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Yamamura Kazuya

山村 和也

Professor

keyword Neutron optics,X-ray optics,ultraprecision optical components,surface midification,unconventional machining,ultraprecision machining

Education

  • - 2001/01, Osaka University, Graduate School, Division of Engineering
  • - 1991/03, Osaka University, Graduate School, Division of Engineering
  • - 1989/03, Osaka University, Faculty of Engineering, precision engineering

Research History

  • 2017/08 - Present, 大阪大学 教授
  • 2009/04 - Present, 理化学研究所 客員研究員
  • 2007/04 - 2017/08, Associate Professor
  • 2009/04 - 2010/03, Osaka Electro-Communication University
  • 2001/08 - 2007/03, Associate Professor
  • 1991/04 - 2001/07, 大阪大学 助手

Research Areas

  • Manufacturing technology (mechanical, electrical/electronic, chemical engineering), Manufacturing and production engineering
  • Nanotechnology/Materials, Thin-film surfaces and interfaces

Professional Memberships

  • 表面技術協会
  • アメリカ精密工学会(ASPE)
  • (社)精密工学会 超精密加工専門委員会
  • The International Academy for Production Engineering
  • Japan Society for Abrasive Technology
  • 日本中性子科学会
  • (社)精密工学会 関西支部
  • (社)精密工学会
  • 応用物理学会
  • 精密工学会
  • The International Academy for Production Engineering
  • Japan Society for Abrasive Technology
  • The Japanese Society for Neutron Science
  • The Japan Society of Applied Physics
  • The Japan Society for Precision Engineering

Papers

  • Selective Etching of Semiconductor Surfaces by Catalytic Activity of Nanocarbon, Ryo MIKURINO,Ayumi OGASAWARA,Kentaro KAWAI,Kazuya YAMAMURA,Kenta ARIMA, Vacuum and Surface Science, Surface Science Society Japan, Vol. 64, No. 8, p. 352-357, 2021/08/10
  • Atomic-scale insights into the origin of rectangular lattice in nanographene probed by scanning tunneling microscopy, Junhuan Li,Shaoxian Li,Tomoki Higashi,Kentaro Kawai,Kouji Inagaki,Kazuya Yamamura,Kenta Arima, Physical Review B, American Physical Society (APS), Vol. 103, No. 24, 2021/06/24
  • Atomic-scale and damage-free polishing of single crystal diamond enhanced by atmospheric pressure inductively coupled plasma, Hu Luo,Khan Muhammad Ajmal,Wang Liu,Kazuya Yamamura,Hui Deng, Carbon, Elsevier BV, Vol. 182, p. 175-184, 2021/06/03
  • Dominant factors and their action mechanisms on material removal rate in electrochemical mechanical polishing of 4H-SiC (0001) surface, Xiaozhe Yang,Xu Yang,Kentaro Kawai,Kenta Arima,Kazuya Yamamura, Applied Surface Science, Elsevier BV, Vol. 562, p. 150130-150130, 2021/05/17
  • Novel highly-efficient and dress-free polishing technique with plasma-assisted surface modification and dressing, Rongyan Sun,Atsunori Nozoe,Junji Nagahashi,Kenta Arima,Kentaro Kawai,Kazuya Yamamura, Precision Engineering, Elsevier BV, Vol. 72, p. 224-236, 2021/05/09
  • Polishing and planarization of single crystal diamonds: state-of-the-art and perspectives, Hu Luo,Khan Muhammad Ajmal,Wang Liu,Kazuya Yamamura,Hui Deng, International Journal of Extreme Manufacturing, IOP Publishing, Vol. 3, No. 2, p. 022003-022003, 2021/03/10
  • Damage-free highly efficient plasma-assisted polishing of a 20-mm square large mosaic single crystal diamond substrate, N. Liu,K. Sugawara,N. Yoshitaka,H. Yamada,D. Takeuchi,Y. Akabane,K. Fujino,K. Kawai,K. Arima,Kazuya Yamamura, Scientific Reports, Springer Science and Business Media LLC, Vol. 10, No. 1, 2020/11/10
  • 熱アシストプラズマ処理の接着性向上効果に対する電極-試料(PTFE)間距離の影響, 中川哲哉,西野実沙,遠藤勝義,山村和也,大久保雄司, 日本接着学会誌, Vol. 56, p. 389-396, 2020/10/01
  • Open-air-type Ar + H2O plasma treatment of polytetrafluoroethylene for improving Ag/PTFE adhesion strength: application to highly adhesive Ag direct wiring patterns, Y. Ohkubo, Y. Kodama, M. Nishino, T. Oshita, T. Uehara, K. Endo, K. Yamamura, Japanese Journal of Applied Physics, IOP Publishing, Vol. 59, No. 7, p. 077004-077004, 2020/06/30
  • High-quality plasma-assisted polishing of aluminum nitride ceramic, R. Sun,X. Yang,K. Arima,K. Kawai,K. Yamamura, CIRP Annals, Vol. 69, p. 301-304, 2020/05/20
  • Catalytic Properties of Chemically Modified Graphene Sheets to Enhance Etching of Ge Surface in Water, Ryo Mikurino,Ayumi Ogasawara,Tomoki Hirano,Yuki Nakata,Hiroto Yamashita,Shaoxian Li,Kentaro Kawai,Kazuya Yamamura,Kenta Arima, The Journal of Physical Chemistry C, ACS Publications, Vol. 124, No. 11, p. 6121-6129, 2020/03
  • Strong Biomimetic Immobilization of Pt-Particle Catalyst on ABS Substrate Using Polydopamine and Its Application for Contact-Lens Cleaning with H2O2., Yuji Ohkubo,Tomonori Aoki,Daisuke Kaibara,Satoshi Seino,Osamu Mori,Rie Sasaki,Katsuyoshi Endo,Kazuya Yamamura, Nanomaterials (Basel, Switzerland), Vol. 10, No. 1, 2020/01
  • Highly efficient planarization of sliced 4H-SiC (0001) wafer by slurryless electrochemical mechanical polishing, Yang Xu,Yang Xiaozhe,Kawai Kentaro,Arima Kenta,Yamamura Kazuya, INTERNATIONAL JOURNAL OF MACHINE TOOLS & MANUFACTURE, Vol. 144, 2019/09
  • Improvements in graphene growth on 4H-SiC(0001) using plasma induced surface oxidation, Ouki Minami,Ryota Ito,Kohei Hosoo,Makoto Ochi,Yasuhisa Sano,Kentaro Kawai,Kazuya Yamamura,Kenta Arima, Journal of Applied Physics, AIP Publishing, Vol. 126, No. 6, p. 065301 1-065301 10, 2019/08
  • Influence of air contamination during heat-assisted plasma treatment on adhesion property of polytetrafluoroethylene (PTFE), Y. Ohkubo,T. Nakagawa,K. Endo,K. Yamamura, RSC Advances, Vol. 9, p. 22900-22906, 2019/07
  • Improved Catalytic Durability of Pt-Particle/ABS for H₂O₂ Decomposition in Contact Lens Cleaning., Yuji Ohkubo,Tomonori Aoki,Satoshi Seino,Osamu Mori,Issaku Ito,Katsuyoshi Endo,Kazuya Yamamura, Nanomaterials (Basel, Switzerland), Vol. 9, No. 3, 2019/03
  • Absolute distance measurement of optical path length of non-contact three-dimensional nanoprofiler based on normal vector tracing method by tandem white-light interferometer, Jungmin Kang,Takao Kitayama,Ryo Kizaki,Yui Toyoshi,Kota Hashimoto,Agustinus Winarno,Kiyoshi Takamasu,Kazuya Yamamura,Katsuyoshi Endo, Proceedings of SPIE - The International Society for Optical Engineering, Vol. 11056, 2019
  • Fundamental Properties for Enhanced Etching of Ge Surfaces in Water Assisted by Single Sheets of Reduced Graphene Oxide, T. Hirano,Y. Nakata,H. Yamashita,S. Li,K. Kawai,K. Yamamura,K. Arima, Abstract Book & Schedule of PCSI-46, American Vacuum Society, p. 88-88, 2019/01
  • Atomic-scale Observations of Reduced Graphene Oxide Nanosheets Dispersed on HOPG Substrates, Shaoxian Li,Tomoki Hirano,Kentaro Kawai,Kazuya Yamamura,Kenta Arima, Abstract Book & Schedule of PCSI-46, American Vacuum Society, p. 69-69, 2019/01
  • Surface Modification and Microstructuring of 4H-SiC(0001) by Anodic Oxidation with Sodium Chloride Aqueous Solution, X. Yang,R. Sun,K. Kawai,K. Arima,K. Yamamura, Applied Materials & Interfaces 11 (2019) 2535-2542., Vol. 11, p. 2535-2542, 2019/01
  • Ultrasonic-assisted anodic oxidation of 4H-SiC (0001) surface, X. Yang,X. Yang,K. Kawai,K. Arima,K. Yamamura, Electrochemistry Communications 100 (2019) 1-5., Vol. 100, p. 1-5, 2019/01
  • Adhesive-free adhesion between heat-assisted plasma-treated fluoropolymers (PTFE, PFA) and plasma-jet-treated polydimethylsiloxane (PDMS) and its application, Yuji Ohkubo,Katsuyoshi Endo,Kazuya Yamamura, Scientific Reports, Springer Science and Business Media LLC, Vol. 8, No. 1, 2018/12
  • プラズマナノ製造プロセスによるセラミックスのダメージフリー加工, 山村和也, トライボロジスト Vol. 63 No. 12 (2018. 12. 15) 806-811., Vol. 63, No. 12, p. 806-811, 2018/12
  • Effect of Temperature Distribution in Microtube and Microfluidic Channel for DNA Origami Assembly, Keita Hara,Tatsuya Inagaki,Naoki Yamashita,Kenta Arima,Kazuya Yamamura,Osamu Tabata,Kentaro Kawai, 2018/11
  • プラズマナノ製造プロセス, 山村和也, メカニカルサーフェス・テック, No. 046, p. 35-37, 2018/10
  • 反応性プラズマを援用したセラミックス材料のダメージフリー形状創成・仕上げ加工技術の開発, 山村和也, 粉体および粉末冶金, Vol. 65, No. 10, p. 654-658, 2018/10
  • Comparison between adhesion properties of adhesive bonding and adhesive-free adhesion for heat-assisted plasma-treated polytetrafluoroethylene (PTFE), Y. Ohkubo,M. Shibahara,A. Nagatani,K. Honda,K. Endo,K. Yamamura, J. Adhesion, 2018/09
  • プラズマCVMによる高精度ミラーの作製, 山村和也, 精密工学会誌 Vol. 84 No. 6, Vol. 84, No. 6, p. 507-510, 2018/06
  • プラズマ援用研磨によるワイドギャップ半導体材料の超平滑仕上げ, 山村和也, 自動車技術 Vol. 72 No. 6, Vol. 72, No. 6, p. 42-47, 2018/06
  • Application of plasma chemical vaporization machining for figuring of reaction-sintered silicon carbide, R. Sun,Y. Ohkubo,K. Endo,K. Yamamura, Proceedings of 18th International Conference of the European Society for Precision Engineering and Nanotechnology, p. 391-392, 2018/06
  • Damage-free highly efficient polishing of single-crystal diamond wafer by plasma-assisted polishing, K. Yamamura,K. Emori,R. Sun,Y. Ohkubo,K. Endo,H. Yamada,A. Chayahara,Y. Mokuno, CIRP Annals, Elsevier USA, Vol. 67, p. 353-356, 2018/05
  • Nanopore Fabrication and DNA sensing on Two-Dimensional Materials using Helium Ion Microscopy, Kentaro Kawai,Takumi Hayashi,Kenta Arima,Kazuya Yamamura,Osamu Tabata, 2018/04
  • Surface modification of fluoropolymer using open-air plasma treatment at atmospheric pressure with Ar, Ar + O2, and Ar + H2 for application in high-adhesion metal wiring patterns, Y. Kodama,Y. Ohkubo,T. Oshita,Y. Nakano,T. Uehara,T. Aoyama,K. Endo,K. Yamamura, 表面技術, Vol. 69, No. 4, p. 152-162, 2018/04
  • Investigation of anodic oxidation mechanism of 4H-SiC (0001) for electrochemical mechanical polishing, Xu Yang,Rongyan Sun,Yuji Ohkubo,Kentaro Kawai,Kenta Arima,Katsuyoshi Endo,Kazuya Yamamura, Electrochimica Acta, Elsevier Ltd, Vol. 271, p. 666-676, 2018/03
  • Effect of rubber compounding agent on adhesion strength between the rubber and heat-assisted plasma-treated polytetrafluoroethylene, Y. Ohkubo,M. Shibahara,K. Ishihara,A. Nagatani,K. Honda,K. Endo,K. Yamamura, J. Adhesion, Vol. 95, No. 3, p. 242-257, 2018/02
  • Adhesion property of heat-assisted plasma-treated polytetrafluoroethylene (PTFE) – Realization in extremely high adhesion of PTFE and other types of material –, Y. Ohkubo,M. Shibahara,A. Nagatani,K. Honda,K. Endo,K. Yamamura, 2018/02
  • Optimization of Gas Composition Used in Plasma Chemical Vaporization Machining for Figuring of Reaction-Sintered Silicon Carbide with Low Surface Roughness, Rongyan Sun,Xu Yang,Yuji Ohkubo,Katsuyoshi Endo,Kazuya Yamamura, Scientific Reports, Nature Publishing Group, Vol. 8, No. 1, 2018/02
  • High accuracy cylindrical mirror measurement by three-dimensional nano-profiler based on the normal vector tracing method, Jungmin Kang,Hiroki Shiraji,Ryo Kizaki,Yui Toyoshi,Takao Kitayama,Kazuya Yamamura,Takashi Miyawaki,Katsuyoshi Endo, Proceedings - 33rd ASPE Annual Meeting, p. 142-145, 2018
  • プラズマCVMによる機能材料の高精度無歪加工, 山村和也, NEW GLASS, Vol.32, No. 3, 16-20., Vol. 32, No. 3, p. 16-20, 2017/11
  • Atomic-scale finishing of carbon face of single crystal SiC by combination of thermal oxidation pretreatment and slurry polishing, Hui Deng,Nian Liu,Katsuyoshi Endo,Kazuya Yamamura, Applied Surface Science, Elsevier B.V., Vol. 434, p. 40-48, 2017/10
  • Polishing of Tungsten Carbide by Combination of Anodizing and Silica Slurry Polishing, Hui Deng,Xinquan Zhang,Kui Liu,Kazuya Yamamura,Hirotaka Sato, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, ELECTROCHEMICAL SOC INC, Vol. 164, No. 12, p. E352-E359, 2017/09
  • プラズマ援用研磨によるSiCのダメージフリー仕上げ, 山村和也, 砥粒加工学会誌 Vol.61, No. 8, 430-433., Vol. 61, No. 8, p. 430-433, 2017/08
  • Drastic Improvement in Adhesion Property of Polytetrafluoroethylene (PTFE) via Heat-Assisted Plasma Treatment Using a Heater, Yuji Ohkubo,Kento Ishihara,Masafumi Shibahara,Asahiro Nagatani,Koji Honda,Katsuyoshi Endo,Kazuya Yamamura, SCIENTIFIC REPORTS, NATURE PUBLISHING GROUP, Vol. 7, 2017/08
  • Radiolytic Synthesis of Pt-Particle/ABS Catalysts for H2O2 Decomposition in Contact Lens Cleaning, Yuji Ohkubo,Tomonori Aoki,Satoshi Seino,Osamu Mori,Issaku Ito,Katsuyoshi Endo,Kazuya Yamamura, NANOMATERIALS, MDPI AG, Vol. 7, No. 9, 2017/08
  • プラズマ援用研磨によるSiCのダメージフリー仕上げ, 山村和也, 砥粒加工学会誌Vol.61 No. 8 430-433., Vol. 61, No. 8, p. 430-433, 2017/08
  • High-accuracy three-dimensional aspheric mirror measurement with nanoprofiler based on normal vector tracing method, Ryota Kudo,Takao Kitayama,Yusuke Tokuta,Hiroki Shiraji,Motohiro Nakano,Kazuya Yamamura,Katsuyoshi Endo, OPTICS AND LASERS IN ENGINEERING, ELSEVIER SCI LTD, Vol. 98, p. 159-162, 2017/07
  • Improving the grindability of titanium alloy Ti–6Al–4V with the assistance of ultrasonic vibration and plasma electrolytic oxidation, S. Li,Y. Wu,K. Yamamura,M. Nomura,T. Fujii, CIRP Annals - Manufacturing Technology, Elsevier USA, Vol. 64, No. 1, p. 345-348, 2017/05
  • 電子線照射還元法によりABS樹脂上へ担持したPtナノ粒子触媒の耐久性向上, 青木智紀,大久保雄司,清野智史,小玉欣典,中川哲哉,原田朋実,遠藤勝義,森理,伊藤一作,山村和也, 2017/03
  • 非接触ナノ形状測定装置による非球面ミラーの形状測定, 木崎 嶺,白地 央樹,北山 貴雄,山村 和也,遠藤 勝義, 精密工学会学術講演会講演論文集, 公益社団法人 精密工学会, Vol. 2017, p. 95-96, 2017
  • Adhesive-free adhesion between polytetrafluoroethylene (PTFE) and isobutylene-isoprene rubber (IIR) via heat-assisted plasma treatment, Y. Ohkubo,K. Ishihara,H. Sato,M. Shibahara,A. Nagatani,K. Honda,K. Endo,K. Yamamura, RSC ADVANCES, ROYAL SOC CHEMISTRY, Vol. 7, No. 11, p. 6432-6438, 2017/01
  • 電子線照射還元法によるH2O2分解用Ptナノ粒子触媒の合成 -微粒子化剤添加の効果-, 青木智紀,大久保雄司,清野智史,小玉欣典,中川哲哉,原田朋実,遠藤勝義,森理,伊藤一作,山村和也, 2016/11
  • Damage-free finishing of CVD-SiC by a combination of dry plasma etching and plasma-assisted polishing, Hui Deng,Katsuyoshi Endo,Kazuya Yamamura, INTERNATIONAL JOURNAL OF MACHINE TOOLS & MANUFACTURE, ELSEVIER SCI LTD, Vol. 115, p. 38-46, 2016/11
  • Preliminary study on atmospheric-pressure plasma-based chemical dry figuring and finishing of reaction-sintered silicon carbide, Xinmin Shen,Hui Deng,Xiaonan Zhang,Kang Peng,Kazuya Yamamura, OPTICAL ENGINEERING, SPIE-SOC PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, Vol. 55, No. 10, 2016/10
  • Improvement in adhesion between polytetrafluoroethylene (PTFE) and electroless plated copper film using heat-assisted plasma treatment, Yuji OHKUBO,Kento ISHIHARA,Haruka SATO,Katsuyoshi ENDO,Kazuya YAMAMURA, Journal of The Surface Finishing Society of Japan, Vol. 67, No. 10, p. 551-556, 2016/10
  • 電子線照射還元法によるABS樹脂基材上へのH2O2分解用触媒Ptナノ粒子の作製, 青木智紀,大久保雄司,小玉欣典,中川哲哉,原田朋実,遠藤勝義,清野智史,森理,伊藤一作,山村和也, 2016/09
  • Surface modification of polytetrafluoroethylene (PTFE) by heat-assisted atmospheric pressure plasma treatment for improving adhesion of PTFE to isobutylene-isoprene rubber (IIR), Y. Ohkubo,K. Ishihara,M. Shibahara,A. Nagatani,K. Honda,T. Aoki,Y. Kodama,K. Enod,K. Yamamura, 2016/09
  • Measurement of aspheric mirror by nanoprofiler using normal vector tracing, Takao Kitayama,Hiroki Shiraji,Kazuya Yamamura,Katsuyoshi Endo, Advances in Metrology for X-Ray and EUV Optics VI, SPIE-INT SOC OPTICAL ENGINEERING, Vol. 9962, 2016/08
  • 電子線照射還元法によるPtナノ粒子触媒のABS樹脂上への固定化 ―エッチング処理と表面電荷調整処理による表面改質効果の調査―, 青木智紀,大久保雄司,小玉欣典,中川哲哉,原田朋実,遠藤勝義,山村和也,清野智史,森理,伊藤一作, 2016/07
  • Highly-efficient slurryless finishing of GaN by plasma-assisted polishing using a resin bonded grinding stone, C. Kageyama,H. Deng,K. Endo,K. Yamamura, Proceedings of 16th International Conference of the European Society for Precision Engineering and Nanotechnology, 2016/05
  • Electrochemical mechanical polishing of difficult-to-machine mold materials, K. Yamamura,Y. Imanishi,K. Endo, Proceedings of 16th International Conference of the European Society for Precision Engineering and Nanotechnology, 2016/05
  • Planarization of CVD grown single crystal diamond wafer by numerically controlled plasma chemical vaporization machining, H. Dojo,K. Endo,H. Yamada,A. Chayahara,Y. Mokuno,K. Yamamura, Proceedings of 16th International Conference of the European Society for Precision Engineering and Nanotechnology, 2016/05
  • 3D surface measurement of spherical mirror by nanoprofiler using normal vector tracing method, H. Shiraji,Y. Tokuta,T. Kitayama,M. Nakano,R. Kudo,K. Yamamura,K. Endo, Proceedings of International Conference on X-ray Optics, Detectors, Sources, and their Applications 2016, p. 37-38, 2016/05
  • Comparative analysis on surface property in anodic oxidation polishing of reaction-sintered silicon carbide and single-crystal 4H silicon carbide, Xinmin Shen,Qunzhang Tu,Hui Deng,Guoliang Jiang,Xiaohui He,Bin Liu,Kazuya Yamamura, Applied Physics A: Materials Science and Processing, Springer Verlag, Vol. 122, No. 4, 2016/04/01
  • High-spatial Resolution Figuring by Pulse Width Modulation Controlled Plasma Chemical Vaporization Machining, Kazuya Yamamura,Yoshiki Takeda,Shogo Sakaiya,Daisuke Funato,Katsuyoshi Endo, 18TH CIRP CONFERENCE ON ELECTRO PHYSICAL AND CHEMICAL MACHINING (ISEM XVIII), ELSEVIER SCIENCE BV, Vol. 42, p. 508-511, 2016/03
  • Oxidation Characteristic and Machining Performance of Reaction-Sintered Silicon Carbide Ceramic in Anodically Oxidation-Assisted Polishing, Guoliang Jiang,Xinmin Shen,Jian Tang,Xiaonan Zhang,Xiangpo Zhang,Kazuya Yamamura, INTERNATIONAL JOURNAL OF ELECTROCHEMICAL SCIENCE, ESG, Vol. 11, No. 2, p. 1512-1529, 2016/02
  • Research on optimal process parameters in thermally oxidation-assisted polishing of reaction-sintered silicon carbide, Xinmin Shen,Kazuya Yamamura,Xiaonan Zhang,Xiangpo Zhang,Dong Wang,Kang Peng, Proceedings of SPIE - The International Society for Optical Engineering, SPIE, Vol. 9683, 2016
  • Innovative technique for bonding fluoropolymers and different materials using atmospheric pressure plasma, Yuji Ohkubo,Kazuya Yamamura, Journal of Japan Institute of Electronics Packaging, Japan Institute of Electronics Packaging, Vol. 19, No. 2, p. 127-131, 2016
  • Study on removal mechanism of sapphire in plasma assisted polishing, C. Kageyama,K. Monna,H. Deng,K. Endo,K. Yamamura, Advanced Materials Research 1136 (2016) 317-320., Vol. 1136, p. 317-320, 2016/01
  • 電子線照射還元法によるABS樹脂基板上へのPtナノ粒子担持, 青木智紀,大久保雄司,清野智史,石原健人,小玉欣典,遠藤勝義,山村和也, 2015/11
  • Efficient processing of reaction-sintered silicon carbide by anodically oxidation-assisted polishing, Qunzhang Tu,Xinmin Shen,Jianzhao Zhou,Xiaohui He,Kazuya Yamamura, OPTICAL ENGINEERING, SPIE-SOC PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, Vol. 54, No. 10, 2015/10
  • Neutron focusing by a Kirkpatrick-Baez type super-mirror, D. Yamazaki,M. Nagano,R. Maruyama,H. Hayashoda,K. Soyama,K. Yamamura, JPS Conf. Proc. 8 (2015) 051009-1_6., 2015/09
  • Atomic-scale and pit-free flattening of GaN by combination of plasma pretreatment and time-controlled chemical mechanical polishing, Hui Deng,Katsuyoshi Endo,Kazuya Yamamura, APPLIED PHYSICS LETTERS, AMER INST PHYSICS, Vol. 107, No. 5, p. 051602-1-051602-4, 2015/08
  • Simulation-based systematic error compensation for nanoprofiler using normal vector tracing method, Ryota Kudo,Kenya Okita,Kohei Okuda,Yusuke Tokuta,Motohiro Nakano,Kazuya Yamamura,Katsuyoshi Endo, MEASUREMENT, ELSEVIER SCI LTD, Vol. 73, p. 473-479, 2015/06
  • PTFEの用途を拡大する革新的な表面処理技術, 大久保雄司,山村和也, 加工技術, 株式会社 繊維社, Vol. 50, No. 6, p. 316-322, 2015/06
  • Polishing characteristics of CVD-SiC in plasma-assisted polishing, H. Deng,K. Endo,K. Yamamura, Proceedings of 15th International Conference of the European Society for Precision Engineering and Nanotechnology, 2015/06
  • Mechanism analysis on finishing of reaction-sintered silicon carbide by combination of water vapor plasma oxidation and ceria slurry polishing, Xinmin Shen,Qunzhang Tu,Hui Deng,Guoliang Jiang,Kazuya Yamamura, OPTICAL ENGINEERING, SPIE-SOC PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, Vol. 54, No. 5, 2015/05
  • Competition between surface modification and abrasive polishing: a method of controlling the surface atomic structure of 4H-SiC (0001), Hui Deng,Katsuyoshi Endo,Kazuya Yamamura, SCIENTIFIC REPORTS, NATURE PUBLISHING GROUP, Vol. 5, 2015/03
  • Plasma-based nanomanufacturing under atmospheric pressure, Kazuya Yamamura,Yasuhisa Sano, HandBook of Manufacturing Engineering and Technology, Springer-Verlag London Ltd, p. 1529-1547, 2015/01/01
  • The measurement of an aspherical mirror by three-dimensional Nanoprofiler, Yusuke Tokuta,Kenya Okita,Kohei Okuda,Takao Kitayama,Motohiro Nakano,Shun Nakatani,Ryota Kudo,Kazuya Yamamura,Katsuyoshi Endo, OPTICAL SYSTEMS DESIGN 2015: OPTICAL FABRICATION, TESTING, AND METROLOGY V, SPIE-INT SOC OPTICAL ENGINEERING, Vol. 9628, 2015
  • Systematic error analysis for 3D nanoprofiler tracing normal vector, Ryota Kudo,Yusuke Tokuta,Motohiro Nakano,Kazuya Yamamura,Katsuyoshi Endo, OPTIFAB 2015, SPIE-INT SOC OPTICAL ENGINEERING, Vol. 9633, 2015
  • Plasma-assisted polishing of gallium nitride to obtain a pit-free and atomically flat surface, H. Deng,K. Endo,K. Yamamura, CIRP ANNALS-MANUFACTURING TECHNOLOGY, ELSEVIER SCIENCE BV, Vol. 64, No. 1, p. 531-534, 2015
  • Electro-chemical mechanical polishing of single-crystal SiC using CeO2 slurry, Hui Deng,Kenji Hosoya,Yusuke Imanishi,Katsuyoshi Endo,Kazuya Yamamura, ELECTROCHEMISTRY COMMUNICATIONS, ELSEVIER SCIENCE INC, Vol. 52, p. 5-8, 2015/01
  • Flattening of 4H-SiC by combination of oxidation and abrasive polishing, H. Deng,K. Endo,K. Yamamura, Proceedings of 15th International Conference of the European Society for Precision Engineering and Nanotechnology, 2014/10
  • Ultra-precision deterministic figuring by pulse width modulation controlled plasma jet figuring, K. Yamamura,K. Hosoya,Y. Imanishi,H. Deng,K. Endo, 2014/10
  • Formation of highly adhesive polytetrafluoroethylene/isobtylene-isoprene rubber interface by atmospheric-pressure plasma irradiation, K. Ishihara,H. Sato,Y. Ohkubo,M. Shibahara,A. Nagatani,K. Honda,K. Endo,K. Yamamura, 5th World Congress on Adhesion and Related Phenomena (WCARP-V) (2014) 122., 2014/09
  • Highly efficient planarization of CVD-grown single-crystal diamond substrate by atmospheric-pressure microwave plasma jet figuring, K. Yamamura,S. Makiyama,T. Tabata,H. Yamada,A. Cyayahara,Y. Mokuno,S. Shikata,K. Endo, 2014/09
  • Surface modification of PTFE for a high adhesive Ag layer by open-air type plasma treatment with graft copolymerization, H. Sato,K. Ishihara,Y. Ohkubo,K. Endo,K. Yamamura, 2014/09
  • Preliminary study on highly efficient polishing of 4H-SiC by utilization of anodic oxidation, Kazuya Yamamura,Kenji Hosoya,Yusuke Imanishi,Hui Deng,Katsuyoshi Endo, Advanced Materials Research, Trans Tech Publications Ltd, Vol. 1017, p. 509-514, 2014/08
  • Improvement of spatial resolution in figuring using Open-Air Type Plasma Chemical Vaporization Machining with Pulse Width Modulation Control, Y. Takeda,Y. Hata,J. Ito,K. Endo,K. Yamamura, 2014/07
  • Effect of plasma irradiation in removal rate of single crystal diamond in plasma assisted polishing with quartz glass tool, T. Tabata,K. Monna,Y. Yamamoto,S. Makiyama,H. Deng,K. Endo,H. Yamada,A. Chayahara,Y. Mokuno,S. Shikata,K. Yamamura, 2014/07
  • Dependency of OH emission intensity in material removal rate of sapphire substrates in plasma assisted polishing, K. Monna,H. Deng,T. Tabata,K. Endo,K. Yamamura, 2014/07
  • Two-stage precision figuring process applying numerically controlled electrochemical machining with suction type electrode, N. Mitsushima,M. Ouchi,K. Endo,K. Yamamura, 2014/07
  • Investigation of the anodic oxide layer/SiC interface morphology during anodic oxidation assisted polishing, K. Hosoya,Y. Imanishi,K. Endo,K. Yamamura, 2014/07
  • Surface modification of GaN by irradiation of atmospheric pressure plasma for damage-free polishing, H. Deng,K. Endo,K Yamamura, 2014/07
  • Ultra-precision Fabrication Process for Neutron Focusing Device, K. Yamamura,N. Mitsushima,Y. Goto,K. Endo,D. Yamazaki,R. Maruyama,H. Hayashida,K. Soyama, 2014/07
  • Optimization of the plasma oxidation and abrasive polishing processes in plasma-assisted polishing for highly effective planarization of 4H-SiC, H. Deng,K. Monna,T. Tabata,K. Endo,K. Yamamura, CIRP ANNALS-MANUFACTURING TECHNOLOGY, ELSEVIER SCIENCE BV, Vol. 63, No. 1, p. 529-532, 2014/06
  • Systematic Error Analysis of Nanoprofiler Using Normal Vector Tracing Method Based on Numerical Simulation, R. Kudo,K. Okuda,K. Okita,Y. Tokuta,M. Nakano,K. Yamamura,K. Endo, 2014/06
  • Measurement of high accurate mirror using nanoprofiler with self-calibratable rotary encoder, K. Okita,T. Kojima,K. Usuki,K. Okuda,Y. Tokuta,M. Nakano,R. Kudo,K. Yamamura,T. Watanabe,K. Endo, 2014/06
  • Flatness correction of quartz glass substrate by plasma jet figuring with pulse width modulation control, K. Yamamura,Y. Takeda,Y. Hata,J. Ito,K. Endo, 2014/05
  • Polishing characteristics of single crystal SiC assisted by plasma oxidation using different kinds of abrasives, H. Deng,K. Endo,K. Yamamura, 2014/05
  • プラズマプロセスを援用した高密着性ポリテトラフルオロエチレン/エポキシ樹脂/SUS304界面形成技術, 是津信行,山村和也,井筒祐志,我田元,大石修治,手島勝弥, 表面技術, Vol. 65, No. 5, p. 227-233, 2014/05
  • Characterization of 4H-SiC (0001) surface processed by plasma-assisted polishing, Hui Deng,Masaki Ueda,Kazuya Yamamura, INTERNATIONAL JOURNAL OF ADVANCED MANUFACTURING TECHNOLOGY, SPRINGER LONDON LTD, Vol. 72, No. 1-4, p. 1-7, 2014/05
  • Damage-free and atomically-flat finishing of single crystal SiC by combination of oxidation and soft abrasive polishing, Hui Deng,Katsuyoshi Endo,Kazuya Yamamura, 2ND CIRP CONFERENCE ON SURFACE INTEGRITY (CSI), ELSEVIER SCIENCE BV, Vol. 13, p. 203-207, 2014/05
  • Three-dimensional surface figure measurement of high-accuracy spherical mirror with nanoprofiler using normal vector tracing method, R. Kudo,K. Okuda,K. Usuki,M. Nakano,K. Yamamura,K. Endo, REVIEW OF SCIENTIFIC INSTRUMENTS, AMER INST PHYSICS, Vol. 85, No. 4, 2014/04
  • Comparison of thermal oxidation and plasma oxidation of 4H-SiC (0001) for surface flattening, Hui Deng,Katsuyoshi Endo,Kazuya Yamamura, APPLIED PHYSICS LETTERS, AMER INST PHYSICS, Vol. 104, No. 10, 2014/03
  • Evaluation of the MRR control performance of PCVM with the application of the PWM control, Y. Takeda,Y. Hata,J. Ito,K. Endo,K. Yamamura, 2014/02
  • Optimization of water content in process gas for high MRR of single crystal diamond in plasma assisted polishing, T. Tabata,K. Monna,Y. Yamamoto,S. Makiyama,H. Deng, 2014/02
  • Development of two-stage figuring process applying numerically controlled electrochemical machining for fabricating neutron focusing mirror substrate, N. Mitsushima,M. Ouchi,K. Endo,K. Yamamura, 2014/02
  • Effects of water concentration and gas species on OH radical emission intensity in plasma assisted polishing, K. Monna,H. Deng,T. Tabata,K. Endo,K. Yamamura, 2014/02
  • XTEM observation of the anodic oxide layer/SiC interface morphology during anodic oxidation assisted polishing, K. Hosoya,Y. Imanishi,K. Endo,K. Yamamura, 2014/02
  • Nanoindentation studies on the mechanical properties of silicon face and carbon face of 4H-SiC, H. Deng,K.Endo,K. Yamamura, 2014/02
  • Profile measurement of aspheric mirror using High-Speed Nanoprofiler, K. Okuda,K. Usuki,T. Kitayama,T. Kojima,K. Okita,R. Tokura,M. Nakano,R. Kudo,K. Yamamura,K. Endo, 2014/02
  • Development of Precisely Controlled Metallodielectric Plasmonic Nanoshell Arrays with Nanogap for Sensitive Detection of Molecular Adsorption Based on NIR responsive LSPR, S. Uchida,N. Zettsu,K. Endo,K. Yamamura, 2014/02
  • Observation of the spatial distribution of gravitationally bound quantum states of ultracold neutrons and its derivation using the Wigner function, G. Ichikawa,S. Komamiya,Y. Kamiya,Y. Minami,M. Tani,P. Geltenbort,K. Yamamura,M. Nagano,T. Sanuki,S. Kawasaki,M. Hino,M. Kitaguchi, Phys. Rev. Lett. 112 (2014) pp. 071101, 2014/02
  • Dicing of SiC wafer by atmospheric-pressure plasma etching process with slit mask for plasma confinement, Y. Sano,H. Nishikawa,Y. Okada,K. Yamamura,S. Matsuyama,K. Yamauchi, Materials Science Forum, TRANS TECH PUBLICATIONS LTD, Vol. 778-780, p. 759-762, 2014/02
  • Thinning of a two-inch silicon carbide wafer by plasma chemical vaporization machining using a slit electrode, Y. Okada,H. Nishikawa,Y. Sano,K. Yamamura,K. Yamauchi, Materials Science Forum, TRANS TECH PUBLICATIONS LTD, Vol. 778-780, p. 750-753, 2014/02
  • Open-air type plasma chemical vaporization machining by applying pulse-width modulation control, Yoshiki Takeda,Yuki Hata,Katsuyoshi Endo,Kazuya Yamamura, JOURNAL OF PHYSICS D-APPLIED PHYSICS, IOP PUBLISHING LTD, Vol. 47, No. 11, 2014/02
  • Study on Controlling Mechanism of Step-Terrace Structure in CeO2 Slurry Polishing of 4H-SiC, Hui Deng,Katsuyoshi Endo,Kazuya Yamamura, 2014 INTERNATIONAL CONFERENCE ON PLANARIZATION/CMP TECHNOLOGY (ICPT), IEEE, p. 147-148, 2014
  • A new optical head tracing reflected light for nanoprofiler, K. Okuda,K. Okita,Y. Tokuta,T. Kitayama,M. Nakano,R. Kudo,K. Yamamura,K. Endo, ADVANCES IN METROLOGY FOR X-RAY AND EUV OPTICS V, SPIE-INT SOC OPTICAL ENGINEERING, Vol. 9206, 2014
  • Development and demonstration of a multi-channel spheroidal focusing device for neutron beams, H. Hayashida,K. Soyama,D. Yamazaki,R. Maruyama,K. Yamamura, INTERNATIONAL WORKSHOP ON NEUTRON OPTICS AND DETECTORS (NOP&D 2013), IOP PUBLISHING LTD, Vol. 528, No. 1, 2014
  • Material removal rate control in open-air type plasma chemical vaporization machining by pulse width modulation of applied power, Yoshiki Takeda,Yuki Hata,Katsuyoshi Endo,Kazuya Yamamura, Key Engineering Materials, Trans Tech Publications Ltd, Vol. 625, p. 593-596, 2013/11
  • Figuring and finishing of reaction-sintered SiC by anodic oxidation assisted process, Naoki Shimozono,Xinmin Shen,Hui Deng,Katsuyoshi Endo,Kazuya Yamamura, Key Engineering Materials, Trans Tech Publications Ltd, Vol. 625, p. 570-575, 2013/11
  • Investigation of removal mechanism of sapphire in plasma assisted polishing, Kohki Monna,Hui Deng,Katsuyoshi Endo,Kazuya Yamamura, Key Engineering Materials, Trans Tech Publications Ltd, Vol. 625, p. 458-462, 2013/11
  • Finishing of 4H-SiC (0001) by combination of thermal oxidation and abrasive polishing, Hui Deng,Katsuyoshi Endo,Kazuya Yamamura, Key Engineering Materials, Trans Tech Publications Ltd, Vol. 625, p. 192-195, 2013/11
  • Comparative analysis of oxidation methods of reaction-sintered silicon carbide for optimization of oxidation-assisted polishing, Xinmin Shen,Yifan Dai,Hui Deng,Chaoliang Guan,Kazuya Yamamura, OPTICS EXPRESS, OPTICAL SOC AMER, Vol. 21, No. 22, p. 26123-26135, 2013/10
  • 数値制御ローカルウエットエッチングによる中性子集束用楕円面ミラー基盤の創成, 山村和也, 精密工学会誌 79 (2013) 813-817., 2013/09
  • Atomic-scale planarization of 4H-SiC (0001) by combination of thermal oxidation and abrasive polishing, Hui Deng,Katsuyoshi Endo,Kazuya Yamamura, APPLIED PHYSICS LETTERS, AMER INST PHYSICS, Vol. 103, No. 11, 2013/09
  • Experimental studies on water vapor plasma oxidation and thermal oxidation of 4H-SiC (0001) for clarification of the atomic-scale flattening mechanism in plasma assisted polishing, Hui Deng,Katsuyoshi Endo,Kazuya Yamamura, SILICON CARBIDE AND RELATED MATERIALS 2013, PTS 1 AND 2, TRANS TECH PUBLICATIONS LTD, Vol. 778-780, p. 587-590, 2013/09
  • Highly Adhesive Copper Pattern on PTFE by Plasma Irradiation through Inkjet Printing, H. Sato,K. Ooka,K. Endo,K. Yamamura, 2013/08
  • Development of focusing supermirors by means of ultra-precise surface figuring and ion beam sputtering, D. Yamazaki,H. Hayashida,R. Maruyama,Y. Kasugai,K. Soyama,M. Nagano,T. Tabata,N. Mitsushima,K. Yamamura, 2013/07
  • Development of a multi-channel ellipsoidal cylindrical focusing mirror, H. Hayashida,D. Yamazaki,R. Maruyama,K. Soyama,K. Yamamura, 2013/07
  • Focusing supermirrors with precisely figured elliptic surfaces, D. Yamazaki,H. Hayashida,R. Maruyama,T. Shinohara,K. Soyama,M. Nagano,N. Mitsushima,K. Yamamura, 2013/07
  • 大気圧プラズマ化学液相堆積法によるPTFE シート上への高密着性無電解銅めっき層の形成, 是津信行,秋山弘貴,山村和也,大石修治,手嶋勝弥, Journal of Flux Growth, Vol. 8, No. 1, 2013/07
  • Fundamental research on the label-free detection of protein adsorption using near-infrared light-responsive plasmonic metal nanoshell arrays with controlled nanogap, Shuhei Uchida,Nobuyuki Zettsu,Katsuyoshi Endo,Kazuya Yamamura, Nanoscale Research Letters, Vol. 8, No. 1, 2013/06
  • Atomic-scale flattening mechanism of 4H-SiC (0001) in plasma assisted polishing, H. Deng,K. Yamamura, CIRP ANNALS-MANUFACTURING TECHNOLOGY, ELSEVIER SCIENCE BV, Vol. 62, No. 1, p. 575-578, 2013/06
  • Ultrasmooth reaction-sintered silicon carbide surface resulting from combination of thermal oxidation and ceria slurry polishing, Xinmin Shen,Yifan Dai,Hui Deng,Chaoliang Guan,Kazuya Yamamura, OPTICS EXPRESS, OPTICAL SOC AMER, Vol. 21, No. 12, p. 14780-14788, 2013/06
  • Label-free detection of biotin-streptavidin binding pair by using the near infra-red light responsible plasmonic nanostructures array with controlled nanogap, S. Uchida,N. Zettsu,K. Yamamura, 2013/05
  • Study on oxidation processes of 4H-SiC (0001) for investigation of the atomically flattening mechanism in plasma assisted polishing, H. Deng,K. Yamamura, 2013/05
  • Preliminary Study on Plasma Assisted Polishing of Sapphire, K. Yamamura,S. Morinaga,K. Monna,H. Deng,K. Endo, Proc. The 9th CJUMP and 7th UPET (2013) 54-58., 2013/03
  • Investigation of Thermally Oxidized SiO2/4H-SiC (0001) Interface for Surface Flattening, H. Deng,K. Endo,K. Yamamura, Proc. The 9th CJUMP and 7th UPET (2013) 65-69., 2013/03
  • Subsurface atomic structure of 4H-SiC (0001) finished by plasma-assisted polishing, Hui Deng,Kazuya Yamamura, SILICON CARBIDE AND RELATED MATERIALS 2012, TRANS TECH PUBLICATIONS LTD, Vol. 740-742, p. 435-438, 2013/02
  • プラズマ援用研磨法の開発(第8報):サファイア基板へのプラズマ援用研磨適用に関する基礎検討, 門奈 剛毅,トウ 輝,田畑 雄壮,遠藤 勝義,山村 和也, 精密工学会学術講演会講演論文集, 公益社団法人 精密工学会, Vol. 2013, p. 221-222, 2013
  • 陽極酸化援用研磨法の開発 (第1報):4H-SiCの基礎加工特性, 細谷 憲治,遠藤 勝義,山村 和也, 精密工学会学術講演会講演論文集, 公益社団法人 精密工学会, Vol. 2013, p. 227-228, 2013
  • 大気圧プラズマプロセスをベースとした単結晶ダイヤモンド基板の高能率ダメージフリー平坦化・平滑化(第2報):石英ガラスを工具としたプラズマ援用研磨におけるプラズマ照射の効果, 田畑 雄壮,門奈 剛毅,トウ 輝,牧山 真也,遠藤 勝義,山村 和也, 精密工学会学術講演会講演論文集, 公益社団法人 精密工学会, Vol. 2013, p. 225-226, 2013
  • Label-free detection of bio-molecular by using the plasmonc nanoshell arrays with controlled nanogap, Uchida Shuhei,Zettsu Nobuyuki,Endo Katsuyoshi,Yamamura Kazuya, Proceedings of JSPE Semestrial Meeting, The Japan Society for Precision Engineering, Vol. 2013, p. 337-338, 2013
  • プラズマ援用研磨法の開発(第7報):酸化面のセリア砥粒研磨によるtwo-bilayerのステップ/テラス構造を形成するメカニズムの考察, トウ 輝,遠藤 勝義,山村 和也, 精密工学会学術講演会講演論文集, 公益社団法人 精密工学会, Vol. 2013, p. 219-220, 2013
  • 陽極酸化援用加工を用いた反応焼結SiC材の高精度ダメージフリー加工に関する研究:陽極酸化におけるSiCとSiの酸化レートの評価, 下園 直樹,遠藤 勝義,山村 和也, 精密工学会学術講演会講演論文集, 公益社団法人 精密工学会, Vol. 2013, p. 229-230, 2013
  • 大気圧プラズマプロセスをベースとした単結晶ダイヤモンド基板の高能率ダメージフリー平坦化・平滑化(第1報):Ar+O2マイクロ波プラズマジェットのエッチング特性, 牧山 真也,田畑 雄壮,遠藤 勝義,山村 和也, 精密工学会学術講演会講演論文集, 公益社団法人 精密工学会, Vol. 2013, p. 223-224, 2013
  • 大気圧プラズマによる表面改質技術の開発:フッ素樹脂表面への高密着性銅メタライジング, 佐藤 悠,遠藤 勝義,山村 和也, 精密工学会学術講演会講演論文集, 公益社団法人 精密工学会, Vol. 2013, p. 581-582, 2013
  • 大気開放型プラズマCVMを用いた形状創成における高精度化・高効率化に関する研究(第1報):プラズマジェット加工方式における基礎的加工特性の評価, 畑 祐輝,竹田 善紀,伊藤 丈予,遠藤 勝義,山村 和也, 精密工学会学術講演会講演論文集, 公益社団法人 精密工学会, Vol. 2013, p. 681-682, 2013
  • 大気開放型プラズマCVMを用いた形状創成における高精度・高効率化に関する研究(第2報):パルス幅変調制御による加工量制御の基礎的検討, 竹田 善紀,畑 祐輝,遠藤 勝義,山村 和也, 精密工学会学術講演会講演論文集, 公益社団法人 精密工学会, Vol. 2013, p. 683-684, 2013
  • 数値制御電解加工(NC-ECM)による中性子収束用金属ミラー基盤の精密形状創成(第1報):ライン型電極による楕円面の一括創成, 光嶋 直樹,大内 将,遠藤 勝義,山村 和也, 精密工学会学術講演会講演論文集, 公益社団法人 精密工学会, Vol. 2013, p. 975-976, 2013
  • Atomically smooth damage free finishing of 4H-SiC(0001) by plasma assisted polishing, K. Yamamura, 2012/12
  • Preface, Kazuto Yamauchi,Kazuya Yamamura, Current Applied Physics, Vol. 12, No. 3, 2012/12
  • Interfacial Analysis of Electroless Copper Thin Film on Fluorocarbon Polymer Fabricated by Plasma Irradiation with Graft Copolymerization, K. Ooka,Y. Hara,K. Yamamura, Proceedings of International Symposium on Dry Process(DPS2012), 2012/11
  • Improvement of adhesion strength of epoxy resin/PTFE interface by atmospheric pressure plasma treatment of PTFE, Y. Hara,K. Yamamura, Proceedings of International Symposium on Dry Process(DPS2012), 2012/11
  • Fabrication of precise asymmetric nanoshells array with nanogaps for a label-free immunoassay based on NIR-light responsive LSPR, Shuhei Uchida,Kazuya Yamamura,Nobuyuki Zettsu, Key Engineering Materials, Vol. 523-524, p. 680-685, 2012/11
  • Nanometer-level self-aggregation and three-dimensional growth of copper nanoparticles under dielectric barrier discharge at atmospheric pressure, Yuto Yamamoto,Hiroki Akiyama,Kento Ooka,Kazuya Yamamura,Yasushi Oshikane,Nobuyuki Zettsu, CURRENT APPLIED PHYSICS, ELSEVIER SCIENCE BV, Vol. 12, p. S63-S68, 2012/11
  • A Simulation Study on Figure Error Correction Using Near-Gaussian Removal Function in Numerical Controlled Local Wet Etching, Xinmin Shen,Mikinori Nagano,Wenqiang Peng,Yifan Dai,Kazuya Yamamura, EMERGING TECHNOLOGY IN PRECISION ENGINEERING XIV, TRANSACTION PUBLISHERS, Vol. 523-524, p. 276-+, 2012/11
  • Relationship between peroxide radical species on plasma-treated PFA surface and adhesion strength of PFA/electroless copper-plating film, Yasuhiro Hara,Kento Ooka,Nobuyuki Zettsu,Kazuya Yamamura, CURRENT APPLIED PHYSICS, ELSEVIER SCIENCE BV, Vol. 12, p. S38-S41, 2012/11
  • Smoothing of reaction sintered silicon carbide using plasma assisted polishing, Hui Deng,Kazuya Yamamura, CURRENT APPLIED PHYSICS, ELSEVIER SCIENCE BV, Vol. 12, p. S24-S28, 2012/11
  • Study on in situ Etching Rate Monitoring in Numerically Controlled Local Wet Etching, Naoki Shimozono,Mikinori Nagano,Takaaki Tabata,Kazuya Yamamura, EMERGING TECHNOLOGY IN PRECISION ENGINEERING XIV, TRANSACTION PUBLISHERS, Vol. 523-524, p. 34-39, 2012/11
  • Material Removal Rate Control in Open-air Type Plasma Chemical Vaporization Machining Using Optical Actinometry, Yuto Yamamoto,Yuki Hata,Mao Hosoda,Yasushi Oshikane,Kazuya Yamamura, EMERGING TECHNOLOGY IN PRECISION ENGINEERING XIV, TRANSACTION PUBLISHERS, Vol. 523-524, p. 267-271, 2012/11
  • Adhesion strength of electroless copper plated layer on fluoropolymer surface modified by medium pressure plasma, Kento Ooka,Yuto Yamamoto,Yasuhiro Hara,Nobuyuki Zettsu,Kazuya Yamamura, EMERGING TECHNOLOGY IN PRECISION ENGINEERING XIV, TRANSACTION PUBLISHERS, Vol. 523-524, p. 262-+, 2012/11
  • Evaluation of surface roughness and subsurface damage of 4H-SiC processed by different finishing techniques, Hui Deng,Kazuya Yamamura, EMERGING TECHNOLOGY IN PRECISION ENGINEERING XIV, TRANSACTION PUBLISHERS, Vol. 523-524, p. 19-23, 2012/11
  • Figuring of Aspherical Metal Mirror Substrate for Neutron Focusing by Numerically Controlled Electrochemical Machining, Takaaki Tabata,Mikinori Nagano,Dai Yamazaki,Ryuji Maruyama,Kazuhiko Soyama,Kazuya Yamamura, EMERGING TECHNOLOGY IN PRECISION ENGINEERING XIV, TRANSACTION PUBLISHERS, Vol. 523-524, p. 29-+, 2012/11
  • Quadruple stacked elliptical supermirror device for one dimensional neutron focusing, M. Nagano,F. Yamaga,D. Yamazaki,R. Maruyama,K. Soyama,K. Yamamura, EMERGING TECHNOLOGY IN PRECISION ENGINEERING XIV, TRANSACTION PUBLISHERS, Vol. 523-524, p. 272-+, 2012/11
  • Adhesion Strength of Epoxy Resin/PTFE Treated by Atmospheric Pressure Helium Plasma, Y. Hara,K. Yamamura, Extended Abstracs of Fifh International Symposium on Atomically Controlled Fabrication Technology, 2012/10
  • Preliminary Study on Etching Characterization of Single Crystal Diamond in Open-air Type Plasma Chemical Vaporization Machining, S. Makiyama,K. Yamamura, Extended Abstracs of Fifh International Symposium on Atomically Controlled Fabrication Technology, 2012/10
  • Development of Removal Rate Control System in Open-air Type Plasma Chemical Vaporization Machining Using Optical Actinometry, Y. Hata,Y. Takeda,Y. Oshikane,K. Yamamura, Extended Abstracs of Fifh International Symposium on Atomically Controlled Fabrication Technology, 2012/10
  • Development of in situ Monitoring System for HF Concentration using Raman Spectroscopy in Numerically Controlled Local Wet Etching, N. Shimozono,M. Nagano,K. Yamamura, Extended Abstracs of Fifh International Symposium on Atomically Controlled Fabrication Technology, 2012/10
  • XTEM Observation of 4H-SiC (0001) Surfaces Oxidized by Water Vapor Plasma in Plasma Assisted Polishing, H. Deng,K. Yamamura, Extended Abstracs of Fifh International Symposium on Atomically Controlled Fabrication Technology, 2012/10
  • Fabrication of Spheroidal Supermirror for Neutron Beam Focusing -Figure Correction of Glass Mandrel using Spherical Polishing Pad-, K. Yamasaki,M. Nagano,N. Mitsushima,R. Maruyama,H. Hayashida,D. Yamazaki,K. Soyama,K. Yamamura, Extended Abstracs of Fifh International Symposium on Atomically Controlled Fabrication Technology, 2012/10
  • Effect of Atmospheric Plasma Treatment on Adhesion Strength of Electroless Copper Film/Fluorocarbon Polymer Interface, K. Ooka,Y. Hara,K. Yamamura, Extended Abstracs of Fifh International Symposium on Atomically Controlled Fabrication Technology, 2012/10
  • Combined effect of Oxidation and Removal in Plasma Chemical Vaporization Machining of Reaction Sintered Silicon CarbideFifh, X. Shen,K. Yamamura, Extended Abstracs of Fifh International Symposium on Atomically Controlled Fabrication Technology, 2012/10
  • Approach to a Nanoscale Optical Biosensor using Nanoshell Array for a Label-Free Immunoassay based on NIR-light Responsive LSPR, S. Uchida,N. Zettsu,K. Yamamura, Extended Abstracs of Fifh International Symposium on Atomically Controlled Fabrication Technology, 2012/10
  • Development of Stacking Mirror Device Using Millimeter-Thick Elliptical Supermirrors for Neutron Beam Focusing, M. Nagano,F. Yamaga,D. Yamazaki,R. Maruyama,K. Soyama,K. Yamamura, Extended Abstracs of Fifh International Symposium on Atomically Controlled Fabrication Technology, 2012/10
  • Chemical Fabrication Techniques for Optical Components with Nanometer-level Accuracy, K. Yamamura, Extended Abstracs of Fifh International Symposium on Atomically Controlled Fabrication Technology, 2012/10
  • Removal Properties of Reaction Sintered SiC in Atmospheric Pressure Plasma Fabrication Process, K. Yamamura,Y. Yamamoto,Y. Hata,H. Deng, Proceedings of 10th International Conference on Progress of Machining Technology(ICPMT2012), 2012/09
  • A Simulation Study on Optimazation of Scan Mode in Numerically Controlled Local Wet Etching, X. Shen,K. Yamamura, Proceedings of 10th International Conference on Progress of Machining Technology(ICPMT2012), 2012/09
  • Oxidation of 4H-SiC by Water Vapor Plasma in Plasma Assisted Polishing, H. Deng,K. Yamamura, Proceedings of 10th International Conference on Progress of Machining Technology(ICPMT2012), 2012/09
  • ULTRA-PRECISION FIGURING OF ELLIPTICAL QUARTZ GLASS SUBSTRATE BY NUMERICALLY CONTROLLED LOCAL WET ETCHING USING HF SOLUTION AT AZEOTROPIC CONCENTRATION, Mikinori Nagano,Kazuya Yamamura, PROGRESS OF MACHINING TECHNOLOGY, JAPAN SOC PRECISION ENGINEERING-JSPE, p. 223-226, 2012/09
  • XPS analysis of 4H-SiC surfaces oxidized by helium-based atmospheric-pressure water vapor plasma for plasma-assisted polishing, Hui Deng,Kazuya Yamamura, SILICON CARBIDE AND RELATED MATERIALS 2012, TRANS TECH PUBLICATIONS LTD, Vol. 740-742, p. 514-517, 2012/09
  • Basic experiment on atmospheric-pressure plasma etching with slit aperture for high-efficiency dicing of SiC wafer, Yasuhisa Sano,Hiroaki Nishikawa,Kohei Aida,Chaiyapat Tangpatjaroen,Kazuya Yamamura,Satoshi Matsuyama,Kazuto Yamauchi, SILICON CARBIDE AND RELATED MATERIALS 2012, TRANS TECH PUBLICATIONS LTD, Vol. 740-742, p. 813-+, 2012/09
  • 大気圧プラズマを援用したSiCの超平滑ダメージフリー研磨, 山村和也, FCレポート, 2012/07
  • Supermirror Coatings for the J-PARC/MLF, R. Maruyama,D. Yamazaki,H. Hayashida,M. Nagano,N. Zettsu,K. Yamamura,M. Takeda,S. Okayasu,K. Soyama, 2012/07
  • Stacking mirror device using millimeter-thick elliptical supermirrors fabricated by numerically controlled local wet etching for focusing neutron beam, M. Nagano,F. Yamaga,D. Yamazaki,R. Maruyama,K. Soyama,K. Yamamura, Proc. of 12th International Conference of the European Society for Precision Engineering and Nanotechnology, 2012/06
  • Smoothing Mechanism of Reaction Sintered SiC in Plasma assisted Polishing using Ceria Abrasive, Hui Deng,Masaki Ueda,Kazuya Yamamura, PROCEEDINGS OF PRECISION ENGINEERING AND NANOTECHNOLOGY (ASPEN2011), TRANS TECH PUBLICATIONS LTD, Vol. 516, p. 119-124, 2012/06
  • Preliminary Study on Chemical Figuring and Finishing of Sintered SiC Substrate Using Atmospheric Pressure Plasma, K. Yamamura,Y. Yamamoto,H. Deng, 45TH CIRP CONFERENCE ON MANUFACTURING SYSTEMS 2012, ELSEVIER SCIENCE BV, Vol. 3, p. 335-339, 2012/05
  • シリコンカーバイドを無傷に研磨, 山村和也, セラミックス, 2012/04
  • Effect of Si interlayers on the magnetic and mechanical properties of Fe/Ge neutron polarizing multilayer mirrors, R. Maruyama,D. Yamazaki,S. Okayasu,M. Takeda,N. Zettsu,M. Nagano,K. Yamamura,H. Hayashida,K. Soyama, J. Appl. Phys. 111 (2012) 063904_1-10., AMER INST PHYSICS, Vol. 111, No. 6, 2012/03
  • High-precision figured thin supermirror substrates for multiple neutron focusing device, M. Nagano,F. Yamaga,D. Yamazaki,R. Maruyama,H. Hayashida,K. Soyama,K. Yamamura, J. Phys. Conf. Ser. 340 (2012) 012016_1_7, IOP PUBLISHING LTD, Vol. 340, 2012/02
  • 数値制御電解加工による金属ミラーの形状創成加工(第2報):同軸ノズル電極の基礎加工特性, 田畑 雄壮,永野 幹典,山村 和也, 精密工学会学術講演会講演論文集, 公益社団法人 精密工学会, Vol. 2012, p. 343-344, 2012
  • プラズマ発生領域制限マスクを用いたPCVM(Plasma Chemical Vaporization Machining) によるSiC基板の切断加工の検討, 西川 央明,佐野 泰久,会田 浩平,岡田 悠,山村 和也,松山 智至,山内 和人, 精密工学会学術講演会講演論文集, 公益社団法人 精密工学会, Vol. 2012, p. 425-426, 2012
  • 数値制御ローカルウエットエッチング法による高精度光学素子の作製(第9報):共沸濃度のフッ化水素酸を用いた合成石英基板の高精度加工, 永野 幹典,山村 和也, 精密工学会学術講演会講演論文集, 公益社団法人 精密工学会, Vol. 2012, p. 407-408, 2012
  • 大気開放型プラズマCVMにおける加工速度フィードバック制御機構の開発 (第3報):アクチノメトリー法を用いた反応種密度計測における誤差要因の検討, 畑 祐輝,竹田 善紀,山村 和也,押鐘 寧, 精密工学会学術講演会講演論文集, 公益社団法人 精密工学会, Vol. 2012, p. 879-880, 2012
  • One-dimensional neutron focusing with large beam divergence by 400mm-long elliptical supermirror, M. Nagano,F. Yamaga,D. Yamazaki,R. Maruyama,H. Hayashida,K. Soyama,K. Yamamura, 5TH EUROPEAN CONFERENCE ON NEUTRON SCATTERING, IOP PUBLISHING LTD, Vol. 340, 2012
  • Shape correction of optical surfaces using plasma chemical vaporization machining with a hemispherical tip electrode, Hideo Takino,Kazuya Yamamura,Yasuhisa Sano,Yuzo Mori, Applied Optics 51 (2012) 401-407., OPTICAL SOC AMER, Vol. 51, No. 3, p. 401-407, 2012/01
  • The improvement of removal function in local wet etching by using eccentric rotation system, X. Shen,Y. Dai,W. Peng,M. Nagano,K. Yamamura, Abstracts of 4th International Conference of Asian Society for Precision Engineering and Nanotechnology, 104., TRANS TECH PUBLICATIONS LTD, Vol. 516, p. 504-+, 2011/11
  • Development of Focusing Supermirrors for GISANS Measurements at BL17 “SHARAKU" of J-PARC/MLF, D. Yamazaki,R. Maruyama,H. Hayashida,K. Soyama,M. Takeda,M. Nagano,F. Yamaga,K. Yamamura, Abstracts of 1st Asia-Oceania Conference on Neutron Scattering, 449., 2011/11
  • Development of neutron focusing device using stacked millimeter-thick elliptical supermirror substrates, M. Nagano,F. Yamaga,D. Yamazaki,R. Maruyama,H. Hayashida,K. Soyama,K. Yamamura, Abstracts of 1st Asia-Oceania Conference on Neutron Scattering, 110., 2011/11
  • Evaluation of focusing performance of elliptical neutron focusing supermirror by ray-tracing simulation, M. Nagano,F. Yamaga,D. Yamazaki,R. Maruyama,H. Hayashida,K. Soyama,K. Yamamura, Abstracts of 1st Asia-Oceania Conference on Neutron Scattering, 444., 2011/11
  • A Spheroidal Supermirror, K. Soyama,D. Yamazaki,R. Maruyama,H. Hayashida,M. Nagano,N. Zettsu,K. Yamamura, Abstracts of 1st Asia-Oceania Conference on Neutron Scattering, 446., 2011/11
  • XTEM observation of 4H-SiC (0001) surfaces processed by plasma assisted polishing, H. Deng,K. Yamamura, Proceeding of the 8th CHINA-JAPAN International Conference on Ultra-Precision Machining, 30., TRANS TECH PUBLICATIONS LTD, Vol. 497, p. 156-159, 2011/11
  • Plasma Chemical Vaporization Machining of Silicon Carbide Wafer Using Flat-bar Electrode with Multiple Gas Nozzles, Y. Sano,K. Aida,H. Nishikawa,K. Yamamura,S. Matsuyama,K. Yamauchi, Proceeding of the 8th CHINA-JAPAN International Conference on Ultra-Precision Machining, 31., TRANS TECH PUBLICATIONS LTD, Vol. 497, p. 160-+, 2011/11
  • Chemical and morphological analysis of 4H-SiC surface processed by plasma assisted polishing, H. Deng,M. Ueda,K. Yamamura, Abstracts of 4th International Conference of Asian Society for Precision Engineering and Nanotechnology, 65., TRANS TECH PUBLICATIONS LTD, Vol. 516, p. 186-191, 2011/11
  • Study on flattening mechanism of reaction sintered SiC by plasma assisted polishing using ceria abrasive, H. Deng,M. Ueda,K. Yamamura, Abstracts of 4th International Conference of Asian Society for Precision Engineering and Nanotechnology, 56., 2011/11
  • Noncontact figuring of millimeter-thick elliptical mirror substrate by numerically controlled local wet etching, M. Nagano,F. Yamaga,K. Yamasaki,N. Zettsu,D. Yamazaki,R. Maruyama,H. Hayashida,K. Soyama,K. Yamamura, Abstracts of 4th International Conference of Asian Society for Precision Engineering and Nanotechnology, 72., TRANS TECH PUBLICATIONS LTD, Vol. 516, p. 361-+, 2011/11
  • Back-side thinning of silicon carbide wafer by plasma etching using atmospheric-pressure plasma, Y. Sano,K. Aida,H. Nishikawa,K. Yamamura,S. Matsuyama,K. Yamauchi, Abstracts of 4th International Conference of Asian Society for Precision Engineering and Nanotechnology, 72, TRANS TECH PUBLICATIONS LTD, Vol. 516, p. 108-+, 2011/11
  • A Study on Surface Roughness of Curved Silicon Crystal Spectrometer Fabricated by Plasma Chemical Vaporization Machining, Y. Yamamoto,M. Hosoda,M. Nagano,K. Yamamura, Abstracts of 4th International Conference of Asian Society for Precision Engineering and Nanotechnology, 51., TRANS TECH PUBLICATIONS LTD, Vol. 516, p. 522-526, 2011/11
  • Cutting of SiC substrates by atmospheric-pressure plasma etching with slit mask for plasma confinement, H. Nishikawa,Y. Sano,K. Aida,T. Chaiyapat,K. Yamamura,S. Matsuyama,K. Yamauchi, Abstracts of The 33rd International Symposium on Dry Process, 35-36., 2011/11
  • Cutting of SiC substrates by atmospheric-pressure plasma etching with slit mask for plasma confinement, H. Nishikawa,Y. Sano,K. Aida,T. Chaiyapat,K. Yamamura,S. Matsuyama,K. Yamauchi, Extended Abstracts of Fourth International Symposium on Atomically Controlled Fabrication Technology, 172-173., 2011/10
  • Study on Adhesion Strength of Cu Plating Film Formed on PTFE Substrate through Atmospheric Pressure Plasma Liquid Deposition, Y. Hara,K. Oooka,H. Akiyama,N. Zettsu,K. Yamamura, Extended Abstracts of Fourth International Symposium on Atomically Controlled Fabrication Technology, 218-219., 2011/10
  • Real Time Monitoring and Control of Etching Rate in Open-air Type Plasma Chemical Vaporization Machining Using Optical Actinometry, Y. Yamamoto,M. Nagano,M. Hosoda,Y. Hata,K. Yamamura, Extended Abstracts of Fourth International Symposium on Atomically Controlled Fabrication Technology, 212-213., 2011/10
  • Investigation of Material Removal Mechanism of Reaction Sintered SiC in Plasma Assisted Polishing, H. Deng,K. Yamamura, Extended Abstracts of Fourth International Symposium on Atomically Controlled Fabrication Technology, 152-153., 2011/10
  • Fabrication of Ring-Shaped PS@Au Metallodielectric Nanoshell Arrays for Localized Surface Plasmon Resonance Biosensor, Y. Yamamoto,S. Uchida,K. Yamamura,N. Zettsu, Extended Abstracts of Fourth International Symposium on Atomically Controlled Fabrication Technology, 96-97., 2011/10
  • Fabrication of Patterned Metal Layer on Poly(tetrafluoroethylene)Substrate through Atmospheric Pressure Plasma Liquid Deposition Approach, K. Ooka,H. Akiyama,Y. Yamamoto,N. Zettsu,K. Yamamura, Extended Abstracts of Fourth International Symposium on Atomically Controlled Fabrication Technology, 158-159., 2011/10
  • Estimation of Alignment Tolerance for Multiply-Arranged Elliptical Neutron Focusing Supermirror Device by Ray-Tracing Simulation, F. Yamaga,M. Nagano,D. Yamazaki,R. Maruyama,K. Soyama,K. Yamamura, Extended Abstracts of Fourth International Symposium on Atomically Controlled Fabrication Technology,, 2011/10
  • Morphological and Molecular Design of PTFE/epoxy Resin Interface for Adhesion Enhancement by Liquid Phase and Atmospheric Pressure Plasma, S. Matsuura,Y. Izutsu,N. Zettsu,K. Yamamura, Extended Abstracts of Fourth International Symposium on Atomically Controlled Fabrication Technology, 132-133., 2011/10
  • Effect of Shield Gas on Surface Roughness in Processing of Silicon by Open-air Type Plasma Chemical Vaporization Machining, M. Hosoda,M. Nagano,Y. Yamamoto,Y. Hata,K. Yamamura, Extended Abstracts of Fourth International Symposium on Atomically Controlled Fabrication Technology, 136-137., 2011/10
  • Fabrication of Precise Metallodielectric Plasmonic Nanoshell Arrays with Nanogap for A Label-Free, S. Uchida,K. Yamamura,N. Zettsu, Extended Abstracts of Fourth International Symposium on Atomically Controlled Fabrication Technology, 94-95., 2011/10
  • Development of multiply-arranged elliptical neutron focusing supermirror device -Fabrication Process of High-Precision Thin Elliptical Supermirror-, M. Nagano,F. Yamaga,D. Yamazaki,R. Maruyama,K. Soyama,K. Yamamura, Extended Abstracts of Fourth International Symposium on Atomically Controlled Fabrication Technology, 22-23., The Japan Society for Precision Engineering, Vol. 2011, No. 0, p. 501-502, 2011/10
  • Cutting of SiC Wafer by Atmospheric-Pressure Plasma Etching With Wire Electrode, Yasuhisa Sano,Kohei Aida,Takehiro Kato,Kazuya Yamamura,Hidekazu Mimura,Satoshi Matsuyama,Kazuto Yamauchi, SILICON CARBIDE AND RELATED MATERIALS 2011, PTS 1 AND 2, TRANS TECH PUBLICATIONS LTD, Vol. 717-720, p. 865-+, 2011/09
  • Evaluation of surface roughness of quartz glass substrate in fabrication process for neutron focusing mirror, Mikinori Nagano,Fumiya Yamaga,Kenta Yamasaki,Nobuyuki Zettsu,Dai Yamazaki,Ryuji Maruyama,Kazuhiko Soyama,Kazuya Yamamura, Advanced Materials Research 325 (2011) 647-652., TRANS TECH PUBLICATIONS LTD, Vol. 325, p. 647-+, 2011/09
  • High-integrity finishing of 4H-SiC (0001) by plasma-assisted polishing, K. Yamamura,T. Takiguchi,M. Ueda,H. Deng,A.N. Hattori,N. Zettsu, Journal of the Japan Society for Abrasive Technology, Vol. 55, No. 9, p. 534-539, 2011/09
  • Damage-Free Dry Polishing of 4H-SiC Combined with Atmospheric-Pressure Water Vapor Plasma Oxidation, Hui Deng,Tatsuya Takiguchi,Masaki Ueda,Azusa N. Hattori,Nobuyuki Zettsu,Kazuya Yamamura, Jpn. J. Appl. Phys. 50 (2011) 08JG05_1-4., IOP PUBLISHING LTD, Vol. 50, No. 8, 2011/08
  • 高精度非球面スーパーミラーの開発, 山崎大,丸山龍治,林田洋寿,曽山和彦,永野幹典,山家史也,山村和也, 日本原子力研究開発機構JAEA-Review(Web), No. 2011-014, 2011/06
  • Development of plasma assisted polishing (4th report):Mechanism for flattening of reaction sintered SiC by plasma assisted polishing, Deng Hui,Makiyama Shinya,Yamamura Kazuya, Proceedings of JSPE Semestrial Meeting, The Japan Society for Precision Engineering, Vol. 2011, p. 764-765, 2011
  • Fabrication of damage-free curved silicon crystal substrate for a focusing X-ray spectrometer by Plasma Chemical Vaporization Machining (6th report):Study on generation mechanism of surface roughness by gas fluid analysis, Hosoda Mao,Nagano Mikinori,Yamamoto Yuto,Hata Yuki,Yamamura Kazuya, Proceedings of JSPE Semestrial Meeting, The Japan Society for Precision Engineering, Vol. 2011, p. 483-484, 2011
  • 中性子集光用楕円面スーパーミラーデバイスの開発:ミラーの形状誤差が集光性能に与える影響, 山家 史也,永野 幹典,山崎 大,丸山 龍治,曽山 和彦,山村 和也, 精密工学会学術講演会講演論文集, 公益社団法人 精密工学会, Vol. 2011, p. 479-480, 2011
  • Crystal Machining Using Atmospheric Pressure Plasma, Yasuhisa Sano,Kazuya Yamamura,Kazuto Yamauchi, Crystal Growth Technology: Semiconductors and Dielectrics, Wiley-VCH, p. 313-330, 2010/07/19
  • Fabrication of damage-free Johansson-type doubly curved crystal spectrometer substrate by numerically controlled local wet etching, K. Yamamura,K. Ueda,M. Nagano,N. Zettsu,S. Maeo,S. Shimada,T. Utaka,K. Taniguchi, Nucl. Instr. and Meth. A 616 (2010) 281-284., 2010/04
  • High-integrity finishing of 4H-SiC (0001) by plasma-assisted polishing, Kazuya Yamamura,Tatsuya Takiguchi,Masaki Ueda,Azusa N. Hattori,Nobuyuki Zettsu, ADVANCES IN ABRASIVE TECHNOLOGY XIII, TRANS TECH PUBLICATIONS LTD, Vol. 126-128, p. 423-428, 2010
  • High-Integrity Finishing of 4H-SiC (0001) by Plasma-Assisted Polishing, K. Yamamura,T. Takiguchi,M. Ueda,A. N. Hattori,N. Zettsu, Adv. Mat. Res., Vol. 423-428, p. 126-128, 2010
  • Improvement of thickness uniformity of bulk silicon wafer by numerically controlled local wet etching, Mikinori Nagano,Takuro Mitani,Kazuaki Ueda,Nobuyuki Zettsu,Kazuya Yamamura, JOURNAL OF CRYSTAL GROWTH, ELSEVIER, Vol. 311, No. 8, p. 2560-2563, 2009/04
  • プログラム自己組織化による銀ナノキューブダイマーの合成とそのプラズモニック特性, 三谷宗久,内田修平,山村和也,遠藤勝義,是津信行, 2009/03
  • サブメートル級ナノ粒子配列膜製造技術の開発(6), 真鍋享平,是津信行,山村和也,遠藤勝義, 2009年度精密工学会春季大会学術講演会講演論文集, 2009/03
  • ナノ粒子デバイス製造プロセスの開発, 斉藤正太,山村和也,遠藤勝義,是津信行, 第69回応用物理学会学術講演会講演予稿集, 2008/09
  • サブメートル級ナノ粒子配列膜製造技術の開発(5), 真鍋享平,是津信行,山村和也,遠藤勝義, 2008年度精密工学会秋季大会学術講演会講演論文集, 2008/09
  • 非最密型中空金ナノ粒子膜の作製, 内田修平,是津信行,山村和也,遠藤勝義, 第58回高分子学会年次大会講演予稿集, 2008/05
  • Ro-vibronic Structure in the Q-branch in the Spectra of Hydrogen Fulcher-a Band Emission in the Atmospheric Pressure Plasma CVD Process Driven at 150 MHz, Y. Oshikane,H. Kakiuchi,K. Yamamura,C. M. Western,K. Yasutake,K. Endo, Extended Abstratcs of International 21st Century COE Symposium on Atomistic Fabrication Technology, 2006/10
  • Development of mirror manipulator for hard x-ray nanofocusing at sub-50nm level, S. Matsuyama,H. Mimura,H. Yumoto,H. Hara,S. Handa,K. Yamamura,Y. Sano,K. Endo,Y. Mori,M. Yabashi,Y. Nishino,K. Tamasaku,T. Ishikawa,K. Yamauchi, Review of Scientific Instruments, Vol. 77, No. 9, 2006/10
  • Scanning X-ray Fluorescence Microscope Using Kirkpatrick-Baez Optics with Spatial Resolution Better than 50nm, Satoshi Matsuyama,Hidekazu Mimura,Mari Shimura,Hirokatsu Yumoto,Keiko Katagishi,Soichiro Handa,Akihiko Shibatani,Yasuhisa Sano,Kazuya Yamamura,Katsuyoshi Endo,Yuzo Mori,Yoshinori Nishino,Kenji Tamasaku,Makina Yabashi,Tetsuya Ishikawa,Kazuto Yamauchi, The 16th International Microscopy Congress (IMC16), 2006/09
  • Development of scanning X-ray fluorescence microscope with spatial resolution of 30nm using K-B mirrors optics, S.Matsuyama,H.Mimura,H.Yumoto,K.Yamamura,Y.Sano,M.Yabashi,Y.Nishino,K.Tamasaku,T. Ishikawa,K.Yamauchi, Review of Scientific Instruments, Vol. 77, No. 10, 2006/09
  • Hard X-ray focusing with a beam size less than 30 nm by total reflection mirror, H. Mimura,H. Yumoto,S. Matsuyama,S. Handa,Y. Sano,K. Yamamura,K. Tamasaku,Y. Nishino,M. Yabashi,T. Ishikawa,K. Yamauchi, 2006/07
  • Diffraction-limited X-ray nanobeam with KB mirrors, K. Yamauchi,H. Mimura,S. Matsuyama,H. Yumoto,S. Handa,Y. Sano,K. Yamamura,K. Tamasaku,Y. Nishino,M. Yabashi,T. Ishikawa, 2006/07
  • N2 C3Pu-B3Pg band spectroscopy in open-air type CVM plasma with He/CF4/O2 and H2 Fulcher-a band spectroscopy in atmospheric He/H2/SiH4 CVD plasma, Yasushi Oshikane,Kazuya Yamamura,Koji Ueno,Hiroaki Kakiuchi,Kiyoshi Yasutake,Takafumi Karasawa,Colin M. Western,Akinori Oda,Akihiko Nagao,Katsuyoshi Endo, Europhysics Conference Abstract of 18th Europhysics Conference on the Atomic and Molecular Physics of Ionised Gases, 2006/07
  • Machining characteristics of AT cut quartz crystal wafer by open-air type atmospheric pressure plasma machining system, Abstractbook of the 8th Asia-Pacific Conference on Plasma Science and Technology, Kazuya Yamamura,Koji Ueno,Yasuhisa Sano,Yasushi Oshikane,Masafumi Shibahara,Yuzo Mori, Abstractbook of the 8th Asia-Pacific Conference on Plasma Science and Technology, 2006/07
  • Surface Gradient Integrated Profiler for X-ray and EUV Optics-Calibration of the rotational angle error of the rotary encoders-, Yasuo Higashi,Yuichi Takaie,Katsuyoshi Endo,Tatsuya Kume,Kazuhiro Enami,Kazuto Ymauchi,Kazuya Yamamura,Yasushi Sano,Kenji Ueno,Yuzo Mori, Ninth International Conference on Synchrotron Radiation Instrumentation, AMER INST PHYSICS, Vol. 879, p. 726-+, 2006/06
  • Development of Surface Measurement Technologies for Hard X-ray Nanofocusing Mirror at Osaka University and SPring-8, H. Mimura,H. Yumoto,S. Matsuyama,K. Yamamura,Y. Sano,K. Endo,Y. Mori,M. Yabashi,Y. Nishino,K. Tamasaku,T. Ishikawa,K. Yamauchi, The 3rd International Workshop on Metrology for X-ray Optics, 2006/05
  • Development of K-B Mirror Manipulator for Hard X-ray Sub-50nm Focusing, Satoshi Matsuyama,Hidekazu Mimura,Hirokatsu Yumoto,Soichiro Handa,Keiko Katagishi,Akihiko Shibatani,Kazuya Yamamura,Yasuhisa Sano,Yoshinori Nishino,Kenji Tamasaku,Makina Yabashi,Tetsuya Ishikawa,Kazuto Yamauchi, International Workshop on Mechanical Engineering Design of Synchrotron Radiation Equipment and Instrumentation 2006, 2006/05
  • Polishing characteristics of silicon carbide by plasma chemical vaporization machining, Y. Sano,M. Watanabe,K. Yamamura,K. Yamauchi,T. Ishida,K. Arima,A. Kubota,Y. Mori, Proc. ICRP-6/SPP-23, Vol. 45, No. 10, p. 8277-8280, 2006/01
  • High-spatial-resolution scanning X-ray fluorescence microscope with Kirkpatrick-Baez mirrors, Satoshi Matsuyama,Hidekazu Mimura,Mari Shimura,Hirokatsu Yumoto,Keiko Katagishi,Soichiro Handa,Akihiko Shibatani,Yasuhis Sano,Kazuya Yamamura,Yoshinori Nishino,Kenji Tamasaku,Makina Yabashi,Tetsuya Ishikawa,Kazuto Yamauchi, ADVANCES IN X-RAY/EUV OPTICS, COMPONENTS, AND APPLICATIONS, SPIE-INT SOC OPTICAL ENGINEERING, Vol. 6317, 2006
  • Ultraprecision finishing process for improving thickness distribution of quartz crystal wafer by utilizing atmospheric pressure plasma, Kazuya Yamamura,Yasuhisa Sano,Yuzo Mori,Masafumi Shibahara, PROCEEDINGS OF THE 2006 IEEE INTERNATIONAL FREQUENCY CONTROL SYMPOSIUM AND EXPOSITION, VOLS 1 AND 2, IEEE, p. 848-+, 2006
  • Wave-optical evaluation of interference fringes and wavefront phase in a hard-x-ray beam totally reflected by mirror optics, Kazuto Yamauchi,Kazuya Yamamura,Hidekazu Mimura,Yasuhisa Sano,Akira Saito,Katsuyoshi Endo,Alexei Souvorov,Makina Yabashi,Kenji Tamasaku,Tetsuya Ishikawa,Yuzo Mori, Applied Optics, OSA - The Optical Society, Vol. 44, No. 32, p. 6927-6932, 2005/11
  • Two-dimensional Actinometric Study of Fluorine and Oxygen Atom Densities in the CVM Plasma Gap and the Temperature Estimation with Electronic Spectra of Diatomic Molecules, Yasushi Oshikane,Akihiko Nagao,Akinori Oda,Colin M. Western,Kazuya Yamamura,Katsuyoshi Endo, 17th International Symposium on Plasma Chemistry, Abstracts and Full-papers CD, IUPAC & IPCS, 2005/08
  • Surface figuring and measurement methods with spatial resolution close to 0.1mm for X-ray mirror fabrication, H. Mimura,H. Yumoto,S. Matsuyama,K. Yamamura,Y. Sano,K. Endo,Y. Mori,Y. Nishino,M. Yabashi,K. Tamasaku,T. Ishikawa,K. Yamauchi, Proceedings of SPIE - The International Society for Optical Engineering, Vol. 5921, p. 1-8, 2005/08
  • Diffraction-limited two-dimensional hard-X-rays focusing in 100nm level using K-B mirror arrangement, S. Matsuyama,H. Mimura,H. Yumoto,K. Yamamura,Y. Sano,K. Endo,Y. Mori,M. Yabashi,K. Tamasaku,Y. Nishino,T. Ishikawa,K. Yamauchi, Review of Scientific Instruments, Vol. 76, No. 8, p. 1-5, 2005/08
  • A new Designed High-Precision Profiler - Study on Mandrel measurement-, Y.Higashi,Y.Takaie,K.Endo,T.Kume,K.Enami,K.Yamauchi,K.Yamamura,K.Ueno,Y.Mori, Proc. 8th Cof. X-ray Microscopy IPAP Conf. Series 7, 2005/07
  • Scanning hard-X-ray microscope with spatial resolution better than 50nm, S. Matsuyama,H. Mimura,H. Yumoto,H. Hara,K. Yamamura,Y. Sano,K.Endo,Y. Mori,M. Yabashi,Y. Nishino,K. Tamasaku,T. Ishikawa,K.Yamauchi, 2005/07
  • Hard X-ray Diffraction-Limited Nanofocusing with unprecidently accurate mirrors, H. Mimura,S. Matsuyama,H. Yumoto,H. Hara,K. Yamamura,Y. Sano,M. Shibahara,K. Endo,Y. Mori,Y. Nishino,K. Tamasaku,M. Yabashi,T. Ishikawa,K. Yamauchi, 2005/07
  • Hard X-ray nano-focusing at 40nm level using K-B mirror optics for nanoscopy/spectroscopy, Satoshi Matsuyama,Hidekazu Mimura,Hirokatsu Yumoto,Hideyuki Hara,Kazuya Yamamura,Yasuhisa Sano,Katsuyoshi Endo,Yuzo Mori,Yoshinori Nishino,Kenji Tamasaku,Makina Yabashi,Tetsuya Ishikawa,Kazuto Yamauchia, Proceedings of SPIE - The International Society for Optical Engineering, Vol. 5918, p. 1-8, 2005
  • Surface Figure Metrology of x-ray mirrors using optical interferometry, K. Yamauchi,K. Yamamura,H. Mimura,Y. Sano,S. Matsuyama,H. Yumoto,K. Ueno,K. Endo,M. Yabashi,K. Tamasaku,Y. Nishino,T. Ishikawa,Y. Mori, 2004/09
  • Surface figure metrology of total reflection X-ray mirror using optical interferometry at Osaka Univ. and SPring-8, K. Yamuchi,H. Mimura,K. Yamamura,Y.Sano,K. Ueno,S. Matsuyama,K. Endo,Y. Nishino,K. Tamasaku,M. Yabashi,T. Ishikawa, Proceedings of Second International Workshop on Metrology for X-ray Optics, 2004/04
  • 超高精度硬X線集光ミラーの製作とナノスペクトロスコピーへの応用, 山村和也,山内和人,佐野泰久,三村秀和,遠藤勝義,森 勇藏, 大阪大学低温センターだより,125, 4-10, 2004/01
  • Sub-micron focusing of hard X-ray beam by elliptically figured mirrors for scanning X-ray microscopy, Y Mori,K Yamauchi,K Yamamura,H Mimura,Y Sano,A Saito,K Ueno,K Endo,A Souvorov,M Yabashi,K Tamasaku,T Ishikawa, X-RAY MIRRORS, CRYSTALS, AND MULTILAYERS II, SPIE-INT SOC OPTICAL ENGINEERING, Vol. 4782, p. 58-64, 2002
  • First-Principles Simulation of Removal Process in EEM(Elastic Emission Machining), Kazuto Yamauchi,Kikuji Hirose,Hidekazu Goto,Kazuhisa Sugiyama,Kouji Inagaki,Kazuya Yamamura,Yasuhisa Sano,Yuzo Mori, 1999/04
  • Laser beam intensity profile transformation with a fabricated mirror, Koshichi Nemoto,Takashi Fujii,Naohiko Goto,Hideo Takino,Teruki Kobayashi,Norio Shibata,Kazuya Yamamura,Yuzo Mori, Applied Optics, Vol. 36, No. 3, p. 551-557, 1997/01/20
  • Influence of fabrication precision on laser beam forming by fabricated optics, K Nemoto,T Fujii,N Goto,H Takino,T Kobayashi,N Shibata,K Yamamura,Y Mori, LBOC - THIRD INTERNATIONAL WORKSHOP ON LASER BEAM AND OPTICS CHARACTERIZATION, SPIE - INT SOC OPTICAL ENGINEERING, Vol. 2870, p. 558-564, 1996

Misc.

  • ポリドーパミンを用いた過酸化水素分解用Pt触媒の耐久性向上, 貝原大介,青木智紀,清野智史,西野実沙,中川哲哉,遠藤勝義,山村和也,大久保雄司,森理,佐々木理衣, 精密工学会関西地方定期学術講演会講演論文集, Vol. 2019, 2019
  • 中性子集光用高精度Wolterミラーマンドレルの作製(第7報):PCVM加工における熱流入由来の加工量誤差の補正, 荒川 翔平,山本 有悟,川合 健太郎,有馬 健太,山崎 大,丸山 龍治,林田 洋寿,曽山 和彦,山村 和也, 精密工学会学術講演会講演論文集, 公益社団法人 精密工学会, Vol. 2019, No. 0, p. 695-695, 2019
  • 中性子集光用高精度Wolterミラーマンドレルの作製(第6報):PCVM加工によるWolterミラーマンドレルの形状修正, 荒川 翔平,川合 健太郎,有馬 健太,山崎 大,丸山 龍治,林田 洋寿,曽山 和彦,山村 和也, 精密工学会学術講演会講演論文集, 公益社団法人 精密工学会, Vol. 2018, No. 0, p. 722-722, 2018
  • 電子線照射還元法により担持したPtナノ粒子のH<sub>2</sub>O<sub>2</sub>分解触媒活性に及ぼす担体材料の影響, 青木智紀,大久保雄司,清野智史,小玉欣典,中川哲哉,河本懐,遠藤勝義,森理,伊藤一作,山村和也, 表面技術協会講演大会講演要旨集, Vol. 136th, 2017
  • Adhesive-free adhesion between polytetrafluoroethylene (PTFE) and isobutylene-isoprene rubber (IIR) via heat-assisted plasma treatment (vol 7, pg 6432, 2017), Y. Ohkubo,K. Ishihara,H. Sato,M. Shibahara,A. Nagatani,K. Honda,K. Endo,K. Yamamura, RSC ADVANCES, ROYAL SOC CHEMISTRY, Vol. 7, No. 63, p. 39928-39928, 2017
  • 中性子集光用高精度Wolterミラーマンドレルの作製(第4報):石英ガラス製回転体基盤に対するプラズマジェット加工特性の評価, 小林 勇輝,後藤 惟樹,遠藤 勝義,山崎 大,丸山 龍治,林田 洋寿,曽山 和彦,山村 和也, 精密工学会学術講演会講演論文集, 公益社団法人 精密工学会, Vol. 2017, No. 0, p. 973-974, 2017
  • 中性子集光用高精度Wolterミラーマンドレルの作製(第5報):PCVM加工における加工変質層が及ぼす加工特性への影響の評価, 小林 勇輝,荒川 翔平,遠藤 勝義,山崎 大,丸山 龍治,林田 洋寿,曽山 和彦,山村 和也, 精密工学会学術講演会講演論文集, 公益社団法人 精密工学会, Vol. 2017, No. 0, p. 865-866, 2017
  • 中性子集光用高精度Wolterミラーマンドレルの作製(第2報):マイクロ波プラズマジェット加工における加工速度のCF4/O2組成依存性, 小林 勇輝,後藤 惟樹,遠藤 勝義,山崎 大,丸山 龍治,林田 洋寿,曽山 和彦,山村 和也, 精密工学会学術講演会講演論文集, 公益社団法人 精密工学会, Vol. 2016, No. 0, p. 277-278, 2016
  • 中性子集束用高精度Wolterミラーマンドレルの作製:集束性能に影響を及ぼす形状誤差の光線追跡シミュレーションによる評価, 後藤 惟樹,小林 勇輝,遠藤 勝義,山崎 大,丸山 龍治,林田 洋寿,曽山 和彦,山村 和也, 精密工学会学術講演会講演論文集, 公益社団法人 精密工学会, Vol. 2016, No. 0, p. 915-916, 2016
  • フッ素樹脂と金属膜の強力接着技術 (新規材料創出に繋がる表面改質), 大久保 雄司,山村 和也, コンバーテック, 加工技術研究会, Vol. 43, No. 2, p. 51-54, 2015/02
  • フッ素樹脂/異種材料(ゴム・金属)の強力接着 (特集 異種材料接着のための界面科学(複合材料界面も含む)), 大久保 雄司,山村 和也, 接着の技術 = Adhesion technology, Japan, 日本接着学会, Vol. 35, No. 3, p. 38-42, 2015
  • Atomic-scale planarization of 4H-SiC (0001) by combination of thermal oxidation and abrasive polishing (vol 103, 111603, 2013), Hui Deng,Katsuyoshi Endo,Kazuya Yamamura, APPLIED PHYSICS LETTERS, AMER INST PHYSICS, Vol. 103, No. 18, 2013/10
  • The 4th International Symposium on Atomically Controlled Fabrication Technology Preface, Kazuto Yamauchi,Kazuya Yamamura, CURRENT APPLIED PHYSICS, ELSEVIER SCIENCE BV, Vol. 12, p. S1-S1, 2012/12
  • 25pCL-11 Angular-divergent neutron reflectometry using high-performance focusing supermirrors, Yamazaki D.,Maruyama R.,Hayashida H.,Soyama K.,Nagano M.,Yamaga K.,Yamamura K., Meeting Abstracts of the Physical Society of Japan, The Physical Society of Japan, Vol. 67, No. 0, p. 1007-1007, 2012
  • 中性子集光用回転楕円ミラーの作製 第IV報:小径球面パッドを用いた形状修正研磨における体積加工速度の安定化, 山崎 健太,永野 幹典,光嶋 直樹,山村 和也,丸山 龍治,林田 洋寿,山崎 大,曽山 和彦, 精密工学会学術講演会講演論文集, 公益社団法人 精密工学会, Vol. 2012, No. 0, p. 409-410, 2012
  • Development of multiply-arranged elliptical neutron focusing supermirror device:Alignment system for 4-1millimeter-thick elliptical mirror substrate, Nagano Mikinori,Yamaga Fumiya,Yamazaki Dai,Maruyama Ryuji,Hayashida Hirotoshi,Soyama Kazuhiko,Yamamura Kazuya, Proceedings of JSPE Semestrial Meeting, The Japan Society for Precision Engineering, Vol. 2012, No. 0, p. 1147-1148, 2012
  • 中性子集光用回転楕円ミラーの作製 第III報:小径パッドを用いた回転体石英マンドレルの形状修正と表面仕上げ, 山崎 健太,永野 幹典,山家 史也,山村 和也,丸山 龍治,林田 洋寿,山崎 大,曽山 和彦, 精密工学会学術講演会講演論文集, 公益社団法人 精密工学会, Vol. 2012, No. 0, p. 1149-1150, 2012
  • One-dimensional neutron focusing with large beam divergence by 400mm-long elliptical supermirror, M. Nagano,F. Yamaga,D. Yamazaki,R. Maruyama,H. Hayashida,K. Soyama,K. Yamamura, 5TH EUROPEAN CONFERENCE ON NEUTRON SCATTERING, IOP PUBLISHING LTD, Vol. 340, 2012
  • Single-nanometer focusing of hard x-rays by Kirkpatrick-Baez mirrors, Kazuto Yamauchi,Hidekazu Mimura,Takashi Kimura,Hirokatsu Yumoto,Soichiro Handa,Satoshi Matsuyama,Kenta Arima,Yasuhisa Sano,Kazuya Yamamura,Koji Inagaki,Hiroki Nakamori,Jangwoo Kim,Kenji Tamasaku,Yoshinori Nishino,Makina Yabashi,Tetsuya Ishikawa, JOURNAL OF PHYSICS: CONDENSED MATTER, Vol. 23, No. 39, p. 394206 1-394206 2, 2011/10
  • M. Nagano, F. Yamaga, D. Yamazaki, R. Maruyama, K. Soyama, K. Yamamura, High-precision figured,thin supermirror substrates for multiple neutron focusing device, Proceedings of 5th European Conference on Neutron Scattering, 2011/07
  • One-dimensional neutron focusing with large beam divergence by 400mm-long elliptical supermirror, M. Nagano,F. Yamaga,D. Yamazaki,R. Maruyama,K. Soyama,K. Yamamura, 5TH EUROPEAN CONFERENCE ON NEUTRON SCATTERING, IOP PUBLISHING LTD, Vol. 340, 2011/07
  • High-integrity finishing of reaction sintered SiC by plasma assisted polishing using ceria abrasive, K. Yamamura,M. Ueda,H. Deng,N. Zettsu, Proceedings of 11th International Conference of the European Society for Precision Engineering and Nanotechnology, Vol. pp.422-426., 2011/05
  • Plasma assisted polishing of single crystal SiC for obtaining atomically flat strain-free surface, K. Yamamura,T. Takiguchi,M. Ueda,H. Deng,A.N. Hattori,N. Zettsu, Annals of the CIRP, 60 (2011) 571-574., ELSEVIER SCIENCE BV, Vol. 60, No. 1, p. 571-574, 2011/05
  • 触媒フリー無電解銅めっきプロセスによるフッ素樹脂表面の高密着性銅メタライジング, 是津 信行,山村 和也, 大阪大学低温センターだより, 大阪大学低温センター, Vol. 154, p. 20-26, 2011/04
  • Fabrication of discrete polystyrene nanoparticle arrays with controllable their structural parameters, S. Uchida,K. Yamamura,N. Zettsu, J. Nanosci. Nanotechnol. 11 (2011) 2956-2961., AMER SCIENTIFIC PUBLISHERS, Vol. 11, No. 4, p. 2956-2961, 2011/04
  • Development of fabrication process for aspherical neutron focusing mirror using numerically controlled local wet etching with low-pressure polishing, M. Nagano,F. Yamaga,N. Zettsu,D. Yamazaki,R. Maruyama,K. Soyama,K. Yamamura, Nucl. Instr. and Meth., A 634 (2011) S112-S116., ELSEVIER SCIENCE BV, Vol. 634, p. S112-S116, 2011/04
  • Finishing of AT-Cut Quartz Crystal Wafer with Nanometric Thickness Uniformity by Pulse-Modulated Atmospheric Pressure Plasma Etching, Kazuya Yamamura,Masaki Ueda,Masafumi Shibahara,Nobuyuki Zettsu, JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, AMER SCIENTIFIC PUBLISHERS, Vol. 11, No. 4, p. 2922-2927, 2011/04
  • Simple and Versatile Route to High Yield Face-to-Face Dimeric Assembly of Ag Nanocubes and Their Surface Plasmonic Properties, Shuhei Uchida,Atsushi Taguchi,Munehisa Mitani,Taro Ichimura,Satoshi Kawata,Kazuya Yamamura,Nobuyuki Zettsu, JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, AMER SCIENTIFIC PUBLISHERS, Vol. 11, No. 4, p. 2890-2896, 2011/04
  • Improvement in Thickness Uniformity of Thick SOI by Numerically Controlled Local Wet Etching, Kazuya Yamamura,Kazuaki Ueda,Mao Hosoda,Nobuyuki Zettsu, JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, AMER SCIENTIFIC PUBLISHERS, Vol. 11, No. 4, p. 2910-2915, 2011/04
  • Thinning of 2-inch SiC wafer by plasma chemical vaporization machining using cylindrical rotary electrode, Yasuhisa Sano,Takehiro Kato,Kohei Aida,Kazuya Yamamura,Hidekazu Mimura,Satoshi Matsuyama,Kazuto Yamauchi, Materials Science Forum, TRANS TECH PUBLICATIONS LTD, Vol. 679-680, p. 481-+, 2011/04
  • Simple and versatile route to high yield face-to-face dimeric assembly of Ag nanocubes and their surface plasmonic properties, S. Uchida,A. Taguchi,M. Mitani,T. Ichimura,S. Kawata,K. Yamamura,N. Zettsu, , J. Nanosci. Nanotechnol. 11 (2011) 2890-2896., AMER SCIENTIFIC PUBLISHERS, Vol. 11, No. 4, p. 2890-2896, 2011/04
  • Improvement in thickness uniformity of thick SOI by numerically controlled local wet etching, K. Yamamura,K. Ueda,M. Hosoda,N. Zettsu, J. Nanosci. Nanotechnol. 11 (2011) 2910-2915., AMER SCIENTIFIC PUBLISHERS, Vol. 11, No. 4, p. 2910-2915, 2011/04
  • Development of fabrication process for aspherical neutron focusing mirror using numerically controlled local wet etching with low-pressure polishing, M. Nagano,F. Yamaga,N. Zettsu,D. Yamazaki,R. Maruyama,K. Soyama,K. Yamamura, NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT, ELSEVIER SCIENCE BV, Vol. 634, p. S112-S116, 2011/04
  • Finishing of AT-cut quartz crystal wafer with nanometric thickness uniformity by pulse-modulated atmospheric pressure plasma etching, K. Yamamura,M. Ueda,M. Shibahara,N. Zettsu, J. Nanosci. Nanotechnol. 11 (2011) 2922-2927., AMER SCIENTIFIC PUBLISHERS, Vol. 11, No. 4, p. 2922-2927, 2011/04
  • Fabrication of Discrete Polystyrene Nanoparticle Arrays with Controllable Their Structural Parameters, Shuhei Uchida,Kazuya Yamamura,Nobuyuki Zettsu, JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, AMER SCIENTIFIC PUBLISHERS, Vol. 11, No. 4, p. 2956-2961, 2011/04
  • 非対称構造を有するPS@Auナノシェルアレイの作製と近赤外プラズモン特性, 内田修平,田口敦清,南本大穂,津田哲哉,山村和也,是津信行, 応用物理学会学術講演会講演予稿集(CD-ROM), Vol. 72nd, 2011
  • Development of multiply-arranged elliptical neutron focusing supermirror device:Estimation of alignment accuracy by ray-trace simulation, Yamaga Fumiya,Nagano Mikinori,Zettsu Nobuyuki,Yamazaki Dai,Maruyama Ryuji,Hayashida Hirotoshi,Soyama Kazuhiko,Yamamura Kazuya, Proceedings of JSPE Semestrial Meeting, The Japan Society for Precision Engineering, Vol. 2011, No. 0, p. 503-504, 2011
  • Effect of Si interlayers on the magnetic and mechanical properties in Fe/Ge neutron polarizing multilayer mirror, maruyama ryuji,yamazaki dai,okayasu satoru,takeda masayasu,zettsu nobuyuki,nagano mikinori,yamamura kazuya,hayashida hirotoshi,soyama kazuhiko, Proceedings of Annual / Fall Meetings of Atomic Energy Society of Japan, Atomic Energy Society of Japan, Vol. 2011, No. 0, p. 122-122, 2011
  • Dicing of SiC wafer by PCVM (Plasma Chemical Vaporization Machining) with shadow mask, Nishikawa Hiroaki,Sano Yasuhisa,Aida Kouhei,Yamamura Kazuya,Matsuyama Satoshi,Yamauchi Kazuto, Proceedings of JSPE Semestrial Meeting, The Japan Society for Precision Engineering, Vol. 2011, No. 0, p. 509-510, 2011
  • High Adhesion PTFE/epoxy Interface Enabled by Exotic Plasmas-assisted Morphological and Molecular Designs, Y. Idutsu,N. Zettsu,K. Yamamura, Proceedings of the Eleventh International Symposium on Biomimetic Materials Processing (BMMP-11)(2010)P-36., 2011/01
  • Thinning of 2-inch SiC Wafer by Plasma Chemical Vaporization Machining Using Cylindrical Rotary Electrode, Yasuhisa Sano,Takehiro Kato,Kohei Aida,Kazuya Yamamura,Hidekazu Mimura,Satoshi Matsuyama,Kazuto Yamauchi, SILICON CARBIDE AND RELATED MATERIALS 2010, TRANS TECH PUBLICATIONS LTD, Vol. 679-680, p. 481-+, 2011
  • Plasma assisted polishing of single crystal SiC for obtaining atomically flat strain-free surface, K. Yamamura,T. Takiguchi,M. Ueda,H. Deng,A. N. Hattori,N. Zettsu, CIRP ANNALS-MANUFACTURING TECHNOLOGY, ELSEVIER SCIENCE BV, Vol. 60, No. 1, p. 571-574, 2011
  • High Adhesion PTFE/epoxy Interface Enabled by Exotic Plasmas-assisted Morphological and Molecular Designs, Proceedings of the Eleventh International Symposium on Biomimetic Materials Processing (BMMP-11)(2010)P-36., 2011
  • M. Nagano, F. Yamaga, D. Yamazaki, R. Maruyama, K. Soyama, K. Yamamura, Proceedings of 5th European Conference on Neutron Scattering, 2011
  • Neutron beam focusing using large-m supermirrors coated on precisely-figured aspheric surfaces, D. Yamazaki,R. Maruyama,K. Soyama,H. Takai,M. Nagano,K. Yamamura, J. Phys. Conf. Ser. 251 (2010) 012076_1_4., IOP PUBLISHING LTD, Vol. 251, 2010/12
  • Fabrication of plano-elliptical neutron focusing supermirror by numerically controlled local wet etching with ion beam sputter deposition, M Nagano,H Takai,D Yamazaki,R Maruyama,K Soyama,K Yamamura, J. Phys. Conf. Ser. 251 (2010) 012077_1_4., IOP PUBLISHING LTD, Vol. 251, 2010/12
  • Atmospheric pressure plasma liquid deposition of copper nanoparticles onto poly(4-vinylpyridine)-grafted-poly(tetrafluoroethylene) surface, Hiroki Akiyama,Kazuya Yamamura,Nobuyuki Zettsu, Transactions of MRS-J, 35 (2010) pp.817-820., Vol. Transactions of MRS-J, 35 (2010) pp.817-820., 2010/12
  • Figuring of Damage-Free Cylindrical Silicon Crystal Substrate for a Focusing X-ray Spectrometer by Plasma Chemical Vaporization Machining, M. Hosoda,M. Nagano,N. Zettsu,S. Shimada,K. Taniguchi,K. Yamamura, Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology, P-7, 72-73., Vol. P-7, 72-73., 2010/11
  • Fabrication of High-Precision Elliptical Neutron Focusing Supermirror with Large Clear Aperture, M. Nagano,F. Yamaga,N. Zettsu,D. Yamazaki,R. Maruyama,K. Soyama,K. Yamamura, Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication, P-11, 80-81., Vol. P-11, 80-81., 2010/11
  • Shape Control Synthesis of QDs with Chemical Composition Gradients for Light Emitting Devices, U. Farva,K. Yamamura,N. Zettsu, Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology, P-32, 122-123., Vol. P-32, 122-123., 2010/11
  • Atmospheric Pressure Plasma Liquid Deposition of Copper Nanoparticles onto Poly(4-vinylpyrdine)-grafted-poly (tetrafluoroethylente) Surface, H. Akiyama,Y. Oshikane,N. Zettsu,K. Yamamura, Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology, P-57, 172-173., Vol. P-57, 172-173., 2010/11
  • Machining Properties of Reaction-Sintered Silicon Carbide by Plasma Assisted Machining, M. Ueda,S. Morinaga,H. Deng,N. Zettsu,K. Yamamura, Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology, P-65, 188-189., Vol. P-65, 188-189., 2010/11
  • Thinning of SiC Wafer by Plasma Chemical Vaporization Machining, K. Aida,Y. Sano,H. Nishikawa,K. Yamamura,H. Mimura,S. Matsuyama,K. Yamauchi, Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology, P-66, 190-191., Vol. P-66, 190-191., 2010/11
  • Development of Chemical Processing Methods for Silicon Carbide Wafering and Device Processing, Y. Sano,K. Yamamura,K. Arima,K. Yamauchi, Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology, 6.2, 54-55., Vol. 6.2, 54-55., 2010/11
  • Fabrication of Shape Controlled Metal Nanodot Arrays by Autonomous Liquid-phase Nanoscale Processing as well as Their Charge Injection Characteritics for Floating Nanodot Gate Memory, N. Zettsu,S. Matsuura,A. Watanabe,K. Yamamura,T. Hosoi,H. Watanabe, Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology, 4.4, 42-43., Vol. 4.4, 42-43., 2010/11
  • Fabrication of Ultraprecision Millimeter-thick Neutron Focusing Supermirror by Numerically Controlled Local Wet Etching and Low-pressure Polishing, F. Yamaga,M. Nagano,K. Yamasaki,N. Zettsu,D. Yamazaki,R. Maruyama,K. Soyama,K. Yamamura, Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology, P-3, 64-65., Vol. P-3, 64-65., 2010/11
  • Fabrication of Metallodielectric Plasmonic Nanoshell Arrays for A Label-Free Immunoassay Based on NIR-light Responsive LSPR, S. Uchida,K. Yamamura,N. Zettsu, Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology, P-12, 82-83., Vol. P-12, 82-83., 2010/11
  • Plasma Assisted Polishing of Reaction-Sintered Silicon Carbide, Kazuya Yamamura,Masaki Ueda,Tatsuya Takiguchi,Nobuyuki Zettsu, Proceedings of 25th Annual Meeting of the American Society for Precision Engineering (ASPE) 61-64., 2010/10
  • Surface Modification by Water Vapor Plasma for Damage-free Roughness Smoothing of 4H-SiC, Kazuya Yamamura,Tatsuya Takiguchi,Masaki Ueda,Azusa N. Hattori,Nobuyuki Zettsu, proceedings of 63rd Gaseous Electronics Conference (GEC) and 7th International Conference on Reactive Plasmas(ICRP),DTP-067, 2010/10
  • Catalyst-free electroless Cu plating of fluoropolymer surface through an atmospheric pressure plasma assisted self-assembly, Nobuyuki Zettsu,Hiroki Akiyama,Kazuya Yamamura, Proceedings of 63rd Gaseous Electronics Conference (GEC) and 7th International Conference on Reactive Plasmas(ICRP), DTP-069, 2010/10
  • Atmospheric pressure plasma liquid deposition of Cu nanoparticles onto P4VP-grafted-PTFE surface and their autocatalytic characteristics, Nobuyuki Zettsu,Hiroki Akiyama,Kazuya Yamamura, Proceedings of 63rd Gaseous Electronics Conference (GEC) and 7th International Conference on Reactive Plasmas(ICRP), ET3-003, 2010/10
  • Figuring of Millimeter-Thick Elliptical Mirror Substrate Using Numerically Controlled Local Wet Etching With Low-Pressure Polishing, M.Nagano,F.Yamaga,N.Zettsu,D.Yamazaki,R.Maruyama,K.Soyama,K.Yamamura, Proceedings of 25th Annual Meeting of the American Society for Precision Engineering (ASPE), 21-24., 2010/10
  • Fabrication of a single layer of polystyrene nanoparticle array, and their use as templates for NIR-light responsible metallodielectric plasmonic nanoshells, Shuhei Uchida,Kazuya Yamamura,Nobuyuki Zettsu, Proceedings of 63rd Gaseous Electronics Conference (GEC) and 7th International Conference on Reactive Plasmas(ICRP), DTP-068, 2010/10
  • Plasma assisted finishing of difficult-to-machine materials, Kazuya Yamamura, Proceedings of 2nd International Conference on Nanomanufacturing, nanaMan00189(Invited), 2010/09
  • Thinning of 2-inch SiC wafer by plasma chemical vaporization machining, Y. Sano,T. Kato,K. Yamamura,H. Mimura,S. Matsuyama,K. Yamauchi, Abstract Booklet of the 8th European Conference on Silicon Carbide and Related Materials, Vol. TP-155, 2010/08
  • Beveling of Silicon Carbide Wafer by Plasma Etching Using Atmospheric-Pressure Plasma, Yasuhisa Sano,Takehiro Kato,Kazuya Yamamura,Hidekazu Mimura,Satoshi Matsuyama,Kazuto Yamauchi, JAPANESE JOURNAL OF APPLIED PHYSICS, JAPAN SOC APPLIED PHYSICS, Vol. 49, No. 8, 2010/08
  • Dicing of SiC wafer by atmospheric-pressure plasma etching process with wire electrode, Yasuhisa Sano,Kohei Aida,Kazuya Yamamura,Hidekazu Mimura,Satoshi Matsuyama,Kazuto Yamauchi, 2010/08
  • Removal characteristics of plasma chemical vaporization machining with a pipe electrode for optical fabrication, Hideo Takino,Kazuya Yamamura,Yasuhisa Sano,Yuzo Mori, Appl. Opt. 49 (2010) 4434-4440., OPTICAL SOC AMER, Vol. 49, No. 23, p. 4434-4440, 2010/08
  • Removal characteristics of plasma chemical vaporization machining with a pipe electrode for optical fabrication, Hideo Takino,Kazuya Yamamura,Yasuhisa Sano,Yuzo Mori, APPLIED OPTICS, OPTICAL SOC AMER, Vol. 49, No. 23, p. 4434-4440, 2010/08
  • Beveling of Silicon Carbide Wafer by Plasma Etching Using Atmospheric-Pressure Plasma, Yasuhisa Sano,Takehiro Kato,Kazuya Yamamura,Hidekazu Mimura,Satoshi Matsuyama,Kazuto Yamauchi, Japanese Journal of Applied Physics, JAPAN SOC APPLIED PHYSICS, Vol. 49, No. 8, 2010/08
  • Development of Atmospheric-Pressure-Plasma-Assisted High-efficient and High-integrity Machining Process of Difficult-to-Machine Materials, K. Yamamura,T. Takiguchi,N. Zettsu, Proceedings of 10th International Conference of the European Society for Precision Engineering and Nanotechnology, 2010/06
  • Fabrication of Ultraprecision Millimeter-thick Elliptical Neutron Focusing Mirror Substrate by Local Wet Etching, Fumiya Yamaga,Mikinori Nagano,Nobuyuki Zettsu,Dai Yamazaki,Ryuji Maruyama,Kazuhiko Soyama,Kazuya Yamamura, Key Engineering Materials, 447-448 (2010) 208-212., TRANS TECH PUBLICATIONS LTD, Vol. 447-448, p. 208-+, 2010/06
  • Fabrication of Damage-free Curved Silicon Crystal Substrate for a Focusing X-ray Spectrometer by Plasma Chemical Vaporization Machining, Mao Hosoda,Kazuaki Ueda,Mikinori Nagano,Nobuyuki Zettsu,Shoichi Shimada,Kazuo Taniguchi,Kazuya Yamamura, Key Engineering Materials, 447-448 (2010) 213-217., TRANS TECH PUBLICATIONS LTD, Vol. 447-448, p. 213-+, 2010/06
  • Effect of Substrate Heating in Thickness Correction of Quartz Crystal Wafer by Plasma Chemical Vaporization Machining, Masaki Ueda,Masafumi Shibahara,Nobuyuki Zettsu,Kazuya Yamamura, Key Engineering Materials, 447-448 (2010) 218-222., TRANS TECH PUBLICATIONS LTD, Vol. 447-448, p. 218-+, 2010/06
  • Chemical machining processes using atmospheric pressure plasma, Yasuhisa Sano,Kazuya Yamamura,Kazuto Yamauchi, Optical and Electro-optical Engineering Contact, Vol. 第48巻 第6号, 2010/06
  • Fabrication of damage-free Johansson-type doubly curved crystal spectrometer substrate by numerically controlled local wet etching, K. Yamamura,K. Ueda,M. Nagano,N. Zettsu,S. Maeo,S. Shimada,T. Utaka,K. Taniguchi, NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT, ELSEVIER SCIENCE BV, Vol. 616, No. 2-3, p. 281-284, 2010/05
  • High-reflectivity (m=4) elliptical neutron focusing supermirror fabricated by numerically controlled local wet etching with ion beam sputter deposition, K. Yamamura,M. Nagano,N. Zettsu,D. Yamazaki,R. Maruyama,K. Soyama, NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT, ELSEVIER SCIENCE BV, Vol. 616, No. 2-3, p. 193-196, 2010/05
  • Fabrication of damage-free Johansson-type doubly curved crystal spectrometer substrate by numerically controlled local wet etching, K. Yamamura,K. Ueda,M. Nagano,N. Zettsu,S. Maeo,S. Shimada,T. Utaka,K. Taniguchi, NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT, ELSEVIER SCIENCE BV, Vol. 616, No. 2-3, p. 281-284, 2010/05
  • High-reflectivity (m=4) elliptical neutron focusing supermirror fabricated by numerically controlled local wet etching with ion beam sputter deposition, K. Yamamura,M. Nagano,N. Zettsu,D. Yamazaki,R. Maruyama,K. Soyama, NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT, ELSEVIER SCIENCE BV, Vol. 616, No. 2-3, p. 193-196, 2010/05
  • High-precision damage-free fabrication of quartz crystal wafer by plasma chemical vaporization machining, Kazuya Yamamura, Journal of the Japan Society for Abrasive Technology, Vol. 54, No. 5, p. 276-279, 2010/05
  • Atmospheric pressure plasma liquid deposition of copper nanoparticles on poly(4-vinylpyridine)-grafted-poly(tetrafluoroethylene) surface and their autocatalytic properties, Hiroki Akiyama,Nobuyuki Zettsu,Kazuya Yamamura, THIN SOLID FILMS, ELSEVIER SCIENCE SA, Vol. 518, No. 13, p. 3551-3554, 2010/04
  • Fabrication of discrete array of metallodielectric nanoshells and their surface plasmonic properties, Shuhei Uchida,Kazuya Yamamura,Nobuyuki Zettsu, THIN SOLID FILMS, ELSEVIER SCIENCE SA, Vol. 518, No. 13, p. 3581-3584, 2010/04
  • Atmospheric pressure plasma liquid deposition of copper nanoparticles on poly(4-vinylpyridine)-grafted-poly(tetrafluoroethylene) surface and their autocatalytic properties, Hiroki Akiyama,Nobuyuki Zettsu,Kazuya Yamamura, Thin Solid Films, 518 (2010) 3351-3354., ELSEVIER SCIENCE SA, Vol. 518, No. 13, p. 3551-3554, 2010/04
  • Fabrication of discrete array of metallodielectric nanoshells and their surface plasmonic properties, Shuhei Uchida,Kazuya Yamamura,Nobuyuki Zettsu, Thin Solid Films, 518 (2010) 3581-3584., ELSEVIER SCIENCE SA, Vol. 518, No. 13, p. 3581-3584, 2010/04
  • Atmospheric pressure plasma liquid deposition of copper nanoparticles on poly(4-vinylpyridine)-grafted-poly(tetrafluoroethylene) surface and their autocatalytic properties, Hiroki Akiyama,Nobuyuki Zettsu,Kazuya Yamamura, THIN SOLID FILMS, ELSEVIER SCIENCE SA, Vol. 518, No. 13, p. 3551-3554, 2010/04
  • Fabrication of 400 mm-long elliptical neutron focusing supermirror by local wet etching with ion beam sputter deposition, M. Nagano,F. Yamaga,N. Zettsu,D. Yamazaki,R. Maruyama,K. Soyama,K. Yamamura, 2010/03
  • Focusing Devices using Spheroidal Supermirrors, K. Soyama,D. Yamazaki,R. Maruyama,M. Nagano,F. Yamaga,N. Zettsu,K. Yamamura, 2010/03
  • Breaking the 10 nm barrier in hard-X-ray focusing, Hidekazu Mimura,Soichiro Handa,Takashi Kimura,Hirokatsu Yumoto,Daisuke Yamakawa,Hikaru Yokoyama,Satoshi Matsuyama,Kouji Inagaki,Kazuya Yamamura,Yasuhisa Sano,Kenji Tamasaku,Yoshinori Nishino,Makina Yabashi,Tetsuya Ishikawa,Kazuto Yamauchi, NATURE PHYSICS, NATURE PUBLISHING GROUP, Vol. 6, No. 2, p. 122-125, 2010/02
  • 24pWZ-6 Wide-band neutron focusing with a high precision elliptic supermirror, Yamazaki D.,Maruyama R.,Hayashida H.,Soyama K.,Nagano M.,Yamaga F.,Yamamura K., Meeting Abstracts of the Physical Society of Japan, The Physical Society of Japan, Vol. 65, No. 0, p. 913-913, 2010
  • PCVM (Plasma Chemical Vaporization Machining)を用いた2インチSiC基板の全面加工, 会田 浩平,佐野 泰久,西川 央明,山村 和也,三村 秀和,松山 智至,山内 和人, 精密工学会学術講演会講演論文集, Vol. 2010, No. 0, p. 735-736, 2010
  • Crystal Growth Technology (Chapter 18; Crystal Machining Using Atmospheric Pressure Plasma), WILEY-VCH, 2010
  • Fabrication of a single layer of polystyrene nanoparticle array, and their use as templates for NIR-light responsible metallodielectric plasmonic nanoshells, Proceedings of 63rd Gaseous Electronics Conference (GEC) and 7th International Conference on Reactive Plasmas(ICRP), DTP-068, 2010
  • Fabrication of Metallodielectric Plasmonic Nanoshell Arrays for A Label-Free Immunoassay Based on NIR-light Responsive LSPR, Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology, P-12, 82-83., Vol. P-12, 82-83., 2010
  • Fabrication of plano-elliptical neutron focusing supermirror by numerically controlled local wet etching with ion beam sputter deposition, M. Nagano,H. Takai,D. Yamazaki,R. Maruyama,K. Soyama,K. Yamamura, INTERNATIONAL CONFERENCE ON NEUTRON SCATTERING 2009, IOP PUBLISHING LTD, Vol. 251, 2010
  • Thinning of SiC wafer by plasma chemical vaporization machining, Yasuhisa Sano,Takehiro Kato,Tsutomu Hori,Kazuya Yamamura,Hidekazu Mimura,Yoshiaki Katsuyama,Kazuto Yamauchi, Material Science Forum, 645-648 (2010) 857-860., TRANS TECH PUBLICATIONS LTD, Vol. 645-648, p. 857-+, 2010/01
  • Fabrication of plano-elliptical neutron focusing supermirror by numerically controlled local wet etching with ion beam sputter deposition, M. Nagano,H. Takai,D. Yamazaki,R. Maruyama,K. Soyama,K. Yamamura, INTERNATIONAL CONFERENCE ON NEUTRON SCATTERING 2009, IOP PUBLISHING LTD, Vol. 251, 2010
  • Focusing Devices using Spheroidal Supermirrors, 2010
  • プラズマCVMによる水晶ウエハの高精度ダメージフリー加工, 砥粒加工学会誌 Vol.54 (2010) 276-279., Vol. Vol.54, No.5 (2010) 276-279., 2010
  • Fabrication of Damage-free Curved Silicon Crystal Substrate for a Focusing X-ray Spectrometer by Plasma Chemical Vaporization Machining, Mao Hosoda,Kazuaki Ueda,Mikinori Nagano,Nobuyuki Zettsu,Shoichi Shimada,Kazuo Taniguchi,Kazuya Yamamura, ADVANCED PRECISION ENGINEERING, TRANS TECH PUBLICATIONS LTD, Vol. 447-448, p. 213-+, 2010
  • Effect of Substrate Heating in Thickness Correction of Quartz Crystal Wafer by Plasma Chemical Vaporization Machining, Masaki Ueda,Masafumi Shibahara,Nobuyuki Zettsu,Kazuya Yamamura, ADVANCED PRECISION ENGINEERING, TRANS TECH PUBLICATIONS LTD, Vol. 447-448, p. 218-+, 2010
  • 大気圧プラズマによるエッチングを応用した種々の加工法とその特性, 光技術コンタクト, Vol. 第48巻 第6号, 2010
  • Dicing of SiC wafer by atmospheric-pressure plasma etching process with wire electrode, 2010
  • Thinning of 2-inch SiC wafer by plasma chemical vaporization machining, Abstract Booklet of the 8th European Conference on Silicon Carbide and Related Materials, Vol. TP-155, 2010
  • Crystal Growth Technology (Chapter 18; Crystal Machining Using Atmospheric Pressure Plasma), WILEY-VCH, 2010
  • Plasma assisted finishing of difficult-to-machine materials, Proceedings of 2nd International Conference on Nanomanufacturing, nanaMan00189(Invited), 2010
  • Plasma Assisted Polishing of Reaction-Sintered Silicon Carbide, Proceedings of 25th Annual Meeting of the American Society for Precision Engineering (ASPE) 61-64., 2010
  • Figuring of Millimeter-Thick Elliptical Mirror Substrate Using Numerically Controlled Local Wet Etching With Low-Pressure Polishing, Proceedings of 25th Annual Meeting of the American Society for Precision Engineering (ASPE), 21-24., 2010
  • Surface Modification by Water Vapor Plasma for Damage-free Roughness Smoothing of 4H-SiC, proceedings of 63rd Gaseous Electronics Conference (GEC) and 7th International Conference on Reactive Plasmas(ICRP),DTP-067, 2010
  • Catalyst-free electroless Cu plating of fluoropolymer surface through an atmospheric pressure plasma assisted self-assembly, Proceedings of 63rd Gaseous Electronics Conference (GEC) and 7th International Conference on Reactive Plasmas(ICRP), DTP-069, 2010
  • Atmospheric pressure plasma liquid deposition of Cu nanoparticles onto P4VP-grafted-PTFE surface and their autocatalytic characteristics, Proceedings of 63rd Gaseous Electronics Conference (GEC) and 7th International Conference on Reactive Plasmas(ICRP), ET3-003, 2010
  • Fabrication of High-Precision Elliptical Neutron Focusing Supermirror with Large Clear Aperture, Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication, P-11, 80-81., Vol. P-11, 80-81., 2010
  • Shape Control Synthesis of QDs with Chemical Composition Gradients for Light Emitting Devices, Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology, P-32, 122-123., Vol. P-32, 122-123., 2010
  • Atmospheric Pressure Plasma Liquid Deposition of Copper Nanoparticles onto Poly(4-vinylpyrdine)-grafted-poly (tetrafluoroethylente) Surface, Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology, P-57, 172-173., Vol. P-57, 172-173., 2010
  • Machining Properties of Reaction-Sintered Silicon Carbide by Plasma Assisted Machining, Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology, P-65, 188-189., Vol. P-65, 188-189., 2010
  • Thinning of SiC Wafer by Plasma Chemical Vaporization Machining, Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology, P-66, 190-191., Vol. P-66, 190-191., 2010
  • Figuring of Damage-Free Cylindrical Silicon Crystal Substrate for a Focusing X-ray Spectrometer by Plasma Chemical Vaporization Machining, Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology, P-7, 72-73., Vol. P-7, 72-73., 2010
  • Development of Chemical Processing Methods for Silicon Carbide Wafering and Device Processing, Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology, 6.2, 54-55., Vol. 6.2, 54-55., 2010
  • Fabrication of Shape Controlled Metal Nanodot Arrays by Autonomous Liquid-phase Nanoscale Processing as well as Their Charge Injection Characteritics for Floating Nanodot Gate Memory, Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology, 4.4, 42-43., Vol. 4.4, 42-43., 2010
  • Fabrication of Ultraprecision Millimeter-thick Neutron Focusing Supermirror by Numerically Controlled Local Wet Etching and Low-pressure Polishing, Extended Abstracts of Third International Symposium on Atomically Controlled Fabrication Technology, P-3, 64-65., Vol. P-3, 64-65., 2010
  • Neutron beam focusing using large-m supermirrors coated on precisely-figured aspheric surfaces, D. Yamazaki,R. Maruyama,K. Soyama,H. Takai,M. Nagano,K. Yamamura, INTERNATIONAL CONFERENCE ON NEUTRON SCATTERING 2009, IOP PUBLISHING LTD, Vol. 251, 2010
  • Thinning of SiC wafer by plasma chemical vaporization machining, Yasuhisa Sano,Takehiro Kato,Tsutomu Hori,Kazuya Yamamura,Hidekazu Mimura,Yoshiaki Katsuyama,Kazuto Yamauchi, SILICON CARBIDE AND RELATED MATERIALS 2009, PTS 1 AND 2, TRANS TECH PUBLICATIONS LTD, Vol. 645-648, p. 857-+, 2010
  • Development of Atmospheric-Pressure-Plasma-Assisted High-efficient and High-integrity Machining Process of Difficult-to-Machine Materials, Proceedings of 10th International Conference of the European Society for Precision Engineering and Nanotechnology, 2010
  • Fabrication of Ultraprecision Millimeter-thick Elliptical Neutron Focusing Mirror Substrate by Local Wet Etching, Fumiya Yamaga,Mikinori Nagano,Nobuyuki Zettsu,Dai Yamazaki,Ryuji Maruyama,Kazuhiko Soyama,Kazuya Yamamura, ADVANCED PRECISION ENGINEERING, TRANS TECH PUBLICATIONS LTD, Vol. 447-448, p. 208-+, 2010
  • High-precision finishing of AT-cut quartz crystal wafer by plasma chemical vaporization machining, M. Ueda,M. Nagano,N. Zettsu,M. Shibahara,K. Yamamura, 3rd International Conference of Asian Society for Precision Engineering and Nanotechnology, Vol. 1P2-6, 2009/11
  • Improvement of Thickness Uniformity of SOI Layer by Numerically Controlled Local Wet Etching, K. Ueda,M. Hosoda,M. Nagano,N. Zettsu,K. Yamamura, 3rd International Conference of Asian Society for Precision Engineering and Nanotechnology, Vol. 2C-12, 2009/11
  • Dicing of SiC Wafer by Plasma Chemical Vaporization Machining with Wire Electrode, K. Aida,Y. Sano,K. Yamamura,H. Mimura,S. Matsuyama,K. Yamauchi, Second International Symposium on Atomically Controlled Fabrication Technology, Vol. pp. 188-189., 2009/11
  • Improvement of thickness uniformity of thick-SOI by numerically controlled local wet etching, K. Ueda,M. Hosoda,M. Nagano,N. Zettsu,K. Yamamura, Second International Symposium on Atomically Controlled Fabrication Technology, Vol. pp. 180-181., 2009/11
  • High-precision correction of thickness distribution of AT-cut quartz crystal wafer by pulse-modulated atmospheric pressure plasma etching, M. Ueda,M. Nagano,N. Zettsu,M. Shibahara,K. Yamamura, Second International Symposium on Atomically Controlled Fabrication Technology, Vol. pp. 178-179., 2009/11
  • Fabrication of non-close packed periodic polymer nanoparticle arrays controllable their structural parameters, S. Uchida,N. Zettsu,K. Yamamura, 3rd International Conference of Asian Society for Precision Engineering and Nanotechnology, Vol. 2C-14, 2009/11
  • Atmospheric pressure plasma liquid deposition of copper nanoparticles on poly(4-vinylpyridine)-grafted-poly(tetrafluoroethylene) surface and their autocatalytic properties, H. Akiyama,K. Yamamura,N. Zettsu, Second International Symposium on Atomically Controlled Fabrication Technology, Vol. pp. 176-177., 2009/11
  • Fabrication of high-precision elliptical mirror substrate for neutron focusing by numerically controlled local wet etching, M. Nagano,F. Yamaga,Y. Yamamoto,N. Zettsu,D. Yamazaki,R. Maruyama,K. Soyama,K. Yamamura, Second International Symposium on Atomically Controlled Fabrication Technology, Vol. pp. 182-183, 2009/11
  • Fabrication of discrete array of metallodielectric nanoshells controllable their surface plasmonic properties, S. Uchida,K. Yamamura,N. Zettsu, Second International Symposium on Atomically Controlled Fabrication Technology, Vol. pp. 186-187., 2009/11
  • Fabrication of thin plano-elliptical neutron focusing mirror substrate by numerically controlled local wet etching, M. Nagano,F. Yamaga,Y. Yamamoto,N. Zettsu,D.Yamazaki,R. Maruyama,K. Soyama,K. Yamamura, 3rd International Conference of Asian Society for Precision Engineering and Nanotechnology, 2009/11
  • Thinning of SiC wafer by plasma chemical vaporization machining, Y. Sano,T. Kato,T. Hori,K. Yamamura,H. Mimura,Y. Katsuyama,K. Yamauchi, Technical Digest of International Conference on Silicon Carbide and Related Materials 2009, Vol. II-108, 2009/10
  • Fabrication of Damage-Free Johansson-Type Doubly Curved Crystal Spectrometer Substrate by Numerically Controlled Local Wet Etching, K. Ueda,M. Nagano,N. Zettsu,S. Maeo,S. Shimada,T. Utaka,K. Taniguchi,K. Yamamura, Vol. pp.46-47, 2009/09
  • High-reflectivity (m=4) elliptical neutron focusing supermirror fabricated by numerically controlled local wet etching with ion beam sputter deposition, M. Nagano,N. Zettsu,D. Yamazaki,R. Maruyama,K. Soyama,K. Yamamura, 2009/09
  • Beveling of Silicon Carbide Wafer by Plasma Etching Using Atmospheric-Pressure Plasma, Y. Sano,T. Kato,K. Yamamura,H. Mimura,S. Matsuyama,K. Yamauchi, Proceedings of 31st International Symposium on Dry Process, Vol. 215-216, 2009/09
  • Novel Scheme of Figure-Error Correction for X-ray Nanofocusing Mirror, Soichiro Handa,Hidekazu Mimura,Hirokatsu Yumoto,Takashi Kimura,Satoshi Matsuyama,Yasuhisa Sano,Kazuya Yamamura,Kenji Tamasaku,Yoshinori Nishino,Makina Yabashi,Tetsuya Ishikawa,Kazuto Yamauchi, Japanese Journal of Applied Physics, 48 (2009) 096507-1_4., JAPAN SOC APPLIED PHYSICS, Vol. 48, No. 9, 2009/09
  • Fabrication of High-Precision Curved Crystal Substrate for Johansson-Type Doubly Curved Crystal by Numerically Controlled Local Wet Etching, K. Yamamura,K. Ueda,M. Nagano,N. Zettsu,S. Maeo,S. Shimada,T. Utaka,K. Taniguchi, Book of Abstracts, P52., Vol. Book of Abstracts, P52., 2009/07
  • High Efficient Damage-Free Correction of Thickness Distribution of Quartz Crystal Wafer by Atmospheric Pressure Plasma Etching, Kazuya yamamura,Tetsuya Morikawa,Masaki Ueda,Mikinori nagano,Nobuyuki Zettsu,Masafumi Shibahara, IEEE Trans. Ultrason. Ferroelectr. Freq. Contro, Vol.56 (2009) pp.1128-1130., IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC, Vol. 56, No. 6, p. 1128-1130, 2009/06
  • Highly Efficient Damage-Free Correction of Thickness Distribution of Quartz Crystal Wafers by Atmospheric Pressure Plasma Etching, Kazuya Yamamura,Tetsuya Morikawa,Masaki Ueda,Mikinori Nagano,Nobuyuki Zettsu,Masafumi Shibahara, IEEE TRANSACTIONS ON ULTRASONICS FERROELECTRICS AND FREQUENCY CONTROL, IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC, Vol. 56, No. 6, p. 1128-1130, 2009/06
  • Two-stage figuring using numerically controlled local wet etching for high-efficiency fabrication of plano-aspherical mirror, K. Yamamura,M. Nagano,H. Takai,D. Yamazaki,R. Maruyama,K. Soyama, Proceedings of 9th International Conference of the European Society for Precision Engineering and Nanotechnology, Vol. pp. 30-33., 2009/06
  • Figuring of plano-elliptical neutron focusing mirror by local wet etching, Kazuya Yamamura,Mikinori Nagano,Hiroyuki Takai,Nobuyuki Zettsu,Dai Yamazaki,Ryuji Maruyama,Kazuhiko Soyama,Shoichi Shimada, OPTICS EXPRESS, OPTICAL SOC AMER, Vol. 17, No. 8, p. 6414-6420, 2009/04
  • Figuring of plano-elliptical neutron focusing mirror by local wet etching, Kazuya Yamamura,Mikinori Nagano,Hiroyuki Takai,Nobuyuki Zettsu,Dai Yamazaki,Ryuji Maruyama,Kazuhiko Soyama,Shoichi Shimada, Optics Express, OPTICAL SOC AMER, Vol. 17, No. 8, p. 6414-6420, 2009/04
  • Improvement of Thickness Uniformity of Bulk Silicon Wafer by Numerically Controlled Local Wet Etching, Mikinori Nagano,Takuro Mitani,Kazuaki Ueda,Nobuyuki Zettsu,Kazuya Yamamura, Jounal of Crystal Growth Vol.311(2009)pp.2560-2563., TRANS TECH PUBLICATIONS LTD, Vol. 407-408, p. 372-375, 2009/04
  • Etching of GaN by plasma chemical vaporization machining, Yasuji Nakahama,Norio Kanetsuki,Takeshi Funaki,Masaru Kadono,Yasuhisa Sano,Kazuya Yamamura,Katsuyoshi Endo,Yuzo Mori, 2009/03
  • Beveling of Silison Carbide Wafer by Plasma Chemical Vaporization Machining, Takehiro Kato,Yasuhisa Sano,Hideyuki Hara,Hidekazu Mimura,Kazuya Yamamura,Kazuto Yamauchi, Materials Science Forum, Vol. Vols. 600-603, pp 843-846, 2009/02
  • Development of the holizonatl drive controlled nano-coater for making single layer of densely-packed polymeric nanoparticle arrays, K. Manabe,K. Yamamura,N. Zettsu, First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing -, Vol. P3.5, pp.128-129., 2009/02
  • Surface metallization of PTFE substrate through atmospheric pressure plasma liquid deposition approach, H. Akiyama,N. Zettsu,K. Yamamura, First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing -, Vol. P3.2, pp.122-123., 2009/02
  • Figuring of plano-elliptical hard X-ray focusing mirror by 1-dimensional numerically controlled local wet etching, First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing -, M. Nagano,H. Takai,N. Zettsu,K. Yamamura, P2.19, pp.92-93., 2009/02
  • Improvement of thickness distribution of bulk silicon wafer and SOI by numerically controlled local wet etching, T. Mitani,M. Nagano,K. Ueda,N. Zettsu,K. Yamamura, First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing -, Vol. P2.17, pp.88-89., 2009/02
  • Development of plano-elliptical neutron focusing supermirror by numerically controlled local wet etching, First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing -, M. Nagano,H. Takai,N. Zettsu,D. Yamazaki,R. Maruyama,K. Soyama,K. Yamamura, First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing -, Vol. P2.18, pp.90-91., 2009/02
  • Temperature Dependence of Plasma Chemical Vaporization Machining of Silicon and Silicon Carbide, Yasuhisa Sano,Masayo Watanabe,Takehiro Kato,Kazuya Yamamura,Hidekazu Mimura,Kazuto Yamauchi, Materials Science Forum, Vol. Vols. 600-603, pp 847-850, 2009/02
  • Development of Johansson-type doubly-curved-crystal by numerically controlled local wet etching, K. Ueda,M. Nagano,N. Zettsu,S. Maeo,S. Shimada,T. Udaka,K. Taniguchi,K. Yamamura, First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing -, Vol. P2.20, pp.94-95., 2009/02
  • Novel scheme of figure-error correction for X-ray nanofocusing mirror, Soichiro Handa,Hidekazu Mimura,Hirokatsu Yumoto,Takashi Kimura,Satoshi Matsuyama,Yasuhisa Sano,Kazuya Yamamura,Kenji Tamasaku,Yoshinori Nishino,Makina Yabashi,Tetsuya Ishikawa,Kazuto Yamauchi, Japanese Journal of Applied Physics, Vol. 48, No. 9, p. 0965071-0965074, 2009
  • 大気圧プラズマ 基礎と応用 6.7.5 マイクロ/ナノ加工 日本学術振興会プラズマ材料科学第153委員会, オーム社, Vol. 6.7.5 マイクロ, No. ナノ加工(p.357-362), 2009
  • 次世代パワー半導体 -省エネルギー社会に向けたデバイス開発の最前線- 第1章第1節2 PCVMを用いたSiC基板の薄化, (株)エヌ・ティー・エス, Vol. pp. 57-66, 2009
  • Fabrication of discrete array of metallodielectric nanoshells controllable their surface plasmonic properties, Second International Symposium on Atomically Controlled Fabrication Technology, Vol. pp. 186-187., 2009
  • Fabrication of thin plano-elliptical neutron focusing mirror substrate by numerically controlled local wet etching, 3rd International Conference of Asian Society for Precision Engineering and Nanotechnology, 2009
  • ローカルウエットエッチング法による超精密非接触加工, 山村和也, 月刊ディスプレイ Vol. 15, No. 1(2009) pp. 40-44., Vol. Vol. 15, No. 1(2009) pp. 40-44., 2009/01
  • Temperature Dependence of Plasma Chemical Vaporization Machining of Silicon and Silicon Carbide, Yasuhisa Sano,Masayo Watanabe,Takehiro Kato,Kazuya Yamamura,Hidekazu Mimura,Kazuto Yamauchi, SILICON CARBIDE AND RELATED MATERIALS 2007, PTS 1 AND 2, TRANS TECH PUBLICATIONS LTD, Vol. 600-603, p. 847-+, 2009
  • Development of Johansson-type doubly-curved-crystal by numerically controlled local wet etching, First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing -, Vol. P2.20, pp.94-95., 2009
  • Improvement of Thickness Uniformity of Bulk Silicon Wafer by Numerically Controlled Local Wet Etching, Kazuya Yamamura,Takuro Mitani,Kazuaki Ueda,Mikinori Nagano,Nobuyuki Zettsu, PROGRESS OF MACHINING TECHNOLOGY, TRANS TECH PUBLICATIONS LTD, Vol. 407-408, p. 372-375, 2009
  • High-Efficient Damage-Free Correction of the Thickness Distribution of Quartz Crystal Wafer Using Open-Air Type Plasma CVM, Kazuya Yamamura,Tetsuya Morikawa,Masaki Ueda, PROGRESS OF MACHINING TECHNOLOGY, TRANS TECH PUBLICATIONS LTD, Vol. 407-408, p. 343-346, 2009
  • Figuring of Elliptical Neutron Focusing Mirror Using Numerically Controlled Local Wet Etching, Mikinori Nagano,Hiroyuki Takai,Kazuya Yamamura,Dai Yamazaki,Ryuji Maruyama,Kazuhiko Soyama, PROGRESS OF MACHINING TECHNOLOGY, TRANS TECH PUBLICATIONS LTD, Vol. 407-408, p. 376-+, 2009
  • Two-stage figuring using numerically controlled local wet etching for high-efficiency fabrication of plano-aspherical mirror, Proceedings of 9th International Conference of the European Society for Precision Engineering and Nanotechnology, Vol. pp. 30-33., 2009
  • Improvement of Thickness Uniformity of Bulk Silicon Wafer by Numerically Controlled Local Wet Etching, Kazuya Yamamura,Takuro Mitani,Kazuaki Ueda,Mikinori Nagano,Nobuyuki Zettsu, PROGRESS OF MACHINING TECHNOLOGY, TRANS TECH PUBLICATIONS LTD, Vol. 407-408, p. 372-375, 2009
  • Beveling of Silicon Carbide Wafer by Plasma Etching Using Atmospheric-Pressure Plasma, Proceedings of 31st International Symposium on Dry Process, Vol. 215-216, 2009
  • Fabrication of Damage-Free Johansson-Type Doubly Curved Crystal Spectrometer Substrate by Numerically Controlled Local Wet Etching, Vol. pp.46-47, 2009
  • High-reflectivity (m=4) elliptical neutron focusing supermirror fabricated by numerically controlled local wet etching with ion beam sputter deposition, 2009
  • Thinning of SiC wafer by plasma chemical vaporization machining, Technical Digest of International Conference on Silicon Carbide and Related Materials 2009, Vol. II-108, 2009
  • High-precision finishing of AT-cut quartz crystal wafer by plasma chemical vaporization machining, 3rd International Conference of Asian Society for Precision Engineering and Nanotechnology, Vol. 1P2-6, 2009
  • Improvement of Thickness Uniformity of SOI Layer by Numerically Controlled Local Wet Etching, 3rd International Conference of Asian Society for Precision Engineering and Nanotechnology, Vol. 2C-12, 2009
  • Dicing of SiC Wafer by Plasma Chemical Vaporization Machining with Wire Electrode, Second International Symposium on Atomically Controlled Fabrication Technology, Vol. pp. 188-189., 2009
  • Improvement of thickness uniformity of thick-SOI by numerically controlled local wet etching, Second International Symposium on Atomically Controlled Fabrication Technology, Vol. pp. 180-181., 2009
  • High-precision correction of thickness distribution of AT-cut quartz crystal wafer by pulse-modulated atmospheric pressure plasma etching, Second International Symposium on Atomically Controlled Fabrication Technology, Vol. pp. 178-179., 2009
  • Fabrication of non-close packed periodic polymer nanoparticle arrays controllable their structural parameters, 3rd International Conference of Asian Society for Precision Engineering and Nanotechnology, Vol. 2C-14, 2009
  • Atmospheric pressure plasma liquid deposition of copper nanoparticles on poly(4-vinylpyridine)-grafted-poly(tetrafluoroethylene) surface and their autocatalytic properties, Second International Symposium on Atomically Controlled Fabrication Technology, Vol. pp. 176-177., 2009
  • Fabrication of high-precision elliptical mirror substrate for neutron focusing by numerically controlled local wet etching, Second International Symposium on Atomically Controlled Fabrication Technology, Vol. pp. 182-183, 2009
  • Beveling of Silicon Carbide Wafer by Plasma Chemical Vaporization Machining, Takehiro Kato,Yasuhisa Sano,Hideyuki Hara,Hidekazu Mimura,Kazuya Yamamura,Kazuto Yamauchi, SILICON CARBIDE AND RELATED MATERIALS 2007, PTS 1 AND 2, TRANS TECH PUBLICATIONS LTD, Vol. 600-603, p. 843-846, 2009
  • Development of the holizonatl drive controlled nano-coater for making single layer of densely-packed polymeric nanoparticle arrays, First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing -, Vol. P3.5, pp.128-129., 2009
  • Surface metallization of PTFE substrate through atmospheric pressure plasma liquid deposition approach, First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing -, Vol. P3.2, pp.122-123., 2009
  • Figuring of plano-elliptical hard X-ray focusing mirror by 1-dimensional numerically controlled local wet etching, First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing -, P2.19, pp.92-93., 2009
  • Development of plano-elliptical neutron focusing supermirror by numerically controlled local wet etching, First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing -, First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing -, Vol. P2.18, pp.90-91., 2009
  • Improvement of Thickness Uniformity of Bulk Silicon Wafer by Numerically Controlled Local Wet Etching, Kazuya Yamamura,Takuro Mitani,Kazuaki Ueda,Mikinori Nagano,Nobuyuki Zettsu, PROGRESS OF MACHINING TECHNOLOGY, TRANS TECH PUBLICATIONS LTD, Vol. 407-408, p. 372-375, 2009
  • High-Efficient Damage-Free Correction of the Thickness Distribution of Quartz Crystal Wafer Using Open-Air Type Plasma CVM, Kazuya Yamamura,Tetsuya Morikawa,Masaki Ueda, PROGRESS OF MACHINING TECHNOLOGY, TRANS TECH PUBLICATIONS LTD, Vol. 407-408, p. 343-346, 2009
  • Figuring of Elliptical Neutron Focusing Mirror Using Numerically Controlled Local Wet Etching, Mikinori Nagano,Hiroyuki Takai,Kazuya Yamamura,Dai Yamazaki,Ryuji Maruyama,Kazuhiko Soyama, PROGRESS OF MACHINING TECHNOLOGY, TRANS TECH PUBLICATIONS LTD, Vol. 407-408, p. 376-+, 2009
  • Improvement of thickness distribution of bulk silicon wafer and SOI by numerically controlled local wet etching, First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing -, Vol. P2.17, pp.88-89., 2009
  • Etching of GaN by plasma chemical vaporization machining, 2009
  • Etching characteristics of GaN by plasma chemical vaporization machining, Yasuji Nakahama,Norio Kanetsuki,Takeshi Funaki,Masaru Kadono,Yasuhisa Sano,Kazuya Yamamura,Katsuyoshi Endo, Surf. Interface Anal., JOHN WILEY & SONS LTD, Vol. 40, No. 12, p. 1566-1570, 2008/12
  • Etching characteristics of GaN by plasma chemical vaporization machining, Yasuji Nakahama,Norio Kanetsuki,Takeshi Funaki,Masaru Kadono,Yasuhisa Sano,Kazuya Yamamura,Katsuyoshi Endo,Yuzo Mori, SURFACE AND INTERFACE ANALYSIS, JOHN WILEY & SONS LTD, Vol. 40, No. 12, p. 1566-1570, 2008/12
  • Plasma Chemical Vaporization Machining and Elastic Emission Machining, Yasuhisa Sano,Kazuya Yamamura,Hidekazu Mimura,Kazuto Yamauchi,Yuzo Mori, Crystal Growth Technology: From Fundamentals and Simulation to Large-scale Production, Wiley-VCH Verlag GmbH &amp; Co. KGaA, p. 475-495, 2008/11/25
  • Improvement of Thickness Uniformity of Silicon and SOI Wafer by Numerically Controlled Local Wet Etching, Kazuya Yamamura,Takuro Mitani,Nobuyuki Zettsu, Proceedings of 23rd ASPE Annual Meeting and 12th ICPE, Vol. Proceedings of 23rd ASPE Annual Meeting and 12th ICPE, pp.538-541., 2008/10
  • The Disecrete Polystylene-Gold Core-Shell Nanoparticles Array And Their Surface Plasmonic Properties, Nobuyuki Zettsu,Shuhei Uchida,Kazuya Yamamura, Proceedings of 23rd ASPE Annual Meeting and 12th ICPE, Vol. Proceedings of 23rd ASPE Annual Meeting and 12th ICPE, pp. 500-501., 2008/10
  • 光医療用ナノ粒子造影剤の開発~銀ナノキューブダイマーの合成とプラズモニック特性~, 内田修平,三谷宗久,山村和也,遠藤勝義,是津信行,市村垂生,田口敦清,河田聡, 応用物理学会学術講演会講演予稿集, Vol. 69th, No. 3, 2008/09/02
  • Neutron-Beam Focusing with a Large-m Supermirror on a High-Precision Ellipsoidal Surface, D. Yamazaki,R. Maruyama,K. Soyama,H. Takai,K. Yamamura, The 7th International Workshop on Polarized Neutrons in Condensed Matter Investigations, PNCMI2008, pp.41., 2008/09
  • Surface functionalization of PTFE sheet through atmospheric pressure plasma liquid deposition approach, Nobuyuki Zettsu,Hiroto Itoh,Kazuya Yamamura, SURFACE & COATINGS TECHNOLOGY, ELSEVIER SCIENCE SA, Vol. 202, No. 22-23, p. 5284-5288, 2008/08
  • Plasma-chemical surface functionalization of flexible substrates at atmospheric pressure, Nobuyuki Zettsu,Hiroto Itoh,Kazuya Yamamura, THIN SOLID FILMS, ELSEVIER SCIENCE SA, Vol. 516, No. 19, p. 6683-6687, 2008/08
  • Surface functionalization of PTFE sheet through atmospheric pressure plasma liquid deposition approach, Nobuyuki Zettsu,Hiroto Itoh,Kazuya Yamamura, Surface & Coatings Technology, Vol.202 (2008) pp.5284-5288., ELSEVIER SCIENCE SA, Vol. 202, No. 22-23, p. 5284-5288, 2008/08
  • Uniformalization of AT cut quartz crystal wafer thickness using open-air type plasma CVM process, Kazuya Yamamura,Tetsuya Morikawa,Masafumi Shibahara,Nobuyuki Zettsua,Yuzo Moria, SURFACE AND INTERFACE ANALYSIS, JOHN WILEY & SONS LTD, Vol. 40, No. 6-7, p. 1007-1010, 2008/06
  • Etching characteristics of local wet etching of silicon in HF/HNO3 mixtures, Kazuya Yamamura,Takuro Mitani, SURFACE AND INTERFACE ANALYSIS, JOHN WILEY & SONS LTD, Vol. 40, No. 6-7, p. 1011-1013, 2008/06
  • Figuring of elliptical hard X-ray focusing mirror using 1-dimensional numerically controlled local wet etching, Kazuya Yamamura,Hiroyuki Takai, SURFACE AND INTERFACE ANALYSIS, JOHN WILEY & SONS LTD, Vol. 40, No. 6-7, p. 1014-1018, 2008/06
  • Figuring of elliptical hard X-ray focusing mirror using 1-dimensional numerically controlled local wet etching, Kazuya Yamamura,Hiroyuki Takai, Surface and Interface Analysis, Vol.40, 2008, pp.1014-1018, JOHN WILEY & SONS LTD, Vol. 40, No. 6-7, p. 1014-1018, 2008/06
  • Uniformalization of AT cut quartz crystal wafer thickness using open-air type plasma CVM process, Kazuya Yamamura,Tetsuya Morikawa,Masafumi Shibahara,Nobuyuki Zettsu,Yuzo Mori, Surface and Interface Analysis, JOHN WILEY & SONS LTD, Vol. 40, No. 6-7, p. 1007-1010, 2008/06
  • Etching characteristics of local wet etching of silicon in HF/HNO3 mixtures, Kazuya Yamamura,Takuro Mitani, Surface and Interface Analysis, JOHN WILEY & SONS LTD, Vol. 40, No. 6-7, p. 1011-1013, 2008/06
  • Plasma-chemical surface functionalization of flexible substrates at atmospheric pressure, Nobuyuki Zettsu,Hiroto Itoh,Kazuya Yamamura, Thin Solid Films, 516 (2008) 6683-6687., ELSEVIER SCIENCE SA, Vol. 516, No. 19, p. 6683-6687, 2008/06
  • Figuring of ultraprecision aspherical focusing mirror using numerically controlled local wet etching, K. Yamamura,H. Takai, International Conference of the European Society for Precision Engineering and Nanotechnology, Vol. 448-451., 2008/05
  • Crystal machining using atmospheric pressure plasma, Y. Sano,K. Yamamura,K. Yamauchi,Y. Mori, Book of Lecture Notes, 4th International Workshop on Crystal Growth Technology, Vol. 47, 2008/05
  • Damage-free improvement of thickness uniformity of quartz crystal wafer by plasma chemical vaporization machining, K. Yamamura,S. Shimada,Y. Mori, Annals of the CIRP, Vol.57 (2008) 567-570., TECHNISCHE RUNDSCHAU EDITION COLIBRI LTD, Vol. 57, No. 1, p. 567-570, 2008/05
  • Crystal Growth Technology (Plasma Chemical Vaporization Machining and Elastic Emission Machining), Wiley-VCH, 2008
  • Neutron-Beam Focusing with a Large-m Supermirror on a High-Precision Ellipsoidal Surface, 2008
  • ウエットエッチングのメカニズムと処理パラメータの最適化,第1章第10節 ローカルウエットエッチング法による光学素子の高精度加工, サイエンス&テクノロジー, Vol. 第1章第10節 pp. 139-153., 2008
  • The Disecrete Polystylene-Gold Core-Shell Nanoparticles Array And Their Surface Plasmonic Properties, Proceedings of 23rd ASPE Annual Meeting and 12th ICPE, Vol. Proceedings of 23rd ASPE Annual Meeting and 12th ICPE, pp. 500-501., 2008
  • Improvement of Thickness Uniformity of Silicon and SOI Wafer by Numerically Controlled Local Wet Etching, Proceedings of 23rd ASPE Annual Meeting and 12th ICPE, Vol. Proceedings of 23rd ASPE Annual Meeting and 12th ICPE, pp.538-541., 2008
  • Crystal machining using atmospheric pressure plasma, Book of Lecture Notes, 4th International Workshop on Crystal Growth Technology, Vol. 47, 2008
  • Figuring of ultraprecision aspherical focusing mirror using numerically controlled local wet etching, International Conference of the European Society for Precision Engineering and Nanotechnology, Vol. 448-451., 2008
  • Damage-free improvement of thickness uniformity of quartz crystal wafer by plasma chemical vaporization machining, K. Yamamura,S. Shimada,Y. Mori, CIRP ANNALS-MANUFACTURING TECHNOLOGY, TECHNISCHE RUNDSCHAU EDITION COLIBRI LTD, Vol. 57, No. 1, p. 567-570, 2008
  • Facile Fabrication and Near-Infrared Localized Surface Plasmon Resonance Properties of Two-dimensional PS@Au Core/Shell Nanoparticle Arrays, and Their Use as a Ultra-sensitive Bio-sensors, Shuhei Uchida,Kazuya Yamamura,Katsuyoshi Endo,Nobuyuki Zettsu, MRS 2007 Fall Meeting, 2007/11
  • Figuring of Elliptical Hard X-ray Focusing Mirror Using Numerically Controlled Local Wet Etching, Hiroyuki Takai,Kazuya Yamamura, Asian Symposium for Precision Engineering and Nanotechnology 2007, Vol. pp. 244-247., 2007/11
  • Improvement of Thickness Distribution of SOI Using Numerically Controlled Local Wet Etching, Takuro Mitani,Kazuya Yamamura, Asian Symposium for Precision Engineering and Nanotechnology 2007, Vol. pp. 241-243., 2007/11
  • Etching characteristics of AT cut quartz crystal in open-air type plasma CVM process, K. Ueno,Y. Oshikane,M. Shibahara,K. Yamamura, 29th International Symposium on Dry Process, Vol. pp. 273-274., 2007/11
  • Improvement of Thickness Distribution of AT Cut Quartz Crystal Wafer Using Open-Air Type Numerically Controlled Plasma Chemical Vaporization Machining, Tetsuya Morikawa,Kazuya Yamamura,Masafumi Shibahara,Yuzo Mori, Asian Symposium for Precision Engineering and Nanotechnology 2007, Vol. pp. 248-251., 2007/11
  • Figuring of Elliptical Hard X-ray Focusing Mirror Using Numerically Controlled Local Wet Etching, H. Takai,K. Yamamura, International 21st Century COE Symposium on Atomistic Fabrication Technology 2007, Vol. International 21st Century COE Symposium on Atomistic Fabrication Technology 2007, pp. 12., 2007/10
  • Improvement of Thickness Distribution of SOI Using Numerically Controlled Local Wet Etching, T. Mitani,K. Yamamura, International 21st Century COE Symposium on Atomistic Fabrication Technology 2007, Vol. International 21st Century COE Symposium on Atomistic Fabrication Technology 2007, pp. 13., 2007/10
  • Uniformation of AT Cut Quartz Crystal Wafer Using Open-Air Type Numerically Controlled Plasma CVM Process, T. Morikawa,M. Shibahara,N. Zettsu,Y. Mori,K. Yamamura, International 21st Century COE Symposium on Atomistic Fabrication Technology 2007, Vol. International 21st Century COE Symposium on Atomistic Fabrication Technology 2007, pp 14., 2007/10
  • Effect of pulse modulated operation on etching characteristics of AT cut quartz crystal in open-air type plasma CVM process, Kohji Ueno,Yasushi Oshikane,Masafumi Shibahara,Nobuyuki Zettsu,Kazuya Yamamura, International 21st Century COE Symposium on Atomistic Fabrication Technology 2007, Vol. International 21st Century COE Symposium on Atomistic Fabrication Technology 2007, pp. 15., 2007/10
  • Machining of GaN by Plasma CVM (Chemical Vaporization Machining), Y. Nakahama,N. Kanetsuki,T. Funaki,M. Kadono,Y. Sano,K. Yamamura,K. Endo,Y. Mori, International 21st Century COE Symposium on Atomistic Fabrication Technology 2007, Vol. International 21st Century COE Symposium on Atomistic Fabrication Technology 2007, pp 18., 2007/10
  • Sensing Characterization of NIR-Localized Surface Plasmon Resonances in PS@Au core-shell nanoparticle array for Application as Ultra-sensitive Sensors, Shuhei Uchida,Kazuya Yamamura,Katsuyoshi Endo,Nobuyuki Zettsu, International 21st Century COE Symposium on Atomistic Fabrication Technology 2007, Vol. International 21st Century COE Symposium on Atomistic Fabrication Technology 2007, pp. 36., 2007/10
  • Beveling of Silicon Carbide Wafer by Plasma Chemical Vaporization Machining, Takehiro Kato,Yasuhisa Sano,Hideyuki Hara,Hidekazu Mimura,Kazuya Yamamura,Kazuto Yamauchi, International Conference on Silicon Carbide and Related Materials 2007 Technical Digest, Vol. We-98, 2007/10
  • Temperature Dependence of Plasma Chemical Vaporization Machining of Silicon and Silicon Carbide, Y. Sano,M. Watanabe,T. Kato,K. Yamamura,H. Mimura,K. Yamauchi, International Conference on Silicon Carbide and Related Materials 2007 Technical Digest, Vol. Mo-P-55, 2007/10
  • Surface Functionalization of PTFE Sheet through Atmospheric Pressure Plasma Liquid Deposition Approach, N. Zettsu,H. Itoh,K. Yamamura, 6th Asian-European International Conference on Plasma Surface Engineering, Vol. pp. 307., 2007/09
  • 超高精度ミラーによる硬X線ナノビーム形成とその応用, 三村秀和,松山智至,湯本博勝,半田宗一郎,片岸恵子,木村隆志,佐野泰久,山村和也,稲垣耕司,玉作賢治,西野吉則,矢橋牧名,石川哲也,山内和人, 日本物理学会講演概要集, Vol. 62, No. 2, 2007/08/21
  • Polishing Characteristics of 4H-SiC Si-Face and C-Face by Plasma Chemical Vaporization Machining, Yasuhisa Sano,Masayo Watanabe,Kazuya Yamamura,Kazuto Yamauchi,Takeshi Ishida,Kenta Arima,Akihisa Kubota,Yuzo Mori, Materials Science Forum, 2007/08
  • Fabrication of ultrathin and highly uniform silicon on insulator by numerically controlled plasma chemical vaporization machining, Yasuhisa Sano,Kazuya Yamamura,Hidekazu Mimura,Kazuto Yamauchi,Yuzo Mori, REVIEW OF SCIENTIFIC INSTRUMENTS, AMER INST PHYSICS, Vol. 78, No. 8, 2007/08
  • Measurement of rotational and vibrational temperature of gas molecules in the CVM plasma by using spatial resolved optical emission spectrometry, Kohji Ueno,Yasushi Oshikane,Yasuhisa Sano,Kazuya Yamamura, 18th International Symposium on Plasma Chemistry, Vol. pp. 166., 2007/08
  • Atomspheric Pressure-Glow Plasma Induced Surface Functionalization of Flexible Substrate, H. Itoh,N. Zettsu,M. Shibahara,K. Yamamura, 18th International Symposium on Plasma Chemistry, Vol. pp. 186., 2007/08
  • Plasma chemical surface functionalization of PTFE sheet through atmospheric pressure plasma liquid deposition approach, N. Zettsu,H. Itoh,K. Yamamura, XXVIII International Conference on Phenomena in Ionized Gases, Vol. XXVIII International Conference on Phenomena in Ionized Gases, p. 757-760., 2007/07
  • Unifomalization of thr AT cut quartz crystal wafer using maskless localized atmospheric pressure plasma etching process, K. Yamamura,Y. Yamamoto,T. Morikawa,M. Shibahara,Y. Mori, XXVIII International Conference on Phenomena in Ionized Gases, Vol. XXVIII International Conference on Phenomena in Ionized Gases. p. 735-736., 2007/07
  • Surface Modification of Polytetrafluoroethylene Sheet by Atmospheric Pressure Plasma Treatment, Masafumi Shibahara,Masanori Akamatsu,Hitoshi Kanzaki,Kazuya Yamamura, Journal of the Surface Finishing Society of Japan, Vol. Vol.58, No.7, pp.420-424., 2007/07
  • Fabrication of Ultra Precision Optics by Numerically Controlled Local Wet Etching, Kazuya Yamamura, Annals of the CIRP, Vol. 56, pp.541-544., TECHNISCHE RUNDSCHAU EDITION COLIBRI LTD, Vol. 56, No. 1, p. 541-544, 2007/07
  • Plasmachemical Surface Functionalization of Flexible Substrates at Atmospheric Pressure, Nobuyuki Zettsu,Hiroto Itoh,Kazuya Yamamura, The 20th Symposium on Plasma Science for Materials, Vol. The 20th Symposium on Plasma Science for Materials, p. 85., 2007/06
  • Development of numerically controlled local wet etching, Kazuya Yamamura, SCIENCE AND TECHNOLOGY OF ADVANCED MATERIALS, NATL INST MATERIALS SCIENCE, Vol. 8, No. 3, p. 158-161, 2007/04
  • Surface gragient integrated profiler for X-ray and EUV optics, Yasuo Higashi,Yuichi Takaie,Katsuyoshi Endo,Tatsuya Kume,Kazuhiro Enami,Kazuto Yamauchi,Kazuya Yamamura,Yasuhisa Sana,Kenji Ueno,Yuzo Mori, SCIENCE AND TECHNOLOGY OF ADVANCED MATERIALS, IOP PUBLISHING LTD, Vol. 8, No. 3, p. 177-180, 2007/04
  • Ultraprecision Machining Method for Ultraprecise Aspherical Mirror, Yasuhisa Sano,Hidekazu Mimura,Kazuya Yamamura,Kazuto Yamauchi,Yuzo Mori, The Review of Laser Engineering, Vol. 35, No. 3, p. 162-167, 2007/03
  • Improvement of the thickness distribution of at cut quartz crystal wafer by open-air type plasma chemical vaporization machining, Kazuya Yamamura,Masafumi Shibahara,Yasuhisa Sano,Yusuke Yamamoto,Tetsuya Morikawa,Yuzo Mori, e-Journal of Surface Science and Nanotechnology, Vol. 5, p. 41-44, 2007/02/06
  • Improvement of the thickness distribution of at cut quartz crystal wafer by open-air type plasma chemical vaporization machining, Kazuya Yamamura,Masafumi Shibahara,Yasuhisa Sano,Yusuke Yamamoto,Tetsuya Morikawa,Yuzo Mori, e-Journal of Surface Science and Nanotechnology, Vol. 5, p. 41-44, 2007/02/06
  • Improvement of the Thickness Distribution of AT Cut Quartz Crystal Wafer by Open-air Type Plasma Chemical Vaporization Machining, Kazuya Yamamura,Masafumi Shibahara,Yasuhisa Sano,Yusuke Yamamoto,Tetsuya Morikawa,Yuzo Mori, e-Journal of Surface Science and Nanotechnology, Vol. 5, p. 41-44, 2007/02
  • Efficient focusing of hard x-rays to 25nm by a total reflection mirror, H. Mimura,H. Yumoto,S. Matsuyama,Y. Sano,K. Yamamura,Y. Mori,M. Yabashi,Y. Nishino,K. Tamasaku,T. Ishikawa,K. Yamauchi, APPLIED PHYSICS LETTERS, AMER INST PHYSICS, Vol. 90, No. 5, 2007/02
  • Surface Modification of Poly ethylene terephthalate sheet by Atmosphere Plasma Treatment, Masafumi Shibahara,Kanji Inagaki,Kazuya Yamamura, Journal of The Surface Finishing Society of Japan, Vol. 58, No. 2, p. 124-129, 2007/02
  • Fabrication of X-ray mirror for hard X-ray diffraction limited nanofocusing, Hirokatsu Yumoto,Hidekazu Mimura,Satoshi Matsuyama,Soichiro Handa,Akihiko Shibatani,Keiko Katagishi,Kazuya Yamamura,Yasuhisa Sano,Katsuyoshi Endo,Yuzo Mori,Makina Yabashi,Yoshinori Nishino,Kenji Tamasaku,Tetsuya Ishikawa,Kazuto Yamauchi, AIP Conference Proceedings, Vol. 879, No. Pt.1, p. 967-970, 2007
  • Development of a scanning X-ray fluorescence microscope using size-controllable focused X-ray beam from 50 to 1500nm, Satoshi Matsuyama,Hidekazu Mimura,Hirokatsu Yumoto,Keiko Katagishi,Soichiro Handa,Akihiko Shibatani,Yasuhisa Sano,Kazuya Yamamura,Katsuyoshi Endo,Yuzo Mori,Yoshinori Nishino,Kenji Tamasaku,Makina Yabashi,Tetsuya Ishikawa,Kazuto Yamauchi, AIP Conference Proceedings, Vol. 879, No. Pt.2, p. 1325-1328, 2007
  • 22pTC-3 Hard X-ray nanofocusing by ultraprecisely figured mirrors and its applications, Mimura H,Matsuyama S,Yumoto H,Handa S,Katagishi K,Kimura T,Sano Y,Yamamura K,Inagaki K,Tamasaku K,Nishino Y,Yabashi M,Ishikawa T,Yamauchi K, Meeting Abstracts of the Physical Society of Japan, 一般社団法人日本物理学会, Vol. 62, No. 0, 2007
  • Efficient focusing of hard x rays to 25 nm by a total reflection mirror, Hidekazu Mimura,Hirokatsu Yumoto,Satoshi Matsuyama,Yasuhisa Sano,Kazuya Yamamura,Yuzo Mori,Makina Yabashi,Yoshinori Nishino,Kenji Tamasaku,Tetsuya Ishikawa,Kazuto Yamauchi, APPLIED PHYSICS LETTERS, AMER INST PHYSICS, Vol. 90, No. 5, 2007/01
  • Polishing characteristics of 4H-SiC Si-face and C-face by plasma chemical vaporization machining, Yasuhisa Sano,Masayo Watanabe,Kazuya Yamamura,Kazuto Yamauchi,Takeshi Ishida,Kenta Arima,Akihisa Kubota,Yuzo Mori, SILICON CARBIDE AND RELATED MATERIALS 2006, TRANS TECH PUBLICATIONS LTD, Vol. 556-557, p. 757-+, 2007
  • 大気圧プラズマ処理によるポリエチレンテレフタレートの表面改質, 表面技術誌, Vol. Vol. 58, No.2 (2007) 124-129., 2007
  • 高精度非球面ミラーの加工技術, レーザー学会誌, Vol. Vol. 35, pp.162-167, 2007
  • 大気圧プラズマ処理によるポリテトラフルオロエチレンの表面改質, 表面技術誌, Vol. Vol.58, No.7, pp.420-424., 2007
  • Fabrication of ultra precision optics by numerically controlled local wet etching, K. Yamamura,T. Masuzawa, CIRP ANNALS-MANUFACTURING TECHNOLOGY, TECHNISCHE RUNDSCHAU EDITION COLIBRI LTD, Vol. 56, No. 1, p. 541-544, 2007
  • Plasmachemical Surface Functionalization of Flexible Substrates at Atmospheric Pressure, The 20th Symposium on Plasma Science for Materials, Vol. The 20th Symposium on Plasma Science for Materials, p. 85., 2007
  • Plasma chemical surface functionalization of PTFE sheet through atmospheric pressure plasma liquid deposition approach, XXVIII International Conference on Phenomena in Ionized Gases, Vol. XXVIII International Conference on Phenomena in Ionized Gases, p. 757-760., 2007
  • Unifomalization of thr AT cut quartz crystal wafer using maskless localized atmospheric pressure plasma etching process, XXVIII International Conference on Phenomena in Ionized Gases, Vol. XXVIII International Conference on Phenomena in Ionized Gases. p. 735-736., 2007
  • Improvement of Thickness Distribution of SOI Using Numerically Controlled Local Wet Etching, International 21st Century COE Symposium on Atomistic Fabrication Technology 2007, Vol. International 21st Century COE Symposium on Atomistic Fabrication Technology 2007, pp. 13., 2007
  • Uniformation of AT Cut Quartz Crystal Wafer Using Open-Air Type Numerically Controlled Plasma CVM Process, International 21st Century COE Symposium on Atomistic Fabrication Technology 2007, Vol. International 21st Century COE Symposium on Atomistic Fabrication Technology 2007, pp 14., 2007
  • Sensing Characterization of NIR-Localized Surface Plasmon Resonances in PS@Au core-shell nanoparticle array for Application as Ultra-sensitive Sensors, International 21st Century COE Symposium on Atomistic Fabrication Technology 2007, Vol. International 21st Century COE Symposium on Atomistic Fabrication Technology 2007, pp. 36., 2007
  • Figuring of Elliptical Hard X-ray Focusing Mirror Using Numerically Controlled Local Wet Etching, International 21st Century COE Symposium on Atomistic Fabrication Technology 2007, Vol. International 21st Century COE Symposium on Atomistic Fabrication Technology 2007, pp. 12., 2007
  • Machining of GaN by Plasma CVM (Chemical Vaporization Machining), International 21st Century COE Symposium on Atomistic Fabrication Technology 2007, Vol. International 21st Century COE Symposium on Atomistic Fabrication Technology 2007, pp 18., 2007
  • Effect of pulse modulated operation on etching characteristics of AT cut quartz crystal in open-air type plasma CVM process, International 21st Century COE Symposium on Atomistic Fabrication Technology 2007, Vol. International 21st Century COE Symposium on Atomistic Fabrication Technology 2007, pp. 15., 2007
  • Facile Fabrication and Near-Infrared Localized Surface Plasmon Resonance Properties of Two-dimensional PS@Au Core/Shell Nanoparticle Arrays, and Their Use as a Ultra-sensitive Bio-sensors, MRS 2007 Fall Meeting, 2007
  • Measurement of rotational and vibrational temperature of gas molecules in the CVM plasma by using spatial resolved optical emission spectrometry, 18th International Symposium on Plasma Chemistry, Vol. pp. 166., 2007
  • Atomspheric Pressure-Glow Plasma Induced Surface Functionalization of Flexible Substrate, 18th International Symposium on Plasma Chemistry, Vol. pp. 186., 2007
  • Surface Functionalization of PTFE Sheet through Atmospheric Pressure Plasma Liquid Deposition Approach, 6th Asian-European International Conference on Plasma Surface Engineering, Vol. pp. 307., 2007
  • Temperature Dependence of Plasma Chemical Vaporization Machining of Silicon and Silicon Carbide, International Conference on Silicon Carbide and Related Materials 2007 Technical Digest, Vol. Mo-P-55, 2007
  • Beveling of Silicon Carbide Wafer by Plasma Chemical Vaporization Machining, International Conference on Silicon Carbide and Related Materials 2007 Technical Digest, Vol. We-98, 2007
  • Figuring of Elliptical Hard X-ray Focusing Mirror Using Numerically Controlled Local Wet Etching, Asian Symposium for Precision Engineering and Nanotechnology 2007, Vol. pp. 244-247., 2007
  • Improvement of Thickness Distribution of SOI Using Numerically Controlled Local Wet Etching, Asian Symposium for Precision Engineering and Nanotechnology 2007, Vol. pp. 241-243., 2007
  • Etching characteristics of AT cut quartz crystal in open-air type plasma CVM process, 29th International Symposium on Dry Process, Vol. pp. 273-274., 2007
  • Development of numerically controlled local wet etching, Science and Technology of Advanced Materials, Vol. Vol.8 No.3 pp.158-161., 2007
  • Numerically Controlled Local Wet Etching For Fabricating the Ultraprecision Optics, Kazuya Yamamura, Proceedings of 5th International Conference on Optics-photonics Design & Fabrication, Vol. pp. 257-258, 2006/12
  • Measurement of rotational and vibrational temperature of gas molecule in the open-air type PCVM plasma by using spatial resolved emission spectra, Kazuya Yamamura,Koji Ueno,Yasushi Oshikane,Yasuhisa Sano,Masafumi Shibahara,Yuzo Mori, Proceedings of 28th International Symposium on Dry Process, Vol. pp. 49-50, 2006/11
  • High spatial resolution machining utilizing atmospheric pressure plasma machining, Kazuya Yamamura,Kunihito Kato,Yasuhisa Sano,Masafumi Shibahara,Katsuyoshi Endo,Yuzo Mori, Proceedings of 8th International Conference on Progress of Machining Technology, Vol. pp. 257-260, 2006/11
  • Improvement of the Thickness Distribution of AT Cut Quartz Crystal Wafer by Open-air Type Plasma Chemical Vaporization Machining, Kazuya Yamamura,Masafumi Shibahara,Yasuhisa Sano,Yusuke Yamamoto,Tetsuya Morikawa,Yuzo Mori, Proceedings of Handai Nanoscience and Nanotechnology International Symposium, Vol. pp. 74, 2006/11
  • Development of ultraprecision numerically controlled finishing machine utilizing atmospheric pressure plasma, Kazuya Yamamura,Akihiro Fujiwara,Koji Ueno,Yasuhisa Sano,Masafumi Shibahara,Katsuyoshi Endo,Yuzo Mori, Proceedings of 8th International Conference on Progress of Machining Technology, Vol. pp. 253-256, 2006/11
  • Machining characteristics of ultraprecision atmospheric pressure plasma process, Kazuya Yamamura,Koji Ueno,Akihiro Fujiwara,Yasuhisa Sano,Yasusi Oshikane,Masafumi Shibahara,Katsuyoshi Endo,Yuzo Mori, Proceedings of 8th International Conference on Progress of Machining Technology, Vol. pp. 265-268, 2006/11
  • Polishing characteristics of silicon carbide by plasma chemical vaporization machining, Yasuhisa Sano,Masayo Watanabe,Kazuya Yamamura,Kazuto Yamauchi,Takeshi Ishida,Kenta Arima,Akihisa Kubota,Yuzo Mori, Jpn. J. Appl. Phys. 45 No.10B, INST PURE APPLIED PHYSICS, Vol. 45, No. 10, p. 8277-8280, 2006/10
  • Surface Gradient Integrated Profiler for X-ray and EUV Optics, Y. Higashi,Y. Takaie,K. Endo,Y. Mori,K. Yamauchi,T. Kume,K. Enami,K. Yamamura,Y. Sano,K. Ueno, Proceedings of International 21st Century COE Symposium on Atomistic Fabrication Technology, IOP PUBLISHING LTD, Vol. 8, No. 3, p. 177-180, 2006/10
  • High-spatial-resolution machining utilizing atmospheric pressure plasma: Machining characteristics of silicon, Kazuya Yamamura,Kunihito Kato,Yasuhisa Sano,Masafumi Shibahara,Katsuyoshi Endo,Yuzo Mori, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, INST PURE APPLIED PHYSICS, Vol. 45, No. 10B, p. 8281-8285, 2006/10
  • Development of Numerically Controlled Local Wet Etching, Kazuya Yamamura, Prceedings of International 21st Century COE Symposium on Atomistic Fabrication Technology, Vol. pp. 15-16, 2006/10
  • Ultraprecision machining utilizing numerically controlled scanning of localized atmospheric pressure plasma, Kazuya Yamamura,Yasuhisa Sano,Masafumi Shibahara,Kazuto Yamauchi,Hidekazu Mimura,Katsuyoshi Endo,Yuzo Mori, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, INST PURE APPLIED PHYSICS, Vol. 45, No. 10B, p. 8270-8276, 2006/10
  • High Spatial Resolution Machining Utilizing Atmospheric Pressure Plasma -Machining Characteristics of Silicon-, Kazuya Yamamura,Kunihito Kato,Yasuhisa Sano,Masafumi Shibahara,Katsuyoshi Endo,Yuzo Mori, Jpn. J. Appl. Phys. 45 No.10B, JAPAN SOC PRECISION ENGINEERING-JSPE, Vol. 363-364, p. 257-260, 2006/10
  • High-spatial-resolution machining utilizing atmospheric pressure plasma: Machining characteristics of silicon, Kazuya Yamamura,Kunihito Kato,Yasuhisa Sano,Masafumi Shibahara,Katsuyoshi Endo,Yuzo Mori, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, INST PURE APPLIED PHYSICS, Vol. 45, No. 10B, p. 8281-8285, 2006/10
  • Development of ultraprecision finishing method for quartz crystal wafer utilizing atmospheric pressure plasma, Masafumi Shibahara,Yusuke Yamamoto,Kazuya Yamamura,Yasuhisa Sano,Katsuyoshi Endo,Yuzo Mori, Towards Synthesis of Micro-/Nano-systems,, Vol. pp. 233-237, 2006/08
  • Fabrication of small complex-shaped optics by plasma chemical vaporization machining with a microelectrode, Hideo Takino,Norio Shibata,Hiroshi Itoh,Teruki Kobayashi,Koshichi Nemoto,Takashi Fujii,Naohiko Goto,Kazuya Yamamura,Yasuhisa Sano,Yuzo Mori, APPLIED OPTICS, OPTICAL SOC AMER, Vol. 45, No. 23, p. 5897-5902, 2006/08
  • Ultraprecision finishing of photomask substrate by utilizing atmospheric pressure plasma, Kazuya Yamamura,Akihiro Fujiwara,Koji Ueno,Yasuhisa Sano,Masafumi Shibahara,Katsuyoshi Endo,Yuzo Mori, Towards Synthesis of Micro-/Nano-systems, Vol. pp. 227-231, 2006/08
  • Fabrication of ultraprecisely figured mirror for nano focusing hard-x-ray, Hirokatsu Yumoto,Hidekazu Mimura,Satoshi Matsuyama,Souichiro Handa,Kazuya Yamamura,Yasuhisa Sano,Katsuyoshi Endo,Yuzo Mori,Makina Yabashi,Yoshinori Nishino,Kenji Tamasaku,Tetsuya Ishikawa,Kazuto Yamauchi, Towards Synthesis of Micro-/Nano-systems, Vol. pp. 295-300, 2006/08
  • Fabrication of small complex-shaped optics by plasmachemical vaporization machining with a microelectrode, Hideo Takino,Norio Shibata,Hiroshi Itoh,Teruki Kobayashi,Koshichi Nemoto,Takashi Fujii,Naohiko Goto,Kazuya Yamamura,Yasuhisa Sano,Yuzo Mori, Applied Optics, OPTICAL SOC AMER, Vol. 45, No. 23, p. 5897-5902, 2006/08
  • Development of a Mirror Manipulator for Hard X-ray Microscopy with High Resolution : Realization of Nanofocused Hard X-ray Beam Better than 50nm under Diffraction Limited Condition, Matsuyama Satoshi,Mimura Hidekazu,Yumoto Hirokatsu,Hara Hideyuki,Yamamura Kazuya,Sano Yasuhisa,Nishino Yoshinori,Tamasaku Kenji,Yabashi Makina,Ishikawa Tetsuya,Yamauchia Kazuto, Journal of the Japan Society for Precision Engineering. Supplement. Contributed papers, 公益社団法人精密工学会, Vol. 72, No. 7, p. 884-888, 2006/07/05
  • Rotational and vibrational temperature of Fulcher-alpha band emitted by hydrogen molecules in capacitive VHF CVD plasma process at atmosphere, Yasushi Oshikane,Hiroaki Kakiuchi,Kazuya Yamamura,Kiyoshi Yasutake,Takafumi Karasawa,Colin M. Western,Akinori Oda,Katsuyoshi Endo, Abstractbook of the 8th Asia-Pacific Conference on Plasma Science and Technology, Vol. p.269, 2006/07
  • Improvement of Thickness Uniformity of Quartz Wafer by Numerically Controlled Plasma CVM -Correction of Thickness Distribution of Quartz Wafer by Numerically Controlled Machining Utilizing Pipe Electrode-, Masafumi Shibahara,Kazuya Yamamura,Yasuhisa Sano,Tsuyoshi Sugiyama,Yuzuke Yamamoto,Katsuyoshi Endo,Yuzo Mori, Journal of the Japan Society for Precision Engineering, Vol. Vol. 72, No.7, 934-938, 2006/07
  • Ultraprecision machining of quartz crystal wafer by numerically controlled plasma CVM, Kazuya Yamamura,Masafumi Shibahara, Ultrasonic Technology, 日本工業出版, Vol. Vol. 18, No.3, 52-55, 2006/05
  • 走査型蛍光X線顕微鏡を用いた細胞内元素分布の測定, 片岸恵子,松山智至,三村秀和,湯本博勝,山村和也,佐野泰久,遠藤勝義,森勇蔵,西野吉則,玉作賢治,矢橋牧名,石川哲也,山内和人, 応用物理学関係連合講演会講演予稿集, Vol. 53rd, No. 2, 2006/03/22
  • Fabrication and evaluation of coherent X&ndash;ray mirror optics, Mimura Hidekazu,Yumoto Hirokatsu,Matsuyama Satoshi,Yamamura Kazuya,Sano Yasuhisa,Tamasaku Kenji,Yabashi Makina,Nisino Yoshinori,Ishikawa Tetsuya,Yamauchi Kazuto, Proceedings of JSPE Semestrial Meeting, 公益社団法人 精密工学会, Vol. 2006, No. 0, p. 233-234, 2006/03/01
  • Atomic–scale analysis of 4 H–SiC (0001) surface after planarization process, Ishida Takeshi,Arima Kenta,Hara Hideyuki,Yamamura Kazuya,Yamauchi Kazuto,Endo Katsuyoshi, Proceedings of JSPE Semestrial Meeting, The Japan Society for Precision Engineering, Vol. 2006, No. 0, p. 1115-1116, 2006
  • Cutting of functional materials by plasma chemical vaporization machining with inner-diameter blade electrode, Y. Sano,K. Yamamura,H. Mimura,K. Yamauchi,A. Kubota,Y. Mori, Proc. ICRP-6/SPP-23, Vol. 305-306, 2006/01
  • Ultra precision machining utilizing numerically controlled scanning of localized atmospheric pressure plasma, K. Yamamura,Y. Sano,M. Shibahara,K. Yamauchi,H. Mimura,K. Endo,Y. Mori, Proceedings of ICRP6/SPP23, Vol. 81-82, 2006/01
  • 数値制御プラズマCVMによる水晶ウエハの高精度加工, 超音波テクノ, Vol. Vol. 18, No.3, 52-55, 2006
  • 数値制御プラズマCVMによる水晶ウエハの高精度加工に関する研究 -回転電極とパイプ電極を併用した数値制御加工による水晶ウエハ厚さの均一化-, 精密工学会誌, Vol. 72, No. 7, Vol. Vol. 72, No.7, 934-938, 2006
  • Ultraprecision finishing of photomask substrate by utilizing atmospheric pressure plasma, Towards Synthesis of Micro-/Nano-systems, Vol. pp. 227-231, 2006
  • Fabrication of ultraprecisely figured mirror for nano focusing hard-x-ray, Towards Synthesis of Micro-/Nano-systems, Vol. pp. 295-300, 2006
  • Surface gradient integrated profiler for X-ray and EUV optics - 3D mapping of 1m-long flat mirror and off-axis parabolic mirror, Y. Higashi,Y. Takaie,K. Endo,T. Kume,K. Enami,K. Yamauchi,K. Yamamura,H. Sano,J. Uchikoshi,K. Ueno,Y. Mori, Proceedings of SPIE - The International Society for Optical Engineering, Vol. 6317, 2006
  • High spatial resolution machning utilizing atmospheric pressure plasma - Machining characteristics of silicon, Kazuya Yamamura,Kunihito Kato,Yasuhisa Sano,Masafumi Shibahara,Katsuyoshi Endo,Yuzo Mori, Progress of Machining Technology, Proceedings, JAPAN SOC PRECISION ENGINEERING-JSPE, Vol. Vol. 45 8281-8285, p. 257-260, 2006
  • Machining characteristics of ultraprecision atmospheric pressure plasma process, Kazuya Yamamura,Koji Ueno,Akihiro Fujiwara,Yasuhisa Sano,Yasusi Osikane,Masafumi Shibahara,Katsuyoshi Endo,Yuzo Mori, Progress of Machining Technology, Proceedings, JAPAN SOC PRECISION ENGINEERING-JSPE, Vol. pp. 265-268, p. 265-268, 2006
  • 大気圧プラズマの生成制御と応用技術, 第13節 プラズマCVMによる超精密加工, サイエンス&テクノロジー, 2006
  • Ultra precision machining utilizing numerically controlled scanning of localized atmospheric pressure plasma, Proceedings of ICRP6/SPP23, Vol. 81-82, 2006
  • Polishing characteristics of 4H-SiC Si-face and C-face by plasma chemical vaporization machining, 2006
  • High spatial resolution machining utilizing atmospheric pressure plasma - machining characteristics of silicon -, K. Kato,K. Yamamura,Y. Sano,M. Shibahara,K. Endo,Y. Mori, Proceedings of ICRP6/SPP23, Vol. 363-364, 2006/01
  • Ultra precision machining utilizing numerically controlled scanning of localized atmospheric pressure plasma, Proceedings of ICRP6/SPP23, Vol. 81-82, 2006
  • Rotational and vibrational temperature of Fulcher-alpha band emitted by hydrogen molecules in capacitive VHF CVD plasma process at atmosphere, Abstractbook of the 8th Asia-Pacific Conference on Plasma Science and Technology, Vol. p.269, 2006
  • Development of ultraprecision finishing method for quartz crystal wafer utilizing atmospheric pressure plasma, Towards Synthesis of Micro-/Nano-systems,, Vol. pp. 233-237, 2006
  • Development of Numerically Controlled Local Wet Etching, Prceedings of International 21st Century COE Symposium on Atomistic Fabrication Technology, Vol. pp. 15-16, 2006
  • Surface gradient integrated profiler for X-ray and EUV optics - 3D mapping of 1m-long flat mirror and off-axis parabolic mirror, Y. Higashi,Y. Takaie,K. Endo,T. Kume,K. Enami,K. Yamauchi,K. Yamamura,H. Sano,J. Uchikoshi,K. Ueno,Y. Mori, Proceedings of SPIE - The International Society for Optical Engineering, Vol. 6317, 2006
  • Measurement of rotational and vibrational temperature of gas molecule in the open-air type PCVM plasma by using spatial resolved emission spectra, Proceedings of 28th International Symposium on Dry Process, Vol. pp. 49-50, 2006
  • High spatial resolution machining utilizing atmospheric pressure plasma machining, Proceedings of 8th International Conference on Progress of Machining Technology, Vol. pp. 257-260, 2006
  • Improvement of the Thickness Distribution of AT Cut Quartz Crystal Wafer by Open-air Type Plasma Chemical Vaporization Machining, Proceedings of Handai Nanoscience and Nanotechnology International Symposium, Vol. pp. 74, 2006
  • Development of ultraprecision numerically controlled finishing machine utilizing atmospheric pressure plasma, Proceedings of 8th International Conference on Progress of Machining Technology, Vol. pp. 253-256, 2006
  • Numerically Controlled Local Wet Etching For Fabricating the Ultraprecision Optics, Proceedings of 5th International Conference on Optics-photonics Design & Fabrication, Vol. pp. 257-258, 2006
  • Ultraprecision Machining Utilizing Numerically Controlled Scanning of Localized Atmospheric Pressure Plasma, Jpn. J. Appl. Phys. 45 No.10B, Vol. Vol. 45 8270-8276, 2006
  • High spatial resolution machining utilizing atmospheric pressure plasma - machining characteristics of silicon -, Proceedings of ICRP6/SPP23, Vol. 363-364, 2006
  • Ultra precision machining utilizing numerically controlled scanning of localized atmospheric pressure plasma, Proceedings of ICRP6/SPP23, Vol. 81-82, 2006
  • Improvement of thickness uniformity of quartz crystal wafer by numerically controlled plasma CVM., M. Shibahara,K. Yamamura,Y. Sano,T. Sugiyama,K. Endo,Y. Mori, Proc. SPIE 5918(2005) 591804, Vol. 5918, 591804, 2005/10
  • A new designed ultra-high precision profiler, Y. Higashi,Y. Takaie,K. Endo,T. Kume,K. Enami,K. Yamauchi,K. Yamamura,Y. Sano,K. Ueno,Y. Mori, Proccedings of SPIE 5921, Vol. Vol. 5921, 592107, 2005/10
  • Plasma Chemical Vaporization Machining (PCVM), Y. Sano,K. Yamamura,K. Endo,Y. Mori, Book of Lecture Note, IWCGT-3, (2005) pp. 305-316., 2005/09
  • Improvement of the thickness distribution of a quartz crystal wafer by numerically controlled plasma chemical vaporization machining, M Shibahara,K Yamamura,Y Sano,T Sugiyama,K Endo,Y Mori, REVIEW OF SCIENTIFIC INSTRUMENTS, AMER INST PHYSICS, Vol. 76, No. 9, 2005/09
  • Improvement of the thickness distribution of a quartz crystal wafer by numerically controlled plasma chemical vaporization machining, M Shibahara,K Yamamura,Y Sano,T Sugiyama,K Endo,Y Mori, REVIEW OF SCIENTIFIC INSTRUMENTS, AMER INST PHYSICS, Vol. 76, No. 9, 2005/09
  • Fabrication of Ultraprecisely Figured Elliptical Mirror for Nano-Focusing of Hard X-ray and Evalation of Focusing Properties, Vol. 71, No. 9, p. 1137-1140, 2005/09
  • Improvement of the thickness distribution of a quartz crystal wafer by numerically controlled plasma chemical vaporization machining, M Shibahara,K Yamamura,Y Sano,T Sugiyama,K Endo,Y Mori, REVIEW OF SCIENTIFIC INSTRUMENTS, AMER INST PHYSICS, Vol. 76, No. 9, 2005/09
  • Improvement of Thickness Distribution of Quartz Crystal Wafer by Numerically Controlled Plasma Chemical Vaporization Machining, Masafumi Shibahara,Kazuya Yamamura,Yasuhisa Sano,Tsuyoshi Sugiyama,Katsuyoshi Endo,Yuzo Mori, Review of Scientific Instruments, AMER INST PHYSICS, Vol. 76, No. 9, 2005/09
  • A new Designed High-Precision Profiler, Y.Higashi,Y.Takaie,K.Endo,T.Kume,K.Enami,K.Yamauchi,K.Yamamura,K.Ueno,Y.Mori, Proceedings of SPIE - The International Society for Optical Engineering, Vol. 5921, p. 1-9, 2005/08
  • Fabrication of elliptically figured mirror for focusing hard X-rays to size less than 50 nm, H. Yumoto,H. Mimura,S. Matsuyama,K. Yamamura,Y. Sano,K. Ueno,K. Endo,Y. Mori,Y. Nishino,M. Yabashi,K. Tamasaku,T. Ishikawa,K. Yamauchi, Review of Scientific Instruments, 76, 063708 (2005)., Vol. 76, No. 6, 2005/07
  • Element Array by Scanning X-ray Fluorescence Microscopy after Cis-Diamminedichloro-Platinum(II) Treatment, M. Shimura,A. Saito,S. Matsuyama,T. Sakuma,Y. Terui,K. Ueno,H. Yumoto,K. Yamauchi,K. Yamamura,H. Mimura,Y. Sano,M. Yabashi,K. Tamasaku,K. Nishio,Y. Nishino,K. Endo,K. Hatake,Y. Mori,Y. Ishizaka,T. Ishikawa, Cancer Research, AMER ASSOC CANCER RESEARCH, Vol. 65, No. 12, p. 4998-5002, 2005/07
  • Element array by scanning X-ray fluorescence microscopy after Cis-diamminedichloro-platinum(II) treatment, M Shimura,A Saito,S Matsuyama,T Sakuma,Y Terui,K Ueno,H Yumoto,K Yamauchi,K Yamamura,H Mimura,Y Sano,M Yabashi,K Tamasaku,K Nishio,Y Nishino,K Endo,K Hatake,Y Mori,Y Ishizaka,T Ishikawa, CANCER RESEARCH, AMER ASSOC CANCER RESEARCH, Vol. 65, No. 12, p. 4998-5002, 2005/06
  • Fabrication of elliptically figured mirror for focusing hard x rays to size less than 50 nm, H Yumoto,H Mimura,S Matsuyama,H Hara,K Yamamura,Y Sano,K Ueno,K Endo,Y Mori,M Yabashi,Y Nishino,K Tamasaku,T Ishikawa,K Yamauchi, REVIEW OF SCIENTIFIC INSTRUMENTS, AMER INST PHYSICS, Vol. 76, No. 6, 2005/06
  • Element array by scanning X-ray fluorescence microscopy after Cis-diamminedichloro-platinum(II) treatment, M Shimura,A Saito,S Matsuyama,T Sakuma,Y Terui,K Ueno,H Yumoto,K Yamauchi,K Yamamura,H Mimura,Y Sano,M Yabashi,K Tamasaku,K Nishio,Y Nishino,K Endo,K Hatake,Y Mori,Y Ishizaka,T Ishikawa, CANCER RESEARCH, AMER ASSOC CANCER RESEARCH, Vol. 65, No. 12, p. 4998-5002, 2005/06
  • Fabrication of elliptically figured mirror for focusing hard x rays to size less than 50 nm, H Yumoto,H Mimura,S Matsuyama,H Hara,K Yamamura,Y Sano,K Ueno,K Endo,Y Mori,M Yabashi,Y Nishino,K Tamasaku,T Ishikawa,K Yamauchi, REVIEW OF SCIENTIFIC INSTRUMENTS, AMER INST PHYSICS, Vol. 76, No. 6, 2005/06
  • Element array by scanning X-ray fluorescence microscopy after Cis-diamminedichloro-platinum(II) treatment, M Shimura,A Saito,S Matsuyama,T Sakuma,Y Terui,K Ueno,H Yumoto,K Yamauchi,K Yamamura,H Mimura,Y Sano,M Yabashi,K Tamasaku,K Nishio,Y Nishino,K Endo,K Hatake,Y Mori,Y Ishizaka,T Ishikawa, CANCER RESEARCH, AMER ASSOC CANCER RESEARCH, Vol. 65, No. 12, p. 4998-5002, 2005/06
  • Fabrication of elliptically figured mirror for focusing hard x rays to size less than 50 nm, H Yumoto,H Mimura,S Matsuyama,H Hara,K Yamamura,Y Sano,K Ueno,K Endo,Y Mori,M Yabashi,Y Nishino,K Tamasaku,T Ishikawa,K Yamauchi, REVIEW OF SCIENTIFIC INSTRUMENTS, AMER INST PHYSICS, Vol. 76, No. 6, 2005/06
  • Hard x-ray focusing less than 50nm for nanoscopy/spectroscopy, Kazuto Yamauchi,Hidekazu Mimura,Satoshi Matsuyama,Hirokatsu Yumoto,Soichiro Handa,Kazuya Yamamura,Yasuhisa Sano,Katsuyoshi Endo,Yuzo Mori,Yoshinori Nishino,Kenji Tamasaku,Makina Yabashi,Tetsuya Ishikawa, AIP Conference Proceedings, Vol. 879, No. Pt.1, p. 786-791, 2005/05
  • Improvement of Thickness Uniformity of Quartz Wafer by Numerically Controlled Plasma CVM -Correction of Thickness Variation of Quartz Wafer by Numerically Controlled Machining Utilizing Rotary Electrode-, Masafumi SHIBAHARA,Kazuya YAMAMURA,Yasuhisa SANO,Tsuyoshi SUGIYAMA,Katsuyoshi ENDO,Yuzo MORI, Journal of the Japan Society for Precision Engineering, Vol. Vol.71, No.5, pp.655-659., 2005/05
  • Relative angle determinable stitching interferometry for hard x-ray reflective optics, H Mimura,H Yumoto,S Matsuyama,K Yamamura,Y Sano,K Ueno,K Endo,Y Mori,M Yabashi,K Tamasaku,Y Nishino,T Ishikawa,K Yamauchi, REVIEW OF SCIENTIFIC INSTRUMENTS, AMER INST PHYSICS, Vol. 76, No. 4, 2005/04
  • EEM (Elastic Emission Machining)による4H-SiC(0001)表面の平滑化, 久保田章亀,三村秀和,佐野泰久,山村和也,山内和人,森 勇藏, 精密工学会誌論文集, Vol. 71, No. 4, p. 477-480, 2005/04
  • Relative angle determinable stitching interferometry for hard x-ray reflective optics, H Mimura,H Yumoto,S Matsuyama,K Yamamura,Y Sano,K Ueno,K Endo,Y Mori,M Yabashi,K Tamasaku,Y Nishino,T Ishikawa,K Yamauchi, REVIEW OF SCIENTIFIC INSTRUMENTS, AMER INST PHYSICS, Vol. 76, No. 4, 2005/04
  • Creation of Perfect Surfaces, Yuzu Mori,Kazuya Yamamura,Katsuyoshi Endo,Kazuto Yamauchi,Kiyoshi Yasutake,Hidekazu Goto,Hiroaki Kakiuchi,Yasuhisa Sano,Hidekazu Mimura, Journal of Crystal Growth, Elsevier, Vol. 275, No. 1-2, p. 39-50, 2005/04
  • Relative angle determinable stitching interferometry for hard x-ray reflective optics, H Mimura,H Yumoto,S Matsuyama,K Yamamura,Y Sano,K Ueno,K Endo,Y Mori,M Yabashi,K Tamasaku,Y Nishino,T Ishikawa,K Yamauchi, REVIEW OF SCIENTIFIC INSTRUMENTS, AMER INST PHYSICS, Vol. 76, No. 4, 2005/04
  • Hard X-ray Diffraction-Limited Nanofocusing with Kirkpatrick-Baez Mirrors, H. Mimura,S. Matsuyama,H. Yumoto,H. Hara,K. Yamamura,Y. Sano,M. Shibahara,K. Endo,Y. Mori,Y. Nishino,K. Tamasaku,M. Yabashi,T. Ishikawa,K. Yamauchi, Japanese Journal of Applied Physics Part 2, Vol. 44 (18), L539-L542 (2005)/,, 2005/04
  • Improvement of Thickness Uniformity of Quartz Wafer by Numerically Controlled Plasma CVM -Development of the NC-PCVM Machine and Acquisition of Machining Properties-, Kazuya Yamamura,Masafumi Shibahara,Yasuhisa Sano,Tsuyoshi Sugiyama,Katsuyoshi Endo,Yuzo Mori, Journal of the Japan Society for Precision Engineering, 2005/04
  • 超高精度X線集光ミラーの作製と集光特性の評価, 三村秀和,松山智至,湯本博勝,原英之,山村和也,西野吉則,玉作賢治,矢橋牧名,石川哲也, 精密工学会大会学術講演会講演論文集, Vol. 2005, 2005/03/01
  • Creation of perfect surfaces, Y Mori,K Yamamura,K Endo,K Yamauchi,K Yasutake,H Goto,H Kakiuchi,Y Sano,H Mimura, JOURNAL OF CRYSTAL GROWTH, ELSEVIER SCIENCE BV, Vol. 275, No. 1-2, p. 39-50, 2005/02
  • Development of surface figuring and smoothing technologies for ultraprecise X-ray mirror Fabrication, H. Mimura,H. Yumoto,S. Matsuyama,K. Yamamura,Y. Sano,K. Endo,Y. Mori,Y. Nishino,K. Tamasaku,M. Yabashi,T. Ishikawa,K. Yamauchi, 2005/02
  • Relative angle determinable stitching interferometry for hard X-ray reflective optics, H. Mimura,H. Yumoto,S. Matsuyama,K. Yamamura,Y. Sano,K. Ueno,K. Endo,Y. Mori,Y. Nishino,K. Tamasaku,M. Yabashi,T. Ishikawa,K. Yamauchi, Review of Scientfic Instruments, AMER INST PHYSICS, Vol. 76, No. 4, 2005/02
  • Fabrication of ultraprecisely figured and ultrasmooth elliptical mirrors for hard X-ray nanofocusing, K. Yamuchi,H. Mimura,K. Yamamura,Y. Sano,K. Ueno,S. Matsuyama,K. Endo,Y. Nishino,K. Tamasaku,M. Yabashi,T. Ishikawa, 2005/02
  • Creation of perfect surfaces, Y Mori,K Yamamura,K Endo,K Yamauchi,K Yasutake,H Goto,H Kakiuchi,Y Sano,H Mimura, JOURNAL OF CRYSTAL GROWTH, ELSEVIER SCIENCE BV, Vol. 275, No. 1-2, p. 39-50, 2005/02
  • Creation of perfect surfaces, Y Mori,K Yamamura,K Endo,K Yamauchi,K Yasutake,H Goto,H Kakiuchi,Y Sano,H Mimura, JOURNAL OF CRYSTAL GROWTH, ELSEVIER SCIENCE BV, Vol. 275, No. 1-2, p. 39-50, 2005/02
  • Flattening SiC surface by elastic emission machining (EEM), Kubota Akihisa,Mimura Hidekazu,Inagaki Kouji,Sano Yasuhisa,Yamamura Kazuya,Yamauchi Kazuto,Mori Yuzo, Proceedings of JSPE Semestrial Meeting, The Japan Society for Precision Engineering, Vol. 2005, No. 0, p. 785-785, 2005
  • Investigation of machining mechanism in Elastic Emission Machining by STM, Katoh Jun,Kubota Akihisa,Arima Kenta,Yamamura Kazuya,Mori Yuzo,Yamauchi Kazuto,Endo Katsuyoshi, Proceedings of JSPE Semestrial Meeting, The Japan Society for Precision Engineering, Vol. 2005, No. 0, p. 779-780, 2005
  • Characteristics of SiC surface processed by Plasma CVM (Chemical Vaporization Machining), Watanabe Masayo,Sano Yasuhisa,Yamamura Kazuya,Yamauchi Kazuto,Ishida tsuyoshi,Arima kenta,Endo Katsuyoshi,Mori Yuzo, Proceedings of JSPE Semestrial Meeting, The Japan Society for Precision Engineering, Vol. 2005, No. 0, p. 529-530, 2005
  • Surface profile measurement of hard X-ray nanofocusing mirrors, Yumoto Hirokatsu,Mimura Hidekazu,Matsuyama Satoshi,Yamamura Kazuya,Sano Yasuhisa,Endo Katsuyoshi,Mori Yuzo,Ishikawa Tetsuya,Yamauchi Kazuto, Proceedings of JSPE Semestrial Meeting, The Japan Society for Precision Engineering, Vol. 2005, No. 0, p. 453-454, 2005
  • 硬X線ナノ集光用超高精度楕円ミラーの作製と1次元集光性能の評価, 精密工学会誌, Vol. 精密工学会誌 Vol. 71 No. 9 pp.1137-1140, 2005
  • Development of surface figuring and smoothing technologies for ultraprecise X-ray mirror Fabrication, 2005
  • Fabrication of ultraprecisely figured and ultrasmooth elliptical mirrors for hard X-ray nanofocusing, 2005
  • Hard X-ray diffraction-limited nanofocusing with Kirkpatrick-Baez mirrors, H Mimura,S Matsuyama,H Yumoto,H Hara,K Yamamura,Y Sano,M Shibahara,K End,Y Mori,Y Nishino,K Tamasaku,M Yabashi,T Ishikawa,K Yamauchi, JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, INST PURE APPLIED PHYSICS, Vol. 44, No. 16-19, p. L539-L542, 2005
  • EEM (Elastic Emission Machining)による4H-SiC(0001)表面の平滑化, 精密工学会誌論文集, Vol. , 71(4), 477-480 (2005), 2005
  • 数値制御プラズマCVMによる水晶ウエハの高精度加工に関する研究 -加工装置の開発と基本的加工特性の取得-, 精密工学会誌, Vol.71 No.4, pp.455-459., 2005
  • 数値制御プラズマCVMによる水晶ウエハの高精度加工に関する研究 -円筒型回転電極を用いた数値制御加工による水晶ウエハ厚さの均一化-, 精密工学会誌, Vol.71, No.5, pp.655-659., Vol. Vol.71, No.5, pp.655-659., 2005
  • Hard X-ray diffraction-limited nanofocusing with kirkpatrick-baez mirrors, Hidekazu Mimura,Satoshi Matsuyama,Hirokatsu Yumoto,Hideyuki Hara,Kazuya Yamamura,Yasuhisa Sano,Masafumi Shibahara,Katsuyoshi Endo,Yuzo Mori,Yoshinori Nishlno,Kenji Tamasaku,Makina Yabashi,Tetsuya Ishikawa,Kazuto Yamauchi, Japanese Journal of Applied Physics, Part 2: Letters, Vol. 44, No. 16-19, p. L539-L542, 2005
  • Plasma Chemical Vaporization Machining (PCVM), Book of Lecture Note, IWCGT-3, (2005) pp. 305-316., 2005
  • A new designed ultra-high precision profiler, Y. Higashi,Y. Takaie,K. Endo,T. Kume,K. Enami,K. Yamauchi,K. Yamamura,H. Sano,K. Ueno,Y. Mori, Proceedings of SPIE - The International Society for Optical Engineering, Vol. 5921, p. 1-9, 2005
  • Improvement of thickness uniformity of quartz crystal wafer by numerically controlled plasma CVM, Masafumi Shibahara,Kazuya Yamamura,Yasuhisa Sano,Tsuyoshi Sugiyama,Katsuyoshi Endo,Yuzo Mori, Proceedings of SPIE - The International Society for Optical Engineering, Vol. 5869, p. 1-8, 2005
  • 数値制御プラズマCVMによる水晶ウエハの高精度加工に関する研究 -加工装置の開発と基本的加工特性の取得-, 精密工学会誌, Vol.71 No.4, pp.455-459., 2005
  • 数値制御プラズマCVMによる水晶ウエハの高精度加工に関する研究 -円筒型回転電極を用いた数値制御加工による水晶ウエハ厚さの均一化-, 精密工学会誌, Vol.71, No.5, pp.655-659., Vol. Vol.71, No.5, pp.655-659./,, 2005
  • Development of surface figuring and smoothing technologies for ultraprecise X-ray mirror Fabrication, 2005
  • Hard X-ray diffraction-limited nanofocusing with kirkpatrick-baez mirrors, Hidekazu Mimura,Satoshi Matsuyama,Hirokatsu Yumoto,Hideyuki Hara,Kazuya Yamamura,Yasuhisa Sano,Masafumi Shibahara,Katsuyoshi Endo,Yuzo Mori,Yoshinori Nishlno,Kenji Tamasaku,Makina Yabashi,Tetsuya Ishikawa,Kazuto Yamauchi, Japanese Journal of Applied Physics, Part 2: Letters, Vol. 44, No. 16-19, p. L539-L542, 2005
  • Plasma Chemical Vaporization Machining (PCVM), Book of Lecture Note, IWCGT-3, (2005) pp. 305-316., 2005
  • Improvement of thickness uniformity of quartz crystal wafer by numerically controlled plasma CVM., Proc. SPIE 5918(2005) 591804, Vol. 5918, 591804, 2005
  • Improvement of Thickness Uniformity of Quartz Wafer by Numerically Controlled Plasma CVM -Development of the NC-PCVM Machine and Acquisition of Machining Properties-, Journal of the Japan Society for Precision Engineering, 2005
  • Development of surface figuring and smoothing technologies for ultraprecise X-ray mirror Fabrication, 2005
  • Plasma Chemical Vaporization Machining (PCVM), Book of Lecture Note, IWCGT-3, (2005) pp. 305-316., 2005
  • A new designed ultra-high precision profiler, Y. Higashi,Y. Takaie,K. Endo,T. Kume,K. Enami,K. Yamauchi,K. Yamamura,H. Sano,K. Ueno,Y. Mori, Proceedings of SPIE - The International Society for Optical Engineering, Vol. 5921, p. 1-9, 2005
  • Improvement of thickness uniformity of quartz crystal wafer by numerically controlled plasma CVM., Proc. SPIE 5918(2005) 591804, Vol. 5918, 591804/,, 2005
  • Improvement of Thickness Uniformity of Quartz Wafer by Numerically Controlled Plasma CVM -Correction of Thickness Variation of Quartz Wafer by Numerically Controlled Machining Utilizing Rotary Electrode-, Journal of the Japan Society for Precision Engineering, Vol. Vol.71, No.5, pp.655-659./,, 2005
  • 硬X線ナノ集光のための高精度楕円体ミラーの作製と集光特性の評価, 湯本博勝,山内和人,三村秀和,松山智至,山村和也,佐野泰久,西野吉則,玉作賢治,矢橋牧名, 応用物理学会学術講演会講演予稿集, Vol. 65th, No. 2, 2004/09/01
  • ミラー集光系を用いたX線顕微鏡(ナノスコピー)の開発, 松山智至,山内和人,三村秀和,湯本博勝,山村和也,西野吉則,玉作賢治,矢橋牧名,石川哲也, 応用物理学会学術講演会講演予稿集, Vol. 65th, No. 2, 2004/09/01
  • Machining of next generation semiconductor materials by plasma chemical vaporization machining, Kazuya Yamamura,Yuzo Mori,Yasuhisa Sano, Abstracts of the 14th international conference on crystal growth, pp.606, Vol. pp.606, 2004/08
  • Microstitching Interferometry for hard X-ray nanofocusing mirrors, H. Mimura,H. Yumoto,K. Yamamura,Y. Sano,S. Matsuyama,K. Ueno,K. Endo,Y. Mori,M. Yabashi,K. Tamasaku,Y. Nishino,T. Ishikawa,K. Yamauchi, Proceedings of SPIE, Vol. 5533, 171-180, 2004/08
  • Wave-optical and ray-tracing analysis to establish a two dimensional focusing unit using K-B arrangement, S. Matsuyama,H. Mimura,K. Yamamura,H. Yumoto,Y. Sano,K. Endo,Y. Mori,M. Yabashi,K. Tamasaku,Y. Nishino,T. Ishikawa,K. Yamauchi, Proceedings of SPIE, SPIE-INT SOC OPTICAL ENGINEERING, Vol. 5533, p. 181-191, 2004/08
  • Fabrication technology of ultraprecise mirror optics to realize hard X-ray nanobeam, SPIE International Symposium, Optical Science and Technology, K. Yamauchi,K. Yamamura,H. Mimura,Y. Sano,S. Matsuyama,H. Yumoto,K. Ueno,M. Shibahara,K. Endo,M. Yabashi,K. Tamasaku,Y. Nishino,T. Ishikawa,Y. Mori, Proceedings of SPIE, SPIE-INT SOC OPTICAL ENGINEERING, Vol. 5533, p. 116-123, 2004/08
  • Creation of perfect surfaces, Yuzo Mori,Kazuya Yamamura,Katsuyoshi Endo,Kazuto Yamauchi,Kiyoshi Yasutake,Hidekazu Goto,Hiroaki Kakiuchi,Yasuhisa Sano,Hidekazu Mimura, Abstracts the 14th international conference on crystal growth, pp.211, 2004/08
  • Image quality improvement in a hard X-ray projection microscope using total reflection mirror optics, H Mimura,K Yamauchi,K Yamamura,A Kubota,S Matsuyama,Y Sano,K Ueno,K Endo,Y Nishino,K Tamasaku,M Yabashi,T Ishikawa,Y Mori, JOURNAL OF SYNCHROTRON RADIATION, BLACKWELL MUNKSGAARD, Vol. 11, p. 343-346, 2004/07
  • Image quality improvement in hard X-ray projection microscope using total reflection mirror optics, H. Mimura,K. Yamauchi,K. Yamamura,A. Kubota,S. Matsuyama,Y. Sano,K. Ueno,K. Endo,Y. Nishino,K. Tamasaku,M. Yabashi,T. Ishikawa,Y. Mori, Journal of Synchrotoron Radiation, 11, pp. 343-346., Vol. 11, pp. 343-346/,, 2004/07
  • Image quality improvement in a hard X-ray projection microscope using total reflection mirror optics, H Mimura,K Yamauchi,K Yamamura,A Kubota,S Matsuyama,Y Sano,K Ueno,K Endo,Y Nishino,K Tamasaku,M Yabashi,T Ishikawa,Y Mori, JOURNAL OF SYNCHROTRON RADIATION, BLACKWELL MUNKSGAARD, Vol. 11, p. 343-346, 2004/07
  • Thinning of silicon-on-insulator wafers by numerically controlled plasma chemical vaporization machining, Yuzo Mori,Kazuya Yamamura,Yasuhisa Sano, Review of Scientific Instruments, Vol. 75, No. 4, pp.942-946, AMER INST PHYSICS, Vol. 75, No. 4, p. 942-946, 2004/04
  • Thinning of silicon-on-insulator wafers by numerically controlled plasma chemical vaporization machining, Yuzo Mori,Kazuya Yamamura,Yasuhisa Sano, Review of Scientific Instruments, Vol. 75, No. 4, p. 942-946, 2004/04
  • Thinning of silicon-on-insulator wafers by numerically controlled plasma chemical vaporization machining, Y Mori,K Yamamura,Y Sano, REVIEW OF SCIENTIFIC INSTRUMENTS, AMER INST PHYSICS, Vol. 75, No. 4, p. 942-946, 2004/04
  • 走査型X線顕微鏡のための楕円体ミラーを用いた二次元集光ユニットの開発, 松山智至,山内和人,山村和也,三村秀和,佐野泰久,玉作賢治,矢橋牧名,西野吉則,石川哲也, 応用物理学関係連合講演会講演予稿集, Vol. 51st, No. 2, 2004/03/28
  • Fabrication technology for hard X-ray reflective optics, Y. Mori,K. Yamuchi,K. Yamamura,H. Mimura,Y.Sano,S. Matsuyama,K. Endo,Y. Nishino,K. Tamasaku,M. Yabashi,T. Ishikawa, Proceedings of Second International Workshop on Metrology for X-ray Optics, 2004/03
  • STM observations of Si(011) and Si(111) surfaces finished by ultra-precision machining, Katoh Jun,Kubota Akihisa,Arima Kenta,Yamamura Kazuya,Yamauchi Kazuto,Endo Katsuyoshi,Mori Yuzo, Proceedings of JSPE Semestrial Meeting, The Japan Society for Precision Engineering, Vol. 2004, No. 0, p. 384-384, 2004
  • Measurement of surface profiles of elliptical mirrors by using interferometer -Development of highly accurate stitching method-, Yumoto Hirokatsu,Yamauchi Kazuto,Mimura Hidekazu,Matsuyama Satoshi,Yamamura Kazuya,Sano Yasuhisa,Endo Katsuyoshi,Ishikawa Tetsuya,Mori Yuzo, Proceedings of JSPE Semestrial Meeting, The Japan Society for Precision Engineering, Vol. 2004, No. 0, p. 116-116, 2004
  • Development of a figure correction method having spatial resolution close to 0.1mm, Y Mori,K Yamauchi,K Yamamura,H Mimura,Y Sano,A Saito,K Endo,A Souvorov,M Yabashi,K Tamasaku,T Ishikawa, ADVANCES IN MIRROR TECHNOLOGY FOR X-RAY, EUV LITHOGRAPHY, LASER, AND OTHER APPLICATIONS, SPIE-INT SOC OPTICAL ENGINEERING, Vol. 5193, p. 105-111, 2004
  • 原子の滑らかさの加工技術, O plus E, Vol. 26, No.1, pp.36-42, Vol. Vol. 26, No.1, pp.36-42, 2004
  • Fabrication technology for hard X-ray reflective optics, Proceedings of Second International Workshop on Metrology for X-ray Optics, 2004
  • Microstitching interferometry for nano focusing mirror optics, H Mimura,H Yumoto,S Matsuyama,K Yamamura,Y Sano,K Ueno,K Endo,Y Mori,M Yabashi,K Tamasaku,Y Nishino,T Ishikawa,K Yamauchi, ADVANCES IN MIRROR TECHNOLOGY FOR X-RAY, EUV LITHOGRAPHY, LASER, AND OTHER APPLICATIONS II, SPIE-INT SOC OPTICAL ENGINEERING, Vol. 5533, p. 171-180, 2004
  • Wave-optical and ray-tracing analysis to establish a compact two-dimensional focusing unit using K-B mirror arrangement, S Matsuyama,H Mimura,K Yamamura,H Yumoto,Y Sano,K Endo,Y Mori,M Yabashi,K Tamasaku,Y Nishino,T Ishikawa,K Yamauchi, ADVANCES IN MIRROR TECHNOLOGY FOR X-RAY, EUV LITHOGRAPHY, LASER, AND OTHER APPLICATIONS II, SPIE-INT SOC OPTICAL ENGINEERING, Vol. 5533, p. 181-191, 2004
  • Fabrication technology of ultraprecise mirror optics to realize hard X-ray nanobeam, K Yamauchi,K Yamamura,H Mimura,Y Sano,S Matsuyama,H Yumoto,K Ueno,M Shibahara,K Endo,M Yabashi,K Tamasaku,Y Nishino,T Ishikawa,Y Mori, ADVANCES IN MIRROR TECHNOLOGY FOR X-RAY, EUV LITHOGRAPHY, LASER, AND OTHER APPLICATIONS II, SPIE-INT SOC OPTICAL ENGINEERING, Vol. 5533, p. 116-123, 2004
  • Creation of perfect surfaces, 2004
  • 数値制御プラズマCVMによる次世代超薄膜SOIウエハの製作, 佐野泰久,山村和也,遠藤勝義,森 勇藏, 大阪大学低温センターだより,125,11-15, Vol. 125,11-15, 2004/01
  • 原子の滑らかさの加工技術, O plus E, Vol. 26, No.1, pp.36-42, Vol. Vol. 26, No.1, pp.36-42, 2004
  • 原子の滑らかさの加工技術, O plus E, Vol. 26, No.1, pp.36-42, Vol. Vol. 26, No.1, pp.36-42/,, 2004
  • Microstitching interferometry for nano focusing mirror optics, H Mimura,H Yumoto,S Matsuyama,K Yamamura,Y Sano,K Ueno,K Endo,Y Mori,M Yabashi,K Tamasaku,Y Nishino,T Ishikawa,K Yamauchi, ADVANCES IN MIRROR TECHNOLOGY FOR X-RAY, EUV LITHOGRAPHY, LASER, AND OTHER APPLICATIONS II, SPIE-INT SOC OPTICAL ENGINEERING, Vol. 5533, p. 171-180, 2004
  • Wave-optical and ray-tracing analysis to establish a compact two-dimensional focusing unit using K-B mirror arrangement, S Matsuyama,H Mimura,K Yamamura,H Yumoto,Y Sano,K Endo,Y Mori,M Yabashi,K Tamasaku,Y Nishino,T Ishikawa,K Yamauchi, ADVANCES IN MIRROR TECHNOLOGY FOR X-RAY, EUV LITHOGRAPHY, LASER, AND OTHER APPLICATIONS II, SPIE-INT SOC OPTICAL ENGINEERING, Vol. 5533, p. 181-191, 2004
  • Fabrication technology of ultraprecise mirror optics to realize hard X-ray nanobeam, K Yamauchi,K Yamamura,H Mimura,Y Sano,S Matsuyama,H Yumoto,K Ueno,M Shibahara,K Endo,M Yabashi,K Tamasaku,Y Nishino,T Ishikawa,Y Mori, ADVANCES IN MIRROR TECHNOLOGY FOR X-RAY, EUV LITHOGRAPHY, LASER, AND OTHER APPLICATIONS II, SPIE-INT SOC OPTICAL ENGINEERING, Vol. 5533, p. 116-123, 2004
  • Creation of perfect surfaces, 2004
  • 数値制御プラズマCVMによる次世代超薄膜SOIウエハの製作, 大阪大学低温センターだより,125,11-15, Vol. 125,11-15/,, 2004
  • 原子の滑らかさの加工技術, O plus E, Vol. 26, No.1, pp.36-42, Vol. Vol. 26, No.1, pp.36-42/,, 2004
  • Machining of next generation semiconductor materials by plasma chemical vaporization machining, Abstracts of the 14th international conference on crystal growth, pp.606, Vol. pp.606, 2004
  • Quality improvement in hard X-ray projection microscope using total reflection mirror optics., J. Synchrotron Rad., Vol. Vol. 11, pp. 343-346./,, 2004
  • Development of a figure correction method having spatial resolution close to 0.1mm, Y Mori,K Yamauchi,K Yamamura,H Mimura,Y Sano,A Saito,K Endo,A Souvorov,M Yabashi,K Tamasaku,T Ishikawa, ADVANCES IN MIRROR TECHNOLOGY FOR X-RAY, EUV LITHOGRAPHY, LASER, AND OTHER APPLICATIONS, SPIE-INT SOC OPTICAL ENGINEERING, Vol. 5193, p. 105-111, 2004
  • Ultra-precision machining technology of realizing atomically smooth surface, O plus E, Vol. 26, No.1, pp.36-42, Vol. Vol. 26, No.1, pp.36-42, 2004
  • Fabrication technology for hard X-ray reflective optics, Proceedings of Second International Workshop on Metrology for X-ray Optics, 2004
  • Image quality improvement in hard X-ray projection microscope using total reflection mirror optics, Journal of Synchrotoron Radiation, 11, pp. 343-346., Vol. 11, pp. 343-346, 2004
  • Fabrication technology of ultraprecise mirror optics to realize hard X-ray nanobeam, K Yamauchi,K Yamamura,H Mimura,Y Sano,S Matsuyama,H Yumoto,K Ueno,M Shibahara,K Endo,M Yabashi,K Tamasaku,Y Nishino,T Ishikawa,Y Mori, ADVANCES IN MIRROR TECHNOLOGY FOR X-RAY, EUV LITHOGRAPHY, LASER, AND OTHER APPLICATIONS II, SPIE-INT SOC OPTICAL ENGINEERING, Vol. 5533, p. 116-123, 2004
  • Creation of perfect surfaces, Abstracts the 14th international conference on crystal growth, pp.211, 2004
  • Ultra-precision machining technology of realizing atomically smooth surface, Yuzo Mori,Kazuya Yamamura,Kazuto Yamauchi,Yasuhisa Sano,Hidekazu Mimura, O plus E, Vol. 26, No.1, pp.36-42, (株)新技術コミュニケーションズ, Vol. Vol. 26, No.1, pp.36-42, 2004/01
  • Machining of next generation semiconductor materials by plasma chemical vaporization machining, Abstracts of the 14th international conference on crystal growth, pp.606, Vol. pp.606, 2004
  • Development of a figure correction method having spatial resolution close to 0.1mm, Y Mori,K Yamauchi,K Yamamura,H Mimura,Y Sano,A Saito,K Endo,A Souvorov,M Yabashi,K Tamasaku,T Ishikawa, ADVANCES IN MIRROR TECHNOLOGY FOR X-RAY, EUV LITHOGRAPHY, LASER, AND OTHER APPLICATIONS, SPIE-INT SOC OPTICAL ENGINEERING, Vol. 5193, p. 105-111, 2004
  • Ultra-precision machining technology of realizing atomically smooth surface, O plus E, Vol. 26, No.1, pp.36-42, Vol. Vol. 26, No.1, pp.36-42/,, 2004
  • Fabrication technology for hard X-ray reflective optics, Proceedings of Second International Workshop on Metrology for X-ray Optics, 2004
  • Microstitching Interferometry for hard X-ray nanofocusing mirrors, Proceedings of SPIE, Vol. 5533, 171-180/,, 2004
  • Wave-optical and ray-tracing analysis to establish a compact two-dimensional focusing unit using K-B mirror arrangement, S Matsuyama,H Mimura,K Yamamura,H Yumoto,Y Sano,K Endo,Y Mori,M Yabashi,K Tamasaku,Y Nishino,T Ishikawa,K Yamauchi, ADVANCES IN MIRROR TECHNOLOGY FOR X-RAY, EUV LITHOGRAPHY, LASER, AND OTHER APPLICATIONS II, SPIE-INT SOC OPTICAL ENGINEERING, Vol. 5533, p. 181-191, 2004
  • Ultra-precision machining technology of realizing atomically smooth surface, O plus E, Vol. 26, No.1, pp.36-42, Vol. Vol. 26, No.1, pp.36-42/,, 2004
  • Machining of next generation semiconductor materials by plasma chemical vaporization machining, Abstracts of the 14th international conference on crystal growth, pp.606, Vol. pp.606, 2004
  • Two-dimensional submicron focusing of hard X-rays by two elliptical mirrors fabricated by plasma chemical vaporization machining and elastic emission machining, K Yamauchi,K Yamamura,H Mimura,Y Sano,A Saito,K Endo,A Souvorov,M Yabashi,K Tamasaku,T Ishikawa,Y Mori, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, INST PURE APPLIED PHYSICS, Vol. 42, No. 11, p. 7129-7134, 2003/11
  • Two-dimensional submicron focusing of hard X-rays by two elliptical mirrors fabricated by plasma chemical vaporization machining and elastic emission machining, K Yamauchi,K Yamamura,H Mimura,Y Sano,A Saito,K Endo,A Souvorov,M Yabashi,K Tamasaku,T Ishikawa,Y Mori, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, INST PURE APPLIED PHYSICS, Vol. 42, No. 11, p. 7129-7134, 2003/11
  • Ultraviolet Emission Spectroscopy and Absorption Spectroscopy of CF2 Radical in Chemical Vaporization Machining (CVM) Plasma Generated with High Speed Rotating Cylindrical Electrode, Yasushi Oshikane,Shinya Sato,Akihiko Nagao,Kazuya Yamamura,Katsuyoshi Endo,Yuzo Mori, Technical Program of AVS 50th, 2003/11
  • Two-dimensional submicron focusing of hard X-rays by two elliptical mirrors fabricated by plasma chemical vaporization machining and elastic emission machining, K Yamauchi,K Yamamura,H Mimura,Y Sano,A Saito,K Endo,A Souvorov,M Yabashi,K Tamasaku,T Ishikawa,Y Mori, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, INST PURE APPLIED PHYSICS, Vol. 42, No. 11, p. 7129-7134, 2003/11
  • Two-dimensional submicron focusing of hard X-rays by two elliptical mirrors fabricated by plasma chemical vaporization machining and elastic emission machining, K Yamauchi,K Yamamura,H Mimura,Y Sano,A Saito,K Endo,A Souvorov,M Yabashi,K Tamasaku,T Ishikawa,Y Mori, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, INST PURE APPLIED PHYSICS, Vol. 42, No. 11, p. 7129-7134, 2003/11
  • Two-dimensional Submicron Focusing of Hard X-rays by Two Elliptical Mirrors Fabricated by Plasma Chemical Vaporization Machining and Elastic Emission Machining, Kazuto Yamauchi,Kazuya Yamamura,Hidekazu Mimura,Yasuhisa Sano,Akira Saito,Katsuyoshi Endo,Alexei Souvorov,Makina Yabashi,Kenji Tamasaku,Tetsuya Ishikawa,Yuzo Mori, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, INST PURE APPLIED PHYSICS, Vol. 42, No. 11, p. 7129-7134, 2003/11
  • Fabrication of elliptical mirror at nanometer-level accuracy for hard x-ray focusing by numerically controlled plasma chemical vaporization machining., K. Yamamura,K. Yamauchi,H. Mimura,Y. Sano,A. Saito,K. Endo,A. Souvorov,M. Yabashi,K. Tamasaku,T. Ishikawa,Y. Mori, REVIEW OF SCIENTIFIC INSTRUMENTS, AMER INST PHYSICS, Vol. 74, No. 10, p. 4549-4553, 2003/10
  • Fabrication of elliptical mirror at nanometer-level accuracy for hard x-ray focusing by numerically controlled plasma chemical vaporization machining, K Yamamura,K Yamauchi,H Mimura,Y Sano,A Saito,K Endo,A Souvorov,M Yabashi,K Tamasaku,T Ishikawa,Y Mori, REVIEW OF SCIENTIFIC INSTRUMENTS, AMER INST PHYSICS, Vol. 74, No. 10, p. 4549-4553, 2003/10
  • Fabrication of elliptical mirror at nanometer-level accuracy for hard x-ray focusing by numerically controlled plasma chemical vaporization machining, K Yamamura,K Yamauchi,H Mimura,Y Sano,A Saito,K Endo,A Souvorov,M Yabashi,K Tamasaku,T Ishikawa,Y Mori, REVIEW OF SCIENTIFIC INSTRUMENTS, AMER INST PHYSICS, Vol. 74, No. 10, p. 4549-4553, 2003/10
  • Fabrication of elliptical mirror at nanometer-level accuracy for hard x-ray focusing by numerically controlled plasma chemical vaporization machining, K Yamamura,K Yamauchi,H Mimura,Y Sano,A Saito,K Endo,A Souvorov,M Yabashi,K Tamasaku,T Ishikawa,Y Mori, REVIEW OF SCIENTIFIC INSTRUMENTS, AMER INST PHYSICS, Vol. 74, No. 10, p. 4549-4553, 2003/10
  • Fabrication technology of hard X-ray aspherical mirror optics and application to nanospectroscopy, Y. Mori,K. Yamauchi,K. Yamamura,H. Mimura,Y. Sano,A. Saito,K. Endo,A. Souvorov,M. Yabashi, K, Proc. SPIE 5193, pp.11-17, Vol. 5193, pp.11-17/,, 2003/08
  • Development of a figure correction method having spatial resolution close to 0.1mm, Y. Mori,K. Yamauchi,K. Yamamura,H. Mimura,Y. Sano,A. Saito,K. Endo,A. Souvorov,M. Yabashi,K. Tamasaku,T. Ishikawa, Proc. SPIE 5193, pp.105-111, SPIE-INT SOC OPTICAL ENGINEERING, Vol. 5193, p. 105-111, 2003/08
  • Wave-optical evaluation of reflected X-ray intensity and wavefront distribution in total reflection hard X-ray mirror optics, Kazuto Yamauchi,Kazuya Yamamura,Hidekazu Mimura,Yasuhisa Sano,Akira Saito,Akihisa Kubota,Masahiko Kanaoka,Alexei Souvorov,Kenji Tamasaku,Makina Yabashi,Tetsuya Ishikawa,Yuzo Mori, Vol. 69, 997-1001/,, 2003/07
  • Development of the Measurement System with Interferometers for Ultraprecise X-ray mirror, Kazuto Yamauchi,Kazuya Yamamura,Hidekazu Mimura,Yasuhisa Sano,Akihisa Kubota,Yasuhiro Sekito,Kazumasa Ueno,Alexei Souvorov,Kenji Tamasaku,Makina Yabashi,Tetsuya Ishikawa,Yuzo Mori, Vol. 69, No. 6, p. 856-860, 2003/06
  • Microstitching interferometry for x-ray reflective optics, K Yamauchi,K Yamamura,H Mimura,Y Sano,A Saito,K Ueno,K Endo,A Souvorov,M Yabashi,K Tamasaku,T Ishikawa,Y Mori, REVIEW OF SCIENTIFIC INSTRUMENTS, AMER INST PHYSICS, Vol. 74, No. 5, p. 2894-2898, 2003/05
  • Microstitching interferometry for x-ray reflective optics, K Yamauchi,K Yamamura,H Mimura,Y Sano,A Saito,K Ueno,K Endo,A Souvorov,M Yabashi,K Tamasaku,T Ishikawa,Y Mori, REVIEW OF SCIENTIFIC INSTRUMENTS, AMER INST PHYSICS, Vol. 74, No. 5, p. 2894-2898, 2003/05
  • Microstitching interferometry for x-ray reflective optics, K. Yamauchi,K. Yamamura,H. Mimura,Y. Sano,A. Saito,K. Ueno,K. Endo,A. Souvorov,M. Yabashi,K. Tamasaku,T. Ishikawa,Y. Mori, REVIEW OF SCIENTIFIC INSTRUMENTS, AMER INST PHYSICS, Vol. 74, No. 5, p. 2894-2898, 2003/05
  • Microstitching interferometry for x-ray reflective optics, K Yamauchi,K Yamamura,H Mimura,Y Sano,A Saito,K Ueno,K Endo,A Souvorov,M Yabashi,K Tamasaku,T Ishikawa,Y Mori, REVIEW OF SCIENTIFIC INSTRUMENTS, AMER INST PHYSICS, Vol. 74, No. 5, p. 2894-2898, 2003/05
  • Thinning of SOI by numerically controlled Plasma CVM(Chemical Vaporization Machining) -Evalation of Machined Surface for Electron Devices-, Yuzo Mori,Yasuhisa Sano,Kazuya Yamamura,Satoru Morita,Ichiro Ohshima,Yuji Saito,Shigetoshi Sugawa,Tadahiro Ohmi, Vol. 69 721-725, 2003/05
  • Microstitching interferometry for x-ray reflective optics, K Yamauchi,K Yamamura,H Mimura,Y Sano,A Saito,K Ueno,K Endo,A Souvorov,M Yabashi,K Tamasaku,T Ishikawa,Y Mori, REVIEW OF SCIENTIFIC INSTRUMENTS, AMER INST PHYSICS, Vol. 74, No. 5, p. 2894-2898, 2003/05
  • Fabrication of Ultraprecise X-ray Mirror by Plasma CVM and EEM and the Application of the Mirror, Mori Yuzo,Yamauchi Kazuto,Yamamura Kazuya,Mimura Hidekazu,Sano Yasuhisa,Kubota Akihisa,Endo Katsuyoshi,Souvorov Alexei,Tamasaku Kenji,Yabashi Makina,Ishikawa Tetsuya, Proceedings of JSPE Semestrial Meeting, The Japan Society for Precision Engineering, Vol. 2003, No. 0, p. 388-388, 2003
  • 加工技術データファイル 基礎編(特殊加工)、5.7プラズマCVM, (財)機械振興協会 技術研究所, 2003
  • Crystal Growth Technology(Plasma-CVM(Chemical Vaporization Machining)), John Wiley & Sons, Vol. pp. 587-606, 2003
  • 数値制御プラズマCVM(Chemical Vaporization Machining)によるSOIの薄膜化 -デバイス用基板としての加工面の評価-, 精密工学会誌 69 (2003) 721-725., Vol. 69 721-725, 2003
  • 高精度X線ミラーのための干渉計を利用した形状計測システムの開発, 精密工学会誌, 69, 6, 856-860, Vol. 69, 6, 856-860, 2003
  • 硬X線用斜入射平面ミラーの形状誤差が反射X線強度・位相分布に及ぼす影響の波動光学的評価, 精密工学会誌, 69, 2003, 997-1001, Vol. 69, 997-1001, 2003
  • Ultraprecision Machining based on Physics and Chemistry, Yuzo Mori,Kikuji Hirose,Kazuto Yamauchi,Hidekazu Goto,Kazuya Yamamura,Yasuhisa Sano, Sensors and Materials Sensors and Materials, MYU, SCIENTIFIC PUBLISHING DIVISION, Vol. 15, No. 1, p. 001-019, 2003/01
  • Ultraviolet Emission Spectroscopy and Absorption Spectroscopy of CF2 Radical in Chemical Vaporization Machining (CVM) Plasma Generated with High Speed Rotating Cylindrical Electrode, Technical Program of AVS 50th, 2003
  • 数値制御プラズマCVM(Chemical Vaporization Machining)によるSOIの薄膜化 -デバイス用基板としての加工面の評価-, 精密工学会誌 69 (2003) 721-725., Vol. 69 721-725, 2003
  • 高精度X線ミラーのための干渉計を利用した形状計測システムの開発, 精密工学会誌, 69, 6, 856-860, Vol. 69, 6, 856-860, 2003
  • 硬X線用斜入射平面ミラーの形状誤差が反射X線強度・位相分布に及ぼす影響の波動光学的評価, 精密工学会誌, 69, 2003, 997-1001, Vol. 69, 997-1001, 2003
  • Fabrication technology of hard X-ray aspherical mirror optics and application to nanospectroscopy, Proc. SPIE 5193, pp.11-17, Vol. 5193, pp.11-17, 2003
  • 数値制御プラズマCVM(Chemical Vaporization Machining)によるSOIの薄膜化 -デバイス用基板としての加工面の評価-, 精密工学会誌 69 (2003) 721-725., Vol. 69 721-725, 2003
  • 高精度X線ミラーのための干渉計を利用した形状計測システムの開発, 精密工学会誌, 69, 6, 856-860, Vol. 69, 6, 856-860/,, 2003
  • 硬X線用斜入射平面ミラーの形状誤差が反射X線強度・位相分布に及ぼす影響の波動光学的評価, 精密工学会誌, 69, 2003, 997-1001, Vol. 69, 997-1001/,, 2003
  • 数値制御プラズマCVM(Chemical Vaporization Machining)によるSOIの薄膜化 -デバイス用基板としての加工面の評価-, 精密工学会誌 69 (2003) 721-725., Vol. 69 721-725, 2003
  • 高精度X線ミラーのための干渉計を利用した形状計測システムの開発, 精密工学会誌, 69, 6, 856-860, Vol. 69, 6, 856-860/,, 2003
  • 硬X線用斜入射平面ミラーの形状誤差が反射X線強度・位相分布に及ぼす影響の波動光学的評価, 精密工学会誌, 69, 2003, 997-1001, Vol. 69, 997-1001/,, 2003
  • 硬X線用斜入射平面ミラーの形状誤差が反射X線強度・位相分布に及ぼす影響の波動光学的評価, 精密工学会誌, Vol. Vol. 69, pp. 997-1001./,, 2003
  • 高精度X線ミラーのための干渉計を利用した形状計測システムの開発, 精密工学会誌, Vol. Vol. 69, pp. 856-860./,, 2003
  • 数値制御プラズマCVM(Chemical Vaporization Machining)によるSOIの薄膜化 -デバイス用基板としての加工面の評価-, 精密工学会誌, Vol. Vol. 69, pp. 721-725./,, 2003
  • Fabrication of elliptical mirror at nanometer-level accuracy for hard x-ray focusing by numerically controlled plasma chemical vaporization machining., Rev. Sci. Instrum., Vol. Vol. 74, pp. 4549-4553./,, 2003
  • Crystal Growth Technology(Plasma-CVM(Chemical Vaporization Machining)), John Wiley & Sons, Vol. pp. 587-606, 2003
  • Thinning of SOI by numerically controlled Plasma CVM(Chemical Vaporization Machining) -Evalation of Machined Surface for Electron Devices-, Vol. 69 721-725, 2003
  • Wave-optical evaluation of reflected X-ray intensity and wavefront distribution in total reflection hard X-ray mirror optics, Vol. 69, 997-1001, 2003
  • Ultraprecision Machining based on Physics and Chemistry, Yuzo Mori,Kikuji Hirose,Kazuto Yamauchi,Hidekazu Goto,Kazuya Yamamura,Yasuhisa Sano, Sensors and Materials, Vol. 15, No. 1 (2003), pp.1-19., 2003/01
  • Ultraviolet Emission Spectroscopy and Absorption Spectroscopy of CF2 Radical in Chemical Vaporization Machining (CVM) Plasma Generated with High Speed Rotating Cylindrical Electrode, Technical Program of AVS 50th, 2003
  • Thinning of SOI by numerically controlled Plasma CVM(Chemical Vaporization Machining) -Evalation of Machined Surface for Electron Devices-, Vol. 69 721-725, 2003
  • Development of the Measurement System with Interferometers for Ultraprecise X-ray mirror, Vol. 69, 6, 856-860, 2003
  • Wave-optical evaluation of reflected X-ray intensity and wavefront distribution in total reflection hard X-ray mirror optics, Vol. 69, 997-1001, 2003
  • Fabrication technology of hard X-ray aspherical mirror optics and application to nanospectroscopy, Proc. SPIE 5193, pp.11-17, Vol. 5193, pp.11-17, 2003
  • Development of the Measurement System with Interferometers for Ultraprecise X-ray mirror, Vol. 69, 6, 856-860/,, 2003
  • Ultraprecision Machining based on Physics and Chemistry, Sensors and Materials, Vol. 15, No. 1 (2003), pp.1-19., 2003
  • Ultraviolet Emission Spectroscopy and Absorption Spectroscopy of CF2 Radical in Chemical Vaporization Machining (CVM) Plasma Generated with High Speed Rotating Cylindrical Electrode, Technical Program of AVS 50th, 2003
  • Thinning of SOI by numerically controlled Plasma CVM(Chemical Vaporization Machining) -Evalation of Machined Surface for Electron Devices-, Vol. 69 721-725, 2003
  • Development of the Measurement System with Interferometers for Ultraprecise X-ray mirror, Vol. 69, 6, 856-860/,, 2003
  • Wave-optical evaluation of reflected X-ray intensity and wavefront distribution in total reflection hard X-ray mirror optics, Vol. 69, 997-1001/,, 2003
  • Fabrication technology of hard X-ray aspherical mirror optics and application to nanospectroscopy, Proc. SPIE 5193, pp.11-17, Vol. 5193, pp.11-17/,, 2003
  • Thinning of SOI by numerically controlled plasma CVM(chemical vaporization machining) -Development of the NC-PCVM machine and trial of ultra-thin SOI wafer-, Vol. Vol.68, No.12, p.1590-1594/,, 2002/12
  • プラズマCVMプロセス中のCF, CF_2ラジカルの分光計測 : レーザー誘起蛍光分光と紫外線吸収分光とによるラジカル密度分布診断, 押鐘 寧,佐藤 慎也,山村 和也,遠藤 勝義,片岡 俊彦,森 勇藏, 精密工学会大会学術講演会講演論文集, Vol. 2002, No. 2, p. 461-461, 2002/10/01
  • プラズマCVMおよびEEMによる放射光用X線ミラーの作製とその応用 : 二枚の平面ミラーを用いたX線干渉計の開発, 森 勇藏,山内 和人,山村 和也,三村 秀和,佐野 泰久,齋藤 彰,SOUVOROV A,矢橋 牧名,玉作 賢治,石川 哲也, 精密工学会大会学術講演会講演論文集, Vol. 2002, No. 2, 2002/10/01
  • プラズマCVMおよびEEMによる放射光用X線ミラーの作製とその応用 : 硬X線顕微鏡の開発, 森 勇蔵,山内 和人,山村 和也,三村 秀和,佐野 泰久,斉藤 彰,SOUVOROV Alexei,矢橋 牧名,玉作 賢治,石川 哲也, 精密工学会大会学術講演会講演論文集, Vol. 2002, No. 2, 2002/10/01
  • Fabrication of Elliptical Mirror for Synchrotron Radiation Hard X-ray by Plasma Chemical Vaporization Machining and Elastic Emission Machining and Evaluation of the focusing Performances, Journal of the Japanese Society of Precision Engineering, Vol. 68, No. 10, p. 1347-1350, 2002/10
  • Fabrication of the Elliptical Mirror for Synchrotron hard X-ray by Plasma Chemical Vaporization Machining and Elastic Emission Machining and the Evaluation of the Focusing Performances, Yuzo Mori,Kazuti Yamauchi,Kazuya Yamamura,Hidekazu Mimura,Yasuhisa Sano,Akira Saito,Alexei Souvorov,Kenji Tamasaku,Makina Yabashi,Tetsuya Ishikawa, Jouranal of the Japan Society for Precision Engineering, Vol.68, p.1347-1350, Vol. 68, No. 10, p. 1347-1350, 2002/10
  • コヒーレント照射でのX線全反射ミラー, 石川哲也,矢橋牧名,玉作賢治,スボロフ アレクセイ,山内和人,山村和也,三村秀和,齋藤 彰,森 勇藏, 放射光, Vol.15, p.296-302, Vol. Vol.15, p.296-302, 2002/09
  • Nearly diffraction-limited line focusing of a hard-X-ray beam with an elliptically figured mirror, K Yamauchi,K Yamamura,H Mimura,Y Sano,A Saito,A Souvorov,M Yabashi,K Tamasaku,T Ishikawa,Y Mori, JOURNAL OF SYNCHROTRON RADIATION, BLACKWELL MUNKSGAARD, Vol. 9, p. 313-316, 2002/09
  • Nearly diffraction-limited line focusing of a hard-X-ray beam with an elliptically figured mirror, K Yamauchi,K Yamamura,H Mimura,Y Sano,A Saito,A Souvorov,M Yabashi,K Tamasaku,T Ishikawa,Y Mori, JOURNAL OF SYNCHROTRON RADIATION, BLACKWELL MUNKSGAARD, Vol. 9, p. 313-316, 2002/09
  • Deterministic retrieval of surface waviness by means of topography with coherent X-rays, A. Souvorov,M. Yabashi,K. Tamasaku,T. Ishikawa,Y. Mori,K. Yamauchi,K. Yamamura,A. Saito, Vol. Vol.9, p.223-228/,, 2002/09
  • Nearly diffraction-limited line focusing of a hard-X-ray beam with an elliptically figured mirror, K. Yamauchi,K. Yamamura,H. Mimura,Y. Sano,A. Saito,A. Souvorov,M. Yabashi,K. Tamasaku,T. Ishikawa,Y. Mori, JOURNAL OF SYNCHROTRON RADIATION, BLACKWELL MUNKSGAARD, Vol. 9, p. 313-316, 2002/09
  • Nearly diffraction-limited line focusing of a hard-X-ray beam with an elliptically figured mirror, Kazuto Yamauchi,Kazuya Yamamura,Hidekazu Mimura,Yasuhisa Sano,Akira Saito,Alexei Souvorov,Makina Yabashi,Kenji Tamasaku,Tetsuya Ishikawa,Yuzo Mori, Journal of Synchrotron Radiation, Vol. 9, No. 5, p. 313-316, 2002/09/01
  • Nearly diffraction-limited line focusing of a hard-X-ray beam with an elliptically figured mirror, Kazuto Yamauchi,Kazuya Yamamura,Hidekazu Mimura,Yasuhisa Sano,Akira Saito,Alexei Souvorov,Makina Yabashi,Kenji Tamasaku,Tetsuya Ishikawa,Yuzo Mori, Journal of Synchrotron Radiation, Vol. 9, No. 5, p. 313-316, 2002/09/01
  • Fabrication of optics by use of plasma chemical vaporization machining with a pipe electrode, H Takino,N Shibata,H Itoh,T Kobayashi,K Yamamura,Y Sano,Y Mori, APPLIED OPTICS, OPTICAL SOC AMER, Vol. 41, No. 19, p. 3971-3977, 2002/07
  • Deterministic retrieval of surface waviness by means of topography with coherent X-rays, A. Souvorov,M. Yabashi,K. Tamasaku,T. Ishikawa,Y. Mori,K. Yamauchi,K. Yamamura,A. Saito, Journal of Synchrotron Radiation, Vol. 9, No. 4, p. 223-228, 2002/07/01
  • Fabrication of optics by use of plasma chemical vaporization machining with a pipe electrode, H Takino,N Shibata,H Itoh,T Kobayashi,K Yamamura,Y Sano,Y Mori, APPLIED OPTICS, OPTICAL SOC AMER, Vol. 41, No. 19, p. 3971-3977, 2002/07
  • Deterministic retrieval of surface waviness by means of topography with coherent X-rays, A Souvorov,M Yabashi,K Tamasaku,T Ishikawa,Y Mori,K Yamauchi,K Yamamura,A Saito, JOURNAL OF SYNCHROTRON RADIATION, BLACKWELL MUNKSGAARD, Vol. 9, p. 223-228, 2002/07
  • Aspheric surface fabrication in nm-level accuracy by numerically controlled plasma CVM and EEM, K. Yamamura,H. Mimura,K. Yamauchi,Y. Sano,A. Saito,T. Kinoshita,K. Endo,A. Souvorov,M. Yabashi,K. Tamasaku,T. Ishikawa,Y. Mori, Vol. Vol.4782, 2002/07
  • Wave-optical analysis of sub-micron focusing of hard X-ray by reflective optics, K. Yamauchi,K. Yamamura,H. Mimura,Y. Sano,A. Saito,M. Kanaoka,K. Endo,A. Souvorov,M. Yabashi,K. Tamasaku,T. Ishikawa,Y. Mori, Vol. Vol.4782, 2002/07
  • Fabrication of optics by use of plasma chemical vaporization machining with a pipe electrode, H. Takino,N. Shibata,H. Itoh,T. Kobayashi,K. Yamamura,Y. Sano,Y. Mori, Vol. Vol.41, p.3971-3977/,, 2002/07
  • Fabrication of optics by use of plasma chemical vaporization machining with a pipe electrode, H Takino,N Shibata,H Itoh,T Kobayashi,K Yamamura,Y Sano,Y Mori, APPLIED OPTICS, OPTICAL SOC AMER, Vol. 41, No. 19, p. 3971-3977, 2002/07
  • Sub-micron focusing of hard X-ray by reflective optics for scanning x-ray microscopy, Y. Mori,K. Yamauchi,K. Yamamura,H. Mimura,Y. Sano,A. Saito,K. Ueno,K. Endo,A. Souvorov,M. Yabashi,K. Tamasaku,T. Ishikawa, Vol. Vol.4782, 2002/07
  • Deterministic retrieval of surface waviness by means of topography with coherent X-rays, A Souvorov,M Yabashi,K Tamasaku,T Ishikawa,Y Mori,K Yamauchi,K Yamamura,A Saito, JOURNAL OF SYNCHROTRON RADIATION, BLACKWELL MUNKSGAARD, Vol. 9, p. 223-228, 2002/07
  • Deterministic retrieval of surface waviness by means of topography with coherent X-rays, A Souvorov,M Yabashi,K Tamasaku,T Ishikawa,Y Mori,K Yamauchi,K Yamamura,A Saito, JOURNAL OF SYNCHROTRON RADIATION, BLACKWELL MUNKSGAARD, Vol. 9, p. 223-228, 2002/07
  • Deterministic retrieval of surface waviness by means of topography with coherent X-rays, A. Souvorov,M. Yabashi,K. Tamasaku,T. Ishikawa,Y. Mori,K. Yamauchi,K. Yamamura,A. Saito, Journal of Synchrotron Radiation, Vol. 9, No. 4, p. 223-228, 2002/07/01
  • Sub-micron focusing by reflective optics for scanning x-ray microscopy, Y. Mori,K. Yamauchi,K. Yamamura,H. Mimura,Y. Sano,A. Saito,K. Ueno,K. Endo,A. Souvorov,M. Yabashi,K. Tamasaku,T. Ishikawa, Proc. SPIE, Vol. 4782, p. 58-64, 2002/07
  • Fabrication of optics by use of plasma chemical vaporization machining with a pipe electrode, Hideo Takino,Norio Shibata,Hiroshi Itoh,Teruki Kobayashi,Kazuya Yamamura,Yasuhisa Sano,Yuzo Mori, Applied Optics, Vol. 41, No. 19, p. 3971-3977, 2002/07/01
  • Deterministic retrieval of surface waviness by means of topography with coherent X-rays, A Souvorov,M Yabashi,K Tamasaku,T Ishikawa,Y Mori,K Yamauchi,K Yamamura,A Saito, JOURNAL OF SYNCHROTRON RADIATION, BLACKWELL MUNKSGAARD, Vol. 9, p. 223-228, 2002/07
  • Deterministic retrieval of surface waviness by means of topography with coherent X-rays, A Souvorov,M Yabashi,K Tamasaku,T Ishikawa,Y Mori,K Yamauchi,K Yamamura,A Saito, JOURNAL OF SYNCHROTRON RADIATION, BLACKWELL MUNKSGAARD, Vol. 9, p. 223-228, 2002/07
  • Ultra-Precision Machining based on Physics and Chemistry, Y. Mori,K. Hirose,K. Yamauchi,H. Goto,K. Yamamura,Y. Sano, 2002/06
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  • プラズマCVMおよびEEMによるシンクロトロン放射X線用楕円ミラーの作製と集光特性の評価, 精密工学会誌, Vol.68, p.1347-1350, Vol. Vol.68, p.1347-1350/,, 2002
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  • Ultra-Precision Machining based on Physics and Chemistry, Proceedings of Proceedings of 3rd Workshop on Physical Chemistry of Wet Etching of Silicon, p.10-26, Vol. p.10-26, 2002
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  • Ultra-Precision Machining based on Physics and Chemistry, Vol. p.10-26, 2002
  • Aspheric surface fabrication in nm-level accuracy by numerically controlled plasma CVM and EEM, Vol. Vol.4782, 2002
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  • Electric Impedance Measurement and Pulsed OPO Laser Induced Fluorescence Study of Capacitively Coupled VHF Plasma (He/CF4/O2) at Atmospheric Pressure for Chemical Vaporization Machining (CVM) Process, Yasushi Oshikane,Shoichi Kawashima,Kenichi Takemoto,Kazuya Yamamura,Katsuyoshi Endo,Yuzo Mori, Vol. 62, 2001/10
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  • Removal Characteristics of Plasma Chemical Vaporization Machining with a Pipe Electrode, Hideo Takino,Teruyuki Kobayashi,Norio Shibata,Kazuya Yamamura,Yasuhisa Sano,Yuzo Mori, 2001/06
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  • プラズマCVMによる機能材料の切断加工 ---内周刃型切断加工装置の試作とその切断加工特性---, 精密工学会誌, Vol.~67, No.~2, pp.~295-299, Vol. Vol.~67, No.~2, pp.~295-299, 2001
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  • Removal Characteristics of Plasma Chemical Vaporization Machining with a Pipe Electrode, Proc. 2nd International Conference of European Society for Precision Engeneering and Nanotechnology, 2001
  • Development of plasma chemical vaporization machining and elastic emission machining systems for coherent x-ray optics, Y Mori,K Yamauchi,K Yamamura,H Mimura,A Saito,H Kishimoto,Y Sekito,M Kanaoka, X-RAY MIRRORS, CRYSTALS AND MULTILAYERS, SPIE-INT SOC OPTICAL ENGINEERING, Vol. 4501, p. 30-42, 2001
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  • Development of Plasma CVM(Chemical Vaporization Machining), Vol. Vol.~66, No.~8, pp.~1280-1285/,, 2000
  • Development of New Machining Process for Ultra Precision Surface Preparation ---EEM,Plasma CVM,and Atmospheric Pressure Plasma CVD---, Vol. pp.~212-232, 2000
  • The Study of Fabrication of the X-ray Mirror by Numerically Controlled Plasma Chemical Vaporization Machining : Development of the Machine for the X-ray Mirror Fabrication, Review of Scientific Instruments, Vol. 71, No. 12, pp. 4620-4626, Vol. Vol. 71, No. 12, pp. 4620-4626/,, 2000
  • Development of plasma chemical vaporization machining, Review of Scientific Instruments, Vol. 71, No. 12, p. 4627-4632, 2000
  • The Study of fabrication of the x-ray mirror by numerically controlled plasma chemical vaporization machining : Development of the machine for the x-ray mirror fabrication, Review of Scientific Instruments, Vol. 71, No. 12, p. 4620-4626, 2000
  • Development of Numerically Controlled Plasma Chemical Vaporization Machining System, Technology Reports of the Osaka University, Vol. 50, No. 2374, 2000
  • With the Aim of Country with Intelligent Sense of Existence : The Case Introduction, Center of Excellence program Creation of Perfect Surfaces, Hideo Takino(Nikon Cor,Norio Shibata(Nikon Cor,Hiroshi Itoh(Nikon Corp,Teruki Kobayashi,Nikon Cor,Hiroaki Tanaka,Nikon Co,Masami Ebi(Nikon Corp,Kazuya Yamamura,Yasuhisa Sano,Yuzo Mori, Vol. 65, No. 11, p. 1650-1651, 1999/11
  • Plasma Chemical Vaporization Machining with a Pipe Electrode for Large Optics, Hideo Takino,ikon,Norio Shibata,Nikon Cor,Teruki Kobayashi,Nikon Cor,Hiroshi\- Itoh,Nikon Cor,Hiroaki Tanaka,ikon,Akihiro Koike,ikon C,Katsuhiko\- Nakano,ikon C,Kazuya Yamamura,Yasuhisa Sano,Yuzo Mori, Vol. pp.~219-224, 1999/09
  • High Speed Patterning of Integrated-Type a-Si Solar Cell Submodules by Plasma CVM, Shingo Nakano,SANYO Electric Co,Yoichi Domoto,SANYO Electric Co,Hisaki Tarui,SANYO Electric Co,Seiichi Kiyama,SANYO Electric Co,Yasuhisa Sano,Kazuya Yamamura,Yuzo Mori, Vol. pp.~543-548, 1999/09
  • Development of Numerically Controlled Plasma CVM (Chemical Vaporization Machining) System for Fabrication of Ultra Precision Optical Devices, Yuzo Mori,Kazuya Yamamura,Yasuhisa Sano, Precision Science and Technology for Perfect Surfaces (Proceedings of the 9th International Conference on Production Engineering), pp.~213-218, Vol. pp.~213-218, 1999/09
  • Slicing of Functional Materials by Plasma CVM (Chemical Vaporization Machining), Yuzo Mori,Kazuya Yamamura,Yasuhisa Sano, Vol. pp.~225-230, 1999/09
  • High Rate Polishing of Silicon Surface using Plasma CVM with Rotary Drum Electrode, Hiroaki Takeuchi,Sharp Corp,Tohru Okuda,Sharp Corp,Kazuhiro Nishikawa,Sharp Corp,Yoshiyuki Hojyo,Sharp Corp,Masaru Kadono,Sharp Cor,Takashi Nukii,Sharp Corp,Kazuya Yamamura,Yasuhisa Sano,Yuzo Mori, Vol. pp.~405-410, 1999/09
  • マイクロ電極を用いたプラズマCVMによる複雑形状光学面の創成加工, 瀧野 日出雄,柴田 規夫,小林 輝紀,伊藤 博,根本 孝七,藤井 隆,後藤 直彦,山村 和也,佐野 泰久,森 勇蔵, 精密工学会大会学術講演会講演論文集, Vol. 1999, No. 1, p. 422-422, 1999/03/05
  • 回転電極型プラズマCVM法におけるシリコンの加工速度向上に関する-検討, 西川 和宏,奥田 徹,竹内 博明,北條 義之,リュウノ野 勝,貫井 孝,山村 和也,佐野 泰久,森 勇蔵, 精密工学会大会学術講演会講演論文集, Vol. 1999, No. 1, p. 423-423, 1999/03/05
  • プラズマCVMによる高融点金属材料の表面加工 (第3報), 柴原 正文,山村 和也,佐野 泰久,園田 司,西岡 敏明,脇坂 彰一,沖田 耕三,森 勇蔵, 精密工学会大会学術講演会講演論文集, Vol. 1999, No. 1, p. 424-424, 1999/03/05
  • 大気圧プラズマインピーダンス測定(第1報) -測定原理, 測定結果, およびその測定精度について-, 森 勇蔵,片岡 俊彦,遠藤 勝義,山村 和也,佐野 泰久,押鐘 寧,江畑 裕介,片山 晋二,岡本 利樹,足立 真士, 精密工学会大会学術講演会講演論文集, Vol. 1999, No. 1, p. 428-428, 1999/03/05
  • プラズマCVM(Chemical Vaporization Machining)における切断加工に関する研究(第4報)-加工ギャップ制御方法-, 森 勇蔵,山村 和也,佐野 泰久,脇坂 彰一,柴原 正文, 精密工学会大会学術講演会講演論文集, Vol. 1999, No. 1, p. 426-426, 1999/03/05
  • 数値制御プラズマCVM加工装置の開発(第3報), 森 勇蔵,山村 和也,佐野 泰久,脇坂 彰一,柴原 正文, 精密工学会大会学術講演会講演論文集, Vol. 1999, No. 1, p. 425-425, 1999/03/05
  • プラズマCVM加工における電極/ワーク間ギャップセンサの開発, 竹内 博明,奥田 徹,西川 和宏,北條 義之,山村 和也,佐野 泰久,森 勇蔵,石川 俊夫, 精密工学会大会学術講演会講演論文集, Vol. 1999, No. 1, p. 427-427, 1999/03/05
  • パイプ電極プラズマCVMによる光学平面の創成加工, 精密工学会誌, Vol.~65, No.~11, pp.~1650-1651, Vol. Vol.~65, No.~11, pp.~1650-1651, 1999
  • Development of Numerically Controlled Plasma CVM (Chemical Vaporization Machining) System for Fabrication of Ultra Precision Optical Devices, Precision Science and Technology for Perfect Surfaces (Proceedings of the 9th International Conference on Production Engineering), pp.~213-218, Vol. pp.~213-218, 1999
  • Slicing of Functional Materials by Plasma CVM (Chemical Vaporization Machining), Precision Science and Technology for Perfect Surfaces (Proceedings of the 9th International Conference on Production Engineering), pp.~225-230, Vol. pp.~225-230, 1999
  • High Rate Polishing of Silicon Surface using Plasma CVM with Rotary Drum Electrode, Precision Science and Technology for Perfect Surfaces (Proceedings of the 9th International Conference on Production Engineering), pp.~405-410, Vol. pp.~405-410, 1999
  • パイプ電極プラズマCVMによる光学平面の創成加工, 精密工学会誌, Vol.~65, No.~11, pp.~1650-1651, Vol. Vol.~65, No.~11, pp.~1650-1651/,, 1999
  • Plasma Chemical Vaporization Machining with a Pipe Electrode for Large Optics, Precision Science and Technology for Perfect Surfaces (Proceedings of the 9th International Conference on Production Engineering), pp.~219-224, Vol. pp.~219-224, 1999
  • High Speed Patterning of Integrated-Type a-Si Solar Cell Submodules by Plasma CVM, Precision Science and Technology for Perfect Surfaces (Proceedings of the 9th International Conference on Production Engineering), pp.~543-548, Vol. pp.~543-548, 1999
  • With the Aim of Country with Intelligent Sense of Existence : The Case Introduction, Center of Excellence program Creation of Perfect Surfaces, Vol. Vol.~65, No.~11, pp.~1650-1651, 1999
  • Plasma Chemical Vaporization Machining with a Pipe Electrode for Large Optics, Vol. pp.~219-224, 1999
  • Development of Numerically Controlled Plasma CVM (Chemical Vaporization Machining) System for Fabrication of Ultra Precision Optical Devices, Precision Science and Technology for Perfect Surfaces (Proceedings of the 9th International Conference on Production Engineering), pp.~213-218, Vol. pp.~213-218, 1999
  • Slicing of Functional Materials by Plasma CVM (Chemical Vaporization Machining), Vol. pp.~225-230, 1999
  • High Speed Patterning of Integrated-Type a-Si Solar Cell Submodules by Plasma CVM, Vol. pp.~543-548, 1999
  • High Rate Polishing of Silicon Surface using Plasma CVM with Rotary Drum Electrode, Vol. pp.~405-410, 1999
  • Plasma Chemical Vaporization Machining with a Pipe Electrode for Large Optics, Vol. pp.~219-224, 1999
  • Development of Numerically Controlled Plasma CVM (Chemical Vaporization Machining) System for Fabrication of Ultra Precision Optical Devices, Precision Science and Technology for Perfect Surfaces (Proceedings of the 9th International Conference on Production Engineering), pp.~213-218, Vol. pp.~213-218, 1999
  • Slicing of Functional Materials by Plasma CVM (Chemical Vaporization Machining), Vol. pp.~225-230, 1999
  • High Speed Patterning of Integrated-Type a-Si Solar Cell Submodules by Plasma CVM, Vol. pp.~543-548, 1999
  • High Rate Polishing of Silicon Surface using Plasma CVM with Rotary Drum Electrode, Vol. pp.~405-410, 1999
  • Slicing of Functional Materials by Plasma CVM, Proceedings of the 9th International Conference on Production Engineering, 1999
  • Development of Numerically Controlled Plasma CVM System for Fabrication of Ultra Precision Optical Devices., Proceedings of the 9th International Conference on Production Engineering, 1999
  • Computer numerically controlled plasma chemical vaporization machining with a pipe electrode for optical fabrication, H Takino,N Shibata,H Itoh,T Kobayashi,H Tanaka,M Ebi,K Yamamura,Y Sano,Y Mori, APPLIED OPTICS, OPTICAL SOC AMER, Vol. 37, No. 22, p. 5198-5210, 1998/08
  • Computer numerically controlled plasma chemical vaporization machining with a pipe electrode for optical fabrication, H Takino,N Shibata,H Itoh,T Kobayashi,H Tanaka,M Ebi,K Yamamura,Y Sano,Y Mori, APPLIED OPTICS, OPTICAL SOC AMER, Vol. 37, No. 22, p. 5198-5210, 1998/08
  • Computer Numerically Controlled Plasma Chemical Vaporization Machining with a Pipe Electrode for Optical Fabrication, Hideo Takino,Norio Shibata,Teruki Kobayashi,Hiroaki Tanaka,Masami Ebi,Kazuya Yamamura,Yasuhisa Sano,Yuzo Mori, APPLIED OPTICS, 37/22,5198, Vol. 37, No. 22, p. 5198-5210, 1998/08
  • Computer numerically controlled plasma chemical vaporization machining with a pipe electrode for optical fabrication, Hideo Takino,Norio Shibata,Hiroshi Itoh,Teruki Kobayashi,Hiroaki Tanaka,Masami Ebi,Kazuya Yamamura,Yasuhisa Sano,Yuzo Mori, Applied Optics, Vol. 37, No. 22, p. 5198-5210, 1998/08/01
  • Plasma chemical vaporization machining (CVM) for fabrication of optics, H Takino,N Shibata,H Itoh,T Kobayashi,H Tanaka,M Ebi,K Yamamura,Y Sano,Y Mori, JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, JAPAN SOC APPLIED PHYSICS, Vol. 37, No. 7B, p. L894-L896, 1998/07
  • Plasma chemical vaporization machining (CVM) for fabrication of optics, H Takino,N Shibata,H Itoh,T Kobayashi,H Tanaka,M Ebi,K Yamamura,Y Sano,Y Mori, JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, JAPAN SOC APPLIED PHYSICS, Vol. 37, No. 7B, p. L894-L896, 1998/07
  • Plasma Chemical Vaporization Machining(CVM)for Fabrication of Optics, Hideo TAKINO,Norio SHIBATA,Teruki KOBAYASHI,Hiroaki TANAKA,Masami EBI,Kazuya YAMAMURA,Yasuhisa SANO,Yuzo MORI, Vol. 37, No. Part2, 1998/07
  • Plasma chemical vaporization machining (CVM) for fabrication of optics, H Takino,N Shibata,H Itoh,T Kobayashi,H Tanaka,M Ebi,K Yamamura,Y Sano,Y Mori, JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, JAPAN SOC APPLIED PHYSICS, Vol. 37, No. 7B, p. L894-L896, 1998/07
  • EEM (Elastic Emission Machining)用微粒子作製装置の開発, 森 勇蔵,山内 和人,山村 和也,佐野 泰久,松本 光弘,三村 秀和, 精密工学会大会学術講演会講演論文集, Vol. 1998, No. 1, 1998/03/05
  • Computer Numerically Controlled Plasma Chemical Vaporization Machining with a Pipe Electrode for Optical Fabrication, APPLIED OPTICS, 37/22,5198, Vol. 37, No. 22, p. 5198-5210, 1998
  • Plasma Chemical Vaporization Machining(CVM)for Fabrication of Optics, Vol. 37, No. Part2, 1998
  • Development of New Ultra Precision Machining Methods-Plasma CVM and EEM-, Book of Lecture Notes, 1998
  • First-principles Analysis of Chemical Reactions between Metal Oxide Fine Powders and Si(100) Surface in EEM(Elastic Emission Machining), Kazuto Yamauchi,Kikuji Hirose,Hidekazu Goto,Masao Sakamoto,Kazuya Yamamura,Yasuhisa Sano,Yuzo Mori, Vol. Vol.20, pp.867-870, 1996/12
  • Plasma CVM(Chemical Vaporization Machining)におけるポリシング加工に関する研究(第3報) -加工面の平坦度と電極形状ならびに試料保持方法の相関(その2)-, 森 勇蔵,山内 和人,山村 和也,佐野 泰久, 精密工学会大会学術講演会講演論文集, Vol. 1996, No. 2, p. 197-198, 1996/09/01
  • First-principles Analysis of Removal Mechanism in EEM(Elastic Emission Machining), Kazuto Yamauchi,Kikuji Hirose,Hidekazu Goto,Kazuya Yamamura,Yasuhisa Sano,Yuzo Mori, Proceedings of 1996 the Japan-China Bilateral Symposium on Advanced Manufacturing Engineering, pp.60-64, Vol. pp.60-64, 1996/09
  • Polishing of Si Wafer by Plasma CVM(Chemical Vaporization Machining), Yuzo Mori,Kazuya Yamamura,Kazuto Yamauchi,Yasuhisa Sano, Vol. pp.65-68, 1996/09
  • Slicing of Silicon by Plasma CVM(Chemical Vaporization Machining), Yuzo Mori,Kazuto Yamauchi,Kazuya Yamamura,Yasuhisa Sano, Vol. pp.69-72, 1996/09
  • Designing a New Apparatus for Measuring Particle Sizes of Nanometer Order by Light-scattering (4th Report) -- Formation for Output Characteristics of Photomultiplier and Improvement of Dynamic Range --, Hiroshi An,Yuzo Mori,Toshihiko Kataoka,Katsuyoshi Endo,Kazuto Yamauchi,Kohji Inagaki,Kazuya Yamamura,Haruyuki Inoue,Yasuhisa Sano, Vol. Vol.62, No.8, pp.1198-1202/,, 1996/08
  • Designing a New Apparatus for Measuring Particle Sizes of Nanometer Order by Light-scattering (4th Report) : Formation for Output Characteristics of Photomultiplier and Improvement of Dynamic Range, Hiroshi AN,Yuzo MORI,Toshihiko KATAOKA,Katsuyoshi ENDO,Kazuto YAMAUCHl,Kohji INAGAKI,Kazuya YAMAMURA,Haruyuki INOUE,Yasuhisa SANO, Journal of the Japanese Society of Precision Engineering, Vol. 62, No. 8, p. 1198-1202, 1996/08
  • Plasma CVM(Chemical Vaporization Machining)におけるポリシング加工に関する研究(第1報) -ポリシング加工用高速回転型電極の試作とその加工特性-, 森 勇藏,山内 和人,山村 和也,佐野 泰久, 精密工学会大会学術講演会講演論文集, Vol. 1996, No. 1, p. 1145-1146, 1996/03/01
  • プラズマCVM(Chemical Vaporization Machining)における切断加工に関する研究 -切断加工用高速回転電極の試作とその加工特性-, 森 勇藏,山内 和人,山村 和也,佐野 泰久, 精密工学会大会学術講演会講演論文集, Vol. 1996, No. 1, p. 1143-1144, 1996/03/01
  • Plasma CVM(Chemical Vaporization Machining)におけるNC加工に関する研究(第1報) -NC加工用高速回転型電極の試作とその加工特性-, 森 勇藏,山内 和人,山村 和也,佐野 泰久, 精密工学会大会学術講演会講演論文集, Vol. 1996, No. 1, p. 1141-1142, 1996/03/01
  • 光散乱法によるナノメータオーダの粒径測定法 (第5報) -ダイナミックレンジの改善法と標準粒子の測定-, 安 弘,南川 文孝,森 勇蔵,片岡 俊彦,遠藤 勝義,山内 和人,稲垣 耕司,井上 晴行,山村 和也,佐野 泰久, 精密工学会大会学術講演会講演論文集, Vol. 1996, No. 1, p. 1109-1110, 1996/03/01
  • EEM(Elastic Emission Machining)における加工現象の第一原理分子動力学シミュレーション (第3報) -化学結合の分子軌道計算-, 山内 和人,山村 和也,佐野 泰久,広瀬 喜久治,後藤 英和,坂本 正雄,森 勇藏, 精密工学会大会学術講演会講演論文集, Vol. 1996, No. 1, p. 989-990, 1996/03/01
  • 精密加工の最先端技術、第8章Ⅳ、「プラズマCVMの加工特性と表面物性」, 工業調査会, 1996
  • A Method for Measuring Particle Sizes of Nanometer Order by Light-Scattering, YAMAMURA Kazuya, Proceedings of 1996 The Japan-China Bilateral Symposium on Advanced Manufacturing Engineering, 1996
  • 光散乱法によるナノメータオーダの粒径測定法の開発(第4報) -- 光電子増倍管出力特性の定式化とダイナミックレンジの改善法 --, 精密工学会誌, Vol.62, No.8, pp.1198-1202, Vol. Vol.62, No.8, pp.1198-1202, 1996
  • A Method for Measuring Particle Sizes of Nanometer Order by Light-Scattering, /,147, 1996
  • First-principles Analysis of Chemical Reactions between Metal Oxide Fine Powders and Si(100) Surface in EEM(Elastic Emission Machining), Transactions of the Materials Research Society of Japan, Vol.20, pp.867-870, Vol. Vol.20, pp.867-870/,, 1996
  • 光散乱法によるナノメータオーダの粒径測定法の開発(第4報) -- 光電子増倍管出力特性の定式化とダイナミックレンジの改善法 --, 精密工学会誌, Vol.62, No.8, pp.1198-1202, Vol. Vol.62, No.8, pp.1198-1202/,, 1996
  • First-principles Analysis of Removal Mechanism in EEM(Elastic Emission Machining), Proceedings of 1996 the Japan-China Bilateral Symposium on Advanced Manufacturing Engineering, pp.60-64, Vol. pp.60-64, 1996
  • Polishing of Si Wafer by Plasma CVM(Chemical Vaporization Machining), Proceedings of 1996 the Japan-China Bilateral Symposium on Advanced Manufacturing Engineering, pp.65-68, Vol. pp.65-68, 1996
  • Slicing of Silicon by Plasma CVM(Chemical Vaporization Machining), Proceedings of 1996 the Japan-China Bilateral Symposium on Advanced Manufacturing Engineering, pp.69-72, Vol. pp.69-72, 1996
  • A Method for Measuring Particle Sizes of Nanometer Order by Light-Scattering, 1996
  • First-principles Analysis of Chemical Reactions between Metal Oxide Fine Powders and Si(100) Surface in EEM(Elastic Emission Machining), Vol. Vol.20, pp.867-870, 1996
  • Designing a New Apparatus for Measuring Particle Sizes of Nanometer Order by Light-scattering (4th Report) -- Formation for Output Characteristics of Photomultiplier and Improvement of Dynamic Range --, Vol. Vol.62, No.8, pp.1198-1202, 1996
  • First-principles Analysis of Removal Mechanism in EEM(Elastic Emission Machining), Proceedings of 1996 the Japan-China Bilateral Symposium on Advanced Manufacturing Engineering, pp.60-64, Vol. pp.60-64, 1996
  • Polishing of Si Wafer by Plasma CVM(Chemical Vaporization Machining), Vol. pp.65-68, 1996
  • Slicing of Silicon by Plasma CVM(Chemical Vaporization Machining), Vol. pp.69-72, 1996
  • A Method for Measuring Particle Sizes of Nanometer Order by Light-Scattering, 1996
  • First-principles Analysis of Chemical Reactions between Metal Oxide Fine Powders and Si(100) Surface in EEM(Elastic Emission Machining), Vol. Vol.20, pp.867-870/,, 1996
  • First-principles Analysis of Removal Mechanism in EEM(Elastic Emission Machining), Proceedings of 1996 the Japan-China Bilateral Symposium on Advanced Manufacturing Engineering, pp.60-64, Vol. pp.60-64, 1996
  • Polishing of Si Wafer by Plasma CVM(Chemical Vaporization Machining), Vol. pp.65-68, 1996
  • Slicing of Silicon by Plasma CVM(Chemical Vaporization Machining), Vol. pp.69-72, 1996
  • Laser Beam Intensity Profile Transformation with a Fabricated Mirror, Koshichi Nemoto(Center Research Institute of Electric Power Industry,Takashi Fujii(Center Research Institute of Electric Power Industry,Naohiko Goto(Center Research Institute of Electric Power Industry,Hideo Takino(Nikon Corporation,Teruki Kobayashi(Nikon Corporation,Norio Shibata(Nikon Corporation,Kazuya Yamamura,Yuzo Mori, APPLIED OPTICS, OPTICAL SOC AMER, Vol. 36, No. 3, p. 551-557, 1996/01
  • First-principles Analysis of Chemical Reactions between Metal Oxide Fine Powders and Si(100) Surface in EEM(Elastic Emission Machining), Transactions of the Materials Research Society of Japan, Vol. 20, 1996
  • A Method for Measuring Particle Sizes of Nanometer Order by Light-Scattering, Proceedings of 1996 The Japan-China Bilateral Symposium on Advanced Manufacturing Engineering, 1996
  • First-principles analysis of Removal Mechanism in EEM(Elastic Emission Machining), Proceedings of 1996 The Japan-China Bilateral Symposium on Advanced Manufacturing Engineering, 1996
  • Slicing of Silicon by Plasma CVM(Chemical Vaporization Machining), Proceedings of 1996 The Japan-China Bilateral Symposium on Advanced Manufacturing, 1996
  • Polishing of Si Water by Plasma CVM(Chmical Vaporization Machining), Proceedings of 1996 The Japan-China Bilateral Symposium on Advanced Manufacturing, 1996
  • プラズマCVM(Chemical Vaporization Machining)における加工現象の第一原理分子動力学シミュレーション(第5報)-Si表面とハロゲン原子の相互作用の解析(その3)-, 山村 和也,佐野 泰久,山内 和人,広瀬 喜久治,後藤 英和,坂本 正雄,森 勇藏, 精密工学会大会学術講演会講演論文集, Vol. 1995, No. 2, p. 625-626, 1995/09/01
  • 光反射率スペクトルによるSi自然酸化表面の酸化膜厚およびひずみの計測, 森 勇藏,片岡 俊彦,遠藤 勝義,山内 和人,稲垣 耕司,山村 和也,広瀬 喜久治, 精密工学会誌, Vol. 61, No. 3, p. 396-400, 1995
  • Plasma CVM (Chemical Vaporization Machining)の開発, 生産と技術, Vol.47, No.1, pp.39-43, Vol. Vol.47, No.1, pp.39-43, 1995
  • Plasma CVM (Chemical Vaporization Machining)の開発, 生産と技術, Vol.47, No.1, pp.39-43, Vol. Vol.47, No.1, pp.39-43/,, 1995
  • Development of Plasma CVM (Chemical Vaporization Machining), Vol. Vol.47, No.1, pp.39-43, 1995
  • Development of Plasma CVM (Chemical Vaporization Machining), Kazuya Yamamura,Yuzo Mori, Vol. Vol.47, No.1, pp.39-43/,, 1995/01
  • Development of Plasma CVM (Chemical Vaporization Machining), The Production and Technique, Vol. 47, No. 1, 1995
  • Thickness and Strain Measurement of Native Oxide on Si Surface by Photo-reflectance Spectra, Journal of the Japan Society for Precision Engineering, Vol. 61, No. 6, 1995
  • A NEW APPARATUS FOR MEASURING PARTICLE SIZES OF THE ORDER OF NANOMETER (2ND REPORT) - EVALUATION OF MEASURING SYSTEM BY USING STANDARD PARTICLES, H AN,Y MORI,T KATAOKA,K ENDO,K INAGAKI,K YAMAMURA,K YAMAUCHI,T FUKUIKE, INTERNATIONAL JOURNAL OF THE JAPAN SOCIETY FOR PRECISION ENGINEERING, JAPAN SOC PRECISION ENG, Vol. 28, No. 4, p. 356-361, 1994/12
  • A NEW APPARATUS FOR MEASURING PARTICLE SIZES OF THE ORDER OF NANOMETER (2ND REPORT) - EVALUATION OF MEASURING SYSTEM BY USING STANDARD PARTICLES, H AN,Y MORI,T KATAOKA,K ENDO,K INAGAKI,K YAMAMURA,K YAMAUCHI,T FUKUIKE, INTERNATIONAL JOURNAL OF THE JAPAN SOCIETY FOR PRECISION ENGINEERING, JAPAN SOC PRECISION ENG, Vol. 28, No. 4, p. 356-361, 1994/12
  • A New Apparatus for Measuring Particle Sizes of the Order of Nanometer (2nd Report) -Evaluation of Measuring System by using Standard Partides-, Hiroshi AN,Yuzo MORI,Tosihiko KATAOKA,Katsuyoshi ENDO,Kohji INAGAKI,Kazuya YAMAMURA,Kazuto YAMAUCHI,Takashige FUKUIKE, International Journal of The Japan Society for Precision Engineering, Vol. 28 356-361, 1994/12
  • A NEW APPARATUS FOR MEASURING PARTICLE SIZES OF THE ORDER OF NANOMETER (2ND REPORT) - EVALUATION OF MEASURING SYSTEM BY USING STANDARD PARTICLES, H AN,Y MORI,T KATAOKA,K ENDO,K INAGAKI,K YAMAMURA,K YAMAUCHI,T FUKUIKE, INTERNATIONAL JOURNAL OF THE JAPAN SOCIETY FOR PRECISION ENGINEERING, JAPAN SOC PRECISION ENG, Vol. 28, No. 4, p. 356-361, 1994/12
  • A NEW APPARATUS FOR MEASURING PARTICLE SIZES OF THE ORDER OF NANOMETER (2ND REPORT) - EVALUATION OF MEASURING SYSTEM BY USING STANDARD PARTICLES, H AN,Y MORI,T KATAOKA,K ENDO,K INAGAKI,K YAMAMURA,K YAMAUCHI,T FUKUIKE, INTERNATIONAL JOURNAL OF THE JAPAN SOCIETY FOR PRECISION ENGINEERING, JAPAN SOC PRECISION ENG, Vol. 28, No. 4, p. 356-361, 1994/12
  • Development of Measuring Systemn for Ultra-precision Machined Surface by Photo-reflectance Spectra, Y.Mori,T.Kataoka,K.Endo,K.Yamauchi,K.Inagaki,K.Yamamura,K.Hirose, 精密工学会誌, 1994/09
  • 光反射率スペクトルによる超精密加工表面の評価法の開発, 精密工学会誌, 1994
  • 光反射率スペクトルによる超精密加工表面の評価法の開発, 精密工学会誌, 1994
  • Development of Measuring Systemn for Ultra-precision Machined Surface by Photo-reflectance Spectra, 1994
  • Development of Measuring Systemn for Ultra-precision Machined Surface by Photo-reflectance Spectra, Yuzo MORI,Toshihiko KATAOKA,Katsuyoshi ENDO,Kazuto YAMAUCHI,Kohji INAGAKI,Kazuya YAMAMURA,Kikuji HIROSE, Journal of the Japan Society for Precision Engineering, Vol. 60, No. 9, p. 1360-1364, 1994
  • Plasma CVM (Chemical Vaporization Machining) - An Ultra Precision Machining with High Pressure Reactive Plasma-, Y.Mori,K.Yamamura,K.Yamauchi,K.Yoshii,T.Kataoka,K.Endo,K.Inagaki,H.Kakiuchi, Vol. 43, 261-266, 1993/10
  • Designing a New Apparatus for Measuring Particle Sizes of Nanometer Order by light-scattering (3rd Report) -Evaluation of Measuring System by using Standard Particles-, Y.Mori,H.An,T.Kataoka,K.Endo,K.Inagaki,K.Yamauchi,K.Yamamura,T.Fukuike, 精密工学会誌, Vol. 59, No. 7, p. 1121-1126, 1993/07
  • Low Temperature Growth of Polycrystalline Silicon Films by Plasma Chemical Vapor Deposition under Higher Pressure than Atmospheric Pressure, H.Kawabe,Y.Mori,K.Yoshii,T.Kataoka,K.Yasutake,K.Endo,K.Yamauchi,K.Yamamura,H.Kakiuchi, Vol. 554-565, 1993/05
  • Plasma CVM (chemical vaporization machining) -- A Chemical Machining Method With Equal Performances to Conventional Mechanical Methods from the Sense of Removal Rates and Spatial Resolutions, Y.Mori,K.Yamamura,K.Yamauchi,K.Yoshii,T.Kataoka,K.Endo,K.Inagaki,H.Kakiuchi, Proc. 7th Int. Prec. Eng. Seminar, 1993/05
  • Plasma CVM (chemical vaporization machining) -- A Chemical Machining Method With Equal Performances to Conventional Mechanical Methods from the Sense of Removal Rates and Spatial Resolutins, Proceeding of 7th International Precision Engineering Seminar, 78-87 (1993), Vol. 78-87, 1993
  • Low Temperature Growth of Polycrystalline Silicon Films by Plasma Chemical Vapor Deposition under Higher Pressure than Atmospheric Pressure, Proceeding of 7th International Precision Engineering Seminar, 554-565 (1993), Vol. 554-565, 1993
  • Low Temperature Growth of Polycrystalline Silicon Films by Plasma Chemical Vapor Deposition under Higher Pressure than Atmospheric Pressure, Proceeding of 7th International Precision Engineering Seminar, 554-565 (1993), Vol. 554-565, 1993
  • Plasma CVM (chemical vaporization machining) -- A Chemical Machining Method With Equal Performances to Conventional Mechanical Methods from the Sense of Removal Rates and Spatial Resolutins, Proceeding of 7th International Precision Engineering Seminar, 78-87 (1993), Vol. 78-87, 1993
  • Plasma CVM (chemical vaporization machining) -- A Chemical Machining Method With Equal Performances to Conventional Mechanical Methods from the Sense of Removal Rates and Spatial Resolutins, Proceeding of 7th International Precision Engineering Seminar, 78-87 (1993), Vol. 78-87, 1993
  • Low Temperature Growth of Polycrystalline Silicon Films by Plasma Chemical Vapor Deposition under Higher Pressure than Atmospheric Pressure, Proceeding of 7th International Precision Engineering Seminar, 554-565 (1993), Vol. 554-565, 1993
  • Plasma CVM (Chemical Vaporization Machining) - An Ultra Precision Machining with High Pressure Reactive Plasma-, TECHNOLOGY RERORTS OF THE OSAKA UNIVERSITY, 43, 261-266 (1993), Vol. 43, 261-266/,, 1993
  • Plasma CVM (chemical vaporization machining) -- A Chemical Machining Method With Equal Performances to Conventional Mechanical Methods from the Sense of Removal Rates and Spatial Resolutins, Proceeding of 7th International Precision Engineering Seminar, 78-87 (1993), Vol. 78-87, 1993
  • 光散乱法によるナノメータオーダの粒径測定法の開発(第3報)-標準微粒子による粒径測定法の評価-, 森勇蔵,安弘,片岡俊彦,遠藤勝義,稲垣耕司,山内和人,山村和也,福池敬重, 59/7,1121, Vol. 59, No. 7, p. 1121-1126, 1993
  • Plasma CVM (chemical vaporization machining) -- A Chemical Machining Method With Equal Performances to Conventional Mechanical Methods from the Sense of Removal Rates and Spatial Resolutins, Vol. 78-87, 1993
  • Low Temperature Growth of Polycrystalline Silicon Films by Plasma Chemical Vapor Deposition under Higher Pressure than Atmospheric Pressure, Vol. 554-565, 1993
  • Plasma CVM (Chemical Vaporization Machining) - An Ultra Precision Machining with High Pressure Reactive Plasma-, Vol. 43, 261-266, 1993
  • Low Temperature Growth of Polycrystalline Silicon Films by Plasma Chemical Vapor Deposition under Higher Pressure than Atmospheric Pressure, Vol. 554-565, 1993
  • Plasma CVM (chemical vaporization machining) -- A Chemical Machining Method With Equal Performances to Conventional Mechanical Methods from the Sense of Removal Rates and Spatial Resolutins, Vol. 78-87, 1993
  • Designing a New Apparatus for Measuring Particle Sizes of Nanometer Order by light-scattering (3rd Report) -Evaluation of Measuring System by using Standard Particles-, Journal of the Japan Society for Precision Engineering, Vol. 59, No. 7, p. 1121-1126, 1993
  • Plasma CVM (chemical vaporization machining) -- A Chemical Machining Method With Equal Performances to Conventional Mechanical Methods from the Sense of Removal Rates and Spatial Resolutins, Vol. 78-87, 1993
  • Low Temperature Growth of Polycrystalline Silicon Films by Plasma Chemical Vapor Deposition under Higher Pressure than Atmospheric Pressure, Vol. 554-565, 1993
  • Plasma CVM (Chemical Vaporization Machining) - An Ultra Precision Machining with High Pressure Reactive Plasma-, Vol. 43, 261-266/,, 1993
  • Low Temperature Growth of Polycrystalline Silicon Films by Plasma Chemical Vapor Deposition under Higher Pressure than Atmospheric Pressure, Vol. 554-565, 1993
  • Plasma CVM (chemical vaporization machining) -- A Chemical Machining Method With Equal Performances to Conventional Mechanical Methods from the Sense of Removal Rates and Spatial Resolutins, Vol. 78-87, 1993
  • Designing a New Apparatus for Measuring Particle Sizes of Nanometer Order by light-scattering (3rd Report) -Evaluation of Measuring System by using Standard Particles-, Journal of the Japan Society for Precision Engineering, Vol. 59, No. 7, p. 1121-1126, 1993
  • Designing a New Apparatus for Measuring Particle Sizes of Nanometer Order by light-scattering (3rd Report) -Evaluation of Measuring System by using Standard Particles-, Journal of the Japan Society for Precision Engineering-, Vol. 59, No. 7, p. 1121-1126, 1993
  • Low Temperature Growth of Polycrystalline Silicon Films by Plasma Chemical Vapor Deposition under Higher Pressure than Atmospheric Pressure, Proc. 7th Int. Prec. Eng. Seminar, 1993
  • Plasma CVM (chemical vaporization machining): An ultra precision machining technique using high-pressure reactive plasma, Y. Mori,K. Yamamura,K. Yamauchi,K. Yoshii,T. Kataoka,K. Endo,K. Inagaki,H. Kakiuchi, Nanotechnology, Vol. 4, No. 4, p. 225-229, 1993
  • Plasma CVM(Chemical Vaporization Machining) - An Ultra Precision Machining with High Pressure Reactive Plasma-, Y. Mori,K. Yamamura,K. Yamauchi,K. Yoshii,T. Kataoka,K. Endo,K. Inagaki,H. Kakiuchi, The 3rd International Conterence on Nanotechnology Abstract, Vol. 26-27, 1992/09
  • プラズマCVM(Chemical Vaporization Machining)-セラミックス材料の加工特性-, 1992
  • プラズマCVM(Chemical Vaporization Machining)-セラミックス材料の加工特性-, 山村和也, 1992年精密工学会春季大会学術講演会講演論文集, 1992
  • Plasma CVM(Chemical Vaporization Machining) - An Ultra Precision Machining with High Pressure Reactive Plasma-, Program and Abstracts of The 3rd International Conference on Nanotechnology (1992) 26-27., Vol. 26-27, 1992
  • Plasma CVM(Chemical Vaporization Machining) - An Ultra Precision Machining with High Pressure Reactive Plasma-, Vol. 26-27, 1992
  • Plasma CVM(Chemical Vaporization Machining) - An Ultra Precision Machining with High Pressure Reactive Plasma-, Vol. 26-27, 1992
  • Plasma CVM (Chemical Vapolization Machining) -An Ultra Precision Machining with High Pressure Reactive Plasma, Tehnology Reports of the Osaka University, Vol. 43, No. 2156, p. 261-266, 1992
  • Plasma CVM(Chemical Vaporization Machining) - An Ultra Precision Machining with High Pressure Reactive Plasma-, The 3rd International Conterence on Nanotechnology Abstract, 1992
  • Ultra-Smooth Surface Machining by Means of Atomistic Processes‐EEM(Elastic Emission Machining) and CVM(Chemical Vaporization Machining), Yuzo Mori,Kazuto Yamauchi,Kazuya Yamamura,Toshihiko Kataoka,Katsuyoshi Endo, Vol. 123-140, 1991/10
  • プラズマCVM(Chemical Vaporization Machining)の開発, 山村和也, 1991年精密工学会春季大会学術講演会講演論文集, 1991
  • プラズマCVM(Chemical Vaporization Machining)の開発, 1991
  • Ultra-Smooth Surface Machining by Means of Atomistic Processes‐EEM(Elastic Emission Machining) and CVM(Chemical Vaporization Machining), Proc.14th Symposium on ULSI ultra clean technology‐Advanced Semiconductor Manufacturing System‐(1991) 123-140., Vol. 123-140, 1991
  • Ultra-Smooth Surface Machining by Means of Atomistic Processes‐EEM(Elastic Emission Machining) and CVM(Chemical Vaporization Machining), Vol. 123-140, 1991
  • Ultra-Smooth Surface Machining by Means of Atomistic Processes‐EEM(Elastic Emission Machining) and CVM(Chemical Vaporization Machining), Vol. 123-140, 1991
  • Ultra-Smooth Surface machining by Means of Atomistic Processes - EEM (Elastic Emission Machining) and CVM (chemical Vaporization Machining)-, 1991

Publications

  • Chapter 41. Plasma-Based Nanomanufacturing Under Atmospheric Pressure, Handbook of Manufacturing Engineering and Technology, K. Yamamura,Y. Sano, Springer, ISBN:9781447146698, 2014/10
  • 超精密加工と表面科学 原子レベルの生産技術, 山村和也他, 大阪大学出版会, 2014/03
  • 精密加工と微細構造の形成技術, 第1章第2節[9], プラズマ援用研磨による SiCのスクラッチフリー・ダメージフリー仕上げ, 山村和也, 技術情報協会, ISBN:9784861044830, 2013/07
  • 大気圧プラズマの生成制御と応用技術 改訂版第6章第3節 プラズマCVMによる超精密形状創成とプラズマ援用研磨による表面仕上げ, 山村和也,佐野泰久,森 勇藏, サイエンス&テクノロジー, ISBN:9784864280396, 2012/03
  • Generation and Applications of Atmospheric Pressure Plasmas, Chapter 15. Ultra precision machining using plasma chemical vaporization machining (CVM), K. Yamamura,Y. Sano,Y. Mori, Nova Science Publishers, ISBN:9781612097176, 2011/04
  • Crystal Growth Technology (Chapter 18; Crystal Machining Using Atmospheric Pressure Plasma), Yasuhisa Sano,Kazuya Yamamura,Kazuto Yamauchi, WILEY-VCH, ISBN:9783527325931, 2010/09
  • 次世代パワー半導体 -省エネルギー社会に向けたデバイス開発の最前線- 第1章第1節2 PCVMを用いたSiC基板の薄化, 佐野泰久,山村和也,山内和人, (株)エヌ・ティー・エス, 2009/10
  • 大気圧プラズマ 基礎と応用 6.7.5 マイクロ/ナノ加工日本学術振興会プラズマ材料科学第153委員会, 佐野泰久,山村和也,山内和人, オーム社, ISBN:9784274207600, 2009/10
  • ウエットエッチングのメカニズムと処理パラメータの最適化,第1章第10節 ローカルウエットエッチング法による光学素子の高精度加工, 山村和也, サイエンス&テクノロジー, ISBN:9784903413471, 2008/07
  • Crystal Growth Technology (Chapter 19; Plasma Chemical Vaporization Machining and Elastic Emission Machining), Yasuhisa Sano,Kazuya Yamamura,Hidekazu Mimura,Kazuto Yamauchi,Yuzo Mori, Wiley-VCH, ISBN:9783527317622, 2008/03
  • 大気圧プラズマの生成制御と応用技術, 第13節 プラズマCVMによる超精密加工, 山村和也,佐野泰久,森 勇藏, サイエンス&テクノロジー, ISBN:4903413136, 2006/11
  • Crystal Growth Technology(Plasma-CVM(Chemical Vaporization Machining)), Yuzo Mori,Kazuya Yamamura,Yasuhisa Sano, John Wiley & Sons, 2003/10
  • 加工技術データファイル 基礎編(特殊加工)、5.7プラズマCVM, 森勇藏,山村和也,佐野泰久, (財)機械振興協会 技術研究所, 2003/06
  • 精密加工の最先端技術、第8章Ⅳ、「プラズマCVMの加工特性と表面物性」, 森勇藏,山村和也, 工業調査会, 1996/03
  • 精密加工の最先端技術, 工業調査会, 1996
  • Advanced Ultraprecision Technology, 1996

Industrial Property Rights

  • 金属含有膜付き誘電体基材の製造方法, 大久保雄司,山村和也,小玉欣典,澤田公平,久保田和宏, 特許第6564283号, 特願2015-169648, 出願日:2015/08, 登録日:2019/08
  • 誘電体基材表面の金属化方法及び金属膜付き誘電体基材, 山村和也,大久保雄司,佐藤悠,疋田真也, 特許第6551391号, 特願2016-505224(PCT/JP2015/055186), 出願日:2015/02, 登録日:2019/07
  • 陽極酸化を援用した研磨方法, 山村和也, 特許第6329655号, 特願2017-019551, 出願日:2017/02, 登録日:2018/04
  • 誘電体基材表面の触媒フリー金属化方法及び金属膜付き誘電体基材, 是津信行,山村和也, 特許第5721254号, 特願2010-208747, 出願日:2010/09, 登録日:2015/04
  • フッ素系樹脂材料の表面改質方法及びフッ素系樹脂材料と金属材料の積層体, 是津信行,山村和也, 特許第5645163号, 特願2011-013714, 出願日:2011/01, 登録日:2014/11
  • 難加工材料の精密加工方法及びその装置, 山村和也,是津信行, 特許第5614677号, 特願2010-041092, 出願日:2010/02, 登録日:2014/09
  • 誘電体機材表面の触媒フリー金属化方法及び金属膜付き誘電体基材, 是津信行,山村和也, 特許第5360963号, 特願2008-335528, 出願日:2008/12, 登録日:2013/09
  • 粒子膜の製造装置、及び粒子膜の製造方法, 是津信行,山村和也,真鍋享平, 特許第5322245号, 特願2010-550476, PCT/JP2010/000933, 出願日:2010/02, 登録日:2013/07
  • 表面加工方法及び装置, 山村和也, 特許第5039939号, 特願2006-014564, 出願日:2006/01, 登録日:2012/07
  • 半導体ウエハ外周部の加工方法及びその装置, 佐野泰久,山村和也,原英之,加藤武寛, 特許第4962960号, 特願2007-207866, 出願日:2007/08, 登録日:2012/04
  • 誘電体基板のパターン転写加工方法, 森勇藏,山村和也,佐野泰久, 特許第4665503号, 特願2004-360939, 出願日:2004/12, 登録日:2011/01
  • 表面改質成型体の製造方法, 大久保雄司,山村和也,秋山大作,東松逸朗,斉藤知志, 特願2018-094857, 出願日:2018/05
  • 表面処理方法及び装置, 大下貴也,上原剛,青山哲平,山村和也,大久保雄司,小玉欣典, 特願2018-019880, 出願日:2018/02
  • 多成分材料のプラズマエッチング加工方法, 山村和也,大久保雄司,孫栄硯, 特願2018-017230, 出願日:2018/02
  • 表面改質成型体の製造方法、及び該表面改質成型体を用いた複合体の製造方法, 山村和也,大久保雄司,石原健人,柴原正文,長谷朝博,本田幸司, 特願2015-175199(PCT/JP2015/075272), 出願日:2015/09
  • 陽極酸化を援用した形状創成エッチング法、研磨方法及び高精度形状創成方法, 山村和也, 特願2013-060147, 出願日:2013/03
  • パルス幅変調電力制御を用いた局所プラズマ処理方法及びその装置, 山村和也,佐野泰久, 特願2013-052219, 出願日:2013/03
  • 数値制御プラズマ処理方法及びその装置, 山村和也,境谷省吾,舩戸大輔, 特願2016-035730, 出願日:2016/02
  • 表面改質成型体の製造方法、及び該表面改質成型体を用いた複合体の製造方法, 山村和也,大久保雄司,石原健人,柴原正文,長谷朝博,本田幸司, 特願2014-181663, 出願日:2014/09
  • 誘電体基材表面の金属化方法及び金属膜付き誘電体基材, 山村和也,大久保雄司,佐藤悠,疋田真也, 特願2014-038876, 出願日:2014/02
  • 半導体記憶素子の製造方法, 是津信行,細井卓治,山村和也, 特願2009-178350, 出願日:2009/07
  • 粒子濃度の測定方法、粒子膜の製造方法、及び粒子膜の製造装置, 是津信行,山村和也,真鍋亨平, 特願2009-033063, 出願日:2009/02
  • 微粒子単層膜付き基板の製造方法及び微粒子単層膜, 是津信行,山村和也, 特願2008-335447, 出願日:2008/12

Works

  • フッ素樹脂を絶縁被覆材料とする無電解銅めっきシールド超極細同軸ケーブルの開発, 2012 -
  • フッ素樹脂を絶縁被覆材料とする無電解銅めっきシールド超極細同軸ケーブルの開発, 2011 -
  • プラズマ援用加工を用いた難加工材料の高品位仕上げプロセスの開発, 2011 -
  • 高性能パワーデバイスのための原子スケールで平坦なダメージフリーSiCウエハの作製, 2011 -
  • 中性子集光用非球面スーパーミラーデバイスの開発, 2010 -
  • 大気圧プラズマを援用した難加工材料の高能率・高品位加工プロセスの開発, 2010 -
  • 大気圧プラズマ照射を援用したパワーデバイス用単結晶SiC基板の高品位加工プロセスの開発, 2010 -
  • 高臨界角スーパーミラーを用いた多重チャネル中性子収束デバイスの研究, 2010 -
  • 高精度ビーム集光による角度発散型中性子反射法の開発, 2010 -
  • 大気圧プラズマ照射を援用したパワーデバイス用単結晶SiC基板の高品位加工プロセスの開発, 2010 -
  • グローバルCOE 高機能化原子制御製造プロセス教育研究拠点, 2010 -
  • 大気圧プラズマを援用した金型用難加工材料の高能率・高品位加工プロセスの開発, 2010 -
  • 大気圧プラズマ液相堆積法によるフッ素ポリマー表面の高密着性極薄銅メタライジング, 2009 -
  • 中性子集光用非球面スーパーミラーデバイスの開発, 2009 -
  • 高臨界角スーパーミラーを用いた多重チャネル中性子収束デバイスの研究, 2009 -
  • 触媒フリー・無電解銅めっきプロセスの開発とPTFE基板の素子化, 2009 -
  • 大気開放プラズマを用いた無歪高能率ナノ精度形状創成プロセスの開発, 2009 -
  • グローバルCOE 高機能化原子制御製造プロセス教育研究拠点, 2009 -
  • Development of aspherical supermirror devices for neutron focusing, 2009 -
  • 大気開放型プラズマプロセスを用いた水晶ウエハの高能率ダメージレス厚み均一化加工技術の開発, 2008 -
  • グローバルCOE 高機能化原子制御製造プロセス教育研究拠点, 2008 -
  • 触媒フリー・無電解銅めっきプロセスの開発とPTFE基板の素子化, 2008 -
  • 数値制御ローカルウエットエッチングによる次世代高速・低消費電力デバイス用SOIウエハの超高精度仕上げ加工, 2008 -
  • 大気開放プラズマを用いた無歪高能率ナノ精度形状創成プロセスの開発, 2008 -
  • 高能率ナノ精度形状創成のための2ステップ数値制御ローカルウエットエッチングプロセスの開発, 2008 -
  • 高臨界角スーパーミラーを用いた多重チャネル中性子収束デバイスの研究, 2008 -
  • 液晶用メーター超級大型フォトマスク基板の高精度・高能率作製プロセスの開発, 2008 -
  • 数値制御ローカルウエットエッチングによる新しい高能率・高精度形状創成プロセスの開発, 2008 -
  • Center of Excellence for Atomically Controlled Fabrication Technology, 2008 -
  • 数値制御LWEによる超大型フォトマスク基板の低コスト・高精度仕上げ加工プロセスの開発, 2007 -
  • 液晶用メーター超級大型フォトマスク基板の高精度・高能率作製プロセスの開発, 2007 -
  • 数値制御ローカルウエットエッチングによる新しい高能率・高精度形状創成プロセスの開発, 2007 -
  • 数値制御LWEによる超大型フォトマスク基板の低コスト・高精度仕上げ加工プロセスの開発, 2006 -
  • 数値制御ローカルウエットエッチングによる新しい高能率・高精度形状創成プロセスの開発, 2006 -
  • 液晶用メーター超級大型フォトマスク基板の高精度・高能率作製プロセスの開発, 2006 -
  • 原子論的生産技術の創出拠点, 2004 -
  • 超高精度X線ミラー作製による高分解能硬X線顕微鏡の開発, 2004 -
  • 高精度X線ミラーの超精密加工と形状計測に関する研究, 2004 -
  • 原子論的生産技術の創出拠点, 2004 -
  • 超高精度X線ミラー作製による高分解能硬X線顕微鏡の開発, 2004 -
  • 高精度X線ミラーの超精密過去と形状計測の関する研究, 2004 -

Awards

  • 文部科学大臣表彰 科学技術賞 開発部門, 2021/04
  • Best Paper Award, X. Yang, Xu. Yang, K. Kawai, K. Arima, K. Yamamura, 18th International Conference on Precision Engineering (ICPE2020), 2020/11
  • 井上春成賞, 山村和也,谷本秀夫, 井上春成賞委員会, 2017/07
  • Rudolf Kingslake Medal and Prize, X. Shen,Q. Tu,J. Zhou,H. Deng,G. Jiang,K. Yamamura, SPIE, 2016/08
  • 平成28年度表面技術協会 論文賞, 是津信行,山村和也,井筒祐志,我田 元,大石修治,手嶋勝弥, 表面技術協会, 2015/12
  • 岩木トライボコーティングネットワークアワード(岩木賞)優秀賞, 山村和也, 一般社団法人未来生産システム学協会, 2015/02
  • 大阪大学総長顕彰, 山村和也, 大阪大学, 2014/07
  • 工作機械技術振興賞(論文賞), トウキ,山村和也, 公益財団法人 工作機械技術振興財団, 2014/06
  • Best Paper Award, H. Deng,M. Ueda,K. Yamamura, 4th International Conference of Asian Society for Precision Engineering and Nanotechnology, 2011/11
  • Best Paper Award, X. Shen,Y. Dai,W. Peng,M. Nagano,K. Yamamura, 4th International Conference of Asian Society for Precision Engineering and Nanotechnology, 2011/11
  • Best Paper Award, Shuhei Uchida,Nobuyuki Zettsu,Kazuya Yamamura, 3rd Asian Symposium for Precision Engineering and Nanotechnology, 2009/11
  • Best Poster Presentation Award, Hiroyuki Takai,Kazuya Yamamura, Asian Symposium for Precision Engineering and Nanotechnology 2007, 2007/11
  • Best Paper Award 2006, Kazuya Yamamura,Kunihito Kato,Yasuhisa Sano,Masafumi Shibahara,Katsuyoshi Endo,Yuzo Mori, The 8th International Conference on Progress of Machining Technology, 2006/11
  • 工作機械技術振興賞(論文賞), 森勇藏,山村和也,佐野泰久, (財)工作機械技術振興財団, 2003/06
  • 精密工学会賞, 森勇藏,山村和也,佐野泰久, (社)精密工学会, 2003/03
  • 工作機械技術振興賞(論文賞), 森 勇蔵,山村和也,佐野泰久, (財)工作機械技術振興財団, 2002/06
  • JSPE Award, Kazuto Yamauchi,Kazuhisa Sugiyama,Kouji Inagaki,Kazuya Yamamura,Yasuhisa Sano,Yuzo Mori, 2001/03
  • 工作機械技術振興賞(論文賞), 森 勇蔵,山内和人,山村和也,佐野泰久, (財)工作機械技術振興財団, 2000/06

Media Coverage

  • PTFEの異材接着技術を開発 人体や環境への負担減 大阪大学, 接着剤新聞, 2019/01
  • 金属・フッ素樹脂 接着剤なく貼る, 日本経済新聞, 2019/01
  • 「NEXTデバイス 京セラ 世界最小の水晶部品 加工、プラズマ技術を応用」, 日経産業新聞, 2017/10
  • フッ素樹脂、熱アシストプラズマ処理で高い接着性-阪大が解明, 日刊工業新聞, 2017/08
  • 「井上春成賞に2件」, 日本経済新聞, 2017/06
  • フッ素樹脂の密着性、1年超持続−阪大、加熱プラズマ処理で成功, 日刊工業新聞, 2017/02
  • フッ素樹脂と金属膜の強力接合 阪大‐積水化学‐日油と共同 3年内めど実用化, 化学工業日報, 2016/10
  • フッ素樹脂と金属膜 プラズマ処理で接合 阪大 積水化学、日油と共同, 化学工業日報, 2016/01
  • フッ素樹脂と金属膜 強力接合技術を開発 阪大など基板実用化目指す, 日刊産業新聞, 2016/01
  • PTFE-銅・銀など 簡易に高強度接合 阪大, 化学工業日報, 2015/02
  • 接着剤使わず接合 阪大 フッ素樹脂とゴム, 日経産業新聞, 2014/09
  • ウエハー平坦化 大気圧プラズマ利用 阪大、多様な基材に対応, 化学工業日報, 2014/08
  • 大阪大学 フッ素と金属を密着 高周波基板材に応用展開, 半導体産業新聞, 2014/03
  • 炭化ケイ素 傷つけずに平滑に研磨 プラズマ照射 砥粒で同時処理, 日刊工業新聞, 2011/11
  • 世界最高性能の中性子集光技術 -照射強度を50倍増強 楕円面スーパーミラー開発-, 科学新聞, 2011/08
  • 表面を非接触超精密加工(微小な凹凸エッチング、阪大がシステム), 日刊工業新聞, 2008/02

Academic Activities

  • 公益社団法人砥粒加工学会関西地区部会 会計監査, 2019/04 - Present
  • 公益社団法人精密工学会 フェロー, 2017/03 - Present
  • 一般社団法人 電気加工学会 西日本支部(幹事), 2016/06 - Present
  • 一般社団法人 電気加工学会(理事), 2016/06 - Present
  • (社)精密工学会 関西支部(商議員), 2006/05 - Present
  • The 18th International Conference on Precision Engineering (ICPE2020) Program Chair, 2019/10 - 2020/11
  • 公益社団法人砥粒加工学会 理事, 2017/04 - 2019/03
  • (社)精密工学会 関西支部(庶務幹事), 2010/04 - 2018/03
  • (社)精密工学会 超精密加工専門委員会(幹事), 2010/12 - 2013/01
  • (社)精密工学会(校閲委員会委員), 2008/04 - 2011/03
  • (社)精密工学会(評議員), 2008/03 - 2011/03
  • (社)精密工学会 関西支部(会計幹事), 2007/05 - 2010/04
  • (社)精密工学会(周年事業検討ワーキンググループ委員), 2006/07 - 2009/09
  • セミコンジャパン Inovation Village, SEMI, 2016/12 -
  • 18th CIRP Conference on Electro Physical and Chemical Machining (ISEM XVIII), CIRP, JSEME, 2016/04 -
  • SURTECH2016「表面技術要素展」, 一般社団法人表面技術協会、日本鍍金材料協同組合、株式会社ICSコンベンションデザイン, 2016/01 -
  • The 6th International Conference of Asian Society for Precision Engineering and Nanotechnology (ASPEN2015), Harbin Institute of Technology, 2015/08 -
  • SURTECH2015「表面技術要素展」, 一般社団法人表面技術協会、日本鍍金材料協同組合、株式会社ICSコンベンションデザイン, 2015/01 -
  • The 4th Asia Pacific Conference on Optics Manufacture 2014 (APCOM 2014), Guangdong University of Technology & The Hong Kong Polytechnic University, 2014/11 -
  • イノベーションジャパン, 科学技術振興機構、新エネルギー・産業技術総合開発機構, 2014/09 -
  • 2014 International Conference on Machining, Materials and Mechanical Technologies(2014 IC3MT), National Central University (NCU), Taiwan, Japan Society for Precision Engineering (JSPE), Japan, 2014/08 -
  • The 15th International Conference on Precision Engineering (ICPE2014), The Japan Society for Precision Engineering (JSPE), 2014/07 -
  • 14th International Conference of the European Society for Precision Engineering and Nanotechnology, The European Society for Precision Engineering and Nanotechnology, 2014/06 -
  • 真空展, 日本真空工業会、一般社団法人日本真空学会, 2013/11 -
  • 13th International Conference of the European Society for Precision Engineering and Nanotechnology, The European Society for Precision Engineering and Nanotechnology, 2013/05 -
  • 砥粒加工学会 先進テクノフェアポスター展示(ATF2013), 2013/03 -
  • The 9th Cooperative and Joint international conference on Ultra-precision Machining Process in conjunction with The 7th Conference of Ultra-Precision (ELID) Technology Research Group, RIKEN, MFL, Committee of Precision Engineering & Micro-nano Technology of CPEI, Committee of Ultra-Precision (ELID) Technology Research Group (UPET), 2013/03 -
  • セミコンジャパン, SEMI, 2012/12 -
  • The 9th CHINA-JAPAN International Conference on Ultra-Precision Machining, Zhejiang University of Technology, CMES, JSPE, RIKEN, 2012/11 -
  • The 14th International Conference on Precision Engineering(ICPE2012), Japan Society for Precision Engineering, 2012/11 -
  • 10th International Conference on Processing of Machining Technology (ICPMT2012), Japan Society for Precision Engineering, 2012/09 -
  • The 3rd Asia Pacific Conference on Optics Manufacture 2012 (APCOM 2012), The Chinese Optical Society et al., 2012/08 -
  • セミコンジャパン, SEMI, 2011/12 -
  • The 8th CHINA-JAPAN International Conference on Ultra-Precision Machining, Zhejiang University of Technology, CMES, JSPE, RIKEN, 2011/11 -
  • 4th International Conference of Asian Society for Precision Engineering and Nanotechnology(ASPEN2011), The Hong Kong Polytechnic University, 2011/11 -
  • Fourth International Symposium on Atomically Controlled Fabrication Technology, The Osaka University Global COE Program "Atomically Controlled Fabrication Technology", 2011/10 -
  • セミコンジャパン, SEMI, 2010/12 -
  • Third international symposium on Atomically Controlled Fabrication Technology, The Osaka University Global COE Program "Atomically Controlled Fabrication Technology", 2010/11 -
  • 2nd International Conference on Nanomanufacturing (nanoMan2010), International Academy for Production Engineering (CIRP), etc., 2010/09 -
  • Second international symposium on Atomically Controlled Fabrication Technology, The Osaka University Global COE Program "Atomically Controlled Fabrication Technology", 2009/11 -
  • 3rd International Conference of Asian Society for Precision Engineering and Nanotechnology(ASPEN2009), Japan Society for Precision Engineering, 2009/11 -
  • International workshop on X-ray mirror design, and metrology, The Osaka University global COE "Atomically Controlled Fabrication Technology", and Grant-in-Aid for, 2009/09 -
  • First International Symposium on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing-, The Global COE Program "Atomically Controlled Fabrication Technology", 2009/02 -
  • セミコンジャパン, SEMI, 2008/12 -
  • nano tech 2008 国際ナノテクノロジー総合展・技術会議, nano tech 実行委員会, 2008/02 -
  • セミコンジャパン, SEMI, 2007/12 -
  • International 21st Century COE Symposium on Atomistic Fabrication Technology, The 21st Century COE Program “Atomistic Fabrication Technology”, Osaka University, 2007/10 -
  • イノベーションジャパン, 科学技術振興機構、NEDO, 2007/09 -
  • モノづくり企業革新研究会, 大阪商工会議所, 2007/07 -
  • 微細精密加工技術展, 微細精密加工技術展2007実行委員会, 2007/05 -
  • International 21st Century COE Symposium on Atomistic Fabrication Technology, The 21st Century COE Program “Atomistic Fabrication Technology” Osaka University, 2006/10 -

Committee Memberships

  • (社)精密工学会 関西支部, 庶務幹事, 2010 -
  • (社)精密工学会 超精密加工専門委員会, 幹事, 2010 -
  • (社)精密工学会, 校閲委員会委員, 2008 -
  • (社)精密工学会 関西支部, 会計幹事, 2007 -
  • (社)精密工学会, 評議員, 2007 -
  • (社)精密工学会, 周年事業検討ワーキンググループ委員, 2006 -
  • (社)精密工学会 関西支部, 商議員, 2006 -