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Hamaguchi Satoshi

浜口 智志

Graduate School of Engineering Center for Atomic and Molecular Technologies, Professor

keyword numerical simulation,plasma chemistry,plasma physics

Education

  • 1984/09 - 1988/06, New York University, Graduate School of Arts and Science, Department of Mathematics
  • 1982/04 - 1987/03, The University of Tokyo, Graduate School of Science, Department of Physics
  • 1978/04 - 1982/03, The University of Tokyo, Faculty of Science, Department of Physics

Research Areas

  • Energy, Nuclear fusion
  • Energy, Applied plasma science
  • Energy, Basic plasma science

Papers

  • Preface to Special Topic: Invited Papers from the 2nd International Conference on Data-Driven Plasma Science, Sadruddin Benkadda,Satoshi Hamaguchi,Magali Muraglia,Deborah O'Connell, Physics of Plasmas, Vol. 28, No. 3, 2021/03/01
  • Development of a Massively Parallelized Fluid-Based Plasma Simulation Code with a Finite-Volume Method on an Unstructured Grid, Kuan Lin Chen,Meng Fan Tseng,Ming Chung Lo,Satoshi Hamaguchi,Meng Hua Hu,Yun Ming Lee,Jong Shinn Wu, IEEE Transactions on Plasma Science, Vol. 49, No. 1, p. 104-119, 2021/01
  • Characterization of descriptors in machine learning for data-based sputtering yield prediction, Hiori Kino,Kazumasa Ikuse,Hieu Chi Dam,Satoshi Hamaguchi, Physics of Plasmas, Vol. 28, No. 1, 2021/01/01
  • Mechanism of SiN etching rate fluctuation in atomic layer etching, Akiko Hirata,Masanaga Fukasawa,Katsuhisa Kugimiya,Kojiro Nagaoka,Kazuhiro Karahashi,Satoshi Hamaguchi,Hayato Iwamoto, Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol. 38, No. 6, 2020/12/01
  • Molecular dynamics simulation of amine groups formation during plasma processing of polystyrene surfaces, Miroslav Michlíček,Satoshi Hamaguchi,Lenka Zajíčková, Plasma Sources Science and Technology, Vol. 29, No. 10, 2020/10
  • Modeling characterisation of a bipolar pulsed discharge, Zoltán Donkó,Lenka Zajičková,Satoshi Sugimoto,Anjar Anggraini Harumningtyas,Satoshi Hamaguchi, Plasma Sources Science and Technology, Vol. 29, No. 10, 2020/10
  • Formation and desorption of nickel hexafluoroacetylacetonate Ni(hfac)<inf>2</inf>on a nickel oxide surface in atomic layer etching processes, Abdulrahman H. Basher,Marjan Krstić,Karin Fink,Tomoko Ito,Kazuhiro Karahashi,Wolfgang Wenzel,Satoshi Hamaguchi, Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol. 38, No. 5, 2020/09/01
  • Self-limiting processes in thermal atomic layer etching of nickel by hexafluoroacetylacetone, Abdulrahman H. Basher,Ikutaro Hamada,Satoshi Hamaguchi, Japanese Journal of Applied Physics, Vol. 59, No. 9, 2020/09/01
  • On-wafer monitoring and control of ion energy distribution for damage minimization in atomic layer etching processes, A. Hirata,M. Fukasawa,K. Kugimiya,K. Nagaoka,K. Karahashi,S. Hamaguchi,H. Iwamoto, Japanese Journal of Applied Physics, Vol. 59, No. SJ, 2020/06/01
  • Experimental and numerical analysis of the effects of ion bombardment in silicon oxide (SiO<inf>2</inf>) plasma enhanced atomic layer deposition (PEALD) processes, Hu Li,Tomoko Ito,Kazuhiro Karahashi,Munehito Kagaya,Tsuyoshi Moriya,Masaaki Matsukuma,Satoshi Hamaguchi, Japanese Journal of Applied Physics, IOP Publishing, Vol. 59, No. SJ, p. SJJA01-SJJA01, 2020/06/01
  • Stability of hexafluoroacetylacetone molecules on metallic and oxidized nickel surfaces in atomic-layer-etching processes, Abdulrahman H. Basher,Marjan Krstić,Takae Takeuchi,Michiro Isobe,Tomoko Ito,Masato Kiuchi,Kazuhiro Karahashi,Wolfgang Wenzel,Satoshi Hamaguchi, Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, A V S AMER INST PHYSICS, Vol. 38, No. 2, 2020/03/01
  • Molecular dynamics simulation of Si and SiO<inf>2</inf> reactive ion etching by fluorine-rich ion species, Erin Joy Capdos Tinacba,Michiro Isobe,Kazuhiro Karahashi,Satoshi Hamaguchi, Surface and Coatings Technology, ELSEVIER SCIENCE SA, Vol. 380, 2019/12/25
  • Special issue: Plasmas for microfabrication, Satoshi Hamaguchi,Sumit Agarwal,Lenka Zajickova,Michael R. Wertheimer, Plasma Processes and Polymers, WILEY-V C H VERLAG GMBH, Vol. 16, No. 9, 2019/09
  • Damage recovery and low-damage etching of ITO in H<inf>2</inf>/CO plasma: Effects of hydrogen or oxygen, Akiko Hirata,Masanaga Fukasawa,Katsuhisa Kugimiya,Kazuhiro Karahashi,Satoshi Hamaguchi,Kojiro Nagaoka, Plasma Processes and Polymers, WILEY-V C H VERLAG GMBH, Vol. 16, No. 9, 2019/09/01
  • Effects of excitation voltage pulse shape on the characteristics of atmospheric-pressure nanosecond discharges, Zoltán Donkó,Satoshi Hamaguchi,Timo Gans, Plasma Sources Science and Technology, IOP PUBLISHING LTD, Vol. 28, No. 7, 2019/07/24
  • Analyses of Hexafluoroacetylacetone (Hfac) Adsorbed on Transition Metal Surfaces, 2019/07
  • 原子層エッチングプロセスにおける表面反応解析, 2019/06
  • ヘキサフルオロアセチルアセトンによる遷移金属(Ni, Co)におけるサーマルエッチング反応解析, 2019/03
  • Molybdenum capping layer effect on electromigration failure of plasma etched copper lines, Jia Quan Su,Mingqian Li,Yue Kuo,Satoshi Hamaguchi, ECS Transactions, Vol. 92, No. 5, p. 39-46, 2019
  • The future for plasma science and technology, Klaus-Dieter Weltmann,Juergen F. Kolb,Marcin Holub,Dirk Uhrlandt,Milan Simek,Kostya (Ken) Ostrikov,Satoshi Hamaguchi,Uros Cvelbar,Mirko Cernak,Bruce Locke,Alexander Fridman,Pietro Favia,Kurt Becker, PLASMA PROCESSES AND POLYMERS, WILEY-V C H VERLAG GMBH, Vol. 16, No. 1, 2019/01
  • Etching reactions by polyatomic molecular ions containing fluorine atoms, 2018/11
  • Ion energy and angular distributions in low-pressure capacitive oxygen RF discharges driven by tailored voltage waveforms, Zoltan Donko,Aranka Derzsi,Mate Vass,Julian Schulze,Edmund Schuengel,Satoshi Hamaguchi, Plasma Sources Science and Technology, IOP PUBLISHING LTD, Vol. 27, No. 10, 2018/09/18
  • Enhanced etching of tin-doped indium oxide due to surface modification by hydrogen ion injection, Hu Li,Kazuhiro Karahashi,Pascal Friederich,Karin Fink,Masanaga Fukasawa,Akiko Hirata,Kazunori Nagahata,Tetsuya Tatsumi,Wolfgang Wenzel,Satoshi Hamaguchi, Japanese Journal of Applied Physics, IOP PUBLISHING LTD, Vol. 57, No. 6, 2018/06
  • Cyclic etching of tin-doped indium oxide using hydrogen-induced modified layer, Akiko Hirata,Masanaga Fukasawa,Kazunori Nagahata,Hu Li,Kazuhiro Karahashi,Satoshi Hamaguchi,Tetsuya Tatsumi, Japanese Journal of Applied Physics, IOP PUBLISHING LTD, Vol. 57, No. 6, 2018/06
  • The effect of photoemission on nanosecond helium microdischarges at atmospheric pressure, Zoltan Donko,Satoshi Hamaguchi,Timo Gans, Plasma Sources Science and Technology, IOP PUBLISHING LTD, Vol. 27, No. 5, 2018/05
  • フルオロカーボン(Cx Fy+)イオンによるSiO2およびSiエッチング反応, 2018/03
  • ヘキサフルオロアセチルアセトン吸着表面金属(Ni, Cu)におけるエッチング反応, 2018/03
  • Plasma Surface Functionalization of Biocompatible Materials, 2018/03
  • Foundations of low-temperature plasma enhanced materials synthesis and etching, Gottlieb S. Oehrlein,Satoshi Hamaguchi, Plasma Sources Science and Technology, IOP PUBLISHING LTD, Vol. 27, No. 2, 2018/02
  • Preface: plasma sources for biological and biomaterial applications, Farzaneh Arefi-Khonsari,Satoshi Hamaguchi,Eric Robert, Plasma Medicine, Vol. 8, No. 1, 2018
  • Impact of non-thermal plasma surface modification on porous calcium hydroxyapatite ceramics for bone regeneration., Yu Moriguchi,Dae-Sung Lee,Ryota Chijimatsu,Khair Thamina,Kazuto Masuda,Dai Itsuki,Hideki Yoshikawa,Satoshi Hamaguchi,Akira Myoui, PloS one, PUBLIC LIBRARY SCIENCE, Vol. 13, No. 3, 2018
  • XPS Analysis of Adsorbed Organic Compounds on Magnetic Materials Surfaces, 2017/12
  • Amino Group Surface Modification of Cell Culture Polystyrene Dishes by an Inverter Plasma Process, 2017/12
  • Editorial for achieving atomistic control in plasma–material interactions, Gottlieb S. Oehrlein,Satoshi Hamaguchi,Achim Von Keudell, Journal of Physics D: Applied Physics, IOP PUBLISHING LTD, Vol. 50, No. 49, 2017/12
  • Molecular dynamics simulations of atomic-layer etching (ALE) of SiO2, 2017/11
  • Surface reactions of metal surfaces with adsorbed organic compounds by Ar+ ion irradiation, 2017/11
  • 金属表面におけるXeF2曝露によるフッ化物層のエッチング反応, 2017/09
  • Ni表面に対するヘキサフルオロアセチルアセトンによる表面反応の解明, 2017/09
  • Effects of hydrogen-damaged layer on tin-doped indium oxide etching by H<inf>2</inf>/Ar plasma, Akiko Hirata,Masanaga Fukasawa,Takushi Shigetoshi,Masaki Okamoto,Kazunori Nagahata,Hu Li,Kazuhiro Karahashi,Satoshi Hamaguchi,Tetsuya Tatsumi, Japanese Journal of Applied Physics, IOP PUBLISHING LTD, Vol. 56, No. 6, 2017/06
  • Etching yields and surface reactions of amorphous carbon by fluorocarbon ion irradiation, Kazuhiro Karahashi,Hu Li,Kentaro Yamada,Tomoko Ito,Satoshi Numazawa,Ken Machida,Kiyoshi Ishikawa,Satoshi Hamaguchi, Japanese Journal of Applied Physics, IOP PUBLISHING LTD, Vol. 56, No. 6, 2017/05
  • Effects of Hydrogen Ion Irradiation on Zinc Oxide Etch, Hu Li,Kazuhiro Karahashi,Pascal Friederich,Karin Fink,Masanaga Fukasawa,Akiko Hirata,Kazunori Nagahata,Tetsuya Tatsumi,Wolfgang Wenzel,Satoshi Hamaguchi, J. Vac. Sci. Tech. A, A V S AMER INST PHYSICS, Vol. 35, No. 5, 2017/05
  • プラズマ照射によるポリスチレン細胞培養皿表面のアミノ基修飾, 2017/03
  • Estrogen alters gonadal soma-derived factor (Gsdf)/Foxl2 expression levels in the testes associated with testis-ova differentiation in adult medaka, Oryzias latipes, Tohru Kobayashi,Ayaka Chiba,Tadashi Sato,Taijun Myosho,Jun Yamamoto,Tetsuro Okamura,Yuta Onishi,Mitsuru Sakaizumi,Satoshi Hamaguchi,Taisen Iguchi,Yoshifumi Horie, Aquatic Toxicology, Elsevier B.V., Vol. 191, p. 209-218, 2017
  • Preface: Sixth International Conference on Plasma Medicine (ICPM-6), Zdenko Machala,Satoshi Hamaguchi,Gregory Fridman, Plasma Medicine, Vol. 7, No. 2, p. v-vi, 2017
  • Atmospheric-pressure plasma-irradiation inhibits mouse embryonic stem cell differentiation to mesoderm and endoderm but promotes ectoderm differentiation, Taichi Miura,Satoshi Hamaguchi,Shoko Nishihara, J. Phys. D: Appl. Phys. 49 (2016) 165401 (12pp)., IOP PUBLISHING LTD, Vol. 49, No. 16, 2016/12
  • Surface reactions of amorphous carbon layers by argon and fluorocarbon ion beams, 2016/11
  • Molecular dynamics study on fluorine radical multilayer adsorption mechanism during Si, SiO2, and Si3N4 etching processes, Satoshi Numazawa,Ken Machida,Michiro Isobe,Satoshi Hamaguchi, Jpn. J. Appl. Phys. 55 (2016) 116204 (pp6)., IOP PUBLISHING LTD, Vol. 55, No. 11, 2016/11
  • GENERATION AND TRANSPORT OF LIQUID-PHASE REACTIVE SPECIES DUE TO PLASMA-LIQUID INTERACTION, Kazumasa Ikuse,Tomoko Ito,Satoshi Hamaguchi, 2016 43RD IEEE INTERNATIONAL CONFERENCE ON PLASMA SCIENCE (ICOPS), IEEE, 2016/04
  • Mass-selected ion beam study on etching characteristics of ZnO by methane-based plasma, Hu Li,Kazuhiro Karahashi,Masanaga Fukasawa,Kazunori Nagahata,Tetsuya Tatsumi,Satoshi Hamaguchi, Japanese Journal of Applied Physics, IOP PUBLISHING LTD, Vol. 55, No. 2, 2016/02
  • Mass spectrometry analyses of ions generated by atmospheric-pressure plasma jets in ambient air, Tomoko Ito,Kensaku Gotou,Kanako Sekimoto,Satoshi Hamaguchi, Plasma Medicine, Vol. 5, No. 2-4, p. 283-298, 2015/12
  • Sputtering yields and surface chemical modification of tin-doped indium oxide in hydrocarbon-based plasma etching, Hu Li,Kazuhiro Karahashi,Masanaga Fukasawa,Kazunori Nagahata,Tetsuya Tatsumi,Satoshi Hamaguchi, Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, A V S AMER INST PHYSICS, Vol. 33, No. 6, 2015/11
  • Correlation between dry etching resistance of Ta masks and the oxidation states of the surface oxide layers, Vol. 33, No. 5, 2015/09
  • Numerical simulation of atomic-layer oxidation of silicon by oxygen gas cluster beams, 2015/09
  • Correlation between dry etching resistance of Ta masks and the oxidation states of the surface oxide layers, Makoto Satake,Masaki Yamada,Hu Li,Kazuhiro Karahashi,Satoshi Hamaguchi, Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics, A V S AMER INST PHYSICS, Vol. 33, No. 5, 2015/09/01
  • In Focus: Plasma Medicine., David Graves,Satoshi Hamaguchi,Deborah O'Connell, Biointerphases, AMER INST PHYSICS, Vol. 10, No. 2, p. 029301-029301, 2015/06/25
  • Suboxide/subnitride formation on Ta masks during magnetic material etching by reactive plasmas, Hu Li,Yu Muraki,Kazuhiro Karahashi,Satoshi Hamaguchi, Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, A V S AMER INST PHYSICS, Vol. 33, No. 4, 2015/04
  • Molecular dynamics simulation of silicon oxidation enhanced by energetic hydrogen ion irradiation, Kohei Mizotani,Michiro Isobe,Masanaga Fukasawa,Kazunori Nagahata,Tetsuya Tatsumi,Satoshi Hamaguchi, Journal of Physics D: Applied Physics, IOP PUBLISHING LTD, Vol. 48, No. 15, 2015/04
  • Molecular dynamic simulation of damage formation at Si vertical walls by grazing incidence of energetic ions in gate etching processes, Kohei Mizotani,Michiro Isobe,Satoshi Hamaguchi, Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, A V S AMER INST PHYSICS, Vol. 33, No. 2, 2015/03
  • Turnover of sex chromosomes in Celebensis Group medaka fishes, Taijun Myosho,Yusuke Takehana,Satoshi Hamaguchi,Mitsuru Sakaizumi, G3: Genes, Genomes, Genetics, Genetics Society of America, Vol. 5, No. 12, p. 2685-2691, 2015
  • Ion beam experiments for the study of plasma-surface interactions, Kazuhiro Karahashi,Satoshi Hamaguchi, Journal of Physics D: Applied Physics, IOP PUBLISHING LTD, Vol. 47, No. 22, 2014/06
  • Special issue: 5th international conference on plasma medicine (ICPM5), Nara, Japan, 18-23 May 2014, Satoshi Hamaguchi, Plasma Medicine, Vol. 4, No. 1-4, 2014/04
  • Low energy indium or gallium ion implantations to SiO2 thin films for development of novel catalysts, S. Yoshimura,M. Kiuchi,Y. Nishimoto,M. Yasuda,A. Baba,S. Hamaguchi, e-Journal of Surface Science and Nanotechnology, 日本表面科学会, Vol. 12, p. 197-202, 2014/04
  • Proliferation assay of mouse embryonic stem (ES) cells exposed to atmospheric-pressure plasmas at room temperature, Taichi Miura,Ayumi Ando,Kazumi Hirano,Chika Ogura,Tatsuya Kanazawa,Masamichi Ikeguchi,Atsushi Seki,Shoko Nishihara,Satoshi Hamaguchi, Journal of Physics D: Applied Physics, IOP PUBLISHING LTD, Vol. 47, No. 44, 2014/04
  • Characterization of polymer layer formation during SiO<inf>2</inf>/SiN etching by fluoro/hydrofluorocarbon plasmas, Keita Miyake,Tomoko Ito,Michiro Isobe,Kazuhiro Karahashi,Masanaga Fukasawa,Kazunori Nagahata,Tetsuya Tatsumi,Satoshi Hamaguchi, Japanese Journal of Applied Physics, IOP PUBLISHING LTD, Vol. 53, No. 3, 2014/03
  • Low energy gallium ion injections to silicon dioxide thin films for development of novel catalysts, S. Yoshimura,M. Kiuchi,Y. Nishimoto,M. Yasuda,A. Baba,S. Hamaguchi, International Symposium on Non-equilibrium Plasma and Complex-System Sciences (IS-NPCS), 26-28 February, 2014, Icho Kaikan, Osaka University, Osaka, Japan (P-04)., 2014/02
  • Low energy indium or gallium iom beam injection to SiO2 thin films for development of novel catalysts, S. Yoshimura,M. Kiuchi,Y. Nishimoto,M. Yasuda,A. Baba,S. Hamaguchi, 12th International Conference on Atomically Controlled Surfaces, Interfaces and Nanostructures (ACSIN-12) & 21st International Colloquium on Scanning Probe Microscopy (ICSPM21), 2013/11
  • Dependence of catalytic properties of indium implanted SiO2 thin films on the film-substrate temperature during indium ion implantation, S. Yoshimura,K. Ikuse,M. Kiuchi,Y. Nishimoto,M. Yasuda,A. Baba,S. Hamaguchi, Nuclear Instruments and Methods in Physics Research B, Vol. 315, p. 222-226, 2013/11
  • Surface Modification of Poly(methyl methacrylate) by Hydrogen-Plasma Exposure and Its Sputtering Characteristics by Ultraviolet Light Irradiation, Satoru Yoshimura,Kazumasa Ikuse,Satoshi Sugimoto,Kensuke Murai,Kuniaki Honjo,Masato Kiuchi,Satoshi Hamaguchi, JAPANESE JOURNAL OF APPLIED PHYSICS, IOP PUBLISHING LTD, Vol. 52, No. 9, p. 090201-1--4, 2013/09
  • Grid-pattern formation of extracellular matrix on silicon by low-temperature atmospheric-pressure plasma jets for neural network biochip fabrication, Ayumi Ando,Hidetaka Uno,Tsuneo Urisu,Satoshi Hamaguchi, Applied Surface Science, ELSEVIER SCIENCE BV, Vol. 276, p. 1-6, 2013/07
  • Quantum cascade laser absorption spectroscopy with the amplitude-to-time conversion technique for atmospheric-pressure plasmas, Takayoshi Yumi,Noriaki Kimura,Satoshi Hamaguchi, JOURNAL OF APPLIED PHYSICS, AMER INST PHYSICS, Vol. 113, No. 21, 2013/06
  • Characteristics of silicon etching by silicon chloride ions, Tomoko Ito,Kazuhiro Karahashi,Song Yun Kang,Satoshi Hamaguchi, Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, A V S AMER INST PHYSICS, Vol. 31, No. 3, 2013/05
  • Oxidation of nitric oxide by atmospheric pressure plasma in a resonant plasma reactor, Takayoshi Yumii,Takashi Yoshida,Kyoji Doi,Noriaki Kimura,Satoshi Hamaguchi, JOURNAL OF PHYSICS D-APPLIED PHYSICS, IOP PUBLISHING LTD, Vol. 46, No. 13, 2013/04
  • プラズマの医療応用, 2013/01
  • Chemically reactive species in liquids generated by atmospheric-pressure plasmas and their roles in plasma medicine, Satoshi Hamaguchi, AIP Conference Proceedings, AMER INST PHYSICS, Vol. 1545, p. 214-222, 2013
  • Sputtering yields and surface modification of poly(methyl methacrylate) (PMMA) by low-energy Ar+/CF3+ ion bombardment with vacuum ultraviolet (VUV) photon irradiation, Satoru Yoshimura,Yasuhiro Tsukazaki,Masato Kiuchi,Satoshi Sugimoto,Satoshi Hamaguchi, JOURNAL OF PHYSICS D-APPLIED PHYSICS, IOP PUBLISHING LTD, Vol. 45, No. 50, p. 505201-1--10, 2012/12
  • Sputtering yields of magnesium hydroxide [Mg(OH)2] by noble-gas ion bombardment, K. Ikuse,S. Yoshimura,M. Kiuchi,M. Terauchi,M. Mishitani,S. Hamaguchi, Journal of Physics D: Applied Physics, Institute of Physics, Vol. 45, No. 43, p. 432001-1--5, 2012/10
  • Efficient modification of the surface properties of interconnected porous hydroxyapatite by low-pressure low-frequency plasma treatment to promote its biological performance, Dae Sung Lee,Yu Moriguchi,Akira Myoui,Hideki Yoshikawa,Satoshi Hamaguchi, Journal of Physics D: Applied Physics, IOP PUBLISHING LTD, Vol. 45, No. 37, 2012/09
  • Si damage due to oblique-angle ion impact relevant for vertical gate etching processes, Tomoko Ito,Kazuhiro Karahashi,Kohei Mizotani,Michiro Isobe,Song Yun Kang,Masanobu Honda,Satoshi Hamaguchi, Japanese Journal of Applied Physics, JAPAN SOC APPLIED PHYSICS, Vol. 51, No. 8, 2012/08
  • Sputtering Yields of CaO, SrO, and BaO by Monochromatic Noble Gas Ion Bombardment, Satoru Yoshimura,Kiyohiro Hine,Masato Kiuchi,Jun Hashimoto,Masaharu Terauchi,Yosuke Honda,Mikihiko Nishitani,Satoshi Hamaguchi, JAPANESE JOURNAL OF APPLIED PHYSICS, JAPAN SOC APPLIED PHYSICS, Vol. 51, No. 8, p. 08HB02-1--4, 2012/08
  • Microcavity array plasma system for remote chemical processing at atmospheric pressure, Dae Sung Lee,Satoshi Hamaguchi,Osamu Sakai,Sung Jin Park,J. Gary Eden, Journal of Physics D: Applied Physics, IOP PUBLISHING LTD, Vol. 45, No. 22, 2012/06
  • Low energy metal ion beam production with a modified Freeman-type ion source for development of novel catalysts, S. Yoshimura,M. Kiuchi,Y. Nishimoto,M. Yasuda,A. Baba,S. Hamaguchi, e-Journal of Surface Science and Nanotechnology, Vol. 10, p. 139-144, 2012/04
  • Dependence of catalytic properties of Indium-implanted SiO2 thin films on the energy and dose of incident Indium ions, S. Yoshimura,M. Kiuchi,Y. Nishimoto,M. Yasuda,A. Baba,S. Hamaguchi, Thin Solid Films, Vol. 520, No. 15, p. 4894-4897, 2012/04
  • Extracellular matrix patterning for cell alignment by atmospheric pressure plasma jets, Ayumi Ando,Toshifumi Asano,Md Abu Sayed,Ryugo Tero,Katsuhisa Kitano,Tsuneo Urisu,Satoshi Hamaguchi, Japanese Journal of Applied Physics, IOP PUBLISHING LTD, Vol. 51, No. 3 PART 1, 2012/03
  • Low energy mass-selected metal ion beam production with a modified Freeman-type ion source, S. Yoshimura,M. Kiuchi,S. Hamaguchi, The 8th EU-Japan Joint Symposium on Plasma Processing (JSPP2012), 16-18 January, 2012, Todaiji Culture Center, Nara, Japan, P-21, 2012/01
  • Micro-pattern formation of extracellular matrix (ECM) layers by atmospheric-pressure plasmas and cell culture on the patterned ECMs, Ayumi Ando,Toshifumi Asano,Tsuneo Urisu,Satoshi Hamaguchi, Journal of Physics D: Applied Physics, IOP PUBLISHING LTD, Vol. 44, No. 48, 2011/12
  • Measurement of MgO, CaO, SrO, and BaO sputtering yields by noble gas ions for plasma display panel cells, S. Yoshimura,K. Hine,M. Kiuchi,J. Hashimoto,M. Terauchi,Y. Honda,M. Nishitani,S. Hamaguchi, Proceedings of International Symposium on Dry Process, 2011/11
  • Plasma microchannel and jet enhanced by an array of ellipsoidal microcavities, D. S. Lee,O. Sakai,S. J. Park,J. G. Eden,S. Hamaguchi, IEEE Transactions on Plasma Science, Vol. 39, No. 11, p. 2690-2691, 2011/11
  • Improvement of hydrophilicity of interconnected porous hydroxyapatite by dielectric barrier discharge plasma treatment, Dae Sung Lee,Yu Moriguchi,Kiyoshi Okada,Akira Myoui,Hideki Yoshikawa,Satoshi Hamaguchi, IEEE Transactions on Plasma Science, IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC, Vol. 39, No. 11, p. 2166-2167, 2011/11
  • Dynamics of near-atmospheric-pressure hydrogen plasmas driven by pulsed high voltages, Chieh Wen Lo,Satoshi Hamaguchi, IEEE Transactions on Plasma Science, IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC, Vol. 39, No. 11, p. 2100-2101, 2011/11
  • Electron density measurement of inductively coupled plasmas by terahertz time-domain spectroscopy (THz-TDS), Ayumi Ando,Tomoko Kurose,Vivien Reymond,Katsuhisa Kitano,Hideaki Kitahara,Keisuke Takano,Masahiko Tani,Masanori Hangyo,Satoshi Hamaguchi, Journal of Applied Physics, AMER INST PHYSICS, Vol. 110, No. 7, 2011/10/01
  • Hydrogen effects in hydrofluorocarbon plasma etching of silicon nitride: Beam study with CF<sup>+</sup>, CF<inf>2</inf><sup>+</sup>, CHF<inf>2</inf><sup>+</sup>, and CH<inf>2</inf>F<sup>+</sup> ions, Tomoko Ito,Kazuhiro Karahashi,Masanaga Fukasawa,Tetsuya Tatsumi,Satoshi Hamaguchi, Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, A V S AMER INST PHYSICS, Vol. 29, No. 5, 2011/09
  • Numerical analyses of hydrogen plasma generation by nanosecond pulsed high voltages at near-atmospheric pressure, Chieh Wen Lo,Satoshi Hamaguchi, Journal of Physics D: Applied Physics, IOP PUBLISHING LTD, Vol. 44, No. 37, 2011/09
  • Rapid breakdown mechanisms of open air nanosecond dielectric barrier discharges., Tsuyohito Ito,Tatsuya Kanazawa,Satoshi Hamaguchi, Physical review letters, AMER PHYSICAL SOC, Vol. 107, No. 6, p. 065002-065002, 2011/08/05
  • Si recess of polycrystalline silicon gate etching: Damage enhanced by ion assisted oxygen diffusion, Tomoko Ito,Kazuhiro Karahashi,Masanaga Fukasawa,Tetsuya Tatsumi,Satoshi Hamaguchi, Japanese Journal of Applied Physics, JAPAN SOC APPLIED PHYSICS, Vol. 50, No. 8, 2011/08
  • Experimental evaluation of CaO, SrO and BaO sputtering yields by Ne+ or Xe+ ions, Satoru Yoshimura,Kiyohiro Hine,Masato Kiuchi,Jun Hashimoto,Masaharu Terauchi,Yosuke Honda,Mikihiko Nishitani,Satoshi Hamaguchi, JOURNAL OF PHYSICS D-APPLIED PHYSICS, IOP PUBLISHING LTD, Vol. 44, No. 25, 2011/06
  • Novel catalysts: Indium implanted SiO2 thin films, S. Yoshimura,K. Hine,M. Kiuchi,Y. Nishimoto,M. Yasuda,A. Baba,S. Hamaguchi, Applied Surface Science, Vol. 257, No. 1, p. 192-196, 2010/10
  • Effect of light irradiation from inductively coupled Ar plasma on etching yields of SiO2 film by CF3 ion beam injections, S. Yoshimura,Y. Tsukazaki,K. Ikuse,M. Kiuchi,S. Hamaguchi, Journal of Physics: Conference Series, Vol. 232, No. 1, 2010/04
  • Electric field measurements at near-atmospheric pressure by coherent Raman scattering of laser beams, Tsuyohito Ito,Kazunobu Kobayashi,Sarah Mueller,Uwe Czarnetzki,Satoshi Hamaguchi, Journal of Physics: Conference Series, Vol. 227, 2010/04
  • Molecular dynamics simulation of the formation of sp3 hybridized bonds in hydrogenated diamondlike carbon deposition processes., Yasuo Murakami,Seishi Horiguchi,Satoshi Hamaguchi, Physical review. E, Statistical, nonlinear, and soft matter physics, Vol. 81, No. 4 Pt 1, p. 041602-041602, 2010/04
  • Electric field measurements in near-atmospheric pressure nitrogen and air based on a four-wave mixing scheme, Sarah Müller,Tsuyohito Ito,Kazunobu Kobayashi,Dirk Luggenhölscher,Uwe Czarnetzki,Satoshi Hamaguchi, Journal of Physics: Conference Series, IOP PUBLISHING LTD, Vol. 227, 2010/04
  • Plasma-surface interactions in material processing, Satoshi Hamaguchi, Journal of Physics: Conference Series, IOP PUBLISHING LTD, Vol. 257, No. 1, 2010/04
  • Evaluation of Si etching yields by Cl<sup>+</sup> Br<sup>+</sup> and HBr<sup>+</sup> ion irradiation, Tomoko Ito,Kazuhiro Karahashi,Song Yun Kang,Satoshi Hamaguchi, Journal of Physics: Conference Series, IOP PUBLISHING LTD, Vol. 232, No. 1, 2010/04
  • Reverse propagation of atmospheric pressure plasma jets, Tsuyohito Ito,Aurélien Raddenzati,Artabaze Shams,Satoshi Hamaguchi, Japanese Journal of Applied Physics, JAPAN SOC APPLIED PHYSICS, Vol. 49, No. 10, p. 1002091-1002093, 2010/04
  • Facile creation of biointerface on commodity plastic surface by combination of atmospheric plasma and reactive polymer coating, Naoki Kanayama,Swapan Kumar Saha,Naoki Nakayama,Jun Nakanishi,Katsuhisa Kitano,Satoshi Hamaguchi,Yukio Nagasaki, Journal of Photopolymer Science and Technology, TECHNICAL ASSOC PHOTOPOLYMERS,JAPAN, Vol. 23, No. 4, p. 579-583, 2010/04
  • Particle-in-cell simulations of high-pressure hydrogen plasmas driven by nano-second pulsed high-voltages, Chieh Wen Lo,Satoshi Hamaguchi, Journal of Physics: Conference Series, IOP PUBLISHING LTD, Vol. 232, No. 1, 2010/04
  • Effects of hydrogen incorporation in the formation of hydrogenated diamond-like carbon films, Yasuo Murakami,Koji Hosaka,Satoshi Hamaguchi, Journal of Physics: Conference Series, IOP PUBLISHING LTD, Vol. 232, No. 1, 2010/04
  • Molecular dynamics simulation of the formation of sp(3) hybridized bonds in hydrogenated diamondlike carbon deposition processes, Yasuo Murakami,Seishi Horiguchi,Satoshi Hamaguchi, PHYSICAL REVIEW E, AMER PHYSICAL SOC, Vol. 81, No. 4, p. 041602-041602, 2010/04
  • Rapid formation of electric field profiles in repetitively pulsed high-voltage high-pressure nanosecond discharges, Tsuyohito Ito,Kazunobu Kobayashi,Uwe Czarnetzki,Satoshi Hamaguchi, Journal of Physics D: Applied Physics, IOP PUBLISHING LTD, Vol. 43, No. 6, 2010/02
  • Electron density measurement for plasmas by terahertz time-domain spectroscopy, A. Ando,H. Kitahara,T. Kurose,K. Kitano,K. Takano,M. Tani,M. Hangyo,S. Hamaguchi, Journal of Physics: Conference Series, Vol. 227, 2010
  • Protein patterning by atmospheric-pressure plasmas, A. Ando,M. A. Sayed,T. Asano,R. Tero,K. Kitano,T. Urisu,S. Hamaguchi, Journal of Physics: Conference Series, Vol. 232, No. 1, 2010
  • Effects of pH on Bacterial Inactivation in Aqueous Solutions due to Low-Temperature Atmospheric Pressure Plasma Application, S. Ikawa,K. Kitano,S. Hamaguchi, Plasma Process. Polym. 7(1), 33-42 (2010), WILEY-V C H VERLAG GMBH, Vol. 7, No. 1, p. 33-42, 2010/01
  • Diagnosis of atmospheric pressure plasmas by using terahertz time-domain spectroscopy, Hideaki Kitahara,Ayumi Ando,Katsuhisa Kitano,Masahiko Tani,Masanori Hangyo,Satoshi Hamaguchi, IRMMW-THz 2010 - 35th International Conference on Infrared, Millimeter, and Terahertz Waves, Conference Guide, IEEE, 2010
  • Effect of ultraviolet light irradiation on etching process of polymethylmethacrylate by ion beam injection, S. Yoshimura,K. Ikuse,Y. Tsukazaki,M. Kiuchi,S. Hamaguchi, Journal of Physics : Conference Series, Vol. 191, 2009/12
  • Structure of laboratory ball lightning., Tsuyohito Ito,Tomoya Tamura,Mark A Cappelli,Satoshi Hamaguchi, Physical review. E, Statistical, nonlinear, and soft matter physics, Vol. 80, No. 6 Pt 2, p. 067401-067401, 2009/12
  • Measurement of sputtering/etching yields by CF3 ion beam injection with UV light irradiation, Y. Tsukazaki,K. IKuse,S.Yoshimura,M. Kiuchi,S. Hamaguchi, 4th International Symposium on Atomic Technologies, 18-19 November, 2009, Seaside Hotek MAIKO VILLA, Kobe, 2009/11
  • Preparation of Stable Water-Dispersible PEGylated Gold Nanoparticles Assisted by Nonequilibrium Atmospheric-Pressure Plasma Jets, Hitoshi Furusho,Katsuhisa Kitano,Satoshi Hamaguchi,Yukio Nagasaki, Chemistry of Materials, AMER CHEMICAL SOC, Vol. 21, No. 15, p. 3526-3535, 2009/08
  • Sputtering yields of Au by low-energy noble gas ion bombardment, K. Ikuse,S. Yoshimura,K. Hine,M. Kiuchi,S. Hamaguchi, Journal of Physics D: Applied Physics, Vol. 42, No. 13, 2009/07
  • Co Si<inf>x</inf> contact resistance after etching and ashing plasma exposure, Ken Katahira,Masanaga Fukasawa,Shoji Kobayashi,Toshifumi Takizawa,Michio Isobe,Satoshi Hamaguchi,Kazunori Nagahata,Tetsuya Tatsumi, Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, A V S AMER INST PHYSICS, Vol. 27, No. 4, p. 844-848, 2009/07
  • Discharge mechanisms of atmospheric-pressure LF (Low Frequency) microplasma jets, KITANO Katsuhisa,HAMAGUCHI Satoshi, Vol. 2009, No. 1, p. 49-54, 2009/06/12
  • Creation of biointerface by atmospheric plasma treatment of plasma sensitive polymeric materials, Swapan Kumar Saha,Jun Nakanishi,Katsuhisa Kitano,Satoshi Hamaguchi,Yukio Nagasaki, Journal of Photopolymer Science and Technology, TECHNICAL ASSOC PHOTOPOLYMERS,JAPAN, Vol. 22, No. 4, p. 481-484, 2009/04
  • Nonequilibrium atmospheric plasma jets assisted stabilization of drug delivery carriers: Preparation and characterization of biodegradable polymeric nano-micelles with enhanced stability, Shogo Sumitani,Hiroki Murotani,Motoi Oishi,Katsuhisa Kitano,Satoshi Hamaguchi,Yukio Nagasaki, Journal of Photopolymer Science and Technology, TECHNICAL ASSOC PHOTOPOLYMERS,JAPAN, Vol. 22, No. 4, p. 467-471, 2009/04
  • Effect of UV light irradiation on sputtering by CF3 ion beams, S.Yoshimura,K. IKuse,Y. Tsukazaki,M. Kiuchi,S. Hamaguchi, 3rd International Symposium on Atomic Technology and 3rd Polyscale Technology Workshop, 5-6 March, 2009, Tokyo International Exchange Center, 2009/03
  • Electric field measurement in an atmospheric or higher pressure gas by coherent Raman scattering of nitrogen, T. Ito,K. Kobayashi,S. Mueller,D. Luggenhölscher,U. Czarnetzki,S. Hamaguchi, J. Phys. D, IOP PUBLISHING LTD, Vol. 42, No. 9, 2009/02
  • Estimation of electron densities of plasmas by terahertz time-domain spectroscopy, Hideaki Kitahara,Ayumi Ando,Tomoko Kurose,Katsuhisa Kitano,Keisuke Takano,Masahiko Tani,Masanori Hangyo,Satoshi Hamaguchi, 34th International Conference on Infrared, Millimeter, and Terahertz Waves, IRMMW-THz 2009, IEEE, p. 205-+, 2009
  • MgO sputtering yields by noble gas ions at relatively low injection energies, S. Yoshimura,K. Hine,M. Matsukuma,K. Ikuse,M. Kiuchi,T. Nakao,J. Hashimoto,M. Terauchi,M. Nishitani,S. Hamaguchi, Proceedings of the 15th International Display Workshops, December 3-5, 2008, Toki Messe Niigata Convention Center, Vol. 3, p. 1865-1868, 2008/12
  • Experimental evaluation of MgO sputtering yields by monochromatic Ne, Kr, or Xe ion beams, K. Hine,S. Yoshimura,K. Ikuse,M. Kiuchi,J. Hashimoto,M. Terauchi,M. Nishitani,S. Hamaguchi, Thin Solid Films, ELSEVIER SCIENCE SA, Vol. 517, No. 2, p. 835-840, 2008/11
  • “Generation of Dust Seeds by Sputtering of Carbon-based Plasma Facing Materials under Low-energy H/D/T Ion Bombardment, Masashi Yamashiro,Satoshi Hamaguchi, Proceedings of the 22nd IAEA Fusion Energy Conference (13-18 Oct., 2008, Geneva, Switzerland), 2008/10
  • Electromagnetic Self-Organization and Transport Barrier Relaxations in Fusion Plasmas, G. Fuhr,S. Benkadda,P. Beyer,M. Leconte,X. Garbet,I. Sandberg,H. Isliker,D. Reiser,I. Caldas,Z.O. Guimarães-Filho,S. Hamaguchi, Proceedings of the 22nd IAEA Fusion Energy Conference (13-18 Oct., 2008, Geneva, Switzerland), 2008/10
  • Development of Diverse Lateral Line Patterns on the Teleost Caudal Fin, Hironori Wada,Satoshi Hamaguchi,Mitsuru Sakaizumi, DEVELOPMENTAL DYNAMICS, WILEY-LISS, Vol. 237, No. 10, p. 2889-2902, 2008/10
  • Reducing damage to Si substrates during gate etching processes, Tomokazu Ohchi,Shoji Kobayashi,Masanaga Fukasawa,Katsuhisa Kugimiya,Takashi Kinoshita,Toshifumi Takizawa,Satoshi Hamaguchi,Yukihiro Kamide,Tetsuya Tatsumi, Japanese Journal of Applied Physics, JAPAN SOCIETY APPLIED PHYSICS, Vol. 47, No. 7, p. 5324-5326, 2008/07
  • Measurement of Au sputtering yields by Ar and He with a low-energy mass selected ion beam system, K. Hine,S. Yoshimura,K. Ikuse,M. Kiuchi,S. Hamaguchi, Journal of Physics: Conference Series, Vol. 106, No. 1, 2008/04
  • Measurement of sticking probability and sputtering yield of Au by low-energy mass selected ion beams with a quartz crystal microbalance, K. Ikuse,S. Yoshimura,M. Kiuchi,K. Hine,S. Hamaguchi, Journal of Physics: Conference Series, Vol. 106, No. 1, 2008/04
  • Anomalous scaling of impurity transport in drift wave turbulence,, S. Futatani,S. Benkadda,Y. Nakamura,K. Kondo,S. Hamaguchi, Contrib. Plasma Phys., Vol. 48, No. 1-3, p. 111-115, 2008/04
  • Electromagnetic Effects on Transport Barrier Relaxations,, G. Fuhr,S. Benkadda,P. Beyer,X. Garbet,S. Hamaguchi, Contrib. Plasma Phys., Vol. 48, No. 1-3, p. 23-26, 2008/04
  • Plasma generation inside externally supplied Ar bubbles in water, H. Aoki,K. Kitano,S. Hamaguchi, Plasma Sources Sci. Technol., IOP PUBLISHING LTD, Vol. 17, No. 2, 2008/04
  • Nonlinear evolution of pressure gradient driven modes and anomalous transport in plasmas, Satoshi Hamaguchi, TURBULENT TRANSPORT IN FUSION PLASMA, AMER INST PHYSICS, Vol. 1013, p. 46-58, 2008/04
  • Magnetized Microdischarge Plasma Generation at Low Pressure, T. Ito,K. Kobayashi,S. Hamaguchi,M. A. Cappelli, Thin Solid Films, ELSEVIER SCIENCE SA, Vol. 516, No. 19, p. 6668-6672, 2008/04
  • Magnetized microdischarge plasmas in low pressure argon and helium, K. Kobayashi,T. Ito,M. A. Cappelli,S. Hamaguchi, J. Phys.: Conf. Series, IOP PUBLISHING LTD, Vol. 106, 2008/04
  • Molecular dynamics simulation of microcrystalline Si deposition processes by silane plasmas, M. Matsukuma,S. Hamaguchi, Thin Solid Films, ELSEVIER SCIENCE SA, Vol. 516, No. 11, p. 3443-3448, 2008/04
  • “Design of Biointerface by Nonequilibrium Atmospheric Plasma Jets -Approach from Plasma Susceptible Polymers-, Y. Nagasaki,M. Umeyama,M. Iijima,K. Kitano,S. Hamaguchi, J. Photopolym. Sci. Technol., TECHNICAL ASSOC PHOTOPOLYMERS,JAPAN, Vol. 21, No. 2, p. 267-270, 2008/04
  • Magnetic neutral loop discharge (NLD) plasmas for surface processing, Taijiro Uchida,Satoshi Hamaguchi, JOURNAL OF PHYSICS D-APPLIED PHYSICS, IOP PUBLISHING LTD, Vol. 41, No. 8, 2008/04
  • Molecular dynamics simulations for nitridation of organic polymer surfaces due to hydrogen-nitrogen ion beam injections, Masashi Yamashiro,Hideaki Yamada,Satoshi Hamaguchi, THIN SOLID FILMS, ELSEVIER SCIENCE SA, Vol. 516, No. 11, p. 3449-3453, 2008/04
  • 低周波大気圧マイクロプラズマジェット, Vol. 2009, No. 1, p. 49-54, 2008/04
  • The novel mutant scl of the medaka fish, Oryzias latipes, shows no secondary sex characters, Tadashi Sato,Aya Suzuki,Naoki Shibata,Mitsuru Sakaizumi,Satoshi Hamaguchi, Zoological Science, Vol. 25, No. 3, p. 299-306, 2008/03
  • Development of NIR bioimaging systems, Kohei Soga,Takashi Tsuji,Fumio Tashiro,Joe Chiba,Motoi Oishi,Keitaro Yoshimoto,Yukio Nagasaki,Katsuhisa Kitano,Satoshi Hamaguchi, Journal of Physics: Conference Series, Vol. 106, No. 1, 2008/03/01
  • Measurement of magnesium oxide sputtering yields by He and Ar ions with a low-energy mass-selected ion beam system, K. Hine,S. Yoshimura,K. Ikuse,M. Kiuchi,J. Hashimoto,M. Terauchi,M. Nishitani,S. Hamaguchi, Japanese Journal of Applied Physics, INST PURE APPLIED PHYSICS, Vol. 46, No. 46, p. L1132-L1134, 2007/11
  • Sputtering yields by noble gas injections measured with a low-energy mass analyzed ion beam system, K. Hine,S. Yoshimura,K. Ikuse,M. Kiuchi,S. Hamaguchi, 2nd International Symposium on Atomic Technologies (ISAT-2), 1-2 October, 2007, Awaji Yumebutai International Conference Center, Yumebutai, Awaji City, Hyogo, Japan, P-27, 2007/10
  • Radicals and non-equilibrium processes in low-temperature plasmas, Zoran Petrović,Nigel Mason,Satoshi Hamaguchi,Marija Radmilović-Radjenović, Journal of Physics: Conference Series, Vol. 86, No. 1, 2007/06/01
  • High-m multiple tearing modes in tokamaks: MHD turbulence generation, interaction with the internal kink and sheared flows, A. Bierwage,S. Benkadda,M. Wakatani,S. Hamaguchi,Q. Yu, 2007/04
  • Incident-energy dependence of crystalline structures of ion beam deposited Au thin films, T. Takizawa,T. Maeda,M. Kiuchi,S. Yoshimura,S. Hamaguchi, Philosophical Magazine, Vol. 87, No. 10, p. 1487-1495, 2007/04
  • Control of atomic layer degradation on Si substrate, Y. Nakamura,T. Tatsumi,S. Kobayashi,K. Kugimiya,T. Harano,A. Ando,T. Kawase,S. Hamaguchi,S. Iseda, J.Vac.Sci.Tech.A, Vol. 25, No. 4, p. 1062-1067, 2007/04
  • Dynamics of resistive double tearing modes with broad linear spectra, A. Bierwage,S. Benkadda,S. Hamaguchi,M. Wakatani, Phys. Plasmas, AMER INST PHYSICS, Vol. 14, No. 2, 2007/04
  • Synthesis of Uniformly Dispersed Metal Nanoparticles with Dispersion Stability by Nonequilibrium Atmospheric Plasma Jets, H. Furusho,D. Miyamoto,Y. Nagasaki,K. Kitano,S. Hamaguchi, J. Photopolymer Sci. Tech., TECHNICAL ASSOC PHOTOPOLYMERS,JAPAN, Vol. 20, No. 2, p. 229-233, 2007/04
  • Modelling of plasma surface interaction, S. Hamaguchi,M. Yamashiro,M. Matsukuma,H. Yamada, J. Phys. :Conf. Series, IOP PUBLISHING LTD, Vol. 86, No. 1, 2007/04
  • Molecular dynamics simulations of organic polymer dry etching at high substrate temperatures, Masashi Yamashiro,Hideaki Yamada,Satoshi Hamaguchi, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, JAPAN SOC APPLIED PHYSICS, Vol. 46, No. 4A, p. 1692-1699, 2007/04
  • Temporal evolution of ion fragment production from dimethylsilane by a hot tungsten wire and compounds deposited on the tungsten surface, Satoru Yoshimura,Akinori Toh,Masato Kiuchi,Satoshi Hamaguchi, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, INST PURE APPLIED PHYSICS, Vol. 46, No. 4A, p. 1707-1709, 2007/04
  • Molecular dynamics simulation study on substrate temperature dependence of sputtering yields for an organic polymer under ion bombardment, Masashi Yamashiro,Hideaki Yamada,Satoshi Hamaguchi, JOURNAL OF APPLIED PHYSICS, AMER INST PHYSICS, Vol. 101, No. 4, 2007/02
  • Atomic-scale analyses of non-equilibrium surface reactions during plasma processing, Satoshi Hamaguchi,Masashi Yamashiro,Hideaki Yamada, ECS Transactions, Vol. 8, No. 1, p. 185-190, 2007
  • Expression profiles of DMRT1 in closely related species of medaka indicate DMY has acquired a new expression pattern after duplication event, Hiroyuki Otake,Ai Shinomiya,Masaru Matsuda,Satoshi Hamaguchi,Mitsuru Sakaizumi, ZOOLOGICAL SCIENCE, ZOOLOGICAL SOC JAPAN, Vol. 23, No. 12, p. 1223-1223, 2006/12
  • Molecular dynamics study on Ar ion bombardment effects in amorphous SiO2 deposition processes, M. Taguchi,S. Hamaguchi, Japanese Journal of Applied Physics, AMER INST PHYSICS, Vol. 100, No. 12, 2006/12
  • Temporal evolution of ion fragment production from methylsilane by a hot tungsten wire, Satoru Yoshimura,Akinori Toh,Takahiro Toyoshima,Masato Kiuchi,Satoshi Hamaguchi, JOURNAL OF APPLIED PHYSICS, AMER INST PHYSICS, Vol. 100, No. 9, 2006/11
  • Substrate temperature dependence of sputtering yields in organic polymer plasma etching processes; short-time effects by ion bombardment, M. Yamashiro,H. Yamada,S. Hamaguchi, 2006/09
  • Radio-Frequency (RF)-driven atmospheric-pressure plasmas in contact with liquid, K. Kitano,H. Aoki,S. Hamaguchi, Japanese Journal of Applied Physics, JAPAN SOC APPLIED PHYSICS, Vol. 45, No. 10 B, p. 8294-8297, 2006/09
  • Numerical analysis of incident angle effects in reactive sputtering deposition of amorphous SiO2, M. Taguchi,S. Hamaguchi, Japanese Journal of Applied Physics, INST PURE APPLIED PHYSICS, Vol. 45, No. 10, p. 8163-8167, 2006/09
  • プラズマの素過程とモデリング, 2006/08
  • High-m multiple tearing modes in tokamaks: MHD turbulence generation, interaction with the internal kink and sheared flows, A. Bierwage,S. Benkadda,M. Wakatani,S. Hamaguchi,Q. Yu, 2006/08
  • Wild-derived XY sex-reversal mutants in the medaka, Oryzias latipes, Hiroyuki Otake,Ai Shinomiya,Masaru Matsuda,Satoshi Hamaguchi,Mitsuru Sakaizumi, GENETICS, GENETICS, Vol. 173, No. 4, p. 2083-2090, 2006/08
  • Atomic-level simulation of non-equilibrium surface chemical reactions under plasma-wall interaction, S. Hamaguchi, Computer Physics Communications, ELSEVIER SCIENCE BV, Vol. 177, No. 1-2 SPEC. ISS., p. 108-109, 2006/08
  • Patterns Intermittent Transport and Universality in Convective Turbulence in Fusion Plasmas, S. Benkadda,P. Beyer,K. Takeda,X. Garbet,S. Hamaguchi,N. Bian, 2006/06
  • Theory of breakdown phenomena in supercritical fluids, S. Hamaguchi, 2006/05
  • RF barrier discharges on the liquid water surface, K. Kitano,H. Aoki,S. Hamaguchi, Proceedings of the 3rd International Workshop on Microplasmas (IWM2006) (ed. by G. Babucke, May 9-11, 2006, Greifswald, Germany)p.67, 2006/05
  • RF barrier discharges on the liquid water surface, K. Kitano,H. Aoki,S. Hamaguchi, Proceedings of the 3rd International Workshop on Microplasmas (IWM2006) (ed. by G. Babucke, May 9-11, 2006, Greifswald, Germany)p.67, 2006/05
  • Fragment ions of methylsilane produced by hot tungsten wires, Satoru Yoshimura,Akinori Toh,Takuya Maeda,Satoshi Sugimoto,Masato Kiuchi,Satoshi Hamaguchi, Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, JAPAN SOC APPLIED PHYSICS, Vol. 45, No. 3 A, p. 1813-1815, 2006/03/08
  • Numerical analyses of subsurface reaction layers for reactive ion etching and sputtering deposition processes, S. Hamaguchi, 2006/03
  • Fragment ions of methylsilane produced by hot tungsten wires, S. Yoshimura,A. Toh,T. Maeda,S. Sugimoto,M. Kiuchi,S. Hamaguchi, Japanese Journal of Applied Physics, 物理系学術誌刊行協会, Vol. 45, No. 3A, p. 1813-1815, 2006/03
  • Atomistic scale analyses of reactive ion etching and sputtering deposition processes by numerical simulations, S. Hamaguchi, 2006/01
  • Electrode voltage distribution analyses for large-area capacitively coupled plasmas based on transmission line models, M. Matsukuma,S. Hamaguchi, Proceedings of the 6th International Conference on Reactive Plasmas and the 23rd Symposium on Plasma Processing (January 24-27,2006, Matsushima/Sendai, Japan) 275-276 (2006)., 2006/01
  • MD and MC simulations of amorphous SiO2 thin film formed by reactive sputtering deposition processes, M. Taguchi,S. Hamaguchi, Proceedings of the 6th International Conference on Reactive Plasmas and the 23rd Symposium on Plasma Processing (January 24-27,2006, Matsushima/Sendai, Japan) 103-104 (2006)., 2006/01
  • Molecular dynamics simulation analyses of surface damages during SiO2 selective etching processes,, T. Kawase,A. Ando,T. Tatsumi,S. Hamaguchi, Proceedings of the 6th International Conference on Reactive Plasmas and the 23rd Symposium on Plasma Processing (January 24-27,2006, Matsushima/Sendai, Japan) 89-90 (2006)., 2006/01
  • Investigation of RF-driven atmospheric-pressure plasmasin contact with liquid water, Katsuhisa Kitano,Hironori Aoki,Satoshi Hamaguchi, Proceedings of the 6th International Conference on Reactive Plasmas and 23th Symposium on Plasma Processing, 2006/01
  • Crystalline structure control of Au thin films in ion beam deposition processes, T. Takizawa,T. Maeda,S. Yoshimura,M. Kiuchi,S. Hamaguchi, Proceedings of the 6th International Conference on Reactive Plasmas and 23th Symposium on Plasma Processing, 2006/01
  • Fragment ions of methylsilane and dimethylsilane generated in tungsten-based catalytic chemical vapor deposition (Cat-CVD) processes, S. Yoshimura,A. Toh,T. Maeda,S. Sugimoto,M. Kiuchi,S. Hamaguchi, Proceedings of the 6th International Conference on Reactive Plasmas and 23th Symposium on Plasma Processing, 2006/01
  • Topography evolution of dielectric thin films on grating surfaces in Oblique Deposition by Multiple Sources (ODMS), M. Taguchi,T. Kunisada,S. Kusaka,S. Hamaguchi, IEEE Trans. Plasma Sci, IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC, Vol. 34, No. 4 I, p. 1084-1093, 2006/01
  • Gonadal development in XY sex-reversal mutants derived from wild populations of the medaka, Oryzias latipes, Hiroyuki Otake,Ai Shinomiya,Masaru Matsuda,Satoshi Hamaguchi,Mitsuru Sakaizumi, ZOOLOGICAL SCIENCE, ZOOLOGICAL SOC JAPAN, Vol. 22, No. 12, p. 1510-1510, 2005/12
  • Molecular dynamics simulation analyses on injection angle dependence of SiO2 sputtering yields by fluorocarbon beams, T. Kawase,S. Hamaguchi, Proceedings of the 5th International Symposium on Dry Process (November28-30, 2005, Jeju, Korea) 245-246 (2005)., ELSEVIER SCIENCE SA, Vol. 515, No. 12, p. 4883-4886, 2005/11
  • Time evolution of electrode voltage distribution in large-area capacitively coupled plasmas, M. Matsukuma,S. Hamaguchi, Proceedings of the 5th International Symposium on Dry Process (November28-30, 2005, Jeju, Korea) 349-350 (2005)., ELSEVIER SCIENCE SA, Vol. 515, No. 12, p. 5188-5192, 2005/11
  • MD simulation of amorphous SiO2 thin film formation in reactive sputter deposition processes,, M. Taguchi,S. Hamaguchi, Proceedings of the 5th International Symposium on Dry Process (November28-30,2005, Jeju, Korea) 243-244 (2005)., ELSEVIER SCIENCE SA, Vol. 515, No. 12, p. 4879-4882, 2005/11
  • Molecular dynamics simulation of plasma-surface interactions during dry etching processes, S. Hamaguchi,H. Yamada,M. Yamashiro, Proceedings of the 2005 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), Japan Society of Applied Physics, IEEE Electron Device Society,, Vol. 2005, p. 67-70, 2005/09
  • Atomistic modeling of etching and deposition processes via molecular dynamics simulations, S. Hamaguchi,H. Yamada,M. Yamashiro, Proceedings of the 2005 International Meeting for Future of Electron Devices, Kansai (2005IMFEDK: April 11-13, 2005, Kyoto University Clock Tower Centennial Hall, Kyoto, Japan), 31-32 (2005)., 2005/04
  • Atomisitic modeling of etching and deposition processes via molecular dynamics simulations, S. Hamaguchi,H. Yamada,M. Yamashiro, Proceedings of the 2005 International Meeting for Future of Electron Devices,Kanasai (2005IMFEDK), IEEE EIC,2005, 2005/04
  • Visualization of Interactions between Organic Polymer Surfaces and Ion beams obtained from Molecular Dynamics Simulations, H. Yamada,S. Hamaguchi, IEEE Trans. Plasma Sci. 33 (2) 246-247, Vol. 33, No. 2 I, p. 246-247, 2005/04
  • Nusselt number scaling in tokamak plasma turbulence, K. Takeda,S. Benkadda,S. Hamaguchi,M. Wakatani, Phys. Plasmas 12 (4) 052309-1 ~0523980-8, Vol. 12, No. 5, p. 1-8, 2005/04
  • Study on Transport Regimes of Ion Temperature Gradient Driven Turbulence, K. Takeda,S. Benkadda,S. Hamaguchi,M. Wakatani, J. Plasma and Fusion Research SERIES 6, 570-572, 2005/01
  • Effects of Van der Waals interactions on SiO2 etching by CFx plasmas, H. Ohta,S. Hamaguchi, J. Plasma and Fusion Research SERIES 6, 399-401, 2005/01
  • Plasma Beam Irradiation into Organic Polymer Surfaces, H. Yamada,S. Hamaguchi, J. Plasma and Fusion Research SERIES 6, 402-405, 2005/01
  • Molecular dynamics simulatin of low energy Au ion-beam deposition using the glue model, T. Takizawa,S. Hamaguchi,T. Fukuda,M. Kiuchi,K. Ito,H. Yamada, Proc. 22nd Symposium on Plasma Processing, Nagoya, Japan, 26-28 January, p.587-588 (2005), 2005/01
  • Numerical analyses of surface interactions between radical beams and organic polymer surfaces, H. Yamada,S. Hamaguchi, Plasma Phys. Control. Fusion 47 A11-A18, Vol. 47, No. 5 A, 2005/01
  • Plasma discharge in supercritical fluids, Satoshi Hamaguchi,Suresh C. Sharma, 32nd EPS Conference on Plasma Physics 2005, EPS 2005, Held with the 8th International Workshop on Fast Ignition of Fusion Targets - Europhysics Conference Abstracts, Vol. 3, p. 2298-2301, 2005
  • Nonlinear evolution of q=1 triple tearing modes in a tokamak plasma, A. Bierwage,S. Hamaguchi,M. Wakatani,S. Benkadda,X. Leoncini, Phy. Rev. Lett. 94(6), 065001-1~065001-4, Vol. 94, No. 6, p. 065001-065001, 2005/01
  • On Interatomic Potential Functions for Molecular Dynamics (MD) Simulations of Plasma-Wall Interactions, S. Hamaguchi,H. Ohta,H. Yamada, J. Plasma and Fusion Research, 2004/12
  • Mutations of the sex-determining gene DMY from wild populations of the medaka. Oryzias latipes, Hiroyuki Ohtake,Ai Shinomiya,Masaru Matsuda,Satoshi Hamaguchi,Mitsuru Sakaizumi, ZOOLOGICAL SCIENCE, ZOOLOGICAL SOC JAPAN, Vol. 21, No. 12, p. 1345-1345, 2004/12
  • Investigation of Interactions between Plasmas and Organic Polymer Surfaces using Molecular Dynamics Simulation, H. Yamada,S. Hamaguchi, Proceedings of the 21st Symposium on Plasma Processing(SPP-21)}, ed. by K. Ono, (Organizing Committee of SPP-21, Sapporo, 2004) p.214-215, 2004/12
  • Nonlinear Behavior of Resistive Pressure Driven Modes in Stellarator/Heliotron Plasmas with Vacuum Magnetic Islands, T. Unemura,S. Hamaguchi,M. Wakatani, Phys. Plasmas 11, 1545-1551, AMER INST PHYSICS, Vol. 11, No. 4, p. 1545-1551, 2004/12
  • Molecular-dynamics simulations of organic polymer etching by hydrocarbon beams, Hideaki Yamada,Satoshi Hamaguchi, Journal of Applied Physics, Vol. 96, No. 11, p. 6147-6152, 2004/12/01
  • Investigation of Interactions between Plasmas and Organic Polymer Surfaces using Molecular Dynamics Simulation, H. Yamada,S. Hamaguchi, Proceedings of the 21st Symposium on Plasma Processing(SPP-21)}, ed. by K. Ono, (Organizing Committee of SPP-21, Sapporo, 2004) p.214-215, 2004/12
  • Onset of intermittent thermal transport by ion-temperature gradient (ITG)-driven turbulence based on a low-degree-of-freedom model, K. Takeda,S. Benkadda,S. Hamaguchi,M. Wakatani, Phys. Plasmas 11(7), 3561-3571, AMER INST PHYSICS, Vol. 11, No. 7, p. 3561-3571, 2004/12
  • Molecular dynamics simulations of organic polymer etching by hydrocarbon beams, H. Yamada,S. Hamaguchi, J. Appl. Phys. vol. 96, 6147 (2004)., 2004/12
  • Onset of intermittent thermal transport by ion-temperature-gradient-driven turbulence based on a low-degree-of-freedom model, K. Takeda,S. Benkadda,S. Hamaguchi,M. Wakatani, Physics of Plasmas, Vol. 11, No. 7, p. 3561-3571, 2004/07
  • Nonlinear behavior of resistive pressure driven modes in stellarator/heliotron plasmas with vacuum magnetic islands, T. Unemura,S. Hamaguchi,M. Wakatani, Physics of Plasmas, Vol. 11, No. 4, p. 1545-1551, 2004/04
  • Introduction: Simulation Reseach in Plasma Application Technolgies, Satoshi Hamaguchi, 2004/01
  • シミュレーションによるプラズマ・システム構築, 2003/12
  • Molecular Dynamics Simulation of Organic Polymer Etching, H. Yamada,S. Hamaguchi, Proceedings of International Symposium on Dry Process (DPS2003), Tokyo 2003 (The Institute of Electrical Engineers of Japan, Tokyo, 2003), 49-54, 2003/12
  • Relaxation time of strongly coupled Yukawa systems, T. Saigo,S. Hamaguchi, Proceedings of the 26th International Conference on Phenomena in Ionized Gases (XXVI ICPIG) (ed. by J. Meichner, D. Loffhagen, and H. E. Wagner: XXVI ICPIG Committee, Greifswald, 2003) vol.1 pp.217-218, 2003/12
  • Molecular Dynamics simulation of polymer etching by H2 and N2 plasmas, H. Yamada,S. Hamaguchi, Proceedings of the 16th International Symposium on Plasma Chemistry (ISPC) (ed. by R. d'Agostino, P. Favia, F. Fracassi, F. Palumbo: Department of Chemistry, University of Bari, Institute of Inorganic Methodologies and Plasmas (IMIP), CNR Bari, 2003) pp. 209, 2003/12
  • Simulations of flattening processes on ion--bombarded silicon surfaces, T. Tani,S. Hamaguchi, Proceedings of the 20th Symposium on Plasma Processing (SPP-20)} (ed. by K. Ono: Organizing Committee of SPP-20, Kyoto, 2003) p.201-202, 2003/12
  • MD simulations of (H,C,N) systems for investigation of plasma-polymer surface reaction mechanisms, H. Yamada,S. Hamaguchi, Proceedings of the 20th Symposium on Plasma Processing (SPP-20)} (ed. by K. Ono: Organizing Committee of SPP-20, Kyoto, 2003) p.191-192, 2003/12
  • Destabilization of nonlinear resistive wall mode due to suppression of poloidal rotation in a cylindrical tokamak, M. Sato,S. Hamaguchi,M. Wakatani, Phys. Plasmas 10, 187-194, Vol. 10, No. 1, p. 187-194, 2003/12
  • Shear flow generation due to electromagnetic instabilities, M. Wakatani,M. Sato,N. Miyato,S. Hamaguchi, Nuclear Fusion 43(1), 63-67, Vol. 43, No. 1, p. 63-67, 2003/12
  • Masahiro Wakatani - Obituary, Vol. 56, No. 11, p. 91-92, 2003/11
  • Oxidation of cobalt(III)-sulfur-rich dithiolate complexes and spectroscopic and electrical properties of the oxidized species, Kazuya Kubo,Motohiro Nakano,Satoshi Hamaguchi,Gen Etsu Matsubayashi, Inorganica Chimica Acta, Vol. 346, p. 43-48, 2003/03/25
  • ナノスケール表面反応モデリング, 2002/12
  • Strongly Coupled Dusty Plasmas, HAMAGUCHI Satoshi, Journal of Plasma and Fusion Research, The Japan Society of Plasma Science and Nuclear Fusion Research, Vol. 78, No. 4, p. 313-319, 2002/12
  • Interatomic potentials for MD simulation of polymer etching by N2/H2 and NH3 plasmas, H. Yamada,S. Hamaguchi, Proceedings of International Symposium on Dry Process (DPS2002), Tokyo 2002 : The Institute of Electrical Engineers of Japan, Tokyo, 2002), 189-194, 2002/12
  • Molecular Dynamics Simulation of Si and SiO2 Etching, S. Hamaguch, Proceedings of Joint Conference of ESCAMPIG16 and ICRP5, (ed. by N. Sadeghi and H. Sugai, European Physical Society and Japan Society of Applied Physics, Grenoble, 2002), Vol.II, pp.5-6, 2002/12
  • Shear viscosity of strongly coupled Yukawa systems, T. Saigo,S. Hamaguchi, Phys. Plasmas 9(4), 1210-1216, Vol. 9, No. 4, p. 1210-1216, 2002/12
  • Surface molecular dynamics of Si/SiO2 reactive ion etching, S. Hamaguchi,H. Ohta, Vacuum 66(3-4), 189-195, Vol. 66, No. 3-4, p. 189-195, 2002/12
  • Nonlinear behaviour of resistive drift-Alfven instabilities in a magnetized cylindrical plasma, N. Miyato,S. Hamaguchi,M. Wakatani, Plasma Phys. Control. Fusion 44(8), 1689-1705, Vol. 44, No. 8, p. 1689-1705, 2002/12
  • Effect of poloidal shear flow on local flattening of density profile due to nonlinear resistive interchange mode, T. Unemura,S. Hamaguchi,M. Wakatani, Plasma Phys. Control. Fusion 44(5A), A507-515, The Physical Society of Japan, Vol. 44, No. 5 A, p. 137-137, 2002/12
  • ELM-like behaviour generated by nonlinear ion-temperature-gradient-driven mode, K. Takeda,S. Hamaguchi,M. Wakatani, Plasma Phys. Control. Fusion 44(5A), A487-494, Vol. 44, No. 5 A, 2002/12
  • Resistive drift-Alfv&eacute;n instability in tokamak edge plasmas, N. Miyato,S. Hamaguchi,M. Wakatani, Plasma Phys. Control. Fusion 44 No 5A A293-A298, Vol. 44, No. 5 A, 2002/05
  • プロセスシミュレーション, 2001/12
  • IT革命とエネルギー問題, 2001/12
  • Fluid simulation of two-dimensional axially symmetric RF plasmas, H. Ishiwata,S. Hamaguchi, Proceedings of Plasma Science Symposium 2001 and the 18th Symposium on Plasma Processing (PSS-2001/SPP-18)} (ed. by N. Sato and H. Fujiyama: Organization Committee of PSS2001/SPP-18, Kyoto, 2001) p. 207-208, 2001/12
  • Simulations of plasma-surface interaction in reactive plasmas, HAMAGUCHI Satoshi, OYOBUTURI, The Japan Society of Applied Physics, Vol. 70, No. 9, p. 1099-1103, 2001/12
  • Molecular Dynamics Simulation of Surface Reactions during Plasma Etching Processes, HAMAGUCHI Satoshi, Journal of plasma and fusion research, Vol. 77, No. 12, p. 1221-1229, 2001/12
  • Waves in strongly-coupled classical one-component plasmas and Yukawa fluids, S. Hamaguchi,H. Ohta, Physica Scripta, T89, 127-129, Vol. 89, p. 127-129, 2001/12
  • Atomic-scale surface analysis of silicon etching by Cl/O plasmas, H. Ohta,S. Hamaguchi, Proceedings of International Symposium on Dry Process (DPS2001), Tokyo 2001 (The Institute of Electrical Engineers of Japan, Tokyo, 2001), 129-133, 2001/12
  • Modeling of Surface Reactions for Silicon and Silicon Dioxide Etching Processes, S. Hamaguchi,H. Ohta, Proceedings of the First International Symposium on Advanced Fluid Information (Institute of Fluid Science, Tohoku University, Sendai, 2001) p206-207, 2001/12
  • Numerical simulation of surface reaction dynamics for Si/SiO2 selective etching, S. Hamaguchi,H. Ohta, Extended Abstracts of International Symposium on Material Processing for Nanostructure Devices (MPND2001 Committee, Kyoto, 2001) p75-76, 2001/12
  • Three dimensional model for plasma-induced charging in asymmetric microstructure, S. S. Kim,S. Hamaguchi, Proceedings of the 25th International Conference on Phenomena in Ionized Gases (XXVICPIG) (ed. by T.~Goto: XXVICPIG Committee, Nagoya, 2001) pp.225-226, 2001/12
  • Screening effects on shear viscosity in strongly coupled Yukawa systems, T. Saigo,S. Hamaguchi, Proceedings of the 25th International Conference on Phenomena in Ionized Gases (XXVICPIG) (ed. by T.~Goto: XXVICPIG Committee, Nagoya, 2001) pp.53-54, 2001/12
  • Finite--element drift--diffusion simulation of two-dimensional axisymmetric parallel plate Ar discharges, H. Ishiwata,S. Hamaguchi, Proceedings of the 25th International Conference on Phenomena in Ionized Gases (XXVICPIG) (ed. by T.~Goto: XXVICPIG Committee, Nagoya, 2001) pp.209-210, 2001/12
  • Surface reaction dynamics of Si/SiO2 selective etching for halogens, H. Ohta,S. Hamaguchi, Proceedings of the 25th International Conference on Phenomena in Ionized Gases (XXVICPIG) (ed. by T.~Goto: XXVICPIG Committee, Nagoya, 2001) pp.159-160, 2001/12
  • Molecular dynamics simulation of Si/SiO2 selective etching, S. Hamaguchi,H. Ohta, Proceedings of the 6th International Symposium on Sputtering and Plasma Processes (ISSP2001) (ed. by E. Kusano: ISSP2001 Committee, Kanazawa, 2001) pp.85-89, 2001/12
  • Molecular dynamics simulation of Si and SiO2 selective etching, S. Hamaguchi,H. Ohta, Proceedings of the 15th International Symposium on Plasma Chemistry (ed. by A. Bouchoule, J. M. Pouvesle, A. L. Thomann, J. M. Bauchire, and E. Robert:The Organization Committee of the 15th International Symposium on Plasma Chemistry, Orleans, 2001) Vol. V, 1701-1704, 2001/12
  • Molecular dynamics simulations of Si and SiO2 reactive ion etching by halogens, in Semiconductor Technology, S. Hamaguchi,H. Ohta, by M. Yang: Proceeding of the 1st International Conference on Semiconductor Technology, The Electrochemical Society, Inc., New Jersey, 2001), vol. 2, 388-393, 2001/12
  • MD Simulation of Silicon and Silicon Dioxide Etching by Halogens: The Effect of Neutral Halogens on Etch Selectivities, H.Ohta,S. Hamaguchi, Proceedings of Plasma Science Symposium 2001 and the 18th Symposium on Plasma Processing (PSS-2001/SPP-18)} (ed. by N. Sato and H. Fujiyama: Organization Committee of PSS2001/SPP-18, Kyoto, 2001) p.~469-470, 2001/12
  • PIC/MCC simulation of a 2d axially symmetric dual-frequency RF plasma processing systems, S. Sunohara,S. Hamaguchi, Proceedings of Plasma Science Symposium 2001 and the 18th Symposium on Plasma Processing (PSS-2001/SPP-18)} (ed. by N. Sato and H. Fujiyama: Organization Committee of PSS2001/SPP-18, Kyoto, 2001) p. 209-210, 2001/12
  • Shear Viscosity of Yukawa Systems: Influence of Coupling and Screening Effects in Fluid States, T. Saigo,S. Hamaguchi, Proceedings of Plasma Science Symposium 2001 and the 18th Symposium on Plasma Processing (PSS-2001/SPP-18)} (ed. by N. Sato and H. Fujiyama: Organization Committee of PSS2001/SPP-18, Kyoto, 2001) p.52-53, 2001/12
  • Effect of Current on Resistive Drift-Alfven Instability in a Cylindrical Plasma, N. Miyato,S. Hamaguchi,M. Wakatani, Proceedings of Plasma Science Symposium 2001 and the 18th Symposium on Plasma Processing (PSS-2001/SPP-18)} (ed. by N. Sato and H. Fujiyama: Organization Committee of PSS2001/SPP-18, Kyoto, 2001) p. 47-48, 2001/12
  • The finite--element spectral method for three-dimensional reduced MHD equations, M. Yamamoto,S. Hamaguchi,M. Wakatani, Proceedings of Plasma Science Symposium 2001 and the 18th Symposium on Plasma Processing (PSS-2001/SPP-18)} (ed. by N. Sato and H. Fujiyama: Organization Committee of PSS2001/SPP-18, Kyoto, 2001) p.43-44, 2001/12
  • Non-linear Saturation of Resistive Interchange Mode due to Flattening of Density Profile, T. Unemura,S. Hamaguchi,M. Wakatani, Proceedings of Plasma Science Symposium 2001 and the 18th Symposium on Plasma Processing (PSS-2001/SPP-18)} (ed. by N. Sato and H. Fujiyama: Organization Committee of PSS2001/SPP-18, Kyoto, 2001) p.41-42, 2001/12
  • Low Order Dynamical Models for Ion Temperature Gradient (ITG) Mode, K. Takeda,S. Hamaguchi,M. Wakatani, Proceedings of Plasma Science Symposium 2001 and the 18th Symposium on Plasma Processing (PSS-2001/SPP-18)} (ed. by N. Sato and H. Fujiyama: Organization Committee of PSS2001/SPP-18, Kyoto, 2001) p. 39-40, The Physical Society of Japan, Vol. 55, No. 0, p. 159-159, 2001/12
  • Nonlinear double tearing modes in negative shear tokamaks, M. Sato,S. Hamaguchi,W. Wakatani, Proceedings of Plasma Science Symposium 2001 and the 18th Symposium on Plasma Processing (PSS-2001/SPP-18)} (ed. by N. Sato and H. Fujiyama: Organization Committee of PSS2001/SPP-18, Kyoto, 2001) p. 15-16, The Physical Society of Japan, Vol. 55, No. 0, p. 161-161, 2001/12
  • Reduction of growth rates of high-n ballooning modes due to sheared toroidal flows in tokamaks, M. Furukawa,Y. Nakamura,S. Hamaguchi,M. Wakatani, Proceedings of Plasma Science Symposium 2001 and the 18th Symposium on Plasma Processing (PSS-2001/SPP-18)} (ed. by N. Sato and H. Fujiyama: Organization Committee of PSS2001/SPP-18, Kyoto, 2001) p. 13-14, 2001/12
  • Numerical investigation on plasma and poly-Si etching uniformity control over large area in a resonant inductively coupled plasma source, S. S. Kim,S. Hamaguchi,N. S. Yoon,C. S. Chang,Y. D. Lee,S. H. Ku, Phys. Plasmas 8, 1384-1394, Vol. 8, No. 4, p. 1384-1394, 2001/12
  • Classical interatomic potential functions for Si-O-F and Si-O-Cl systems, H. Ohta,S. Hamaguchi, J. Chem. Phys., 115, 6679-6690, Vol. 115, No. 14, p. 6679-6690, 2001/12
  • Molecular Dynamics Simulation of Silicon and Silicon Dioxide Etching by Energetic Halogen Beams, H. Ohta,S. Hamaguchi, J. Vac. Sci. Tech., A, 19(5), 2373-2381, Vol. 19, No. 5, p. 2373-2381, 2001/12
  • Nonlinear Double Tearing Mode in Negative Shear Cylindrical Tokamaks, M. Sato,S. Hamaguchi,M. Wakatani, J. Phys. Soc. Japan, 70(9), 2578-2587, Vol. 70, No. 9, p. 2578-2587, 2001/12
  • High-n ballooning instabilities in toroidally rotating tokamaks, M. Furukawa,Y. Nakamura,S. Hamaguchi,M. Wakatani, Phys. Plasmas 8(11), 4889-4897, Vol. 8, No. 11, p. 4889-4897, 2001/12
  • Plasma Current Effects on Unstable Resistive Drift-Alfvén Modes in a Magnetized Cylindrical Plasma, Naoaki Miyato,Satoshi Hamaguchi,Masahiro Wakatani, Journal of the Physical Society of Japan, Vol. 70, No. 11, p. 3197-3200, 2001/11
  • Modeling of reactive ion etching for Si/SiO2 systems, S Hamaguchi,H Ohta, SIMULATION OF SEMICONDUCTOR PROCESSES AND DEVICES 2001, SPRINGER-VERLAG WIEN, p. 170-173, 2001
  • Fluid simulation of two-dimensional axially symmetric process plasmas, Ishiwata Hirotaka,Hamaguchi Satoshi, Meeting Abstracts of the Physical Society of Japan, The Physical Society of Japan, Vol. 56, No. 0, p. 180-180, 2001
  • Molecular dynamics evaluation of self diffusion in Yukawa systems, H. Ohta,S. Hamaguchi, Phys. Plasmas 7, 4506-4514, Vol. 7, No. 11, p. 4506-4514, 2000/12
  • Dynamical properties of strongly coupled dusty plasmas, S. Hamaguchi,H. Ohta, Frontiers in Dusty Plasmas (ed. by Y. Nakamura, T. Yokota, and P. K. Shukla: Elsevier Sci., 2000) 135-140, ELSEVIER SCIENCE BV, p. 135-140, 2000/12
  • Resistive Drift-Alfven Instability in a Cylindrical Magnetized Plasma, N. Miyato,S. Hamaguchi,M. Wakatani, Contrib. Plasma Phys. 40, 362-367, Vol. 40, No. 3-4, p. 362-367, 2000/12
  • Resistive Drift-Alfven Instabilities in a Cylindrical Plasma, N. Miyato,S. Hamaguchi,M. Wakatani, J. Phys. Soc. Jpn. 69, 1401-1408, The Physical Society of Japan (JPS), Vol. 69, No. 5, p. 1401-1408, 2000/12
  • Classical plasmas with Yukawa potentials, S. Hamaguchi,H. Ohta, J. Phys. IV France 10, Pr5-19-26, Vol. 10, No. 5, 2000/12
  • Tokamak equilibria with toroidal flows, M. Furukawa,Y. Nakamura,S. Hamaguchi,M. Wakatani, J. Plasma and Fusion Research, 76, 937-948, Vol. 76, No. 9, p. 937-948, 2000/12
  • Wave dispersion relations in Yukawa fluids, H. Ohta,S. Hamaguchi, Phy. Rev. Lett. 84, 6026-6029, Vol. 84, No. 26, p. 6026-6029, 2000/12
  • モデリング・シミュレーション, 1999/12
  • Modeling of plasma processing, S. Hamaguch, IBM J. Res. Develop. 43, 199-215, 1999/12
  • Modeling and simulation methods for plasma processing, S. Hamaguchi, IBM Journal of Research and Development, Vol. 43, No. 1-2, p. 199-215, 1999/04
  • Static and dynamic properties of Yukawa systems, S Hamaguchi,H Ohta, INTERNATIONAL CONFERENCE ON PHENOMENA IN IONIZED GASES, VOL IV, PROCEEDINGS, POLISH ACAD SCIENCES, SPACE RESEARCH CENTRE, p. 133-134, 1999
  • Triple point of Yukawa systems, S. Hamaguchi,R. T. Farouki,D. H. E. Dubin, Phys. Rev. E 56, 4671-4682, Vol. 56, No. 4, p. 4671-4682, 1997/12
  • Numerical simulation of etching and deposition processes, S. Hamaguchi,A. A. Mayo,S. M. Rossnagel,D. E. Kotecki,K. R. Milkove,C. X. Wang,C. E. Farrell, Jpn. J. Appl. Phys. 36 4762-4768, Vol. 36, No. 7, p. 4762-4768, 1997/12
  • Across-wafer nonuniformity of long-throw sputter deposition, A. A. Mayo,S. Hamaguchi,J. H. Joo,S. M. Rossnagel, J. Vac. Sci. Tech. B 15, 1788-1793, Vol. 15, No. 5, p. 1788-1793, 1997/12
  • Electrostatic forces of plasma dust grains with position--dependent charges, S. Hamaguch, Comments Plasma Phys. Controlled Fusion 18, 95-101, 1997/12
  • Mathematical methods for thin film deposition simulations, S. Hamaguchi, Modeling of Film Deposition for Microelectronic Applications, ed. by S. M. Rossnagel and A. Ulman,(Academic Press, San Diego 1996), Thin Films, vol. 22, p. 81-115, Vol. 22, No. C, p. 81-115, 1996/12
  • Ionized physical vapor deposition of Cu for high aspect ratio damascene trench fill applications, C. A. Nichols,S. M. Rossnagel,S. Hamaguchi, J. Vac. Sci. Tech. B 14, 3270-3275, Vol. 14, No. 5, p. 3270-3275, 1996/12
  • Phase diagram of Yukawa systems near the one-component-plasma limit revisited, S. Hamaguchi,R. T. Farouki,D. H. E. Dubin, J. Chem. Phys. 105 7641-7647, Vol. 105, No. 17, p. 7641-7647, 1996/12
  • Liner conformality in ionized magnetron sputter metal deposition processes, S. Hamaguchi,S. M. Rossnagel, J. Vac. Sci. Tech. B 14, 2603-2608, Vol. 14, No. 4, p. 2603-2608, 1996/12
  • Thin, high atomic weight refractory film deposition for diffusion barrier, adhesion layer and seed layer applications, S. M. Rossnagel,C. Nichols,S. Hamaguchi,D. Ruzic,R. Turkot, J. Vac. Sci. Tech. B 14, 1819-1827, Vol. 14, No. 3, p. 1819-1827, 1996/12
  • Simulations of trench--filling profiles under ionized magnetron sputter metal deposition, S. Hamaguchi,S. M. Rossnage, J. Vac. Sci. Tech. B, 13, 183-191, Vol. 13, No. 2, p. 183-191, 1995/12
  • Surface-topography simulations of ionized sputter metal deposition, S. Hamaguchi,S. M. Rossnagel, Materials Research Society Symposium - Proceedings, Vol. 389, p. 113-117, 1995
  • Thermodynamics of strongly-coupled Yukawa systems near the OCP limit II. Molecular dynamics simulations, R. T. Farouki,S. Hamaguchi, J. Chem. Phys., 101, 9885-9893, Vol. 101, No. 11, p. 9885-9893, 1994/12
  • Thermodynamics of strongly-coupled Yukawa systems near the OCP limit I.~Derivation of the excess energy, S. Hamaguchi,R. T. Farouki, J. Chem. Phys., 101, 9876-9884, Vol. 101, No. 11, p. 9876-9884, 1994/12
  • Spline approximation of ``effective'' potentials under periodic boundary conditions, R. T. Farouki,S. Hamaguchi, J. Comp. Phys. 115, 276--287, Vol. 115, No. 2, p. 276-287, 1994/12
  • Plasma-particulate interactions in non--uniform plasmas with finite flows, S. Hamaguchi,R. T. Farouki, Phys. Plasmas, 1, 2110-2118, Vol. 1, No. 7, p. 2110-2118, 1994/12
  • Intrinsic and passivation-induced trench tapering during plasma etching, S. Hamaguchi,M. Dalvie, J. Electrochem. Soc., 141, 1964-1972, Vol. 141, No. 7, p. 1964-1972, 1994/12
  • The polarization force on a charged particulate in a non-uniform plasma, S. Hamaguchi,R. T. Farouki, Phys. Rev. E, 49, 4430-4441, Vol. 49, No. 5, p. 4430-4441, 1994/12
  • Micro-profile simulations for plasma etching with surface passivation, S. Hamaguchi,M. Dalvie, J. Vac. Sci. Tech. A 12, 2745-2753, Vol. 12, No. 5, p. 2745-2753, 1994/04
  • Simulation of surface topology evolution during plasma etching by the method of characteristics, J. C. Arnold,H. H. Sawin,M. Dalvie,S. Hamaguchi, J. Vac. Sci. Tech. A12, 620-635, Vol. 12, No. 3, p. 620-635, 1994/04
  • Dynamics of charged particulates in plasmas, S. Hamaguchi,R. T. Farouki, IEEE International Conference on Plasma Science, 1994
  • A shock-tracking algorithm for surface evolution under reactive-ion etching, S. Hamaguchi,M. Dalvie,R. T. Farouki,S. Sethuraman, J. Appl. Phys. 74, 5172-5184, Vol. 74, No. 8, p. 5172-5184, 1993/12
  • Thermal energy of the crystalline one-component plasma from dynamical simulations, R. T. Farouki,S. Hamaguchi, Phys. Rev. E 47, 4330-4336, Vol. 47, No. 6, p. 4330-4336, 1993/12
  • New fluid model for the turbulent transport due to the ion temperature gradient, Chang Bae Kim,Wendell Horton,Satoshi Hamaguchi, Physics of Fluids B, Vol. 5, No. 5, p. 1516-1522, 1993/05
  • ION-TEMPERATURE-GRADIENT-DRIVEN TRANSPORT IN A DENSITY MODIFICATION EXPERIMENT ON THE TOKAMAK FUSION TEST REACTOR - REPLY, Vol. 5, No. 3, p. 1034-1035, 1993/03
  • Ion temperature gradient driven transport in a density modification experiment on the Tokamak Fusion Test Reactor, W. Horton,D. Lindberg,J. Y. Kim,J. Q. Dong,Q. W. Hammet,S. D. Scott,M. C. Zarnstorff,S. Hamaguchi, Phys. Fluids B 4, 953-966, Vol. 4, No. 4, p. 953-966, 1992/12
  • Dynamical N-body simulations of Coulomb scattering in plasma sheaths, R. T. Farouki,S. Hamaguchi,M. Dalvie,M. Surendra, Phys. Rev. A 46, 7815-7829, Vol. 46, No. 12, p. 7815-7829, 1992/12
  • Self-consistent Monte-Carlo simulation of the cathode fall including treatment of negative glow electrons, M. Dalvie,S. Hamaguchi,R. T. Farouki, Phys. Rev. A 46, 1066-1077, Vol. 46, No. 2, p. 1066-1077, 1992/12
  • Analysis of a kinematic model for ion transport in RF plasma sheaths, R. T. Farouki,S. Hamaguchi,M. Dalvie, Phys. Rev. A 45, 5913-5928, Vol. 45, No. 8, p. 5913-5928, 1992/12
  • The ponderomotive force and ion energy distribution in an RF sheath, S. Hamaguchi,R. T. Farouki,M. Dalvie, Phys. Rev. Lett. 68 44-47, Vol. 68, No. 1, p. 44-47, 1992/12
  • Ion energetics in collisionless sheaths of RF process plasmas, S. Hamaguchi,R. T. Farouki,M. Dalvie, Phys. Fluids B 4, 2362-2367, Vol. 4, No. 7, p. 2362-2367, 1992/12
  • Effects of sheared flows on ion temperature gradient driven turbulence, S. Hamaguchi,W. Horton, Phys. Fluids B 4, 319-328, Vol. 4, No. 2, p. 319-328, 1992/12
  • Hydrodynamic analysis of electron motion in the cathode fall using a Monte Carlo simulation, M. Dalvie,S. Hamaguchi,R.T. Farouki,M. Surendra, J. Appl. Phys. 72, 2620-2631, Vol. 72, No. 7, p. 2620-2631, 1992/12
  • Phase transitions of dense systems of charged ``dust'' grains in plasmas, R. T. Farouki,S. Hamaguchi, Appl. Phys. Lett. 61, 2973-2975, Vol. 61, No. 25, p. 2973-2975, 1992/12
  • Transition from resistive-g to eta_i driven turbulence in stellarator systems, B. G. Hong,W. Horton,S. Hamaguchi,M. Wakatani,M. Yagi,H. Sugama, Phys. Fluids B 3, 1638-1643, Vol. 3, No. 7, p. 1638-1643, 1991/12
  • Monte Carlo simulations of space-charge-limited ion transport through collisional plasma sheaths, R. T. Farouki,S. Hamaguchi,M. Dalvie, Phys. Rev. A 44, 2664-2681, Vol. 44, No. 4, p. 2664-2681, 1991/12
  • The Ion distribution function in a weakly collisional sheath, S. Hamaguchi,R. T. Farouki,M. Dalvie, Phys. Rev. A 44, 3804-3821, p. 137-138, 1991/12
  • Flux considerations in the coupling of Monte Carlo plasma sheath simulations with feature evolution models, M. Dalvie,R. T. Farouki,S. Hamaguchi, IEEE Trans. Electron Devices 39, 1090-1099, Vol. 39, No. 5, p. 1090-1099, 1991/12
  • Ion distribution function in a weakly collisional sheath, S. Hamaguchi,R. T. Farouki,M. Dalvie, Physical Review A, Vol. 44, No. 6, p. 3804-3821, 1991/09
  • Flux integration in 2D vs. 3D feature evolution models of plasma processing, Manoj Dalvie,Rida T. Farouki,Satoshi Hamaguchi, 1991
  • Nonlinear behavior of magnetohydrodynamic modes near marginally stable state, N. Nakajima,S. Hamaguchi, Phys. Fluids B 2, 1184-1189, 1990/12
  • Wave particle power transfer in a steady state driven system, H. L. Berk,B. N. Breizman,S. Hamaguchi, Phys. Fluids B 2, 3212-3214, Vol. 2, No. 12, p. 3212-3214, 1990/12
  • Ion temperature gradient driven turbulence in the weak density gradient limit, S. Hamaguchi,W. Horton, Phys. Fluids B 2, 3040-3046, Vol. 2, No. 12, p. 3040-3046, 1990/12
  • Fluctuation spectrum and transport from ion temperature gradient driven modes in sheared magnetic fields, S. Hamaguchi,W. Horton, Phys. Fluids B 2, 1833-1851, Vol. 2, No. 8, p. 1833-1851, 1990/12
  • Nonlinear behavior of magnetohydrodynamic modes near marginally stable states. II. Application to the resistive fast interchange mode, Noriyoshi Nakajima,Satoshi Hamaguchi, Physics of Fluids B, Vol. 2, No. 6, p. 1184-1189, 1990/06
  • Modelling of drift wave turbulence with a finite ion temperature gradient, S. Hamaguchi,W. Horton, Plasma Phys. Control. Fusion 34 No 2 203-233, Vol. 34, No. 2, p. 203-233, 1990/02
  • Theory of long-period magnetic pulsations, S. Hamaguchi,W. Grossmann, Courant Institute of Mathematical Sciences, MF-120, Courant Institute of Mathematical Sciences, MF-120, 1989/12
  • Anomalous transport arising from nonlinear resistive pressure-driven modes in a plasma, S. Hamaguchi, Phys. Fluids B 1, 1416-1430, Vol. 1, No. 7, p. 1416-1430, 1989/12
  • Summary of very low-q discharges in Toriut tokamaks, H. Yamada,S. Hamaguchi,K. Hattori,Y. Kamada,M. Kikuchi,J. Morikawa,H. Nihei,Z. Yoshida,N. Inoue, Kakuyugo Kenkyu, 56, 341-354, Vol. 56, No. 5, p. 341-354, 1986/12
  • Selective acceleration of NBI-injected fast ion cyclotron wave in a tokomak plasma, Y. Murakami,K. Itami,S. Ishida,N. Suzuki,S. Hamaguchi,H. Yamada,H. Nihei,Morikawa,Z. Yoshida,N. Inoue, Jpn. J. Appl. Phys., 25, 1045-1047, Vol. 25, No. 7, p. 1045-1048, 1986/12
  • Helically assisted low-q tokamak with l = 2 helical winding, S. Hamaguchi,H. Yamada,Z. Yoshida,Y. Kamada,K. Hattori,N. Inoue,T. Uchida, Jpn. J. Appl. Phys., 23, 505-507, Vol. 23, No. 7, p. L505-L508, 1984/12
  • Shrinkage of a tokamak current channel by external ergodization, K. Hattori,Y. Seike,Z. Yoshida,S. Hamaguchi,H. Yamada,N. Suzuki,K. Itami,Y. Kamada,N. Inoue,T. Uchida, J. Nucl. Mater., 121, 368-373, Vol. 121, No. C, p. 368-373, 1984/12

Misc.

  • ビーム実験による原子スケールプロセスにおける表面反応解析 (シリコン材料・デバイス), Vol. 119, No. 273, p. 11-16, 2019/11/07
  • Prediction of Plasma Etching Yields by Machine Learning, Vol. 95, No. 11, p. 542-547, 2019/11
  • Plasma Informatics : Application of Data-Driven Science to Plasma Science, Vol. 43, No. 5, p. 198-202, 2019/09
  • Surface reaction mechanisms of plasma processes for semiconductor device manufacturing, Hamaguchi Satoshi, Abstract book of Annual Meeting of the Japan Society of Vacuum and Surface Science, The Japan Society of Vacuum and Surface Science, Vol. 2019, No. 0, 2019
  • Theory and Numerical Simulation of Plasma-Liquid Interaction, Vol. 42, No. 3, p. 118-123, 2018/05
  • Ab initio DFT Study on Surface Reaction Mechanisms of Acetyl Acetone on Ni and NiO Surfaces, Nakamura Kana,Basher Abdulrahman H.,Ito Tomoko,Karahashi Kazuhiro,Hamaguchi Satoshi,Takeuchi Takae, Abstract of annual meeting of the Surface Science of Japan, The Japan Society of Vacuum and Surface Science, Vol. 2018, No. 0, p. 122-122, 2018
  • 1590 オゾン水による建物内装材表面汚染物質の除去効果に関する研究, No. 2017, p. 1179-1180, 2017/07/20
  • 41323 弱アルカリ電解水による室内臭低減に関する研究, No. 2017, p. 691-692, 2017/07/20
  • The 2017 Plasma Roadmap: Low temperature plasma science and technology, I. Adamovich,S. D. Baalrud,A. Bogaerts,P. J. Bruggeman,M. Cappelli,V. Colombo,U. Czarnetzki,U. Ebert,J. G. Eden,P. Favia,D. B. Graves,S. Hamaguchi,G. Hieftje,M. Hori,I. D. Kaganovich,U. Kortshagen,M. J. Kushner,N. J. Mason,S. Mazouffre,S. Mededovic Thagard,H. R. Metelmann,A. Mizuno,E. Moreau,A. B. Murphy,B. A. Niemira,G. S. Oehrlein,Z. Lj Petrovic,L. C. Pitchford,Y. K. Pu,S. Rauf,O. Sakai,S. Samukawa,S. Starikovskaia,J. Tennyson,K. Terashima,M. M. Turner,M. C.M. Van De Sanden,A. Vardelle, Journal of Physics D: Applied Physics, Vol. 50, No. 32, 2017/07/14
  • 分子動力学シミュレーションによるプラズマプロセス表面反応機構解析(キーノートスピーチ), Vol. 2017, No. 0, p. 253-254, 2017
  • Molecular dynamics simulation of damage formation in Ni due to H<sup>+</sup> ion bombardment, Trung Phung,Isobe Michiro,Morikawa Yoshitada,Inagaki Kouji,Hamaguchi Satoshi, Proceedings of JSPE Semestrial Meeting, The Japan Society for Precision Engineering, Vol. 2017, No. 0, p. 257-258, 2017
  • Plasma-Liquid Interactions: A Review and Roadmap, P.J. Bruggeman,M.J. Kushner,B.R. Locke,J.G.E. Gardeniers,W.G. Graham,D.B. Graves,R.C. Hofman-Caris,D. Maric,J.P. Reid,E. Ceriani,D. Fernandez Rivas,J. E. Foster,S.C. Garrick,Y. Gorbanev,S. Hamaguchi,F. Iza,J. Kolb,F. Krcma,P. Lukes,Z. Machala,I. Marinov,D. Mariotti,S. Mededovic Thagard,D. Minakata,E. Neyts,J. Pawlat,Z.Lj. Petrovic,R. Pfieger,S. Reuter,D.C. Schram,S. Schroter,M. Shiraiwa,B. Tarabová,H. Tresp,P. Tsai,J. Verlet,T. von Woedtke,E. Vyhnankova,K.R. Wilson,K. Yasui,G. Zvereva, Plasma Sources Sci. Technol., Vol. 25, No. 5, 2016/12
  • プラズマの医療応用と医療材料の表面処理技術, Vol. 54, No. 4, p. 9-18, 2016/04
  • Numerical Simulation for Generation and Transport of Liquid-Phase Chemically Reactive Species that Potentially Trigger Biological Activities, IKUSE Kazumasa,HAMAGUCHI Satoshi, Vol. 91, No. 12, p. 780-784, 2015/12
  • Indium implantation onto zeolite for development of novel catalysts with a ion beam system, Satoru Yoshimura,Masato Kiuchi,Yoshihiro Nishimoto,Makoto Yasuda,Akio Baba,Yoshiaki Mokuno,Satoshi Sugimoto,Satoshi Hamaguchi, Journal of Smart Processing -for Materials, Environment & Energy-, スマートプロセス学会, Vol. 4, No. 5, p. 228-233, 2015/09
  • 高度物理刺激と生体反応(1) ― 第1章 高度物理刺激の生成法と計測・予測 ―, Vol. 67, No. 8, p. 673-683, 2015/07
  • 17th International Congress on Plasma Physics, Vol. 90, No. 12, p. 837-839, 2014/12
  • Sterilization technology by low-temperature atmospheric-pressure plasmas, Vol. 52, No. 4, p. 295-304, 2014/04
  • Concept of Research Network on Non-Equilibrium and Extreme State Plasma : New Research System of Plasma Physical Science, FUJISAWA Akihide,ITOH Kimitaka,ITOH Sanae-I.,UESUGI Yoshihiko,OHNO Noriyasu,KANEKO Toshiro,KODAMA Ryosuke,SHIRATANI Masaharu,TANAKA Kazuo A.,HATAKEYAMA Rikizo,HAMAGUCHI Satoshi,YONEDA Hitoki, Vol. 90, No. 3, p. 177-182, 2014/03
  • 30aAE-12 Numerical analyses of plasma-nanosurface interactions, Mizotani Kohei,Isobe Michiro,Hamaguchi Satoshi, Meeting Abstracts of the Physical Society of Japan, The Physical Society of Japan, Vol. 69, No. 0, p. 279-279, 2014
  • プラズマ医療の最新動向, Vol. 58, No. 12, p. 915-921, 2013/04
  • Hydrogen plasma exposure of polymethylmethacrylate and etching by low energy Ar+ ion, S. Yoshimura,K. Ikuse,S. Sugimoto,K. Murai,M. Kiuchi,S. Hamaguchi, Journal of the Vacuum Society of Japan, The Vacuum Society of Japan, Vol. 56, No. 4, p. 129-132, 2013/04
  • 27aEA-7 Physics of free radicals in plasmas and their application to medicine, Hamaguchi Satoshi, Meeting Abstracts of the Physical Society of Japan, The Physical Society of Japan, Vol. 68, No. 0, p. 278-278, 2013
  • Introduction : Overview of Atomic and Molecular Databases and their Applications for Plasma Research, MURAKAMI Izumi,OSAKABE Masaki,IKEDA Katsunori,NISHIURA Masaki,ODA Akinori,SUGAWARA Hirotake,HAMAGUCHI Satoshi, Vol. 88, No. 1, p. 35-47, 2012/01
  • Interaction of Plasmas with Biological Objectsin Plasma Medicine, HAMAGUCHI Satoshi, Journal of plasma and fusion research, Vol. 87, No. 10, p. 696-703, 2011/10
  • Arrangement of PC12 cells on a silicon chip via extracellular matrix (ECM) layer patterning by atmospheric pressure plasmas, Ayumi Ando,Hidetaka Uno,Toshifumi Asano,Tsuneo Urisu,Satoshi Hamaguchi, Plasma and Fusion Research, Vol. 6, No. 2011, 2011
  • 第3回ITER国際夏の学校(IISS-2009), Vol. 85, No. 11, p. 799-799, 2009/11/25
  • Analyses of Hard Carbon Film Formation Mechanisms by Molecular Dynamics Simulations, MURAKAMI Yasuo,HAMAGUCHI Satoshi, Journal of plasma and fusion research, Vol. 85, No. 10, p. 674-679, 2009/10/25
  • Generation of free radicals in liquids by low-temperature atmospheric-pressure plasmas, KITANO Katsuhisa,TANI Atsushi,IKAWA Satoshi,OHNISHI Naofumi,HAMAGUCHI Satoshi, Vol. 2009, No. 103, p. 19-22, 2009/09/05
  • Bacteria inactivation by free radicals in liquid in contact with plasma, IKAWA Satoshi,KITANO Katsuhisa,TANI Atsushi,OHNISHI Naofumi,HAMAGUCHI Satoshi, Vol. 2009, No. 103, p. 23-26, 2009/09/05
  • 冷たいプラズマによる液中化学反応--重合から殺菌まで, No. 460, p. 25-31, 2009/07
  • Sterilization by atmospheric pressure plasma devices of small size, Bio industry, Vol. 26, No. 6, p. 16-22, 2009/06
  • Atomic Scale Assessment of Surface Reactions in Dry Etching Processing, HAMAGUCHI Satoshi, Journal of plasma and fusion research, Vol. 85, No. 4, p. 177-184, 2009/04/25
  • Effects of ultraviolet light irradiation on etching of polymethylmethacrylate by CF<inf>3</inf><sup>+</sup> ion beam injections, Kazumasa Ikuse,Satoru Yoshimura,Yasuhiro Tsukazaki,Masato Kiuchi,Satoshi Hamaguchi, Journal of the Vacuum Society of Japan, The Vacuum Society of Japan, Vol. 52, No. 3, p. 127-130, 2009
  • Atmospheric-pressure LF microplasma jets, KITANO Katsuhisa,HAMAGUCHI Satoshi, Oyo Buturi, The Japan Society of Applied Physics, Vol. 77, No. 4, p. 383-389, 2008/04/10
  • SiO2 etching yield measurements by CF3 ion beam injections superposed with light irradiation, K. Ikuse,S. Yoshimura,T. Takizawa,K. Karahashi,M. Kiuchi,S. Hamaguchi, Journal of the Vacuum Society of Japan, The Vacuum Society of Japan, Vol. 51, No. 3, p. 158-161, 2008/03
  • Indium ion implantation into SiO2/Si substrates with a low-energy mass analyzed ion beam system, K. Hine,S. Yoshimura,K. Karahashi,M. Kiuchi,S. Hamaguchi, Journal of the Vacuum Society of Japan, The Vacuum Society of Japan, Vol. 51, No. 3, p. 218-220, 2008/03
  • 21aZB-5 Recent trends in atmospheric-pressure/high-pressure plasma research, Hamaguchi Satoshi, Meeting Abstracts of the Physical Society of Japan, The Physical Society of Japan, Vol. 63, No. 0, p. 161-161, 2008
  • 高温タングステン表面での有機ケイ素のフラグメンテーション, 2007/06
  • Measurement of Au sputtering yields by Neon with low-energy mass analyzed ion beam system, K. Hine,S. Yoshimura,M. Kiuchi,S. hamaguchi, Journal of the Vacuum Society of Japan, The Vacuum Society of Japan, Vol. 50, No. 3, p. 217-219, 2007/03
  • Fragment ions of dimethylsilane produced by hot tungsten wires, Satoru Yoshimura,Akinori Toh,Satoshi Sugimoto,Masato Kiuchi,Satoshi Hamaguchi, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, JAPAN SOC APPLIED PHYSICS, Vol. 45, No. 10B, p. 8204-8207, 2006/10
  • Fragment ions produced from methylsilane in Freeman-type ion source amd compounds deposited on tungsten surface, A. Toh,S. Yoshimura,S. Sugimoto,M. Kiuchi,S. Hamaguchi, Journal of Vacuum Society of Japan, The Vacuum Society of Japan, Vol. 49, No. 6, p. 383-385, 2006/06
  • Nonlinear evolution of the m = 1 internal kink mode in the presence of magnetohydrodynamic turbulence, A. Bierwage,S. Benkadda,S. Hamaguchi,M. Wakatani, Phys., Plasmas 13 (3), 032506-1~13 (2006)., Vol. 13, No. 3, 2006/03
  • Measurement of Au deposition rates with low-energy mass separated ion beam deposition apparatus, Kiyohiro Hine,Satoru Yoshimura,Takuya Maeda,Masato Kiuchi,Satoshi Hamaguchi, Journal of Vacuum Society of Japan, 日本真空協会, Vol. 49, No. 3, p. 177-179, 2006/03
  • 01pC05 Discharge Mechanisms of the Atmospheric Pressure Plasma Jet generated by Lower-frequency HV Power Supply, KITANO Katsuhisa,HAMAGUCHI Satoshi, No. 23, p. 301-301, 2006
  • Numerical Simulation of Dry Etching Surface Reactions, HAMAGUCHI Satoshi, Shinku, The Vacuum Society of Japan, Vol. 50, No. 6, p. 403-410, 2006/01
  • 第12回International Congress on Plasma Physics, Vol. 81, No. 2, p. 127-127, 2005/12
  • プラズマ科学シンポジウム2005/第22回プラズマプロセシング研究会, Vol. 81, No. 3, p. 223-226, 2005/12
  • Fast growing double tearing modes in a tokamak plasma, A. Bierwage,S. Benkadda,S. Hamaguchi,M. Wakatani, Phys. Plasmas, Vol. 12, No. 8, p. 1-12, 2005/08
  • Numerical simulation of surface reactions in plasma processing, Satoshi Hamaguchi, Seisan to Gijutsu, 57(2) 10-14 (2005), 生産技術振興協会, Vol. 57, No. 2, p. 10-14, 2005/06
  • The XX-XY Sex-determination System in Oryzias Iuzonensis and O. mekongensis Revealed by the Sex Ratio of the Progeny of Sex-reversed Fish, HAMAGUCHI Satoshi,TOYAZAKI Yota,SHINOMIYA Ai,SAKAIZUMI Mitsuru, ZOOLOGICAL SCIENCE, Zoological Society of Japan, Vol. 21, No. 10, p. 1015-1018, 2004/10/25
  • Inhomogeneous Energy - Density Driven Instability in Presence of a Transverse DC Electric Fields in a Magnetized Plasma Cylinder, Suresh C. Sharma,Satoshi Hamaguchi, 2004/10/19
  • Current-Driven Dust Ion-Cyclotron Waves in Presence of a Transverse DC Electric Fields in Magnetized Plasma with Charge Fluctuations, Suresh C. Sharma,Satoshi Hamaguchi, 2004/10/19
  • Gain and Efficiency Enhancement in Free Electron Laser by Means of Modulated Electron Beam, Vivek Beniwal,Suresh C. Sharma,Satoshi Hamaguchi, 2004/10/07
  • Analyses of Surface Reaction Mechanisms of Plasma Etching by Molecular Dynamics Simulations, HAMAGUCHI Satoshi,YAMADA Hideaki, Technical report of IEICE. VLD, The Institute of Electronics, Information and Communication Engineers, Vol. 104, No. 322, p. 1-2, 2004/09/21
  • Field Survey of Sex-Reversals in the Medaka, Oryzias latipes : Genotypic Sexing of Wild Populations, SHINOMIYA Ai,OTAKE Hiroyuki,TOGASHI Ken-ichi,HAMAGUCHI Satoshi,SAKAIZUMI Mitsuru, ZOOLOGICAL SCIENCE, The Zoological Society of Japan, Vol. 21, No. 6, p. 613-619, 2004/06/25
  • Present status of beam nanotechnology, "OYO BUTURI" Editorial Committee,"OYO BUTURI" Editorial Committee, Oyo Buturi, The Japan Society of Applied Physics, Vol. 73, No. 4, p. 444-444, 2004/04/10
  • Numerical Simulation Research in Plasma Technologies, HAMAGUCHI Satoshi, Journal of plasma and fusion research, Vol. 80, No. 2, p. 110-112, 2004/02/25
  • 歴史的にみる超短パルスレーザー光の発生とその応用, Vol. 73, No. 2, p. 166-166, 2004/02/10
  • Oryzias curvinotus Has DMY, a Gene That Is Required for Male Development in the Medaka, O.latipes, MATSUDA Masaru,SATO Tadashi,TOYAZAKI Yota,NAGAHAMA Yoshitaka,HAMAGUCHI Satoshi,SAKAIZUMI Mitsuru, ZOOLOGICAL SCIENCE, The Zoological Society of Japan, Vol. 20, No. 2, p. 159-161, 2003/02/01
  • Dynamical response and relaxation time approximation in moderately and strongly coupled Yukawa systems, Saigo T.,Wierling August,Hamaguchi S., Meeting Abstracts of the Physical Society of Japan, The Physical Society of Japan, Vol. 58, No. 0, p. 238-238, 2003
  • Transport regimes in a low-dimensional model of ITG turbulence, Takeda Kazuo,Sadruddin Benkadda,Hamaguchi Satoshi,Wakatani Masahiro, Meeting Abstracts of the Physical Society of Japan, The Physical Society of Japan, Vol. 58, No. 0, p. 192-192, 2003
  • Promotion 東大大学院薬学系研究科の野心的試み 大学発イノベーション 提案するのはマーケットドリブン, Vol. 30, No. 12, p. 14-17, 2002/10
  • EXPRESSION OF DMY IN MEDAKA GONAD DURING EARLY TESTICULAR DEVELOPMENT(Developmental Biology)(Proceedings of the Seventy-Third Annual Meeting of the Zoological Society of Japan) :, Nakamoto Masatoshi,Matsuda Masaru,Kobayashi Tohru,Nagahama Yoshitaka,Sakaizumi Mitsuru,Hamaguchi Satoshi,Shibata Naoki, Zoological science, Zoological Society of Japan, Vol. 19, No. 12, p. 1449-1449, 2002
  • DEVELOPMENT OF GONADS AND GENITAL DUCTS IN SECONDARY SEXUAL CHARACTER LESS MUTANT OF MEDAKA(Endocrinology)(Proceedings of the Seventy-Third Annual Meeting of the Zoological Society of Japan) :, Suzuki Aya,Sato Tadashi,Sakaizumi Mitsuru,Hamaguchi Satoshi,Shibata Naoki, Zoological science, Zoological Society of Japan, Vol. 19, No. 12, p. 1488-1488, 2002
  • GENETIC ANALYSIS OF A SECONDARY SEXUAL CHARACTER-LESS MUTANT, SCL, OF THE MEDAKA, ORYZIAS LATIPES(Endocrinology)(Proceedings of the Seventy-Third Annual Meeting of the Zoological Society of Japan) :, Sato Tadashi,Sakaizumi Mitsuru,Hamaguchi Satoshi, Zoological science, Zoological Society of Japan, Vol. 19, No. 12, p. 1488-1488, 2002
  • THREE SPECIES CLOSELY RELATED TO ORYZIAS LATIPES HAVE A MALE-HETEROGAMETIC (XX-XY) SEX-DETERMINING SYSTEM(Endocrinology & Genetics)(Proceedings of the Seventy-Third Annual Meeting of the Zoological Society of Japan) :, Toyazaki Yota,Sakaizumi Mituru,Hamaguchi Satoshi, Zoological science, Zoological Society of Japan, Vol. 19, No. 12, p. 1496-1496, 2002
  • MUTATIONS AFFECTING SEX DETERMINATION OR DIFFERENTIATION FROM WILD POPULATIONS OF THE MEDAKA, ORYZIAS LATIPES(Genetics)(Proceedings of the Seventy-Third Annual Meeting of the Zoological Society of Japan) :, Sakaizumi Mitsuru,Takeda Miharu,Ohtake Hiroyuki,Togashi Ken-ichi,Shinomiya Ai,Matsuda Masaru,Nagahama Yoshitaka,Hamaguchi Satoshi, Zoological science, Zoological Society of Japan, Vol. 19, No. 12, p. 1497-1497, 2002
  • A STRAIN HAVING A ZZ/ZW SEX DETERMINATION SYSTEM DERIVED FROM A NATURALLY OCCURRING RECESSIVE MUTATION IN THE MEDAKA, ORYZIAS LATIPES(Genetics)(Proceedings of the Seventy-Third Annual Meeting of the Zoological Society of Japan) :, Shinomiya Ai,Matsuda Masaru,Nagahama Yoshitaka,Hamaguchi Satoshi,Sakaizumi Mitsuru, Zoological science, Zoological Society of Japan, Vol. 19, No. 12, p. 1497-1497, 2002
  • 27aA29P Simulation studies on nonlinear coupling of m/n=1/1 and 2/1 tearing modes in high-beta tokamak plasmas., TSURIMAKI Satoshi,HAMAGUCHI Satoshi,WAKATANI Masahiro, No. 19, p. 101-101, 2002
  • Analysis of neoclassical tearing modes using reduced MHD model, Sato Masahiko,Hamaguchi Satoshi,Wakatani Masahiro, Meeting Abstracts of the Physical Society of Japan, The Physical Society of Japan, Vol. 57, No. 0, p. 181-181, 2002
  • 24pZB-2 ELM-like Behavior Generated by Nonlinear ITG Mode, Takeda Kazuo,Hamaguchi Satoshi,Wakatani Masahiro, Meeting Abstracts of the Physical Society of Japan, The Physical Society of Japan, Vol. 57, No. 0, p. 183-183, 2002
  • 27aWJ-9 Slowdown mechanism of poloidal rotation in nonlinear resistive wall mode, Sato Masahiko,Hamaguchi Satoshi,Wakatani Masahiro, Meeting Abstracts of the Physical Society of Japan, The Physical Society of Japan, Vol. 57, No. 0, p. 209-209, 2002
  • Comparison between double-resonant and non-resonant mode driven convections in a stellarator with a non-monotonic rotational transform, Takeshi Unemura,Satoshi Hamaguchi,Masahiro Wakatani, Journal of the Physical Society of Japan, The Physical Society of Japan (JPS), Vol. 70, No. 4, p. 983-987, 2001/04
  • Construction of a BAC library derived from the inbred Hd-rR strain of the teleost fish, Oryzias latipes, MATSUDA Masaru,KAWATO Norihisa,ASAKAWA Shuichi,SHIMIZU Nobuyoshi,NAGAHAMA Yoshitaka,HAMAGUCHI Satoshi,SAKAIZUMI Mitsuru,HORI Hiroshi, Genes & Genetic Systems, The Genetics Society of Japan, Vol. 76, No. 1, p. 61-63, 2001/02
  • Modeling of nonlinear resistive wall modes, Sato Masahiko,Hamaguchi Satoshi,Wakatani Masahiro, Meeting Abstracts of the Physical Society of Japan, The Physical Society of Japan, Vol. 56, No. 0, p. 121-121, 2001
  • Effects of toroidal flows on high-η balloning modes in tokamaks (II), Furukawa M.,Tokuda S.,Nakamura Yuji,Hamaguchi S.,Wakatani M., Meeting Abstracts of the Physical Society of Japan, The Physical Society of Japan, Vol. 56, No. 0, p. 131-131, 2001
  • Two-dimensional Axisymmetric Ar Discharges Simulation based on the Drift-diffusion Model and Finite Element Method, Ishiwata Hirotaka,Hamaguchi Satoshi, Meeting Abstracts of the Physical Society of Japan, The Physical Society of Japan, Vol. 56, No. 0, p. 137-137, 2001
  • Calculation of Shear and Bulk Viscosities in Yukawa System, Saigo Tomoyasu,Hamaguchi Satoshi, Meeting Abstracts of the Physical Society of Japan, The Physical Society of Japan, Vol. 56, No. 0, p. 142-142, 2001
  • Effects of toroidal flows on high-n ballooning modes in tokamaks, Furukawa M.,Nakamura Y.,Hamaguchi S.,Wakatani M., Meeting Abstracts of the Physical Society of Japan, The Physical Society of Japan, Vol. 56, No. 0, p. 155-155, 2001
  • Calculation of Shear Viscosities in Strongly Coupled Yukawa Systems Using Molecular Dynamics Simulations, Saigo Tomoyasu,Hamaguchi Satoshi,Wakatani Masahiro, Meeting Abstracts of the Physical Society of Japan, The Physical Society of Japan, Vol. 56, No. 0, p. 177-177, 2001
  • POSITIONAL CLONING OF THE SEX-DETERMINING REGION OF MEDAKA USING A Y CONGENIC STRAIN(Genetics)(Proceeding of the Seventy-Third Annual Meeting of the Zoological Society of Japan) :, Matsuda M.,Matsuda C.,Nagahama Y.,Hamaguchi S.,Sakaizumi M., Zoological science, Zoological Society of Japan, Vol. 18, No. 0, p. 27-27, 2001
  • Mapping of the factor(s) controlling strain difference of estrogen-induced sex reversal rate in the medaka(Genetics)(Proceeding of the Seventy-Third Annual Meeting of the Zoological Society of Japan) :, Sato T.,Fujimaki R.,Sakaizumi M.,Hamaguchi S., Zoological science, Zoological Society of Japan, Vol. 18, No. 0, p. 28-28, 2001
  • Occurrence of ectopic primordial germ cells in the medaka, Oryzias latipes(Developmental Biology)(Proceeding of the Seventy-Third Annual Meeting of the Zoological Society of Japan) :, Shinomiya A.,Tanaka M.,Hamaguchi S., Zoological science, Zoological Society of Japan, Vol. 18, No. 0, p. 66-66, 2001
  • 3 Plasma-surface interactions during etching processes, Hamaguchi Satoshi, No. 18, p. 20-20, 2001
  • The vasa-like gene, olvas, identifies the migration path of primordial germ cells during embryonic body formation stage in the medaka, Oryzias latipes, SHINOMIYA Ai,TANAKA Minoru,KOBAYASHI Tohru,NAGAHAMA Yoshitaka,HAMAGUCHI Satoshi, Development, Growth & Differentiation, Vol. 42, No. 4, p. 317-326, 2000/08/01
  • Effects of toroidal shear flows on tokamak MHD equilibria, Furukawa M.,Nakamura Y.,Hamaguchi S.,Wakatani M., Meeting Abstracts of the Physical Society of Japan, The Physical Society of Japan, Vol. 55, No. 0, p. 160-160, 2000
  • 27pA24P Non-linear Saturation of Resistive Interchange Mode due to Flafting of Pressure Profile, No. 17, p. 86-86, 2000
  • 25pYG-10 Linear Analysis of Resistive Drift-Alfven Instability in a Cylindrical Plasma, Miyako Naoaki, Meeting Abstracts of the Physical Society of Japan, The Physical Society of Japan, Vol. 54, No. 0, p. 160-160, 1999
  • Identification of genetic sex of the medaka, Oryzias latipes, by PCR, SHINOMIYA A,Matsuda Masaru,Hamaguchi Satoshi,Sakaizumi Mitsuru, The Fish Biology Journal Medaka, Laboratory of Freshwater Fish Stocks Bioscience Center Nagoya University, No. 10, p. 31-32, 1999
  • Coulomb Crystals of Plasma Dust, HAMAGUCHI Satoshi, Meeting Abstracts of the Physical Society of Japan, The Physical Society of Japan, Vol. 53, No. 0, p. 933-933, 1998
  • Isolation of a sex chromosome-specific DNA sequence in the medaka, Oryzias latipes, MATSUDA Masaru,KUSAMA Takehiko,OSHIRO Takashi,KURIHARA Yasuyuki,HAMAGUCHI Satoshi,SAKAIZUMI Mitsuru, Genes & Genetic Systems, The Genetics Society of Japan, Vol. 72, No. 5, p. 263-268, 1997/10
  • Geographic Variation and Diversity in the Mitochondrial DNA of the Medaka, Oryzias latipes, as Determined by Restriction Endonuclease Analysis, MATSUDA Masaru,YONEKAWA Hiromichi,HAMAGUCHI Satoshi,SAKAIZUMI Mitsuru, Zoological Science, Zoological Society of Japan, Vol. 14, No. 3, p. 517-526, 1997/06/15
  • Bilaterally Asymmetrical Testes in Fishes of the Genus Oryzias, HAMAGUCHI Satoshi, Zoological Science, Zoological Society of Japan, Vol. 13, No. 5, p. 757-763, 1996/10/15
  • Plasma Processing and Dusty Plasmas., Hamaguchi Satoshi, Butsuri, The Physical Society of Japan, Vol. 50, No. 7, p. 527-532, 1995/12
  • Reply to comments of Nordman and Weiland on Norton et al. On "ion-temperature-gradient-driven transport in a density modification experiment on the Tokamak Fusion Test Reactor" [Phys. Fluids B 4, 953 (1992)] [1], W. Horton,D. Lindberg,J. Y. Kim,J. Q. Dong,G. W. Hammett,S. D. Scott,M. C. Zarnstorff,S. Hamaguchi, Physics of Fluids B, Vol. 5, No. 3, p. 1034-1035, 1993
  • 2a-RB-1 TORlUT-5実験V, Vol. 39, No. 0, p. 104-104, 1984
  • 13a-DG-12 TORIUT-5トカマク実験I, Vol. 1983, No. 0, p. 169-169, 1983
  • 29a-A-12 トカマク TORIUT-4M 実験 VI (低q放電-数値解析), Vol. 38, No. 0, p. 127-127, 1983
  • 29a-A-12 トカマク TORIUT-4M 実験 VII (低q放電-実験), Vol. 38, No. 0, p. 128-128, 1983
  • 30p-CE-4 TORIUT-4M 実験 V : 低q放電, Vol. 37, No. 0, p. 99-99, 1982
  • The Male Secondary Sex Characteristics in the Gynogenetic Female Fish,Poecilia formosa,Induced by the Administration of Methyltestosterone :, HAMAGUCHI Satoshi,EGAMI Nobuo, Vol. 53, No. 4, p. 227-230, 1980
  • The Inhibitory Effects of Cyproterone Acetate on the Male Secondary Sex Characters of the Medaka,Oryzias latipes :, HAMAGUCHI Satoshi, Vol. 51, No. 2, p. 65-69, 1978

Publications

  • プラズマプロセスの基礎と素過程」 浜口智志: 第25回プラズマエレクトロニクス講習会テキスト, (公社)応用物理学会プラズマエレクトロニクス分科会, 2014/11
  • プラズマ原子分子過程ハンドブック, 大阪大学出版会, ISBN:4872593626, 2011/04
  • 「プラズマエッチング表面反応シミュレーション」 “ドライ・ウエットエッチング技術全集”, 技術情報協会, 2009/03
  • 「プラズマフォトニクス」“光とナノが創る科学と産業”, 株式会社アドスリー, 2009/03
  • Plasma ion processes and their applications: modeling, Satoshi Hamaguchi, Ohm Co., 2005/08
  • Modeling of reactive ion etching for Si/SiO2 systems, S. Hamaguchi,H. Ohta, Springer-Verlag, Wien, 2001/12
  • Dynamical properties of strongly coupled dusty plasmas, S. Hamaguchi,H. Ohta, Elsevier Sci., 2000/12
  • "Dusty Plasmas and Coulomb Crystals,"in High Field Science, S. Hamaguchi, Plenum Publisher, New York, 2000/10
  • "Mathematical methods for thin film deposition simulations," in Modeling of Film Deposition for Microelectronic Applications,, S. Hamaguchi, Academic Press, San Diego, 1996/04
  • "The Boltzmann-Poisson system in weakly collisional sheaths," in Semiconductors, S. Hamaguchi,R. T. Farouki,M. Dalvie, Springer-Verlag, New York, 1994/12
  • "Drift wave turbulence and vortices in 3--D sheared magnetic fields" in Chaotic Dynamics and Transport in Fluids and Plasmas, W. Horton,S. Hamaguchi,B.-G. Hong, AIP, New York, 1993/06

Industrial Property Rights

  • Plasma producing apparatus and method of plasma production, US8232729 US20100019677, PCT/JP2007/061837, 出願日:2007/06, 登録日:2012/06
  • High density plasma processing tool with toroidal magnetic field, Manoj Dalvie,Satoshi Hamaguchi, US05505780, 出願日:1994/10, 登録日:1996/10
  • 胚様体を外胚葉へと分化誘導する方法, 特願2015-231156, 出願日:2015/11
  • 放射性プルーム監視システムおよび放射性物質検出装置, 2014-179899, 出願日:2014/09
  • エッチング方法および装置, 特願2014-41240, 出願日:2014/03
  • 人工骨、人工骨製造装置及び人工骨製造方法, PCT/JP2011/071262, 出願日:2011/09
  • 人工骨、人工骨製造装置及び人工骨製造方法, 特願2010-207645, 出願日:2010/09
  • 殺菌方法および装置, 末連絡, 出願日:2008/09
  • イオン化電流検出器, 特願2008-224483, 出願日:2008/09
  • ガスクロマトグラフ用イオン化電流検出器, 特願2008-76917, 出願日:2008/03
  • 殺菌方法および装置, 2007-251194, 出願日:2007/09
  • プラズマ生成装置およびプラズマ生成方法, PCT/JP2007/061837, 出願日:2007/06
  • LFプラズマジェットを用いた金属ナノ粒子の合成及び表面処理, 特願2007-97829, 出願日:2007/03
  • プラズマ生成装置およびプラズマ発生方法, 特願2006-334800, 出願日:2006/12
  • The apparatus and method for the generation of glow plasmas, Katsuhisa Kitano,Hironori Aoki,Satoshi Hamaguchi, PCT/JP2006/317652, 出願日:2006/09
  • The apparatus and method for the generation of glow plasmas, Katsuhisa Kitano,Hironori Aoki,Satoshi Hamaguchi, 特願2006-058721, 出願日:2006/03

Awards

  • Mercator Fellow, German Research Foundation, 2019/09
  • The 41st JSAP Outstating Paper Award,, Japan Society of Applied Physics, 2019/09
  • Plasma Prize, American Vacuum Society, 2016/11
  • Fellow, American Physical Society, 2012/10
  • Plasma Electronics Prize, Division of Plasma Electronics, Japan Society of Applied Physics, 2012/09
  • Fellow, American Vacuum Society, 2011/10
  • Fulbright Fellow, The US-Japan Education Commission (Fulbright Japan), 1984/07

Committee Memberships

  • 25th International Symposium on Plasma Chemistry (ISPC25), Co-Chair, Program Committee, 2020/01 - Present
  • 25th International Symposium on Plasma Chemistry (ISPC25), Co-Chair, Local Organizing Committee, 2020/01 - Present
  • Plasma Medicine (Begell House Publishing), Editor-in-Chief, 2019/12 - Present
  • 12th EU-Japan Joint Symposium on Plasma Processing (JSPP-11), Co-Chair, Organizing Committee,, 2019/01 - Present
  • 3nd International Conference on Data-Driven Plasma Science (ICDDPS), Co-Chair, Executive Scientific Committee,, 2019/01 - Present
  • Gaseous Electronics Conference (GEC), Chair, Program Committee, Tutorial “Artificial Intelligence and Machine Learning” and Workshop “Artificial Intelligence and Machine Learning in Plasma Science and Beyond”, 2019/01 - Present
  • International Union for Vacuum Science, Technique and Applications (IUVSTA), Chair, Executive Committee, Plasma Science and Techniques Division (PSTD),, 2019/01 - Present
  • International Conference on Atomic Layer Deposition & International Atomic Layer Etch Workshop, ALE Program Committee, 2018/01 - Present
  • International Symposium of Dry Process (DPS), Organizing Committee, 2017/01 - Present
  • Leibniz-Institut für Plasmaforschung und Technologie e. V. (INP Greifswald)., Scientific Advisory Board, 2016/01 - Present
  • Plasma Science and Techniques Division (PSTD), International Union for Vacuum Science, Technique and Applications (IUVSTA), Executive Committee, 2016/01 - Present
  • IEEE Transactions on Radiation and Plasma Medical Sciences, Associate editor, 2016/01 - Present
  • Plasma Medicine (Begell House Publishing), Executive Editor, 2015/01 - Present
  • Frontiers in Physics, Frontiers, Associate Editor, Plasma Physics, 2014/01 - Present
  • Journal of Physics D: Applied Physics, Member of the Editorial Board, 2013/01 - Present
  • International Plasma Chemistry Society (IPCS), Member of the Board of Directors, 2009/01 - Present
  • International Society for Plasma Medicine (ISPM), Member of Board of Directors, 2009/01 - Present