Improving the efficiency of CO2 methanation using a combination of plasma and molecular sieves

Susumu Toko, Takamasa Okumura, Kunihiro Kamataki, Kosuke Takenaka, Kazunori Koga, Masaharu Shiratani, Yuichi Setsuhara

Results in Surfaces and Interfaces　p. 100204-100204　2024/02　Research paper (scientific journal)

Stability and gap states of amorphous In-Ga-Zn-Ox thin film transistors: Impact of sputtering configuration and post-annealing on device performance

Kosuke Takenaka, Shota Nunomura, Yuji Hayashi, Hibiki Komatsu, Susumu Toko, Hitoshi Tampo, Yuichi Setsuhara

Thin Solid Films　Vol. 790　p. 140203-140203　2024/02　Research paper (scientific journal)

プラズマ触媒作用を用いた二酸化炭素還元反応の促進に関する基礎研究

Susumu TOKO, Takamasa OKUMURA, Kunihiro KAMATAKI, Kosuke TAKENAKA, Kazunori KOGA, Masaharu SHIRATANI, Yuichi SETSUHARA

Journal of Smart Processing　Vol. 13　No. 1　p. 31-36　2024/01/10　Research paper (scientific journal)

Influence of pre-treatment using non-thermal atmospheric pressure plasma jet on aluminum alloy A1050 to PEEK direct joining with hot-pressing process

Kosuke Takenaka, Akiya Jinda, Soutaro Nakamoto, Ryosuke Koyari, Susumu Toko, Giichiro Uchida, Yuichi Setsuhara

The International Journal of Advanced Manufacturing Technology　Vol. 130　No. 3-4　p. 1925-1933　2023/12/15　Research paper (scientific journal)

Improving bonding strength by non-thermal atmospheric pressure plasma-assisted technology for A5052/PEEK direct joining

Kosuke Takenaka, Akiya Jinda, Soutaro Nakamoto, Ryosuke Koyari, Susumu Toko, Giichiro Uchida, Yuichi Setsuhara

The International Journal of Advanced Manufacturing Technology　Vol. 130　No. 1-2　p. 903-913　2023/12/06　Research paper (scientific journal)

Direct bonding of stainless steel and PEEK using non-thermal atmospheric pressure plasma-assisted joining technology

Kosuke Takenaka, Akiya Jinda, Soutaro Nakamoto, Susumu Toko, Giichiro Uchida, Yuichi Setsuhara

Journal of Manufacturing Processes　Vol. 105　p. 276-281　2023/11　Research paper (scientific journal)

プラズマ支援反応性プロセスを用いた酸化物半導体薄膜形成

竹中弘祐, 節原裕一, 江部明憲

真空ジャーナル　No. 186　2023/10

Contribution of active species generated in plasma to CO<inf>2</inf> methanation

Susumu Toko, Taiki Hasegawa, Takamasa Okumura, Kunihiro Kamataki, Kosuke Takenaka, Kazunori Koga, Masaharu Shiratani, Yuichi Setsuhara

Japanese Journal of Applied Physics　Vol. 62　No. SL　2023/09/01　Research paper (scientific journal)

Improving the efficiency of Sabatier reaction through H2O removal with low-pressure plasma catalysis Taiki

Susumu Toko, Taiki Haseagawa, Takamasa Okumura, Kunihiro Kamataki, Kosuke Takenaka, Kazunori Koga, Masaharu Shiratani, Yuichi Setsuhara

Japanese Journal of Applied Physics　Vol. 62　p. SL1028-SL1028　2023/07　Research paper (scientific journal)

Optical emission spectroscopy study in CO<inf>2</inf> methanation with plasma

Susumu Toko, Taiki Hasegawa, Takamasa Okumura, Kunihiro Kamataki, Kosuke Takenaka, Kazunori Koga, Masaharu Shiratani, Yuichi Setsuhara

Japanese Journal of Applied Physics　Vol. 62　2023/07/01　Research paper (scientific journal)

Analysis of oxygen-based species introduced during plasma assisted reactive processing of a-IGZO films

Kosuke Takenaka, Hiroyuki Hirayama, Masashi Endo, Susumu Toko, Giichiro Uchida, Akinori Ebe, Yuichi Setsuhara

Japanese Journal of Applied Physics　Vol. 62　2023/06　Research paper (scientific journal)

Analysis of residual oxygen during a-IGZO thin film formation by plasma-assisted reactive sputtering using a stable isotope

Kosuke Takenaka, Masashi Endo, Hiroyuki Hirayama, Susumu Toko, Giichiro Uchida, Akinori Ebe, Yuichi Setsuhara

Vacuum　Vol. 215　2023/06　Research paper (scientific journal)

Plasma processing technique by combination of plasma-assisted reactive sputtering and plasma annealing for uniform electrical characteristics of InGaZnO thin film transistors formed on large-area substrates

Kosuke Takenaka, Tomoki Yoshitani, Masashi Endo, Hiroyuki Hirayama, Susumu Toko, Giichiro Uchida, Akinori Ebe, Yuichi Setsuhara

Japanese Journal of Applied Physics　Vol. 62　p. SI1005/1-SI1005/9　2023/03　Research paper (scientific journal)

Development of a non-thermal atmospheric pressure plasma-assisted technology for the direct joining of metals with dissimilar materials

Kosuke Takenaka, Rikuro Machida, Tetsuya Bono, Akiya Jinda, Susumu Toko, Giichiro Uchida, Yuichi Setsuhara

Journal of Manufacturing Processes　Vol. 75　p. 664-669　2022/03　Research paper (scientific journal)

Nanostructured Ge and GeSn films by high-pressure He plasma sputtering for high-capacity Li ion battery anodes

Giichiro Uchida, Kenta Nagai, Yuma Habu, Junki Hayashi, Yumiko Ikebe, Mineo Hiramatsu, Ryota Narishige, Naho Itagaki, Masaharu Shiratani, Yuichi Setsuhara

Scientific Reports　Vol. 12　No. 1　2022/02/02　Research paper (scientific journal)

Effect of gas flow rate and discharge volume on CO2 methanation with plasma catalysis

Susumu Toko, Masashi Ideguchi, Taiki Haseagawa, Takamasa Okumura, Kunihiro Kamataki, Kosuke Takenaka, Kazunori Koga, Masaharu Shiratani, Yuichi Setsuhara

Japanese Journal of Applied Physics　2022/01　Research paper (scientific journal)

Morphological control of nanostructured Ge films in high Ar-gas-pressure plasma sputtering process for Li ion batteries

Junki Hayashi, Kenta Nagai, Yuma Habu, Yumiko Ikebe, Mineo Hiramatsu, Ryota Narishige, Naho Itagaki, Masaharu Shiratani, Yuichi Setsuhara, Giichiro Uchida

Japanese Journal of Applied Physics　Vol. 61　No. SA　p. SA1002-SA1002　2021/12/15　Research paper (scientific journal)

Formation of Functional Oxide Thin Film by Plasma-assisted Reactive Process Using Mist

竹中弘祐, 節原裕一

スマートプロセス学会誌　Vol. 10　No. 1　2021

Amorphous InGaZnO_x thin film formation by a plasma-assisted reactive process.

竹中弘祐, 内田儀一郎, 江部明憲, 節原裕一

応用物理　Vol. 90　No. 1　2021

Effects of surrounding gas on plasma-induced downward liquid flow

Toshiyuki Kawasaki, Keisuke Nishida, Giichiro Uchida, Fumiaki Mitsugi, Kosuke Takenaka, Kazunori Koga, Yuichi Setsuhara, Masaharu Shiratani

Japanese Journal of Applied Physics　Vol. 59　No. SH　2020/05/01　Research paper (scientific journal)

Study on Cancer Cell Killing by Using Aqueous Solution Treated by Atmospheric Low-temperature Plasma Jet

内田儀一郎, 池田純一郎, 竹中弘祐, 節原裕一

スマートプロセス学会誌　Vol. 9　No. 3　2020

Formation of functional oxide thin films using plasma-assisted reactive process

Kosuke Takenaka, Yuichi Setsuhara

Yosetsu Gakkai Shi/Journal of the Japan Welding Society　Vol. 89　No. 7　p. 6-9　2020

High-rate deposition of silicon nitride thin films using plasma-assisted reactive sputter deposition

Kosuke Takenaka, Yuichi Setsuhara, Jeon Geon Han, Giichiro Uchida, Akinori Ebe

Thin Solid Films　Vol. 685　p. 306-311　2019/09　Research paper (scientific journal)

Droplet-Vaporization Behavior during Plasma-Assisted Mist Chemical Vapor Deposition of Zinc Oxide Films

Kosuke Takenaka, Yuichi Setsuhara

Plasma Sources Science & Technology　Vol. 28　p. 065015/1-065015/8　2019/06　Research paper (scientific journal)

Low-temperature formation of high-mobility a-InGaZnOx films using plasma-enhanced reactive processes

Kosuke Takenaka, Masashi Endo, Hiroyuki Hirayama, Giichiro Uchida Akinori Ebe, Yuichi Setsuhara

Japanese Journal of Applied Physics　Vol. 58　p. 090605/1-090605/5　2019/06　Research paper (scientific journal)

大気非平衡プラズマによる水中活性種の生成・制御

節原 裕一, 内田 儀一郎, 竹中 弘祐

金属　Vol. 89　No. 6　2019/05

Decomposition and oxidation of methionine and tryptophan following irradiation with a nonequilibrium plasma jet and applications forkilling cancer cells

Giichiro Uchida, Yusuke Mino, Tensho Suzuki, Jun-ichiro Ikeda, Takashi Suzuki, Kosuke Takenaka, Yuichi Setsuhara

Scientific Reports　Vol. 9　p. 6625/1-6625/17　2019/04　Research paper (scientific journal)

大気圧非平衡He プラズマジェットと溶液との相互作用に関する可視化研究

内田 儀一郎, 竹中 弘祐, 川崎 敏之, 古閑 一憲, 白谷 正治, 節原 裕一

スマートプロセス学会誌　Vol. 8　No. 2　p. 58-63　2019/03

Effects of post-deposition plasma treatments on stability of amorphous InGaZnOx thin-film transistors prepared with plasma-assisted reactive magnetron sputtering

K. Takenaka, M. Endo, G. Uchida, Y. Setsuhara

Japanese Journal of Applied Physics　Vol. 58　No. 2s　p. SAAC03/1-SAAC03/5　2019/02　Research paper (scientific journal)

Influence of deposition condition on electrical properties of a-IGZO films deposited by plasma-enhanced reactive sputtering

Kosuke Takenaka, Masashi Endo, Giichiro Uchida, Akinori Ebe, Yuichi Setsuhara

Journal of Alloys and Compounds　Vol. 772　p. 642-649　2019/01　Research paper (scientific journal)

The effect of the H<inf>2</inf>/(H<inf>2</inf> + Ar) flow-rate ratio on hydrogenated amorphous carbon films grown using Ar/H<inf>2</inf>/C<inf>7</inf>H<inf>8</inf> plasma chemical vapor deposition

Taojun Fang, Kenji Yamaki, Kazunori Koga, Daisuke Yamashita, Hyunwoong Seo, Naho Itagaki, Masaharu Shiratani, Kosuke Takenaka, Yuichi Setsuhara

Thin Solid Films　Vol. 660　No. 8　p. 891-898　2018/08/30　Research paper (scientific journal)

Plasma-enhanced reactive linear sputtering source for formation of silicon-based thin films

K. Takenaka, Y. Setsuhara, J. G. Han, G. Uchida, A. Ebe

Review of Scientific Instruments　Vol. 89　No. 8　p. 083902/1-083902/6　2018/08　Research paper (scientific journal)

Effect of a plasma-activated medium produced by direct irradiation on cancer cell killing

G. Uchida, T. Ito, J. Ikeda, T. Suzkuki, K. Takenaka, Y. Setsuhara

Japanese Journal of Applied Physics　Vol. 57　No. 9　p. 096201-1-096201-6　2018/07　Research paper (scientific journal)

Fabrication of high-performance InGaZnOx thin film transistors based on control of oxidation using a low-temperature plasma

Kosuke Takenaka, Masashi Endo, Giichiro Uchida, Yuichi Setsuhara

Applied Physics Letters　Vol. 112　No. 15　p. 152103/1-152103/3　2018/04/09　Research paper (scientific journal)

Low-temperature formation of c-axis-oriented aluminum nitride thin films by plasma-assisted reactive pulsed-DC magnetron sputtering

Kosuke Takenaka, Yoshikatsu Satake, Giichiro Uchida, Yuichi Setsuhara

Japanese Journal of Applied Physics　Vol. 57　No. 1　p. 01AD06-1-01AD06-5　2018/01/01　Research paper (international conference proceedings)

Selective production of reactive oxygen and nitrogen species in the plasma-treated water by using a nonthermal high-frequency plasma jet

Giichiro Uchida, Kosuke Takenaka, Keigo Takeda, Kenji Ishikawa, Masaru Hori, Yuichi Setsuhara

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 57　No. 1　p. 0102B4-1-0102B4-6　2018/01　Research paper (scientific journal)

Development of a non-equilibrium 60 MHz plasma jet with a long discharge plume

Giichiro Uchida, Kazufumi Kawabata, Taiki Ito, Kosuke Takenaka, Yuichi Setsuhara

JOURNAL OF APPLIED PHYSICS　Vol. 122　No. 3　p. 033301-1-033301-8　2017/07　Research paper (scientific journal)

Control of reactive oxygen and nitrogen species production in liquid by nonthermal plasma jet with controlled surrounding gas

Taiki Ito, Giichiro Uchida, Atsushi Nakajima, Kosuke Takenaka, Yuichi Setsuhara

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 56　No. 1　p. 01AC06-1-01AC06-6　2017/01　Research paper (scientific journal)

Effects of Working Pressure on the Physical Properties of a-InGaZnOx Films Formed Using Inductively Coupled Plasma-Enhanced Reactive Sputtering Deposition

Kosuke Takenaka, Keitaro Nakata, Giichiro Uchida, Yuichi Setsuhara, Akinori Ebe

IEEE TRANSACTIONS ON PLASMA SCIENCE　Vol. 44　No. 12　p. 3099-3106　2016/12　Research paper (scientific journal)

Effects of nonthermal plasma jet irradiation on the selective production of H2O2 and NO2- in liquid water

Giichiro Uchida, Atsushi Nakajima, Taiki Ito, Kosuke Takenaka, Toshiyuki Kawasaki, Kazunori Koga, Masaharu Shiratani, Yuichi Setsuhara

JOURNAL OF APPLIED PHYSICS　Vol. 120　No. 20　p. 203302-1-203302-9　2016/11　Research paper (scientific journal)

Low-temperature atmospheric-pressure plasma sources for plasma medicine

Yuichi Setsuhara

ARCHIVES OF BIOCHEMISTRY AND BIOPHYSICS　Vol. 605　p. 3-10　2016/09　Research paper (scientific journal)

Advanced Plasma Science and Its Applications for Nitride and Nanomaterials FOREWORD

Wakahara Akihiro, Nakatsuka Osamu, Sasaki Minoru, Terashima Kazuo, Amano Hiroshi, Egawa Takashi, Fujiwara Yasufumi, Hiramatsu Mineo, Ichino Ryoichi, Inoue Yasushi, Ito Masafumi, Kasu Makoto, Kondo Hiroki, Miyazaki Seiichi, Sawada Kazuaki, Sekine Makoto, Setsuhara Yuichi, Shiratani Masaharu, Takikawa Hirofumi, Watanabe Yoshimi

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 55　No. 1　2016/01

Effects of deposition rate and ion bombardment on properties of a-C:H films deposited by H-assisted plasma CVD method

Xiao Dong, Kazunori Koga, Daisuke Yamashita, Hyunwoong Seo, Naho Itagaki, Masaharu Shiratani, Yuichi Setsuhara, Makoto Sekine, Masaru Hori

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 55　No. 1　p. 01AA11-1-01AA11-7　2016/01　Research paper (scientific journal)

Process controllability of inductively coupled plasma-enhanced reactive sputter deposition for the fabrication of amorphous InGaZnOx channel thin-film transistors

Kosuke Takenaka, Keitaro Nakata, Hirofumi Otani, Soichiro Osaki, Giichiro Uchida, Yuichi Setsuhara

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 55　No. 1　2016/01　Research paper (scientific journal)

Influence of voltage pulse width on the discharge characteristics in an atmospheric dielectric-barrier-discharge plasma jet

Giichiro Uchida, Kosuke Takenaka, Yuichi Setsuhara

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 55　No. 1　2016/01　Research paper (scientific journal)

Gas Flow Rate Dependence of the Discharge Characteristics of a Plasma Jet Impinging Onto the Liquid Surface

Giichiro Uchida, Atsushi Nakajima, Kosuke Takenaka, Kazunori Koga, Masaharu Shiratani, Yuichi Setsuhara

IEEE TRANSACTIONS ON PLASMA SCIENCE　Vol. 43　No. 12　p. 4081-4087　2015/12　Research paper (scientific journal)

Analysis of Dynamic Discharge Characteristics of Plasma Jet Based on Voltage and Current Measurements Using a Metal Plate

Yuichi Setsuhara, Giichiro Uchida, Kazufumi Kawabata, Atsushi Nakajima, Kosuke Takenaka

IEEE TRANSACTIONS ON PLASMA SCIENCE　Vol. 43　No. 11　p. 3821-3826　2015/11　Research paper (scientific journal)

Effects of gas flow on oxidation reaction in liquid induced by He/O-2 plasma-jet irradiation

Atsushi Nakajima, Giichiro Uchida, Toshiyuki Kawasaki, Kazunori Koga, Thapanut Sarinont, Takaaki Amano, Kosuke Takenaka, Masaharu Shiratani, Yuichi Setsuhara

JOURNAL OF APPLIED PHYSICS　Vol. 118　No. 4　p. 043301-1-043301-9　2015/07　Research paper (scientific journal)

Low-temperature formation of amorphous InGaZnOx films with inductively coupled plasma-enhanced reactive sputter deposition

Kosuke Takenaka, Ken Cho, Yasufumi Ohchi, Hirofumi Otani, Giichiro Uchida, Yuichi Setsuhara

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 54　No. 6　2015/06　Research paper (scientific journal)

Low-temperature formation of amorphous InGaZnO

Takenaka Kosuke, Cho Ken, Ohchi Yasufumi, Otani Hirofumi, Uchida Giichiro, Setsuhara Yuichi

Jpn. J. Appl. Phys.　Vol. 54　No. 6　2015/05/28

Effects of discharge voltage waveform on the discharge characteristics in a helium atmospheric plasma jet

Giichiro Uchida, Kosuke Takenaka, Yuichi Setsuhara

JOURNAL OF APPLIED PHYSICS　Vol. 117　No. 15　p. 153301-1-153301-6　2015/04　Research paper (scientific journal)

Plasma Interaction with Organic Molecules in Liquid as Fundamental Processes in Plasma Medicine

Kosuke Takenaka, Atsushi Miyazaki, Hiroya Abe, Giichiro Uchida, Yuichi Setsuhara

JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY　Vol. 15　No. 3　p. 2120-2124　2015/03　Research paper (scientific journal)

Influence of He Gas Flow Rate on Optical Emission Characteristics in Atmospheric Dielectric-Barrier-Discharge Plasma Jet

Giichiro Uchida, Kosuke Takenaka, Kazufumi Kawabata, Yuichi Setsuhara

IEEE TRANSACTIONS ON PLASMA SCIENCE　Vol. 43　No. 3　p. 737-744　2015/03　Research paper (scientific journal)

Atmospheric-Pressure Plasma Interaction with Soft Materials as Fundamental Processes in Plasma Medicine

Kosuke Takenaka, Atsushi Miyazaki, Giichiro Uchida, Yuichi Setsuhara

JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY　Vol. 15　No. 3　p. 2115-2119　2015/03　Research paper (scientific journal)

Dynamic Properties of Helium Atmospheric Dielectric-Barrier-Discharge Plasma Jet

Giichiro Uchida, Kosuke Takenaka, Atsushi Miyazaki, Kazufumi Kawabata, Yuichi Setsuhara

JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY　Vol. 15　No. 3　p. 2324-2329　2015/03　Research paper (scientific journal)

Atmospheric-Pressure Gas-Breakdown Characteristics with a Radio-Frequency Voltage

Giichiro Uchida, Kosuke Takenaka, Atsushi Miyazaki, Yuichi Setsuhara

JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY　Vol. 15　No. 3　p. 2192-2196　2015/03　Research paper (scientific journal)

Molecular-structure variation of biomolecules irradiated with atmospheric-pressure plasma through plasma/liquid interface

Kosuke Takenaka, Atushi Miyazaki, Kazufumi Kawabata, Giichiro Uchida, Yuichi Setsuhara

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 54　No. 1　2015/01　Research paper (scientific journal)

FOREWORD Advanced Plasma Science and Its Applications for Nitride and Nanomaterials

Satoshi Kamiyama, Yasufumi Fujiwara, Mineo Hiramatsu, Masafumi Ito, Toshiro Kaneko, Makoto Kasu, Hideto Miyake, Keiji Nakamura, Kazuaki Sawada, Makoto Sekine, Yuichi Setsuhara, Tatsuru Shirafuji, Hirofumi Takikawa, Kazuo Terashima, Akihiro Wakahara, Yoshimi Watanabe

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 53　No. 11　2014/11

Effects of driving voltage frequency on the discharge characteristics of atmospheric dielectric-barrier-discharge plasma jet

Giichiro Uchida, Kosuke Takenaka, Kazufumi Kawabata, Atsushi Miyazaki, Yuichi Setsuhara

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 53　No. 11　2014/11　Research paper (scientific journal)

Plasma Sources in Thin Film Deposition

Y. Setsuhara

Comprehensive Materials Processing　Vol. 4　p. 307-324　2014/05　Part of collection (book)

Investigation of plasma-organic materials interaction in aqueous solution with atmospheric pressure plasmas

K. Takenaka, A. Miyazaki, Y. Setsuhara

26TH SYMPOSIUM ON PLASMA SCIENCES FOR MATERIALS (SPSM26)　Vol. 518　2014　Research paper (international conference proceedings)

Molecular-structure variation of organic materials irradiated with atmospheric pressure plasma

K. Takenaka, A. Miyazaki, Y. Setsuhara

26TH SYMPOSIUM ON PLASMA SCIENCES FOR MATERIALS (SPSM26)　Vol. 518　2014　Research paper (international conference proceedings)

プラズマを用いたソフトマテリアルプロセスの展開〜低温・低ダメージの材料プロセスからプラズマ医療〜

節原 裕一

スマートプロセス学会誌　Vol. 3　No. 1　p. 23-29　2014/01

プラズマとソフトマテリアルとの相互作用 −低ダメージの表面プロセスからプラズマ医療にわたる基礎過程−

節原 裕一

表面技術　Vol. 64　No. 12　p. 628-633　2013/12

Plasma-Enhanced Reactive Magnetron Sputtering Assisted with Inductively Coupled Plasma for Reactivity-Controlled Deposition of Microcrystalline Silicon Thin Films

Kosuke Takenaka, Yuichi Setsuhara, Akinori Ebe

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 52　No. 11　2013/11　Research paper (scientific journal)

Plasma Interactions with Organic Materials in Liquid through Plasma/Liquid Interface

Kosuke Takenaka, Yuichi Setsuhara

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 52　No. 11　2013/11　Research paper (scientific journal)

Deposition and characterization of a- and μc-Si: H thin films by ICP-CVD system with internal antennas

J. H. Hsieh, H. C. Liang, Y. Setsuhara, C. Li

Surface and Coatings Technology　Vol. 231　p. 550-556　2013/09/25　Research paper (scientific journal)

Plasma interaction with Zn nano layer on organic materials for analysis of early stage of inorganic/organic hybrid multi-layer formation

Ken Cho, Kosuke Takenaka, Yuichi Setsuhara

SURFACE & COATINGS TECHNOLOGY　Vol. 228　p. S271-S275　2013/08　Research paper (scientific journal)

Mass density control of carbon films deposited by H-assisted plasma CVD method

Tatsuya Urakawa, Hidehumi Matsuzaki, Daisuke Yamashita, Giichiro Uchida, Kazunori Koga, Masaharu Shiratani, Yuichi Setsuhara, Makoto Sekine, Masaru Hori

SURFACE & COATINGS TECHNOLOGY　Vol. 228　p. S15-S18　2013/08　Research paper (scientific journal)

Plasma interactions with aminoacid (l-alanine) as a basis of fundamental processes in plasma medicine

Yuichi Setsuhara, Ken Cho, Masaharu Shiratani, Makoto Sekine, Masaru Hori

Current Applied Physics　Vol. 13　No. 1　p. S59-S63　2013/03/20　Research paper (scientific journal)

Surface roughness development on ArF-photoresist studied by beam-irradiation of CF4 plasma

Takuya Takeuchi, Kenji Ishikawa, Yuichi Setsuhara, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

JOURNAL OF PHYSICS D-APPLIED PHYSICS　Vol. 46　No. 10　2013/03　Research paper (scientific journal)

Advanced materials design via low-damage plasma processes

Yuichi Setsuhara

Progress in Advanced Structural and Functional Materials Design　p. 225-236　2013/01/01　Part of collection (book)

Investigations on plasma-biomolecules interactions as fundamental process for plasma medicine

Kosuke Takenaka, Ken Cho, Yuichi Setsuhara, Masaharu Shiratani, Makoto Sekine, Masaru Hori

Journal of Physics: Conference Series　Vol. 441　No. 1　2013　Research paper (international conference proceedings)

H-2/N-2 Plasma Etching Rate of Carbon Films Deposited by H-Assisted Plasma Chemical Vapor Deposition

Tatsuya Urakawa, Ryuhei Torigoe, Hidefumi Matsuzaki, Daisuke Yamashita, Giichiro Uchida, Kazunori Koga, Masaharu Shiratani, Yuichi Setsuhara, Keigo Takeda, Makoto Sekine, Masaru Hori

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 52　No. 1　2013/01　Research paper (scientific journal)

Plasma-Assisted Mist Chemical Vapor Deposition of Zinc Oxide Films Using Solution of Zinc Acetate

Kosuke Takenaka, Yusuke Okumura, Yuichi Setsuhara

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 52　No. 1　2013/01　Research paper (scientific journal)

Investigation of chemical bonding states at interface of Zn/organic materials for analysis of early stage of inorganic/organic hybrid multi-layer formation

Ken Cho, Kosuke Takenaka, Yuichi Setsuhara, Masaharu Shiratani, Makoto Sekine, Masaru Hori

THIN SOLID FILMS　Vol. 523　p. 15-19　2012/11　Research paper (scientific journal)

Low-Temperature Deposition of Zinc Oxide Film by Plasma-Assisted Mist Chemical Vapor Deposition

Kosuke Takenaka, Yusuke Okumura, Yuichi Setsuhara

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 51　No. 8　p. 08HF05-1-08HF05-4　2012/08　Research paper (scientific journal)

Low-Temperature Growth of Zinc Oxide Films from Zinc Acetate Solution Using Plasma-Assisted Mist Chemical Vapor Deposition

Kosuke Takenaka, Yusuke Okumura, Yuichi Setsuhara

Transactions of the Materials Research Society of Japan　Vol. 37　No. 2　p. 173-176　2012/06　Research paper (scientific journal)

Characterization of inductively coupled RF plasmas for plasma-assisted mist CVD of ZnO films

Kosuke Takenaka, Yusuke Okumura, Yuichi Setsuhara

INTERNATIONAL SYMPOSIUM ON MATERIALS SCIENCE AND INNOVATION FOR SUSTAINABLE SOCIETY: ECO-MATERIALS AND ECO-INNOVATION FOR GLOBAL SUSTAINABILITY (ECO-MATES 2011)　Vol. 379　p. 012031-1-012031-6　2012　Research paper (international conference proceedings)

Effects of Irradiation with Ions and Photons in Ultraviolet-Vacuum Ultraviolet Regions on Nano-Surface Properties of Polymers Exposed to Plasmas

Ken Cho, Kosuke Takenaka, Yuichi Setsuhara, Masaharu Shiratani, Makoto Sekine, Masaru Hori

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 51　No. 1　p. 01AJ02-1-01AJ02-5　2012/01　Research paper (scientific journal)

Investigations on Plasma Interactions with Soft Materials for Fabrication of Flexible Devices

Ken Cho, Yuichi Setsuhara, Kosuke Takenaka, Masaharu Shiratani, Makoto Sekine, Masaru Hori

Journal of High Temperature Society　Vol. 37　No. 6　p. 289-297　2011/11　Research paper (scientific journal)

The 10th Asia-Pacific conference on Plasma Science and Technology (APCPST 2010): The 153rd symposium on Plasma Science for Materials (SPSM 2010)

H. Y. Chae, Chin Wook Chung, J. W. Chung, M. P. Hong, J. H. Joo, H. J. Kim, D. H. Kim, E. Kusano, L. Overzet, Yi-Kang Pu, Y. Setsuhara, J. J. Shi, K. Terashima, T. Watanabe

Thin Solid Films　Vol. 519　No. 20　p. 6637-6638　2011/08/01　Research paper (scientific journal)

Effects of photoirradiation in UV and VUV regions during plasma exposure to polymers

Ken Cho, Yuichi Setsuhara, Kosuke Takenaka, Masaharu Shiratani, Makoto Sekine, Masaru Hori

THIN SOLID FILMS　Vol. 519　No. 20　p. 6810-6814　2011/08　Research paper (scientific journal)

Plasma processing of soft materials for development of flexible devices

Yuichi Setsuhara, Ken Cho, Kosuke Takenaka, Masaharu Shiratani, Makoto Sekine, Masaru Hori

THIN SOLID FILMS　Vol. 519　No. 20　p. 6721-6726　2011/08　Research paper (scientific journal)

Combinatorial analyses of plasma-polymer interactions

Yuichi Setsuhara, Ken Cho, Kosuke Takenaka, Masaharu Shiratani, Makoto Sekine, Masaru Hori

SURFACE & COATINGS TECHNOLOGY　Vol. 205　p. S484-S489　2011/07　Research paper (scientific journal)

Nano-Surface Modification of Silicon with Ultra-Short Pulse Laser Process

Yuichi Setsuhara, Masaki Hashida

TECHNOLOGY EVOLUTION FOR SILICON NANO-ELECTRONICS　Vol. 470　p. 117-+　2011　Research paper (international conference proceedings)

Combinatorial analysis of plasma-polymer interactions for formation of inorganic-soft materials hybrid structure

Kosuke Takenaka, Ken Cho, Yuichi Setsuhara, Masaharu Shiratani, Makoto Sekine, Masaru Hori

Trans. JWRI　Vol. 39　No. 2　p. 250-252　2010/12　Research paper (bulletin of university, research institution)

Effects of photon irradiation in UV and VUV regions during plasma processing of organic materials

Ken Cho, Kosuke Takenaka, Yuichi Setsuhara, Masaharu Shiratani, Makoto Sekine, Masaru Hori

Trans. JWRI　Vol. 39　No. 2　p. 298-300　2010/12　Research paper (bulletin of university, research institution)

Photon-induced phonon excitation process as low-temperature nonequillibrium nano-surface modification of silicon

Yuichi Setsuhara, Masaki Hashida

SURFACE & COATINGS TECHNOLOGY　Vol. 205　No. 7　p. 1826-1829　2010/12　Research paper (scientific journal)

Nano-crystalline silicon thin films grown by the inductively coupled plasma assisted CFUBM at low temperature

Kyung S. Shin, Yoon S. Choi, In S. Choi, Y. Setsuhara, Jeon G. Han

SURFACE & COATINGS TECHNOLOGY　Vol. 205　p. S227-S230　2010/12　Research paper (scientific journal)

Low-damage plasma processing of polymers for development of organic-inorganic flexible devices

Yuichi Setsuhara, Ken Cho, Kosuke Takenaka, Masaharu Shiratani, Makoto Sekine, Masaru Hori

SURFACE & COATINGS TECHNOLOGY　Vol. 205　p. S355-S359　2010/12　Research paper (scientific journal)

Advanced research and development for plasma processing of polymers with combinatorial plasma-process analyzer

Yuichi Setsuhara, Ken Cho, Kosuke Takenaka, Masaharu Shiratani, Makoto Sekine, Masaru Hori

THIN SOLID FILMS　Vol. 518　No. 22　p. 6320-6324　2010/09　Research paper (scientific journal)

X-Ray photoelectron spectroscopy analysis of plasma-polymer interactions for development of low-damage plasma processing of soft materials

Yuichi Setsuhara, Ken Cho, Masaharu Shiratani, Makoto Sekine, Masaru Hori

THIN SOLID FILMS　Vol. 518　No. 22　p. 6492-6495　2010/09　Research paper (scientific journal)

Etching characteristics of organic low-k films interpreted by internal parameters employing a combinatorial plasma process in an inductively coupled H-2/N-2 plasma

Chang Sung Moon, Keigo Takeda, Makoto Sekine, Yuichi Setsuhara, Masaharu Shiratani, Masaru Hori

JOURNAL OF APPLIED PHYSICS　Vol. 107　No. 11　p. 113310-1-113310-8　2010/06　Research paper (scientific journal)

Surface loss probabilities of H and N radicals on different materials in afterglow plasmas employing H-2 and N-2 mixture gases

Chang Sung Moon, Keigo Takeda, Seigo Takashima, Makoto Sekine, Yuichi Setsuhara, Masaharu Shiratani, Masaru Hori

JOURNAL OF APPLIED PHYSICS　Vol. 107　No. 10　p. 103310-1-103310-7　2010/05　Research paper (scientific journal)

Low-damage surface modification of polymethylmethacrylate with argon-oxygen mixture plasmas driven by multiple low-inductance antenna units

Yuichi Setsuhara, Ken Cho, Kosuke Takenaka, Masaharu Shiratani, Makoto Sekine, Masaru Hori, Eiji Ikenaga, Shigeaki Zaima

Thin Solid Films　Vol. 518　No. 13　p. 3561-3565　2010/04　Research paper (scientific journal)

Combinatorial Analysis of Plasma-Surface Interactions of Polyethyleneterephthalate with X-ray Photoelectron Spectroscopy

Kosuke Takenaka, Yuichi Setsuhara, Ken Cho, Masaharu Shiratani, Makoto Sekine, Masaru Hori

Jpn. J. Appl. Phys.　Vol. 49　p. 08JA02-1-08JA02-4　2010/03　Research paper (scientific journal)

High performance of compact radical monitoring probe in H-2/N-2 mixture plasma

Chang Sung Moon, Keigo Takeda, Seigo Takashima, Makoto Sekine, Yuichi Setsuhara, Masaharu Shiratani, Masaru Hori

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B　Vol. 28　No. 2　p. L17-L20　2010/03　Research paper (scientific journal)

X-ray photoelectron spectroscopy for analysis of plasma-polymer interactions in Ar plasmas sustained via RF inductive coupling with low-inductance antenna units

Yuichi Setsuhara, Ken Cho, Masaharu Shiratani, Makoto Sekine, Masaru Hori

Thin Solid Films　Vol. 518　p. 3555-3560　2010/03　Research paper (scientific journal)

High performance of compact radical monitoring probe in H2 / N2 mixture plasma

Chang Sung Moon, Keigo Takeda, Seigo Takashima, Makoto Sekine, Yuichi Setsuhara, Masaharu Shiratani, Masaru Hori

Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics　Vol. 28　No. 2　p. L17-L20　2010　Research paper (scientific journal)

PLASMA-ENHANCED NANOPARTICLES-BEAM DEPOSITION FOR HIGH-RATE FORMATION OF NANOCOMPOSITE FILMS

Kosuke Takenaka, Yuki Nakajima, Yuichi Setsuhara, Hiroya Abe, Kiyoshi Nogi

CHARACTERIZATION AND CONTROL OF INTERFACES FOR HIGH QUALITY ADVANCED MATERIALS III　Vol. 219　p. 293-+　2010　Research paper (international conference proceedings)

DEVELOPMENT OF A COMBINATORIAL PLASMA PROCESS ANALYZER FOR ADVANCED R&D OF NEXT GENERATION NANODEVICE FABRICATION

Kosuke Takenaka, Ken Cho, Yuichi Setsuhara, Masaharu Shiratani, Makoto Sekine, Masaru Hori

CHARACTERIZATION AND CONTROL OF INTERFACES FOR HIGH QUALITY ADVANCED MATERIALS III　Vol. 219　p. 279-+　2010　Research paper (international conference proceedings)

HARD X-RAY PHOTOELECTRON SPECTROSCOPY ANALYSIS FOR ORGANIC-INORGANIC HYBRID MATERIALS FORMATION

Ken Cho, Kosuke Takenaka, Yuichi Setsuhara, Masaharu Shiratani, Makoto Sekine, Masaru Hori, Eiji Ikenaga, Hiroki Kondo, Osamu Nakatsuka, Shigeaki Zaima

CHARACTERIZATION AND CONTROL OF INTERFACES FOR HIGH QUALITY ADVANCED MATERIALS III　Vol. 219　p. 183-+　2010　Research paper (international conference proceedings)

Polycarbonate Surface Treatment by Using an Inductively-Coupled Plasma

Tae J. Byun, Kyung S. Shin, Youn J. Kim, Jeon G. Han, Y. Setsuhara

JOURNAL OF THE KOREAN PHYSICAL SOCIETY　Vol. 55　No. 5　p. 1785-1789　2009/11　Research paper (scientific journal)

Combinatorial Plasma Etching Process

Chang Sung Moon, Keigo Takeda, Makoto Sekine, Yuichi Setsuhara, Masaharu Shiratani, Masaru Hori

APPLIED PHYSICS EXPRESS　Vol. 2　No. 9　2009/09　Research paper (scientific journal)

Surface Modification of Polyimide for Improving Adhesion Strength by Inductively Coupled Plasma

Tae Joon Byun, Sung Il Kim, Youn Joon Kim, Yoon Suk Choi, In Sik Choi, Yuichi Setsuhara, Jeon Geon Han

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 48　No. 8　p. 08HL01-1-08HL01-4　2009/08　Research paper (scientific journal)

Development of density-inclination plasmas for analysis of plasma nano-processes via combinatorial method

Y. Setsuhara, K. Nagao, M. Shiratani, M. Sekine, M. Hori

Thin Solid Films　Vol. 518　p. 1020-1023　2009/08　Research paper (scientific journal)

Plasma surface treatment of polymers with inductivity-coupled RF plasmas driven by low-inductance antenna units

Y. Setsuhara, K. Cho, K. Takenaka, A. Ebe, M. Shiratani, M. Sekine, M. Hori, E.. Ikeitaga, H. Kondo, O. Nakatsuka, S. Zaima

Thin Solid Films　Vol. 518　p. 1006-1011　2009/06　Research paper (scientific journal)

Radial-Profile Control of Cylindrical Plasma Source With Multiple Low-Inductance Antenna Units

Kosuke Takenaka, Yuichi Setsuhara, Kazuaki Nishisaka, Akinori Ebe

PLASMA PROCESSES AND POLYMERS　Vol. 6　No. S1　p. S278-S281　2009　Research paper (scientific journal)

Large-area and low-damage processes for hybrid flexible device fabrications with reactive high-density plasmas driven by multiple low-inductance antenna modules

Yuichi Setsuhara, Kosuke Takenaka, Ken Cho, Jeon G. Han

Journal of Physics: Conference Series　Vol. 165　p. 12042-1-12042-6　2009　Research paper (international conference proceedings)

Magnetron sputtered Si-B-C-N films with high oxidation resistance and thermal stability in air at temperatures above 1500 degrees C

Jaroslav Vlcek, Stanislav Hreben, Jiri Kalas, Jiri Capek, Petr Zeman, Radomir Cerstvy, Vratislav Perina, Yuichi Setsuhara

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A　Vol. 26　No. 5　p. 1101-1108　2008/09　Research paper (scientific journal)

Interface structures of microcrystalline silicon films deposited with inductively coupled plasmas using internal low-inductance antenna units

Hirokazu Kaki, Eiji Takahashi, Tsukasa Hayashi, Kiyoshi Ogata, Akinori Ebe, Kosuke Takenaka, Yuichi Setsuhara

Surface and Coatings Technology　Vol. 202　p. 5672-5675　2008/09　Research paper (scientific journal)

Corrosion Resistance of Plasma-Oxidized Stainless Steel

Jiro Okado, Ken Okada, Asahiko Ishiyama, Yuichi Setsuhara, Kosuke Takenaka

Surface and Coatings Technology　Vol. 202　p. 5595-5598　2008/09　Research paper (scientific journal)

Large-Area Low-Damage Plasma Sources Driven by Multiple Low-Inductance-Antenna Modules for Next-Generation Flat-Panel Display Processes

Yuichi Setsuhara, Kosuke Takenaka, Akinori Ebe

Surface and Coatings Technology　Vol. 202　p. 5225-5229　2008/09　Research paper (scientific journal)

Uniformity of 500-mm Cylindrical Plasma Source Sustained with Multiple Low-Inductance Antenna Units

Yuichi Setsuhara, Daisuke Tsukiyama, Kosuke Takenaka

Surface and Coatings Technology　Vol. 202　p. 5238-5241　2008/09　Research paper (scientific journal)

Modification of Yttrium-Iron-Oxide Nanoparticle Films Using Inductively-Coupled Plasma Annealing

Kosuke Takenaka, Hiroaki Nakayama, Yuichi Setsuhara, Hiroya Abe, Kiyoshi Nogi

Surface and Coatings Technology　Vol. 202　p. 5336-5338　2008/09　Research paper (scientific journal)

Discharge Profiles of Internal-Antenna-Driven Inductively-Coupled Plasmas

Yuichi Setsuhara, Takashi Sera, Kosuke Takenaka

Surface and Coatings Technology　Vol. 202　p. 5234-5237　2008/09　Research paper (scientific journal)

Properties of Argon/Oxygen Mixture Plasmas Driven by Multiple Internal-Antenna Units

Yuichi Setsuhara, Kosuke Takenaka, Akinori Ebe, Jeon G. Han

Surface and Coatings Technology　Vol. 202　p. 5230-5233　2008/09　Research paper (scientific journal)

Properties of argon/oxygen mixture plasmas driven by multiple internal-antenna units

Yuichi Setsuhara, Kosuke Takenaka, Akinori Ebe, Jeon G. Han

SURFACE & COATINGS TECHNOLOGY　Vol. 202　No. 22-23　p. 5230-5233　2008/08　Research paper (scientific journal)

Large-area low-damage plasma sources driven by multiple low-inductance-antenna modules for next-generation flat-panel display processes

Yuichi Setsuhara, Kosuke Takenaka, Akinori Ebe

SURFACE & COATINGS TECHNOLOGY　Vol. 202　No. 22-23　p. 5225-5229　2008/08　Research paper (scientific journal)

Discharge profiles of internal-antenna-driven inductively-coupled plasmas

Yuichi Setsuhara, Takashi Sera, Kosuke Takenaka

SURFACE & COATINGS TECHNOLOGY　Vol. 202　No. 22-23　p. 5234-5237　2008/08　Research paper (scientific journal)

Uniformity of 500-mm cylindrical plasma source sustained with multiple low-inductance antenna units

Yuichi Setsuhara, Daisuke Tsukiyama, Kosuke Takenaka

SURFACE & COATINGS TECHNOLOGY　Vol. 202　No. 22-23　p. 5238-5241　2008/08　Research paper (scientific journal)

Modification of yttrium-iron-oxide nanoparticle films using inductively-coupled plasma annealing

Kosuke Takenaka, Hiroaki Nakayama, Yuichi Setsuhara, Hiroya Abe, Kiyoshi Nogi

SURFACE & COATINGS TECHNOLOGY　Vol. 202　No. 22-23　p. 5336-5338　2008/08　Research paper (scientific journal)

Corrosion resistance of plasma-oxidized stainless steel

Jiro Okado, Ken Okada, Asahiko Ishiyama, Yuichi Setsuhara, Kosuke Takenaka

SURFACE & COATINGS TECHNOLOGY　Vol. 202　No. 22-23　p. 5595-5598　2008/08　Research paper (scientific journal)

Simulation-Aided Designing of Meter-Scale Large-Area Plasma Source with Multiple Low-Inductance Antenna Modules

Yuichi Setsuhara, Daisuke Tsukiyama, Kosuke Takenaka, Koichi Ono

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 47　No. 8　p. 6903-6906　2008/08　Research paper (scientific journal)

Characterization of Ion Energy Distribution in Inductively Coupled Argon Plasmas Sustained with Multiple Internal-Antenna Units

Kosuke Takenaka, Yuichi Setsuhara, Kazuaki Nishisakai, Akinori Ebe

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 47　No. 8　p. 6900-6902　2008/08　Research paper (scientific journal)

Mechanical milling with capacitively coupled plasma for surface modification of particulate materials

Jun-ichi Noma, Hiroya Abe, Kosuke Takenaka, Yuichi Setsuhara, Makio Naito

SURFACE & COATINGS TECHNOLOGY　Vol. 202　No. 22-23　p. 5347-5349　2008/08　Research paper (scientific journal)

マルチアンテナ型RFプラズマによるメートル級大面積での低ダメージプロセスと制御

節原 裕一, 竹中 弘祐, 江部 明憲

日本機械学会関東支部第14期総会講演会講演論文集　p. 391-392　2008/03　Research paper (other academic)

Meters-Scale Ultra-Large-Area Plasma-Source Designs Employing Multiple Low-Inductance -Antenna Modules

Yuichi Setsuhara, Daisuke Tsukiyama, Kosuke Takenaka, Akinori Ebe

Full-Papers CD of the 18th International Symposium on Plasma Chemistry　p. 30P-77-1-30P-77-4　2007/08　Research paper (international conference proceedings)

Characterization of Argon/Oxygen Mixture Plasmas Driven by Multiple Internal-Antenna Units

Kosuke Takenaka, Yuichi Setsuhara, Kazuaki Nishisaka, Akinori Ebe, Yong-Mo Kim, Jeon G. Han

Full-Papers CD of the 18th International Symposium on Plasma Chemistry　p. 30P-76-1-30P-76-4　2007/08　Research paper (international conference proceedings)

Meters-Scale Large-Area Plasma Sources with Multiple Low-Inductance Antenna Units for Next-Generation Flat-Panel Display Processing

Daisuke Tsukiyama, Kosuke Takenaka, Yuichi Setsuhara, Kazuaki Nishisaka, Akinori Ebe

Transactions of the Materials Research Society of Japan　Vol. 32　p. 497-500　2007/04　Research paper (scientific journal)

Modification of nanoparticle films with inductively-coupled high-pressure RF plasmas

Kosuke Takenaka, Hiroaki Nakayama, Yuichi Setsuhara, Hiroya Abe, Kiyoshi Nogi

Transactions of the Materials Research Society of Japan　Vol. 32　p. 505-508　2007/04　Research paper (scientific journal)

Effect of Pressure on Inductively-Coupled Plasmas Sustained with Multiple Low-Inductance Internal-Antenna Units

Kosuke Takenaka, Yuichi Setsuhara, Kazuaki Nishisaka, Akinori Ebe

Transactions of the Materials Research Society of Japan　Vol. 32　p. 493-496　2007/04　Research paper (scientific journal)

Plasma Profiles of Inductively Coupled Plasmas Sustained with Low-Inductance Internal Antenna

Kosuke Takenaka, Takashi Sera, Akinori Ebe, Yuichi Setsuhara

PLASMA PROCESSES AND POLYMERS　Vol. 4　p. S1013-S1016　2007/04　Research paper (scientific journal)

Properties of Inductively-Coupled Plasmas Driven by Multiple Low-Inductance Internal-Antenna Units

Kosuke Takenaka, Yuichi Setsuhara, Kazuaki Nishisaka, Akinori Ebe

PLASMA PROCESSES AND POLYMERS　Vol. 4　p. S1009-S1012　2007/04　Research paper (scientific journal)

Production and Control of Large-Area Plasmas for Meters-Scale Flat-Panel-Display Processing with Multiple Low-Inductance Antenna Modules

Yuichi Setsuhara, Kosuke Takenaka, Akinori Ebe, Kazuaki Nishisaka

PLASMA PROCESSES AND POLYMERS　Vol. 4　p. S628-S632　2007/04　Research paper (scientific journal)

Large-area and high-speed deposition of microcrystalline silicon film by inductive coupled plasma using internal low-inductance antenna

Eiji Takahashi, Yasuaki Nishigami, Atsushi Tomyo, Masaki Fujiwara, Hirokazu Kaki, Kiyoshi Kubota, Tsukasa Hayashi, Kiyoshi Ogata, Akinori Ebe, Yuichi Setsuhara

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS　Vol. 46　No. 3B　p. 1280-1285　2007/03　Research paper (scientific journal)

Development of large area plasma reactor using multiple low-inductance antenna modules for flat panel display processing

Y. Setsuhara, K. Takenaka, A. Ebe, K. Nishisaka

Solid State Phenomena　Vol. 127　p. 239-244　2007　Research paper (international conference proceedings)

Development of inductively-coupled RF plasma source for carbon alignment film deposition

T. Matsumoto, Y. Kinoshita, Y. Matsuda, Y. Andoh, Y. Setsuhara, Y. Iimura

IDW '07: PROCEEDINGS OF THE 14TH INTERNATIONAL DISPLAY WORKSHOPS, VOLS 1-3　p. 541-+　2007　Research paper (international conference proceedings)

Ultrafast phase transition of Si by femtosecond laser pulse irradiation - art. no. 63463S

Masayuki Fujita, Yusaku Izawa, Masaki Hashida, Yuichi Setsuhara, Yasukazu Izawa, Chiyoe Yamanaka

XVI International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers, Pts 1 and 2　Vol. 6346　p. S3463-S3463　2007　Research paper (international conference proceedings)

Designing of Meters-Scale Ultra-Large Area RF Plasma Sources Sustained with Multiple Low-Inductance-Antenna Modules

Yuichi Setsuhara, Daisuke Tsukiyama, Kosuke Takenaka, Akinori Ebe

Proceedings of the 24th Symposium on Plasma Processing　p. 61-62　2007/01　Research paper (other academic)

Uniformity of 500-mm Cylindrical Plasmas Sustained with Low-Inductance Antennas

Daisuke Tsukiyama, Kosuke Takenaka, Yuichi Setsuhara, Akinori Ebe

Proceedings of the 24th Symposium on Plasma Processing　p. 63-64　2007/01　Research paper (other academic)

Ion Energy Distributions in Inductively-Coupled Plasmas Sustained with Multiple Internal-Antenna Units

Kosuke Takenaka, Yuichi Setsuhara, Kazuaki Nishisaka, Akinori Ebe

Proceedings of the 24th Symposium on Plasma Processing　p. 65-66　2007/01　Research paper (other academic)

Properties of Ar+O2 Mixture Discharge plasmas Sustained with Multiple Internal-Antenna Units

Kosuke Takenaka, Yuichi Setsuhara, Akinori Ebe, Yong-Mo Kim, Jeon G. Han

Proceedings of the 24th Symposium on Plasma Processing　p. 67-68　2007/01　Research paper (other academic)

Potential Formation in Inductively-Coupled Plasmas Driven by Internal Antenna

Takashi Sera, Kosuke Takenaka, Akinori Ebe, Yuichi Setsuhara

Proceedings of the 24th Symposium on Plasma Processing　p. 69-70　2007/01　Research paper (other academic)

Electric Discharge in Comminution Process and Surface Modification of Nanoparticles

J.Noma, H.Abe, K.Takenaka, Y.Setsuhara, M.Naito

Proceedings of the 24th Symposium on Plasma Processing　p. 5-6　2007/01　Research paper (other academic)

Phase Structure Control of Yttrium Iron Garnet Nanoparticle Films Using Inductively-Coupled High-Pressure RF Plasmas

Yuichi Setsuhara, Hiroaki Nakayama, Kosuke Takenaka, Hiroya Abe, Kiyoshi Nogi

Proceedings of the 24th Symposium on Plasma Processing　p. 111-112　2007/01　Research paper (other academic)

Ultra-large area RF plasma sources employing multiple low-inductance internal-antenna modules for flat panel display processing

Yuichi Setsuhara, Kosuke Takenaka, Daisuke Tsukiyama, Kazuaki Nishisaka, Akinori Ebe

PRICM 6: SIXTH PACIFIC RIM INTERNATIONAL CONFERENCE ON ADVANCED MATERIALS AND PROCESSING, PTS 1-3　Vol. 561-565　p. 1237-1240　2007　Research paper (international conference proceedings)

PROPERTIES OF INDUCTIVETY-COUPLED RF PLASMAS SUSTAINED WITH INTERNAL ANTENNA FOR DEPOSITION OF CARBON-RELATED FILMS

Kosuke Takenaka, Yuichi Setsuhara, Kazuaki Nishisaka, Akinori Ebe

CHARACTERIZATION AND CONTROL OF INTERFACES FOR HIGH QUALITY ADVANCED MATERIALS II　Vol. 198　p. 413-+　2007　Research paper (international conference proceedings)

Development of large area plasma reactor using multiple low-inductance antenna modules for flat panel display processing

Y. Setsuhara, K. Takenaka, A. Ebe, K. Nishisaka

DESIGNING OF INTERFACIAL STRUCTURES IN ADVANCED MATERIALS AND THEIR JOINTS　Vol. 127　p. 239-+　2007　Research paper (international conference proceedings)

Ultrathin amorphous Si layer formation by femtosecond laser pulse irradiation

Yusaku Izawa, Yasukazu Izawa, Yuichi Setsuhara, Masaki Hashida, Ryuichiro Sasaki, Hiroyuki Nagai, Makoto Yoshida

APPLIED PHYSICS LETTERS　Vol. 90　No. 4　p. 044107-1-044107-2　2007/01　Research paper (scientific journal)

Effects of antenna size and configurations in large-area RF plasma production with internal low-inductance antenna units

Hiroshige Deguchi, Hitoshi Yoneda, Kenji Kato, Kiyoshi Kubota, Tsukasa Hayashi, Kiyoshi Ogata, Akinori Ebe, Kosuke Takenaka, Yuichi Setsuhara

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS　Vol. 45　No. 10B　p. 8042-8045　2006/10　Research paper (scientific journal)

Characterization of inductively-coupled RF plasma sources with multiple low-inductance antenna units

Kosuke Takenaka, Yuichi Setsuhara, Kazuaki Nishisaka, Akinori Ebe, Shinya Sugiura, Kazuo Takahashi, Koichi Ono

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS　Vol. 45　No. 10B　p. 8046-8049　2006/10　Research paper (scientific journal)

Surface Modification of Nanopowder by Milling under Electric Discharge

Hiroya Abe, Akira Kondo, Kosuke Takenaka, Yuichi Setsuhara, Makio Naito

Advances in Science and Technology　Vol. 45　p. 363-367　2006/09　Research paper (scientific journal)

Ablation and amorphization of crystalline Si by femtosecond and picosecond laser irradiation

Yusaku Izawa, Yuichi Setuhara, Masaki Hashida, Masayuki Fujita, Yasukazu Izawa

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS　Vol. 45　No. 7　p. 5791-5794　2006/07　Research paper (scientific journal)

Development of Internal-Antenna-Driven RF Plasma Sources for Ultra-Large-Area Deposition of Carbon-Related Films

Y. Setsuhara, K. Takenaka

11th International Conferences on Modern Materials and Technologies　2006/06　Research paper (international conference proceedings)

Development of Large Area Plasma Reactor Using Multiple Low-Inductance Antenna Modules for Flat Panel Display Processing

Y.Setsuhara, K.Takenaka, A.Ebe, K.Nishisaka

Proceedings of InternationalWorkshop on Designing of Interfacial Structrures in Advanced Materials and their Joints　p. 17-17　2006/05　Research paper (international conference proceedings)

Novel ICP plasma source for large area CVD processing

Y. Setsuhara, K. Takenaka, A. Ebe, K. Nishisaka

The 3rd International Workshop on Advanced Plasma Processing and Diagnostics　p. 3-3　2006/04　Research paper (international conference proceedings)

Microwave-sustained miniature plasmas for an ultra small thruster

Yoshinori Takao, Kouichi Ono, Kazuo Takahashi, Yuichi Setsuhara

Thin Solid Films　Vol. 506-507　p. 592-596　2006/04　Research paper (scientific journal)

Properties of Inductively-Coupled RF Plasma Sources with Multiple Low-Inductance Antenna Modules

Kosuke Takenaka, Yuichi Setsuhara, Kazuaki Nishisaka, Akinori Ebe, Shinya Sugiura, Kazuo Takahashi, Koichi Ono

Proceedings of the 6th International Conference on Reactive Plasmas and 23rd Symposium on Plasma Processing　p. 183-184　2006/01　Research paper (international conference proceedings)

Development of Meters-Scale Large-Area RF Plasma Sources with Control Capabilities of Power Deposition Profiles

Yuichi Setsuhara, Akinori Ebe, Kazuaki Nishisaka, Kosuke Takenaka

Proceedings of the 6th International Conference on Reactive Plasmas and 23rd Symposium on Plasma Processing　p. 179-180　2006/01　Research paper (international conference proceedings)

Direct deposition of microcrystalline Si films on large size glass substrate by internal ICP source

E. Takahashi, H. Kaki, M. Fujiwara, Y. Nishigami, K. Kubota, T. Hayashi, K. Ogata, A. Ebe, Y. Setsuhara

Transactions of the Materials Research Society of Japan, Vol 31, No 2　Vol. 31　No. 2　p. 507-510　2006　Research paper (international conference proceedings)

Properties of inductively coupled hydrogen plasmas sustained with multiple low-inductance internal-antenna units

Kosuke Takenaka, Yuichi Setsuhara, Kazuaki Nishisaka, Akinori Ebe

Transactions of the Materials Research Society of Japan, Vol 31, No 2　Vol. 31　No. 2　p. 511-514　2006　Research paper (international conference proceedings)

New quaternary SI-B-C-N films prepared by reactive magnetron sputtering

J. Vlcek, S. Potocky, J. Houska, P. Zeman, V. Perina, Y. Setsuhara

Transactions of the Materials Research Society of Japan, Vol 31, No 2　Vol. 31　No. 2　p. 447-451　2006　Research paper (international conference proceedings)

Development of Meters-Scale/Large-Area Inductively Coupled Plasma Sources with Integrated Control of Multiple Low-Inductance Internal-Antenna Modules

Y.Setsuhara, K.Takenaka, K.Nishisaka, A.Ebe

The 16th Symposium of The Material Research Society of Japan　2005/12　Research paper (other academic)

Potential Distributions and Ionic Behaviors during Electrophoretic Deposition of Ceramics Films in Nanoparticles-Dispersed Liquid

T.Sano, K.Takenaka, Y.Setsuhara, K.Sato, H.Abe, K.Nogi

The 16th Symposium of The Material Research Society of Japan　2005/12　Research paper (other academic)

Reactive magnetron sputtering of hard Si-B-C-N films with a high-temperature oxidation resistance

Jaroslav Vlcek, Stepan Potocky, Jiri Cizek, Jiri Houska, Martin Kormunda, Petr Zeman, Vratislav Perina, Josef Zemek, Yuichi Setsuhara, Seiji Konuma

J. Vac. Sci. Technol.　Vol. A23　No. 6　p. 1513-1522　2005/10　Research paper (scientific journal)

Etching characteristics of high-k dielectric HfO2 thin films in inductively coupled fluorocarbon plasmas

Kazuo Takahashi, Kouichi Ono, Yuichi Setsuhara

J. Vac. Sci. Technol.　Vol. A23　No. 6　p. 1691-1697　2005/10　Research paper (scientific journal)

Principles of Plasma Sources and their Applications

Yuichi Setsuhara

Textbook for the 12th Plasma Electronics Summer School (Division of Plasma Electronics, The Japan Society of Applied Physics)　p. 1-20　2005/08

Plasma Technologies for Meters-scale Large-Area Processes

Y. Setsuhara, A. Ebe

J. Surface Finishing Society of Japan　Vol. 56　No. 5　p. 268-275　2005/05

Characterization of Amorphous Hydrogenated Carbon Formed by Low-pressure Inductively Coupled Plasma Enhanced Chemical Vapor Deposition Using Multiple Low-Inductance Antenna Units

Osamu Tsuda, Masatou Ishihara, Yoshinoi Koga, Shuzo Fujiwara, Yuichi Setsuhara, Naoyuki Sato

J. Phys. Chem. B　Vol. 109　No. 11　p. 4917-4922　2005/02　Research paper (scientific journal)

Meter-scale Large-Area Plasma Sources for Next-Generation Processes

Y. Setsuhara

J. Plasma and Fusion Research　Vol. 81　No. 2　p. 85-93　2005/02

Surface modification of crystalline Si irradiated by femtosecond laser pulses

Yu Izawa, M. Fujita, Y. Setsuhara, M. Hashida, Y. Izawa

Conference on Lasers and Electro-Optics Europe - Technical Digest　2005　Research paper (international conference proceedings)

Etching of High Dielectric Constant HfO2 Thin Films in Inductively Coupled Fluorocarbon Plasmas

K. Talahashi, K. Ono, Y. Setsuhara

J. Surface Finishing Society of Japan　Vol. 55　No. 12　p. 793-799　2004/12　Research paper (scientific journal)

Characterization of porosity and dielectric constant of fluorocarbon porous films synthesized by using plasma-enhanced chemical vapor deposition and solvent process

K. Takahashi, T. Mitamura, K. Ono, Y. Setsuhara, A. Itoh, K. Tachibana

Appl. Phys. Lett. 82, pp. 2476-2478 (2003).　Vol. 82　No. 15　p. 2476-2478　2003/12　Research paper (scientific journal)

Tribological Property of CeO2 Films Prepared by Ion-Beam-Assisted Deposition

Ippei Shimizu, Yuichi Setsuhara, Shoji Miyake, Jindrich Musil, Hidenori Saitou, Masao Kumagai

Jpn. J. Appl. Phys. 42, pp. 634-639 (2003).　Vol. 42　No. 2　p. 634-639　2003/04　Research paper (scientific journal)

Mechanical properties of zirconium films prepared by ion-beam assisted deposition

A. Mitsuo, T. Mori, Y. Setsuhara, S. Miyake, T. Aizawa

Nucl. Instrum. Meth. B 206, pp. 366-370 (2003).　2003/04　Research paper (scientific journal)

Performance of inductively coupled fluorocarbon plasmas in etching of HfO2 thin films as a high-k gate insulating material

Takahashi, K, Ono, K, Setsuhara, Y

Proc. of 2003 Int. Symp. on Dry Process, Tokyo, Japan　p. 247-252　2003　Research paper (international conference proceedings)

Gas phase nucleation of diamond in non-thermal fluorocarbon dusty plasmas

Takahashi, K, Ono, K, Setsuhara, Y, Okano, T, Kouzaki, T

Abstracts and Full Paper CD of 16th Int. Symp. on Plasma Chemistry, Taormina, Italy　p. Po.10.33-3 pages　2003　Research paper (international conference proceedings)

Particle-in-cell simulation of ion thruster with multiple plasma channels extracted from high-density helicon plasma source

Yamamoto, H, Setsuhara, Y, Takahashi, K, Ono, K

Abstracts and Full Paper CD of 16th Int. Symp. on Plasma Chemistry, Taormina, Italy　p. Po.5.45-6 pages　2003　Research paper (international conference proceedings)

Plasma chemical behavior of reaction products during inductively coupled CF4 plasma etching of Si and SiO2

Fujikake, I, Ono, K, Takahashi, K, Setsuhara, Y

Abstracts and Full Paper CD of 16th Int. Symp. on Plasma Chemistry, Taormina, Italy　p. Po6.33-6 pages　2003　Research paper (international conference proceedings)

Development of internal-antenna-driven large-area RF plasma sources using multiple low-inductance antenna units

Y. Setsuhara, T. Shoji, A. Ebe, S. Baba, N. Yamamoto, K. Takahashi, K. Ono, S. Miyake

Surface and Coatings Technology　Vol. 174-175　p. 33-39　2003　Research paper (scientific journal)

フェムト秒レーザーによる物質プロセッシング

橋田昌樹, 藤田雅之, 節原裕一

光学 31, PP.621-628(2002).　Vol. 31　No. 8　p. 621-628　2002/12

Fluorocarbon Porous Films with Low-K Formed by Using Plasma-Enhanced CVD and Solvent Process

TAKAHASHI Kazuo, MITAMURA Takashi, ONO Kouichi, SETSUHARA Yuichi

Jitsumu Hyomen Gijutsu　Vol. 53　No. 12　p. 857-859　2002/12

Morphology and Microstructure of Hard and Superhard Zr-Cu-N Nanocomposite Coatings

Jindrich Musil, Jaroslav Vlcek, Petr Zeman, Yuichi Setsuhara, Shoji Miyake, Seiji Konuma, Masao Kumagai, Christian Mitte

Jpn. J. Appl. Phys. 41, pp. 6529-6533 (2002).　Vol. 41　No. 11　p. 6529-6533　2002/04　Research paper (scientific journal)

Synthesis of microcrystalline silicon films by plasma enhanced chemical vapor deposition using multiple inductively-coupled-plasma modules with low-inductance antenna

A. Ebe, H. Inami, S. Baba, N. Yamamoto, Y. Setsuhara, T. Shoji, S. Miyake

2002 International Microprocesses and Nanotechnology Conference, MNC 2002　2002　Research paper (international conference proceedings)

Development of large-scale inductively coupled plasma source with multiple internal antennas units for synthesis of microcrystalline silicon films

S. Baba, N. Yamamoto, H. Inami, A. Ebe, Y. Setsuhara, T. Shoji, S. Miyake

2002 International Microprocesses and Nanotechnology Conference, MNC 2002　2002　Research paper (international conference proceedings)

Production mechanism and chemical structure of dust particles in fluorocarbon plasmas

K Takahashi, K Ono, Y Setsuhara

DUSTY PLASMAS IN THE NEW MILLENNIUM　Vol. 649　p. 446-449　2002　Research paper (international conference proceedings)

今三次元−プラズマイオンによる表面改質とプロセス−３ プラズマ源の開発

節原裕一

電気学会誌 121, pp.308-311(2001).　2001/12

Fundamental study of ion irradiation effects on the columnar growth of chromium films prepared by ion beam and vapor deposition

N. Kuratani, A. Ebe, K. Ogata, I. Shimizu, Y. Setsuhara, S. Miyake

J. Vac. Sci. Technol. A. 19 (1), pp. 153-157 (2001).　2001/04　Research paper (scientific journal)

Development of internal-antenna-driven large-volume RF plasma sources for plasma-based ion implantation

Y. Setsuhara, S. Miyake, Y. Sakawa, T. Shoji

Surf. Coat. Technol. 136, pp. 60-64 (2001).　2001/04　Research paper (scientific journal)

Synthesis of carbon nitride films by high-density helicon wave-excited plasma sputtering

Y. Setsuhara, Y. Sakawa, T. Shoji, M. Kumagai, S. Miyake

Surf. Coat. Technol. 142-144, pp. 874-880 (2001).　2001/04　Research paper (scientific journal)

Improved anti-wear performance of nanostructured titanium boron nitride coatings

J. L. He, S. Miyake, Y. Setsuhara, I. Shimizu, M. Suzuki, K. Numata, H. Saito

Wear 249, pp. 498-502 (2001).　2001/04　Research paper (scientific journal)

Structure refinement and hardness enhancement of titanium nitride films by addition of copper

J. L. He, Y. Setsuhara, I. Shimizu, S. Miyake

Surface and Coatings Technology　Vol. 137　No. 1　p. 38-42　2001　Research paper (scientific journal)

イオンビーム支援蒸着法を用いたCeO2薄膜合成におけるモルフォロジーに及ぼすイオン照射効果

志水一平, 節原裕一, 斉藤英純, 熊谷正夫, 三宅正司

高温学会誌 26, No.5, pp. 211-218 (2000).　2000/05　Research paper (scientific journal)

低インダクタンス内部アンテナを用いた大口径誘導結合ＲＦプラズマ生成

節原裕一, 三宅正司, 坂和洋一, 庄司多津男

電気学会プラズマ研究会資料　2000/04　Research paper (scientific journal)

Effects of Ion beam Irradiation on Morphology and Densification of CeO2 Films by Ion Beam Assisted Deposition

I. Shimizu, Y. Setsuhara, S. Miyake, H. Saito, M. Kumagai

Jpn. J. Appl. Phys. 39, pp. 4138-4142 (2000).　Vol. 39　No. 7　p. 4138-4142　2000/04　Research paper (scientific journal)

Development of High Density RF Plasma and Application to PVD

S. Miyake, Y. Setsuhara, Y. Sakawa, T. Shoji

Surf. Coat. Technol. 131, pp.171-176 (2000).　2000/04　Research paper (scientific journal)

Intrenal-antenna driven inductive RF discharges for development of large-area high-density plasma sources with supressed electrostatic coupling

S. Miyake, Y. Setsuhara, Y. Sakawa, T. Shoji

Vacuum 59, pp. 472-478 (2000).　2000/04　Research paper (scientific journal)

Influence of ion energy and arrival rate on x-ray crystallographic properties of thin ZrOx films prepared on Si(111) substrate by ion-beam assisted deposition

M. Matsuoka, S. Isotani, J. F.D. Chubaci, S. Miyake, Y. Setsuhara, K. Ogata, N. Kuratani

Journal of Applied Physics　Vol. 88　No. 6　p. 3773-3775　2000　Research paper (scientific journal)

Preparation of aluminum oxide films by ion beam assisted deposition

I. Shimizu, Y. Setsuhara, S. Miyake, M. Kumagai, K. Ogata, M. Kohata, K. Yamaguchi

Surface and Coatings Technology　Vol. 131　No. 1-3　p. 187-191　2000　Research paper (international conference proceedings)

Synthesis of CeO2 Films by Ion Beam Assisted Deposition

I. Shimizu, M. Kumagai, H. Saito, Y. Setsuhara, Y. Makino, S. Miyake

Ion Implantation Technology-98 ed. by J. Matsuo, G. Takaoka and I. Yamada (IEEE Inc., New Jersey, 1999) pp. 943-946.　1999/12　Research paper (scientific journal)

Properties of Cubic Boron Nitride Films Prepared by Ion Beam Assisted Deposition

M. Kumagai, S. Konuma, Y. Setsuhara, S. Miyake, K. Ogata, M. Kohata

Ion Implantation Technology-98 ed. by J. Matsuo, G. Takaoka and I. Yamada (IEEE Inc., New Jersey, 1999) pp. 1140-1143.　1999/12　Research paper (scientific journal)

Formation of b-SiC Thin Layers by Implantation of Carbon Ions into Silicon by Using MEVVA Ion Source

S. Yonekubo, Y. Setsuhara, S. Miyake, M. Kumagai, B. Kyoh

Ion Implantation Technology-98 ed. by J. Matsuo, G. Takaoka and I. Yamada (IEEE Inc., New Jersey, 1999) pp. 1090-1092.　1999/12　Research paper (scientific journal)

Studies on Magnetron Sputtering Assisted by Inductively Coupled RF Plasma for Enhanced Metal Ionization

M. Yamashita, Y. Setsuhara, S. Miyake, M. Kumagai, T. Shoji, J. Musil

Jpn. J. Appl. Phys. 38, pp. 4291-4295 (1999).　Vol. 38　No. 7　p. 4291-4295　1999/12　Research paper (scientific journal)

Production of Inductively-Coupled Large-Diameter Plasmas with Internal Antenna

Y. Setsuhara, S. Miyake, Y. Sakawa, T. Shoji

Jpn. J. Appl. Phys. 38, pp. 4263-4267 (1999).　Vol. 38　No. 7　p. 4263-4267　1999/09　Research paper (scientific journal)

Sintering of Al2O3-ZrO2 composites using millimeter-wave radiation

Y Makino, T Ohmae, Y Setsuhara, S Miyake, S Sano

SCIENCE OF ENGINEERING CERAMICS II　Vol. 2　p. 41-44　1999　Research paper (scientific journal)

Millimeter-wave sintering of Si3N4

T Ueno, S Kinoshita, Y Setsuhara, Y Makino, S Miyake, S Sano, H Saito

SCIENCE OF ENGINEERING CERAMICS II　Vol. 2　p. 45-48　1999　Research paper (scientific journal)

IBAD法を用いた多結晶cBN薄膜合成

節原裕一, 熊谷正夫, 鈴木常生, 三宅正司

第5回エレクトロニクスにおけるマイクロ接合・実装技術シンポジウム論文集, (1999) pp. 275-280.　1999/01　Research paper (scientific journal)

Properties of cubic boron nitride films with buffer layer control for stress relaxation using ion-beam-assisted deposition

Y. Setsuhara, M. Kumagai, M. Suzuki, T. Suzuki, S. Miyake

Surface and Coatings Technology　Vol. 116-119　p. 100-107　1999　Research paper (scientific journal)

Formation of carbon nitride films by reactive high-density plasma sputtering with excitation of m=0 mode helicon wave

S. Miyake, Y. Setsuhara, K. Shibata, M. Kumagai, Y. Sakawa, T. Shoji

Surface and Coatings Technology　Vol. 116-119　p. 11-17　1999　Research paper (scientific journal)

Ion-beam and plasma processing techniques for thin-film synthesis of superhard materials in boron-carbon-nitrogen system

SETSUHARA Yuichi, MIYAKE Shoji

OYOBUTURI　Vol. 67　No. 6　p. 659-663　1998/12

ミリ波によるセラミックス加熱・焼結

節原裕一

ニューセラミックス 10, pp. 9-16 (1997).　1997/12

Characterization of Ion-Assisted Deposition Processes for Surface Modifications.

Setsuhara Yuichi, Miyake Shoji

QUARTERLY JOURNAL OF THE JAPAN WELDING SOCIETY　Vol. 66　No. 3　p. 151-155　1997/12

Phase variation and properties of (Ti, Al)N films prepared by ion beam assisted deposition

Y Setsuhara, T Suzuki, Y Makino, S Miyake, T Sakata, H Mori

SURFACE & COATINGS TECHNOLOGY　Vol. 97　No. 1-3　p. 254-258　1997/12　Research paper (scientific journal)

Inductively coupled reactive high-density plasmas designed for sputter deposition

S Miyake, Y Setsuhara, JQ Zhang, M Kamai, B Kyoh

SURFACE & COATINGS TECHNOLOGY　Vol. 97　No. 1-3　p. 768-772　1997/12　Research paper (scientific journal)

Ion Assisted Deposition of Crystalline TiNi Thin Films by Electron Cyclotron Resonance Plasma Enhanced Sputtering

M. Misina, Y. Setsuhara, S. Miyake

Jpn. J. Appl. Phys. 36, pp. 3629-3634 (1997).　Vol. 36　No. 6　p. 3629-3634　1997/12　Research paper (scientific journal)

Measurements of Ion Energy Distribution Functions in a Radio Frequency Plasma Excited with an m=0 Mode Helical Antenna and Thin Film Preparation

Y. Ohtsu, G. Tochitani, H. Fujita, J. Q. Zhang, Y. Setsuhara, S. Miyake

Jpn. J. Appl. Phys. 36, pp. 4620-4624 (1997).　1997/12　Research paper (scientific journal)

Formation of Carbon Nitride Films by Helicon Wave Plasma Enhanced DC Sputtering

J. Q. Zhang, Y. Setsuhara, S. Miyake, B. Kyoh

Jpn. J. Appl. Phys. 36, pp. 6894-6899 (1997).　Vol. 36　No. 11　p. 6894-6899　1997/12　Research paper (scientific journal)

Inductively-Coupled-Plasma-Assisted Planar Magnetron Discharge for Enhanced Ionization of Sputtered Atoms

Y. Setsuhara, M. Kamai, S. Miyake, J. Musil

Jpn. J. Appl. Phys. 36, pp. 4568-4571 (1997)　Vol. 36　No. 7　p. 4568-4571　1997/12　Research paper (scientific journal)

Exposure of spacecraft insulators to energetic ions

LL Zhang, H Tahara, L Yasui, T Yoshikawa

7TH INTERNATIONAL SYMPOSIUM ON MATERIALS IN SPACE ENVIRONMENT　Vol. 399　p. 113-117　1997　Research paper (international conference proceedings)

イオンビーム支援蒸着法によって合成した(Ti, Al)N薄膜の微細構造と特性

鈴木常生, 節原裕一, 三宅正司, 巻野勇喜雄, 坂田孝夫, 森博太郎

第5回エレクトロニクスにおけるマイクロ接合・実装技術シンポジウム論文集, (1997) pp. 127-130.　1997/01　Research paper (scientific journal)

Interface structure between polyimide film substrate and copper film prepared by ion beam and vapor deposition (IVD) method

Akinori Ebe, Eiji Takahashi, Naoto Kuratani, Satoshi Nishiyama, Osamu Imai, Kiyoshi Ogata, Yuichi Setsuhara, Shoji Miyake

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms　Vol. 121　No. 1-4　p. 207-211　1997　Research paper (scientific journal)

Properties of depth-profile controlled boron nitride films prepared by ion-beam assisted deposition

M. Kumagai, M. Suzuki, T. Suzuki, Y. Tanaka, Y. Setsuhara, S. Miyake, K. Ogata, M. Kohata, K. Higeta, T. Einishi, Y. Suzuki, Y. Shimoitani, Y. Motonami

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms　Vol. 127-128　p. 977-980　1997　Research paper (scientific journal)

Interfacial structure control of cubic boron nitride films prepared by ion-beam assisted deposition

Y. Setsuhara, T. Suzuki, Y. Tanaka, S. Miyake, M. Suzuki, M. Kumagai, K. Ogata, M. Kohata, K. Higeta, T. Einishi, Y. Suzuki, Y. Shimoitani, Y. Motonami

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms　Vol. 127-128　p. 851-856　1997　Research paper (scientific journal)

Electron cyclotron resonance plasma enhanced direct current sputtering discharge with magnetic-mirror plasma confinement

M. Mišina, Y. Setsuhara, S. Miyake

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films　Vol. 15　No. 4　p. 1922-1928　1997　Research paper (scientific journal)

Improvement of Adhesion to Polyimide Substrates of Copper Film Prepared by Ion Beam and Vapor Deposition (IVD) Method

A. Ebe, E.Takahashi, Y. Iwamoto, N. Kuratani, S. Nishiyama, O. Imai, K. Oagata, Y. Setsuhara, S. Miyake

Thin Solid Films 281-282, pp. 356-359 (1996).　1996/12　Research paper (scientific journal)

Effects of Ion Energy and Arrival Rate on the Composion of Zirconium Oxide Films Prepared by Ion-Beam Assisted Depostion

M. Matsuoka, S. Isotani, S. Miyake, Y. Setsuhara, K. Ogata, N. Kuratani

J. Appl. Phys. 80, pp. 1177-1181 (1996).　Vol. 80　No. 2　p. 1177-1181　1996/12　Research paper (scientific journal)

イオンビーム照射による窒化硼素の相転移 : 低圧相から高圧相へ

節原, 裕一, 鈴木, 常生, 三宅, 正司

大阪大学低温センターだより　Vol. 96　p. 14-18　1996/10　Research paper (bulletin of university, research institution)

Synthesis of (Ti,Al)N films by ion beam assisted deposition (Reprinted from Nuclear Instruments and Methods in Physics Research B, vol 106, pg 120-125, 1995)

Y Setsuhara, T Suzuki, Y Makino, S Miyake, T Sakata, H Mori

ION BEAM MODIFICATION OF MATERIALS　p. 120-125　1996　Research paper (international conference proceedings)

Microwave plasma sintering of alumina

DL Johnson, HH Su

MICROWAVE PROCESSING OF MATERIALS V　Vol. 430　p. 629-634　1996　Research paper (international conference proceedings)

Advanced ceramics sintering using high-power millimeter-wave radiation

Y Setsuhara, M Kamai, S Kinoshita, N Abe, S Miyake, T Saji

MICROWAVE PROCESSING OF MATERIALS V　Vol. 430　p. 533-538　1996　Research paper (international conference proceedings)

Prediction of single phase formation of nitrides assisted by energetic particle bombardment

Y Makino, Y Setsuhara, S Miyake

ION BEAM MODIFICATION OF MATERIALS　p. 736-739　1996　Research paper (international conference proceedings)

Study of crystallization of copper films prepared by ion beam and vapour deposition method on polyimide substrates

A Ebe, E Takahashi, N Kuratani, S Nishiyama, O Imai, K Ogata, Y Setsuhara, S Miyake

ION BEAM MODIFICATION OF MATERIALS　p. 777-780　1996　Research paper (international conference proceedings)

A study of ion implantation induced variation of crystalline phase of boron nitride

M Kumagai, M Ohkubo, K Ogata, K Higeta, Y Shimoitani, Y Shimizu, M Satou, Y Setsuhara, S Miyake

ION BEAM MODIFICATION OF MATERIALS　p. 1081-1084　1996　Research paper (international conference proceedings)

The synthesis of TiB2 films by ion beam assisted deposition

Y Wang, Y Setsuihara, S Miyake

ION BEAM MODIFICATION OF MATERIALS　p. 744-747　1996　Research paper (international conference proceedings)

Characterization of helicon wave plasma designed for direct current sputtering

J. Q. Zhang, Y. Setsuhara, T. Ariyasu, S. Miyake

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films　Vol. 14　No. 4　p. 2163-2168　1996　Research paper (scientific journal)

Synthesis of(Ti, Al)N films by ion beam assisted deposition

Y Setsuhara, T Suzuki, Y Makino, S Miyake, T Sakata, H Mori

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS　Vol. 106　No. 1-4　p. 120-125　1995/12　Research paper (scientific journal)

Exposure of space material insulators to energetic ions

Hirokazu Tahara, Lulu Zhang, Miki Hiramatsu, Toshiaki Yasui, Takao Yoshikawa, Yuichi Setsuhara, Shoji Miyake

Journal of Applied Physics　Vol. 78　No. 6　p. 3719-3723　1995　Research paper (scientific journal)

Microwave Sintering of Slip Cast Formed ZrO2-3 mol%Y2O3 Green Body

Saburo Sano, Kiichi Oda, Yasuo Shibasaki, Kenichi Koizumi, Tomoya Matayoshi, Yuichi Setsuhara, Shoji Miyake

Journal of the Japan Society of Powder and Powder Metallurgy　Vol. 42　No. 6　p. 767-770　1995　Research paper (scientific journal)

Microstructure of titanium oxide films synthesized by ion bem dynamic mixing

Y. Makino, Y. Setsuhara, S. Miyake

Nucl. Instrum. Meth. B91, pp. 696-700 (1994).　1994/12　Research paper (scientific journal)

Synthesis of Ti-Al alloys by ion-beam-enhanced deposition

Y. Setsuhara, H. Ohsako, Y. Makino, S. Miyake

Surface and Coatings Technology　Vol. 66　No. 1-3　p. 495-498　1994　Research paper (scientific journal)

CERAMIC SINTERING BY HIGH-POWER MICROWAVE PLASMA

Y SETSUHARA, R OHNISHI, S MIYAKE

FIRST INTERNATIONAL CONFERENCE ON PROCESSING MATERIALS FOR PROPERTIES　p. 709-712　1993　Research paper (international conference proceedings)

Synthesis of aluminum oxide thin films by ion beam and vapor deposition technology

K. Ogata, K. Yamaguchi, S. Kiyama, H. Hirano, S. Shimizu, M. Kohata, T. Miyano, Y. Setsuhara, S. Miyake

Nuclear Inst. and Methods in Physics Research, B　Vol. 80-81　No. 2　p. 1423-1426　1993　Research paper (scientific journal)

Titanium oxide films prepared by dynamic ion mixing

Y. Setsuhara, H. Aoki, S. Miyake, A. Chayahara, M. Satou

Nuclear Inst. and Methods in Physics Research, B　Vol. 80-81　No. 2　p. 1406-1408　1993　Research paper (scientific journal)

High Density Compression of Hollow Pellet by Gekko XII at Osaka

T.Yamanaka, S.Nakai, K.Mima, Y.Izawa, Y.Kato, K.Nishihara, T.Sasaki, M.Nakatsuka, M.Yamanaka, H.Azechi, T.Jitsuno, T.Norimatsu, K.A.Tanaka, N.Miyanaga, M.Nakai, M.Takagi, M.Katayama, H.Nakaishi, Y.Setsuhara, A.Nishiguchi, T.Kanabe, C.Yamanaka

Particle Accelerators 37-39, pp.543-555 (1992).　1992/12　Research paper (scientific journal)

Rutile-type TiO2 formation by ion beam dynamic mixing

S. Miyake, K. Honda, T. Kohno, Y. Setsuhara, M. Satou, A. Chayahara

J. Vac. Sci. Technol. A 10, pp. 3253-3259 (1992).　Vol. 10　No. 5　p. 3253-3259　1992/12　Research paper (scientific journal)

Comparison of ion-implantation-induced damage in narrow-gap (0.1 eV) Hgi_xCdxTe and Hg1-xZnxTe

S. Mivake, K. Honda, T. Kohno, Y. Setsuhara

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films　Vol. 10　No. 5　p. 3253-3259　1992　Research paper (scientific journal)

HIGH-DENSITY COMPRESSION EXPERIMENTS AND REACTOR DESIGN AT ILE, OSAKA

Y KITAGAWA, K MIMA, H AZECHI, H TAKABE, S NAKAI, C YAMANAKA

INERTIAL CONFINEMENT FUSION　p. 94-107　1992　Research paper (international conference proceedings)

HIGH-DENSITY COMPRESSION EXPERIMENTS AT ILE, OSAKA

AZECHI H, JITSUNO T, KANABE T, KATAYAMA M, MIMA K, MIYANAGA N, NAKAI M, NAKAI S, NAKAISHI H, NAKATSUKA M, NISHIGUCHI A, NORRAYS PA, SETSUHARA Y, TAKAGI M, YAMANAKA M

Laser and Particle Beams　Vol. 9　No. 2　p. 193-207　1991

HIGH-DENSITY COMPRESSION OF HOLLOW-SHELL TARGET BY GEKKO XII AND LASER FUSION-RESEARCH AT ILE, OSAKA-UNIVERSITY

S NAKAI, K MIMA, M YAMANAKA, H AZECHI, N MIYANAGA, A NISHIGUCHI, H NAKAISHI, YW CHEN, Y SETSUHARA, PA NORREYS, T YAMANAKA, K NISHIHARA, KA TANAKA, M NAKAI, R KODAMA, M KATAYAMA, Y KATO, H TAKABE, H NISHIMURA, H SHIRAGA, T ENDO, K KONDO, M NAKATSUKA, T SASAKI, T JITSUNO, K YOSHIDA, T KANABE, A YOKOTANI, T NORIMATSU, M TAKAGI, H KATAYAMA, Y IZAWA, C YAMANAKA

LASER INTERACTION AND RELATED PLASMA PHENOMENA, VOL 9　Vol. 9　p. 25-67　1991　Research paper (international conference proceedings)

Six hundred times solid density compression of directly driven hollow shell pellets

S.Nakai, K.Mima, T.Yamanaka, Y.Izawa, Y.Kato, K.Nishmura, T.Sasaki, M.Nakatsuka, M.Yamanaka, H.Azechi, T.Jitsuno, T.Norimatsu, K.A.Tanaka, N.Miyanaga, M.Nakai, M.Takagi, Y.-W.Chen, H.Katayama, M.Katayama, R.Kodama, H.Nakaishi, Y.Setsuhara, A.Nishiguchi, T.Kanabe, C.Yamanaka

Plasma Physics and Controled Nuclear Fusion Research 3 (IAEA Press, Washington, DC, 1990) pp. 29-39.　1990/12　Research paper (scientific journal)

SECONDARY NUCLEAR-FUSION REACTIONS AS EVIDENCE OF ELECTRON DEGENERACY IN HIGHLY COMPRESSED FUSION FUEL

Y SETSUHARA, H AZECHI, N MIYANAGA, H FURUKAWA, R ISHIZAKI, K NISHIHARA, M KATAYAMA, A NISHIGUCHI, K MIMA, S NAKAI

LASER AND PARTICLE BEAMS　Vol. 8　No. 4　p. 609-620　1990　Research paper (scientific journal)

X-ray and particle diagnostics of a high-density plasma by laser implosion (invited)

M. Nakai, M. Yamanaka, H. Azechi, Y. W. Chen, T. Jitsuno, M. Katayama, M. Mima, N. Miyanaga, H. Nakaishi, M. Nakatsuka, A. Nishiguchi, P. A. Norreys, Y. Setsuhara, M. Takagi, T. Norimatsu, T. Yamanaka, C. Yamanaka, S. Nakai

Review of Scientific Instruments　Vol. 61　No. 10　p. 3235-3240　1990　Research paper (scientific journal)

An Automated Analysis System for Proton Etched Tracks in CR-39

H. Azechi, Y. Setsuhara, M. Yamanaka, S. Morinobu

Ionizing Radiation 16, pp. 95-100 (1989).　1989/12　Research paper (scientific journal)

DIRECT AREAL DENSITY-MEASUREMENT BY ACTIVATION TECHNIQUE FOR PLASTIC HOLLOW SHELL IMPLOSION EXPERIMENTS

H NAKAISHI, N MIYANAGA, Y SETSUHARA, H AZECHI, M TAKAGI, M SAITO, M YAMANAKA, T YAMANAKA, S NAKAI, K KOBAYASHI, KIMURA, I

APPLIED PHYSICS LETTERS　Vol. 55　No. 20　p. 2072-2074　1989/11　Research paper (scientific journal)

DEVELOPMENT OF WOLTER TYPE-1 REPLICATED X-RAY OPTICS FOR LASER FUSION

HASHIMOTO H, KAMIGAKI K, AOKI S, SETSUHARA Y, AZECHI H, YAMANAKA M, YAMANAKA T, IZAWA Y, YAMANAKA C

BULLETIN OF THE JAPAN SOCIETY OF PRECISION ENGINEERING 22 (3), pp. 177-182 (1988).　1988/12　Research paper (scientific journal)

レーザーエネルギー応用

疇地 宏, 宮永 憲明, 中石 博之, 陳 延偉, 節原 裕一, 村上 匡旦, 山中 正宣, 西原 功修, 高部 英明, 三間 圀興, 山中 千代衛, 中井 貞雄, 中井 光男, 島田 耕治, 西村 博明, 近藤 公伯, 白神 宏之, 加藤 義章, 遠藤 琢磨, 中西 淑人, 矢部 孝, 大山 俊之, 横田 千秋, 西沢 博, 小林 雅義, 石井 忠浩, 武内 一夫, 乗松 孝好, 真野 豊司, 片山 秀史, 児玉 了祐, 西野 嘉也, 田中 和夫, 高木 勝, 椿原 啓, 久保 宇市, 実野 孝久, 金 辺忠, 横谷 篤至, 佐々木 孝友, 吉田 国雄, 中塚 正大, 植田 憲一, 宅間 宏, 笹川 照夫, 川原 章裕, 小原 實, 北川 米喜, 中山 師生, 澤井 清信, 三問 圀興, 畦地 宏, 大東 延久, 松本 孝之, 南畑 毅, 奥村 夏彦, 宮本 照雄, 仁木 秀明, 井澤 靖和, 仲 俊博, 小坂 学, 橋田 昌樹, 阪部 周二, 山中 龍彦, 望月 孝晏, 多田 昭史, 平原 猛

レーザー研究　Vol. 16　No. Supplement　p. 101-103,108　1988

Imaging characteristics of a replicated wolter type. I. X-ray mirror designed for laser plasma diagnostics

Sadao Aoki, Munehisa Shiozawa, Keiji Kamigaki, Hiroshi Hashimoto, Masahiko Kokaji, Yuichi Setsuhara, Hiroshi Azechi, Masanobu Yamanaka, Tatsuhiko Yamanaka, Yasukazu Izawa, Chiyoe Yamanaka

Japanese Journal of Applied Physics　Vol. 26　No. 6R　p. 952-954　1987　Research paper (scientific journal)