The University of Osaka Researchers

Yasuhisa Sano

佐野泰久

Yasuhisa Sano

佐野泰久

Graduate School of Engineering　Division of Precision Science & Technology and Applied Physics, Professor

keyword Physical and Chemical Machining Process，Ultra Precision Machining

Research History 3

2024/04 - Present

Osaka University
2007 -

- 大阪大学・准教授
2003 -

- 大阪大学・助教授

Education 4

Osaka University

- 1993
Osaka University　Graduate School, Division of Engineering

- 1993
Osaka University　School of Engineering

- 1991
Osaka University　Faculty of Engineering

- 1991

Professional Memberships 6

応用物理学会半導体の結晶成長と加工および評価に関する産学連携委員会
応用物理学会先進パワー半導体分科会
精密工学会超精密加工専門委員会
精密工学会プラナリゼーションCMPとその応用技術専門委員会
応用物理学会
精密工学会

Research Areas 1

Manufacturing technology (mechanical, electrical/electronic, chemical engineering) / Manufacturing and production engineering /

Awards 19

Best poster presentation award

2018/06
Best poster presentation award

Ryota Ito, Kohei Hosoo, Ouki Minami, Yasuhisa Sano, Kentaro Kawai, Kenta Arima　2017/09
Yasuda Award

Kazuki Nakade, Daichi Mori, Tatsuya Kawase, Kentaro Kawai, Yasuhisa Sano, Kazuto Yamauchi, Mizuho Morita, Kenta Arima　21st Symposium on Electron Device Interface Technology, The Japan Society of Applied Physics　2016/01
SSSJ Review Paper Award

Kazuto Yamauchi, Yasuhisa Sano, Kenta Arima　The Surface Science Society of Japan　2013/11
JSPE Prize Best Paper Award

Shun Sadakuni, Junji Murata, Keita Yagi, Kenta Arima, Yasuhisa Sano, Takeshi Okamoto, Hidekazu Mimura, Kazuto Yamauchi　3rd International Conference of Asian Society for Precision Engineering and Nanotechnology (Japan Society for Precision Engineering)　2009/11
JSPE Prize Best Paper Award

2009
Best Paper Award 2006

Kazuya Yamamura, Kunihito Kato, Yasuhisa Sano, Masafumi Shibahara, Katsuyoshi Endo, Yuzo Mori　The 8th International Conference on Progress of Machining Technology　2006/11
第19回日本放射光学会年会・放射光科学合同シンポジウム学生会員発表賞

松山智至, 三村秀和, 湯本博勝, 原英之, 山村和也, 佐野泰久, 遠藤勝義, 森勇藏, 西野吉則, 玉作賢治, 矢橋牧名, 石川哲也, 山内和人　日本放射光学会　2006/02
Best Paper Award 2006

2006
奨励研究賞

原英之, 佐野泰久, 三村秀和, 山内和人　応用物理学会、SiC及び関連ワイドギャップ半導体研究会　2005/11
工作機械技術振興賞（論文賞）

森勇藏, 山村和也, 佐野泰久　（財）工作機械技術振興財団　2003/06
精密工学会賞

森勇藏, 山村和也, 佐野泰久　(社)精密工学会　2003/03
精密工学会賞

2003
工作機械技術振興賞（論文賞）

2003
工作機械技術振興賞(論文賞)

森勇蔵, 山村和也, 佐野泰久　(財)工作機械技術振興財団　2002/06
工作機械技術振興財団工作機械技術振興賞

2002
JSPE Award

Kazuto Yamauchi, Kazuhisa Sugiyama, Kouji Inagaki, Kazuya Yamamura, Yasuhisa Sano, Yuzo Mori　2001/03
工作機械技術振興財団工作機械技術振興賞

2001
工作機械技術振興賞(論文賞)

森勇蔵, 山内和人, 山村和也, 佐野泰久　(財)工作機械技術振興財団　2000/06

Papers 275

{Nanofocused attosecond hard X-ray free-electron laser with intensity exceeding $10^{19}$ W/cm$^2$

Ichiro Inoue, Takahiro Sato, River Robles, Matthew Seaberg, Yanwen Sun, Diling Zhu, David Cesar, Yuantao Ding, Vincent Esposito, Paris Franz, Veronica Guo, Alex Halavanau, Nick Sudar, Zen Zhang, Yuichi Inubushi, Taito Osaka, Gota Yamaguchi, Yasuhisa Sano, Kazuto Yamauchi, Makina Yabashi, Agostino Marinelli, Junpei Yamada

Optica　2025/01/21　Research paper (scientific journal)
Publisher: Optica Publishing Group
Dicing Process for 4H-SiC Wafers by Plasma Etching Using High-Pressure SF<sub>6</sub> Plasma with Metal Masks

Yasuhisa Sano, Yuma Nakanishi, Masaaki Oshima, Shunto Iden, Jumpei Yamada, Daisetsu Toh, Kazuto Yamauchi

Materials Science Forum　Vol. 1124　p. 51-55　2024/08/21　Research paper (scientific journal)
Publisher: Trans Tech Publications, Ltd.
Ultra-precision smooth surface on polymer material prepared by catalyst-referred etching

D. Toh, K. Takeda, K. Kayao, Y. Ohkubo, K. Yamauchi, Y. Sano

International Journal of Automation Technology　Vol. 18　No. 2　p. 240-247　2024/03/05　Research paper (scientific journal)
High-precision finishing method for narrow-groove channel-cut crystal x-ray monochromator using plasma chemical vaporization machining with wire electrode

Shotaro Matsumura, Iori Ogasahara, Taito Osaka, Makina Yabashi, Kazuto Yamauchi, Yasuhisa Sano

Review of Scientific Instruments　Vol. 95　No. 1　2024/01/01　Research paper (scientific journal)
Publisher: AIP Publishing
High-pressure plasma etching up to 9 atm toward uniform processing inside narrow grooves of high-precision X-ray crystal optics

Shotaro Matsumura, Iori Ogasahara, Masafumi Miyake, Taito Osaka, Daisetsu Toh, Jumpei Yamada, Makina YABASHI, Kazuto Yamauchi, Yasuhisa Sano

Applied Physics Express　2023/12/02　Research paper (scientific journal)
Publisher: IOP Publishing
Fabrication of YAG ceramics surface without damage and grain boundary steps using catalyzed chemical wet etching

Daisetsu Toh, Kiyoto Kayao, Kazuto Yamauchi, Yasuhisa Sano

CIRP Journal of Manufacturing Science and Technology　Vol. 47　p. 1-6　2023/12　Research paper (scientific journal)
Publisher: Elsevier BV
Catalyst enhancement approach for improving the removal rate and stability of silica glass polishing via catalyzed chemical etching in pure water

Daisetsu Toh, Kiyoto Kayao, Pho Van Bui, Kouji Inagaki, Yoshitada Morikawa, Kazuto Yamauchi, Yasuhisa Sano

Precision Engineering　Vol. 84　p. 21-27　2023/11　Research paper (scientific journal)
Publisher: Elsevier BV
Bias-assisted photoelectrochemical planarization of GaN (0001) with impurity concentration distribution

D. Toh, K. Kayao, R. Ohnishi, A. I. Osaka, K. Yamauchi, Y. Sano

AIP Advances　Vol. 13　No. 9　2023/09/01　Research paper (scientific journal)
Publisher: AIP Publishing
Role of Photoelectrochemical Oxidation in Enabling High-Efficiency Polishing of Gallium Nitride

Kiyoto Kayao, Daisetsu Toh, Kazuto Yamauchi, Yasuhisa Sano

ECS Journal of Solid State Science and Technology　Vol. 12　No. 6　p. 063005-063005　2023/06/01　Research paper (scientific journal)
Publisher: The Electrochemical Society
High-Speed Plasma Etching of Gallium Oxide Substrates Using Atmospheric-Pressure Plasma with Hydrogen-Helium Mixed Gas

Yasuhisa Sano, Taiki Sai, Genta Nakaue, Daisetsu Toh, Kazuto Yamauchi

Solid State Phenomena　Vol. 342　p. 69-72　2023/05/25　Research paper (scientific journal)
Publisher: Trans Tech Publications, Ltd.
High-speed etching of gallium nitride substrate using hydrogen-contained atmospheric-pressure plasma

Yasuhisa Sano, Genta Nakaue, Daisetsu Toh, Jumpei Yamada, Kazuto Yamauchi

Applied Physics Express　Vol. 16　No. 4　p. 045504-045504　2023/04/01　Research paper (scientific journal)
Publisher: IOP Publishing
Hard x-ray intensity autocorrelation using direct two-photon absorption

Taito Osaka, Ichiro Inoue, Jumpei Yamada, Yuichi Inubushi, Shotaro Matsumura, Yasuhisa Sano, Kensuke Tono, Kazuto Yamauchi, Kenji Tamasaku, Makina Yabashi

Physical Review Research　Vol. 4　No. 1　2022/03　Research paper (scientific journal)
High-throughput deterministic plasma etching using array-type plasma generator system

Yasuhisa Sano, Ken Nishida, Ryohei Asada, Shinya Okayama, Daisetsu Toh, Satoshi Matsuyama, Kazuto Yamauchi

Review of Scientific Instruments　Vol. 92　No. 12　p. 125107-125107　2021/12/01　Research paper (scientific journal)
Publisher: AIP Publishing
Optimal deformation procedure for hybrid adaptive x-ray mirror based on mechanical and piezo-driven bending system

Takato Inoue, Yuka Nishioka, Satoshi Matsuyama, Junki Sonoyama, Kazuteru Akiyama, Hiroki Nakamori, Yoshio Ichii, Yasuhisa Sano, Xianbo Shi, Deming Shu, Max D. Wyman, Ross Harder, Yoshiki Kohmura, Makina Yabashi, Lahsen Assoufid, Tetsuya Ishikawa, Kazuto Yamauchi

Review of Scientific Instruments　Vol. 92　No. 12　p. 123706-123706　2021/12/01　Research paper (scientific journal)
Publisher: AIP Publishing
X-ray adaptive zoom condenser utilizing an intermediate virtual focus

Satoshi Matsuyama, Hiroyuki Yamaguchi, Takato Inoue, Yuka Nishioka, Jumpei Yamada, Yasuhisa Sano, Yoshiki Kohmura, Makina Yabashi, Tetsuya Ishikawa, Kazuto Yamauchi

Optics Express　Vol. 29　No. 10　p. 15604-15604　2021/05/10　Research paper (scientific journal)
Publisher: The Optical Society
Photoelectrochemical Oxidation Assisted Catalyst-Referred Etching for SiC (0001) Surface

Daisetsu Toh, Pho Van Bui, Kazuto Yamauchi, Yasuhisa Sano

International Journal of Automation Technology　Vol. 15　No. 1　p. 74-79　2021/01/05　Research paper (scientific journal)
Publisher: Fuji Technology Press Ltd.
High-speed etching of silicon carbide wafer using high-pressure SF6 plasma

Yasuhisa Sano, Koki Tajiri, Yuki Inoue, Risa Mukai, Yuma Nakanishi, Satoshi Matsuyama, Kazuto Yamauchi

ECS Journal of Solid State Science and Technology　Vol. 10　No. 1　2021/01　Research paper (scientific journal)
High-Speed Plasma Etching of SiC Wafer Toward Backside Thinning

Yasuhisa Sano

ECS Transactions　Vol. 104　No. 7　p. 85-92　2021　Research paper (international conference proceedings)
High-resolution micro channel-cut crystal monochromator processed by plasma chemical vaporization machining for a reflection self-seeded X-ray free-electron laser

Shotaro Matsumura, Taito Osaka, Ichiro Inoue, Satoshi Matsuyama, Makina Yabashi, Kazuto Yamauchi, Yasuhisa Sano

Optics Express　Vol. 28　No. 18　p. 25706-25715　2020/08/31　Research paper (scientific journal)
An abrasive-free chemical polishing method assisted by nickel catalyst generated by in situ electrochemical plating

D. Toh, P. V. Bui, A. Isohashi, S. Matsuyama, K. Yamauchi, Y. Sano

Review of Scientific Instruments　Vol. 91　No. 4　2020/04　Research paper (scientific journal)
Atomically smooth Si surface planarized using a thin film catalyst in pure water

Pho van Bui, Daisetsu Toh, Shinsaku Shiroma, Taku Hagiwara, Ai Isohashi Osaka, Satoshi Matsuyama, Yasuhisa Sano, Kazuto Yamauchi

Proceedings of the 20th International Conference of the European Society for Precision Engineering and Nanotechnology, EUSPEN 2020　p. 43-44　2020　Research paper (international conference proceedings)
Cause of etch pits during the high speed plasma etching of silicon carbide and an approach to reduce their size

Y. Nakanishi, R. Mukai, S. Matsuyama, K. Yamauchi, Y. Sano

Materials Science Forum　Vol. 1004 MSF　p. 161-166　2020　Research paper (international conference proceedings)
触媒表面電位制御を取り入れた光電気化学触媒表面基準エッチング法によるSiC基板の高能率平坦化加工

大西諒典, 木田英香, 藤大雪, 松山智至, 佐野泰久, 山内和人

精密工学会学術講演会講演論文集　Vol. 2019A　p. 28-29　2019/08/20
Publisher: 公益社団法人精密工学会
Improvements in graphene growth on 4H-SiC(0001) using plasma induced surface oxidation

Ouki Minami, Ryota Ito, Kohei Hosoo, Makoto Ochi, Yasuhisa Sano, Kentaro Kawai, Kazuya Yamamura, Kenta Arima

Journal of Applied Physics　Vol. 126　No. 6　p. 065301 1-065301 10　2019/08　Research paper (scientific journal)
Fabrication of optics with a thin part by plasma chemical vaporization machining

Hideo Takino, Kazuya Yamamura, Yasuhisa Sano, Yuzo Mori

Freeform Optics - Proceedings Optical Design and Fabrication 2019 (Freeform, OFT)　2019/06/03　Research paper (international conference proceedings)
Publisher: Optical Society of America (OSA)
Catalyzed chemical polishing of SiO2 glasses in pure water

D. Toh, P. V. Bui, A. Isohashi, N. Kidani, S. Matsuyama, Y. Sano, Y. Morikawa, K. Yamauchi

Review of Scientific Instruments　Vol. 90　No. 4　2019/04　Research paper (scientific journal)
X-ray optics for advanced ultrafast pump-probe X-ray experiments at SACLA.

Tetsuo Katayama, Takashi Hirano, Yuki Morioka, Yasuhisa Sano, Taito Osaka, Shigeki Owada, Tadashi Togashi, Makina Yabashi

Journal of synchrotron radiation　Vol. 26　No. Pt 2　p. 333-338　2019/03/01　Research paper (scientific journal)
Surface Finishing Method using Plasma Chemical Vaporization Machining for Narrow Channel Walls of X-ray Crystal Monochromators

T. Hirano, Y. Morioka, S. Matsumura, Y. Sano, T. Osaka, S. Matsuyama, M. Yabashi, K. Yamauchi

Int. J. Automation Technol.　Vol. 13　No. 2　p. 246-253　2019/03　Research paper (scientific journal)
Compact reflective imaging optics in hard X-ray region based on concave and convex mirrors

J. Yamada, S. Matsuyama, Y. Sano, Y. Kohmura, M. Yabashi, T. Ishikawa, K. Yamauchi

Optics Express　Vol. 27　No. 3　p. 3429-3438　2019/02　Research paper (scientific journal)
Figuring of fused silica optical surface with thin parts by plasma chemical vaporization machining

Hideo Takino, Kazuya Yamamura, Yasuhisa Sano, Yuzo Mori

Proceedings of SPIE - The International Society for Optical Engineering　Vol. 11168　2019　Research paper (international conference proceedings)
Publisher: SPIE
Numerically controlled plasma chemical vaporization machining using array-type electrode toward high-throughput deterministic machining

Ken Nishida, Shinya Okayama, Satoshi Matsuyama, Kazuto Yamauchi, Yasuhisa Sano

Proceedings - 34th ASPE Annual Meeting　p. 466-469　2019　Research paper (international conference proceedings)
Publisher: American Society for Precision Engineering, ASPE
High-efficiency SiC polishing using a thin film catalyst in pure water

Pho Van Bui, Daisetsu Toh, Satoshi Matsuyama, Yasuhisa Sano, Kazuto Yamauchi

European Society for Precision Engineering and Nanotechnology, Conference Proceedings - 19th International Conference and Exhibition, EUSPEN 2019　p. 50-51　2019　Research paper (international conference proceedings)
Development of an abrasive-free polishing method for optical material using pure water and Ni catalyst

Daisetsu Toh, Ryosuke Ohnishi, Pho V. Bui, Ai Isohsahi, Satoshi Matsuyama, Yasuhisa Sano, Kazuto Yamauchi

Proceedings - 34th ASPE Annual Meeting　p. 474-477　2019　Research paper (international conference proceedings)
High-efficiency planarization of SIC wafers by water-CARE (Catalyst-referred etching) employing photoelectrochemical oxidation

H. Kida, D. Toh, P. V. Bui, A. Isohashi, R. Ohnishi, S. Matsuyama, K. Yamauchi, Y. Sano

Materials Science Forum　Vol. 963 MSF　p. 525-529　2019　Research paper (international conference proceedings)
High-efficiency planarization of GaN wafer by catalyst-referred etching with positive-biased photo-electrochemical oxidation

Ryosuke Ohnishi, Daisetsu Toh, Satoshi Matsuyama, Ai Isohashi, Yasuhisa Sano, Kazuto Yamauchi

Proceedings - 34th ASPE Annual Meeting　p. 79-83　2019　Research paper (international conference proceedings)
Hard-x-ray imaging mirror optics using concave and convex mirrors

J. Yamada, S. Matsuyama, Y. Sano, Y. Kohmura, M. Yabashi, T. Ishikawa, K. Yamauchi

International Conference on Synchrotron Radiation Instrumentation (SRI 2018)　2018/06
Development of hybrid X-ray adaptive optical system based on piezo-driven deformable mirror and a mechanical mirror bender

H. Yamaguchi, T. Goto, H. Hayashi, S. Matsuyama, J. Sonoyama, K. Akiyama, H. Nakamori, Y. Sano, Y. Kohmura, M. Yabashi, T. Ishikawa, K. Yamauchi

International Conference on Synchrotron Radiation Instrumentation (SRI 2018)　2018/06
Development of adaptive Kirkpatrick-Baez mirrors based on bimorph and mechanical bending

H. Nakamori, T. Goto, S. Matsuyama, H. Hayashi, H. Yamaguchi, J. Sonoyama, K. Akiyama, Y. Sano, Y. Kohmura, M. Yabashi, T. Ishikawa, H. Okada, K. Yamauchi

International Workshop on X-ray Optics and Metrology Satellite Meeting of SRI 2018 (IWXM 2018)　2018/06
Development of reflective imaging optics using concave and convex mirrors

J. Yamada, S. Matsuyama, Y. Sano, Y. Kohmura, M. Yabashi, T. Ishikawa, K. Yamauchi

International Workshop on X-ray Optics and Metrology Satellite Meeting of SRI 2018 (IWXM 2018)　2018/06
Nearly diffraction-limited hard X-ray line focusing with hybrid adaptive X-ray mirror based on mechanical and piezo-driven deformation

T. Goto, S. Matsuyama, H. Hayashi, H. Yamaguchi, J. Sonoyama, K. Akiyama, H. Nakamori, Y. Sano, Y. Kohmura, M. Yabashi, T. Ishikawa, K. Yamauchi

Optics Express　Vol. 26　No. 13　p. 17477-17486　2018/06　Research paper (scientific journal)
Development of high-resolution X-ray imaging optical system using multilayer imaging mirrors

K. Hata, J. Yamada, S. Matsuyama, Y. Sano, Y. Kohmura, M. Yabashi, T. Ishikawa, K. Yamauchi

International Conference on X-ray Optics and Applications 2018 (XOPT2018)　2018/04
Compact and large-magnification full-field X-ray microscope using concave-convex imaging mirrors

J. Yamada, S. Matsuyama, Y. Sano, Y. Kohmura, M. Yabashi, T. Ishikawa, K. Yamauchi

International Conference on X-ray Optics and Applications 2018 (XOPT2018)　2018/04
Systematic-error-free wavefront measurement using an X-ray single-grating interferometer

T. Inoue, S. Matsuyama, S. Kawai, H. Yumoto, Y. Inubushi, T. Osaka, I. Inoue, T. Koyama, K. Tono, H. Ohashi, M. Yabashi, T. Ishikawa, K. Yamauchi

Review of Scientific Instruments　Vol. 89　No. 4　p. 043106-1-043106-7　2018/04　Research paper (scientific journal)
Platinum-catalyzed hydrolysis etching of SiC in water: A density functional theory study

Pho Van Bui, Daisetsu Toh, Ai Isohashi, Satoshi Matsuyama, Kouji Inagaki, Yasuhisa Sano, Kazuto Yamauchi, Yoshitada Morikawa

Japanese Journal of Applied Physics　Vol. 57　No. 5　p. 055703-1-055703-5　2018/04　Research paper (scientific journal)
Publisher: The Japan Society of Applied Physics
Characteristics and Mechanism of Catalyst-Referred Etching Method: Application to 4H-SiC

Pho Van Bui, Yasuhisa Sano, Yoshitada Morikawa, Kazuto Yamauchi

International Journal of Automation Technology　Vol. 12　No. 2　p. 154-159　2018/03　Research paper (scientific journal)
High-efficiency planarization of GaN by catalyst-referred etching using photo-electrochemical oxidation

KIDA Hideka, TOH Daisetsu, OHNISHI Ryosuke, Matsuyama Tomohisa, Sano Yasuhisa, Yamauchi Kazuto

The Proceedings of Mechanical Engineering Congress, Japan　Vol. 2018　2018
Publisher: The Japan Society of Mechanical Engineers
High-efficiency planarization of SiC in pure water using a thin film catalyst

Pho Van Bui, Yuta Nakahira, Daisetsu Toh, Satoshi Matsuyama, Yasuhisa Sano, Kazuto Yamauchi

European Society for Precision Engineering and Nanotechnology, Conference Proceedings - 18th International Conference and Exhibition, EUSPEN 2018　p. 433-434　2018　Research paper (international conference proceedings)
Development of high efficiency polishing method using pure water and Ni catalyst

Daisetsu Toh, Pho Van Bui, Nakahira Yuta, Hideka Kida, Takahisa Ohgushi, Satoshi Matsuyama, Yasuhisa Sano, Kazuto Yamauchi

European Society for Precision Engineering and Nanotechnology, Conference Proceedings - 18th International Conference and Exhibition, EUSPEN 2018　p. 435-436　2018　Research paper (international conference proceedings)
Surface Modification of SiC by Plasma Oxidation to Form Graphene/SiC Structure with Low Pit Density

K. Arima, R. Ito, O. Minami, K. Hosoo, Y. Sano, K. Kawai

Abstract Book & Schedule of PCSI 45　p. 31-31　2018/01
Publisher: American Vacuum Society
Performance of a hard X-ray split-and-delay optical system with a wavefront division

Takashi Hirano, Taito Osaka, Yuki Morioka, Yasuhisa Sano, Yuichi Inubushi, Tadashi Togashi, Ichiro Inoue, Satoshi Matsuyama, Kensuke Tono, Aymeric Robert, Jerome B. Hastings, Kazuto Yamauchi, Makina Yabashi

JOURNAL OF SYNCHROTRON RADIATION　Vol. 25　No. 1　p. 20-25　2018/01　Research paper (scientific journal)
Characterization of temporal coherence of hard x-ray free-electron laser pulses with single-shot interferograms

T. Osaka, T. Hirano, Y. Morioka, Y. Sano, Y. Inubushi, I. Inoue, K. Tono, A. Robert, J. B. Hastings, K. Yamauchi, M. Yabashi

IUCrJ　Vol. 4　No. 6　p. 728-733　2017/11　Research paper (scientific journal)
Fabrication of X-ray imaging mirror for an achromatic and high-resolution full-field X-ray microscope

J. Yamada, S. Matsuyama, S. Yasuda, Y. Sano, K. Yamauchi

2017/10
Plasma-assisted Oxidation of SiC Surface to Assist Forming Graphene with Low Pit Density

Ryota Ito, Kohei Hosoo, Ouki Minami, Mizuho Morita, Yasuhisa Sano, Kentaro Kawai, Kenta Arima

Program & Exhibition Guide of The 8th International Symposium on Surface Science　p. 476-476　2017/10
Development of concave-convex imaging mirror system for a compact and achromatic full-field x-ray microscope

J. Yamada, S. Matsuyama, S. Yasuda, Y. Sano, Y. Kohmura, M. Yabashi, T. Ishikawa, K. Yamauchi

Proceedings of SPIE　Vol. 10386　p. 103860C-1-103860C-6　2017/09　Research paper (international conference proceedings)
Development of crystal-based split-and-delay optics with wavefront splitting at SACLA

T. Hirano, T. Osaka, Y. Sano, Y. Inubushi, T. Togashi, I. Inoue, S. Matsuyama, K. Tono, K. Yamauchi, M. Yabashi

SPIE Optics+Photonics2017　p. 187-187　2017/08
Development of an X-ray imaging optical system consisting of concave and convex mirrors

J. Yamada, S. Matsuyama, S. Yasuda, Y. Sano, Y. Kohmura, M. Yabashi, T. Ishikawa, K. Yamauchi

The 24th Congress of the International Comission for Optics, X-ray and High-energy Optics　2017/08
Development of hybrid adaptive x-ray focusing system based on piezoelectric bimorph mirror and mirror bender

T. Goto, S. Matsuyama, H. Hayashi, J. Sonoyama, K. Akiyama, H. Nakamori, Y. Sano, K. Yamauchi

SPIE Optics+Photonics2017　p. 187-187　2017/08
Dynamic fracture of tantalum under extreme tensile stress

B. Albertazzi, N. Ozaki, V. Zhakhovsky, A. Faenov, H. Habara, M. Harmand, N. Hartley, D. Ilnitsky, N. Inogamov, Y. Inubushi, T. Ishikawa, T. Katayama, T. Koyama, M. Koenig, A. Krygier, T. Matsuoka, S. Matsuyama, E. McBride, K. P. Migdal, G. Morard, H. Ohashim T. Okuchi, T. Pikuz, N. Purejav, O. Sakata, Y. Sano, T. Sato, T. Sekine, Y. Seto, K. Takahashi, K. Tanaka, Y. Tange, T. Togashi, K. Tono, Y. Umeda, T. Vinci, M. Yabashi, T. Yabuuchi, K. Yamauchi, H. Yumoto, R. Kodama

Science Advances　Vol. 3　No. 6　p. e1602705-e1602705-6　2017/06　Research paper (scientific journal)
Chemical etching of silicon carbide in pure water by using platinum catalyst

A. Isohashi, P. V. Pho, S. Matsuyama, Y. Sano, K. Inagaki, Y. Morikawa, K. Yamauchi

Applied Phsyics Letters　Vol. 110　No. 20　2017/05　Research paper (scientific journal)
Hard X-ray Split-and-Delay Optics with wavefront Division at SACLA

T. Hirano, T. Osaka, Y. Sano, Y. Inubushi, T. Togashi, I. Inoue, S. Matsuyama, K. Tono, K. Yamauchi, M. Yabashi

International conference on X-ray optics and applications 2017 (XOPT'17) in OPIC2017　p. 34-34　2017/04
High-magnification X-ray imaging mirror system consisting of elliptical concave and hyperbolic convex mirrors

J. Yamada, S. Matsuyama, S. Yasuda, Y. Sano, Y. Kohmura, M. Yabashi, T. Ishikawa, K. Yamauchi

International conference on X-ray optics and applications 2017 (XOPT'17) in OPIC2017　p. 66-66　2017/04
Simulation of concave-convex imaging mirror system for development of a compact and achromatic full-field x-ray microscope

J. Yamada, S. Matsuyama, Y. Sano, K. Yamauchi

Applied Optics　Vol. 56　No. 4　p. 967-974　2017/02　Research paper (scientific journal)
Ultrafast observation of lattice dynamics in laser-irradiated gold foils

N. J. Hartley, N. Ozaki, T. Matsuoka, B. Albertazzi, A. Faenov, Y. Fujimoto, H. Habara, M. Harmand, Y. Inubushi, T. Katayama, M. Koenig, A. Krygier, P. Mabey, Y. Matsumura, S. Matsuyama, E. E. McBride, K. Miyanishi, G. Morard, T. Okuchi, T. Pikuz, O. Sakata, Y. Sano, T. Sato, T. Sekine, Y. Seto, K. Takahashi, K. A. Tanaka, Y. Tange, T. Togashi, Y. Umeda, T. Vinci, M. Yabashi, T. Yabuuchi, K. Yamauchi, R. Kodama

Applied Physics Letters　Vol. 110　No. 7　p. 071905-071905　2017/02　Research paper (scientific journal)
ニッケル触媒を利用した純水ベースの触媒表面基準エッチング法の開発

藤大雪, 礒橋藍, 稻田辰昭, 中平雄太, 木田英香, 松山智至, 佐野泰久, 山内和人

精密工学会学術講演会講演論文集　Vol. 2017A　p. 35-36　2017
Publisher: 公益社団法人精密工学会
光電気化学酸化を援用した触媒表面基準エッチング法による窒化ガリウムの高能率平坦化

木田英香, 藤大雪, 中平雄太, 松山智至, 佐野泰久, 山内和人

精密工学会学術講演会講演論文集　Vol. 2017A　p. 19-20　2017
Publisher: 公益社団法人精密工学会
Platinum-assisted chemical etching of SiC: A density functional theory study

Bui Pho Van, Toh Daisetsu, Inagaki Kouji, Sano Yasuhisa, Yamauchi Kazuto, Morikawa Yoshitada

Proceedings of JSPE Semestrial Meeting　Vol. 2017A　p. 251-252　2017
Publisher: The Japan Society for Precision Engineering
触媒表面基準エッチング法における水素水を用いた被毒除去法の提案

中平雄太, 礒橋藍, Bui Pho, 稻田辰昭, 藤大雪, 木田英香, 松山智至, 佐野泰久, 山内和人

精密工学会学術講演会講演論文集　Vol. 2017A　p. 1-2　2017
Publisher: 公益社団法人精密工学会
Stabilization of removal rate of silica glass on catalyst-referred etching by cleaning catalyst surface

Yuta Nakahira, Ai Isohashi, Tatsuaki Inada, Daisetsu Toh, Hideka Kida, Satoshi Matsuyama, Yasuhisa Sano, Kazuto Yamauchi

ICPT 2017 - International Conference on Planarization/CMP Technology　p. 110-114　2017　Research paper (international conference proceedings)
Planarization of SiC and oxide surfaces by using Catalyst-Referred Etching with water

Pho Van Bui, Ai Isohashi, Daisetsu Toh, Satoshi Matsuyama, Kouji Inagaki, Yasuhisa Sano, Kazuto Yamauchi

Proceedings of the 17th International Conference of the European Society for Precision Engineering and Nanotechnology, EUSPEN 2017　p. 157-158　2017　Research paper (international conference proceedings)
Carbon overlayer on 4H-SiC surfaces by plasma oxidation at near room temperature followed by wet etching

Kohei Hosoo, Ryota Ito, Kentaro Kawai, Yasuhisa Sano, Mizuho Morita, Kenta Arima

Abstracts of Symposium on Surface Science & Nanotechnology -25th Anniversary of SSSJ Kansai-　p. 164-164　2017/01
Formation of Carbon Aggregates on SiC by Combination of Plasma Oxidation at Near Room Temperature and Wet Etching

Ryota Ito, Kohei Hosoo, Kentaro Kawai, Yasuhisa Sano, Mizuho Morita, Kenta Arima

Extended Abstracts of the 22st Workshop on Symposium on Electron Device Interface Technology　p. 203-206　2017/01
Angle-resolved photoelectron spectroscopy studies of initial stage of thermal oxidation on 4H-SiC (0001) on-Axis and 4° off-axis substrates

Hitoshi Arai, Ryoma Toyoda, Ai Ishohashi, Yasuhisa Sano, Hiroshi Nohira

ECS Transactions　Vol. 77　No. 6　p. 51-57　2017　Research paper (international conference proceedings)
Publisher: Electrochemical Society Inc.
Change in surface morphology of Si (100) wafer after oxidation with atmospheric-pressure plasma

Hiroyasu Takei, Satoshi Kurio, Satoshi Matsuyama, Kazuto Yamauchi, Yasuhisa Sano

Key Engineering Materials　Vol. 723　p. 242-246　2017　Research paper (international conference proceedings)
Publisher: Trans Tech Publications Ltd
The Polishing Effect of SiC Substrates in Femtosecond Laser Irradiation Assisted Chemical Mechanical Polishing (CMP)

Chengwu Wang, Syuhei Kurokawa, Toshiro Doi, Julong Yuan, Yasuhisa Sano, Hideo Aida, Kehua Zhang, Qianfa Deng

ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY　Vol. 6　No. 4　p. P105-P112　2017　Research paper (scientific journal)
Characterization of Aggregated Carbon Compounds at SiO2/SiC Interface after Plasma Oxidation at Near Room Temperature

K. Arima, K. Hosoo, R. Ito, N. Saito, K. Kawai, Y. Sano, M. Morita

Meeting Program of PRiME 2016　p. 283-283　2016/10
Pit Formation, Patterning and Flattening of Ge Surfaces in O2-Containing Water by Metal-Assisted Chemical Etching

T. Kawase, A. Mura, Y. Saito, T. Okamoto, K. Kawai, Y. Sano, K. Yamauchi, M. Morita, K. Arima

Meeting Program of PRiME 2016　p. 124-124　2016/10
Size-changeable x-ray beam collimation using an adaptive x-ray optical system based on four deformable mirrors

T. Goto, S. Matsuyama, H. Nakamori, H. Hayashi, Y. Sano, Y. Kohmura, M. Yabashi, T. Ishikawa, K. Yamauchi

Proceedings of SPIE　Vol. 9965　2016/10　Research paper (scientific journal)
Development of array-type atmospheric-pressure RF plasma generator with electric on-off control for high-throughput numerically controlled processes

H. Takei, S. Kurio, S. Matsuyama, K. Yamauchi, Y. Sano

Review of Scientific Instruments　Vol. 87　No. 10　2016/10　Research paper (scientific journal)
Development of an x-ray imaging optical system based on a combination of concave and convex mirrors

Satoshi Matsuyama, Jumpei Yamada, Yasuhisa Sano, Kazuto Yamauchi

SPIE Optics+Photonics　2016/09
A Two-stage Adaptive X-ray Focusing System using Four Piezoelectric Deformable Mirrors

T. Goto, H. Nakamori, S. Matsuyama, H. Hayashi, T. Kimura, K. P. Khakurel, Y. Sano, Y. Kohmura, M. Yabashi, Y. Nishino, T. Ishikawa, K. Yamauchi

13th International Conference on X-ray Microscopy (XRM2016)　2016/08
Simulation and Experimental Study of Wavefront Measurement Accuracy of the Pencil-Beam Method

T. Goto, S. Matsuyama, H. Nakamori, Y. Sano, Y. Kohmura, M. Yabashi, T. Ishikawa, K. Yamauchi

Synchrotron Radiation News　Vol. 29　No. 4　p. 32-36　2016/08　Research paper (scientific journal)
Development of speckle-free channel-cut crystal optics using plasma chemical vaporization machining for coherent X-ray applications

T. Hirano, T. Osaka, Y. Sano, Y. Inubushi, S. Matsuyama, K. Tono, T. Ishikawa, M. Yabashi, K. Yamauchi

Review of Scientific Instruments　Vol. 87　No. 6　2016/06　Research paper (scientific journal)
Fabrication of Strain-Free Crystal Optics for a Hard X-ray Split-and-Delay Optical System

T. Hirano, T. Osaka, Y. Sano, Y. Inubushi, S. Matsuyama, K. Tono, T. Ishikawa, M. Yabashi, K. Yamauchi

International Conference on X-ray Optics, Detectors, Sources, and their Applications 2016 (XOPT2016)　2016/05
High-resolution imaging XAFS using advanced Kirkpatrick-Baez mirror optics

S. Yasuda, S. Matsuyama, H. Okada, Y. Sano, Y. Kohmura, M. Yabashi, T. Ishikawa, K. Yamauchi

International Conference on X-ray Optics, Detectors, Sources, and their Applications 2016 (XOPT2016)　2016/05
Size-controllable X-ray beam collimation using a two-stage adaptive Kirkpatrick-Baez mirror system based on piezoelectric deformable mirrors

T. Goto, H. Nakamori, S. Matsuyama, H. Hayashi, Y. Sano, Y. Kohmura, M. Yabashi, T. Ishikawa, K. Yamauchi

International Conference on X-ray Optics, Detectors, Sources, and their Applications 2016 (XOPT2016)　2016/05
A variable-numerical-aperture x-ray focusing system using a two-stage adaptive Kirkpatrick-Baez mirrors based on piezo electric deformable mirrors

H. Hayashi, T. Goto, H. Nakamori, S. Matsuyama, T. Kimura, K. P. Khakurel, Y. Sano, Y. Kohmura, M. Yabashi, Y. Nishino, T. Ishikawa, K. Yamauchi

International Conference on X-ray Optics, Detectors, Sources, and their Applications 2016 (XOPT2016)　2016/05
Wavelength-tunable hard X-ray split-and-delay optics at SACLA

T. Osaka, T. Hirano, Y. Sano, Y. Inubushi, S. Matsuyama, K. Tono, T. Ishikawa, K. Yamauchi, M. Yabashi

International Conference on X-ray Optics, Detectors, Sources, and their Applications 2016 (XOPT2016)　2016/05
Achromatic and high-resolution full-field X-ray microscopy based on four total-reflection mirrors

S.Matsuyama, S. Yashuda, H. Okada, Y. Kohmura, Y. Sano, M. Yabashi, T. Ishikawa, K. Yamauchi

International Conference on X-ray Optics, Detectors, Sources, and their Applications 2016 (XOPT2016)　2016/05
Wavelength-tunable split-and-delay optical system for hard X-ray free-electron lasers

T. Osaka, T. Hirano, Y. Sano, Y. Inubushi, S. Matsuyama, K. Tono, T. Ishikawa, K. Yamauchi, M. Yabashi

Optics Express　Vol. 24　No. 9　p. 9187-9201　2016/04　Research paper (scientific journal)
Nearly diffraction-limited X-ray focusing with variable-numerical-aperture focusing optical system based on four deformable mirrors

S. Matsuyama, H. Nakamori, T. Goto, T. Kimura, K. P. Khakurel, Y. Kohmura, Y. Sano, M. Yabashi, T. Ishikawa, Y. Nishino, K. Yamauchi

Scientific Reports　Vol. 6　No. 1　2016/04　Research paper (scientific journal)
Publisher: Springer Science and Business Media LLC
Dry planarization method using transport of reactive species

Reiji Ryokume, Toshinobu Miyazaki, Satoshi Matsuyama, Yasuhisa Sano, Kazuto Yamauchi

Proceedings - 32nd ASPE Annual Meeting　p. 597-601　2016　Research paper (international conference proceedings)
Publisher: American Society for Precision Engineering, ASPE
Improvement of removal rate in catalyst-referred etching of GaN substrates

INADA Tatsuaki, ISOHASHI Ai, TOH Daisetsu, NAKAHIRA Yuta, MATSUYAMA Satoshi, SANO Yasuhisa, YAMAUCHI Kazuto

The Proceedings of Mechanical Engineering Congress, Japan　Vol. 2016　2016
Publisher: The Japan Society of Mechanical Engineers
触媒表面基準エッチング法における被毒物除去による加工速度安定化手法の開発

中平雄太, 礒橋藍, Bui Pho, 稻田辰昭, 藤大雪, 松山智至, 佐野泰久, 山内和人

精密工学会学術講演会講演論文集　Vol. 2016A　p. 211-212　2016
Publisher: 公益社団法人精密工学会
High-efficiency planarization method combining mechanical polishing andatmospheric-pressure plasma etching for hard-to-machine semiconductorsubstrates

Y. Sano, K. Shiozawa, T. Doi, H. Aida, T. Miyashita, K. Yamauchi

Mechanical Engineering Journal,　Vol. 3　No. 1　2016/01　Research paper (scientific journal)
Publisher: The Japan Society of Mechanical Engineers
Etching Properties of Ge Surfaces in Contact with Oxygen Reduction Catalyst in Water and Its Application to Surface Flattening

Kazuki Nakade, Daichi Mori, Tatsuya Kawase, Kentaro Kawai, Yasuhisa Sano, Kazuto Yamauchi, Mizuho Morita, Kenta Arima

Extended Abstracts of the 21st Workshop on Symposium on Electron Device Interface Technology　p. 9-12　2016/01
Damage threshold of platinum/carbon multilayers under hard X-ray free-electron laser irradiation

J. Kim, A. Nagahira, T. Koyama, S. Matsuyama, Y. Sano, M. Yabashi, H. Ohashi, T. Ishikawa, K. Yamauchi

Optics Express　Vol. 23　No. 22　p. 29032-29037　2015/11　Research paper (scientific journal)
XFEL を用いた衝撃圧縮下の炭素凝集過程の超高速観察

小川剛史, 尾崎典雅, 高橋謙次郎, 羽原英明, 松岡健之, 田中和夫, 池谷正太郎, Ochante. M, Ricardo A, 喜田美佳, 久保田善大, 佐藤友哉, 西川豊人, 野間澄人, 藤本陽平, 松村祐介, 吉田有佑, 松山智至, 佐野泰久, 山内和人, Albertazzi Bruno, Hartley Nicholas, Pikuz Tatiana, Faenov Anatory, 犬伏雄一, 丹下慶範, 富樫格, 片山哲夫, 矢橋牧名, 薮内俊毅, 梅田悠平, 佐藤友子, 関根利守, 奥地拓生, 瀬戸雄介, 坂田修身, 兒玉了祐

2015/11　Research paper (other academic)
XFEL を用いたハイパワーレーザーショック下における鉄の相転移観察

松村祐介, 尾崎典雅, Albertazzi Bruno, Hartley Nicholas, 高橋謙次郎, 羽原英明, 松岡健之, 田中和夫, 池谷正太郎, 小川剛史, Ochante Muray Ricardo Arturo, 喜田美佳, 久保田善大, 佐藤友哉, 西川豊人, 野間澄人, 藤本陽平, 吉田有佑, 松山智至, 佐野泰久, 山内和人, Pikuz Tatiana, Faenov Anatoly, 犬伏雄一, 丹下慶範, 富樫格, 薮内俊毅, 片山哲夫, 矢橋牧名, 梅田悠平, 佐藤友子, 関根利守, 奥地拓生, 瀬戸雄介, 坂田修身, 兒玉了祐

2015/11　Research paper (other academic)
Study on the mechanism of platinum-assisted hydrofluoric acid etching of SiC using density functional theory calculations

P. V. Bui, A. Isohashi, H. Kizaki, Y. Sano, K. Yamauchi, Y. Morikawa, K. inagaki

Applied Physics Letters　Vol. 107　No. 20　p. 201601-1-201601-4　2015/11　Research paper (scientific journal)
Catalyst-Assisted Electroless Flattening of Ge Surfaces in Dissolved-O2-Containing Water

T. Kawase, Y. Saito, A. Mura, T. Okamoto, K. Kawai, Y. Sano, M. Morita, K. Yamauchi, K. Arima

ChemElectroChem　Vol. 2　No. 11　p. 1656-1659　2015/11　Research paper (scientific journal)
Development of ion beam figuring system with electrostatic deflection for ultraprecise X-ray reflective optics

J. Yamada, S. Matsuyama, Y. Sano, K. Yamauchi

J. Yamada , S. Matsuyama, Y. Sano , K. Yamauchi　Vol. 86　No. 9　2015/08　Research paper (scientific journal)
Metal-Assisted Etching of Ge Surfaces in Water: From Pit Formation to Flattening

Kenta Arima, Tatsuya Kawase, Atsushi Mura, Kentaro Kawai, Yasuhisa Sano, Kazuto Yamauchi, Mizuho Morita

Program of 2015 MRS Spring Meeting & Exhibit　p. 329-329　2015/04
Hard X-ray nanofocusing using adaptive focusing optics based on piezoelectric deformable mirrors

Takumi Goto, Hiroki Nakamori, Takashi Kimura, Yasuhisa Sano, Yoshiki Kohmura, Kenji Tamasaku, Makina Yabashi, Tetsuya Ishikawa, Kazuto Yamauchi, Satoshi Matsuyama

Review of Scientific Instruments　Vol. 86　2015/04　Research paper (scientific journal)
Ion Beam Figuringを用いた高精度X線ミラーの作製（第7報）―静電偏向制御による非球面形状の作製と評価―

山田純平, 松山智至, 佐野泰久, 山内和人

アブストラクト集　2015/03
X線集光ミラー形状測定のための姿勢補正機構を有する三次元測定機の開発

金章雨, 松山智至, 佐野泰久, 山内和人

アブストラクト集　2015/03
モノリシックな一次元Wolter mirrorを用いた結像型硬X線顕微鏡の開発

安田周平, 松山智至, 木野英俊, 岡田浩巳, 青野真也, 佐野泰久, 香村芳樹, 石川哲也, 山内和人

アブストラクト集　2015/03
Local atomic configuration of graphene, buffer layer, and precursor layer on SiC(0001) by photoelectron diffraction

H. Matsui, F. Matsui, N. Maejima, T. Matsushita, T. Okamoto, A. N. Hattori, Y. Sano, K. Yamauchi, H. Daimon

Surface Science　Vol. 632　p. 98-102　2015/02　Research paper (scientific journal)
Atomically controlled surfacing of single crystalline SiC and GaN by catalyst-referred etching

Kazuto Yamauchi, Ai Isohashi, Kenta Arima, Yasuhisa Sano

ICPT 2014 - Proceedings of International Conference on Planarization/CMP Technology 2014　p. 139-141　2015/01/20　Research paper (international conference proceedings)
Publisher: Institute of Electrical and Electronics Engineers Inc.
Study on a novel CMP/P-CVM fusion processing system (Type B) and its basic characteristics

Koki Oyama, Yasuhisa Sano, Hideo Aida, Seongwoo Kim, Hideakli Nishizawa, Toshiro K. Doi, Syuhei Kurokawa, Tadakazu Miyashita, Tsutomu Yamazaki

ICPT 2014 - Proceedings of International Conference on Planarization/CMP Technology 2014　p. 142-146　2015/01/20　Research paper (international conference proceedings)
Publisher: Institute of Electrical and Electronics Engineers Inc.
触媒表面基準エッチング法における触媒機能活性化手法の開発

藤大雪, 礒橋藍, 稻田辰昭, 中平雄太, 松山智至, 佐野泰久, 山内和人

精密工学会学術講演会講演論文集　Vol. 2015A　p. 447-448　2015
Publisher: 公益社団法人精密工学会
A new mirror-like finish method for oxide materials by catalytically induced chemical etching in pure water

Ai Isohashi, Shun Sadakuni, Takahito Sugiura, Naotaka Kidani, Tatsuaki Inada, Wataru Yamaguchi, Koji Inagaki, Yasuhisa Sano, Kazuto Yamauchi

Proceedings of the 15th International Conference of the European Society for Precision Engineering and Nanotechnology, EUSPEN 2015　p. 345-346　2015　Research paper (international conference proceedings)
1次元Wolterミラー（Monolithic型）を用いた色収差のない結像型X線顕微鏡の開発

木野英俊, 松山智至, 岡田浩巳, 佐野泰久, 香村芳樹, 玉作賢治, 矢橋牧名, 津村尚史, 石川哲也, 山内和人

予稿集　2015/01
形状可変ミラーによる二段集光光学系の開発

後藤拓実, 中森紘基, 松山智至, 木村隆志, 佐野泰久, 香村芳樹, 玉作賢治, 矢橋牧名, 石川哲也, 山内和人

予稿集　2015/01
X線ミラー作製のためのビーム偏向制御を用いた数値制御イオンビーム加工装置の開発

山田純平, 松山智至, 佐野泰久, 山内和人

予稿集　2015/01
Sub-10 nm集光用X線ミラーのための高精度形状計測装置の開発

金章雨, 長平良綾香, 西原明彦, 松山智至, 佐野泰久, 山内和人

予稿集　2015/01
XFEL用集光ミラー用Pt/C多層膜の性能評価

長平良綾香, 金章雨, 小山貴久, 松山智至, 西原明彦, 湯本博勝, 佐野泰久, 大橋治彦, 後藤俊治, 矢橋牧名, 石川哲也, 山内和人

予稿集　2015/01
Formation of Pit-free Graphene Assisted by Plasma Oxidation on Flattened SiC Surface

Kenta Arima, Naoki Saito, Daichi Mori, Kentaro Kawai, Yasuhisa Sano, Kazuto Yamauchi, Morita Mizuho

Extended Abstracts of the 20th Workshop on Gate Stack Technology and Physics　p. 93-96　2015/01
Publisher: 応用物理学会
Improvement of I-V characteristics of Schottky barrier diode by 4H-SiC surface planarization

H. Fujiwara, A. Onogi, T. Katsuno, T. Morino, T. Endo, Y. Sano

Materials Science Forum　Vol. 821-823　p. 567-570　2015　Research paper (international conference proceedings)
Publisher: Trans Tech Publications Ltd
Planarization of 6-inch 4H-SiC wafer using catalyst-referred etching

A. Isohashi, Y. Sano, T. Kato, K. Yamauchi

Materials Science Forum　Vol. 821-823　p. 537-540　2015　Research paper (international conference proceedings)
Publisher: Trans Tech Publications Ltd
Plasma-based nanomanufacturing under atmospheric pressure

Kazuya Yamamura, Yasuhisa Sano

HandBook of Manufacturing Engineering and Technology　p. 1529-1547　2015/01/01　Part of collection (book)
Publisher: Springer-Verlag London Ltd
Basic study on etching selectivity of plasma chemical vaporization machining by introducing crystallographic damage into work surface

Yasuhisa Sano, Toshiro Doi, Syuhei Kurokawa, Hideo Aida, Osamu Ohnishi, Michio Uneda, Yuu Okada, Hiroaki Nishikawa, Kazuto Yamauchi

Key Engineering Materials　Vol. 625　p. 550-553　2015　Research paper (international conference proceedings)
Publisher: Trans Tech Publications Ltd
Optimization of Machining Conditions of Basic-Type CMP/P-CVM Fusion Processing Using SiC Substrate

Yasuhisa Sano, Kousuke Shiozawa, Toshiro Doi, Syuhei Kurokawa, Hideo Aida, Koki Oyama, Tadakazu Miyashita, Haruo Sumizawa, Kazuto Yamauchi

2015 INTERNATIONAL CONFERENCE ON PLANARIZATION/CMP TECHNOLOGY (ICPT)　2015　Research paper (international conference proceedings)
Numerically controlled atmospheric-pressure plasma sacrificial oxidation using electrode arrays for improving silicon-on-insulator layer uniformity

H. Takei, K. Yoshinaga, S. Matsuyama, K. Yamauchi, Y. Sano

Japanese Journal of Applied Physics　Vol. 54　No. 1S　2015/01　Research paper (scientific journal)
Publisher: Institute of Physics
Aggregation of carbon atoms at SiO2/SiC(0001) interface by plasma oxidation toward formation of pit-free graphene

Naoki Saito, Daichi Mori, Akito Imafuku, Keisuke Nishitani, Hiroki Sakane, Kentaro Kawai, Yasuhisa Sano, Mizuho Morita, Kenta Arima

Carbon　Vol. 80　p. 440-445　2014/12　Research paper (scientific journal)
Development of a one-dimensional two-stage focusing system with two deformable mirrors

T. Goto, S. Matsuyama, H. Nakamori, T. Kimura, Y. Sano, Y. Kohmura, K. Tamasaku, M. Yabashi, T. Ishikawa, K. Yamauchi

Proceedings of SPIE　Vol. 9208　2014/10　Research paper (international conference proceedings)
Development of hard X-Ray split-delay optics based on Si(220) crystals

Taito Osaka, Takashi Hirano, Yuichi Inubushi, Makina Yabashi, Yasuhisa Sano, Satoshi Matsuyama, Kensuke Tono, Takahiro Sato, Kanade Ogawa, Tetsuya Ishikawa, Kazuto Yamauchi

JSAP-OSA Joint Symposia, JSAP 2014　2014/09/01　Research paper (international conference proceedings)
Publisher: Optical Society of America (OSA)
位相回折格子を用いたX線レーザーナノビームの高精度波面計測

西原明彦, 松山智至, 金章雨, 長平良綾香, 湯本博勝, 三村秀和, 小山貴久, 登野健介, 犬伏雄一, 佐藤尭洋, 片山拓也, 富樫格, 矢代航, 佐野泰久, 大橋治彦, 百生敦, 後藤俊治, 矢橋牧名, 石川哲也, 山内和人

アブストラクト集　p. 281-282　2014/09
Ion Beam Figuringを用いた高精度X線ミラーの作製（第6報）～静電偏向制御による数値制御加工～

山田純平, 松山智至, 佐野泰久, 山内和人

アブストラクト集　p. 283-284　2014/09
Development of high-precision figure measurement system for x-ray optics using laser focus microscope

J. Kim, S. Matsuyama, Y. Sano, K. Yamauchi

Technical program　p. 188-188　2014/08　Research paper (international conference proceedings)
Development of a two-stage x-ray focusing system with ultraprecise deformable mirrors

T. Goto, S. Matsuyama, H. Nakamori, T. Kimura, Y. Sano, Y. Kohmura, K. Tamasaku, M. Yabashi, T. Ishikawa, K. Yamauchi

Technical program　p. 193-193　2014/08　Research paper (international conference proceedings)
Development of achromatic full-field hard x-ray microscopy with ultraprecise total reflection mirrors

S. Masuyama, Y. Emi, H. Kino, Y. Sano, Y. Kohmura, T. Ishikawa, K. Yamauchi

Technical program　p. 192-192　2014/08　Research paper (international conference proceedings)
Development of split-delay x-ray optics using Si(220) crystals at SACLA

T. Osaka, T. Hirano, M. Yabashi, Y. Sano, K. Tono, Y. Inubushi, T. Sato, K. Ogawa, S. Matsuyama, T. Ishikawa, K. Yamauchi

Technical program　Vol. 9210　p. 198-198　2014/08　Research paper (international conference proceedings)
Removal Rate of Plasma Chemical Vaporization Machining of Intentionally Damaged Surface by Mechanical Action

K. Shiozawa, Y. Sano, T. Doi, S. Kurokawa, H. Aida, O. Ohnishi, M. Uneda, Y. Okada, K. Yamauchi

15th International Conference on Precision Engineering (ICPE2014), Abstracts, pp. 53, P22　p. 53-53　2014/07　Research paper (international conference proceedings)
Removal Mechanism in Catalyst-Referred Etching Process for SiC Planarization

P. V. Bui, K. Inagaki, Y. Sano, K. Yamauchi, Y. Morikawa

15th International Conference on Precision Engineering (ICPE2014), Abstracts, pp. 50, P05　p. 50-50　2014/07　Research paper (international conference proceedings)
Improving the Accuracy of Numerically Controlled Sacrificial Plasma Oxidation Using an Array of Electrodes to Produce Ultra-uniform SOI

H. Takei, S. Kurio, Y. Sano, S. Matsuyama, K. Yamauchi

15th International Conference on Precision Engineering (ICPE2014), Abstracts, pp. 32, B15　p. 32-32　2014/07　Research paper (international conference proceedings)
A novel abrasive-free chemical planarization of oxide materials using pure water and Pt catalyst

T. Sugiura, A. Isohashi, W. Yamaguchi, S. Matsuyama, Y. Sano, K. Yamauchi

Extended Abstracts of European society for precision engineering & nanotechnology 2014　p. 351-354　2014/06　Research paper (international conference proceedings)
Combination of Plasma Oxidation and Wet Etching to Create Monolayer-scale C Source for Pit-free Graphene on SiC Surfaces

Kenta Arima, Naoki Saito, Daichi Mori, Kentaro Kawai, Mizuho Morita, Yasuhisa Sano

Program of Collaborative Conference on 3D&Materials Research 2014　p. 248-249　2014/06
Dependence of GaN Removal Rate of Plasma Chemical Vaporization Machining on Mechanically Introduced Damage

Y. Sano, T. K. Doi, S. Kurokawa, H. Aida, O. Ohnishi, M. Ueda, K. Shiozawa, Y. Okada, K. Yamauchi

Sensors and Materials　Vol. 26　No. 6　p. 429-434　2014/06　Research paper (scientific journal)
Accumulation of C Atoms at SiO2/SiC Interface by Plasma Oxidation of 4H-SiC(0001) at Room Temperature: Toward Formation of PIt-Free Graphene

Kenta Arima, Naoki Saito, Kentaro Kawai, Yasuhisa Sano, Mizuho Morita

Program of 2014 MRS Spring Meeting & Exhibit　2014/04
Publisher: Materials Research Society
Generation of 1020 W/cm2 Hard X-ray Laser Pulses with Two-Stage Reflective Focusing System

H. Mimura, H. Yumoto, S. Matsuyama, T. Koyama, K. Tono, Y. Inubushi, T. Togashi, T. Sato, J. Kim, R. Fukui, Y. Sano, M. Yabashi, H. Ohashi, T. Ishikawa, K. Yamauchi

Nature Communications　Vol. 5　2014/04　Research paper (scientific journal)
Dicing of SiC wafer by atmospheric-pressure plasma etching process with slit mask for plasma confinement

Y. Sano, H. Nishikawa, Y. Okada, K. Yamamura, S. Matsuyama, K. Yamauchi

Materials Science Forum　Vol. 778-780　p. 759-762　2014/02　Research paper (scientific journal)
Thinning of a two-inch silicon carbide wafer by plasma chemical vaporization machining using a slit electrode

Y. Okada, H. Nishikawa, Y. Sano, K. Yamamura, K. Yamauchi

Materials Science Forum　Vol. 778-780　p. 750-753　2014/02　Research paper (scientific journal)
4H-SiC planarization using catalyst-referred etching with pure water

A. Isohashi, Y. Sano, S. Sadakuni, K. Yamauchi

Materials Science Forum　Vol. 778-780　p. 722-725　2014/02　Research paper (scientific journal)
Investigation of the Barrier Heights for Dissociative Adsorption of HF on SiC Surfaces in the Catalyst-Referred Etching Process

P. V. Bui, K. Inagaki, Y. Sano, K. Yamauchi, Y. Morikawa

Materials Science Forum　Vol. 778-780　p. 726-729　2014/02　Research paper (scientific journal)
Planarization of the gallium nitride substrate grown by the Na flux method applying catalyst-referred etching

W. Yamaguchi, S. Sadakuni, A. Isohashi, H. Asano, Y. Sano, M. Imade, M. Maruyama, M. Yoshimura, Y. Mori, K. Yamauchi

Materials Science Forum　Vol. 778-780　p. 1193-1196　2014/02　Research paper (scientific journal)
Pit-free Graphene Growth on SiC Surface Assisted by Plasma Oxidation at Near Room Temperature

Naoki Saito, Akito Imafuku, Hiroaki Nishikawa, Kentaro Kawai, Yasuhisa Sano, Mizuho Morita, Kenta Arima

Extended Abstracts of the 19th Workshop on Gate Stack Technology and Physics　2014/01
Publisher: The Japan Society of Applied Physics
Approach to high efficient CMP for power device substrates

S. Kurokawa, T. K. Doi, C. Wang, Y. Sano, H. Aida, K. Oyama, K. Takahashi

ECS Transactions　Vol. 60　No. 1　p. 641-646　2014　Research paper (international conference proceedings)
Publisher: Electrochemical Society Inc.
Development of Basic-Type CMP/P-CVM Fusion Processing System (Type A) and Its Fundamental Characteristics

Kousuke Shiozawa, Yasuhisa Sano, Toshiro Doi, Syuhei Kurokawa, Hideo Aida, Koki Oyama, Tadakazu Miyashita, Haruo Sumizawa, Kazuto Yamauchi

2014 INTERNATIONAL CONFERENCE ON PLANARIZATION/CMP TECHNOLOGY (ICPT)　p. 275-278　2014　Research paper (international conference proceedings)
Atomic scale flattening of gallium nitride substrate grown by Na flux method applying catalyst-referred etching

Wataru Yamaguchi, Shun Sadakuni, Ai Isohashi, Hiroya Asano, Yasuhisa Sano, Mamoru Imade, Mihoko Maruyama, Masashi Yoshimura, Yusuke Mori, Kazuto Yamauchi

2014 INTERNATIONAL CONFERENCE ON PLANARIZATION/CMP TECHNOLOGY (ICPT)　p. 337-339　2014　Research paper (international conference proceedings)
Novel Chemical Mechanical Polishing/Plasma-Chemical Vaporization Machining (CMP/P-CVM) Combined Processing of Hard-to-Process Crystals Based on Innovative Concepts

Toshiro K. Doi, Yasuhisa Sano, Syuhei Kurowaka, Hideo Aida, Osamu Ohnishi, Michio Uneda, Koki Ohyama

SENSORS AND MATERIALS　Vol. 26　No. 6　p. 403-415　2014　Research paper (scientific journal)
Planarization of 4H-SiC(0001) by Catalyst-Referred Etching Using Pure Water Etchant

Ai Isohashi, Yasuhisa Sano, Kazuto Yamauchi

2014 INTERNATIONAL CONFERENCE ON PLANARIZATION/CMP TECHNOLOGY (ICPT)　p. 273-274　2014　Research paper (international conference proceedings)
Enhancement of photoluminescence efficiency from GaN(0001) by surface treatments

A. N. Hattori, K. Hattori, Y. Morikawa, A. Yamamoto, S. Sadakuni, J. Murata, K. Arima, Y. Sano, K. Yamauchi, H. Daimon, K. Endo

Japanese Journal of Applied Physics　Vol. 53　No. 2　2014/01　Research paper (scientific journal)
Two-dimensional X-ray nanofocusing using piezoelectric deformable mirrors

H. Nakamori, S. Matsuyama, T. Goto, T. Kimura, Y. Sano, Y. Kohmura, K. Tamasaku, M. Yabashi, T. Ishikawa, K. Yamauchi

The 12th symposium on X-ray Imaging Optics, Abstract　p. 99-100　2013/11
Development of one-dimensional Wolter Mirror figured on a single substrate for full-field X-ray microscopy

H. Kino, S. Matsuyama, Y. Emi, H. Okada, Y. Sano, K. Yamauchi

The 12th symposium on X-ray Imaging Optics, Abstract　p. 93-94　2013/11
Fabrication of Thin Si Crystal for X-Ray Beam Splitter

T. Osaka, M. Yabashi, Y. Sano, K. Tono, Y. Inubushi, T. Sato, S. Matsuyama, T. Ishikawa, K. Yamauchi

28th The American Society for Precision Engineering Annual Meeting, Extended Abstracts　2013/10　Research paper (international conference proceedings)
Wet Chemical Planarization of Single-Crystalline SiC Using Catalyst-Referred Etching

A. Isohashi, Y. Sano, T. Okamoto, S. Sadakuni, P. V. Bui, K. Yagi, K. Yamauchi

28th The American Society for Precision Engineering Annual Meeting, Extended Abstracts　2013/10　Research paper (international conference proceedings)
Thin crystal development and applications for hard x-ray free-electron lasers

T. Osaka, M. Yabashi, Y. Sano, K. Tono, Y. Inubushi, T. Sato, K. Ogawa, S. Matsuyama, T. Ishikawa, K. Yamauchi

Proceedings of SPIE　Vol. 8848　2013/09　Research paper (international conference proceedings)
Development of achromatic full-field x-ray microscopy with compact imaging mirror system

S. Matsuyama, Y. Emi, H. Kino, Y. Sano, Y. Kohmura, K. Tamasaku, M. Yabashi, T. Ishikawa, K. Yamauchi

Proc. SPIE　Vol. 8851　2013/09　Research paper (scientific journal)
Damage characteristics of platinum/carbon multilayers under x-ray free-electron laser irradiation

J. Kim, T. Koyama, H. Yumoto, A. Nagahira, S. Matsuyama, Y. Sano, M. Yabashi, H. Ohashi, T. Ishikawa, K. Yamauchi

Proc. SPIE　Vol. 8848　2013/09　Research paper (scientific journal)
Planarization of SiC and GaN Wafers Using Polishing Technique Utilizing Catalyst Surface Reaction

Y. Sano, K. Arima, K. Yamauchi

ECS Journal of Solid State Science and Technology　Vol. 2　No. 8　p. N3028-N3035　2013/06　Research paper (scientific journal)
Nanofocusing and single shot wavefront diagnosis of SACLA

K. Yamauchi, M. Yabashi, H. Mimura, H. Yumoto, T. Koyama, K. Tono, T. Togashi, Y. Inubushi, T. Sato, T. Katayama, S. Matsuyama, J. Kim, R. Fukui, Y. Sano, W. Yashiro, T. Ohmori, S. Goto, H. Ohashi, A. Momose, T. Ishikawa

SPIE Optics+Optelectronics, Technical Abstracts　2013/04　Research paper (international conference proceedings)
X-ray nanofocusing using a piezoelectric deformable mirror and at-wavelength metrology methods

H. Nakamori, S. Matsuyama, S. Imai, T. Kimura, Y. Sano, Y. Kohmura, T. Kenji, M. Yabashi, T. Ishikawa, K. Yamauchi

Nuclear Inst. and Methods in Physics Research, A　Vol. 710　p. 93-97　2013/04　Research paper (scientific journal)
Ion Beam Figuring を用いた高精度Ｘ線ミラーの作製第 5 報－X線集光ミラーの作製－

松山智至, 北村真一, 佐野泰久, 山内和人

2013年度精密工学会春季大会プログラム＆アブストラクト集　2013/03
大変形可能な硬X線集光用形状可変ミラーの開発－シミュレーションによる設計指針の検討－

後藤拓実, 中森紘基, 松山智至, 今井将太, 木村隆志, 佐野泰久, 香村芳樹, 石川哲也, 山内和人

2013年度精密工学会春季大会プログラム＆アブストラクト集　2013/03
Bias-Assisted Photochemical Planarization of GaN(0001) Substrate with Damage Layer

S. Sadakuni, J. Murata, Y. Sano, K. Yagi, S. Matsuyama, K. Yamauchi

Japanese Journal of Applied Physics　Vol. 52　No. 3R　p. 036504-1-4　2013/03　Research paper (scientific journal)
Publisher: The Japan Society of Applied Physics
A Bragg beam splitter for hard x-ray free-electron lasers

T. Osaka, M. Yabashi, Y. Sano, K. Tono, Y. Inubushi, T. Sato, S. Matsuyama, T. Ishikawa, K. Yamauchi

Optics Express　Vol. 21　No. 3　p. 2823-2831　2013/02　Research paper (scientific journal)
X線自由電子レーザー集光用Pt/C多層膜の性能評価

金章雨, 福井亮介, 松山智至, 小山貴久, 湯本博勝, 佐野泰久, 大橋治彦, 後藤俊治, 矢橋牧名, 石川哲也, 山内和人

2013/01
X線回折格子を用いたXFELナノビームのワンショット波面計測

福井亮介, 松山智至, 金章雨, 湯本博勝, 三村秀和, 小山貴久, 登野健介, 犬伏雄一, 佐藤尭洋, 片山哲夫, 富樫格, 矢代航, 佐野泰久, 大橋治彦, 百生敦, 後藤俊治, 矢橋牧名, 石川哲也, 山内和人

2013/01
Micro-focusing of hard x-ray free electron laser radiation using Kirkpatrick-Baez mirror system

H. Yumoto, H. Mimura, S. Matsuyama, T. Koyama, Y. Hachisu, T. Kimura, H. Yokoyama, J. Kim, Y. Sano, K. Tono, T. Togashi, Y. Inubushi, T. Sato, T. Tanaka, M. Yabashi, H. Ohashi, H. Ohmori, T. Ishikawa, K. Yamauchi

11TH INTERNATIONAL CONFERENCE ON SYNCHROTRON RADIATION INSTRUMENTATION (SRI 2012)　Vol. 425　2013　Research paper (international conference proceedings)
Advanced Kirkpatrick-Baezミラー光学系を用いた色収差のない結像型硬X線顕微鏡の開発

恵美陽治, 松山智至, 佐野泰久, 香村芳樹, 玉作賢治, 矢橋牧名, 石川哲也, 山内和人

第25回日本放射光学会年会・放射光科学合同シンポジウム　2013/01　Research paper (other academic)
Epitaxial Graphene Growth on Atomically Flattened SiC Assisted by Plasma Oxidation at 1000°C

Naoki Saito, Hiroaki Nishikawa, Yasuhisa Sano, Kentaro Kawai, Junichi Uchikoshi, Kazuto Yamauchi, Mizuho Morita, Kenta Arima

Program and Abstracts of 8th Handai Nanoscience and Nanotechnology International Symposium　2012/12
Adsorption of hydrogen fluoride on SiC surfaces: A density functional theory study

Pho Van Bui, K. Inagaki, Y. Sano, K. Yamauchi, Y. Morikawa

Current Appl. Phys.　Vol. 12　p. S42-S46　2012/12　Research paper (scientific journal)
Focusing of X-ray free-electron laser pulses with reflective optics

Hirokatsu Yumoto, Hidekazu Mimura, Takahisa Koyama, Satoshi Matsuyama, Kensuke Tono, Tadashi Togashi, Yuichi Inubushi, Takahiro Sato, Takashi Tanaka, Takashi Kimura, Hikaru Yokoyama, Jangwoo Kim, Yasuhisa Sano, Yousuke Hachisu, Makina Yabashi, Haruhiko Ohashi, Hitoshi Ohmori, Tetsuya Ishikawa, Kazuto Yamauchi

Nature Photonics　Vol. 7　No. 1　p. 43-47　2012/12　Research paper (scientific journal)
Improvement of interface roughness in platinum/carbon multilayers for X-ray mirrors

J. Kim, S. Matsuyama, Y. Sano, K. Yamauchi

Key Engineering Materials　Vol. 523-524　p. 1076-1079　2012/11　Research paper (scientific journal)
Development of an ultraprecise piezoelectric deformable mirror for adaptive X-ray optics

Hiroki Nakamori, Satoshi Matsuyama, Shota Imai, Takashi Kimura, Yasuhisa Sano, Yoshiki Kohmura, Kenji Tamasaku, Makina Yabashi, Tetsuya Ishikawa, Kazuto Yamauchi

Key Engineering Materials　Vol. 523-524　p. 50-+　2012/11　Research paper (scientific journal)
Fabrication of ultraprecise X-ray mirrors by ion beam figuring system: Fabrication and evaluation of aspheric shape on silicon surface

Shinichi Kitamura, Satoshi Matsuyama, Yasuhisa Sano, Kazuto Yamauchi

Extended Abstracts of 5th International Symposium on Atomically Controlled Fabrication Technology　2012/10　Research paper (international conference proceedings)
Development of ultraprecise piezoelectric deformable mirror for adaptive X-ray focusing

Hiroki Nakamori, Satoshi Matsuyama, Shota Imai, Takashi Kimura, Yasuhisa Sano, Yoshiki Kohmura, Kenji Tamasaku, Makina Yabashi, Tetsuya Ishikawa, Kazuto Yamauchi

Extended Abstracts of 5th International Symposium on Atomically Controlled Fabrication Technology　2012/10　Research paper (international conference proceedings)
Development of one-dimensional Wolter mirror figured on a single substrate for full-field X-ray microscopy

Satoshi Matsuyama, Yoji Emi, Yasuhisa Sano, Kazuto Yamauchi

Extended Abstracts of 5th International Symposium on Atomically Controlled Fabrication Technology　2012/10　Research paper (international conference proceedings)
Study of Pt/C multilayers for X-ray mirrors improvement of reflectivity

J. Kim, A. Nagahira, S. Matsuyama, Y. Sano, K. Yamauchi

Extended Abstracts of 5th International Symposium on Atomically Controlled Fabrication Technology　2012/10　Research paper (international conference proceedings)
Analysis of Enhanced Oxygen Reduction Reaction on Ge(100) Surface in Water Toward Metal-free Machining Process

Atsushi Mura, Yoshie Kawai, Tatsuya Kawase, Kentaro Kawai, Yasuhisa Sano, Junichi Uchikoshi, Kazuto Yamauchi, Mizuho Morita, Kenta Arima

Extended Abstracts of Fifth International Symposium on Atomically Controlled Fabrication Technology　2012/10
Low Temparature Growth of Graphene on Atomically Flat SiC Assited by Plasma Oxidation

Kenta Arima, Naoki Saito, Hiroaki Nishikawa, Yasuhisa Sano, Kentaro Kawai, Junichi Uchikoshi, Kazuto Yamauchi, Mizuho Morita

Extended Abstracts of Fifth International Symposium on Atomically Controlled Fabrication Technology　2012/10
Ion Beam Figuring を用いた高精度Ｘ線ミラーの作製第 4 報 ―シリコン表面に対する非球面形状の作製と評価―

北村真一, 松山智至, 佐野泰久, 山内和人

2012/09
硬Ｘ線集光用形状可変ミラーの開発－形状可変ミラー変形性能の評価－

中森紘基, 松山智至, 今井将太, 木村隆志, 佐野泰久, 香村芳樹, 玉作賢治, 矢橋牧名, 石川哲也, 山内和人

2012/09
A Study of Terminated Species on 4H-SiC (0001) Surfaces Planarized using Hydrofluoric Acid

P. V. Bui, S. Sadakuni, T. Okamoto, K. Arima, Y. Sano, K. Yamauchi

2012/09　Research paper (international conference proceedings)
Low temperature growth of graphene on 4H-SiC(0001) flattened by catalyst-assisted etching in HF solution

K. Arima, K. Nishitani, N. Saito, K. Kawai, J. Uchikoshi, K. Yamauchi, Y. Sano, M. Morita

Abstract book of 24th General Conference of the Condensed Matter Division of the European Physical Society held jointly with 29th European Conference on Surface Science　2012/09
Publisher: Institute of Physics
Basic experiment on atmospheric-pressure plasma etching with slit aperture for high-efficiency dicing of SiC wafer

Yasuhisa Sano, Hiroaki Nishikawa, Kohei Aida, Chaiyapat Tangpatjaroen, Kazuya Yamamura, Satoshi Matsuyama, Kazuto Yamauchi

SILICON CARBIDE AND RELATED MATERIALS 2012　Vol. 740-742　p. 813-+　2012/09　Research paper (international conference proceedings)
Development of piezoelectric deformable mirror for hard X-ray nanofocusing

S. Matsuyama, T. Kimura, H. Nakamori, S. Imai, H. Yokoyama, J. Kim, R. Fukui, H. Mimura, Y. Sano, Y. Kohmura, K. Tamasaku, M. Yabashi, T. Ishikawa, K. Yamauchi

Technical Program　Vol. 8503　2012/08　Research paper (international conference proceedings)
Plasma Chemical Vaporization Machining of Silicon Carbide Wafer Using Flat-bar Electrode with Multiple Gas Nozzles

Y. Sano, K. Aida, H. Nishikawa, K. Yamamura, S. Matsuyama, K. Yamauchi

Advanced Materials Research　2012/08　Research paper (scientific journal)
Improved reflectivity of platinum/carbon multilayers for X-ray mirrors by carbon doping into platinum layer

J. Kim, H. Yokoyama, S. Matsuyama, Y. Sano, K. Yamauchi

Current Applied Physics　Vol. 12　p. S20-S23　2012/07　Research paper (scientific journal)
Fabrication of a Bragg beam splitter for hard X-ray free-electron laser

OSAKA Taito, YABASHI Makina, SANO Yasuhisa, TONO Kensuke, INUBUSHI Yuichi, SATO Takahiro, MATSUYAMA Satoshi, ISHIKAWA Tetsuya, YAMAUCHI Kazuto

11TH INTERNATIONAL CONFERENCE ON SYNCHROTRON RADIATION INSTRUMENTATION (SRI 2012)　Vol. 425　2012/07　Research paper (international conference proceedings)
Structural and chemical characteristics of atomically smooth GaN surfaces prepared by abrasive-free polishing with Pt catalyst

Murata Junji, Sadakuni Shun, Okamoto Takeshi, Hattori Azusa N, Yagi Keita, Sano Yasuhisa, Arima Kenta, Yamauchi Kazuto

JOURNAL OF CRYSTAL GROWTH　Vol. 349　No. 1　p. 83-88　2012/06/15
Experimental and simulation study of undesirable short-period deformation in piezoelectric deformable x-ray mirrors

Hiroki Nakamori, Satoshi Matsuyama, Shota Imai, Takashi Kimura, Yasuhisa Sano, Yoshiki Kohmura, Kenji Tamasaku, Makina Yabashi, Tetsuya Ishikawa, Kazuto Yamauchi

Review of Scientific Instruments　Vol. 83　No. 5　2012/05　Research paper (scientific journal)
Hard-X-ray imaging optics based on four aspherical mirrors with 50 nm resolution

Satoshi Matsuyama, Naotaka Kidani, Hidekazu Mimura, Yasuhisa Sano, Yoshiki Kohmura, Kenji Tamasaku, Makina Yabashi, Tetsuya Ishikawa, Kazuto Yamauchi

Optics Express　2012/04　Research paper (scientific journal)
Improvement of Removal Rate in Abrasive-Free Planarization of 4H-SiC Substrates Using Catalytic Platinum and Hydrofluoric Acid

Takeshi Okamoto, Yasuhisa Sano, Kazuma Tachibana, Bui Van Pho, Kenta Arima, Kouji Inagaki, Keita Yagi, Junji Murata, Shun Sadakuni, Hiroya Asano, Ai Isohashi, Kazuto Yamauchi

Japanese Journal of Applied Physics　Vol. 51　No. 4　p. 46501-046501-4　2012/04　Research paper (scientific journal)
Publisher: The Japan Society of Applied Physics
Atomically Smooth Gallium Nitride Surfaces Prepared by Chemical Etching with Platinum Catalyst in Water

Junji Murata, Takeshi Okamoto, Shun Sadakuni, Azusa N. Hattori, Keita Yagi, Yasuhisa Sano, Kenta Arima, Kazuto Yamauchi

Journal of Electrochemical Society　2012/04　Research paper (scientific journal)
PtC/C多層膜を用いた硬X線集光用ミラーの反射率改善

金章雨, 横山光, 松山智至, 佐野泰久, 山内和人

2012年度精密工学会春季大会プログラム＆アブストラクト集　2012/03　Research paper (other academic)
硬X線集光用形状可変ミラーの開発－SPring-8での集光特性－

松山智至, 中森紘基, 今井将太, 横山光, 木村隆志, 佐野泰久, 香村芳樹, 石川哲也, 山内和人

2012年度精密工学会春季大会プログラム＆アブストラクト集　2012/03　Research paper (other academic)
Ion Beam Figuringを用いた高精度X線ミラーの作製第3報－シリコン表面に対する楕円形状の作製と評価－

北村真一, 松山智至, 佐野泰久, 山内和人

2012年度精密工学会春季大会プログラム＆アブストラクト集　2012/03　Research paper (other academic)
High-resolution TEM observation of 4H-SiC (0001) surface planarized by catalyst-referred etching

Bui Van Pho, Shun Sadakuni, Takeshi Okamoto, Ryusuke Sagawa, Kenta Arima, Yasuhisa Sano, Kazuto Yamauchi

Materials Science Forum　Vol. 717-720　p. 873-876　2012　Research paper (international conference proceedings)
Publisher: Trans Tech Publications Ltd
回折限界下で集光径可変なミラー集光光学系の開発

松山智至, 木村隆志, 中森紘基, 今井将太, 香村芳樹, 玉作賢治, 矢橋牧名, 石川哲也, 西野吉則, 山内和人

第25回日本放射光学会年会・放射光科学合同シンポジウム　2012/01
Rapid planarization method by ultraviolet light irradiation for gallium nitride using platinum catalyst

Hiroya Asano, Shun Sadakuni, K. Yagi, Y. Sano, S. Matsuyama, T. Okamoto, K. Tachibana, K. Yamauchi

EMERGING TECHNOLOGY IN PRECISION ENGINEERING XIV　Vol. 523-524　p. 46-+　2012　Research paper (international conference proceedings)
First-Principles Study of Reaction Process of SiC and HF Molecules in Catalyst-Referred Etching

Pho Van Bui, Kouji Inagaki, Yasuhisa Sano, Kazuto Yamauchi, Yoshitada Morikawa

EMERGING TECHNOLOGY IN PRECISION ENGINEERING XIV　Vol. 523-524　p. 173-177　2012　Research paper (international conference proceedings)
Fabrication of ultrathin Bragg beam splitter by plasma chemical vaporization machining

T. Osaka, M. Yabashi, Y. Sano, K. Tono, Y. Inubushi, T. Sato, S. Matsuyama, T. Ishikawa, K. Yamauchi

EMERGING TECHNOLOGY IN PRECISION ENGINEERING XIV　Vol. 523-524　p. 40-+　2012　Research paper (international conference proceedings)
Improving the Accuracy of Numerically Controlled Sacrificial Plasma Oxidation Using Array of Electrodes to Improve the Thickness Uniformity of SOI

H. Takei, K. Yoshinaga, Y. Sano, S. Matsuyama, K. Yamauchi

IEEE INTERNATIONAL SOI CONFERENCE　2012　Research paper (international conference proceedings)
Atomically controlled chemical polishing of GaN using platinum and hydrofluoric acid

Shun Sadakuni, Junji Murata, Yasuhisa Sano, Keita Yagi, Takeshi Okamoto, Kazuma Tachibana, Hiroya Asano, Kazuto Yamauchi

PHYSICA STATUS SOLIDI C: CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 9, NO 3-4　Vol. 9　No. 3-4　p. 433-435　2012　Research paper (international conference proceedings)
Shape correction of optical surfaces using plasma chemical vaporization machining with a hemispherical tip electrode

Hideo Takino, Kazuya Yamamura, Yasuhisa Sano, Yuzo Mori

Applied Optics 51 (2012) 401-407.　2012/01　Research paper (scientific journal)
開口シフトを用いた位相回復計算による硬X線集光光学素子の波面収差算出法の開発

横山光, 三村秀和, 木村隆志, 今井将太, 松山智至, 佐野泰久, 香村秀樹, 玉作賢治, 矢橋牧名, 石川哲也, 山内和人

第25回日本放射光学会年会・放射光科学合同シンポジウム　2012/01　Research paper (other academic)
アダプティブ集光光学系のための高精度形状可変ミラーの作成と評価

中森紘基, 松山智至, 今井将太, 横山光, 木村隆志, 三村秀和, 佐野泰久, 香村芳樹, 玉作賢治, 矢橋牧名, 石川哲也, 山内和人

第25回日本放射光学会年会・放射光科学合同シンポジウム　2012/01　Research paper (other academic)
PtC/C多層膜を用いたX線集光用ミラーの反射率改善

金章雨, 横山光, 松山智至, 佐野泰久, 香村芳樹, 玉作賢治, 矢橋牧名, 石川哲也, 山内和人

第25回日本放射光学会年会・放射光科学合同シンポジウム　2012/01　Research paper (other academic)
Back-side thinning of silicon carbide wafer by plasma etching using atmospheric-pressure plasma

Y. Sano, K. Aida, H. Nishikawa, K. Yamamura, S. Matsuyama, K. Yamauchi

Abstracts of 4th International Conference of Asian Society for Precision Engineering and Nanotechnology, 72　Vol. 516　p. 108-+　2011/11　Research paper (international conference proceedings)
Determination of Had X-ray Focusing Mirror Aberration using Phase Retrieval with Transverse Translation Diversity

H. Yokoyama, T. Kimura, H. Mimura, S. Imai, S. Matsuyama, Y. Kohmura, T. Ishikawa, K. Yamauchi

Extended Abstracts of 4th International Symposium on Atomically Controlled Fabrication Technology　2011/11
Development of an ultra-precise deformable mirror for hard X-ray nanofocusing

Hiroki Nakamori, Satoshi Matsuyama, Takashi Kimura, Shouta Imai, Yoshiki Kohmura, Tetsuya Ishikawa, Yoshinori Nishino, Kazuto Yamauchi

Program of 7th Handai Nanoscience and Nanotechnology International Symposium　2011/11
Development of an adaptive hard X-ray focusing system with adaptive mirrors

S. Imai, S. Matsuyama, H. Nakamori, T. Kimura, H. Yokoyama, H. Mimura, Y. Sano, Y. Kohmura, T. Ishikawa, K. Yamauchi

Extended Abstracts of 4th International Symposium on Atomically Controlled Fabrication Technology　2011/11
Development of an Adaptive X-Ray Focusing Mirror with Large NA -Evaluation of Reproducibility of Deformable Mirror-

H. Nakamori, S. Matsuyama, S. Imai, H. Yokoyama, T. Kimura, H. Mimura, Y. Sano, Y. Kohmura, T. Ishikawa, K. Yamauchi

Extended Abstracts of 4th International Symposium on Atomically Controlled Fabrication Technology　2011/11
KBミラー光学系を用いた硬X線二次元Sub-10nm集光システムの開発

横山光, 三村秀和, 木村隆志, 今井将太, 松山智至, 佐野泰久, 香村秀樹, 玉作賢治, 矢橋牧名, 石川哲也, 山内和人

プログラム予稿集第11回X線結像光学シンポジウム　2011/11　Research paper (other academic)
Development of Hard X-ray Imaging Optics for Achromatic Full-Field X-ray Microscopy

Satoshi Matsuyama, Naotaka Kidani, Yoji Emi, Yasuhisa Sano, Yoshiki Kohmura, Tetsuya Ishikawa, Kazuto Yamauchi

Extended Abstracts of 4th International Symposium on Atomically Controlled Fabrication Technology　2011/11
Reflectivity improvement using PtC/C multilayers for X-ray mirrors

Jangwoo Kim, Hikaru Yokoyama, Satoshi Matsuyama, Yasuhisa Sano, Kazuto Yamauchi

Extended Abstracts of 4th International Symposium on Atomically Controlled Fabrication Technology　2011/11
Cutting of SiC substrates by atmospheric-pressure plasma etching with slit mask for plasma confinement

H. Nishikawa, Y. Sano, K. Aida, T. Chaiyapat, K. Yamamura, S. Matsuyama, K. Yamauchi

Abstracts of The 33rd International Symposium on Dry Process, 35-36.　2011/11　Research paper (international conference proceedings)
硬X線集光用形状可変ミラーの開発－変形再現性の評価―

中森紘基, 松山智至, 今井将太, 横山光, 木村隆志, 三村秀和, 佐野泰久, 香村芳樹, 石川哲也, 山内和人

2011年度精密工学会秋季大会学術講演会アブストラクト集　2011/09　Research paper (other academic)
IBF(Ion Beam Figuring)を用いた高精度X線ミラーの作製 ―シリコン表面の加工特性とビームの安定性の評価―

北村真一, 松山智至, 佐野泰久, 山内和人

2011年度精密工学会秋季大会学術講演会アブストラクト集　2011/09　Research paper (other academic)
硬X線集光用多層膜ミラーの開発

金章雨, 横山光, 松山智至, 三村秀和, 佐野泰久, 香村芳樹, 石川哲也, 山内和人

2011年度精密工学会秋季大会学術講演会アブストラクト集　2011/09　Research paper (other academic)
Mechanism of atomic-scale passivation and flattening of semiconductor surfaces by wet-chemical preparations

Kenta Arima, Katsuyoshi Endo, Kazuto Yamauchi, Kikuji Hirose, Tomoya Ono, Yasuhisa Sano

Journal of Physics: Condensed Matter　Vol. 23　No. 39　p. 394202 1-394202 14　2011/09　Research paper (scientific journal)
Publisher: IOP Publishing
Development of a one-dimensional Wolter mirror for achromatic full-field X-ray microscopy

S. Matsuyama, N. Kidani, H. Mimura, J. Kim, Y. Sano, K. Tamasaku, Y. Kohmura, M. Yabashi, T. Ishikawa, K. Yamauchi

Proc. SPIE　Vol. 8139　2011/08　Research paper (international conference proceedings)
Development of hard x-ray imaging optics with four aspherical mirrors

S. Matsuyama, N. Kidani, H. Mimura, Y. Sano, K. Tamasaku, Y. Kohmura, M. Yabashi, T. Ishikawa, K. Yamauchi

SPIE Optics+Photonics, Technical Program　Vol. 2011　p. 469-470　2011/08　Research paper (international conference proceedings)
Publisher: The Japan Society for Precision Engineering
Influence of gallium additives on surface roughness for photoelectrochemical planarization of GaN

S. Sadakuni, J. Murata, K. Yagi, Y. Sano, K. Arima, T. Okamoto, K. Tachibana, K. Yamauchi

Physica Status Solidi C　Vol. 8　No. 7-8　p. 2223-2225　2011/07　Research paper (scientific journal)
Electroforming for Replicating Nanometer-Level Smooth Surface

Hidekazu Mimura, Hiroyuki Ishikura, Satoshi Matsuyama, Yasuhisa Sano, Kazuto Yamauchi

Journal of Nanoscience and Nanotechnology　Vol. 11　No. 4　p. 2886-2889　2011/04　Research paper (scientific journal)
Efficient Wet Etching of GaN (0001) Substrate with Subsurface Damage Layer

Shun Sadakuni, Junji Murata, Keita Yagi, Yasuhisa Sano, Takeshi Okamoto, Arima Kenta, Azusa N. Hattori, Kazuto Yamauchi

Journal of Nanoscience and Nanotechnology　Vol. 11　No. 4　p. 2979-2982　2011/04　Research paper (scientific journal)
Improved Optical and Electrical Characteristics of Free-Standing GaN Substrates by Chemical Polishing Utilizing Photo-Electrochemical Method

Junji Murata, Yuki Shirasawa, Yasuhisa Sano, Shun Sadakuni, Keita Yagi, Takeshi Okamoto, Azusa N. Hattori, Kenta Arima, Kazuto Yamauchi

Journal of Nanoscience and Nanotechnology　Vol. 11　No. 4　p. 2882-2885　2011/04　Research paper (scientific journal)
Structure and Magnetic Properties of Mono- and Bi-Layer Graphene Films on Ultraprecision Figured 4H-SiC(0001) Surfaces

Azusa N. Hattori, Takeshi Okamoto, Shun Sadakuni, Junji Murata, Hideo Oi, Kenta Arima, Yasuhisa Sano, Ken Hattori, Hiroshi Daimon, Katsuyoshi Endo, Kazuto Yamauchi

JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY　Vol. 11　No. 4　p. 2897-2902　2011/04　Research paper (scientific journal)
Simulation Study of Adaptive Mirror for Hard X-ray Focusing

Hiroki Nakamori, Satoshi Matsuyama, Takashi Kimura, Shouta Imai, Hidekazu Mimura, Yasuhisa Sano, Kazuto Yamauchi

Programme of ACTOP11　2011/04
Dependence of Process Characteristics on Atomic-Step Density in Catalyst-Referred Etching of 4H-SiC(0001) Surface

Takeshi Okamoto, Yasuhisa Sano, Kazuma Tachibana, Kenta Arima, Azusa N. Hattori, Keita Yagi, Junji Murata, Shun Sadakuni, Kazuto Yamauchi

Journal of Nanoscience and Nanotechnology　Vol. 11　p. 2928-2930　2011/04　Research paper (scientific journal)
Evaluation of Schottky Barrier Diodes Fabricated Directly on Processed 4H-SiC(0001) Surfaces

Yasuhisa Sano, Yuki Shirasawa, Takeshi Okamoto, Kazuto Yamauchi

Journal of Nanoscience and Nanotechnology　2011/04　Research paper (scientific journal)
Formation of wide and atomically flat graphene layers on ultraprecision-figured 4H-Si(0001) surfaces

A. N. Hattori, T. Okamoto, S. Sadakuni, J. Murata, K. Arima, Y. Sano, K. Hattori, H. Daimon, K. Endo, K. Yamauchi

Surface Science　Vol. 605　No. 5-6　p. 597-605　2011/03　Research paper (scientific journal)
TEM Observation of 8 Deg Off-Axis 4H-SiC (0001) Surfaces Planarized by Catalyst-Referred Etching

S. Sadakuni, N. X. Dai, Y. Sano, K. Arima, K. Yagi, J. Murata, T. Okamoto, K. Tachibana, K. Yamauchi

Materials Science Forum　Vol. 679-680　p. 489-492　2011/03　Research paper (scientific journal)
高能率高精度Ｘ線ミラー加工のためのIBF(Ion Beam Figuring)システムの開発

北村真一, 松山智至, 三村秀和, 佐野泰久, 山内和人

2011年度精密工学会春季大会学術講演会講演論文集　2011/03　Research paper (other academic)
シミュレーションを用いた硬X線用形状可変ミラー設計に関する研究

中森紘基, 松山智至, 今井将太, 木村隆志, 三村秀和, 佐野泰久, 山内和人

2011年度精密工学会春季大会学術講演会講演論文集　2011/03　Research paper (other academic)
Ultra precision machining using plasma chemical vaporization machining (CVM)

Kazuya Yamamura, Yasuhisa Sano, Yuzo Mori

Generation and Applications of Atmospheric Pressure Plasmas　p. 237-254　2011　Part of collection (book)
Publisher: Nova Science Publishers, Inc.
Temperature measurements of Electrostatic Shocks in laser-produced counter-streaming plasmas

T. Morita, Y. Sakawa, Y. Kuramitsu, H. Tanji, H. Aoki, T. Ide, S. Shibata, N. Onishi, C. Gregory, A. Diziere, J. Waugh, N. Woolsey, Y. Sano, A. Shiroshita, K. Shigemori, N. Ozaki, T. Kimura, K. Miyanishi, R. Kodama, M. Koenig, H. Takabe

Astrophysics and Space Science　Vol. 336　No. 1　p. 283-286　2010/11　Research paper (scientific journal)
One-dimensional Wolter optics with a sub-50-nm spatial resolution

S. Matsuyama, T. Wakioka, N. Kidani, T. Kimura, H. Mimura, Y. Sano, Y. Nishino, M. Yabashi, K. Tamasaku, T. Ishikawa, K. Yamauchi

Optics Letters　Vol. 35　No. 21　p. 3583-3585　2010/11　Research paper (scientific journal)
Stitching-angle measurable microscopic-interferometer: Surface-figure metrology tool for hard X-ray nanofocusing mirrors with large curvature

Yumoto Hirokatsu, Mimura Hidekazu, Handa Soichiro, Kimura Takashi, Matsuyama Satoshi, Sano Yasuhisa, Ohashi Haruhiko, Yamauchi Kazuto, Ishikawa Tetsuya

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT　Vol. 616　No. 2-3　p. 203-206　2010/04　Research paper (scientific journal)
Extended knife-edge method for characterizing sub-10-nm X-ray beams

Handa, Soichiro, Kimura, Takashi, Mimura, Hidekazu, Yumoto, Hirokatsu, Matsuyama, Satoshi, Sano, Yasuhisa, Tamasaku, Kenji, Nishino, Yoshinori, Yabashi, Makina, Ishikawa, Tetsuya, Yamauchi, Kazuto

Nuclear Instruments & Methods in Physics Research Section A-Accelerators Spectrometers Detectors And Associated Equipment　Vol. 616　No. 2月3日　p. 246-250　2010/04　Research paper (scientific journal)
Development of Nanometer Level Accurate Computer-Controlled Figuring with High Spatial Resolution and its Application to Hard X-ray Focusing Mirror

H. Mimura, K. Yumoto, S. Matsuyama, Y. Sano, K. Yamauchi

Journal of the Japan Society for Precision Engineering　Vol. 76　No. 3　p. 338-342　2010/03　Research paper (scientific journal)
Publisher: The Japan Society for Precision Engineering
Elemental mapping of frozen hydrated cells with cryo-scanning X-ray fluorescence microscopy

S. Matsuyama, M. Shimura, M. Fujii, K. Maeshima, H. Yumoto, H. Mimura, Y. Sano, M. Yabashi, Y. Nishino, K. Tamasaku, Y. Ishizaka, T. Ishikawa, K. Yamauchi

X-Ray Spectrometry　Vol. 39　No. 4　p. 260-266　2010/03　Research paper (scientific journal)
Numerically Controlled Sacrificial Plasma Oxidation Using Array of Electrodes for Improving Thickness Uniformity of SOI

Y. Sano, S. Kamisaka, K. Yoshinaga, H. Mimura, S. Matsuyama, K. Yamauchi

2010 IEEE INTERNATIONAL SOI CONFERENCE　2010　Research paper (international conference proceedings)
Planarization of GaN(0001) Surface by Photo-Electrochemical Method with Solid Acidic or Basic Catalyst

J. Murata, S. Sadakuni, K. Yagi, Y. Sano, T. Okamoto, K. Arima, A. N. Hattori, H. Mimura, K. Yamauchi

Japanese Journal of Applied Physics　Vol. 48　No. 12　p. 121001-121001-4　2009/12　Research paper (scientific journal)
Development of hard X-ray imaging optics with 4 aspherical mirrors

M. Fujii, S. Matsuyama, T. Wakioka, H. Mimura, Y. Sano, K. Yamauchi

2009/09　Research paper (other academic)
Wavefront Control System for Phase Compensation in Hard X-ray Optics

Kimura, Takashi, Handa, Soichiro, Mimura, Hidekazu, Yumoto, Hirokatsu, Yamakawa, Daisuke, Matsuyama, Satoshi, Inagaki, Kouji, Sano, Yasuhisa, Tamasaku, Kenji, Nishino, Yoshinori, Yabashi, Makina, Ishikawa, Tetsuya, Yamauchi, Kazuto

Japanese Journal of Applied Physics　Vol. 48　No. 7　p. 72503-072503　2009/07　Research paper (scientific journal)
Publisher: IOP Publishing
Stitching interferometric measurement system for hard x-ray nanofocusing mirrors

Yumoto Hirokatsu, Mimura Hidekazu, Handa Soichiro, Kimura Takashi, Matsuyama Satoshi, Sano Yasuhisa, Yabashi Makina, Nishino Yoshinori, Tamasaku Kenji, Ishikawa Tetsuya, Yamauchi Kazuto

9TH INTERNATIONAL CONFERENCE ON X-RAY MICROSCOPY　Vol. 186　2009　Research paper (international conference proceedings)
Catalyst-referred etching of 4H-SiC substrate utilizing hydroxyl radicals generated from hydrogen peroxide molecules

Yagi Keita, Murata Junji, Kubota Akihisa, Sano Yasuhisa, Hara Hideyuki, Okamoto Takeshi, Arima Kenta, Mimura Hidekazu, Yamauchi Kazuto

SURFACE AND INTERFACE ANALYSIS　Vol. 40　No. 6-7　p. 998-1001　2008/06
Trace element mapping using hard X-ray nanobeam focused by a Kirkpatrick Baez mirror system

S. Matsuyama, M. Shimura, H. Mimura, M. Fujii, H. Yumoto, S. Handa, T. Kimura, Y. Sano, M. Yabashi, Y. Nishino, K. Tamasaku, T. Ishikawa, K. Yamauchi

European Conference on X-ray Spectrometry, Book of Abstract　Vol. 38　No. 2　p. 89-94　2008/06　Research paper (scientific journal)
Stitching interferometric metrology for steeply curved x-ray mirrors

H.Yumoto, H.Mimura, T.Kimura, S.Handa, S.Matsuyama, Y.Sano, K.Yamauchi

Surface and Interface Analysis　Vol. 40　No. 6-7　p. 1023-1027　2008/03　Research paper (scientific journal)
Highly accurate differential deposition for X-ray reflective optics

S.Handa, H.Mimura, H.Yumoto, T.Kimura, S.Matsuyama, Y.Sano, Kazuto Yamauchi

Surface and Interface Analysis　Vol. 40　No. 6-7　p. 1019-1022　2008/03　Research paper (scientific journal)
Direct Determination of the Wave Field of an X-ray Nanobeam

H.Mimura, H. Yumoto, S. Matsuyama, S. Handa, T. Kimura, Y. Sano, M. Yabashi, Y. Nishino, K. Tamasaku, T. Ishikawa, K. Yamauchi

Physical Review A　Vol. 77　No. 1　2008/02　Research paper (scientific journal)
Development of adaptive mirror for wavefront correction of hard X-ray nanobeam

Takashi Kimura, Soichiro Handa, Hidekazu Mimura, Hirokatsu Yumoto, Daisuke Yamakawa, Satoshi Matsuyama, Yasuhisa Sano, Kenji Tamasaku, Yoshinori Nishino, Makina Yabashi, Tetsuya Ishikawa, Kazuto Yamauchi

ADVANCES IN X-RAY/EUV OPTICS AND COMPONENTS III　Vol. 7077　2008　Research paper (international conference proceedings)
Defect-free planarization of 4H-SiC(0001) substrate using reference plate

Yagi Keita, Murata Junji, Kubota Akihisa, Sano Yasuhisa, Hara Hideyuki, Arima Kenta, Okamoto Takeshi, Mimura Hidekazu, Yamauchi Kazuto

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 47　No. 1　p. 104-107　2008/01
走査型蛍光X線顕微鏡による細胞内元素分布の測定

藤井正輝, 松山智至, 志村まり, 三村秀和, 前島一博, 片岸恵子, 湯本博勝, 半田宗一郎, 木村隆志, 佐野泰久, 西野吉則, 玉作賢治, 矢橋牧名, 石川哲也, 山内和人

第9回Ｘ線結像光学シンポジウム要旨集　2007/11
Experimental determination of the wave field of X-ray nanobeam

Hidekazu Mimura, Hirokatsu Yumoto, Soichiro Handa, Takashi Kimura, Satoshi Matsuyama, Yasuhisa Sano, Yoshinori Nishino, Kenji Tamasaku, Yabashi Makina, Tetsuya Ishikawa, Kazuto Yamauchi

2007/10
Reflective optics for sub-10nm hard X-ray focusing

H. Mimura, S. Matsuyama, H. Yumoto, S. Handa, T. Kimura, Y. Sano, K. Tamasaku, Y. Nishino, M. Yabashi, T. Ishikawa, K. Yamauchi

ADVANCES IN X-RAY/EUV OPTICS AND COMPONENTS II　Vol. 6705　2007　Research paper (international conference proceedings)
Novel abrasive-free planarization of Si and SiC using catalyst

Hideyuki Hara, Yasuhisa Sano, Hidekazu Mimura, Kenta Arima, Akihisa Kubota, Keita Yagi, Junji Murata, Kazuto Yamauchi

TOWARDS SYNTHESIS OF MICRO - /NANO - SYSTEMS　No. 5　p. 267-+　2007　Research paper (international conference proceedings)
Hard x-ray wavefront measurement and control for hard x-ray nanofocusing

Handa Soichiro, Mimura Hidekazu, Matsuyama Satoshi, Yumoto Hirokatsu, Kimura Takashi, Sano Yasuhisa, Tamasaku Kenji, Nishino Yoshinori, Yabashi Makina, Ishikawa Tetsuya, Yamauchi Kazuto

ADVANCES IN METROLOGY FOR X-RAY AND EUV OPTICS II　Vol. 6704　2007　Research paper (international conference proceedings)
Waveoptical simulation for designing and evaluating hard X-ray nanofocusing mirror

H. Mimura, S. Matsuyama, H. Yumoto, S. Handa, A. Shibatani, K. Katagishi, Y. Sano, M. Yabashi, Y. Nishino, K. Tamasaku, T. Ishikawa, K. Yamauchi

2006/08
Surface Gradient Integrated Profiler for X-ray and EUV Optics-Calibration of the rotational angle error of the rotary encoders-

Yasuo Higashi, Yuichi Takaie, Katsuyoshi Endo, Tatsuya Kume, Kazuhiro Enami, Kazuto Ymauchi, Kazuya Ymamura, Yasuhisa Sano, Kenji Ueno, Yuzo Mori

Ninth International Conference on Synchrotron Radiation Instrumentation　Vol. 879　p. 726-+　2006/06　Research paper (international conference proceedings)
Development of Surface Measurement Technologies for Hard X-ray Nanofocusing Mirror at Osaka University and SPring-8

H. Mimura, H. Yumoto, S. Matsuyama, K. Yamamura, Y. Sano, K. Endo, Y. Mori, M. Yabashi, Y. Nishino, K. Tamasaku, T. Ishikawa, K. Yamauchi

The 3rd International Workshop on Metrology for X-ray Optics　2006/05
Development of K-B Mirror Manipulator for Hard X-ray Sub-50nm Focusing

Satoshi Matsuyama, Hidekazu Mimura, Hirokatsu Yumoto, Soichiro Handa, Keiko Katagishi, Akihiko Shibatani, Kazuya Yamamura, Yasuhisa Sano, Yoshinori Nishino, Kenji Tamasaku, Makina Yabashi, Tetsuya Ishikawa, Kazuto Yamauchi

International Workshop on Mechanical Engineering Design of Synchrotron Radiation Equipment and Instrumentation 2006　2006/05
Polishing characteristics of silicon carbide by plasma chemical vaporization machining

Y. Sano, M. Watanabe, K. Yamamura, K. Yamauchi, T. Ishida, K. Arima, A. Kubota, Y. Mori

Proc. ICRP-6/SPP-23　Vol. 45　No. 10　p. 8277-8280　2006/01　Research paper (international conference proceedings)
Ultraprecision finishing process for improving thickness distribution of quartz crystal wafer by utilizing atmospheric pressure plasma

Kazuya Yamamura, Yasuhisa Sano, Yuzo Mori, Masafumi Shibahara

PROCEEDINGS OF THE 2006 IEEE INTERNATIONAL FREQUENCY CONTROL SYMPOSIUM AND EXPOSITION, VOLS 1 AND 2　p. 848-+　2006　Research paper (international conference proceedings)
Wave-optical evaluation of interference fringes and wavefront phase in a hard-x-ray beam totally reflected by mirror optics

Kazuto Yamauchi, Kazuya Yamamura, Hidekazu Mimura, Yasuhisa Sano, Akira Saito, Katsuyoshi Endo, Alexei Souvorov, Makina Yabashi, Kenji Tamasaku, Tetsuya Ishikawa, Yuzo Mori

Applied Optics　Vol. 44　No. 32　p. 6927-6932　2005/11　Research paper (scientific journal)
Diffraction-limited two-dimensional hard-X-rays focusing in 100nm level using K-B mirror arrangement

S. Matsuyama, H. Mimura, H. Yumoto, K. Yamamura, Y. Sano, K. Endo, Y. Mori, M. Yabashi, K. Tamasaku, Y. Nishino, T. Ishikawa, K. Yamauchi

Review of Scientific Instruments　Vol. 76　No. 8　p. 83114-5　2005/08　Research paper (scientific journal)
Development of elliptical kirkpatrick-baez mirrors for hard X-ray nanofocusing

K. Yamauchi, H. Mimura, K. Yamamura, Y. Sano, H. Yumoto, S. Matsuyama, K. Endo, Y. Nishino, K. Tamasaku, M. Yabashi, T. Ishikawa, Y. Mori

Optics InfoBase Conference Papers　2005　Research paper (international conference proceedings)
Focusing hard X-rays to sub-50 nm size by elliptically figured: Mirror

Hirokatsu Yumoto, Hidekazu Mimura, Satoshi Matsuyama, Hideyuki Hara, Kazuya Yamamura, Yasuhisa Sano, Kazumasa Ueno, Katsuyoshi Endo, Yuzo Mori, Makina Yabashi, Yoshinori Nishino, Kenji Tamasaku, Tetsuya Ishikawa, Kazuto Yamauchi

Optics InfoBase Conference Papers　2005　Research paper (international conference proceedings)
Stitching interferometry for surface figure measurement of X-ray reflective optics

Hidekazu Mimura, Hirokatsu Yumoto, Satoshi Matsuyama, Hideyuki Hara, Kazuya Yamamura, Yasuhisa Sano, Kazumasa Ueno, Katsuyoshi Endo, Yuzo Mori, Makina Yabashi, Yoshinori Nishino, Kenji Tamasaku, Tetsuya Ishikawa, Kazuto Yamauchi

Optics InfoBase Conference Papers　2005　Research paper (international conference proceedings)
Hard X-ray nano-focusing at 40nm level using K-B mirror optics for nanoscopy/spectroscopy

Satoshi Matsuyama, Hidekazu Mimura, Hirokatsu Yumoto, Hideyuki Hara, Kazuya Yamamura, Yasuhisa Sano, Katsuyoshi Endo, Yuzo Mori, Yoshinori Nishino, Kenji Tamasaku, Makina Yabashi, Tetsuya Ishikawa, Kazuto Yamauchia

Proceedings of SPIE - The International Society for Optical Engineering　Vol. 5918　p. 1-8　2005　Research paper (international conference proceedings)
Aspheric surface fabrication in nm-level accuracy by numerically controlled plasma chemical vaporization machining (CVM) and elastic emission machining (EEM)

K Yamamura, H Mimura, K Yamauchi, Y Sano, A Saito, T Kinoshita, K Endo, Y Mori, A Souvorov, M Yabashi, K Tamasaku, D Ishikawa

X-RAY MIRRORS, CRYSTALS, AND MULTILAYERS II　Vol. 4782　p. 265-270　2002　Research paper (international conference proceedings)
Sub-micron focusing of hard X-ray beam by elliptically figured mirrors for scanning X-ray microscopy

Y Mori, K Yamauchi, K Yamamura, H Mimura, Y Sano, A Saito, K Ueno, K Endo, A Souvorov, M Yabashi, K Tamasaku, T Ishikawa

X-RAY MIRRORS, CRYSTALS, AND MULTILAYERS II　Vol. 4782　p. 58-64　2002　Research paper (international conference proceedings)
Computer numerically controlled plasma chemical vaporization machining with a pipe electrode for optical fabrication

Hideo Takino, Norio Shibata, Hiroshi Itoh, Teruki Kobayashi, Hiroaki Tanaka, Masami Ebi, Kazuya Yamamura, Yasuhisa Sano, Yuzo Mori

Applied Optics　Vol. 37　No. 22　p. 5198-5210　1998/08/01　Research paper (scientific journal)

Misc. 559

大気圧プラズマによる表面処理を利用した常温接合技術の開発

櫛川新太, 西岡柚香, 藤大雪, 山内和人, 佐野泰久

精密工学会関西地方定期学術講演会講演論文集　Vol. 2022　2022
水素ガスを用いた大気圧プラズマによる窒化ガリウム基板の高能率エッチング

中上元太, 崔泰樹, 藤大雪, 山内和人, 佐野泰久

精密工学会関西地方定期学術講演会講演論文集　Vol. 2022　2022
紫外光照射を援用した触媒表面基準エッチング法を用いた窒化ガリウム基板の高能率平滑化

萱尾澄人, 藤大雪, 山田純平, 山内和人, 佐野泰久

精密工学会関西地方定期学術講演会講演論文集　Vol. 2022　2022
触媒表面基準エッチング法を用いた高分子材料表面の高精度平坦化手法-ポリカーボネートの加工特性評価-

竹田広大, 藤大雪, 佐野泰久, 山内和人

精密工学会関西地方定期学術講演会講演論文集　Vol. 2021　2021
SF₆ガスを用いたサブ大気圧プラズマによるSiC-MOSFETの裏面薄化におけるデバイス性能への影響の調査

大島政明, 中西悠真, 藤大雪, 松山智至, 山内和人, 佐野泰久

精密工学会関西地方定期学術講演会講演論文集　Vol. 2021　2021
触媒表面基準エッチング法におけるシリコンの除去機構の解明

板垣果歩, 萩原拓, 萱尾清人, VAN PHO Bui, 藤大雪, 佐野泰久, 山内和人

精密工学会関西地方定期学術講演会講演論文集　Vol. 2021　2021
Fabrication of atomically smooth polycrystalline surface without grain boundary steps by using catalyst-referred etching method

藤大雪, VAN BUI Pho, 松山智至, 佐野泰久, 山内和人

精密工学会大会学術講演会講演論文集　Vol. 2021　2021
Metal-insulator phase transition in ultra-thin Fe₃O₄film grown on MgO substrate flattened by catalyst-referred etching

大坂藍, 服部梓, 田中秀和, 藤大雪, 山内和人, 佐野泰久

日本表面真空学会学術講演会要旨集(Web)　Vol. 2020　2020
A micro channel-cut crystal X-ray monochromator for a self-seeded hard X-ray free-electron laser

T. Osaka, I. Inoue, R. Kinjo, T. Hirano, Y. Morioka, Y. Sano, K. Yamauchi, M. Yabashi

Journal of Synchrotron Radiation　Vol. 26　No. 5　p. 1496-1502　2019/09　Internal/External technical report, pre-print, etc.
Development of catalyst-referred chemical etching

Vol. 61　No. 8　p. 426-429　2017/08
Publisher: 砥粒加工学会
触媒表面基準エッチング法における水素水を用いた被毒除去法の提案

中平雄太, 礒橋藍, PHO Bui Van, 稻田辰昭, 藤大雪, 木田英香, 松山智至, 佐野泰久, 山内和人

精密工学会大会学術講演会講演論文集　Vol. 2017　2017
光電気化学酸化を利用した触媒表面基準エッチング法による窒化ガリウムの高能率平坦化

木田英香, 藤大雪, 中平雄太, 松山智至, 佐野泰久, 山内和人

精密工学会大会学術講演会講演論文集　Vol. 2017　2017
ニッケル触媒を利用した純水ベースの触媒表面基準エッチング法の開発

藤大雪, 礒橋藍, 稻田辰昭, 中平雄太, 木田英香, 松山智至, 佐野泰久, 山内和人

精密工学会大会学術講演会講演論文集　Vol. 2017　2017
Pit Formation, Patterning and Flattening of Ge Surfaces in O2-Containing Water by Metal-Assisted Chemical Etching

Tatsuya Kawase, Atsushi Mura, Yusuke Saito, Takeshi Okamoto, Kentaro Kawai, Yasuhisa Sano, Kazuto Yamauchi, Mizuho Morita, Kenta Arima

ECS Transactions　Vol. 75　No. 1　p. 107-112　2016/09
形状可変ミラーによる二段KBミラー集光光学系を用いた任意サイズ硬X線集光ビームの形成

後藤拓実, 中森紘基, 中森紘基, 松山智至, 木村隆志, KHAKUREL Krishna Prasad, 佐野泰久, 香村芳樹, 西野吉則, 石川哲也, 山内和人

日本放射光学会年会・放射光科学合同シンポジウム予稿集　Vol. 29th　2016/01/09
触媒表面基準エッチング法における被毒物除去による加工速度安定化手法の開発

中平雄太, 礒橋藍, VAN Pho Bui, 稻田辰昭, 藤大雪, 松山智至, 佐野泰久, 山内和人

精密工学会大会学術講演会講演論文集　Vol. 2016　2016
大気圧プラズマを用いた超精密加工

佐野泰久

機械の研究　Vol. 67　No. 10　p. 832-838　2015/10
Publisher: 養賢堂
WeC-2-5 HIGH-EFFICIENCY PLANARIZATION METHOD FOR HARD-TO-MACHINE SEMICONDUCTOR SUBSTRATES COMBINING MECHANICAL POLISHING AND ATMOSPHERIC-PRESSURE PLASMA ETCHING

Sano Yasuhisa, Shiozawa Kousuke, Doi Toshiro, Kurokawa Syuhei, Aida Hideo, Miyashita Tadakazu, Yamauchi Kazuto

Proceedings of ... JSME-IIP/ASME-ISPS Joint Conference on Micromechatronics for Information and Precision Equipment : IIP/ISPS joint MIPE　Vol. 2015　p. "WeC-2-5-1"-"WeC-2-5-3"　2015/06/14
Publisher: The Japan Society of Mechanical Engineers
硬X線集光用形状可変ミラーによる二段KBミラー集光光学系の開発

後藤拓実, 中森紘基, 松山智至, 木村隆志, Khakurel Krishna, 佐野泰久, 香村芳樹, 石川哲也, 西野吉則, 山内和人

アブストラクト集　Vol. 2015　No. 0　p. 1047-1048　2015/03
Publisher: 公益社団法人精密工学会
形状可変ミラーを用いた二段Kirkpatrick-Baezミラー集光光学系による硬X線集光ビームの形成

後藤拓実, 中森紘基, 松山智至, 木村隆志, Khakurel Krishna, 佐野泰久, 香村芳樹, 西野吉則, 石川哲也, 山内和人

精密工学会学術講演会講演論文集　Vol. 2015　No. 0　p. 703-704　2015
Publisher: 公益社団法人精密工学会
Behaviors of Carbon Atoms during Plasma Oxidation of 4H-SiC(0001) Surfaces near Room Temperature

Naoki Saito, Daichi Mori, Akito Imafuku, Kentaro Kawai, Yasuhisa Sano, Mizuho Morita, Kenta Arima

ECS Transactions　Vol. 64　No. 17　p. 23-28　2014/10　Article, review, commentary, editorial, etc. (international conference proceedings)
硬X線自由電子レーザーシングルナノ集光用Pt/C多層膜の破壊特性評価

金章雨, 長平良綾香, 松山智至, 福井亮介, 西原明彦, 小山貴久, 湯本博勝, 佐野泰久, 大橋治彦, 後藤俊治, 矢橋牧名, 石川哲也, 山内和人

日本放射光学会年会・放射光科学合同シンポジウム予稿集　Vol. 27th　2014
二次元位相回折格子を用いたXFELナノビームのシングルショット波面計測

西原明彦, 福井亮介, 松山智至, KIM Jangwoo, 長平良綾香, 湯本博勝, 三村秀和, 小山貴久, 登野健介, 犬伏雄一, 佐藤尭洋, 片山拓也, 富樫格, 矢代航, 佐野泰久, 大橋治彦, 百生敦, 後藤俊治, 矢橋牧名, 石川哲也, 山内和人

精密工学会大会学術講演会講演論文集　Vol. 2014　2014
位相回折格子を用いたX線レーザナノビームの波面計測法の研究-フーリエ変換法と縞走査法の2つの解析法の検討-

西原明彦, 松山智至, 金章雨, 長平良綾香, 湯本博勝, 三村秀和, 小山貴久, 登野健介, 犬伏雄一, 佐藤尭洋, 片山拓也, 富樫格, 矢代航, 佐野泰久, 大橋治彦, 百生敦, 後藤俊治, 矢橋牧名, 石川哲也, 山内和人

精密工学会関西地方定期学術講演会講演論文集　Vol. 2014　2014
チェス盤回折格子を用いたXFELナノビームのシングルショット波面計測

西原明彦, 福井亮介, 松山智至, 金章雨, 長平良綾香, 湯本博勝, 三村秀和, 小山貴久, 登野健介, 犬伏雄一, 佐藤尭洋, 片山拓也, 富樫格, 矢代航, 佐野泰久, 大橋治彦, 百生敦, 後藤俊治, 矢橋牧名, 石川哲也, 山内和人

日本放射光学会年会・放射光科学合同シンポジウム予稿集　Vol. 27th　2014
Abrasive-Free Polishing of SiC Wafer Utilizing Catalyst Surface Reaction

Y. Sano, K. Arima, K. Yamauchi

ECS Transactions　Vol. 58　No. 4　p. 447-453　2013/10
Atomically controlled surfacing by wet chemical etching : Development of catalyst referred etching

YAMAUCHI Kazuto, SANO Yasuhisa, ARIMA Kenta

應用物理　Vol. 82　No. 5　p. 403-406　2013/05
Publisher: 応用物理学会
Study of Terminated Species on 4H-SiC (0001) Surface Planarized by Catalyst-Referred Etching

P. V. Bui, S. Sadakuni, T. Okamoto, K. Arima, Y. Sano, K. Yamauchi

Materials Science Forum　Vol. 740-724　p. 510-513　2013/01
New Polishing Technique of Semiconductor SiC Substrate : Development of Polishing Technique Utilizing Catalyst Surface Reaction

YAGI Keita, TSUJIMURA Manabu, SANO Yasuhisa, YAMAUCHI Kazuto

Journal of the Japan Society of Mechanical Engineers　Vol. 115　No. 1128　p. 767-771　2012/11/05
Publisher: 一般社団法人日本機械学会
Smoothing of single crystalline SiC and GaN by catalyst referred etching

Kazuto Yamauchi, Yasuhisa Sano, Kenta Arima

Seimitsu Kogaku Kaishi/Journal of the Japan Society for Precision Engineering　Vol. 78　No. 11　p. 947-951　2012/11
Publisher: The Japan Society for Precision Engineering
Study on reactive species in catalyst-referred etching of 4H-SiC using platinum and hydrofluoric acid

Ai Isohashi, Yasuhisa Sano, Takeshi Okamoto, Kazuma Tachibana, Kenta Arima, Koji Inagaki, Keita Yagi, Shun Sadakuni, Yoshitada Morikawa, Kazuto Yamauchi

Materials Science Forum　Vol. 740-742　p. 847-850　2012/09
Smoothing of Single Crystalline SiC, GaN and ZnO by Catalyst Referred Etching

YAMAUCHI Kazuto, SANO Yasuhisa, ARIMA Kenta

表面科学 : hyomen kagaku = Journal of the Surface Science Society of Japan　Vol. 33　No. 6　p. 334-338　2012/06/10
Publisher: 日本表面科学会
触媒表面基準エッチングによる単結晶SiC、GaN表面の平滑化 (特集先端部品のための高付価値研磨・切断加工技術)

山内和人, 佐野泰久, 有馬健太

機械技術　Vol. 60　No. 5　p. 37-41　2012/05
Publisher: 日刊工業出版プロダクション
SACLA硬X線自由電子レーザービームラインにおける1μm集光用KBミラー光学系の開発

湯本博勝, 小山貴久, 三村秀和, 八須洋輔, 木村隆志, 横山光, 金章雨, 松山智至, 佐野泰久, 登野健介, 富樫格, 犬伏雄一, 佐藤尭洋, 矢橋牧名, 大橋治彦, 大橋治彦, 大森整, 山内和人, 石川哲也

日本放射光学会年会・放射光科学合同シンポジウム予稿集　Vol. 25th　2012
Atomically flattening of SiC substrate

Yasuhisa Sano, Kenta Arima, Kazuto Yamauchi

Vol. 49　No. 12　p. 22-27　2011/12
Publisher: 日本オプトメカトロニクス協会
Graphene Formation on 4H-SiC(0001) Surface Flattened by Catalyst-Assisted Chemical Etching in HF Solution

Keisuke Nishitani, Hiroki Sakane, Azusa N. Hattori, Takeshi Okamoto, Kentaro Kawai, Junichi Uchikoshi, Yasuhisa Sano, Kazuto Yamauchi, Mizuho Morita, Kenta Arima

ECS Transactions, State-of-the-Art Program on Compound Semiconductors 53 (SOTAPOCS 53)　Vol. 41　No. 6　p. 241-248　2011/10
Single-nanometer focusing of hard x-rays by Kirkpatrick-Baez mirrors

Kazuto Yamauchi, Hidekazu Mimura, Takashi Kimura, Hirokatsu Yumoto, Soichiro Handa, Satoshi Matsuyama, Kenta Arima, Yasuhisa Sano, Kazuya Yamamura, Koji Inagaki, Hiroki Nakamori, Jangwoo Kim, Kenji Tamasaku, Yoshinori Nishino, Makina Yabashi, Tetsuya Ishikawa

JOURNAL OF PHYSICS: CONDENSED MATTER　Vol. 23　No. 39　p. 394206 1-394206 2　2011/10
Thinning of 2-inch SiC wafer by plasma chemical vaporization machining using cylindrical rotary electrode

Yasuhisa Sano, Takehiro Kato, Kohei Aida, Kazuya Yamamura, Hidekazu Mimura, Satoshi Matsuyama, Kazuto Yamauchi

Materials Science Forum　Vol. 679-680　p. 481-+　2011/04
Surface replication with one-nanometer-level smoothness by a nickel electroforming process

MIMURA Hidekazu, MATSUYAMA Satoshi, SANO Yasuhisa, YAMAUCHI Kazuto

No. 16　p. 21-25　2011/01/01
Fabrication and evaluation of Si beam splitter used in autocorrelator for hard x-ray free electron laser

Osaka Taito, Yabashi Makina, Sano Yasuhisa, Tono Kensuke, Inubushi Yuichi, Sato Takahiro, Mimura Hidekazu, Matsuyama Satoshi, Ishikawa Tetsuya, Yamauchi Kazuto

Proceedings of JSPE Semestrial Meeting　Vol. 2011　No. 0　p. 511-512　2011
Publisher: The Japan Society for Precision Engineering
Dicing of SiC wafer by PCVM (Plasma Chemical Vaporization Machining) with shadow mask

Nishikawa Hiroaki, Sano Yasuhisa, Aida Kouhei, Yamamura Kazuya, Matsuyama Satoshi, Yamauchi Kazuto

Proceedings of JSPE Semestrial Meeting　Vol. 2011　No. 0　p. 509-510　2011
Publisher: The Japan Society for Precision Engineering
多層膜ミラーによる硬X線Sub-10nm集光と顕微鏡への応用

三村秀和, 木村隆志, 横山光, 今井将太, 湯本博勝, 松山智至, 佐野泰久, 石川哲也, 山内和人

精密工学会学術講演会講演論文集　Vol. 2011　No. 0　p. 491-492　2011
SiC 基板表面の原子レベル平坦化技術（キーノートスピーチ）

佐野泰久, 有馬健太, 山内和人

精密工学会学術講演会講演論文集　Vol. 2011　No. 0　p. 373-374　2011
色収差のない結像型硬X線顕微鏡構築のためのAdvanced Kirkpatrick‐Baezミラー光学系の開発

木谷直隆, 松山智至, 脇岡敏之, 中森紘基, 三村秀和, 木村隆志, 佐野泰久, 西野吉則, 玉作賢治, 香村芳樹, 矢橋牧名, 石川哲也, 山内和人

日本放射光学会年会・放射光科学合同シンポジウム予稿集　Vol. 24th　2011/01
波動光学シミュレーションを用いたAdvanced Kirkpatrick‐Baezミラー光学系の検討

中森紘基, 松山智至, 脇岡敏之, 木谷直隆, 三村秀和, 佐野泰久, 西野吉則, 香村芳樹, 玉作賢治, 矢橋牧名, 石川哲也, 山内和人

日本放射光学会年会・放射光科学合同シンポジウム予稿集　Vol. 24th　2011/01
Thinning of 2-inch SiC Wafer by Plasma Chemical Vaporization Machining Using Cylindrical Rotary Electrode

Yasuhisa Sano, Takehiro Kato, Kohei Aida, Kazuya Yamamura, Hidekazu Mimura, Satoshi Matsuyama, Kazuto Yamauchi

SILICON CARBIDE AND RELATED MATERIALS 2010　Vol. 679-680　p. 481-+　2011
Wavefield characterization of nearly diffraction-limited focused hard x-ray beam with size less than 10 nm

Takashi Kimura, Hidekazu Mimura, Soichiro Handa, Hirokatsu Yumoto, Hikaru Yokoyama, Shota Imai, Satoshi Matsuyama, Yasuhisa Sano, Kenji Tamasaku, Yoshiki Komura, Yoshinori Nishino, Makina Yabashi, Tetsuya Ishikawa, Kazuto Yamauchi

Review of Science Instruments　Vol. 81　No. 12　2010/12
Wavefield characterization of nearly diffraction-limited focused hard x-ray beam with size less than 10 nm

Takashi Kimura, Hidekazu Mimura, Soichiro Handa, Hirokatsu Yumoto, Hikaru Yokoyama, Shota Imai, Satoshi Matsuyama, Yasuhisa Sano, Kenji Tamasaku, Yoshiki Komura, Yoshinori Nishino, Makina Yabashi, Tetsuya Ishikawa, Kazuto Yamauchi

REVIEW OF SCIENTIFIC INSTRUMENTS　Vol. 81　No. 12　2010/12
Development of Side-By-Side Kirkpatrick-Baez mirror for high-density X-ray nanobeam

T. Wakioka, S. Matsuyama, N. Kidani, H. Mimura, Y. Sano, K. Yamauchi

Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology　Vol. pp70-71 (P-06)　2010/11
Thinning of SiC Wafer by Plasma Chemical Vaporization Machining

K. Aida, Y. Sano, H. Nishikawa, K. Yamamura, H. Mimura, S. Matsuyama, K. Yamauchi

Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology, P-66, 190-191.　Vol. P-66, 190-191.　2010/11
Development of Chemical Processing Methods for Silicon Carbide Wafering and Device Processing

Y. Sano, K. Yamamura, K. Arima, K. Yamauchi

Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology, 6.2, 54-55.　Vol. 6.2, 54-55.　2010/11
Ultra-precision Figured 4H-SiC(0001) Surfaces : A Demonstration of the High-quality Graphene Layers

HATTORI Azusa N, OKAMOTO Takeshi, SADAKUNI Shun, MURATA Junji, ARIMA Kenta, SANO Yasuhisa, ENDO Katsuyoshi, YAMAUCHI Kazuto

J. Surf. Sci. Soc. Jpn.　Vol. 31　No. 9　p. 466-473　2010/09/10
Publisher: The Surface Science Society of Japan
Numerically Controlled Sacrificial Plasma Oxidation Using Array-Type Electrode toward High-Throughput Deterministic Machining

Yasuhisa Sano, Keinosuke Yoshinaga, Shohei Kamisaka, Hidekazu Mimura, Satoshi Matsuyama, Kazuto Yamauchi

Proceedings of the 2nd International Conference on Nanomanufacturing　Vol. 169　2010/09
Development of a one-dimensional Wolter mirror for an advanced Kirkpatrick-Baez mirror

S. Matsuyama, T. Wakioka, H. Mimura, T. Kimura, N. Kidani, Y. Sano, Y. Nishino, K. Tamasaku, M. Yabashi, T. Ishikawa, K. Yamauchi

Proc. SPIE　Vol. 7802　2010/09
24aPS-72 Formation process and layer-resolved structure analysis of graphene grown on 4H-SiC(0001)

Matsui Hirosuke, Matsui Fumihiko, Hashimoto M, Goto K, Nishikayama N, Maejima N, Tanaka K, Matsushita T, Kato Y, Okamoto T, Hattori A, Sano Y, Yamauchi K, Daimon H

Meeting abstracts of the Physical Society of Japan　Vol. 65　No. 2　p. 855-855　2010/08/18
Publisher: The Physical Society of Japan (JPS)
Improvement of Thickness Uniformity of Silicon on Insulator Layer by Numerically Controlled Sacrificial Oxidation Using Atmospheric-Pressure Plasma with Electrode Array System

Shohei Kamisaka, Keinosuke Yoshinaga, Yasuhisa Sano, Hidekazu Mimura, Satoshi Matsuyama, Kazuto Yamauchi

Japanese Journal of Applied Physics　Vol. 49　No. 8　2010/08
Beveling of Silicon Carbide Wafer by Plasma Etching Using Atmospheric-Pressure Plasma

Yasuhisa Sano, Takehiro Kato, Kazuya Yamamura, Hidekazu Mimura, Satoshi Matsuyama, Kazuto Yamauchi

Japanese Journal of Applied Physics　Vol. 49　No. 8　2010/08
Dicing of SiC wafer by atmospheric-pressure plasma etching process with wire electrode

Yasuhisa Sano, Kohei Aida, Kazuya Yamamura, Hidekazu Mimura, Satoshi Matsuyama, Kazuto Yamauchi

2010/08
Hard X-ray Imaging Optics with Elliptical mirrors and Hyperbolic Mirrors

S. Matsuyama, T. Wakioka, H. Mimura, T. Kimura, N. Kidani, Y. Sano, Y. Nishino, K. Tamasaku, M. Yabashi, T. Ishikawa, K. Yamauchi

SPIE Optics+Photonics, Technical Program　Vol. p191, 7802-01　2010/08
Removal characteristics of plasma chemical vaporization machining with a pipe electrode for optical fabrication

Hideo Takino, Kazuya Yamamura, Yasuhisa Sano, Yuzo Mori

APPLIED OPTICS　Vol. 49　No. 23　p. 4434-4440　2010/08
High-resolution TEM observation of SiC surface flattened by catalyst referred etching

S. Sadakuni, N. X. Dai, Y. Sano, K. Arima, A. N. Hattori, K. Yagi, J. Murata, T. Okamoto, K. Tachibana, K. Yamauchi

Abstract Booklet of the 8th European Conference on Silicon Carbide and Related Materials　Vol. TP-158　2010/08
Abrasive-free planarization of 3-inch 4H-SiC substrate by catalyst-referred etching

T. Okamoto, Y. Sano, K. Tachibana, K. Arima, A. N. Hattori, K. Yagi, J. Murata, S. Sadakuni, K. Yamauchi

Abstract Booklet of the 8th European Conference on Silicon Carbide and Related Materials　Vol. TP-160　2010/08
Thinning of 2-inch SiC wafer by plasma chemical vaporization machining

Y. Sano, T. Kato, K. Yamamura, H. Mimura, S. Matsuyama, K. Yamauchi

Abstract Booklet of the 8th European Conference on Silicon Carbide and Related Materials　Vol. TP-155　2010/08
Improvement of Thickness Uniformity of Silicon on Insulator Layer by Numerically Controlled Sacrificial Oxidation Using Atmospheric-Pressure Plasma with Electrode Array System

Shohei Kamisaka, Keinosuke Yoshinaga, Yasuhisa Sano, Hidekazu Mimura, Satoshi Matsuyama, Kazuto Yamauchi

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 49　No. 8　2010/08
Removal characteristics of plasma chemical vaporization machining with a pipe electrode for optical fabrication

Hideo Takino, Kazuya Yamamura, Yasuhisa Sano, Yuzo Mori

Appl. Opt. 49 (2010) 4434-4440.　Vol. 49　No. 23　p. 4434-4440　2010/08
Beveling of Silicon Carbide Wafer by Plasma Etching Using Atmospheric-Pressure Plasma

Yasuhisa Sano, Takehiro Kato, Kazuya Yamamura, Hidekazu Mimura, Satoshi Matsuyama, Kazuto Yamauchi

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 49　No. 8　2010/08
Chemical machining processes using atmospheric pressure plasma

Yasuhisa Sano, Kazuya Yamamura, Kazuto Yamauchi

Optical and Electro-optical Engineering Contact　Vol. 第48巻第6号　2010/06
触媒表面を基準面とする化学研磨法の開発

佐野泰久, 有馬健太, 山内和人, サノヤスヒサ, アリマケンタ, ヤマウチカズト

大阪大学低温センターだより　Vol. 150　p. 22-27　2010/04
Publisher: 大阪大学低温センター
硬X線ナノ集光ビーム用波面誤差算出法の開発

木村隆志, 三村秀和, 半田宗一郎, 湯本博勝, 山川大輔, 松山智至, 佐野泰久, 玉作賢治, 西野吉則, 矢橋牧名, 石川哲也, 山内和人

放射光　Vol. 23　No. 2　p. 119-121　2010/03/31
Publisher: 日本放射光学会
22pGQ-6 Graphene grown on the ultraprecision figured 4H-SiC(0001) surfaces

Hattori A. N, Okamoto T, Sadakuni S, Murata J, Arima K, Sano Y, Endo K, Yamauchi K

Meeting abstracts of the Physical Society of Japan　Vol. 65　No. 1　p. 957-957　2010/03/01
Publisher: The Physical Society of Japan (JPS)
21pPSA-27 Composition and structure analysis of Graphene grown on 4H-SiC(0001) surface

Matsui H, Matsui F, Hashimoto M, Goto K, Nishikayama N, Maejima N, Tanaka K, Matsushita T, Kato Y, Okamoto T, Hattori A, Sano Y, Yamauchi K, Daimon H

Meeting abstracts of the Physical Society of Japan　Vol. 65　No. 1　p. 949-949　2010/03/01
Publisher: The Physical Society of Japan (JPS)
Influence of the UV Light Intensity on the Photoelectrochemical Planarization Technique for Gallium Nitride

Shun Sadakuni, Junji Murata, Keita Yagi, Yasuhisa Sano, Kenta Arima, Azusa Hattori, Takeshi Okamoto, Kazuto Yamauchi

Materials Science Forum　Vol. 645-648　p. 795-+　2010/03
Fabrication Technology for Large-Scale Atomically Flat Surface

Yasuhisa Sano, Hideyuki Hara, Kenta Arima, Kazuto Yamauchi

Journal of Japanese Society of Tribologists　Vol. 55　No. 3　p. 148-153　2010/03
Reduction of surface roughness of 4H-SiC by catalyst-referred etching

T. Okamoto, Y. Sano, H. Hara, T. Hatayama, K. Arima, K. Yagi, J. Murata, S. Sadakuni, K. Tachibana, Y. Shirasawa, H. Mimura, T. Fuyuki, K. Yamauchi

Materials Science Forum　Vol. 645-648　p. 775-+　2010/03
Breaking the 10 nm barrier in hard-X-ray focusing

Hidekazu Mimura, Soichiro Handa, Takashi Kimura, Hirokatsu Yumoto, Daisuke Yamakawa, Hikaru Yokoyama, Satoshi Matsuyama, Kouji Inagaki, Kazuya Yamamura, Yasuhisa Sano, Kenji Tamasaku, Yoshinori Nishino, Makina Yabashi, Tetsuya Ishikawa, Kazuto Yamauchi

NATURE PHYSICS　Vol. 6　No. 2　p. 122-125　2010/02
Development of nanometer level accurate computer-controlled figuring with high spatial resolution and its application to hard X-ray focusing minor

三村秀和, 三村秀和, 湯本博勝, 松山智至, 佐野泰久, 山内和人, 山内和人

精密工学会誌(CD-ROM)　Vol. 76　No. 3　2010
PCVM (Plasma Chemical Vaporization Machining)を用いた2インチSiC基板の全面加工

会田浩平, 佐野泰久, 西川央明, 山村和也, 三村秀和, 松山智至, 山内和人

精密工学会学術講演会講演論文集　Vol. 2010　No. 0　p. 735-736　2010
Development of Sub-10nm hard X-ray focusing system with multilayer mirrors

Mimura Hidekazu, Kimura Takashi, Yokoyama Hikaru, Imai Shouta, Yumoto Hirokatsu, Matsuyama Satoshi, Sano Yasuhisa, Ishikawa Tetsuya, Yamauchi Kazuto

Proceedings of JSPE Semestrial Meeting　Vol. 2010　No. 0　p. 715-716　2010
Publisher: The Japan Society for Precision Engineering
Development of Numerically Controlled Sacrificial Oxidation using Atmospheric-Pressure Plasma

Yoshinaga Keinosuke, Kamisaka Shohei, Sano Yasuhisa, Mimura Hidekazu, Matsuyama Satoshi, Yamauchi Kazuto

Proceedings of JSPE Semestrial Meeting　Vol. 2010　No. 0　p. 309-310　2010
Publisher: The Japan Society for Precision Engineering
Development of surface figure replication method with nanometer accuracy

Mimura Hidekazu, Ishikura Hiroyuki, Matsuyama Satoshi, Sano Yasuhisa, Yamauchi Kazuto

Proceedings of JSPE Semestrial Meeting　Vol. 2010　No. 0　p. 305-306　2010
Publisher: The Japan Society for Precision Engineering
Fabrication and evaluation of multilayer for hard X-ray mirror

Yokoyama Hikaru, Handa Soichiro, Mimura Hidekazu, Kimura Takashi, Matsuyama Satoshi, Sano Yasuhisa, Yamauchi Kazuto

Proceedings of JSPE Semestrial Meeting　Vol. 2010　No. 0　p. 287-288　2010
Publisher: The Japan Society for Precision Engineering
結像型X線顕微鏡のための4枚ミラー反射型結像光学系の開発

松山智至, 藤井正輝, 脇岡敏之, 木谷直隆, 三村秀和, 佐野泰久, 西野吉則, 玉作賢治, 矢橋牧名, 石川哲也, 山内和人

日本放射光学会年会・放射光科学合同シンポジウム予稿集　Vol. 23rd　2010/01
Development of a one-dimensional Wolter mirror for an advanced Kirkpatrick-Baez mirror

S. Matsuyama, T. Wakioka, H. Mimura, T. Kimura, N. Kidani, Y. Sano, Y. Nishino, K. Tamasaku, M. Yabashi, T. Ishikawa, K. Yamauchi

ADVANCES IN X-RAY/EUV OPTICS AND COMPONENTS V　Vol. 7802　2010
Crystal Growth Technology (Chapter 18; Crystal Machining Using Atmospheric Pressure Plasma)

WILEY-VCH　2010
Thinning of SiC wafer by plasma chemical vaporization machining

Yasuhisa Sano, Takehiro Kato, Tsutomu Hori, Kazuya Yamamura, Hidekazu Mimura, Yoshiaki Katsuyama, Kazuto Yamauchi

Material Science Forum, 645-648 (2010) 857-860.　Vol. 645-648　p. 857-860　2010/01
Publisher: Trans Tech Publications Ltd
原子レベルで平坦な表面の創成技術

トライボロジスト　Vol. Vol. 55, No.3, pp. 148-153　2010
Reduction of surface roughness of 4H-SiC by catalyst-referred etching

T. Okamoto, Y. Sano, H. Hara, T. Hatayama, K. Arima, K. Yagi, J. Murata, S. Sadakuni, K. Tachibana, Y. Shirasawa, H. Mimura, T. Fuyuki, K. Yamauchi

SILICON CARBIDE AND RELATED MATERIALS 2009, PTS 1 AND 2　Vol. 645-648　p. 775-+　2010
大気圧プラズマによるエッチングを応用した種々の加工法とその特性

佐野泰久, 山村和也, 山内和人

光技術コンタクト　Vol. 第48巻第6号　No. 6　p. 260-265　2010
Publisher: 日本オプトメカトロニクス協会
High-resolution TEM observation of SiC surface flattened by catalyst referred etching

Abstract Booklet of the 8th European Conference on Silicon Carbide and Related Materials　Vol. TP-158　2010
Dicing of SiC wafer by atmospheric-pressure plasma etching process with wire electrode

2010
Abrasive-free planarization of 3-inch 4H-SiC substrate by catalyst-referred etching

Abstract Booklet of the 8th European Conference on Silicon Carbide and Related Materials　Vol. TP-160　2010
Hard X-ray Imaging Optics with Elliptical mirrors and Hyperbolic Mirrors

SPIE Optics+Photonics, Technical Program　Vol. p191, 7802-01　2010
Thinning of 2-inch SiC wafer by plasma chemical vaporization machining

Abstract Booklet of the 8th European Conference on Silicon Carbide and Related Materials　Vol. TP-155　2010
Numerically Controlled Sacrificial Plasma Oxidation Using Array-Type Electrode toward High-Throughput Deterministic Machining

Proceedings of the 2nd International Conference on Nanomanufacturing　Vol. 169　2010
Crystal Growth Technology (Chapter 18; Crystal Machining Using Atmospheric Pressure Plasma)

WILEY-VCH　2010
Development of Side-By-Side Kirkpatrick-Baez mirror for high-density X-ray nanobeam

Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology　Vol. pp70-71 (P-06)　2010
Thinning of SiC Wafer by Plasma Chemical Vaporization Machining

Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology, P-66, 190-191.　Vol. P-66, 190-191.　2010
Development of Chemical Processing Methods for Silicon Carbide Wafering and Device Processing

Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology, 6.2, 54-55.　Vol. 6.2, 54-55.　2010
Thinning of SiC wafer by plasma chemical vaporization machining

Yasuhisa Sano, Takehiro Kato, Tsutomu Hori, Kazuya Yamamura, Hidekazu Mimura, Yoshiaki Katsuyama, Kazuto Yamauchi

SILICON CARBIDE AND RELATED MATERIALS 2009, PTS 1 AND 2　Vol. 645-648　p. 857-+　2010
Influence of the UV Light Intensity on the Photoelectrochemical Planarization Technique for Gallium Nitride

Shun Sadakuni, Junji Murata, Keita Yagi, Yasuhisa Sano, Kenta Arima, Azusa Hattori, Takeshi Okamoto, Kazuto Yamauchi

SILICON CARBIDE AND RELATED MATERIALS 2009, PTS 1 AND 2　Vol. 645-648　p. 795-+　2010
Dicing of SiC Wafer by Plasma Chemical Vaporization Machining with Wire Electrode

K. Aida, Y. Sano, K. Yamamura, H. Mimura, S. Matsuyama, K. Yamauchi

Second International Symposium on Atomically Controlled Fabrication Technology　Vol. pp. 188-189.　2009/11
Development of Achromatic X-ray Imaging System with 4 Aspherical Mirrors

S. Matsuyama, M. Fujii, T. Wakioka, H. Mimura, Y. Sano, Y. Nishino, M. Yabashi, K. Tamasaku, T. Ishikawa, K. Yamauchi

Extended Abstracts of Second International Symposium on Atomically Controlled Fabrication Technology　Vol. p166-167　2009/11
Development of a Mirror Manipulator for Advanced Kirkpatrick-Baez Optics

M. Fujii, S. Matsuyama, T. Wakioka, H. Mimura, Y. Sano, Y. Nishino, M. Yabashi, K. Tamasaku, T. Ishikawa, K. Yamauchi

Extended Abstracts of Second International Symposium on Atomically Controlled Fabrication Technology　Vol. p162-163　2009/11
Planarization of GaN using photoelectrochemical process and solid catalyst

S. Sadakuni, J. Murata, K. Yagi, Y. Sano, T. Okamoto, K. Arima, H. Mimura, K. Yamauchi

Technical Digest of International Conference on Silicon Carbide and Related Materials 2009　Vol. I-160　2009/10
Thinning of SiC wafer by plasma chemical vaporization machining

Y. Sano, T. Kato, T. Hori, K. Yamamura, H. Mimura, Y. Katsuyama, K. Yamauchi

Technical Digest of International Conference on Silicon Carbide and Related Materials 2009　Vol. II-108　2009/10
Reduction of surface roughness by catalyst-referred etching

T. Okamoto, Y. Sano, H. Hara, T. Hatayama, K. Arima, K. Yagi, J. Murata, H. Mimura, T. Fuyuki, K. Yamauchi

Technical Digest of International Conference on Silicon Carbide and Related Materials 2009　Vol. I-156　2009/10
高密度X線ナノビーム形成のための並列型Kirkpatrick-Baezミラー光学系の開発

脇岡敏之, 松山智至, 藤井正輝, 三村秀和, 佐野泰久, 山内和人

精密工学会秋季大会プログラム＆アブストラクト集　Vol. p51, D33　2009/09
Improvement of Thickness Uniformity of SOI Layer by Numerically Controlled Sacrificial Oxidation using Atmospheric-Pressure Plasma with Electrode Array System

S. Kamisaka, Y. Sano, H. Mimura, S. Matsuyama, K. Yamauchi

Proceedings of 31st International Symposium on Dry Process　Vol. 217-218　2009/09
Beveling of Silicon Carbide Wafer by Plasma Etching Using Atmospheric-Pressure Plasma

Y. Sano, T. Kato, K. Yamamura, H. Mimura, S. Matsuyama, K. Yamauchi

Proceedings of 31st International Symposium on Dry Process　Vol. 215-216　2009/09
Novel Scheme of Figure-Error Correction for X-ray Nanofocusing Mirror

Soichiro Handa, Hidekazu Mimura, Hirokatsu Yumoto, Takashi Kimura, Satoshi Matsuyama, Yasuhisa Sano, Kazuya Yamamura, Kenji Tamasaku, Yoshinori Nishino, Makina Yabashi, Tetsuya Ishikawa, Kazuto Yamauchi

Japanese Journal of Applied Physics, 48 (2009) 096507-1_4.　Vol. 48　No. 9　2009/09
触媒基準エッチング法(CAtalyst Referred Ething: CARE)の開発--SiC, GaN基板加工への応用 (特集グリーンエネルギー時代を支える先進加工技術とその課題)

山内和人, 佐野泰久, 有馬健太

機械と工具　Vol. 53　No. 8　p. 20-24　2009/08
Publisher: 工業調査会
Termination dependence of surface stacking at 4H-SiC(0001)-1×1: Density functional theory calculations

Hideyuki Hara, Yoshitada Morikawa, Yasuhisa Sano, Kazuto Yamauchi

PHYSICAL REVIEW B　Vol. 79　No. 15　2009/04
Etching of GaN by plasma chemical vaporization machining

Yasuji Nakahama, Norio Kanetsuki, Takeshi Funaki, Masaru Kadono, Yasuhisa Sano, Kazuya Yamamura, Katsuyoshi Endo, Yuzo Mori

2009/03
Development of Advanced Kirkpatrick -Baez System for X- ray Nano- Imaging

M. Fujii, S. Matsuyama, T. Wakioka, H. Mimura, Y. Sano, K. Yamauchi

Extended Abstracts of First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing　Vol. p78-79　2009/02
A Study on a Surface Preparation Method for Single-Crystal SiC Using an Fe Catalyst

Akihisa Kubota, Keita Yagi, Junji Murata, Heiji Yasui, Shiro Miyamoto, Hideyuki Hara, Yasuhisa Sano, Kazuto Yamauchi

JOURNAL OF ELECTRONIC MATERIALS　Vol. 38　No. 1　p. 159-163　2009/02
Beveling of Silison Carbide Wafer by Plasma Chemical Vaporization Machining

Takehiro Kato, Yasuhisa Sano, Hideyuki Hara, Hidekazu Mimura, Kazuya Yamamura, Kazuto Yamauchi

Materials Science Forum　Vol. Vols. 600-603, pp 843-846　2009/02
Temperature Dependence of Plasma Chemical Vaporization Machining of Silicon and Silicon Carbide

Yasuhisa Sano, Masayo Watanabe, Takehiro Kato, Kazuya Yamamura, Hidekazu Mimura, Kazuto Yamauchi

Materials Science Forum　Vol. Vols. 600-603, pp 847-850　2009/02
Damage-free Planarization of 2-inch 4H-SiC Wafer Using Pt Catalyst Plate and HF Solution

Takeshi Okamoto, Yasuhisa Sano, Hideyuki Hara, Kenta Arima, Keita Yagi, Junji Murata, Hedekazu Mimura, Kazuto Yamauchi

Materials Science Forum　Vol. 600-603　p. 835-+　2009/02
Development of nanometer-level accurate surface figure replication process

Mimura Hidekazu, Ishikura Hiroyuki, Matsuyama Satoshi, Sano Yasuhisa, Yamauchi Kazuto

Proceedings of JSPE Semestrial Meeting　Vol. 2009　No. 0　p. 263-264　2009
Publisher: The Japan Society for Precision Engineering
Catalyst-Referred Etching of 4H-SiC:Study of Etching Mechanism

Hara Hideyuki, Sano Yasuhisa, Morikawa Yoshitada, Okamoto Takeshi, Yagi Keita, Murata Junji, Sadakuni Shun, Arima Kenta, Yamauchi Kazuto

Proceedings of JSPE Semestrial Meeting　Vol. 2009　No. 0　p. 1011-1012　2009
Publisher: The Japan Society for Precision Engineering
Development of electroforming for ultra-precise mirror fabrication

Ishikura Hiroyuki, Mimura Hidekazu, Matsuyama Satoshi, Sano Yasuhisa, Yamauchi Kazuto

Proceedings of JSPE Semestrial Meeting　Vol. 2009　No. 0　p. 181-182　2009
Publisher: The Japan Society for Precision Engineering
Evaluation of GaN Substrate Surface Quality by Characteristics of Schottky Barrier Diode

Shirasawa Yuki, Sano Yasuhisa, Murata Junji, Yamauchi Kazuto

Proceedings of JSPE Semestrial Meeting　Vol. 2009　No. 0　p. 175-176　2009
Publisher: The Japan Society for Precision Engineering
Sub-10 nm Focusing of Hard X-ray by Pt/C Multilayer Mirror

Handa Soichiro, Kimura Takashi, Yamakawa Daisuke, Yumoto Hirokatsu, Mimura Hidekazu, Matsuyama Satoshi, Sano Yasuhisa, Ishikawa Tetsuya, Yamauchi Kazuto

Proceedings of JSPE Semestrial Meeting　Vol. 2009　No. 0　p. 149-150　2009
Publisher: The Japan Society for Precision Engineering
硬X線用高精度波面制御システムの開発

木村隆志, 半田宗一郎, 山川大輔, 湯本博勝, 三村秀和, 松山智至, 佐野泰久, 石川哲也, 山内和人

精密工学会学術講演会講演論文集　Vol. 2009　No. 0　p. 147-148　2009
Development of surface-figure metrology technique based on relative-angle-determinable stitching interferometry for hard-x-ray nanofocusing mirrors

Yumoto Hirokatsu, Mimura Hidekazu, Handa Soichiro, Kimura Takashi, Matsuyama Satoshi, Sano Yasuhisa, Ohashi Haruhiko, Ishikawa Tetsuya, Yamauchi Kazuto

Proceedings of JSPE Semestrial Meeting　Vol. 2009　No. 0　p. 143-144　2009
Publisher: The Japan Society for Precision Engineering
硬X線微小集光用多層膜ミラーの開発

半田宗一郎, 木村隆志, 三村秀和, 湯本博勝, 松山智至, 佐野泰久, 玉作賢治, 西野吉則, 矢橋牧名, 石川哲也, 山内和人

日本放射光学会年会・放射光科学合同シンポジウム予稿集　Vol. 22nd　2009
硬X線ナノビーム用波面補正ミラーの開発

木村隆志, 半田宗一郎, 三村秀和, 湯本秀和, 山川大輔, 松山智至, 佐野泰久, 玉作賢治, 西野吉則, 矢橋牧名, 石川哲也, 山内和人

日本放射光学会年会・放射光科学合同シンポジウム予稿集　Vol. 22nd　2009
フレネルミラーを用いたX線の可干渉性の評価

山川大輔, 三村秀和, 木村隆志, 松山智至, 佐野泰久, 玉作賢治, 西野吉則, 矢橋牧名, 石川哲也, 山内和人

日本放射光学会年会・放射光科学合同シンポジウム予稿集　Vol. 22nd　2009
高度好熱菌丸ごと一匹プロジェクト走査型X線顕微鏡を用いた細胞イメージング

松山智至, 志村まり, 藤井正輝, 脇岡敏之, 三村秀和, 佐野泰久, 矢橋牧名, 西野吉則, 玉作賢治, 石川哲也, 山内和人

高度好熱菌丸ごと一匹プロジェクト第8回連携研究会理研シンポジウム平成21年　p. 9-10　2009
Advanced Kirkpatrick-Baez ミラー光学系の開発

藤井正輝, 松山智至, 三村秀和, 脇岡敏之, 半田宗一郎, 木村隆志, 佐野泰久, 西野吉則, 玉作賢治, 矢橋牧名, 石川哲也, 山内和人

第22回日本放射光学会年会・放射光科学合同シンポジウム　Vol. 23　No. 2　p. 118-119　2009/01
Novel scheme of figure-error correction for X-ray nanofocusing mirror

Soichiro Handa, Hidekazu Mimura, Hirokatsu Yumoto, Takashi Kimura, Satoshi Matsuyama, Yasuhisa Sano, Kazuya Yamamura, Kenji Tamasaku, Yoshinori Nishino, Makina Yabashi, Tetsuya Ishikawa, Kazuto Yamauchi

Japanese Journal of Applied Physics　Vol. 48　No. 9　p. 0965071-0965074　2009
次世代パワー半導体－省エネルギー社会に向けたデバイス開発の最前線－第1章第1節2 PCVMを用いたSiC基板の薄化

(株)エヌ・ティー・エス　2009
大気圧プラズマ基礎と応用 6.7.5 マイクロ／ナノ加工日本学術振興会プラズマ材料科学第153委員会

オーム社　2009
Temperature Dependence of Plasma Chemical Vaporization Machining of Silicon and Silicon Carbide

Yasuhisa Sano, Masayo Watanabe, Takehiro Kato, Kazuya Yamamura, Hidekazu Mimura, Kazuto Yamauchi

SILICON CARBIDE AND RELATED MATERIALS 2007, PTS 1 AND 2　Vol. 600-603　p. 847-+　2009
Beveling of Silison Carbide Wafer by Plasma Chemical Vaporization Machining

Materials Science Forum　Vol. Vols. 600-603, pp 843-846　2009
Damage-free Planarization of 2-inch 4H-SiC Wafer Using Pt Catalyst Plate and HF Solution

Takeshi Okamoto, Yasuhisa Sano, Hideyuki Hara, Kenta Arima, Keita Yagi, Junji Murata, Hidekazu Mimura, Kazuto Yamauchi

SILICON CARBIDE AND RELATED MATERIALS 2007, PTS 1 AND 2　Vol. 600-603　p. 835-+　2009
Development of Advanced Kirkpatrick-Baez System for Hard X-ray Nano-Imaging

Extended abstracts of international workshop on X-ray mirror design, fabrication and metrology　Vol. p78-79　2009
Improvement of Thickness Uniformity of SOI Layer by Numerically Controlled Sacrificial Oxidation using Atmospheric-Pressure Plasma with Electrode Array System

Proceedings of 31st International Symposium on Dry Process　Vol. 217-218　2009
Beveling of Silicon Carbide Wafer by Plasma Etching Using Atmospheric-Pressure Plasma

Proceedings of 31st International Symposium on Dry Process　Vol. 215-216　2009
Planarization of GaN using photoelectrochemical process and solid catalyst

Technical Digest of International Conference on Silicon Carbide and Related Materials 2009　Vol. I-160　2009
Thinning of SiC wafer by plasma chemical vaporization machining

Technical Digest of International Conference on Silicon Carbide and Related Materials 2009　Vol. II-108　2009
Reduction of surface roughness by catalyst-referred etching

Technical Digest of International Conference on Silicon Carbide and Related Materials 2009　Vol. I-156　2009
Dicing of SiC Wafer by Plasma Chemical Vaporization Machining with Wire Electrode

Second International Symposium on Atomically Controlled Fabrication Technology　Vol. pp. 188-189.　2009
Development of Achromatic X-ray Imaging System with 4 Aspherical Mirrors

Extended Abstracts of Second International Symposium on Atomically Controlled Fabrication Technology　Vol. p166-167　2009
Development of a Mirror Manipulator for Advanced Kirkpatrick-Baez Optics

Extended Abstracts of Second International Symposium on Atomically Controlled Fabrication Technology　Vol. p162-163　2009
New chemical planarization of SiC and GaN using an Fe plate in H2O2 solution

J. Murata, A. Kubota, K. Yagi, Y. Sano, H. Hara, K. Arima, T. Okamoto, H. Mimura, K. Yamauchi

SILICON CARBIDE AND RELATED MATERIALS 2007, PTS 1 AND 2　Vol. 600-603　p. 815-+　2009
Etching of GaN by plasma chemical vaporization machining

2009
Etching characteristics of GaN by plasma chemical vaporization machining

Yasuji Nakahama, Norio Kanetsuki, Takeshi Funaki, Masaru Kadono, Yasuhisa Sano, Kazuya Yamamura, Katsuyoshi Endo

Surf. Interface Anal.　Vol. 40　No. 12　p. 1566-1570　2008/12
Etching characteristics of GaN by plasma chemical vaporization machining

Yasuji Nakahama, Norio Kanetsuki, Takeshi Funaki, Masaru Kadono, Yasuhisa Sano, Kazuya Yamamura, Katsuyoshi Endo, Yuzo Mori

SURFACE AND INTERFACE ANALYSIS　Vol. 40　No. 12　p. 1566-1570　2008/12
Plasma Chemical Vaporization Machining and Elastic Emission Machining

Yasuhisa Sano, Kazuya Yamamura, Hidekazu Mimura, Kazuto Yamauchi, Yuzo Mori

Crystal Growth Technology: From Fundamentals and Simulation to Large-scale Production　Vol. Chapter 19, Plasma Chemical Vaporization Machining and Elastic Emission Machining　p. 475-495　2008/11/25
Publisher: Wiley-VCH Verlag GmbH & Co. KGaA
Improvement of Thickness Uniformity of SOI by Numerically Controlled Sacrificial Oxidation Using Atmospheric-Pressure Plasma

Y. Sano, T. Masuda, S. Kamisaka, H. Mimura, S. Matsuyama, K. Yamauchi

2008 IEEE International SOI Conference Proceedings　Vol. 165-166　p. 165-166　2008/10
Trace element mapping using a high-resolution scanning X-ray fluorescence microscope equipped with a Kirkpatrick-Baez mirror system

S. Matsuyama, H. Mimura, K. Katagishi, H. Yumoto, S. Handa, M. Fujii, Y. Sano, M. Shimura, M. Yabashi, Y. Nishino, K. Tamasaku, T. Ishikawa, K. Yamauchi

SURFACE AND INTERFACE ANALYSIS　Vol. 40　No. 6-7　p. 1042-1045　2008/06
Catalyst-referred etching

K. Yamauchi, Y. Sano, K. Arima, H. Hara

Book of Lecture Notes, 4th International Workshop on Crystal Growth Technology　Vol. 87　2008/05
Crystal machining using atmospheric pressure plasma

Y. Sano, K. Yamamura, K. Yamauchi, Y. Mori

Book of Lecture Notes, 4th International Workshop on Crystal Growth Technology　Vol. 47　2008/05
Ultraprecision finishing technique by numerically controlled sacrificial oxidation

Yasuhisa Sano, Takaya Masuda, Hidekazu Mimura, Kazuto Yamauchi

Journal of Crystal Growth　Vol. 310　No. 7-9　p. 2173-2177　2008/04
Chemical planarization of GaN using hydroxyl radicals generated on a catalyst plate in H2O2 solution

J. Murata, A. Kubota, K. Yagi, Y. Sano, H. Hara, K. Arima, T. Okamoto, H. Mimura, K. Yamauchi

Journal of Crstal Growth　Vol. 310　No. 7-9　p. 1637-1641　2008/04
Chemical planarization of GaN using hydroxyl radicals generated on a catalyst plate in H2O2 solution

J. Murata, A. Kubota, K. Yagi, Y. Sano, H. Hara, K. Arima, T. Okamoto, H. Mimura, K. Yamauchi

JOURNAL OF CRYSTAL GROWTH　Vol. 310　No. 7-9　p. 1637-1641　2008/04
Ultraprecision finishing technique by numerically controlled sacrificial oxidation

Yasuhisa Sano, Takaya Masuda, Hidekazu Mimura, Kazuto Yamauchi

JOURNAL OF CRYSTAL GROWTH　Vol. 310　No. 7-9　p. 2173-2177　2008/04
Trace element mapping using a high-resolution scanning X-ray fluorescence microscope equipped with a Kirkpatrick-Baez mirror system

S. Matsuyama, H. Mimura, K. Katagishi, H. Yumoto, S. Handa, M. Fujii, Y. Sano, M. Shimura, M. Yabashi, Y. Nishino, K. Tamasaku, T. Ishikawad, K. Yamauchi

Surface and interface analysis　Vol. 40　No. 6-7　p. 1042-1045　2008/03
Catalyst-referred etching

Hideyuki Hara, Yasuhisa Sano, Kenta Arima, Kazuto Yamauchi

OYOBUTURI　Vol. 53　No. 8　p. 20-24　2008/02
Kirkpatrick‐Baezミラー光学系を搭載した走査型蛍光X線顕微鏡による細胞内元素分布の観察

藤井正輝, 松山智至, 志村まり, 三村秀和, 前島一博, 片岸恵子, 湯本博勝, 半田宗一郎, 佐野泰久, 西野吉則, 玉作賢治, 矢橋牧名, 石川哲也, 山内和人

日本放射光学会年会・放射光科学合同シンポジウム予稿集　Vol. 21st　2008/01
触媒基準エッチング法

応用物理　Vol. Vol. 77, No 2, pp 168-171　2008
Crystal Growth Technology (Plasma Chemical Vaporization Machining and Elastic Emission Machining)

Wiley-VCH　Vol. Chapter 19, Plasma Chemical Vaporization Machining and Elastic Emission Machining　2008
Improvement of thickness uniformity of SOI by numerically controlled sacrificial oxidation using atmospheric-pressure plasma

Y. Sano, T. Masuda, S. Kamisaka, H. Mimura, S. Matsuyama, K. Yamauchi

Proceedings - IEEE International SOI Conference　Vol. 165-166　p. 165-166　2008
Crystal machining using atmospheric pressure plasma

Book of Lecture Notes, 4th International Workshop on Crystal Growth Technology　Vol. 47　2008
Catalyst-referred etching

Book of Lecture Notes, 4th International Workshop on Crystal Growth Technology　Vol. 87　2008
硬X線反射用多層膜ミラーの開発

半田宗一郎, 玉作賢治, 三村秀和, 湯本博勝, 木村隆志, 松山智至, 佐野泰久, 西野吉則, 矢橋牧名, 石川哲也, 山内和人

日本放射光学会年会・放射光科学合同シンポジウム予稿集　Vol. 21st　2007/12/20
硬X線集光ミラーのためのスティッチング干渉法に基づく高精度表面形状計測法の開発

湯本博勝, 三村秀和, 木村隆志, 半田宗一郎, 松山智至, 佐野泰久, 西野吉則, 玉作賢治, 矢橋牧名, 石川哲也, 山内和人

日本放射光学会年会・放射光科学合同シンポジウム予稿集　Vol. 21st　2007/12/20
KBミラー光光学系におけるX線集光状態維持システム

山川大輔, 三村秀和, 木村隆志, 湯本博勝, 松山智至, 佐野泰久, 玉作賢治, 西野吉則, 矢橋牧名, 石川哲也, 山内和人

日本放射光学会年会・放射光科学合同シンポジウム予稿集　Vol. 21st　2007/12/20
Atomic-scale characterization of hf-treated 4H-SiC(0001)l×l surfaces by scanning tunneling microscopy

Kenta Arima, Hideyuki Hara, Yasuhisa Sano, Keita Yagi, Ryota Okamoto, Junji Murata, Hidekazu Mimura, Kazuto Yamauchi

Materials Research Society Symposium Proceedings　Vol. 996　p. 157-162　2007/12/01
Machining of GaN by Plasma CVM (Chemical Vaporization Machining)

Y. Nakahama, N. Kanetsuki, T. Funaki, M. Kadono, Y. Sano, K. Yamamura, K. Endo, Y. Mori

International 21st Century COE Symposium on Atomistic Fabrication Technology 2007　Vol. International 21st Century COE Symposium on Atomistic Fabrication Technology 2007, pp 18.　2007/10
Atomically Resolved STM Study of 4H-SiC(0001) Surfaces Flattened by Chemical Etching in HF solutions with Pt Catalyst

Kenta Arima, Ryosuke Suga, Hideyuki Hara, Junji Murata, Keita Yagi, Hidekazu Mimura, Yasuhisa Sano, Kazuto Yamauchi

Technical Digest of International Conference on Silicon Carbide and Related Materials 2007, Ohtsu, pp. We 28-29　Vol. We 28-29　2007/10
Publisher: The Japan Society of Applied Physics
High-resolution and Highly Sensitive Scanning X-ray Fluorescence Microscopy Using Kirkpatrick-Baez Mirror Optics

Satoshi Matsuyama, Hidekazu Mimura, Keiko Katagishi, Mari Shimura, Masaki Fujii, Hirokatsu Yumoto, Soichiro Handa, Takashi Kimura, Yasuhisa Sano, Kenji Tamasaku, Yoshinori Nishino, Makina Yabashi, Tetsuya Ishikawa, Kazuto Yamauchi

2007/10
Temperature Dependence of Plasma Chemical Vaporization Machining of Silicon and Silicon Carbide

Y. Sano, M. Watanabe, T. Kato, K. Yamamura, H. Mimura, K. Yamauchi

International Conference on Silicon Carbide and Related Materials 2007 Technical Digest　Vol. Mo-P-55　2007/10
Development of Cryo Scanning X-ray Fluorescent Microscopy to Observe Frozen Hydrated Cells and Tissues

Masaki Fujii, Satoshi Matsuyama, Mari Shimura, Keiko Katagishi, Hidekazu Mimura, Hirokatsu Yumoto, Soichiro Handa, Takashi Kimura, Yasuhisa Sano, Kenji Tamasaku, Yoshinori Nishin, Makina Yabashi, Tetsuya Ishikawa, Kazuto Yamauchi

2007/10
New Chemical Planarization of SiC and GaN Using Fe Plate in H2O2 solution

Junji Murata, Akihisa Kubota, Keita Yagi, Yasuhisa Sano, Hideyuki Hara, Kenta Arima, Takeshi Okamoto, Hidekazu Mimura, Kazuto Yamauchi

International Conference on Silicon Carbide and Related Materials 2007 Technical Digest　Vol. Th-0B-3　2007/10
Damage-free Planarization of 2-inch 4H-SiC Wafer Using Pt Catalyst Plate and HF Solution

T. Okamoto, Y. Sano, H. Hara, K. Arima, K. Yagi, J. Murata, H. Mimura, K. Yamauchi

International Conference on Silicon Carbide and Related Materials 2007 Technical Digest　Vol. We-94　2007/10
Beveling of Silicon Carbide Wafer by Plasma Chemical Vaporization Machining

Takehiro Kato, Yasuhisa Sano, Hideyuki Hara, Hidekazu Mimura, Kazuya Yamamura, Kazuto Yamauchi

International Conference on Silicon Carbide and Related Materials 2007 Technical Digest　Vol. We-98　2007/10
クライオ走査型蛍光X線顕微鏡による急速凍結された細胞の元素分布測定

片岸恵子, 松山智至, 志村まり, 三村秀和, 湯本博勝, 半田宗一郎, 木村隆志, 佐野泰久, 西野吉則, 玉作賢治, 矢橋牧名, 石川哲也, 山内和人

応用物理学会学術講演会講演予稿集　Vol. 68th　No. 3　2007/09
超高精度ミラーによる硬X線ナノビーム形成とその応用

三村秀和, 松山智至, 湯本博勝, 半田宗一郎, 片岸恵子, 木村隆志, 佐野泰久, 山村和也, 稲垣耕司, 玉作賢治, 西野吉則, 矢橋牧名, 石川哲也, 山内和人

日本物理学会講演概要集　Vol. 62　No. 2　2007/08/21
Damage-free Planarization of 4H-SiC (0001) by Catalyst-Referred Etching

Hideyuki Hara, Yasuhisa Sano, Hidekazu Mimura, Kenta Arima, Akihisa Kubota, Keita Yagi, Junji Murata, Kazuto Yamauchi

Materials Science Forum　2007/08
Damage-free planarization of GaN using a catalyst plate

Junji Murata, Akihisa Kubota, Keita Yagi, Yasuhisa Sano, Hideyuki Hara, Kenta Arima, Takeshi Okamoto, Hidekazu Mimura, Kazuto Yamauchi

Proceedings of 15th International Conference on Crystal Growth　Vol. #789　2007/08
Polishing characteristics of 4H-SiC Si-face and C-face by plasma chemical vaporization machining

Yasuhisa Sano, Masayo Watanabe, Kazuya Yamamura, Kazuto Yamauchi, Takeshi Ishida, Kenta Arima, Akihisa Kubota, Yuzo Mori

SILICON CARBIDE AND RELATED MATERIALS 2006　Vol. 556-557　p. 757-+　2007/08
Measurement of rotational and vibrational temperature of gas molecules in the CVM plasma by using spatial resolved optical emission spectrometry

Kohji Ueno, Yasushi Oshikane, Yasuhisa Sano, Kazuya Yamamura

18th International Symposium on Plasma Chemistry　Vol. pp. 166.　2007/08
Fabrication of ultrathin and highly uniform silicon on insulator by numerically controlled plasma chemical vaporization machining

Yasuhisa Sano, Kazuya Yamamura, Hidekazu Mimura, Kazuto Yamauchi, Yuzo Mori

REVIEW OF SCIENTIFIC INSTRUMENTS　Vol. 78　No. 8　2007/08
New Crystal Planarization Technique using a catalyst plate

Hideyuki Hara, Yasuhisa Sano, Kenta Arima, Keita Yagi, Junji Murata, Takeshi Okamoto, Hidekazu Mimura, Kazuto Yamauchi

Proceedings of 15th International Conference on Crystal Growth　Vol. #769　2007/08
Ultraprecision Finishing Technique by Numerically Controlled Sacrificial Oxidation

Yasuhisa Sano, Takaya Masuda, Hidekazu Mimura, Kazuto Yamauchi

Proceedings of 15th International Conference on Crystal Growth　Vol. #586　2007/08
Atomic-scale flattening of SiC surfaces by electroless chemical etching in HF solution with Pt catalyst

Kenta Arima, Hideyuki Hara, Junji Murata, Takeshi Ishida, Ryota Okamoto, Keita Yagi, Yasuhisa Sano, Hidekazu Mimura, Kazuto Yamauchi

Applied Physics Letters　Vol. 90　No. 20　p. 202106 1-202106 3　2007/05
Atomic-scale flattening of SiC surfaces by electroless chemical etching in HF solution with Pt catalyst

Kenta Arima, Hideyuki Hara, Junji Murata, Takeshi Ishida, Ryota Okamoto, Keita Yagi, Yasuhisa Sano, Hidekazu Mimura, Kazuto Yamauchi

APPLIED PHYSICS LETTERS　Vol. 90　No. 20　2007/05
Surface gragient integrated profiler for X-ray and EUV optics

Yasuo Higashi, Yuichi Takaie, Katsuyoshi Endo, Tatsuya Kume, Kazuhiro Enami, Kazuto Yamauchi, Kazuya Yamamura, Yasuhisa Sano, Kenji Ueno, Yuzo Mori

SCIENCE AND TECHNOLOGY OF ADVANCED MATERIALS　Vol. 8　No. 3　p. 177-180　2007/04
Catalyst-referred etching of silicon

Hideyuki Hara, Yasuhisa Sano, Kenta Arima, Keita Yagi, Junji Murata, Akihisa Kubota, Hidekazu Mimura, Kazuto Yamauchi

SCIENCE AND TECHNOLOGY OF ADVANCED MATERIALS　Vol. 8　No. 3　p. 162-165　2007/04
Fabrication of damascene Cu wirings using solid acidic catalyst

K. Yagi, J. Murata, H. Hara, Y. Sano, K. Yamauchi, H. Goto

Science and Technology of Advanced Materials　Vol. 8　No. 3　p. 166-169　2007/04
CAtalyst-Referred Etching of Silicon

H. Hara, Y. Sano, K. Arima, K. Yagi, J. Murata, A. Kubota, H. Mimura, K. Yamauchi

Science and Technology of Advanced Materials　Vol. 8　No. 3　p. 162-165　2007/04
Fabrication of damascene Cu wirings using solid acidic catalyst

Keita Yagi, Junji Murata, Hideyuki Hara, Yasuhisa Sano, Kazuto Yamauchi, Hidekazu Goto

SCIENCE AND TECHNOLOGY OF ADVANCED MATERIALS　Vol. 8　No. 3　p. 166-169　2007/04
Ultraprecision Machining Method for Ultraprecise Aspherical Mirror

Yasuhisa Sano, Hidekazu Mimura, Kazuya Yamamura, Kazuto Yamauchi, Yuzo Mori

The Review of Laser Engineering　Vol. 35　No. 3　p. 162-167　2007/03
Improvement of the thickness distribution of at cut quartz crystal wafer by open-air type plasma chemical vaporization machining

Kazuya Yamamura, Masafumi Shibahara, Yasuhisa Sano, Yusuke Yamamoto, Tetsuya Morikawa, Yuzo Mori

e-Journal of Surface Science and Nanotechnology　Vol. 5　p. 41-44　2007/02/06
Efficient focusing of hard x-rays to 25nm by a total reflection mirror

H. Mimura, H. Yumoto, S. Matsuyama, Y. Sano, K. Yamamura, Y. Mori, M. Yabashi, Y. Nishino, K. Tamasaku, T. Ishikawa, K. Yamauchi

APPLIED PHYSICS LETTERS　Vol. 90　No. 5　2007/02
Investigation of Surface Roughness of Silicon Carbide in Elastic Emission Machining

A. Kubota, Y. Shinbayashi, H. Mimura, Y.Sano, K.Inagaki, Y.Mori, K.Yamauchi

JOURNAL OF ELECTRONIC MATERIALS　Vol. 36　No. 1　p. 92-97　2007/02
Improvement of the Thickness Distribution of AT Cut Quartz Crystal Wafer by Open-air Type Plasma Chemical Vaporization Machining

Kazuya Yamamura, Masafumi Shibahara, Yasuhisa Sano, Yusuke Yamamoto, Tetsuya Morikawa, Yuzo Mori

e-Journal of Surface Science and Nanotechnology　Vol. 5　p. 41-44　2007/02
硬X線集光光学系における波面補正法の開発

木村隆志, 三村秀和, 松山智至, 湯本博勝, 半田宗一郎, 佐野泰久, 山内和人

精密工学会関西地方定期学術講演会講演論文集　Vol. 2007　2007
The study on SiC surface preparation method by Catalyst-Referred Etching

Kubota Akihisa, Yagi keita, Murata Junji, Hara Hideyuki, Miyamoto Shiro, Mimura Hidekazu, Sano Yasuhisa, Yamauchi Kazuto

Proceedings of JSPE Semestrial Meeting　Vol. 2007　No. 0　p. 81-82　2007
Publisher: The Japan Society for Precision Engineering
Catalyst-Referred Etching of 4H-SiC:Planarization of 2 inch wafers

Hara Hideyuki, Sano Yasuhisa, Okamoto Takeshi, Arima Kenta, Yagi Keita, Murata Junji, Mimura Hidekazu, Yamauchi Kazuto

Proceedings of JSPE Semestrial Meeting　Vol. 2007　No. 0　p. 1001-1002　2007
Publisher: The Japan Society for Precision Engineering
Fabrication of X‐ray Mirror for Hard X‐ray Diffraction Limited Nanofocusing

YUMOTO Hirokatsu, MIMURA Hidekazu, MATSUYAMA Satoshi, HANDA Soichiro, SHIBATANI Akihiko, KATAGISHI Keiko, YAMAMURA Kazuya, SANO Yasuhisa, ENDO Katsuyoshi, MORI Yuzo, YABASHI Makina, NISHINO Yoshinori, TAMASAKU Kenji, ISHIKAWA Tetsuya, YAMAUCHI Kazuto

AIP Conference Proceedings　Vol. 879　No. Pt.1　p. 967-970　2007
Development of a Scanning X‐ray Fluorescence Microscope Using Size‐Controllable Focused X‐ray Beam from 50 to 1500nm

MATSUYAMA Satoshi, MIMURA Hidekazu, YUMOTO Hirokatsu, KATAGISHI Keiko, HANDA Soichiro, SHIBATANI Akihiko, SANO Yasuhisa, YAMAMURA Kazuya, ENDO Katsuyoshi, MORI Yuzo, NISHINO Yoshinori, TAMASAKU Kenji, YABASHI Makina, ISHIKAWA Tetsuya, YAMAUCHI Kazuto

AIP Conference Proceedings　Vol. 879　No. Pt.2　p. 1325-1328　2007
22pTC-3 Hard X-ray nanofocusing by ultraprecisely figured mirrors and its applications

Mimura H, Matsuyama S, Yumoto H, Handa S, Katagishi K, Kimura T, Sano Y, Yamamura K, Inagaki K, Tamasaku K, Nishino Y, Yabashi M, Ishikawa T, Yamauchi K

Meeting Abstracts of the Physical Society of Japan　Vol. 62　No. 0　p. 989-989　2007
Publisher: 一般社団法人日本物理学会
Investigation of the surface removal process of silicon carbide in elastic emission machining

Akihisa Kubota, Yohsuke Shinbayashi, Hidekazu Mimura, Yasuhisa Sano, Kouji Inagaki, Yuzo Mori, Kazuto Yamauchi

JOURNAL OF ELECTRONIC MATERIALS　Vol. 36　No. 1　p. 92-97　2007/01
Beveling of Silicon Carbide Wafer by Plasma Chemical Vaporization Machining

International Conference on Silicon Carbide and Related Materials 2007 Technical Digest　Vol. We-98　2007
高精度非球面ミラーの加工技術

レーザー学会誌　Vol. Vol. 35, pp.162-167　2007
Machining of GaN by Plasma CVM (Chemical Vaporization Machining)

International 21st Century COE Symposium on Atomistic Fabrication Technology 2007　Vol. International 21st Century COE Symposium on Atomistic Fabrication Technology 2007, pp 18.　2007
Efficient focusing of hard x rays to 25 nm by a total reflection mirror

Hidekazu Mimura, Hirokatsu Yumoto, Satoshi Matsuyama, Yasuhisa Sano, Kazuya Yamamura, Yuzo Mori, Makina Yabashi, Yoshinori Nishino, Kenji Tamasaku, Tetsuya Ishikawa, Kazuto Yamauchi

APPLIED PHYSICS LETTERS　Vol. 90　No. 5　2007/01
Measurement of rotational and vibrational temperature of gas molecules in the CVM plasma by using spatial resolved optical emission spectrometry

18th International Symposium on Plasma Chemistry　Vol. pp. 166.　2007
Damage-free planarization of 4H-SiC(0001) by catalyst-referred etching

Hideyuki Hara, Yasuhisa Sano, Hidekazu Mimura, Kenta Arima, Akihisa Kubota, Keita Yagi, Junji Murata, Kazuto Yamauchi

SILICON CARBIDE AND RELATED MATERIALS 2006　Vol. 556-557　p. 749-+　2007
Ultraprecision Finishing Technique by Numerically Controlled Sacrificial Oxidation

Proceedings of 15th International Conference on Crystal Growth　Vol. #586　2007
New Crystal Planarization Technique using a catalyst plate

Proceedings of 15th International Conference on Crystal Growth　Vol. #769　2007
Damage-free planarization of GaN using a catalyst plate

Proceedings of 15th International Conference on Crystal Growth　Vol. #789　2007
Atomically Resolved STM Study of 4H-SiC(0001) Surfaces Flattened by Chemical Etching in HF solutions with Pt Catalyst

Technical Digest of International Conference on Silicon Carbide and Related Materials 2007, Ohtsu, pp. We 28-29　Vol. We 28-29　2007
Temperature Dependence of Plasma Chemical Vaporization Machining of Silicon and Silicon Carbide

International Conference on Silicon Carbide and Related Materials 2007 Technical Digest　Vol. Mo-P-55　2007
Development of Cryo Scanning X-ray Fluorescent Microscopy to Observe Frozen Hydrated Cells and Tissues

2007
Damage-free Planarization of 2-inch 4H-SiC Wafer Using Pt Catalyst Plate and HF Solution

International Conference on Silicon Carbide and Related Materials 2007 Technical Digest　Vol. We-94　2007
New Chemical Planarization of SiC and GaN Using Fe Plate in H2O2 solution

International Conference on Silicon Carbide and Related Materials 2007 Technical Digest　Vol. Th-0B-3　2007
High-resolution and Highly Sensitive Scanning X-ray Fluorescence Microscopy Using Kirkpatrick-Baez Mirror Optics

2007
Measurement of rotational and vibrational temperature of gas molecule in the open-air type PCVM plasma by using spatial resolved emission spectra

Kazuya Yamamura, Koji Ueno, Yasushi Oshikane, Yasuhisa Sano, Masafumi Shibahara, Yuzo Mori

Proceedings of 28th International Symposium on Dry Process　Vol. pp. 49-50　2006/11
Improvement of the Thickness Distribution of AT Cut Quartz Crystal Wafer by Open-air Type Plasma Chemical Vaporization Machining

Kazuya Yamamura, Masafumi Shibahara, Yasuhisa Sano, Yusuke Yamamoto, Tetsuya Morikawa, Yuzo Mori

Proceedings of Handai Nanoscience and Nanotechnology International Symposium　Vol. pp. 74　2006/11
High spatial resolution machining utilizing atmospheric pressure plasma machining

Kazuya Yamamura, Kunihito Kato, Yasuhisa Sano, Masafumi Shibahara, Katsuyoshi Endo, Yuzo Mori

Proceedings of 8th International Conference on Progress of Machining Technology　Vol. pp. 257-260　2006/11
Machining characteristics of ultraprecision atmospheric pressure plasma process

Kazuya Yamamura, Koji Ueno, Akihiro Fujiwara, Yasuhisa Sano, Yasusi Oshikane, Masafumi Shibahara, Katsuyoshi Endo, Yuzo Mori

Proceedings of 8th International Conference on Progress of Machining Technology　Vol. pp. 265-268　2006/11
Development of ultraprecision numerically controlled finishing machine utilizing atmospheric pressure plasma

Kazuya Yamamura, Akihiro Fujiwara, Koji Ueno, Yasuhisa Sano, Masafumi Shibahara, Katsuyoshi Endo, Yuzo Mori

Proceedings of 8th International Conference on Progress of Machining Technology　Vol. pp. 253-256　2006/11
Ultraprecision machining utilizing numerically controlled scanning of localized atmospheric pressure plasma

Kazuya Yamamura, Yasuhisa Sano, Masafumi Shibahara, Kazuto Yamauchi, Hidekazu Mimura, Katsuyoshi Endo, Yuzo Mori

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers　Vol. 45　No. 10 B　p. 8270-8276　2006/10/21
Polishing characteristics of silicon carbide by plasma chemical vaporization machining

Yasuhisa Sano, Masayo Watanabe, Kazuya Yamamura, Kazuto Yamauchi, Takeshi Ishida, Kenta Arima, Akihisa Kubota, Yuzo Mori

Jpn. J. Appl. Phys. 45 No.10B　Vol. 45　No. 10　p. 8277-8280　2006/10
Development of scanning x-ray fluorescence microscope with spatial resolution of 30 nm using Kirkpatrick-Baez mirror optics

S. Matsuyama, H. Mimura, H. Yumoto, Y. Sano, K. Yamamura, M. Yabashi, Y. Nishino, K. Tamasaku, T. Ishikawa, K. Yamauchi

REVIEW OF SCIENTIFIC INSTRUMENTS　Vol. 77　No. 10　2006/10
Development of mirror manipulator for hard x-ray nanofocusing at sub-50nm level

S. Matsuyama, H. Mimura, H. Yumoto, H. Hara, S. Handa, K. Yamamura, Y. Sano, K. Endo, Y. Mori, M. Yabashi, Y. Nishino, K. Tamasaku, T. Ishikawa, K. Yamauchi

Review of Scientific Instruments　Vol. 77　No. 9　2006/10
High Spatial Resolution Machining Utilizing Atmospheric Pressure Plasma -Machining Characteristics of Silicon-

Kazuya Yamamura, Kunihito Kato, Yasuhisa Sano, Masafumi Shibahara, Katsuyoshi Endo, Yuzo Mori

Jpn. J. Appl. Phys. 45 No.10B　Vol. Vol. 45 8281-8285　p. 257-260　2006/10
Polishing characteristics of silicon carbide by plasma chemical vaporization machining

Yasuhisa Sano, Masayo Watanabe, Kazuya Yamamura, Kazuto Yamauchi, Takeshi Ishida, Kenta Arima, Akihisa Kubota, Yuzo Mori

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS　Vol. 45　No. 10B　p. 8277-8280　2006/10
Surface Gradient Integrated Profiler for X-ray and EUV Optics

Y. Higashi, Y. Takaie, K. Endo, Y. Mori, K. Yamauchi, T. Kume, K. Enami, K. Yamamura, Y. Sano, K. Ueno

Proceedings of International 21st Century COE Symposium on Atomistic Fabrication Technology　Vol. 8　No. 3　p. 177-180　2006/10
High-spatial-resolution machining utilizing atmospheric pressure plasma: Machining characteristics of silicon

Kazuya Yamamura, Kunihito Kato, Yasuhisa Sano, Masafumi Shibahara, Katsuyoshi Endo, Yuzo Mori

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS　Vol. 45　No. 10B　p. 8281-8285　2006/10
At-wavelength metrology for hard X-ray nanofocusing mirror

Mimura Hidekazu, Yumoto Hirokatsu, Handa Soichiro, Matsuyama Satoshi, Sano Yasuhisa, Nishino Yoshinori, Tamasaku Kenji, Yabashi Makina, Ishikawa Tetsuya, Yamauchi Kazuto

Proceedings of JSPE Semestrial Meeting　Vol. 2006　No. 0　p. 207-208　2006/09/04
Publisher: 公益社団法人精密工学会
Polishing characteristics of 4H-SiC Si-face and C-face by plasma chemical vaporization machining

Yasuhisa Sano, Masayo Watanabe, Kazuya Yamamura, Kazuto Yamauchi, Takeshi Ishida, Kenta Arima, Akihisa Kubota, Yuzo Mori

2006/09
Observation of Intracellular Elements by Scanning X-ray Fluorescence Microscopy with Spatial Resolution of 50nm

Keiko Katagishi, Satoshi Matsuyama, Hidekazu Mimura, Mari Shimura, Hirokatsu Yumoto, Soichiro Handa, Akihiko Shibatani, Yasuhisa Sano, Kazuya Yamamura, Yoshinori Nishino, Kenji Tamasaku, Makina Yabashi, Tetsuya Ishikawa, Kazuto Yamauchi

2006/09
Scanning X-ray Fluorescence Microscope Using Kirkpatrick-Baez Optics with Spatial Resolution Better than 50nm

Satoshi Matsuyama, Hidekazu Mimura, Mari Shimura, Hirokatsu Yumoto, Keiko Katagishi, Soichiro Handa, Akihiko Shibatani, Yasuhisa Sano, Kazuya Yamamura, Katsuyoshi Endo, Yuzo Mori, Yoshinori Nishino, Kenji Tamasaku, Makina Yabashi, Tetsuya Ishikawa, Kazuto Yamauchi

The 16th International Microscopy Congress (IMC16)　Vol. Vol2, 1030　2006/09
Development of scanning X-ray fluorescence microscope with spatial resolution of 30nm using K-B mirrors optics

S.Matsuyama, H.Mimura, H.Yumoto, K.Yamamura, Y.Sano, M.Yabashi, Y.Nishino, K.Tamasaku, T. Ishikawa, K.Yamauchi

Review of Scientific Instruments　Vol. 77,093107　2006/09
Development of mirror manipulator for hard-x-ray nanofocusing at sub-50-nm level

S. Matsuyama, H. Mimura, H. Yumoto, H. Hara, K. Yamamura, Y. Sano, K. Endo, Y. Mori, M. Yabashi, Y. Nishino, K. Tamasaku, T. Ishikawa, K. Yamauchi

REVIEW OF SCIENTIFIC INSTRUMENTS　Vol. 77　No. 9　2006/09
走査型蛍光X線顕微鏡を用いた細胞内元素分布の測定

片岸恵子, 松山智至, 志村まり, 三村秀和, 湯本博勝, 半田宗一郎, 芝谷昭彦, 佐野泰久, 西野吉則, 玉作賢治, 矢橋牧名, 石川哲也, 山内和人

応用物理学会学術講演会講演予稿集　Vol. 67th　No. 3　2006/08/29
At-wavelength figure metrology of total reflection mirrors in hard x-ray region

Hirokatsu Yumoto, Flidekazu Mimura, Satoshi Matsuyama, Soichiro Handa, Akihiko Shibatani, Keiko Katagishi, Yasuhisa Sano, Makina Yabashi, Yoshinori Nishino, Kenji Tamasaku, Tetsuya Ishikawa, Kazuto Yamauchi

ADVANCES IN X-RAY/EUV OPTICS, COMPONENTS, AND APPLICATIONS　Vol. 6317　2006/08
Scanning X-ray Fluorescence Microscope Using Kirkpatrick-Baez Optics with Spatial Resolution Better than 50nm

Satoshi Matsuyama, Hidekazu Mimura, Mari Shimura, Hirokatsu Yumoto, Keiko Katagishi, Soichiro Handa, Akihiko Shibatani, Yasuhisa Sano, Kazuya Yamamura, Yoshinori Nishino, Kenji Tamasaku, Makina Yabashi, Tetsuya Ishikawa, Kazuto Yamauchi

Proc. SPIE　Vol. 6317, 631719　2006/08
Novel Abrasive-Free Planarization of 4H-SiC(0001) Using Catalyst

Hideyuki Hara, Yasuhisa Sano, Hidekazu Mimura, Kenta Arima, Akihisa Kubota, Keita Yagi, Junji Murata, Kazuto Yamauchi

Journal of Electronic Materials　Vol. 35　No. 8　p. L11-L14　2006/08　Rapid communication, short report, research note, etc. (scientific journal)
Development of ultraprecision finishing method for quartz crystal wafer utilizing atmospheric pressure plasma

Masafumi Shibahara, Yusuke Yamamoto, Kazuya Yamamura, Yasuhisa Sano, Katsuyoshi Endo, Yuzo Mori

Towards Synthesis of Micro-/Nano-systems,　Vol. pp. 233-237　2006/08
Fabrication of small complex-shaped optics by plasma chemical vaporization machining with a microelectrode

Hideo Takino, Norio Shibata, Hiroshi Itoh, Teruki Kobayashi, Koshichi Nemoto, Takashi Fujii, Naohiko Goto, Kazuya Yamamura, Yasuhisa Sano, Yuzo Mori

APPLIED OPTICS　Vol. 45　No. 23　p. 5897-5902　2006/08
Fabrication of ultraprecisely figured mirror for nano focusing hard-x-ray

Hirokatsu Yumoto, Hidekazu Mimura, Satoshi Matsuyama, Souichiro Handa, Kazuya Yamamura, Yasuhisa Sano, Katsuyoshi Endo, Yuzo Mori, Makina Yabashi, Yoshinori Nishino, Kenji Tamasaku, Tetsuya Ishikawa, Kazuto Yamauchi

Towards Synthesis of Micro-/Nano-systems　Vol. pp. 295-300　2006/08
Ultraprecision finishing of photomask substrate by utilizing atmospheric pressure plasma

Kazuya Yamamura, Akihiro Fujiwara, Koji Ueno, Yasuhisa Sano, Masafumi Shibahara, Katsuyoshi Endo, Yuzo Mori

Towards Synthesis of Micro-/Nano-systems　Vol. pp. 227-231　2006/08
Fabrication of small complex-shaped optics by plasmachemical vaporization machining with a microelectrode

Hideo Takino, Norio Shibata, Hiroshi Itoh, Teruki Kobayashi, Koshichi Nemoto, Takashi Fujii, Naohiko Goto, Kazuya Yamamura, Yasuhisa Sano, Yuzo Mori

Applied Optics　Vol. 45　No. 23　p. 5897-5902　2006/08
Development of a Mirror Manipulator for Hard X-ray Microscopy with High Resolution : Realization of Nanofocused Hard X-ray Beam Better than 50nm under Diffraction Limited Condition

Matsuyama Satoshi, Mimura Hidekazu, Yumoto Hirokatsu, Hara Hideyuki, Yamamura Kazuya, Sano Yasuhisa, Nishino Yoshinori, Tamasaku Kenji, Yabashi Makina, Ishikawa Tetsuya, Yamauchia Kazuto

Journal of the Japan Society for Precision Engineering. Supplement. Contributed papers　Vol. 72　No. 7　p. 884-888　2006/07/05
Publisher: 公益社団法人精密工学会
Machining characteristics of AT cut quartz crystal wafer by open-air type atmospheric pressure plasma machining system, Abstractbook of the 8th Asia-Pacific Conference on Plasma Science and Technology

Kazuya Yamamura, Koji Ueno, Yasuhisa Sano, Yasushi Oshikane, Masafumi Shibahara, Yuzo Mori

Abstractbook of the 8th Asia-Pacific Conference on Plasma Science and Technology　Vol. p.133　2006/07
Hard X-ray focusing with a beam size less than 30 nm by total reflection mirror

H. Mimura, H. Yumoto, S. Matsuyama, S. Handa, Y. Sano, K. Yamamura, K. Tamasaku, Y. Nishino, M. Yabashi, T. Ishikawa, K. Yamauchi

2006/07
Diffraction-limited X-ray nanobeam with KB mirrors

K. Yamauchi, H. Mimura, S. Matsuyama, H. Yumoto, S. Handa, Y. Sano, K. Yamamura, K. Tamasaku, Y. Nishino, M. Yabashi, T. Ishikawa

2006/07
Improvement of Thickness Uniformity of Quartz Wafer by Numerically Controlled Plasma CVM -Correction of Thickness Distribution of Quartz Wafer by Numerically Controlled Machining Utilizing Pipe Electrode-

Masafumi Shibahara, Kazuya Yamamura, Yasuhisa Sano, Tsuyoshi Sugiyama, Yuzuke Yamamoto, Katsuyoshi Endo, Yuzo Mori

Journal of the Japan Society for Precision Engineering　Vol. Vol. 72, No.7, 934-938　2006/07
At-wavelength figure metrology fo hard x-ray focusing mirrors

H. Yumoto, H. Mimura, S. Matsuyama, S. Handa, Y. Sano, M. Yabashi, Y. Nishino, K. Tamasaku, T. Ishikawa, K. Yamauchi

Review of Scientific Instruments　Vol. 77　No. 6　2006/06
At-wavelength figure metrology of hard x-ray focusing mirrors

Hirokatsu Yumoto, Hidekazu Mimura, Satoshi Matsuyama, Soichiro Handa, Yasuhisa Sano, Makina Yabashi, Yoshinori Nishino, Kenji Tamasaku, Tetsuya Ishikawa, Kazuto Yamauchi

REVIEW OF SCIENTIFIC INSTRUMENTS　Vol. 77　No. 6　2006/06
走査型蛍光X線顕微鏡を用いた細胞内元素分布の測定

片岸恵子, 松山智至, 三村秀和, 湯本博勝, 山村和也, 佐野泰久, 遠藤勝義, 森勇蔵, 西野吉則, 玉作賢治, 矢橋牧名, 石川哲也, 山内和人

応用物理学関係連合講演会講演予稿集　Vol. 53rd　No. 2　2006/03/22
Fabrication and evaluation of coherent X–ray mirror optics

Mimura Hidekazu, Yumoto Hirokatsu, Matsuyama Satoshi, Yamamura Kazuya, Sano Yasuhisa, Tamasaku Kenji, Yabashi Makina, Nisino Yoshinori, Ishikawa Tetsuya, Yamauchi Kazuto

Proceedings of JSPE Semestrial Meeting　Vol. 2006　No. 0　p. 233-234　2006/03/01
Publisher: 公益社団法人精密工学会
Development of a Mirror Manipulator for Hard X-ray Microscopy with High Resolution-Realization of Nanofocused Hard X-ray Beam Better than 50nm under Diffraction Limited Condition-

松山智至, 三村秀和, 湯本博勝, 原英之, 山村和也, 佐野泰久, 西野吉則, 玉作賢治, 矢橋牧名, 石川哲也, 山内和人

精密工学会誌(CD-ROM)　Vol. 72　No. 7　2006
Catalyst-Referred Etching of GaN

Murata Junji, Kubota Akihisa, Yagi Keita, Sano Yasuhisa, Hara Hideyuki, Arima Kenta, Mimura Hidekazu, Yamauchi Kazuto

Proceedings of JSPE Semestrial Meeting　Vol. 2006　No. 0　p. 533-534　2006
Publisher: The Japan Society for Precision Engineering
Catalyst Assited Chemical Polishing of 4H–SiC

Hara Hideyuki, Sano Yasuhisa, Mimura Hidekazu, Takegawa Yuya, Yamauchi Kazuto

Proceedings of JSPE Semestrial Meeting　Vol. 2006　No. 0　p. 557-558　2006
Publisher: The Japan Society for Precision Engineering
Removal Characteristics of Silicon Carbide (SiC) surface by EEM(Elastic Emission Machining)

Kubota Akihisa, Mimura Hidekazu, Inagaki Kouji, Sano Yasuhisa, Mori Yuzo, Yamauchi Kazuto

Proceedings of JSPE Semestrial Meeting　Vol. 2006　No. 0　p. 967-968　2006
Publisher: The Japan Society for Precision Engineering
Atomic-scale analysis of 4 H-SiC (0001) surface after wet-chemical preperations.

Okamoto Ryota, Arima Kenta, Sano Yasuhisa, Hara Hideyuki, Ishida Takeshi, Yagi Keita, Yamauchi Kazuto, Endo Katsuyoshi

Proceedings of JSPE Semestrial Meeting　Vol. 2006　No. 0　p. 539-540　2006
Publisher: The Japan Society for Precision Engineering
Catalyst-Referred Etching of 4H-SiC

Hara Hideyuki, Sano Yasuhisa, Arima Kenta, Yagi Keita, Murata Junji, Kubota Akihisa, Mimura Hidekazu, Yamauchi Kazuto

Proceedings of JSPE Semestrial Meeting　Vol. 2006　No. 0　p. 531-532　2006
Publisher: The Japan Society for Precision Engineering
Cutting of functional materials by plasma chemical vaporization machining with inner-diameter blade electrode

Y. Sano, K. Yamamura, H. Mimura, K. Yamauchi, A. Kubota, Y. Mori

Proc. ICRP-6/SPP-23　Vol. 305-306　2006/01
Wave-optical simulations for designing and evaluating hard x-ray reflective optics

H. Mimura, S. Matsuyama, H. Yumoto, S. Handa, A. Shibatani, K. Katagishi, Y. Sano, Y. Nishino, M. Yabashi, K. Tamasaku, T. Ishikawa, K. Yamauchi

ADVANCES IN X-RAY/EUV OPTICS, COMPONENTS, AND APPLICATIONS　Vol. 6317　2006
Fabrication of ultraprecisely figured mirror for nano focusing hard-x-ray

2006
Ultra precision machining utilizing numerically controlled scanning of localized atmospheric pressure plasma

K. Yamamura, Y. Sano, M. Shibahara, K. Yamauchi, H. Mimura, K. Endo, Y. Mori

Proceedings of ICRP6/SPP23　Vol. 81-82　2006/01
Improvement of Thickness Uniformity of Quartz Crystal Wafer by Numerically Controlled Plasma CVM:—Correction of Thickness Distribution of Quartz Crystal Wafer by Numerically Controlled Machining Utilizing Pipe Electrode—

SHIBAHARA Masafumi, YAMAMURA Kazuya, SANO Yasuhisa, SUGIYAMA Tsuyoshi, YAMAMOTO Yusuke, ENDO Katsuyoshi, MORI Yuzo

Journal of the Japan Society for Precision Engineering, Contributed Papers　Vol. Vol. 72, No.7, 934-938　No. 7　p. 934-938　2006
Publisher: The Japan Society for Precision Engineering
Ultraprecision finishing of photomask substrate by utilizing atmospheric pressure plasma

Towards Synthesis of Micro-/Nano-systems　Vol. pp. 227-231　2006
Fabrication of ultraprecisely figured mirror for nano focusing hard-x-ray

Towards Synthesis of Micro-/Nano-systems　Vol. pp. 295-300　2006
大気圧プラズマの生成制御と応用技術, 第13節プラズマCVMによる超精密加工

サイエンス＆テクノロジー　2006
Machining characteristics of ultraprecision atmospheric pressure plasma process

Kazuya Yamamura, Koji Ueno, Akihiro Fujiwara, Yasuhisa Sano, Yasusi Osikane, Masafumi Shibahara, Katsuyoshi Endo, Yuzo Mori

Progress of Machining Technology, Proceedings　Vol. pp. 265-268　p. 265-268　2006
Development of ultraprecison numerically controlled finishing machine utilizing atmospheric pressure plasma

Kazuya Yamamura, Akihiro Fujiwara, Koji Ueno, Yasuhisa Sano, Masafumi Shibahara, Katsuyoshi Endo, Yuzo Mori

Progress of Machining Technology, Proceedings　Vol. pp. 253-256　p. 253-256　2006
High spatial resolution machning utilizing atmospheric pressure plasma - Machining characteristics of silicon

Kazuya Yamamura, Kunihito Kato, Yasuhisa Sano, Masafumi Shibahara, Katsuyoshi Endo, Yuzo Mori

Progress of Machining Technology, Proceedings　Vol. 363-364　p. 257-260　2006
Ultra precision machining utilizing numerically controlled scanning of localized atmospheric pressure plasma

Proceedings of ICRP6/SPP23　Vol. 81-82　2006
Machining characteristics of AT cut quartz crystal wafer by open-air type atmospheric pressure plasma machining system, Abstractbook of the 8th Asia-Pacific Conference on Plasma Science and Technology

Abstractbook of the 8th Asia-Pacific Conference on Plasma Science and Technology　Vol. p.133　2006
Diffraction-limited X-ray nanobeam with KB mirrors

2006
Polishing characteristics of 4H-SiC Si-face and C-face by plasma chemical vaporization machining

2006
Damage-free Planarization of 4H-SiC (0001) by Catalyst-Referred Etching

2006
High spatial resolution machining utilizing atmospheric pressure plasma - machining characteristics of silicon -

K. Kato, K. Yamamura, Y. Sano, M. Shibahara, K. Endo, Y. Mori

Proceedings of ICRP6/SPP23　Vol. 363-364　2006/01
Development of ultraprecision finishing method for quartz crystal wafer utilizing atmospheric pressure plasma

Towards Synthesis of Micro-/Nano-systems,　Vol. pp. 233-237　2006
Surface gradient integrated profiler for X-ray and EUV optics - 3D mapping of 1m-long flat mirror and off-axis parabolic mirror

Y. Higashi, Y. Takaie, K. Endo, T. Kume, K. Enami, K. Yamauchi, K. Yamamura, Y. Sano, J. Uchikoshi, K. Ueno, Y. Mori

Proceedings of SPIE - The International Society for Optical Engineering　Vol. 6317　2006
Polishing characteristics of silicon carbide by plasma chemical vaporization machining

Jpn. J. Appl. Phys. 45 No.10B　Vol. Vol.45 8277-8280.　2006
Ultraprecision Machining Utilizing Numerically Controlled Scanning of Localized Atmospheric Pressure Plasma

Jpn. J. Appl. Phys. 45 No.10B　Vol. Vol. 45 8270-8276　2006
Measurement of rotational and vibrational temperature of gas molecule in the open-air type PCVM plasma by using spatial resolved emission spectra

Proceedings of 28th International Symposium on Dry Process　Vol. pp. 49-50　2006
Improvement of the Thickness Distribution of AT Cut Quartz Crystal Wafer by Open-air Type Plasma Chemical Vaporization Machining

Proceedings of Handai Nanoscience and Nanotechnology International Symposium　Vol. pp. 74　2006
High spatial resolution machining utilizing atmospheric pressure plasma machining

Proceedings of 8th International Conference on Progress of Machining Technology　Vol. pp. 257-260　2006
High spatial resolution machining utilizing atmospheric pressure plasma - machining characteristics of silicon -

Proceedings of ICRP6/SPP23　Vol. 363-364　2006
Ultra precision machining utilizing numerically controlled scanning of localized atmospheric pressure plasma

Proceedings of ICRP6/SPP23　Vol. 81-82　2006
Improvement of thickness uniformity of quartz crystal wafer by numerically controlled plasma CVM.

M. Shibahara, K. Yamamura, Y. Sano, T. Sugiyama, K. Endo, Y. Mori

Proc. SPIE 5918(2005) 591804　Vol. 5918, 591804　2005/10
A new designed ultra-high precision profiler

Y. Higashi, Y. Takaie, K. Endo, T. Kume, K. Enami, K. Yamauchi, K. Yamamura, Y. Sano, K. Ueno, Y. Mori

Proccedings of SPIE 5921　Vol. Vol. 5921, 592107　2005/10
Plasma Chemical Vaporization Machining (PCVM)

Y. Sano, K. Yamamura, K. Endo, Y. Mori

Book of Lecture Note, IWCGT-3, (2005) pp. 305-316.　2005/09
Improvement of Thickness Distribution of Quartz Crystal Wafer by Numerically Controlled Plasma Chemical Vaporization Machining

Masafumi Shibahara, Kazuya Yamamura, Yasuhisa Sano, Tsuyoshi Sugiyama, Katsuyoshi Endo, Yuzo Mori

Review of Scientific Instruments　Vol. 76　No. 9　2005/09
Fabrication of Ultraprecisely Figured Elliptical Mirror for Nano-Focusing of Hard X-ray and Evalation of Focusing Properties

YUMOTO Hirokatsu, MIMURA Hidekazu, MATSUYAMA Satoshi, HARA Hideyuki, YAMAMURA Kazuya, SANO Yasuhisa, UENO Kazumasa, ENDO Katsuyoshi, MORI Yuzo, NISHINO Yoshinori, TAMASAKU Kenji, YABASHI Makina, ISHIKAWA Tetsuya, YAMAUCHI Kazuto

Journal of the Japan Society for Precision Engineering. Supplement. Contributed papers　Vol. 71　No. 9　p. 1137-1140　2005/09
Publisher: The Japan Society for Precision Engineering
Improvement of the thickness distribution of a quartz crystal wafer by numerically controlled plasma chemical vaporization machining

Masafumi Shibahara, Kazuya Yamamura, Yasuhisa Sano, Tsuyoshi Sugiyama, Katsuyoshi Endo, Yuzo Mori

Review of Scientific Instruments　Vol. 76　No. 9　2005/09
Surface figuring and measurement methods with spatial resolution close to 0.1mm for X-ray mirror fabrication

H. Mimura, H. Yumoto, S. Matsuyama, K. Yamamura, Y. Sano, K. Endo, Y. Mori, Y. Nishino, M. Yabashi, K. Tamasaku, T. Ishikawa, K. Yamauchi

Proceedings of SPIE - The International Society for Optical Engineering　Vol. 5921　p. 1-8　2005/08
Hard X-ray Diffraction-Limited Nanofocusing with unprecidently accurate mirrors

H. Mimura, S. Matsuyama, H. Yumoto, H. Hara, K. Yamamura, Y. Sano, M. Shibahara, K. Endo, Y. Mori, Y. Nishino, K. Tamasaku, M. Yabashi, T. Ishikawa, K. Yamauchi

2005/07
Scanning hard-X-ray microscope with spatial resolution better than 50nm

S. Matsuyama, H. Mimura, H. Yumoto, H. Hara, K. Yamamura, Y. Sano, K.Endo, Y. Mori, M. Yabashi, Y. Nishino, K. Tamasaku, T. Ishikawa, K.Yamauchi

2005/07
Fabrication of elliptically figured mirror for focusing hard X-rays to size less than 50 nm

H. Yumoto, H. Mimura, S. Matsuyama, K. Yamamura, Y. Sano, K. Ueno, K. Endo, Y. Mori, Y. Nishino, M. Yabashi, K. Tamasaku, T. Ishikawa, K. Yamauchi

Review of Scientific Instruments, 76, 063708 (2005).　Vol. 76　No. 6　2005/07
Element Array by Scanning X-ray Fluorescence Microscopy after Cis-Diamminedichloro-Platinum(II) Treatment

M. Shimura, A. Saito, S. Matsuyama, T. Sakuma, Y. Terui, K. Ueno, H. Yumoto, K. Yamauchi, K. Yamamura, H. Mimura, Y. Sano, M. Yabashi, K. Tamasaku, K. Nishio, Y. Nishino, K. Endo, K. Hatake, Y. Mori, Y. Ishizaka, T. Ishikawa

Cancer Research　Vol. 65　No. 12　p. 4998-5002　2005/07
Fabrication of elliptically figured mirror for focusing hard x rays to size less than 50 nm

H Yumoto, H Mimura, S Matsuyama, H Hara, K Yamamura, Y Sano, K Ueno, K Endo, Y Mori, M Yabashi, Y Nishino, K Tamasaku, T Ishikawa, K Yamauchi

REVIEW OF SCIENTIFIC INSTRUMENTS　Vol. 76　No. 6　2005/06
Element array by scanning X-ray fluorescence microscopy after Cis-diamminedichloro-platinum(II) treatment

M Shimura, A Saito, S Matsuyama, T Sakuma, Y Terui, K Ueno, H Yumoto, K Yamauchi, K Yamamura, H Mimura, Y Sano, M Yabashi, K Tamasaku, K Nishio, Y Nishino, K Endo, K Hatake, Y Mori, Y Ishizaka, T Ishikawa

CANCER RESEARCH　Vol. 65　No. 12　p. 4998-5002　2005/06
Hard X‐ray Focusing less than 50nm for Nanoscopy/spectroscopy

YAMAUCHI Kazuto, MIMURA Hidekazu, MATSUYAMA Satoshi, YUMOTO Hirokatsu, HANDA Soichiro, YAMAMURA Kazuya, SANO Yasuhisa, ENDO Katsuyoshi, MORI Yuzo, NISHINO Yoshinori, TAMASAKU Kenji, YABASHI Makina, ISHIKAWA Tetsuya

AIP Conference Proceedings　Vol. 879　No. Pt.1　p. 786-791　2005/05
Improvement of Thickness Uniformity of Quartz Wafer by Numerically Controlled Plasma CVM -Correction of Thickness Variation of Quartz Wafer by Numerically Controlled Machining Utilizing Rotary Electrode-

Masafumi SHIBAHARA, Kazuya YAMAMURA, Yasuhisa SANO, Tsuyoshi SUGIYAMA, Katsuyoshi ENDO, Yuzo MORI

Journal of the Japan Society for Precision Engineering　Vol. Vol.71, No.5, pp.655-659./,　No. 5　p. 655-659　2005/05
Publisher: The Japan Society for Precision Engineering
Relative angle determinable stitching interferometry for hard x-ray reflective optics

H Mimura, H Yumoto, S Matsuyama, K Yamamura, Y Sano, K Ueno, K Endo, Y Mori, M Yabashi, K Tamasaku, Y Nishino, T Ishikawa, K Yamauchi

REVIEW OF SCIENTIFIC INSTRUMENTS　Vol. 76　No. 4　2005/04
EEM (Elastic Emission Machining)による4H-SiC(0001)表面の平滑化

久保田章亀, 三村秀和, 佐野泰久, 山村和也, 山内和人, 森勇藏

精密工学会誌論文集　Vol. 71　No. 4　p. 477-480　2005/04
Creation of Perfect Surfaces

Yuzu Mori, Kazuya Yamamura, Katsuyoshi Endo, Kazuto Yamauchi, Kiyoshi Yasutake, Hidekazu Goto, Hiroaki Kakiuchi, Yasuhisa Sano, Hidekazu Mimura

Journal of Crystal Growth　Vol. 275　No. 1-2　p. 39-50　2005/04
Smoothing 4H-SiC(0001)surface by EEM(Elastic Emission Machining)

A. Kubota, H. Mimura, Y. Sano, K. Yamamura, K. Yamauchi, Y. Mori

Journal of the Japanese Society of Precision Engineering　Vol. 71　No. 4　p. 477-480　2005/04
Publisher: The Japan Society for Precision Engineering
Improvement of Thickness Uniformity of Quartz Wafer by Numerically Controlled Plasma CVM -Development of the NC-PCVM Machine and Acquisition of Machining Properties-

Kazuya Yamamura, Masafumi Shibahara, Yasuhisa Sano, Tsuyoshi Sugiyama, Katsuyoshi Endo, Yuzo Mori

Journal of the Japan Society for Precision Engineering　2005/04
Hard X-ray Diffraction-Limited Nanofocusing with Kirkpatrick-Baez Mirrors

H. Mimura, S. Matsuyama, H. Yumoto, H. Hara, K. Yamamura, Y. Sano, M. Shibahara, K. Endo, Y. Mori, Y. Nishino, K. Tamasaku, M. Yabashi, T. Ishikawa, K. Yamauchi

Japanese Journal of Applied Physics Part 2　Vol. 44　No. 16-19　p. L539-L542　2005/04
Creation of perfect surfaces

Yuzo Mori, Kazuya Yamamura, Katsuyoshi Endo, Kazuto Yamauchi, Kiyoshi Yasutake, Hidekazu Goto, Hiroaki Kakiuchi, Yasuhisa Sano, Hidekazu Mimura

Journal of Crystal Growth　Vol. 275　No. 1-2　p. 39-50　2005/02/15
Development of surface figuring and smoothing technologies for ultraprecise X-ray mirror Fabrication

H. Mimura, H. Yumoto, S. Matsuyama, K. Yamamura, Y. Sano, K. Endo, Y. Mori, Y. Nishino, K. Tamasaku, M. Yabashi, T. Ishikawa, K. Yamauchi

2005/02
Fabrication of ultraprecisely figured and ultrasmooth elliptical mirrors for hard X-ray nanofocusing

K. Yamuchi, H. Mimura, K. Yamamura, Y. Sano, K. Ueno, S. Matsuyama, K. Endo, Y. Nishino, K. Tamasaku, M. Yabashi, T. Ishikawa

2005/02
Relative angle determinable stitching interferometry for hard X-ray reflective optics

H. Mimura, H. Yumoto, S. Matsuyama, K. Yamamura, Y. Sano, K. Ueno, K. Endo, Y. Mori, Y. Nishino, K. Tamasaku, M. Yabashi, T. Ishikawa, K. Yamauchi

Review of Scientfic Instruments　Vol. 76　No. 4　2005/02
Fabrication of ultraprecisely figured mirrors for hard X-ray focusing and evaluation of focusing property

Mimura Hidekazu, Matsuyama Satoshi, Yumoto Hirokatsu, Hara Hideyuki, Yamamura Kazuya, Sano Yasuhisa, Endo Katsuyoshi, Mori Yuzo, Ishikawa Tetsuya, Yamauchi Kazuto

Proceedings of JSPE Semestrial Meeting　Vol. 2005　No. 0　p. 788-788　2005
Publisher: The Japan Society for Precision Engineering
Flattening SiC surface by elastic emission machining (EEM)

Kubota Akihisa, Mimura Hidekazu, Inagaki Kouji, Sano Yasuhisa, Yamamura Kazuya, Yamauchi Kazuto, Mori Yuzo

Proceedings of JSPE Semestrial Meeting　Vol. 2005　No. 0　p. 785-785　2005
Publisher: The Japan Society for Precision Engineering
Characteristics of SiC surface processed by Plasma CVM (Chemical Vaporization Machining)

Watanabe Masayo, Sano Yasuhisa, Yamamura Kazuya, Yamauchi Kazuto, Ishida tsuyoshi, Arima kenta, Endo Katsuyoshi, Mori Yuzo

Proceedings of JSPE Semestrial Meeting　Vol. 2005　No. 0　p. 529-530　2005
Publisher: The Japan Society for Precision Engineering
Surface profile measurement of hard X-ray nanofocusing mirrors

Yumoto Hirokatsu, Mimura Hidekazu, Matsuyama Satoshi, Yamamura Kazuya, Sano Yasuhisa, Endo Katsuyoshi, Mori Yuzo, Ishikawa Tetsuya, Yamauchi Kazuto

Proceedings of JSPE Semestrial Meeting　Vol. 2005　No. 0　p. 453-454　2005
Publisher: The Japan Society for Precision Engineering
Catalyst Assisted Chemical Polishing(CACP) of Silicon carbide

Hara Hideyuki, Sano Yasuhisa, Mimura Hidekazu, Yamauchi Kazuto

Proceedings of JSPE Semestrial Meeting　Vol. 2005　No. 0　p. 337-338　2005
Publisher: The Japan Society for Precision Engineering
Fabrication of Ultraprecisely Figured Elliptical Mirror for Nano-Focusing of Hard X-ray and Evaluation of Focusing Properties

YUMOTO Hirokatsu, MIMURA Hidekazu, MATSUYAMA Satoshi, HARA Hideyuki, YAMAMURA Kazuya, SANO Yasuhisa, UENO Kazumasa, ENDO Katsuyoshi, MORI Yuzo, NISHINO Yoshinori, TAMASAKU Kenji, YABASHI Makina, ISHIKAWA Tetsuya, YAMAUCHI Kazuto

Journal of the Japan Society for Precision Engineering. Supplement. Contributed papers　Vol. 精密工学会誌 Vol. 71 No. 9 pp.1137-1140　No. 9　p. 1137-1140　2005
Publisher: The Japan Society for Precision Engineering
Development of surface figuring and smoothing technologies for ultraprecise X-ray mirror Fabrication

2005
Fabrication of ultraprecisely figured and ultrasmooth elliptical mirrors for hard X-ray nanofocusing

2005
数値制御プラズマＣＶＭによる水晶ウエハの高精度加工に関する研究－円筒型回転電極を用いた数値制御加工による水晶ウエハ厚さの均一化－

精密工学会誌, Vol.71, No.5, pp.655-659.　Vol. Vol.71, No.5, pp.655-659.　2005
Plasma Chemical Vaporization Machining (PCVM)

Book of Lecture Note, IWCGT-3, (2005) pp. 305-316.　2005
Improvement of Thickness Distribution of Quartz Crystal Wafer by Numerically Controlled Plasma Chemical Vaporization Machining

Review of Scientific Instruments, Vol.76, 096103　Vol. Vol. 76, 096103　2005
Relative angle determinable stitching interferometry for hard X-ray reflective optics

Review of Scientfic Instruments　Vol. 76, 045102 (2005)/,　2005
Hard X-ray diffraction-limited nanofocusing with Kirkpatrick-Baez mirrors

H Mimura, S Matsuyama, H Yumoto, H Hara, K Yamamura, Y Sano, M Shibahara, K End, Y Mori, Y Nishino, K Tamasaku, M Yabashi, T Ishikawa, K Yamauchi

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS　Vol. 44　No. 16-19　p. L539-L542　2005
数値制御プラズマＣＶＭによる水晶ウエハの高精度加工に関する研究－加工装置の開発と基本的加工特性の取得－

精密工学会誌, Vol.71 No.4, pp.455-459.　2005
Creation of Perfect Surfaces

Journal of Crystal Growth　Vol. 275 39-50.　2005
数値制御プラズマＣＶＭによる水晶ウエハの高精度加工に関する研究－円筒型回転電極を用いた数値制御加工による水晶ウエハ厚さの均一化－

精密工学会誌, Vol.71, No.5, pp.655-659.　Vol. Vol.71, No.5, pp.655-659./,　2005
Improvement of thickness uniformity of quartz crystal wafer by numerically controlled plasma CVM

Masafumi Shibahara, Kazuya Yamamura, Yasuhisa Sano, Tsuyoshi Sugiyama, Katsuyoshi Endo, Yuzo Mori

Proceedings of SPIE - The International Society for Optical Engineering　Vol. 5869　p. 1-8　2005
Hard X-ray diffraction-limited nanofocusing with kirkpatrick-baez mirrors

Hidekazu Mimura, Satoshi Matsuyama, Hirokatsu Yumoto, Hideyuki Hara, Kazuya Yamamura, Yasuhisa Sano, Masafumi Shibahara, Katsuyoshi Endo, Yuzo Mori, Yoshinori Nishlno, Kenji Tamasaku, Makina Yabashi, Tetsuya Ishikawa, Kazuto Yamauchi

Japanese Journal of Applied Physics, Part 2: Letters　Vol. 44　No. 16-19　p. L539-L542　2005
Improvement of Thickness Uniformity of Quartz Wafer by Numerically Controlled Plasma CVM -Development of the NC-PCVM Machine and Acquisition of Machining Properties-

YAMAMURA Kazuya, SHIBAHARA Masafumi, SANO Yasuhisa, SUGIYAMA Tsuyoshi, ENDO Katsuyoshi, MORI Yuzo

Journal of the Japan Society for Precision Engineering　Vol. 71　No. 4　p. 455-459　2005
Publisher: The Japan Society for Precision Engineering
Creation of Perfect Surfaces

Journal of Crystal Growth　Vol. 275 39-50.　2005
Improvement of Thickness Uniformity of Quartz Wafer by Numerically Controlled Plasma CVM -Correction of Thickness Variation of Quartz Wafer by Numerically Controlled Machining Utilizing Rotary Electrode-

SHIBAHARA Masafumi, YAMAMURA Kazuya, SANO Yasuhisa, SUGIYAMA Tsuyoshi, ENDO Katsuyoshi, MORI Yuzo

Journal of the Japan Society for Precision Engineering　Vol. Vol.71, No.5, pp.655-659.　No. 5　p. 655-659　2005
Publisher: The Japan Society for Precision Engineering
Fabrication of elliptically figured mirror for focusing hard x rays to size less than 50 nm

Hirokatsu Yumoto, Hidekazu Mimura, Satoshi Matsuyama, Hideyuki Hara, Kazuya Yamamura, Yasuhisa Sano, Kazumasa Ueno, Katsuyoshi Endo, Yuzo Mori, Makina Yabashi, Yoshinori Nishino, Kenji Tamasaku, Tetsuya Ishikawa, Kazuto Yamauchi

Review of Scientific Instruments　Vol. 76　No. 6　2005
Improvement of thickness uniformity of quartz crystal wafer by numerically controlled plasma CVM.

Proc. SPIE 5918(2005) 591804　Vol. 5918, 591804　2005
Development of surface figuring and smoothing technologies for ultraprecise X-ray mirror Fabrication

2005
Relative angle determinable stitching interferometry for hard X-ray reflective optics

Review of Scientfic Instruments　Vol. 76, 045102 (2005)/,　2005
Fabrication of elliptically figured mirror for focusing hard X-rays to size less than 50 nm

Review of Scientific Instruments, 76, 063708 (2005).　2005
Plasma Chemical Vaporization Machining (PCVM)

Book of Lecture Note, IWCGT-3, (2005) pp. 305-316.　2005
Improvement of Thickness Distribution of Quartz Crystal Wafer by Numerically Controlled Plasma Chemical Vaporization Machining

Review of Scientific Instruments　Vol. Vol. 76, 096103/,　2005
A new designed ultra-high precision profiler

Y. Higashi, Y. Takaie, K. Endo, T. Kume, K. Enami, K. Yamauchi, K. Yamamura, Y. Sano, K. Ueno, Y. Mori

Proceedings of SPIE - The International Society for Optical Engineering　Vol. 5921　p. 1-9　2005
Improvement of thickness uniformity of quartz crystal wafer by numerically controlled plasma CVM.

Proc. SPIE 5918(2005) 591804　Vol. 5918, 591804/,　2005
硬X線ナノ集光のための高精度楕円体ミラーの作製と集光特性の評価

湯本博勝, 山内和人, 三村秀和, 松山智至, 山村和也, 佐野泰久, 西野吉則, 玉作賢治, 矢橋牧名

応用物理学会学術講演会講演予稿集　Vol. 65th　No. 2　2004/09/01
Surface Figure Metrology of x-ray mirrors using optical interferometry

K. Yamauchi, K. Yamamura, H. Mimura, Y. Sano, S. Matsuyama, H. Yumoto, K. Ueno, K. Endo, M. Yabashi, K. Tamasaku, Y. Nishino, T. Ishikawa, Y. Mori

2004/09
Machining of next generation semiconductor materials by plasma chemical vaporization machining

Kazuya Yamamura, Yuzo Mori, Yasuhisa Sano

Abstracts of the 14th international conference on crystal growth, pp.606　Vol. pp.606　2004/08
Wave-optical and ray-tracing analysis to establish a two dimensional focusing unit using K-B arrangement

S. Matsuyama, H. Mimura, K. Yamamura, H. Yumoto, Y. Sano, K. Endo, Y. Mori, M. Yabashi, K. Tamasaku, Y. Nishino, T. Ishikawa, K. Yamauchi

Proceedings of SPIE　Vol. 5533　p. 181-191　2004/08
Fabrication technology of ultraprecise mirror optics to realize hard X-ray nanobeam, SPIE International Symposium, Optical Science and Technology

K. Yamauchi, K. Yamamura, H. Mimura, Y. Sano, S. Matsuyama, H. Yumoto, K. Ueno, M. Shibahara, K. Endo, M. Yabashi, K. Tamasaku, Y. Nishino, T. Ishikawa, Y. Mori

Proceedings of SPIE　Vol. 5533　p. 116-123　2004/08
Microstitching Interferometry for hard X-ray nanofocusing mirrors

H. Mimura, H. Yumoto, K. Yamamura, Y. Sano, S. Matsuyama, K. Ueno, K. Endo, Y. Mori, M. Yabashi, K. Tamasaku, Y. Nishino, T. Ishikawa, K. Yamauchi

Proceedings of SPIE　Vol. 5533, 171-180　2004/08
Creation of perfect surfaces

Yuzo Mori, Kazuya Yamamura, Katsuyoshi Endo, Kazuto Yamauchi, Kiyoshi Yasutake, Hidekazu Goto, Hiroaki Kakiuchi, Yasuhisa Sano, Hidekazu Mimura

Abstracts the 14th international conference on crystal growth, pp.211　2004/08
数値制御プラズマCVMによる超薄膜SOIウエハの製作

佐野泰久

生産と技術　Vol. 56　No. 3　p. 49-51　2004/07
Publisher: 生産技術振興協会
Image quality improvement in hard X-ray projection microscope using total reflection mirror optics

H. Mimura, K. Yamauchi, K. Yamamura, A. Kubota, S. Matsuyama, Y. Sano, K. Ueno, K. Endo, Y. Nishino, K. Tamasaku, M. Yabashi, T. Ishikawa, Y. Mori

Journal of Synchrotoron Radiation, 11, pp. 343-346.　Vol. 11, pp. 343-346　2004/07
Image quality improvement in a hard X-ray projection microscope using total reflection mirror optics

Hidekazu Mimura, Kazuto Yamauchi, Kazuya Yamamura, Akihisa Kubota, Satoshi Matsuyama, Yasuhisa Sano, Kazumasa Ueno, Katsuyoshi Endo, Yoshinori Nishino, Kenji Tamasaku, Makina Yabashi, Tetsuya Ishikawa, Yuzo Mori

Journal of Synchrotron Radiation　Vol. 11　No. 4　p. 343-346　2004/07/01
Surface figure metrology of total reflection X-ray mirror using optical interferometry at Osaka Univ. and SPring-8

K. Yamuchi, H. Mimura, K. Yamamura, Y.Sano, K. Ueno, S. Matsuyama, K. Endo, Y. Nishino, K. Tamasaku, M. Yabashi, T. Ishikawa

Proceedings of Second International Workshop on Metrology for X-ray Optics　2004/04
Thinning of silicon-on-insulator wafers by numerically controlled plasma chemical vaporization machining

Y Mori, K Yamamura, Y Sano

REVIEW OF SCIENTIFIC INSTRUMENTS　Vol. 75　No. 4　p. 942-946　2004/04
Thinning of silicon-on-insulator wafers by numerically controlled plasma chemical vaporization machining

Yuzo Mori, Kazuya Yamamura, Yasuhisa Sano

Review of Scientific Instruments, Vol. 75, No. 4, pp.942-946　Vol. 75　No. 4　p. 942-946　2004/04
走査型X線顕微鏡のための楕円体ミラーを用いた二次元集光ユニットの開発

松山智至, 山内和人, 山村和也, 三村秀和, 佐野泰久, 玉作賢治, 矢橋牧名, 西野吉則, 石川哲也

応用物理学関係連合講演会講演予稿集　Vol. 51st　No. 2　2004/03/28
Fabrication technology for hard X-ray reflective optics

Y. Mori, K. Yamuchi, K. Yamamura, H. Mimura, Y.Sano, S. Matsuyama, K. Endo, Y. Nishino, K. Tamasaku, M. Yabashi, T. Ishikawa

Proceedings of Second International Workshop on Metrology for X-ray Optics　2004/03
Measurement of surface profiles of elliptical mirrors by using interferometer -Development of highly accurate stitching method-

Yumoto Hirokatsu, Yamauchi Kazuto, Mimura Hidekazu, Matsuyama Satoshi, Yamamura Kazuya, Sano Yasuhisa, Endo Katsuyoshi, Ishikawa Tetsuya, Mori Yuzo

Proceedings of JSPE Semestrial Meeting　Vol. 2004　No. 0　p. 116-116　2004
Publisher: The Japan Society for Precision Engineering
超高精度硬Ｘ線集光ミラーの製作とナノスペクトロスコピーへの応用

山村和也, 山内和人, 佐野泰久, 三村秀和, 遠藤勝義, 森勇藏

大阪大学低温センターだより，125, 4-10　Vol. 125, 4-10　p. 4-10　2004/01
Publisher: 大阪大学低温センター
Fabrication technology for hard X-ray reflective optics

Proceedings of Second International Workshop on Metrology for X-ray Optics　2004
数値制御プラズマCVMによる超薄膜SOIウエハの製作

生産と技術　Vol. Vol.56 No.3　2004
Image quality improvement in hard X-ray projection microscope using total reflection mirror optics

Journal of Synchrotoron Radiation, 11, pp. 343-346.　Vol. 11, pp. 343-346　2004
Microstitching interferometry for nano focusing mirror optics

H Mimura, H Yumoto, S Matsuyama, K Yamamura, Y Sano, K Ueno, K Endo, Y Mori, M Yabashi, K Tamasaku, Y Nishino, T Ishikawa, K Yamauchi

ADVANCES IN MIRROR TECHNOLOGY FOR X-RAY, EUV LITHOGRAPHY, LASER, AND OTHER APPLICATIONS II　Vol. 5533　p. 171-180　2004
数値制御プラズマＣＶＭによる次世代超薄膜ＳＯＩウエハの製作

佐野泰久, 山村和也, 遠藤勝義, 森勇藏

大阪大学低温センターだより，125,11-15　Vol. 125,11-15　2004/01
原子の滑らかさの加工技術

O plus E, Vol. 26, No.1, pp.36-42　Vol. Vol. 26, No.1, pp.36-42　2004
超高精度硬Ｘ線集光ミラーの製作とナノスペクトロスコピーへの応用

大阪大学低温センターだより，125, 4-10　Vol. 125, 4-10/,　2004
Image quality improvement in hard X-ray projection microscope using total reflection mirror optics

Journal of Synchrotoron Radiation, 11, pp. 343-346.　Vol. 11, pp. 343-346/,　2004
Microstitching Interferometry for hard X-ray nanofocusing mirrors

Proceedings of SPIE　Vol. 5533, 171-180/,　2004
Creation of perfect surfaces

2004
数値制御プラズマＣＶＭによる次世代超薄膜ＳＯＩウエハの製作

森勇蔵, 佐野泰久, 山村和也, 遠藤勝義, ヤマムラカズヤ, モリユウゾウ, エンドウカツヨシ, サノヤスヒサ

大阪大学低温センターだより，125,11-15　Vol. 125,11-15/,　p. 11-15　2004
Publisher: 大阪大学低温センター
原子の滑らかさの加工技術

O plus E, Vol. 26, No.1, pp.36-42　Vol. Vol. 26, No.1, pp.36-42/,　2004
Machining of next generation semiconductor materials by plasma chemical vaporization machining

Abstracts of the 14th international conference on crystal growth, pp.606　Vol. pp.606　2004
Development of a figure correction method having spatial resolution close to 0.1mm

Y Mori, K Yamauchi, K Yamamura, H Mimura, Y Sano, A Saito, K Endo, A Souvorov, M Yabashi, K Tamasaku, T Ishikawa

ADVANCES IN MIRROR TECHNOLOGY FOR X-RAY, EUV LITHOGRAPHY, LASER, AND OTHER APPLICATIONS　Vol. 5193　p. 105-111　2004
Surface figure metrology of total reflection X-ray mirror using optical interferometry at Osaka Univ. and SPring-8

Proceedings of Second International Workshop on Metrology for X-ray Optics　2004
Ultra-precision machining technology of realizing atomically smooth surface

O plus E, Vol. 26, No.1, pp.36-42　Vol. Vol. 26, No.1, pp.36-42　2004
Ultra-precision machining technology of realizing atomically smooth surface

O plus E, Vol. 26, No.1, pp.36-42　Vol. Vol. 26, No.1, pp.36-42/,　2004
Fabrication technology for hard X-ray reflective optics

Proceedings of Second International Workshop on Metrology for X-ray Optics　2004
Fabrication technology of ultraprecise mirror optics to realize hard X-ray nanobeam

K Yamauchi, K Yamamura, H Mimura, Y Sano, S Matsuyama, H Yumoto, K Ueno, M Shibahara, K Endo, M Yabashi, K Tamasaku, Y Nishino, T Ishikawa, Y Mori

ADVANCES IN MIRROR TECHNOLOGY FOR X-RAY, EUV LITHOGRAPHY, LASER, AND OTHER APPLICATIONS II　Vol. 5533　p. 116-123　2004
Microstitching Interferometry for hard X-ray nanofocusing mirrors

Proceedings of SPIE　Vol. 5533, 171-180/,　2004
Wave-optical and ray-tracing analysis to establish a compact two-dimensional focusing unit using K-B mirror arrangement

S Matsuyama, H Mimura, K Yamamura, H Yumoto, Y Sano, K Endo, Y Mori, M Yabashi, K Tamasaku, Y Nishino, T Ishikawa, K Yamauchi

ADVANCES IN MIRROR TECHNOLOGY FOR X-RAY, EUV LITHOGRAPHY, LASER, AND OTHER APPLICATIONS II　Vol. 5533　p. 181-191　2004
Creation of perfect surfaces

Abstracts the 14th international conference on crystal growth, pp.211　2004
Ultra-precision machining technology of realizing atomically smooth surface

Yuzo Mori, Kazuya Yamamura, Kazuto Yamauchi, Yasuhisa Sano, Hidekazu Mimura

O plus E, Vol. 26, No.1, pp.36-42　Vol. Vol. 26, No.1, pp.36-42/,　2004/01
Publisher: (株)新技術コミュニケーションズ
Machining of next generation semiconductor materials by plasma chemical vaporization machining

Abstracts of the 14th international conference on crystal growth, pp.606　Vol. pp.606　2004
Two-dimensional Submicron Focusing of Hard X-rays by Two Elliptical Mirrors Fabricated by Plasma Chemical Vaporization Machining and Elastic Emission Machining

Kazuto Yamauchi, Kazuya Yamamura, Hidekazu Mimura, Yasuhisa Sano, Akira Saito, Katsuyoshi Endo, Alexei Souvorov, Makina Yabashi, Kenji Tamasaku, Tetsuya Ishikawa, Yuzo Mori

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS　Vol. 42　No. 11　p. 7129-7134　2003/11
Two-dimensional submicron focusing of hard X-rays by two elliptical mirrors fabricated by plasma chemical vaporization machining and elastic emission machining

K Yamauchi, K Yamamura, H Mimura, Y Sano, A Saito, K Endo, A Souvorov, M Yabashi, K Tamasaku, T Ishikawa, Y Mori

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS　Vol. 42　No. 11　p. 7129-7134　2003/11
Fabrication of elliptical mirror at nanometer-level accuracy for hard x-ray focusing by numerically controlled plasma chemical vaporization machining

K Yamamura, K Yamauchi, H Mimura, Y Sano, A Saito, K Endo, A Souvorov, M Yabashi, K Tamasaku, T Ishikawa, Y Mori

REVIEW OF SCIENTIFIC INSTRUMENTS　Vol. 74　No. 10　p. 4549-4553　2003/10
Fabrication of elliptical mirror at nanometer-level accuracy for hard x-ray focusing by numerically controlled plasma chemical vaporization machining.

K. Yamamura, K. Yamauchi, H. Mimura, Y. Sano, A. Saito, K. Endo, A. Souvorov, M. Yabashi, K. Tamasaku, T. Ishikawa, Y. Mori

REVIEW OF SCIENTIFIC INSTRUMENTS　Vol. 74　No. 10　p. 4549-4553　2003/10
Fabrication technology of hard X-ray aspherical mirror optics and application to nanospectroscopy

Y. Mori, K. Yamauchi, K. Yamamura, H. Mimura, Y. Sano, A. Saito, K. Endo, A. Souvorov, M. Yabashi, K

Proc. SPIE 5193, pp.11-17　Vol. 5193, pp.11-17　2003/08
Development of a figure correction method having spatial resolution close to 0.1mm

Y. Mori, K. Yamauchi, K. Yamamura, H. Mimura, Y. Sano, A. Saito, K. Endo, A. Souvorov, M. Yabashi, K. Tamasaku, T. Ishikawa

Proc. SPIE 5193, pp.105-111　Vol. 5193　p. 105-111　2003/08
Wave-optical evaluation of reflected X-ray intensity and wavefront distribution in total reflection hard X-ray mirror optics

Kazuto Yamauchi, Kazuya Yamamura, Hidekazu Mimura, Yasuhisa Sano, Akira Saito, Akihisa Kubota, Masahiko Kanaoka, Alexei Souvorov, Kenji Tamasaku, Makina Yabashi, Tetsuya Ishikawa, Yuzo Mori

Vol. 69, 997-1001/,　2003/07
Development of the Measurement System with Interferometers for Ultraprecise X-ray mirror

Kazuto Yamauchi, Kazuya Yamamura, Hidekazu Mimura, Yasuhisa Sano, Akihisa Kubota, Yasuhiro Sekito, Kazumasa Ueno, Alexei Souvorov, Kenji Tamasaku, Makina Yabashi, Tetsuya Ishikawa, Yuzo Mori

Vol. 69　No. 6　p. 856-860　2003/06
Microstitching interferometry for x-ray reflective optics

K Yamauchi, K Yamamura, H Mimura, Y Sano, A Saito, K Ueno, K Endo, A Souvorov, M Yabashi, K Tamasaku, T Ishikawa, Y Mori

REVIEW OF SCIENTIFIC INSTRUMENTS　Vol. 74　No. 5　p. 2894-2898　2003/05
Microstitching interferometry for x-ray reflective optics

K. Yamauchi, K. Yamamura, H. Mimura, Y. Sano, A. Saito, K. Ueno, K. Endo, A. Souvorov, M. Yabashi, K. Tamasaku, T. Ishikawa, Y. Mori

REVIEW OF SCIENTIFIC INSTRUMENTS　Vol. 74　No. 5　p. 2894-2898　2003/05
Thinning of SOI by numerically controlled Plasma CVM(Chemical Vaporization Machining) -Evalation of Machined Surface for Electron Devices-

Yuzo Mori, Yasuhisa Sano, Kazuya Yamamura, Satoru Morita, Ichiro Ohshima, Yuji Saito, Shigetoshi Sugawa, Tadahiro Ohmi

Journal of the Japan Society of Precision Engineering　Vol. 69 721-725　No. 5　p. 721-725　2003/05
Publisher: The Japan Society for Precision Engineering
Fabrication of Ultraprecise X-ray Mirror by Plasma CVM and EEM and the Application of the Mirror

Mori Yuzo, Yamauchi Kazuto, Yamamura Kazuya, Mimura Hidekazu, Sano Yasuhisa, Kubota Akihisa, Endo Katsuyoshi, Souvorov Alexei, Tamasaku Kenji, Yabashi Makina, Ishikawa Tetsuya

Proceedings of JSPE Semestrial Meeting　Vol. 2003　No. 0　p. 388-388　2003
Publisher: The Japan Society for Precision Engineering
Ultraprecision Machining based on Physics and Chemistry

2003
高精度X線ミラーのための干渉計を利用した形状計測システムの開発

精密工学会誌, 69, 6, 856-860　Vol. 69, 6, 856-860　2003
硬Ｘ線用斜入射平面ミラーの形状誤差が反射Ｘ線強度・位相分布に及ぼす影響の波動光学的評価

精密工学会誌, 69, 2003, 997-1001　Vol. 69, 997-1001　2003
Thinning of SOI by numerically controlled Plasma CVM (Chemical Vaporization Machining) : Evaluation of Machined Surface for Electron Devices

MORI Yuzo, SANO Yasuhisa, YAMAMURA Kazuya, MORITA Satoru, MORITA Mizuho, OHSHIMA Ichiro, SAITO Yuji, SUGAWA Shigetoshi, OHMI Tadahiro

Journal of the Japan Society of Precision Engineering　Vol. 69 721-725　No. 5　p. 721-725　2003
Publisher: The Japan Society for Precision Engineering
加工技術データファイル基礎編（特殊加工）、5.7プラズマＣＶＭ

（財）機械振興協会技術研究所　2003
Development of the Measurement System with Interferometers for Ultraprecise X-ray Mirror

YAMAUCHI Kazuto, YAMAMURA Kazuya, MIMURA Hidekazu, SANO Yasuhisa, KUBOTA Akihisa, SEKITO Yasuhiro, UENO Kazumasa, SOUVOROV Alexei, TAMASAKU Kenji, YABASHI Makina, ISHIKAWA Tetsuya, MORI Yuzo

Journal of the Japan Society of Precision Engineering　Vol. 69, 6, 856-860/,　No. 6　p. 856-860　2003
Publisher: The Japan Society for Precision Engineering
Wave-optical evaluation of reflected X-ray intensity and wavefront distribution in total reflection hard X-ray mirror optics.

YAMAUCHI Kazuto, YAMAMURA Kazuya, MIMURA Hidekazu, SANO Yasuhisa, SAITO Akira, KUBOTA Akishisa, KANAOKA Masahiko, SOUVOROV Alexei, TAMASAKU Kenji, YABASHI Makina, ISHIKAWA Tetsuya, MORI Yuzo

Journal of the Japan Society of Precision Engineering　Vol. 69, 997-1001/,　No. 7　p. 997-1001　2003
Publisher: The Japan Society for Precision Engineering
Crystal Growth Technology(Plasma-CVM(Chemical Vaporization Machining))

John Wiley & Sons　2003
Fabrication of elliptical mirror at nanometer-level accuracy for hard x-ray focusing by numerically controlled plasma chemical vaporization machining.

Review of Sceintific Instruments, 74, (10), pp.4549-4553　Vol. 74, (10), pp.4549-4553/,　2003
数値制御プラズマCVM(Chemical Vaporization Machining)によるSOIの薄膜化－デバイス用基板としての加工面の評価－

精密工学会誌 69 (2003) 721-725.　Vol. 69 721-725　2003
高精度X線ミラーのための干渉計を利用した形状計測システムの開発

精密工学会誌, 69, 6, 856-860　Vol. 69, 6, 856-860/,　2003
硬Ｘ線用斜入射平面ミラーの形状誤差が反射Ｘ線強度・位相分布に及ぼす影響の波動光学的評価

精密工学会誌, 69, 2003, 997-1001　Vol. 69, 997-1001/,　2003
Fabrication technology of hard X-ray aspherical mirror optics and application to nanospectroscopy

Proc. SPIE 5193, pp.11-17　Vol. 5193, pp.11-17/,　2003
Ultraprecision Machining based on Physics and Chemistry

Yuzo Mori, Kikuji Hirose, Kazuto Yamauchi, Hidekazu Goto, Kazuya Yamamura, Yasuhisa Sano

Sensors and Materials, Vol. 15, No. 1 (2003), pp.1-19.　2003/01
Two-dimensional Submicron Focusing of Hard X-rays by Two Elliptical Mirrors Fabricated by Plasma Chemical Vaporization Machining and Elastic Emission Machining

Vol. Vol.42, No.11, pp.7129-7134　2003
Thinning of SOI by numerically controlled Plasma CVM(Chemical Vaporization Machining) -Evalation of Machined Surface for Electron Devices-

MORI Yuzo, SANO Yasuhisa, YAMAMURA Kazuya, MORITA Satoru, MORITA Mizuho, OHSHIMA Ichiro, SAITO Yuji, SUGAWA Shigetoshi, OHMI Tadahiro

Journal of the Japan Society of Precision Engineering　Vol. 69 721-725　No. 5　p. 721-725　2003
Publisher: The Japan Society for Precision Engineering
Development of the Measurement System with Interferometers for Ultraprecise X-ray mirror

Vol. 69, 6, 856-860　2003
Wave-optical evaluation of reflected X-ray intensity and wavefront distribution in total reflection hard X-ray mirror optics

Vol. 69, 997-1001　2003
Fabrication technology of hard X-ray aspherical mirror optics and application to nanospectroscopy

Proc. SPIE 5193, pp.11-17　Vol. 5193, pp.11-17　2003
Thinning of SOI by numerically controlled Plasma CVM(Chemical Vaporization Machining) -Evalation of Machined Surface for Electron Devices-

Vol. 69 721-725　2003
Wave-optical evaluation of reflected X-ray intensity and wavefront distribution in total reflection hard X-ray mirror optics

Vol. 69, 997-1001/,　2003
Ultraprecision Machining based on Physics and Chemistry

Sensors and Materials, Vol. 15, No. 1 (2003), pp.1-19.　2003
Crystal Growth Technology(Plasma-CVM(Chemical Vaporization Machining))

John Wiley & Sons　2003
Fabrication of elliptical mirror at nanometer-level accuracy for hard x-ray focusing by numerically controlled plasma chemical vaporization machining.

Vol. 74, (10), pp.4549-4553/,　2003
Two-dimensional Submicron Focusing of Hard X-rays by Two Elliptical Mirrors Fabricated by Plasma Chemical Vaporization Machining and Elastic Emission Machining

Vol. Vol.42, No.11, pp.7129-7134/,　2003
Microstitching interferometry for x-ray reflective optics

Vol. 74 2894-2898　2003
Development of the Measurement System with Interferometers for Ultraprecise X-ray mirror

Vol. 69, 6, 856-860/,　2003
Fabrication technology of hard X-ray aspherical mirror optics and application to nanospectroscopy

Proc. SPIE 5193, pp.11-17　Vol. 5193, pp.11-17/,　2003
Thinning of SOI by numerically controlled plasma CVM(chemical vaporization machining) -Development of the NC-PCVM machine and trial of ultra-thin SOI wafer-

MORI Yuzo, YAMAMURA Kazuya, SANO Yasuhisa

Journal of the Japan Society of Precision Engineering　Vol. Vol.68, No.12, p.1590-1594　No. 12　p. 1590-1594　2002/12
Publisher: The Japan Society for Precision Engineering
プラズマCVMおよびEEMによる放射光用X線ミラーの作製とその応用 : 二枚の平面ミラーを用いたX線干渉計の開発

森勇藏, 山内和人, 山村和也, 三村秀和, 佐野泰久, 齋藤彰, SOUVOROV A, 矢橋牧名, 玉作賢治, 石川哲也

精密工学会大会学術講演会講演論文集　Vol. 2002　No. 2　p. 459-459　2002/10/01
プラズマCVMおよびEEMによる放射光用X線ミラーの作製とその応用 : 硬X線顕微鏡の開発

森勇蔵, 山内和人, 山村和也, 三村秀和, 佐野泰久, 斉藤彰, SOUVOROV Alexei, 矢橋牧名, 玉作賢治, 石川哲也

精密工学会大会学術講演会講演論文集　Vol. 2002　No. 2　p. 458-458　2002/10/01
Fabrication of the Elliptical Mirror for Synchrotron hard X-ray by Plasma Chemical Vaporization Machining and Elastic Emission Machining and the Evaluation of the Focusing Performances

Yuzo Mori, Kazuti Yamauchi, Kazuya Yamamura, Hidekazu Mimura, Yasuhisa Sano, Akira Saito, Alexei Souvorov, Kenji Tamasaku, Makina Yabashi, Tetsuya Ishikawa

Jouranal of the Japan Society for Precision Engineering, Vol.68, p.1347-1350　Vol. 68　No. 10　p. 1347-1350　2002/10
Publisher: The Japan Society for Precision Engineering
Nearly diffraction-limited line focusing of a hard-X-ray beam with an elliptically figured mirror

K. Yamauchi, K. Yamamura, H. Mimura, Y. Sano, A. Saito, A. Souvorov, M. Yabashi, K. Tamasaku, T. Ishikawa, Y. Mori

JOURNAL OF SYNCHROTRON RADIATION　Vol. 9　p. 313-316　2002/09
Nearly diffraction-limited line focusing of a hard-X-ray beam with an elliptically figured mirror

K Yamauchi, K Yamamura, H Mimura, Y Sano, A Saito, A Souvorov, M Yabashi, K Tamasaku, T Ishikawa, Y Mori

JOURNAL OF SYNCHROTRON RADIATION　Vol. 9　p. 313-316　2002/09
Nearly diffraction-limited line focusing of a hard-X-ray beam with an elliptically figured mirror

Kazuto Yamauchi, Kazuya Yamamura, Hidekazu Mimura, Yasuhisa Sano, Akira Saito, Alexei Souvorov, Makina Yabashi, Kenji Tamasaku, Tetsuya Ishikawa, Yuzo Mori

Journal of Synchrotron Radiation　Vol. 9　No. 5　p. 313-316　2002/09/01
Aspheric surface fabrication in nm-level accuracy by numerically controlled plasma CVM and EEM

K. Yamamura, H. Mimura, K. Yamauchi, Y. Sano, A. Saito, T. Kinoshita, K. Endo, A. Souvorov, M. Yabashi, K. Tamasaku, T. Ishikawa, Y. Mori

Vol. Vol.4782　2002/07
Sub-micron focusing of hard X-ray by reflective optics for scanning x-ray microscopy

Y. Mori, K. Yamauchi, K. Yamamura, H. Mimura, Y. Sano, A. Saito, K. Ueno, K. Endo, A. Souvorov, M. Yabashi, K. Tamasaku, T. Ishikawa

Vol. Vol.4782　2002/07
Aspheric surface fabrication in nm-level accuracy by numerically controlled plasma CVM and EEM

K. Yamamura, H. Mimura, K. Yamauchi, Y. Sano, A. Saito, T. Kinoshita, K. Endo, A. Souvorov, M. Yabashi, K. Tamasaku, T. Ishikawa, Y. Mori

Proc. SPIE　Vol. Vol.4782　p. 265-265　2002/07
Wave-optical analysis of sub-micron focusing of hard X-ray by reflective optics

K. Yamauchi, K. Yamamura, H. Mimura, Y. Sano, A. Saito, M. Kanaoka, K. Endo, A. Souvorov, M. Yabashi, K. Tamasaku, T. Ishikawa, Y. Mori

Vol. Vol.4782　2002/07
Fabrication of optics by use of plasma chemical vaporization machining with a pipe electrode

H Takino, N Shibata, H Itoh, T Kobayashi, K Yamamura, Y Sano, Y Mori

APPLIED OPTICS　Vol. 41　No. 19　p. 3971-3977　2002/07
Fabrication of optics by use of plasma chemical vaporization machining with a pipe electrode

Hideo Takino, Norio Shibata, Hiroshi Itoh, Teruki Kobayashi, Kazuya Yamamura, Yasuhisa Sano, Yuzo Mori

Applied Optics　Vol. 41　No. 19　p. 3971-3977　2002/07/01
Sub-micron focusing by reflective optics for scanning x-ray microscopy

Y. Mori, K. Yamauchi, K. Yamamura, H. Mimura, Y. Sano, A. Saito, K. Ueno, K. Endo, A. Souvorov, M. Yabashi, K. Tamasaku, T. Ishikawa

Proc. SPIE　Vol. 4782　p. 58-64　2002/07
Fabrication of optics by use of plasma chemical vaporization machining with a pipe electrode

H. Takino, N. Shibata, H. Itoh, T. Kobayashi, K. Yamamura, Y. Sano, Y. Mori

Vol. Vol.41, p.3971-3977/,　2002/07
Ultra-Precision Machining based on Physics and Chemistry

Y. Mori, K. Hirose, K. Yamauchi, H. Goto, K. Yamamura, Y. Sano

2002/06
プラズマCVMおよびEEMによるX線平面ミラーの加工と放射光による評価

森勇蔵, 山内和人, 山村和也, 三村秀和, 佐野泰久, 斉藤彰, 金岡政彦, SOUVOROV A, 矢橋牧名, 玉作賢治, 石川哲也

精密工学会大会学術講演会講演論文集　Vol. 2002　No. 1　p. 605-605　2002/03/01
数値制御プラズマCVMおよび数値制御EEMによる硬X線集光用超精密非球面ミラーの加工

森勇蔵, 山内和人, 山村和也, 三村秀和, 佐野泰久, 斉藤彰, SOUVOROV A, 矢橋牧名, 玉作賢治, 石川哲也

精密工学会大会学術講演会講演論文集　Vol. 2002　No. 1　p. 604-604　2002/03/01
プラズマCVMおよびEEMによるシンクロトロン放射X線用楕円ミラーの作製と集光特性の評価

精密工学会誌, Vol.68, p.1347-1350　Vol. Vol.68, p.1347-1350　2002
数値制御プラズマCVM(Chemical Vaporization Machining)によるSOIの薄膜化

精密工学会誌, Vol.68, No.12, p.1590-1594　Vol. Vol.68, No.12, p.1590-1594　2002
Fabrication of the Elliptical Mirror for Synchrotron hard X-ray by Plasma Chemical Vaporization Machining and Elastic Emission Machining and the Evaluation of the Focusing Performances

MORI Yuzo, YAMAUCHI Kazuto, YAMAMURA Kazuya, MIMURA Hidekazu, SANO Yasuhisa, SAITO Akira, SOUVOROV Alexei, TAMASAKU Kenji, YABASHI Makina, ISHIKAWA Tetsuya

Journal of the Japan Society of Precision Engineering　Vol. Vol.68, p.1347-1350/,　No. 10　p. 1347-1350　2002
Publisher: The Japan Society for Precision Engineering
数値制御プラズマCVM(Chemical Vaporization Machining)によるSOIの薄膜化

精密工学会誌, Vol.68, No.12, p.1590-1594　Vol. Vol.68, No.12, p.1590-1594/,　2002
Ultra-Precision Machining based on Physics and Chemistry

Proceedings of Proceedings of 3rd Workshop on Physical Chemistry of Wet Etching of Silicon, p.10-26　Vol. p.10-26　2002
Aspheric surface fabrication in nm-level accuracy by numerically controlled plasma CVM and EEM

Proc. SPIE, Vol.4782　Vol. Vol.4782　2002
Sub-micron focusing of hard X-ray by reflective optics for scanning x-ray microscopy

SPIE Vol.4782　Vol. Vol.4782　2002
Wave-optical analysis of sub-micron focusing of hard X-ray by reflective optics

Proc. SPIE, Vol.4782　Vol. Vol.4782　2002
Wave-optical analysis of sub-micron focusing of hard X-ray beams by reflective optics

K. Yamauchi, K. Yamamura, H. Mimura, Y. Sano, A. Saito, M. Kanaoka, K. Endo, A. Souvorov, M. Yabashi, K. Tamasaku, T. Ishikawa, Y. Mori

Proceedings of SPIE - The International Society for Optical Engineering　Vol. 4782　p. 271-276　2002
Fabrication of optics by use of plasma chemical vaporization machining with a pipe electrode

Vol. Vol.41, p.3971-3977/,　2002
Nearly diffraction-limited line focusing of a hard-X-ray beam with an elliptically figured mirror

Vol. vol.9, p.313-316/,　2002
Fabrication of the Elliptical Mirror for Synchrotron hard X-ray by Plasma Chemical Vaporization Machining and Elastic Emission Machining and the Evaluation of the Focusing Performances

Jouranal of the Japan Society for Precision Engineering, Vol.68, p.1347-1350　Vol. Vol.68, p.1347-1350/,　2002
Thinning of SOI by numerically controlled plasma CVM(chemical vaporization machining) -Development of the NC-PCVM machine and trial of ultra-thin SOI wafer-

MORI Yuzo, YAMAMURA Kazuya, SANO Yasuhisa

Journal of the Japan Society of Precision Engineering　Vol. Vol.68, No.12, p.1590-1594/,　No. 12　p. 1590-1594　2002
Publisher: The Japan Society for Precision Engineering
Ultra-Precision Machining based on Physics and Chemistry

Vol. p.10-26　2002
Sub-micron focusing of hard X-ray by reflective optics for scanning x-ray microscopy

Vol. Vol.4782　2002
Aspheric surface fabrication in nm-level accuracy by numerically controlled plasma CVM and EEM

Vol. Vol.4782　2002
Wave-optical analysis of sub-micron focusing of hard X-ray by reflective optics

Vol. Vol.4782　2002
Removal Characteristics of Plasma Chemical Vaporization Machining with a Pipe Electrode

Hideo Takino, Teruyuki Kobayashi, Norio Shibata, Kazuya Yamamura, Yasuhisa Sano, Yuzo Mori

2001/06
Ultra-precision Machining by Plasma CVM

Kazuya Yamamura, Yasuhisa Sano, Yuzo Mori

Vol. 22　No. 3　p. 160-166　2001/03
Cutting og Functional Material by Plasma CVM ---Development of the Cutting Machine with Inner Blade Electrode and Its Cutting Characteristics---

Yuzo Mori, Kazuto Yamauchi, Kazuya Yamamura, Yasuhisa Sano

Journal of the Japan Society of Precision Engineering　Vol. 67　No. 2　p. 295-299　2001/02
Publisher: The Japan Society for Precision Engineering
プラズマCVM(Chemical Vaporization Machining)による超精密加工

表面科学, Vol.~22, No.~3, pp.~160-166　Vol. Vol.~22, No.~3, pp.~160-166　2001
Removal Characteristics of Plasma Chemical Vaporization Machining with a Pipe Electrode

Proc. 2nd International Conference of European Society for Precision Engeneering and Nanotechnology　2001
プラズマCVM(Chemical Vaporization Machining)による超精密加工

表面科学, Vol.~22, No.~3, pp.~160-166　Vol. Vol.~22, No.~3, pp.~160-166/,　2001
The Study of Fabrication of the X-ray Mirror by Numerically Controlled Plasma CVM (1st Report) ---Development of the Machine for the X-ray Mirror Fabrication---

Yuzo Mori, Kazuya Yamamura, Yasuhisa Sano

Vol. 67　No. 1　p. 131-136　2001/01
Ultra-precision Machining by Plasma CVM

Vol. Vol.~22, No.~3, pp.~160-166　2001
Ultra-precision Machining by Plasma CVM

Vol. Vol.~22, No.~3, pp.~160-166/,　2001
Removal Characteristics of Plasma Chemical Vaporization Machining with a Pipe Electrode

2001
Ultra-precision Machining by Plasma CVM

Vol. 22　No. 3　p. 160-166　2001
The Study of Fabrication of the X-ray Mirror by Numerically Controlled Plasma CVM(1st Report)-Development of the Machine for the X-ray Mirror Fabrication-

Journal of the Japan Society for Precision Engineering　Vol. 67　No. 1　p. 131-136　2001
Cutting og Functional Material by Plasma CVM-Development of the Cutting Machine with Inner Blade Electrode and Its Cutting Characteristics-

Yuzo MORI, Kazuto YAMAUCHI, Kazuya YAMAMURA, Yasuhisa SANO

Journal of the Japan Society for Precision Engineering　Vol. 67　No. 2　p. 295-299　2001
Development of Plasma Chemical Vaporization Machining

Yuzo Mori, Kazuto Yamauchi, Kazuya Yamamura, Yasuhisa Sano

Vol. Vol.~71, No.~12, pp.~4627-4632　2000/12
The Study of Fabrication of the X-ray Mirror by Numerically Controlled Plasma Chemical Vaporization Machining : Development of the Machine for the X-ray Mirror Fabrication

Yuzo Mori, Kazuya Yamamura, Yasuhisa Sano

Review of Scientific Instruments, Vol. 71, No. 12, pp. 4620-4626　Vol. Vol. 71, No. 12, pp. 4620-4626　2000/12
Development of plasma chemical vaporization machining

Y Mori, K Yamauchi, K Yamamura, Y Sano

REVIEW OF SCIENTIFIC INSTRUMENTS　Vol. 71　No. 12　p. 4627-4632　2000/12
Development of New Machining Process for Ultra Precision Surface Preparation ---EEM,Plasma CVM,and Atmospheric Pressure Plasma CVD---

Yuzo Mori, Kazuto Yamauhci, Kazuya Yamamura, Hiroaki Kakiuchi, Yasuhisa Sano

Vol. pp.~212-232　2000/08
Development of Plasma CVM(Chemical Vaporization Machining)

Yuzo Mori, Kazuto Yamauchi, Kazuya Yamamura, Yasuhisa Sano

Vol. 66　No. 8　p. 1280-1285　2000/08
Development of Numerically Controlled Plasma Chemical Vaporization Machining System

Yuzo Mori, Kazuya Yamamura, Yasuhisa Sano

Vol. Vol.~50, No.~2374, pp.~63‐69/,　2000/04
Development of SPV(Surface Photo-voltage) Spectroscopy to Observe Finely-prepared Surface by Ultraprecision Machining Process

Kazuto Yamauchi, Kazuhisa Sugiyama, Kouji Inagaki, Kazuya Yamamura, Yasuhisa Sano, Yuzo Mori

Vol. 66　No. 4　p. 630-634　2000/04
Development of SPV (Surface Photo-voltage) Spectroscopy to Observe Finely-prepared Surfaces by Ultraprecision Machining Processes

Kazuto YAMAUCHI, Kazuhisa SUGIYAMA, Kouji INAGAKI, Kazuya YAMAMURA, Yasuhisa SANO, Yuzo MORI

Journal of the Japan Society for Precision Engineering　Vol. 66　No. 4　p. 630-634　2000/04
Publisher: The Japan Society for Precision Engineering
Development of Numerically Controlled Plasma Chemical Vaporization Machining System

Technology Reports of the Osaka University, Vol.~50, No.~2374, pp.~63‐69　Vol. Vol.~50, No.~2374, pp.~63‐69　2000
Development of New Machining Process for Ultra Precision Surface Preparation ---EEM,Plasma CVM,and Atmospheric Pressure Plasma CVD---

The 2nd International School on Crystal Growth Technology, Book of Lecture Notes, pp.~212-232　Vol. pp.~212-232　2000
The Study of Fabrication of the X-ray Mirror by Numerically Controlled Plasma Chemical Vaporization Machining : Development of the Machine for the X-ray Mirror Fabrication

Review of Scientific Instruments, Vol. 71, No. 12, pp. 620-4626　Vol. Vol. 71, No. 12, pp. 4620-4626/,　2000
Development of Plasma Chemical Vaporization Machining

Vol. Vol.~71, No.~12, pp.~4627-4632　2000
The Study of Fabrication of the X-ray Mirror by Numerically Controlled Plasma Chemical Vaporization Machining : Development of the Machine for the X-ray Mirror Fabrication

Review of Scientific Instruments, Vol. 71, No. 12, pp. 4620-4626　Vol. Vol. 71, No. 12, pp. 4620-4626　2000
Development of Numerically Controlled Plasma Chemical Vaporization Machining System

Vol. Vol.~50, No.~2374, pp.~63‐69　2000
Development of Plasma Chemical Vaporization Machining

Vol. Vol.~71, No.~12, pp.~4627-4632/,　2000
The Study of Fabrication of the X-ray Mirror by Numerically Controlled Plasma Chemical Vaporization Machining : Development of the Machine for the X-ray Mirror Fabrication

Review of Scientific Instruments, Vol. 71, No. 12, pp. 4620-4626　Vol. Vol. 71, No. 12, pp. 4620-4626/,　2000
Development of Numerically Controlled Plasma Chemical Vaporization Machining System

Vol. Vol.~50, No.~2374, pp.~63‐69/,　2000
Development of New Machining Process for Ultra Precision Surface Preparation ---EEM,Plasma CVM,and Atmospheric Pressure Plasma CVD---

Vol. pp.~212-232　2000
Development of Numerically Controlled Plasma Chemical Vaporization Machining System

Technology Reports of the Osaka University　Vol. 50　No. 2374　p. 63-69　2000
Development of New Machining Process for Ultra Precision Surface Preparation-EEM, Plasma CVM, and Atmospheric Pressure Plasma CVD-

Second International School on Crystal Growth Technology, Book of Lecture Notes　p. 212-232　2000
Development of Plasma CVM(Chemical Vaporization Machining)

Journal of the Japan Society for Precision Engineering　Vol. 66　No. 8　p. 1280-1285　2000
The Study of Fabrication of the X-ray Mirror by Numerically Controlled Plasma Chemical Vaporization Machining : Development of the Machine for the X-ray Mirror Fabrication

REVIEW OF SCIENTIFIC INSTRUMENTS　Vol. 71　No. 12　p. 4620-4626　2000
Development of Plasma Chemical Vaporization Machining

REVIEW OF SCIENTIFIC INSTRUMENTS　Vol. 71　No. 12　p. 4627-4632　2000
With the Aim of Country with Intelligent Sense of Existence : The Case Introduction, Center of Excellence program Creation of Perfect Surfaces

Hideo Takino(Nikon Cor, Norio Shibata(Nikon Cor, Hiroshi Itoh(Nikon Corp, Teruki Kobayashi, Nikon Cor, Hiroaki Tanaka, Nikon Co, Masami Ebi(Nikon Corp, Kazuya Yamamura, Yasuhisa Sano, Yuzo Mori

Vol. 65　No. 11　p. 1650-1651　1999/11
Slicing of Functional Materials by Plasma CVM (Chemical Vaporization Machining)

Yuzo Mori, Kazuya Yamamura, Yasuhisa Sano

Vol. pp.~225-230　1999/09
High Speed Patterning of Integrated-Type a-Si Solar Cell Submodules by Plasma CVM

Shingo Nakano, SANYO Electric Co, Yoichi Domoto, SANYO Electric Co, Hisaki Tarui, SANYO Electric Co, Seiichi Kiyama, SANYO Electric Co, Yasuhisa Sano, Kazuya Yamamura, Yuzo Mori

Vol. pp.~543-548　1999/09
Plasma Chemical Vaporization Machining with a Pipe Electrode for Large Optics

Hideo Takino, ikon, Norio Shibata, Nikon Cor, Teruki Kobayashi, Nikon Cor, Hiroshi\- Itoh, Nikon Cor, Hiroaki Tanaka, ikon, Akihiro Koike, ikon C, Katsuhiko\- Nakano, ikon C, Kazuya Yamamura, Yasuhisa Sano, Yuzo Mori

Vol. pp.~219-224　1999/09
Development of Numerically Controlled Plasma CVM (Chemical Vaporization Machining) System for Fabrication of Ultra Precision Optical Devices

Yuzo Mori, Kazuya Yamamura, Yasuhisa Sano

Precision Science and Technology for Perfect Surfaces (Proceedings of the 9th International Conference on Production Engineering), pp.~213-218　Vol. pp.~213-218　1999/09
High Rate Polishing of Silicon Surface using Plasma CVM with Rotary Drum Electrode

Hiroaki Takeuchi, Sharp Corp, Tohru Okuda, Sharp Corp, Kazuhiro Nishikawa, Sharp Corp, Yoshiyuki Hojyo, Sharp Corp, Masaru Kadono, Sharp Cor, Takashi Nukii, Sharp Corp, Kazuya Yamamura, Yasuhisa Sano, Yuzo Mori

Vol. pp.~405-410　1999/09
First-Principles Simulation of Removal Process in EEM(Elastic Emission Machining)

Kazuto Yamauchi, Kikuji Hirose, Hidekazu Goto, Kazuhisa Sugiyama, Kouji Inagaki, Kazuya Yamamura, Yasuhisa Sano, Yuzo Mori

COMPUTATIONAL MATERIALS SCIENCE　Vol. 14　No. 1-4　p. 232-235　1999/04
First-principles simulations of removal process in EEM (Elastic Emission Machining)

K Yamauchi, K Hirose, H Goto, K Sugiyama, K Inagaki, K Yamamura, Y Sano, Y Mori

COMPUTATIONAL MATERIALS SCIENCE　Vol. 14　No. 1-4　p. 232-235　1999/02
Fabrication of Optical Flat using Plasma Chemical Vaporization Machining with a Pipe Electrode

TAKINO Hideo, SHIBATA Norio, ITOH Hiroshi, KOBAYASHI Teruki, TANAKA Hiroaki, EBI Masami, YAMAMURA Kazuya, SANO Yasuhisa, MORI Yuzo

Journal of the Japan Society of Precision Engineering　Vol. Vol.~65, No.~11, pp.~1650-1651　No. 11　p. 1650-1651　1999
Publisher: The Japan Society for Precision Engineering
Development of Numerically Controlled Plasma CVM (Chemical Vaporization Machining) System for Fabrication of Ultra Precision Optical Devices

Precision Science and Technology for Perfect Surfaces (Proceedings of the 9th International Conference on Production Engineering), pp.~213-218　Vol. pp.~213-218　1999
Plasma Chemical Vaporization Machining with a Pipe Electrode for Large Optics

Precision Science and Technology for Perfect Surfaces (Proceedings of the 9th International Conference on Production Engineering), pp.~219-224　Vol. pp.~219-224　1999
High Rate Polishing of Silicon Surface using Plasma CVM with Rotary Drum Electrode

Precision Science and Technology for Perfect Surfaces (Proceedings of the 9th International Conference on Production Engineering), pp.~405-410　Vol. pp.~405-410　1999
High Speed Patterning of Integrated-Type a-Si Solar Cell Submodules by Plasma CVM

Precision Science and Technology for Perfect Surfaces (Proceedings of the 9th International Conference on Production Engineering), pp.~543-548　Vol. pp.~543-548　1999
Fabrication of Optical Flat using Plasma Chemical Vaporization Machining with a Pipe Electrode

TAKINO Hideo, SHIBATA Norio, ITOH Hiroshi, KOBAYASHI Teruki, TANAKA Hiroaki, EBI Masami, YAMAMURA Kazuya, SANO Yasuhisa, MORI Yuzo

Journal of the Japan Society of Precision Engineering　Vol. Vol.~65, No.~11, pp.~1650-1651/,　No. 11　p. 1650-1651　1999
Publisher: The Japan Society for Precision Engineering
Slicing of Functional Materials by Plasma CVM (Chemical Vaporization Machining)

Precision Science and Technology for Perfect Surfaces (Proceedings of the 9th International Conference on Production Engineering), pp.~225-230　Vol. pp.~225-230　1999
With the Aim of Country with Intelligent Sense of Existence : The Case Introduction, Center of Excellence program Creation of Perfect Surfaces

Vol. Vol.~65, No.~11, pp.~1650-1651　1999
With the Aim of Country with Intelligent Sense of Existence : The Case Introduction, Center of Excellence program Creation of Perfect Surfaces

Vol. Vol.~65, No.~11, pp.~1650-1651/,　1999
Slicing of Functional Materials by Plasma CVM (Chemical Vaporization Machining)

Vol. pp.~225-230　1999
Plasma Chemical Vaporization Machining with a Pipe Electrode for Large Optics

Vol. pp.~219-224　1999
Development of Numerically Controlled Plasma CVM (Chemical Vaporization Machining) System for Fabrication of Ultra Precision Optical Devices

Precision Science and Technology for Perfect Surfaces (Proceedings of the 9th International Conference on Production Engineering), pp.~213-218　Vol. pp.~213-218　1999
High Speed Patterning of Integrated-Type a-Si Solar Cell Submodules by Plasma CVM

Vol. pp.~543-548　1999
High Rate Polishing of Silicon Surface using Plasma CVM with Rotary Drum Electrode

Vol. pp.~405-410　1999
Development of New Ultra Precision Machining Methods --- Plasma CVM and EEM ---

Yuzo Mori, Kazuto Yamauchi, Kazuya Yamamura, Yasuhisa Sano

First International School on Crystal Growth Technology, pp. 218-228　Vol. pp. 218-228　1998/09
Computer numerically controlled plasma chemical vaporization machining with a pipe electrode for optical fabrication

H Takino, N Shibata, H Itoh, T Kobayashi, H Tanaka, M Ebi, K Yamamura, Y Sano, Y Mori

APPLIED OPTICS　Vol. 37　No. 22　p. 5198-5210　1998/08
Computer Numerically Controlled Plasma Chemical Vaporization Machining with a Pipe Electrode for Optical Fabrication

Hideo Takino, Norio Shibata, Teruki Kobayashi, Hiroaki Tanaka, Masami Ebi, Kazuya Yamamura, Yasuhisa Sano, Yuzo Mori

APPLIED OPTICS, 37/22,5198　Vol. 37　No. 22　p. 5198-5210　1998/08
Plasma chemical vaporization machining (CVM) for fabrication of optics

H Takino, N Shibata, H Itoh, T Kobayashi, H Tanaka, M Ebi, K Yamamura, Y Sano, Y Mori

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS　Vol. 37　No. 7B　p. L894-L896　1998/07
Plasma Chemical Vaporization Machining(CVM)for Fabrication of Optics

Hideo TAKINO, Norio SHIBATA, Teruki KOBAYASHI, Hiroaki TANAKA, Masami EBI, Kazuya YAMAMURA, Yasuhisa SANO, Yuzo MORI

Jpn J Appl Phys　Vol. 37　No. Part2　p. 7B,L894-L896　1998/07
Publisher: The Japan Society of Applied Physics
EEM (Elastic Emission Machining)用微粒子作製装置の開発

森勇蔵, 山内和人, 山村和也, 佐野泰久, 松本光弘, 三村秀和

精密工学会大会学術講演会講演論文集　Vol. 1998　No. 1　p. 430-430　1998/03/05
Computer Numerically Controlled Plasma Chemical Vaporization Machining with a Pipe Electrode for Optical Fabrication

TAKINO H, SHIBATA N, ITOH H, KOBAYASHI T, TANAKA H, EBI M, YAMAMURA K, SANO Y, MORI Y

APPLIED OPTICS, 37/22,5198　Vol. 37　No. 22　p. 5198-5210　1998
Development of New Ultra Precision Machining Methods --- Plasma CVM and EEM ---

First International School on Crystal Growth Technology, pp. 218-228　Vol. pp. 218-228　1998
Plasma Chemical Vaporization Machining(CVM)for Fabrication of Optics

Vol. 37　No. Part2　1998
Computer Numerically Controlled Plasma Chemical Vaporization Machining with a Pipe Electrode for Optical Fabrication

APPLIED OPTICS, 37/22,5198　Vol. 37　No. 22　p. 5198-5210　1998
Development of New Ultra Precision Machining Methods --- Plasma CVM and EEM ---

First International School on Crystal Growth Technology, pp. 218-228　Vol. pp. 218-228　1998
Development of New Ultra Precision Machining Methads-Plasma CVM and EEM-

First International School on Crystal Growth Technology　1998
Plasma Chemical Vaporization Machining(CVM)for Fabrication of Optics

Jpn. J. Appl. Phys.　Vol. 37　No. Part2　1998
First-principles Analysis of Chemical Reactions between Metal Oxide Fine Powders and Si(100) Surface in EEM(Elastic Emission Machining)

Kazuto Yamauchi, Kikuji Hirose, Hidekazu Goto, Masao Sakamoto, Kazuya Yamamura, Yasuhisa Sano, Yuzo Mori

Vol. Vol.20, pp.867-870　1996/12
Plasma CVM(Chemical Vaporization Machining)におけるポリシング加工に関する研究(第3報) -加工面の平坦度と電極形状ならびに試料保持方法の相関(その2)-

森勇蔵, 山内和人, 山村和也, 佐野泰久

精密工学会大会学術講演会講演論文集　Vol. 1996　No. 2　p. 197-198　1996/09/01
First-principles Analysis of Removal Mechanism in EEM(Elastic Emission Machining)

Kazuto Yamauchi, Kikuji Hirose, Hidekazu Goto, Kazuya Yamamura, Yasuhisa Sano, Yuzo Mori

Proceedings of 1996 the Japan-China Bilateral Symposium on Advanced Manufacturing Engineering, pp.60-64　Vol. pp.60-64　1996/09
Polishing of Si Wafer by Plasma CVM(Chemical Vaporization Machining)

Yuzo Mori, Kazuya Yamamura, Kazuto Yamauchi, Yasuhisa Sano

1996 The Japan-China Bilateral Symp.on Advances Manufacturing Eng.　Vol. pp.65-68　1996/09
Slicing of Silicon by Plasma CVM(Chemical Vaporization Machining)

Yuzo Mori, Kazuto Yamauchi, Kazuya Yamamura, Yasuhisa Sano

Vol. pp.69-72　1996/09
Designing a New Apparatus for Measuring Particle Sizes of Nanometer Order by Light-scattering (4th Report) -- Formation for Output Characteristics of Photomultiplier and Improvement of Dynamic Range --

Hiroshi An, Yuzo Mori, Toshihiko Kataoka, Katsuyoshi Endo, Kazuto Yamauchi, Kohji Inagaki, Kazuya Yamamura, Haruyuki Inoue, Yasuhisa Sano

Vol. 62　No. 8　p. 1198-1202　1996/08
Designing a New Apparatus for Measuring Particle Sizes of Nanometer Order by Light-scattering (4th Report) : Formation for Output Characteristics of Photomultiplier and Improvement of Dynamic Range

Hiroshi AN, Yuzo MORI, Toshihiko KATAOKA, Katsuyoshi ENDO, Kazuto YAMAUCHl, Kohji INAGAKI, Kazuya YAMAMURA, Haruyuki INOUE, Yasuhisa SANO

Journal of the Japanese Society of Precision Engineering　Vol. 62　No. 8　p. 1198-1202　1996/08
Publisher: The Japan Society for Precision Engineering
Plasma CVM(Chemical Vaporization Machining)におけるポリシング加工に関する研究(第1報) -ポリシング加工用高速回転型電極の試作とその加工特性-

森勇藏, 山内和人, 山村和也, 佐野泰久

精密工学会大会学術講演会講演論文集　Vol. 1996　No. 1　p. 1145-1146　1996/03/01
プラズマCVM(Chemical Vaporization Machining)における切断加工に関する研究 -切断加工用高速回転電極の試作とその加工特性-

森勇藏, 山内和人, 山村和也, 佐野泰久

精密工学会大会学術講演会講演論文集　Vol. 1996　No. 1　p. 1143-1144　1996/03/01
Plasma CVM(Chemical Vaporization Machining)におけるNC加工に関する研究(第1報) -NC加工用高速回転型電極の試作とその加工特性-

森勇藏, 山内和人, 山村和也, 佐野泰久

精密工学会大会学術講演会講演論文集　Vol. 1996　No. 1　p. 1141-1142　1996/03/01
光散乱法によるナノメータオーダの粒径測定法 (第5報) -ダイナミックレンジの改善法と標準粒子の測定-

安弘, 南川文孝, 森勇蔵, 片岡俊彦, 遠藤勝義, 山内和人, 稲垣耕司, 井上晴行, 山村和也, 佐野泰久

精密工学会大会学術講演会講演論文集　Vol. 1996　No. 1　p. 1109-1110　1996/03/01
EEM(Elastic Emission Machining)における加工現象の第一原理分子動力学シミュレーション (第3報) -化学結合の分子軌道計算-

山内和人, 山村和也, 佐野泰久, 広瀬喜久治, 後藤英和, 坂本正雄, 森勇藏

精密工学会大会学術講演会講演論文集　Vol. 1996　No. 1　p. 989-990　1996/03/01
First-principles Analysis of Chemical Reactions between Metal Oxide Fine Powders and Si(100) Surface in EEM(Elastic Emission Machining)

Transactions of the Materials Research Society of Japan, Vol.20, pp.867-870　Vol. Vol.20, pp.867-870/,　1996
Polishing of Si Wafer by Plasma CVM(Chemical Vaporization Machining)

Proceedings of 1996 the Japan-China Bilateral Symposium on Advanced Manufacturing Engineering, pp.65-68　Vol. pp.65-68　1996
First-principles Analysis of Removal Mechanism in EEM(Elastic Emission Machining)

Proceedings of 1996 the Japan-China Bilateral Symposium on Advanced Manufacturing Engineering, pp.60-64　Vol. pp.60-64　1996
Slicing of Silicon by Plasma CVM(Chemical Vaporization Machining)

Proceedings of 1996 the Japan-China Bilateral Symposium on Advanced Manufacturing Engineering, pp.69-72　Vol. pp.69-72　1996
First-principles Analysis of Chemical Reactions between Metal Oxide Fine Powders and Si(100) Surface in EEM(Elastic Emission Machining)

Vol. Vol.20, pp.867-870　1996
First-principles Analysis of Chemical Reactions between Metal Oxide Fine Powders and Si(100) Surface in EEM(Elastic Emission Machining)

Vol. Vol.20, pp.867-870/,　1996
Polishing of Si Wafer by Plasma CVM(Chemical Vaporization Machining)

Vol. pp.65-68　1996
First-principles Analysis of Removal Mechanism in EEM(Elastic Emission Machining)

Proceedings of 1996 the Japan-China Bilateral Symposium on Advanced Manufacturing Engineering, pp.60-64　Vol. pp.60-64　1996
Slicing of Silicon by Plasma CVM(Chemical Vaporization Machining)

Vol. pp.69-72　1996
First-principles Analysis of Chemical Reactions between Metal Oxide Fine Powders and Si(100)Surface in EEM(Elastic Emission Machining)

Transactions of the Materials Research Society of Japan　Vol. 20　1996
A Method for Measuring Particle Sizes of Nanometer Order by Light-scattering

Proceedings of 1996 The Japan-China Bilateral Symposium on Advanced Manufacturing Engineering　1996
First-principles Analysis of Removal Mechanism in EEM(Elastic Emission Machining)

Proceedings of 1996 The Japan-China Bilateral Symposium on Advanced Manufacturing Engineering　1996
Slicing of Silicon by Plasma CVM(Chemical Vaporization Machining)

Proceedings of 1996 The Japan-China Bilateral Symposium on Advanced Manufacturing　1996
Polishing of Si Water by Plasma CVM(Chemical Vaporization Machining)

Proceedings of 1996 The Japan-China Bilateral Symposium on Advanced Manufacturing　1996
プラズマCVM(Chemical Vaporization Machining)における加工現象の第一原理分子動力学シミュレーション(第5報)-Si表面とハロゲン原子の相互作用の解析(その3)-

山村和也, 佐野泰久, 山内和人, 広瀬喜久治, 後藤英和, 坂本正雄, 森勇藏

精密工学会大会学術講演会講演論文集　Vol. 1995　No. 2　p. 625-626　1995/09/01

Publications 18

Chapter 41. Plasma-Based Nanomanufacturing Under Atmospheric Pressure, Handbook of Manufacturing Engineering and Technology

K. Yamamura, Y. Sano

Springer　2014/10　Scholarly book

ISBN: 9781447146698
超精密加工と表面科学－原子レベルの生産技術－第3部第2章2 半導体ウエハの超精密加工

佐野泰久

大阪大学出版　2014/03　Scholarly book

ISBN: 9784872594652
SiCパワーデバイスの開発と最新動向、第7章第5節SiC 基板表面の原子レベル平坦化技術

佐野泰久, 有馬健太, 山内和人

S&T出版　2012/10　Scholarly book

ISBN: 9784907002060
大気圧プラズマの生成制御と応用技術改訂版第6章第3節プラズマCVMによる超精密形状創成とプラズマ援用研磨による表面仕上げ

山村和也, 佐野泰久, 森勇藏

サイエンス&テクノロジー　2012/03　Scholarly book

ISBN: 9784864280396
Technology of Semiconductor SiC and Its Application

Hiroyuki Matsunami, Noboru Otani, Tsunenobu Kimoto, Takashi Nakamura

Nikkan Kogyo Shimbun Ltd.　2011/09　Scholarly book

ISBN: 9784526067549
Generation and Applications of Atmospheric Pressure Plasmas, Chapter 15. Ultra precision machining using plasma chemical vaporization machining (CVM)

K. Yamamura, Y. Sano, Y. Mori

Nova Science Publishers　2011/04　Scholarly book

ISBN: 9781612097176
Crystal Growth Technology (Chapter 18; Crystal Machining Using Atmospheric Pressure Plasma)

Yasuhisa Sano, Kazuya Yamamura, Kazuto Yamauchi

WILEY-VCH　2010/09　Scholarly book

ISBN: 9783527325931
次世代パワー半導体－省エネルギー社会に向けたデバイス開発の最前線－第1章第1節2 PCVMを用いたSiC基板の薄化

佐野泰久, 山村和也, 山内和人

(株)エヌ・ティー・エス　2009/10　Scholarly book
大気圧プラズマ基礎と応用 6.7.5 マイクロ／ナノ加工日本学術振興会プラズマ材料科学第153委員会

佐野泰久, 山村和也, 山内和人

オーム社　2009/10　Scholarly book

ISBN: 9784274207600
Crystal Growth Technology (Chapter 19; Plasma Chemical Vaporization Machining and Elastic Emission Machining)

Yasuhisa Sano, Kazuya Yamamura, Hidekazu Mimura, Kazuto Yamauchi, Yuzo Mori

Wiley-VCH　2008/03　Scholarly book

ISBN: 9783527317622
大気圧プラズマの生成制御と応用技術, 第13節プラズマCVMによる超精密加工

山村和也, 佐野泰久, 森勇藏

サイエンス＆テクノロジー　2006/11　Scholarly book

ISBN: 4903413136
Crystal Growth Technology(Plasma-CVM(Chemical Vaporization Machining))

Yuzo Mori, Kazuya Yamamura, Yasuhisa Sano

John Wiley & Sons　2003/10　Scholarly book
加工技術データファイル基礎編（特殊加工）、5.7プラズマＣＶＭ

森勇藏, 山村和也, 佐野泰久

（財）機械振興協会技術研究所　2003/06　Scholarly book
High-speed Patterning of Integrated-Type a-Si Solar Cell Submodules by Plasma CVM

Precision Science and Technology for Perfact Surfaces Published by The Japan Society for Precision Engineering(JSPE)　1999
High Rate Polishing of Silicon Surface using Plasma CVM with Rotary Drum Electrode

Precision Science and Technology for Pertect Surfaces Published by The Japan Society for Precision Engineering(JSPE)　1999
Slicing of Functional Materials by Plasma CVM (Chemical Vaporization Machining)

Precision Science and Technology for Pertect Surfaces Published by The Japan Society for Precision Engineering(JSPE)　1999
Plasma Chemical Vaporization Machining with a Pipe Electrode for Large Optics

Precision Science and Technology for Pertect Surfaces Published by The Japan Society for Precision Engineering(JSPE)　1999
Development of Numerically Controlled Plasma CVM (Chemical Vaporization Machining)System for Fabrication of Ultra Precsion Optical Devices

Precision Science and Technology for Pertect Surfaces Published by The Japan Society for Precision Engineering(JSPE)　1999

Works 23

窒化ガリウム(GaN)基板の高能率・ダメージレス平坦化加工技術の開発

2010 -
省エネルギーパワーデバイス用SiC基板の高能率加工方法

2010 -
数値制御大気圧プラズマ犠牲酸化による超精密加工

2009 -
固体酸・塩基触媒を用いた窒化ガリウム(GaN)基板の高能率・ダメージレス平坦化技術の開発

2009 -
省エネルギーパワーデバイス用SiC基板の高能率加工方法

2009 -
固体酸・塩基触媒を用いた窒化ガリウム(GaN)基板の高能率・ダメージレス平坦化技術の開発

2008 -
グローバルCOE 高機能化原子制御製造プロセス教育研究拠点

2008 -
ワイドバンドギャップ半導体デバイス製作のための高能率化学的加工法

2008 -
数値制御大気圧プラズマ犠牲酸化による超精密加工

2008 -
液晶用メーター超級大型フォトマスク基板の高精度・高能率作製プロセスの開発

2008 -
Center of Excellence for Atomically Controlled Fabrication Technology

2008 -
触媒支援型化学加工法によるSiC基板の高精度・高能率平坦化

2007 -
液晶用メーター超級大型フォトマスク基板の高精度・高能率作製プロセスの開発

2007 -
数値制御大気圧プラズマ犠牲酸化による超精密加工

2007 -
ワイドバンドギャップ半導体デバイス製作のための高能率化学的加工法

2007 -
ワイドバンドギャップ半導体デバイス製作のための高能率化学的加工法

2006 -
触媒支援型化学加工法によるSiC基板の高精度・高能率平坦化

2006 -
液晶用メーター超級大型フォトマスク基板の高精度・高能率作製プロセスの開発

2006 -
触媒支援型化学加工法によるSiC基板の高精度・高能率平坦化

2005 -
高精度X線ミラーの超精密加工と形状計測に関する研究

2004 -
原子論的生産技術の創出拠点

2004 -
超高精度X線ミラー作製による高分解能硬X線顕微鏡の開発

2004 -
高精度X線ミラーの超精密過去と形状計測の関する研究

2004 -

Industrial Property Rights 4

プラズマ処理装置

佐野泰久

5013332

出願日:2007/08

登録日:2012/06
半導体ウエハ外周部の加工方法及びその装置

佐野泰久, 山村和也, 原英之, 加藤武寛

特許第4962960号

出願日:2007/08

登録日:2012/04
誘電体基板のパターン転写加工方法

森勇藏, 山村和也, 佐野泰久

特許第4665503号

出願日:2004/12

登録日:2011/01
精密加工方法及び精密加工装置

佐野泰久

4644858

出願日:2006/07

登録日:2010/12

Academic Activities 32

精密工学会（関西支部庶務幹事）

2018/04 - Present
応用物理学会先進パワー半導体分科会（幹事）

2017/04 - Present
精密工学会プラナリゼーションCMPとその応用技術専門委員会（幹事）

2013/02 - Present
精密工学会（関西支部幹事）

2011/04 - Present
精密工学会（関西支部商議員）

2009/04 - Present
International Conference on Planarization/CMP Technology 2019 (ICPT2019)

ICPT2019 Organizing Committee

2019/09 -
International Conference on Silicon Carbide and Related Materials 2019

ICSCRM2019組織委員会

2019/09 -
応用物理学会先進パワー半導体分科会第5回講演会

応用物理学会先進パワー半導体分科会

2018/11 -
International Conference on Planarization/CMP Technology 2018 (ICPT2018)

ICPT2018 Organizing Committee

2018/10 -
International Conference on Planarization/CMP Technology 2017 (ICPT2017)

ICPT2017 Organizing Committee

2017/10 -
精密工学会2017年度秋季大会学術講演会

精密工学会

2017/09 -
International Conference on Planarization/CMP Technology 2016 (ICPT2016)

ICPT2016 Organizing Committee

2016/11 -
The 7th International Symposium on Advanced Science and Technology of Silicon Materials

シリコン材料の先端科学と技術国際シンポジウム実行委員会

2016/11 -
International Conference on Planarization/CMP Technology 2015 (ICPT2015)

ICPT2015 Organizing Committee

2015/11 -
応用物理学会先進パワー半導体分科会第2回講演会

応用物理学会先進パワー半導体分科会

2015/11 -
International Conference on Planarization/CMP Technology 2014 (ICPT2014)

公益社団法人精密工学会プラナリゼーションCMPとその応用技術専門委員会

2014/11 -
International Conference on Silicon Carbide and Related Materials 2013 (ICSCRM2013)

公益社団法人応用物理学会

2013/09 -
セミコンジャパン2012

SEMIジャパン

2012/12 -
The 5th international symposium on Atomically Controlled Fabrication Technology

The Global COE program at Osaka University and The Technical Committee on Ultra Precision Machining

2012/10 -
セミコンジャパン2011

SEMIジャパン

2011/12 -
The 4th international symposium on Atomically Controlled Fabrication Technology

The Global COE program at Osaka University and The Technical Committee on Ultra Precision Machining

2011/10 -
セミコンジャパン2010

SEMI ジャパン

2010/12 -
The third international symposium on Atomically Controlled Fabrication Technology

The Global COE program at Osaka University and The Technical Committee on Ultra Precision Machining

2010/11 -
セミコンジャパン2009

SEMIジャパン

2009/12 -
The second international symposium on Atomically Controlled Fabrication Technology

The Global COE program at Osaka University and The Technical Committee on Ultra Precision Machining

2009/10 -
イノベーションジャパン2009

JST, NEDO

2009/09 -
The first international symposium on Atomically Controlled Fabrication Technology

The global COE Program "Atomically Controlled Fabrication Technology"

2009/02 -
セミコンジャパン2008

SEMI Japan

2008/12 -
セミコンジャパン2007

SEMI ジャパン

2007/12 -
セミコンジャパン2007

SEMI ジャパン

2007/12 -
セミコンジャパン2006

SEMI ジャパン

2006/12 -
セミコンジャパン2006

SEMI ジャパン

2006/12 -

Institutional Repository 50

Content Published in the University of Osaka Institutional Repository (OUKA)

Hard x-ray intensity autocorrelation using direct two-photon absorption

Osaka Taito, Inoue Ichiro, Yamada Jumpei, Inubushi Yuichi, Matsumura Shotaro, Sano Yasuhisa, Tono Kensuke, Yamauchi Kazuto, Tamasaku Kenji, Yabashi Makina

Physical Review Research　Vol. 4　No. 1　2022/03/18
Optimal deformation procedure for hybrid adaptive x-ray mirror based on mechanical and piezo-driven bending system

Inoue Takato, Nishioka Yuka, Matsuyama Satoshi, Sonoyama Junki, Akiyama Kazuteru, Nakamori Hiroki, Ichii Yoshio, Sano Yasuhisa, Shi Xianbo, Shu Deming, Wyman Max D., Harder Ross, Kohmura Yoshiki, Yabashi Makina, Assoufid Lahsen, Ishikawa Tetsuya, Yamauchi Kazuto

Review of Scientific Instruments　Vol. 92　No. 12　2021/12/28
High-throughput deterministic plasma etching using array-type plasma generator system

Sano Yasuhisa, Nishida Ken, Asada Ryohei, Okayama Shinya, Toh Daisetsu, Matsuyama Satoshi, Yamauchi Kazuto

Review of Scientific Instruments　Vol. 92　No. 12　2021/12/16
Photoelectrochemical oxidation assisted catalyst-referred etching for sic (0001) surface

Toh Daisetsu, Bui Pho Van, Yamauchi Kazuto, Sano Yasuhisa

International Journal of Automation Technology　Vol. 15　No. 1　p. 74-79　2021/01/05
An abrasive-free chemical polishing method assisted by nickel catalyst generated by in situ electrochemical plating

Toh Daisetsu, Van Bui Pho, Isohashi Ai, Matsuyama Satoshi, Yamauchi Kazuto, Sano Yasuhisa

Review of Scientific Instruments　Vol. 91　No. 4　2020/04/13
Improvements in graphene growth on 4H-SiC(0001) using plasma induced surface oxidation

Minami Ouki, Ito Ryota, Hosoo Kohei, Ochi Makoto, Sano Yasuhisa, Kawai Kentaro, Yamamura Kazuya, Arima Kenta

Journal of Applied Physics　Vol. 126　No. 6　p. 065301-1-065301-10　2019/08/08
Catalyzed chemical polishing of SiO2 glasses in pure water

Toh Daisetsu, Bui Pho Van, Isohashi Ai, Kidani Naotaka, Matsuyama Satoshi, Sano Yasuhisa, Morikawa Yoshitada, Yamauchi Kazuto

Review of Scientific Instruments　Vol. 90　No. 4　2019/04/15
Surface finishing method using plasma chemical vaporization machining for narrow channel walls of x-ray crystal monochromators

Hirano Takashi, Morioka Yuki, Matsumura Shotaro, Sano Yasuhisa, Osaka Taito, Matsuyama Satoshi, Yabashi Makina, Yamauchi Kazuto

International Journal of Automation Technology　Vol. 13　No. 2　p. 246-253　2019/03/05
Characteristics and mechanism of catalyst-referred etching method: Application to 4H-SiC

Van Bui Pho, Sano Yasuhisa, Morikawa Yoshitada, Yamauchi Kazuto

International Journal of Automation Technology　Vol. 12　No. 2　p. 154-159　2018/03/05
Development of concave-convex imaging mirror system for a compact and achromatic full-field x-ray microscope

Yamada Jumpei, Matsuyama Satoshi, Yasuda Shuhei, Sano Yasuhisa, Kohmura Yoshiki, Yabashi Makina, Ishikawa Tetsuya, Yamauchi Kazuto

Proceedings of SPIE　Vol. 10386　2017/09/06
Chemical etching of silicon carbide in pure water by using platinum catalyst

Isohashi Ai, Bui P. V., Toh D., Matsuyama S., Sano Y., Inagaki K., Morikawa Y., Yamauchi K.

Applied Physics Letters　Vol. 110　No. 20　2017/05/15
Ultrafast observation of lattice dynamics in laser-irradiated gold foils

Hartley N. J., Ozaki N., Matsuoka T., Albertazzi B., Faenov A., Fujimoto Y., Habara H., Harmand M., Inubushi Y., Katayama T., Koenig M., Krygier A., Mabey P., Matsumura Y., Matsuyama S., McBride E. E., Miyanishi K., Morard G., Okuchi T., Pikuz T., Sakata O., Sano Y., Sato T., Sekine T., Seto Y., Takahashi K., Tanaka K. A., Tange Y., Togashi T., Umeda Y., Vinci T., Yabashi M., Yabuuchi T., Yamauchi K., Kodama R.

Applied Physics Letters　Vol. 110　No. 7　2017/02/13
Size-changeable x-ray beam collimation using an adaptive x-ray optical system based on four deformable mirrors

Goto T., Matsuyama S., Nakamori H., Hayashi H., Sano Y., Kohmura Y., Yabashi M., Ishikawa T., Yamauchi K.

Proceedings of SPIE - The International Society for Optical Engineering　Vol. 9965　2016/10/27
Development of array-type atmospheric-pressure RF plasma generator with electric on-off control for high-throughput numerically controlled processes

Takei H., Kurio S., Matsuyama S., Yamauchi K., Sano Y.

Review of Scientific Instruments　Vol. 87　No. 10　2016/10
Development of speckle-free channel-cut crystal optics using plasma chemical vaporization machining for coherent x-ray applications

Hirano Takashi, Osaka Taito, Sano Yasuhisa, Inubushi Yuichi, Matsuyama Satoshi, Tono Kensuke, Ishikawa Tetsuya, Yabashi Makina, Yamauchi Kazuto

Review of Scientific Instruments　Vol. 87　No. 6　2016/06
High-efficiency planarization method combining mechanical polishing and atmospheric-pressure plasma etching for hard-to-machine semiconductor substrates

Sano Yasuhisa, Shiozawa Kousuke, Doi Toshiro, Kurokawa Syuhei, Aida Hideo, Miyashita Tadakazu, Yamauchi Kazuto

Mechanical Engineering Journal　Vol. 3　No. 1　2016/02
Study on the mechanism of platinum-assisted hydrofluoric acid etching of SiC using density functional theory calculations

Bui P. V., Isohashi A., Kizaki H., Sano Y., Yamauchi K., Morikawa Y., Inagaki K.

Applied Physics Letters　Vol. 107　No. 20　2015/11/16
Development of ion beam figuring system with electrostatic deflection for ultraprecise X-ray reflective optics

Yamada Jumpei, Matsuyama Satoshi, Sano Yasuhisa, Yamauchi Kazuto

Review of Scientific Instruments　Vol. 86　No. 9　2015/09
Hard X-ray nanofocusing using adaptive focusing optics based on piezoelectric deformable mirrors

Goto Takumi, Nakamori Hiroki, Kimura Takashi, Sano Yasuhisa, Kohmura Yoshiki, Tamasaku Kenji, Yabashi Makina, Ishikawa Tetsuya, Yamauchi Kazuto, Matsuyama Satoshi

Review of Scientific Instruments　Vol. 86　No. 4　2015/04
Development of split-delay x-ray optics using Si(220) crystals at SACLA

Osaka Taito, Hirano Takashi, Yabashi Makina, Sano Yasuhisa, Tono Kensuke, Inubushi Yuichi, Sato Takahiro, Ogawa Kanade, Matsuyama Satoshi, Ishikawa Tetsuya, Yamauchi Kazuto

Proceedings of SPIE - The International Society for Optical Engineering　Vol. 9210　2014/10/08
Development of a one-dimensional two-stage focusing system with two deformable mirrors

Goto T., Matsuyama S., Nakamori H., Kimura T., Sano Y., Kohmura Y., Tamasaku K., Yabashi M., Ishikawa T., Yamauchi K.

Proceedings of SPIE - The International Society for Optical Engineering　Vol. 9208　2014/10/03
Dependence of GaN Removal Rate of Plasma Chemical Vaporization Machining on Mechanically Introduced Damage

Sano Yasuhisa, Doi Toshiro K., Kurokawa Syuhei, Aida Hideo, Ohnishi Osamu, Uneda Michio, Shiozawa Kousuke, Okada Yu, Yamauchi Kazuto

Sensors and Materials　Vol. 26　No. 4　p. 429-434　2014/06/29
Damage characteristics of platinum/carbon multilayers under X-ray free-electron laser irradiation

Kim Jangwoo, Koyama Takahisa, Yumoto Hirokatsu, Nagahira Ayaka, Matsuyama Satoshi, Sano Yasuhisa, Yabashi Makina, Ohashi Haruhiko, Ishikawa Tetsuya, Yamauchi Kazuto

Proceedings of SPIE - The International Society for Optical Engineering　Vol. 8848　2013/09/27
Thin crystal development and applications for hard x-ray free-electron lasers

Osaka Taito, Yabashi Makina, Sano Yasuhisa, Tono Kensuke, Inubushi Yuichi, Sato Takahiro, Ogawa Kanade, Matsuyama Satoshi, Ishikawa Tetsuya, Yamauchi Kazuto

Proceedings of SPIE - The International Society for Optical Engineering　Vol. 8848　2013/09/27
Development of achromatic full-field x-ray microscopy with compact imaging mirror system

Matsuyama S., Emi Y., Kino H., Sano Y., Kohmura Y., Tamasaku K., Yabashi M., Ishikawa T., Yamauchi K.

Proceedings of SPIE - The International Society for Optical Engineering　Vol. 8851　2013/09/26
Experimental and simulation study of undesirable short-period deformation in piezoelectric deformable x-ray mirrors

Nakamori Hiroki, Matsuyama Satoshi, Imai Shota, Kimura Takashi, Sano Yasuhisa, Kohmura Yoshiki, Tamasaku Kenji, Yabashi Makina, Ishikawa Tetsuya, Yamauchi Kazuto

Review of Scientific Instruments　Vol. 83　No. 5　2012/05/03
Development of a one-dimensional Wolter mirror for achromatic full-field X-ray microscopy

Matsuyama S., Kidani N., Mimura H., Kim J., Sano Y., Tamasaku K., Kohmura Y., Yabashi M., Ishikawa T., Yamauchi K.

Proceedings of SPIE - The International Society for Optical Engineering　Vol. 8139　2011/09/28
Wavefield characterization of nearly diffraction-limited focused hard x-ray beam with size less than 10 nm

Kimura Takashi, Mimura Hidekazu, Handa Soichiro, Yumoto Hirokatsu, Yokoyama Hikaru, Imai Shota, Matsuyama Satoshi, Sano Yasuhisa, Tamasaku Kenji, Komura Yoshiki, Nishino Yoshinori, Yabashi Makina, Ishikawa Tetsuya, Yamauchi Kazuto

Review of Scientific Instruments　Vol. 81　No. 12　2010/12/29
Development of a one-dimensional Wolter mirror for an advanced Kirkpatrick-Baez mirror

Matsuyama S., Wakioka T., Mimura H., Kimura T., Kidani N., Sano Y., Nishino Y., Tamasaku K., Yabashi M., Ishikawa T., Yamauchi K.

Proceedings of SPIE - The International Society for Optical Engineering　Vol. 7802　2010/08/27
触媒表面を基準面とする化学研磨法の開発

佐野泰久, 有馬健太, 山内和人

大阪大学低温センターだより　Vol. 150　p. 22-27　2010/04
Termination dependence of surface stacking at 4H-SiC (0001) -1×1: Density functional theory calculations

Hara Hideyuki, Morikawa Yoshitada, Sano Yasuhisa, Yamauchi Kazuto

Physical Review B - Condensed Matter and Materials Physics　Vol. 79　No. 15　2009/04/27
Direct determination of the wave field of an x-ray nanobeam

Mimura Hidekazu, Yumoto Hirokatsu, Matsuyama Satoshi, Handa Soichiro, Kimura Takashi, Sano Yasuhisa, Yabashi Makina, Nishino Yoshinori, Tamasaku Kenji, Ishikawa Tetsuya, Yamauchi Kazuto

Physical Review A　Vol. 77　No. 1　2008/01/31
Fabrication of ultrathin and highly uniform silicon on insulator by numerically controlled plasma chemical vaporization machining

Sano Yasuhisa, Yamamura Kazuya, Mimura Hidekazu, Yamauchi Kazuto, Mori Yuzo

Review of Scientific Instruments　Vol. 78　No. 8　2007/08/07
Atomic-scale flattening of SiC surfaces by electroless chemical etching in HF solution with Pt catalyst

Arima Kenta, Hara Hideyuki, Murata Junji, Ishida Takeshi, Okamoto Ryota, Yagi Keita, Sano Yasuhisa, Mimura Hidekazu, Yamauchi Kazuto

Applied Physics Letters　Vol. 90　No. 20　2007/05/16
Efficient focusing of hard x rays to 25 nm by a total reflection mirror

Mimura Hidekazu, Yumoto Hirokatsu, Matsuyama Satoshi, Sano Yasuhisa, Yamamura Kazuya, Mori Yuzo, Yabashi Makina, Nishino Yoshinori, Tamasaku Kenji, Ishikawa Tetsuya, Yamauchi Kazuto

Applied Physics Letters　Vol. 90　No. 5　2007/01/29
Development of scanning x-ray fluorescence microscope with spatial resolution of 30 nm using Kirkpatrick-Baez mirror optics

Matsuyama S., Mimura H., Yumoto H., Sano Y., Yamamura K., Yabashi M., Nishino Y., Tamasaku K., Ishikawa T., Yamauchi K.

Review of Scientific Instruments　Vol. 77　No. 10　2006/10/11
Development of mirror manipulator for hard-x-ray nanofocusing at sub-50-nm level

Matsuyama S., Mimura H., Yumoto H., Hara H., Yamamura K., Sano Y., Endo K., Mori Y., Yabashi M., Nishino Y., Tamasaku K., Ishikawa T., Yamauchi K.

Review of Scientific Instruments　Vol. 77　No. 9　2006/09/25
At-wavelength figure metrology of total reflection mirrors in hard x-ray region

Yumoto Hirokatsu, Mimura Hidekazu, Matsuyama Satoshi, Handa Soichiro, Shibatani Akihiko, Katagishi Keiko, Sano Yasuhisa, Yabashi Makina, Nishino Yoshinori, Tamasaku Kenji, Ishikawa Tetsuya, Yamauchi Kazuto

Proceedings of SPIE - The International Society for Optical Engineering　Vol. 6317　2006/08/29
At-wavelength figure metrology of hard x-ray focusing mirrors

Yumoto Hirokatsu, Mimura Hidekazu, Matsuyama Satoshi, Handa Soichiro, Sano Yasuhisa, Yabashi Makina, Nishino Yoshinori, Tamasaku Kenji, Ishikawa Tetsuya, Yamauchi Kazuto

Review of Scientific Instruments　Vol. 77　No. 6　2006/06/30
Diffraction-limited two-dimensional hard-x-ray focusing at the 100 nm level using a Kirkpatrick-Baez mirror arrangement

Matsuyama S., Mimura H., Yumoto H., Yamamura K., Sano Y., Endo K., Mori Y., Nishino Y., Tamasaku K., Ishikawa T., Yabashi M., Yamauchi K.

Review of Scientific Instruments　Vol. 76　No. 8　2005/08/04
Fabrication of elliptically figured mirror for focusing hard x rays to size less than 50 nm

Yumoto Hirokatsu, Mimura Hidekazu, Matsuyama Satoshi, Hara Hideyuki, Yamamura Kazuya, Sano Yasuhisa, Ueno Kazumasa, Endo Katsuyoshi, Mori Yuzo, Yabashi Makina, Nishino Yoshinori, Tamasaku Kenji, Ishikawa Tetsuya, Yamauchi Kazuto

Review of Scientific Instruments　Vol. 76　No. 6　2005/06/07
Relative angle determinable stitching interferometry for hard x-ray reflective optics

Mimura Hidekazu, Yumoto Hirokatsu, Matsuyama Satoshi, Yamamura Kazuya, Sano Yasuhisa, Ueno Kazumasa, Endo Katsuyoshi, Mori Yuzo, Yabashi Makina, Tamasaku Kenji, Nishino Yoshinori, Ishikawa Tetsuya, Yamauchi Kazuto

Review of Scientific Instruments　Vol. 76　No. 4　2005/03/16
Wave-optical and ray-tracing analysis to establish a compact two-dimensional focusing unit using K-B mirror arrangement

Matsuyama S., Mimura H., Yamamura K., Yumoto H., Sano Y., Endo K., Mori Y., Yabashi M., Tamasaku K., Nishino Y., Ishikawa T., Yamauchi K.

Proceedings of SPIE - The International Society for Optical Engineering　Vol. 5533　p. 181-191　2004/10/18
数値制御プラズマCVMによる次世代超薄膜SOIウエハの製作

佐野泰久, 山村和也, 遠藤勝義, 森勇蔵

大阪大学低温センターだより　Vol. 125　p. 11-15　2004/01
超高精度硬X線集光ミラーの製作とナノスペクトロスコピーへの応用

山村和也, 山内和人, 佐野泰久, 三村秀和, 遠藤勝義, 森勇蔵

大阪大学低温センターだより　Vol. 125　p. 4-10　2004/01
Fabrication of elliptical mirror at nanometer-level accuracy for hard x-ray focusing by numerically controlled plasma chemical vaporization machining

Yamamura Kazuya, Yamauchi Kazuto, Mimura Hidekazu, Sano Yasuhisa, Saito Akira, Endo Katsuyoshi, Souvorov Alexei, Yabashi Makina, Tamasaku Kenji, Ishikawa Tetsuya, Mori Yuzo

Review of Scientific Instruments　Vol. 74　No. 10　p. 4549-4553　2003/10
Microstitching interferometry for x-ray reflective optics

Yamauchi Kazuto, Yamamura Kazuya, Mimura Hidekazu, Sano Yasuhisa, Saito Akira, Ueno Kazumasa, Endo Katsuyoshi, Souvorov Alexei, Yabashi Makina, Tamasaku Kenji, Ishikawa Tetsuya, Mori Yuzo

Review of Scientific Instruments　Vol. 74　No. 5　p. 2894-2898　2003/05
Ultraprecision Machining based on Physics and Chemistry

Mori Yuzo, Hirose Kikuji, Yamauchi Kazuto, Goto Hidekazu, Yamamura Kazuya, Sano Yasuhisa

Sensors and materials　Vol. 15　No. 1　p. 1-19　2003
Nearly diffraction-limited line focusing of a hard-X-ray beam with an elliptically figured mirror

Yamauchi Kazuto, Yamamura Kazuya, Mimura Hidekazu, Sano Yasuhisa, Saito Akira, Souvorov Alexei, Yabashi Makina, Tamasaku Kenji, Ishikawa Tetsuya, Mori Yuzo

Journal of Synchrotron Radiation　Vol. 9　No. 5　p. 313-316　2002/09
プラズマCVM(Chemical Vaporization Machining)による超精密加工に関する研究 -超薄膜SOI(Silicon on Insulator)ウエハの製作-

Sano Yasuhisa