋一浩,浜口智志, 応用物理学会春季学術講演会講演予稿集(CD-ROM), Vol. 60th, 2013
  • ハイドロフルオロカーボン(HFC)プラズマによるSiNエッチングにおける表面ポリマー形成過程の解析, 三宅啓太,礒部倫郎,深沢正永,辰巳哲也,浜口智志, 応用物理学会春季学術講演会講演予稿集(CD-ROM), Vol. 60th, 2013
  • 酸素ガスクラスタービーム照射によるシリコン表面酸化プロセスの分子動力学シミュレーション, 溝谷浩平,礒部倫郎,浜口智志, 応用物理学会春季学術講演会講演予稿集(CD-ROM), Vol. 60th, 2013
  • 高エネルギー水素イオン入射によるSi表面の増殖酸化, 伊藤智子,溝谷浩平,礒部倫郎,唐橋一浩,深沢正永,長畑和典,辰巳哲也,浜口智志, 応用物理学会秋季学術講演会講演予稿集(CD-ROM), Vol. 74th, 2013
  • HBrプラズマにおける斜め入射イオンおよび反応生成物(SiBr<sub>x</sub>)イオンによる反応, 村木裕,LI Hu,伊藤智子,唐橋一浩,松隈正明,浜口智志, 応用物理学会秋季学術講演会講演予稿集(CD-ROM), Vol. 74th, 2013
  • 酸素ガスクラスタービーム照射によるシリコン表面酸化プロセスの分子動力学シミュレーション II, 溝谷浩平,礒部倫郎,浜口智志, 応用物理学会秋季学術講演会講演予稿集(CD-ROM), Vol. 74th, 2013
  • Taマスクの形状制御の観点から見たTaNおよびTaO<sub>x</sub>に対するエッチング反応解析, LI Hu,村木裕,唐橋一浩,浜口智志, 応用物理学会秋季学術講演会講演予稿集(CD-ROM), Vol. 74th, 2013
  • フルオロカーボン(FC)・ハイドロフルオロカーボン(HFC)プラズマエッチングにおけるSiN/SiO<sub>2</sub>選択性の解析, 三宅啓太,礒部倫郎,深沢正永,長畑和典,辰巳哲也,浜口智志, 応用物理学会秋季学術講演会講演予稿集(CD-ROM), Vol. 74th, 2013
  • プラズマの医療応用, 浜口智志, パリティ, Vol. 1月号, No. 1, p. 16-17, 2013/01
  • Chemically reactive species in liquids generated by atmospheric-pressure plasmas and their roles in plasma medicine, Satoshi Hamaguchi, AIP Conference Proceedings, AMER INST PHYSICS, Vol. 1545, p. 214-222, 2013
  • Sputtering yields and surface modification of poly(methyl methacrylate) (PMMA) by low-energy Ar+/CF3+ ion bombardment with vacuum ultraviolet (VUV) photon irradiation, Satoru Yoshimura,Yasuhiro Tsukazaki,Masato Kiuchi,Satoshi Sugimoto,Satoshi Hamaguchi, JOURNAL OF PHYSICS D-APPLIED PHYSICS, IOP PUBLISHING LTD, Vol. 45, No. 50, p. 505201-1--10, 2012/12
  • Sputtering yields of magnesium hydroxide [Mg(OH)2] by noble-gas ion bombardment, K. Ikuse,S. Yoshimura,M. Kiuchi,M. Terauchi,M. Mishitani,S. Hamaguchi, Journal of Physics D: Applied Physics, Institute of Physics, Vol. 45, No. 43, p. 432001-1--5, 2012/10
  • Efficient modification of the surface properties of interconnected porous hydroxyapatite by low-pressure low-frequency plasma treatment to promote its biological performance, Dae Sung Lee,Yu Moriguchi,Akira Myoui,Hideki Yoshikawa,Satoshi Hamaguchi, Journal of Physics D: Applied Physics, IOP PUBLISHING LTD, Vol. 45, No. 37, 2012/09
  • Si damage due to oblique-angle ion impact relevant for vertical gate etching processes, Tomoko Ito,Kazuhiro Karahashi,Kohei Mizotani,Michiro Isobe,Song Yun Kang,Masanobu Honda,Satoshi Hamaguchi, Japanese Journal of Applied Physics, JAPAN SOC APPLIED PHYSICS, Vol. 51, No. 8, 2012/08
  • Sputtering Yields of CaO, SrO, and BaO by Monochromatic Noble Gas Ion Bombardment, Satoru Yoshimura,Kiyohiro Hine,Masato Kiuchi,Jun Hashimoto,Masaharu Terauchi,Yosuke Honda,Mikihiko Nishitani,Satoshi Hamaguchi, JAPANESE JOURNAL OF APPLIED PHYSICS, JAPAN SOC APPLIED PHYSICS, Vol. 51, No. 8, p. 08HB02-1--4, 2012/08
  • Microcavity array plasma system for remote chemical processing at atmospheric pressure, Dae Sung Lee,Satoshi Hamaguchi,Osamu Sakai,Sung Jin Park,J. Gary Eden, Journal of Physics D: Applied Physics, IOP PUBLISHING LTD, Vol. 45, No. 22, 2012/06
  • Low energy metal ion beam production with a modified Freeman-type ion source for development of novel catalysts, S. Yoshimura,M. Kiuchi,Y. Nishimoto,M. Yasuda,A. Baba,S. Hamaguchi, e-Journal of Surface Science and Nanotechnology, Vol. 10, p. 139-144, 2012/04
  • Dependence of catalytic properties of Indium-implanted SiO2 thin films on the energy and dose of incident Indium ions, S. Yoshimura,M. Kiuchi,Y. Nishimoto,M. Yasuda,A. Baba,S. Hamaguchi, Thin Solid Films, Vol. 520, No. 15, p. 4894-4897, 2012/04
  • Extracellular matrix patterning for cell alignment by atmospheric pressure plasma jets, Ayumi Ando,Toshifumi Asano,Md Abu Sayed,Ryugo Tero,Katsuhisa Kitano,Tsuneo Urisu,Satoshi Hamaguchi, Japanese Journal of Applied Physics, IOP PUBLISHING LTD, Vol. 51, No. 3 PART 1, 2012/03
  • ヘテロエピタキシャルダイヤモンド成長のためのIr(100)/MgOへの低エネルギー炭素イオン照射, 井谷司,井谷司,山崎一寿,伊藤智子,唐橋一浩,浜口智志, 応用物理学関係連合講演会講演予稿集(CD-ROM), Vol. 59th, 2012
  • フロロカーボンイオン照射におけるSiN<sub>x</sub>:H膜中の水素の含有率の違いによるエッチング反応への影響, 伊藤智子,唐橋一浩,深沢正永,辰巳哲也,浜口智志, 応用物理学関係連合講演会講演予稿集(CD-ROM), Vol. 59th, 2012
  • 水素イオン入射によるシリコン中の増速酸化プロセスの入射エネルギー依存性, 溝谷浩平,礒部倫郎,深沢正永,辰巳哲也,浜口智志, 応用物理学関係連合講演会講演予稿集(CD-ROM), Vol. 59th, 2012
  • メタノールプラズマ中のイオン照射によるFeCoBエッチング反応, 唐橋一浩,伊藤智子,浜口智志, 応用物理学関係連合講演会講演予稿集(CD-ROM), Vol. 59th, 2012
  • 大気圧放電に接した水中における活性酸素・活性窒素種の化学反応シミュレーション, 金澤龍也,浜口智志, 応用物理学関係連合講演会講演予稿集(CD-ROM), Vol. 59th, 2012
  • 大気圧プラズマにより水中に誘起される化学種の反応シミュレーション, 金澤龍也,浜口智志, 応用物理学会学術講演会講演予稿集(CD-ROM), Vol. 73rd, 2012
  • プラズマエッチングプロセスにおけるナノスケール表面ダメージ解析, 浜口智志,寒川誠二, 東北大学流体科学研究所共同利用・共同研究拠点流体科学研究拠点活動報告書, Vol. 2011, 2012
  • ビーム表面相互作用分子動力学(MD)シミュレーションにおける基板熱緩和過程の解析, 三宅啓太,溝谷浩平,礒部倫郎,浜口智志, 応用物理学会学術講演会講演予稿集(CD-ROM), Vol. 73rd, 2012
  • プラズマエッチングにおけるゲートダメージ層形成機構の数値解析, 溝谷浩平,礒部倫郎,浜口智志, 応用物理学会学術講演会講演予稿集(CD-ROM), Vol. 73rd, 2012
  • メタノールプラズマ中のイオン照射によるCoFeBエッチング反応(2), 唐橋一浩,伊藤智子,浜口智志, 応用物理学会学術講演会講演予稿集(CD-ROM), Vol. 73rd, 2012
  • SiF<sub>x</sub><sup>+</sup>イオン照射によるSi,Si<sub>3</sub>N<sub>4</sub>およびSiO<sub>2</sub>エッチング反応解析, 伊藤智子,唐橋一浩,浜口智志, 応用物理学会学術講演会講演予稿集(CD-ROM), Vol. 73rd, 2012
  • 低エネルギーイオンビーム照射によるPMMAエッチングイールドへの紫外線照射および水素プラズマ暴露の影響, 幾世和将,吉村智,杉本敏司,木内正人,木内正人,浜口智志, 真空に関する連合講演会講演予稿集, Vol. 53rd, 2012
  • 低エネルギーイオンビーム照射によるPMMAエッチングイールドの測定と水素プラズマ暴露のエッチングイールドへの影響, 吉村智,塚崎泰裕,杉本敏司,木内正人,木内正人,浜口智志, 応用物理学関係連合講演会講演予稿集(CD-ROM), Vol. 59th, 2012
  • 量子カスケードレーザーを用いた大気圧RFプラズマリアクター内の赤外吸収分光計測, 弓井孝佳,弓井孝佳,木村憲明,木村憲明,浜口智志, プラズマ・核融合学会年会(Web), Vol. 29th, 2012
  • Low energy mass-selected metal ion beam production with a modified Freeman-type ion source, S. Yoshimura,M. Kiuchi,S. Hamaguchi, The 8th EU-Japan Joint Symposium on Plasma Processing (JSPP2012), 16-18 January, 2012, Todaiji Culture Center, Nara, Japan, P-21, 2012/01
  • Micro-pattern formation of extracellular matrix (ECM) layers by atmospheric-pressure plasmas and cell culture on the patterned ECMs, Ayumi Ando,Toshifumi Asano,Tsuneo Urisu,Satoshi Hamaguchi, Journal of Physics D: Applied Physics, IOP PUBLISHING LTD, Vol. 44, No. 48, 2011/12
  • Measurement of MgO, CaO, SrO, and BaO sputtering yields by noble gas ions for plasma display panel cells, S. Yoshimura,K. Hine,M. Kiuchi,J. Hashimoto,M. Terauchi,Y. Honda,M. Nishitani,S. Hamaguchi, Proceedings of International Symposium on Dry Process, 2011/11
  • Plasma microchannel and jet enhanced by an array of ellipsoidal microcavities, D. S. Lee,O. Sakai,S. J. Park,J. G. Eden,S. Hamaguchi, IEEE Transactions on Plasma Science, Vol. 39, No. 11, p. 2690-2691, 2011/11
  • Improvement of hydrophilicity of interconnected porous hydroxyapatite by dielectric barrier discharge plasma treatment, Dae Sung Lee,Yu Moriguchi,Kiyoshi Okada,Akira Myoui,Hideki Yoshikawa,Satoshi Hamaguchi, IEEE Transactions on Plasma Science, IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC, Vol. 39, No. 11, p. 2166-2167, 2011/11
  • Dynamics of near-atmospheric-pressure hydrogen plasmas driven by pulsed high voltages, Chieh Wen Lo,Satoshi Hamaguchi, IEEE Transactions on Plasma Science, IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC, Vol. 39, No. 11, p. 2100-2101, 2011/11
  • ハイドロキシアパタイト人工骨に対する低温プラズマ処理, 名井 陽,森口 悠,李 大成,増田 一仁,浜口 智志,吉川 秀樹, 人工臓器, (一社)日本人工臓器学会, Vol. 40, No. 2, p. S140-S140, 2011/10
  • Electron density measurement of inductively coupled plasmas by terahertz time-domain spectroscopy (THz-TDS), Ayumi Ando,Tomoko Kurose,Vivien Reymond,Katsuhisa Kitano,Hideaki Kitahara,Keisuke Takano,Masahiko Tani,Masanori Hangyo,Satoshi Hamaguchi, Journal of Applied Physics, AMER INST PHYSICS, Vol. 110, No. 7, 2011/10/01
  • Hydrogen effects in hydrofluorocarbon plasma etching of silicon nitride: Beam study with CF<sup>+</sup>, CF<inf>2</inf><sup>+</sup>, CHF<inf>2</inf><sup>+</sup>, and CH<inf>2</inf>F<sup>+</sup> ions, Tomoko Ito,Kazuhiro Karahashi,Masanaga Fukasawa,Tetsuya Tatsumi,Satoshi Hamaguchi, Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, A V S AMER INST PHYSICS, Vol. 29, No. 5, 2011/09
  • Numerical analyses of hydrogen plasma generation by nanosecond pulsed high voltages at near-atmospheric pressure, Chieh Wen Lo,Satoshi Hamaguchi, Journal of Physics D: Applied Physics, IOP PUBLISHING LTD, Vol. 44, No. 37, 2011/09
  • Rapid breakdown mechanisms of open air nanosecond dielectric barrier discharges., Tsuyohito Ito,Tatsuya Kanazawa,Satoshi Hamaguchi, Physical review letters, AMER PHYSICAL SOC, Vol. 107, No. 6, p. 065002-065002, 2011/08/05
  • Si recess of polycrystalline silicon gate etching: Damage enhanced by ion assisted oxygen diffusion, Tomoko Ito,Kazuhiro Karahashi,Masanaga Fukasawa,Tetsuya Tatsumi,Satoshi Hamaguchi, Japanese Journal of Applied Physics, JAPAN SOC APPLIED PHYSICS, Vol. 50, No. 8, 2011/08
  • Experimental evaluation of CaO, SrO and BaO sputtering yields by Ne+ or Xe+ ions, Satoru Yoshimura,Kiyohiro Hine,Masato Kiuchi,Jun Hashimoto,Masaharu Terauchi,Yosuke Honda,Mikihiko Nishitani,Satoshi Hamaguchi, JOURNAL OF PHYSICS D-APPLIED PHYSICS, IOP PUBLISHING LTD, Vol. 44, No. 25, 2011/06
  • 国際宇宙ステーションにおける微粒子プラズマ実験の次期計画, 林康明,佐藤徳芳,高橋和生,東辻浩夫,渡辺征夫,石原修,三重野哲,上村鉄雄,飯塚哲,浜口智志,足立聡,高柳昌弘, 宇宙利用シンポジウム, Vol. 27th, 2011
  • 大気圧プラズマ照射による細胞増殖促進プロセス, 増田一仁,森口悠,岡田潔,名井陽,吉川秀樹,浜口智志, 応用物理学関係連合講演会講演予稿集(CD-ROM), Vol. 58th, 2011
  • 分子動力学法を用いたシリコン窒化膜のエッチングシミュレーション, 重川遼太,礒部倫郎,浜口智志, 応用物理学関係連合講演会講演予稿集(CD-ROM), Vol. 58th, 2011
  • CO<sup>+</sup>イオンによるCo,NiおよびTaエッチング反応, 唐橋一浩,伊藤智子,浜口智志, 応用物理学関係連合講演会講演予稿集(CD-ROM), Vol. 58th, 2011
  • 水素希釈炭化水素プラズマによるDLC薄膜堆積プロセスの分子動力学シミュレーション解析, 村上泰夫,浜口智志, 応用物理学関係連合講演会講演予稿集(CD-ROM), Vol. 58th, 2011
  • 創傷治癒に対する低温プラズマの効果, 金子恵子,森口悠,椚座康夫,浜口智志,吉川秀樹,冨田哲也,冨田哲也, 日本抗加齢医学会総会プログラム・抄録集, (一社)日本抗加齢医学会, Vol. 11th, p. 279-279, 2011
  • インジウム照射SiO<sub>2</sub>基板の触媒効果の入射エネルギー依存性, 吉村智,木内正人,木内正人,西本能弘,安田誠,馬場章夫,浜口智志, 応用物理学会学術講演会講演予稿集(CD-ROM), Vol. 72nd, 2011
  • 大気開放誘電体バリア放電中での電界測定, 伊藤剛仁,金澤龍也,浜口智志, 応用物理学会学術講演会講演予稿集(CD-ROM), Vol. 72nd, 2011
  • 大気圧プラズマによる培養液中の長寿命ラジカル生成と細胞増殖効果, 増田一仁,森口悠,岡田潔,名井陽,吉川秀樹,浜口智志, 応用物理学会学術講演会講演予稿集(CD-ROM), Vol. 72nd, 2011
  • メタノールプラズマエッチングプロセス中のイオン照射によるNi薄膜酸化過程の解析, 唐橋一浩,伊藤智子,浜口智志, 応用物理学会学術講演会講演予稿集(CD-ROM), Vol. 72nd, 2011
  • 水素イオン入射によるシリコン中の増速酸化プロセスの数値解析, 溝谷浩平,礒部倫郎,深沢正永,辰巳哲也,浜口智志, 応用物理学会学術講演会講演予稿集(CD-ROM), Vol. 72nd, 2011
  • SiClx<sup>+</sup>イオン照射によるSiエッチング反応解析, 伊藤智子,唐橋一浩,KAN Song-Yun,浜口智志, 応用物理学会学術講演会講演予稿集(CD-ROM), Vol. 72nd, 2011
  • SiNエッチングにおける水素反応:分子動力学シミュレーション解析, 重川遼太,礒部倫郎,深沢正永,辰巳哲也,浜口智志, 応用物理学会学術講演会講演予稿集(CD-ROM), Vol. 72nd, 2011
  • カーボン堆積膜の密着性解析, 松隈正明,礒部倫朗,浜口智志, 分子動力学シンポジウム講演論文集(CD-ROM), Vol. 16th, 2011
  • フロロカーボンプラズマからのイオン照射によるPMMAのエッチングイールド, 塚崎泰裕,吉村智,木内正人,木内正人,浜口智志, 応用物理学関係連合講演会講演予稿集(CD-ROM), Vol. 58th, 2011
  • PMMA(ポリメチルメタクリレート)のビームエッチング分子動力学シミュレーション, 森田泰光,礒部倫郎,浜口智志, 応用物理学関係連合講演会講演予稿集(CD-ROM), Vol. 58th, 2011
  • 骨粗鬆症のない腰椎圧迫骨折の保存的治療成績, 漆谷信治,浜口建紀,鄭明和,島田道明,小川将司,林智志, 骨折, (一社)日本骨折治療学会, Vol. 33, No. 3, p. 757-760, 2011
  • Si酸化反応における水素イオン照射効果, 伊藤智子,唐橋一浩,深沢正永,辰巳哲也,浜口智志, 応用物理学関係連合講演会講演予稿集(CD-ROM), Vol. 58th, 2011
  • Novel catalysts: Indium implanted SiO2 thin films, S. Yoshimura,K. Hine,M. Kiuchi,Y. Nishimoto,M. Yasuda,A. Baba,S. Hamaguchi, Applied Surface Science, Vol. 257, No. 1, p. 192-196, 2010/10
  • Effect of light irradiation from inductively coupled Ar plasma on etching yields of SiO2 film by CF3 ion beam injections, S. Yoshimura,Y. Tsukazaki,K. Ikuse,M. Kiuchi,S. Hamaguchi, Journal of Physics: Conference Series, Vol. 232, No. 1, 2010/04
  • Electric field measurements at near-atmospheric pressure by coherent Raman scattering of laser beams, Tsuyohito Ito,Kazunobu Kobayashi,Sarah Mueller,Uwe Czarnetzki,Satoshi Hamaguchi, Journal of Physics: Conference Series, Vol. 227, 2010/04
  • Molecular dynamics simulation of the formation of sp3 hybridized bonds in hydrogenated diamondlike carbon deposition processes., Yasuo Murakami,Seishi Horiguchi,Satoshi Hamaguchi, Physical review. E, Statistical, nonlinear, and soft matter physics, Vol. 81, No. 4 Pt 1, p. 041602-041602, 2010/04
  • Electric field measurements in near-atmospheric pressure nitrogen and air based on a four-wave mixing scheme, Sarah Müller,Tsuyohito Ito,Kazunobu Kobayashi,Dirk Luggenhölscher,Uwe Czarnetzki,Satoshi Hamaguchi, Journal of Physics: Conference Series, IOP PUBLISHING LTD, Vol. 227, 2010/04
  • Plasma-surface interactions in material processing, Satoshi Hamaguchi, Journal of Physics: Conference Series, IOP PUBLISHING LTD, Vol. 257, No. 1, 2010/04
  • Evaluation of Si etching yields by Cl<sup>+</sup> Br<sup>+</sup> and HBr<sup>+</sup> ion irradiation, Tomoko Ito,Kazuhiro Karahashi,Song Yun Kang,Satoshi Hamaguchi, Journal of Physics: Conference Series, IOP PUBLISHING LTD, Vol. 232, No. 1, 2010/04
  • Reverse propagation of atmospheric pressure plasma jets, Tsuyohito Ito,Aurélien Raddenzati,Artabaze Shams,Satoshi Hamaguchi, Japanese Journal of Applied Physics, JAPAN SOC APPLIED PHYSICS, Vol. 49, No. 10, p. 1002091-1002093, 2010/04
  • Facile creation of biointerface on commodity plastic surface by combination of atmospheric plasma and reactive polymer coating, Naoki Kanayama,Swapan Kumar Saha,Naoki Nakayama,Jun Nakanishi,Katsuhisa Kitano,Satoshi Hamaguchi,Yukio Nagasaki, Journal of Photopolymer Science and Technology, TECHNICAL ASSOC PHOTOPOLYMERS,JAPAN, Vol. 23, No. 4, p. 579-583, 2010/04
  • Particle-in-cell simulations of high-pressure hydrogen plasmas driven by nano-second pulsed high-voltages, Chieh Wen Lo,Satoshi Hamaguchi, Journal of Physics: Conference Series, IOP PUBLISHING LTD, Vol. 232, No. 1, 2010/04
  • Effects of hydrogen incorporation in the formation of hydrogenated diamond-like carbon films, Yasuo Murakami,Koji Hosaka,Satoshi Hamaguchi, Journal of Physics: Conference Series, IOP PUBLISHING LTD, Vol. 232, No. 1, 2010/04
  • Molecular dynamics simulation of the formation of sp(3) hybridized bonds in hydrogenated diamondlike carbon deposition processes, Yasuo Murakami,Seishi Horiguchi,Satoshi Hamaguchi, PHYSICAL REVIEW E, AMER PHYSICAL SOC, Vol. 81, No. 4, p. 041602-041602, 2010/04
  • Rapid formation of electric field profiles in repetitively pulsed high-voltage high-pressure nanosecond discharges, Tsuyohito Ito,Kazunobu Kobayashi,Uwe Czarnetzki,Satoshi Hamaguchi, Journal of Physics D: Applied Physics, IOP PUBLISHING LTD, Vol. 43, No. 6, 2010/02
  • CHxFy<sup>+</sup>イオン照射によるエッチング反応の評価, 伊藤智子,唐橋一浩,深沢正永,辰巳哲也,浜口智志, 応用物理学関係連合講演会講演予稿集(CD-ROM), Vol. 57th, 2010
  • 反応性イオンによるPt,CoおよびPtCoエッチング反応, 唐橋一浩,伊藤智子,浜口智志, 応用物理学関係連合講演会講演予稿集(CD-ROM), Vol. 57th, 2010
  • 大気圧プラズマジェットにおける発光部伝搬速度, 伊藤剛仁,RADDENZATI Aurelien,SHAMS Artabaze,浜口智志, 応用物理学関係連合講演会講演予稿集(CD-ROM), Vol. 57th, 2010
  • CO<sup>+</sup>イオンによるPt,CoおよびPtCoエッチング反応, 唐橋一浩,伊藤智子,浜口智志, 応用物理学会学術講演会講演予稿集(CD-ROM), Vol. 71st, 2010
  • フロロカーボンおよび水素イオン入射によるPMMA(ポリメチルメタクリレート)表面の改質に関する分子動力学シミュレーション, 森田泰光,礒部倫郎,浜口智志, 応用物理学会学術講演会講演予稿集(CD-ROM), Vol. 71st, 2010
  • CHxFy<sup>+</sup>イオンエッチングにおける水素の効果, 伊藤智子,唐橋一浩,深沢正永,辰巳哲也,浜口智志, 応用物理学会学術講演会講演予稿集(CD-ROM), Vol. 71st, 2010
  • 小児上腕骨外顆骨折・内側上顆骨折に対する吸収糸を用いたtension band法, 林智志,鄭明和,小川将司,島田道明,浜口建紀, 骨折, (一社)日本骨折治療学会, Vol. 32, No. 1, p. 43-45, 2010
  • 高圧力液中プラズマ反応空間の創成, 伊藤剛仁,浜口智志, 村田学術振興財団年報, No. 24, 2010
  • Electron density measurement for plasmas by terahertz time-domain spectroscopy, A. Ando,H. Kitahara,T. Kurose,K. Kitano,K. Takano,M. Tani,M. Hangyo,S. Hamaguchi, Journal of Physics: Conference Series, Vol. 227, 2010
  • Protein patterning by atmospheric-pressure plasmas, A. Ando,M. A. Sayed,T. Asano,R. Tero,K. Kitano,T. Urisu,S. Hamaguchi, Journal of Physics: Conference Series, Vol. 232, No. 1, 2010
  • Effects of pH on Bacterial Inactivation in Aqueous Solutions due to Low-Temperature Atmospheric Pressure Plasma Application, S. Ikawa,K. Kitano,S. Hamaguchi, Plasma Process. Polym. 7(1), 33-42 (2010), WILEY-V C H VERLAG GMBH, Vol. 7, No. 1, p. 33-42, 2010/01
  • Diagnosis of atmospheric pressure plasmas by using terahertz time-domain spectroscopy, Hideaki Kitahara,Ayumi Ando,Katsuhisa Kitano,Masahiko Tani,Masanori Hangyo,Satoshi Hamaguchi, IRMMW-THz 2010 - 35th International Conference on Infrared, Millimeter, and Terahertz Waves, Conference Guide, IEEE, 2010
  • Effect of ultraviolet light irradiation on etching process of polymethylmethacrylate by ion beam injection, S. Yoshimura,K. Ikuse,Y. Tsukazaki,M. Kiuchi,S. Hamaguchi, Journal of Physics : Conference Series, Vol. 191, 2009/12
  • Structure of laboratory ball lightning., Tsuyohito Ito,Tomoya Tamura,Mark A Cappelli,Satoshi Hamaguchi, Physical review. E, Statistical, nonlinear, and soft matter physics, Vol. 80, No. 6 Pt 2, p. 067401-067401, 2009/12
  • Measurement of sputtering/etching yields by CF3 ion beam injection with UV light irradiation, Y. Tsukazaki,K. IKuse,S.Yoshimura,M. Kiuchi,S. Hamaguchi, 4th International Symposium on Atomic Technologies, 18-19 November, 2009, Seaside Hotek MAIKO VILLA, Kobe, 2009/11
  • Preparation of Stable Water-Dispersible PEGylated Gold Nanoparticles Assisted by Nonequilibrium Atmospheric-Pressure Plasma Jets, Hitoshi Furusho,Katsuhisa Kitano,Satoshi Hamaguchi,Yukio Nagasaki, Chemistry of Materials, AMER CHEMICAL SOC, Vol. 21, No. 15, p. 3526-3535, 2009/08
  • Sputtering yields of Au by low-energy noble gas ion bombardment, K. Ikuse,S. Yoshimura,K. Hine,M. Kiuchi,S. Hamaguchi, Journal of Physics D: Applied Physics, Vol. 42, No. 13, 2009/07
  • Co Si<inf>x</inf> contact resistance after etching and ashing plasma exposure, Ken Katahira,Masanaga Fukasawa,Shoji Kobayashi,Toshifumi Takizawa,Michio Isobe,Satoshi Hamaguchi,Kazunori Nagahata,Tetsuya Tatsumi, Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, A V S AMER INST PHYSICS, Vol. 27, No. 4, p. 844-848, 2009/07
  • Discharge mechanisms of atmospheric-pressure LF (Low Frequency) microplasma jets, KITANO Katsuhisa,HAMAGUCHI Satoshi, 電気学会プラズマ研究会資料, Vol. 2009, No. 1, p. 49-54, 2009/06/12
  • Creation of biointerface by atmospheric plasma treatment of plasma sensitive polymeric materials, Swapan Kumar Saha,Jun Nakanishi,Katsuhisa Kitano,Satoshi Hamaguchi,Yukio Nagasaki, Journal of Photopolymer Science and Technology, TECHNICAL ASSOC PHOTOPOLYMERS,JAPAN, Vol. 22, No. 4, p. 481-484, 2009/04
  • Nonequilibrium atmospheric plasma jets assisted stabilization of drug delivery carriers: Preparation and characterization of biodegradable polymeric nano-micelles with enhanced stability, Shogo Sumitani,Hiroki Murotani,Motoi Oishi,Katsuhisa Kitano,Satoshi Hamaguchi,Yukio Nagasaki, Journal of Photopolymer Science and Technology, TECHNICAL ASSOC PHOTOPOLYMERS,JAPAN, Vol. 22, No. 4, p. 467-471, 2009/04
  • Effect of UV light irradiation on sputtering by CF3 ion beams, S.Yoshimura,K. IKuse,Y. Tsukazaki,M. Kiuchi,S. Hamaguchi, 3rd International Symposium on Atomic Technology and 3rd Polyscale Technology Workshop, 5-6 March, 2009, Tokyo International Exchange Center, 2009/03
  • Electric field measurement in an atmospheric or higher pressure gas by coherent Raman scattering of nitrogen, T. Ito,K. Kobayashi,S. Mueller,D. Luggenhölscher,U. Czarnetzki,S. Hamaguchi, J. Phys. D, IOP PUBLISHING LTD, Vol. 42, No. 9, 2009/02
  • コヒーレントラマン散乱による高圧力水素・窒素・大気雰囲気での電界測定, 伊藤剛仁,小林和伸,MUELLER S.,LUGGENHOELSCHER D.,CZARNETZKI U.,浜口智志, 応用物理学関係連合講演会講演予稿集, Vol. 56th, No. 1, 2009
  • Cl<sup>+</sup>,Br<sup>+</sup>イオン照射によるSiエッチング反応の評価, 伊藤智子,松本祥志,唐橋一浩,KANG Song-Yun,浜口智志, 応用物理学関係連合講演会講演予稿集, Vol. 56th, No. 1, 2009
  • イボキサゴ浮遊幼生に対するモノクローナル抗体の作成, 浜口昌巳,佐々木美穂,大橋智志,玉置昭夫,上村了美, 日本水産学会大会講演要旨集, Vol. 2009, 2009
  • 大気解放雰囲気における大容積低温放電の発生, 伊藤剛仁,小林和伸,増田一仁,浜口智志, 応用物理学会学術講演会講演予稿集, Vol. 70th, No. 1, 2009
  • SiO<sub>2</sub>基板への低エネルギーインジウムイオンビームの照射と触媒効果, 吉村智,日根清裕,木内正人,木内正人,西本能弘,安田誠,馬場章夫,浜口智志, 応用物理学会学術講演会講演予稿集, Vol. 70th, No. 1, 2009
  • Cl<sup>+</sup>.Br<sup>+</sup>イオン照射によるSiエッチング反応における水素の影響, 伊藤智子,唐橋一浩,KANG Song-Yun,浜口智志, 応用物理学会学術講演会講演予稿集, Vol. 70th, No. 1, 2009
  • 低エネルギーイオンビーム照射装置を用いたシリカ基板へのインジウムおよびガリウムの注入, 吉村智,塚崎泰裕,木内正人,木内正人,浜口智志, 真空に関する連合講演会講演予稿集, Vol. 50th, 2009
  • Plasma Medicineの国際ネットワーク, 浜口智志, プラズマ・核融合学会年会(Web), Vol. 26th, 2009
  • Estimation of electron densities of plasmas by terahertz time-domain spectroscopy, Hideaki Kitahara,Ayumi Ando,Tomoko Kurose,Katsuhisa Kitano,Keisuke Takano,Masahiko Tani,Masanori Hangyo,Satoshi Hamaguchi, 34th International Conference on Infrared, Millimeter, and Terahertz Waves, IRMMW-THz 2009, IEEE, p. 205-+, 2009
  • MgO sputtering yields by noble gas ions at relatively low injection energies, S. Yoshimura,K. Hine,M. Matsukuma,K. Ikuse,M. Kiuchi,T. Nakao,J. Hashimoto,M. Terauchi,M. Nishitani,S. Hamaguchi, Proceedings of the 15th International Display Workshops, December 3-5, 2008, Toki Messe Niigata Convention Center, Vol. 3, p. 1865-1868, 2008/12
  • Experimental evaluation of MgO sputtering yields by monochromatic Ne, Kr, or Xe ion beams, K. Hine,S. Yoshimura,K. Ikuse,M. Kiuchi,J. Hashimoto,M. Terauchi,M. Nishitani,S. Hamaguchi, Thin Solid Films, ELSEVIER SCIENCE SA, Vol. 517, No. 2, p. 835-840, 2008/11
  • “Generation of Dust Seeds by Sputtering of Carbon-based Plasma Facing Materials under Low-energy H/D/T Ion Bombardment, Masashi Yamashiro,Satoshi Hamaguchi, Proceedings of the 22nd IAEA Fusion Energy Conference (13-18 Oct., 2008, Geneva, Switzerland), 2008/10
  • Electromagnetic Self-Organization and Transport Barrier Relaxations in Fusion Plasmas, G. Fuhr,S. Benkadda,P. Beyer,M. Leconte,X. Garbet,I. Sandberg,H. Isliker,D. Reiser,I. Caldas,Z.O. Guimarães-Filho,S. Hamaguchi, Proceedings of the 22nd IAEA Fusion Energy Conference (13-18 Oct., 2008, Geneva, Switzerland), 2008/10
  • Development of Diverse Lateral Line Patterns on the Teleost Caudal Fin, Hironori Wada,Satoshi Hamaguchi,Mitsuru Sakaizumi, DEVELOPMENTAL DYNAMICS, WILEY-LISS, Vol. 237, No. 10, p. 2889-2902, 2008/10
  • Reducing damage to Si substrates during gate etching processes, Tomokazu Ohchi,Shoji Kobayashi,Masanaga Fukasawa,Katsuhisa Kugimiya,Takashi Kinoshita,Toshifumi Takizawa,Satoshi Hamaguchi,Yukihiro Kamide,Tetsuya Tatsumi, Japanese Journal of Applied Physics, JAPAN SOCIETY APPLIED PHYSICS, Vol. 47, No. 7, p. 5324-5326, 2008/07
  • Measurement of Au sputtering yields by Ar and He with a low-energy mass selected ion beam system, K. Hine,S. Yoshimura,K. Ikuse,M. Kiuchi,S. Hamaguchi, Journal of Physics: Conference Series, Vol. 106, No. 1, 2008/04
  • Measurement of sticking probability and sputtering yield of Au by low-energy mass selected ion beams with a quartz crystal microbalance, K. Ikuse,S. Yoshimura,M. Kiuchi,K. Hine,S. Hamaguchi, Journal of Physics: Conference Series, Vol. 106, No. 1, 2008/04
  • Anomalous scaling of impurity transport in drift wave turbulence,, S. Futatani,S. Benkadda,Y. Nakamura,K. Kondo,S. Hamaguchi, Contrib. Plasma Phys., Vol. 48, No. 1-3, p. 111-115, 2008/04
  • Electromagnetic Effects on Transport Barrier Relaxations,, G. Fuhr,S. Benkadda,P. Beyer,X. Garbet,S. Hamaguchi, Contrib. Plasma Phys., Vol. 48, No. 1-3, p. 23-26, 2008/04
  • Plasma generation inside externally supplied Ar bubbles in water, H. Aoki,K. Kitano,S. Hamaguchi, Plasma Sources Sci. Technol., IOP PUBLISHING LTD, Vol. 17, No. 2, 2008/04
  • Nonlinear evolution of pressure gradient driven modes and anomalous transport in plasmas, Satoshi Hamaguchi, TURBULENT TRANSPORT IN FUSION PLASMA, AMER INST PHYSICS, Vol. 1013, p. 46-58, 2008/04
  • Magnetized Microdischarge Plasma Generation at Low Pressure, T. Ito,K. Kobayashi,S. Hamaguchi,M. A. Cappelli, Thin Solid Films, ELSEVIER SCIENCE SA, Vol. 516, No. 19, p. 6668-6672, 2008/04
  • Magnetized microdischarge plasmas in low pressure argon and helium, K. Kobayashi,T. Ito,M. A. Cappelli,S. Hamaguchi, J. Phys.: Conf. Series, IOP PUBLISHING LTD, Vol. 106, 2008/04
  • Molecular dynamics simulation of microcrystalline Si deposition processes by silane plasmas, M. Matsukuma,S. Hamaguchi, Thin Solid Films, ELSEVIER SCIENCE SA, Vol. 516, No. 11, p. 3443-3448, 2008/04
  • “Design of Biointerface by Nonequilibrium Atmospheric Plasma Jets -Approach from Plasma Susceptible Polymers-, Y. Nagasaki,M. Umeyama,M. Iijima,K. Kitano,S. Hamaguchi, J. Photopolym. Sci. Technol., TECHNICAL ASSOC PHOTOPOLYMERS,JAPAN, Vol. 21, No. 2, p. 267-270, 2008/04
  • Magnetic neutral loop discharge (NLD) plasmas for surface processing, Taijiro Uchida,Satoshi Hamaguchi, JOURNAL OF PHYSICS D-APPLIED PHYSICS, IOP PUBLISHING LTD, Vol. 41, No. 8, 2008/04
  • Molecular dynamics simulations for nitridation of organic polymer surfaces due to hydrogen-nitrogen ion beam injections, Masashi Yamashiro,Hideaki Yamada,Satoshi Hamaguchi, THIN SOLID FILMS, ELSEVIER SCIENCE SA, Vol. 516, No. 11, p. 3449-3453, 2008/04
  • 低周波大気圧マイクロプラズマジェット, 北野勝久,浜口智志, 応用物理学会誌、, Vol. 2009, No. 1, p. 49-54, 2008/04
  • The novel mutant scl of the medaka fish, Oryzias latipes, shows no secondary sex characters, Tadashi Sato,Aya Suzuki,Naoki Shibata,Mitsuru Sakaizumi,Satoshi Hamaguchi, Zoological Science, Vol. 25, No. 3, p. 299-306, 2008/03
  • Development of NIR bioimaging systems, Kohei Soga,Takashi Tsuji,Fumio Tashiro,Joe Chiba,Motoi Oishi,Keitaro Yoshimoto,Yukio Nagasaki,Katsuhisa Kitano,Satoshi Hamaguchi, Journal of Physics: Conference Series, Vol. 106, No. 1, 2008/03/01
  • CF<sub>3</sub>イオンビームと光の重畳照射によるSiO<sub>2</sub>エッチングイールドの測定, 幾世和将,吉村智,唐橋一浩,滝澤敏史,木内正人,木内正人,浜口智志, 応用物理学関係連合講演会講演予稿集, Vol. 55th, No. 1, 2008
  • 反応性イオンによるFe-Co合金エッチング反応の検討, 松本祥志,唐橋一浩,犬飼和明,上原裕二,浜口智志, 応用物理学関係連合講演会講演予稿集, Vol. 55th, No. 1, 2008
  • ハルマンスナモグリ (十脚甲殻類) およびイボキサゴ (腹足類) 幼生の輸送, 玉置昭夫,万田敦昌,大橋智志,浜口昌巳,MANDAL Sumit,中野善, 日本海洋学会大会講演要旨集, Vol. 2008, 2008
  • フロロカーボンビームによる低誘電率SiOCHエッチングの分子動力学シミュレーション, 鈴木歩太,滝澤敏史,磯部倫朗,小林正治,深沢正永,辰巳哲也,浜口智志, 応用物理学関係連合講演会講演予稿集, Vol. 55th, No. 1, 2008
  • 分光学的手法によるAr直流グロー放電の電子温度,密度測定, 田村知也,伊藤剛仁,浜口智志, 応用物理学会学術講演会講演予稿集, Vol. 69th, No. 1, 2008
  • コヒーレントラマン散乱による高圧力水素放電雰囲気での電界測定, 伊藤剛仁,小林和伸,CZARNETZKI Uwe,浜口智志, 応用物理学会学術講演会講演予稿集, Vol. 69th, No. 1, 2008
  • 大気圧・高気圧プラズマ研究の新しい展開, 浜口智志, 日本物理学会講演概要集, Vol. 63, No. 2, 2008
  • 反応性イオンを用いたFe-Co合金のエッチング, 唐橋一浩,松本祥志,高須庸一,犬飼和明,上原裕二,浜口智志, 日本磁気学会学術講演概要集, Vol. 32nd, 2008
  • CH<sub>x</sub>F<sub>y</sub>プラズマ処理とコンタクト抵抗の変動, 片平研,辰巳哲也,小林正治,深沢正永,滝澤敏史,礒部倫郎,浜口智志,長畑和典, 応用物理学関係連合講演会講演予稿集, Vol. 55th, No. 1, 2008
  • CF<sub>3</sub><sup>+</sup>イオンビームを用いたPMMAエッチングにおける光照射重畳効果, 幾世和将,吉村智,塚崎泰裕,木内正人,木内正人,浜口智志, 真空に関する連合講演会講演予稿集, Vol. 49th, 2008
  • Measurement of magnesium oxide sputtering yields by He and Ar ions with a low-energy mass-selected ion beam system, K. Hine,S. Yoshimura,K. Ikuse,M. Kiuchi,J. Hashimoto,M. Terauchi,M. Nishitani,S. Hamaguchi, Japanese Journal of Applied Physics, INST PURE APPLIED PHYSICS, Vol. 46, No. 46, p. L1132-L1134, 2007/11
  • Sputtering yields by noble gas injections measured with a low-energy mass analyzed ion beam system, K. Hine,S. Yoshimura,K. Ikuse,M. Kiuchi,S. Hamaguchi, 2nd International Symposium on Atomic Technologies (ISAT-2), 1-2 October, 2007, Awaji Yumebutai International Conference Center, Yumebutai, Awaji City, Hyogo, Japan, P-27, 2007/10
  • Radicals and non-equilibrium processes in low-temperature plasmas, Zoran Petrović,Nigel Mason,Satoshi Hamaguchi,Marija Radmilović-Radjenović, Journal of Physics: Conference Series, Vol. 86, No. 1, 2007/06/01
  • High-m multiple tearing modes in tokamaks: MHD turbulence generation, interaction with the internal kink and sheared flows, A. Bierwage,S. Benkadda,M. Wakatani,S. Hamaguchi,Q. Yu, 2007/04
  • Incident-energy dependence of crystalline structures of ion beam deposited Au thin films, T. Takizawa,T. Maeda,M. Kiuchi,S. Yoshimura,S. Hamaguchi, Philosophical Magazine, Vol. 87, No. 10, p. 1487-1495, 2007/04
  • Control of atomic layer degradation on Si substrate, Y. Nakamura,T. Tatsumi,S. Kobayashi,K. Kugimiya,T. Harano,A. Ando,T. Kawase,S. Hamaguchi,S. Iseda, J.Vac.Sci.Tech.A, Vol. 25, No. 4, p. 1062-1067, 2007/04
  • Dynamics of resistive double tearing modes with broad linear spectra, A. Bierwage,S. Benkadda,S. Hamaguchi,M. Wakatani, Phys. Plasmas, AMER INST PHYSICS, Vol. 14, No. 2, 2007/04
  • Synthesis of Uniformly Dispersed Metal Nanoparticles with Dispersion Stability by Nonequilibrium Atmospheric Plasma Jets, H. Furusho,D. Miyamoto,Y. Nagasaki,K. Kitano,S. Hamaguchi, J. Photopolymer Sci. Tech., TECHNICAL ASSOC PHOTOPOLYMERS,JAPAN, Vol. 20, No. 2, p. 229-233, 2007/04
  • Modelling of plasma surface interaction, S. Hamaguchi,M. Yamashiro,M. Matsukuma,H. Yamada, J. Phys. :Conf. Series, IOP PUBLISHING LTD, Vol. 86, No. 1, 2007/04
  • Molecular dynamics simulations of organic polymer dry etching at high substrate temperatures, Masashi Yamashiro,Hideaki Yamada,Satoshi Hamaguchi, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, JAPAN SOC APPLIED PHYSICS, Vol. 46, No. 4A, p. 1692-1699, 2007/04
  • Temporal evolution of ion fragment production from dimethylsilane by a hot tungsten wire and compounds deposited on the tungsten surface, Satoru Yoshimura,Akinori Toh,Masato Kiuchi,Satoshi Hamaguchi, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, INST PURE APPLIED PHYSICS, Vol. 46, No. 4A, p. 1707-1709, 2007/04
  • Molecular dynamics simulation study on substrate temperature dependence of sputtering yields for an organic polymer under ion bombardment, Masashi Yamashiro,Hideaki Yamada,Satoshi Hamaguchi, JOURNAL OF APPLIED PHYSICS, AMER INST PHYSICS, Vol. 101, No. 4, 2007/02
  • 光照射を重畳したCF<sub>3</sub>イオンビームによるスパッタ率の測定, 幾世和将,吉村智,木内正人,木内正人,滝澤敏史,豊島隆寛,唐橋一浩,浜口智志, 応用物理学関係連合講演会講演予稿集, Vol. 54th, No. 1, 2007
  • 有機高分子膜エッチングにおけるCN膜形成のMDシミュレーション III, 山城昌志,山田英明,浜口智志, 応用物理学関係連合講演会講演予稿集, Vol. 54th, No. 1, 2007
  • ドライエッチング表面反応シミュレーション, 浜口智志, 真空, Vol. 50, No. 6, 2007
  • 分子運動論に基づくエッチング/デポジション表面のシミュレーション, 浜口智志, 応用物理学会学術講演会講演予稿集, Vol. 68th, 2007
  • 水素イオン照射によるシリコン酸化膜基板損傷の分子動力学シミュレーション, 滝澤敏史,小林正治,辰巳哲也,浜口智志, 応用物理学関係連合講演会講演予稿集, Vol. 54th, No. 1, 2007
  • CF<sub>3</sub><sup>+</sup>イオン照射によるSi,SiO<sub>2</sub>エッチング反応生成物の脱離角度分布, 唐橋一浩,浜口智志, 応用物理学関係連合講演会講演予稿集, Vol. 54th, No. 1, 2007
  • 低気圧直流マイクロ放電プラズマの発生, 小林和伸,伊藤剛仁,CAPPELLI Mark A.,浜口智志, 応用物理学会学術講演会講演予稿集, Vol. 68th, No. 1, 2007
  • 低エネルギーイオンビーム照射装置を用いたシリカ基板へのインジウム注入, 日根清裕,吉村智,木内正人,木内正人,浜口智志, 真空に関する連合講演会講演予稿集, Vol. 48th, 2007
  • CF<sub>3</sub><sup>+</sup>照射によるSiO<sub>2</sub>エッチング反応生成物のイオン入射角およびエネルギー依存性, 唐橋一浩,浜口智志, 応用物理学会学術講演会講演予稿集, Vol. 68th, No. 1, 2007
  • 水素終端されたSi結晶面上の吸着Si原子表面拡散に関する分子動力学シミュレーション, 松隈正明,浜口智志, 応用物理学関係連合講演会講演予稿集, Vol. 54th, No. 1, 2007
  • 生態系保全型増養殖システム確立のための種苗生産・放流技術の開発事業(暖流系アワビ類の遺伝的,形態的および生態的差異の特定と類縁関係の解明), 大橋智志,岩永俊介,藤井明彦,桐山隆哉,堀井豊充,清本節夫,浜口昌巳, 長崎県総合水産試験場事業報告, Vol. 2006, 2007
  • 国内に生息する大型アワビ類の浮遊幼生期の卵黄タンパク質の消費状況の比較, 浜口昌巳,堀井豊充,清本節夫,高見秀輝,大橋智志,藤井明彦, 日本水産学会大会講演要旨集, Vol. 2007, 2007
  • Atomic-scale analyses of non-equilibrium surface reactions during plasma processing, Satoshi Hamaguchi,Masashi Yamashiro,Hideaki Yamada, ECS Transactions, Vol. 8, No. 1, p. 185-190, 2007
  • Expression profiles of DMRT1 in closely related species of medaka indicate DMY has acquired a new expression pattern after duplication event, Hiroyuki Otake,Ai Shinomiya,Masaru Matsuda,Satoshi Hamaguchi,Mitsuru Sakaizumi, ZOOLOGICAL SCIENCE, ZOOLOGICAL SOC JAPAN, Vol. 23, No. 12, p. 1223-1223, 2006/12
  • Molecular dynamics study on Ar ion bombardment effects in amorphous SiO2 deposition processes, M. Taguchi,S. Hamaguchi, Japanese Journal of Applied Physics, AMER INST PHYSICS, Vol. 100, No. 12, 2006/12
  • Temporal evolution of ion fragment production from methylsilane by a hot tungsten wire, Satoru Yoshimura,Akinori Toh,Takahiro Toyoshima,Masato Kiuchi,Satoshi Hamaguchi, JOURNAL OF APPLIED PHYSICS, AMER INST PHYSICS, Vol. 100, No. 9, 2006/11
  • Substrate temperature dependence of sputtering yields in organic polymer plasma etching processes; short-time effects by ion bombardment, M. Yamashiro,H. Yamada,S. Hamaguchi, 2006/09
  • Radio-Frequency (RF)-driven atmospheric-pressure plasmas in contact with liquid, K. Kitano,H. Aoki,S. Hamaguchi, Japanese Journal of Applied Physics, JAPAN SOC APPLIED PHYSICS, Vol. 45, No. 10 B, p. 8294-8297, 2006/09
  • Numerical analysis of incident angle effects in reactive sputtering deposition of amorphous SiO2, M. Taguchi,S. Hamaguchi, Japanese Journal of Applied Physics, INST PURE APPLIED PHYSICS, Vol. 45, No. 10, p. 8163-8167, 2006/09
  • プラズマの素過程とモデリング, 浜口智志, 第13回プラズマエレクトロニクス サマースクールテキスト, 応用物理学会プラズマエレクトロニクス分科会, 2006/08
  • High-m multiple tearing modes in tokamaks: MHD turbulence generation, interaction with the internal kink and sheared flows, A. Bierwage,S. Benkadda,M. Wakatani,S. Hamaguchi,Q. Yu, 2006/08
  • Wild-derived XY sex-reversal mutants in the medaka, Oryzias latipes, Hiroyuki Otake,Ai Shinomiya,Masaru Matsuda,Satoshi Hamaguchi,Mitsuru Sakaizumi, GENETICS, GENETICS, Vol. 173, No. 4, p. 2083-2090, 2006/08
  • Atomic-level simulation of non-equilibrium surface chemical reactions under plasma-wall interaction, S. Hamaguchi, Computer Physics Communications, ELSEVIER SCIENCE BV, Vol. 177, No. 1-2 SPEC. ISS., p. 108-109, 2006/08
  • Color reversion of the albino medaka fish associated with spontaneous somatic excision of the Tol-1 transposable element from the tyrosinase gene, Makiko Tsutsumi,Shuichiro Imai,Yoriko Kyono-Hamaguchi,Satoshi Hamaguchi,Akihiko Koga,Hiroshi Hori, PIGMENT CELL RESEARCH, WILEY, Vol. 19, No. 3, p. 243-247, 2006/06
  • Patterns Intermittent Transport and Universality in Convective Turbulence in Fusion Plasmas, S. Benkadda,P. Beyer,K. Takeda,X. Garbet,S. Hamaguchi,N. Bian, No. 23, p. 170-170, 2006/06
  • Theory of breakdown phenomena in supercritical fluids, S. Hamaguchi, 2006/05
  • RF barrier discharges on the liquid water surface, K. Kitano,H. Aoki,S. Hamaguchi, Proceedings of the 3rd International Workshop on Microplasmas (IWM2006) (ed. by G. Babucke, May 9-11, 2006, Greifswald, Germany)p.67, 2006/05
  • RF barrier discharges on the liquid water surface, K. Kitano,H. Aoki,S. Hamaguchi, Proceedings of the 3rd International Workshop on Microplasmas (IWM2006) (ed. by G. Babucke, May 9-11, 2006, Greifswald, Germany)p.67, 2006/05
  • Fragment ions of methylsilane produced by hot tungsten wires, Satoru Yoshimura,Akinori Toh,Takuya Maeda,Satoshi Sugimoto,Masato Kiuchi,Satoshi Hamaguchi, Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, JAPAN SOC APPLIED PHYSICS, Vol. 45, No. 3 A, p. 1813-1815, 2006/03/08
  • Numerical analyses of subsurface reaction layers for reactive ion etching and sputtering deposition processes, S. Hamaguchi, 2006/03
  • Fragment ions of methylsilane produced by hot tungsten wires, S. Yoshimura,A. Toh,T. Maeda,S. Sugimoto,M. Kiuchi,S. Hamaguchi, Japanese Journal of Applied Physics, 物理系学術誌刊行協会, Vol. 45, No. 3A, p. 1813-1815, 2006/03
  • クロアワビとマダカアワビの類縁関係-I-遺伝学的アプローチ-, 浜口昌巳,佐々木美穂,大橋智志,堀井豊充, 日本水産学会大会講演要旨集, Vol. 2006, 2006
  • クロアワビとマダカアワビの類縁関係-II-形態学的アプローチ-, 堀井豊充,大橋智志,浜口昌巳, 日本水産学会大会講演要旨集, Vol. 2006, 2006
  • 生態系保全型増養殖システム確立のための種苗生産・放流技術の開発事業(暖流系アワビ類の遺伝的,形態的および生態的差異の特定と類縁関係の解明), 大橋智志,岩永俊介,藤井明彦,桐山隆哉,堀井豊充,清本節夫,浜口昌巳, 長崎県総合水産試験場事業報告, Vol. 2005, 2006
  • 有機高分子膜エッチングにおけるCN膜形成のMDシミュレーション II, 山城昌志,山田英明,浜口智志, 応用物理学会学術講演会講演予稿集, Vol. 67th, No. 1, 2006
  • 有機ケイ素化合物の表面電離フラグメントイオンとタングステンワイヤの表面状態, 豊島隆寛,藤章至,吉村智,木内正人,浜口智志, 応用物理学関係連合講演会講演予稿集, Vol. 53rd, No. 1, 2006
  • エッチング・プラズマ曝露試料の真空搬送電子スピン共鳴(in-vacuo ESR)法による観察 5, 石川健治,山崎雄一,山崎聡,森本幸裕,陣内仏りん,石川寧,浜口智志,寒川誠二, 応用物理学関係連合講演会講演予稿集, Vol. 53rd, No. 1, 2006
  • Siトレンチ加工時の残さ発生のメカニズム解析, 中村雄吾,釘宮克久,片平研,牧田和明,川瀬智人,浜口智志,上出幸洋,辰巳哲也,森田靖, 応用物理学関係連合講演会講演予稿集, Vol. 53rd, No. 1, 2006
  • 微結晶SiGe薄膜プラズマCVDおよび水素引き抜き反応の分子動力学シミュレーション, 松隈正明,浜口智志, 応用物理学会学術講演会講演予稿集, Vol. 67th, No. 1, 2006
  • 低エネルギーイオンビーム照射装置を用いた希ガスイオンによる金のスパッタ率の精密測定, 日根清裕,吉村智,木内正人,木内正人,浜口智志, 真空に関する連合講演会講演予稿集, Vol. 47th, 2006
  • 有機高分子膜エッチングにおけるCN膜形成のMDシミュレーション, 山城昌志,山田英明,浜口智志, 応用物理学関係連合講演会講演予稿集, Vol. 53rd, No. 1, 2006
  • イオンビーム蒸着法を用いたAu薄膜形成における結晶配向性のエネルギー依存性, 滝沢敏史,前田拓也,木内正人,木内正人,吉村智,浜口智志, 応用物理学関係連合講演会講演予稿集, Vol. 53rd, No. 2, 2006
  • 低エネルギーCF<sub>3</sub>イオンビームによるSiO<sub>2</sub>のエッチング機構, 滝澤敏史,豊島隆寛,木内正人,木内正人,吉村智,浜口智志, 真空に関する連合講演会講演予稿集, Vol. 47th, 2006
  • アワビ類初期生態解明のための種判別技術の開発, 浜口昌巳,佐々木美穂,堀井豊充,清本節夫,大橋智志,藤井明彦,滝口直之,橋本加奈子,竹内泰介, 水産総合研究センター研究報告, 2006
  • Atomistic scale analyses of reactive ion etching and sputtering deposition processes by numerical simulations, S. Hamaguchi, 2006/01
  • Electrode voltage distribution analyses for large-area capacitively coupled plasmas based on transmission line models, M. Matsukuma,S. Hamaguchi, Proceedings of the 6th International Conference on Reactive Plasmas and the 23rd Symposium on Plasma Processing (January 24-27,2006, Matsushima/Sendai, Japan) 275-276 (2006)., 2006/01
  • MD and MC simulations of amorphous SiO2 thin film formed by reactive sputtering deposition processes, M. Taguchi,S. Hamaguchi, Proceedings of the 6th International Conference on Reactive Plasmas and the 23rd Symposium on Plasma Processing (January 24-27,2006, Matsushima/Sendai, Japan) 103-104 (2006)., 2006/01
  • Molecular dynamics simulation analyses of surface damages during SiO2 selective etching processes,, T. Kawase,A. Ando,T. Tatsumi,S. Hamaguchi, Proceedings of the 6th International Conference on Reactive Plasmas and the 23rd Symposium on Plasma Processing (January 24-27,2006, Matsushima/Sendai, Japan) 89-90 (2006)., 2006/01
  • Investigation of RF-driven atmospheric-pressure plasmasin contact with liquid water, Katsuhisa Kitano,Hironori Aoki,Satoshi Hamaguchi, Proceedings of the 6th International Conference on Reactive Plasmas and 23th Symposium on Plasma Processing, 2006/01
  • Crystalline structure control of Au thin films in ion beam deposition processes, T. Takizawa,T. Maeda,S. Yoshimura,M. Kiuchi,S. Hamaguchi, Proceedings of the 6th International Conference on Reactive Plasmas and 23th Symposium on Plasma Processing, 2006/01
  • Fragment ions of methylsilane and dimethylsilane generated in tungsten-based catalytic chemical vapor deposition (Cat-CVD) processes, S. Yoshimura,A. Toh,T. Maeda,S. Sugimoto,M. Kiuchi,S. Hamaguchi, Proceedings of the 6th International Conference on Reactive Plasmas and 23th Symposium on Plasma Processing, 2006/01
  • Topography evolution of dielectric thin films on grating surfaces in Oblique Deposition by Multiple Sources (ODMS), M. Taguchi,T. Kunisada,S. Kusaka,S. Hamaguchi, IEEE Trans. Plasma Sci, IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC, Vol. 34, No. 4 I, p. 1084-1093, 2006/01
  • Gonadal development in XY sex-reversal mutants derived from wild populations of the medaka, Oryzias latipes, Hiroyuki Otake,Ai Shinomiya,Masaru Matsuda,Satoshi Hamaguchi,Mitsuru Sakaizumi, ZOOLOGICAL SCIENCE, ZOOLOGICAL SOC JAPAN, Vol. 22, No. 12, p. 1510-1510, 2005/12
  • Molecular dynamics simulation analyses on injection angle dependence of SiO2 sputtering yields by fluorocarbon beams, T. Kawase,S. Hamaguchi, Proceedings of the 5th International Symposium on Dry Process (November28-30, 2005, Jeju, Korea) 245-246 (2005)., ELSEVIER SCIENCE SA, Vol. 515, No. 12, p. 4883-4886, 2005/11
  • Time evolution of electrode voltage distribution in large-area capacitively coupled plasmas, M. Matsukuma,S. Hamaguchi, Proceedings of the 5th International Symposium on Dry Process (November28-30, 2005, Jeju, Korea) 349-350 (2005)., ELSEVIER SCIENCE SA, Vol. 515, No. 12, p. 5188-5192, 2005/11
  • MD simulation of amorphous SiO2 thin film formation in reactive sputter deposition processes,, M. Taguchi,S. Hamaguchi, Proceedings of the 5th International Symposium on Dry Process (November28-30,2005, Jeju, Korea) 243-244 (2005)., ELSEVIER SCIENCE SA, Vol. 515, No. 12, p. 4879-4882, 2005/11
  • Molecular dynamics simulation of plasma-surface interactions during dry etching processes, S. Hamaguchi,H. Yamada,M. Yamashiro, Proceedings of the 2005 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), Japan Society of Applied Physics, IEEE Electron Device Society,, Vol. 2005, p. 67-70, 2005/09
  • Atomistic modeling of etching and deposition processes via molecular dynamics simulations, S. Hamaguchi,H. Yamada,M. Yamashiro, Proceedings of the 2005 International Meeting for Future of Electron Devices, Kansai (2005IMFEDK: April 11-13, 2005, Kyoto University Clock Tower Centennial Hall, Kyoto, Japan), 31-32 (2005)., 2005/04
  • Atomisitic modeling of etching and deposition processes via molecular dynamics simulations, S. Hamaguchi,H. Yamada,M. Yamashiro, Proceedings of the 2005 International Meeting for Future of Electron Devices,Kanasai (2005IMFEDK), IEEE EIC,2005, 2005/04
  • Visualization of Interactions between Organic Polymer Surfaces and Ion beams obtained from Molecular Dynamics Simulations, H. Yamada,S. Hamaguchi, IEEE Trans. Plasma Sci. 33 (2) 246-247, Vol. 33, No. 2 I, p. 246-247, 2005/04
  • Nusselt number scaling in tokamak plasma turbulence, K. Takeda,S. Benkadda,S. Hamaguchi,M. Wakatani, Phys. Plasmas 12 (4) 052309-1 ~0523980-8, Vol. 12, No. 5, p. 1-8, 2005/04
  • スパッタ成膜による薄膜の形状および非晶質膜質の数値解析予測, 田口雅文,浜口智志, 応用物理学関係連合講演会講演予稿集, Vol. 52nd, No. 1, 2005
  • 低エネルギーイオンビーム照射装置を用いた金の堆積率の精密測定, 日根清裕,吉村智,前田拓也,木内正人,浜口智志, 真空に関する連合講演会講演予稿集, Vol. 46th, 2005
  • 第2期魚介類種苗量産技術開発研究事業, 大橋智志,岩永俊介,藤井明彦,桐山隆哉,堀井豊充,清本節夫,浜口昌巳, 長崎県総合水産試験場事業報告, Vol. 2004, 2005
  • メチルシランおよびジメチルシランの表面解離フラグメントイオンの測定, 藤章至,吉村智,杉本敏司,木内正人,浜口智志, 真空に関する連合講演会講演予稿集, Vol. 46th, 2005
  • CF<sub>x</sub>ビームによるSiO<sub>2</sub>スパッタリングイールド角度依存性に関するMDシミュレーション解析, 川瀬智人,浜口智志, 応用物理学会学術講演会講演予稿集, Vol. 66th, No. 1, 2005
  • 有機ケイ素化合物の表面電離フラグメントイオンの測定, 藤章至,前田拓也,吉村智,杉本敏司,木内正人,浜口智志, 応用物理学会学術講演会講演予稿集, Vol. 66th, No. 1, 2005
  • 暖流系アワビ類3種における着底基盤の設置方向および水深による浮遊幼生着底率の差異, 大橋智志,清本節夫,堀井豊充,浜口昌巳, 日本水産学会大会講演要旨集, Vol. 2005, 2005
  • 反応性スパッタ法による非晶質SiO<sub>2</sub>薄膜堆積プロセスのMDシミュレーション解析, 田口雅文,田口雅文,浜口智志, 応用物理学会学術講演会講演予稿集, Vol. 66th, No. 1, 2005
  • 異なる温度の有機高分子基板-CH<sub>4</sub>ビーム間相互作用のMDシミュレーション, 山城昌志,山田英明,浜口智志, 応用物理学会学術講演会講演予稿集, Vol. 66th, No. 1, 2005
  • Study on Transport Regimes of Ion Temperature Gradient Driven Turbulence, K. Takeda,S. Benkadda,S. Hamaguchi,M. Wakatani, J. Plasma and Fusion Research SERIES 6, 570-572, 2005/01
  • Effects of Van der Waals interactions on SiO2 etching by CFx plasmas, H. Ohta,S. Hamaguchi, J. Plasma and Fusion Research SERIES 6, 399-401, 2005/01
  • Plasma Beam Irradiation into Organic Polymer Surfaces, H. Yamada,S. Hamaguchi, J. Plasma and Fusion Research SERIES 6, 402-405, 2005/01
  • Molecular dynamics simulatin of low energy Au ion-beam deposition using the glue model, T. Takizawa,S. Hamaguchi,T. Fukuda,M. Kiuchi,K. Ito,H. Yamada, Proc. 22nd Symposium on Plasma Processing, Nagoya, Japan, 26-28 January, p.587-588 (2005), 2005/01
  • Numerical analyses of surface interactions between radical beams and organic polymer surfaces, H. Yamada,S. Hamaguchi, Plasma Phys. Control. Fusion 47 A11-A18, Vol. 47, No. 5 A, 2005/01
  • Plasma discharge in supercritical fluids, Satoshi Hamaguchi,Suresh C. Sharma, 32nd EPS Conference on Plasma Physics 2005, EPS 2005, Held with the 8th International Workshop on Fast Ignition of Fusion Targets - Europhysics Conference Abstracts, Vol. 3, p. 2298-2301, 2005
  • Nonlinear evolution of q=1 triple tearing modes in a tokamak plasma, A. Bierwage,S. Hamaguchi,M. Wakatani,S. Benkadda,X. Leoncini, Phy. Rev. Lett. 94(6), 065001-1~065001-4, Vol. 94, No. 6, p. 065001-065001, 2005/01
  • On Interatomic Potential Functions for Molecular Dynamics (MD) Simulations of Plasma-Wall Interactions, S. Hamaguchi,H. Ohta,H. Yamada, J. Plasma and Fusion Research, 2004/12
  • Mutations of the sex-determining gene DMY from wild populations of the medaka. Oryzias latipes, Hiroyuki Ohtake,Ai Shinomiya,Masaru Matsuda,Satoshi Hamaguchi,Mitsuru Sakaizumi, ZOOLOGICAL SCIENCE, ZOOLOGICAL SOC JAPAN, Vol. 21, No. 12, p. 1345-1345, 2004/12
  • Investigation of Interactions between Plasmas and Organic Polymer Surfaces using Molecular Dynamics Simulation, H. Yamada,S. Hamaguchi, Proceedings of the 21st Symposium on Plasma Processing(SPP-21)}, ed. by K. Ono, (Organizing Committee of SPP-21, Sapporo, 2004) p.214-215, 2004/12
  • Nonlinear Behavior of Resistive Pressure Driven Modes in Stellarator/Heliotron Plasmas with Vacuum Magnetic Islands, T. Unemura,S. Hamaguchi,M. Wakatani, Phys. Plasmas 11, 1545-1551, AMER INST PHYSICS, Vol. 11, No. 4, p. 1545-1551, 2004/12
  • Molecular-dynamics simulations of organic polymer etching by hydrocarbon beams, Hideaki Yamada,Satoshi Hamaguchi, Journal of Applied Physics, Vol. 96, No. 11, p. 6147-6152, 2004/12/01
  • Investigation of Interactions between Plasmas and Organic Polymer Surfaces using Molecular Dynamics Simulation, H. Yamada,S. Hamaguchi, Proceedings of the 21st Symposium on Plasma Processing(SPP-21)}, ed. by K. Ono, (Organizing Committee of SPP-21, Sapporo, 2004) p.214-215, 2004/12
  • Onset of intermittent thermal transport by ion-temperature gradient (ITG)-driven turbulence based on a low-degree-of-freedom model, K. Takeda,S. Benkadda,S. Hamaguchi,M. Wakatani, Phys. Plasmas 11(7), 3561-3571, AMER INST PHYSICS, Vol. 11, No. 7, p. 3561-3571, 2004/12
  • Molecular dynamics simulations of organic polymer etching by hydrocarbon beams, H. Yamada,S. Hamaguchi, J. Appl. Phys. vol. 96, 6147 (2004)., 2004/12
  • Onset of intermittent thermal transport by ion-temperature-gradient-driven turbulence based on a low-degree-of-freedom model, K. Takeda,S. Benkadda,S. Hamaguchi,M. Wakatani, Physics of Plasmas, Vol. 11, No. 7, p. 3561-3571, 2004/07
  • Nonlinear behavior of resistive pressure driven modes in stellarator/heliotron plasmas with vacuum magnetic islands, T. Unemura,S. Hamaguchi,M. Wakatani, Physics of Plasmas, Vol. 11, No. 4, p. 1545-1551, 2004/04
  • (H,C,N)系原子間ポテンシアルを用いた有機ポリマーエッチングの分子動力学シミュレーション, 山田英明,浜口智志, 応用物理学関係連合講演会講演予稿集, Vol. 51st, No. 1, 2004
  • 有機ポリマーエッチングおよび金属スパッタリングにおけるビーム表面相互作用, 浜口智志,山田英明,伊藤憲司, 応用物理学会学術講演会講演予稿集, Vol. 65th, No. 1, 2004
  • Large-scale Numerical Simulations of Plasmas, 浜口智志, 日本原子力研究所JAERI-Conf, 2004
  • 遺伝子解析識別技術を用いたクロアワビ,マダカアワビの資源特性に関する研究, 大橋智志,藤井明彦,桐山隆哉,堀井豊充,浜口昌巳,清本節夫, 長崎県総合水産試験場事業報告, Vol. 2003, 2004
  • CF<sub>x</sub>ビームによるSiO<sub>2</sub>エッチングの数値計算による研究, 太田裕朗,浜口智志, 応用物理学関係連合講演会講演予稿集, Vol. 51st, No. 1, 2004
  • Introduction: Simulation Reseach in Plasma Application Technolgies, Satoshi Hamaguchi, Vol. 80, No. 2, 2004/01
  • シミュレーションによるプラズマ・システム構築, 浜口智志, 第14回プラズマエレクトロニクス講習会テキスト, 2003/12
  • Molecular Dynamics Simulation of Organic Polymer Etching, H. Yamada,S. Hamaguchi, Proceedings of International Symposium on Dry Process (DPS2003), Tokyo 2003 (The Institute of Electrical Engineers of Japan, Tokyo, 2003), 49-54, 2003/12
  • Relaxation time of strongly coupled Yukawa systems, T. Saigo,S. Hamaguchi, Proceedings of the 26th International Conference on Phenomena in Ionized Gases (XXVI ICPIG) (ed. by J. Meichner, D. Loffhagen, and H. E. Wagner: XXVI ICPIG Committee, Greifswald, 2003) vol.1 pp.217-218, 2003/12
  • Molecular Dynamics simulation of polymer etching by H2 and N2 plasmas, H. Yamada,S. Hamaguchi, Proceedings of the 16th International Symposium on Plasma Chemistry (ISPC) (ed. by R. d'Agostino, P. Favia, F. Fracassi, F. Palumbo: Department of Chemistry, University of Bari, Institute of Inorganic Methodologies and Plasmas (IMIP), CNR Bari, 2003) pp. 209, 2003/12
  • Simulations of flattening processes on ion--bombarded silicon surfaces, T. Tani,S. Hamaguchi, Proceedings of the 20th Symposium on Plasma Processing (SPP-20)} (ed. by K. Ono: Organizing Committee of SPP-20, Kyoto, 2003) p.201-202, 2003/12
  • MD simulations of (H,C,N) systems for investigation of plasma-polymer surface reaction mechanisms, H. Yamada,S. Hamaguchi, Proceedings of the 20th Symposium on Plasma Processing (SPP-20)} (ed. by K. Ono: Organizing Committee of SPP-20, Kyoto, 2003) p.191-192, 2003/12
  • Destabilization of nonlinear resistive wall mode due to suppression of poloidal rotation in a cylindrical tokamak, M. Sato,S. Hamaguchi,M. Wakatani, Phys. Plasmas 10, 187-194, Vol. 10, No. 1, p. 187-194, 2003/12
  • Shear flow generation due to electromagnetic instabilities, M. Wakatani,M. Sato,N. Miyato,S. Hamaguchi, Nuclear Fusion 43(1), 63-67, Vol. 43, No. 1, p. 63-67, 2003/12
  • Masahiro Wakatani - Obituary, Hamaguchi S,Hasegawa A,Van Dam J, PHYSICS TODAY, Vol. 56, No. 11, p. 91-92, 2003/11
  • Oxidation of cobalt(III)-sulfur-rich dithiolate complexes and spectroscopic and electrical properties of the oxidized species, Kazuya Kubo,Motohiro Nakano,Satoshi Hamaguchi,Gen Etsu Matsubayashi, Inorganica Chimica Acta, Vol. 346, p. 43-48, 2003/03/25
  • 中性気体圧力分布がアルゴンプラズマ分布に与える影響について, 石渡寛隆,浜口智志,若谷誠宏, 応用物理学関係連合講演会講演予稿集, Vol. 50th, No. 1, 2003
  • Si/SiO<sub>2</sub>へのCFビーム照射に対する表面緩和過程を含む分子動力学シミュレーション, 太田裕朗,浜口智志,若谷誠宏,山田英明, 応用物理学関係連合講演会講演予稿集, Vol. 50th, No. 1, 2003
  • SiO<sub>2</sub>のCF<sub>x</sub>ビームによるエッチング・堆積過程の分子間力を含んだMDシミュレーション, 太田裕朗,浜口智志, 応用物理学会学術講演会講演予稿集, Vol. 64th, No. 1, 2003
  • H<sub>2</sub>/N<sub>2</sub>プラズマによるポリマーエッチングの分子動力学シミュレーション, 山田英明,浜口智志, 応用物理学関係連合講演会講演予稿集, Vol. 50th, No. 1, 2003
  • 有機ポリマーエッチングの分子動力学シミュレーション, 山田英明,浜口智志, 応用物理学会学術講演会講演予稿集, Vol. 64th, No. 1, 2003
  • ナノスケール表面反応モデリング, 浜口智志, シリコンテクノロジー, 社)応用物学会・シリコンテクノロジー分科会、東京, 2002/12
  • Strongly Coupled Dusty Plasmas, HAMAGUCHI Satoshi, Journal of Plasma and Fusion Research, The Japan Society of Plasma Science and Nuclear Fusion Research, Vol. 78, No. 4, p. 313-319, 2002/12
  • Interatomic potentials for MD simulation of polymer etching by N2/H2 and NH3 plasmas, H. Yamada,S. Hamaguchi, Proceedings of International Symposium on Dry Process (DPS2002), Tokyo 2002 : The Institute of Electrical Engineers of Japan, Tokyo, 2002), 189-194, 2002/12
  • Molecular Dynamics Simulation of Si and SiO2 Etching, S. Hamaguch, Proceedings of Joint Conference of ESCAMPIG16 and ICRP5, (ed. by N. Sadeghi and H. Sugai, European Physical Society and Japan Society of Applied Physics, Grenoble, 2002), Vol.II, pp.5-6, 2002/12
  • Shear viscosity of strongly coupled Yukawa systems, T. Saigo,S. Hamaguchi, Phys. Plasmas 9(4), 1210-1216, Vol. 9, No. 4, p. 1210-1216, 2002/12
  • Surface molecular dynamics of Si/SiO2 reactive ion etching, S. Hamaguchi,H. Ohta, Vacuum 66(3-4), 189-195, Vol. 66, No. 3-4, p. 189-195, 2002/12
  • Nonlinear behaviour of resistive drift-Alfven instabilities in a magnetized cylindrical plasma, N. Miyato,S. Hamaguchi,M. Wakatani, Plasma Phys. Control. Fusion 44(8), 1689-1705, Vol. 44, No. 8, p. 1689-1705, 2002/12
  • Effect of poloidal shear flow on local flattening of density profile due to nonlinear resistive interchange mode, T. Unemura,S. Hamaguchi,M. Wakatani, Plasma Phys. Control. Fusion 44(5A), A507-515, The Physical Society of Japan, Vol. 44, No. 5 A, p. 137-137, 2002/12
  • ELM-like behaviour generated by nonlinear ion-temperature-gradient-driven mode, K. Takeda,S. Hamaguchi,M. Wakatani, Plasma Phys. Control. Fusion 44(5A), A487-494, Vol. 44, No. 5 A, 2002/12
  • Resistive drift-Alfv&eacute;n instability in tokamak edge plasmas, N. Miyato,S. Hamaguchi,M. Wakatani, Plasma Phys. Control. Fusion 44 No 5A A293-A298, Vol. 44, No. 5 A, 2002/05
  • CF<sub>x</sub>によるSiO<sub>2</sub>エッチングにおける表面反応の分子動力学シミュレーション, 太田裕朗,浜口智志,若谷誠宏, 分子動力学シンポジウム講演論文集, Vol. 7th, 2002
  • プラズマエッチングにおける表面反応シミュレーションのための原子間ポテンシャルモデル, 太田裕朗,浜口智志,若谷誠宏, 応用物理学会学術講演会講演予稿集, Vol. 63rd, No. 1, 2002
  • プロセスシミュレーション, 浜口智志, 第12回プラズマエレクトロニクス講習会テキスト — プラズマCVDによる新材料プロセスとプラズマモニタリング・モデリングの最前線, (社)応用物理学会・プラズマエレクトロニクス分科会、東京, 2001/12
  • IT革命とエネルギー問題, 浜口智志, 公開講座テキストNo. 6, 「21世紀のエネルギー科学 -新エネルギー・材料の創成-」, 京都大学エネルギー科学研究科, 2001/12
  • Fluid simulation of two-dimensional axially symmetric RF plasmas, H. Ishiwata,S. Hamaguchi, Proceedings of Plasma Science Symposium 2001 and the 18th Symposium on Plasma Processing (PSS-2001/SPP-18)} (ed. by N. Sato and H. Fujiyama: Organization Committee of PSS2001/SPP-18, Kyoto, 2001) p. 207-208, 2001/12
  • Simulations of plasma-surface interaction in reactive plasmas, HAMAGUCHI Satoshi, OYOBUTURI, The Japan Society of Applied Physics, Vol. 70, No. 9, p. 1099-1103, 2001/12
  • Molecular Dynamics Simulation of Surface Reactions during Plasma Etching Processes, HAMAGUCHI Satoshi, Journal of plasma and fusion research, Vol. 77, No. 12, p. 1221-1229, 2001/12
  • Waves in strongly-coupled classical one-component plasmas and Yukawa fluids, S. Hamaguchi,H. Ohta, Physica Scripta, T89, 127-129, Vol. 89, p. 127-129, 2001/12
  • Atomic-scale surface analysis of silicon etching by Cl/O plasmas, H. Ohta,S. Hamaguchi, Proceedings of International Symposium on Dry Process (DPS2001), Tokyo 2001 (The Institute of Electrical Engineers of Japan, Tokyo, 2001), 129-133, 2001/12
  • Modeling of Surface Reactions for Silicon and Silicon Dioxide Etching Processes, S. Hamaguchi,H. Ohta, Proceedings of the First International Symposium on Advanced Fluid Information (Institute of Fluid Science, Tohoku University, Sendai, 2001) p206-207, 2001/12
  • Numerical simulation of surface reaction dynamics for Si/SiO2 selective etching, S. Hamaguchi,H. Ohta, Extended Abstracts of International Symposium on Material Processing for Nanostructure Devices (MPND2001 Committee, Kyoto, 2001) p75-76, 2001/12
  • Three dimensional model for plasma-induced charging in asymmetric microstructure, S. S. Kim,S. Hamaguchi, Proceedings of the 25th International Conference on Phenomena in Ionized Gases (XXVICPIG) (ed. by T.~Goto: XXVICPIG Committee, Nagoya, 2001) pp.225-226, 2001/12
  • Screening effects on shear viscosity in strongly coupled Yukawa systems, T. Saigo,S. Hamaguchi, Proceedings of the 25th International Conference on Phenomena in Ionized Gases (XXVICPIG) (ed. by T.~Goto: XXVICPIG Committee, Nagoya, 2001) pp.53-54, 2001/12
  • Finite--element drift--diffusion simulation of two-dimensional axisymmetric parallel plate Ar discharges, H. Ishiwata,S. Hamaguchi, Proceedings of the 25th International Conference on Phenomena in Ionized Gases (XXVICPIG) (ed. by T.~Goto: XXVICPIG Committee, Nagoya, 2001) pp.209-210, 2001/12
  • Surface reaction dynamics of Si/SiO2 selective etching for halogens, H. Ohta,S. Hamaguchi, Proceedings of the 25th International Conference on Phenomena in Ionized Gases (XXVICPIG) (ed. by T.~Goto: XXVICPIG Committee, Nagoya, 2001) pp.159-160, 2001/12
  • Molecular dynamics simulation of Si/SiO2 selective etching, S. Hamaguchi,H. Ohta, Proceedings of the 6th International Symposium on Sputtering and Plasma Processes (ISSP2001) (ed. by E. Kusano: ISSP2001 Committee, Kanazawa, 2001) pp.85-89, 2001/12
  • Molecular dynamics simulation of Si and SiO2 selective etching, S. Hamaguchi,H. Ohta, Proceedings of the 15th International Symposium on Plasma Chemistry (ed. by A. Bouchoule, J. M. Pouvesle, A. L. Thomann, J. M. Bauchire, and E. Robert:The Organization Committee of the 15th International Symposium on Plasma Chemistry, Orleans, 2001) Vol. V, 1701-1704, 2001/12
  • Molecular dynamics simulations of Si and SiO2 reactive ion etching by halogens, in Semiconductor Technology, S. Hamaguchi,H. Ohta, by M. Yang: Proceeding of the 1st International Conference on Semiconductor Technology, The Electrochemical Society, Inc., New Jersey, 2001), vol. 2, 388-393, 2001/12
  • MD Simulation of Silicon and Silicon Dioxide Etching by Halogens: The Effect of Neutral Halogens on Etch Selectivities, H.Ohta,S. Hamaguchi, Proceedings of Plasma Science Symposium 2001 and the 18th Symposium on Plasma Processing (PSS-2001/SPP-18)} (ed. by N. Sato and H. Fujiyama: Organization Committee of PSS2001/SPP-18, Kyoto, 2001) p.~469-470, 2001/12
  • PIC/MCC simulation of a 2d axially symmetric dual-frequency RF plasma processing systems, S. Sunohara,S. Hamaguchi, Proceedings of Plasma Science Symposium 2001 and the 18th Symposium on Plasma Processing (PSS-2001/SPP-18)} (ed. by N. Sato and H. Fujiyama: Organization Committee of PSS2001/SPP-18, Kyoto, 2001) p. 209-210, 2001/12
  • Shear Viscosity of Yukawa Systems: Influence of Coupling and Screening Effects in Fluid States, T. Saigo,S. Hamaguchi, Proceedings of Plasma Science Symposium 2001 and the 18th Symposium on Plasma Processing (PSS-2001/SPP-18)} (ed. by N. Sato and H. Fujiyama: Organization Committee of PSS2001/SPP-18, Kyoto, 2001) p.52-53, 2001/12
  • Effect of Current on Resistive Drift-Alfven Instability in a Cylindrical Plasma, N. Miyato,S. Hamaguchi,M. Wakatani, Proceedings of Plasma Science Symposium 2001 and the 18th Symposium on Plasma Processing (PSS-2001/SPP-18)} (ed. by N. Sato and H. Fujiyama: Organization Committee of PSS2001/SPP-18, Kyoto, 2001) p. 47-48, 2001/12
  • The finite--element spectral method for three-dimensional reduced MHD equations, M. Yamamoto,S. Hamaguchi,M. Wakatani, Proceedings of Plasma Science Symposium 2001 and the 18th Symposium on Plasma Processing (PSS-2001/SPP-18)} (ed. by N. Sato and H. Fujiyama: Organization Committee of PSS2001/SPP-18, Kyoto, 2001) p.43-44, 2001/12
  • Non-linear Saturation of Resistive Interchange Mode due to Flattening of Density Profile, T. Unemura,S. Hamaguchi,M. Wakatani, Proceedings of Plasma Science Symposium 2001 and the 18th Symposium on Plasma Processing (PSS-2001/SPP-18)} (ed. by N. Sato and H. Fujiyama: Organization Committee of PSS2001/SPP-18, Kyoto, 2001) p.41-42, 2001/12
  • Low Order Dynamical Models for Ion Temperature Gradient (ITG) Mode, K. Takeda,S. Hamaguchi,M. Wakatani, Proceedings of Plasma Science Symposium 2001 and the 18th Symposium on Plasma Processing (PSS-2001/SPP-18)} (ed. by N. Sato and H. Fujiyama: Organization Committee of PSS2001/SPP-18, Kyoto, 2001) p. 39-40, The Physical Society of Japan, Vol. 55, No. 0, p. 159-159, 2001/12
  • Nonlinear double tearing modes in negative shear tokamaks, M. Sato,S. Hamaguchi,W. Wakatani, Proceedings of Plasma Science Symposium 2001 and the 18th Symposium on Plasma Processing (PSS-2001/SPP-18)} (ed. by N. Sato and H. Fujiyama: Organization Committee of PSS2001/SPP-18, Kyoto, 2001) p. 15-16, The Physical Society of Japan, Vol. 55, No. 0, p. 161-161, 2001/12
  • Reduction of growth rates of high-n ballooning modes due to sheared toroidal flows in tokamaks, M. Furukawa,Y. Nakamura,S. Hamaguchi,M. Wakatani, Proceedings of Plasma Science Symposium 2001 and the 18th Symposium on Plasma Processing (PSS-2001/SPP-18)} (ed. by N. Sato and H. Fujiyama: Organization Committee of PSS2001/SPP-18, Kyoto, 2001) p. 13-14, 2001/12
  • Numerical investigation on plasma and poly-Si etching uniformity control over large area in a resonant inductively coupled plasma source, S. S. Kim,S. Hamaguchi,N. S. Yoon,C. S. Chang,Y. D. Lee,S. H. Ku, Phys. Plasmas 8, 1384-1394, Vol. 8, No. 4, p. 1384-1394, 2001/12
  • Classical interatomic potential functions for Si-O-F and Si-O-Cl systems, H. Ohta,S. Hamaguchi, J. Chem. Phys., 115, 6679-6690, Vol. 115, No. 14, p. 6679-6690, 2001/12
  • Molecular Dynamics Simulation of Silicon and Silicon Dioxide Etching by Energetic Halogen Beams, H. Ohta,S. Hamaguchi, J. Vac. Sci. Tech., A, 19(5), 2373-2381, Vol. 19, No. 5, p. 2373-2381, 2001/12
  • Nonlinear Double Tearing Mode in Negative Shear Cylindrical Tokamaks, M. Sato,S. Hamaguchi,M. Wakatani, J. Phys. Soc. Japan, 70(9), 2578-2587, Vol. 70, No. 9, p. 2578-2587, 2001/12
  • High-n ballooning instabilities in toroidally rotating tokamaks, M. Furukawa,Y. Nakamura,S. Hamaguchi,M. Wakatani, Phys. Plasmas 8(11), 4889-4897, Vol. 8, No. 11, p. 4889-4897, 2001/12
  • Plasma Current Effects on Unstable Resistive Drift-Alfvén Modes in a Magnetized Cylindrical Plasma, Naoaki Miyato,Satoshi Hamaguchi,Masahiro Wakatani, Journal of the Physical Society of Japan, Vol. 70, No. 11, p. 3197-3200, 2001/11
  • サブサーフェスのモデリング・シミュレーション, 浜口智志, 応用物理学関係連合講演会講演予稿集, Vol. 48th, 2001
  • Si-O-F系およびSi-O-Cl系の原子間ポテンシャルを用いたMDシミュレーション, 太田裕朗,浜口智志, 応用物理学関係連合講演会講演予稿集, Vol. 48th, No. 1, 2001
  • 塩素/酸素を用いたシリコンの反応性イオンエッチングの分子動力学による研究, 太田裕朗,浜口智志, 応用物理学会学術講演会講演予稿集, Vol. 62nd, No. 1, 2001
  • Modeling of reactive ion etching for Si/SiO2 systems, S Hamaguchi,H Ohta, SIMULATION OF SEMICONDUCTOR PROCESSES AND DEVICES 2001, SPRINGER-VERLAG WIEN, p. 170-173, 2001
  • Fluid simulation of two-dimensional axially symmetric process plasmas, Ishiwata Hirotaka,Hamaguchi Satoshi, Meeting Abstracts of the Physical Society of Japan, The Physical Society of Japan, Vol. 56, No. 0, p. 180-180, 2001
  • Molecular dynamics evaluation of self diffusion in Yukawa systems, H. Ohta,S. Hamaguchi, Phys. Plasmas 7, 4506-4514, Vol. 7, No. 11, p. 4506-4514, 2000/12
  • Dynamical properties of strongly coupled dusty plasmas, S. Hamaguchi,H. Ohta, Frontiers in Dusty Plasmas (ed. by Y. Nakamura, T. Yokota, and P. K. Shukla: Elsevier Sci., 2000) 135-140, ELSEVIER SCIENCE BV, p. 135-140, 2000/12
  • Resistive Drift-Alfven Instability in a Cylindrical Magnetized Plasma, N. Miyato,S. Hamaguchi,M. Wakatani, Contrib. Plasma Phys. 40, 362-367, Vol. 40, No. 3-4, p. 362-367, 2000/12
  • Resistive Drift-Alfven Instabilities in a Cylindrical Plasma, N. Miyato,S. Hamaguchi,M. Wakatani, J. Phys. Soc. Jpn. 69, 1401-1408, The Physical Society of Japan (JPS), Vol. 69, No. 5, p. 1401-1408, 2000/12
  • Classical plasmas with Yukawa potentials, S. Hamaguchi,H. Ohta, J. Phys. IV France 10, Pr5-19-26, Vol. 10, No. 5, 2000/12
  • Tokamak equilibria with toroidal flows, M. Furukawa,Y. Nakamura,S. Hamaguchi,M. Wakatani, J. Plasma and Fusion Research, 76, 937-948, Vol. 76, No. 9, p. 937-948, 2000/12
  • Wave dispersion relations in Yukawa fluids, H. Ohta,S. Hamaguchi, Phy. Rev. Lett. 84, 6026-6029, Vol. 84, No. 26, p. 6026-6029, 2000/12
  • イントロダクトリートーク-Feature Profile Evolutionのためのプラズマ物理化学とは-, 浜口智志, 応用物理学会学術講演会講演予稿集, Vol. 61st, 2000
  • 酸化シリコンのハロゲンによるエッチングのMDシミュレーション, 太田裕朗,浜口智志, 応用物理学会学術講演会講演予稿集, Vol. 61st, No. 1, 2000
  • 二次元軸対称二周波駆動型RFプラズマプロセシングシステムのPIC/MCCシミュレーション, 春原聡,浜口智志, 応用物理学会学術講演会講演予稿集, Vol. 61st, No. 1, 2000
  • モデリング・シミュレーション, 浜口智志, 第6回プラズマエレクトロにクス・サマースクールテキスト, (社)応用物理学会・プラズマエレクトロニクス分科会, 1999/12
  • Modeling of plasma processing, S. Hamaguch, IBM J. Res. Develop. 43, 199-215, 1999/12
  • Modeling and simulation methods for plasma processing, S. Hamaguchi, IBM Journal of Research and Development, Vol. 43, No. 1-2, p. 199-215, 1999/04
  • Strongly coupled Yukawa plasmasmodels for dusty plasmas and colloidal suspensions, Satoshi Hamaguchi, Plasmas & Ions, 1999
  • Strongly coupled Yukawa plasmas — models for dusty plasmas and colloidal suspensions, S. Hamaguchi, Plasmas &amp; Ions, Elsevier {BV}, Vol. 2, No. 2, p. 57-68, 1999/01
  • Static and dynamic properties of Yukawa systems, S Hamaguchi,H Ohta, INTERNATIONAL CONFERENCE ON PHENOMENA IN IONIZED GASES, VOL IV, PROCEEDINGS, POLISH ACAD SCIENCES, SPACE RESEARCH CENTRE, p. 133-134, 1999
  • Triple point of Yukawa systems, S. Hamaguchi,R. T. Farouki,D. H. E. Dubin, Phys. Rev. E 56, 4671-4682, Vol. 56, No. 4, p. 4671-4682, 1997/12
  • Numerical simulation of etching and deposition processes, S. Hamaguchi,A. A. Mayo,S. M. Rossnagel,D. E. Kotecki,K. R. Milkove,C. X. Wang,C. E. Farrell, Jpn. J. Appl. Phys. 36 4762-4768, Vol. 36, No. 7, p. 4762-4768, 1997/12
  • Across-wafer nonuniformity of long-throw sputter deposition, A. A. Mayo,S. Hamaguchi,J. H. Joo,S. M. Rossnagel, J. Vac. Sci. Tech. B 15, 1788-1793, Vol. 15, No. 5, p. 1788-1793, 1997/12
  • Electrostatic forces of plasma dust grains with position--dependent charges, S. Hamaguch, Comments Plasma Phys. Controlled Fusion 18, 95-101, 1997/12
  • Mathematical methods for thin film deposition simulations, S. Hamaguchi, Modeling of Film Deposition for Microelectronic Applications, ed. by S. M. Rossnagel and A. Ulman,(Academic Press, San Diego 1996), Thin Films, vol. 22, p. 81-115, Vol. 22, No. C, p. 81-115, 1996/12
  • Ionized physical vapor deposition of Cu for high aspect ratio damascene trench fill applications, C. A. Nichols,S. M. Rossnagel,S. Hamaguchi, J. Vac. Sci. Tech. B 14, 3270-3275, Vol. 14, No. 5, p. 3270-3275, 1996/12
  • Phase diagram of Yukawa systems near the one-component-plasma limit revisited, S. Hamaguchi,R. T. Farouki,D. H. E. Dubin, J. Chem. Phys. 105 7641-7647, Vol. 105, No. 17, p. 7641-7647, 1996/12
  • Liner conformality in ionized magnetron sputter metal deposition processes, S. Hamaguchi,S. M. Rossnagel, J. Vac. Sci. Tech. B 14, 2603-2608, Vol. 14, No. 4, p. 2603-2608, 1996/12
  • Thin, high atomic weight refractory film deposition for diffusion barrier, adhesion layer and seed layer applications, S. M. Rossnagel,C. Nichols,S. Hamaguchi,D. Ruzic,R. Turkot, J. Vac. Sci. Tech. B 14, 1819-1827, Vol. 14, No. 3, p. 1819-1827, 1996/12
  • Simulations of trench--filling profiles under ionized magnetron sputter metal deposition, S. Hamaguchi,S. M. Rossnage, J. Vac. Sci. Tech. B, 13, 183-191, Vol. 13, No. 2, p. 183-191, 1995/12
  • Surface-topography simulations of ionized sputter metal deposition, S. Hamaguchi,S. M. Rossnagel, Materials Research Society Symposium - Proceedings, Vol. 389, p. 113-117, 1995
  • Thermodynamics of strongly-coupled Yukawa systems near the OCP limit II. Molecular dynamics simulations, R. T. Farouki,S. Hamaguchi, J. Chem. Phys., 101, 9885-9893, Vol. 101, No. 11, p. 9885-9893, 1994/12
  • Thermodynamics of strongly-coupled Yukawa systems near the OCP limit I.~Derivation of the excess energy, S. Hamaguchi,R. T. Farouki, J. Chem. Phys., 101, 9876-9884, Vol. 101, No. 11, p. 9876-9884, 1994/12
  • Spline approximation of ``effective'' potentials under periodic boundary conditions, R. T. Farouki,S. Hamaguchi, J. Comp. Phys. 115, 276--287, Vol. 115, No. 2, p. 276-287, 1994/12
  • Plasma-particulate interactions in non--uniform plasmas with finite flows, S. Hamaguchi,R. T. Farouki, Phys. Plasmas, 1, 2110-2118, Vol. 1, No. 7, p. 2110-2118, 1994/12
  • Intrinsic and passivation-induced trench tapering during plasma etching, S. Hamaguchi,M. Dalvie, J. Electrochem. Soc., 141, 1964-1972, Vol. 141, No. 7, p. 1964-1972, 1994/12
  • The polarization force on a charged particulate in a non-uniform plasma, S. Hamaguchi,R. T. Farouki, Phys. Rev. E, 49, 4430-4441, Vol. 49, No. 5, p. 4430-4441, 1994/12
  • Micro-profile simulations for plasma etching with surface passivation, S. Hamaguchi,M. Dalvie, J. Vac. Sci. Tech. A 12, 2745-2753, Vol. 12, No. 5, p. 2745-2753, 1994/04
  • Simulation of surface topology evolution during plasma etching by the method of characteristics, J. C. Arnold,H. H. Sawin,M. Dalvie,S. Hamaguchi, J. Vac. Sci. Tech. A12, 620-635, Vol. 12, No. 3, p. 620-635, 1994/04
  • Dynamics of charged particulates in plasmas, S. Hamaguchi,R. T. Farouki, IEEE International Conference on Plasma Science, 1994
  • A shock-tracking algorithm for surface evolution under reactive-ion etching, S. Hamaguchi,M. Dalvie,R. T. Farouki,S. Sethuraman, J. Appl. Phys. 74, 5172-5184, Vol. 74, No. 8, p. 5172-5184, 1993/12
  • Thermal energy of the crystalline one-component plasma from dynamical simulations, R. T. Farouki,S. Hamaguchi, Phys. Rev. E 47, 4330-4336, Vol. 47, No. 6, p. 4330-4336, 1993/12
  • New fluid model for the turbulent transport due to the ion temperature gradient, Chang Bae Kim,Wendell Horton,Satoshi Hamaguchi, Physics of Fluids B, Vol. 5, No. 5, p. 1516-1522, 1993/05
  • ION-TEMPERATURE-GRADIENT-DRIVEN TRANSPORT IN A DENSITY MODIFICATION EXPERIMENT ON THE TOKAMAK FUSION TEST REACTOR - REPLY, HORTON W,LINDBERG D,KIM JY,DONG JQ,HAMMETT GW,SCOTT SD,ZARNSTORFF MC,HAMAGUCHI S, PHYSICS OF FLUIDS B-PLASMA PHYSICS, Vol. 5, No. 3, p. 1034-1035, 1993/03
  • Ion temperature gradient driven transport in a density modification experiment on the Tokamak Fusion Test Reactor, W. Horton,D. Lindberg,J. Y. Kim,J. Q. Dong,Q. W. Hammet,S. D. Scott,M. C. Zarnstorff,S. Hamaguchi, Phys. Fluids B 4, 953-966, Vol. 4, No. 4, p. 953-966, 1992/12
  • Dynamical N-body simulations of Coulomb scattering in plasma sheaths, R. T. Farouki,S. Hamaguchi,M. Dalvie,M. Surendra, Phys. Rev. A 46, 7815-7829, Vol. 46, No. 12, p. 7815-7829, 1992/12
  • Self-consistent Monte-Carlo simulation of the cathode fall including treatment of negative glow electrons, M. Dalvie,S. Hamaguchi,R. T. Farouki, Phys. Rev. A 46, 1066-1077, Vol. 46, No. 2, p. 1066-1077, 1992/12
  • Analysis of a kinematic model for ion transport in RF plasma sheaths, R. T. Farouki,S. Hamaguchi,M. Dalvie, Phys. Rev. A 45, 5913-5928, Vol. 45, No. 8, p. 5913-5928, 1992/12
  • The ponderomotive force and ion energy distribution in an RF sheath, S. Hamaguchi,R. T. Farouki,M. Dalvie, Phys. Rev. Lett. 68 44-47, Vol. 68, No. 1, p. 44-47, 1992/12
  • Ion energetics in collisionless sheaths of RF process plasmas, S. Hamaguchi,R. T. Farouki,M. Dalvie, Phys. Fluids B 4, 2362-2367, Vol. 4, No. 7, p. 2362-2367, 1992/12
  • Effects of sheared flows on ion temperature gradient driven turbulence, S. Hamaguchi,W. Horton, Phys. Fluids B 4, 319-328, Vol. 4, No. 2, p. 319-328, 1992/12
  • Hydrodynamic analysis of electron motion in the cathode fall using a Monte Carlo simulation, M. Dalvie,S. Hamaguchi,R.T. Farouki,M. Surendra, J. Appl. Phys. 72, 2620-2631, Vol. 72, No. 7, p. 2620-2631, 1992/12
  • Phase transitions of dense systems of charged ``dust'' grains in plasmas, R. T. Farouki,S. Hamaguchi, Appl. Phys. Lett. 61, 2973-2975, Vol. 61, No. 25, p. 2973-2975, 1992/12
  • Transition from resistive-g to eta_i driven turbulence in stellarator systems, B. G. Hong,W. Horton,S. Hamaguchi,M. Wakatani,M. Yagi,H. Sugama, Phys. Fluids B 3, 1638-1643, Vol. 3, No. 7, p. 1638-1643, 1991/12
  • Monte Carlo simulations of space-charge-limited ion transport through collisional plasma sheaths, R. T. Farouki,S. Hamaguchi,M. Dalvie, Phys. Rev. A 44, 2664-2681, Vol. 44, No. 4, p. 2664-2681, 1991/12
  • The Ion distribution function in a weakly collisional sheath, S. Hamaguchi,R. T. Farouki,M. Dalvie, Phys. Rev. A 44, 3804-3821, p. 137-138, 1991/12
  • Flux considerations in the coupling of Monte Carlo plasma sheath simulations with feature evolution models, M. Dalvie,R. T. Farouki,S. Hamaguchi, IEEE Trans. Electron Devices 39, 1090-1099, Vol. 39, No. 5, p. 1090-1099, 1991/12
  • Ion distribution function in a weakly collisional sheath, S. Hamaguchi,R. T. Farouki,M. Dalvie, Physical Review A, Vol. 44, No. 6, p. 3804-3821, 1991/09
  • Flux integration in 2D vs. 3D feature evolution models of plasma processing, Manoj Dalvie,Rida T. Farouki,Satoshi Hamaguchi, 1991
  • Nonlinear behavior of magnetohydrodynamic modes near marginally stable state, N. Nakajima,S. Hamaguchi, Phys. Fluids B 2, 1184-1189, 1990/12
  • Wave particle power transfer in a steady state driven system, H. L. Berk,B. N. Breizman,S. Hamaguchi, Phys. Fluids B 2, 3212-3214, Vol. 2, No. 12, p. 3212-3214, 1990/12
  • Ion temperature gradient driven turbulence in the weak density gradient limit, S. Hamaguchi,W. Horton, Phys. Fluids B 2, 3040-3046, Vol. 2, No. 12, p. 3040-3046, 1990/12
  • Fluctuation spectrum and transport from ion temperature gradient driven modes in sheared magnetic fields, S. Hamaguchi,W. Horton, Phys. Fluids B 2, 1833-1851, Vol. 2, No. 8, p. 1833-1851, 1990/12
  • Nonlinear behavior of magnetohydrodynamic modes near marginally stable states. II. Application to the resistive fast interchange mode, Noriyoshi Nakajima,Satoshi Hamaguchi, Physics of Fluids B, Vol. 2, No. 6, p. 1184-1189, 1990/06
  • Modelling of drift wave turbulence with a finite ion temperature gradient, S. Hamaguchi,W. Horton, Plasma Phys. Control. Fusion 34 No 2 203-233, Vol. 34, No. 2, p. 203-233, 1990/02
  • Nonlinear development of η<sub>i</sub>-mode and effects of radial electric field on it., 中島徳嘉,浜口智志,HORTON W, プラズマ・核融合学会秋季講演会予稿集, Vol. 7th, 1990
  • Theory of long-period magnetic pulsations, S. Hamaguchi,W. Grossmann, Courant Institute of Mathematical Sciences, MF-120, Courant Institute of Mathematical Sciences, MF-120, 1989/12
  • Anomalous transport arising from nonlinear resistive pressure-driven modes in a plasma, S. Hamaguchi, Phys. Fluids B 1, 1416-1430, Vol. 1, No. 7, p. 1416-1430, 1989/12
  • Summary of very low-q discharges in Toriut tokamaks, H. Yamada,S. Hamaguchi,K. Hattori,Y. Kamada,M. Kikuchi,J. Morikawa,H. Nihei,Z. Yoshida,N. Inoue, Kakuyugo Kenkyu, 56, 341-354, Japan Society of Plasma Science and Nuclear Fusion Research, Vol. 56, No. 5, p. 341-354, 1986/12
  • Selective acceleration of NBI-injected fast ion cyclotron wave in a tokomak plasma, Y. Murakami,K. Itami,S. Ishida,N. Suzuki,S. Hamaguchi,H. Yamada,H. Nihei,Morikawa,Z. Yoshida,N. Inoue, Jpn. J. Appl. Phys., 25, 1045-1047, Vol. 25, No. 7, p. 1045-1048, 1986/12
  • Helically assisted low-q tokamak with l = 2 helical winding, S. Hamaguchi,H. Yamada,Z. Yoshida,Y. Kamada,K. Hattori,N. Inoue,T. Uchida, Jpn. J. Appl. Phys., 23, 505-507, Vol. 23, No. 7, p. L505-L508, 1984/12
  • Shrinkage of a tokamak current channel by external ergodization, K. Hattori,Y. Seike,Z. Yoshida,S. Hamaguchi,H. Yamada,N. Suzuki,K. Itami,Y. Kamada,N. Inoue,T. Uchida, J. Nucl. Mater., 121, 368-373, Vol. 121, No. C, p. 368-373, 1984/12
  • 低q領域における破壊的不安定性の抑制, 吉田善章,岡野邦彦,清家裕次郎,伊丹潔,鈴木信治,山田弘司,浜口智志,井上信幸,内田たい二郎, 核融合研究, Vol. 49, No. 3, 1983

Misc.

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  • Surface fluorination of Y<sub>2</sub>O<sub>3</sub> irradiated by low energy CF<sub>3</sub><sup>+</sup> ion and F<sup>+</sup> ion, Kang Hojun,Ito Tomoko,Um Junghwan,Kokura Hikaru,Kang Taekyun,Cho Sungil,Park Hyunjung,Karahashi Kazuhiro,Hamaguchi Satoshi, JSAP Annual Meetings Extended Abstracts, The Japan Society of Applied Physics, Vol. 2020.2, p. 1132-1132, 2020/08/26
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  • Desorption reaction in halogenated layer by low energy ion irradiation, Karahashi Kazuhiro,Ito Tomoko,Hamaguchi Satoshi, JSAP Annual Meetings Extended Abstracts, The Japan Society of Applied Physics, Vol. 2020.1, p. 1586-1586, 2020/02/28
  • Surface Reactions of Plasma assisted Atomic Layer Etching for Silicon, 唐橋一浩,浜口智志, 表面と真空, The Japan Society of Vacuum and Surface Science, Vol. 63, No. 12, p. 616-622, 2020
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  • Prediction of Plasma Etching Yields by Machine Learning, Vol. 95, No. 11, p. 542-547, 2019/11
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  • 小特集 プラズマ・インフォマティクス:データ駆動科学のプラズマへの応用 6. まとめ, 浜口 智志, プラズマ・核融合学会誌, Vol. 95, p. 560-561, 2019
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  • 小特集 プラズマ・インフォマティクス:データ駆動科学のプラズマへの応用 1. はじめに, 浜口 智志, プラズマ・核融合学会誌, Vol. 95, p. 535-536, 2019
  • Surface reaction mechanisms of plasma processes for semiconductor device manufacturing, Hamaguchi Satoshi, Abstract book of Annual Meeting of the Japan Society of Vacuum and Surface Science, The Japan Society of Vacuum and Surface Science, Vol. 2019, No. 0, 2019
  • SiO<sub>2</sub> and Si etching reactions by SFx<sup> +</sup> ion bombardment, Karahashi Kazuhiro,Ito Tomoko,Hashimoto Junichi,Omura Mitsuhiro,Hayashi Hisataka,Hamaguchi Satoshi, JSAP Annual Meetings Extended Abstracts, The Japan Society of Applied Physics, Vol. 2018.2, p. 1740-1740, 2018/09/05
  • Atomic Layer Etching: its Science and Technologies, Hamaguchi Satoshi,Ito Tomoko,Isobe Michiro,Karahashi Kazuhiro, JSAP Annual Meetings Extended Abstracts, The Japan Society of Applied Physics, Vol. 2018.2, p. 257-257, 2018/09/05
  • Discussion and Summary, Hamaguchi Satoshi, JSAP Annual Meetings Extended Abstracts, The Japan Society of Applied Physics, Vol. 2018.2, p. 135-135, 2018/09/05
  • Opening: Goal of the Symposium, Hamaguchi Satoshi, JSAP Annual Meetings Extended Abstracts, The Japan Society of Applied Physics, Vol. 2018.2, p. 128-128, 2018/09/05
  • Theory and Numerical Simulation of Plasma-Liquid Interaction, Vol. 42, No. 3, p. 118-123, 2018/05
  • プラズマ表面処理を用いた官能基修飾によるバイオマテリアルの生体親和性向上, 大野一平,伊藤智子,A.H Anjar,杉本敏司,小玉城,千々松良太,海渡貴司,朝森千永子,浜口智志, プラズマ・核融合学会年会(Web), Vol. 35th, 2018
  • Ab initio DFT Study on Surface Reaction Mechanisms of Acetyl Acetone on Ni and NiO Surfaces, Nakamura Kana,Basher Abdulrahman H.,Ito Tomoko,Karahashi Kazuhiro,Hamaguchi Satoshi,Takeuchi Takae, Abstract of annual meeting of the Surface Science of Japan, The Japan Society of Vacuum and Surface Science, Vol. 2018, No. 0, p. 122-122, 2018
  • 症例 長期の経過を経て間質性肺炎が亜急性に進行した抗MDA5 抗体陽性皮膚筋炎の1 例, 澤田 香織,伊川 友香,前田 進太郎,松下 貴史,濱口 儒人,竹原 和彦,渡辺 知志,牧野 智,東 晃, 皮膚科の臨床, 金原出版, Vol. 59, No. 12, p. 1873-1877, 2017/11/01
  • Control of ITO etch rate by using Hydrogen-induced Modified Layer, Hirata Akiko,Fukasawa Masanaga,Nagahata Kazunori,Li Hu,Ito Tomoko,Karahashi Kazuhiro,Hamaguchi Satoshi,Tatsumi Tetsuya, JSAP Annual Meetings Extended Abstracts, The Japan Society of Applied Physics, Vol. 2017.2, p. 1760-1760, 2017/08/25
  • Analysis of Etching Mechanisms on of ZnO pretreated by He<sup>+</sup> Ion Irradiation, LI HU,Ito Tomoko,Karahashi Kazuhiro,Fukasawa Masanaga,Hirata Akiko,Kazunori Nagahata,Tatsumi Tetsuya,Hamaguchi Satoshi, JSAP Annual Meetings Extended Abstracts, The Japan Society of Applied Physics, Vol. 2017.2, p. 1751-1751, 2017/08/25
  • Molecular dynamics simulation of SiO<sub>2</sub> atomic layer etching by fluorocarbon plasmas and Ar plasmas, Okada Yuki,Isobe Michiro,Hamaguchi Satoshi, JSAP Annual Meetings Extended Abstracts, The Japan Society of Applied Physics, Vol. 2017.2, p. 1762-1762, 2017/08/25
  • Surface composition analysis of SiN/SiO<sub>2</sub> deep holes fabricated by plasma etching, Iwase Taku,Karahashi Kazuhiro,Hamaguchi Satoshi, JSAP Annual Meetings Extended Abstracts, The Japan Society of Applied Physics, Vol. 2017.2, p. 1759-1759, 2017/08/25
  • Numerical Simulation of Concentration Distribution of Plasma-generated Hypochlorous Acid at the Plasma-liquid Interface, Ikuse Kazumasa,Hamaguchi Satoshi, JSAP Annual Meetings Extended Abstracts, The Japan Society of Applied Physics, Vol. 2017.2, p. 1830-1830, 2017/08/25
  • 1590 オゾン水による建物内装材表面汚染物質の除去効果に関する研究, 佐々木 静郎,浜口 智志,伊藤 智子,須山 喜美,村上 栄造,宇井 衞, 材料施工, 日本建築学会, Vol. 2017, No. 2017, p. 1179-1180, 2017/07/20
  • 41323 弱アルカリ電解水による室内臭低減に関する研究, 村上 栄造,伊藤 智子,浜口 智志,須山 喜美, 環境工学II, 日本建築学会, Vol. 2017, No. 2017, p. 691-692, 2017/07/20
  • The 2017 Plasma Roadmap: Low temperature plasma science and technology, I. Adamovich,S. D. Baalrud,A. Bogaerts,P. J. Bruggeman,M. Cappelli,V. Colombo,U. Czarnetzki,U. Ebert,J. G. Eden,P. Favia,D. B. Graves,S. Hamaguchi,G. Hieftje,M. Hori,I. D. Kaganovich,U. Kortshagen,M. J. Kushner,N. J. Mason,S. Mazouffre,S. Mededovic Thagard,H. R. Metelmann,A. Mizuno,E. Moreau,A. B. Murphy,B. A. Niemira,G. S. Oehrlein,Z. Lj Petrovic,L. C. Pitchford,Y. K. Pu,S. Rauf,O. Sakai,S. Samukawa,S. Starikovskaia,J. Tennyson,K. Terashima,M. M. Turner,M. C.M. Van De Sanden,A. Vardelle, Journal of Physics D: Applied Physics, Vol. 50, No. 32, 2017/07/14
  • Etching of amorphous carbon layer (a-C) by fluorine and fluorocarbon ions (F<sup>+</sup>, CF<sup>+</sup>, CF<sub>3</sub><sup>+</sup>), Karahashi Kazuhiro,Li Hu,Yamada Kentaro,Ito Tomoko,Numazawa Satoshi,Machida Ken,Ishikawa Kiyoshi,Hamaguchi Satoshi, JSAP Annual Meetings Extended Abstracts, The Japan Society of Applied Physics, Vol. 2017.1, p. 1753-1753, 2017/03/01
  • First Principle Study on the Effects of Hydrogen on Transparent Conducting Oxide Etching, LI HU,Friederich Pascal,Fink Karin,Wenzel Wolfgang,Karahashi Kazuhiro,Fukasawa Masanaga,Nagahata Kazunori,Tatsumi Tetsuya,Hamaguchi Satoshi, JSAP Annual Meetings Extended Abstracts, The Japan Society of Applied Physics, Vol. 2017.1, p. 1760-1760, 2017/03/01
  • Effects of He<sup>+</sup> ion irradiation on the Etching of Transparent Conduction Oxides, LI HU,Karahashi Kazuhiro,Fukasawa Masanaga,Nagahata Kazunori,Tatsumi Tetsuya,Hamaguchi Satoshi, JSAP Annual Meetings Extended Abstracts, The Japan Society of Applied Physics, Vol. 2017.1, p. 1759-1759, 2017/03/01
  • Surface Reaction Analysis of SiN Etching with Hydrogen Radicals using MD Simulation, SUGANO RYOKO,ISOBE MICHIRO,HAMAGUCHI SATOSHI, JSAP Annual Meetings Extended Abstracts, The Japan Society of Applied Physics, Vol. 2017.1, p. 1762-1762, 2017/03/01
  • 分子動力学シミュレーションによるプラズマプロセス表面反応機構解析(キーノートスピーチ), 浜口 智志, 精密工学会学術講演会講演論文集, 公益社団法人 精密工学会, Vol. 2017, No. 0, p. 253-254, 2017
  • Molecular dynamics simulation of damage formation in Ni due to H<sup>+</sup> ion bombardment, Trung Phung,Isobe Michiro,Morikawa Yoshitada,Inagaki Kouji,Hamaguchi Satoshi, Proceedings of JSPE Semestrial Meeting, The Japan Society for Precision Engineering, Vol. 2017, No. 0, p. 257-258, 2017
  • Plasma-Liquid Interactions: A Review and Roadmap, P.J. Bruggeman,M.J. Kushner,B.R. Locke,J.G.E. Gardeniers,W.G. Graham,D.B. Graves,R.C. Hofman-Caris,D. Maric,J.P. Reid,E. Ceriani,D. Fernandez Rivas,J. E. Foster,S.C. Garrick,Y. Gorbanev,S. Hamaguchi,F. Iza,J. Kolb,F. Krcma,P. Lukes,Z. Machala,I. Marinov,D. Mariotti,S. Mededovic Thagard,D. Minakata,E. Neyts,J. Pawlat,Z.Lj. Petrovic,R. Pfieger,S. Reuter,D.C. Schram,S. Schroter,M. Shiraiwa,B. Tarabová,H. Tresp,P. Tsai,J. Verlet,T. von Woedtke,E. Vyhnankova,K.R. Wilson,K. Yasui,G. Zvereva, Plasma Sources Sci. Technol., Vol. 25, No. 5, 2016/12
  • Analyses of Ni sputtering by energetic ions from CO plasmas, Kumamoto Akito,Mauchamp Nicolas,Isobe Michiro,Mizotani Kohei,Li Hu,Ito Tomoko,Karahashi Kazuhiro,Hamaguchi Satoshi, JSAP Annual Meetings Extended Abstracts, The Japan Society of Applied Physics, Vol. 2016.2, p. 1691-1691, 2016/09/01
  • Chemical Effects of Hydrogen Ion Irradiation on ITO Etching by Hydrocarbon Plasma, LI HU,Karahashi Kazuhiro,Fukasawa Masanaga,Nagahata Kazunori,Tatsumi Tetsuya,Hamaguchi Satoshi, JSAP Annual Meetings Extended Abstracts, The Japan Society of Applied Physics, Vol. 2016.2, p. 1690-1690, 2016/09/01
  • Molecular dynamics simulation of surface reactions in atomic layer etching (ALE) of SiN, SUGANO RYOKO,ISOBE MICHORO,HAMAGUCHI SATOSHI, JSAP Annual Meetings Extended Abstracts, The Japan Society of Applied Physics, Vol. 2016.2, p. 1687-1687, 2016/09/01
  • Numerical Simulation of Aqueous Electron Reactions near the Gas-Liquid Interface by Plasma Irradiation on a Water Surface, Ikuse Kazumasa,Hamaguchi Satoshi, JSAP Annual Meetings Extended Abstracts, The Japan Society of Applied Physics, Vol. 2016.2, p. 1756-1756, 2016/09/01
  • プラズマの医療応用と医療材料の表面処理技術, 浜口智志, 光技術コンタクト, 光学工業技術協会, Vol. 54, No. 4, p. 9-18, 2016/04
  • Hydrogen-damage-layer effects on ITO etching by H<sub>2</sub>/Ar plasma, Hirata Akiko,Fukasawa Masanaga,Shigetoshi Takushi,Okamoto Masaki,Nagahata Kazunori,Li Hu,Hamaguchi Satoshi,Tatsumi Tetsuya, JSAP Annual Meetings Extended Abstracts, The Japan Society of Applied Physics, Vol. 2016.1, p. 1709-1709, 2016/03/03
  • Analyses of aerosol-particle collection mechanisms using an ionic wind, Ito Tomoko,Chen Longwei,Hamaguchi Satoshi, JSAP Annual Meetings Extended Abstracts, The Japan Society of Applied Physics, Vol. 2016.1, p. 1791-1791, 2016/03/03
  • Numerical Simulations of Plasma-generated Chemical Species and Induced Metabolic Responses, Ikuse Kazumasa,Hamaguchi Satoshi, JSAP Annual Meetings Extended Abstracts, The Japan Society of Applied Physics, Vol. 2016.1, p. 1767-1767, 2016/03/03
  • Numerical Simulation for Generation and Transport of Liquid-Phase Chemically Reactive Species that Potentially Trigger Biological Activities, IKUSE Kazumasa,HAMAGUCHI Satoshi, Vol. 91, No. 12, p. 780-784, 2015/12
  • Indium implantation onto zeolite for development of novel catalysts with a ion beam system, Satoru Yoshimura,Masato Kiuchi,Yoshihiro Nishimoto,Makoto Yasuda,Akio Baba,Yoshiaki Mokuno,Satoshi Sugimoto,Satoshi Hamaguchi, Journal of Smart Processing -for Materials, Environment & Energy-, スマートプロセス学会, Vol. 4, No. 5, p. 228-233, 2015/09
  • Molecular dynamics simulation analyses of the mechanisms of SiN etching by simultaneous incidence of hydrogen radicals and hydrocarbon ions (CH<sub>x</sub><sup>+</sup>), Murakami Yuichi,Isobe Michiro,Miyake Keita,Fukasawa Masanaga,Nagahata Kazunori,Tatsumi Tetsuya,Hamaguchi Satoshi, JSAP Annual Meetings Extended Abstracts, The Japan Society of Applied Physics, Vol. 2015.2, p. 1669-1669, 2015/08/31
  • Hydrogen-damage-layer effects on ZnO etching by CH<sub>4</sub> plasma, LI HU,Karahashi Kazuhiro,Fukasawa Masanaga,Nagahata Kazunori,Tatsumi Tetsuya,Hamaguchi Satoshi, JSAP Annual Meetings Extended Abstracts, The Japan Society of Applied Physics, Vol. 2015.2, p. 1668-1668, 2015/08/31
  • Generation of ozone water by water discharge, Ito Tomoko,Murakami Eizo,Matsutani Teruo,Hamaguchi Satoshi, JSAP Annual Meetings Extended Abstracts, The Japan Society of Applied Physics, Vol. 2015.2, p. 1731-1731, 2015/08/31
  • 高度物理刺激と生体反応(1) ― 第1章 高度物理刺激の生成法と計測・予測 ―, 佐藤岳彦,金澤誠司,浜口智志,小宮敦樹, 機械の研究, 養賢堂, Vol. 67, No. 8, p. 673-683, 2015/07
  • Effects of hydrogen reaction in SiN etching by hydrofluorocarbon (HFC) plasma: molecular dynamics simulation analysis, Murakami Yuichi,Isobe Michiro,Miyake Keita,Fukasawa Masanaga,Nagahata Kazunori,Tatsumi Tetsuya,Hamaguchi Satoshi, JSAP Annual Meetings Extended Abstracts, The Japan Society of Applied Physics, Vol. 2015.1, p. 1668-1668, 2015/02/26
  • Effects of hydrogen radicals on etching reactions of transparent conducting oxides, Li Hu,Karahashi Kazuhiro,Fukasawa Masanaga,Kazunori Nagahata,Tetsuya Tatsumi,Satoshi Hamaguchi, JSAP Annual Meetings Extended Abstracts, The Japan Society of Applied Physics, Vol. 2015.1, p. 1665-1665, 2015/02/26
  • Analysis of Amino Group Formation on Polystyrene Surfaces by Nitrogen-Hydrogen Plasma Irradiation, goto kensaku,itsuki dai,isobe michiro,sugimoto satoshi,hamaguchi satoshi, JSAP Annual Meetings Extended Abstracts, The Japan Society of Applied Physics, Vol. 2015.1, p. 1660-1660, 2015/02/26
  • Etching reaction of magnetic materials by CO cluster injection (2), Karahashi Kazuhiro,Seki Toshio,Matsuo Jiro,Hamaguchi Satashi, JSAP Annual Meetings Extended Abstracts, The Japan Society of Applied Physics, Vol. 2015.1, p. 1664-1664, 2015/02/26
  • Numerical Simulation of Convective Transport of Reactive Species in Water Generated by an Atmospheric-Pressure Plasma, Ikuse Kazumasa,Hamaguchi Satoshi, JSAP Annual Meetings Extended Abstracts, The Japan Society of Applied Physics, Vol. 2015.1, p. 1711-1711, 2015/02/26
  • 高 度 物 理 刺 激 と 生 体 反 応, 浜口 智志, 機械の研究, Vol. 67, 2015
  • 17th International Congress on Plasma Physics, Vol. 90, No. 12, p. 837-839, 2014/12
  • Analyses of chemical effects of CH+ and CH3+ on etching processes of transparent conducting films, Li Hu,Karahashi Kazuhiro,Fukasawa Masanaga,Nagahata Kazunori,Tatsumi Tetsuya,Hamaguchi Satoshi, JSAP Annual Meetings Extended Abstracts, The Japan Society of Applied Physics, Vol. 2014.2, p. 1615-1615, 2014/09/01
  • Surface modification for cell culture plates by plasmas, Itsuki Dai,Sugimoto Satoshi,Miyamoto Satoshi,Myoui Akira,Yoshikawa Hideki,Hamaguti Satoshi, JSAP Annual Meetings Extended Abstracts, The Japan Society of Applied Physics, Vol. 2014.2, p. 2610-2610, 2014/09/01
  • Sterilization technology by low-temperature atmospheric-pressure plasmas, 伊藤智子,浜口智志, 空気清浄, Vol. 52, No. 4, p. 295-304, 2014/04
  • Etching reactions for transparent conducting films by CHx ions, Li Hu,Muraki Yu,Karahashi Kazuhiro,Fukasawa Masanaga,Nagahata Kazunori,Tatsumi Tetsuya,Hamaguchi Satoshi, JSAP Annual Meetings Extended Abstracts, The Japan Society of Applied Physics, Vol. 2014.1, p. 1659-1659, 2014/03/03
  • Effects of metal carbonyls formation during ferromagnetic metal etching processes, Mizotani Kohei,Miyake Keita,Isobe Michiro,Karahashi Kazuhiro,Hamaguchi Satoshi, JSAP Annual Meetings Extended Abstracts, The Japan Society of Applied Physics, Vol. 2014.1, p. 1658-1658, 2014/03/03
  • Etching reactions for Si, SiO2 and SiN by SiBrx ions, karahashi kazuhiro,muraki yu,li hu,matsukuma masaaki,hamaguchi satoshi, JSAP Annual Meetings Extended Abstracts, The Japan Society of Applied Physics, Vol. 2014.1, p. 1666-1666, 2014/03/03
  • Generation and evaluation of CO clusters for cluster beams, karahashi kazuhiro,seki toshio,matsuo jiro,hamaguchi satoshi, JSAP Annual Meetings Extended Abstracts, The Japan Society of Applied Physics, Vol. 2014.1, p. 1667-1667, 2014/03/03
  • Mass spectrometry study on ions of atmospheric-pressure plasma jets, Ito Tomoko,Sekimoto Kanako,Hamaguchi Satoshi, JSAP Annual Meetings Extended Abstracts, The Japan Society of Applied Physics, Vol. 2014.1, p. 1713-1713, 2014/03/03
  • Numerical simulation of chemical reactions and diffusion of reactive species in liquid generated by an atmospheric-pressure plasma, Ikuse Kazumasa,Hamaguchi Satoshi, JSAP Annual Meetings Extended Abstracts, The Japan Society of Applied Physics, Vol. 2014.1, p. 1729-1729, 2014/03/03
  • Concept of Research Network on Non-Equilibrium and Extreme State Plasma : New Research System of Plasma Physical Science, FUJISAWA Akihide,ITOH Kimitaka,ITOH Sanae-I.,UESUGI Yoshihiko,OHNO Noriyasu,KANEKO Toshiro,KODAMA Ryosuke,SHIRATANI Masaharu,TANAKA Kazuo A.,HATAKEYAMA Rikizo,HAMAGUCHI Satoshi,YONEDA Hitoki, Vol. 90, No. 3, p. 177-182, 2014/03
  • 30aAE-12 Numerical analyses of plasma-nanosurface interactions, Mizotani Kohei,Isobe Michiro,Hamaguchi Satoshi, Meeting Abstracts of the Physical Society of Japan, The Physical Society of Japan, Vol. 69, No. 0, p. 279-279, 2014
  • プラズマ医療の最新動向, 浜口智志, ケミカルエンジニヤリング, 化学工業社, Vol. 58, No. 12, p. 915-921, 2013/04
  • Hydrogen plasma exposure of polymethylmethacrylate and etching by low energy Ar+ ion, S. Yoshimura,K. Ikuse,S. Sugimoto,K. Murai,M. Kiuchi,S. Hamaguchi, Journal of the Vacuum Society of Japan, The Vacuum Society of Japan, Vol. 56, No. 4, p. 129-132, 2013/04
  • 27aEA-7 Physics of free radicals in plasmas and their application to medicine, Hamaguchi Satoshi, Meeting Abstracts of the Physical Society of Japan, The Physical Society of Japan, Vol. 68, No. 0, p. 278-278, 2013
  • 希ガスイオン照射による水酸化マグネシウムのスパッタ率測定, 幾世和将,吉村智,木内正人,木内正人,寺内正治,西谷幹彦,西谷幹彦,浜口智志, 応用物理学会学術講演会講演予稿集(CD-ROM), Vol. 73rd, 2012
  • Introduction : Overview of Atomic and Molecular Databases and their Applications for Plasma Research, MURAKAMI Izumi,OSAKABE Masaki,IKEDA Katsunori,NISHIURA Masaki,ODA Akinori,SUGAWARA Hirotake,HAMAGUCHI Satoshi, Vol. 88, No. 1, p. 35-47, 2012/01
  • Interaction of Plasmas with Biological Objectsin Plasma Medicine, HAMAGUCHI Satoshi, Journal of plasma and fusion research, Vol. 87, No. 10, p. 696-703, 2011/10
  • 国際宇宙ステーションにおける微粒子プラズマ実験の次期計画—Next plan for experiments of fine-particle plasma in international space station, 林, 康明,佐藤, 徳芳,高橋, 和生,東辻, 浩夫,渡辺, 征夫,石原, 修,三重野, 哲,上村, 鉄雄,飯塚, 哲,濱口, 智志,足立, 聡,高柳, 昌弘,Hayashi, Yasuaki,Sato, Noriyoshi,Takahashi, Kazuo,Totsuji, Hiroo,Watanabe, Yukio,Ishihara, Osamu,Mieno, Tetsu,Kamimura, Tetsuo,Iizuka, Satoru,Hamaguchi, Satoshi,Adachi, Satoshi,Takayanagi, Masahiro, 宇宙利用シンポジウム: 第27回: 平成22年度 = Space Utilization Research, Vol. 27 2011: Proceedings of The Twenty-seventh Space Utilization Symposium, 宇宙航空研究開発機構宇宙科学研究所 (JAXA)(ISAS), Vol. 27, p. 11-12, 2011/03
  • 第1部基礎編, 浜口智志編, プラズマ原子分子過程ハンドブック, 大阪大学出版会, 2011
  • 大気圧低温プラズマによる神経細胞ネットワーク用細胞外マトリックスパターニング技術の開発, 安藤あゆみ,宇野秀隆,浅野豪文,手老龍吾,北野勝久,宇理須恒雄,浜口智志, 応用物理学関係連合講演会講演予稿集(CD-ROM), Vol. 58th, 2011
  • テラヘルツ時間領域分光法を用いた反応性プラズマの先駆的診断手法の開発, 北野勝久,安藤あゆみ,北原英明,萩行正憲,浜口智志, 大阪大学レーザーエネルギー学研究センター共同利用・共同研究成果報告書, Vol. 2010, 2011
  • Arrangement of PC12 cells on a silicon chip via extracellular matrix (ECM) layer patterning by atmospheric pressure plasmas, Ayumi Ando,Hidetaka Uno,Toshifumi Asano,Tsuneo Urisu,Satoshi Hamaguchi, Plasma and Fusion Research, Vol. 6, No. 2011, 2011
  • プラズマ誘起フリーラジカルによる液体殺菌, 北野勝久,井川聡,谷篤史,大西直文,浜口智志, 電気学会全国大会講演論文集, Vol. 2010, No. 1, 2010
  • 大気圧プラズマによる細胞外マトリックス膜パターニング技術の開発, 安藤あゆみ,浅野豪文,手老龍吾,北野勝久,宇理須恒雄,浜口智志, 応用物理学関係連合講演会講演予稿集(CD-ROM), Vol. 57th, 2010
  • プラズマ液体プロセスにおける液中イオン・ラジカル生成機構, 北野勝久,米森星矢,谷篤史,井川聡,大西直文,荒川隆一,浜口智志, 応用物理学関係連合講演会講演予稿集(CD-ROM), Vol. 57th, 2010
  • テラヘルツ時間領域分光法を用いた反応性プラズマの先駆的診断手法の開発, 北野勝久,安藤あゆみ,北原英明,萩行正憲,浜口智志, 大阪大学レーザーエネルギー学研究センター共同利用・共同研究成果報告書, Vol. 2009, 2010
  • 大気圧プラズマによる神経細胞ネットワークチップ用細胞外マトリックスパターニング, 安藤あゆみ,浅野豪文,手老龍吾,北野勝久,宇理須恒雄,浜口智志, プラズマ・核融合学会年会(Web), Vol. 27th, 2010
  • 第3回ITER国際夏の学校(IISS-2009), 浜口 智志, プラズマ・核融合学会誌 = Journal of plasma and fusion research, Vol. 85, No. 11, p. 799-799, 2009/11/25
  • Analyses of Hard Carbon Film Formation Mechanisms by Molecular Dynamics Simulations, MURAKAMI Yasuo,HAMAGUCHI Satoshi, Journal of plasma and fusion research, Vol. 85, No. 10, p. 674-679, 2009/10/25
  • Generation of free radicals in liquids by low-temperature atmospheric-pressure plasmas, KITANO Katsuhisa,TANI Atsushi,IKAWA Satoshi,OHNISHI Naofumi,HAMAGUCHI Satoshi, 電気学会プラズマ研究会資料, Vol. 2009, No. 103, p. 19-22, 2009/09/05
  • Bacteria inactivation by free radicals in liquid in contact with plasma, IKAWA Satoshi,KITANO Katsuhisa,TANI Atsushi,OHNISHI Naofumi,HAMAGUCHI Satoshi, 電気学会プラズマ研究会資料, Vol. 2009, No. 103, p. 23-26, 2009/09/05
  • 冷たいプラズマによる液中化学反応--重合から殺菌まで, 北野 勝久,浜口 智志, 現代化学, 東京化学同人, No. 460, p. 25-31, 2009/07
  • Sterilization by atmospheric pressure plasma devices of small size, Bio industry, Vol. 26, No. 6, p. 16-22, 2009/06
  • Atomic Scale Assessment of Surface Reactions in Dry Etching Processing, HAMAGUCHI Satoshi, Journal of plasma and fusion research, Vol. 85, No. 4, p. 177-184, 2009/04/25
  • 微小重力微粒子プラズマ実験装置—Experimental systems of fine-particle plasmas under microgravity, 林, 康明,高橋, 和生,東辻, 浩夫,石原, 修,飯塚, 哲,三重野, 哲,上村, 鉄雄,白谷, 正治,濱口, 智志,佐藤, 徳芳,渡辺, 征夫,足立, 聡,高柳, 昌弘,Hayashi, Yasuaki,Takahashi, Kazuo,Totsuji, Hiroo,Ishihara, Osamu,Iizuka, Satoru,Mieno, Tetsu,Uemura, Tetsuo,Shiratani, Masaharu,Hamaguchi, Satoshi,Sato, Noriyoshi,Watanabe, Yukio,Adachi, Satoshi,Takayanagi, Masahiro, 宇宙利用シンポジウム = Space Utilization Research: Proceedings of Space Utilization Symposium, 宇宙航空研究開発機構宇宙科学研究本部, Vol. 25, 2009/03
  • Larval Transport of the Callianassid Shrimp, Nihonotrypaea harmandi, and the Trochid Gastropod, Umbonium moniliferum , Inhabiting Intertidal Sandflats in Tachibana Bay and the Outermost Ariake Sound, Tamaki Tamaki,Mianda Atsuyosh,Oihashi Satosh,Sumit Mandal,Hamaguchi Masami, Bulletin on Coastal Oceanography, Coastal Oceanography Research Committee, the Oceanographic Society of Japan, Vol. 46, No. 2, p. 119-126, 2009
  • Atomic-Scale Numerical Simulations of Structural Properties in Carbon-Based Thin Film Deposition Processes,, 浜口 智志, Proceedings of the 19th International Symposium on Plasma Chemistry, (ed.By A.von Keudell, J.Winter, M.Boke, V.Schlz-von der Gathen, July 26-31, 2009, Bochum, Germany) 1, 2009
  • 液体のプラズマ滅菌とメカニズム, 北野勝久,井川聡,谷篤史,浜口智志, 電気学会全国大会講演論文集, Vol. 2009, No. 1, 2009
  • テラヘルツ時間領域分光法による容量結合型反応性プラズマ診断, 安藤あゆみ,北原英明,北野勝久,高野恵介,谷正彦,萩行正憲,浜口智志, 応用物理学関係連合講演会講演予稿集, Vol. 56th, No. 1, 2009
  • 大気圧低温プラズマジェットを用いた液中滅菌プロセスの解明 III, 北野勝久,井川聡,谷篤史,浜口智志, 応用物理学関係連合講演会講演予稿集, Vol. 56th, No. 1, 2009
  • 液中プラズマプロセスにおける液中ラジカルの電子スピン共鳴法による診断 III, 北野勝久,谷篤史,溝谷浩平,井川聡,浜口智志, 応用物理学関係連合講演会講演予稿集, Vol. 56th, No. 1, 2009
  • 低周波大気圧非平衡マイクロプラズマジェットの動的挙動 V, 北野勝久,浜口智志, 応用物理学会学術講演会講演予稿集, Vol. 70th, No. 1, 2009
  • 液中プラズマプロセスにおける液中ラジカルの電子スピン共鳴法による診断 IV, 北野勝久,谷篤史,溝谷浩平,井川聡,大西直文,浜口智志, 応用物理学会学術講演会講演予稿集, Vol. 70th, No. 1, 2009
  • 液中プラズマプロセスでのラジカル生成における雰囲気ガスの効果, 谷篤史,北野勝久,溝谷浩平,井川聡,浜口智志, ESR応用計測, Vol. 25, 2009
  • テラヘルツ時間領域分光法を用いた反応性プラズマの先駆的診断手法の開発, 北野勝久,黒瀬智子,安藤あゆみ,北原英明,高野恵介,萩行正憲,浜口智志, 大阪大学レーザーエネルギー学研究センター共同利用・共同研究成果報告書, Vol. 2008, 2009
  • 大気圧低温プラズマジェットを用いた液中滅菌プロセスの解明 IV, 北野勝久,井川聡,谷篤史,大西直文,浜口智志, 応用物理学会学術講演会講演予稿集, Vol. 70th, No. 1, 2009
  • 液中プラズマプロセスにおける気中・液中フリーラジカル生成, 北野勝久,谷篤史,井川聡,大西直文,荒川隆一,浜口智志, プラズマ・核融合学会年会(Web), Vol. 26th, 2009
  • 大気圧低温プラズマジェットのタンパク質膜パターニングへの応用, 安藤あゆみ,SAYED Abu,浅野豪文,手老龍吾,北野勝久,宇理須恒雄,浜口智志, プラズマ・核融合学会年会(Web), Vol. 26th, 2009
  • LF大気圧プラズマジェットを用いたタンパク質膜パターニング技術の開発~タンパク質の二次構造の変化の観察~, 安藤あゆみ,SAYED Abu,浅野豪文,手老龍吾,北野勝久,宇理須恒雄,浜口智志, 応用物理学会学術講演会講演予稿集, Vol. 70th, No. 1, 2009
  • 大気圧低温プラズマジェットを用いた液中ラジカル生成, 北野勝久,谷篤史,井川聡,大西直文,荒川隆一,米森星矢,浜口智志, 電子スピンサイエンス学会年会講演要旨集, Vol. 48th, 2009
  • NeおよびXeイオンの照射によるMgO,CaO,SrO,BaOのスパッタ率測定, 吉村智,日根清裕,木内正人,木内正人,橋本潤,寺内正治,本多洋介,坂井全弘,西谷幹彦,浜口智志, 応用物理学関係連合講演会講演予稿集, Vol. 56th, No. 1, 2009
  • Effects of ultraviolet light irradiation on etching of polymethylmethacrylate by CF<inf>3</inf><sup>+</sup> ion beam injections, Kazumasa Ikuse,Satoru Yoshimura,Yasuhiro Tsukazaki,Masato Kiuchi,Satoshi Hamaguchi, Journal of the Vacuum Society of Japan, The Vacuum Society of Japan, Vol. 52, No. 3, p. 127-130, 2009
  • Atmospheric-pressure LF microplasma jets, KITANO Katsuhisa,HAMAGUCHI Satoshi, Oyo Buturi, The Japan Society of Applied Physics, Vol. 77, No. 4, p. 383-389, 2008/04/10
  • SiO2 etching yield measurements by CF3 ion beam injections superposed with light irradiation, K. Ikuse,S. Yoshimura,T. Takizawa,K. Karahashi,M. Kiuchi,S. Hamaguchi, Journal of the Vacuum Society of Japan, The Vacuum Society of Japan, Vol. 51, No. 3, p. 158-161, 2008/03
  • Indium ion implantation into SiO2/Si substrates with a low-energy mass analyzed ion beam system, K. Hine,S. Yoshimura,K. Karahashi,M. Kiuchi,S. Hamaguchi, Journal of the Vacuum Society of Japan, The Vacuum Society of Japan, Vol. 51, No. 3, p. 218-220, 2008/03
  • マイクロプラズマエンジニアリングによるバイオ表面構築のための材料設計, 梅山雅也,飯島道弘,北野勝久,浜口智志,長崎幸夫, 応用物理学関係連合講演会講演予稿集, Vol. 55th, No. 1, 2008
  • 液中プラズマプロセスにおける液中ラジカルの電子スピン共鳴(ESR)法による珍断, 谷篤史,北野勝久,溝谷浩平,浜口智志, 応用物理学関係連合講演会講演予稿集, Vol. 55th, No. 1, 2008
  • 大気圧低温プラズマジェットを用いた液中滅菌プロセスの解明, 北野勝久,井川聡,浜口智志, 応用物理学関係連合講演会講演予稿集, Vol. 55th, No. 1, 2008
  • 単電極方式による大気圧低温プラズマジェット, 北野勝久,浜口智志, 電気学会全国大会講演論文集, Vol. 2008, No. 1, 2008
  • 大気圧低温プラズマを用いた液中プラズマプロセスにおける生成ラジカル, 谷篤史,北野勝久,溝谷浩平,浜口智志, ESR応用計測, Vol. 24, 2008
  • 低周波大気圧非平衡マイクロプラズマジェットの動的挙動 III, 北野勝久,浜口智志, 応用物理学関係連合講演会講演予稿集, Vol. 55th, No. 1, 2008
  • 大気圧マイクロプラズマを用いたガスクロマトグラフ用イオン化電流検出器, 品田恵,西本尚弘,北野勝久,浜口智志, 応用物理学関係連合講演会講演予稿集, Vol. 55th, No. 1, 2008
  • 大気圧低温プラズマジェットを用いた液中滅菌プロセスの解明 II, 北野勝久,井川聡,浜口智志, 応用物理学会学術講演会講演予稿集, Vol. 69th, No. 1, 2008
  • 大気圧マイクロプラズマを用いたガスクロマトグラフ用イオン化電流検出器 (II), 品田恵,西本尚弘,北野勝久,浜口智志, 応用物理学会学術講演会講演予稿集, Vol. 69th, No. 1, 2008
  • 液中プラズマプロセスにおける液中ラジカルの電子スピン共鳴法による診断 II, 谷篤史,北野勝久,溝谷浩平,浜口智志, 応用物理学会学術講演会講演予稿集, Vol. 69th, No. 1, 2008
  • 低周波大気圧非平衡マイクロプラズマジェットの動的挙動 IV, 北野勝久,浜口智志, 応用物理学会学術講演会講演予稿集, Vol. 69th, No. 1, 2008
  • テラヘルツ時間領域分光法を用いた反応性プラズマの先駆的診断手法の開発, 北野勝久,黒瀬智子,安藤あゆみ,北原英明,高野恵介,谷正彦,萩行正憲,浜口智志, 大阪大学レーザーエネルギー学研究センター共同研究成果報告書, Vol. 2007, 2008
  • テラヘルツ時間領域分光法によるCH<sub>4</sub>/Arプラズマ計測, 安藤あゆみ,黒瀬智子,北野勝久,北原英明,高野恵介,谷正彦,萩行正憲,浜口智志, 応用物理学関係連合講演会講演予稿集, Vol. 55th, No. 1, 2008
  • 21aZB-5 Recent trends in atmospheric-pressure/high-pressure plasma research, Hamaguchi Satoshi, Meeting Abstracts of the Physical Society of Japan, The Physical Society of Japan, Vol. 63, No. 0, p. 161-161, 2008
  • 高温タングステン表面での有機ケイ素のフラグメンテーション, 吉村智,木内正人,竹内孝江,浜口智志, 第4回Cat-CVD研究会資料, 2007/06
  • Measurement of Au sputtering yields by Neon with low-energy mass analyzed ion beam system, K. Hine,S. Yoshimura,M. Kiuchi,S. hamaguchi, Journal of the Vacuum Society of Japan, The Vacuum Society of Japan, Vol. 50, No. 3, p. 217-219, 2007/03
  • 水表面ならび水中気泡内で生成したグロープラズマにより誘起された液中溶解物化学反応の特性, 青木裕紀,北野勝久,浜口智志, 応用物理学関係連合講演会講演予稿集, Vol. 54th, No. 1, 2007
  • 低周波大気圧非平衡マイクロプラズマジェットの動的挙動, 北野勝久,浜口智志, 応用物理学関係連合講演会講演予稿集, Vol. 54th, No. 1, 2007
  • 低周波大気圧非平衡マイクロプラズマジェットの動的挙動 II, 北野勝久,浜口智志, 応用物理学会学術講演会講演予稿集, Vol. 68th, No. 1, 2007
  • テラヘルツ時間領域分光法を用いた反応性プラズマ中のラジカル診断手法の開発, 北野勝久,黒瀬智子,安藤あゆみ,北原英明,谷正彦,萩行正憲,浜口智志, 大阪大学レーザーエネルギー学研究センター共同研究成果報告書, Vol. 2006, 2007
  • テラヘルツ時間領域分光法を用いたプラズマ診断, 黒瀬智子,北野勝久,北原英明,谷正彦,萩行正憲,浜口智志, 応用物理学関係連合講演会講演予稿集, Vol. 54th, No. 1, 2007
  • 大気圧低温プラズマジェットを用いた液中プラズマプロセシング, 北野勝久,古性均,長崎幸夫,井川聡,谷篤史,浜口智志, プラズマ・核融合学会年会(Web), Vol. 24th, 2007
  • 希ガスイオンの照射によるMgOのスパッタ率測定, 日根清裕,吉村智,幾世和将,木内正人,木内正人,橋本潤,寺内正治,中尾武寿,西谷幹彦,浜口智志, 応用物理学会学術講演会講演予稿集, Vol. 68th, No. 1, 2007
  • 低エネルギー質量分離イオンビーム照射装置を用いた酸化マグネシウムのスパッタ率測定, 日根清裕,吉村智,幾世和将,木内正人,木内正人,橋本潤,寺内正治,西谷幹彦,浜口智志, 応用物理学関係連合講演会講演予稿集, Vol. 54th, No. 2, 2007
  • Fragment ions of dimethylsilane produced by hot tungsten wires, Satoru Yoshimura,Akinori Toh,Satoshi Sugimoto,Masato Kiuchi,Satoshi Hamaguchi, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, JAPAN SOC APPLIED PHYSICS, Vol. 45, No. 10B, p. 8204-8207, 2006/10
  • Fragment ions produced from methylsilane in Freeman-type ion source amd compounds deposited on tungsten surface, A. Toh,S. Yoshimura,S. Sugimoto,M. Kiuchi,S. Hamaguchi, Journal of Vacuum Society of Japan, The Vacuum Society of Japan, Vol. 49, No. 6, p. 383-385, 2006/06
  • Nonlinear evolution of the m = 1 internal kink mode in the presence of magnetohydrodynamic turbulence, A. Bierwage,S. Benkadda,S. Hamaguchi,M. Wakatani, Phys., Plasmas 13 (3), 032506-1~13 (2006)., Vol. 13, No. 3, 2006/03
  • Measurement of Au deposition rates with low-energy mass separated ion beam deposition apparatus, Kiyohiro Hine,Satoru Yoshimura,Takuya Maeda,Masato Kiuchi,Satoshi Hamaguchi, Journal of Vacuum Society of Japan, 日本真空協会, Vol. 49, No. 3, p. 177-179, 2006/03
  • 大気圧RFバリアー放電による液体表面ならび液中におけるグロープラズマの生成と諸特性, 北野勝久,青木裕紀,浜口智志, 核融合エネルギー連合講演会予稿集, Vol. 6th, 2006
  • 高周波電源を用いた水中気泡内グロー放電の生成, 青木裕紀,北野勝久,浜口智志, 応用物理学関係連合講演会講演予稿集, Vol. 53rd, No. 1, 2006
  • 液体接触大気圧放電プラズマの生成と諸特性, 北野勝久,青木裕紀,浜口智志, 応用物理学会学術講演会講演予稿集, Vol. 67th, No. 1, 2006
  • 水接触大気圧高周波グロー放電プラズマの生成とその反応特性, 北野勝久,青木裕紀,浜口智志, 応用物理学関係連合講演会講演予稿集, Vol. 53rd, No. 1, 2006
  • 01pC05 Discharge Mechanisms of the Atmospheric Pressure Plasma Jet generated by Lower-frequency HV Power Supply, KITANO Katsuhisa,HAMAGUCHI Satoshi, No. 23, p. 301-301, 2006
  • Numerical Simulation of Dry Etching Surface Reactions, HAMAGUCHI Satoshi, Shinku, The Vacuum Society of Japan, Vol. 50, No. 6, p. 403-410, 2006/01
  • 第12回International Congress on Plasma Physics, 浜口智志, プラズマ・核融合学会誌, Vol. 81, No. 2, p. 127-127, 2005/12
  • プラズマ科学シンポジウム2005/第22回プラズマプロセシング研究会, 佐藤浩之助,荻野竜樹,田中雅慶,浜口智志,西原功修, プラズマ・核融合学会誌, プラズマ・核融合学会, Vol. 81, No. 3, p. 223-226, 2005/12
  • Fast growing double tearing modes in a tokamak plasma, A. Bierwage,S. Benkadda,S. Hamaguchi,M. Wakatani, Phys. Plasmas, Vol. 12, No. 8, p. 1-12, 2005/08
  • Numerical simulation of surface reactions in plasma processing, Satoshi Hamaguchi, Seisan to Gijutsu, 57(2) 10-14 (2005), 生産技術振興協会, Vol. 57, No. 2, p. 10-14, 2005/06
  • 水接触大気圧高周波放電プラズマの諸特性, 北野勝久,青木裕紀,浜口智志, 応用物理学会学術講演会講演予稿集, Vol. 66th, No. 1, 2005
  • The XX-XY Sex-determination System in Oryzias Iuzonensis and O. mekongensis Revealed by the Sex Ratio of the Progeny of Sex-reversed Fish, HAMAGUCHI Satoshi,TOYAZAKI Yota,SHINOMIYA Ai,SAKAIZUMI Mitsuru, ZOOLOGICAL SCIENCE, Zoological Society of Japan, Vol. 21, No. 10, p. 1015-1018, 2004/10/25
  • Inhomogeneous Energy - Density Driven Instability in Presence of a Transverse DC Electric Fields in a Magnetized Plasma Cylinder, Suresh C. Sharma,Satoshi Hamaguchi, 2004/10/19
  • Current-Driven Dust Ion-Cyclotron Waves in Presence of a Transverse DC Electric Fields in Magnetized Plasma with Charge Fluctuations, Suresh C. Sharma,Satoshi Hamaguchi, 2004/10/19
  • Gain and Efficiency Enhancement in Free Electron Laser by Means of Modulated Electron Beam, Vivek Beniwal,Suresh C. Sharma,Satoshi Hamaguchi, 2004/10/07
  • Analyses of Surface Reaction Mechanisms of Plasma Etching by Molecular Dynamics Simulations, HAMAGUCHI Satoshi,YAMADA Hideaki, Technical report of IEICE. VLD, The Institute of Electronics, Information and Communication Engineers, Vol. 104, No. 322, p. 1-2, 2004/09/21
  • Field Survey of Sex-Reversals in the Medaka, Oryzias latipes : Genotypic Sexing of Wild Populations, SHINOMIYA Ai,OTAKE Hiroyuki,TOGASHI Ken-ichi,HAMAGUCHI Satoshi,SAKAIZUMI Mitsuru, ZOOLOGICAL SCIENCE, The Zoological Society of Japan, Vol. 21, No. 6, p. 613-619, 2004/06/25
  • Present status of beam nanotechnology, "OYO BUTURI" Editorial Committee,"OYO BUTURI" Editorial Committee, Oyo Buturi, The Japan Society of Applied Physics, Vol. 73, No. 4, p. 444-444, 2004/04/10
  • Numerical Simulation Research in Plasma Technologies, HAMAGUCHI Satoshi, Journal of plasma and fusion research, Vol. 80, No. 2, p. 110-112, 2004/02/25
  • 歴史的にみる超短パルスレーザー光の発生とその応用, 北嶋 巌,浜口 智志,平山 秀樹,若原 昭浩, 應用物理, Vol. 73, No. 2, p. 166-166, 2004/02/10
  • Oryzias curvinotus Has DMY, a Gene That Is Required for Male Development in the Medaka, O.latipes, MATSUDA Masaru,SATO Tadashi,TOYAZAKI Yota,NAGAHAMA Yoshitaka,HAMAGUCHI Satoshi,SAKAIZUMI Mitsuru, ZOOLOGICAL SCIENCE, The Zoological Society of Japan, Vol. 20, No. 2, p. 159-161, 2003/02/01
  • Dynamical response and relaxation time approximation in moderately and strongly coupled Yukawa systems, Saigo T.,Wierling August,Hamaguchi S., Meeting Abstracts of the Physical Society of Japan, The Physical Society of Japan, Vol. 58, No. 0, p. 238-238, 2003
  • Transport regimes in a low-dimensional model of ITG turbulence, Takeda Kazuo,Sadruddin Benkadda,Hamaguchi Satoshi,Wakatani Masahiro, Meeting Abstracts of the Physical Society of Japan, The Physical Society of Japan, Vol. 58, No. 0, p. 192-192, 2003
  • Promotion 東大大学院薬学系研究科の野心的試み 大学発イノベーション 提案するのはマーケットドリブン, 木村 廣道,各務 茂夫,浜口 智志, ミクス, エルゼビア・ジャパン, Vol. 30, No. 12, p. 14-17, 2002/10
  • EXPRESSION OF DMY IN MEDAKA GONAD DURING EARLY TESTICULAR DEVELOPMENT(Developmental Biology)(Proceedings of the Seventy-Third Annual Meeting of the Zoological Society of Japan) :, Nakamoto Masatoshi,Matsuda Masaru,Kobayashi Tohru,Nagahama Yoshitaka,Sakaizumi Mitsuru,Hamaguchi Satoshi,Shibata Naoki, Zoological science, Zoological Society of Japan, Vol. 19, No. 12, p. 1449-1449, 2002
  • DEVELOPMENT OF GONADS AND GENITAL DUCTS IN SECONDARY SEXUAL CHARACTER LESS MUTANT OF MEDAKA(Endocrinology)(Proceedings of the Seventy-Third Annual Meeting of the Zoological Society of Japan) :, Suzuki Aya,Sato Tadashi,Sakaizumi Mitsuru,Hamaguchi Satoshi,Shibata Naoki, Zoological science, Zoological Society of Japan, Vol. 19, No. 12, p. 1488-1488, 2002
  • GENETIC ANALYSIS OF A SECONDARY SEXUAL CHARACTER-LESS MUTANT, SCL, OF THE MEDAKA, ORYZIAS LATIPES(Endocrinology)(Proceedings of the Seventy-Third Annual Meeting of the Zoological Society of Japan) :, Sato Tadashi,Sakaizumi Mitsuru,Hamaguchi Satoshi, Zoological science, Zoological Society of Japan, Vol. 19, No. 12, p. 1488-1488, 2002
  • THREE SPECIES CLOSELY RELATED TO ORYZIAS LATIPES HAVE A MALE-HETEROGAMETIC (XX-XY) SEX-DETERMINING SYSTEM(Endocrinology & Genetics)(Proceedings of the Seventy-Third Annual Meeting of the Zoological Society of Japan) :, Toyazaki Yota,Sakaizumi Mituru,Hamaguchi Satoshi, Zoological science, Zoological Society of Japan, Vol. 19, No. 12, p. 1496-1496, 2002
  • MUTATIONS AFFECTING SEX DETERMINATION OR DIFFERENTIATION FROM WILD POPULATIONS OF THE MEDAKA, ORYZIAS LATIPES(Genetics)(Proceedings of the Seventy-Third Annual Meeting of the Zoological Society of Japan) :, Sakaizumi Mitsuru,Takeda Miharu,Ohtake Hiroyuki,Togashi Ken-ichi,Shinomiya Ai,Matsuda Masaru,Nagahama Yoshitaka,Hamaguchi Satoshi, Zoological science, Zoological Society of Japan, Vol. 19, No. 12, p. 1497-1497, 2002
  • A STRAIN HAVING A ZZ/ZW SEX DETERMINATION SYSTEM DERIVED FROM A NATURALLY OCCURRING RECESSIVE MUTATION IN THE MEDAKA, ORYZIAS LATIPES(Genetics)(Proceedings of the Seventy-Third Annual Meeting of the Zoological Society of Japan) :, Shinomiya Ai,Matsuda Masaru,Nagahama Yoshitaka,Hamaguchi Satoshi,Sakaizumi Mitsuru, Zoological science, Zoological Society of Japan, Vol. 19, No. 12, p. 1497-1497, 2002
  • 27aA29P Simulation studies on nonlinear coupling of m/n=1/1 and 2/1 tearing modes in high-beta tokamak plasmas., TSURIMAKI Satoshi,HAMAGUCHI Satoshi,WAKATANI Masahiro, No. 19, p. 101-101, 2002
  • Analysis of neoclassical tearing modes using reduced MHD model, Sato Masahiko,Hamaguchi Satoshi,Wakatani Masahiro, Meeting Abstracts of the Physical Society of Japan, The Physical Society of Japan, Vol. 57, No. 0, p. 181-181, 2002
  • 24pZB-2 ELM-like Behavior Generated by Nonlinear ITG Mode, Takeda Kazuo,Hamaguchi Satoshi,Wakatani Masahiro, Meeting Abstracts of the Physical Society of Japan, The Physical Society of Japan, Vol. 57, No. 0, p. 183-183, 2002
  • 27aWJ-9 Slowdown mechanism of poloidal rotation in nonlinear resistive wall mode, Sato Masahiko,Hamaguchi Satoshi,Wakatani Masahiro, Meeting Abstracts of the Physical Society of Japan, The Physical Society of Japan, Vol. 57, No. 0, p. 209-209, 2002
  • Comparison between double-resonant and non-resonant mode driven convections in a stellarator with a non-monotonic rotational transform, Takeshi Unemura,Satoshi Hamaguchi,Masahiro Wakatani, Journal of the Physical Society of Japan, The Physical Society of Japan (JPS), Vol. 70, No. 4, p. 983-987, 2001/04
  • Construction of a BAC library derived from the inbred Hd-rR strain of the teleost fish, Oryzias latipes, MATSUDA Masaru,KAWATO Norihisa,ASAKAWA Shuichi,SHIMIZU Nobuyoshi,NAGAHAMA Yoshitaka,HAMAGUCHI Satoshi,SAKAIZUMI Mitsuru,HORI Hiroshi, Genes & Genetic Systems, The Genetics Society of Japan, Vol. 76, No. 1, p. 61-63, 2001/02
  • Modeling of nonlinear resistive wall modes, Sato Masahiko,Hamaguchi Satoshi,Wakatani Masahiro, Meeting Abstracts of the Physical Society of Japan, The Physical Society of Japan, Vol. 56, No. 0, p. 121-121, 2001
  • Effects of toroidal flows on high-η balloning modes in tokamaks (II), Furukawa M.,Tokuda S.,Nakamura Yuji,Hamaguchi S.,Wakatani M., Meeting Abstracts of the Physical Society of Japan, The Physical Society of Japan, Vol. 56, No. 0, p. 131-131, 2001
  • Two-dimensional Axisymmetric Ar Discharges Simulation based on the Drift-diffusion Model and Finite Element Method, Ishiwata Hirotaka,Hamaguchi Satoshi, Meeting Abstracts of the Physical Society of Japan, The Physical Society of Japan, Vol. 56, No. 0, p. 137-137, 2001
  • Calculation of Shear and Bulk Viscosities in Yukawa System, Saigo Tomoyasu,Hamaguchi Satoshi, Meeting Abstracts of the Physical Society of Japan, The Physical Society of Japan, Vol. 56, No. 0, p. 142-142, 2001
  • Effects of toroidal flows on high-n ballooning modes in tokamaks, Furukawa M.,Nakamura Y.,Hamaguchi S.,Wakatani M., Meeting Abstracts of the Physical Society of Japan, The Physical Society of Japan, Vol. 56, No. 0, p. 155-155, 2001
  • Calculation of Shear Viscosities in Strongly Coupled Yukawa Systems Using Molecular Dynamics Simulations, Saigo Tomoyasu,Hamaguchi Satoshi,Wakatani Masahiro, Meeting Abstracts of the Physical Society of Japan, The Physical Society of Japan, Vol. 56, No. 0, p. 177-177, 2001
  • POSITIONAL CLONING OF THE SEX-DETERMINING REGION OF MEDAKA USING A Y CONGENIC STRAIN(Genetics)(Proceeding of the Seventy-Third Annual Meeting of the Zoological Society of Japan) :, Matsuda M.,Matsuda C.,Nagahama Y.,Hamaguchi S.,Sakaizumi M., Zoological science, Zoological Society of Japan, Vol. 18, No. 0, p. 27-27, 2001
  • Mapping of the factor(s) controlling strain difference of estrogen-induced sex reversal rate in the medaka(Genetics)(Proceeding of the Seventy-Third Annual Meeting of the Zoological Society of Japan) :, Sato T.,Fujimaki R.,Sakaizumi M.,Hamaguchi S., Zoological science, Zoological Society of Japan, Vol. 18, No. 0, p. 28-28, 2001
  • Occurrence of ectopic primordial germ cells in the medaka, Oryzias latipes(Developmental Biology)(Proceeding of the Seventy-Third Annual Meeting of the Zoological Society of Japan) :, Shinomiya A.,Tanaka M.,Hamaguchi S., Zoological science, Zoological Society of Japan, Vol. 18, No. 0, p. 66-66, 2001
  • 3 Plasma-surface interactions during etching processes, Hamaguchi Satoshi, No. 18, p. 20-20, 2001
  • The vasa-like gene, olvas, identifies the migration path of primordial germ cells during embryonic body formation stage in the medaka, Oryzias latipes, SHINOMIYA Ai,TANAKA Minoru,KOBAYASHI Tohru,NAGAHAMA Yoshitaka,HAMAGUCHI Satoshi, Development, Growth & Differentiation, Vol. 42, No. 4, p. 317-326, 2000/08/01
  • Effects of toroidal shear flows on tokamak MHD equilibria, Furukawa M.,Nakamura Y.,Hamaguchi S.,Wakatani M., Meeting Abstracts of the Physical Society of Japan, The Physical Society of Japan, Vol. 55, No. 0, p. 160-160, 2000
  • 27pA24P Non-linear Saturation of Resistive Interchange Mode due to Flafting of Pressure Profile, No. 17, p. 86-86, 2000
  • 25pYG-10 Linear Analysis of Resistive Drift-Alfven Instability in a Cylindrical Plasma, Miyako Naoaki, Meeting Abstracts of the Physical Society of Japan, The Physical Society of Japan, Vol. 54, No. 0, p. 160-160, 1999
  • Identification of genetic sex of the medaka, Oryzias latipes, by PCR, SHINOMIYA A,Matsuda Masaru,Hamaguchi Satoshi,Sakaizumi Mitsuru, The Fish Biology Journal Medaka, Laboratory of Freshwater Fish Stocks Bioscience Center Nagoya University, Vol. 10, No. 10, p. 31-32, 1999
  • Coulomb Crystals of Plasma Dust, HAMAGUCHI Satoshi, Meeting Abstracts of the Physical Society of Japan, The Physical Society of Japan, Vol. 53, No. 0, p. 933-933, 1998
  • Isolation of a sex chromosome-specific DNA sequence in the medaka, Oryzias latipes, MATSUDA Masaru,KUSAMA Takehiko,OSHIRO Takashi,KURIHARA Yasuyuki,HAMAGUCHI Satoshi,SAKAIZUMI Mitsuru, Genes & Genetic Systems, The Genetics Society of Japan, Vol. 72, No. 5, p. 263-268, 1997/10
  • Geographic Variation and Diversity in the Mitochondrial DNA of the Medaka, Oryzias latipes, as Determined by Restriction Endonuclease Analysis, MATSUDA Masaru,YONEKAWA Hiromichi,HAMAGUCHI Satoshi,SAKAIZUMI Mitsuru, Zoological Science, Zoological Society of Japan, Vol. 14, No. 3, p. 517-526, 1997/06/15
  • Bilaterally Asymmetrical Testes in Fishes of the Genus Oryzias, HAMAGUCHI Satoshi, Zoological Science, Zoological Society of Japan, Vol. 13, No. 5, p. 757-763, 1996/10/15
  • Plasma Processing and Dusty Plasmas., Hamaguchi Satoshi, Butsuri, The Physical Society of Japan, Vol. 50, No. 7, p. 527-532, 1995/12
  • Reply to comments of Nordman and Weiland on Norton et al. On "ion-temperature-gradient-driven transport in a density modification experiment on the Tokamak Fusion Test Reactor" [Phys. Fluids B 4, 953 (1992)] [1], W. Horton,D. Lindberg,J. Y. Kim,J. Q. Dong,G. W. Hammett,S. D. Scott,M. C. Zarnstorff,S. Hamaguchi, Physics of Fluids B, Vol. 5, No. 3, p. 1034-1035, 1993
  • Electron Microscopic Study of the Blood-Testis Barrier in the Teleost,Oryzias latipes, SHIBATA N., Zoological Science, Vol. 3, No. 2, p. p331-338, 1986/04
  • 2a-RB-1 TORlUT-5実験V, 浜口 智志,井上 信幸,内田 袋二郎,TORlUTグループ, 年会講演予稿集, 一般社団法人 日本物理学会, Vol. 39, No. 0, p. 104-104, 1984
  • 13a-DG-12 TORIUT-5トカマク実験I, 浜口 智志,井上 信幸,内田 岱二郎他TORIOTグループ, 秋の分科会予稿集, 一般社団法人 日本物理学会, Vol. 1983, No. 0, p. 169-169, 1983
  • 29a-A-12 トカマク TORIUT-4M 実験 VI (低q放電-数値解析), 清家 裕次郎,山田 弘司,浜口 智志,吉田 善章,岡野 邦彦,井上 信幸,内田 岱二郎, 年会講演予稿集, 一般社団法人 日本物理学会, Vol. 38, No. 0, p. 127-127, 1983
  • 29a-A-12 トカマク TORIUT-4M 実験 VII (低q放電-実験), 清家 裕次郎,服部 健一,浜口 智志,山田 弘司,吉田 善章,岡野 邦彦,井上 信幸,内田 岱二郎, 年会講演予稿集, 一般社団法人 日本物理学会, Vol. 38, No. 0, p. 128-128, 1983
  • 30p-CE-4 TORIUT-4M 実験 V : 低q放電, 清家 裕次郎,吉田 善章,岡野 邦彦,山田 弘司,鈴木 信治,浜口 智志,伊丹 潔,井上 信幸,内田 岱二郎, 年会講演予稿集, 一般社団法人 日本物理学会, Vol. 37, No. 0, p. 99-99, 1982
  • The Male Secondary Sex Characteristics in the Gynogenetic Female Fish,Poecilia formosa,Induced by the Administration of Methyltestosterone :, HAMAGUCHI Satoshi,EGAMI Nobuo, Vol. 53, No. 4, p. 227-230, 1980
  • The Inhibitory Effects of Cyproterone Acetate on the Male Secondary Sex Characters of the Medaka,Oryzias latipes :, HAMAGUCHI Satoshi, Vol. 51, No. 2, p. 65-69, 1978

Publications

  • プラズマプロセスの基礎と素過程」 浜口智志: 第25回プラズマエレクトロニクス講習会テキスト, 浜口智志, (公社)応用物理学会プラズマエレクトロニクス分科会, 2014/11
  • プラズマ原子分子過程ハンドブック, 浜口智志,村上泉,加藤太治, 大阪大学出版会, ISBN:4872593626, 2011/04
  • プラズマ原子分子過程ハンドブック, 浜口, 智志,村上, 泉,加藤, 太治,プラズマ・核融合学会, 大阪大学出版会, ISBN:9784872593624, 2011/03
  • 「プラズマエッチング表面反応シミュレーション」 “ドライ・ウエットエッチング技術全集”, 浜口智志,技術情報協会編, 技術情報協会, 2009/03
  • 「プラズマフォトニクス」“光とナノが創る科学と産業”, 浜口智志,北野勝久,大阪大学フォトニクス先端融合研究センター編, 株式会社アドスリー, 2009/03
  • Plasma ion processes and their applications: modeling, Satoshi Hamaguchi, Ohm Co., 2005/08
  • Modeling of reactive ion etching for Si/SiO2 systems, S. Hamaguchi,H. Ohta, Springer-Verlag, Wien, 2001/12
  • Dynamical properties of strongly coupled dusty plasmas, S. Hamaguchi,H. Ohta, Elsevier Sci., 2000/12
  • "Dusty Plasmas and Coulomb Crystals,"in High Field Science, S. Hamaguchi, Plenum Publisher, New York, 2000/10
  • "Mathematical methods for thin film deposition simulations," in Modeling of Film Deposition for Microelectronic Applications,, S. Hamaguchi, Academic Press, San Diego, 1996/04
  • "The Boltzmann-Poisson system in weakly collisional sheaths," in Semiconductors, S. Hamaguchi,R. T. Farouki,M. Dalvie, Springer-Verlag, New York, 1994/12
  • "Drift wave turbulence and vortices in 3--D sheared magnetic fields" in Chaotic Dynamics and Transport in Fluids and Plasmas, W. Horton,S. Hamaguchi,B.-G. Hong, AIP, New York, 1993/06

Industrial Property Rights

  • 人工骨、及び人工骨の製造方法, 浜口 智志,出口 智子,▲杉▼本 敏司,海渡 貴司,吉川 秀樹,朝森 千永子, 特許第7201971号, JP2019030787, 出願日:2019/08/05, 登録日:2022/12/27
  • 胚様体を外胚葉へと分化誘導する方法, 西原 祥子,三浦 太一,浜口 智志, 特許第6821166号, 特願2015-231156, 出願日:2015/11/26, 登録日:2021/01/08
  • 支持体表面の処理用架橋重合体組成物, 長崎 幸夫,梅山 雅也,飯島 道弘,北野 勝久,浜口 智志, 特許第5504491号, 特願2008-238133, 出願日:2008/09/17, 登録日:2014/03/28
  • デバイス装置及びデバイス装置の作製方法, 北原 英明,浜口 智志,高野 恵介,木村 憲明,弓井 孝佳,吉田 卓史, 特許第5307687号, 特願2009-242980, 出願日:2009/10/22, 登録日:2013/07/05
  • Plasma producing apparatus and method of plasma production, K. Kitano,S. Hamaguchi,H. Aoki, US8232729 US20100019677, PCT/JP2007/061837, 出願日:2007/06, 登録日:2012/06
  • 放電イオン化電流検出器, 北野 勝久,浜口 智志,品田 恵, 特許第4936492号, 特願2010-505323, 出願日:2009/03/19, 登録日:2012/03/02
  • プラズマ生成装置およびプラズマ生成方法, 北野 勝久,浜口 智志,青木 裕紀, 特許第4677530号, 特願2008-549208, 出願日:2007/06/12, 登録日:2011/02/10
  • グロープラズマ発生装置及びグロープラズマ発生方法, 北野 勝久,青木 裕紀,浜口 智志, 特許第4590528号, 特願2008-504972, 出願日:2006/09/06, 登録日:2010/09/24
  • 殺菌方法および装置, 井川 聡,北野 勝久,浜口 智志, 特許第4408957号, 特願2009-534183, 出願日:2008/09/25, 登録日:2009/11/20
  • High density plasma processing tool with toroidal magnetic field, Manoj Dalvie,Satoshi Hamaguchi, US05505780, 出願日:1994/10, 登録日:1996/10
  • 酸化物半導体膜のエッチング方法, 平田 瑛子,辰巳 哲也,深沢 正永,浜口 智志,唐橋 一浩, WO2020-145080, JP2019049908, 出願日:2019/12/19
  • 人工骨、及び人工骨の製造方法, 浜口 智志,出口 智子,▲杉▼本 敏司,海渡 貴司,吉川 秀樹,朝森 千永子, WO2020-031988, JP2019030787, 出願日:2019/08/05
  • 人工骨、人工骨製造装置及び人工骨製造方法, 浜口 智志,森口 悠,増田 一仁,岡田 潔,名井 陽,吉川 秀樹,李 大成, WO2012-036286, JP2011071262, 出願日:2011/09/16
  • 放電イオン化電流検出器, 北野 勝久,浜口 智志,品田 恵, WO2009-119050, JP2009001250, 出願日:2009/03/19
  • 殺菌方法および装置, 井川 聡,北野 勝久,浜口 智志, WO2009-041049, JP2008002670, 出願日:2008/09/25
  • プラズマ生成装置およびプラズマ生成方法, 北野 勝久,浜口 智志,青木 裕紀, WO2008-072390, JP2007061837, 出願日:2007/06/12
  • グロープラズマ発生装置及びグロープラズマ発生方法, 北野 勝久,青木 裕紀,浜口 智志, WO2007-105330, JP2006317652, 出願日:2006/09/06
  • 胚様体を外胚葉へと分化誘導する方法, 西原 祥子,三浦 太一,浜口 智志, 特願2015-231156, 出願日:2015/11/26
  • 放射性プルーム監視システムおよび放射性物質検出装置, 浜口 智志,出口 智子,竹内 正人,タム アンディ,内田 清志,加藤 万寿夫,隅谷 典久, 特願2014-179899, 出願日:2014/09/04
  • エッチング方法および装置, 唐橋 一浩,瀬木 利夫,松尾 二郎,浜口 智志,木下 啓蔵,溝谷 浩平, 特願2014-041240, 出願日:2014/03/04
  • バイオセラミックスを含む人工骨の改質方法と、その方法で改質された人工骨, 浜口 智志,吉川 秀樹,名井 陽,森口 悠,増田 一仁,李 大成,小嶋 保次,大野 信男,小泉 剛,時政 大造, 特願2012-085854, 出願日:2012/04/04
  • デバイス装置及びデバイス装置の作製方法, 北原 英明,浜口 智志,高野 恵介,木村 憲明,弓井 孝佳,吉田 卓史, 特願2009-242980, 出願日:2009/10/22
  • プラズマ処理装置及びプラズマ処理方法, 伊藤 剛仁,浜口 智志, 特願2009-097385, 出願日:2009/04/13
  • 支持体表面の処理用架橋重合体組成物, 長崎 幸夫,梅山 雅也,飯島 道弘,北野 勝久,浜口 智志, 特願2008-238133, 出願日:2008/09/17
  • 炭素膜の製造法, 浜口 智志,村上 泰夫, 特願2008-109129, 出願日:2008/04/18
  • プラズマジェットを用いた金属ナノ粒子の合成及び表面処理, 長崎 幸夫,浜口 智志,北野 勝久,古性 均, 特願2007-097829, 出願日:2007/03/06
  • 胚様体を外胚葉へと分化誘導する方法, 西原祥子,三浦太一,浜口智志, 特願2015-231156, 出願日:2015/11
  • 放射性プルーム監視システムおよび放射性物質検出装置, 浜口智志,出口智子,竹内正人,タム・アンディ,内田清志,加藤万寿夫,隅谷典久, 2014-179899, 出願日:2014/09
  • エッチング方法および装置, 唐橋一浩,浜口智志,瀬木利夫,松尾二郎,木下啓蔵,溝谷浩平, 特願2014-41240, 出願日:2014/03
  • 人工骨、人工骨製造装置及び人工骨製造方法, 浜口智志,森口悠,増田一仁,岡田潔,名井陽,吉川秀樹,李大成, PCT/JP2011/071262, 出願日:2011/09
  • 人工骨、人工骨製造装置及び人工骨製造方法, 浜口智志,森口悠,増田一仁,岡田潔,名井陽,吉川秀樹, 特願2010-207645, 出願日:2010/09
  • 殺菌方法および装置, 北野勝久,浜口智志,井川聡, 末連絡, 出願日:2008/09
  • イオン化電流検出器, 北野勝久,浜口智志,品田恵, 特願2008-224483, 出願日:2008/09
  • ガスクロマトグラフ用イオン化電流検出器, 北野勝久,浜口智志,品田恵, 特願2008-76917, 出願日:2008/03
  • 殺菌方法および装置, 北野勝久,井川聡,浜口智志, 2007-251194, 出願日:2007/09
  • プラズマ生成装置およびプラズマ生成方法, 北野勝久,青木裕紀,浜口智志, PCT/JP2007/061837, 出願日:2007/06
  • LFプラズマジェットを用いた金属ナノ粒子の合成及び表面処理, 古性均,長崎幸夫,北野勝久,浜口智志, 特願2007-97829, 出願日:2007/03
  • プラズマ生成装置およびプラズマ発生方法, 北野勝久,浜口智志, 特願2006-334800, 出願日:2006/12
  • The apparatus and method for the generation of glow plasmas, Katsuhisa Kitano,Hironori Aoki,Satoshi Hamaguchi, PCT/JP2006/317652, 出願日:2006/09
  • The apparatus and method for the generation of glow plasmas, Katsuhisa Kitano,Hironori Aoki,Satoshi Hamaguchi, 特願2006-058721, 出願日:2006/03

Awards

  • The Japan Society of Applied Physics (JSAP) Fellow, The Japan Society of Applied Physics (JSAP), 2022/09
  • Plasma Material Science Award, Plasma Science for Materials,. JSPS 153 Committee, 2022/01
  • Mercator Fellow, German Research Foundation, 2019/09
  • The 41st JSAP Outstating Paper Award,, Japan Society of Applied Physics, 2019/09
  • Plasma Prize, American Vacuum Society, 2016/11
  • Fellow, American Physical Society, 2012/10
  • Plasma Electronics Prize, Division of Plasma Electronics, Japan Society of Applied Physics, 2012/09
  • Fellow, American Vacuum Society, 2011/10
  • Fulbright Fellow, The US-Japan Education Commission (Fulbright Japan), 1984/07

Committee Memberships

  • 25th International Symposium on Plasma Chemistry (ISPC25), Co-Chair, Program Committee, 2020/01 - Present
  • 25th International Symposium on Plasma Chemistry (ISPC25), Co-Chair, Local Organizing Committee, 2020/01 - Present
  • Plasma Medicine (Begell House Publishing), Editor-in-Chief, 2019/12 - Present
  • 12th EU-Japan Joint Symposium on Plasma Processing (JSPP-11), Co-Chair, Organizing Committee,, 2019/01 - Present
  • 3nd International Conference on Data-Driven Plasma Science (ICDDPS), Co-Chair, Executive Scientific Committee,, 2019/01 - Present
  • Gaseous Electronics Conference (GEC), Chair, Program Committee, Tutorial “Artificial Intelligence and Machine Learning” and Workshop “Artificial Intelligence and Machine Learning in Plasma Science and Beyond”, 2019/01 - Present
  • International Union for Vacuum Science, Technique and Applications (IUVSTA), Chair, Executive Committee, Plasma Science and Techniques Division (PSTD),, 2019/01 - Present
  • International Conference on Atomic Layer Deposition & International Atomic Layer Etch Workshop, ALE Program Committee, 2018/01 - Present
  • International Symposium of Dry Process (DPS), Organizing Committee, 2017/01 - Present
  • Leibniz-Institut für Plasmaforschung und Technologie e. V. (INP Greifswald)., Scientific Advisory Board, 2016/01 - Present
  • Plasma Science and Techniques Division (PSTD), International Union for Vacuum Science, Technique and Applications (IUVSTA), Executive Committee, 2016/01 - Present
  • IEEE Transactions on Radiation and Plasma Medical Sciences, Associate editor, 2016/01 - Present
  • Plasma Medicine (Begell House Publishing), Executive Editor, 2015/01 - Present
  • Frontiers in Physics, Frontiers, Associate Editor, Plasma Physics, 2014/01 - Present
  • Journal of Physics D: Applied Physics, Member of the Editorial Board, 2013/01 - Present
  • International Plasma Chemistry Society (IPCS), Member of the Board of Directors, 2009/01 - Present
  • International Society for Plasma Medicine (ISPM), Member of Board of Directors, 2009/01 - Present