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Kenta Arima
有馬 健太
Kenta Arima
有馬 健太
Institutional repository
Graduate School of Engineering　Division of Precision Science & Technology and Applied Physics, Professor

keyword Production engineering，semiconductor process，Surface Science

Institutional repository

Research History 6

  1. 2023/04 - Present
    大阪大学 大学院 工学研究科 物理学系専攻 教授

  2. 2009/04 - 2023/03
    Osaka University　Graduate School of Engineering　Associate professor

  3. 2007/04 - 2009/03
    Osaka University　Graduate School of Engineering　Assistant professor

  4. 2007/11 - 2008/10
    Lawrence Berkeley National Laboratory　Visiting Scholar

  5. 2000/04 - 2007/03
    Osaka University　Graduate School of Engineering　Research Associate

  6. 1997/04 - 2000/03
    RIKEN　Junior research associate

Education 3

  1. Osaka University　Graduate School of Engineering　Department of Precision Science and Technology

    1997/04 - 2000/03

  2. Osaka University　Graduate School of Engineering　Department of Precision Science and Technology

    1995/04 - 1997/03

  3. Osaka University　School of Engineering　Department of Precision Engineering

    1991/04 - 1995/03

Committee Memberships 13

  1. 応用物理学会 薄膜・表面物理分科会　常任幹事　Academic society

    2024/04 - Present

  2. 応用物理学会 界面ナノ電子化学研究会　副委員長　Academic society

    2022/01 - Present

  3. 精密工学会 関西支部　幹事　Academic society

    2018/07 - Present

  4. 精密工学会 超精密加工専門委員会　幹事　Academic society

    2010/04 - Present

  5. 応用物理学会 界面ナノ電子化学研究会　コアメンバー　Academic society

    2019/01 - 2021/12

  6. 日本表面真空学会 学術講演会委員会　委員　Academic society

    2018/04 - 2019/03

  7. 日本表面真空学会 関西支部　委員　Academic society

    2018/04 - 2019/03

  8. 応用物理学会 界面ナノ電子化学研究会　アドバイザー　Academic society

    2016/04 - 2018/12

  9. 精密工学会 関西支部　商議委員　Academic society

    2011/04 - 2018/06

  10. 精密工学会　校閲委員　Academic society

    2016/04 - 2018/03

  11. 日本表面科学会　関西支部役員　Academic society

    2013/04 - 2018/03

  12. 日本表面科学会　支部推薦本部企画委員　Academic society

    2015/04 - 2017/03

  13. 精密工学会　会誌編集委員　Academic society

    2012/04 - 2015/03

Professional Memberships 5

  1. The Electrochemical Society

  2. Materials Research Society

  3. The Japan Society of Vacuum and Surface Science

  4. The Japan Society of Applied Physics

  5. The Japan Society for Precision Engineering

Research Areas 3

  1. Nanotechnology/Materials / Material fabrication and microstructure control /

  2. Manufacturing technology (mechanical, electrical/electronic, chemical engineering) / Manufacturing and production engineering /

  3. Nanotechnology/Materials / Thin-film surfaces and interfaces /

Awards 28

  1. Best Poster Presentation Award

    Mizuma Uno, Ryuto Hashimoto, Kouji Inagaki, Kenta Arima　Kansai Branch, The Japan Society for Precision Engineering　2025/06

  2. Poster Award

    Shiika Murase, Tomoki Higashi, Kouji Inagaki, Kenta Arima　The 85th JSAP Autumn Meeting 2024　2024/11

  3. Best Poster Award

    Junhuan Li, Kouji Inagaki, Kenta Arima　ACSIN-15 (15th International Conference on Atomically Controlled Surfaces, Interfaces and Nanostructures)　2024/05

  4. Best Presentation Award

    Tetsuro Takeuchi, Ryuto Hashimoto, Zhida Ma, Kouji Inagaki, Kenta Arima　The Japan Society for Precision Engineering　2023/11

  5. Best Presentation Award

    Junhuan Li, Kouji Inagaki, Rongyan Sun, Kazuya Yamamura, Kenta Arima　The Japan Society for Precision Engineering　2023/06

  6. Best Presentation Award

    Tetsuro Takeuchi, Zhida Ma, Ryuto Hashimoto, Rongyan Sun, Kazuya Yamamura, Kenta Arima　Professional Group of Interfacial Nano Electrochemistry, The Japan Society of Applied Physics　2022/09

  7. Best Presentation Award

    Ryo Kajimoto, Makoto Ochi, Kentaro Kawai, Kazuya Yamamura, Kenta Arima　The Japan Society for Precision Engineering　2021/12

  8. Recognition by Dean of Graduate School of Engineering

    Kenta Arima　2021/03

  9. Best Presentation Award

    Ryo Mikurino, Ayumi Ogasawara, Tomoki Hirano, Kentaro Kawai, Kazuya Yamamura, Kenta Arima　The Japan Society for Precision Engineering　2020/12

  10. Best Presentation Award

    Zhida Ma, Seiya Masumoto, Kentaro Kawai, Kazuya Yamamura, Kenta Arima　The Japan Society for Precision Engineering　2020/12

  11. Young Researcher Award

    Zhida Ma, Seiya Masumoto, Kentaro Kawai, Kazuya Yamamura, Kenta Arima　ICPE 2020　2020/11

  12. Best Poster Presentation Award

    MASUMOTO Seiya, KAWAI Kentaro, YAMAMURA Kazuya, ARIMA Kenta　The Japan Society for Precision Engineering　2019/09

  13. Best Poster Presentation Award

    MASUMOTO Seiya, KAWAI Kentaro, YAMAMURA Kazuya, ARIMA Kenta　Kansai Branch, The Japan Society for Precision Engineering　2019/06

  14. Young Scientist Presentation Award

    HIRANO Tomoki, NAKATA Yuki, YAMASHITA Hiroto, LI Shaoxian, KAWAI Kentaro, YAMAMURA Kazuya, ARIMA Kenta　The Japan Society of Applied Physics　2019/03

  15. Young Scientist Award

    Shaoxian LI, Tomoki HIRANO, Kentaro KAWAI, Kazuya YAMAMURA, Kenta ARIMA　PCSI-46　2019/01

  16. Young Scientist Award

    Tomoki HIRANO, Yuki NAKATA, Hiroto YAMASHITA, Shaoxian LI, Kentaro KAWAI, Kazuya YAMAMURA, Kenta ARIMA　PCSI-46　2019/01

  17. Best Poster Presentation Award

    MINAMI Ouki, ITO Ryota, HOSOO Kohei, SANO Yasuhisa, KAWAI Kentaro, ARIMA Kenta　Kansai Branch, The Japan Society for Precision Engineering　2018/06

  18. Best Presentation Award

    HIRANO Tomoki, NAKADE Kazuki, LI Shaoxian, KAWAI Kentaro, YAMAMURA Kazuya, ARIMA Kenta　Professional Group of Interfacial Nano Electrochemistry, The Japan Society of Applied Physics　2018/03

  19. Best Presentation Award

    Yuki Nakata, Tomoki Hirano, Shaoxian Li, Kentaro Kawai, Kazuya Yamamura, Kenta Arima　The Japan Society for Precision Engineering　2018/03

  20. ベストポスタープレゼンテーション賞

    平野智暉, 中出和希, 李韶賢, 森田瑞穂, 川合健太郎, 有馬健太　精密工学会 2017年度秋季大会　2017/09

  21. Best Poster Presentation Award

    Ryota Ito, Kohei Hosoo, Ouki Minami, Mizuho Morita, Yasuhisa Sano, Kentaro Kawai, Kenta Arima　The Japan Society for Precision Engineering　2017/09

  22. Yasuda Award

    Kazuki Nakade, Daichi Mori, Tatsuya Kawase, Kentaro Kawai, Yasuhisa Sano, Kazuto Yamauchi, Mizuho Morita, Kenta Arima　The Japan Society of Applied Physics　2016/01

  23. Osaka University Presidential Award for Encouragement

    ARIMA Kenta　Osaka University　2015/07

  24. Best Poster Award

    Yusuke Saito, Daichi Mori, Atsushi Mura, Kentaro Kawai, Mizuho Morita, Kenta Arima　The Japan Society for Precision Engineering, Kansai Branch　2014/07

  25. Paper Award on Review Article

    ARIMA Kenta　The Surface Science Society of Japan　2013/11

  26. Osaka University Presidential Award for Encouragement

    ARIMA Kenta　Osaka University　2013/08

  27. Best Poster Award (First International Symposium on Atomically Controlled Fabrication Technology)

    Akina Yoshimatsu, Hiroki Sakane, Takushi Shigetoshi, Junichi Uchikoshi, Mizuho Morita, Kenta Arima　The Japan Society for Precision Engineering　2009/02

  28. Image of the Month

    ARIMA Kenta　RHK Technology　2005/12

Papers 134

  1. Measurement of electrical characteristics of Ge-based diodes with thermal GeO2 films exposed to controlled humidity conditions

    Shuto Sano, Hiroki Takano, Yohei Wada, Ethan J. Crumlin, Kouji Inagaki, Kenta Arima

    JOURNAL OF APPLIED PHYSICS　Vol. 137　No. 15　p. 155304-1-155304-7　2025/04/16　Research paper (scientific journal)

    Publisher: AIP Publishing

  2. Nanocarbon-assisted chemical etching of Ge(100) in H2O2

    Junhuan Li, Seiya Yamamoto, Kouji Inagaki, Kenta Arima

    ELECTROCHEMISTRY COMMUNICATIONS　Vol. 163　p. 107735-1-107735-5　2024/04/29　Research paper (scientific journal)

    Publisher: Elsevier BV

  3. First-principles simulations of scanning tunneling microscopy images exhibiting anomalous dot patterns on armchair-edged graphene nanoribbons

    Junhuan Li, Kouji Inagaki, Kenta Arima

    PHYSICAL REVIEW RESEARCH　Vol. 6　No. 1　p. 013252-1-013252-9　2024/03/07　Research paper (scientific journal)

    Publisher: American Physical Society (APS)

  4. Nanocarbon-Induced Etching Property of Semiconductor Surfaces: Testing Nanocarbon’s Catalytic Activity for Oxygen Reduction Reaction at a Single-Sheet Level

    Ayumi Ogasawara, Kentaro Kawai, Kazuya Yamamura, Kenta Arima

    ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY　Vol. 11　No. 4　p. 041001-1-041001-5　2022/04/05　Research paper (scientific journal)

    Publisher: The Electrochemical Society

  5. Separation of Neighboring Terraces on a Flattened Si(111) Surface by Selective Etching along Step Edges Using Total Wet Chemical Processing

    Zhida Ma, Seiya Masumoto, Kentaro Kawai, Kazuya Yamamura, Kenta Arima

    LANGMUIR　Vol. 38　No. 12　p. 3748-3754　2022/03/29　Research paper (scientific journal)

    Publisher: American Chemical Society (ACS)

  6. Atomic-scale insights into the origin of rectangular lattice in nanographene probed by scanning tunneling microscopy

    Junhuan Li, Shaoxian Li, Tomoki Higashi, Kentaro Kawai, Kouji Inagaki, Kazuya Yamamura, Kenta Arima

    PHYSICAL REVIEW B　Vol. 103　No. 24　p. 245433-1-245433-9　2021/06/24　Research paper (scientific journal)

  7. Catalytic Properties of Chemically Modified Graphene Sheets to Enhance Etching of Ge Surface in Water

    Ryo Mikurino, Ayumi Ogasawara, Tomoki Hirano, Yuki Nakata, Hiroto Yamashita, Shaoxian Li, Kentaro Kawai, Kazuya Yamamura, Kenta Arima

    The JOURNAL OF PHYSICAL CHEMISTRY C　Vol. 124　No. 11　p. 6121-6129　2020/03/19　Research paper (scientific journal)

    Publisher: American Chemical Society (ACS)

  8. Improvements in graphene growth on 4H-SiC(0001) using plasma induced surface oxidation

    Ouki Minami, Ryota Ito, Kohei Hosoo, Makoto Ochi, Yasuhisa Sano, Kentaro Kawai, Kazuya Yamamura, Kenta Arima

    JOURNAL OF APPLIED PHYSICS　Vol. 126　No. 6　p. 065301-1-065301-10　2019/08/14　Research paper (scientific journal)

  9. Investigation of reaction sequence occurring in graphene-assisted chemical etching of Ge surfaces in water

    Shaoxian Li, Kazuki Nakade, Tomoki Hirano, Kentaro Kawai, Kenta Arima

    MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING　Vol. 87　p. 32-36　2018/11/15　Research paper (scientific journal)

  10. Chemical etching of a semiconductor surface assisted by single sheets of reduced graphene oxide

    Tomoki Hirano, Kazuki Nakade, Shaoxian Li, Kentaro Kawai, Kenta Arima

    CARBON　Vol. 127　p. 681-687　2018/02　Research paper (scientific journal)

  11. Comparative study of GeO2/Ge and SiO2/Si structures on anomalous charging of oxide films upon water adsorption revealed by ambient-pressure X-ray photoelectron spectroscopy

    Daichi Mori, Hiroshi Oka, Takuji Hosoi, Kentaro Kawai, Mizuho Morita, Ethan J. Crumlin, Zhi Liu, Heiji Watanabe, Kenta Arima

    JOURNAL OF APPLIED PHYSICS　Vol. 120　No. 9　p. 095306-1-095306-10　2016/09/02　Research paper (scientific journal)

  12. Catalyst-Assisted Electroless Flattening of Ge Surfaces in Dissolved-O2-Containing Water

    Tatsuya Kawase, Yusuke Saito, Atsushi Mura, Takeshi Okamoto, Kentaro Kawai, Yasuhisa Sano, Mizuho Morita, Kazuto Yamauchi, Kenta Arima

    CHEMELECTROCHEM　Vol. 2　No. 11　p. 1656-1659　2015/07/23　Research paper (scientific journal)

  13. Aggregation of carbon atoms at SiO2/SiC(0001) interface by plasma oxidation toward formation of pit-free graphene

    Naoki Saito, Daichi Mori, Akito Imafuku, Keisuke Nishitani, Hiroki Sakane, Kentaro Kawai, Yasuhisa Sano, Mizuho Morita, Kenta Arima

    CARBON　Vol. 80　p. 440-445　2014/12　Research paper (scientific journal)

  14. Metal-assisted chemical etching of Ge(100) surfaces in water toward nanoscale patterning

    Tatsuya Kawase, Atsushi Mura, Katsuya Dei, Keisuke Nishitani, Kentaro Kawai, Junichi Uchikoshi, Mizuho Morita, Kenta Arima

    NANOSCALE RESEARCH LETTERS　Vol. 8　p. 151-1-151-7　2013/04/02　Research paper (scientific journal)

  15. Water Growth on GeO2/Ge(100) Stack and Its Effect on the Electronic Properties of GeO2

    Atsushi Mura, Iori Hideshima, Zhi Liu, Takuji Hosoi, Heiji Watanabe, Kenta Arima

    JOURNAL OF PHYSICAL CHEMISTRY C　Vol. 117　No. 1　p. 165-171　2013/01/10　Research paper (scientific journal)

  16. Catalytic behavior of metallic particles in anisotropic etching of Ge(100) surfaces in water mediated by dissolved oxygen

    Tatsuya Kawase, Atsushi Mura, Keisuke Nishitani, Yoshie Kawai, Kentaro Kawai, Junichi Uchikoshi, Mizuho Morita, Kenta Arima

    JOURNAL OF APPLIED PHYSICS　Vol. 111　No. 12　p. 126102-1-126102-3　2012/06/20　Research paper (scientific journal)

  17. Mechanism of atomic-scale passivation and flattening of semiconductor surfaces by wet-chemical preparations

    Kenta Arima, Katsuyoshi Endo, Kazuto Yamauchi, Kikuji Hirose, Tomoya Ono, Yasuhisa Sano

    JOURNAL OF PHYSICS-CONDENSED MATTER　Vol. 23　No. 39　p. 394202-1-394202-14　2011/09/15　Research paper (scientific journal)

  18. Characterization of Terraces and Steps on Cl-Terminated Ge(111) Surfaces After HCl Treatment in N2 Ambient

    Katsuya Dei, Tatsuya Kawase, Kazufumi Yoneda, Junichi Uchikoshi, Mizuho Morita, Kenta Arima

    JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY　Vol. 11　No. 4　p. 2968-2972　2011/04/01　Research paper (scientific journal)

  19. Selective Adsorption of Organosilane Molecules Along Step Edges of Atomically Flattened Si(111) Surfaces

    Hiroki Sakane, Akina Yoshimatsu, Takushi Shigetoshi, Junichi Uchikoshi, Mizuho Morita, Kenta Arima

    JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY　Vol. 11　No. 4　p. 2962-2967　2011/04/01　Research paper (scientific journal)

  20. Water Adsorption, Solvation, and Deliquescence of Potassium Bromide Thin Films on SiO2 Studied by Ambient-Pressure X-ray Photoelectron Spectroscopy

    Kenta Arima, Peng Jiang, Xingyi Deng, Hendrik Bluhm, Miquel Salmeron

    JOURNAL OF PHYSICAL CHEMISTRY C　Vol. 114　No. 35　p. 14900-14906　2010/09/09　Research paper (scientific journal)

  21. Ion Segregation and Deliquescence of Alkali Halide Nanocrystals on SiO2

    Kenta Arima, Peng Jiang, Deng-Sung Lin, Albert Verdaguer, Miquel Salmeron

    JOURNAL OF PHYSICAL CHEMISTRY A　Vol. 113　No. 35　p. 9715-9720　2009/09/03　Research paper (scientific journal)

  22. Development of surface Hall potentiometry to reveal the variation of drift velocity of carriers in semiconductor materials

    Kenta Arima, Yuji Hidaka, Kenji Hiwa, Junichi Uchikoshl, Mizuho Morita

    JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 47　No. 4　p. 3041-3045　2008/04/25　Research paper (scientific journal)

  23. Ex situ scanning tunneling microscopy study of Cu nanowires formed by electroless deposition at atomic-step edges of flat Si(111) surfaces

    Akina Yoshimatsu, Takushi Shigetoshi, Junichi Uchikoshi, Mizuho Morita, Kenta Arima

    SURFACE AND INTERFACE ANALYSIS　Vol. 40　No. 6-7　p. 1134-1137　2008/03/07　Research paper (scientific journal)

  24. Atomic-scale flattening of SiC surfaces by electroless chemical etching in HF solution with Pt catalyst

    Kenta Arima, Hideyuki Hara, Junji Murata, Takeshi Ishida, Ryota Okamoto, Keita Yagi, Yasuhisa Sano, Hidekazu Mimura, Kazuto Yamauchi

    APPLIED PHYSICS LETTERS　Vol. 90　No. 20　p. 202106-1-202106-3　2007/05/16　Research paper (scientific journal)

  25. Microscratches with depths of angstrom order on Si wafers detected by light scattering and AFM

    Takushi Shigetoshi, Haruyuki Inoue, Tsukasa Kawashima, Takaaki Hirokane, Toshihiko Kataoka, Mizuho Morita, Kenta Arima

    ELECTROCHEMICAL AND SOLID STATE LETTERS　Vol. 10　No. 7　p. H206-H209　2007/04/25　Research paper (scientific journal)

  26. Highly resolved scanning tunneling microscopy study of Si(001) surfaces flattened in aqueous environment

    Kenta Arima, Akihisa Kubota, Hidekazu Mimura, Kouji Inagaki, Katsuyoshi Endo, Yuzo Mori, Kazuto Yamauchi

    SURFACE SCIENCE　Vol. 600　No. 15　p. L185-L188　2006/08/01　Research paper (scientific journal)

  27. Surface Hall Potentiometry for Characterizing Semiconductor Films

    Kenta Arima, Kenji Hiwa, Ryoji Nakaoka, Mizuho Morita

    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS　Vol. 45　No. 4B　p. 3601-3605　2006/04/25　Research paper (scientific journal)

  28. Atomic-Scale Evaluation of Si(111) Surfaces Finished by the Planarization Process Utilizing SiO2 Particles Mixed with Water

    Jun Katoh, Kenta Arima, Akihisa Kubota, Hidekazu Mimura, Kouji Inagaki, Yuzo Mori, Kazuto Yamauchi, Katsuyoshi Endo

    JOURNAL OF THE ELECTROCHEMICAL SOCIETY　Vol. 153　No. 6　p. G560-G560　2006/04/13　Research paper (scientific journal)

  29. Surface photovoltage measurements of intrinsic hydrogenated amorphous Si films on Si wafers on the nanometer scale

    Kenta Arima, Takushi Shigetoshi, Hiroaki Kakiuchi, Mizuho Morita

    PHYSICA B-CONDENSED MATTER　Vol. 376-377　p. 893-896　2006/04/01　Research paper (scientific journal)

  30. Hydrogen termination of Si(110) surfaces upon wet cleaning revealed by highly resolved scanning tunneling microscopy

    Kenta Arima, Jun Katoh, Shinya Horie, Katsuyoshi Endo, Tomoya Ono, Shigetoshi Sugawa, Hiroshi Akahori, Akinobu Teramoto, Tadahiro Ohmi

    JOURNAL OF APPLIED PHYSICS　Vol. 98　No. 10　p. 103525-103525　2005/11/15　Research paper (scientific journal)

  31. Atomic-scale analysis of hydrogen-terminated Si(110) surfaces after wet cleaning

    Kenta Arima, Jun Katoh, Katsuyoshi Endo

    APPLIED PHYSICS LETTERS　Vol. 85　No. 25　p. 6254-6256　2004/12/20　Research paper (scientific journal)

  32. Scanning tunneling microscopy/spectroscopy observation of intrinsic hydrogenated amorphous silicon surface under light irradiation

    Kenta Arima, Hiroaki Kakiuchi, Manabu Ikeda, Katsuyoshi Endo, Mizuho Morita, Yuzo Mori

    SURFACE SCIENCE　Vol. 572　No. 2-3　p. 449-458　2004/11/20　Research paper (scientific journal)

  33. Visible Light Irradiation Effects on STM Observations of Hydrogenated Amorphous Silicon Surfaces

    Kenta Arima, Hiroaki Kakiuchi, Manabu Ikeda, Katsuyoshi Endo, Mizuho Morita, Yuzo Mori

    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS　Vol. 43　No. 4B　p. 1891-1895　2004/04/27　Research paper (scientific journal)

  34. Scanning tunneling microscopy study of hydrogen-terminated Si(001) surfaces after wet cleaning

    K. Arima, K. Endo, T. Kataoka, Y. Oshikane, H. Inoue, Y. Mori

    SURFACE SCIENCE　Vol. 446　No. 1-2　p. 128-136　2000/02/01　Research paper (scientific journal)

  35. Atomically resolved scanning tunneling microscopy of hydrogen-terminated Si(001) surfaces after HF cleaning

    Kenta Arima, Katsuyoshi Endo, Toshihiko Kataoka, Yasushi Oshikane, Haruyuki Inoue, Yuzo Mori

    APPLIED PHYSICS LETTERS　Vol. 76　No. 4　p. 463-465　2000/01/24　Research paper (scientific journal)

  36. Observation of metal on Si(001) by STM/STS and its consideration based on the first principles calculations

    Kenta Arima, Katsuyoshi Endo, Toshihiko Kataoka, Kikuji Hirose, Hidekazu Goto, Yasushi Oshikane, Haruyuki Inoue, Yoshitaka Tatara, Yuzo Mori

    COMPUTATIONAL MATERIALS SCIENCE　Vol. 14　No. 1-4　p. 236-240　1999/03/04　Research paper (scientific journal)

  37. Highly efficient finishing of large-sized single crystal diamond substrates by combining nanosecond pulsed laser trimming and plasma-assisted polishing

    Nian Liu, Kentaro Sugimoto, Naoya Yoshitaka, Hideaki Yamada, Rongyan Sun, Kenta Arima, Kazuya Yamamura

    Ceramics International　Vol. 49　No. 11　p. 19109-19123　2023/06　Research paper (scientific journal)

    Publisher: Elsevier BV

  38. Electroluminescence in metal-oxide-semiconductor tunnel diodes with a crystalline silicon/silicon dioxide quantum well

    Yuki Miyata, Yasunori Nakamukai, Cassia Tiemi Azevedo, Ayano Tsuchida, Miho Morita, Yasushi Oshikane, Junichi Uchikoshi, Kentaro Kawai, Kenta Arima, Mizuho Morita

    Micro and Nanostructures　Vol. 166　p. 207228-207228　2022/06　Research paper (scientific journal)

    Publisher: Elsevier BV

  39. Effects of polishing pressure and sliding speed on the material removal mechanism of single crystal diamond in plasma-assisted polishing

    Nian Liu, Kentaro Sugimoto, Naoya Yoshitaka, Hideaki Yamada, Rongyan Sun, Kentaro Kawai, Kenta Arima, Kazuya Yamamura

    Diamond and Related Materials　Vol. 124　p. 108899-108899　2022/04　Research paper (scientific journal)

    Publisher: Elsevier BV

  40. Charge Utilization Efficiency and Side Reactions in the Electrochemical Mechanical Polishing of 4H-SiC (0001)

    Xiaozhe Yang, Xu Yang, Haiyang Gu, Kentaro Kawai, Kenta Arima, Kazuya Yamamura

    Journal of The Electrochemical Society　Vol. 169　No. 2　p. 023501-023501　2022/02/01　Research paper (scientific journal)

    Publisher: The Electrochemical Society

  41. Comparison of surface and subsurface damage of mosaic single-crystal diamond substrate processed by mechanical and plasma-assisted polishing

    Nian Liu, Hideaki Yamada, Naoya Yoshitaka, Kentaro Sugimoto, Rongyan Sun, Kentaro Kawai, Kenta Arima, Kazuya Yamamura

    Diamond and Related Materials　Vol. 119　p. 108555-108555　2021/11　Research paper (scientific journal)

    Publisher: Elsevier BV

  42. Novel highly-efficient and dress-free polishing technique with plasma-assisted surface modification and dressing

    Rongyan Sun, Atsunori Nozoe, Junji Nagahashi, Kenta Arima, Kentaro Kawai, Kazuya Yamamura

    Precision Engineering　Vol. 72　p. 224-236　2021/11　Research paper (scientific journal)

    Publisher: Elsevier BV

  43. Novel SiC wafer manufacturing process employing three-step slurryless electrochemical mechanical polishing

    Xu Yang, Xiaozhe Yang, Kentaro Kawai, Kenta Arima, Kazuya Yamamura

    Journal of Manufacturing Processes　Vol. 70　p. 350-360　2021/10/01　Research paper (scientific journal)

    Publisher: Elsevier Ltd

  44. Dominant factors and their action mechanisms on material removal rate in electrochemical mechanical polishing of 4H-SiC (0001) surface

    Xiaozhe Yang, Xu Yang, Kentaro Kawai, Kenta Arima, Kazuya Yamamura

    Applied Surface Science　Vol. 562　p. 150130-150130　2021/10　Research paper (scientific journal)

    Publisher: Elsevier BV

  45. Damage-free highly efficient plasma-assisted polishing of a 20-mm square large mosaic single crystal diamond substrate

    Nian Liu, Kohki Sugawara, Naoya Yoshitaka, Hideaki Yamada, Daisuke Takeuchi, Yuko Akabane, Kenichi Fujino, Kentaro Kawai, Kenta Arima, Kazuya Yamamura

    Scientific Reports　Vol. 10　No. 1　2020/12　Research paper (scientific journal)

    Publisher: Springer Science and Business Media LLC

  46. Feasibility using ethanol-added argon instead of helium as the carrier gas used in atmospheric-pressure plasma chemical vaporization machining

    Rongyan Sun, Keiichiro Watanabe, Shiro Miyazaki, Toru Fukano, Masanobu Kitada, Kentaro Kawai, Kenta Arima, Kazuya Yamamura

    Proceedings of the 20th International Conference of the European Society for Precision Engineering and Nanotechnology, EUSPEN 2020　p. 159-160　2020　Research paper (international conference proceedings)

    Publisher: euspen

  47. Nanopore sensing device integrating nanopillar array for DNA translocation control

    Takahiro Tanaka, Syogo Kanetani, Kenta Arima, Kentaro Kawai

    21st International Conference on Miniaturized Systems for Chemistry and Life Sciences, MicroTAS 2017　p. 362-363　2020　Research paper (international conference proceedings)

    Publisher: Chemical and Biological Microsystems Society

  48. Rapid folding of DNA nanostructures in microfluidic channel

    Keita Hara, Kenta Arima, Osamu Tabata, Kentaro Kawai

    21st International Conference on Miniaturized Systems for Chemistry and Life Sciences, MicroTAS 2017　p. 387-388　2020　Research paper (international conference proceedings)

  49. High-quality plasma-assisted polishing of aluminum nitride ceramic

    Rongyan Sun, Xu Yang, Kenta Arima, Kentaro Kawai, Kazuya Yamamura

    CIRP Annals　Vol. 69　No. 1　p. 301-304　2020　Research paper (scientific journal)

    Publisher: Elsevier BV

  50. Obtaining Atomically Smooth 4H–SiC (0001) Surface by Controlling Balance Between Anodizing and Polishing in Electrochemical Mechanical Polishing

    Xu Yang, Xiaozhe Yang, Rongyan Sun, Kentaro Kawai, Kenta Arima, Kazuya Yamamura

    Nanomanufacturing and Metrology　Vol. 2　No. 3　p. 140-147　2019/09　Research paper (scientific journal)

    Publisher: Springer Science and Business Media LLC

  51. Etching Characteristics of Quartz Crystal Wafers Using Argon-Based Atmospheric Pressure CF4 Plasma Stabilized by Ethanol Addition

    Rongyan Sun, Xu Yang, Keiichiro Watanabe, Shiro Miyazaki, Toru Fukano, Masanobu Kitada, Kenta Arima, Kentaro Kawai, Kazuya Yamamura

    Nanomanufacturing and Metrology　Vol. 2　No. 3　p. 168-176　2019/09　Research paper (scientific journal)

    Publisher: Springer Science and Business Media LLC

  52. Highly efficient planarization of sliced 4H-SiC (0001) wafer by slurryless electrochemical mechanical polishing

    Yang Xu, Yang Xiaozhe, Kawai Kentaro, Arima Kenta, Yamamura Kazuya

    INTERNATIONAL JOURNAL OF MACHINE TOOLS & MANUFACTURE　Vol. 144　2019/09

  53. Rapid Assembly of DNA Origami in Microfluidic Temperature Gradient

    Kentaro Kawai, Hara Keita, Ryota Nakamura, Kenta Arima, Kazuya Yamamura, Osamu Tabata

    2019 20th International Conference on Solid-State Sensors, Actuators and Microsystems and Eurosensors XXXIII, TRANSDUCERS 2019 and EUROSENSORS XXXIII　p. 398-401　2019/06　Research paper (international conference proceedings)

  54. Ultrasonic-assisted anodic oxidation of 4H-SiC (0001) surface

    Yang Xiaozhe, Yang Xu, Kawai Kentaro, Arima Kenta, Yamamura Kazuya

    ELECTROCHEMISTRY COMMUNICATIONS　Vol. 100　p. 1-5　2019/03

  55. Surface Modification and Microstructuring of 4H-SiC(0001) by Anodic Oxidation with Sodium Chloride Aqueous Solution

    Yang Xu, Sun Rongyan, Kawai Kentaro, Arima Kenta, Yamamura Kazuya

    ACS APPLIED MATERIALS & INTERFACES　Vol. 11　No. 2　p. 2535-2542　2019/01/16　Research paper (scientific journal)

  56. Freestanding graphene CVD growth on insulating substrate using ga catalyst

    Tomoki Tsuji, Kenta Arima, Kazuya Yamamura, Kentaro Kawai

    23rd International Conference on Miniaturized Systems for Chemistry and Life Sciences, MicroTAS 2019　p. 1194-1195　2019　Research paper (international conference proceedings)

    Publisher: Chemical and Biological Microsystems Society

  57. Nanopore Fabrication of Two-Dimensional Materials on SiO2 Membranes Using He Ion Microscopy

    Hayashi Takumi, Arima Kenta, Yamashita Naoki, Park Seongsu, Ma Zhipeng, Tabata Osamu, Kawai Kentaro

    IEEE TRANSACTIONS ON NANOTECHNOLOGY　Vol. 17　No. 4　p. 727-730　2018/07　Research paper (scientific journal)

  58. Investigation of anodic oxidation mechanism of 4H-SiC (0001) for electrochemical mechanical polishing

    Xu Yang, Rongyan Sun, Yuji Ohkubo, Kentaro Kawai, Kenta Arima, Katsuyoshi Endo, Kazuya Yamamura

    Electrochimica Acta　Vol. 271　p. 666-676　2018/05/01　Research paper (scientific journal)

  59. Electrochemical mechanical polishing of 4H-SiC (0001) with different grinding stones

    Xu Yang, Kentaro Kawai, Kenta Arima, Kazuya Yamamura

    ISAAT 2018 - 21st International Symposium on Advances in Abrasive Technology　2018　Research paper (international conference proceedings)

    Publisher: 21st International Symposium on Advances in Abrasive Technology, ISAAT 2018

  60. Preliminary study on figuring of reaction-sintered silicon carbide by plasma chemical vaporization machining

    Rongyan Sun, Yuji Ohkubo, Kentaro Kawai, Kenta Arima, Kazuya Yamamura

    Proceedings - 33rd ASPE Annual Meeting　p. 335-338　2018　Research paper (international conference proceedings)

    Publisher: American Society for Precision Engineering, ASPE

  61. Photoetching method that provides improved silicon-on-insulator layer thickness uniformity in a defined area

    Yuki Miyata, Yasunori Nakamukai, Cassia Tiemi Azevedo, Miho Morita, Junichi Uchikoshi, Kentaro Kawai, Kenta Arima, Mizuho Morita

    MICROELECTRONIC ENGINEERING　Vol. 180　p. 93-95　2017/08　Research paper (scientific journal)

  62. Impact of coated layers on initial SiC surfaces on graphene structures

    Ito Ryota, Hosoo Kohei, Kawai Kentaro, Sano Yasuhisa, Morita Mizuho, Arima Kenta

    Proceedings of JSPE Semestrial Meeting　Vol. 2017　p. 85-86　2017

    Publisher: The Japan Society for Precision Engineering

  63. Effect of metal particles on the rate of Si etching with N-fluoropyridinium salts

    Masaki Otani, Kentaro Kawai, Kentaro Tsukamoto, Takabumi Nagai, Kenji Adachi, Junichi Uchikoshi, Kenta Arima, Mizuho Morita

    JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 55　No. 10　2016/10　Research paper (scientific journal)

  64. Formation of Random Double Textures on Si Surfaces by Photoetching with N-fluoropyridinium Salt

    kumada tatsuya, Kentaro Kawai, Takabumi Nagai, Adachi Kenji, Kenta Arima, Mizuho Morita

    JSAP Annual Meetings Extended Abstracts　Vol. 2016.1　p. 3719-3719　2016/03/03

    Publisher: The Japan Society of Applied Physics

  65. Ambient-pressure XPS observations of structures and electronic properties of water-adsorbed ultrathin GeO2 on Ge

    Arima Kenta, Mori Daichi, Oka Hiroshi, Hosoi Takuji, Kawai Kentaro, Morita Mizuho, Watanabe Heiji, Liu Zhi, Crumlin Ethan J.

    Abstract of annual meeting of the Surface Science of Japan　Vol. 36　p. 405-405　2016

    Publisher: The Surface Science Society of Japan

  66. Formation of graphene with reduced pit density assisted by plasma oxidation at room temperature

    Hosoo Kohei, Saito Naoki, Imahuku Ryoto, Kawai Kentaro, Sano Yasuhisa, Morita Mizuho, Arima Kenta

    Proceedings of JSPE Semestrial Meeting　Vol. 2016　p. 183-184　2016

    Publisher: The Japan Society for Precision Engineering

  67. Synthesis of graphene-based catalysts and their characterizations by electrochemical measurements toward machining of semiconductor surfaces

    Sato Shinsuke, Mori Daichi, Nakade Kazuki, Saito Yusuke, Kawai Kentaro, Morita Mizuho, Arima Kenta

    Proceedings of JSPE Semestrial Meeting　Vol. 2016　p. 181-182　2016

    Publisher: The Japan Society for Precision Engineering

  68. Microfluidic valve array control system integrating a fluid demultiplexer circuit

    Kentaro Kawai, Kenta Arima, Mizuho Morita, Shuichi Shoji

    JOURNAL OF MICROMECHANICS AND MICROENGINEERING　Vol. 25　No. 6　2015/06　Research paper (scientific journal)

  69. Surface flattening of Ge using oxygen reduction reaction enhanced by catalysts in water

    Nakade Kazuki, Mori Daichi, Saitou Yusuke, Kawai Kentarou, Sano Yasuhisa, Yamauchi Kazuto, Morita Mizuho, Arima Kenta

    Proceedings of JSPE Semestrial Meeting　Vol. 2015　p. 297-298　2015

    Publisher: The Japan Society for Precision Engineering

  70. Formation of Pit-free Graphene Assisted by Plasma Oxidation of Silicon Carbide Surface

    Arima Kenta, Saito Naoki, Mori Daichi, Kawai Kentaro, Sano Yasuhisa, Morita Mizuho

    Proceedings of JSPE Semestrial Meeting　Vol. 2015　p. 617-618　2015

    Publisher: The Japan Society for Precision Engineering

  71. Flattening of Ge surfaces in water by catalytic activity of metals enhancing oxygen reduction reaction

    Arima Kenta, Kawase Tatsuya, Saito Yusuke, Kawai Kentaro, Sano Yasuhisa, Morita MIzuho, Yamauchi Kazuto

    Abstract of annual meeting of the Surface Science of Japan　Vol. 35　p. 58-58　2015

    Publisher: The Surface Science Society of Japan

  72. Texturing Low Reflecting Surface of Random Double Textures Using N-fluoropyridinium Salt

    Kumada Tatsuya, Kawai Kentaro, Otani Masaki, Hirano Toshinori, Nagai takabumi, Adachi Kenji, Arima Kenta, Morita mizuho

    JSAP Annual Meetings Extended Abstracts　Vol. 2014.2　p. 982-982　2014/09/01

    Publisher: The Japan Society of Applied Physics

  73. Enhancement of photoluminescence efficiency from GaN(0001) by surface treatments

    Azusa N. Hattori, Ken Hattori, Yuta Moriwaki, Aishi Yamamoto, Shun Sadakuni, Junji Murata, Kenta Arima, Yasuhisa Sano, Kazuto Yamauchi, Hiroshi Daimon, Katsuyoshi Endo

    JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 53　No. 2　2014/02　Research paper (scientific journal)

  74. N-フルオロピリジニウム塩を用いたパターニングレスSi陽極化成深堀加工

    中川 雄人, 川合 健太郎, 平野 利典, 大谷 真輝, 熊田 竜也, 永井 隆文, 足達 健二, 有馬 健太, 森田 瑞穂

    精密工学会学術講演会講演論文集　Vol. 2014S　p. 935-936　2014

    Publisher: 公益社団法人 精密工学会

  75. Si単結晶太陽電池用テクスチャのためのN-フルオロピリジニウム塩を用いた光エッチングによるランダム逆ピラミッドの形成

    熊田 竜也, 川合 健太郎, 大谷 真輝, 平野 利典, 永井 隆文, 足達 健二, 有馬 健太, 森田 瑞穂

    精密工学会学術講演会講演論文集　Vol. 2014S　p. 931-932　2014

    Publisher: 公益社団法人 精密工学会

  76. 純水中での溶存酸素を介した金属アシストエッチングによるGe表面のナノスケール加工

    有馬 健太, 川瀬 達也, 村 敦史, 川合 健太郎, 森田 瑞穂

    表面科学学術講演会要旨集　Vol. 34　p. 153-153　2014

    Publisher: 公益社団法人 日本表面科学会

  77. Absolute flatness measurements of silicon mirrors by a three-intersection method by near-infrared interferometry

    Junichi Uchikoshi, Yoshinori Hayashi, Noritaka Ajari, Kentaro Kawai, Kenta Arima, Mizuho Morita

    NANOSCALE RESEARCH LETTERS　Vol. 8　2013/06　Research paper (scientific journal)

  78. N-フルオロピリジニウム塩を用いた光エッチングによるシリコンのランダム逆ピラミッドの形成

    平野 利典, 打越 純一, 大谷 真輝, 永井 隆文, 足達 健二, 川合 健太郎, 有馬 健太, 森田 瑞穂

    応用物理学会学術講演会講演予稿集　Vol. 2013.1　p. 2599-2599　2013/03/11

    Publisher: 公益社団法人 応用物理学会

  79. 酸素還元触媒によるGe表面の純水エッチング:触媒材料の検討

    齋藤 雄介, 村 敦史, 川合 健太郎, 森田 瑞穂, 有馬 健太

    精密工学会学術講演会講演論文集　Vol. 2013　p. 353-354　2013

    Publisher: 公益社団法人 精密工学会

  80. 室温プラズマ酸化を援用したSiC表面上への低欠陥グラフェン成長

    齋藤 直樹, 今福 亮斗, 西川 央明, 佐野 泰久, 川合 健太郎, 森田 瑞穂, 有馬 健太

    精密工学会学術講演会講演論文集　Vol. 2013　p. 345-346　2013

    Publisher: 公益社団法人 精密工学会

  81. Planarization of SiC and GaN Wafers Using Polishing Technique Utilizing Catalyst Surface Reaction

    Yasuhisa Sano, Kenta Arima, Kazuto Yamauchi

    ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY　Vol. 2　No. 8　p. N3028-N3035　2013　Research paper (scientific journal)

  82. Characterization of Si etching with N-fluoropyridinium salt

    Kentaro Tsukamoto, Junichi Uchikoshi, Masaki Otani, Toshinori Hirano, Yutaka Ie, Takabumi Nagai, Kenji Adachi, Kentaro Kawai, Kenta Arima, Mizuho Morita

    CURRENT APPLIED PHYSICS　Vol. 12　p. S29-S32　2012/12　Research paper (scientific journal)

  83. Continuous generation of femtolitre droplets using multistage dividing microfluidic channel

    Kentaro Kawai, Masaru Fujii, Junichi Uchikoshi, Kenta Arima, Shuichi Shoji, Mizuho Morita

    CURRENT APPLIED PHYSICS　Vol. 12　p. S33-S37　2012/12　Research paper (scientific journal)

  84. Structural and chemical characteristics of atomically smooth GaN surfaces prepared by abrasive-free polishing with Pt catalyst

    Junji Murata, Shun Sadakuni, Takeshi Okamoto, Azusa N. Hattori, Keita Yagi, Yasuhisa Sano, Kenta Arima, Kazuto Yamauchi

    JOURNAL OF CRYSTAL GROWTH　Vol. 349　No. 1　p. 83-88　2012/06　Research paper (scientific journal)

  85. Improvement of Removal Rate in Abrasive-Free Planarization of 4H-SiC Substrates Using Catalytic Platinum and Hydrofluoric Acid

    Takeshi Okamoto, Yasuhisa Sano, Kazuma Tachibana, Bui Van Pho, Kenta Arima, Kouji Inagaki, Keita Yagi, Junji Murata, Shun Sadakuni, Hiroya Asano, Ai Isohashi, Kazuto Yamauchi

    JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 51　No. 4　2012/04　Research paper (scientific journal)

  86. Formation of Si surface texture by etching with N-fluoropyridinium salts

    Otani Masaki, Uchikoshi Junichi, Tsukamoto Kentaro, Hirano Toshinori, Nagai Takabumi, Adachi Kenji, Kawai Kentaro, Arima Kenta, Morita Mizuho

    Proceedings of JSPE Semestrial Meeting　Vol. 2012S　p. 47-48　2012

    Publisher: The Japan Society for Precision Engineering

  87. In situ XPS of Adsorbed Water/GeO2/Ge(100) Structures under Controlled Relative Humidity

    Arima Kenta, Mura Atsushi, Hideshima Iori, Hosoi Takuji, Watanabe Heiji, Liu Zhi

    Abstract of annual meeting of the Surface Science of Japan　Vol. 32　p. 75-75　2012

    Publisher: The Surface Science Society of Japan

  88. Increase of luminescent intensity from GaN(0001) induced by surface cleaning treatments

    Hattori Azusa, Endo Katsuyoshi, Hattori Ken, Moriwaki Yuta, Yamamoto Aishi, Arima Kenta, Sano Yasuhisa, Yamauchi Kazuto, Daimon Hiroshi

    Abstract of annual meeting of the Surface Science of Japan　Vol. 32　p. 72-72　2012

    Publisher: The Surface Science Society of Japan

  89. Metal-assisted Anisotropic Etching of Ge Surfaces Mediated by Dissolved Oxygen in Water

    Arima Kenta, Kawase Tatsuya, Mura Atsushi, Nishitani Keisuke, Kawai Yoshie, Kawai Kentaro, Uchikoshi Junichi, Morita Mizuho

    Abstract of annual meeting of the Surface Science of Japan　Vol. 32　p. 108-108　2012

    Publisher: The Surface Science Society of Japan

  90. 酸素還元触媒を用いた純水中でのGe表面のナノスケール加工

    河合 佳枝, 村 敦史, 岡本 武志, 川合 健太郎, 打越 純一, 佐野 泰久, 森田 瑞穂, 有馬 健太

    精密工学会学術講演会講演論文集　Vol. 2012　p. 707-708　2012

    Publisher: 公益社団法人 精密工学会

  91. 室温プラズマ酸化を援用したSiC上へのグラフェン低温形成

    齋藤 直樹, 西谷 恵介, 西川 央明, 佐野 泰久, 川合 健太郎, 打越 純一, 森田 瑞穂, 有馬 健太

    精密工学会学術講演会講演論文集　Vol. 2012　p. 703-704　2012

    Publisher: 公益社団法人 精密工学会

  92. N-フルオロピリジニウム塩を用いたエッチングによるSiのランダム逆ピラミッドの形成

    平野 利典, 打越 純一, 大谷 真輝, 塚本 健太郎, 永井 隆文, 足達 健二, 川合 健太郎, 有馬 健太, 森田 瑞穂

    精密工学会学術講演会講演論文集　Vol. 2012　p. 885-886　2012

    Publisher: 公益社団法人 精密工学会

  93. Atomically Smooth Gallium Nitride Surfaces Prepared by Chemical Etching with Platinum Catalyst in Water

    Junji Murata, Takeshi Okamoto, Shun Sadakuni, Azusa N. Hattori, Keita Yagi, Yasuhisa Sano, Kenta Arima, Kazuto Yamauchi

    JOURNAL OF THE ELECTROCHEMICAL SOCIETY　Vol. 159　No. 4　p. H417-H420　2012　Research paper (scientific journal)

  94. Single-nanometer focusing of hard x-rays by Kirkpatrick-Baez mirrors

    Kazuto Yamauchi, Hidekazu Mimura, Takashi Kimura, Hirokatsu Yumoto, Soichiro Handa, Satoshi Matsuyama, Kenta Arima, Yasuhisa Sano, Kazuya Yamamura, Koji Inagaki, Hiroki Nakamori, Jangwoo Kim, Kenji Tamasaku, Yoshinori Nishino, Makina Yabashi, Tetsuya Ishikawa

    JOURNAL OF PHYSICS-CONDENSED MATTER　Vol. 23　No. 39　2011/10　Research paper (scientific journal)

  95. N-フルオロピリジニウム塩を用いたシリコンの銅触媒エッチング

    塚本 健太郎, 打越 純一, 大谷 真輝, 永井 隆文, 足達 健二, 川合 健太郎, 有馬 健太, 森田 瑞穂

    応用物理学会学術講演会講演予稿集　Vol. 2011.2　p. 2266-2266　2011/08/16

    Publisher: 公益社団法人 応用物理学会

  96. Center of Excellence for Atomically Controlled Fabrication Technology

    Yuji Kuwahara, Akira Saito, Kenta Arima, Hiromasa Ohmi

    JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY　Vol. 11　No. 4　p. 2763-2776　2011/04

  97. Efficient Wet Etching of GaN (0001) Substrate with Subsurface Damage Layer

    Shun Sadakuni, Junji Murata, Keita Yagi, Yasuhisa Sano, Takeshi Okamoto, Arima Kenta, Azusa N. Hattori, Kazuto Yamauchi

    JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY　Vol. 11　No. 4　p. 2979-2982　2011/04　Research paper (scientific journal)

  98. Dependence of Process Characteristics on Atomic-Step Density in Catalyst-Referred Etching of 4H-SiC(0001) Surface

    Takeshi Okamoto, Yasuhisa Sano, Kazuma Tachibana, Kenta Arima, Azusa N. Hattori, Keita Yagi, Junji Murata, Shun Sadakuni, Kazuto Yamauchi

    JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY　Vol. 11　No. 4　p. 2928-2930　2011/04　Research paper (scientific journal)

  99. Improved Optical and Electrical Characteristics of Free-Standing GaN Substrates by Chemical Polishing Utilizing Photo-Electrochemical Method

    Junji Murata, Yuki Shirasawa, Yasuhisa Sano, Shun Sadakuni, Keita Yagi, Takeshi Okamoto, Azusa N. Hattori, Kenta Arima, Kazuto Yamauchi

    JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY　Vol. 11　No. 4　p. 2882-2885　2011/04　Research paper (scientific journal)

  100. Structure and Magnetic Properties of Mono- and Bi-Layer Graphene Films on Ultraprecision Figured 4H-SiC(0001) Surfaces

    Azusa N. Hattori, Takeshi Okamoto, Shun Sadakuni, Junji Murata, Hideo Oi, Kenta Arima, Yasuhisa Sano, Ken Hattori, Hiroshi Daimon, Katsuyoshi Endo, Kazuto Yamauchi

    JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY　Vol. 11　No. 4　p. 2897-2902　2011/04　Research paper (scientific journal)

  101. Formation of wide and atomically flat graphene layers on ultraprecision-figured 4H-SiC(0001) surfaces

    Azusa N. Hattori, Takeshi Okamoto, Shun Sadakuni, Junji Murata, Kenta Arima, Yasuhisa Sano, Ken Hattori, Hiroshi Daimon, Katsuyoshi Endo, Kazuto Yamauchi

    SURFACE SCIENCE　Vol. 605　No. 5-6　p. 597-605　2011/03　Research paper (scientific journal)

  102. Formation of three-dimensional shape in silicon surface by photo-etching with N-fluoropyridinium salts

    Otani Masaki, Uchikoshi Junichi, Tsukamoto Kentaro, Nagai Takabumi, Adachi Kenji, Kawai Kentaro, Arima Kenta, Morita Mizuho

    Proceedings of JSPE Semestrial Meeting　Vol. 2011S　p. 991-992　2011

    Publisher: The Japan Society for Precision Engineering

  103. Study of the formation of roughness on Ge(100) surface by residual metals impurities

    Mura Atsushi, Kawase Tatsuya, Nishitani Keisuke, Kawai Kentarou, Uchikoshi Junichi, Morita Mizuho, Arima Kenta

    Proceedings of JSPE Semestrial Meeting　Vol. 2011　p. 1010-1011　2011

    Publisher: The Japan Society for Precision Engineering

  104. Formation of high quality graphene on atomically flattened 4H-SiC(0001) surfaces

    Nishitani Keisuke, Sakane Hiroki, Yamaguchi Takamitsu, Okamoto Takeshi, Kawai Kentaro, Uchikoshi Junichi, Yamauchi Kazuto, Morita Miizuho, Arima Kenta

    Proceedings of JSPE Semestrial Meeting　Vol. 2011　p. 996-997　2011

    Publisher: The Japan Society for Precision Engineering

  105. 触媒基準エッチング法による4H-SiCの平坦化における加工速度の検討

    橘 一真, 佐野 泰久, 岡本 武志, 礒橋 藍, 有馬 健太, 稲垣 耕司, 八木 圭太, 定國 峻, 森川 良忠, 山内 和人

    精密工学会学術講演会講演論文集　Vol. 2011　p. 457-458　2011

    Publisher: 公益社団法人 精密工学会

  106. Precise alignment on three-dimensional shape fabrication in silicon surface by photo-etching with N-fluoropyridinium salts

    Otani Masaki, Uchikoshi Junichi, Tsukamoto Kentaro, Nagai Takabumi, Adachi Kenji, Kawai Kentaro, Arima Kenta, Morita Mizuho

    Proceedings of JSPE Semestrial Meeting　Vol. 2011　p. 391-392　2011

    Publisher: The Japan Society for Precision Engineering

  107. Influence of gallium additives on surface roughness for photoelectrochemical planarization of GaN

    Shun Sadakuni, Junji Murata, Keita Yagi, Yasuhisa Sano, Kenta Arima, Takeshi Okamoto, Kazuma Tachibana, Kazuto Yamauchi

    PHYSICA STATUS SOLIDI C: CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 8, NO 7-8　Vol. 8　No. 7-8　2011　Research paper (international conference proceedings)

  108. Photoetching of Silicon by N-Fluoropyridinium Salt

    Kentaro Tsukamoto, Junichi Uchikoshi, Shigeharu Goto, Tatsuya Kawase, Noritaka Ajari, Takabumi Nagai, Kenji Adachi, Kenta Arima, Mizuho Morita

    ELECTROCHEMICAL AND SOLID STATE LETTERS　Vol. 13　No. 11　p. D80-D82　2010　Research paper (scientific journal)

  109. Planarization of GaN(0001) Surface by Photo-Electrochemical Method with Solid Acidic or Basic Catalyst

    Junji Murata, Shun Sadakuni, Keita Yagi, Yasuhisa Sano, Takeshi Okamoto, Kenta Arima, Azusa N. Hattori, Hidekazu Mimura, Kazuto Yamauchi

    JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 48　No. 12　2009/12　Research paper (scientific journal)

  110. Metal-Insulator-Gap-Insulator-Semiconductor Structure for Sensing Devices

    Takaaki Hirokane, Hideaki Hashimoto, Daisuke Kanzaki, Shinichi Urabe, Kenta Arima, Junichi Uchikoshi, Mizuho Morita

    ANALYTICAL SCIENCES　Vol. 25　No. 1　p. 101-104　2009/01　Research paper (scientific journal)

  111. Absolute Line Profile Measurements of Silicon Plane Mirrors by Near-Infrared Interferometry

    Junichi Uchikoshi, Amane Tsuda, Noritaka Ajari, Taichirou Okamoto, Kenta Arima, Mizuho Morita

    JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 47　No. 12　p. 8978-8981　2008/12　Research paper (scientific journal)

  112. Characterization of Tunneling Current through Ultrathin Silicon Dioxide Films by Different-Metal Gates Method

    Takaaki Hirokane, Naoto Yoshii, Tatsuya Okazaki, Shinichi Urabe, Kazuo Nishimura, Satoru Morita, Kenta Arima, Junichi Uchikoshi, Mizuho Morita

    JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 47　No. 11　p. 8317-8320　2008/11　Research paper (scientific journal)

  113. Catalyst-referred etching of 4H-SiC substrate utilizing hydroxyl radicals generated from hydrogen peroxide molecules

    Keita Yagi, Junji Murata, Akihisa Kubota, Yasuhisa Sano, Hideyuki Hara, Takeshi Okamoto, Kenta Arima, Hidekazu Mimura, Kazuto Yamauchi

    SURFACE AND INTERFACE ANALYSIS　Vol. 40　No. 6-7　p. 998-1001　2008/06　Research paper (scientific journal)

  114. Sensing of lambda DNA solutions by metal-gap-semiconductor devices

    Takaaki Hirokane, Daisuke Kanzaki, Hideaki Hashimoto, Shinichi Urabe, Kenta Arima, Junichi Uchikoshi, Mizuho Morita

    SURFACE AND INTERFACE ANALYSIS　Vol. 40　No. 6-7　p. 1131-1133　2008/06　Research paper (scientific journal)

  115. Chemical planarization of GaN using hydroxyl radicals generated on a catalyst plate in H2O2 solution

    J. Murata, A. Kubota, K. Yagi, Y. Sano, H. Hara, K. Arima, T. Okamoto, H. Mimura, K. Yamauchi

    JOURNAL OF CRYSTAL GROWTH　Vol. 310　No. 7-9　p. 1637-1641　2008/04　Research paper (scientific journal)

  116. Characterization of patterned oxide buried in bonded silicon-on-insulator wafers by near-infrared scattering topography and microscopy

    Xing Wu, Junichi Uchikoshi, Takaaki Hirokane, Ryuta Yamada, Akihiro Takeuchi, Kenta Arima, Mizuho Morita

    JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 47　No. 4　p. 2511-2514　2008/04　Research paper (scientific journal)

  117. Defect-free planarization of 4H-SiC(0001) substrate using reference plate

    Keita Yagi, Junji Murata, Akihisa Kubota, Yasuhisa Sano, Hideyuki Hara, Kenta Arima, Takeshi Okamoto, Hidekazu Mimura, Kazuto Yamauchi

    JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 47　No. 1　p. 104-107　2008/01　Research paper (scientific journal)

  118. Characterization of pinhole in patterned oxide buried in bonded silicon-on-insulator wafers by near-infrared scattering topography and transmission microscopy

    Xing Wu, Junichi Uchikoshi, Takaaki Hirokane, Ryuta Yamada, Akihiro Takeuchi, Kenta Arima, Mizuho Morita

    JOURNAL OF THE ELECTROCHEMICAL SOCIETY　Vol. 155　No. 11　p. H864-H868　2008　Research paper (scientific journal)

  119. Very high carrier mobility for high-performance CMOS on a Si(110) surface

    Akinobu Teramoto, Tatsufumi Hamada, Masashi Yamamoto, Philippe Gaubert, Hiroshi Akahori, Keiichi Nii, Masaki Hirayama, Kenta Arima, Katsuyoshi Endo, Shigetoshi Sugawa, Tadahiro Ohmi

    IEEE TRANSACTIONS ON ELECTRON DEVICES　Vol. 54　No. 6　p. 1438-1445　2007/06　Research paper (scientific journal)

  120. Catalyst-referred etching of silicon

    Hideyuki Hara, Yasuhisa Sano, Kenta Arima, Keita Yagi, Junji Murata, Akihisa Kubota, Hidekazu Mimura, Kazuto Yamauchi

    SCIENCE AND TECHNOLOGY OF ADVANCED MATERIALS　Vol. 8　No. 3　p. 162-165　2007/04　Research paper (scientific journal)

  121. Photodetective characteristics of metal-oxide-semiconductor tunneling structure with aluminum grid gate

    Hideaki Hashimoto, Ryuta Yamada, Takaaki Hirokane, Kenta Arima, Junichi Uchikoshi, Mizuho Morita

    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS　Vol. 46　No. 4B　p. 2467-2470　2007/04　Research paper (scientific journal)

  122. Characterization of void in bonded silicon-on-insulator wafers by controlling coherence length of light source using near-infrared microscope

    Noritaka Ajari, Junichi Uchikoshi, Takaaki Hirokane, Kenta Arima, Mizuho Morita

    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS　Vol. 46　No. 4B　p. 1994-1996　2007/04　Research paper (scientific journal)

  123. Observation of Oxide-film Step with Very Small Height on Si Wafer Surface Using a Laser Scattering Method

    井上晴行, 片岡俊彦, 長尾祥浩, 押鐘寧, 中野元博, 越智保文, 有馬健太, 森田瑞穂

    精密工学会誌(CD-ROM)　Vol. 72　No. 11　p. 1363-1367　2006/11/05　Research paper (scientific journal)

    Publisher: The Japan Society for Precision Engineering

  124. Polishing characteristics of silicon carbide by plasma chemical vaporization machining

    Yasuhisa Sano, Masayo Watanabe, Kazuya Yamamura, Kazuto Yamauchi, Takeshi Ishida, Kenta Arima, Akihisa Kubota, Yuzo Mori

    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS　Vol. 45　No. 10B　p. 8277-8280　2006/10　Research paper (scientific journal)

  125. Novel abrasive-free planarization of 4H-SiC (0001) using catalyst

    Hideyuki Hara, Yasuhisa Sano, Hidekazu Mimura, Kenta Arima, Akihisa Kubota, Keita Yagi, Junji Murata, Kazuto Yamauch

    JOURNAL OF ELECTRONIC MATERIALS　Vol. 35　No. 8　p. L11-L14　2006/08

  126. Photo current through SnO2/SiC/p-Si(100) structures

    S Nishikawa, H Hashimoto, M Chikamoto, K Honikoshi, M Aoki, K Arima, J Uchikosi, M Morita

    THIN SOLID FILMS　Vol. 508　No. 1-2　p. 385-388　2006/06　Research paper (scientific journal)

  127. First-principles study on scanning tunneling microscopy images of different hydrogen-terminated Si(110) surfaces

    S Horie, K Arima, K Hirose, J Katoh, T Ono, K Endo

    PHYSICAL REVIEW B　Vol. 72　No. 11　2005/09　Research paper (scientific journal)

  128. Preparation of ultrasmooth and defect-free 4H-SiC(0001) surfaces by elastic emission machining

    A Kubota, H Mimura, K Inagaki, K Arima, Y Mori, K Yamauchi

    JOURNAL OF ELECTRONIC MATERIALS　Vol. 34　No. 4　p. 439-443　2005/04　Research paper (scientific journal)

  129. Flattening of Si(001) Surface by EEM (Elastic Emission Machining)-Atomic Structure Identification of Processed Surface-

    山内和人, 三村秀和, 久保田章亀, 有馬健太, 稲垣耕司, 遠藤勝義, 森勇蔵

    精密工学会誌　Vol. 70　No. 4　p. 547-551　2004/04　Research paper (scientific journal)

    Publisher: The Japan Society for Precision Engineering

  130. FTIR-ATR evaluation of organic contaminant cleaning methods for SiO2 surfaces

    A Shinozaki, K Arima, M Morita, Kojima, I, Y Azuma

    ANALYTICAL SCIENCES　Vol. 19　No. 11　p. 1557-1559　2003/11　Research paper (scientific journal)

  131. Atomic structure of Si(001)-c(4 x 4) formed by heating processes after wet cleaning and its first-principles study

    K Endo, T Ono, K Arima, Y Uesugi, K Hirose, Y Mori

    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS　Vol. 42　No. 7B　p. 4646-4649　2003/07　Research paper (scientific journal)

  132. Atomic image of hydrogen-terminated Si(001) surfaces after wet cleaning and its first-principles study

    K Endo, K Arima, K Hirose, T Kataoka, Y Mori

    JOURNAL OF APPLIED PHYSICS　Vol. 91　No. 7　p. 4065-4072　2002/04　Research paper (scientific journal)

  133. Atomic structures of hydrogen-terminated Si(001) surfaces after wet cleaning by scanning tunneling microscopy

    K Endo, K Arima, T Kataoka, Y Oshikane, H Inoue, Y Mori

    APPLIED PHYSICS LETTERS　Vol. 73　No. 13　p. 1853-1855　1998/09　Research paper (scientific journal)

  134. STM/STS and the first principles calculations on Al/Si(001)2 × 1

    K. Endo, K. Arima, T. Kataoka, K. Hirose, Y. Oshikane, H. Inoue, H. Kuramochi, T. Sato, Y. Mori

    Applied Physics A: Materials Science and Processing　Vol. 66　No. 1　p. S145-S148　1998　Research paper (scientific journal)

Misc. 94

  1. Selective Wet Etching of Semiconductor Materials by Novel Catalyst-assisted Modes

    Kenta Arima, Junhuan Li, Shiika Murase, Kouji Inagaki

    ECS Transactions　Vol. 114　No. 1　p. 17-26　2024/09/27　Research paper, summary (international conference)

    Publisher: The Electrochemical Society

  2. 大阪大学大学院工学研究科 ナノ表面界面工学領域の紹介

    有馬健太

    応用物理学会 薄膜・表面物理分科会 News Letter　No. 187　p. 2-6　2024/06　Article, review, commentary, editorial, etc. (other)

  3. 超精密な表面計測が拓く次世代ものづくり：ナノ表面界面工学の世界

    有馬健太

    TECHNO NET　No. 601　p. 4-5　2023/10　Article, review, commentary, editorial, etc. (other)

  4. Opening a New Laboratory Named Nano Surface and Interface Engineering Area

    Kenta ARIMA

    Manufacturing & Technology　Vol. 75　No. 3　p. 34-36　2023/07　Article, review, commentary, editorial, etc. (other)

  5. Selective Etching of Semiconductor Surfaces by Catalytic Activity of Nanocarbon

    Ryo MIKURINO, Ayumi OGASAWARA, Kentaro KAWAI, Kazuya YAMAMURA, Kenta ARIMA

    Vacuum and Surface Science　Vol. 64　No. 8　p. 352-357　2021/08/10　Article, review, commentary, editorial, etc. (scientific journal)

    Publisher: Surface Science Society Japan

  6. Selective Etching of Semiconductor Surfaces Assisted by Nanocarbon Catalysts and Its Application

    Kenta Arima

    Chemical Industry　Vol. 72　No. 2　p. 77-83　2021/02　Article, review, commentary, editorial, etc. (trade magazine, newspaper, online media)

  7. New Era of Our Academic Society Opened by Annual Meeting in Kansai

    ARIMA Kenta

    Vacuum and Surface Science　Vol. 62　No. 8　p. 469-469　2019/08/10　Article, review, commentary, editorial, etc. (scientific journal)

  8. Water-Adsorbed Ultrathin GeO2/Ge and SiO2/Si Structures Studied In Situ by Near-Ambient-Pressure X-ray Photoelectron Spectroscopy

    ARIMA Kenta

    Journal of The Surface Science Society of Japan　Vol. 38　No. 7　p. 330-335　2017/07

    Publisher: The Surface Science Society of Japan

  9. Reactivity of water vapor with ultrathin GeO2/Ge and SiO2/Si structures investigated by near-ambient-pressure X-ray photoelectron spectroscopy

    K. Arima, T. Hosoi, H. Watanabe, E. J. Crumlin

    ECS Transactions　Vol. 80　p. 131-140　2017/01/01

  10. Formation of etch pits on germanium surfaces loaded with reduced graphene oxide in water

    K. Nakade, T. Hirano, S. Li, Y. Saito, D. Mori, M. Morita, K. Kawai, K. Arima

    ECS Transactions　Vol. 77　No. 4　p. 127-133　2017

    Publisher: Electrochemical Society Inc.

  11. Pit Formation, Patterning and Flattening of Ge Surfaces in O2-Containing Water by Metal-Assisted Chemical Etching

    T. Kawase, A. Mura, Y. Saito, T. Okamoto, K. Kawai, Y. Sano, K. Yamauchi, M. Morita, K. Arima

    PITS & PORES 7: NANOMATERIALS - FABRICATION PROCESSES, PROPERTIES, AND APPLICATIONS　Vol. 75　No. 1　p. 107-112　2016

  12. Tips for cleaning techniques: Focusing on wet cleaning of Si surfaces

    ARIMA Kenta

    OYO BUTURI　Vol. 84　No. 11　p. 1009-1012　2015/11

    Publisher: 応用物理学会

  13. Fundamental Properties of Metal-Assisted Chemical Etching of Ge Surfaces Mediated by Dissolved O2 Molecules in Water

    ARIMA Kenta, KAWAI Kentaro, MORITA Mizuho

    Journal of The Surface Science Society of Japan　Vol. 36　No. 7　p. 369-374　2015/07

    Publisher: The Surface Science Society of Japan

  14. Observation of adsorbed water on ultrathin GeO2/Ge(100) by ambient-pressure x-ray photoelectron spectroscopy (AP-XPS)

    Kenta Arima

    Journal of the Vacuum Society of Japan　Vol. 58　No. 1　p. 20-26　2015　Book review, literature introduction, etc.

    Publisher: Vacuum Society of Japan

  15. Gravure & Interview

    TSUTSUMI Kenichi, Interviewer, ARIMA Kenta

    Journal of the Japan Society for Precision Engineering　Vol. 80　No. 5　p. 425-428　2014/05

    Publisher: 精密工学会 ; 1986-

  16. Atomic-scale observations of semiconductor surfaces after ultra-precision machining

    Kenta Arima

    Seimitsu Kogaku Kaishi/Journal of the Japan Society for Precision Engineering　Vol. 80　No. 5　p. 452-456　2014/05

  17. Behaviors of Carbon Atoms during Plasma Oxidation of 4H-SiC(0001) Surfaces near Room Temperature

    N. Saito, D. Mori, A. Imafuku, K. Kawai, Y. Sano, M. Morita, K. Arima

    ECS Transactions　Vol. 64　No. 17　p. 23-28　2014　Article, review, commentary, editorial, etc. (international conference proceedings)

  18. Ambient-Pressure XPS Study of GeO2/Ge(100) and SiO2/Si(100) at Controlled Relative Humidity

    K. Arima, Y. Kawai, Y. Minoura, Y. Saito, D. Mori, H. Oka, K. Kawai, T. Hosoi, Z. Liu, H. Watanabe, M. Morita

    ECS Transactions　Vol. 64　No. 8　p. 77-82　2014　Article, review, commentary, editorial, etc. (international conference proceedings)

  19. Gravure & Interview

    Yasuto TATSUTA, In, viewer, Kenta ARIMA, Kiwamu ASHIDA

    Journal of the Japan Society for Precision Engineering　Vol. 79　No. 1　p. 3-6　2013/01

    Publisher: The Japan Society for Precision Engineering

  20. In situ Observation of Deliquesced Droplets of Alkali Halide Nanocrystals: Investigation of Ion Segregation in Droplets for Environmental Science

    ARIMA Kenta, BLUHM Hendrik, SALMERON Miquel

    Journal of The Surface Science Society of Japan　Vol. 32　No. 6　p. 368-373　2011/06

  21. Formation of Pyramidal Etch Pits Induced by Metallic Particles on Ge(100) Surfaces in Water

    Kenta Arima, Tatsuya Kawase, Keisuke Nishitani, Atsushi Mura, Kentaro Kawai, Junichi Uchikoshi, Mizuho Morita

    SEMICONDUCTOR CLEANING SCIENCE AND TECHNOLOGY 12 (SCST 12)　Vol. 41　No. 5　p. 171-178　2011

  22. Graphene Formation on 4H-SiC(0001) Surface Flattened by Catalyst-Assisted Chemical Etching in HF Solution

    Keisuke Nishitani, Hiroki Sakane, Azusa N. Hattori, Takeshi Okamoto, Kentaro Kawai, Junichi Uchikoshi, Yasuhisa Sano, Kazuto Yamauchi, Mizuho Morita, Kenta Arima

    STATE-OF-THE-ART PROGRAM ON COMPOUND SEMICONDUCTORS 53 (SOTAPOCS 53)　Vol. 41　No. 6　p. 241-248　2011

  23. Atomic-scale characterization of HF-treated 4H-SiC(0001)l×l surfaces by scanning tunneling microscopy

    Kenta Arima, Hideyuki Hara, Yasuhisa Sano, Keita Yagi, Ryota Okamoto, Junji Murata, Hidekazu Mimura, Kazuto Yamauchi

    Materials Research Society Symposium Proceedings　Vol. 996　p. 157-162　2007/12/01

  24. Nano-scale characterization of surface defects on CMP-finished Si wafers by scanning probe microscopy combined with laser light scattering

    Kenta Arima, Takushi Shigetoshi, Haruyuki Inoue, Tsukasa Kawashima, Takaaki Hirokane, Toshihiko Kataoka, Mizuho Morita

    ADVANCES AND CHALLENGES IN CHEMICAL MECHANICAL PLANARIZATION　Vol. 991　p. 227-232　2007

  25. プラズマ援用研磨法の開発(第25報)-RS-SiC材のSiC成分とSi成分の酸化レートの評価-

    陶通, 孫栄硯, 川合健太郎, 有馬健太, 山村和也

    精密工学会大会学術講演会講演論文集　Vol. 2022　2022

  26. プラズマ援用研磨法の開発(第24報)-CF4プラズマ照射前後におけるAlN基板とダイヤモンド砥粒との吸着力の変化-

    孫栄硯, 陶通, 川合健太郎, 有馬健太, 山村和也

    精密工学会大会学術講演会講演論文集　Vol. 2022　2022

  27. プラズマ援用研磨による多結晶ダイヤモンド基板の高能率ダメージフリー 平坦・平滑化に関する研究(第1報)

    杉本健太郎, 孫栄硯, 川合健太郎, 有馬健太, 山村和也

    砥粒加工学会学術講演会講演論文集(CD-ROM)　Vol. 2022　2022

  28. Si表面の溝底部に埋め込んだ金属原子からの光電子検出~光電子検出量の脱出角依存性の検討~

    東知樹, 孫栄硯, 川合健太郎, 山村和也, 有馬健太

    精密工学会関西地方定期学術講演会講演論文集　Vol. 2022　2022

  29. プラズマ援用研磨による単結晶ダイヤモンド基板の高能率ダメージフリー加工-研磨レートおよび表面性状の研磨圧力依存性および摺動速度依存性に関する検討-

    杉本健太郎, 劉念, 吉鷹直也, 孫栄硯, 川合健太郎, 有馬健太, 山村和也

    精密工学会関西地方定期学術講演会講演論文集　Vol. 2022　2022

  30. 第一原理計算を用いたナノグラフエン上の特異な超構造電子状態の解析

    李君寰, 稲垣耕司, 川合健太郎, 孫栄硯, 山村和也, 有馬健太

    精密工学会関西地方定期学術講演会講演論文集　Vol. 2022　2022

  31. プラズマ援用研磨による多結晶ダイヤモンド基板の高能率ダメージフリー平坦・平滑化に関する研究(第1報)

    杉本健太郎, 孫栄硯, 川合健太郎, 有馬健太, 山村和也

    精密工学会大会学術講演会講演論文集　Vol. 2022　2022

  32. サブ分子層の吸着水がGeO2/Ge界面の電気特性に与える影響の超精密計測

    佐野修斗, 和田陽平, 孫栄硯, 川合健太郎, 山村和也, 有馬健太

    精密工学会関西地方定期学術講演会講演論文集　Vol. 2022　2022

  33. Si表面の溝底部に埋め込んだ金属原子からの光電子検出~光電子検出量の脱出角依存性の検討~

    東知樹, 孫栄硯, 山村和也, 有馬健太

    精密工学会大会学術講演会講演論文集　Vol. 2022　2022

  34. プラズマ援用研磨法の開発(第21報)-ビトリファイドボンド砥石を用いたドレスフリー研磨法の開発-

    孫栄硯, 川合健太郎, 有馬健太, 山村和也, 永橋潤司, 野副厚訓

    精密工学会大会学術講演会講演論文集　Vol. 2021　2021

  35. 減圧プラズマフッ化における焼結AlN基板のフッ化レートの評価

    孫栄硯, 陶通, 川合健太郎, 有馬健太, 山村和也

    精密工学会関西地方定期学術講演会講演論文集　Vol. 2021　2021

  36. 減圧プラズマ酸化における反応焼結SiCの酸化特性

    陶通, 孫栄硯, 川合健太郎, 有馬健太, 山村和也

    精密工学会関西地方定期学術講演会講演論文集　Vol. 2021　2021

  37. プラズマCVM加工におけるガス組成と最適加工ギャップの関係

    北出隼人, 孫栄硯, 川合健太郎, 有馬健太, 山村和也

    精密工学会関西地方定期学術講演会講演論文集　Vol. 2021　2021

  38. 窒化アルミニウムセラミックス材のプラズマ援用研磨に関する研究-異なる粒径のビトリファイドボンドダイヤモンド砥石を用いたAlN基板の研磨特性-

    陶通, 孫栄硯, 川合健太郎, 有馬健太, 山村和也

    砥粒加工学会学術講演会講演論文集(CD-ROM)　Vol. 2021　2021

  39. プラズマ援用研磨法の開発(第22報)-フッ素系ガスを用いたプラズマ援用研磨における砥石成分の付着抑制-

    孫栄硯, 陶通, 川合健太郎, 有馬健太, 山村和也

    精密工学会大会学術講演会講演論文集　Vol. 2021　2021

  40. マイクロ波プラズマジェット型プラズマCVMにおける加工痕形状の考察

    北出隼人, 孫栄硯, 川合健太郎, 有馬健太, 山村和也

    精密工学会大会学術講演会講演論文集　Vol. 2021　2021

  41. プラズマ援用研磨法の開発(第23報)-AlN基板の研磨における砥粒材質と研磨特性の相関-

    陶通, 孫栄硯, 川合健太郎, 有馬健太, 山村和也

    精密工学会大会学術講演会講演論文集　Vol. 2021　2021

  42. プラズマ援用研磨法の開発(第19報)-AlN基板の研磨特性の評価-

    孫栄硯, 川合健太郎, 有馬健太, 山村和也

    精密工学会大会学術講演会講演論文集　Vol. 2020　2020

  43. プラズマ援用研磨法の開発(第20報)-焼結AlN基板の脱粒フリー研磨-

    孫栄硯, 川合健太郎, 有馬健太, 山村和也

    精密工学会大会学術講演会講演論文集　Vol. 2020　2020

  44. プラズマ援用研磨法の開発(第18報)-フッ素系プラズマの照射によるAlN基板の表面改質効果の評価-

    孫栄硯, 川合健太郎, 有馬健太, 山村和也

    精密工学会大会学術講演会講演論文集　Vol. 2019　2019

  45. プラズマCVMによる多成分材料の高精度加工に関する研究(第3報)-反応焼結SiC材の加工における反応生成堆積物の影響-

    孫栄硯, 川合健太郎, 有馬健太, 山村和也, 大久保雄司

    精密工学会関西地方定期学術講演会講演論文集　Vol. 2019　2019

  46. プラズマCVMによる水晶ウエハの加工に関する研究-エタノール添加によるCF4含有大気圧Arプラズマの安定化-

    孫栄硯, 川合健太郎, 有馬健太, 山村和也, 渡辺啓一郎, 宮崎史朗, 深野徹, 北田勝信

    精密工学会関西地方定期学術講演会講演論文集　Vol. 2018　2018

  47. プラズマCVMによる多成分材料の高精度加工に関する研究(第2報)-反応焼結SiC材に対する非球面形状の創成-

    孫栄硯, 川合健太郎, 有馬健太, 山村和也, 大久保雄司

    精密工学会大会学術講演会講演論文集　Vol. 2018　2018

  48. Development of catalyst-referred chemical etching

    Vol. 61　No. 8　p. 426-429　2017/08

    Publisher: 砥粒加工学会

  49. ウェットエッチングによる原子スケール平坦化 －触媒表面基準エッチング法の開発－

    山内和人, 佐野泰久, 有馬健太

    応用物理　Vol. 82　No. 5　p. 403-406　2013/05

  50. Abrasive-Free Polishing of SiC Wafer Utilizing Catalyst Surface Reaction

    Y. Sano, K. Arima, K. Yamauchi

    GALLIUM NITRIDE AND SILICON CARBIDE POWER TECHNOLOGIES 3　Vol. 58　No. 4　p. 447-453　2013

  51. Smoothing of single crystalline SiC and GaN by catalyst referred etching

    Kazuto Yamauchi, Yasuhisa Sano, Kenta Arima

    Seimitsu Kogaku Kaishi/Journal of the Japan Society for Precision Engineering　Vol. 78　No. 11　p. 947-951　2012/11

    Publisher: The Japan Society for Precision Engineering

  52. Smoothing of Single Crystalline SiC, GaN and ZnO by Catalyst Referred Etching

    YAMAUCHI Kazuto, SANO Yasuhisa, ARIMA Kenta

    Journal of The Surface Science Society of Japan　Vol. 33　No. 6　p. 334-338　2012/06

  53. 触媒表面基準エッチングによる単結晶SiC、GaN表面の平滑化 (特集 先端部品のための高付価値研磨・切断加工技術)

    山内 和人, 佐野 泰久, 有馬 健太

    機械技術　Vol. 60　No. 5　p. 37-41　2012/05

    Publisher: 日刊工業出版プロダクション

  54. 触媒表面を基準面とする化学研磨法の開発

    有馬 健太, 山内 和人, 佐野 泰久, ヤマウチ カズト, サノ ヤスヒサ, アリマ ケンタ

    大阪大学低温センターだより　Vol. 150　p. 22-27　2010/04

    Publisher: 大阪大学低温センター

  55. Fabrication Technology for Large-Scale Atomically Flat Surface

    Yasuhisa Sano, Hideyuki Hara, Kenta Arima, Kazuto Yamauchi

    JOURNAL OF JAPANESE SOCIETY OF TRIBOLOGISTS　Vol. 55　No. 3　p. 148-153　2010

  56. Electroluminescence in Metal-Oxide-Semiconductor Tunnel Diodes with a Silicon Nano-layer

    Mizuho Morita, Kei Matsumura, Ryuta Yamada, Junichi Uchikoshi, Kenta Arima

    NANOSCALE LUMINESCENT MATERIALS　Vol. 28　No. 3　p. 279-284　2010

  57. 触媒基準エッチング法(CAtalyst Referred Ething: CARE)の開発--SiC, GaN基板加工への応用 (特集 グリーンエネルギー時代を支える先進加工技術とその課題)

    山内 和人, 佐野 泰久, 有馬 健太

    機械と工具　Vol. 53　No. 8　p. 20-24　2009/08

    Publisher: 工業調査会

  58. Catalyst-referred etching

    Hara Hideyuki, Sano Yasuhisa, Arima Kenta, Yamauchi Kazuto

    OYO BUTURI　Vol. 77　No. 2　p. 168-171　2008/02　Article, review, commentary, editorial, etc. (scientific journal)

  59. Scanning Surface Hall Potentiometry on Semiconductor Wafers

    HIDAKA Yuji, MARUYAMA Daiki, UCHIKOSHI Junichi, MORITA Mizuho, ARIMA Kenta

    Vol. 2007　p. 1024-1025　2007/09/19

  60. Electrical detection of damage of extended λDNA molecules by ultraviolet radiation Extended Abstracts of International 21st Century COE Symposium on Atomistic Fabrication Technology

    Hanada, T, K. Hashimoto, Y. Ochi, T. Hirokane, S. Kajiyama, S. Uchiyama, K. Fukui, K. Arima, J. Uchikoshi, M. Morita

    Extended Abstracts of International 21st Century COE Symposium on Atomistic Fabrication Technology　p. 151-152　2007

  61. Polishing characteristics of 4H-SiC Si-face and C-face by plasma chemical vaporization machining

    Yasuhisa Sano, Masayo Watanabe, Kazuya Yamamura, Kazuto Yamauchi, Takeshi Ishida, Kenta Arima, Akihisa Kubota, Yuzo Mori

    SILICON CARBIDE AND RELATED MATERIALS 2006　Vol. 556-557　p. 757-+　2007

  62. Damage-free planarization of 4H-SiC(0001) by catalyst-referred etching

    Hideyuki Hara, Yasuhisa Sano, Hidekazu Mimura, Kenta Arima, Akihisa Kubota, Keita Yagi, Junji Murata, Kazuto Yamauchi

    SILICON CARBIDE AND RELATED MATERIALS 2006　Vol. 556-557　p. 749-+　2007

  63. Characterization of pinhole in patterned oxide buried in bonded silicon-on-insulator wafers by near-infrared scattering topography and microscopy

    Xing Wu, Junichi Uchikoshi, Takaaki Hirokane, Ryuta Yamada, Kenta Arima, Mizuho Morita

    ECS Transactions　Vol. 11　No. 3　p. 173-182　2007

  64. Profile measurements of microscratches remaining on polished Si(001) wafers

    Takushi Shigetoshi, Haruyuki Inoue, Tsukasa Kawashima, Takaaki Hirokane, Toshihiko Kataoka, Mizuho Morita, Kenta Arima

    ECS Transactions　Vol. 3　No. 41　p. 65-71　2007

  65. Photodetective Characteristics of Metal-Oxide-Semiconductor Tunneling Structure with Aluminum Grid Gate

    HASHIMOTO Hideaki, YAMADA Ryuta, ARIMA Kenta, UCHIKOSHI Junichi, MORITA Mizuho

    Vol. 2006　p. 860-861　2006/09/13

  66. Catalyst-Referred Etching of GaN

    Murata Junji, Kubota Akihisa, Yagi Keita, Sano Yasuhisa, Hara Hideyuki, Arima Kenta, Mimura Hidekazu, Yamauchi Kazuto

    Proceedings of JSPE Semestrial Meeting　Vol. 2006　No. 0　p. 533-534　2006

    Publisher: The Japan Society for Precision Engineering

  67. Atomic–scale analysis of 4 H–SiC (0001) surface after planarization process

    Ishida Takeshi, Arima Kenta, Hara Hideyuki, Yamamura Kazuya, Yamauchi Kazuto, Endo Katsuyoshi

    Proceedings of JSPE Semestrial Meeting　Vol. 2006　No. 0　p. 1115-1116　2006

    Publisher: The Japan Society for Precision Engineering

  68. Atomic-scale analysis of 4 H-SiC (0001) surface after wet-chemical preperations.

    Okamoto Ryota, Arima Kenta, Sano Yasuhisa, Hara Hideyuki, Ishida Takeshi, Yagi Keita, Yamauchi Kazuto, Endo Katsuyoshi

    Proceedings of JSPE Semestrial Meeting　Vol. 2006　No. 0　p. 539-540　2006

    Publisher: The Japan Society for Precision Engineering

  69. Photodetection characteristics of SnO2-ultrathin SiO2-Si structures

    Motonori Chikamoto, Hideaki Hashimoto, Kosuke Horikoshi, Akihito Shinozaki, Satoru Morita, Kenta Arima, Junichi Uchikoshi, Mizuho Morita

    ECS Transactions　Vol. 1　p. 97-102　2005/12

  70. Development of Nanao-Gap Device for Biosensor

    MORITA Satoru, HIROKANE Takaaki, TAKEGAWA Tatsuya, URABE Shinichi, ARIMA Kenta, UCHIKOSHI Junichi, MORITA Mizuho

    Vol. 2005　p. 828-829　2005/09/13

  71. Photodetector Characteristics of Metal-Oxide-Semiconductor Tunneling Structures with Transparent Conductive Tin Oxide Gate

    CHIKAMOTO Motonori, HASHIMOTO Hideaki, HORIKOSHI Kosuke, SHINOZAKI Akihito, MORITA Satoru, ARIMA Kenta, UCHIKOSHI Junichi, MORITA Mizuho

    Vol. 2005　p. 734-735　2005/09/13

  72. Surface Hall Potentiometry to Characterize Functional Semiconductor Films

    ARIMA Kenta, HIWA Kenji, NAKAOKA Ryoji, MORITA Mizuho

    Vol. 2005　p. 378-379　2005/09/13

  73. Investigation of machining mechanism in Elastic Emission Machining by STM

    Katoh Jun, Kubota Akihisa, Arima Kenta, Yamamura Kazuya, Mori Yuzo, Yamauchi Kazuto, Endo Katsuyoshi

    Proceedings of JSPE Semestrial Meeting　Vol. 2005　No. 0　p. 779-780　2005

    Publisher: The Japan Society for Precision Engineering

  74. Nano-Gap Device for Liquid Sensing

    MORITA Satoru, TAKEGAWA Tatsuya, HIROKANE Takaaki, URABE Shinichi, ARIMA Kenta, UCHIKOSHI Junichi, MORITA Mizuho

    Vol. 2004　p. 704-705　2004/09/15

  75. STM observations of Si(011) and Si(111) surfaces finished by ultra-precision machining

    Katoh Jun, Kubota Akihisa, Arima Kenta, Yamamura Kazuya, Yamauchi Kazuto, Endo Katsuyoshi, Mori Yuzo

    Proceedings of JSPE Semestrial Meeting　Vol. 2004　No. 0　p. 384-384　2004

    Publisher: The Japan Society for Precision Engineering

  76. Flattening of Si (001) Surface by EEM (Elastic Emission Machining):—Atomic Structure Identification of Processed Surface—

    YAMAUCHI Kazuto, MIMURA Hidekazu, KUBOTA Akihisa, ARIMA Kenta, INAGAKI Kouji, ENDO Katsuyoshi, MORI Yuzo

    Journal of the Japan Society for Precision Engineering, Contributed Papers　Vol. 70　No. 4　p. 547-551　2004

    Publisher: The Japan Society for Precision Engineering

  77. Fabrication of the processed surface in extensive spacial wavelength zone by elastic emission machining (EEM)

    Mori Yuzo, Yamauchi Kazuto, Mimura Hidekazu, Kubota Akihisa, Inagaki Kouji, Arima Kenta, Endo Katsuyosi

    Proceedings of JSPE Semestrial Meeting　Vol. 2003　No. 0　p. 411-411　2003

    Publisher: The Japan Society for Precision Engineering

  78. Surface Profile Correction in Wide Spatial Wavelengths Range by Numerically Controlled EEM (Elastic Emission Machining)

    Mori Yuzo, Yamauchi Kazuto, Mimura Hidekazu, Kubota Akihisa, Endo Katsuyosi, Arima Kenta, Inagaki Kouji

    Proceedings of JSPE Semestrial Meeting　Vol. 2003　No. 0　p. 387-387　2003

    Publisher: The Japan Society for Precision Engineering

  79. 走査型トンネル顕微鏡による水素化アモルファスシリコン表面の原子像観察

    有馬 健太, 池田 学, 垣内 弘章, 遠藤 勝義, 森田 瑞穂, 森 勇蔵

    精密工学会大会学術講演会講演論文集　Vol. 2002　No. 2　p. 147-147　2002/10/01

  80. モノメチルシラン(SiH_3CH_3)を用いた熱CVDによるシリコンカーバイド膜の作製

    青木 稔, 吉井 直人, 有馬 健太, 森田 瑞穂

    精密工学会大会学術講演会講演論文集　Vol. 2002　No. 2　p. 372-372　2002/10/01

  81. 超清浄EEM(Elastic Emission Machining)システムに関する研究 : 最適加工条件の探索

    森 勇藏, 山内 和人, 三村 秀和, 有馬 健太, 稲垣 耕司, 久保田 章亀, 新林 洋介

    精密工学会大会学術講演会講演論文集　Vol. 2002　No. 2　p. 460-460　2002/10/01

  82. 超清浄EEM (Elastic Emission Machining)加工システムの開発:加工表面の原子レベルでの評価

    森 勇蔵, 山内 和人, 三村 秀和, 有馬 健太, 稲垣 耕司, 久保田 章亀, 新林 洋介

    精密工学会大会学術講演会講演論文集　Vol. 2002　No. 1　p. 606-606　2002/03/01

  83. SMTによる水素終端化Si(001)表面の昇温過程の観察

    遠藤 勝義, 大野 広基, 上杉 雄二, 有馬 健太, 森 勇蔵

    精密工学会大会学術講演会講演論文集　Vol. 2002　No. 1　p. 43-43　2002/03/01

  84. 走査型トンネル顕微鏡による水素化アモルファスシリコン表面の構造解析

    有馬 健太, 池田 学, 垣内 弘章, 遠藤 勝義, 森田 瑞穂, 森 勇蔵

    精密工学会大会学術講演会講演論文集　Vol. 2002　No. 1　p. 44-44　2002/03/01

  85. STMによる湿式洗浄Si(110)表面の昇温過程の観察

    遠藤 勝義, 大野 広基, 上杉 雄二, 池上 忠明, 有馬 健太, 森 勇蔵

    精密工学会大会学術講演会講演論文集　Vol. 2001　No. 2　p. 286-286　2001/09/01

  86. 走査型トンネル顕微鏡による水素化アモルファスシリコン表面の構造解析

    有馬 健太, 後藤 由光, 垣内 弘章, 遠藤 勝義, 森田 瑞穂, 森 勇蔵

    精密工学会大会学術講演会講演論文集　Vol. 2001　No. 2　p. 287-287　2001/09/01

  87. STM/STS observations and first-principles simulations of metal adsorbed Si(001) surfaces

    Katsuyoshi Endo, Kenta Arima, Toshihiko Kataoka, Yasushi Oshikane, Haruyuki Inoue, Kenji Koba, Kikuji Hirose, Yuzo Mori

    Technology Reports of the Osaka University　Vol. 50　p. 41-47　2000/04

  88. STMによる溶液処理水素終端化Si(001)表面の原子構造観察

    有馬 健太, 遠藤 勝義, 片岡 俊彦, 押鐘 寧, 井上 晴行, 木庭 謙二, 中原 裕喜, 森 勇蔵

    精密工学会大会学術講演会講演論文集　Vol. 1999　No. 2　p. 659-659　1999/09/01

  89. STMによる溶液処理水素終端化Si(001)表面の観察

    有馬 健太, 遠藤 勝義, 片岡 俊彦, 押鐘 寧, 井上 晴行, 木庭 謙二, 森 勇蔵

    精密工学会大会学術講演会講演論文集　Vol. 1999　No. 1　p. 503-503　1999/03/05

  90. STMによる水素終端化Si(001)ウェーハ表面の観察

    有馬 健太, 遠藤 勝義, 片岡 俊彦, 押鐘 寧, 井上 晴行, 木庭 謙二, 森 勇蔵

    精密工学会大会学術講演会講演論文集　Vol. 1998　No. 2　p. 420-420　1998/09/01

  91. STM/STSによるSiウェーハ表面の金属汚染物の極微量元素分析

    有馬 健太, 遠藤 勝義, 片岡 俊彦, 稲垣 耕司, 押鐘 寧, 井上 晴行, 森 勇蔵, 後藤 英和

    精密工学会大会学術講演会講演論文集　Vol. 1998　No. 1　p. 672-672　1998/03/05

  92. STM/STSによる金属吸着Si(001)表面の観察

    遠藤 勝彦, 片岡 俊彦, 広瀬 喜久治, 森 勇藏, 押鐘 寧, 井上 晴行, 有馬 健太, 多田羅 佳孝, 大和 大周

    精密工学会大会学術講演会講演論文集　Vol. 1997　No. 2　p. 271-271　1997/10/01

  93. STM/STSによるSiウェーハ表面の金属原子の観察

    遠藤 勝義, 片岡 俊彦, 森 勇蔵, 稲垣 耕司, 押鐘 寧, 井上 晴行, 有馬 健太, 多田羅 佳孝, 大和 正和

    精密工学会大会学術講演会講演論文集　Vol. 1997　No. 1　p. 377-378　1997/03/01

  94. STM/STSによるSiウェーハ表面の金属汚染物の極微量元素分析

    遠藤 勝義, 片岡 俊彦, 森 勇蔵, 稲垣 耕司, 押 鐘寧, 井上 晴行, 有馬 健太, 増田 裕一, 多田羅 佳孝

    精密工学会大会学術講演会講演論文集　Vol. 1996　No. 1　p. 967-968　1996/03/01

Publications 8

  1. エッチングの高度化と３次元構造の作製技術

    田中 浩 他25名

    S&T出版（株）　2025/03/31　Scholarly book

    ISBN: 9784911146095

  2. 先端半導体製造プロセスの最新動向と微細化技術

    諏訪部 仁 他56名

    （株）技術情報協会　2023/09/29

    ISBN: 9784861049828

  3. 半導体製造プロセスを支える洗浄・クリーン化・汚染制御技術

    羽深等, 清家善之, 白水好美, 有馬健太, カチョーンルンルアン パナート, 岩本花子, 前田主悦, 山崎克弘, 向井義雄, 長谷川浩史, 松井淳, 金洪杰

    サイエンス＆テクノロジー（株）　2022/11/29

    ISBN: 9784864282949

  4. 半導体製造におけるウェット／ドライエッチング技術

    礒部 晶, 服部 毅, 大山 聡, 式田 光宏, 河合 晃, 堀 勝, 中野 博彦, 浜口 智志, 豊田 紀章, 唐橋 一浩, 江利口 浩二, 寒川 誠二, 篠田 和典, 佐藤 威友, 有馬 健太

    （株）R&D支援センター　2022/10/31　Scholarly book

    ISBN: 9784905507611

  5. 2020版 薄膜作製応用ハンドブック

    権田, 俊一, 酒井, 忠司, 田畑, 仁, 八瀬, 清志, 宮崎, 照宣

    （株）エヌ・ティー・エス　2020/02/14　Scholarly book

    ISBN: 9784860436315

  6. 超精密加工と表面科学 : 原子レベルの生産技術

    大阪大学グローバルCOEプログラム高機能化原子制御製造プロセス教育研究拠点, 精密工学会超精密加工専門委員会

    大阪大学出版会　2014/03/19　Textbook, survey, introduction

    ISBN: 9784872594652

  7. 超精密加工と表面科学 : 原子レベルの生産技術

    大阪大学グローバルCOEプログラム高機能化原子制御製造プロセス教育研究拠点, 精密工学会超精密加工専門委員会

    大阪大学出版会　2014/03/19　Textbook, survey, introduction

    ISBN: 9784872594652

  8. 問題と解説で学ぶ表面科学

    日本表面科学会, 松井, 文彦

    共立出版（株）　2013/10/25　Textbook, survey, introduction

    ISBN: 9784320033740

Media Coverage 1

  1. 阪大がオンライン授業 「学ぶ機会を確保」

    毎日新聞社

    2020/04/17

Institutional Repository 7

Content Published in the University of Osaka Institutional Repository (OUKA)

  1. Atomic-scale insights into the origin of rectangular lattice in nanographene probed by scanning tunneling microscopy

    Li Junhuan, Li Shaoxian, Higashi Tomoki, Kawai Kentaro, Inagaki Kouji, Yamamura Kazuya, Arima Kenta

    Physical Review B　Vol. 103　No. 24　p. 245433-1-245433-9　2021/06/24

  2. Improvements in graphene growth on 4H-SiC(0001) using plasma induced surface oxidation

    Minami Ouki, Ito Ryota, Hosoo Kohei, Ochi Makoto, Sano Yasuhisa, Kawai Kentaro, Yamamura Kazuya, Arima Kenta

    Journal of Applied Physics　Vol. 126　No. 6　p. 065301-1-065301-10　2019/08/08

  3. Comparative study of GeO2/Ge and SiO2/Si structures on anomalous charging of oxide films upon water adsorption revealed by ambient-pressure X-ray photoelectron spectroscopy

    Mori Daichi, Oka Hiroshi, Hosoi Takuji, Kawai Kentaro, Morita Mizuho, Crumlin Ethan J., Liu Zhi, Watanabe Heiji, Arima Kenta

    Journal of Applied Physics　Vol. 120　No. 9　p. 095306-1-095306-10　2016/09/02

  4. 触媒表面を基準面とする化学研磨法の開発

    佐野 泰久, 有馬 健太, 山内 和人

    大阪大学低温センターだより　Vol. 150　p. 22-27　2010/04

  5. Atomic-scale flattening of SiC surfaces by electroless chemical etching in HF solution with Pt catalyst

    Arima Kenta, Hara Hideyuki, Murata Junji, Ishida Takeshi, Okamoto Ryota, Yagi Keita, Sano Yasuhisa, Mimura Hidekazu, Yamauchi Kazuto

    Applied Physics Letters　Vol. 90　No. 20　2007/05/16

  6. Flattening of Si (001) Surface by EEM (Elastic Emission Machining) : Atomic Structure Identification of Processed Surface

    山内 和人, 三村 秀和, 久保田 章亀, 有馬 健太, 稲垣 耕司, 遠藤 勝義, 森 勇藏

    精密工学会誌論文集　Vol. 70　No. 4　p. 547-551　2004/04/05

  7. 走査型トンネル顕微鏡/分光法によるSi(001)洗浄表面に関する研究

    Arima Kenta