keyword Neutron optics，X-ray optics，ultraprecision optical components，surface midification，unconventional machining，ultraprecision machining
Osaka University Graduate School, Division of Engineering
- 2001/01
Osaka University Graduate School, Division of Engineering
- 1991/03
Osaka University Faculty of Engineering precision engineering
- 1989/03
（公社）精密工学会 フェロー Academic society
2017 - Present
（一社）電気加工学会 理事 Academic society
2016 - Present
（一社）電気加工学会西日本支部 幹事 Academic society
2016 - Present
（公社）精密工学会 超精密加工専門委員会 幹事 Academic society
2012 - Present
（公社）精密工学会 代議員 Academic society
2011 - Present
（公社）精密工学会 関西支部 商議員 Academic society
2006 - Present
（公社）砥粒加工学会関西地区部会 会計監査 Academic society
2019 - 2022
（公社）砥粒加工学会 理事 Academic society
2017 - 2018
（公社）精密工学会 関西支部 庶務幹事 Academic society
2010 - 2017
（公社）砥粒加工学会関西地区部会 幹事 Academic society
2015 - 2016
（社）精密工学会 校閲委員会委員 Academic society
2008 - 2010
（社）精密工学会 評議員 Academic society
2008 - 2009
（社）精密工学会 周年事業検討ワーキンググループ委員 Academic society
2007 - 2009
（社）精密工学会 関西支部 会計幹事 Academic society
2007 - 2009
表面技術協会
アメリカ精密工学会（ASPE）
（社）精密工学会 超精密加工専門委員会
The International Academy for Production Engineering
Japan Society for Abrasive Technology
日本中性子科学会
（社）精密工学会 関西支部
（社）精密工学会
応用物理学会
精密工学会
The International Academy for Production Engineering
Japan Society for Abrasive Technology
The Japanese Society for Neutron Science
The Japan Society of Applied Physics
The Japan Society for Precision Engineering
Manufacturing technology (mechanical, electrical/electronic, chemical engineering) / Manufacturing and production engineering /
Nanotechnology/Materials / Thin-film surfaces and interfaces /
紫綬褒章
山村和也 2024/04
精密工学会沼田記念論文賞
楊旭、楊暁喆、青木一史、山村和也 公益社団法人精密工学会 2024/03
工作機械技術振興賞・人材育成賞
山村和也 公益社団法人工作機械技術振興財団 2023/06
精密工学会高城賞
孫栄硯 野副厚訓 永橋潤司 有馬健太 川合健太郎 山村和也 公益社団法人精密工学会 2023/03
SEMICON Japan 2022 アカデミアAward 最優秀賞
山村研究室 SEMICON Japan 2022/12
精密工学会技術賞
赤羽優子, 佐藤幸男, 菅原宏輝, 山村和也, 山田英明 公益社団法人 精密工学会 2021/09
文部科学大臣表彰 科学技術賞 開発部門
北田勝信, 山村和也, 深野徹, 宮﨑史朗, 渡辺啓一郎 2021/04
Best Paper Award
X. Yang, Xu. Yang, K. Kawai, K. Arima, K. Yamamura 18th International Conference on Precision Engineering (ICPE2020) 2020/11
井上春成賞
山村和也, 谷本秀夫 井上春成賞委員会 2017/07
Rudolf Kingslake Medal and Prize
X. Shen, Q. Tu, J. Zhou, H. Deng, G. Jiang, K. Yamamura SPIE 2016/08
平成28年度表面技術協会 論文賞
是津信行, 山村和也, 井筒祐志, 我田 元, 大石修治, 手嶋勝弥 表面技術協会 2015/12
岩木トライボコーティングネットワークアワード（岩木賞）優秀賞
山村和也 一般社団法人未来生産システム学協会 2015/02
大阪大学総長顕彰
山村和也 大阪大学 2014/07
工作機械技術振興賞（論文賞）
トウキ, 山村和也 公益財団法人 工作機械技術振興財団 2014/06
Best Paper Award
H. Deng, M. Ueda, K. Yamamura 4th International Conference of Asian Society for Precision Engineering and Nanotechnology 2011/11
Best Paper Award
X. Shen, Y. Dai, W. Peng, M. Nagano, K. Yamamura 4th International Conference of Asian Society for Precision Engineering and Nanotechnology 2011/11
Best Paper Award
Shuhei Uchida, Nobuyuki Zettsu, Kazuya Yamamura 3rd Asian Symposium for Precision Engineering and Nanotechnology 2009/11
Best Poster Presentation Award
Hiroyuki Takai, Kazuya Yamamura Asian Symposium for Precision Engineering and Nanotechnology 2007 2007/11
Best Paper Award 2006
Kazuya Yamamura, Kunihito Kato, Yasuhisa Sano, Masafumi Shibahara, Katsuyoshi Endo, Yuzo Mori The 8th International Conference on Progress of Machining Technology 2006/11
工作機械技術振興賞（論文賞）
森勇藏, 山村和也, 佐野泰久 （財）工作機械技術振興財団 2003/06
精密工学会賞
森勇藏, 山村和也, 佐野泰久 (社)精密工学会 2003/03
工作機械技術振興賞(論文賞)
森 勇蔵, 山村和也, 佐野泰久 (財)工作機械技術振興財団 2002/06
JSPE Award
Kazuto Yamauchi, Kazuhisa Sugiyama, Kouji Inagaki, Kazuya Yamamura, Yasuhisa Sano, Yuzo Mori 2001/03
工作機械技術振興賞(論文賞)
森 勇蔵, 山内和人, 山村和也, 佐野泰久 (財)工作機械技術振興財団 2000/06
An interior damage free approach for nanosecond pulsed laser ablation of single crystal diamond via metal film induced self-maintaining graphitization
Nian Liu, Ling Lei, Jingming Zhu, Hao Lu, Junfeng Xiao, Jianguo Zhang, Xiao Chen, Jianfeng Xu, Kazuya Yamamura
Journal of Manufacturing Processes Vol. 131 p. 958-972 2024/12 Research paper (scientific journal)
Publisher: Elsevier BV
A proposed methodology to develop digital twin framework for plasma processing
Alasdair Mitchell, Xinyang Wei, Rongyan Sun, Kazuya Yamamura, Long Ye, Jonathan Corney, Nan Yu
Results in Engineering Vol. 24 p. 103462-103462 2024/12 Research paper (scientific journal)
Publisher: Elsevier BV
A highly efficient semi-finishing approach for polycrystalline diamond film via plasma-based anisotropic etching
Nian Liu, Ling Lei, Huilong Jiang, Yongjie Zhang, Junfeng Xiao, Jianguo Zhang, Xiao Chen, Jianfeng Xu, Kazuya Yamamura
Journal of Materials Processing Technology Vol. 332 p. 118578-118578 2024/11 Research paper (scientific journal)
Publisher: Elsevier BV
Neutron Optics Design of a Neutron Magnetic Microscope Using Wolter Type I Supermirror
Kazuhiko SOYAMA, Hirotoshi HAYASHIDA, Ryuji MARUYAMA, Dai YAMAZAKI, Yuiki GOTO, Yuki KOBAYASHI, Shohei ARAKAWA, Yugo YAMAMOTO, Kenta SUBA, Kazuya YAMAMURA
JAEA Research Vol. 2024 No. 006 p. 1-15 2024/10 Research paper (bulletin of university, research institution)
プラズマおよび電気化学プロセスを援用したナノ精度の加工技術
山村和也
クリーンテクノロジー Vol. 34 No. 9 p. 54-59 2024/09
A Review of Simulation Modeling of the State Evaluation and Process Prediction of Plasma Processing under Atmospheric Pressure
Xinyang Wei, Alasdair Mitchell, Rongyan Sun, Nan Yu, Kazuya Yamamura
Nanomanufacturing and Metrology Vol. 7 No. 1 2024/06/26 Research paper (scientific journal)
Publisher: Springer Science and Business Media LLC
プラズマを援用したナノ製造プロセス ―プラズマCVMとプラズマ援用研磨―
山村和也
静電気学会誌 Vol. 48 No. 3 p. 69-73 2024/06
Oxidation mechanism of 4H-SiC in slurry-less ECMP with weak alkaline electrolyte
R. Sun, R. Kinoshita, K. Aoki, S. Hayakawa, K. Hori, K. Yasuda, Y. Ohkubo, K. Yamamura
CIRP Annals - Manufacturing Technology 2024/05/01 Research paper (scientific journal)
Insights into the atomic-scale removal mechanism of single crystal diamond in plasma-assisted polishing with quartz glass
Nian Liu, Huilong Jiang, Junfeng Xiao, Jianguo Zhang, Xiao Chen, Jingming Zhu, Jianfeng Xu, Kazuya Yamamura
Tribology International Vol. 194 p. 109507-109507 2024/03/04 Research paper (scientific journal)
Publisher: Elsevier BV
Identification of the surface chemical species of plasma-treated polytetrafluoroethylene by ab-initio calculations of the core-energy-level shift in X-ray photoelectron spectra
M. Nishino, K. Inagaki, Y. Morikawa, K. Yamamura, Y. Ohkubo
Applied Surface Science Vol. in Press 2024/01/08 Research paper (scientific journal)
Effects of electrolyte type and concentration on the anodic oxidation of 4H-SiC (0001) in slurryless electrochemical mechanical polishing
Xiaozhe Yang, Xu Yang, Kazuya Yamamura
Electrochimica Acta Vol. 474 p. 143531-143531 2023/11/19 Research paper (scientific journal)
Publisher: Elsevier BV
プラズマ／電気化学プロセスを援用したナノ精度の形状加工と難加工材料のダメージフリー研磨
山村和也
日本機械学会誌 Vol. 126 No. 1259 p. 8-13 2023/10/05
「ナノ製造プロセスの最前線」特集によせて
山村和也
日本機械学会誌 Vol. 126 No. 1259 p. 6-7 2023/10/05
Preparation of platinum-free manganese oxide (MnOx) catalyst film for H2O2 decomposition in contact-lens cleaning
Y. Ohkubo, D. Fukuoka, Y. Seto, M. Nishino a, K. Endo a, K. Yamamura
Thin Solid Films 2023/09/09 Research paper (scientific journal)
Direct adhesion between Cu foil and polytetrafluoroethylene without increasing surface roughness for high-frequency printed wiring boards
M. Nishino, T. Kodama, K. Yamamura, Y. Ohkubo
RSC Advances Vol. 13 No. 37 p. 25895-25903 2023/08/30 Research paper (scientific journal)
Selective electrochemical mechanical polishing of 4H–SiC surface employing porous material impregnated with electrolyte
Xiaozhe Yang, Xu Yang, Zhuangde Jiang, Kazuya Yamamura
Ceramics International Vol. 49 No. 22 p. 34569-34581 2023/08/09 Research paper (scientific journal)
Publisher: Elsevier BV
Slurryless electrochemical mechanical polishing of 4-inch 4H–SiC (0001) and (000–1) surfaces
Xu Yang, Xiaozhe Yang, Kazufumi Aoki, Kazuya Yamamura
Precision Engineering Vol. 83 p. 237-249 2023/06/06 Research paper (scientific journal)
Publisher: Elsevier BV
Highly efficient finishing of large-sized single crystal diamond substrates by combining nanosecond pulsed laser trimming and plasma-assisted polishing
Nian Liu, Kentaro Sugimoto, Naoya Yoshitaka, Hideaki Yamada, Rongyan Sun, Kenta Arima, Kazuya Yamamura
Ceramics International Vol. 49 No. 11 p. 19109-19123 2023/03/06 Research paper (scientific journal)
Publisher: Elsevier BV
Surface modification and adhesive-free adhesion of polytetrafluoroethylene (PTFE) and silicone gel containing oleophilic SiO2 powder by plasma treatment
E. Miyake, Y. Seto, M. Nishino, I. Komatsu, K. Endo, K. Yamamura, Y. Ohkubo
RSC Advances Vol. 13 No. 3 p. 1834-1841 2023/01/09 Research paper (scientific journal)
プラズマ援用研磨による大面積ダイヤモンド基板の高能率ダメージフリー研磨
山村和也
ニューダイヤモンド誌 Vol. 39 No. 1 p. 37-39 2023/01
スラリーレス電気化学機械研磨によるSiCのダメージフリー研磨
山村和也
表面技術誌 Vol. 73 No. 11 p. 523-527 2022/11
難研磨材料のスラリーレスプラズマ援用研磨と電気化学機械研磨
山村和也
精密工学会誌 Vol. 88 No. 6 p. 440-444 2022/06
Effects of polishing pressure and sliding speed on the material removal mechanism of single crystal diamond in plasma-assisted polishing
Nian Liu, Kentaro Sugimoto, Naoya Yoshitaka, Hideaki Yamada, Rongyan Sun, Kentaro Kawai, Kenta Arima, Kazuya Yamamura
Diamond and Related Materials Vol. 124 p. 108899-108899 2022/04 Research paper (scientific journal)
Publisher: Elsevier BV
Nanocarbon-Induced Etching Property of Semiconductor Surfaces: Testing Nanocarbon’s Catalytic Activity for Oxygen Reduction Reaction at a Single-Sheet Level
Ayumi Ogasawara, Kentaro Kawai, Kazuya Yamamura, Kenta Arima
ECS Journal of Solid State Science and Technology Vol. 11 No. 4 p. 041001-041001 2022/04/01 Research paper (scientific journal)
Publisher: The Electrochemical Society
Separation of Neighboring Terraces on a Flattened Si(111) Surface by Selective Etching along Step Edges Using Total Wet Chemical Processing
Zhida Ma, Seiya Masumoto, Kentaro Kawai, Kazuya Yamamura, Kenta Arima
Langmuir Vol. 38 No. 12 p. 3748-3754 2022/03/29 Research paper (scientific journal)
Publisher: American Chemical Society (ACS)
Charge Utilization Efficiency and Side Reactions in the Electrochemical Mechanical Polishing of 4H-SiC (0001)
Xiaozhe Yang, Xu Yang, Haiyang Gu, Kentaro Kawai, Kenta Arima, Kazuya Yamamura
Journal of The Electrochemical Society Vol. 169 No. 2 p. 023501-023501 2022/02/01 Research paper (scientific journal)
Publisher: The Electrochemical Society
Adhesive-free adhesion between plasma-treated glass-cloth-containing polytetrafluoroethylene (GC-PTFE) and stainless steel: Comparison between GC-PTFE and pure-PTFE
M. Nishino, Y. Okazaki, Y. Seto, T. Uehara, K. Endo, K. Yamamura, Y. Ohkubo
Polymers Vol. 14 No. 3 2022/01/20 Research paper (scientific journal)
プラズマを援用した大面積単結晶ダイヤモンド基板の高能率ダメージフリー研磨技術の開発
赤羽優子, 佐藤幸男, 菅原宏輝, 山村和也, 山田英明
精密工学会誌 Vol. 88 No. 2 p. 133-136 2022/01
Flexible selection of the functional-group ratio on a polytetrafluoroethylene (PTFE) surface using a single-gas plasma treatment
Yuji Ohkubo, Yuki Okazaki, Misa Nishino, Yosuke Seto, Katsuyoshi Endo, Kazuya Yamamura
RSC Advances Vol. 12 No. 48 p. 31246-31254 2022 Research paper (scientific journal)
Publisher: Royal Society of Chemistry (RSC)
Cross-sectional observation of a weak boundary layer in polytetrafluoroethylene (PTFE) using scanning electron microscope
Y. Seto, M. Nishino, Y. Okazaki, K. Endo, K. Yamamura, Y. Ohkubo
Polymer Journal Vol. 54 No. 1 p. pp.79-81 2022/01 Research paper (scientific journal)
Effects of He and Ar heat-assisted plasma treatments on the adhesion properties of polytetrafluoroethylene (PTFE)
Y. Ohkubo, Y. Okazaki, M. Shibahara, M. Nishino, Y. Seto, K. Endo, K. Yamamura
Polymers Vol. 13 No. 23 2021/12/09 Research paper (scientific journal)
Comparison of surface and subsurface damage of mosaic single-crystal diamond substrate processed by mechanical and plasma-assisted polishing
Nian Liu, Hideaki Yamada, Naoya Yoshitaka, Kentaro Sugimoto, Rongyan Sun, Kentaro Kawai, Kenta Arima, Kazuya Yamamura
Diamond and Related Materials Vol. 119 p. 108555-108555 2021/11 Research paper (scientific journal)
Publisher: Elsevier BV
Novel SiC wafer manufacturing process employing three-step slurryless electrochemical mechanical polishing
Xu Yang, Xiaozhe Yang, Kentaro Kawai, Kenta Arima, Kazuya Yamamura
Journal of Manufacturing Processes Vol. 70 p. 350-360 2021/10/01 Research paper (scientific journal)
Publisher: Elsevier Ltd
Selective Etching of Semiconductor Surfaces by Catalytic Activity of Nanocarbon
Ryo MIKURINO, Ayumi OGASAWARA, Kentaro KAWAI, Kazuya YAMAMURA, Kenta ARIMA
Vacuum and Surface Science Vol. 64 No. 8 p. 352-357 2021/08/10 Research paper (scientific journal)
Publisher: Surface Science Society Japan
Atomic-scale insights into the origin of rectangular lattice in nanographene probed by scanning tunneling microscopy
Junhuan Li, Shaoxian Li, Tomoki Higashi, Kentaro Kawai, Kouji Inagaki, Kazuya Yamamura, Kenta Arima
Physical Review B Vol. 103 No. 24 2021/06/24 Research paper (scientific journal)
Publisher: American Physical Society (APS)
Atomic-scale and damage-free polishing of single crystal diamond enhanced by atmospheric pressure inductively coupled plasma
Hu Luo, Khan Muhammad Ajmal, Wang Liu, Kazuya Yamamura, Hui Deng
Carbon Vol. 182 p. 175-184 2021/06/03 Research paper (scientific journal)
Publisher: Elsevier BV
Dominant factors and their action mechanisms on material removal rate in electrochemical mechanical polishing of 4H-SiC (0001) surface
Xiaozhe Yang, Xu Yang, Kentaro Kawai, Kenta Arima, Kazuya Yamamura
Applied Surface Science Vol. 562 p. 150130-150130 2021/05/17 Research paper (scientific journal)
Publisher: Elsevier BV
Novel highly-efficient and dress-free polishing technique with plasma-assisted surface modification and dressing
Rongyan Sun, Atsunori Nozoe, Junji Nagahashi, Kenta Arima, Kentaro Kawai, Kazuya Yamamura
Precision Engineering Vol. 72 p. 224-236 2021/05/09 Research paper (scientific journal)
Publisher: Elsevier BV
Polishing and planarization of single crystal diamonds: state-of-the-art and perspectives
Hu Luo, Khan Muhammad Ajmal, Wang Liu, Kazuya Yamamura, Hui Deng
International Journal of Extreme Manufacturing Vol. 3 No. 2 p. 022003-022003 2021/03/10 Research paper (scientific journal)
Publisher: IOP Publishing
Damage-free highly efficient plasma-assisted polishing of a 20-mm square large mosaic single crystal diamond substrate
N. Liu, K. Sugawara, N. Yoshitaka, H. Yamada, D. Takeuchi, Y. Akabane, K. Fujino, K. Kawai, K. Arima, Kazuya Yamamura
Scientific Reports Vol. 10 No. 1 2020/11/10 Research paper (scientific journal)
Publisher: Springer Science and Business Media LLC
熱アシストプラズマ処理の接着性向上効果に対する電極-試料（PTFE）間距離の影響
中川哲哉, 西野実沙, 遠藤勝義, 山村和也, 大久保雄司
日本接着学会誌 Vol. 56 p. 389-396 2020/10/01 Research paper (scientific journal)
Open-air-type Ar + H2O plasma treatment of polytetrafluoroethylene for improving Ag/PTFE adhesion strength: application to highly adhesive Ag direct wiring patterns
Y. Ohkubo, Y. Kodama, M. Nishino, T. Oshita, T. Uehara, K. Endo, K. Yamamura
Japanese Journal of Applied Physics Vol. 59 No. 7 p. 077004-077004 2020/06/30 Research paper (scientific journal)
Publisher: IOP Publishing
High-quality plasma-assisted polishing of aluminum nitride ceramic
R. Sun, X. Yang, K. Arima, K. Kawai, K. Yamamura
CIRP Annals Vol. 69 No. 1 p. 301-304 2020/05/20 Research paper (scientific journal)
Publisher: Elsevier BV
Catalytic Properties of Chemically Modified Graphene Sheets to Enhance Etching of Ge Surface in Water
Ryo Mikurino, Ayumi Ogasawara, Tomoki Hirano, Yuki Nakata, Hiroto Yamashita, Shaoxian Li, Kentaro Kawai, Kazuya Yamamura, Kenta Arima
The Journal of Physical Chemistry C Vol. 124 No. 11 p. 6121-6129 2020/03 Research paper (scientific journal)
Publisher: ACS Publications
Feasibility using ethanol-added argon instead of helium as the carrier gas used in atmospheric-pressure plasma chemical vaporization machining
Rongyan Sun, Keiichiro Watanabe, Shiro Miyazaki, Toru Fukano, Masanobu Kitada, Kentaro Kawai, Kenta Arima, Kazuya Yamamura
Proceedings of the 20th International Conference of the European Society for Precision Engineering and Nanotechnology, EUSPEN 2020 p. 159-160 2020 Research paper (international conference proceedings)
Publisher: euspenStrong Biomimetic Immobilization of Pt-Particle Catalyst on ABS Substrate Using Polydopamine and Its Application for Contact-Lens Cleaning with H2O2.
Yuji Ohkubo, Tomonori Aoki, Daisuke Kaibara, Satoshi Seino, Osamu Mori, Rie Sasaki, Katsuyoshi Endo, Kazuya Yamamura
Nanomaterials (Basel, Switzerland) Vol. 10 No. 1 2020/01 Research paper (scientific journal)
Obtaining Atomically Smooth 4H–SiC (0001) Surface by Controlling Balance Between Anodizing and Polishing in Electrochemical Mechanical Polishing
Xu Yang, Xiaozhe Yang, Rongyan Sun, Kentaro Kawai, Kenta Arima, Kazuya Yamamura
Nanomanufacturing and Metrology Vol. 2 No. 3 p. 140-147 2019/09 Research paper (scientific journal)
Publisher: Springer Science and Business Media LLC
Etching Characteristics of Quartz Crystal Wafers Using Argon-Based Atmospheric Pressure CF4 Plasma Stabilized by Ethanol Addition
Rongyan Sun, Xu Yang, Keiichiro Watanabe, Shiro Miyazaki, Toru Fukano, Masanobu Kitada, Kenta Arima, Kentaro Kawai, Kazuya Yamamura
Nanomanufacturing and Metrology Vol. 2 No. 3 p. 168-176 2019/09 Research paper (scientific journal)
Publisher: Springer Science and Business Media LLC
Highly efficient planarization of sliced 4H-SiC (0001) wafer by slurryless electrochemical mechanical polishing
Yang Xu, Yang Xiaozhe, Kawai Kentaro, Arima Kenta, Yamamura Kazuya
INTERNATIONAL JOURNAL OF MACHINE TOOLS & MANUFACTURE Vol. 144 2019/09
Improvements in graphene growth on 4H-SiC(0001) using plasma induced surface oxidation
Ouki Minami, Ryota Ito, Kohei Hosoo, Makoto Ochi, Yasuhisa Sano, Kentaro Kawai, Kazuya Yamamura, Kenta Arima
Journal of Applied Physics Vol. 126 No. 6 p. 065301 1-065301 10 2019/08 Research paper (scientific journal)
Influence of air contamination during heat-assisted plasma treatment on adhesion property of polytetrafluoroethylene (PTFE)
Y. Ohkubo, T. Nakagawa, K. Endo, K. Yamamura
RSC Advances Vol. 9 p. 22900-22906 2019/07 Research paper (scientific journal)
Fabrication of optics with a thin part by plasma chemical vaporization machining
Hideo Takino, Kazuya Yamamura, Yasuhisa Sano, Yuzo Mori
Freeform Optics - Proceedings Optical Design and Fabrication 2019 (Freeform, OFT) 2019/06/03 Research paper (international conference proceedings)
Publisher: Optical Society of America (OSA)
Rapid Assembly of DNA Origami in Microfluidic Temperature Gradient
Kentaro Kawai, Hara Keita, Ryota Nakamura, Kenta Arima, Kazuya Yamamura, Osamu Tabata
2019 20th International Conference on Solid-State Sensors, Actuators and Microsystems and Eurosensors XXXIII, TRANSDUCERS 2019 and EUROSENSORS XXXIII p. 398-401 2019/06 Research paper (international conference proceedings)
Improved Catalytic Durability of Pt-Particle/ABS for H₂O₂ Decomposition in Contact Lens Cleaning.
Yuji Ohkubo, Tomonori Aoki, Satoshi Seino, Osamu Mori, Issaku Ito, Katsuyoshi Endo, Kazuya Yamamura
Nanomaterials (Basel, Switzerland) Vol. 9 No. 3 2019/03 Research paper (scientific journal)
Freestanding graphene CVD growth on insulating substrate using ga catalyst
Tomoki Tsuji, Kenta Arima, Kazuya Yamamura, Kentaro Kawai
23rd International Conference on Miniaturized Systems for Chemistry and Life Sciences, MicroTAS 2019 p. 1194-1195 2019 Research paper (international conference proceedings)
Publisher: Chemical and Biological Microsystems SocietyFiguring of fused silica optical surface with thin parts by plasma chemical vaporization machining
Hideo Takino, Kazuya Yamamura, Yasuhisa Sano, Yuzo Mori
Proceedings of SPIE - The International Society for Optical Engineering Vol. 11168 2019 Research paper (international conference proceedings)
Publisher: SPIE
Absolute distance measurement of optical path length of non-contact three-dimensional nanoprofiler based on normal vector tracing method by tandem white-light interferometer
Jungmin Kang, Takao Kitayama, Ryo Kizaki, Yui Toyoshi, Kota Hashimoto, Agustinus Winarno, Kiyoshi Takamasu, Kazuya Yamamura, Katsuyoshi Endo
Proceedings of SPIE - The International Society for Optical Engineering Vol. 11056 2019 Research paper (international conference proceedings)
Fundamental Properties for Enhanced Etching of Ge Surfaces in Water Assisted by Single Sheets of Reduced Graphene Oxide
T. Hirano, Y. Nakata, H. Yamashita, S. Li, K. Kawai, K. Yamamura, K. Arima
Abstract Book & Schedule of PCSI-46 p. 88-88 2019/01
Publisher: American Vacuum SocietyAtomic-scale Observations of Reduced Graphene Oxide Nanosheets Dispersed on HOPG Substrates
Shaoxian Li, Tomoki Hirano, Kentaro Kawai, Kazuya Yamamura, Kenta Arima
Abstract Book & Schedule of PCSI-46 p. 69-69 2019/01
Publisher: American Vacuum SocietySurface Modification and Microstructuring of 4H-SiC(0001) by Anodic Oxidation with Sodium Chloride Aqueous Solution
Xu Yang, Rongyan Sun, Kentaro Kawai, Kenta Arima, Kazuya Yamamura
ACS Applied Materials & Interfaces Vol. 11 No. 2 p. 2535-2542 2019/01 Research paper (scientific journal)
Publisher: American Chemical Society (ACS)
Ultrasonic-assisted anodic oxidation of 4H-SiC (0001) surface
X. Yang, X. Yang, K. Kawai, K. Arima, K. Yamamura
Electrochemistry Communications 100 (2019) 1-5. Vol. 100 p. 1-5 2019/01 Research paper (scientific journal)
Adhesive-free adhesion between heat-assisted plasma-treated fluoropolymers (PTFE, PFA) and plasma-jet-treated polydimethylsiloxane (PDMS) and its application
Yuji Ohkubo, Katsuyoshi Endo, Kazuya Yamamura
Scientific Reports Vol. 8 No. 1 2018/12 Research paper (scientific journal)
Publisher: Springer Science and Business Media LLC
プラズマナノ製造プロセスによるセラミックスのダメージフリー加工
山村和也
トライボロジスト Vol. 63 No. 12 (2018. 12. 15) 806-811. Vol. 63 No. 12 p. 806-811 2018/12
Effect of Temperature Distribution in Microtube and Microfluidic Channel for DNA Origami Assembly
Keita Hara, Tatsuya Inagaki, Naoki Yamashita, Kenta Arima, Kazuya Yamamura, Osamu Tabata, Kentaro Kawai
2018/11 Research paper (other academic)
プラズマナノ製造プロセス
山村和也
メカニカルサーフェス・テック No. 046 p. 35-37 2018/10
反応性プラズマを援用したセラミックス材料のダメージフリー形状創成・仕上げ加工技術の開発
山村和也
粉体および粉末冶金 Vol. 65 No. 10 p. 654-658 2018/10
Comparison between adhesion properties of adhesive bonding and adhesive-free adhesion for heat-assisted plasma-treated polytetrafluoroethylene (PTFE)
Yuji Ohkubo, Masafumi Shibahara, Asahiro Nagatani, Koji Honda, Katsuyoshi Endo, Kazuya Yamamura
JOURNAL OF ADHESION Vol. 96 No. 8 p. 776-796 2018/09 Research paper (scientific journal)
プラズマCVMによる高精度ミラーの作製
山村和也
精密工学会誌 Vol. 84 No. 6 Vol. 84 No. 6 p. 507-510 2018/06
プラズマ援用研磨によるワイドギャップ半導体材料の超平滑仕上げ
山村和也
自動車技術 Vol. 72 No. 6 Vol. 72 No. 6 p. 42-47 2018/06
Application of plasma chemical vaporization machining for figuring of reaction-sintered silicon carbide
R. Sun, Y. Ohkubo, K. Endo, K. Yamamura
Proceedings of 18th International Conference of the European Society for Precision Engineering and Nanotechnology p. 391-392 2018/06 Research paper (international conference proceedings)
Damage-free highly efficient polishing of single-crystal diamond wafer by plasma-assisted polishing
K. Yamamura, K. Emori, R. Sun, Y. Ohkubo, K. Endo, H. Yamada, A. Chayahara, Y. Mokuno
CIRP Annals Vol. 67 p. 353-356 2018/05 Research paper (scientific journal)
Publisher: Elsevier USA
Nanopore Fabrication and DNA sensing on Two-Dimensional Materials using Helium Ion Microscopy
Kentaro Kawai, Takumi Hayashi, Kenta Arima, Kazuya Yamamura, Osamu Tabata
2018/04 Research paper (international conference proceedings)
Surface modification of fluoropolymer using open-air plasma treatment at atmospheric pressure with Ar, Ar + O2, and Ar + H2 for application in high-adhesion metal wiring patterns
Y. Kodama, Y. Ohkubo, T. Oshita, Y. Nakano, T. Uehara, T. Aoyama, K. Endo, K. Yamamura
表面技術 Vol. 69 No. 4 p. 152-162 2018/04 Research paper (scientific journal)
Investigation of anodic oxidation mechanism of 4H-SiC (0001) for electrochemical mechanical polishing
Xu Yang, Rongyan Sun, Yuji Ohkubo, Kentaro Kawai, Kenta Arima, Katsuyoshi Endo, Kazuya Yamamura
Electrochimica Acta Vol. 271 p. 666-676 2018/03 Research paper (scientific journal)
Publisher: Elsevier Ltd
Effect of rubber compounding agent on adhesion strength between rubber and heat-assisted plasma-treated polytetrafluoroethylene (PTFE)
Yuji Ohkubo, Masafumi Shibahara, Kento Ishihara, Asahiro Nagatani, Koji Honda, Katsuyoshi Endo, Kazuya Yamamura
JOURNAL OF ADHESION Vol. 95 No. 3 p. 242-257 2018/02 Research paper (scientific journal)
Adhesion property of heat-assisted plasma-treated polytetrafluoroethylene (PTFE) – Realization in extremely high adhesion of PTFE and other types of material –
Y. Ohkubo, M. Shibahara, A. Nagatani, K. Honda, K. Endo, K. Yamamura
2018/02
Optimization of Gas Composition Used in Plasma Chemical Vaporization Machining for Figuring of Reaction-Sintered Silicon Carbide with Low Surface Roughness
Rongyan Sun, Xu Yang, Yuji Ohkubo, Katsuyoshi Endo, Kazuya Yamamura
Scientific Reports Vol. 8 No. 1 2018/02 Research paper (scientific journal)
Publisher: Nature Publishing Group
Electrochemical mechanical polishing of 4H-SiC (0001) with different grinding stones
Xu Yang, Kentaro Kawai, Kenta Arima, Kazuya Yamamura
ISAAT 2018 - 21st International Symposium on Advances in Abrasive Technology 2018 Research paper (international conference proceedings)
Publisher: 21st International Symposium on Advances in Abrasive Technology, ISAAT 2018Preliminary study on figuring of reaction-sintered silicon carbide by plasma chemical vaporization machining
Rongyan Sun, Yuji Ohkubo, Kentaro Kawai, Kenta Arima, Kazuya Yamamura
Proceedings - 33rd ASPE Annual Meeting p. 335-338 2018 Research paper (international conference proceedings)
Publisher: American Society for Precision Engineering, ASPEAFM Observation of Initial Oxidation Stage of 4H-SiC (0001) in Electrochemical Mechanical Polishing
Xu Yang, Yuji Ohkubo, Katsuyoshi Endo, Kazuya Yamamura
Procedia CIRP Vol. 68 p. 735-740 2018 Research paper (international conference proceedings)
Publisher: Elsevier B.V.
Effect of addition of SiO2 particles to rubber on adhesion interface between the rubber and heat-assisted plasma-treated polytetrafluoroethylene
Shibahara Masafumi, Ohkubo Yuji, Nagatani Asahiro, Honda Koji, Endo Katsuyoshi, Yamamura Kazuya
Proceedings of JSPE Semestrial Meeting Vol. 2018 p. 710-710 2018
Publisher: The Japan Society for Precision Engineering
High accuracy cylindrical mirror measurement by three-dimensional nano-profiler based on the normal vector tracing method
Jungmin Kang, Hiroki Shiraji, Ryo Kizaki, Yui Toyoshi, Takao Kitayama, Kazuya Yamamura, Takashi Miyawaki, Katsuyoshi Endo
Proceedings - 33rd ASPE Annual Meeting p. 142-145 2018 Research paper (international conference proceedings)
Precision damage-free figuring of functional materials by plasma chemical vaporization machining
New glass Vol. 32 No. 3 p. 16-20 2017/11
Publisher:
Atomic-scale finishing of carbon face of single crystal SiC by combination of thermal oxidation pretreatment and slurry polishing
Hui Deng, Nian Liu, Katsuyoshi Endo, Kazuya Yamamura
Applied Surface Science Vol. 434 p. 40-48 2017/10 Research paper (scientific journal)
Publisher: Elsevier B.V.
Polishing of Tungsten Carbide by Combination of Anodizing and Silica Slurry Polishing
Hui Deng, Xinquan Zhang, Kui Liu, Kazuya Yamamura, Hirotaka Sato
JOURNAL OF THE ELECTROCHEMICAL SOCIETY Vol. 164 No. 12 p. E352-E359 2017/09 Research paper (scientific journal)
Damage-free finishing of SiC by plasma assisted polishing
Vol. 61 No. 8 p. 430-433 2017/08
Publisher:
Drastic Improvement in Adhesion Property of Polytetrafluoroethylene (PTFE) via Heat-Assisted Plasma Treatment Using a Heater
Yuji Ohkubo, Kento Ishihara, Masafumi Shibahara, Asahiro Nagatani, Koji Honda, Katsuyoshi Endo, Kazuya Yamamura
SCIENTIFIC REPORTS Vol. 7 2017/08 Research paper (scientific journal)
Radiolytic Synthesis of Pt-Particle/ABS Catalysts for H2O2 Decomposition in Contact Lens Cleaning
Yuji Ohkubo, Tomonori Aoki, Satoshi Seino, Osamu Mori, Issaku Ito, Katsuyoshi Endo, Kazuya Yamamura
NANOMATERIALS Vol. 7 No. 9 2017/08 Research paper (scientific journal)
プラズマ援用研磨によるSiCのダメージフリー仕上げ
山村和也
砥粒加工学会誌Vol.61 No. 8 430-433. Vol. 61 No. 8 p. 430-433 2017/08
High-accuracy three-dimensional aspheric mirror measurement with nanoprofiler based on normal vector tracing method
Ryota Kudo, Takao Kitayama, Yusuke Tokuta, Hiroki Shiraji, Motohiro Nakano, Kazuya Yamamura, Katsuyoshi Endo
OPTICS AND LASERS IN ENGINEERING Vol. 98 p. 159-162 2017/07 Research paper (scientific journal)
Improving the grindability of titanium alloy Ti–6Al–4V with the assistance of ultrasonic vibration and plasma electrolytic oxidation
S. Li, Y. Wu, K. Yamamura, M. Nomura, T. Fujii
CIRP Annals - Manufacturing Technology Vol. 64 No. 1 p. 345-348 2017/05 Research paper (scientific journal)
Publisher: Elsevier USA
電子線照射還元法によりABS樹脂上へ担持したPtナノ粒子触媒の耐久性向上
青木智紀, 大久保雄司, 清野智史, 小玉欣典, 中川哲哉, 原田朋実, 遠藤勝義, 森理, 伊藤一作, 山村和也
表面技術協会講演大会講演要旨集 Vol. 135th 2017/03 Research paper (other academic)
High rate abrasive-free polishing of single crystal diamond wafer by plasma assisted polishing
Ken Emori, Katsuyoshi Endo, Hideaki Yamada, Akiyoshi Chayahara, Yoshiaki Mokuno, Kazuya Yamamura
Proceedings of the 17th International Conference of the European Society for Precision Engineering and Nanotechnology, EUSPEN 2017 p. 163-164 2017 Research paper (international conference proceedings)
Publisher: euspenRemoval of subsurface damage of 4H-SiC wafer by plasma assisted polishing
Kentaro Tsujiuchi, Chika Kageyama, Katsuyoshi Endo, Kazuya Yamamura
Proceedings of the 17th International Conference of the European Society for Precision Engineering and Nanotechnology, EUSPEN 2017 p. 197-198 2017 Research paper (international conference proceedings)
Publisher: euspen非接触ナノ形状測定装置による非球面ミラーの形状測定
木崎 嶺, 白地 央樹, 北山 貴雄, 山村 和也, 遠藤 勝義
精密工学会学術講演会講演論文集 Vol. 2017 p. 95-96 2017
Publisher: 公益社団法人 精密工学会
Adhesive-free adhesion between polytetrafluoroethylene (PTFE) and isobutylene-isoprene rubber (IIR) via heat-assisted plasma treatment
Y. Ohkubo, K. Ishihara, H. Sato, M. Shibahara, A. Nagatani, K. Honda, K. Endo, K. Yamamura
RSC ADVANCES Vol. 7 No. 11 p. 6432-6438 2017/01 Research paper (scientific journal)
電子線照射還元法によるH2O2分解用Ptナノ粒子触媒の合成 -微粒子化剤添加の効果-
青木智紀, 大久保雄司, 清野智史, 小玉欣典, 中川哲哉, 原田朋実, 遠藤勝義, 森理, 伊藤一作, 山村和也
2016/11 Research paper (other academic)
Damage-free finishing of CVD-SiC by a combination of dry plasma etching and plasma-assisted polishing
Hui Deng, Katsuyoshi Endo, Kazuya Yamamura
INTERNATIONAL JOURNAL OF MACHINE TOOLS & MANUFACTURE Vol. 115 p. 38-46 2016/11 Research paper (scientific journal)
Preliminary study on atmospheric-pressure plasma-based chemical dry figuring and finishing of reaction-sintered silicon carbide
Xinmin Shen, Hui Deng, Xiaonan Zhang, Kang Peng, Kazuya Yamamura
OPTICAL ENGINEERING Vol. 55 No. 10 2016/10 Research paper (scientific journal)
Improvement in adhesion between polytetrafluoroethylene (PTFE) and electroless plated copper film using heat-assisted plasma treatment
Yuji OHKUBO, Kento ISHIHARA, Haruka SATO, Katsuyoshi ENDO, Kazuya YAMAMURA
Journal of The Surface Finishing Society of Japan Vol. 67 No. 10 p. 551-556 2016/10 Research paper (scientific journal)
Publisher: The Surface Finishing Society of Japan
電子線照射還元法によるABS樹脂基材上へのH2O2分解用触媒Ptナノ粒子の作製
青木智紀, 大久保雄司, 小玉欣典, 中川哲哉, 原田朋実, 遠藤勝義, 清野智史, 森理, 伊藤一作, 山村和也
表面技術協会講演大会講演要旨集 Vol. 134th 2016/09 Research paper (other academic)
Surface modification of polytetrafluoroethylene (PTFE) by heat-assisted atmospheric pressure plasma treatment for improving adhesion of PTFE to isobutylene-isoprene rubber (IIR)
Y. Ohkubo, K. Ishihara, M. Shibahara, A. Nagatani, K. Honda, T. Aoki, Y. Kodama, K. Enod, K. Yamamura
2016/09 Research paper (other academic)
Measurement of aspheric mirror by nanoprofiler using normal vector tracing
Takao Kitayama, Hiroki Shiraji, Kazuya Yamamura, Katsuyoshi Endo
Advances in Metrology for X-Ray and EUV Optics VI Vol. 9962 2016/08 Research paper (international conference proceedings)
電子線照射還元法によるPtナノ粒子触媒のABS樹脂上への固定化 ―エッチング処理と表面電荷調整処理による表面改質効果の調査―
青木智紀, 大久保雄司, 小玉欣典, 中川哲哉, 原田朋実, 遠藤勝義, 山村和也, 清野智史, 森理, 伊藤一作
精密工学会関西地方定期学術講演会講演論文集 Vol. 2016 2016/07 Research paper (other academic)
Highly-efficient slurryless finishing of GaN by plasma-assisted polishing using a resin bonded grinding stone
C. Kageyama, H. Deng, K. Endo, K. Yamamura
Proceedings of 16th International Conference of the European Society for Precision Engineering and Nanotechnology 2016/05 Research paper (international conference proceedings)
Electrochemical mechanical polishing of difficult-to-machine mold materials
K. Yamamura, Y. Imanishi, K. Endo
Proceedings of 16th International Conference of the European Society for Precision Engineering and Nanotechnology 2016/05 Research paper (scientific journal)
Planarization of CVD grown single crystal diamond wafer by numerically controlled plasma chemical vaporization machining
H. Dojo, K. Endo, H. Yamada, A. Chayahara, Y. Mokuno, K. Yamamura
Proceedings of 16th International Conference of the European Society for Precision Engineering and Nanotechnology 2016/05 Research paper (international conference proceedings)
3D surface measurement of spherical mirror by nanoprofiler using normal vector tracing method
H. Shiraji, Y. Tokuta, T. Kitayama, M. Nakano, R. Kudo, K. Yamamura, K. Endo
Proceedings of International Conference on X-ray Optics, Detectors, Sources, and their Applications 2016 p. 37-38 2016/05 Research paper (international conference proceedings)
Comparative analysis on surface property in anodic oxidation polishing of reaction-sintered silicon carbide and single-crystal 4H silicon carbide
Xinmin Shen, Qunzhang Tu, Hui Deng, Guoliang Jiang, Xiaohui He, Bin Liu, Kazuya Yamamura
Applied Physics A: Materials Science and Processing Vol. 122 No. 4 2016/04/01 Research paper (scientific journal)
Publisher: Springer Verlag
High-spatial Resolution Figuring by Pulse Width Modulation Controlled Plasma Chemical Vaporization Machining
Kazuya Yamamura, Yoshiki Takeda, Shogo Sakaiya, Daisuke Funato, Katsuyoshi Endo
18TH CIRP CONFERENCE ON ELECTRO PHYSICAL AND CHEMICAL MACHINING (ISEM XVIII) Vol. 42 p. 508-511 2016/03 Research paper (international conference proceedings)
Oxidation Characteristic and Machining Performance of Reaction-Sintered Silicon Carbide Ceramic in Anodically Oxidation-Assisted Polishing
Guoliang Jiang, Xinmin Shen, Jian Tang, Xiaonan Zhang, Xiangpo Zhang, Kazuya Yamamura
INTERNATIONAL JOURNAL OF ELECTROCHEMICAL SCIENCE Vol. 11 No. 2 p. 1512-1529 2016/02 Research paper (scientific journal)
大気圧プラズマプロセスをベースとした単結晶ダイヤモンド基板の高能率ダメージフリー平坦化・平滑化（第7報）
道上 久也, 遠藤 勝義, 山田 英明, 茶谷原 昭義, 杢野 由明, 山村 和也
精密工学会学術講演会講演論文集 Vol. 2016 p. 851-852 2016
Publisher: 公益社団法人 精密工学会
数値制御プラズマCVMにおける高精度・高能率化に関する研究（第1報）
境谷 省吾, 舩戸 大輔, 遠藤 勝義, 山村 和也
精密工学会学術講演会講演論文集 Vol. 2016 p. 927-928 2016
Publisher: 公益社団法人 精密工学会
プラズマ援用研磨法の開発（第16報）
蔭山 千華, トウ 輝, 遠藤 勝義, 山村 和也
精密工学会学術講演会講演論文集 Vol. 2016 p. 849-850 2016
Publisher: 公益社団法人 精密工学会
Error reduction by iterative calculation for nanoprofiler using normal vector tracing method
Kudo Ryota, Kitayama Takao, Tokuta Yusuke, Shiraji Hiroki, Nakano Motohiro, Yamamura Kazuya, Endo Katsuyoshi
Proceedings of JSPE Semestrial Meeting Vol. 2016 p. 187-188 2016
Publisher: The Japan Society for Precision Engineering
Research on optimal process parameters in thermally oxidation-assisted polishing of reaction-sintered silicon carbide
Xinmin Shen, Kazuya Yamamura, Xiaonan Zhang, Xiangpo Zhang, Dong Wang, Kang Peng
Proceedings of SPIE - The International Society for Optical Engineering Vol. 9683 2016 Research paper (international conference proceedings)
Publisher: SPIE
Innovative technique for bonding fluoropolymers and different materials using atmospheric pressure plasma
Yuji Ohkubo, Kazuya Yamamura
Journal of Japan Institute of Electronics Packaging Vol. 19 No. 2 p. 127-131 2016 Research paper (scientific journal)
Publisher: Japan Institute of Electronics Packaging
Study on removal mechanism of sapphire in plasma assisted polishing
C. Kageyama, K. Monna, H. Deng, K. Endo, K. Yamamura
Advanced Materials Research 1136 (2016) 317-320. Vol. 1136 p. 317-320 2016/01 Research paper (international conference proceedings)
電子線照射還元法によるABS樹脂基板上へのPtナノ粒子担持
青木智紀, 大久保雄司, 清野智史, 石原健人, 小玉欣典, 遠藤勝義, 山村和也
2015/11 Research paper (other academic)
Efficient processing of reaction-sintered silicon carbide by anodically oxidation-assisted polishing
Qunzhang Tu, Xinmin Shen, Jianzhao Zhou, Xiaohui He, Kazuya Yamamura
OPTICAL ENGINEERING Vol. 54 No. 10 2015/10 Research paper (scientific journal)
Neutron focusing by a Kirkpatrick-Baez type super-mirror
D. Yamazaki, M. Nagano, R. Maruyama, H. Hayashoda, K. Soyama, K. Yamamura
JPS Conf. Proc. 8 (2015) 051009-1_6. 2015/09 Research paper (international conference proceedings)
Atomic-scale and pit-free flattening of GaN by combination of plasma pretreatment and time-controlled chemical mechanical polishing
Hui Deng, Katsuyoshi Endo, Kazuya Yamamura
APPLIED PHYSICS LETTERS Vol. 107 No. 5 p. 051602-1-051602-4 2015/08 Research paper (scientific journal)
Simulation-based systematic error compensation for nanoprofiler using normal vector tracing method
Ryota Kudo, Kenya Okita, Kohei Okuda, Yusuke Tokuta, Motohiro Nakano, Kazuya Yamamura, Katsuyoshi Endo
MEASUREMENT Vol. 73 p. 473-479 2015/06 Research paper (scientific journal)
PTFEの用途を拡大する革新的な表面処理技術
大久保雄司, 山村和也
加工技術 Vol. 50 No. 6 p. 316-322 2015/06
Publisher: 株式会社 繊維社
Polishing characteristics of CVD-SiC in plasma-assisted polishing
H. Deng, K. Endo, K. Yamamura
Proceedings of 15th International Conference of the European Society for Precision Engineering and Nanotechnology 2015/06 Research paper (international conference proceedings)
Mechanism analysis on finishing of reaction-sintered silicon carbide by combination of water vapor plasma oxidation and ceria slurry polishing
Xinmin Shen, Qunzhang Tu, Hui Deng, Guoliang Jiang, Kazuya Yamamura
OPTICAL ENGINEERING Vol. 54 No. 5 2015/05 Research paper (scientific journal)
Competition between surface modification and abrasive polishing: a method of controlling the surface atomic structure of 4H-SiC (0001)
Hui Deng, Katsuyoshi Endo, Kazuya Yamamura
SCIENTIFIC REPORTS Vol. 5 2015/03 Research paper (scientific journal)
Self-calibration for optical path length of 3D nanoprofiler considering random error
Ryota Kudo, Kohei Okuda, Kenya Okita, Yusuke Tokuta, Shun Nakatani, Motohiro Nakano, Kazuya Yamamura, Katsuyoshi Endo
XXI IMEKO World Congress "Measurement in Research and Industry" 2015 Research paper (international conference proceedings)
Publisher: IMEKO-International Measurement Federation SecretariatFlattening of single crystal SiC by combination of anodic oxidation and soft abrasive polishing
Hui Deng, Kenji Hosoya, Yusuke Imanishi, Katsuyoshi Endo, Kazuya Yamamura
Proceedings of the 15th International Conference of the European Society for Precision Engineering and Nanotechnology, EUSPEN 2015 p. 365-366 2015 Research paper (international conference proceedings)
Publisher: euspenプラズマ援用研磨法の開発（第15報）
蔭山 千華, 門奈 剛毅, 田畑 雄壮, とう 輝, 遠藤 勝義, 山村 和也
精密工学会学術講演会講演論文集 Vol. 2015 p. 377-378 2015
Publisher: 公益社団法人 精密工学会
ナノ形状測定法におけるマルチステップ自律校正法による光路長の推定
白地 央樹, 徳田 有亮, 工藤 良太, 中野 元博, 山村 和也, 遠藤 勝義
精密工学会学術講演会講演論文集 Vol. 2015 p. 309-310 2015
Publisher: 公益社団法人 精密工学会
プラズマ援用研磨法の開発（第14報）
とう 輝, 遠藤 勝義, 山村 和也
精密工学会学術講演会講演論文集 Vol. 2015 p. 479-480 2015
Publisher: 公益社団法人 精密工学会
High Efficient Damage-free Planarization and Smoothing of Single Crystal Diamond Utilizing Atmospheric Pressure Plasma Process (6th report)
Dojo Hisaya, Tabata Takaaki, Deng Hui, Endo Katsuyoshi, Yamamura Kazuya, Yamada Hideaki, Chayahara Akiyoshi, Mokuno Yoshiaki
Proceedings of JSPE Semestrial Meeting Vol. 2015 p. 481-482 2015
Publisher: The Japan Society for Precision Engineering
大気開放型プラズマCVMにおける高精度・高能率化に関する研究（第5報）
境谷 省吾, 竹田 善紀, 船戸 大輔, 遠藤 勝義, 山村 和也
精密工学会学術講演会講演論文集 Vol. 2015 p. 547-548 2015
Publisher: 公益社団法人 精密工学会
Characteristics investigation of shape deriving algorithm for nanoprofiler using normal vector tracing method
Kudo Ryota, Okita Kenya, Okuda Kohei, Kitayama Takao, Tokuta Yusuke, Nakatani Shun, Nakano Motohiro, Yamamura Kazuya, Endo Katsuyoshi
Proceedings of JSPE Semestrial Meeting Vol. 2015 p. 635-636 2015
Publisher: The Japan Society for Precision Engineering
The form measurement of an aspherical mirror by High-speed Nanoprofiler
Tokuta Yusuke, Kitayama Takao, Okita Kenya, Okuda Kohei, Nakano Motohiro, Nakatani Shun, Yamamura Kazuya, Kudo Ryota, Endo Katsuyoshi
Proceedings of JSPE Semestrial Meeting Vol. 2015 p. 633-634 2015
Publisher: The Japan Society for Precision Engineering
Surface modification and surface hardening of polytetrafluoroethylene through heat-assisted plasma treatment
Ohkubo Yuji, Sato Haruka, Ishihara Kento, Aoki Tomonori, Endo Katsuyoshi, Yamamura Kazuya
Proceedings of JSPE Semestrial Meeting Vol. 2015 p. 1097-1098 2015
Publisher: The Japan Society for Precision Engineering
High Efficient Damage-free Planarization and Smoothing of Single Crystal Diamond Utilizing Atmospheric Pressure Plasma Process (5th report)
Tabata Takaaki, Dojo Hisaya, Endo Katsuyoshi, Yamada Hideaki, Chayahara Akiyoshi, Mokuno Yoshiaki, Yamamura Kazuya
Proceedings of JSPE Semestrial Meeting Vol. 2015 p. 1009-1010 2015
Publisher: The Japan Society for Precision Engineering
電気化学機械研磨による金型用SiC材の高能率・ダメージフリー研磨（第1報）
今西 勇介, 遠藤 勝義, 山村 和也
精密工学会学術講演会講演論文集 Vol. 2015 p. 1011-1012 2015
Publisher: 公益社団法人 精密工学会
Development of plasma assisted polishing (13th report)
Deng Hui, Endo Katsuyoshi, Yamamura Kazuya
Proceedings of JSPE Semestrial Meeting Vol. 2015 p. 1007-1008 2015
Publisher: The Japan Society for Precision Engineering
Development of plasma assisted polishing (12th report)
Deng Hui, Imanishi Yusuke, Endo Katsuyoshi, Yamamura Kazuya
Proceedings of JSPE Semestrial Meeting Vol. 2015 p. 1005-1006 2015
Publisher: The Japan Society for Precision Engineering
High-efficient damage-free polishing of 4H-SiC by electrochemical mechanical polishing (1st report)
Yamamura Kazuya, Hosoya Kenji, Deng Hui, Imanishi Yusuke, Endo Katsuyoshi
Proceedings of JSPE Semestrial Meeting Vol. 2015 p. 1003-1004 2015
Publisher: The Japan Society for Precision Engineering
Plasma-based nanomanufacturing under atmospheric pressure
Kazuya Yamamura, Yasuhisa Sano
HandBook of Manufacturing Engineering and Technology p. 1529-1547 2015/01/01 Part of collection (book)
Publisher: Springer-Verlag London Ltd
The measurement of an aspherical mirror by three-dimensional Nanoprofiler
Yusuke Tokuta, Kenya Okita, Kohei Okuda, Takao Kitayama, Motohiro Nakano, Shun Nakatani, Ryota Kudo, Kazuya Yamamura, Katsuyoshi Endo
OPTICAL SYSTEMS DESIGN 2015: OPTICAL FABRICATION, TESTING, AND METROLOGY V Vol. 9628 2015 Research paper (international conference proceedings)
Systematic error analysis for 3D nanoprofiler tracing normal vector
Ryota Kudo, Yusuke Tokuta, Motohiro Nakano, Kazuya Yamamura, Katsuyoshi Endo
OPTIFAB 2015 Vol. 9633 2015 Research paper (international conference proceedings)
Plasma-assisted polishing of gallium nitride to obtain a pit-free and atomically flat surface
H. Deng, K. Endo, K. Yamamura
CIRP ANNALS-MANUFACTURING TECHNOLOGY Vol. 64 No. 1 p. 531-534 2015 Research paper (scientific journal)
Electro-chemical mechanical polishing of single-crystal SiC using CeO2 slurry
Hui Deng, Kenji Hosoya, Yusuke Imanishi, Katsuyoshi Endo, Kazuya Yamamura
ELECTROCHEMISTRY COMMUNICATIONS Vol. 52 p. 5-8 2015/01 Research paper (scientific journal)
Flattening of 4H-SiC by combination of oxidation and abrasive polishing
H. Deng, K. Endo, K. Yamamura
Proceedings of 15th International Conference of the European Society for Precision Engineering and Nanotechnology 2014/10 Research paper (international conference proceedings)
Ultra-precision deterministic figuring by pulse width modulation controlled plasma jet figuring
K. Yamamura, K. Hosoya, Y. Imanishi, H. Deng, K. Endo
2014/10
Formation of highly adhesive polytetrafluoroethylene/isobtylene-isoprene rubber interface by atmospheric-pressure plasma irradiation
K. Ishihara, H. Sato, Y. Ohkubo, M. Shibahara, A. Nagatani, K. Honda, K. Endo, K. Yamamura
5th World Congress on Adhesion and Related Phenomena (WCARP-V) (2014) 122. 2014/09
Highly efficient planarization of CVD-grown single-crystal diamond substrate by atmospheric-pressure microwave plasma jet figuring
K. Yamamura, S. Makiyama, T. Tabata, H. Yamada, A. Cyayahara, Y. Mokuno, S. Shikata, K. Endo
2014/09
Surface modification of PTFE for a high adhesive Ag layer by open-air type plasma treatment with graft copolymerization
H. Sato, K. Ishihara, Y. Ohkubo, K. Endo, K. Yamamura
2014/09 Research paper (international conference proceedings)
Preliminary study on highly efficient polishing of 4H-SiC by utilization of anodic oxidation
Kazuya Yamamura, Kenji Hosoya, Yusuke Imanishi, Hui Deng, Katsuyoshi Endo
Advanced Materials Research Vol. 1017 p. 509-514 2014/08 Research paper (international conference proceedings)
Publisher: Trans Tech Publications Ltd
Improvement of spatial resolution in figuring using Open-Air Type Plasma Chemical Vaporization Machining with Pulse Width Modulation Control
Y. Takeda, Y. Hata, J. Ito, K. Endo, K. Yamamura
2014/07 Research paper (international conference proceedings)
Effect of plasma irradiation in removal rate of single crystal diamond in plasma assisted polishing with quartz glass tool
T. Tabata, K. Monna, Y. Yamamoto, S. Makiyama, H. Deng, K. Endo, H. Yamada, A. Chayahara, Y. Mokuno, S. Shikata, K. Yamamura
2014/07 Research paper (international conference proceedings)
Dependency of OH emission intensity in material removal rate of sapphire substrates in plasma assisted polishing
K. Monna, H. Deng, T. Tabata, K. Endo, K. Yamamura
2014/07 Research paper (international conference proceedings)
Two-stage precision figuring process applying numerically controlled electrochemical machining with suction type electrode
N. Mitsushima, M. Ouchi, K. Endo, K. Yamamura
2014/07 Research paper (international conference proceedings)
Investigation of the anodic oxide layer/SiC interface morphology during anodic oxidation assisted polishing
K. Hosoya, Y. Imanishi, K. Endo, K. Yamamura
2014/07 Research paper (international conference proceedings)
Surface modification of GaN by irradiation of atmospheric pressure plasma for damage-free polishing
H. Deng, K. Endo, K Yamamura
2014/07 Research paper (international conference proceedings)
Ultra-precision Fabrication Process for Neutron Focusing Device
K. Yamamura, N. Mitsushima, Y. Goto, K. Endo, D. Yamazaki, R. Maruyama, H. Hayashida, K. Soyama
2014/07
Optimization of the plasma oxidation and abrasive polishing processes in plasma-assisted polishing for highly effective planarization of 4H-SiC
H. Deng, K. Monna, T. Tabata, K. Endo, K. Yamamura
CIRP ANNALS-MANUFACTURING TECHNOLOGY Vol. 63 No. 1 p. 529-532 2014/06 Research paper (scientific journal)
Systematic error analysis of nanoprofiler using normal vector tracing method based on numerical simulation
Ryota Kudo, Kohei Okuda, Kenya Okita, Yusuke Tokuta, Motohiro Nakano, Kazuya Yamamura, Kaysuyoshi Endo
Proceedings - ASPE/ASPEN Summer Topical Meeting: Manufacture and Metrology of Freeform and Off-Axis Aspheric Surfaces p. 126-131 2014/06 Research paper (international conference proceedings)
Measurement of high accurate mirror using nanoprofiler with self-calibratable rotary encoder
K. Okita, T. Kojima, K. Usuki, K. Okuda, Y. Tokuta, M. Nakano, R. Kudo, K. Yamamura, T. Watanabe, K. Endo
2014/06 Research paper (international conference proceedings)
Flatness correction of quartz glass substrate by plasma jet figuring with pulse width modulation control
K. Yamamura, Y. Takeda, Y. Hata, J. Ito, K. Endo
2014/05 Research paper (international conference proceedings)
Polishing characteristics of single crystal SiC assisted by plasma oxidation using different kinds of abrasives
H. Deng, K. Endo, K. Yamamura
2014/05 Research paper (international conference proceedings)
プラズマプロセスを援用した高密着性ポリテトラフルオロエチレン/エポキシ樹脂/SUS304界面形成技術
是津信行, 山村和也, 井筒祐志, 我田元, 大石修治, 手島勝弥
表面技術 Vol. 65 No. 5 p. 227-233 2014/05 Research paper (scientific journal)
Characterization of 4H-SiC (0001) surface processed by plasma-assisted polishing
Hui Deng, Masaki Ueda, Kazuya Yamamura
INTERNATIONAL JOURNAL OF ADVANCED MANUFACTURING TECHNOLOGY Vol. 72 No. 1-4 p. 1-7 2014/05 Research paper (scientific journal)
Damage-free and atomically-flat finishing of single crystal SiC by combination of oxidation and soft abrasive polishing
Hui Deng, Katsuyoshi Endo, Kazuya Yamamura
2ND CIRP CONFERENCE ON SURFACE INTEGRITY (CSI) Vol. 13 p. 203-207 2014/05 Research paper (international conference proceedings)
Three-dimensional surface figure measurement of high-accuracy spherical mirror with nanoprofiler using normal vector tracing method
R. Kudo, K. Okuda, K. Usuki, M. Nakano, K. Yamamura, K. Endo
REVIEW OF SCIENTIFIC INSTRUMENTS Vol. 85 No. 4 2014/04 Research paper (scientific journal)
Comparison of thermal oxidation and plasma oxidation of 4H-SiC (0001) for surface flattening
Hui Deng, Katsuyoshi Endo, Kazuya Yamamura
APPLIED PHYSICS LETTERS Vol. 104 No. 10 2014/03 Research paper (scientific journal)
Evaluation of the MRR control performance of PCVM with the application of the PWM control
Y. Takeda, Y. Hata, J. Ito, K. Endo, K. Yamamura
2014/02
Optimization of water content in process gas for high MRR of single crystal diamond in plasma assisted polishing
T. Tabata, K. Monna, Y. Yamamoto, S. Makiyama, H. Deng
2014/02
Development of two-stage figuring process applying numerically controlled electrochemical machining for fabricating neutron focusing mirror substrate
N. Mitsushima, M. Ouchi, K. Endo, K. Yamamura
2014/02
Effects of water concentration and gas species on OH radical emission intensity in plasma assisted polishing
K. Monna, H. Deng, T. Tabata, K. Endo, K. Yamamura
2014/02
XTEM observation of the anodic oxide layer/SiC interface morphology during anodic oxidation assisted polishing
K. Hosoya, Y. Imanishi, K. Endo, K. Yamamura
2014/02
Nanoindentation studies on the mechanical properties of silicon face and carbon face of 4H-SiC
H. Deng, K.Endo, K. Yamamura
2014/02
Profile measurement of aspheric mirror using High-Speed Nanoprofiler
K. Okuda, K. Usuki, T. Kitayama, T. Kojima, K. Okita, R. Tokura, M. Nakano, R. Kudo, K. Yamamura, K. Endo
2014/02
Development of Precisely Controlled Metallodielectric Plasmonic Nanoshell Arrays with Nanogap for Sensitive Detection of Molecular Adsorption Based on NIR responsive LSPR
S. Uchida, N. Zettsu, K. Endo, K. Yamamura
2014/02
Observation of the spatial distribution of gravitationally bound quantum states of ultracold neutrons and its derivation using the Wigner function
G. Ichikawa, S. Komamiya, Y. Kamiya, Y. Minami, M. Tani, P. Geltenbort, K. Yamamura, M. Nagano, T. Sanuki, S. Kawasaki, M. Hino, M. Kitaguchi
Physical Review Letters Vol. 112 No. 7 2014/02 Research paper (scientific journal)
Dicing of SiC wafer by atmospheric-pressure plasma etching process with slit mask for plasma confinement
Y. Sano, H. Nishikawa, Y. Okada, K. Yamamura, S. Matsuyama, K. Yamauchi
Materials Science Forum Vol. 778-780 p. 759-762 2014/02 Research paper (scientific journal)
Thinning of a two-inch silicon carbide wafer by plasma chemical vaporization machining using a slit electrode
Y. Okada, H. Nishikawa, Y. Sano, K. Yamamura, K. Yamauchi
Materials Science Forum Vol. 778-780 p. 750-753 2014/02 Research paper (scientific journal)
Open-air type plasma chemical vaporization machining by applying pulse-width modulation control
Yoshiki Takeda, Yuki Hata, Katsuyoshi Endo, Kazuya Yamamura
JOURNAL OF PHYSICS D-APPLIED PHYSICS Vol. 47 No. 11 2014/02 Research paper (scientific journal)
Study on Controlling Mechanism of Step-Terrace Structure in CeO2 Slurry Polishing of 4H-SiC
Hui Deng, Katsuyoshi Endo, Kazuya Yamamura
2014 INTERNATIONAL CONFERENCE ON PLANARIZATION/CMP TECHNOLOGY (ICPT) p. 147-148 2014 Research paper (international conference proceedings)
A new optical head tracing reflected light for nanoprofiler
K. Okuda, K. Okita, Y. Tokuta, T. Kitayama, M. Nakano, R. Kudo, K. Yamamura, K. Endo
ADVANCES IN METROLOGY FOR X-RAY AND EUV OPTICS V Vol. 9206 2014 Research paper (international conference proceedings)
Development and demonstration of a multi-channel spheroidal focusing device for neutron beams
H. Hayashida, K. Soyama, D. Yamazaki, R. Maruyama, K. Yamamura
INTERNATIONAL WORKSHOP ON NEUTRON OPTICS AND DETECTORS (NOP&D 2013) Vol. 528 No. 1 2014 Research paper (international conference proceedings)
Material removal rate control in open-air type plasma chemical vaporization machining by pulse width modulation of applied power
Yoshiki Takeda, Yuki Hata, Katsuyoshi Endo, Kazuya Yamamura
Key Engineering Materials Vol. 625 p. 593-596 2013/11 Research paper (international conference proceedings)
Publisher: Trans Tech Publications Ltd
Figuring and finishing of reaction-sintered SiC by anodic oxidation assisted process
Naoki Shimozono, Xinmin Shen, Hui Deng, Katsuyoshi Endo, Kazuya Yamamura
Key Engineering Materials Vol. 625 p. 570-575 2013/11 Research paper (international conference proceedings)
Publisher: Trans Tech Publications Ltd
Investigation of removal mechanism of sapphire in plasma assisted polishing
Kohki Monna, Hui Deng, Katsuyoshi Endo, Kazuya Yamamura
Key Engineering Materials Vol. 625 p. 458-462 2013/11 Research paper (international conference proceedings)
Publisher: Trans Tech Publications Ltd
Finishing of 4H-SiC (0001) by combination of thermal oxidation and abrasive polishing
Hui Deng, Katsuyoshi Endo, Kazuya Yamamura
Key Engineering Materials Vol. 625 p. 192-195 2013/11 Research paper (international conference proceedings)
Publisher: Trans Tech Publications Ltd
Comparative analysis of oxidation methods of reaction-sintered silicon carbide for optimization of oxidation-assisted polishing
Xinmin Shen, Yifan Dai, Hui Deng, Chaoliang Guan, Kazuya Yamamura
OPTICS EXPRESS Vol. 21 No. 22 p. 26123-26135 2013/10 Research paper (scientific journal)
数値制御ローカルウエットエッチングによる中性子集束用楕円面ミラー基盤の創成
山村和也
精密工学会誌 79 (2013) 813-817. 2013/09
Atomic-scale planarization of 4H-SiC (0001) by combination of thermal oxidation and abrasive polishing
Hui Deng, Katsuyoshi Endo, Kazuya Yamamura
APPLIED PHYSICS LETTERS Vol. 103 No. 11 2013/09 Research paper (scientific journal)
Experimental studies on water vapor plasma oxidation and thermal oxidation of 4H-SiC (0001) for clarification of the atomic-scale flattening mechanism in plasma assisted polishing
Hui Deng, Katsuyoshi Endo, Kazuya Yamamura
SILICON CARBIDE AND RELATED MATERIALS 2013, PTS 1 AND 2 Vol. 778-780 p. 587-590 2013/09 Research paper (international conference proceedings)
Highly Adhesive Copper Pattern on PTFE by Plasma Irradiation through Inkjet Printing
H. Sato, K. Ooka, K. Endo, K. Yamamura
2013/08
Development of focusing supermirors by means of ultra-precise surface figuring and ion beam sputtering
D. Yamazaki, H. Hayashida, R. Maruyama, Y. Kasugai, K. Soyama, M. Nagano, T. Tabata, N. Mitsushima, K. Yamamura
2013/07
Development of a multi-channel ellipsoidal cylindrical focusing mirror
H. Hayashida, D. Yamazaki, R. Maruyama, K. Soyama, K. Yamamura
2013/07
Focusing supermirrors with precisely figured elliptic surfaces
D. Yamazaki, H. Hayashida, R. Maruyama, T. Shinohara, K. Soyama, M. Nagano, N. Mitsushima, K. Yamamura
2013/07
大気圧プラズマ化学液相堆積法によるPTFE シート上への高密着性無電解銅めっき層の形成
是津信行, 秋山弘貴, 山村和也, 大石修治, 手嶋勝弥
Journal of Flux Growth Vol. 8 No. 1 2013/07
Fundamental research on the label-free detection of protein adsorption using near-infrared light-responsive plasmonic metal nanoshell arrays with controlled nanogap
Shuhei Uchida, Nobuyuki Zettsu, Katsuyoshi Endo, Kazuya Yamamura
Nanoscale Research Letters Vol. 8 No. 1 2013/06 Research paper (scientific journal)
Atomic-scale flattening mechanism of 4H-SiC (0001) in plasma assisted polishing
H. Deng, K. Yamamura
CIRP ANNALS-MANUFACTURING TECHNOLOGY Vol. 62 No. 1 p. 575-578 2013/06 Research paper (scientific journal)
Ultrasmooth reaction-sintered silicon carbide surface resulting from combination of thermal oxidation and ceria slurry polishing
Xinmin Shen, Yifan Dai, Hui Deng, Chaoliang Guan, Kazuya Yamamura
OPTICS EXPRESS Vol. 21 No. 12 p. 14780-14788 2013/06 Research paper (scientific journal)
Label-free detection of biotin-streptavidin binding pair by using the near infra-red light responsible plasmonic nanostructures array with controlled nanogap
S. Uchida, N. Zettsu, K. Yamamura
2013/05
Study on oxidation processes of 4H-SiC (0001) for investigation of the atomically flattening mechanism in plasma assisted polishing
H. Deng, K. Yamamura
2013/05 Research paper (international conference proceedings)
Preliminary Study on Plasma Assisted Polishing of Sapphire
K. Yamamura, S. Morinaga, K. Monna, H. Deng, K. Endo
Proc. The 9th CJUMP and 7th UPET (2013) 54-58. 2013/03 Research paper (international conference proceedings)
Investigation of Thermally Oxidized SiO2/4H-SiC (0001) Interface for Surface Flattening
H. Deng, K. Endo, K. Yamamura
Proc. The 9th CJUMP and 7th UPET (2013) 65-69. 2013/03 Research paper (international conference proceedings)
Subsurface atomic structure of 4H-SiC (0001) finished by plasma-assisted polishing
Hui Deng, Kazuya Yamamura
SILICON CARBIDE AND RELATED MATERIALS 2012 Vol. 740-742 p. 435-438 2013/02 Research paper (scientific journal)
プラズマ援用研磨法の開発（第８報）:サファイア基板へのプラズマ援用研磨適用に関する基礎検討
門奈 剛毅, トウ 輝, 田畑 雄壮, 遠藤 勝義, 山村 和也
精密工学会学術講演会講演論文集 Vol. 2013 p. 221-222 2013
Publisher: 公益社団法人 精密工学会
陽極酸化援用研磨法の開発 (第1報):4H-SiCの基礎加工特性
細谷 憲治, 遠藤 勝義, 山村 和也
精密工学会学術講演会講演論文集 Vol. 2013 p. 227-228 2013
Publisher: 公益社団法人 精密工学会
大気圧プラズマプロセスをベースとした単結晶ダイヤモンド基板の高能率ダメージフリー平坦化・平滑化（第2報）:石英ガラスを工具としたプラズマ援用研磨におけるプラズマ照射の効果
田畑 雄壮, 門奈 剛毅, トウ 輝, 牧山 真也, 遠藤 勝義, 山村 和也
精密工学会学術講演会講演論文集 Vol. 2013 p. 225-226 2013
Publisher: 公益社団法人 精密工学会
Label-free detection of bio-molecular by using the plasmonc nanoshell arrays with controlled nanogap
Uchida Shuhei, Zettsu Nobuyuki, Endo Katsuyoshi, Yamamura Kazuya
Proceedings of JSPE Semestrial Meeting Vol. 2013 p. 337-338 2013
Publisher: The Japan Society for Precision Engineering
プラズマ援用研磨法の開発（第7報）:酸化面のセリア砥粒研磨によるtwo-bilayerのステップ/テラス構造を形成するメカニズムの考察
トウ 輝, 遠藤 勝義, 山村 和也
精密工学会学術講演会講演論文集 Vol. 2013 p. 219-220 2013
Publisher: 公益社団法人 精密工学会
陽極酸化援用加工を用いた反応焼結SiC材の高精度ダメージフリー加工に関する研究:陽極酸化におけるSiCとSiの酸化レートの評価
下園 直樹, 遠藤 勝義, 山村 和也
精密工学会学術講演会講演論文集 Vol. 2013 p. 229-230 2013
Publisher: 公益社団法人 精密工学会
大気圧プラズマプロセスをベースとした単結晶ダイヤモンド基板の高能率ダメージフリー平坦化・平滑化(第1報):Ar+O2マイクロ波プラズマジェットのエッチング特性
牧山 真也, 田畑 雄壮, 遠藤 勝義, 山村 和也
精密工学会学術講演会講演論文集 Vol. 2013 p. 223-224 2013
Publisher: 公益社団法人 精密工学会
大気圧プラズマによる表面改質技術の開発:フッ素樹脂表面への高密着性銅メタライジング
佐藤 悠, 遠藤 勝義, 山村 和也
精密工学会学術講演会講演論文集 Vol. 2013 p. 581-582 2013
Publisher: 公益社団法人 精密工学会
大気開放型プラズマCVMを用いた形状創成における高精度化・高効率化に関する研究（第1報）:プラズマジェット加工方式における基礎的加工特性の評価
畑 祐輝, 竹田 善紀, 伊藤 丈予, 遠藤 勝義, 山村 和也
精密工学会学術講演会講演論文集 Vol. 2013 p. 681-682 2013
Publisher: 公益社団法人 精密工学会
大気開放型プラズマCVMを用いた形状創成における高精度・高効率化に関する研究（第2報）:パルス幅変調制御による加工量制御の基礎的検討
竹田 善紀, 畑 祐輝, 遠藤 勝義, 山村 和也
精密工学会学術講演会講演論文集 Vol. 2013 p. 683-684 2013
Publisher: 公益社団法人 精密工学会
数値制御電解加工(NC-ECM)による中性子収束用金属ミラー基盤の精密形状創成（第1報）:ライン型電極による楕円面の一括創成
光嶋 直樹, 大内 将, 遠藤 勝義, 山村 和也
精密工学会学術講演会講演論文集 Vol. 2013 p. 975-976 2013
Publisher: 公益社団法人 精密工学会
Atomically smooth damage free finishing of 4H-SiC(0001) by plasma assisted polishing
K. Yamamura
2012/12
Preface
Kazuto Yamauchi, Kazuya Yamamura
Current Applied Physics Vol. 12 No. 3 2012/12 Research paper (scientific journal)
Interfacial Analysis of Electroless Copper Thin Film on Fluorocarbon Polymer Fabricated by Plasma Irradiation with Graft Copolymerization
K. Ooka, Y. Hara, K. Yamamura
Proceedings of International Symposium on Dry Process(DPS2012) 2012/11 Research paper (international conference proceedings)
Improvement of adhesion strength of epoxy resin/PTFE interface by atmospheric pressure plasma treatment of PTFE
Y. Hara, K. Yamamura
Proceedings of International Symposium on Dry Process(DPS2012) 2012/11 Research paper (international conference proceedings)
Fabrication of precise asymmetric nanoshells array with nanogaps for a label-free immunoassay based on NIR-light responsive LSPR
Shuhei Uchida, Kazuya Yamamura, Nobuyuki Zettsu
Key Engineering Materials Vol. 523-524 p. 680-685 2012/11 Research paper (scientific journal)
Nanometer-level self-aggregation and three-dimensional growth of copper nanoparticles under dielectric barrier discharge at atmospheric pressure
Yuto Yamamoto, Hiroki Akiyama, Kento Ooka, Kazuya Yamamura, Yasushi Oshikane, Nobuyuki Zettsu
CURRENT APPLIED PHYSICS Vol. 12 p. S63-S68 2012/11 Research paper (scientific journal)
A Simulation Study on Figure Error Correction Using Near-Gaussian Removal Function in Numerical Controlled Local Wet Etching
Xinmin Shen, Mikinori Nagano, Wenqiang Peng, Yifan Dai, Kazuya Yamamura
EMERGING TECHNOLOGY IN PRECISION ENGINEERING XIV Vol. 523-524 p. 276-+ 2012/11 Research paper (scientific journal)
Relationship between peroxide radical species on plasma-treated PFA surface and adhesion strength of PFA/electroless copper-plating film
Yasuhiro Hara, Kento Ooka, Nobuyuki Zettsu, Kazuya Yamamura
CURRENT APPLIED PHYSICS Vol. 12 p. S38-S41 2012/11 Research paper (scientific journal)
Smoothing of reaction sintered silicon carbide using plasma assisted polishing
Hui Deng, Kazuya Yamamura
CURRENT APPLIED PHYSICS Vol. 12 p. S24-S28 2012/11 Research paper (scientific journal)
Study on in situ Etching Rate Monitoring in Numerically Controlled Local Wet Etching
Naoki Shimozono, Mikinori Nagano, Takaaki Tabata, Kazuya Yamamura
EMERGING TECHNOLOGY IN PRECISION ENGINEERING XIV Vol. 523-524 p. 34-39 2012/11 Research paper (scientific journal)
Material Removal Rate Control in Open-air Type Plasma Chemical Vaporization Machining Using Optical Actinometry
Yuto Yamamoto, Yuki Hata, Mao Hosoda, Yasushi Oshikane, Kazuya Yamamura
EMERGING TECHNOLOGY IN PRECISION ENGINEERING XIV Vol. 523-524 p. 267-271 2012/11 Research paper (scientific journal)
Adhesion strength of electroless copper plated layer on fluoropolymer surface modified by medium pressure plasma
Kento Ooka, Yuto Yamamoto, Yasuhiro Hara, Nobuyuki Zettsu, Kazuya Yamamura
EMERGING TECHNOLOGY IN PRECISION ENGINEERING XIV Vol. 523-524 p. 262-+ 2012/11 Research paper (scientific journal)
Evaluation of surface roughness and subsurface damage of 4H-SiC processed by different finishing techniques
Hui Deng, Kazuya Yamamura
EMERGING TECHNOLOGY IN PRECISION ENGINEERING XIV Vol. 523-524 p. 19-23 2012/11 Research paper (scientific journal)
Figuring of Aspherical Metal Mirror Substrate for Neutron Focusing by Numerically Controlled Electrochemical Machining
Takaaki Tabata, Mikinori Nagano, Dai Yamazaki, Ryuji Maruyama, Kazuhiko Soyama, Kazuya Yamamura
EMERGING TECHNOLOGY IN PRECISION ENGINEERING XIV Vol. 523-524 p. 29-+ 2012/11 Research paper (scientific journal)
Quadruple stacked elliptical supermirror device for one dimensional neutron focusing
M. Nagano, F. Yamaga, D. Yamazaki, R. Maruyama, K. Soyama, K. Yamamura
EMERGING TECHNOLOGY IN PRECISION ENGINEERING XIV Vol. 523-524 p. 272-+ 2012/11 Research paper (scientific journal)
Adhesion Strength of Epoxy Resin/PTFE Treated by Atmospheric Pressure Helium Plasma
Y. Hara, K. Yamamura
Extended Abstracs of Fifh International Symposium on Atomically Controlled Fabrication Technology 2012/10
Preliminary Study on Etching Characterization of Single Crystal Diamond in Open-air Type Plasma Chemical Vaporization Machining
S. Makiyama, K. Yamamura
Extended Abstracs of Fifh International Symposium on Atomically Controlled Fabrication Technology 2012/10
Development of Removal Rate Control System in Open-air Type Plasma Chemical Vaporization Machining Using Optical Actinometry
Y. Hata, Y. Takeda, Y. Oshikane, K. Yamamura
Extended Abstracs of Fifh International Symposium on Atomically Controlled Fabrication Technology 2012/10
Development of in situ Monitoring System for HF Concentration using Raman Spectroscopy in Numerically Controlled Local Wet Etching
N. Shimozono, M. Nagano, K. Yamamura
Extended Abstracs of Fifh International Symposium on Atomically Controlled Fabrication Technology 2012/10
XTEM Observation of 4H-SiC (0001) Surfaces Oxidized by Water Vapor Plasma in Plasma Assisted Polishing
H. Deng, K. Yamamura
Extended Abstracs of Fifh International Symposium on Atomically Controlled Fabrication Technology 2012/10
Fabrication of Spheroidal Supermirror for Neutron Beam Focusing -Figure Correction of Glass Mandrel using Spherical Polishing Pad-
K. Yamasaki, M. Nagano, N. Mitsushima, R. Maruyama, H. Hayashida, D. Yamazaki, K. Soyama, K. Yamamura
Extended Abstracs of Fifh International Symposium on Atomically Controlled Fabrication Technology 2012/10
Effect of Atmospheric Plasma Treatment on Adhesion Strength of Electroless Copper Film/Fluorocarbon Polymer Interface
K. Ooka, Y. Hara, K. Yamamura
Extended Abstracs of Fifh International Symposium on Atomically Controlled Fabrication Technology 2012/10
Combined effect of Oxidation and Removal in Plasma Chemical Vaporization Machining of Reaction Sintered Silicon CarbideFifh
X. Shen, K. Yamamura
Extended Abstracs of Fifh International Symposium on Atomically Controlled Fabrication Technology 2012/10
Approach to a Nanoscale Optical Biosensor using Nanoshell Array for a Label-Free Immunoassay based on NIR-light Responsive LSPR
S. Uchida, N. Zettsu, K. Yamamura
Extended Abstracs of Fifh International Symposium on Atomically Controlled Fabrication Technology 2012/10
Development of Stacking Mirror Device Using Millimeter-Thick Elliptical Supermirrors for Neutron Beam Focusing
M. Nagano, F. Yamaga, D. Yamazaki, R. Maruyama, K. Soyama, K. Yamamura
Extended Abstracs of Fifh International Symposium on Atomically Controlled Fabrication Technology 2012/10
Chemical Fabrication Techniques for Optical Components with Nanometer-level Accuracy
K. Yamamura
Extended Abstracs of Fifh International Symposium on Atomically Controlled Fabrication Technology 2012/10
Removal Properties of Reaction Sintered SｉC in Atmospheric Pressure Plasma Fabrication Process
K. Yamamura, Y. Yamamoto, Y. Hata, H. Deng
Proceedings of 10th International Conference on Progress of Machining Technology(ICPMT2012) 2012/09 Research paper (international conference proceedings)
A Simulation Study on Optimazation of Scan Mode in Numerically Controlled Local Wet Etching
X. Shen, K. Yamamura
Proceedings of 10th International Conference on Progress of Machining Technology(ICPMT2012) 2012/09 Research paper (international conference proceedings)
Oxidation of 4H-SiC by Water Vapor Plasma in Plasma Assisted Polishing
H. Deng, K. Yamamura
Proceedings of 10th International Conference on Progress of Machining Technology(ICPMT2012) 2012/09 Research paper (international conference proceedings)
ULTRA-PRECISION FIGURING OF ELLIPTICAL QUARTZ GLASS SUBSTRATE BY NUMERICALLY CONTROLLED LOCAL WET ETCHING USING HF SOLUTION AT AZEOTROPIC CONCENTRATION
Mikinori Nagano, Kazuya Yamamura
PROGRESS OF MACHINING TECHNOLOGY p. 223-226 2012/09 Research paper (international conference proceedings)
XPS analysis of 4H-SiC surfaces oxidized by helium-based atmospheric-pressure water vapor plasma for plasma-assisted polishing
Hui Deng, Kazuya Yamamura
SILICON CARBIDE AND RELATED MATERIALS 2012 Vol. 740-742 p. 514-517 2012/09 Research paper (international conference proceedings)
Basic experiment on atmospheric-pressure plasma etching with slit aperture for high-efficiency dicing of SiC wafer
Yasuhisa Sano, Hiroaki Nishikawa, Kohei Aida, Chaiyapat Tangpatjaroen, Kazuya Yamamura, Satoshi Matsuyama, Kazuto Yamauchi
SILICON CARBIDE AND RELATED MATERIALS 2012 Vol. 740-742 p. 813-+ 2012/09 Research paper (international conference proceedings)
大気圧プラズマを援用したSiCの超平滑ダメージフリー研磨
山村和也
FCレポート 2012/07
Supermirror Coatings for the J-PARC/MLF
R. Maruyama, D. Yamazaki, H. Hayashida, M. Nagano, N. Zettsu, K. Yamamura, M. Takeda, S. Okayasu, K. Soyama
2012/07
Stacking mirror device using millimeter-thick elliptical supermirrors fabricated by numerically controlled local wet etching for focusing neutron beam
M. Nagano, F. Yamaga, D. Yamazaki, R. Maruyama, K. Soyama, K. Yamamura
Proc. of 12th International Conference of the European Society for Precision Engineering and Nanotechnology 2012/06 Research paper (international conference proceedings)
Smoothing Mechanism of Reaction Sintered SiC in Plasma assisted Polishing using Ceria Abrasive
Hui Deng, Masaki Ueda, Kazuya Yamamura
PROCEEDINGS OF PRECISION ENGINEERING AND NANOTECHNOLOGY (ASPEN2011) Vol. 516 p. 119-124 2012/06 Research paper (scientific journal)
Preliminary Study on Chemical Figuring and Finishing of Sintered SiC Substrate Using Atmospheric Pressure Plasma
K. Yamamura, Y. Yamamoto, H. Deng
45TH CIRP CONFERENCE ON MANUFACTURING SYSTEMS 2012 Vol. 3 p. 335-339 2012/05 Research paper (international conference proceedings)
シリコンカーバイドを無傷に研磨
山村和也
セラミックス 2012/04
Effect of Si interlayers on the magnetic and mechanical properties of Fe/Ge neutron polarizing multilayer mirrors
R. Maruyama, D. Yamazaki, S. Okayasu, M. Takeda, N. Zettsu, M. Nagano, K. Yamamura, H. Hayashida, K. Soyama
J. Appl. Phys. 111 (2012) 063904_1-10. Vol. 111 No. 6 2012/03 Research paper (scientific journal)
High-precision figured thin supermirror substrates for multiple neutron focusing device
M. Nagano, F. Yamaga, D. Yamazaki, R. Maruyama, H. Hayashida, K. Soyama, K. Yamamura
J. Phys. Conf. Ser. 340 (2012) 012016_1_7 Vol. 340 2012/02 Research paper (scientific journal)
Oxidation of 4H-SIC (0001) by water vapor plasma in plasma assisted polishing
Hui Deng, Kazuya Yamamura
10th International Conference on Progress of Machining Technology, ICPMT 2012 p. 160-163 2012 Research paper (international conference proceedings)
数値制御電解加工による金属ミラーの形状創成加工（第２報）:同軸ノズル電極の基礎加工特性
田畑 雄壮, 永野 幹典, 山村 和也
精密工学会学術講演会講演論文集 Vol. 2012 p. 343-344 2012
Publisher: 公益社団法人 精密工学会
プラズマ発生領域制限マスクを用いたPCVM(Plasma Chemical Vaporization Machining) によるSiC基板の切断加工の検討
西川 央明, 佐野 泰久, 会田 浩平, 岡田 悠, 山村 和也, 松山 智至, 山内 和人
精密工学会学術講演会講演論文集 Vol. 2012 p. 425-426 2012
Publisher: 公益社団法人 精密工学会
数値制御ローカルウエットエッチング法による高精度光学素子の作製（第9報）:共沸濃度のフッ化水素酸を用いた合成石英基板の高精度加工
永野 幹典, 山村 和也
精密工学会学術講演会講演論文集 Vol. 2012 p. 407-408 2012
Publisher: 公益社団法人 精密工学会
大気開放型プラズマCVMにおける加工速度フィードバック制御機構の開発 (第3報):アクチノメトリー法を用いた反応種密度計測における誤差要因の検討
畑 祐輝, 竹田 善紀, 山村 和也, 押鐘 寧
精密工学会学術講演会講演論文集 Vol. 2012 p. 879-880 2012
Publisher: 公益社団法人 精密工学会
One-dimensional neutron focusing with large beam divergence by 400mm-long elliptical supermirror
M. Nagano, F. Yamaga, D. Yamazaki, R. Maruyama, H. Hayashida, K. Soyama, K. Yamamura
5TH EUROPEAN CONFERENCE ON NEUTRON SCATTERING Vol. 340 2012 Research paper (international conference proceedings)
Shape correction of optical surfaces using plasma chemical vaporization machining with a hemispherical tip electrode
Hideo Takino, Kazuya Yamamura, Yasuhisa Sano, Yuzo Mori
Applied Optics 51 (2012) 401-407. Vol. 51 No. 3 p. 401-407 2012/01 Research paper (scientific journal)
The improvement of removal function in local wet etching by using eccentric rotation system
X. Shen, Y. Dai, W. Peng, M. Nagano, K. Yamamura
Abstracts of 4th International Conference of Asian Society for Precision Engineering and Nanotechnology, 104. Vol. 516 p. 504-+ 2011/11 Research paper (international conference proceedings)
Development of Focusing Supermirrors for GISANS Measurements at BL17 “SHARAKU" of J-PARC/MLF
D. Yamazaki, R. Maruyama, H. Hayashida, K. Soyama, M. Takeda, M. Nagano, F. Yamaga, K. Yamamura
Abstracts of 1st Asia-Oceania Conference on Neutron Scattering, 449. 2011/11
Development of neutron focusing device using stacked millimeter-thick elliptical supermirror substrates
M. Nagano, F. Yamaga, D. Yamazaki, R. Maruyama, H. Hayashida, K. Soyama, K. Yamamura
Abstracts of 1st Asia-Oceania Conference on Neutron Scattering, 110. 2011/11
Evaluation of focusing performance of elliptical neutron focusing supermirror by ray-tracing simulation
M. Nagano, F. Yamaga, D. Yamazaki, R. Maruyama, H. Hayashida, K. Soyama, K. Yamamura
Abstracts of 1st Asia-Oceania Conference on Neutron Scattering, 444. 2011/11
A Spheroidal Supermirror
K. Soyama, D. Yamazaki, R. Maruyama, H. Hayashida, M. Nagano, N. Zettsu, K. Yamamura
Abstracts of 1st Asia-Oceania Conference on Neutron Scattering, 446. 2011/11
XTEM observation of 4H-SiC (0001) surfaces processed by plasma assisted polishing
H. Deng, K. Yamamura
Proceeding of the 8th CHINA-JAPAN International Conference on Ultra-Precision Machining, 30. Vol. 497 p. 156-159 2011/11 Research paper (international conference proceedings)
Plasma Chemical Vaporization Machining of Silicon Carbide Wafer Using Flat-bar Electrode with Multiple Gas Nozzles
Y. Sano, K. Aida, H. Nishikawa, K. Yamamura, S. Matsuyama, K. Yamauchi
Proceeding of the 8th CHINA-JAPAN International Conference on Ultra-Precision Machining, 31. Vol. 497 p. 160-+ 2011/11 Research paper (international conference proceedings)
Chemical and morphological analysis of 4H-SiC surface processed by plasma assisted polishing
H. Deng, M. Ueda, K. Yamamura
Abstracts of 4th International Conference of Asian Society for Precision Engineering and Nanotechnology, 65. Vol. 516 p. 186-191 2011/11 Research paper (international conference proceedings)
Study on flattening mechanism of reaction sintered SiC by plasma assisted polishing using ceria abrasive
H. Deng, M. Ueda, K. Yamamura
Abstracts of 4th International Conference of Asian Society for Precision Engineering and Nanotechnology, 56. 2011/11
Noncontact figuring of millimeter-thick elliptical mirror substrate by numerically controlled local wet etching
M. Nagano, F. Yamaga, K. Yamasaki, N. Zettsu, D. Yamazaki, R. Maruyama, H. Hayashida, K. Soyama, K. Yamamura
Abstracts of 4th International Conference of Asian Society for Precision Engineering and Nanotechnology, 72. Vol. 516 p. 361-+ 2011/11 Research paper (international conference proceedings)
Back-side thinning of silicon carbide wafer by plasma etching using atmospheric-pressure plasma
Y. Sano, K. Aida, H. Nishikawa, K. Yamamura, S. Matsuyama, K. Yamauchi
Abstracts of 4th International Conference of Asian Society for Precision Engineering and Nanotechnology, 72 Vol. 516 p. 108-+ 2011/11 Research paper (international conference proceedings)
A Study on Surface Roughness of Curved Silicon Crystal Spectrometer Fabricated by Plasma Chemical Vaporization Machining
Y. Yamamoto, M. Hosoda, M. Nagano, K. Yamamura
Abstracts of 4th International Conference of Asian Society for Precision Engineering and Nanotechnology, 51. Vol. 516 p. 522-526 2011/11 Research paper (international conference proceedings)
Cutting of SiC substrates by atmospheric-pressure plasma etching with slit mask for plasma confinement
H. Nishikawa, Y. Sano, K. Aida, T. Chaiyapat, K. Yamamura, S. Matsuyama, K. Yamauchi
Abstracts of The 33rd International Symposium on Dry Process, 35-36. 2011/11 Research paper (international conference proceedings)
Cutting of SiC substrates by atmospheric-pressure plasma etching with slit mask for plasma confinement
H. Nishikawa, Y. Sano, K. Aida, T. Chaiyapat, K. Yamamura, S. Matsuyama, K. Yamauchi
Extended Abstracts of Fourth International Symposium on Atomically Controlled Fabrication Technology, 172-173. 2011/10 Research paper (international conference proceedings)
Study on Adhesion Strength of Cu Plating Film Formed on PTFE Substrate through Atmospheric Pressure Plasma Liquid Deposition
Y. Hara, K. Oooka, H. Akiyama, N. Zettsu, K. Yamamura
Extended Abstracts of Fourth International Symposium on Atomically Controlled Fabrication Technology, 218-219. 2011/10
Real Time Monitoring and Control of Etching Rate in Open-air Type Plasma Chemical Vaporization Machining Using Optical Actinometry
Y. Yamamoto, M. Nagano, M. Hosoda, Y. Hata, K. Yamamura
Extended Abstracts of Fourth International Symposium on Atomically Controlled Fabrication Technology, 212-213. 2011/10
Investigation of Material Removal Mechanism of Reaction Sintered SiC in Plasma Assisted Polishing
H. Deng, K. Yamamura
Extended Abstracts of Fourth International Symposium on Atomically Controlled Fabrication Technology, 152-153. 2011/10
Fabrication of Ring-Shaped PS@Au Metallodielectric Nanoshell Arrays for Localized Surface Plasmon Resonance Biosensor
Y. Yamamoto, S. Uchida, K. Yamamura, N. Zettsu
Extended Abstracts of Fourth International Symposium on Atomically Controlled Fabrication Technology, 96-97. 2011/10
Fabrication of Patterned Metal Layer on Poly(tetrafluoroethylene)Substrate through Atmospheric Pressure Plasma Liquid Deposition Approach
K. Ooka, H. Akiyama, Y. Yamamoto, N. Zettsu, K. Yamamura
Extended Abstracts of Fourth International Symposium on Atomically Controlled Fabrication Technology, 158-159. 2011/10
Estimation of Alignment Tolerance for Multiply-Arranged Elliptical Neutron Focusing Supermirror Device by Ray-Tracing Simulation
F. Yamaga, M. Nagano, D. Yamazaki, R. Maruyama, K. Soyama, K. Yamamura
Extended Abstracts of Fourth International Symposium on Atomically Controlled Fabrication Technology, 2011/10
Morphological and Molecular Design of PTFE/epoxy Resin Interface for Adhesion Enhancement by Liquid Phase and Atmospheric Pressure Plasma
S. Matsuura, Y. Izutsu, N. Zettsu, K. Yamamura
Extended Abstracts of Fourth International Symposium on Atomically Controlled Fabrication Technology, 132-133. 2011/10
Effect of Shield Gas on Surface Roughness in Processing of Silicon by Open-air Type Plasma Chemical Vaporization Machining
M. Hosoda, M. Nagano, Y. Yamamoto, Y. Hata, K. Yamamura
Extended Abstracts of Fourth International Symposium on Atomically Controlled Fabrication Technology, 136-137. 2011/10
Fabrication of Precise Metallodielectric Plasmonic Nanoshell Arrays with Nanogap for A Label-Free
S. Uchida, K. Yamamura, N. Zettsu
Extended Abstracts of Fourth International Symposium on Atomically Controlled Fabrication Technology, 94-95. 2011/10
Development of multiply-arranged elliptical neutron focusing supermirror device -Fabrication Process of High-Precision Thin Elliptical Supermirror-
M. Nagano, F. Yamaga, D. Yamazaki, R. Maruyama, K. Soyama, K. Yamamura
Extended Abstracts of Fourth International Symposium on Atomically Controlled Fabrication Technology, 22-23. Vol. 2011 No. 0 p. 501-502 2011/10
Publisher: The Japan Society for Precision Engineering
Cutting of SiC Wafer by Atmospheric-Pressure Plasma Etching With Wire Electrode
Yasuhisa Sano, Kohei Aida, Takehiro Kato, Kazuya Yamamura, Hidekazu Mimura, Satoshi Matsuyama, Kazuto Yamauchi
SILICON CARBIDE AND RELATED MATERIALS 2011, PTS 1 AND 2 Vol. 717-720 p. 865-+ 2011/09 Research paper (international conference proceedings)
Evaluation of surface roughness of quartz glass substrate in fabrication process for neutron focusing mirror
Mikinori Nagano, Fumiya Yamaga, Kenta Yamasaki, Nobuyuki Zettsu, Dai Yamazaki, Ryuji Maruyama, Kazuhiko Soyama, Kazuya Yamamura
Advanced Materials Research 325 (2011) 647-652. Vol. 325 p. 647-+ 2011/09 Research paper (scientific journal)
High-integrity finishing of 4H-SiC (0001) by plasma-assisted polishing
K. Yamamura, T. Takiguchi, M. Ueda, H. Deng, A.N. Hattori, N. Zettsu
Journal of the Japan Society for Abrasive Technology Vol. 55 No. 9 p. 534-539 2011/09 Research paper (scientific journal)
Publisher:
Damage-Free Dry Polishing of 4H-SiC Combined with Atmospheric-Pressure Water Vapor Plasma Oxidation
Hui Deng, Tatsuya Takiguchi, Masaki Ueda, Azusa N. Hattori, Nobuyuki Zettsu, Kazuya Yamamura
Jpn. J. Appl. Phys. 50 (2011) 08JG05_1-4. Vol. 50 No. 8 2011/08 Research paper (scientific journal)
高精度非球面スーパーミラーの開発
山崎大, 丸山龍治, 林田洋寿, 曽山和彦, 永野幹典, 山家史也, 山村和也
日本原子力研究開発機構JAEA-Review(Web) No. 2011-014 2011/06
Ultra precision machining using plasma chemical vaporization machining (CVM)
Kazuya Yamamura, Yasuhisa Sano, Yuzo Mori
Generation and Applications of Atmospheric Pressure Plasmas p. 237-254 2011 Part of collection (book)
Publisher: Nova Science Publishers, Inc.Development of plasma assisted polishing (4th report):Mechanism for flattening of reaction sintered SiC by plasma assisted polishing
Deng Hui, Makiyama Shinya, Yamamura Kazuya
Proceedings of JSPE Semestrial Meeting Vol. 2011 p. 764-765 2011
Publisher: The Japan Society for Precision Engineering
Fabrication of damage-free curved silicon crystal substrate for a focusing X-ray spectrometer by Plasma Chemical Vaporization Machining (6th report):Study on generation mechanism of surface roughness by gas fluid analysis
Hosoda Mao, Nagano Mikinori, Yamamoto Yuto, Hata Yuki, Yamamura Kazuya
Proceedings of JSPE Semestrial Meeting Vol. 2011 p. 483-484 2011
Publisher: The Japan Society for Precision Engineering
リング型PS@Auプラズモニックナノシェルアレイの作製
山本 悠人, 内田 修平, 山村 和也, 是津 信行
精密工学会学術講演会講演論文集 Vol. 2011 p. 519-520 2011
Publisher: 公益社団法人 精密工学会
大気開放下におけるプラズマ化学液相堆積法によるフッ素ポリマー表面の銅メタライジング:過酸化物ラジカルの存在形態と無電解銅めっき膜の密着強度の相関
大岡 健人, 秋山 弘貴, 山本 悠人, 是津 信行, 山村 和也
精密工学会学術講演会講演論文集 Vol. 2011 p. 537-538 2011
Publisher: 公益社団法人 精密工学会
中性子集光用楕円面スーパーミラーデバイスの開発:ミラーの形状誤差が集光性能に与える影響
山家 史也, 永野 幹典, 山崎 大, 丸山 龍治, 曽山 和彦, 山村 和也
精密工学会学術講演会講演論文集 Vol. 2011 p. 479-480 2011
Publisher: 公益社団法人 精密工学会
Development of high-precision magnifying mirror for observation for quantum states of neutrons in the gravity field
Nagano Mikinori, Yamasaki Kenta, Tabata Takaaki, Yamamura Kazuya, Ichikawa Go, Minami Yuto, Komamiya Sachio
Proceedings of JSPE Semestrial Meeting Vol. 2011 p. 481-482 2011
Publisher: The Japan Society for Precision Engineering
Crystal Machining Using Atmospheric Pressure Plasma
Yasuhisa Sano, Kazuya Yamamura, Kazuto Yamauchi
Crystal Growth Technology: Semiconductors and Dielectrics p. 313-330 2010/07/19 Part of collection (book)
Publisher: Wiley-VCH
Fabrication of damage-free Johansson-type doubly curved crystal spectrometer substrate by numerically controlled local wet etching
K. Yamamura, K. Ueda, M. Nagano, N. Zettsu, S. Maeo, S. Shimada, T. Utaka, K. Taniguchi
Nucl. Instr. and Meth. A 616 (2010) 281-284. 2010/04 Research paper (scientific journal)
High-integrity finishing of 4H-SiC (0001) by plasma-assisted polishing
Kazuya Yamamura, Tatsuya Takiguchi, Masaki Ueda, Azusa N. Hattori, Nobuyuki Zettsu
ADVANCES IN ABRASIVE TECHNOLOGY XIII Vol. 126-128 p. 423-428 2010 Research paper (international conference proceedings)
High-Integrity Finishing of 4H-SiC (0001) by Plasma-Assisted Polishing
K. Yamamura, T. Takiguchi, M. Ueda, A. N. Hattori, N. Zettsu
Adv. Mat. Res. Vol. 423-428 p. 126-128 2010 Research paper (scientific journal)
Improvement of thickness uniformity of bulk silicon wafer by numerically controlled local wet etching
Mikinori Nagano, Takuro Mitani, Kazuaki Ueda, Nobuyuki Zettsu, Kazuya Yamamura
JOURNAL OF CRYSTAL GROWTH Vol. 311 No. 8 p. 2560-2563 2009/04 Research paper (scientific journal)
プログラム自己組織化による銀ナノキューブダイマーの合成とそのプラズモニック特性
三谷宗久, 内田修平, 山村和也, 遠藤勝義, 是津信行
2009/03
サブメートル級ナノ粒子配列膜製造技術の開発（6）
真鍋享平, 是津信行, 山村和也, 遠藤勝義
2009年度精密工学会春季大会学術講演会講演論文集 2009/03
ナノ粒子デバイス製造プロセスの開発
斉藤正太, 山村和也, 遠藤勝義, 是津信行
第69回応用物理学会学術講演会講演予稿集 2008/09
サブメートル級ナノ粒子配列膜製造技術の開発（５）
真鍋享平, 是津信行, 山村和也, 遠藤勝義
2008年度精密工学会秋季大会学術講演会講演論文集 2008/09
非最密型中空金ナノ粒子膜の作製
内田修平, 是津信行, 山村和也, 遠藤勝義
第58回高分子学会年次大会講演予稿集 2008/05
Shape correction of steep curved surfaces using plasma chemical vaporization machining with a hemispherical tip electrode
H. Takino, K. Ara, N. Shibata, K. Yamamura, Y. Sano, Y. Mori
Proceedings of the 7th International Conference European Society for Precision Engineering and Nanotechnology, EUSPEN 2007 Vol. 2 p. 193-196 2007 Research paper (international conference proceedings)
Publisher: euspenRo-vibronic Structure in the Q-branch in the Spectra of Hydrogen Fulcher-a Band Emission in the Atmospheric Pressure Plasma CVD Process Driven at 150 MHz
Y. Oshikane, H. Kakiuchi, K. Yamamura, C. M. Western, K. Yasutake, K. Endo
Extended Abstratcs of International 21st Century COE Symposium on Atomistic Fabrication Technology 2006/10
Development of mirror manipulator for hard x-ray nanofocusing at sub-50nm level
S. Matsuyama, H. Mimura, H. Yumoto, H. Hara, S. Handa, K. Yamamura, Y. Sano, K. Endo, Y. Mori, M. Yabashi, Y. Nishino, K. Tamasaku, T. Ishikawa, K. Yamauchi
Review of Scientific Instruments Vol. 77 No. 9 2006/10 Research paper (scientific journal)
Scanning X-ray Fluorescence Microscope Using Kirkpatrick-Baez Optics with Spatial Resolution Better than 50nm
Satoshi Matsuyama, Hidekazu Mimura, Mari Shimura, Hirokatsu Yumoto, Keiko Katagishi, Soichiro Handa, Akihiko Shibatani, Yasuhisa Sano, Kazuya Yamamura, Katsuyoshi Endo, Yuzo Mori, Yoshinori Nishino, Kenji Tamasaku, Makina Yabashi, Tetsuya Ishikawa, Kazuto Yamauchi
The 16th International Microscopy Congress (IMC16) 2006/09
Development of scanning X-ray fluorescence microscope with spatial resolution of 30nm using K-B mirrors optics
S.Matsuyama, H.Mimura, H.Yumoto, K.Yamamura, Y.Sano, M.Yabashi, Y.Nishino, K.Tamasaku, T. Ishikawa, K.Yamauchi
Review of Scientific Instruments Vol. 77 No. 10 2006/09 Research paper (scientific journal)
Hard X-ray focusing with a beam size less than 30 nm by total reflection mirror
H. Mimura, H. Yumoto, S. Matsuyama, S. Handa, Y. Sano, K. Yamamura, K. Tamasaku, Y. Nishino, M. Yabashi, T. Ishikawa, K. Yamauchi
2006/07
Diffraction-limited X-ray nanobeam with KB mirrors
K. Yamauchi, H. Mimura, S. Matsuyama, H. Yumoto, S. Handa, Y. Sano, K. Yamamura, K. Tamasaku, Y. Nishino, M. Yabashi, T. Ishikawa
2006/07
N2 C3Pu-B3Pg band spectroscopy in open-air type CVM plasma with He/CF4/O2 and H2 Fulcher-a band spectroscopy in atmospheric He/H2/SiH4 CVD plasma
Yasushi Oshikane, Kazuya Yamamura, Koji Ueno, Hiroaki Kakiuchi, Kiyoshi Yasutake, Takafumi Karasawa, Colin M. Western, Akinori Oda, Akihiko Nagao, Katsuyoshi Endo
Europhysics Conference Abstract of 18th Europhysics Conference on the Atomic and Molecular Physics of Ionised Gases 2006/07
Machining characteristics of AT cut quartz crystal wafer by open-air type atmospheric pressure plasma machining system, Abstractbook of the 8th Asia-Pacific Conference on Plasma Science and Technology
Kazuya Yamamura, Koji Ueno, Yasuhisa Sano, Yasushi Oshikane, Masafumi Shibahara, Yuzo Mori
Abstractbook of the 8th Asia-Pacific Conference on Plasma Science and Technology 2006/07
Surface Gradient Integrated Profiler for X-ray and EUV Optics-Calibration of the rotational angle error of the rotary encoders-
Yasuo Higashi, Yuichi Takaie, Katsuyoshi Endo, Tatsuya Kume, Kazuhiro Enami, Kazuto Ymauchi, Kazuya Yamamura, Yasushi Sano, Kenji Ueno, Yuzo Mori
Ninth International Conference on Synchrotron Radiation Instrumentation Vol. 879 p. 726-+ 2006/06 Research paper (international conference proceedings)
Development of Surface Measurement Technologies for Hard X-ray Nanofocusing Mirror at Osaka University and SPring-8
H. Mimura, H. Yumoto, S. Matsuyama, K. Yamamura, Y. Sano, K. Endo, Y. Mori, M. Yabashi, Y. Nishino, K. Tamasaku, T. Ishikawa, K. Yamauchi
The 3rd International Workshop on Metrology for X-ray Optics 2006/05
Development of K-B Mirror Manipulator for Hard X-ray Sub-50nm Focusing
Satoshi Matsuyama, Hidekazu Mimura, Hirokatsu Yumoto, Soichiro Handa, Keiko Katagishi, Akihiko Shibatani, Kazuya Yamamura, Yasuhisa Sano, Yoshinori Nishino, Kenji Tamasaku, Makina Yabashi, Tetsuya Ishikawa, Kazuto Yamauchi
International Workshop on Mechanical Engineering Design of Synchrotron Radiation Equipment and Instrumentation 2006 2006/05
Polishing characteristics of silicon carbide by plasma chemical vaporization machining
Y. Sano, M. Watanabe, K. Yamamura, K. Yamauchi, T. Ishida, K. Arima, A. Kubota, Y. Mori
Proc. ICRP-6/SPP-23 Vol. 45 No. 10 p. 8277-8280 2006/01 Research paper (international conference proceedings)
High-spatial-resolution scanning X-ray fluorescence microscope with Kirkpatrick-Baez mirrors
Satoshi Matsuyama, Hidekazu Mimura, Mari Shimura, Hirokatsu Yumoto, Keiko Katagishi, Soichiro Handa, Akihiko Shibatani, Yasuhis Sano, Kazuya Yamamura, Yoshinori Nishino, Kenji Tamasaku, Makina Yabashi, Tetsuya Ishikawa, Kazuto Yamauchi
ADVANCES IN X-RAY/EUV OPTICS, COMPONENTS, AND APPLICATIONS Vol. 6317 2006 Research paper (international conference proceedings)
Ultraprecision finishing process for improving thickness distribution of quartz crystal wafer by utilizing atmospheric pressure plasma
Kazuya Yamamura, Yasuhisa Sano, Yuzo Mori, Masafumi Shibahara
PROCEEDINGS OF THE 2006 IEEE INTERNATIONAL FREQUENCY CONTROL SYMPOSIUM AND EXPOSITION, VOLS 1 AND 2 p. 848-+ 2006 Research paper (international conference proceedings)
Wave-optical evaluation of interference fringes and wavefront phase in a hard-x-ray beam totally reflected by mirror optics
Kazuto Yamauchi, Kazuya Yamamura, Hidekazu Mimura, Yasuhisa Sano, Akira Saito, Katsuyoshi Endo, Alexei Souvorov, Makina Yabashi, Kenji Tamasaku, Tetsuya Ishikawa, Yuzo Mori
Applied Optics Vol. 44 No. 32 p. 6927-6932 2005/11 Research paper (scientific journal)
Publisher: OSA - The Optical Society
Two-dimensional Actinometric Study of Fluorine and Oxygen Atom Densities in the CVM Plasma Gap and the Temperature Estimation with Electronic Spectra of Diatomic Molecules
Yasushi Oshikane, Akihiko Nagao, Akinori Oda, Colin M. Western, Kazuya Yamamura, Katsuyoshi Endo
17th International Symposium on Plasma Chemistry, Abstracts and Full-papers CD 2005/08 Research paper (international conference proceedings)
Publisher: IUPAC & IPCSSurface figuring and measurement methods with spatial resolution close to 0.1mm for X-ray mirror fabrication
H. Mimura, H. Yumoto, S. Matsuyama, K. Yamamura, Y. Sano, K. Endo, Y. Mori, Y. Nishino, M. Yabashi, K. Tamasaku, T. Ishikawa, K. Yamauchi
Proceedings of SPIE - The International Society for Optical Engineering Vol. 5921 p. 1-8 2005/08 Research paper (international conference proceedings)
Diffraction-limited two-dimensional hard-X-rays focusing in 100nm level using K-B mirror arrangement
S. Matsuyama, H. Mimura, H. Yumoto, K. Yamamura, Y. Sano, K. Endo, Y. Mori, M. Yabashi, K. Tamasaku, Y. Nishino, T. Ishikawa, K. Yamauchi
Review of Scientific Instruments Vol. 76 No. 8 p. 1-5 2005/08 Research paper (scientific journal)
A new Designed High-Precision Profiler - Study on Mandrel measurement-
Y.Higashi, Y.Takaie, K.Endo, T.Kume, K.Enami, K.Yamauchi, K.Yamamura, K.Ueno, Y.Mori
Proc. 8th Cof. X-ray Microscopy IPAP Conf. Series 7 2005/07 Research paper (international conference proceedings)
Scanning hard-X-ray microscope with spatial resolution better than 50nm
S. Matsuyama, H. Mimura, H. Yumoto, H. Hara, K. Yamamura, Y. Sano, K.Endo, Y. Mori, M. Yabashi, Y. Nishino, K. Tamasaku, T. Ishikawa, K.Yamauchi
2005/07 Research paper (scientific journal)
Hard X-ray Diffraction-Limited Nanofocusing with unprecidently accurate mirrors
H. Mimura, S. Matsuyama, H. Yumoto, H. Hara, K. Yamamura, Y. Sano, M. Shibahara, K. Endo, Y. Mori, Y. Nishino, K. Tamasaku, M. Yabashi, T. Ishikawa, K. Yamauchi
2005/07 Research paper (scientific journal)
Development of elliptical kirkpatrick-baez mirrors for hard X-ray nanofocusing
K. Yamauchi, H. Mimura, K. Yamamura, Y. Sano, H. Yumoto, S. Matsuyama, K. Endo, Y. Nishino, K. Tamasaku, M. Yabashi, T. Ishikawa, Y. Mori
Optics InfoBase Conference Papers 2005 Research paper (international conference proceedings)
Focusing hard X-rays to sub-50 nm size by elliptically figured: Mirror
Hirokatsu Yumoto, Hidekazu Mimura, Satoshi Matsuyama, Hideyuki Hara, Kazuya Yamamura, Yasuhisa Sano, Kazumasa Ueno, Katsuyoshi Endo, Yuzo Mori, Makina Yabashi, Yoshinori Nishino, Kenji Tamasaku, Tetsuya Ishikawa, Kazuto Yamauchi
Optics InfoBase Conference Papers 2005 Research paper (international conference proceedings)
Stitching interferometry for surface figure measurement of X-ray reflective optics
Hidekazu Mimura, Hirokatsu Yumoto, Satoshi Matsuyama, Hideyuki Hara, Kazuya Yamamura, Yasuhisa Sano, Kazumasa Ueno, Katsuyoshi Endo, Yuzo Mori, Makina Yabashi, Yoshinori Nishino, Kenji Tamasaku, Tetsuya Ishikawa, Kazuto Yamauchi
Optics InfoBase Conference Papers 2005 Research paper (international conference proceedings)
Hard X-ray nano-focusing at 40nm level using K-B mirror optics for nanoscopy/spectroscopy
Satoshi Matsuyama, Hidekazu Mimura, Hirokatsu Yumoto, Hideyuki Hara, Kazuya Yamamura, Yasuhisa Sano, Katsuyoshi Endo, Yuzo Mori, Yoshinori Nishino, Kenji Tamasaku, Makina Yabashi, Tetsuya Ishikawa, Kazuto Yamauchia
Proceedings of SPIE - The International Society for Optical Engineering Vol. 5918 p. 1-8 2005 Research paper (international conference proceedings)
Surface Figure Metrology of x-ray mirrors using optical interferometry
K. Yamauchi, K. Yamamura, H. Mimura, Y. Sano, S. Matsuyama, H. Yumoto, K. Ueno, K. Endo, M. Yabashi, K. Tamasaku, Y. Nishino, T. Ishikawa, Y. Mori
2004/09
Surface figure metrology of total reflection X-ray mirror using optical interferometry at Osaka Univ. and SPring-8
K. Yamuchi, H. Mimura, K. Yamamura, Y.Sano, K. Ueno, S. Matsuyama, K. Endo, Y. Nishino, K. Tamasaku, M. Yabashi, T. Ishikawa
Proceedings of Second International Workshop on Metrology for X-ray Optics 2004/04
超高精度硬Ｘ線集光ミラーの製作とナノスペクトロスコピーへの応用
山村和也, 山内和人, 佐野泰久, 三村秀和, 遠藤勝義, 森 勇藏
大阪大学低温センターだより，125, 4-10 Vol. 125 p. 4-10 2004/01 Research paper (bulletin of university, research institution)
Publisher: 大阪大学低温センター
Aspheric surface fabrication in nm-level accuracy by numerically controlled plasma chemical vaporization machining (CVM) and elastic emission machining (EEM)
K Yamamura, H Mimura, K Yamauchi, Y Sano, A Saito, T Kinoshita, K Endo, Y Mori, A Souvorov, M Yabashi, K Tamasaku, D Ishikawa
X-RAY MIRRORS, CRYSTALS, AND MULTILAYERS II Vol. 4782 p. 265-270 2002 Research paper (international conference proceedings)
Sub-micron focusing of hard X-ray beam by elliptically figured mirrors for scanning X-ray microscopy
Y Mori, K Yamauchi, K Yamamura, H Mimura, Y Sano, A Saito, K Ueno, K Endo, A Souvorov, M Yabashi, K Tamasaku, T Ishikawa
X-RAY MIRRORS, CRYSTALS, AND MULTILAYERS II Vol. 4782 p. 58-64 2002 Research paper (international conference proceedings)
First-Principles Simulation of Removal Process in EEM(Elastic Emission Machining)
Kazuto Yamauchi, Kikuji Hirose, Hidekazu Goto, Kazuhisa Sugiyama, Kouji Inagaki, Kazuya Yamamura, Yasuhisa Sano, Yuzo Mori
1999/04 Research paper (scientific journal)
Laser beam intensity profile transformation with a fabricated mirror
Koshichi Nemoto, Takashi Fujii, Naohiko Goto, Hideo Takino, Teruki Kobayashi, Norio Shibata, Kazuya Yamamura, Yuzo Mori
Applied Optics Vol. 36 No. 3 p. 551-557 1997/01/20 Research paper (scientific journal)
Mirror fabricated with nonaxisymmetric surface profile for laser beam forming and wave front correction
Koshichi Nemoto, Takashi Fujii, Naohiko Goto, Hideo Takino, Norio Shibata, Kazuya Yamamura, Yuzo Mori
Conference Proceedings - Lasers and Electro-Optics Society Annual Meeting-LEOS p. 202-203 1996 Research paper (scientific journal)
Publisher: IEEEInfluence of fabrication precision on laser beam forming by fabricated optics
K Nemoto, T Fujii, N Goto, H Takino, T Kobayashi, N Shibata, K Yamamura, Y Mori
LBOC - THIRD INTERNATIONAL WORKSHOP ON LASER BEAM AND OPTICS CHARACTERIZATION Vol. 2870 p. 558-564 1996 Research paper (international conference proceedings)
プラズマ援用研磨法の開発(第25報)-RS-SiC材のSiC成分とSi成分の酸化レートの評価-
陶通, 孫栄硯, 川合健太郎, 有馬健太, 山村和也
精密工学会大会学術講演会講演論文集 Vol. 2022 2022
プラズマ援用研磨法の開発(第24報)-CF4プラズマ照射前後におけるAlN基板とダイヤモンド砥粒との吸着力の変化-
孫栄硯, 陶通, 川合健太郎, 有馬健太, 山村和也
精密工学会大会学術講演会講演論文集 Vol. 2022 2022
プラズマ援用研磨による多結晶ダイヤモンド基板の高能率ダメージフリー 平坦・平滑化に関する研究(第1報)
杉本健太郎, 孫栄硯, 川合健太郎, 有馬健太, 山村和也
砥粒加工学会学術講演会講演論文集(CD-ROM) Vol. 2022 2022
Si表面の溝底部に埋め込んだ金属原子からの光電子検出~光電子検出量の脱出角依存性の検討~
東知樹, 孫栄硯, 川合健太郎, 山村和也, 有馬健太
精密工学会関西地方定期学術講演会講演論文集 Vol. 2022 2022
プラズマ援用研磨による単結晶ダイヤモンド基板の高能率ダメージフリー加工-研磨レートおよび表面性状の研磨圧力依存性および摺動速度依存性に関する検討-
杉本健太郎, 劉念, 吉鷹直也, 孫栄硯, 川合健太郎, 有馬健太, 山村和也
精密工学会関西地方定期学術講演会講演論文集 Vol. 2022 2022
第一原理計算を用いたナノグラフエン上の特異な超構造電子状態の解析
李君寰, 稲垣耕司, 川合健太郎, 孫栄硯, 山村和也, 有馬健太
精密工学会関西地方定期学術講演会講演論文集 Vol. 2022 2022
プラズマ援用研磨による多結晶ダイヤモンド基板の高能率ダメージフリー平坦・平滑化に関する研究(第1報)
杉本健太郎, 孫栄硯, 川合健太郎, 有馬健太, 山村和也
精密工学会大会学術講演会講演論文集 Vol. 2022 2022
中性子集光用高精度Wolterミラーマンドレルの作製(第14報)-PCVMにおける加工温度と表面粗さの相関-
須場健太, 山本有悟, 孫栄硯, 川合健太郎, 有馬健太, 山村和也, 丸山龍治, 曽山和彦, 林田洋寿
精密工学会大会学術講演会講演論文集 Vol. 2022 2022
サブ分子層の吸着水がGeO2/Ge界面の電気特性に与える影響の超精密計測
佐野修斗, 和田陽平, 孫栄硯, 川合健太郎, 山村和也, 有馬健太
精密工学会関西地方定期学術講演会講演論文集 Vol. 2022 2022
Si表面の溝底部に埋め込んだ金属原子からの光電子検出~光電子検出量の脱出角依存性の検討~
東知樹, 孫栄硯, 山村和也, 有馬健太
精密工学会大会学術講演会講演論文集 Vol. 2022 2022
数値制御プラズマCVMによるWolterミラーマンドレルの高精度加工
須場健太, 山本有悟, 孫栄硯, 川合健太郎, 有馬健太, 山村和也, 丸山龍治, 曽山和彦, 林田洋寿
精密工学会関西地方定期学術講演会講演論文集 Vol. 2022 2022
Plasma-assisted polishing for atomic surface fabrication of single crystal SiC
Jian-Wei Ji, Yamamura Kazuya, Hui Deng
Wuli Xuebao/Acta Physica Sinica Vol. 70 No. 6 2021/03/20 Book review, literature introduction, etc.
Publisher: Institute of Physics, Chinese Academy of Sciences
プラズマ援用研磨法の開発(第21報)-ビトリファイドボンド砥石を用いたドレスフリー研磨法の開発-
孫栄硯, 川合健太郎, 有馬健太, 山村和也, 永橋潤司, 野副厚訓
精密工学会大会学術講演会講演論文集 Vol. 2021 2021
減圧プラズマフッ化における焼結AlN基板のフッ化レートの評価
孫栄硯, 陶通, 川合健太郎, 有馬健太, 山村和也
精密工学会関西地方定期学術講演会講演論文集 Vol. 2021 2021
減圧プラズマ酸化における反応焼結SiCの酸化特性
陶通, 孫栄硯, 川合健太郎, 有馬健太, 山村和也
精密工学会関西地方定期学術講演会講演論文集 Vol. 2021 2021
プラズマCVM加工におけるガス組成と最適加工ギャップの関係
北出隼人, 孫栄硯, 川合健太郎, 有馬健太, 山村和也
精密工学会関西地方定期学術講演会講演論文集 Vol. 2021 2021
窒化アルミニウムセラミックス材のプラズマ援用研磨に関する研究-異なる粒径のビトリファイドボンドダイヤモンド砥石を用いたAlN基板の研磨特性-
陶通, 孫栄硯, 川合健太郎, 有馬健太, 山村和也
砥粒加工学会学術講演会講演論文集(CD-ROM) Vol. 2021 2021
プラズマ援用研磨法の開発(第22報)-フッ素系ガスを用いたプラズマ援用研磨における砥石成分の付着抑制-
孫栄硯, 陶通, 川合健太郎, 有馬健太, 山村和也
精密工学会大会学術講演会講演論文集 Vol. 2021 2021
マイクロ波プラズマジェット型プラズマCVMにおける加工痕形状の考察
北出隼人, 孫栄硯, 川合健太郎, 有馬健太, 山村和也
精密工学会大会学術講演会講演論文集 Vol. 2021 2021
プラズマ援用研磨法の開発(第23報)-AlN基板の研磨における砥粒材質と研磨特性の相関-
陶通, 孫栄硯, 川合健太郎, 有馬健太, 山村和也
精密工学会大会学術講演会講演論文集 Vol. 2021 2021
プラズマ援用研磨法の開発(第19報)-AlN基板の研磨特性の評価-
孫栄硯, 川合健太郎, 有馬健太, 山村和也
精密工学会大会学術講演会講演論文集 Vol. 2020 2020
プラズマ援用研磨法の開発(第20報)-焼結AlN基板の脱粒フリー研磨-
孫栄硯, 川合健太郎, 有馬健太, 山村和也
精密工学会大会学術講演会講演論文集 Vol. 2020 2020
プラズマ援用研磨法の開発(第18報)-フッ素系プラズマの照射によるAlN基板の表面改質効果の評価-
孫栄硯, 川合健太郎, 有馬健太, 山村和也
精密工学会大会学術講演会講演論文集 Vol. 2019 2019
プラズマCVMによる多成分材料の高精度加工に関する研究(第3報)-反応焼結SiC材の加工における反応生成堆積物の影響-
孫栄硯, 川合健太郎, 有馬健太, 山村和也, 大久保雄司
精密工学会関西地方定期学術講演会講演論文集 Vol. 2019 2019
AFM-IRを用いたポリテトラフルオロエチレン(PTFE)/天然ゴム(NR)接着体の界面分析
大久保雄司, 柴原正文, 本田幸司, 長谷朝博, 遠藤勝義, 山村和也
日本接着学会年次大会講演要旨集(CD-ROM) Vol. 57th 2019
ポリドーパミンを用いた過酸化水素分解用Pt触媒の耐久性向上
貝原大介, 青木智紀, 清野智史, 西野実沙, 中川哲哉, 遠藤勝義, 山村和也, 大久保雄司, 森理, 佐々木理衣
精密工学会関西地方定期学術講演会講演論文集 Vol. 2019 2019
中性子集光用高精度Wolterミラーマンドレルの作製（第7報）:PCVM加工における熱流入由来の加工量誤差の補正
荒川 翔平, 山本 有悟, 川合 健太郎, 有馬 健太, 山崎 大, 丸山 龍治, 林田 洋寿, 曽山 和彦, 山村 和也
精密工学会学術講演会講演論文集 Vol. 2019 No. 0 p. 695-695 2019
Publisher: 公益社団法人 精密工学会
プラズマCVMによる水晶ウエハの加工に関する研究-エタノール添加によるCF4含有大気圧Arプラズマの安定化-
孫栄硯, 川合健太郎, 有馬健太, 山村和也, 渡辺啓一郎, 宮崎史朗, 深野徹, 北田勝信
精密工学会関西地方定期学術講演会講演論文集 Vol. 2018 2018
プラズマCVMによる多成分材料の高精度加工に関する研究(第2報)-反応焼結SiC材に対する非球面形状の創成-
孫栄硯, 川合健太郎, 有馬健太, 山村和也, 大久保雄司
精密工学会大会学術講演会講演論文集 Vol. 2018 2018
反応性プラズマを援用したセラミックス材料のダメージフリー形状創成・仕上げ加工技術の開発
山村和也, 孫栄硯, 大久保雄司
粉体粉末冶金協会講演大会(Web) Vol. 2018 2018
中性子集光用高精度Wolterミラーマンドレルの作製（第6報）:PCVM加工によるWolterミラーマンドレルの形状修正
荒川 翔平, 川合 健太郎, 有馬 健太, 山崎 大, 丸山 龍治, 林田 洋寿, 曽山 和彦, 山村 和也
精密工学会学術講演会講演論文集 Vol. 2018 No. 0 p. 722-722 2018
Publisher: 公益社団法人 精密工学会
大気圧プラズマを用いた金型用反応焼結SiC材のダメージフリー形状創成・仕上げ加工技術-プラズマCVMの基礎加工特性-
孫栄硯, 大久保雄司, 遠藤勝義, 山村和也
精密工学会関西地方定期学術講演会講演論文集 Vol. 2017 2017
電子線照射還元法により担持したPtナノ粒子のH2O2分解触媒活性に及ぼす担体材料の影響
青木智紀, 大久保雄司, 清野智史, 小玉欣典, 中川哲哉, 河本懐, 遠藤勝義, 森理, 伊藤一作, 山村和也
表面技術協会講演大会講演要旨集 Vol. 136th 2017
Adhesive-free adhesion between polytetrafluoroethylene (PTFE) and isobutylene-isoprene rubber (IIR) via heat-assisted plasma treatment (vol 7, pg 6432, 2017)
Y. Ohkubo, K. Ishihara, H. Sato, M. Shibahara, A. Nagatani, K. Honda, K. Endo, K. Yamamura
RSC ADVANCES Vol. 7 No. 63 p. 39928-39928 2017 Other
中性子集光用高精度Wolterミラーマンドレルの作製（第4報）:石英ガラス製回転体基盤に対するプラズマジェット加工特性の評価
小林 勇輝, 後藤 惟樹, 遠藤 勝義, 山崎 大, 丸山 龍治, 林田 洋寿, 曽山 和彦, 山村 和也
精密工学会学術講演会講演論文集 Vol. 2017 No. 0 p. 973-974 2017
Publisher: 公益社団法人 精密工学会
中性子集光用高精度Wolterミラーマンドレルの作製（第5報）:PCVM加工における加工変質層が及ぼす加工特性への影響の評価
小林 勇輝, 荒川 翔平, 遠藤 勝義, 山崎 大, 丸山 龍治, 林田 洋寿, 曽山 和彦, 山村 和也
精密工学会学術講演会講演論文集 Vol. 2017 No. 0 p. 865-866 2017
Publisher: 公益社団法人 精密工学会
Surface Modification of Fluoropolymers via Heat-Assisted Plasma Treatment
Vol. 36 No. 10 p. 13-20 2016/10
Publisher: シーエムシー出版
中性子集光用高精度Wolterミラーマンドレルの作製（第2報）:マイクロ波プラズマジェット加工における加工速度のCF4/O2組成依存性
小林 勇輝, 後藤 惟樹, 遠藤 勝義, 山崎 大, 丸山 龍治, 林田 洋寿, 曽山 和彦, 山村 和也
精密工学会学術講演会講演論文集 Vol. 2016 No. 0 p. 277-278 2016
Publisher: 公益社団法人 精密工学会
中性子集束用高精度Wolterミラーマンドレルの作製:集束性能に影響を及ぼす形状誤差の光線追跡シミュレーションによる評価
後藤 惟樹, 小林 勇輝, 遠藤 勝義, 山崎 大, 丸山 龍治, 林田 洋寿, 曽山 和彦, 山村 和也
精密工学会学術講演会講演論文集 Vol. 2016 No. 0 p. 915-916 2016
Publisher: 公益社団法人 精密工学会
フッ素樹脂と金属膜の強力接着技術 (新規材料創出に繋がる表面改質)
大久保 雄司, 山村 和也
コンバーテック Vol. 43 No. 2 p. 51-54 2015/02
Publisher: 加工技術研究会
フッ素樹脂/異種材料(ゴム・金属)の強力接着 (特集 異種材料接着のための界面科学(複合材料界面も含む))
大久保 雄司, 山村 和也
接着の技術 = Adhesion technology, Japan Vol. 35 No. 3 p. 38-42 2015
Publisher: 日本接着学会
Atomic-scale planarization of 4H-SiC (0001) by combination of thermal oxidation and abrasive polishing (vol 103, 111603, 2013)
Hui Deng, Katsuyoshi Endo, Kazuya Yamamura
APPLIED PHYSICS LETTERS Vol. 103 No. 18 2013/10 Other
28pRC-5 Observation of Gravitationally Bound Quantum States of Ultracold Neutrons and Search for New Short-range Forces From Experimental Results
Ichikawa Go, Komamiya Sachio, Kamiya Yoshio, Yamamura Kazuya, Nagano Mikinori
Meeting abstracts of the Physical Society of Japan Vol. 68 No. 1 p. 37-37 2013/03/26
Publisher: The Physical Society of Japan (JPS)
The 4th International Symposium on Atomically Controlled Fabrication Technology Preface
Kazuto Yamauchi, Kazuya Yamamura
CURRENT APPLIED PHYSICS Vol. 12 p. S1-S1 2012/12 Other
25pCL-11 Angular-divergent neutron reflectometry using high-performance focusing supermirrors
Yamazaki D., Maruyama R., Hayashida H., Soyama K., Nagano M., Yamaga K., Yamamura K.
Meeting Abstracts of the Physical Society of Japan Vol. 67 No. 0 p. 1007-1007 2012
Publisher: The Physical Society of Japan
中性子集光用回転楕円ミラーの作製 第IV報:小径球面パッドを用いた形状修正研磨における体積加工速度の安定化
山崎 健太, 永野 幹典, 光嶋 直樹, 山村 和也, 丸山 龍治, 林田 洋寿, 山崎 大, 曽山 和彦
精密工学会学術講演会講演論文集 Vol. 2012 No. 0 p. 409-410 2012
Publisher: 公益社団法人 精密工学会
Development of multiply-arranged elliptical neutron focusing supermirror device:Alignment system for 4-1millimeter-thick elliptical mirror substrate
Nagano Mikinori, Yamaga Fumiya, Yamazaki Dai, Maruyama Ryuji, Hayashida Hirotoshi, Soyama Kazuhiko, Yamamura Kazuya
Proceedings of JSPE Semestrial Meeting Vol. 2012 No. 0 p. 1147-1148 2012
Publisher: The Japan Society for Precision Engineering
中性子集光用回転楕円ミラーの作製 第III報:小径パッドを用いた回転体石英マンドレルの形状修正と表面仕上げ
山崎 健太, 永野 幹典, 山家 史也, 山村 和也, 丸山 龍治, 林田 洋寿, 山崎 大, 曽山 和彦
精密工学会学術講演会講演論文集 Vol. 2012 No. 0 p. 1149-1150 2012
Publisher: 公益社団法人 精密工学会
One-dimensional neutron focusing with large beam divergence by 400mm-long elliptical supermirror
M. Nagano, F. Yamaga, D. Yamazaki, R. Maruyama, H. Hayashida, K. Soyama, K. Yamamura
5TH EUROPEAN CONFERENCE ON NEUTRON SCATTERING Vol. 340 2012
Single-nanometer focusing of hard x-rays by Kirkpatrick-Baez mirrors
Kazuto Yamauchi, Hidekazu Mimura, Takashi Kimura, Hirokatsu Yumoto, Soichiro Handa, Satoshi Matsuyama, Kenta Arima, Yasuhisa Sano, Kazuya Yamamura, Koji Inagaki, Hiroki Nakamori, Jangwoo Kim, Kenji Tamasaku, Yoshinori Nishino, Makina Yabashi, Tetsuya Ishikawa
JOURNAL OF PHYSICS: CONDENSED MATTER Vol. 23 No. 39 p. 394206 1-394206 2 2011/10 Book review, literature introduction, etc.
M. Nagano, F. Yamaga, D. Yamazaki, R. Maruyama, K. Soyama, K. Yamamura
High-precision figured, thin supermirror substrates for multiple neutron focusing device
Proceedings of 5th European Conference on Neutron Scattering 2011/07
One-dimensional neutron focusing with large beam divergence by 400mm-long elliptical supermirror
M. Nagano, F. Yamaga, D. Yamazaki, R. Maruyama, K. Soyama, K. Yamamura
5TH EUROPEAN CONFERENCE ON NEUTRON SCATTERING Vol. 340 2011/07
High-integrity finishing of reaction sintered SiC by plasma assisted polishing using ceria abrasive
K. Yamamura, M. Ueda, H. Deng, N. Zettsu
Proceedings of 11th International Conference of the European Society for Precision Engineering and Nanotechnology Vol. pp.422-426. 2011/05
Plasma assisted polishing of single crystal SiC for obtaining atomically flat strain-free surface
K. Yamamura, T. Takiguchi, M. Ueda, H. Deng, A.N. Hattori, N. Zettsu
Annals of the CIRP, 60 (2011) 571-574. Vol. 60 No. 1 p. 571-574 2011/05
触媒フリー無電解銅めっきプロセスによるフッ素樹脂表面の高密着性銅メタライジング
是津 信行, 山村 和也
大阪大学低温センターだより Vol. 154 p. 20-26 2011/04
Publisher: 大阪大学低温センター
Fabrication of discrete polystyrene nanoparticle arrays with controllable their structural parameters
S. Uchida, K. Yamamura, N. Zettsu
J. Nanosci. Nanotechnol. 11 (2011) 2956-2961. Vol. 11 No. 4 p. 2956-2961 2011/04
Development of fabrication process for aspherical neutron focusing mirror using numerically controlled local wet etching with low-pressure polishing
M. Nagano, F. Yamaga, N. Zettsu, D. Yamazaki, R. Maruyama, K. Soyama, K. Yamamura
Nucl. Instr. and Meth., A 634 (2011) S112-S116. Vol. 634 p. S112-S116 2011/04
Finishing of AT-Cut Quartz Crystal Wafer with Nanometric Thickness Uniformity by Pulse-Modulated Atmospheric Pressure Plasma Etching
Kazuya Yamamura, Masaki Ueda, Masafumi Shibahara, Nobuyuki Zettsu
JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY Vol. 11 No. 4 p. 2922-2927 2011/04
Simple and Versatile Route to High Yield Face-to-Face Dimeric Assembly of Ag Nanocubes and Their Surface Plasmonic Properties
Shuhei Uchida, Atsushi Taguchi, Munehisa Mitani, Taro Ichimura, Satoshi Kawata, Kazuya Yamamura, Nobuyuki Zettsu
JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY Vol. 11 No. 4 p. 2890-2896 2011/04
Improvement in Thickness Uniformity of Thick SOI by Numerically Controlled Local Wet Etching
Kazuya Yamamura, Kazuaki Ueda, Mao Hosoda, Nobuyuki Zettsu
JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY Vol. 11 No. 4 p. 2910-2915 2011/04
Thinning of 2-inch SiC wafer by plasma chemical vaporization machining using cylindrical rotary electrode
Yasuhisa Sano, Takehiro Kato, Kohei Aida, Kazuya Yamamura, Hidekazu Mimura, Satoshi Matsuyama, Kazuto Yamauchi
Materials Science Forum Vol. 679-680 p. 481-+ 2011/04
Simple and versatile route to high yield face-to-face dimeric assembly of Ag nanocubes and their surface plasmonic properties
S. Uchida, A. Taguchi, M. Mitani, T. Ichimura, S. Kawata, K. Yamamura, N. Zettsu
, J. Nanosci. Nanotechnol. 11 (2011) 2890-2896. Vol. 11 No. 4 p. 2890-2896 2011/04
Improvement in thickness uniformity of thick SOI by numerically controlled local wet etching
K. Yamamura, K. Ueda, M. Hosoda, N. Zettsu
J. Nanosci. Nanotechnol. 11 (2011) 2910-2915. Vol. 11 No. 4 p. 2910-2915 2011/04
Development of fabrication process for aspherical neutron focusing mirror using numerically controlled local wet etching with low-pressure polishing
M. Nagano, F. Yamaga, N. Zettsu, D. Yamazaki, R. Maruyama, K. Soyama, K. Yamamura
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT Vol. 634 p. S112-S116 2011/04
Finishing of AT-cut quartz crystal wafer with nanometric thickness uniformity by pulse-modulated atmospheric pressure plasma etching
K. Yamamura, M. Ueda, M. Shibahara, N. Zettsu
J. Nanosci. Nanotechnol. 11 (2011) 2922-2927. Vol. 11 No. 4 p. 2922-2927 2011/04
Fabrication of Discrete Polystyrene Nanoparticle Arrays with Controllable Their Structural Parameters
Shuhei Uchida, Kazuya Yamamura, Nobuyuki Zettsu
JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY Vol. 11 No. 4 p. 2956-2961 2011/04
28aGB-12 Observation Experiment of Gravity Induced Quantum States of Ultra-Cold Neutrons Upgrade of Experimental Setup
Minami Yuto, Ichikawa Go, Komamiya Sachio, Kamiya Yoshio, Kawasaki Shinsuke, Sanuki Tomoyuki
Meeting Abstracts of the Physical Society of Japan Vol. 66 No. 0 p. 31-31 2011
Publisher: The Physical Society of Japan
非対称構造を有するPS@Auナノシェルアレイの作製と近赤外プラズモン特性
内田修平, 田口敦清, 南本大穂, 津田哲哉, 山村和也, 是津信行
応用物理学会学術講演会講演予稿集(CD-ROM) Vol. 72nd 2011
Development of multiply-arranged elliptical neutron focusing supermirror device:Estimation of alignment accuracy by ray-trace simulation
Yamaga Fumiya, Nagano Mikinori, Zettsu Nobuyuki, Yamazaki Dai, Maruyama Ryuji, Hayashida Hirotoshi, Soyama Kazuhiko, Yamamura Kazuya
Proceedings of JSPE Semestrial Meeting Vol. 2011 No. 0 p. 503-504 2011
Publisher: The Japan Society for Precision Engineering
Effect of Si interlayers on the magnetic and mechanical properties in Fe/Ge neutron polarizing multilayer mirror
maruyama ryuji, yamazaki dai, okayasu satoru, takeda masayasu, zettsu nobuyuki, nagano mikinori, yamamura kazuya, hayashida hirotoshi, soyama kazuhiko
Proceedings of Annual / Fall Meetings of Atomic Energy Society of Japan Vol. 2011 No. 0 p. 122-122 2011
Publisher: Atomic Energy Society of Japan
Dicing of SiC wafer by PCVM (Plasma Chemical Vaporization Machining) with shadow mask
Nishikawa Hiroaki, Sano Yasuhisa, Aida Kouhei, Yamamura Kazuya, Matsuyama Satoshi, Yamauchi Kazuto
Proceedings of JSPE Semestrial Meeting Vol. 2011 No. 0 p. 509-510 2011
Publisher: The Japan Society for Precision Engineering
High Adhesion PTFE/epoxy Interface Enabled by Exotic Plasmas-assisted Morphological and Molecular Designs
Y. Idutsu, N. Zettsu, K. Yamamura
Proceedings of the Eleventh International Symposium on Biomimetic Materials Processing (BMMP-11)(2010)P-36. 2011/01
Thinning of 2-inch SiC Wafer by Plasma Chemical Vaporization Machining Using Cylindrical Rotary Electrode
Yasuhisa Sano, Takehiro Kato, Kohei Aida, Kazuya Yamamura, Hidekazu Mimura, Satoshi Matsuyama, Kazuto Yamauchi
SILICON CARBIDE AND RELATED MATERIALS 2010 Vol. 679-680 p. 481-+ 2011
Plasma assisted polishing of single crystal SiC for obtaining atomically flat strain-free surface
K. Yamamura, T. Takiguchi, M. Ueda, H. Deng, A. N. Hattori, N. Zettsu
CIRP ANNALS-MANUFACTURING TECHNOLOGY Vol. 60 No. 1 p. 571-574 2011
High Adhesion PTFE/epoxy Interface Enabled by Exotic Plasmas-assisted Morphological and Molecular Designs
Proceedings of the Eleventh International Symposium on Biomimetic Materials Processing (BMMP-11)(2010)P-36. 2011
M. Nagano, F. Yamaga, D. Yamazaki, R. Maruyama, K. Soyama, K. Yamamura
Proceedings of 5th European Conference on Neutron Scattering 2011
Neutron beam focusing using large-m supermirrors coated on precisely-figured aspheric surfaces
D. Yamazaki, R. Maruyama, K. Soyama, H. Takai, M. Nagano, K. Yamamura
J. Phys. Conf. Ser. 251 (2010) 012076_1_4. Vol. 251 2010/12
Fabrication of plano-elliptical neutron focusing supermirror by numerically controlled local wet etching with ion beam sputter deposition
M Nagano, H Takai, D Yamazaki, R Maruyama, K Soyama, K Yamamura
J. Phys. Conf. Ser. 251 (2010) 012077_1_4. Vol. 251 2010/12
Atmospheric pressure plasma liquid deposition of copper nanoparticles onto poly(4-vinylpyridine)-grafted-poly(tetrafluoroethylene) surface
Hiroki Akiyama, Kazuya Yamamura, Nobuyuki Zettsu
Transactions of MRS-J, 35 (2010) pp.817-820. Vol. Transactions of MRS-J, 35 (2010) pp.817-820. No. 4 p. 817-820 2010/12
Publisher: The Materials Research Society of Japan
Figuring of Damage-Free Cylindrical Silicon Crystal Substrate for a Focusing X-ray Spectrometer by Plasma Chemical Vaporization Machining
M. Hosoda, M. Nagano, N. Zettsu, S. Shimada, K. Taniguchi, K. Yamamura
Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology, P-7, 72-73. Vol. P-7, 72-73. 2010/11
Fabrication of High-Precision Elliptical Neutron Focusing Supermirror with Large Clear Aperture
M. Nagano, F. Yamaga, N. Zettsu, D. Yamazaki, R. Maruyama, K. Soyama, K. Yamamura
Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication, P-11, 80-81. Vol. P-11, 80-81. 2010/11
Shape Control Synthesis of QDs with Chemical Composition Gradients for Light Emitting Devices
U. Farva, K. Yamamura, N. Zettsu
Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology, P-32, 122-123. Vol. P-32, 122-123. 2010/11
Atmospheric Pressure Plasma Liquid Deposition of Copper Nanoparticles onto Poly(4-vinylpyrdine)-grafted-poly (tetrafluoroethylente) Surface
H. Akiyama, Y. Oshikane, N. Zettsu, K. Yamamura
Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology, P-57, 172-173. Vol. P-57, 172-173. No. 4 p. 817-820 2010/11
Publisher: The Materials Research Society of Japan
Machining Properties of Reaction-Sintered Silicon Carbide by Plasma Assisted Machining
M. Ueda, S. Morinaga, H. Deng, N. Zettsu, K. Yamamura
Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology, P-65, 188-189. Vol. P-65, 188-189. 2010/11
Thinning of SiC Wafer by Plasma Chemical Vaporization Machining
K. Aida, Y. Sano, H. Nishikawa, K. Yamamura, H. Mimura, S. Matsuyama, K. Yamauchi
Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology, P-66, 190-191. Vol. P-66, 190-191. 2010/11
Development of Chemical Processing Methods for Silicon Carbide Wafering and Device Processing
Y. Sano, K. Yamamura, K. Arima, K. Yamauchi
Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology, 6.2, 54-55. Vol. 6.2, 54-55. 2010/11
Fabrication of Shape Controlled Metal Nanodot Arrays by Autonomous Liquid-phase Nanoscale Processing as well as Their Charge Injection Characteritics for Floating Nanodot Gate Memory
N. Zettsu, S. Matsuura, A. Watanabe, K. Yamamura, T. Hosoi, H. Watanabe
Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology, 4.4, 42-43. Vol. 4.4, 42-43. 2010/11
Fabrication of Ultraprecision Millimeter-thick Neutron Focusing Supermirror by Numerically Controlled Local Wet Etching and Low-pressure Polishing
F. Yamaga, M. Nagano, K. Yamasaki, N. Zettsu, D. Yamazaki, R. Maruyama, K. Soyama, K. Yamamura
Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology, P-3, 64-65. Vol. P-3, 64-65. 2010/11
Fabrication of Metallodielectric Plasmonic Nanoshell Arrays for A Label-Free Immunoassay Based on NIR-light Responsive LSPR
S. Uchida, K. Yamamura, N. Zettsu
Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology, P-12, 82-83. Vol. P-12, 82-83. 2010/11
Plasma Assisted Polishing of Reaction-Sintered Silicon Carbide
Kazuya Yamamura, Masaki Ueda, Tatsuya Takiguchi, Nobuyuki Zettsu
Proceedings of 25th Annual Meeting of the American Society for Precision Engineering (ASPE) 61-64. 2010/10
Surface Modification by Water Vapor Plasma for Damage-free Roughness Smoothing of 4H-SiC
Kazuya Yamamura, Tatsuya Takiguchi, Masaki Ueda, Azusa N. Hattori, Nobuyuki Zettsu
proceedings of 63rd Gaseous Electronics Conference (GEC) and 7th International Conference on Reactive Plasmas(ICRP),DTP-067 2010/10
Catalyst-free electroless Cu plating of fluoropolymer surface through an atmospheric pressure plasma assisted self-assembly
Nobuyuki Zettsu, Hiroki Akiyama, Kazuya Yamamura
Proceedings of 63rd Gaseous Electronics Conference (GEC) and 7th International Conference on Reactive Plasmas(ICRP), DTP-069 2010/10
Atmospheric pressure plasma liquid deposition of Cu nanoparticles onto P4VP-grafted-PTFE surface and their autocatalytic characteristics
Nobuyuki Zettsu, Hiroki Akiyama, Kazuya Yamamura
Proceedings of 63rd Gaseous Electronics Conference (GEC) and 7th International Conference on Reactive Plasmas(ICRP), ET3-003 2010/10
Figuring of Millimeter-Thick Elliptical Mirror Substrate Using Numerically Controlled Local Wet Etching With Low-Pressure Polishing
M.Nagano, F.Yamaga, N.Zettsu, D.Yamazaki, R.Maruyama, K.Soyama, K.Yamamura
Proceedings of 25th Annual Meeting of the American Society for Precision Engineering (ASPE), 21-24. 2010/10
Fabrication of a single layer of polystyrene nanoparticle array, and their use as templates for NIR-light responsible metallodielectric plasmonic nanoshells
Shuhei Uchida, Kazuya Yamamura, Nobuyuki Zettsu
Proceedings of 63rd Gaseous Electronics Conference (GEC) and 7th International Conference on Reactive Plasmas(ICRP), DTP-068 2010/10
Plasma assisted finishing of difficult-to-machine materials
Kazuya Yamamura
Proceedings of 2nd International Conference on Nanomanufacturing, nanaMan00189(Invited) 2010/09
Thinning of 2-inch SiC wafer by plasma chemical vaporization machining
Y. Sano, T. Kato, K. Yamamura, H. Mimura, S. Matsuyama, K. Yamauchi
Abstract Booklet of the 8th European Conference on Silicon Carbide and Related Materials Vol. TP-155 2010/08
Beveling of Silicon Carbide Wafer by Plasma Etching Using Atmospheric-Pressure Plasma
Yasuhisa Sano, Takehiro Kato, Kazuya Yamamura, Hidekazu Mimura, Satoshi Matsuyama, Kazuto Yamauchi
JAPANESE JOURNAL OF APPLIED PHYSICS Vol. 49 No. 8 2010/08
Dicing of SiC wafer by atmospheric-pressure plasma etching process with wire electrode
Yasuhisa Sano, Kohei Aida, Kazuya Yamamura, Hidekazu Mimura, Satoshi Matsuyama, Kazuto Yamauchi
2010/08
Removal characteristics of plasma chemical vaporization machining with a pipe electrode for optical fabrication
Hideo Takino, Kazuya Yamamura, Yasuhisa Sano, Yuzo Mori
Appl. Opt. 49 (2010) 4434-4440. Vol. 49 No. 23 p. 4434-4440 2010/08
Removal characteristics of plasma chemical vaporization machining with a pipe electrode for optical fabrication
Hideo Takino, Kazuya Yamamura, Yasuhisa Sano, Yuzo Mori
APPLIED OPTICS Vol. 49 No. 23 p. 4434-4440 2010/08
Beveling of Silicon Carbide Wafer by Plasma Etching Using Atmospheric-Pressure Plasma
Yasuhisa Sano, Takehiro Kato, Kazuya Yamamura, Hidekazu Mimura, Satoshi Matsuyama, Kazuto Yamauchi
Japanese Journal of Applied Physics Vol. 49 No. 8 2010/08
Development of Atmospheric-Pressure-Plasma-Assisted High-efficient and High-integrity Machining Process of Difficult-to-Machine Materials
K. Yamamura, T. Takiguchi, N. Zettsu
Proceedings of 10th International Conference of the European Society for Precision Engineering and Nanotechnology 2010/06
Fabrication of Ultraprecision Millimeter-thick Elliptical Neutron Focusing Mirror Substrate by Local Wet Etching
Fumiya Yamaga, Mikinori Nagano, Nobuyuki Zettsu, Dai Yamazaki, Ryuji Maruyama, Kazuhiko Soyama, Kazuya Yamamura
Key Engineering Materials, 447-448 (2010) 208-212. Vol. 447-448 p. 208-+ 2010/06
Fabrication of Damage-free Curved Silicon Crystal Substrate for a Focusing X-ray Spectrometer by Plasma Chemical Vaporization Machining
Mao Hosoda, Kazuaki Ueda, Mikinori Nagano, Nobuyuki Zettsu, Shoichi Shimada, Kazuo Taniguchi, Kazuya Yamamura
Key Engineering Materials, 447-448 (2010) 213-217. Vol. 447-448 p. 213-+ 2010/06
Effect of Substrate Heating in Thickness Correction of Quartz Crystal Wafer by Plasma Chemical Vaporization Machining
Masaki Ueda, Masafumi Shibahara, Nobuyuki Zettsu, Kazuya Yamamura
Key Engineering Materials, 447-448 (2010) 218-222. Vol. 447-448 p. 218-+ 2010/06
Chemical machining processes using atmospheric pressure plasma
Yasuhisa Sano, Kazuya Yamamura, Kazuto Yamauchi
Optical and Electro-optical Engineering Contact Vol. 第48巻 第6号 2010/06
Fabrication of damage-free Johansson-type doubly curved crystal spectrometer substrate by numerically controlled local wet etching
K. Yamamura, K. Ueda, M. Nagano, N. Zettsu, S. Maeo, S. Shimada, T. Utaka, K. Taniguchi
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT Vol. 616 No. 2-3 p. 281-284 2010/05
High-reflectivity (m=4) elliptical neutron focusing supermirror fabricated by numerically controlled local wet etching with ion beam sputter deposition
K. Yamamura, M. Nagano, N. Zettsu, D. Yamazaki, R. Maruyama, K. Soyama
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT Vol. 616 No. 2-3 p. 193-196 2010/05
High-precision damage-free fabrication of quartz crystal wafer by plasma chemical vaporization machining
Kazuya Yamamura
Journal of the Japan Society for Abrasive Technology Vol. 54 No. 5 p. 276-279 2010/05
Publisher: 砥粒加工学会
Fabrication of discrete array of metallodielectric nanoshells and their surface plasmonic properties
Shuhei Uchida, Kazuya Yamamura, Nobuyuki Zettsu
THIN SOLID FILMS Vol. 518 No. 13 p. 3581-3584 2010/04
Atmospheric pressure plasma liquid deposition of copper nanoparticles on poly(4-vinylpyridine)-grafted-poly(tetrafluoroethylene) surface and their autocatalytic properties
Hiroki Akiyama, Nobuyuki Zettsu, Kazuya Yamamura
Thin Solid Films, 518 (2010) 3351-3354. Vol. 518 No. 13 p. 3551-3554 2010/04
Fabrication of discrete array of metallodielectric nanoshells and their surface plasmonic properties
Shuhei Uchida, Kazuya Yamamura, Nobuyuki Zettsu
Thin Solid Films, 518 (2010) 3581-3584. Vol. 518 No. 13 p. 3581-3584 2010/04
Atmospheric pressure plasma liquid deposition of copper nanoparticles on poly(4-vinylpyridine)-grafted-poly(tetrafluoroethylene) surface and their autocatalytic properties
Hiroki Akiyama, Nobuyuki Zettsu, Kazuya Yamamura
THIN SOLID FILMS Vol. 518 No. 13 p. 3551-3554 2010/04
Fabrication of 400 mm-long elliptical neutron focusing supermirror by local wet etching with ion beam sputter deposition
M. Nagano, F. Yamaga, N. Zettsu, D. Yamazaki, R. Maruyama, K. Soyama, K. Yamamura
2010/03
Focusing Devices using Spheroidal Supermirrors
K. Soyama, D. Yamazaki, R. Maruyama, M. Nagano, F. Yamaga, N. Zettsu, K. Yamamura
2010/03
Breaking the 10 nm barrier in hard-X-ray focusing
Hidekazu Mimura, Soichiro Handa, Takashi Kimura, Hirokatsu Yumoto, Daisuke Yamakawa, Hikaru Yokoyama, Satoshi Matsuyama, Kouji Inagaki, Kazuya Yamamura, Yasuhisa Sano, Kenji Tamasaku, Yoshinori Nishino, Makina Yabashi, Tetsuya Ishikawa, Kazuto Yamauchi
NATURE PHYSICS Vol. 6 No. 2 p. 122-125 2010/02
24pWZ-6 Wide-band neutron focusing with a high precision elliptic supermirror
Yamazaki D., Maruyama R., Hayashida H., Soyama K., Nagano M., Yamaga F., Yamamura K.
Meeting Abstracts of the Physical Society of Japan Vol. 65 No. 0 p. 913-913 2010
Publisher: The Physical Society of Japan
PCVM (Plasma Chemical Vaporization Machining)を用いた2インチSiC基板の全面加工
会田 浩平, 佐野 泰久, 西川 央明, 山村 和也, 三村 秀和, 松山 智至, 山内 和人
精密工学会学術講演会講演論文集 Vol. 2010 No. 0 p. 735-736 2010
Crystal Growth Technology (Chapter 18; Crystal Machining Using Atmospheric Pressure Plasma)
WILEY-VCH 2010
Fabrication of a single layer of polystyrene nanoparticle array, and their use as templates for NIR-light responsible metallodielectric plasmonic nanoshells
Proceedings of 63rd Gaseous Electronics Conference (GEC) and 7th International Conference on Reactive Plasmas(ICRP), DTP-068 2010
Fabrication of Metallodielectric Plasmonic Nanoshell Arrays for A Label-Free Immunoassay Based on NIR-light Responsive LSPR
Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology, P-12, 82-83. Vol. P-12, 82-83. 2010
Thinning of SiC wafer by plasma chemical vaporization machining
Yasuhisa Sano, Takehiro Kato, Tsutomu Hori, Kazuya Yamamura, Hidekazu Mimura, Yoshiaki Katsuyama, Kazuto Yamauchi
Material Science Forum, 645-648 (2010) 857-860. Vol. 645-648 p. 857-+ 2010/01
Fabrication of plano-elliptical neutron focusing supermirror by numerically controlled local wet etching with ion beam sputter deposition
M. Nagano, H. Takai, D. Yamazaki, R. Maruyama, K. Soyama, K. Yamamura
INTERNATIONAL CONFERENCE ON NEUTRON SCATTERING 2009 Vol. 251 2010
Focusing Devices using Spheroidal Supermirrors
2010
プラズマCVMによる水晶ウエハの高精度ダメージフリー加工
砥粒加工学会誌 Vol.54 (2010) 276-279. Vol. Vol.54, No.5 (2010) 276-279. 2010
Fabrication of Damage-free Curved Silicon Crystal Substrate for a Focusing X-ray Spectrometer by Plasma Chemical Vaporization Machining
Mao Hosoda, Kazuaki Ueda, Mikinori Nagano, Nobuyuki Zettsu, Shoichi Shimada, Kazuo Taniguchi, Kazuya Yamamura
ADVANCED PRECISION ENGINEERING Vol. 447-448 p. 213-+ 2010
Effect of Substrate Heating in Thickness Correction of Quartz Crystal Wafer by Plasma Chemical Vaporization Machining
Masaki Ueda, Masafumi Shibahara, Nobuyuki Zettsu, Kazuya Yamamura
ADVANCED PRECISION ENGINEERING Vol. 447-448 p. 218-+ 2010
大気圧プラズマによるエッチングを応用した種々の加工法とその特性
光技術コンタクト Vol. 第48巻 第6号 2010
Dicing of SiC wafer by atmospheric-pressure plasma etching process with wire electrode
2010
Thinning of 2-inch SiC wafer by plasma chemical vaporization machining
Abstract Booklet of the 8th European Conference on Silicon Carbide and Related Materials Vol. TP-155 2010
Crystal Growth Technology (Chapter 18; Crystal Machining Using Atmospheric Pressure Plasma)
WILEY-VCH 2010
Plasma assisted finishing of difficult-to-machine materials
Proceedings of 2nd International Conference on Nanomanufacturing, nanaMan00189(Invited) 2010
Plasma Assisted Polishing of Reaction-Sintered Silicon Carbide
Proceedings of 25th Annual Meeting of the American Society for Precision Engineering (ASPE) 61-64. 2010
Figuring of Millimeter-Thick Elliptical Mirror Substrate Using Numerically Controlled Local Wet Etching With Low-Pressure Polishing
Proceedings of 25th Annual Meeting of the American Society for Precision Engineering (ASPE), 21-24. 2010
Surface Modification by Water Vapor Plasma for Damage-free Roughness Smoothing of 4H-SiC
proceedings of 63rd Gaseous Electronics Conference (GEC) and 7th International Conference on Reactive Plasmas(ICRP),DTP-067 2010
Catalyst-free electroless Cu plating of fluoropolymer surface through an atmospheric pressure plasma assisted self-assembly
Proceedings of 63rd Gaseous Electronics Conference (GEC) and 7th International Conference on Reactive Plasmas(ICRP), DTP-069 2010
Atmospheric pressure plasma liquid deposition of Cu nanoparticles onto P4VP-grafted-PTFE surface and their autocatalytic characteristics
Proceedings of 63rd Gaseous Electronics Conference (GEC) and 7th International Conference on Reactive Plasmas(ICRP), ET3-003 2010
Fabrication of High-Precision Elliptical Neutron Focusing Supermirror with Large Clear Aperture
Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication, P-11, 80-81. Vol. P-11, 80-81. 2010
Shape Control Synthesis of QDs with Chemical Composition Gradients for Light Emitting Devices
Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology, P-32, 122-123. Vol. P-32, 122-123. 2010
Atmospheric Pressure Plasma Liquid Deposition of Copper Nanoparticles onto Poly(4-vinylpyrdine)-grafted-poly (tetrafluoroethylente) Surface
Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology, P-57, 172-173. Vol. P-57, 172-173. 2010
Machining Properties of Reaction-Sintered Silicon Carbide by Plasma Assisted Machining
Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology, P-65, 188-189. Vol. P-65, 188-189. 2010
Thinning of SiC Wafer by Plasma Chemical Vaporization Machining
Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology, P-66, 190-191. Vol. P-66, 190-191. 2010
Figuring of Damage-Free Cylindrical Silicon Crystal Substrate for a Focusing X-ray Spectrometer by Plasma Chemical Vaporization Machining
Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology, P-7, 72-73. Vol. P-7, 72-73. 2010
Development of Chemical Processing Methods for Silicon Carbide Wafering and Device Processing
Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology, 6.2, 54-55. Vol. 6.2, 54-55. 2010
Fabrication of Shape Controlled Metal Nanodot Arrays by Autonomous Liquid-phase Nanoscale Processing as well as Their Charge Injection Characteritics for Floating Nanodot Gate Memory
Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology, 4.4, 42-43. Vol. 4.4, 42-43. 2010
Fabrication of Ultraprecision Millimeter-thick Neutron Focusing Supermirror by Numerically Controlled Local Wet Etching and Low-pressure Polishing
Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology, P-3, 64-65. Vol. P-3, 64-65. 2010
Neutron beam focusing using large-m supermirrors coated on precisely-figured aspheric surfaces
D. Yamazaki, R. Maruyama, K. Soyama, H. Takai, M. Nagano, K. Yamamura
INTERNATIONAL CONFERENCE ON NEUTRON SCATTERING 2009 Vol. 251 2010
Thinning of SiC wafer by plasma chemical vaporization machining
Yasuhisa Sano, Takehiro Kato, Tsutomu Hori, Kazuya Yamamura, Hidekazu Mimura, Yoshiaki Katsuyama, Kazuto Yamauchi
SILICON CARBIDE AND RELATED MATERIALS 2009, PTS 1 AND 2 Vol. 645-648 p. 857-+ 2010
Development of Atmospheric-Pressure-Plasma-Assisted High-efficient and High-integrity Machining Process of Difficult-to-Machine Materials
Proceedings of 10th International Conference of the European Society for Precision Engineering and Nanotechnology 2010
Fabrication of Ultraprecision Millimeter-thick Elliptical Neutron Focusing Mirror Substrate by Local Wet Etching
Fumiya Yamaga, Mikinori Nagano, Nobuyuki Zettsu, Dai Yamazaki, Ryuji Maruyama, Kazuhiko Soyama, Kazuya Yamamura
ADVANCED PRECISION ENGINEERING Vol. 447-448 p. 208-+ 2010
High-precision finishing of AT-cut quartz crystal wafer by plasma chemical vaporization machining
M. Ueda, M. Nagano, N. Zettsu, M. Shibahara, K. Yamamura
3rd International Conference of Asian Society for Precision Engineering and Nanotechnology Vol. 1P2-6 2009/11
Improvement of Thickness Uniformity of SOI Layer by Numerically Controlled Local Wet Etching
K. Ueda, M. Hosoda, M. Nagano, N. Zettsu, K. Yamamura
3rd International Conference of Asian Society for Precision Engineering and Nanotechnology Vol. 2C-12 2009/11
Dicing of SiC Wafer by Plasma Chemical Vaporization Machining with Wire Electrode
K. Aida, Y. Sano, K. Yamamura, H. Mimura, S. Matsuyama, K. Yamauchi
Second International Symposium on Atomically Controlled Fabrication Technology Vol. pp. 188-189. 2009/11
Improvement of thickness uniformity of thick-SOI by numerically controlled local wet etching
K. Ueda, M. Hosoda, M. Nagano, N. Zettsu, K. Yamamura
Second International Symposium on Atomically Controlled Fabrication Technology Vol. pp. 180-181. 2009/11
High-precision correction of thickness distribution of AT-cut quartz crystal wafer by pulse-modulated atmospheric pressure plasma etching
M. Ueda, M. Nagano, N. Zettsu, M. Shibahara, K. Yamamura
Second International Symposium on Atomically Controlled Fabrication Technology Vol. pp. 178-179. 2009/11
Fabrication of non-close packed periodic polymer nanoparticle arrays controllable their structural parameters
S. Uchida, N. Zettsu, K. Yamamura
3rd International Conference of Asian Society for Precision Engineering and Nanotechnology Vol. 2C-14 2009/11
Atmospheric pressure plasma liquid deposition of copper nanoparticles on poly(4-vinylpyridine)-grafted-poly(tetrafluoroethylene) surface and their autocatalytic properties
H. Akiyama, K. Yamamura, N. Zettsu
Second International Symposium on Atomically Controlled Fabrication Technology Vol. pp. 176-177. 2009/11
Fabrication of high-precision elliptical mirror substrate for neutron focusing by numerically controlled local wet etching
M. Nagano, F. Yamaga, Y. Yamamoto, N. Zettsu, D. Yamazaki, R. Maruyama, K. Soyama, K. Yamamura
Second International Symposium on Atomically Controlled Fabrication Technology Vol. pp. 182-183 2009/11
Fabrication of discrete array of metallodielectric nanoshells controllable their surface plasmonic properties
S. Uchida, K. Yamamura, N. Zettsu
Second International Symposium on Atomically Controlled Fabrication Technology Vol. pp. 186-187. 2009/11
Fabrication of thin plano-elliptical neutron focusing mirror substrate by numerically controlled local wet etching
M. Nagano, F. Yamaga, Y. Yamamoto, N. Zettsu, D.Yamazaki, R. Maruyama, K. Soyama, K. Yamamura
3rd International Conference of Asian Society for Precision Engineering and Nanotechnology 2009/11
Thinning of SiC wafer by plasma chemical vaporization machining
Y. Sano, T. Kato, T. Hori, K. Yamamura, H. Mimura, Y. Katsuyama, K. Yamauchi
Technical Digest of International Conference on Silicon Carbide and Related Materials 2009 Vol. II-108 2009/10
Fabrication of Damage-Free Johansson-Type Doubly Curved Crystal Spectrometer Substrate by Numerically Controlled Local Wet Etching
K. Ueda, M. Nagano, N. Zettsu, S. Maeo, S. Shimada, T. Utaka, K. Taniguchi, K. Yamamura
Vol. pp.46-47 2009/09
High-reflectivity (m=4) elliptical neutron focusing supermirror fabricated by numerically controlled local wet etching with ion beam sputter deposition
M. Nagano, N. Zettsu, D. Yamazaki, R. Maruyama, K. Soyama, K. Yamamura
2009/09
Beveling of Silicon Carbide Wafer by Plasma Etching Using Atmospheric-Pressure Plasma
Y. Sano, T. Kato, K. Yamamura, H. Mimura, S. Matsuyama, K. Yamauchi
Proceedings of 31st International Symposium on Dry Process Vol. 215-216 2009/09
Novel Scheme of Figure-Error Correction for X-ray Nanofocusing Mirror
Soichiro Handa, Hidekazu Mimura, Hirokatsu Yumoto, Takashi Kimura, Satoshi Matsuyama, Yasuhisa Sano, Kazuya Yamamura, Kenji Tamasaku, Yoshinori Nishino, Makina Yabashi, Tetsuya Ishikawa, Kazuto Yamauchi
Japanese Journal of Applied Physics, 48 (2009) 096507-1_4. Vol. 48 No. 9 2009/09
27pYK-7 Wide-band neutron focusing with a high precision elliptic supermirror
Yamazaki D., Maruyama R., Soyama K., Nagano M., Yamamura K.
Meeting abstracts of the Physical Society of Japan Vol. 64 No. 2 p. 882-882 2009/08/18
Publisher: The Physical Society of Japan (JPS)
Fabrication of High-Precision Curved Crystal Substrate for Johansson-Type Doubly Curved Crystal by Numerically Controlled Local Wet Etching
K. Yamamura, K. Ueda, M. Nagano, N. Zettsu, S. Maeo, S. Shimada, T. Utaka, K. Taniguchi
Book of Abstracts, P52. Vol. Book of Abstracts, P52. 2009/07
High Efficient Damage-Free Correction of Thickness Distribution of Quartz Crystal Wafer by Atmospheric Pressure Plasma Etching
Kazuya yamamura, Tetsuya Morikawa, Masaki Ueda, Mikinori nagano, Nobuyuki Zettsu, Masafumi Shibahara
IEEE Trans. Ultrason. Ferroelectr. Freq. Contro, Vol.56 (2009) pp.1128-1130. Vol. 56 No. 6 p. 1128-1130 2009/06
Highly Efficient Damage-Free Correction of Thickness Distribution of Quartz Crystal Wafers by Atmospheric Pressure Plasma Etching
Kazuya Yamamura, Tetsuya Morikawa, Masaki Ueda, Mikinori Nagano, Nobuyuki Zettsu, Masafumi Shibahara
IEEE TRANSACTIONS ON ULTRASONICS FERROELECTRICS AND FREQUENCY CONTROL Vol. 56 No. 6 p. 1128-1130 2009/06
Two-stage figuring using numerically controlled local wet etching for high-efficiency fabrication of plano-aspherical mirror
K. Yamamura, M. Nagano, H. Takai, D. Yamazaki, R. Maruyama, K. Soyama
Proceedings of 9th International Conference of the European Society for Precision Engineering and Nanotechnology Vol. pp. 30-33. 2009/06
Figuring of plano-elliptical neutron focusing mirror by local wet etching
Kazuya Yamamura, Mikinori Nagano, Hiroyuki Takai, Nobuyuki Zettsu, Dai Yamazaki, Ryuji Maruyama, Kazuhiko Soyama, Shoichi Shimada
OPTICS EXPRESS Vol. 17 No. 8 p. 6414-6420 2009/04
Figuring of plano-elliptical neutron focusing mirror by local wet etching
Kazuya Yamamura, Mikinori Nagano, Hiroyuki Takai, Nobuyuki Zettsu, Dai Yamazaki, Ryuji Maruyama, Kazuhiko Soyama, Shoichi Shimada
Optics Express Vol. 17 No. 8 p. 6414-6420 2009/04
Improvement of Thickness Uniformity of Bulk Silicon Wafer by Numerically Controlled Local Wet Etching
Mikinori Nagano, Takuro Mitani, Kazuaki Ueda, Nobuyuki Zettsu, Kazuya Yamamura
Jounal of Crystal Growth Vol.311(2009)pp.2560-2563. Vol. 407-408 p. 372-375 2009/04
30pRE-10 Neutron Beam Focusing by means of high-Qc supermirror on a precisely-carved surface
Yamazaki Dai, Maruyama Ryuji, Soyama Kazuhiko, Takai Hiroyuki, Nagano Mikinori, Yamamura Kazuya
Meeting abstracts of the Physical Society of Japan Vol. 64 No. 1 p. 983-983 2009/03/03
Publisher: The Physical Society of Japan (JPS)
Etching of GaN by plasma chemical vaporization machining
Yasuji Nakahama, Norio Kanetsuki, Takeshi Funaki, Masaru Kadono, Yasuhisa Sano, Kazuya Yamamura, Katsuyoshi Endo, Yuzo Mori
2009/03
Beveling of Silison Carbide Wafer by Plasma Chemical Vaporization Machining
Takehiro Kato, Yasuhisa Sano, Hideyuki Hara, Hidekazu Mimura, Kazuya Yamamura, Kazuto Yamauchi
Materials Science Forum Vol. Vols. 600-603, pp 843-846 2009/02
Development of the holizonatl drive controlled nano-coater for making single layer of densely-packed polymeric nanoparticle arrays
K. Manabe, K. Yamamura, N. Zettsu
First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing - Vol. P3.5, pp.128-129. 2009/02
Surface metallization of PTFE substrate through atmospheric pressure plasma liquid deposition approach
H. Akiyama, N. Zettsu, K. Yamamura
First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing - Vol. P3.2, pp.122-123. 2009/02
Figuring of plano-elliptical hard X-ray focusing mirror by 1-dimensional numerically controlled local wet etching, First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing -
M. Nagano, H. Takai, N. Zettsu, K. Yamamura
P2.19, pp.92-93. 2009/02
Improvement of thickness distribution of bulk silicon wafer and SOI by numerically controlled local wet etching
T. Mitani, M. Nagano, K. Ueda, N. Zettsu, K. Yamamura
First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing - Vol. P2.17, pp.88-89. 2009/02
Development of plano-elliptical neutron focusing supermirror by numerically controlled local wet etching, First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing -
M. Nagano, H. Takai, N. Zettsu, D. Yamazaki, R. Maruyama, K. Soyama, K. Yamamura
First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing - Vol. P2.18, pp.90-91. 2009/02
Temperature Dependence of Plasma Chemical Vaporization Machining of Silicon and Silicon Carbide
Yasuhisa Sano, Masayo Watanabe, Takehiro Kato, Kazuya Yamamura, Hidekazu Mimura, Kazuto Yamauchi
Materials Science Forum Vol. Vols. 600-603, pp 847-850 2009/02
Development of Johansson-type doubly-curved-crystal by numerically controlled local wet etching
K. Ueda, M. Nagano, N. Zettsu, S. Maeo, S. Shimada, T. Udaka, K. Taniguchi, K. Yamamura
First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing - Vol. P2.20, pp.94-95. 2009/02
Novel scheme of figure-error correction for X-ray nanofocusing mirror
Soichiro Handa, Hidekazu Mimura, Hirokatsu Yumoto, Takashi Kimura, Satoshi Matsuyama, Yasuhisa Sano, Kazuya Yamamura, Kenji Tamasaku, Yoshinori Nishino, Makina Yabashi, Tetsuya Ishikawa, Kazuto Yamauchi
Japanese Journal of Applied Physics Vol. 48 No. 9 p. 0965071-0965074 2009
大気圧プラズマ 基礎と応用 6.7.5 マイクロ／ナノ加工 日本学術振興会プラズマ材料科学第153委員会
オーム社 Vol. 6.7.5 マイクロ No. ナノ加工(p.357-362) 2009
次世代パワー半導体 －省エネルギー社会に向けたデバイス開発の最前線－ 第1章第1節2 PCVMを用いたSiC基板の薄化
(株)エヌ・ティー・エス Vol. pp. 57-66 2009
Fabrication of discrete array of metallodielectric nanoshells controllable their surface plasmonic properties
Second International Symposium on Atomically Controlled Fabrication Technology Vol. pp. 186-187. 2009
Fabrication of thin plano-elliptical neutron focusing mirror substrate by numerically controlled local wet etching
3rd International Conference of Asian Society for Precision Engineering and Nanotechnology 2009
ローカルウエットエッチング法による超精密非接触加工
山村和也
月刊ディスプレイ Vol. 15, No. 1(2009) pp. 40-44. Vol. Vol. 15, No. 1(2009) pp. 40-44. 2009/01
Temperature Dependence of Plasma Chemical Vaporization Machining of Silicon and Silicon Carbide
Yasuhisa Sano, Masayo Watanabe, Takehiro Kato, Kazuya Yamamura, Hidekazu Mimura, Kazuto Yamauchi
SILICON CARBIDE AND RELATED MATERIALS 2007, PTS 1 AND 2 Vol. 600-603 p. 847-+ 2009
Development of Johansson-type doubly-curved-crystal by numerically controlled local wet etching
First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing - Vol. P2.20, pp.94-95. 2009
Two-stage figuring using numerically controlled local wet etching for high-efficiency fabrication of plano-aspherical mirror
Proceedings of 9th International Conference of the European Society for Precision Engineering and Nanotechnology Vol. pp. 30-33. 2009
Improvement of Thickness Uniformity of Bulk Silicon Wafer by Numerically Controlled Local Wet Etching
Kazuya Yamamura, Takuro Mitani, Kazuaki Ueda, Mikinori Nagano, Nobuyuki Zettsu
PROGRESS OF MACHINING TECHNOLOGY Vol. 407-408 p. 372-375 2009
Beveling of Silicon Carbide Wafer by Plasma Etching Using Atmospheric-Pressure Plasma
Proceedings of 31st International Symposium on Dry Process Vol. 215-216 2009
Fabrication of Damage-Free Johansson-Type Doubly Curved Crystal Spectrometer Substrate by Numerically Controlled Local Wet Etching
Vol. pp.46-47 2009
High-reflectivity (m=4) elliptical neutron focusing supermirror fabricated by numerically controlled local wet etching with ion beam sputter deposition
2009
Thinning of SiC wafer by plasma chemical vaporization machining
Technical Digest of International Conference on Silicon Carbide and Related Materials 2009 Vol. II-108 2009
High-precision finishing of AT-cut quartz crystal wafer by plasma chemical vaporization machining
3rd International Conference of Asian Society for Precision Engineering and Nanotechnology Vol. 1P2-6 2009
Improvement of Thickness Uniformity of SOI Layer by Numerically Controlled Local Wet Etching
3rd International Conference of Asian Society for Precision Engineering and Nanotechnology Vol. 2C-12 2009
Dicing of SiC Wafer by Plasma Chemical Vaporization Machining with Wire Electrode
Second International Symposium on Atomically Controlled Fabrication Technology Vol. pp. 188-189. 2009
Improvement of thickness uniformity of thick-SOI by numerically controlled local wet etching
Second International Symposium on Atomically Controlled Fabrication Technology Vol. pp. 180-181. 2009
High-precision correction of thickness distribution of AT-cut quartz crystal wafer by pulse-modulated atmospheric pressure plasma etching
Second International Symposium on Atomically Controlled Fabrication Technology Vol. pp. 178-179. 2009
Fabrication of non-close packed periodic polymer nanoparticle arrays controllable their structural parameters
3rd International Conference of Asian Society for Precision Engineering and Nanotechnology Vol. 2C-14 2009
Atmospheric pressure plasma liquid deposition of copper nanoparticles on poly(4-vinylpyridine)-grafted-poly(tetrafluoroethylene) surface and their autocatalytic properties
Second International Symposium on Atomically Controlled Fabrication Technology Vol. pp. 176-177. 2009
Fabrication of high-precision elliptical mirror substrate for neutron focusing by numerically controlled local wet etching
Second International Symposium on Atomically Controlled Fabrication Technology Vol. pp. 182-183 2009
Beveling of Silicon Carbide Wafer by Plasma Chemical Vaporization Machining
Takehiro Kato, Yasuhisa Sano, Hideyuki Hara, Hidekazu Mimura, Kazuya Yamamura, Kazuto Yamauchi
SILICON CARBIDE AND RELATED MATERIALS 2007, PTS 1 AND 2 Vol. 600-603 p. 843-846 2009
Development of the holizonatl drive controlled nano-coater for making single layer of densely-packed polymeric nanoparticle arrays
First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing - Vol. P3.5, pp.128-129. 2009
Surface metallization of PTFE substrate through atmospheric pressure plasma liquid deposition approach
First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing - Vol. P3.2, pp.122-123. 2009
Figuring of plano-elliptical hard X-ray focusing mirror by 1-dimensional numerically controlled local wet etching, First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing -
P2.19, pp.92-93. 2009
Development of plano-elliptical neutron focusing supermirror by numerically controlled local wet etching, First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing -
First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing - Vol. P2.18, pp.90-91. 2009
Improvement of Thickness Uniformity of Bulk Silicon Wafer by Numerically Controlled Local Wet Etching
Kazuya Yamamura, Takuro Mitani, Kazuaki Ueda, Mikinori Nagano, Nobuyuki Zettsu
PROGRESS OF MACHINING TECHNOLOGY Vol. 407-408 p. 372-375 2009
High-Efficient Damage-Free Correction of the Thickness Distribution of Quartz Crystal Wafer Using Open-Air Type Plasma CVM
Kazuya Yamamura, Tetsuya Morikawa, Masaki Ueda
PROGRESS OF MACHINING TECHNOLOGY Vol. 407-408 p. 343-346 2009
Figuring of Elliptical Neutron Focusing Mirror Using Numerically Controlled Local Wet Etching
Mikinori Nagano, Hiroyuki Takai, Kazuya Yamamura, Dai Yamazaki, Ryuji Maruyama, Kazuhiko Soyama
PROGRESS OF MACHINING TECHNOLOGY Vol. 407-408 p. 376-+ 2009
Improvement of thickness distribution of bulk silicon wafer and SOI by numerically controlled local wet etching
First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing - Vol. P2.17, pp.88-89. 2009
Etching of GaN by plasma chemical vaporization machining
2009
Etching characteristics of GaN by plasma chemical vaporization machining
Yasuji Nakahama, Norio Kanetsuki, Takeshi Funaki, Masaru Kadono, Yasuhisa Sano, Kazuya Yamamura, Katsuyoshi Endo
Surf. Interface Anal. Vol. 40 No. 12 p. 1566-1570 2008/12
Etching characteristics of GaN by plasma chemical vaporization machining
Yasuji Nakahama, Norio Kanetsuki, Takeshi Funaki, Masaru Kadono, Yasuhisa Sano, Kazuya Yamamura, Katsuyoshi Endo, Yuzo Mori
SURFACE AND INTERFACE ANALYSIS Vol. 40 No. 12 p. 1566-1570 2008/12
Plasma Chemical Vaporization Machining and Elastic Emission Machining
Yasuhisa Sano, Kazuya Yamamura, Hidekazu Mimura, Kazuto Yamauchi, Yuzo Mori
Crystal Growth Technology: From Fundamentals and Simulation to Large-scale Production p. 475-495 2008/11/25
Publisher: Wiley-VCH Verlag GmbH & Co. KGaA
Improvement of Thickness Uniformity of Silicon and SOI Wafer by Numerically Controlled Local Wet Etching
Kazuya Yamamura, Takuro Mitani, Nobuyuki Zettsu
Proceedings of 23rd ASPE Annual Meeting and 12th ICPE Vol. Proceedings of 23rd ASPE Annual Meeting and 12th ICPE, pp.538-541. 2008/10
The Disecrete Polystylene-Gold Core-Shell Nanoparticles Array And Their Surface Plasmonic Properties
Nobuyuki Zettsu, Shuhei Uchida, Kazuya Yamamura
Proceedings of 23rd ASPE Annual Meeting and 12th ICPE Vol. Proceedings of 23rd ASPE Annual Meeting and 12th ICPE, pp. 500-501. 2008/10
光医療用ナノ粒子造影剤の開発~銀ナノキューブダイマーの合成とプラズモニック特性~
内田修平, 三谷宗久, 山村和也, 遠藤勝義, 是津信行, 市村垂生, 田口敦清, 河田聡
応用物理学会学術講演会講演予稿集 Vol. 69th No. 3 2008/09/02
Neutron-Beam Focusing with a Large-m Supermirror on a High-Precision Ellipsoidal Surface
D. Yamazaki, R. Maruyama, K. Soyama, H. Takai, K. Yamamura
The 7th International Workshop on Polarized Neutrons in Condensed Matter Investigations, PNCMI2008, pp.41. 2008/09
Surface functionalization of PTFE sheet through atmospheric pressure plasma liquid deposition approach
Nobuyuki Zettsu, Hiroto Itoh, Kazuya Yamamura
SURFACE & COATINGS TECHNOLOGY Vol. 202 No. 22-23 p. 5284-5288 2008/08
Plasma-chemical surface functionalization of flexible substrates at atmospheric pressure
Nobuyuki Zettsu, Hiroto Itoh, Kazuya Yamamura
THIN SOLID FILMS Vol. 516 No. 19 p. 6683-6687 2008/08
Surface functionalization of PTFE sheet through atmospheric pressure plasma liquid deposition approach
Nobuyuki Zettsu, Hiroto Itoh, Kazuya Yamamura
Surface & Coatings Technology, Vol.202 (2008) pp.5284-5288. Vol. 202 No. 22-23 p. 5284-5288 2008/08
Uniformalization of AT cut quartz crystal wafer thickness using open-air type plasma CVM process
Kazuya Yamamura, Tetsuya Morikawa, Masafumi Shibahara, Nobuyuki Zettsua, Yuzo Moria
SURFACE AND INTERFACE ANALYSIS Vol. 40 No. 6-7 p. 1007-1010 2008/06
Etching characteristics of local wet etching of silicon in HF/HNO3 mixtures
Kazuya Yamamura, Takuro Mitani
SURFACE AND INTERFACE ANALYSIS Vol. 40 No. 6-7 p. 1011-1013 2008/06
Figuring of elliptical hard X-ray focusing mirror using 1-dimensional numerically controlled local wet etching
Kazuya Yamamura, Hiroyuki Takai
SURFACE AND INTERFACE ANALYSIS Vol. 40 No. 6-7 p. 1014-1018 2008/06
Figuring of elliptical hard X-ray focusing mirror using 1-dimensional numerically controlled local wet etching
Kazuya Yamamura, Hiroyuki Takai
Surface and Interface Analysis, Vol.40, 2008, pp.1014-1018 Vol. 40 No. 6-7 p. 1014-1018 2008/06
Uniformalization of AT cut quartz crystal wafer thickness using open-air type plasma CVM process
Kazuya Yamamura, Tetsuya Morikawa, Masafumi Shibahara, Nobuyuki Zettsu, Yuzo Mori
Surface and Interface Analysis Vol. 40 No. 6-7 p. 1007-1010 2008/06
Etching characteristics of local wet etching of silicon in HF/HNO3 mixtures
Kazuya Yamamura, Takuro Mitani
Surface and Interface Analysis Vol. 40 No. 6-7 p. 1011-1013 2008/06
Plasma-chemical surface functionalization of flexible substrates at atmospheric pressure
Nobuyuki Zettsu, Hiroto Itoh, Kazuya Yamamura
Thin Solid Films, 516 (2008) 6683-6687. Vol. 516 No. 19 p. 6683-6687 2008/06
Figuring of ultraprecision aspherical focusing mirror using numerically controlled local wet etching
K. Yamamura, H. Takai
International Conference of the European Society for Precision Engineering and Nanotechnology Vol. 448-451. 2008/05
Crystal machining using atmospheric pressure plasma
Y. Sano, K. Yamamura, K. Yamauchi, Y. Mori
Book of Lecture Notes, 4th International Workshop on Crystal Growth Technology Vol. 47 2008/05
Damage-free improvement of thickness uniformity of quartz crystal wafer by plasma chemical vaporization machining
K. Yamamura, S. Shimada, Y. Mori
Annals of the CIRP, Vol.57 (2008) 567-570. Vol. 57 No. 1 p. 567-570 2008/05
Crystal Growth Technology (Plasma Chemical Vaporization Machining and Elastic Emission Machining)
Wiley-VCH 2008
Neutron-Beam Focusing with a Large-m Supermirror on a High-Precision Ellipsoidal Surface
2008
ウエットエッチングのメカニズムと処理パラメータの最適化,第1章第10節 ローカルウエットエッチング法による光学素子の高精度加工
サイエンス&テクノロジー Vol. 第1章第10節 pp. 139-153. 2008
The Disecrete Polystylene-Gold Core-Shell Nanoparticles Array And Their Surface Plasmonic Properties
Proceedings of 23rd ASPE Annual Meeting and 12th ICPE Vol. Proceedings of 23rd ASPE Annual Meeting and 12th ICPE, pp. 500-501. 2008
Improvement of Thickness Uniformity of Silicon and SOI Wafer by Numerically Controlled Local Wet Etching
Proceedings of 23rd ASPE Annual Meeting and 12th ICPE Vol. Proceedings of 23rd ASPE Annual Meeting and 12th ICPE, pp.538-541. 2008
Crystal machining using atmospheric pressure plasma
Book of Lecture Notes, 4th International Workshop on Crystal Growth Technology Vol. 47 2008
Figuring of ultraprecision aspherical focusing mirror using numerically controlled local wet etching
International Conference of the European Society for Precision Engineering and Nanotechnology Vol. 448-451. 2008
Damage-free improvement of thickness uniformity of quartz crystal wafer by plasma chemical vaporization machining
K. Yamamura, S. Shimada, Y. Mori
CIRP ANNALS-MANUFACTURING TECHNOLOGY Vol. 57 No. 1 p. 567-570 2008
Facile Fabrication and Near-Infrared Localized Surface Plasmon Resonance Properties of Two-dimensional PS@Au Core/Shell Nanoparticle Arrays, and Their Use as a Ultra-sensitive Bio-sensors
Shuhei Uchida, Kazuya Yamamura, Katsuyoshi Endo, Nobuyuki Zettsu
MRS 2007 Fall Meeting 2007/11
Figuring of Elliptical Hard X-ray Focusing Mirror Using Numerically Controlled Local Wet Etching
Hiroyuki Takai, Kazuya Yamamura
Asian Symposium for Precision Engineering and Nanotechnology 2007 Vol. pp. 244-247. 2007/11
Improvement of Thickness Distribution of SOI Using Numerically Controlled Local Wet Etching
Takuro Mitani, Kazuya Yamamura
Asian Symposium for Precision Engineering and Nanotechnology 2007 Vol. pp. 241-243. 2007/11
Etching characteristics of AT cut quartz crystal in open-air type plasma CVM process
K. Ueno, Y. Oshikane, M. Shibahara, K. Yamamura
29th International Symposium on Dry Process Vol. pp. 273-274. 2007/11
Improvement of Thickness Distribution of AT Cut Quartz Crystal Wafer Using Open-Air Type Numerically Controlled Plasma Chemical Vaporization Machining
Tetsuya Morikawa, Kazuya Yamamura, Masafumi Shibahara, Yuzo Mori
Asian Symposium for Precision Engineering and Nanotechnology 2007 Vol. pp. 248-251. 2007/11
Figuring of Elliptical Hard X-ray Focusing Mirror Using Numerically Controlled Local Wet Etching
H. Takai, K. Yamamura
International 21st Century COE Symposium on Atomistic Fabrication Technology 2007 Vol. International 21st Century COE Symposium on Atomistic Fabrication Technology 2007, pp. 12. 2007/10
Improvement of Thickness Distribution of SOI Using Numerically Controlled Local Wet Etching
T. Mitani, K. Yamamura
International 21st Century COE Symposium on Atomistic Fabrication Technology 2007 Vol. International 21st Century COE Symposium on Atomistic Fabrication Technology 2007, pp. 13. 2007/10
Uniformation of AT Cut Quartz Crystal Wafer Using Open-Air Type Numerically Controlled Plasma CVM Process
T. Morikawa, M. Shibahara, N. Zettsu, Y. Mori, K. Yamamura
International 21st Century COE Symposium on Atomistic Fabrication Technology 2007 Vol. International 21st Century COE Symposium on Atomistic Fabrication Technology 2007, pp 14. 2007/10
Effect of pulse modulated operation on etching characteristics of AT cut quartz crystal in open-air type plasma CVM process
Kohji Ueno, Yasushi Oshikane, Masafumi Shibahara, Nobuyuki Zettsu, Kazuya Yamamura
International 21st Century COE Symposium on Atomistic Fabrication Technology 2007 Vol. International 21st Century COE Symposium on Atomistic Fabrication Technology 2007, pp. 15. 2007/10
Machining of GaN by Plasma CVM (Chemical Vaporization Machining)
Y. Nakahama, N. Kanetsuki, T. Funaki, M. Kadono, Y. Sano, K. Yamamura, K. Endo, Y. Mori
International 21st Century COE Symposium on Atomistic Fabrication Technology 2007 Vol. International 21st Century COE Symposium on Atomistic Fabrication Technology 2007, pp 18. 2007/10
Sensing Characterization of NIR-Localized Surface Plasmon Resonances in PS@Au core-shell nanoparticle array for Application as Ultra-sensitive Sensors
Shuhei Uchida, Kazuya Yamamura, Katsuyoshi Endo, Nobuyuki Zettsu
International 21st Century COE Symposium on Atomistic Fabrication Technology 2007 Vol. International 21st Century COE Symposium on Atomistic Fabrication Technology 2007, pp. 36. 2007/10
Beveling of Silicon Carbide Wafer by Plasma Chemical Vaporization Machining
Takehiro Kato, Yasuhisa Sano, Hideyuki Hara, Hidekazu Mimura, Kazuya Yamamura, Kazuto Yamauchi
International Conference on Silicon Carbide and Related Materials 2007 Technical Digest Vol. We-98 2007/10
Temperature Dependence of Plasma Chemical Vaporization Machining of Silicon and Silicon Carbide
Y. Sano, M. Watanabe, T. Kato, K. Yamamura, H. Mimura, K. Yamauchi
International Conference on Silicon Carbide and Related Materials 2007 Technical Digest Vol. Mo-P-55 2007/10
Surface Functionalization of PTFE Sheet through Atmospheric Pressure Plasma Liquid Deposition Approach
N. Zettsu, H. Itoh, K. Yamamura
6th Asian-European International Conference on Plasma Surface Engineering Vol. pp. 307. 2007/09
超高精度ミラーによる硬X線ナノビーム形成とその応用
三村秀和, 松山智至, 湯本博勝, 半田宗一郎, 片岸恵子, 木村隆志, 佐野泰久, 山村和也, 稲垣耕司, 玉作賢治, 西野吉則, 矢橋牧名, 石川哲也, 山内和人
日本物理学会講演概要集 Vol. 62 No. 2 2007/08/21
Polishing Characteristics of 4H-SiC Si-Face and C-Face by Plasma Chemical Vaporization Machining
Yasuhisa Sano, Masayo Watanabe, Kazuya Yamamura, Kazuto Yamauchi, Takeshi Ishida, Kenta Arima, Akihisa Kubota, Yuzo Mori
Materials Science Forum 2007/08
Fabrication of ultrathin and highly uniform silicon on insulator by numerically controlled plasma chemical vaporization machining
Yasuhisa Sano, Kazuya Yamamura, Hidekazu Mimura, Kazuto Yamauchi, Yuzo Mori
REVIEW OF SCIENTIFIC INSTRUMENTS Vol. 78 No. 8 2007/08
Measurement of rotational and vibrational temperature of gas molecules in the CVM plasma by using spatial resolved optical emission spectrometry
Kohji Ueno, Yasushi Oshikane, Yasuhisa Sano, Kazuya Yamamura
18th International Symposium on Plasma Chemistry Vol. pp. 166. 2007/08
Atomspheric Pressure-Glow Plasma Induced Surface Functionalization of Flexible Substrate
H. Itoh, N. Zettsu, M. Shibahara, K. Yamamura
18th International Symposium on Plasma Chemistry Vol. pp. 186. 2007/08
Plasma chemical surface functionalization of PTFE sheet through atmospheric pressure plasma liquid deposition approach
N. Zettsu, H. Itoh, K. Yamamura
XXVIII International Conference on Phenomena in Ionized Gases Vol. XXVIII International Conference on Phenomena in Ionized Gases, p. 757-760. 2007/07
Unifomalization of thr AT cut quartz crystal wafer using maskless localized atmospheric pressure plasma etching process
K. Yamamura, Y. Yamamoto, T. Morikawa, M. Shibahara, Y. Mori
XXVIII International Conference on Phenomena in Ionized Gases Vol. XXVIII International Conference on Phenomena in Ionized Gases. p. 735-736. 2007/07
Surface Modification of Polytetrafluoroethylene Sheet by Atmospheric Pressure Plasma Treatment
Masafumi Shibahara, Masanori Akamatsu, Hitoshi Kanzaki, Kazuya Yamamura
Journal of the Surface Finishing Society of Japan Vol. Vol.58, No.7, pp.420-424. 2007/07
Fabrication of Ultra Precision Optics by Numerically Controlled Local Wet Etching
Kazuya Yamamura
Annals of the CIRP, Vol. 56, pp.541-544. Vol. 56 No. 1 p. 541-544 2007/07
Plasmachemical Surface Functionalization of Flexible Substrates at Atmospheric Pressure
Nobuyuki Zettsu, Hiroto Itoh, Kazuya Yamamura
The 20th Symposium on Plasma Science for Materials Vol. The 20th Symposium on Plasma Science for Materials, p. 85. 2007/06
Development of numerically controlled local wet etching
Kazuya Yamamura
SCIENCE AND TECHNOLOGY OF ADVANCED MATERIALS Vol. 8 No. 3 p. 158-161 2007/04
Surface gragient integrated profiler for X-ray and EUV optics
Yasuo Higashi, Yuichi Takaie, Katsuyoshi Endo, Tatsuya Kume, Kazuhiro Enami, Kazuto Yamauchi, Kazuya Yamamura, Yasuhisa Sana, Kenji Ueno, Yuzo Mori
SCIENCE AND TECHNOLOGY OF ADVANCED MATERIALS Vol. 8 No. 3 p. 177-180 2007/04
Ultraprecision Machining Method for Ultraprecise Aspherical Mirror
Yasuhisa Sano, Hidekazu Mimura, Kazuya Yamamura, Kazuto Yamauchi, Yuzo Mori
The Review of Laser Engineering Vol. 35 No. 3 p. 162-167 2007/03
Improvement of the thickness distribution of at cut quartz crystal wafer by open-air type plasma chemical vaporization machining
Kazuya Yamamura, Masafumi Shibahara, Yasuhisa Sano, Yusuke Yamamoto, Tetsuya Morikawa, Yuzo Mori
e-Journal of Surface Science and Nanotechnology Vol. 5 p. 41-44 2007/02/06
Improvement of the Thickness Distribution of AT Cut Quartz Crystal Wafer by Open-air Type Plasma Chemical Vaporization Machining
Kazuya Yamamura, Masafumi Shibahara, Yasuhisa Sano, Yusuke Yamamoto, Tetsuya Morikawa, Yuzo Mori
e-Journal of Surface Science and Nanotechnology Vol. 5 p. 41-44 2007/02
Efficient focusing of hard x-rays to 25nm by a total reflection mirror
H. Mimura, H. Yumoto, S. Matsuyama, Y. Sano, K. Yamamura, Y. Mori, M. Yabashi, Y. Nishino, K. Tamasaku, T. Ishikawa, K. Yamauchi
APPLIED PHYSICS LETTERS Vol. 90 No. 5 2007/02
Surface Modification of Poly ethylene terephthalate sheet by Atmosphere Plasma Treatment
Masafumi Shibahara, Kanji Inagaki, Kazuya Yamamura
Journal of The Surface Finishing Society of Japan Vol. 58 No. 2 p. 124-129 2007/02
Publisher: The Surface Finishing Society of Japan
Fabrication of X-ray mirror for hard X-ray diffraction limited nanofocusing
Hirokatsu Yumoto, Hidekazu Mimura, Satoshi Matsuyama, Soichiro Handa, Akihiko Shibatani, Keiko Katagishi, Kazuya Yamamura, Yasuhisa Sano, Katsuyoshi Endo, Yuzo Mori, Makina Yabashi, Yoshinori Nishino, Kenji Tamasaku, Tetsuya Ishikawa, Kazuto Yamauchi
AIP Conference Proceedings Vol. 879 No. Pt.1 p. 967-970 2007
Development of a scanning X-ray fluorescence microscope using size-controllable focused X-ray beam from 50 to 1500nm
Satoshi Matsuyama, Hidekazu Mimura, Hirokatsu Yumoto, Keiko Katagishi, Soichiro Handa, Akihiko Shibatani, Yasuhisa Sano, Kazuya Yamamura, Katsuyoshi Endo, Yuzo Mori, Yoshinori Nishino, Kenji Tamasaku, Makina Yabashi, Tetsuya Ishikawa, Kazuto Yamauchi
AIP Conference Proceedings Vol. 879 No. Pt.2 p. 1325-1328 2007
22pTC-3 Hard X-ray nanofocusing by ultraprecisely figured mirrors and its applications
Mimura H, Matsuyama S, Yumoto H, Handa S, Katagishi K, Kimura T, Sano Y, Yamamura K, Inagaki K, Tamasaku K, Nishino Y, Yabashi M, Ishikawa T, Yamauchi K
Meeting Abstracts of the Physical Society of Japan Vol. 62 No. 0 p. 989-989 2007
Publisher: 一般社団法人日本物理学会
Efficient focusing of hard x rays to 25 nm by a total reflection mirror
Hidekazu Mimura, Hirokatsu Yumoto, Satoshi Matsuyama, Yasuhisa Sano, Kazuya Yamamura, Yuzo Mori, Makina Yabashi, Yoshinori Nishino, Kenji Tamasaku, Tetsuya Ishikawa, Kazuto Yamauchi
APPLIED PHYSICS LETTERS Vol. 90 No. 5 2007/01
Polishing characteristics of 4H-SiC Si-face and C-face by plasma chemical vaporization machining
Yasuhisa Sano, Masayo Watanabe, Kazuya Yamamura, Kazuto Yamauchi, Takeshi Ishida, Kenta Arima, Akihisa Kubota, Yuzo Mori
SILICON CARBIDE AND RELATED MATERIALS 2006 Vol. 556-557 p. 757-+ 2007
Surface Modification of Poly Ethylene Terephthalate Sheet by Atmospheric Plasma Treatment
SHIBAHARA Masafumi, INAGAKI Kanji, YAMAMURA Kazuya, YAMAMURA Kazuya
Jitsumu Hyomen Gijutsu Vol. Vol. 58, No.2 (2007) 124-129. No. 2 p. 124-129 2007
Publisher: The Surface Finishing Society of Japan
高精度非球面ミラーの加工技術
レーザー学会誌 Vol. Vol. 35, pp.162-167 2007
大気圧プラズマ処理によるポリテトラフルオロエチレンの表面改質
表面技術誌 Vol. Vol.58, No.7, pp.420-424. 2007
Fabrication of ultra precision optics by numerically controlled local wet etching
K. Yamamura, T. Masuzawa
CIRP ANNALS-MANUFACTURING TECHNOLOGY Vol. 56 No. 1 p. 541-544 2007
Plasmachemical Surface Functionalization of Flexible Substrates at Atmospheric Pressure
The 20th Symposium on Plasma Science for Materials Vol. The 20th Symposium on Plasma Science for Materials, p. 85. 2007
Plasma chemical surface functionalization of PTFE sheet through atmospheric pressure plasma liquid deposition approach
XXVIII International Conference on Phenomena in Ionized Gases Vol. XXVIII International Conference on Phenomena in Ionized Gases, p. 757-760. 2007
Unifomalization of thr AT cut quartz crystal wafer using maskless localized atmospheric pressure plasma etching process
XXVIII International Conference on Phenomena in Ionized Gases Vol. XXVIII International Conference on Phenomena in Ionized Gases. p. 735-736. 2007
Improvement of Thickness Distribution of SOI Using Numerically Controlled Local Wet Etching
International 21st Century COE Symposium on Atomistic Fabrication Technology 2007 Vol. International 21st Century COE Symposium on Atomistic Fabrication Technology 2007, pp. 13. 2007
Uniformation of AT Cut Quartz Crystal Wafer Using Open-Air Type Numerically Controlled Plasma CVM Process
International 21st Century COE Symposium on Atomistic Fabrication Technology 2007 Vol. International 21st Century COE Symposium on Atomistic Fabrication Technology 2007, pp 14. 2007
Sensing Characterization of NIR-Localized Surface Plasmon Resonances in PS@Au core-shell nanoparticle array for Application as Ultra-sensitive Sensors
International 21st Century COE Symposium on Atomistic Fabrication Technology 2007 Vol. International 21st Century COE Symposium on Atomistic Fabrication Technology 2007, pp. 36. 2007
Figuring of Elliptical Hard X-ray Focusing Mirror Using Numerically Controlled Local Wet Etching
International 21st Century COE Symposium on Atomistic Fabrication Technology 2007 Vol. International 21st Century COE Symposium on Atomistic Fabrication Technology 2007, pp. 12. 2007
Machining of GaN by Plasma CVM (Chemical Vaporization Machining)
International 21st Century COE Symposium on Atomistic Fabrication Technology 2007 Vol. International 21st Century COE Symposium on Atomistic Fabrication Technology 2007, pp 18. 2007
Effect of pulse modulated operation on etching characteristics of AT cut quartz crystal in open-air type plasma CVM process
International 21st Century COE Symposium on Atomistic Fabrication Technology 2007 Vol. International 21st Century COE Symposium on Atomistic Fabrication Technology 2007, pp. 15. 2007
Facile Fabrication and Near-Infrared Localized Surface Plasmon Resonance Properties of Two-dimensional PS@Au Core/Shell Nanoparticle Arrays, and Their Use as a Ultra-sensitive Bio-sensors
MRS 2007 Fall Meeting 2007
Measurement of rotational and vibrational temperature of gas molecules in the CVM plasma by using spatial resolved optical emission spectrometry
18th International Symposium on Plasma Chemistry Vol. pp. 166. 2007
Atomspheric Pressure-Glow Plasma Induced Surface Functionalization of Flexible Substrate
18th International Symposium on Plasma Chemistry Vol. pp. 186. 2007
Surface Functionalization of PTFE Sheet through Atmospheric Pressure Plasma Liquid Deposition Approach
6th Asian-European International Conference on Plasma Surface Engineering Vol. pp. 307. 2007
Temperature Dependence of Plasma Chemical Vaporization Machining of Silicon and Silicon Carbide
International Conference on Silicon Carbide and Related Materials 2007 Technical Digest Vol. Mo-P-55 2007
Beveling of Silicon Carbide Wafer by Plasma Chemical Vaporization Machining
International Conference on Silicon Carbide and Related Materials 2007 Technical Digest Vol. We-98 2007
Figuring of Elliptical Hard X-ray Focusing Mirror Using Numerically Controlled Local Wet Etching
Asian Symposium for Precision Engineering and Nanotechnology 2007 Vol. pp. 244-247. 2007
Improvement of Thickness Distribution of SOI Using Numerically Controlled Local Wet Etching
Asian Symposium for Precision Engineering and Nanotechnology 2007 Vol. pp. 241-243. 2007
Etching characteristics of AT cut quartz crystal in open-air type plasma CVM process
29th International Symposium on Dry Process Vol. pp. 273-274. 2007
Development of numerically controlled local wet etching
Science and Technology of Advanced Materials Vol. Vol.8 No.3 pp.158-161. 2007
Numerically Controlled Local Wet Etching For Fabricating the Ultraprecision Optics
Kazuya Yamamura
Proceedings of 5th International Conference on Optics-photonics Design & Fabrication Vol. pp. 257-258 2006/12
Measurement of rotational and vibrational temperature of gas molecule in the open-air type PCVM plasma by using spatial resolved emission spectra
Kazuya Yamamura, Koji Ueno, Yasushi Oshikane, Yasuhisa Sano, Masafumi Shibahara, Yuzo Mori
Proceedings of 28th International Symposium on Dry Process Vol. pp. 49-50 2006/11
High spatial resolution machining utilizing atmospheric pressure plasma machining
Kazuya Yamamura, Kunihito Kato, Yasuhisa Sano, Masafumi Shibahara, Katsuyoshi Endo, Yuzo Mori
Proceedings of 8th International Conference on Progress of Machining Technology Vol. pp. 257-260 2006/11
Improvement of the Thickness Distribution of AT Cut Quartz Crystal Wafer by Open-air Type Plasma Chemical Vaporization Machining
Kazuya Yamamura, Masafumi Shibahara, Yasuhisa Sano, Yusuke Yamamoto, Tetsuya Morikawa, Yuzo Mori
Proceedings of Handai Nanoscience and Nanotechnology International Symposium Vol. pp. 74 2006/11
Development of ultraprecision numerically controlled finishing machine utilizing atmospheric pressure plasma
Kazuya Yamamura, Akihiro Fujiwara, Koji Ueno, Yasuhisa Sano, Masafumi Shibahara, Katsuyoshi Endo, Yuzo Mori
Proceedings of 8th International Conference on Progress of Machining Technology Vol. pp. 253-256 2006/11
Machining characteristics of ultraprecision atmospheric pressure plasma process
Kazuya Yamamura, Koji Ueno, Akihiro Fujiwara, Yasuhisa Sano, Yasusi Oshikane, Masafumi Shibahara, Katsuyoshi Endo, Yuzo Mori
Proceedings of 8th International Conference on Progress of Machining Technology Vol. pp. 265-268 2006/11
Polishing characteristics of silicon carbide by plasma chemical vaporization machining
Yasuhisa Sano, Masayo Watanabe, Kazuya Yamamura, Kazuto Yamauchi, Takeshi Ishida, Kenta Arima, Akihisa Kubota, Yuzo Mori
Jpn. J. Appl. Phys. 45 No.10B Vol. 45 No. 10 p. 8277-8280 2006/10
Surface Gradient Integrated Profiler for X-ray and EUV Optics
Y. Higashi, Y. Takaie, K. Endo, Y. Mori, K. Yamauchi, T. Kume, K. Enami, K. Yamamura, Y. Sano, K. Ueno
Proceedings of International 21st Century COE Symposium on Atomistic Fabrication Technology Vol. 8 No. 3 p. 177-180 2006/10
Development of Numerically Controlled Local Wet Etching
Kazuya Yamamura
Prceedings of International 21st Century COE Symposium on Atomistic Fabrication Technology Vol. pp. 15-16 2006/10
Ultraprecision machining utilizing numerically controlled scanning of localized atmospheric pressure plasma
Kazuya Yamamura, Yasuhisa Sano, Masafumi Shibahara, Kazuto Yamauchi, Hidekazu Mimura, Katsuyoshi Endo, Yuzo Mori
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS Vol. 45 No. 10B p. 8270-8276 2006/10
High Spatial Resolution Machining Utilizing Atmospheric Pressure Plasma -Machining Characteristics of Silicon-
Kazuya Yamamura, Kunihito Kato, Yasuhisa Sano, Masafumi Shibahara, Katsuyoshi Endo, Yuzo Mori
Jpn. J. Appl. Phys. 45 No.10B Vol. 363-364 p. 257-260 2006/10
High-spatial-resolution machining utilizing atmospheric pressure plasma: Machining characteristics of silicon
Kazuya Yamamura, Kunihito Kato, Yasuhisa Sano, Masafumi Shibahara, Katsuyoshi Endo, Yuzo Mori
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS Vol. 45 No. 10B p. 8281-8285 2006/10
Development of ultraprecision finishing method for quartz crystal wafer utilizing atmospheric pressure plasma
Masafumi Shibahara, Yusuke Yamamoto, Kazuya Yamamura, Yasuhisa Sano, Katsuyoshi Endo, Yuzo Mori
Towards Synthesis of Micro-/Nano-systems, Vol. pp. 233-237 2006/08
Fabrication of small complex-shaped optics by plasma chemical vaporization machining with a microelectrode
Hideo Takino, Norio Shibata, Hiroshi Itoh, Teruki Kobayashi, Koshichi Nemoto, Takashi Fujii, Naohiko Goto, Kazuya Yamamura, Yasuhisa Sano, Yuzo Mori
APPLIED OPTICS Vol. 45 No. 23 p. 5897-5902 2006/08
Ultraprecision finishing of photomask substrate by utilizing atmospheric pressure plasma
Kazuya Yamamura, Akihiro Fujiwara, Koji Ueno, Yasuhisa Sano, Masafumi Shibahara, Katsuyoshi Endo, Yuzo Mori
Towards Synthesis of Micro-/Nano-systems Vol. pp. 227-231 2006/08
Fabrication of ultraprecisely figured mirror for nano focusing hard-x-ray
Hirokatsu Yumoto, Hidekazu Mimura, Satoshi Matsuyama, Souichiro Handa, Kazuya Yamamura, Yasuhisa Sano, Katsuyoshi Endo, Yuzo Mori, Makina Yabashi, Yoshinori Nishino, Kenji Tamasaku, Tetsuya Ishikawa, Kazuto Yamauchi
Towards Synthesis of Micro-/Nano-systems Vol. pp. 295-300 2006/08
Fabrication of small complex-shaped optics by plasmachemical vaporization machining with a microelectrode
Hideo Takino, Norio Shibata, Hiroshi Itoh, Teruki Kobayashi, Koshichi Nemoto, Takashi Fujii, Naohiko Goto, Kazuya Yamamura, Yasuhisa Sano, Yuzo Mori
Applied Optics Vol. 45 No. 23 p. 5897-5902 2006/08
Development of a Mirror Manipulator for Hard X-ray Microscopy with High Resolution : Realization of Nanofocused Hard X-ray Beam Better than 50nm under Diffraction Limited Condition
Matsuyama Satoshi, Mimura Hidekazu, Yumoto Hirokatsu, Hara Hideyuki, Yamamura Kazuya, Sano Yasuhisa, Nishino Yoshinori, Tamasaku Kenji, Yabashi Makina, Ishikawa Tetsuya, Yamauchia Kazuto
Journal of the Japan Society for Precision Engineering. Supplement. Contributed papers Vol. 72 No. 7 p. 884-888 2006/07/05
Publisher: 公益社団法人精密工学会
Rotational and vibrational temperature of Fulcher-alpha band emitted by hydrogen molecules in capacitive VHF CVD plasma process at atmosphere
Yasushi Oshikane, Hiroaki Kakiuchi, Kazuya Yamamura, Kiyoshi Yasutake, Takafumi Karasawa, Colin M. Western, Akinori Oda, Katsuyoshi Endo
Abstractbook of the 8th Asia-Pacific Conference on Plasma Science and Technology Vol. p.269 2006/07
Improvement of Thickness Uniformity of Quartz Wafer by Numerically Controlled Plasma CVM -Correction of Thickness Distribution of Quartz Wafer by Numerically Controlled Machining Utilizing Pipe Electrode-
Masafumi Shibahara, Kazuya Yamamura, Yasuhisa Sano, Tsuyoshi Sugiyama, Yuzuke Yamamoto, Katsuyoshi Endo, Yuzo Mori
Journal of the Japan Society for Precision Engineering Vol. Vol. 72, No.7, 934-938 No. 7 p. 934-938 2006/07
Publisher: The Japan Society for Precision Engineering
Ultraprecision machining of quartz crystal wafer by numerically controlled plasma CVM
Kazuya Yamamura, Masafumi Shibahara
Ultrasonic Technology Vol. Vol. 18, No.3, 52-55 No. 3 p. 52-55,127 2006/05
Publisher: 日本工業出版
走査型蛍光X線顕微鏡を用いた細胞内元素分布の測定
片岸恵子, 松山智至, 三村秀和, 湯本博勝, 山村和也, 佐野泰久, 遠藤勝義, 森勇蔵, 西野吉則, 玉作賢治, 矢橋牧名, 石川哲也, 山内和人
応用物理学関係連合講演会講演予稿集 Vol. 53rd No. 2 2006/03/22
Fabrication and evaluation of coherent X–ray mirror optics
Mimura Hidekazu, Yumoto Hirokatsu, Matsuyama Satoshi, Yamamura Kazuya, Sano Yasuhisa, Tamasaku Kenji, Yabashi Makina, Nisino Yoshinori, Ishikawa Tetsuya, Yamauchi Kazuto
Proceedings of JSPE Semestrial Meeting Vol. 2006 No. 0 p. 233-234 2006/03/01
Publisher: 公益社団法人 精密工学会
Development of a Mirror Manipulator for Hard X-ray Microscopy with High Resolution-Realization of Nanofocused Hard X-ray Beam Better than 50nm under Diffraction Limited Condition-
松山智至, 三村秀和, 湯本博勝, 原英之, 山村和也, 佐野泰久, 西野吉則, 玉作賢治, 矢橋牧名, 石川哲也, 山内和人
精密工学会誌(CD-ROM) Vol. 72 No. 7 2006
Atomic–scale analysis of 4 H–SiC (0001) surface after planarization process
Ishida Takeshi, Arima Kenta, Hara Hideyuki, Yamamura Kazuya, Yamauchi Kazuto, Endo Katsuyoshi
Proceedings of JSPE Semestrial Meeting Vol. 2006 No. 0 p. 1115-1116 2006
Publisher: The Japan Society for Precision Engineering
Cutting of functional materials by plasma chemical vaporization machining with inner-diameter blade electrode
Y. Sano, K. Yamamura, H. Mimura, K. Yamauchi, A. Kubota, Y. Mori
Proc. ICRP-6/SPP-23 Vol. 305-306 2006/01
Ultra precision machining utilizing numerically controlled scanning of localized atmospheric pressure plasma
K. Yamamura, Y. Sano, M. Shibahara, K. Yamauchi, H. Mimura, K. Endo, Y. Mori
Proceedings of ICRP6/SPP23 Vol. 81-82 2006/01
数値制御プラズマCVMによる水晶ウエハの高精度加工
超音波テクノ Vol. Vol. 18, No.3, 52-55 2006
Improvement of Thickness Uniformity of Quartz Crystal Wafer by Numerically Controlled Plasma CVM:—Correction of Thickness Distribution of Quartz Crystal Wafer by Numerically Controlled Machining Utilizing Pipe Electrode—
SHIBAHARA Masafumi, YAMAMURA Kazuya, SANO Yasuhisa, SUGIYAMA Tsuyoshi, YAMAMOTO Yusuke, ENDO Katsuyoshi, MORI Yuzo
Journal of the Japan Society for Precision Engineering, Contributed Papers Vol. Vol. 72, No.7, 934-938 No. 7 p. 934-938 2006
Publisher: The Japan Society for Precision Engineering
Ultraprecision finishing of photomask substrate by utilizing atmospheric pressure plasma
Towards Synthesis of Micro-/Nano-systems Vol. pp. 227-231 2006
Fabrication of ultraprecisely figured mirror for nano focusing hard-x-ray
Towards Synthesis of Micro-/Nano-systems Vol. pp. 295-300 2006
High spatial resolution machning utilizing atmospheric pressure plasma - Machining characteristics of silicon
Kazuya Yamamura, Kunihito Kato, Yasuhisa Sano, Masafumi Shibahara, Katsuyoshi Endo, Yuzo Mori
Progress of Machining Technology, Proceedings Vol. Vol. 45 8281-8285 p. 257-260 2006
Machining characteristics of ultraprecision atmospheric pressure plasma process
Kazuya Yamamura, Koji Ueno, Akihiro Fujiwara, Yasuhisa Sano, Yasusi Osikane, Masafumi Shibahara, Katsuyoshi Endo, Yuzo Mori
Progress of Machining Technology, Proceedings Vol. pp. 265-268 p. 265-268 2006
大気圧プラズマの生成制御と応用技術, 第13節 プラズマCVMによる超精密加工
サイエンス＆テクノロジー 2006
Ultra precision machining utilizing numerically controlled scanning of localized atmospheric pressure plasma
Proceedings of ICRP6/SPP23 Vol. 81-82 2006
Polishing characteristics of 4H-SiC Si-face and C-face by plasma chemical vaporization machining
2006
High spatial resolution machining utilizing atmospheric pressure plasma - machining characteristics of silicon -
K. Kato, K. Yamamura, Y. Sano, M. Shibahara, K. Endo, Y. Mori
Proceedings of ICRP6/SPP23 Vol. 363-364 2006/01
Rotational and vibrational temperature of Fulcher-alpha band emitted by hydrogen molecules in capacitive VHF CVD plasma process at atmosphere
Abstractbook of the 8th Asia-Pacific Conference on Plasma Science and Technology Vol. p.269 2006
Development of ultraprecision finishing method for quartz crystal wafer utilizing atmospheric pressure plasma
Towards Synthesis of Micro-/Nano-systems, Vol. pp. 233-237 2006
Development of Numerically Controlled Local Wet Etching
Prceedings of International 21st Century COE Symposium on Atomistic Fabrication Technology Vol. pp. 15-16 2006
Surface gradient integrated profiler for X-ray and EUV optics - 3D mapping of 1m-long flat mirror and off-axis parabolic mirror
Y. Higashi, Y. Takaie, K. Endo, T. Kume, K. Enami, K. Yamauchi, K. Yamamura, H. Sano, J. Uchikoshi, K. Ueno, Y. Mori
Proceedings of SPIE - The International Society for Optical Engineering Vol. 6317 2006
Measurement of rotational and vibrational temperature of gas molecule in the open-air type PCVM plasma by using spatial resolved emission spectra
Proceedings of 28th International Symposium on Dry Process Vol. pp. 49-50 2006
High spatial resolution machining utilizing atmospheric pressure plasma machining
Proceedings of 8th International Conference on Progress of Machining Technology Vol. pp. 257-260 2006
Improvement of the Thickness Distribution of AT Cut Quartz Crystal Wafer by Open-air Type Plasma Chemical Vaporization Machining
Proceedings of Handai Nanoscience and Nanotechnology International Symposium Vol. pp. 74 2006
Development of ultraprecision numerically controlled finishing machine utilizing atmospheric pressure plasma
Proceedings of 8th International Conference on Progress of Machining Technology Vol. pp. 253-256 2006
Numerically Controlled Local Wet Etching For Fabricating the Ultraprecision Optics
Proceedings of 5th International Conference on Optics-photonics Design & Fabrication Vol. pp. 257-258 2006
Ultraprecision Machining Utilizing Numerically Controlled Scanning of Localized Atmospheric Pressure Plasma
Jpn. J. Appl. Phys. 45 No.10B Vol. Vol. 45 8270-8276 2006
High spatial resolution machining utilizing atmospheric pressure plasma - machining characteristics of silicon -
Proceedings of ICRP6/SPP23 Vol. 363-364 2006
Ultra precision machining utilizing numerically controlled scanning of localized atmospheric pressure plasma
Proceedings of ICRP6/SPP23 Vol. 81-82 2006
Improvement of thickness uniformity of quartz crystal wafer by numerically controlled plasma CVM.
M. Shibahara, K. Yamamura, Y. Sano, T. Sugiyama, K. Endo, Y. Mori
Proc. SPIE 5918(2005) 591804 Vol. 5918, 591804 2005/10
A new designed ultra-high precision profiler
Y. Higashi, Y. Takaie, K. Endo, T. Kume, K. Enami, K. Yamauchi, K. Yamamura, Y. Sano, K. Ueno, Y. Mori
Proccedings of SPIE 5921 Vol. Vol. 5921, 592107 2005/10
Plasma Chemical Vaporization Machining (PCVM)
Y. Sano, K. Yamamura, K. Endo, Y. Mori
Book of Lecture Note, IWCGT-3, (2005) pp. 305-316. 2005/09
Fabrication of Ultraprecisely Figured Elliptical Mirror for Nano-Focusing of Hard X-ray and Evalation of Focusing Properties
YUMOTO Hirokatsu, MIMURA Hidekazu, MATSUYAMA Satoshi, HARA Hideyuki, YAMAMURA Kazuya, SANO Yasuhisa, UENO Kazumasa, ENDO Katsuyoshi, MORI Yuzo, NISHINO Yoshinori, TAMASAKU Kenji, YABASHI Makina, ISHIKAWA Tetsuya, YAMAUCHI Kazuto
Journal of the Japan Society for Precision Engineering. Supplement. Contributed papers Vol. 71 No. 9 p. 1137-1140 2005/09
Publisher: The Japan Society for Precision Engineering
Improvement of the thickness distribution of a quartz crystal wafer by numerically controlled plasma chemical vaporization machining
M Shibahara, K Yamamura, Y Sano, T Sugiyama, K Endo, Y Mori
REVIEW OF SCIENTIFIC INSTRUMENTS Vol. 76 No. 9 2005/09
Improvement of Thickness Distribution of Quartz Crystal Wafer by Numerically Controlled Plasma Chemical Vaporization Machining
Masafumi Shibahara, Kazuya Yamamura, Yasuhisa Sano, Tsuyoshi Sugiyama, Katsuyoshi Endo, Yuzo Mori
Review of Scientific Instruments Vol. 76 No. 9 2005/09
A new Designed High-Precision Profiler
Y.Higashi, Y.Takaie, K.Endo, T.Kume, K.Enami, K.Yamauchi, K.Yamamura, K.Ueno, Y.Mori
Proceedings of SPIE - The International Society for Optical Engineering Vol. 5921 p. 1-9 2005/08
Fabrication of elliptically figured mirror for focusing hard X-rays to size less than 50 nm
H. Yumoto, H. Mimura, S. Matsuyama, K. Yamamura, Y. Sano, K. Ueno, K. Endo, Y. Mori, Y. Nishino, M. Yabashi, K. Tamasaku, T. Ishikawa, K. Yamauchi
Review of Scientific Instruments, 76, 063708 (2005). Vol. 76 No. 6 2005/07
Element Array by Scanning X-ray Fluorescence Microscopy after Cis-Diamminedichloro-Platinum(II) Treatment
M. Shimura, A. Saito, S. Matsuyama, T. Sakuma, Y. Terui, K. Ueno, H. Yumoto, K. Yamauchi, K. Yamamura, H. Mimura, Y. Sano, M. Yabashi, K. Tamasaku, K. Nishio, Y. Nishino, K. Endo, K. Hatake, Y. Mori, Y. Ishizaka, T. Ishikawa
Cancer Research Vol. 65 No. 12 p. 4998-5002 2005/07
Element array by scanning X-ray fluorescence microscopy after Cis-diamminedichloro-platinum(II) treatment
M Shimura, A Saito, S Matsuyama, T Sakuma, Y Terui, K Ueno, H Yumoto, K Yamauchi, K Yamamura, H Mimura, Y Sano, M Yabashi, K Tamasaku, K Nishio, Y Nishino, K Endo, K Hatake, Y Mori, Y Ishizaka, T Ishikawa
CANCER RESEARCH Vol. 65 No. 12 p. 4998-5002 2005/06
Fabrication of elliptically figured mirror for focusing hard x rays to size less than 50 nm
H Yumoto, H Mimura, S Matsuyama, H Hara, K Yamamura, Y Sano, K Ueno, K Endo, Y Mori, M Yabashi, Y Nishino, K Tamasaku, T Ishikawa, K Yamauchi
REVIEW OF SCIENTIFIC INSTRUMENTS Vol. 76 No. 6 2005/06
Hard x-ray focusing less than 50nm for nanoscopy/spectroscopy
Kazuto Yamauchi, Hidekazu Mimura, Satoshi Matsuyama, Hirokatsu Yumoto, Soichiro Handa, Kazuya Yamamura, Yasuhisa Sano, Katsuyoshi Endo, Yuzo Mori, Yoshinori Nishino, Kenji Tamasaku, Makina Yabashi, Tetsuya Ishikawa
AIP Conference Proceedings Vol. 879 No. Pt.1 p. 786-791 2005/05
Improvement of Thickness Uniformity of Quartz Wafer by Numerically Controlled Plasma CVM -Correction of Thickness Variation of Quartz Wafer by Numerically Controlled Machining Utilizing Rotary Electrode-
Masafumi SHIBAHARA, Kazuya YAMAMURA, Yasuhisa SANO, Tsuyoshi SUGIYAMA, Katsuyoshi ENDO, Yuzo MORI
Journal of the Japan Society for Precision Engineering Vol. Vol.71, No.5, pp.655-659. No. 5 p. 655-659 2005/05
Publisher: The Japan Society for Precision Engineering
EEM (Elastic Emission Machining)による4H-SiC(0001)表面の平滑化
久保田章亀, 三村秀和, 佐野泰久, 山村和也, 山内和人, 森 勇藏
精密工学会誌論文集 Vol. 71 No. 4 p. 477-480 2005/04
Creation of Perfect Surfaces
Yuzu Mori, Kazuya Yamamura, Katsuyoshi Endo, Kazuto Yamauchi, Kiyoshi Yasutake, Hidekazu Goto, Hiroaki Kakiuchi, Yasuhisa Sano, Hidekazu Mimura
Journal of Crystal Growth Vol. 275 No. 1-2 p. 39-50 2005/04
Relative angle determinable stitching interferometry for hard x-ray reflective optics
H Mimura, H Yumoto, S Matsuyama, K Yamamura, Y Sano, K Ueno, K Endo, Y Mori, M Yabashi, K Tamasaku, Y Nishino, T Ishikawa, K Yamauchi
REVIEW OF SCIENTIFIC INSTRUMENTS Vol. 76 No. 4 2005/04
Hard X-ray Diffraction-Limited Nanofocusing with Kirkpatrick-Baez Mirrors
H. Mimura, S. Matsuyama, H. Yumoto, H. Hara, K. Yamamura, Y. Sano, M. Shibahara, K. Endo, Y. Mori, Y. Nishino, K. Tamasaku, M. Yabashi, T. Ishikawa, K. Yamauchi
Japanese Journal of Applied Physics Part 2 Vol. 44 (18), L539-L542 (2005)/, 2005/04
Improvement of Thickness Uniformity of Quartz Wafer by Numerically Controlled Plasma CVM -Development of the NC-PCVM Machine and Acquisition of Machining Properties-
Kazuya Yamamura, Masafumi Shibahara, Yasuhisa Sano, Tsuyoshi Sugiyama, Katsuyoshi Endo, Yuzo Mori
Journal of the Japan Society for Precision Engineering Vol. 71 No. 4 p. 455-459 2005/04
Publisher: The Japan Society for Precision Engineering
超高精度X線集光ミラーの作製と集光特性の評価
三村秀和, 松山智至, 湯本博勝, 原英之, 山村和也, 西野吉則, 玉作賢治, 矢橋牧名, 石川哲也
精密工学会大会学術講演会講演論文集 Vol. 2005 2005/03/01
Development of surface figuring and smoothing technologies for ultraprecise X-ray mirror Fabrication
H. Mimura, H. Yumoto, S. Matsuyama, K. Yamamura, Y. Sano, K. Endo, Y. Mori, Y. Nishino, K. Tamasaku, M. Yabashi, T. Ishikawa, K. Yamauchi
2005/02
Relative angle determinable stitching interferometry for hard X-ray reflective optics
H. Mimura, H. Yumoto, S. Matsuyama, K. Yamamura, Y. Sano, K. Ueno, K. Endo, Y. Mori, Y. Nishino, K. Tamasaku, M. Yabashi, T. Ishikawa, K. Yamauchi
Review of Scientfic Instruments Vol. 76 No. 4 2005/02
Fabrication of ultraprecisely figured and ultrasmooth elliptical mirrors for hard X-ray nanofocusing
K. Yamuchi, H. Mimura, K. Yamamura, Y. Sano, K. Ueno, S. Matsuyama, K. Endo, Y. Nishino, K. Tamasaku, M. Yabashi, T. Ishikawa
2005/02
Creation of perfect surfaces
Y Mori, K Yamamura, K Endo, K Yamauchi, K Yasutake, H Goto, H Kakiuchi, Y Sano, H Mimura
JOURNAL OF CRYSTAL GROWTH Vol. 275 No. 1-2 p. 39-50 2005/02
Flattening SiC surface by elastic emission machining (EEM)
Kubota Akihisa, Mimura Hidekazu, Inagaki Kouji, Sano Yasuhisa, Yamamura Kazuya, Yamauchi Kazuto, Mori Yuzo
Proceedings of JSPE Semestrial Meeting Vol. 2005 No. 0 p. 785-785 2005
Publisher: The Japan Society for Precision Engineering
Investigation of machining mechanism in Elastic Emission Machining by STM
Katoh Jun, Kubota Akihisa, Arima Kenta, Yamamura Kazuya, Mori Yuzo, Yamauchi Kazuto, Endo Katsuyoshi
Proceedings of JSPE Semestrial Meeting Vol. 2005 No. 0 p. 779-780 2005
Publisher: The Japan Society for Precision Engineering
Characteristics of SiC surface processed by Plasma CVM (Chemical Vaporization Machining)
Watanabe Masayo, Sano Yasuhisa, Yamamura Kazuya, Yamauchi Kazuto, Ishida tsuyoshi, Arima kenta, Endo Katsuyoshi, Mori Yuzo
Proceedings of JSPE Semestrial Meeting Vol. 2005 No. 0 p. 529-530 2005
Publisher: The Japan Society for Precision Engineering
Surface profile measurement of hard X-ray nanofocusing mirrors
Yumoto Hirokatsu, Mimura Hidekazu, Matsuyama Satoshi, Yamamura Kazuya, Sano Yasuhisa, Endo Katsuyoshi, Mori Yuzo, Ishikawa Tetsuya, Yamauchi Kazuto
Proceedings of JSPE Semestrial Meeting Vol. 2005 No. 0 p. 453-454 2005
Publisher: The Japan Society for Precision Engineering
Fabrication of Ultraprecisely Figured Elliptical Mirror for Nano-Focusing of Hard X-ray and Evaluation of Focusing Properties
YUMOTO Hirokatsu, MIMURA Hidekazu, MATSUYAMA Satoshi, HARA Hideyuki, YAMAMURA Kazuya, SANO Yasuhisa, UENO Kazumasa, ENDO Katsuyoshi, MORI Yuzo, NISHINO Yoshinori, TAMASAKU Kenji, YABASHI Makina, ISHIKAWA Tetsuya, YAMAUCHI Kazuto
Journal of the Japan Society for Precision Engineering. Supplement. Contributed papers Vol. 精密工学会誌 Vol. 71 No. 9 pp.1137-1140 No. 9 p. 1137-1140 2005
Publisher: The Japan Society for Precision Engineering
Development of surface figuring and smoothing technologies for ultraprecise X-ray mirror Fabrication
2005
Fabrication of ultraprecisely figured and ultrasmooth elliptical mirrors for hard X-ray nanofocusing
2005
Hard X-ray diffraction-limited nanofocusing with Kirkpatrick-Baez mirrors
H Mimura, S Matsuyama, H Yumoto, H Hara, K Yamamura, Y Sano, M Shibahara, K End, Y Mori, Y Nishino, K Tamasaku, M Yabashi, T Ishikawa, K Yamauchi
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS Vol. 44 No. 16-19 p. L539-L542 2005
EEM (Elastic Emission Machining)による4H-SiC(0001)表面の平滑化
精密工学会誌論文集 Vol. , 71(4), 477-480 (2005) 2005
Improvement of Thickness Uniformity of Quartz Wafer by Numerically controlled Plasma CVM : Development of the NC-PCVM Machine and Acquisition of Machining Properties
YAMAMURA Kazuya, SHIBAHARA Masafumi, SANO Yasuhisa, SUGIYAMA Tsuyoshi, ENDO Katsuyoshi, MORI Yuzo
Journal of the Japan Society for Precision Engineering. Supplement. Contributed papers Vol. 71 No. 4 p. 455-459 2005
Publisher: The Japan Society for Precision Engineering
Improvement of Thickness Uniformity of Quartz Wafer by Numerically Controlled Plasma CVM : Correction of Thickness Variation of Quartz Wafer by Numerically Controlled Machining Utilizing Rotary Electrode
SHIBAHARA Masafumi, YAMAMURA Kazuya, SANO Yasuhisa, SUGIYAMA Tsuyoshi, ENDO Katsuyoshi, MORI Yuzo
Journal of the Japan Society for Precision Engineering. Supplement. Contributed papers Vol. Vol.71, No.5, pp.655-659. No. 5 p. 655-659 2005
Publisher: The Japan Society for Precision Engineering
Plasma Chemical Vaporization Machining (PCVM)
Book of Lecture Note, IWCGT-3, (2005) pp. 305-316. 2005
Improvement of thickness uniformity of quartz crystal wafer by numerically controlled plasma CVM
Masafumi Shibahara, Kazuya Yamamura, Yasuhisa Sano, Tsuyoshi Sugiyama, Katsuyoshi Endo, Yuzo Mori
Proceedings of SPIE - The International Society for Optical Engineering Vol. 5869 p. 1-8 2005
数値制御プラズマＣＶＭによる水晶ウエハの高精度加工に関する研究 －円筒型回転電極を用いた数値制御加工による水晶ウエハ厚さの均一化－
精密工学会誌, Vol.71, No.5, pp.655-659. Vol. Vol.71, No.5, pp.655-659./, 2005
Hard X-ray diffraction-limited nanofocusing with kirkpatrick-baez mirrors
Hidekazu Mimura, Satoshi Matsuyama, Hirokatsu Yumoto, Hideyuki Hara, Kazuya Yamamura, Yasuhisa Sano, Masafumi Shibahara, Katsuyoshi Endo, Yuzo Mori, Yoshinori Nishlno, Kenji Tamasaku, Makina Yabashi, Tetsuya Ishikawa, Kazuto Yamauchi
Japanese Journal of Applied Physics, Part 2: Letters Vol. 44 No. 16-19 p. L539-L542 2005
Improvement of thickness uniformity of quartz crystal wafer by numerically controlled plasma CVM.
Proc. SPIE 5918(2005) 591804 Vol. 5918, 591804 2005
Improvement of Thickness Uniformity of Quartz Wafer by Numerically Controlled Plasma CVM -Development of the NC-PCVM Machine and Acquisition of Machining Properties-
YAMAMURA Kazuya, SHIBAHARA Masafumi, SANO Yasuhisa, SUGIYAMA Tsuyoshi, ENDO Katsuyoshi, MORI Yuzo
Journal of the Japan Society for Precision Engineering Vol. 71 No. 4 p. 455-459 2005
Publisher: The Japan Society for Precision Engineering
Development of surface figuring and smoothing technologies for ultraprecise X-ray mirror Fabrication
2005
Plasma Chemical Vaporization Machining (PCVM)
Book of Lecture Note, IWCGT-3, (2005) pp. 305-316. 2005
A new designed ultra-high precision profiler
Y. Higashi, Y. Takaie, K. Endo, T. Kume, K. Enami, K. Yamauchi, K. Yamamura, H. Sano, K. Ueno, Y. Mori
Proceedings of SPIE - The International Society for Optical Engineering Vol. 5921 p. 1-9 2005
Improvement of thickness uniformity of quartz crystal wafer by numerically controlled plasma CVM.
Proc. SPIE 5918(2005) 591804 Vol. 5918, 591804/, 2005
Improvement of Thickness Uniformity of Quartz Wafer by Numerically Controlled Plasma CVM -Correction of Thickness Variation of Quartz Wafer by Numerically Controlled Machining Utilizing Rotary Electrode-
SHIBAHARA Masafumi, YAMAMURA Kazuya, SANO Yasuhisa, SUGIYAMA Tsuyoshi, ENDO Katsuyoshi, MORI Yuzo
Journal of the Japan Society for Precision Engineering Vol. Vol.71, No.5, pp.655-659./, No. 5 p. 655-659 2005
Publisher: The Japan Society for Precision Engineering
硬X線ナノ集光のための高精度楕円体ミラーの作製と集光特性の評価
湯本博勝, 山内和人, 三村秀和, 松山智至, 山村和也, 佐野泰久, 西野吉則, 玉作賢治, 矢橋牧名
応用物理学会学術講演会講演予稿集 Vol. 65th No. 2 2004/09/01
ミラー集光系を用いたX線顕微鏡(ナノスコピー)の開発
松山智至, 山内和人, 三村秀和, 湯本博勝, 山村和也, 西野吉則, 玉作賢治, 矢橋牧名, 石川哲也
応用物理学会学術講演会講演予稿集 Vol. 65th No. 2 2004/09/01
Machining of next generation semiconductor materials by plasma chemical vaporization machining
Kazuya Yamamura, Yuzo Mori, Yasuhisa Sano
Abstracts of the 14th international conference on crystal growth, pp.606 Vol. pp.606 2004/08
Microstitching Interferometry for hard X-ray nanofocusing mirrors
H. Mimura, H. Yumoto, K. Yamamura, Y. Sano, S. Matsuyama, K. Ueno, K. Endo, Y. Mori, M. Yabashi, K. Tamasaku, Y. Nishino, T. Ishikawa, K. Yamauchi
Proceedings of SPIE Vol. 5533, 171-180 2004/08
Wave-optical and ray-tracing analysis to establish a two dimensional focusing unit using K-B arrangement
S. Matsuyama, H. Mimura, K. Yamamura, H. Yumoto, Y. Sano, K. Endo, Y. Mori, M. Yabashi, K. Tamasaku, Y. Nishino, T. Ishikawa, K. Yamauchi
Proceedings of SPIE Vol. 5533 p. 181-191 2004/08
Fabrication technology of ultraprecise mirror optics to realize hard X-ray nanobeam, SPIE International Symposium, Optical Science and Technology
K. Yamauchi, K. Yamamura, H. Mimura, Y. Sano, S. Matsuyama, H. Yumoto, K. Ueno, M. Shibahara, K. Endo, M. Yabashi, K. Tamasaku, Y. Nishino, T. Ishikawa, Y. Mori
Proceedings of SPIE Vol. 5533 p. 116-123 2004/08
Creation of perfect surfaces
Yuzo Mori, Kazuya Yamamura, Katsuyoshi Endo, Kazuto Yamauchi, Kiyoshi Yasutake, Hidekazu Goto, Hiroaki Kakiuchi, Yasuhisa Sano, Hidekazu Mimura
Abstracts the 14th international conference on crystal growth, pp.211 2004/08
Image quality improvement in hard X-ray projection microscope using total reflection mirror optics
H. Mimura, K. Yamauchi, K. Yamamura, A. Kubota, S. Matsuyama, Y. Sano, K. Ueno, K. Endo, Y. Nishino, K. Tamasaku, M. Yabashi, T. Ishikawa, Y. Mori
Journal of Synchrotoron Radiation, 11, pp. 343-346. Vol. 11, pp. 343-346/, 2004/07
Image quality improvement in a hard X-ray projection microscope using total reflection mirror optics
H Mimura, K Yamauchi, K Yamamura, A Kubota, S Matsuyama, Y Sano, K Ueno, K Endo, Y Nishino, K Tamasaku, M Yabashi, T Ishikawa, Y Mori
JOURNAL OF SYNCHROTRON RADIATION Vol. 11 p. 343-346 2004/07
Thinning of silicon-on-insulator wafers by numerically controlled plasma chemical vaporization machining
Yuzo Mori, Kazuya Yamamura, Yasuhisa Sano
Review of Scientific Instruments, Vol. 75, No. 4, pp.942-946 Vol. 75 No. 4 p. 942-946 2004/04
Thinning of silicon-on-insulator wafers by numerically controlled plasma chemical vaporization machining
Yuzo Mori, Kazuya Yamamura, Yasuhisa Sano
Review of Scientific Instruments Vol. 75 No. 4 p. 942-946 2004/04
Thinning of silicon-on-insulator wafers by numerically controlled plasma chemical vaporization machining
Y Mori, K Yamamura, Y Sano
REVIEW OF SCIENTIFIC INSTRUMENTS Vol. 75 No. 4 p. 942-946 2004/04
走査型X線顕微鏡のための楕円体ミラーを用いた二次元集光ユニットの開発
松山智至, 山内和人, 山村和也, 三村秀和, 佐野泰久, 玉作賢治, 矢橋牧名, 西野吉則, 石川哲也
応用物理学関係連合講演会講演予稿集 Vol. 51st No. 2 2004/03/28
27pPSA-45 First-principles study of surface of α-alumina : Searching for Etching process based on chemical reaction
Kakeya S., Inagaki K., Yamamura K., Sano Y., Hirose K., Endo K.
Meeting abstracts of the Physical Society of Japan Vol. 59 No. 1 p. 899-899 2004/03/03
Publisher: The Physical Society of Japan (JPS)
Fabrication technology for hard X-ray reflective optics
Y. Mori, K. Yamuchi, K. Yamamura, H. Mimura, Y.Sano, S. Matsuyama, K. Endo, Y. Nishino, K. Tamasaku, M. Yabashi, T. Ishikawa
Proceedings of Second International Workshop on Metrology for X-ray Optics 2004/03
STM observations of Si(011) and Si(111) surfaces finished by ultra-precision machining
Katoh Jun, Kubota Akihisa, Arima Kenta, Yamamura Kazuya, Yamauchi Kazuto, Endo Katsuyoshi, Mori Yuzo
Proceedings of JSPE Semestrial Meeting Vol. 2004 No. 0 p. 384-384 2004
Publisher: The Japan Society for Precision Engineering
Measurement of surface profiles of elliptical mirrors by using interferometer -Development of highly accurate stitching method-
Yumoto Hirokatsu, Yamauchi Kazuto, Mimura Hidekazu, Matsuyama Satoshi, Yamamura Kazuya, Sano Yasuhisa, Endo Katsuyoshi, Ishikawa Tetsuya, Mori Yuzo
Proceedings of JSPE Semestrial Meeting Vol. 2004 No. 0 p. 116-116 2004
Publisher: The Japan Society for Precision Engineering
Fabrication technology for hard X-ray reflective optics
Proceedings of Second International Workshop on Metrology for X-ray Optics 2004
数値制御プラズマＣＶＭによる次世代超薄膜ＳＯＩウエハの製作
佐野泰久, 山村和也, 遠藤勝義, 森 勇藏
大阪大学低温センターだより，125,11-15 Vol. 125,11-15 p. 11-15 2004/01
Publisher: 大阪大学低温センター
原子の滑らかさの加工技術
O plus E, Vol. 26, No.1, pp.36-42 Vol. Vol. 26, No.1, pp.36-42 2004
Microstitching interferometry for nano focusing mirror optics
H Mimura, H Yumoto, S Matsuyama, K Yamamura, Y Sano, K Ueno, K Endo, Y Mori, M Yabashi, K Tamasaku, Y Nishino, T Ishikawa, K Yamauchi
ADVANCES IN MIRROR TECHNOLOGY FOR X-RAY, EUV LITHOGRAPHY, LASER, AND OTHER APPLICATIONS II Vol. 5533 p. 171-180 2004
Creation of perfect surfaces
2004
数値制御プラズマＣＶＭによる次世代超薄膜ＳＯＩウエハの製作
森 勇蔵, 佐野 泰久, 山村 和也, 遠藤 勝義, ヤマムラ カズヤ, モリ ユウゾウ, エンドウ カツヨシ, サノ ヤスヒサ
大阪大学低温センターだより，125,11-15 Vol. 125,11-15/, p. 11-15 2004
Publisher: 大阪大学低温センター
原子の滑らかさの加工技術
O plus E, Vol. 26, No.1, pp.36-42 Vol. Vol. 26, No.1, pp.36-42/, 2004
Machining of next generation semiconductor materials by plasma chemical vaporization machining
Abstracts of the 14th international conference on crystal growth, pp.606 Vol. pp.606 2004
Quality improvement in hard X-ray projection microscope using total reflection mirror optics.
J. Synchrotron Rad. Vol. Vol. 11, pp. 343-346./, 2004
Ultra-precision machining technology of realizing atomically smooth surface
O plus E, Vol. 26, No.1, pp.36-42 Vol. Vol. 26, No.1, pp.36-42 2004
Image quality improvement in hard X-ray projection microscope using total reflection mirror optics
Journal of Synchrotoron Radiation, 11, pp. 343-346. Vol. 11, pp. 343-346 2004
Fabrication technology of ultraprecise mirror optics to realize hard X-ray nanobeam
K Yamauchi, K Yamamura, H Mimura, Y Sano, S Matsuyama, H Yumoto, K Ueno, M Shibahara, K Endo, M Yabashi, K Tamasaku, Y Nishino, T Ishikawa, Y Mori
ADVANCES IN MIRROR TECHNOLOGY FOR X-RAY, EUV LITHOGRAPHY, LASER, AND OTHER APPLICATIONS II Vol. 5533 p. 116-123 2004
Creation of perfect surfaces
Abstracts the 14th international conference on crystal growth, pp.211 2004
Ultra-precision machining technology of realizing atomically smooth surface
Yuzo Mori, Kazuya Yamamura, Kazuto Yamauchi, Yasuhisa Sano, Hidekazu Mimura
O plus E, Vol. 26, No.1, pp.36-42 Vol. Vol. 26, No.1, pp.36-42 2004/01
Publisher: (株)新技術コミュニケーションズDevelopment of a figure correction method having spatial resolution close to 0.1mm
Y Mori, K Yamauchi, K Yamamura, H Mimura, Y Sano, A Saito, K Endo, A Souvorov, M Yabashi, K Tamasaku, T Ishikawa
ADVANCES IN MIRROR TECHNOLOGY FOR X-RAY, EUV LITHOGRAPHY, LASER, AND OTHER APPLICATIONS Vol. 5193 p. 105-111 2004
Fabrication technology for hard X-ray reflective optics
Proceedings of Second International Workshop on Metrology for X-ray Optics 2004
Microstitching Interferometry for hard X-ray nanofocusing mirrors
Proceedings of SPIE Vol. 5533, 171-180/, 2004
Wave-optical and ray-tracing analysis to establish a compact two-dimensional focusing unit using K-B mirror arrangement
S Matsuyama, H Mimura, K Yamamura, H Yumoto, Y Sano, K Endo, Y Mori, M Yabashi, K Tamasaku, Y Nishino, T Ishikawa, K Yamauchi
ADVANCES IN MIRROR TECHNOLOGY FOR X-RAY, EUV LITHOGRAPHY, LASER, AND OTHER APPLICATIONS II Vol. 5533 p. 181-191 2004
Ultra-precision machining technology of realizing atomically smooth surface
O plus E, Vol. 26, No.1, pp.36-42 Vol. Vol. 26, No.1, pp.36-42/, 2004
Machining of next generation semiconductor materials by plasma chemical vaporization machining
Abstracts of the 14th international conference on crystal growth, pp.606 Vol. pp.606 2004
Ultraviolet Emission Spectroscopy and Absorption Spectroscopy of CF2 Radical in Chemical Vaporization Machining (CVM) Plasma Generated with High Speed Rotating Cylindrical Electrode
Yasushi Oshikane, Shinya Sato, Akihiko Nagao, Kazuya Yamamura, Katsuyoshi Endo, Yuzo Mori
Technical Program of AVS 50th 2003/11
Two-dimensional submicron focusing of hard X-rays by two elliptical mirrors fabricated by plasma chemical vaporization machining and elastic emission machining
K Yamauchi, K Yamamura, H Mimura, Y Sano, A Saito, K Endo, A Souvorov, M Yabashi, K Tamasaku, T Ishikawa, Y Mori
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS Vol. 42 No. 11 p. 7129-7134 2003/11
Two-dimensional Submicron Focusing of Hard X-rays by Two Elliptical Mirrors Fabricated by Plasma Chemical Vaporization Machining and Elastic Emission Machining
Kazuto Yamauchi, Kazuya Yamamura, Hidekazu Mimura, Yasuhisa Sano, Akira Saito, Katsuyoshi Endo, Alexei Souvorov, Makina Yabashi, Kenji Tamasaku, Tetsuya Ishikawa, Yuzo Mori
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS Vol. 42 No. 11 p. 7129-7134 2003/11
Fabrication of elliptical mirror at nanometer-level accuracy for hard x-ray focusing by numerically controlled plasma chemical vaporization machining.
K. Yamamura, K. Yamauchi, H. Mimura, Y. Sano, A. Saito, K. Endo, A. Souvorov, M. Yabashi, K. Tamasaku, T. Ishikawa, Y. Mori
REVIEW OF SCIENTIFIC INSTRUMENTS Vol. 74 No. 10 p. 4549-4553 2003/10
Fabrication of elliptical mirror at nanometer-level accuracy for hard x-ray focusing by numerically controlled plasma chemical vaporization machining
K Yamamura, K Yamauchi, H Mimura, Y Sano, A Saito, K Endo, A Souvorov, M Yabashi, K Tamasaku, T Ishikawa, Y Mori
REVIEW OF SCIENTIFIC INSTRUMENTS Vol. 74 No. 10 p. 4549-4553 2003/10
Fabrication technology of hard X-ray aspherical mirror optics and application to nanospectroscopy
Y. Mori, K. Yamauchi, K. Yamamura, H. Mimura, Y. Sano, A. Saito, K. Endo, A. Souvorov, M. Yabashi, K
Proc. SPIE 5193, pp.11-17 Vol. 5193, pp.11-17/, 2003/08
Development of a figure correction method having spatial resolution close to 0.1mm
Y. Mori, K. Yamauchi, K. Yamamura, H. Mimura, Y. Sano, A. Saito, K. Endo, A. Souvorov, M. Yabashi, K. Tamasaku, T. Ishikawa
Proc. SPIE 5193, pp.105-111 Vol. 5193 p. 105-111 2003/08
Wave-optical evaluation of reflected X-ray intensity and wavefront distribution in total reflection hard X-ray mirror optics
Kazuto Yamauchi, Kazuya Yamamura, Hidekazu Mimura, Yasuhisa Sano, Akira Saito, Akihisa Kubota, Masahiko Kanaoka, Alexei Souvorov, Kenji Tamasaku, Makina Yabashi, Tetsuya Ishikawa, Yuzo Mori
Journal of the Japan Society of Precision Engineering Vol. 69, 997-1001/, No. 7 p. 997-1001 2003/07
Publisher: The Japan Society for Precision Engineering
Development of the Measurement System with Interferometers for Ultraprecise X-ray mirror
Kazuto Yamauchi, Kazuya Yamamura, Hidekazu Mimura, Yasuhisa Sano, Akihisa Kubota, Yasuhiro Sekito, Kazumasa Ueno, Alexei Souvorov, Kenji Tamasaku, Makina Yabashi, Tetsuya Ishikawa, Yuzo Mori
Journal of the Japan Society of Precision Engineering Vol. 69 No. 6 p. 856-860 2003/06
Publisher: The Japan Society for Precision Engineering
Microstitching interferometry for x-ray reflective optics
K. Yamauchi, K. Yamamura, H. Mimura, Y. Sano, A. Saito, K. Ueno, K. Endo, A. Souvorov, M. Yabashi, K. Tamasaku, T. Ishikawa, Y. Mori
REVIEW OF SCIENTIFIC INSTRUMENTS Vol. 74 No. 5 p. 2894-2898 2003/05
Thinning of SOI by numerically controlled Plasma CVM(Chemical Vaporization Machining) -Evalation of Machined Surface for Electron Devices-
Yuzo Mori, Yasuhisa Sano, Kazuya Yamamura, Satoru Morita, Ichiro Ohshima, Yuji Saito, Shigetoshi Sugawa, Tadahiro Ohmi
Journal of the Japan Society of Precision Engineering Vol. 69 721-725 No. 5 p. 721-725 2003/05
Publisher: The Japan Society for Precision Engineering
Microstitching interferometry for x-ray reflective optics
K Yamauchi, K Yamamura, H Mimura, Y Sano, A Saito, K Ueno, K Endo, A Souvorov, M Yabashi, K Tamasaku, T Ishikawa, Y Mori
REVIEW OF SCIENTIFIC INSTRUMENTS Vol. 74 No. 5 p. 2894-2898 2003/05
Fabrication of Ultraprecise X-ray Mirror by Plasma CVM and EEM and the Application of the Mirror
Mori Yuzo, Yamauchi Kazuto, Yamamura Kazuya, Mimura Hidekazu, Sano Yasuhisa, Kubota Akihisa, Endo Katsuyoshi, Souvorov Alexei, Tamasaku Kenji, Yabashi Makina, Ishikawa Tetsuya
Proceedings of JSPE Semestrial Meeting Vol. 2003 No. 0 p. 388-388 2003
Publisher: The Japan Society for Precision Engineering
加工技術データファイル 基礎編（特殊加工）、5.7プラズマＣＶＭ
（財）機械振興協会 技術研究所 2003
Crystal Growth Technology(Plasma-CVM(Chemical Vaporization Machining))
John Wiley & Sons Vol. pp. 587-606 2003
Ultraprecision Machining based on Physics and Chemistry
Yuzo Mori, Kikuji Hirose, Kazuto Yamauchi, Hidekazu Goto, Kazuya Yamamura, Yasuhisa Sano
Sensors and Materials Sensors and Materials Vol. 15 No. 1 p. 001-019 2003/01
Ultraviolet Emission Spectroscopy and Absorption Spectroscopy of CF2 Radical in Chemical Vaporization Machining (CVM) Plasma Generated with High Speed Rotating Cylindrical Electrode
Technical Program of AVS 50th 2003
数値制御プラズマCVM(Chemical Vaporization Machining)によるSOIの薄膜化 －デバイス用基板としての加工面の評価－
精密工学会誌 69 (2003) 721-725. Vol. 69 721-725 2003
高精度X線ミラーのための干渉計を利用した形状計測システムの開発
精密工学会誌, 69, 6, 856-860 Vol. 69, 6, 856-860 2003
硬Ｘ線用斜入射平面ミラーの形状誤差が反射Ｘ線強度・位相分布に及ぼす影響の波動光学的評価
精密工学会誌, 69, 2003, 997-1001 Vol. 69, 997-1001 2003
Fabrication technology of hard X-ray aspherical mirror optics and application to nanospectroscopy
Proc. SPIE 5193, pp.11-17 Vol. 5193, pp.11-17 2003
Thinning of SOI by numerically controlled Plasma CVM (Chemical Vaporization Machining) : Evaluation of Machined Surface for Electron Devices
MORI Yuzo, SANO Yasuhisa, YAMAMURA Kazuya, MORITA Satoru, MORITA Mizuho, OHSHIMA Ichiro, SAITO Yuji, SUGAWA Shigetoshi, OHMI Tadahiro
Journal of the Japan Society of Precision Engineering Vol. 69 721-725 No. 5 p. 721-725 2003
Publisher: The Japan Society for Precision Engineering
Development of the Measurement System with Interferometers for Ultraprecise X-ray Mirror
YAMAUCHI Kazuto, YAMAMURA Kazuya, MIMURA Hidekazu, SANO Yasuhisa, KUBOTA Akihisa, SEKITO Yasuhiro, UENO Kazumasa, SOUVOROV Alexei, TAMASAKU Kenji, YABASHI Makina, ISHIKAWA Tetsuya, MORI Yuzo
Journal of the Japan Society of Precision Engineering Vol. 69, 6, 856-860/, No. 6 p. 856-860 2003
Publisher: The Japan Society for Precision Engineering
硬Ｘ線用斜入射平面ミラーの形状誤差が反射Ｘ線強度・位相分布に及ぼす影響の波動光学的評価
精密工学会誌, 69, 2003, 997-1001 Vol. 69, 997-1001/, 2003
硬Ｘ線用斜入射平面ミラーの形状誤差が反射Ｘ線強度・位相分布に及ぼす影響の波動光学的評価
精密工学会誌 Vol. Vol. 69, pp. 997-1001./, 2003
高精度X線ミラーのための干渉計を利用した形状計測システムの開発
精密工学会誌 Vol. Vol. 69, pp. 856-860./, 2003
数値制御プラズマCVM(Chemical Vaporization Machining)によるSOIの薄膜化 －デバイス用基板としての加工面の評価－
精密工学会誌 Vol. Vol. 69, pp. 721-725./, 2003
Fabrication of elliptical mirror at nanometer-level accuracy for hard x-ray focusing by numerically controlled plasma chemical vaporization machining.
Rev. Sci. Instrum. Vol. Vol. 74, pp. 4549-4553./, 2003
Crystal Growth Technology(Plasma-CVM(Chemical Vaporization Machining))
John Wiley & Sons Vol. pp. 587-606 2003
Wave-optical evaluation of reflected X-ray intensity and wavefront distribution in total reflection hard X-ray mirror optics
YAMAUCHI Kazuto, YAMAMURA Kazuya, MIMURA Hidekazu, SANO Yasuhisa, SAITO Akira, KUBOTA Akishisa, KANAOKA Masahiko, SOUVOROV Alexei, TAMASAKU Kenji, YABASHI Makina, ISHIKAWA Tetsuya, MORI Yuzo
Journal of the Japan Society of Precision Engineering Vol. 69, 997-1001 No. 7 p. 997-1001 2003
Publisher: The Japan Society for Precision Engineering
Ultraprecision Machining based on Physics and Chemistry
Yuzo Mori, Kikuji Hirose, Kazuto Yamauchi, Hidekazu Goto, Kazuya Yamamura, Yasuhisa Sano
Sensors and Materials, Vol. 15, No. 1 (2003), pp.1-19. 2003/01
Thinning of SOI by numerically controlled Plasma CVM(Chemical Vaporization Machining) -Evalation of Machined Surface for Electron Devices-
MORI Yuzo, SANO Yasuhisa, YAMAMURA Kazuya, MORITA Satoru, MORITA Mizuho, OHSHIMA Ichiro, SAITO Yuji, SUGAWA Shigetoshi, OHMI Tadahiro
Journal of the Japan Society of Precision Engineering Vol. 69 721-725 No. 5 p. 721-725 2003
Publisher: The Japan Society for Precision Engineering
Development of the Measurement System with Interferometers for Ultraprecise X-ray mirror
Vol. 69, 6, 856-860 2003
Wave-optical evaluation of reflected X-ray intensity and wavefront distribution in total reflection hard X-ray mirror optics
Vol. 69, 997-1001 2003
Fabrication technology of hard X-ray aspherical mirror optics and application to nanospectroscopy
Proc. SPIE 5193, pp.11-17 Vol. 5193, pp.11-17 2003
Ultraprecision Machining based on Physics and Chemistry
Sensors and Materials, Vol. 15, No. 1 (2003), pp.1-19. 2003
Ultraviolet Emission Spectroscopy and Absorption Spectroscopy of CF2 Radical in Chemical Vaporization Machining (CVM) Plasma Generated with High Speed Rotating Cylindrical Electrode
Technical Program of AVS 50th 2003
Thinning of SOI by numerically controlled Plasma CVM(Chemical Vaporization Machining) -Evalation of Machined Surface for Electron Devices-
Vol. 69 721-725 2003
Development of the Measurement System with Interferometers for Ultraprecise X-ray mirror
Vol. 69, 6, 856-860/, 2003
Wave-optical evaluation of reflected X-ray intensity and wavefront distribution in total reflection hard X-ray mirror optics
Vol. 69, 997-1001/, 2003
Fabrication technology of hard X-ray aspherical mirror optics and application to nanospectroscopy
Proc. SPIE 5193, pp.11-17 Vol. 5193, pp.11-17/, 2003
Thinning of SOI by numerically controlled plasma CVM(chemical vaporization machining) -Development of the NC-PCVM machine and trial of ultra-thin SOI wafer-
MORI Yuzo, YAMAMURA Kazuya, SANO Yasuhisa
Journal of the Japan Society of Precision Engineering Vol. Vol.68, No.12, p.1590-1594/, No. 12 p. 1590-1594 2002/12
Publisher: The Japan Society for Precision Engineering
プラズマCVMプロセス中のCF, CF_2ラジカルの分光計測 : レーザー誘起蛍光分光と紫外線吸収分光とによるラジカル密度分布診断
押鐘 寧, 佐藤 慎也, 山村 和也, 遠藤 勝義, 片岡 俊彦, 森 勇藏
精密工学会大会学術講演会講演論文集 Vol. 2002 No. 2 p. 461-461 2002/10/01
プラズマCVMおよびEEMによる放射光用X線ミラーの作製とその応用 : 二枚の平面ミラーを用いたX線干渉計の開発
森 勇藏, 山内 和人, 山村 和也, 三村 秀和, 佐野 泰久, 齋藤 彰, SOUVOROV A, 矢橋 牧名, 玉作 賢治, 石川 哲也
精密工学会大会学術講演会講演論文集 Vol. 2002 No. 2 p. 458-458 2002/10/01
プラズマCVMおよびEEMによる放射光用X線ミラーの作製とその応用 : 硬X線顕微鏡の開発
森 勇蔵, 山内 和人, 山村 和也, 三村 秀和, 佐野 泰久, 斉藤 彰, SOUVOROV Alexei, 矢橋 牧名, 玉作 賢治, 石川 哲也
精密工学会大会学術講演会講演論文集 Vol. 2002 No. 2 p. 458-458 2002/10/01
Fabrication of Elliptical Mirror for Synchrotron Radiation Hard X-ray by Plasma Chemical Vaporization Machining and Elastic Emission Machining and Evaluation of the focusing Performances
MORI Yuzo, YAMAUCHI Kazuto, YAMAMURA Kazuya, MIMURA Hidekazu, SANO Yasuhisa, SAITO Akira, SOUVOROV Alexei, TAMASAKU Kenji, YABASHI Makina, ISHIKAWA Tetsuya
Journal of the Japanese Society of Precision Engineering Vol. 68 No. 10 p. 1347-1350 2002/10
Publisher: The Japan Society for Precision Engineering
Fabrication of the Elliptical Mirror for Synchrotron hard X-ray by Plasma Chemical Vaporization Machining and Elastic Emission Machining and the Evaluation of the Focusing Performances
Yuzo Mori, Kazuti Yamauchi, Kazuya Yamamura, Hidekazu Mimura, Yasuhisa Sano, Akira Saito, Alexei Souvorov, Kenji Tamasaku, Makina Yabashi, Tetsuya Ishikawa
Jouranal of the Japan Society for Precision Engineering, Vol.68, p.1347-1350 Vol. 68 No. 10 p. 1347-1350 2002/10
コヒーレント照射でのＸ線全反射ミラー
石川哲也, 矢橋牧名, 玉作賢治, スボロフ アレクセイ, 山内和人, 山村和也, 三村秀和, 齋藤 彰, 森 勇藏
放射光, Vol.15, p.296-302 Vol. Vol.15, p.296-302 2002/09
Nearly diffraction-limited line focusing of a hard-X-ray beam with an elliptically figured mirror
K Yamauchi, K Yamamura, H Mimura, Y Sano, A Saito, A Souvorov, M Yabashi, K Tamasaku, T Ishikawa, Y Mori
JOURNAL OF SYNCHROTRON RADIATION Vol. 9 p. 313-316 2002/09
Deterministic retrieval of surface waviness by means of topography with coherent X-rays
A. Souvorov, M. Yabashi, K. Tamasaku, T. Ishikawa, Y. Mori, K. Yamauchi, K. Yamamura, A. Saito
Vol. Vol.9, p.223-228/, 2002/09
Nearly diffraction-limited line focusing of a hard-X-ray beam with an elliptically figured mirror
K. Yamauchi, K. Yamamura, H. Mimura, Y. Sano, A. Saito, A. Souvorov, M. Yabashi, K. Tamasaku, T. Ishikawa, Y. Mori
JOURNAL OF SYNCHROTRON RADIATION Vol. 9 p. 313-316 2002/09
Nearly diffraction-limited line focusing of a hard-X-ray beam with an elliptically figured mirror
Kazuto Yamauchi, Kazuya Yamamura, Hidekazu Mimura, Yasuhisa Sano, Akira Saito, Alexei Souvorov, Makina Yabashi, Kenji Tamasaku, Tetsuya Ishikawa, Yuzo Mori
Journal of Synchrotron Radiation Vol. 9 No. 5 p. 313-316 2002/09/01
Aspheric surface fabrication in nm-level accuracy by numerically controlled plasma CVM and EEM
K. Yamamura, H. Mimura, K. Yamauchi, Y. Sano, A. Saito, T. Kinoshita, K. Endo, A. Souvorov, M. Yabashi, K. Tamasaku, T. Ishikawa, Y. Mori
Vol. Vol.4782 2002/07
Wave-optical analysis of sub-micron focusing of hard X-ray by reflective optics
K. Yamauchi, K. Yamamura, H. Mimura, Y. Sano, A. Saito, M. Kanaoka, K. Endo, A. Souvorov, M. Yabashi, K. Tamasaku, T. Ishikawa, Y. Mori
Vol. Vol.4782 2002/07
Fabrication of optics by use of plasma chemical vaporization machining with a pipe electrode
H. Takino, N. Shibata, H. Itoh, T. Kobayashi, K. Yamamura, Y. Sano, Y. Mori
Vol. Vol.41, p.3971-3977/, 2002/07
Fabrication of optics by use of plasma chemical vaporization machining with a pipe electrode
H Takino, N Shibata, H Itoh, T Kobayashi, K Yamamura, Y Sano, Y Mori
APPLIED OPTICS Vol. 41 No. 19 p. 3971-3977 2002/07
Sub-micron focusing of hard X-ray by reflective optics for scanning x-ray microscopy
Y. Mori, K. Yamauchi, K. Yamamura, H. Mimura, Y. Sano, A. Saito, K. Ueno, K. Endo, A. Souvorov, M. Yabashi, K. Tamasaku, T. Ishikawa
Proc. SPIE Vol. Vol.4782 p. 58-58 2002/07
Deterministic retrieval of surface waviness by means of topography with coherent X-rays
A. Souvorov, M. Yabashi, K. Tamasaku, T. Ishikawa, Y. Mori, K. Yamauchi, K. Yamamura, A. Saito
Journal of Synchrotron Radiation Vol. 9 No. 4 p. 223-228 2002/07/01
Sub-micron focusing by reflective optics for scanning x-ray microscopy
Y. Mori, K. Yamauchi, K. Yamamura, H. Mimura, Y. Sano, A. Saito, K. Ueno, K. Endo, A. Souvorov, M. Yabashi, K. Tamasaku, T. Ishikawa
Proc. SPIE Vol. 4782 p. 58-64 2002/07
Fabrication of optics by use of plasma chemical vaporization machining with a pipe electrode
Hideo Takino, Norio Shibata, Hiroshi Itoh, Teruki Kobayashi, Kazuya Yamamura, Yasuhisa Sano, Yuzo Mori
Applied Optics Vol. 41 No. 19 p. 3971-3977 2002/07/01
Deterministic retrieval of surface waviness by means of topography with coherent X-rays
A Souvorov, M Yabashi, K Tamasaku, T Ishikawa, Y Mori, K Yamauchi, K Yamamura, A Saito
JOURNAL OF SYNCHROTRON RADIATION Vol. 9 p. 223-228 2002/07
Ultra-Precision Machining based on Physics and Chemistry
Y. Mori, K. Hirose, K. Yamauchi, H. Goto, K. Yamamura, Y. Sano
2002/06
プラズマCVMによるSOlの数値制御薄膜化:薄膜化した8インチSOlウエハのデバイス特性
森 勇蔵, 山村 和也, 佐野 泰久, 上島 洋輝, 沖 一郎, 伊佐次 晃司
精密工学会大会学術講演会講演論文集 Vol. 2002 No. 1 p. 608-608 2002/03/01
プラズマCVMおよびEEMによるX線平面ミラーの加工と放射光による評価
森 勇蔵, 山内 和人, 山村 和也, 三村 秀和, 佐野 泰久, 斉藤 彰, 金岡 政彦, SOUVOROV A, 矢橋 牧名, 玉作 賢治, 石川 哲也
精密工学会大会学術講演会講演論文集 Vol. 2002 No. 1 p. 605-605 2002/03/01
数値制御プラズマCVMおよび数値制御EEMによる硬X線集光用超精密非球面ミラーの加工
森 勇蔵, 山内 和人, 山村 和也, 三村 秀和, 佐野 泰久, 斉藤 彰, SOUVOROV A, 矢橋 牧名, 玉作 賢治, 石川 哲也
精密工学会大会学術講演会講演論文集 Vol. 2002 No. 1 p. 604-604 2002/03/01
プラズマCVMおよびEEMによるシンクロトロン放射X線用楕円ミラーの作製と集光特性の評価
精密工学会誌, Vol.68, p.1347-1350 Vol. Vol.68, p.1347-1350 2002
数値制御プラズマCVM(Chemical Vaporization Machining)によるSOIの薄膜化
精密工学会誌, Vol.68, No.12, p.1590-1594 Vol. Vol.68, No.12, p.1590-1594 2002
Sub-micron focusing of hard X-ray by reflective optics for scanning x-ray microscopy
SPIE Vol.4782 Vol. Vol.4782 2002
コヒーレント照射でのＸ線全反射ミラー
放射光, Vol.15, p.296-302 Vol. Vol.15, p.296-302/, 2002
プラズマCVMおよびEEMによるシンクロトロン放射X線用楕円ミラーの作製と集光特性の評価
精密工学会誌, Vol.68, p.1347-1350 Vol. Vol.68, p.1347-1350/, 2002
数値制御プラズマCVM(Chemical Vaporization Machining)によるSOIの薄膜化
精密工学会誌, Vol.68, No.12, p.1590-1594 Vol. Vol.68, No.12, p.1590-1594/, 2002
Ultra-Precision Machining based on Physics and Chemistry
Proceedings of Proceedings of 3rd Workshop on Physical Chemistry of Wet Etching of Silicon, p.10-26 Vol. p.10-26 2002
Aspheric surface fabrication in nm-level accuracy by numerically controlled plasma CVM and EEM
Proc. SPIE, Vol.4782 Vol. Vol.4782 2002
Wave-optical analysis of sub-micron focusing of hard X-ray beams by reflective optics
K Yamauchi, K Yamamura, H Mimura, Y Sano, A Saito, M Kanaoka, K Endo, A Souvorov, M Yabashi, K Tamasaku, T Ishikawa, Y Mori
X-RAY MIRRORS, CRYSTALS, AND MULTILAYERS II Vol. 4782 p. 271-276 2002
数値制御プラズマCVM(Chemical Vaporization Machining)によるSOIの薄膜化 －加工装置の開発と超薄膜SOIウエハの試作－
精密工学会誌 Vol. Vol. 68, pp. 1590-1594./, 2002
Fabrication of the Elliptical Mirror for Synchrotron hard X-ray by Plasma Chemical Vaporization Machining and Elastic Emission Machining and the Evaluation of the Focusing Performances
Jouranal of the Japan Society for Precision Engineering, Vol.68, p.1347-1350 Vol. Vol.68, p.1347-1350 2002
Thinning of SOI by numerically controlled plasma CVM(chemical vaporization machining) -Development of the NC-PCVM machine and trial of ultra-thin SOI wafer-
Vol. Vol.68, No.12, p.1590-1594 2002
Fabrication of optics by use of plasma chemical vaporization machining with a pipe electrode
Vol. Vol.41, p.3971-3977 2002
Ultra-Precision Machining based on Physics and Chemistry
Vol. p.10-26 2002
Aspheric surface fabrication in nm-level accuracy by numerically controlled plasma CVM and EEM
Vol. Vol.4782 2002
Fabrication of optics by use of plasma chemical vaporization machining with a pipe electrode
Vol. Vol.41, p.3971-3977/, 2002
Sub-micron focusing of hard X-ray by reflective optics for scanning x-ray microscopy
Vol. Vol.4782 2002
Wave-optical analysis of sub-micron focusing of hard X-ray beams by reflective optics
K. Yamauchi, K. Yamamura, H. Mimura, Y. Sano, A. Saito, M. Kanaoka, K. Endo, A. Souvorov, M. Yabashi, K. Tamasaku, T. Ishikawa, Y. Mori
Proceedings of SPIE - The International Society for Optical Engineering Vol. 4782 p. 271-276 2002
Electric Impedance Measurement and Pulsed OPO Laser Induced Fluorescence Study of Capacitively Coupled VHF Plasma (He/CF4/O2) at Atmospheric Pressure for Chemical Vaporization Machining (CVM) Process
Yasushi Oshikane, Shoichi Kawashima, Kenichi Takemoto, Kazuya Yamamura, Katsuyoshi Endo, Yuzo Mori
Vol. 62 2001/10
レーザ誘起蛍光分光法による大気圧・高周波CF_4プラズマ中のラジカル密度の空間分布計測
押鐘 寧, 川島 祥一, 竹本 健一, 山村 和也, 遠藤 勝義, 森 勇蔵
精密工学会大会学術講演会講演論文集 Vol. 2001 No. 2 p. 234-234 2001/09/01
プラズマCVMにおける高融点金属材料の加工特性
柴原 正文, 山村 和也, 佐野 泰久, 森 勇蔵
精密工学会大会学術講演会講演論文集 Vol. 2001 No. 2 p. 231-231 2001/09/01
プラズマCVMにおける基礎研究 : 単結晶シリコンの加工における加工条件と表面粗さの相関
森 勇蔵, 山村 和也, 佐野 泰久, 鴻池 満司
精密工学会大会学術講演会講演論文集 Vol. 2001 No. 2 p. 233-233 2001/09/01
数値制御プラズマCVMによるX線ミラーの加工に関する研究(第2報)
森 勇蔵, 山村 和也, 佐野 泰久, 岸本 宏樹
精密工学会大会学術講演会講演論文集 Vol. 2001 No. 2 p. 229-229 2001/09/01
プラズマCVMによるSOIの数値制御薄膜化 : 加工面のデバイス特性評価
森 勇蔵, 山村 和也, 佐野 泰久, 上島 洋輝
精密工学会大会学術講演会講演論文集 Vol. 2001 No. 2 p. 228-228 2001/09/01
プラズマCVMによる光学部品の超精密加工 : 薄肉光学部品の加工特性
瀧野 日出雄, 小林 輝紀, 柴田 規夫, 山村 和也, 佐野 泰久, 森 勇蔵
精密工学会大会学術講演会講演論文集 Vol. 2001 No. 2 p. 230-230 2001/09/01
超精密非球面形状計測装置の開発 : ゴニオメータの角度位置決め精度の検証
東 保男, 杉山 弘, 張 小威, 安藤 正海, 遠藤 勝義, 山内 和人, 山村 和也, 打越 純一, 森 勇蔵
精密工学会大会学術講演会講演論文集 Vol. 2001 No. 2 p. 133-133 2001/09/01
プラズマCVMおよびEEMによるX線光学素子の加工と放射光による評価
森 勇蔵, 山内 和人, 山村 和也, 三村 秀和, 斉藤 彰, 岸本 宏樹, 関戸 康裕, 金岡 政彦
精密工学会大会学術講演会講演論文集 Vol. 2001 No. 2 p. 240-240 2001/09/01
Development of plasma chemical vaporization machining and elastic emission machining systems for coherent x-ray optics
Y. Mori, K. Yamauchi, K. Yamamura, H. Mimura, A. Saito, H. Kishimoto, Y. Sekito, M. Kanaoka, A. Souvorov, M. Yabashi, K. Tamasaku, T. Ishikawa
Proceedings of SPIE - The International Society for Optical Engineering Vol. 4501 p. 30-42 2001/07
Removal Characteristics of Plasma Chemical Vaporization Machining with a Pipe Electrode
Hideo Takino, Teruyuki Kobayashi, Norio Shibata, Kazuya Yamamura, Yasuhisa Sano, Yuzo Mori
Proc. 2^<nd> EUSPEN p. 58-61 2001/06
Ultra-precision Machining by Plasma CVM
Kazuya Yamamura, Yasuhisa Sano, Yuzo Mori
Vol. 22 No. 3 p. 160-166 2001/03
Cutting og Functional Material by Plasma CVM ---Development of the Cutting Machine with Inner Blade Electrode and Its Cutting Characteristics---
Yuzo Mori, Kazuto Yamauchi, Kazuya Yamamura, Yasuhisa Sano
Vol. Vol.~67, No.~2, pp.~295-299/, 2001/02
Cutting of Functional Material by Plasma CVM : Development of the Cutting Machine with Inner Blade Electrode and Its Cutting Characteristics
Yuzo MORI, Kazuto YAMAUCHI, Kazuya YAMAMURA, Yasuhisa SANO
Journal of the Japanese Society of Precision Engineering Vol. 67 No. 2 p. 295-299 2001/02
プラズマCVM(Chemical Vaporization Machining)による超精密加工
表面科学, Vol.~22, No.~3, pp.~160-166 Vol. Vol.~22, No.~3, pp.~160-166 2001
数値制御プラズマCVMによるX線ミラーの加工に関する研究（第1報）---X線ミラー加工用装置の開発---
精密工学会誌, Vol.~67, No.~1, pp.~131-136 Vol. Vol.~67, No.~1, pp.~131-136 2001
Electric Impedance Measurement and Pulsed OPO Laser Induced Fluorescence Study of Capacitively Coupled VHF Plasma (He/CF4/O2) at Atmospheric Pressure for Chemical Vaporization Machining (CVM) Process
Program of the 54th Annual Gaseous Electronics Conference, (2001) 62. Vol. 62 2001
プラズマCVMによる機能材料の切断加工 ---内周刃型切断加工装置の試作とその切断加工特性---
精密工学会誌, Vol.~67, No.~2, pp.~295-299 Vol. Vol.~67, No.~2, pp.~295-299 2001
Removal Characteristics of Plasma Chemical Vaporization Machining with a Pipe Electrode
Proc. 2nd International Conference of European Society for Precision Engeneering and Nanotechnology 2001
The Study of Fabrication of the X-ray Mirror by Numerically Controlled Plasma CVM (1st Report) : Development of the Machine for the X-ray Mirror Fabrication
MORI Yuzo, YAMAMURA Kazuya, SANO Yasuhisa
Journal of the Japan Society of Precision Engineering Vol. Vol.~67, No.~1, pp.~131-136/, No. 1 p. 131-136 2001
Publisher: The Japan Society for Precision Engineering
プラズマCVMによる機能材料の切断加工 ---内周刃型切断加工装置の試作とその切断加工特性---
精密工学会誌, Vol.~67, No.~2, pp.~295-299 Vol. Vol.~67, No.~2, pp.~295-299/, 2001
プラズマCVM(Chemical Vaporization Machining)による超精密加工
表面科学, Vol.~22, No.~3, pp.~160-166 Vol. Vol.~22, No.~3, pp.~160-166/, 2001
Development of plasma chemical vaporization machining and elastic emission machining systems for coherent x-ray optics
Y Mori, K Yamauchi, K Yamamura, H Mimura, A Saito, H Kishimoto, Y Sekito, M Kanaoka
X-RAY MIRRORS, CRYSTALS AND MULTILAYERS Vol. 4501 p. 30-42 2001
Cutting of Functional Material by Plasma CVM : Development of the Cutting Machine with Inner Blade Electrode and Its Cutting Characteristics
MORI Yuzo, YAMAUCHI Kazuto, YAMAMURA Kazuya, SANO Yasuhisa
Journal of the Japan Society of Precision Engineering Vol. 67 No. 2 p. 295-299 2001
Publisher: The Japan Society for Precision Engineering
The Study of Fabrication of the X-ray Mirror by Numerically Controlled Plasma CVM (1st Report) : Development of the Machine for the X-ray Mirror Fabrication
MORI Yuzo, YAMAMURA Kazuya, SANO Yasuhisa
Journal of the Japan Society of Precision Engineering Vol. 67 No. 1 p. 131-136 2001
Publisher: The Japan Society for Precision Engineering
The Study of Fabrication of the X-ray Mirror by Numerically Controlled Plasma CVM (1st Report) ---Development of the Machine for the X-ray Mirror Fabrication---
Vol. Vol.~67, No.~1, pp.~131-136 2001
Cutting og Functional Material by Plasma CVM ---Development of the Cutting Machine with Inner Blade Electrode and Its Cutting Characteristics---
Vol. Vol.~67, No.~2, pp.~295-299 2001
Ultra-precision Machining by Plasma CVM
Vol. Vol.~22, No.~3, pp.~160-166 2001
The Study of Fabrication of the X-ray Mirror by Numerically Controlled Plasma CVM (1st Report) ---Development of the Machine for the X-ray Mirror Fabrication---
Yuzo Mori, Kazuya Yamamura, Yasuhisa Sano
Vol. Vol.~67, No.~1, pp.~131-136/, 2001/01
Electric Impedance Measurement and Pulsed OPO Laser Induced Fluorescence Study of Capacitively Coupled VHF Plasma (He/CF4/O2) at Atmospheric Pressure for Chemical Vaporization Machining (CVM) Process
Vol. 62 2001
Ultra-precision Machining by Plasma CVM
Vol. Vol.~22, No.~3, pp.~160-166/, 2001
Removal Characteristics of Plasma Chemical Vaporization Machining with a Pipe Electrode
2001
Development of plasma chemical vaporization machining and elastic emission machining systems for coherent X-ray optics
Y. Mori, K. Yamauchi, K. Yamamura, H. Mimura, A. Saito, H. Kishimoto, Y. Sekito, M. Kanaoka, A. Souvorov, M. Yabashi, K. Tamasaku, T. Ishikawa
Proceedings of SPIE - The International Society for Optical Engineering Vol. 4501 p. 30-42 2001
The Study of fabrication of the x-ray mirror by numerically controlled plasma CVM(1st-report)-Development of the machine for the x-ray mirror fabrication-
Journal of the Japan Society for Precision Engineering Vol. 67 No. 1 2001
Development of Plasma Chemical Vaporization Machining
Yuzo Mori, Kazuto Yamauchi, Kazuya Yamamura, Yasuhisa Sano
Vol. Vol.~71, No.~12, pp.~4627-4632 2000/12
Development of plasma chemical vaporization machining
Y Mori, K Yamauchi, K Yamamura, Y Sano
REVIEW OF SCIENTIFIC INSTRUMENTS Vol. 71 No. 12 p. 4627-4632 2000/12
The Study of Fabrication of the X-ray Mirror by Numerically Controlled Plasma Chemical Vaporization Machining : Development of the Machine for the X-ray Mirror Fabrication
Yuzo Mori, Kazuya Yamamura, Yasuhisa Sano
Review of Scientific Instruments, Vol. 71, No. 12, pp. 4620-4626 Vol. Vol. 71, No. 12, pp. 4620-4626/, 2000/12
The study of fabrication of the x-ray mirror by numerically controlled plasma chemical vaporization machining: Development of the machine for the x-ray mirror fabrication
Y Mori, K Yamamura, Y Sano
REVIEW OF SCIENTIFIC INSTRUMENTS Vol. 71 No. 12 p. 4620-4626 2000/12
Development of New Machining Process for Ultra Precision Surface Preparation ---EEM,Plasma CVM,and Atmospheric Pressure Plasma CVD---
Yuzo Mori, Kazuto Yamauhci, Kazuya Yamamura, Hiroaki Kakiuchi, Yasuhisa Sano
Vol. pp.~212-232 2000/08
Development of Plasma CVM(Chemical Vaporization Machining)
Yuzo Mori, Kazuto Yamauchi, Kazuya Yamamura, Yasuhisa Sano
Journal of the Japan Society for Precision Engineering Vol. 66 No. 8 p. 1280-1285 2000/08
Development of Numerically Controlled Plasma Chemical Vaporization Machining System
Yuzo Mori, Kazuya Yamamura, Yasuhisa Sano
Vol. Vol.~50, No.~2374, pp.~63‐69 2000/04
Development of SPV(Surface Photo-voltage) Spectroscopy to Observe Finely-prepared Surface by Ultraprecision Machining Process
Kazuto Yamauchi, Kazuhisa Sugiyama, Kouji Inagaki, Kazuya Yamamura, Yasuhisa Sano, Yuzo Mori
Vol. 66 No. 4 p. 630-634 2000/04
Ultra-precision Machining and High-rate Deposition of Thin Films Using Atmospheric Pressure Plasma
Yuzo Mori, Kiyoshi Yasutake, Kazuya Yamamura, Hiroaki Kakiuchi
Vol. Vol.~66, No.~4, pp.~517-522 2000/04
Development of SPV (Surface Photo-voltage) Spectroscopy to Observe Finely-prepared Surfaces by Ultraprecision Machining Processes
Kazuto YAMAUCHI, Kazuhisa SUGIYAMA, Kouji INAGAKI, Kazuya YAMAMURA, Yasuhisa SANO, Yuzo MORI
Journal of the Japan Society for Precision Engineering Vol. 66 No. 4 p. 630-634 2000/04
Publisher: The Japan Society for Precision Engineering
プラズマCVMにおける切断加工に関する研究(第5報) : 加工ギャップのその場観察
森 勇蔵, 山村 和也, 佐野 泰久
精密工学会大会学術講演会講演論文集 Vol. 2000 No. 1 p. 193-193 2000/03/01
数値制御プラズマCVM加工装置の開発(第4報)
森 勇蔵, 山村 和也, 佐野 泰久
精密工学会大会学術講演会講演論文集 Vol. 2000 No. 1 p. 192-192 2000/03/01
大気圧プラズマインピーダンス測定(第2報) : 測定装置内電磁界解析による測定原理の検証
森 勇蔵, 片岡 俊彦, 遠藤 勝義, 山村 和也, 佐野 泰久, 押鐘 寧, 片山 晋二, 江畑 裕介
精密工学会大会学術講演会講演論文集 Vol. 2000 No. 1 p. 194-194 2000/03/01
SPV(Surface Photo-voltage)スペクトロスコピーによる超精密加工表面評価法の開発
精密工学会誌, Vol.~66, No.~4, pp.~630-634 Vol. Vol.~66, No.~4, pp.~630-634 2000
Ultra-Precision Machining and High-Rate Deposition of Thin Films Using Atmospheric Pressure Plasma(<Special Issue>Advanced Techniques of Thin Films)
MORI Yuzo, YASUTAKE Kiyoshi, YAMAMURA Kazuya, KAKIUCHI Hiroaki
Journal of the Japan Society of Precision Engineering Vol. Vol.~66, No.~4, pp.~517-522 No. 4 p. 517-522 2000
Publisher: The Japan Society for Precision Engineering
プラズマCVMの開発
精密工学会誌, Vol.~66, No.~8, pp.~1280-1285 Vol. Vol.~66, No.~8, pp.~1280-1285 2000
The Study of Fabrication of the X-ray Mirror by Numerically Controlled Plasma Chemical Vaporization Machining : Development of the Machine for the X-ray Mirror Fabrication
Review of Scientific Instruments, Vol. 71, No. 12, pp. 620-4626 Vol. Vol. 71, No. 12, pp. 4620-4626 2000
Development of Numerically Controlled Plasma Chemical Vaporization Machining System
Technology Reports of the Osaka University, Vol.~50, No.~2374, pp.~63‐69 Vol. Vol.~50, No.~2374, pp.~63‐69/, 2000
SPV(Surface Photo-voltage)スペクトロスコピーによる超精密加工表面評価法の開発
精密工学会誌, Vol.~66, No.~4, pp.~630-634 Vol. Vol.~66, No.~4, pp.~630-634/, 2000
大気圧プラズマによる超精密加工と高速成膜
精密工学会誌, Vol.~66, No.~4, pp.~517-522 Vol. Vol.~66, No.~4, pp.~517-522/, 2000
プラズマCVMの開発
精密工学会誌, Vol.~66, No.~8, pp.~1280-1285 Vol. Vol.~66, No.~8, pp.~1280-1285/, 2000
Development of New Machining Process for Ultra Precision Surface Preparation ---EEM,Plasma CVM,and Atmospheric Pressure Plasma CVD---
The 2nd International School on Crystal Growth Technology, Book of Lecture Notes, pp.~212-232 Vol. pp.~212-232 2000
Development of Plasma CVM (Chemical Vaporization Machining)
MORI Yuzo, YAMAUCHI Kazuto, YAMAMURA Kazuya, SANO Yasuhisa
Journal of the Japan Society of Precision Engineering Vol. 66 No. 8 p. 1280-1285 2000
Publisher: The Japan Society for Precision Engineering
Development of plasma chemical vaporization machining.
Rev. Sci. Instrum. Vol. Vol. 71, pp. 4627-4632./, 2000
Development of plasma chemical vaporization machining
Yuzo Mori, Kazuto Yamauchi, Kazuya Yamamura, Yasuhisa Sano
Review of Scientific Instruments Vol. 71 No. 12 p. 4627-4627 2000
Publisher: AIP Publishing
Development of Numerically Controlled Plasma Chemical Vaporization Machining System
Vol. Vol.~50, No.~2374, pp.~63‐69 2000
Development of Plasma CVM(Chemical Vaporization Machining)
Vol. Vol.~66, No.~8, pp.~1280-1285 2000
The Study of Fabrication of the X-ray Mirror by Numerically Controlled Plasma Chemical Vaporization Machining : Development of the Machine for the X-ray Mirror Fabrication
Review of Scientific Instruments, Vol. 71, No. 12, pp. 4620-4626 Vol. Vol. 71, No. 12, pp. 4620-4626 2000
Development of Plasma Chemical Vaporization Machining
Vol. Vol.~71, No.~12, pp.~4627-4632/, 2000
Development of Numerically Controlled Plasma Chemical Vaporization Machining System
Vol. Vol.~50, No.~2374, pp.~63‐69/, 2000
Development of SPV(Surface Photo-voltage) Spectroscopy to Observe Finely-prepared Surface by Ultraprecision Machining Process
YAMAUCHI Kazuto, SUGIYAMA Kazuhisa, INAGAKI Kouji, YAMAMURA Kazuya, SANO Yasuhisa, MORI Yuzo
Journal of the Japan Society of Precision Engineering Vol. Vol.~66, No.~4, pp.~630-634/, No. 4 p. 630-634 2000
Publisher: The Japan Society for Precision Engineering
Ultra-precision Machining and High-rate Deposition of Thin Films Using Atmospheric Pressure Plasma
Vol. Vol.~66, No.~4, pp.~517-522/, 2000
Development of Plasma CVM(Chemical Vaporization Machining)
Vol. Vol.~66, No.~8, pp.~1280-1285/, 2000
Development of New Machining Process for Ultra Precision Surface Preparation ---EEM,Plasma CVM,and Atmospheric Pressure Plasma CVD---
Vol. pp.~212-232 2000
The Study of Fabrication of the X-ray Mirror by Numerically Controlled Plasma Chemical Vaporization Machining : Development of the Machine for the X-ray Mirror Fabrication
Review of Scientific Instruments, Vol. 71, No. 12, pp. 4620-4626 Vol. Vol. 71, No. 12, pp. 4620-4626/, 2000
Development of plasma chemical vaporization machining
Review of Scientific Instruments Vol. 71 No. 12 p. 4627-4632 2000
The Study of fabrication of the x-ray mirror by numerically controlled plasma chemical vaporization machining : Development of the machine for the x-ray mirror fabrication
Review of Scientific Instruments Vol. 71 No. 12 p. 4620-4626 2000
Development of Numerically Controlled Plasma Chemical Vaporization Machining System
Technology Reports of the Osaka University Vol. 50 No. 2374 2000
With the Aim of Country with Intelligent Sense of Existence : The Case Introduction, Center of Excellence program Creation of Perfect Surfaces
Hideo Takino(Nikon Cor, Norio Shibata(Nikon Cor, Hiroshi Itoh(Nikon Corp, Teruki Kobayashi, Nikon Cor, Hiroaki Tanaka, Nikon Co, Masami Ebi(Nikon Corp, Kazuya Yamamura, Yasuhisa Sano, Yuzo Mori
Vol. 65 No. 11 p. 1650-1651 1999/11
Plasma Chemical Vaporization Machining with a Pipe Electrode for Large Optics
Hideo Takino, ikon, Norio Shibata, Nikon Cor, Teruki Kobayashi, Nikon Cor, Hiroshi\- Itoh, Nikon Cor, Hiroaki Tanaka, ikon, Akihiro Koike, ikon C, Katsuhiko\- Nakano, ikon C, Kazuya Yamamura, Yasuhisa Sano, Yuzo Mori
Vol. pp.~219-224 1999/09
High Speed Patterning of Integrated-Type a-Si Solar Cell Submodules by Plasma CVM
Shingo Nakano, SANYO Electric Co, Yoichi Domoto, SANYO Electric Co, Hisaki Tarui, SANYO Electric Co, Seiichi Kiyama, SANYO Electric Co, Yasuhisa Sano, Kazuya Yamamura, Yuzo Mori
Precision Science and Technology for Perfect Surfaces Vol. pp.~543-548 1999/09
Publisher: JSPE
Development of Numerically Controlled Plasma CVM (Chemical Vaporization Machining) System for Fabrication of Ultra Precision Optical Devices
Yuzo Mori, Kazuya Yamamura, Yasuhisa Sano
Precision Science and Technology for Perfect Surfaces (Proceedings of the 9th International Conference on Production Engineering), pp.~213-218 Vol. pp.~213-218 1999/09
Publisher: JSPE
Slicing of Functional Materials by Plasma CVM (Chemical Vaporization Machining)
Yuzo Mori, Kazuya Yamamura, Yasuhisa Sano
Precision Science and Technology for Perfect Surfaces Vol. pp.~225-230 1999/09
Publisher: JSPE
High Rate Polishing of Silicon Surface using Plasma CVM with Rotary Drum Electrode
Hiroaki Takeuchi, Sharp Corp, Tohru Okuda, Sharp Corp, Kazuhiro Nishikawa, Sharp Corp, Yoshiyuki Hojyo, Sharp Corp, Masaru Kadono, Sharp Cor, Takashi Nukii, Sharp Corp, Kazuya Yamamura, Yasuhisa Sano, Yuzo Mori
Vol. pp.~405-410 1999/09
マイクロ電極を用いたプラズマCVMによる複雑形状光学面の創成加工
瀧野 日出雄, 柴田 規夫, 小林 輝紀, 伊藤 博, 根本 孝七, 藤井 隆, 後藤 直彦, 山村 和也, 佐野 泰久, 森 勇蔵
精密工学会大会学術講演会講演論文集 Vol. 1999 No. 1 p. 422-422 1999/03/05
回転電極型プラズマCVM法におけるシリコンの加工速度向上に関する-検討
西川 和宏, 奥田 徹, 竹内 博明, 北條 義之, リュウノ野 勝, 貫井 孝, 山村 和也, 佐野 泰久, 森 勇蔵
精密工学会大会学術講演会講演論文集 Vol. 1999 No. 1 p. 423-423 1999/03/05
プラズマCVMによる高融点金属材料の表面加工 (第3報)
柴原 正文, 山村 和也, 佐野 泰久, 園田 司, 西岡 敏明, 脇坂 彰一, 沖田 耕三, 森 勇蔵
精密工学会大会学術講演会講演論文集 Vol. 1999 No. 1 p. 424-424 1999/03/05
大気圧プラズマインピーダンス測定(第1報) -測定原理, 測定結果, およびその測定精度について-
森 勇蔵, 片岡 俊彦, 遠藤 勝義, 山村 和也, 佐野 泰久, 押鐘 寧, 江畑 裕介, 片山 晋二, 岡本 利樹, 足立 真士
精密工学会大会学術講演会講演論文集 Vol. 1999 No. 1 p. 428-428 1999/03/05
プラズマCVM(Chemical Vaporization Machining)における切断加工に関する研究(第4報)-加工ギャップ制御方法-
森 勇蔵, 山村 和也, 佐野 泰久, 脇坂 彰一, 柴原 正文
精密工学会大会学術講演会講演論文集 Vol. 1999 No. 1 p. 426-426 1999/03/05
数値制御プラズマCVM加工装置の開発(第3報)
森 勇蔵, 山村 和也, 佐野 泰久, 脇坂 彰一, 柴原 正文
精密工学会大会学術講演会講演論文集 Vol. 1999 No. 1 p. 425-425 1999/03/05
プラズマCVM加工における電極/ワーク間ギャップセンサの開発
竹内 博明, 奥田 徹, 西川 和宏, 北條 義之, 山村 和也, 佐野 泰久, 森 勇蔵, 石川 俊夫
精密工学会大会学術講演会講演論文集 Vol. 1999 No. 1 p. 427-427 1999/03/05
Fabrication of Optical Flat using Plasma Chemical Vaporization Machining with a Pipe Electrode
TAKINO Hideo, SHIBATA Norio, ITOH Hiroshi, KOBAYASHI Teruki, TANAKA Hiroaki, EBI Masami, YAMAMURA Kazuya, SANO Yasuhisa, MORI Yuzo
Journal of the Japan Society of Precision Engineering Vol. Vol.~65, No.~11, pp.~1650-1651 No. 11 p. 1650-1651 1999
Publisher: The Japan Society for Precision Engineering
Development of Numerically Controlled Plasma CVM (Chemical Vaporization Machining) System for Fabrication of Ultra Precision Optical Devices
Precision Science and Technology for Perfect Surfaces (Proceedings of the 9th International Conference on Production Engineering), pp.~213-218 Vol. pp.~213-218 1999
Slicing of Functional Materials by Plasma CVM (Chemical Vaporization Machining)
Precision Science and Technology for Perfect Surfaces (Proceedings of the 9th International Conference on Production Engineering), pp.~225-230 Vol. pp.~225-230 1999
High Rate Polishing of Silicon Surface using Plasma CVM with Rotary Drum Electrode
Precision Science and Technology for Perfect Surfaces (Proceedings of the 9th International Conference on Production Engineering), pp.~405-410 Vol. pp.~405-410 1999
Fabrication of Optical Flat using Plasma Chemical Vaporization Machining with a Pipe Electrode
TAKINO Hideo, SHIBATA Norio, ITOH Hiroshi, KOBAYASHI Teruki, TANAKA Hiroaki, EBI Masami, YAMAMURA Kazuya, SANO Yasuhisa, MORI Yuzo
Journal of the Japan Society of Precision Engineering Vol. Vol.~65, No.~11, pp.~1650-1651/, No. 11 p. 1650-1651 1999
Publisher: The Japan Society for Precision Engineering
Plasma Chemical Vaporization Machining with a Pipe Electrode for Large Optics
Precision Science and Technology for Perfect Surfaces (Proceedings of the 9th International Conference on Production Engineering), pp.~219-224 Vol. pp.~219-224 1999
High Speed Patterning of Integrated-Type a-Si Solar Cell Submodules by Plasma CVM
Precision Science and Technology for Perfect Surfaces (Proceedings of the 9th International Conference on Production Engineering), pp.~543-548 Vol. pp.~543-548 1999
With the Aim of Country with Intelligent Sense of Existence : The Case Introduction, Center of Excellence program Creation of Perfect Surfaces
Vol. Vol.~65, No.~11, pp.~1650-1651 1999
Plasma Chemical Vaporization Machining with a Pipe Electrode for Large Optics
Vol. pp.~219-224 1999
Development of Numerically Controlled Plasma CVM (Chemical Vaporization Machining) System for Fabrication of Ultra Precision Optical Devices
Precision Science and Technology for Perfect Surfaces (Proceedings of the 9th International Conference on Production Engineering), pp.~213-218 Vol. pp.~213-218 1999
Slicing of Functional Materials by Plasma CVM (Chemical Vaporization Machining)
Vol. pp.~225-230 1999
High Speed Patterning of Integrated-Type a-Si Solar Cell Submodules by Plasma CVM
Vol. pp.~543-548 1999
High Rate Polishing of Silicon Surface using Plasma CVM with Rotary Drum Electrode
Vol. pp.~405-410 1999
Slicing of Functional Materials by Plasma CVM
Proceedings of the 9th International Conference on Production Engineering 1999
Development of Numerically Controlled Plasma CVM System for Fabrication of Ultra Precision Optical Devices.
Proceedings of the 9th International Conference on Production Engineering 1999
Computer numerically controlled plasma chemical vaporization machining with a pipe electrode for optical fabrication
H Takino, N Shibata, H Itoh, T Kobayashi, H Tanaka, M Ebi, K Yamamura, Y Sano, Y Mori
APPLIED OPTICS Vol. 37 No. 22 p. 5198-5210 1998/08
Computer Numerically Controlled Plasma Chemical Vaporization Machining with a Pipe Electrode for Optical Fabrication
Hideo Takino, Norio Shibata, Teruki Kobayashi, Hiroaki Tanaka, Masami Ebi, Kazuya Yamamura, Yasuhisa Sano, Yuzo Mori
APPLIED OPTICS, 37/22,5198 Vol. 37 No. 22 p. 5198-5210 1998/08
Computer numerically controlled plasma chemical vaporization machining with a pipe electrode for optical fabrication
Hideo Takino, Norio Shibata, Hiroshi Itoh, Teruki Kobayashi, Hiroaki Tanaka, Masami Ebi, Kazuya Yamamura, Yasuhisa Sano, Yuzo Mori
Applied Optics Vol. 37 No. 22 p. 5198-5210 1998/08/01
Plasma chemical vaporization machining (CVM) for fabrication of optics
H Takino, N Shibata, H Itoh, T Kobayashi, H Tanaka, M Ebi, K Yamamura, Y Sano, Y Mori
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS Vol. 37 No. 7B p. L894-L896 1998/07
Plasma Chemical Vaporization Machining(CVM)for Fabrication of Optics
Hideo TAKINO, Norio SHIBATA, Teruki KOBAYASHI, Hiroaki TANAKA, Masami EBI, Kazuya YAMAMURA, Yasuhisa SANO, Yuzo MORI
Jpn J Appl Phys Vol. 37 No. Part2 p. 7B,L894-L896 1998/07
Publisher: The Japan Society of Applied Physics
Plasma chemical vaporization machining (CVM) for fabrication of optics
H Takino, N Shibata, H Itoh, T Kobayashi, H Tanaka, M Ebi, K Yamamura, Y Sano, Y Mori
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS Vol. 37 No. 7B p. L894-L896 1998/07
プラズマCVMによる光学面の形状創成 -第2報 : パイプ電極プラズマCVM装置による非球面加工-
瀧野 日出雄, 柴田 規夫, 伊藤 博, 小林 輝紀, 田中 宏明, 海老 正美, 谷口 美樹, 山村 和也, 佐野 泰久, 森 勇藏
精密工学会大会学術講演会講演論文集 Vol. 1998 No. 1 p. 513-513 1998/03/05
プラズマCVMによる高融点金属材料の表面加工 (第2報)
柴原 正文, 西岡 敏明, 脇坂 彰一, 沖田 耕三, 森 勇藏, 山村 和也, 佐野 泰久
精密工学会大会学術講演会講演論文集 Vol. 1998 No. 1 p. 515-515 1998/03/05
EEM (Elastic Emission Machining)用微粒子作製装置の開発
森 勇蔵, 山内 和人, 山村 和也, 佐野 泰久, 松本 光弘, 三村 秀和
精密工学会大会学術講演会講演論文集 Vol. 1998 No. 1 p. 430-430 1998/03/05
Computer Numerically Controlled Plasma Chemical Vaporization Machining with a Pipe Electrode for Optical Fabrication
APPLIED OPTICS, 37/22,5198 Vol. 37 No. 22 p. 5198-5210 1998
Plasma Chemical Vaporization Machining(CVM)for Fabrication of Optics
Vol. 37 No. Part2 1998
Development of New Ultra Precision Machining Methods-Plasma CVM and EEM-
Book of Lecture Notes 1998
プラズマCVM(Chemical Vaporization Machining)における切断加工に関する研究(第3報) -各種材料の切断加工特性-
森 勇藏, 山村 和也, 佐野 泰久
精密工学会大会学術講演会講演論文集 Vol. 1997 No. 2 p. 185-185 1997/10/01
プラズマCVMによる高融点金属材料の表面加工
柴原 正文, 西岡 敏明, 沖田 耕三, 森 勇蔵, 山村 和也, 佐野 泰久
精密工学会大会学術講演会講演論文集 Vol. 1997 No. 2 p. 189-189 1997/10/01
数値制御プラズマCVM加工装置の開発(第1報)
森 勇藏, 山村 和也, 佐野 泰久, 石川 俊夫, 岡本 利樹, 足立 真士
精密工学会大会学術講演会講演論文集 Vol. 1997 No. 2 p. 186-186 1997/10/01
プラズマCVMによる光学面の形状創成 -第1報 : パイプ電極を用いた数値制御プラズマCVM装置の開発-
瀧野 日出雄, 柴田 規夫, 伊藤 博, 小林 輝紀, 田中 宏明, 海老 正美, 山村 和也, 森 勇蔵
精密工学会大会学術講演会講演論文集 Vol. 1997 No. 2 p. 187-187 1997/10/01
プラズマCVM加工面に影響を与える前加工面の加工変質層について
小林 輝紀, 柴田 規夫, 瀧野 日出雄, 伊藤 博, 山村 和也, 森 勇蔵
精密工学会大会学術講演会講演論文集 Vol. 1997 No. 2 p. 188-188 1997/10/01
プラズマCVMによる集積型a-Si太陽電池の高速パターニングに関する研究
中野 真吾, 堂本 洋一, 平野 均, 樽井 久樹, 木山 精一, 中野 昭一, 佐野 泰久, 山村 和也, 森 勇藏
精密工学会大会学術講演会講演論文集 Vol. 1997 No. 2 p. 190-190 1997/10/01
First-principles Analysis of Chemical Reactions between Metal Oxide Fine Powders and Si(100) Surface in EEM(Elastic Emission Machining)
Kazuto Yamauchi, Kikuji Hirose, Hidekazu Goto, Masao Sakamoto, Kazuya Yamamura, Yasuhisa Sano, Yuzo Mori
Vol. Vol.20, pp.867-870 1996/12
Plasma CVM(Chemical Vaporization Machining)におけるポリシング加工に関する研究(第3報) -加工面の平坦度と電極形状ならびに試料保持方法の相関(その2)-
森 勇蔵, 山内 和人, 山村 和也, 佐野 泰久
精密工学会大会学術講演会講演論文集 Vol. 1996 No. 2 p. 197-198 1996/09/01
First-principles Analysis of Removal Mechanism in EEM(Elastic Emission Machining)
Kazuto Yamauchi, Kikuji Hirose, Hidekazu Goto, Kazuya Yamamura, Yasuhisa Sano, Yuzo Mori
Proceedings of 1996 the Japan-China Bilateral Symposium on Advanced Manufacturing Engineering, pp.60-64 Vol. pp.60-64 1996/09
Polishing of Si Wafer by Plasma CVM(Chemical Vaporization Machining)
Yuzo Mori, Kazuya Yamamura, Kazuto Yamauchi, Yasuhisa Sano
Vol. pp.65-68 1996/09
Slicing of Silicon by Plasma CVM(Chemical Vaporization Machining)
Yuzo Mori, Kazuto Yamauchi, Kazuya Yamamura, Yasuhisa Sano
Vol. pp.69-72 1996/09
Designing a New Apparatus for Measuring Particle Sizes of Nanometer Order by Light-scattering (4th Report) -- Formation for Output Characteristics of Photomultiplier and Improvement of Dynamic Range --
Hiroshi An, Yuzo Mori, Toshihiko Kataoka, Katsuyoshi Endo, Kazuto Yamauchi, Kohji Inagaki, Kazuya Yamamura, Haruyuki Inoue, Yasuhisa Sano
Vol. Vol.62, No.8, pp.1198-1202/, 1996/08
Designing a New Apparatus for Measuring Particle Sizes of Nanometer Order by Light-scattering (4th Report) : Formation for Output Characteristics of Photomultiplier and Improvement of Dynamic Range
Hiroshi AN, Yuzo MORI, Toshihiko KATAOKA, Katsuyoshi ENDO, Kazuto YAMAUCHl, Kohji INAGAKI, Kazuya YAMAMURA, Haruyuki INOUE, Yasuhisa SANO
Journal of the Japanese Society of Precision Engineering Vol. 62 No. 8 p. 1198-1202 1996/08
Plasma CVM(Chemical Vaporization Machining)におけるポリシング加工に関する研究(第1報) -ポリシング加工用高速回転型電極の試作とその加工特性-
森 勇藏, 山内 和人, 山村 和也, 佐野 泰久
精密工学会大会学術講演会講演論文集 Vol. 1996 No. 1 p. 1145-1146 1996/03/01
プラズマCVM(Chemical Vaporization Machining)における切断加工に関する研究 -切断加工用高速回転電極の試作とその加工特性-
森 勇藏, 山内 和人, 山村 和也, 佐野 泰久
精密工学会大会学術講演会講演論文集 Vol. 1996 No. 1 p. 1143-1144 1996/03/01
Plasma CVM(Chemical Vaporization Machining)におけるNC加工に関する研究(第1報) -NC加工用高速回転型電極の試作とその加工特性-
森 勇藏, 山内 和人, 山村 和也, 佐野 泰久
精密工学会大会学術講演会講演論文集 Vol. 1996 No. 1 p. 1141-1142 1996/03/01
光散乱法によるナノメータオーダの粒径測定法 (第5報) -ダイナミックレンジの改善法と標準粒子の測定-
安 弘, 南川 文孝, 森 勇蔵, 片岡 俊彦, 遠藤 勝義, 山内 和人, 稲垣 耕司, 井上 晴行, 山村 和也, 佐野 泰久
精密工学会大会学術講演会講演論文集 Vol. 1996 No. 1 p. 1109-1110 1996/03/01
EEM(Elastic Emission Machining)における加工現象の第一原理分子動力学シミュレーション (第3報) -化学結合の分子軌道計算-
山内 和人, 山村 和也, 佐野 泰久, 広瀬 喜久治, 後藤 英和, 坂本 正雄, 森 勇藏
精密工学会大会学術講演会講演論文集 Vol. 1996 No. 1 p. 989-990 1996/03/01
精密加工の最先端技術、第８章Ⅳ、「プラズマＣＶＭの加工特性と表面物性」
工業調査会 1996
A Method for Measuring Particle Sizes of Nanometer Order by Light-Scattering
YAMAMURA Kazuya
1996
Publisher: Proceedings of 1996 The Japan-China Bilateral Symposium on Advanced Manufacturing Engineering光散乱法によるナノメータオーダの粒径測定法の開発(第4報) -- 光電子増倍管出力特性の定式化とダイナミックレンジの改善法 --
精密工学会誌, Vol.62, No.8, pp.1198-1202 Vol. Vol.62, No.8, pp.1198-1202 1996
A Method for Measuring Particle Sizes of Nanometer Order by Light-Scattering
/,147 1996
First-principles Analysis of Chemical Reactions between Metal Oxide Fine Powders and Si(100) Surface in EEM(Elastic Emission Machining)
Transactions of the Materials Research Society of Japan, Vol.20, pp.867-870 Vol. Vol.20, pp.867-870/, 1996
光散乱法によるナノメータオーダの粒径測定法の開発(第4報) -- 光電子増倍管出力特性の定式化とダイナミックレンジの改善法 --
精密工学会誌, Vol.62, No.8, pp.1198-1202 Vol. Vol.62, No.8, pp.1198-1202/, 1996
First-principles Analysis of Removal Mechanism in EEM(Elastic Emission Machining)
Proceedings of 1996 the Japan-China Bilateral Symposium on Advanced Manufacturing Engineering, pp.60-64 Vol. pp.60-64 1996
Polishing of Si Wafer by Plasma CVM(Chemical Vaporization Machining)
Proceedings of 1996 the Japan-China Bilateral Symposium on Advanced Manufacturing Engineering, pp.65-68 Vol. pp.65-68 1996
Slicing of Silicon by Plasma CVM(Chemical Vaporization Machining)
Proceedings of 1996 the Japan-China Bilateral Symposium on Advanced Manufacturing Engineering, pp.69-72 Vol. pp.69-72 1996
First-principles Analysis of Chemical Reactions between Metal Oxide Fine Powders and Si(100) Surface in EEM(Elastic Emission Machining)
Vol. Vol.20, pp.867-870 1996
Designing a New Apparatus for Measuring Particle Sizes of Nanometer Order by Light-scattering (4th Report) -- Formation for Output Characteristics of Photomultiplier and Improvement of Dynamic Range --
Vol. Vol.62, No.8, pp.1198-1202 1996
A Method for Measuring Particle Sizes of Nanometer Order by Light-Scattering
1996
First-principles Analysis of Chemical Reactions between Metal Oxide Fine Powders and Si(100) Surface in EEM(Elastic Emission Machining)
Vol. Vol.20, pp.867-870/, 1996
First-principles Analysis of Removal Mechanism in EEM(Elastic Emission Machining)
Proceedings of 1996 the Japan-China Bilateral Symposium on Advanced Manufacturing Engineering, pp.60-64 Vol. pp.60-64 1996
Polishing of Si Wafer by Plasma CVM(Chemical Vaporization Machining)
Vol. pp.65-68 1996
Slicing of Silicon by Plasma CVM(Chemical Vaporization Machining)
Vol. pp.69-72 1996
Laser Beam Intensity Profile Transformation with a Fabricated Mirror
Koshichi Nemoto(Center Research Institute of Electric Power Industry, Takashi Fujii(Center Research Institute of Electric Power Industry, Naohiko Goto(Center Research Institute of Electric Power Industry, Hideo Takino(Nikon Corporation, Teruki Kobayashi(Nikon Corporation, Norio Shibata(Nikon Corporation, Kazuya Yamamura, Yuzo Mori
APPLIED OPTICS Vol. 36 No. 3 p. 551-557 1996/01
First-principles Analysis of Chemical Reactions between Metal Oxide Fine Powders and Si(100) Surface in EEM(Elastic Emission Machining)
Transactions of the Materials Research Society of Japan Vol. 20 1996
A Method for Measuring Particle Sizes of Nanometer Order by Light-Scattering
Proceedings of 1996 The Japan-China Bilateral Symposium on Advanced Manufacturing Engineering 1996
First-principles analysis of Removal Mechanism in EEM(Elastic Emission Machining)
Proceedings of 1996 The Japan-China Bilateral Symposium on Advanced Manufacturing Engineering 1996
Slicing of Silicon by Plasma CVM(Chemical Vaporization Machining)
Proceedings of 1996 The Japan-China Bilateral Symposium on Advanced Manufacturing 1996
Polishing of Si Water by Plasma CVM(Chmical Vaporization Machining)
Proceedings of 1996 The Japan-China Bilateral Symposium on Advanced Manufacturing 1996
プラズマCVM(Chemical Vaporization Machining)における加工現象の第一原理分子動力学シミュレーション(第5報)-Si表面とハロゲン原子の相互作用の解析(その3)-
山村 和也, 佐野 泰久, 山内 和人, 広瀬 喜久治, 後藤 英和, 坂本 正雄, 森 勇藏
精密工学会大会学術講演会講演論文集 Vol. 1995 No. 2 p. 625-626 1995/09/01
Plasma Chemical Vaporization Machining of Quartz Crystal
IKEDA M., TOMITA Y., EDA K., YAMAMURA K., MORI Y.
Proceedings of the IEICE General Conference Vol. 1995 p. 383-383 1995/03/27
Publisher: The Institute of Electronics, Information and Communication Engineers
Thickness and Strain Measurement of Native Oxide on Si Surface by Photo-reflectance Spectra
MORI Yuzo, KATAOKA Toshihiko, ENDO Katsuyoshi, YAMAUCHI Kazuto, INAGAKI Kohji, YAMAMURA Kazuya, HIROSE Kikuji
Journal of the Japan Society of Precision Engineering Vol. 61 No. 3 p. 396-400 1995
Publisher: The Japan Society for Precision Engineering
Plasma CVM (Chemical Vaporization Machining)の開発
生産と技術, Vol.47, No.1, pp.39-43 Vol. Vol.47, No.1, pp.39-43 1995
Plasma CVM (Chemical Vaporization Machining)の開発
生産と技術, Vol.47, No.1, pp.39-43 Vol. Vol.47, No.1, pp.39-43/, 1995
Development of Plasma CVM (Chemical Vaporization Machining)
Vol. Vol.47, No.1, pp.39-43 1995
Development of Plasma CVM (Chemical Vaporization Machining)
Kazuya Yamamura, Yuzo Mori
Vol. Vol.47, No.1, pp.39-43/, 1995/01
Development of Plasma CVM (Chemical Vaporization Machining)
The Production and Technique Vol. 47 No. 1 1995
Thickness and Strain Measurement of Native Oxide on Si Surface by Photo-reflectance Spectra
Journal of the Japan Society for Precision Engineering Vol. 61 No. 6 1995
A New Apparatus for Measuring Particle Sizes of the Order of Nanometer (2nd Report) -Evaluation of Measuring System by using Standard Partides-
Hiroshi AN, Yuzo MORI, Tosihiko KATAOKA, Katsuyoshi ENDO, Kohji INAGAKI, Kazuya YAMAMURA, Kazuto YAMAUCHI, Takashige FUKUIKE
Vol. 28 356-361 1994/12
Publisher: International Journal of The Japan Society for Precision EngineeringA NEW APPARATUS FOR MEASURING PARTICLE SIZES OF THE ORDER OF NANOMETER (2ND REPORT) - EVALUATION OF MEASURING SYSTEM BY USING STANDARD PARTICLES
H AN, Y MORI, T KATAOKA, K ENDO, K INAGAKI, K YAMAMURA, K YAMAUCHI, T FUKUIKE
INTERNATIONAL JOURNAL OF THE JAPAN SOCIETY FOR PRECISION ENGINEERING Vol. 28 No. 4 p. 356-361 1994/12
Development of Measuring Systemn for Ultra-precision Machined Surface by Photo-reflectance Spectra
Y.Mori, T.Kataoka, K.Endo, K.Yamauchi, K.Inagaki, K.Yamamura, K.Hirose
1994/09
Publisher: 精密工学会誌
光反射率スペクトルによる超精密加工表面の評価法の開発
精密工学会誌 1994
Development of Measuring System for Ultra-precision Machined Surface by Photo-reflectance Spectra
MORI Yuzo, KATAOKA Toshihiko, ENDO Katsuyoshi, YAMAUCHI Kazuto, INAGAKI Kohji, YAMAMURA Kazuya, HIROSE Kikuji
Journal of the Japan Society of Precision Engineering Vol. 60 No. 9 p. 1360-1364 1994
Publisher: The Japan Society for Precision Engineering
Development of Measuring Systemn for Ultra-precision Machined Surface by Photo-reflectance Spectra
1994
Development of Measuring Systemn for Ultra-precision Machined Surface by Photo-reflectance Spectra
Yuzo MORI, Toshihiko KATAOKA, Katsuyoshi ENDO, Kazuto YAMAUCHI, Kohji INAGAKI, Kazuya YAMAMURA, Kikuji HIROSE
Journal of the Japan Society for Precision Engineering Vol. 60 No. 9 p. 1360-1364 1994
Plasma CVM (Chemical Vaporization Machining) - An Ultra Precision Machining with High Pressure Reactive Plasma-
Y.Mori, K.Yamamura, K.Yamauchi, K.Yoshii, T.Kataoka, K.Endo, K.Inagaki, H.Kakiuchi
Technol. Repts. of the Osaka Univ. Vol. 43, 261-266 p. 261-261 1993/10
Designing a New Apparatus for Measuring Particle Sizes of Nanometer Order by light-scattering (3rd Report) -Evaluation of Measuring System by using Standard Particles-
Y.Mori,H.An, T.Kataoka, K.Endo, K.Inagaki, K.Yamauchi, K.Yamamura, T.Fukuike
Vol. 59 No. 7 p. 1121-1126 1993/07
Publisher: 精密工学会誌
Low Temperature Growth of Polycrystalline Silicon Films by Plasma Chemical Vapor Deposition under Higher Pressure than Atmospheric Pressure
H.Kawabe, Y.Mori, K.Yoshii, T.Kataoka, K.Yasutake, K.Endo, K.Yamauchi, K.Yamamura, H.Kakiuchi
Proc. 7th Int. Prec. Eng. Seminar Vol. 554-565 1993/05
Plasma CVM (chemical vaporization machining) -- A Chemical Machining Method With Equal Performances to Conventional Mechanical Methods from the Sense of Removal Rates and Spatial Resolutions
Y.Mori, K.Yamamura, K.Yamauchi, K.Yoshii, T.Kataoka, K.Endo, K.Inagaki, H.Kakiuchi
Proc. 7th Int. Prec. Eng. Seminar Vol. 78 1993/05
Low Temperature Growth of Polycrystalline Silicon Films by Plasma Chemical Vapor Deposition under Higher Pressure than Atmospheric Pressure
Proceeding of 7th International Precision Engineering Seminar, 554-565 (1993) Vol. 554-565 1993
Plasma CVM (Chemical Vaporization Machining) - An Ultra Precision Machining with High Pressure Reactive Plasma-
TECHNOLOGY RERORTS OF THE OSAKA UNIVERSITY, 43, 261-266 (1993) Vol. 43, 261-266/, 1993
Plasma CVM (chemical vaporization machining) -- A Chemical Machining Method With Equal Performances to Conventional Mechanical Methods from the Sense of Removal Rates and Spatial Resolutins
Proceeding of 7th International Precision Engineering Seminar, 78-87 (1993) Vol. 78-87 1993
Designing a New Apparatus for Measuring Particle Sizes of Nanometer Order by Light-scattering (3rd Report) : Evaluation of Measuring System by using Standard Particles
MORI Yuzo, AN Hiroshi, KATAOKA Tosihiko, ENDO Katsuyoshi, INAGAKI Kohji, YAMAUCHI Kazuto, YAMAMURA Kazuya, FUKUIKE Takashige
Journal of the Japan Society of Precision Engineering Vol. 59 No. 7 p. 1121-1126 1993
Publisher: The Japan Society for Precision Engineering
Plasma CVM (Chemical Vaporization Machining) - An Ultra Precision Machining with High Pressure Reactive Plasma-
Vol. 43, 261-266 1993
Designing a New Apparatus for Measuring Particle Sizes of Nanometer Order by light-scattering (3rd Report) -Evaluation of Measuring System by using Standard Particles-
MORI Yuzo, AN Hiroshi, KATAOKA Tosihiko, ENDO Katsuyoshi, INAGAKI Kohji, YAMAUCHI Kazuto, YAMAMURA Kazuya, FUKUIKE Takashige
Journal of the Japan Society for Precision Engineering Vol. 59 No. 7 p. 1121-1126 1993
Publisher: The Japan Society for Precision Engineering
Plasma CVM (Chemical Vaporization Machining) - An Ultra Precision Machining with High Pressure Reactive Plasma-
Vol. 43, 261-266/, 1993
Low Temperature Growth of Polycrystalline Silicon Films by Plasma Chemical Vapor Deposition under Higher Pressure than Atmospheric Pressure
Vol. 554-565 1993
Plasma CVM (chemical vaporization machining) -- A Chemical Machining Method With Equal Performances to Conventional Mechanical Methods from the Sense of Removal Rates and Spatial Resolutins
Vol. 78-87 1993
Designing a New Apparatus for Measuring Particle Sizes of Nanometer Order by light-scattering (3rd Report) -Evaluation of Measuring System by using Standard Particles-
Journal of the Japan Society for Precision Engineering Vol. 59 No. 7 p. 1121-1126 1993
Designing a New Apparatus for Measuring Particle Sizes of Nanometer Order by light-scattering (3rd Report) -Evaluation of Measuring System by using Standard Particles-
Journal of the Japan Society for Precision Engineering- Vol. 59 No. 7 p. 1121-1126 1993
Low Temperature Growth of Polycrystalline Silicon Films by Plasma Chemical Vapor Deposition under Higher Pressure than Atmospheric Pressure
Proc. 7th Int. Prec. Eng. Seminar 1993
Plasma CVM (chemical vaporization machining): An ultra precision machining technique using high-pressure reactive plasma
Y. Mori, K. Yamamura, K. Yamauchi, K. Yoshii, T. Kataoka, K. Endo, K. Inagaki, H. Kakiuchi
Nanotechnology Vol. 4 No. 4 p. 225-229 1993
Plasma CVM(Chemical Vaporization Machining) - An Ultra Precision Machining with High Pressure Reactive Plasma-
Y. Mori, K. Yamamura, K. Yamauchi, K. Yoshii, T. Kataoka, K. Endo, K. Inagaki, H. Kakiuchi
Vol. 26-27 1992/09
Publisher: The 3rd International Conterence on Nanotechnology AbstractプラズマCVM(Chemical Vaporization Machining)-セラミックス材料の加工特性-
1992
プラズマCVM(Chemical Vaporization Machining)-セラミックス材料の加工特性-
山村和也
1992
Publisher: 1992年精密工学会春季大会学術講演会講演論文集Plasma CVM(Chemical Vaporization Machining) - An Ultra Precision Machining with High Pressure Reactive Plasma-
Program and Abstracts of The 3rd International Conference on Nanotechnology (1992) 26-27. Vol. 26-27 1992
Plasma CVM(Chemical Vaporization Machining) - An Ultra Precision Machining with High Pressure Reactive Plasma-
Vol. 26-27 1992
Plasma CVM (Chemical Vapolization Machining) -An Ultra Precision Machining with High Pressure Reactive Plasma
Tehnology Reports of the Osaka University Vol. 43 No. 2156 p. 261-266 1992
Plasma CVM(Chemical Vaporization Machining) - An Ultra Precision Machining with High Pressure Reactive Plasma-
The 3rd International Conterence on Nanotechnology Abstract 1992
Ultra-Smooth Surface Machining by Means of Atomistic Processes‐EEM(Elastic Emission Machining) and CVM(Chemical Vaporization Machining)
Yuzo Mori, Kazuto Yamauchi, Kazuya Yamamura, Toshihiko Kataoka, Katsuyoshi Endo
Vol. 123-140 1991/10
プラズマCVM(Chemical Vaporization Machining)の開発
山村和也
1991
Publisher: 1991年精密工学会春季大会学術講演会講演論文集プラズマCVM(Chemical Vaporization Machining)の開発
1991
Ultra-Smooth Surface Machining by Means of Atomistic Processes‐EEM(Elastic Emission Machining) and CVM(Chemical Vaporization Machining)
Proc.14th Symposium on ULSI ultra clean technology‐Advanced Semiconductor Manufacturing System‐(1991) 123-140. Vol. 123-140 1991
Ultra-Smooth Surface Machining by Means of Atomistic Processes‐EEM(Elastic Emission Machining) and CVM(Chemical Vaporization Machining)
Vol. 123-140 1991
Ultra-Smooth Surface machining by Means of Atomistic Processes - EEM (Elastic Emission Machining) and CVM (chemical Vaporization Machining)-
1991
接着界面解析と次世代接着接合技術
大久保雄司, 山村和也
(株)エヌ･ティー･エス、東京 2022/10
Chapter 41. Plasma-Based Nanomanufacturing Under Atmospheric Pressure, Handbook of Manufacturing Engineering and Technology
K. Yamamura, Y. Sano
Springer 2014/10 Scholarly book
ISBN: 9781447146698
超精密加工と表面科学 原子レベルの生産技術
山村和也他
大阪大学出版会 2014/03 Textbook, survey, introduction
精密加工と微細構造の形成技術, 第1章第2節[9], プラズマ援用研磨による SiCのスクラッチフリー・ダメージフリー仕上げ
山村和也
技術情報協会 2013/07 Scholarly book
ISBN: 9784861044830
大気圧プラズマの生成制御と応用技術 改訂版第6章第3節 プラズマCVMによる超精密形状創成とプラズマ援用研磨による表面仕上げ
山村和也, 佐野泰久, 森 勇藏
サイエンス&テクノロジー 2012/03 Scholarly book
ISBN: 9784864280396
Generation and Applications of Atmospheric Pressure Plasmas, Chapter 15. Ultra precision machining using plasma chemical vaporization machining (CVM)
K. Yamamura, Y. Sano, Y. Mori
Nova Science Publishers 2011/04 Scholarly book
ISBN: 9781612097176
Crystal Growth Technology (Chapter 18; Crystal Machining Using Atmospheric Pressure Plasma)
Yasuhisa Sano, Kazuya Yamamura, Kazuto Yamauchi
WILEY-VCH 2010/09 Scholarly book
ISBN: 9783527325931
次世代パワー半導体 －省エネルギー社会に向けたデバイス開発の最前線－ 第1章第1節2 PCVMを用いたSiC基板の薄化
佐野泰久, 山村和也, 山内和人
(株)エヌ・ティー・エス 2009/10 Scholarly book
大気圧プラズマ 基礎と応用 6.7.5 マイクロ／ナノ加工日本学術振興会プラズマ材料科学第153委員会
佐野泰久, 山村和也, 山内和人
オーム社 2009/10 Scholarly book
ISBN: 9784274207600
ウエットエッチングのメカニズムと処理パラメータの最適化,第1章第10節 ローカルウエットエッチング法による光学素子の高精度加工
山村和也
サイエンス&テクノロジー 2008/07 Scholarly book
ISBN: 9784903413471
Crystal Growth Technology (Chapter 19; Plasma Chemical Vaporization Machining and Elastic Emission Machining)
Yasuhisa Sano, Kazuya Yamamura, Hidekazu Mimura, Kazuto Yamauchi, Yuzo Mori
Wiley-VCH 2008/03 Scholarly book
ISBN: 9783527317622
大気圧プラズマの生成制御と応用技術, 第13節 プラズマCVMによる超精密加工
山村和也, 佐野泰久, 森 勇藏
サイエンス＆テクノロジー 2006/11 Scholarly book
ISBN: 4903413136
Crystal Growth Technology(Plasma-CVM(Chemical Vaporization Machining))
Yuzo Mori, Kazuya Yamamura, Yasuhisa Sano
John Wiley & Sons 2003/10 Scholarly book
加工技術データファイル 基礎編（特殊加工）、5.7プラズマＣＶＭ
森勇藏, 山村和也, 佐野泰久
（財）機械振興協会 技術研究所 2003/06 Scholarly book
精密加工の最先端技術、第８章Ⅳ、「プラズマＣＶＭの加工特性と表面物性」
森勇藏, 山村和也
工業調査会 1996/03 Scholarly book
精密加工の最先端技術
工業調査会 1996
Advanced Ultraprecision Technology
1996
フッ素樹脂を絶縁被覆材料とする無電解銅めっきシールド超極細同軸ケーブルの開発
2012 -
フッ素樹脂を絶縁被覆材料とする無電解銅めっきシールド超極細同軸ケーブルの開発
2011 -
プラズマ援用加工を用いた難加工材料の高品位仕上げプロセスの開発
2011 -
高性能パワーデバイスのための原子スケールで平坦なダメージフリーSiCウエハの作製
2011 -
中性子集光用非球面スーパーミラーデバイスの開発
2010 -
大気圧プラズマを援用した難加工材料の高能率・高品位加工プロセスの開発
2010 -
高臨界角スーパーミラーを用いた多重チャネル中性子収束デバイスの研究
2010 -
高精度ビーム集光による角度発散型中性子反射法の開発
2010 -
大気圧プラズマ照射を援用したパワーデバイス用単結晶SiC基板の高品位加工プロセスの開発
2010 -
グローバルCOE 高機能化原子制御製造プロセス教育研究拠点
2010 -
大気圧プラズマを援用した金型用難加工材料の高能率・高品位加工プロセスの開発
2010 -
大気圧プラズマ液相堆積法によるフッ素ポリマー表面の高密着性極薄銅メタライジング
2009 -
中性子集光用非球面スーパーミラーデバイスの開発
2009 -
高臨界角スーパーミラーを用いた多重チャネル中性子収束デバイスの研究
2009 -
触媒フリー・無電解銅めっきプロセスの開発とPTFE基板の素子化
2009 -
大気開放プラズマを用いた無歪高能率ナノ精度形状創成プロセスの開発
2009 -
グローバルCOE 高機能化原子制御製造プロセス教育研究拠点
2009 -
Development of aspherical supermirror devices for neutron focusing
2009 -
大気開放型プラズマプロセスを用いた水晶ウエハの高能率ダメージレス厚み均一化加工技術の開発
2008 -
グローバルCOE 高機能化原子制御製造プロセス教育研究拠点
2008 -
触媒フリー・無電解銅めっきプロセスの開発とPTFE基板の素子化
2008 -
数値制御ローカルウエットエッチングによる次世代高速・低消費電力デバイス用SOIウエハの超高精度仕上げ加工
2008 -
大気開放プラズマを用いた無歪高能率ナノ精度形状創成プロセスの開発
2008 -
高能率ナノ精度形状創成のための2ステップ数値制御ローカルウエットエッチングプロセスの開発
2008 -
高臨界角スーパーミラーを用いた多重チャネル中性子収束デバイスの研究
2008 -
液晶用メーター超級大型フォトマスク基板の高精度・高能率作製プロセスの開発
2008 -
数値制御ローカルウエットエッチングによる新しい高能率・高精度形状創成プロセスの開発
2008 -
Center of Excellence for Atomically Controlled Fabrication Technology
2008 -
数値制御LWEによる超大型フォトマスク基板の低コスト・高精度仕上げ加工プロセスの開発
2007 -
液晶用メーター超級大型フォトマスク基板の高精度・高能率作製プロセスの開発
2007 -
数値制御ローカルウエットエッチングによる新しい高能率・高精度形状創成プロセスの開発
2007 -
数値制御LWEによる超大型フォトマスク基板の低コスト・高精度仕上げ加工プロセスの開発
2006 -
数値制御ローカルウエットエッチングによる新しい高能率・高精度形状創成プロセスの開発
2006 -
液晶用メーター超級大型フォトマスク基板の高精度・高能率作製プロセスの開発
2006 -
高精度X線ミラーの超精密加工と形状計測に関する研究
2004 -
原子論的生産技術の創出拠点
2004 -
超高精度X線ミラー作製による高分解能硬X線顕微鏡の開発
2004 -
高精度X線ミラーの超精密過去と形状計測の関する研究
2004 -
金属含有膜付き誘電体基材の製造方法
大久保雄司, 山村和也, 小玉欣典, 澤田公平, 久保田和宏
特許第6564283号
出願日:2015/08
登録日:2019/08
誘電体基材表面の金属化方法及び金属膜付き誘電体基材
山村和也, 大久保雄司, 佐藤悠, 疋田真也
特許第6551391号
出願日:2015/02
登録日:2019/07
陽極酸化を援用した研磨方法
山村和也
特許第6329655号
出願日:2017/02
登録日:2018/04
誘電体基材表面の触媒フリー金属化方法及び金属膜付き誘電体基材
是津信行, 山村和也
特許第5721254号
出願日:2010/09
登録日:2015/04
フッ素系樹脂材料の表面改質方法及びフッ素系樹脂材料と金属材料の積層体
是津信行, 山村和也
特許第5645163号
出願日:2011/01
登録日:2014/11
難加工材料の精密加工方法及びその装置
山村和也, 是津信行
特許第5614677号
出願日:2010/02
登録日:2014/09
誘電体機材表面の触媒フリー金属化方法及び金属膜付き誘電体基材
是津信行, 山村和也
特許第5360963号
出願日:2008/12
登録日:2013/09
粒子膜の製造装置、及び粒子膜の製造方法
是津信行, 山村和也, 真鍋享平
特許第5322245号
出願日:2010/02
登録日:2013/07
表面加工方法及び装置
山村和也
特許第5039939号
出願日:2006/01
登録日:2012/07
半導体ウエハ外周部の加工方法及びその装置
佐野泰久, 山村和也, 原英之, 加藤武寛
特許第4962960号
出願日:2007/08
登録日:2012/04
誘電体基板のパターン転写加工方法
森勇藏, 山村和也, 佐野泰久
特許第4665503号
出願日:2004/12
登録日:2011/01
表面改質成型体の製造方法
大久保雄司, 山村和也, 秋山大作, 東松逸朗, 斉藤知志
出願日:2018/05
表面処理方法及び装置
大下貴也, 上原剛, 青山哲平, 山村和也, 大久保雄司, 小玉欣典
出願日:2018/02
多成分材料のプラズマエッチング加工方法
山村和也, 大久保雄司, 孫栄硯
出願日:2018/02
表面改質成型体の製造方法、及び該表面改質成型体を用いた複合体の製造方法
山村和也, 大久保雄司, 石原健人, 柴原正文, 長谷朝博, 本田幸司
出願日:2015/09
陽極酸化を援用した形状創成エッチング法、研磨方法及び高精度形状創成方法
山村和也
出願日:2013/03
パルス幅変調電力制御を用いた局所プラズマ処理方法及びその装置
山村和也, 佐野泰久
出願日:2013/03
数値制御プラズマ処理方法及びその装置
山村和也, 境谷省吾, 舩戸大輔
出願日:2016/02
表面改質成型体の製造方法、及び該表面改質成型体を用いた複合体の製造方法
山村和也, 大久保雄司, 石原健人, 柴原正文, 長谷朝博, 本田幸司
出願日:2014/09
誘電体基材表面の金属化方法及び金属膜付き誘電体基材
山村和也, 大久保雄司, 佐藤悠, 疋田真也
出願日:2014/02
半導体記憶素子の製造方法
是津信行, 細井卓治, 山村和也
出願日:2009/07
粒子濃度の測定方法、粒子膜の製造方法、及び粒子膜の製造装置
是津信行, 山村和也, 真鍋亨平
出願日:2009/02
微粒子単層膜付き基板の製造方法及び微粒子単層膜
是津信行, 山村和也
出願日:2008/12
PTFEの異材接着技術を開発 人体や環境への負担減 大阪大学
接着剤新聞
2019/01
金属・フッ素樹脂 接着剤なく貼る
日本経済新聞
2019/01
「NEXTデバイス 京セラ 世界最小の水晶部品 加工、プラズマ技術を応用」
日経産業新聞
2017/10
フッ素樹脂、熱アシストプラズマ処理で高い接着性－阪大が解明
日刊工業新聞
2017/08
「井上春成賞に2件」
日本経済新聞
2017/06
フッ素樹脂の密着性、１年超持続−阪大、加熱プラズマ処理で成功
日刊工業新聞
2017/02
フッ素樹脂と金属膜の強力接合 阪大‐積水化学‐日油と共同 3年内めど実用化
化学工業日報
2016/10
フッ素樹脂と金属膜 プラズマ処理で接合 阪大 積水化学、日油と共同
化学工業日報
2016/01
フッ素樹脂と金属膜 強力接合技術を開発 阪大など基板実用化目指す
日刊産業新聞
2016/01
PTFE-銅・銀など 簡易に高強度接合 阪大
化学工業日報
2015/02
接着剤使わず接合 阪大 フッ素樹脂とゴム
日経産業新聞
2014/09
ウエハー平坦化 大気圧プラズマ利用 阪大、多様な基材に対応
化学工業日報
2014/08
大阪大学 フッ素と金属を密着 高周波基板材に応用展開
半導体産業新聞
2014/03
炭化ケイ素 傷つけずに平滑に研磨 プラズマ照射 砥粒で同時処理
日刊工業新聞
2011/11
世界最高性能の中性子集光技術 －照射強度を50倍増強 楕円面スーパーミラー開発－
科学新聞
2011/08
表面を非接触超精密加工（微小な凹凸エッチング、阪大がシステム）
日刊工業新聞
2008/02
公益社団法人砥粒加工学会関西地区部会 会計監査
2019/04 - Present
公益社団法人精密工学会 フェロー
2017/03 - Present
一般社団法人 電気加工学会 西日本支部（幹事）
2016/06 - Present
一般社団法人 電気加工学会（理事）
2016/06 - Present
（社）精密工学会 関西支部（商議員）
2006/05 - Present
The 18th International Conference on Precision Engineering (ICPE2020) Program Chair
2019/10 - 2020/11
公益社団法人砥粒加工学会 理事
2017/04 - 2019/03
（社）精密工学会 関西支部（庶務幹事）
2010/04 - 2018/03
（社）精密工学会 超精密加工専門委員会（幹事）
2010/12 - 2013/01
（社）精密工学会（校閲委員会委員）
2008/04 - 2011/03
（社）精密工学会（評議員）
2008/03 - 2011/03
（社）精密工学会 関西支部（会計幹事）
2007/05 - 2010/04
（社）精密工学会（周年事業検討ワーキンググループ委員）
2006/07 - 2009/09
セミコンジャパン Inovation Village
SEMI
2016/12 -
18th CIRP Conference on Electro Physical and Chemical Machining (ISEM XVIII)
CIRP, JSEME
2016/04 -
SURTECH2016「表面技術要素展」
一般社団法人表面技術協会、日本鍍金材料協同組合、株式会社ICSコンベンションデザイン
2016/01 -
The 6th International Conference of Asian Society for Precision Engineering and Nanotechnology (ASPEN2015)
Harbin Institute of Technology
2015/08 -
SURTECH2015「表面技術要素展」
一般社団法人表面技術協会、日本鍍金材料協同組合、株式会社ICSコンベンションデザイン
2015/01 -
The 4th Asia Pacific Conference on Optics Manufacture 2014 (APCOM 2014)
Guangdong University of Technology & The Hong Kong Polytechnic University
2014/11 -
イノベーションジャパン
科学技術振興機構、新エネルギー・産業技術総合開発機構
2014/09 -
2014 International Conference on Machining, Materials and Mechanical Technologies(2014 IC3MT)
National Central University (NCU), Taiwan, Japan Society for Precision Engineering (JSPE), Japan
2014/08 -
The 15th International Conference on Precision Engineering (ICPE2014)
The Japan Society for Precision Engineering (JSPE)
2014/07 -
14th International Conference of the European Society for Precision Engineering and Nanotechnology
The European Society for Precision Engineering and Nanotechnology
2014/06 -
真空展
日本真空工業会、一般社団法人日本真空学会
2013/11 -
13th International Conference of the European Society for Precision Engineering and Nanotechnology
The European Society for Precision Engineering and Nanotechnology
2013/05 -
砥粒加工学会 先進テクノフェアポスター展示(ATF2013)
2013/03 -
The 9th Cooperative and Joint international conference on Ultra-precision Machining Process in conjunction with The 7th Conference of Ultra-Precision (ELID) Technology Research Group
RIKEN, MFL, Committee of Precision Engineering & Micro-nano Technology of CPEI, Committee of Ultra-Precision (ELID) Technology Research Group (UPET)
2013/03 -
セミコンジャパン
SEMI
2012/12 -
The 9th CHINA-JAPAN International Conference on Ultra-Precision Machining
Zhejiang University of Technology, CMES, JSPE, RIKEN
2012/11 -
The 14th International Conference on Precision Engineering(ICPE2012)
Japan Society for Precision Engineering
2012/11 -
10th International Conference on Processing of Machining Technology (ICPMT2012)
Japan Society for Precision Engineering
2012/09 -
The 3rd Asia Pacific Conference on Optics Manufacture 2012 (APCOM 2012)
The Chinese Optical Society et al.
2012/08 -
セミコンジャパン
SEMI
2011/12 -
The 8th CHINA-JAPAN International Conference on Ultra-Precision Machining
Zhejiang University of Technology, CMES, JSPE, RIKEN
2011/11 -
4th International Conference of Asian Society for Precision Engineering and Nanotechnology(ASPEN2011)
The Hong Kong Polytechnic University
2011/11 -
Fourth International Symposium on Atomically Controlled Fabrication Technology
The Osaka University Global COE Program "Atomically Controlled Fabrication Technology"
2011/10 -
セミコンジャパン
SEMI
2010/12 -
Third international symposium on Atomically Controlled Fabrication Technology
The Osaka University Global COE Program "Atomically Controlled Fabrication Technology"
2010/11 -
2nd International Conference on Nanomanufacturing (nanoMan2010)
International Academy for Production Engineering (CIRP), etc.
2010/09 -
Second international symposium on Atomically Controlled Fabrication Technology
The Osaka University Global COE Program "Atomically Controlled Fabrication Technology"
2009/11 -
3rd International Conference of Asian Society for Precision Engineering and Nanotechnology(ASPEN2009)
Japan Society for Precision Engineering
2009/11 -
International workshop on X-ray mirror design, and metrology
The Osaka University global COE "Atomically Controlled Fabrication Technology", and Grant-in-Aid for
2009/09 -
First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing-
The Global COE Program "Atomically Controlled Fabrication Technology"
2009/02 -
セミコンジャパン
SEMI
2008/12 -
nano tech 2008 国際ナノテクノロジー総合展・技術会議
nano tech 実行委員会
2008/02 -
セミコンジャパン
SEMI
2007/12 -
International 21st Century COE Symposium on Atomistic Fabrication Technology
The 21st Century COE Program “Atomistic Fabrication Technology”, Osaka University
2007/10 -
イノベーションジャパン
科学技術振興機構、NEDO
2007/09 -
モノづくり企業革新研究会
大阪商工会議所
2007/07 -
微細精密加工技術展
微細精密加工技術展2007実行委員会
2007/05 -
International 21st Century COE Symposium on Atomistic Fabrication Technology
The 21st Century COE Program “Atomistic Fabrication Technology” Osaka University
2006/10 -
接着剤レスでフッ素樹脂と超平滑Cu箔を強力接着 : Beyond 5G時代に必須の「基板」に
大久保 雄司, 西野 実沙, 山村 和也
2021/09/03
Atomic-scale insights into the origin of rectangular lattice in nanographene probed by scanning tunneling microscopy
Li Junhuan, Li Shaoxian, Higashi Tomoki, Kawai Kentaro, Inagaki Kouji, Yamamura Kazuya, Arima Kenta
Physical Review B Vol. 103 No. 24 p. 245433-1-245433-9 2021/06/24
Improvements in graphene growth on 4H-SiC(0001) using plasma induced surface oxidation
Minami Ouki, Ito Ryota, Hosoo Kohei, Ochi Makoto, Sano Yasuhisa, Kawai Kentaro, Yamamura Kazuya, Arima Kenta
Journal of Applied Physics Vol. 126 No. 6 p. 065301-1-065301-10 2019/08/08
Influence of air contamination during heat-assisted plasma treatment on adhesion properties of polytetrafluoroethylene (PTFE)
Ohkubo Yuji, Nakagawa Tetsuya, Endo Katsuyoshi, Yamamura Kazuya
RSC Advances Vol. 9 No. 40 p. 22900-22906 2019/07/24
世界初！接着剤レスでフッ素樹脂と金属・ガラスを接着 : シリコーン樹脂を接着剤代わりにする新接着技術
大久保 雄司, 山村 和也
2018/12/25
Adhesive-free adhesion between heat-assisted plasma-treated fluoropolymers (PTFE, PFA) and plasma-jet-treated polydimethylsiloxane (PDMS) and its application
Ohkubo Yuji, Endo Katsuyoshi, Yamamura Kazuya
Scientific Reports Vol. 8 2018/12/01
Comparison between adhesion properties of adhesive bonding and adhesive-free adhesion for heat-assisted plasma-treated polytetrafluoroethylene (PTFE)
Ohkubo Yuji, Shibahara Masafumi, Nagatani Asahiro, Honda Koji, Endo Katsuyoshi, Yamamura Kazuya
Journal of Adhesion Vol. 96 No. 8 p. 776-796 2018/09/10
Surface Modification of Fluoropolymer Using Open-Air Plasma Treatment at Atmospheric Pressure with Ar, Ar＋O2, and Ar＋H2 for Application in HighAdhesion Metal Wiring Patterns
Kodama Yoshinori, Ohkubo Yuji, Oshita Takaya, Nakano Yoshinori, Uehara Tsuyoshi, Aoyama Teppei, Endo Katsuyoshi, Yamamura Kazuya
Journal of The Surface Finishing Society of Japan Vol. 69 No. 4 p. 155-162 2018/04/01
Effect of rubber compounding agent on adhesion strength between rubber and heat-assisted plasma-treated polytetrafluoroethylene (PTFE)
Ohkubo Yuji, Shibahara Masafumi, Ishihara Kento, Nagatani Asahiro, Honda Koji, Endo Katsuyoshi, Yamamura Kazuya
Journal of Adhesion Vol. 95 No. 3 p. 242-257 2018/02/14
Drastic Improvement in Adhesion Property of Polytetrafluoroethylene (PTFE) via Heat-Assisted Plasma Treatment Using a Heater
Ohkubo Yuji, Ishihara Kento, Shibahara Masafumi, Nagatani Asahiro, Honda Koji, Endo Katsuyoshi, Yamamura Kazuya
Scientific Reports Vol. 7 2017/08/25
低コストでプラズマ処理の表面改質能力を大幅向上 : ヒーター加熱の効果でフッ素樹脂と異種材料の強力接着を実現
大久保 雄司, 山村 和也
2017/08/24
フッ素樹脂の表面改質状態を超長寿命化 : フッ素樹脂の利用用途の拡大に期待
大久保 雄司, 山村 和也
2017/01/25
Adhesive-free adhesion between polytetrafluoroethylene (PTFE) and isobutylene-isoprene rubber (IIR): Via heat-assisted plasma treatment
Ohkubo Y., Ishihara K., Sato H., Shibahara M., Nagatani A., Honda K., Endo K., Yamamura Y.
RSC Advances Vol. 7 No. 11 p. 6432-6438 2017/01/20
接着剤なしでフッ素樹脂と異種材料を接合する技術
大久保 雄司, 山村 和也
ケミカルエンジニヤリング Vol. 61 No. 12 p. 898-904 2016/12
接着剤を使わずにフッ素樹脂と金属を強力にくっつける技術 : 大阪大学×積水化学工業×日油の協力体制で実用化を加速！
大久保 雄司, 山村 和也
2016/01/19
Innovative Technique for Bonding Fluoropolymers and Different Materials Using Atmospheric Pressure Plasma
大久保 雄司, 山村 和也
エレクトロニクス実装学会誌 Vol. 19 No. 2 p. 127-131 2016
PTFEの用途を拡大する革新的な表面処理技術
大久保 雄司, 山村 和也
加工技術 Vol. 50 No. 6 p. 316-322 2015/06
フッ素樹脂と金属膜の強力接着技術
大久保 雄司, 山村 和也
コンバーテック Vol. 43 No. 2 p. 51-54 2015/02
また困難を実現？！接着剤を使用せずフッ素樹脂とゴムを強力に接合 : 安全性の高いオイルフリーな注射器のピストンなどへの応用に期待
大久保 雄司, 石原 健人, 山村 和也
2014/09/08
困難をついに実現？！フッ素樹脂と金属膜を強力に接着させる技術を開発 : 省エネかつ処理スピードの速い高周波用プリント配線板材料への応用に期待
大久保 雄司, 佐藤 悠, 山村 和也
2014/03/12
触媒フリー無電解銅めっきプロセスによるフッ素樹脂表面の高密着性銅メタライジング
是津 信行, 山村 和也
大阪大学低温センターだより Vol. 154 p. 20-26 2011/04
Fabrication of ultrathin and highly uniform silicon on insulator by numerically controlled plasma chemical vaporization machining
Sano Yasuhisa, Yamamura Kazuya, Mimura Hidekazu, Yamauchi Kazuto, Mori Yuzo
Review of Scientific Instruments Vol. 78 No. 8 2007/08/07
Efficient focusing of hard x rays to 25 nm by a total reflection mirror
Mimura Hidekazu, Yumoto Hirokatsu, Matsuyama Satoshi, Sano Yasuhisa, Yamamura Kazuya, Mori Yuzo, Yabashi Makina, Nishino Yoshinori, Tamasaku Kenji, Ishikawa Tetsuya, Yamauchi Kazuto
Applied Physics Letters Vol. 90 No. 5 2007/01/29
Development of scanning x-ray fluorescence microscope with spatial resolution of 30 nm using Kirkpatrick-Baez mirror optics
Matsuyama S., Mimura H., Yumoto H., Sano Y., Yamamura K., Yabashi M., Nishino Y., Tamasaku K., Ishikawa T., Yamauchi K.
Review of Scientific Instruments Vol. 77 No. 10 2006/10/11
Development of mirror manipulator for hard-x-ray nanofocusing at sub-50-nm level
Matsuyama S., Mimura H., Yumoto H., Hara H., Yamamura K., Sano Y., Endo K., Mori Y., Yabashi M., Nishino Y., Tamasaku K., Ishikawa T., Yamauchi K.
Review of Scientific Instruments Vol. 77 No. 9 2006/09/25
Diffraction-limited two-dimensional hard-x-ray focusing at the 100 nm level using a Kirkpatrick-Baez mirror arrangement
Matsuyama S., Mimura H., Yumoto H., Yamamura K., Sano Y., Endo K., Mori Y., Nishino Y., Tamasaku K., Ishikawa T., Yabashi M., Yamauchi K.
Review of Scientific Instruments Vol. 76 No. 8 2005/08/04
Fabrication of elliptically figured mirror for focusing hard x rays to size less than 50 nm
Yumoto Hirokatsu, Mimura Hidekazu, Matsuyama Satoshi, Hara Hideyuki, Yamamura Kazuya, Sano Yasuhisa, Ueno Kazumasa, Endo Katsuyoshi, Mori Yuzo, Yabashi Makina, Nishino Yoshinori, Tamasaku Kenji, Ishikawa Tetsuya, Yamauchi Kazuto
Review of Scientific Instruments Vol. 76 No. 6 2005/06/07
Relative angle determinable stitching interferometry for hard x-ray reflective optics
Mimura Hidekazu, Yumoto Hirokatsu, Matsuyama Satoshi, Yamamura Kazuya, Sano Yasuhisa, Ueno Kazumasa, Endo Katsuyoshi, Mori Yuzo, Yabashi Makina, Tamasaku Kenji, Nishino Yoshinori, Ishikawa Tetsuya, Yamauchi Kazuto
Review of Scientific Instruments Vol. 76 No. 4 2005/03/16
Wave-optical and ray-tracing analysis to establish a compact two-dimensional focusing unit using K-B mirror arrangement
Matsuyama S., Mimura H., Yamamura K., Yumoto H., Sano Y., Endo K., Mori Y., Yabashi M., Tamasaku K., Nishino Y., Ishikawa T., Yamauchi K.
Proceedings of SPIE - The International Society for Optical Engineering Vol. 5533 p. 181-191 2004/10/18
数値制御プラズマCVMによる次世代超薄膜SOIウエハの製作
佐野 泰久, 山村 和也, 遠藤 勝義, 森 勇蔵
大阪大学低温センターだより Vol. 125 p. 11-15 2004/01
超高精度硬X線集光ミラーの製作とナノスペクトロスコピーへの応用
山村 和也, 山内 和人, 佐野 泰久, 三村 秀和, 遠藤 勝義, 森 勇蔵
大阪大学低温センターだより Vol. 125 p. 4-10 2004/01
Fabrication of elliptical mirror at nanometer-level accuracy for hard x-ray focusing by numerically controlled plasma chemical vaporization machining
Yamamura Kazuya, Yamauchi Kazuto, Mimura Hidekazu, Sano Yasuhisa, Saito Akira, Endo Katsuyoshi, Souvorov Alexei, Yabashi Makina, Tamasaku Kenji, Ishikawa Tetsuya, Mori Yuzo
Review of Scientific Instruments Vol. 74 No. 10 p. 4549-4553 2003/10
Microstitching interferometry for x-ray reflective optics
Yamauchi Kazuto, Yamamura Kazuya, Mimura Hidekazu, Sano Yasuhisa, Saito Akira, Ueno Kazumasa, Endo Katsuyoshi, Souvorov Alexei, Yabashi Makina, Tamasaku Kenji, Ishikawa Tetsuya, Mori Yuzo
Review of Scientific Instruments Vol. 74 No. 5 p. 2894-2898 2003/05
Ultraprecision Machining based on Physics and Chemistry
Mori Yuzo, Hirose Kikuji, Yamauchi Kazuto, Goto Hidekazu, Yamamura Kazuya, Sano Yasuhisa
Sensors and materials Vol. 15 No. 1 p. 1-19 2003
Nearly diffraction-limited line focusing of a hard-X-ray beam with an elliptically figured mirror
Yamauchi Kazuto, Yamamura Kazuya, Mimura Hidekazu, Sano Yasuhisa, Saito Akira, Souvorov Alexei, Yabashi Makina, Tamasaku Kenji, Ishikawa Tetsuya, Mori Yuzo
Journal of Synchrotron Radiation Vol. 9 No. 5 p. 313-316 2002/09
Deterministic retrieval of surface waviness by means of topography with coherent X-rays
Souvorov A., Yabashi M., Tamasaku K., Ishikawa T., Mori Y., Yamauchi K., Yamamura K., Saito A.
Journal of Synchrotron Radiation Vol. 9 No. 4 p. 223-228 2002/07
プラズマCVM(Chemical Vaporization Machining)による超精密加工に関する研究
Yamamura Kazuya
