Kinetics of the Oxidation of the [2Fe-2S] Cluster in SoxR by Redox-Active Compounds as Studied by Pulse Radiolysis

Kazuo Kobayashi, Takahiro Tanaka, Takahiro Kozawa

Biochemistry　No. 64　p. 895-902　2025/01/30　Research paper (scientific journal)

Reaction mechanisms of Sn-based polarity-change copolymer resists with different counter anions, designed for extreme ultraviolet lithography

Kohei Hashimoto, Yui Takata, Yusa Muroya, Takahiro KOZAWA, Kohei Machida, Satoshi Enomoto, Bilal Naqvi, Danilo De Simone

Japanese Journal of Applied Physics　Vol. 64　2025/01/27　Research paper (scientific journal)

Synthesis of Polystyrene-block-poly(3-hydroxy-1-methacryloyloxyadamantane) (PS-b-PHAdMA) via RAFT polymerization as candidate block copolymers for next generation lithography

Hiroki Yamamoto, Francis McCallum, Hui Peng, Idriss Blakey, Shin Hasegawa, Yasunari Maekawa, Takahiro Kozawa, Andrew K. Whittaker

Polymer　Vol. 318　p. 127983-127983　2025/01　Research paper (scientific journal)

Quartz crystal microbalance analysis of effects of surfactants on dissolution kinetics of poly(4-hydroxystyrene) partially protected by t-butoxycarbonyl group

Hitomi Betsumiya, Mikiko Kozawa, Takahiro Kozawa, Takashi Hasebe, Kazuo Sakamoto, Makoto Muramatsu

Japanese Journal of Applied Physics　Vol. 63　No. 11　p. 116501-116501　2024/11/27　Research paper (scientific journal)

Relationship between the surface free energy of underlayers and the dissolution kinetics of poly(4-hydroxystyrene) partially protected by t-butoxycarbonyl groups in tetramethylammonium hydroxide aqueous developer

Jiahao Wang, Takahiro Kozawa

Japanese Journal of Applied Physics　Vol. 63　No. 9　p. 096502-096502　2024/09/04　Research paper (scientific journal)

Effects of acid generator anions on radiation-induced decomposition and dissolution kinetics of chemically amplified resists

Yoshika Tsuda, Yusa Muroya, Takahiro Kozawa, Takuya Ikeda, Yoshitaka Komuro

Japanese Journal of Applied Physics　Vol. 63　No. 8　p. 086505-086505　2024/08/27　Research paper (scientific journal)

Stratified polymer dissolution model based on impedance data from quartz crystal microbalance method

Yuqing Jin, Yuko Tsutsui Ito, Takahiro KOZAWA, Takashi Hasebe, Kazuo Sakamoto, Makoto Muramatsu

Applied Physics Express　Vol. 17　p. 086502-086502　2024/08/20　Research paper (scientific journal)

Corrigendum: “Relationship between surface free energy and development process (swelling and dissolution kinetics) of poly(4-hydroxystyrene) film in water and 2.38 wt% tetramethylammonium hydroxide aqueous solution” [Jpn. J. Appl. Phys. 61, 016502 (2022)]

Yuko Tsutsui Ito, Takahiro Kozawa

Japanese Journal of Applied Physics　Vol. 63　No. 8　p. 089301-089301　2024/08/06　Research paper (scientific journal)

Dissolution dynamics of partially protected poly(4-hydroxystyrene) in organic developers investigated by a quartz crystal microbalance (QCM) method

Yuko Tsutsui Ito, Kyoko Watanabe, Takahiro Kozawa, Kazuo Sakamoto, Makoto Muramatsu

Japanese Journal of Applied Physics　Vol. 63　No. 7　p. 076506-076506　2024/07/26　Research paper (scientific journal)

Dynamics of ionized poly(4-hydroxystyrene)-type resist polymers with tert-butoxycarbonyl-protecting group

Kazumasa Okamoto, Yusa Muroya, Takahiro Kozawa

Scientific Reports　Vol. 14　No. 1　2024/07/20　Research paper (scientific journal)

Dissolution dynamics of poly(4-hydroxystyrene) partially protected with t-butoxycarbonyl group in alkyltrimethylammonium hydroxide aqueous developers

Jiahao Wang, Takahiro Kozawa

Japanese Journal of Applied Physics　Vol. 63　No. 7　p. 076503-076503　2024/07/18　Research paper (scientific journal)

Effects of substituents in triphenylsulfonium cation on its radiation-induced decomposition and dissolution kinetics of chemically amplified resists

Yoshika Tsuda, Yusa Muroya, Kazumasa Okamoto, Takahiro KOZAWA, Takuya Ikeda, Yoshitaka Komuro

Japanese Journal of Applied Physics　Vol. 63　p. 076501-076501　2024/07/09　Research paper (scientific journal)

Synthesis of Resist Materials Containing Hemiacetal Groups and Their Resist Sensitivity

Kouta Iwane, Hiroto Kudo, Kazumasa Okamoto, Takahiro Kozawa

Journal of Photopolymer Science and Technology　Vol. 37　No. 3　p. 287-292　2024/06/25　Research paper (scientific journal)

Synthesis of Botryosin-type Resist Material Containing Acetal Groups in the Main Chain and Its Sensitivity

Riku Akabane, Kazumasa Okamoto, Takahiro Kozawa, Hiroto Kudo

Journal of Photopolymer Science and Technology　Vol. 37　No. 3　p. 293-298　2024/06/25　Research paper (scientific journal)

Relationship between Defect Risks and Effective Reaction Radius for Deprotection in Chemically Amplified Resist Process for Extreme Ultraviolet Lithography

Takahiro Kozawa

Journal of Photopolymer Science and Technology　Vol. 37　No. 1　p. 129-134　2024/05/31　Research paper (scientific journal)

Transient Swelling During Development of Poly(methyl methacrylate) Resist

Akihiro Konda, Hiroki Yamamoto, Shusuke Yoshitake, Takahiro Kozawa

Journal of Photopolymer Science and Technology　Vol. 37　No. 1　p. 81-88　2024/05/31　Research paper (scientific journal)

Design strategy of extreme ultraviolet resists

Takahiro Kozawa

Japanese Journal of Applied Physics　Vol. 63　No. 5　p. 050101-050101　2024/05/13　Research paper (scientific journal)

A study on the resist performance of inorganic-organic resist materials for EUV and electron-beam lithography

Hiroki Yamamoto, Yuko Tsutsui Ito, Kazumasa Okamoto, Shuhei Shimoda, Takahiro KOZAWA

Japanese Journal of Applied Physics　Vol. 63　2024/04/30　Research paper (scientific journal)

Dissolution dynamics of poly(4-hydroxystyrene) in potassium hydroxide (KOH) and sodium hydroxide (NaOH) aqueous solutions investigated by quartz crystal microbalance (QCM) method

Yuko Tsutsui Ito, Kyoko Watanabe, Takahiro Kozawa, Kazuo Sakamoto, Makoto Muramatsu

Japanese Journal of Applied Physics　Vol. 63　No. 4　p. 046502-046502　2024/04/09　Research paper (scientific journal)

Dissolution dynamics of zirconia nanocluster resist

Yuko Tsutsui Ito, Takahiro Kozawa, Kazuo Sakamoto, Makoto Muramatsu

Japanese Journal of Applied Physics　Vol. 63　No. 4　p. 046501-046501　2024/04/08　Research paper (scientific journal)

Dissolution dynamics of poly(4-hydroxystyrene-co-methacrylic acid) in tetraalkylammonium hydroxide aqueous solutions

Yutaro Iwashige, Kyoko Watanabe, Yuko Tsutsui Ito, Takahiro Kozawa, Kazuo Sakamoto, Makoto Muramatsu

Japanese Journal of Applied Physics　Vol. 63　No. 2　p. 026504-026504　2024/02/21　Research paper (scientific journal)

Extreme Ultraviolet Lithographic Performance and Reaction Mechanism of Polymeric Resist─Utilizing Radical- and Acid-Amplified Cross-Linking

Bilal A. Naqvi, Satoshi Enomoto, Kohei Machida, Yui Takata, Takahiro Kozawa, Yusa Muroya, Stefan De Gendt, Danilo De Simone

Chemistry of Materials　Vol. 36　No. 3　p. 1459-1471　2024/02/01　Research paper (scientific journal)

Relationship between poly(4-hydroxystyrene) (PHS) and tetramethylammonium hydroxide (TMAH) concentrations during the development of PHS films in TMAH aqueous solution studied by a quartz crystal microbalance (QCM) method

Yuko Tsutsui Ito, Kyoko Watanabe, Yuqing Jin, Takahiro Kozawa, Kazuo Sakamoto, Makoto Muramatsu

Japanese Journal of Applied Physics　Vol. 63　No. 1　p. 018002-018002　2024/01/10　Research paper (scientific journal)

Shielding effect of underlayer against secondary electrons generated in substrate in extreme ultraviolet lithography

Takahiro Kozawa

Japanese Journal of Applied Physics　Vol. 63　No. 1　p. 016503-016503　2023/12/27　Research paper (scientific journal)

Automatic evaluation of line-and-space resist patterns with defects using image recognition technology

Yuqing Jin, Takahiro Kozawa, Kota Aoki, Tomoya Nakamura, Yasushi Makihara, Yasushi Yagi

International Conference on Extreme Ultraviolet Lithography 2023　2023/11/21　Research paper (international conference proceedings)

Sensitization of polymethacrylate resist with adding acid-generating promoters upon exposure to EUV light

Kazumasa Okamoto, Akihiro Konda, Yuki Ishimaru, Takahiro Kozawa, Yasunobu Nakagawa, Masamichi Nishimura

Japanese Journal of Applied Physics　Vol. 62　No. 11　p. 116503-116503　2023/11/01　Research paper (scientific journal)

Effects of underlayer absorption coefficient on bridging risk in chemically amplified resist process for extreme ultraviolet lithography

Takahiro Kozawa

Japanese Journal of Applied Physics　Vol. 62　No. 11　p. 116502-116502　2023/11/01　Research paper (scientific journal)

Analysis of resist images with pattern defects by Hough transform

Yuqing Jin, Takahiro KOZAWA, Kota Aoki, Tomoya Nakamura, Yasushi Makihara, Yasushi Yagi

Japanese Journal of Applied Physics　2023/07/24　Research paper (scientific journal)

Reaction mechanisms of Sn-complex-side-chain polymer used for extreme ultraviolet lithography, studied by electron pulse radiolysis and γ-radiolysis

Yui Takata, Yusa Muroya, Takahiro Kozawa, Kohei Machida, Satoshi Enomoto, Bilal Naqvi, Danilo De Simone

Japanese Journal of Applied Physics　Vol. 62　No. 7　p. 076502-076502　2023/07/01　Research paper (scientific journal)

Defect risks at interfaces of chemically amplified resists in extreme ultraviolet lithography process

Takahiro Kozawa

Japanese Journal of Applied Physics　Vol. 62　No. 7　p. 076501-076501　2023/07/01　Research paper (scientific journal)

Classification of dissolution modes of partially protected poly(4-hydroxystyrene) in tetraalkylammonium hydroxide aqueous solutions

Hitomi Betsumiya, Yuqing Jin, Yuko Tsutsui Ito, Takahiro Kozawa, Kazuo Sakamoto, Makoto Muramatsu

Japanese Journal of Applied Physics　Vol. 62　No. 6　p. 066501-066501　2023/06/08　Research paper (scientific journal)

Design of High-Sensitive EUV Resist Materials based on Polyacetals

Hiroyuki Maekawa, Yutaro Iwashige, Hiroyuki Yamamoto, Kazumasa Okamoto, Takahiro Kozawa, Hiroto Kudo

Journal of Photopolymer Science and Technology　Vol. 36　p. 31-39　2023/06　Research paper (scientific journal)

Photoresist stochastic defect generation depending on alkyl chain length and concentration of tetraalkylammonium hydroxide in alkali aqueous developer

Masahiko Harumoto, Andreia Figueiredo dos Santos, Julius Joseph Santillan, Toshiro Itani, Takahiro Kozawa

Japanese Journal of Applied Physics　Vol. 62　2023/03/23　Research paper (scientific journal)

Effects of photoacid generator decomposition on dissolution kinetics of poly(4-hydroxystyrene) in tetraalkylammonium hydroxide aqueous solutions

Yutaro Iwashige, Yuko Tsutsui Ito, Takahiro Kozawa, Kazuo Sakamoto, Makoto Muramatsu

Japanese Journal of Applied Physics　Vol. 62　No. 3　p. 036502-036502　2023/03/10　Research paper (scientific journal)

Stochastic defect generation depending on tetraalkylhydroxide aqueous developers in extreme ultraviolet lithography

Masahiko Harumoto, Andreia Figueiredo dos Santos, Julius Joseph Santillan, Toshiro Itani, Takahiro Kozawa

Japanese Journal of Applied Physics　Vol. 62　No. 1　p. 016503-016503　2023/01/06　Research paper (scientific journal)

Intramolecular electron transfer from biopterin to FeII-O2 complex in nitric oxide synthases occurs at very different rates between bacterial and mammalian enzymes: Direct observation of a catalytically active intermediate.

Kazuo Kobayashi, Yuko Tsutsui Ito, Yuri Kasu, Masaki Horitani, Takahiro Kozawa

Journal of inorganic biochemistry　Vol. 238　p. 112035-112035　2023/01　Research paper (scientific journal)

Protected unit distribution near interfaces of chemically amplified resists used for extreme ultraviolet lithography

Takahiro Kozawa

Japanese Journal of Applied Physics　Vol. 62　No. 1　p. 016509-016509　2023/01　Research paper (scientific journal)

Interfacial effects on sensitization of chemically amplified extreme ultraviolet resists

Takahiro Kozawa

Japanese Journal of Applied Physics　Vol. 61　No. 11　p. 116501-116501　2022/10/18　Research paper (scientific journal)

Theoretical study on defect risks of chemically amplified resists used for extreme ultraviolet lithography

Takahiro Kozawa

Japanese Journal of Applied Physics　Vol. 61　No. 10　p. 106502-106502　2022/09/21　Research paper (scientific journal)

Electrostatic effect on the dissolution kinetics of poly(4-hydroxystyrene) in alkaline aqueous solution

Naoki Tanaka, Takahiro Kozawa, Takuya Ikeda, Yoshitaka Komuro, Daisuke Kawana

Japanese Journal of Applied Physics　Vol. 61　No. 8　p. 086509-086509　2022/08/02　Research paper (scientific journal)

Sensitization mechanism of metal oxide nanocluster resists with carboxylic acid ligands

Tomoe Otsuka, Yusa Muroya, Takuya Ikeda, Yoshitaka Komuro, Daisuke Kawana, Takahiro Kozawa

Japanese Journal of Applied Physics　Vol. 61　No. 8　p. 086508-086508　2022/08/01　Research paper (scientific journal)

Dependence of Dissolution Kinetics of Main-Chain Scission Type Resists on Molecular Weight

Akihiro Konda, Hiroki Yamamoto, Shusuke Yoshitake, Takahiro Kozawa

Journal of Photopolymer Science and Technology　Vol. 35　p. 1-7　2022/06　Research paper (scientific journal)

Synthesis and Resist Sensitive Property of Iodine-Containing Materials using Extreme Ultraviolet (EUV) Exposure Tool

Yutaro Iwashige, Hiroto Kudo, Kazumasa Okamoto, Takahiro Kozawa

Journal of Photopolymer Science and Technology　Vol. 35　No. 1　p. 41-47　2022/06　Research paper (scientific journal)

Study on deprotonation from radiation-induced ionized acrylate polymers including acid-generation promoters for improving chemically amplified resists

Kazumasa Okamoto, Akihiro Konda, Yuki Ishimaru, Takahiro Kozawa, Yasunobu Nakagawa, Masamichi Nishimura

Japanese Journal of Applied Physics　Vol. 61　No. 6　p. 066505-066505　2022/06/01　Research paper (scientific journal)

Swelling and dissolution kinetics of poly(4-hydroxystyrene) in tetrabutylammonium hydroxide (TBAH) aqueous solutions studied by quartz crystal microbalance (QCM) method—in comparison with tetramethylammonium hydroxide (TMAH) aqueous solutions

Yuko Tsutsui Ito, Hitomi Betsumiya, Takahiro Kozawa, Kazuo Sakamoto, Makoto Muramatsu

Japanese Journal of Applied Physics　Vol. 61　No. 6　p. 066506-066506　2022/06/01　Research paper (scientific journal)

Estimation of effective reaction radius for catalytic chain reaction of chemically amplified resist by Bayesian optimization

Yuqing Jin, Takahiro Kozawa

Japanese Journal of Applied Physics　Vol. 61　No. 6　p. 066504-066504　2022/06/01　Research paper (scientific journal)

Classification of lines, spaces, and edges of resist patterns in scanning electron microscopy images using unsupervised machine learning

Yuqing Jin, Takahiro KOZAWA

Japanese Journal of Applied Physics　Vol. 61　2022/05/13　Research paper (scientific journal)

Dependence of photoresist dissolution dynamics in alkaline developers on alkyl chain length of tetraalkylammonium hydroxide

Masahiko Harumoto, Julius Joseph Santillan, Toshiro Itani, Takahiro Kozawa

Japanese Journal of Applied Physics　Vol. 61　No. 5　p. 056506-056506　2022/05　Research paper (scientific journal)

Effect of surface free energy of organic underlayer on dissolution kinetics of poly(4-hydroxystyrene) film in tetramethylammonium hydroxide aqueous developer

Tomoe Otsuka, Yuqing Jin, Naoki Tanaka, Takahiro KOZAWA

Japanese Journal of Applied Physics　Vol. 61　2022/04/25　Research paper (scientific journal)

Effects of film thickness and alkaline concentration on dissolution kinetics of poly(4-hydroxystyrene) in alkaline aqueous solution

Naoki Tanaka, Kyoko Matsuoka, Takahiro KOZAWA, Takuya Ikeda, Yoshitaka Komuro, Daisuke Kawana

Japanese Journal of Applied Physics　Vol. 61　2022/04/20　Research paper (scientific journal)

Interdomain electron transfer in flavohaemoglobin from Candida norvegensis with antibiotic azole compounds

Kazuo Kobayashi, Jotaro Igarashi, Takahiro Kozawa

FEBS LETTERS　Vol. 565　p. 938-946　2022/03　Research paper (scientific journal)

Decarboxylation efficiency of carboxylic acids as ligands of metal oxide nanocluster resists upon γ-ray irradiation

Tomoe Otsuka, Yusa Muroya, Takuya Ikeda, Yoshitaka Komuro, Daisuke Kawana, Takahiro KOZAWA

Japanese Journal of Applied Physics　Vol. 61　2022/01/13　Research paper (scientific journal)

Exploration of charge transport materials to improve the radiation tolerance of lead halide perovskite solar cells

Yoshiyuki Murakami, Ryosuke Nishikubo, Fumitaka Ishiwari, Kazumasa Okamoto, Takahiro Kozawa, Akinori Saeki

Materials Advances　Vol. 3　No. 12　p. 4861-4869　2022　Research paper (scientific journal)

Relationship between surface free energy and development process (swelling and dissolution kinetics) of poly(4-hydroxystyrene) film in water and 2.38 wt% tetramethylammonium hydroxide aqueous solution

Yuko Tsutsui Ito, Takahiro Kozawa

Japanese Journal of Applied Physics　Vol. 61　No. 1　p. 016502-016502　2021/12　Research paper (scientific journal)

Formulation of trade-off relationships between resolution, line edge roughness, and sensitivity in sub-10 nm half-pitch region for chemically amplified extreme ultraviolet resists

Takahiro Kozawa

Japanese Journal of Applied Physics　Vol. 61　No. 1　p. 016501-016501　2021/12　Research paper (scientific journal)

Relationship between blurring factors and interfacial effects in chemically amplified resist processes in photomask fabrication

Takahiro Kozawa, Takao Tamura

Japanese Journal of Applied Physics　Vol. 60　No. 12　p. 126504-126504　2021/12/01　Research paper (scientific journal)

Theoretical study of interfacial effects on low-energy electron dynamics in chemically amplified resist processes of photomask fabrication

Takahiro Kozawa, Takao Tamura

Japanese Journal of Applied Physics　Vol. 60　No. 8　p. 086503-086503　2021/08/03　Research paper (scientific journal)

Analysis of mitigating factors for line edge roughness generated during electron beam lithography using machine learning

Yuqing Jin, Takahiro Kozawa, Takao Tamura

Japanese Journal of Applied Physics　Vol. 60　No. 7　p. 076509-076509　2021/07/05　Research paper (scientific journal)

Study on radical dianions of carboxylates used as ligands of metal oxide nanocluster resists

Kengo Ikeuchi, Yusa Muroya, Takuya Ikeda, Yoshitaka Komuro, Daisuke Kawana, Takahiro Kozawa

Japanese Journal of Applied Physics　Vol. 60　No. 7　2021/07/01　Research paper (scientific journal)

Dependence of dose rate on the sensitivity of the resist under ultra-high flux extreme ultraviolet (EUV) pulse irradiation

Kazumasa Okamoto, Shunpei Kawai, Yuta Ikari, Shigeo Hori, Akihiro Konda, Koki Ueno, Yohei Arai, Masahiko Ishino, Thanh-Hung Dinh, Masaharu Nishikino, Akira Kon, Shigeki Owada, Yuichi Inubushi, Hiroo Kinoshita, Takahiro Kozawa

APPLIED PHYSICS EXPRESS　Vol. 14　No. 6　2021/06　Research paper (scientific journal)

Non-chemically Amplified Negative Molecular Resist Materials using Polarity Change by EUV Exposure,

K. Fujisawa, H. Maekawa, H. Kudo, K. Okamoto, T. Kozawa

J. Photopolym. Sci. Technol.　Vol. 34　p. 87-93　2021/06　Research paper (scientific journal)

Resist Thickness Dependence of Latent Images in Chemically Amplified Resists Used for Electron Beam Lithography

T. Kozawa, T. Tamura

J. Photopolym. Sci. Technol.　Vol. 34　p. 17-25　2021/06　Research paper (scientific journal)

Analysis of dissolution kinetics of narrow polydispersity poly(4-hydroxystyrene) in alkaline aqueous solution using machine learning

Naoki Tanaka, Kyoko Watanabe, Kyoko Matsuoka, Kazuki Azumagawa, Takahiro Kozawa, Takuya Ikeda, Yoshitaka Komuro, Daisuke Kawana

Japanese Journal of Applied Physics　Vol. 60　No. 6　p. 066503-066503　2021/05/28　Research paper (scientific journal)

Electron Beam Irradiation of Lead Halide Perovskite Solar Cells: Dedoping of Organic Hole Transport Materials despite Hardness of the Perovskite Layer

Yoshiyuki Murakami, Fumitaka Ishiwari, Kazumasa Okamoto, Takahiro Kozawa, Akinori Saeki

ACS Applied Materials & Interfaces　Vol. 13　No. 21　p. 24824-24832　2021/05/19　Research paper (scientific journal)

Corrigendum: “Theoretical study on trade-off relationships between resolution, line edge roughness, and sensitivity in photomask production by electron beam lithography” [Jpn. J. Appl. Phys. 58, 076501 (2019)]

Takahiro Kozawa, Takao Tamura

Japanese Journal of Applied Physics　Vol. 60　No. 6　p. 069301-069301　2021/05/13　Research paper (scientific journal)

Effect of initial molecular weight distribution on pattern formation of main-chain-scission-type resists

Ayako Nakajima, Manabu Hoshino, Takahiro Kozawa

Japanese Journal of Applied Physics　Vol. 60　No. 5　p. 056501-056501　2021/04/20　Research paper (scientific journal)

Pattern collapse mitigation by controlling atmosphere during development process for semiconductor lithography

Masahiko Harumoto, Tomohiro Motono, Andreia Figueiredo dos Santos, Chisayo Mori, Yuji Tanaka, Harold Stokes, Masaya Asai, JULIUSJOSEPH SANTILLAN, Toshiro Itani, Takahiro KOZAWA

Japanese Journal of Applied Physics　Vol. 60　No. SC　p. SCCA03-SCCA03　2021/04/13　Research paper (scientific journal)

Application of machine learning to stochastic effect analysis of chemically amplified resists used for extreme ultraviolet lithography

Kazuki Azumagawa, Takahiro Kozawa

Japanese Journal of Applied Physics　Vol. 60　No. SC　p. SCCC02-SCCC02　2021/03/08　Research paper (scientific journal)

Fast autooxidation of a bis-histidyl-ligated globin from the anhydrobiotic tardigrade,Ramazzottius varieornatus, by molecular oxygen

Kazuo Kobayashi, JeeEun Kim, Yohta Fukuda, Takahiro Kozawa, Tsuyoshi Inoue

The Journal of Biochemistry　2021/01/27　Research paper (scientific journal)

Dissolution kinetics of main-chain-scission-type resist in organic developers

Ayako Nakajima, Keiko Matsuo, Takahiro Kozawa

Applied Physics Express　Vol. 14　No. 2　p. 026501-026501　2021/01/08　Research paper (scientific journal)

Estimation of electron affinity of photoacid generators: Density functional theory calculations using static and dynamic models

Okamoto, K., Kozawa, T.

Japanese Journal of Applied Physics　Vol. 60　2021　Research paper (scientific journal)

Gel permeation chromatography analysis of remaining components of electron-beam-irradiated ZEP520A resist after development

Ayako Nakajima, Manabu Hoshino, Takahiro Kozawa

Japanese Journal of Applied Physics　Vol. 60　No. 1　p. 010901-010901　2021/01/01　Research paper (scientific journal)

Changes in molecular weight distribution caused by main-chain scission of electron beam resists

Takahiro Kozawa, Ayako Nakajima, Manabu Hoshino

Japanese Journal of Applied Physics　Vol. 59　No. 12　p. 126506-126506　2020/12/03　Research paper (scientific journal)

Formation of intramolecular dimer radical ions of diphenyl sulfones

Kazumasa Okamoto, Shunpei Kawai, Takahiro Kozawa

SCIENTIFIC REPORTS　Vol. 10　No. 1　2020/11　Research paper (scientific journal)

Regression analysis of photodecomposable quencher concentration effects on chemical gradient in chemically amplified extreme ultraviolet resist processes

Kazuki Azumagawa, Takahiro Kozawa

Japanese Journal of Applied Physics　Vol. 59　2020/11　Research paper (scientific journal)

Heating effect of the radiation chemistry of polyhydroxystyrene-type chemically amplified resists

Yuta Ikari, Kazumasa Okamoto, Akihiro Konda, Takahiro Kozawa, Takao Tamura

Japanese Journal of Applied Physics　Vol. 59　No. 8　p. 086506-086506　2020/08/01　Research paper (scientific journal)

Resist thickness dependence of line width roughness of chemically amplified resists used for electron beam lithography

Naoki Maeda, Akihiro Konda, Kazumasa Okamoto, Takahiro Kozawa, Takao Tamura

Japanese Journal of Applied Physics　Vol. 59　No. 8　p. 086501-086501　2020/08/01　Research paper (scientific journal)

Higher Sensitive Extreme Ultraviolet (EUV) Resist Materials Derived From p-t-Butylcalix[n]arenes (n = 4 and 8)

Hiroyuki Maekawa, Hiroto Kudo, Takeo Watanabe, Hiroki Yamamoto, Kazumasa Okamoto, Takahiro Kozawa

Journal of Photopolymer Science and Technology　Vol. 33　No. 1　p. 45-51　2020/07/01　Research paper (scientific journal)

Lamellar Orientation of a Block Copolymer via an Electron-Beam Induced Polarity Switch in a Nitrophenyl Self-Assembled Monolayer or Si Etching Treatments

Hiroki Yamamoto, Guy Dawson, Takahiro Kozawa, Alex P. G. Robinson

QUANTUM BEAM SCIENCE　Vol. 4　No. 2　2020/06　Research paper (scientific journal)

Analysis of trade-off relationships between resolution, line edge roughness, and sensitivity in extreme ultraviolet lithography using lasso regression

Kazuki Azumagawa, Takahiro Kozawa

Jpn. J. Appl. Phys　Vol. 59　2020/06　Research paper (scientific journal)

Dissolution kinetics of poly(4-hydroxystyrene) with different molecular weight distributions in alkaline aqueous solution,

A. Nakajima, K.Watanabe, K. Matsuoka, T. Kozawa, Y. Komuro, D. Kawana, and A. Yamazaki,

Jpn. J. Appl. Phys.　Vol. 59　2020/03　Research paper (scientific journal)

Synthesis and Property of Tellurium-Containing Molecular Resist Materials for Extreme Ultraviolet Lithography System

Hiroto Kudo, Mari Fukunaga, Teppei Yamada, Shinji Yamakawa, Takeo Watanabe, Hiroki Yamamoto, Kazumasa Okamoto, Takahiro Kozawa

Journal of Photopolymer Science and Technology　Vol. 32　No. 6　p. 805-810　2020/01/31　Research paper (scientific journal)

Sensitivity enhancement of chemically amplified EUV resist by adding diphenyl sulfone derivatives

Kazumasa Okamoto, Shunpei Kawai, Takahiro Kozawa

ADVANCES IN PATTERNING MATERIALS AND PROCESSES XXXVII　Vol. 11326　2020　Research paper (international conference proceedings)

Mechanism of resist heating effect in chemically amplified resist

Y. Ikari, K. Okamoto, N. Maeda, A. Konda, T. Kozawa, T. Tamura

Proceedings of SPIE - The International Society for Optical Engineering　Vol. 11326　2020　Research paper (international conference proceedings)

Sensitivity enhancement of chemically amplified EUV resist by adding diphenyl sulfone derivatives

Kazumasa Okamoto, Shunpei Kawai, Takahiro Kozawa

Proceedings of SPIE - The International Society for Optical Engineering　Vol. 11326　2020　Research paper (international conference proceedings)

Theoretical study on protected unit fluctuation of chemically amplified resists used for photomask production by electron beam lithography,

T. Kozawa and T. Tamura,

Jpn. J. Appl. Phys.　Vol. 59　2020/01　Research paper (scientific journal)

Theoretical study on effects of electron thermal energy on sensitization process of chemically amplified electron beam resists—contribution to resist heating effect in electron beam mask writing,

T. Kozawa and T. Tamura,

Jpn. J. Appl. Phys.　Vol. 58　2019/11　Research paper (scientific journal)

Pulse radiolysis of carboxylic acids used as ligands of metal oxide nanocluster resists,

T. Yamada, Y. Muroya, S. Yamashita, Y. Komuro, D. Kawana, A. Yamazaki, and T. Kozawa,

Jpn. J. Appl. Phys.　Vol. 58　No. 9　p. 096504-096504　2019/09　Research paper (scientific journal)

Theoretical study on trade-off relationships between resolution, line edge roughness, and sensitivity in resist processes for semiconductor manufacturing by extreme ultraviolet lithography,

T. Kozawa,

Jpn. J. Appl. Phys.　Vol. 58　2019/09　Research paper (scientific journal)

Theoretical study on trade-off relationships between resolution, line edge roughness, and sensitivity in photomask production by electron beam lithography,

T. Kozawa and T. Tamura,

Jpn. J. Appl. Phys.　Vol. 58　2019/07　Research paper (scientific journal)

Relationship between Resolution Blur and Stochastic Defect of Chemically Amplified Resists Used for Extreme Ultraviolet Lithography,

T. Kozawa, J. J. Santillan, and T. Itani,

J. Photopolym. Sci. Technol.　Vol. 32　p. 161-167　2019/06　Research paper (scientific journal)

Incorporation of chemical amplification in dual insolubilization resists,

S. Enomoto, T. Yoshino, K. Machida, and T. Kozawa,

Jpn. J. Appl. Phys.　Vol. 58　2019/05　Research paper (scientific journal)

Pulse radiolysis of methacrylic acid ligand for zirconia nanoparticle resist,

T. Yamada, S. Ishihara, Y. Muroya, J. J. Santillan, S. Yamashita, T. Itani, and T. Kozawa,

Jpn. J. Appl. Phys　Vol. 58　No. 3　2019/03　Research paper (scientific journal)

Dependence of relationship between chemical gradient and line width roughness of zirconia nanoparticle resist on pattern duty, acid generator, and developer,

T. Kozawa, A. Nakajima, T. Yamada, Y. Muroya, J. J. Santillan, and T. Itani,

Jpn. J. Appl. Phys.　Vol. 58　2019/03　Research paper (scientific journal)

Effects of molecular weight and dispersity on performance of main-chain-scission-type resist,

A. Nakajima, M. Hoshino, M. Hashimoto, and T. Kozawa,

Jpn. J. Appl. Phys.　Vol. 58　2019/02　Research paper (scientific journal)

Strategy for the breakthrough of RLS trade-off relationship in the development of novel resist materials and a developer

Ayako Nakajima, Manabu Hoshino, Kazunori Taguchi, Takahiro Kozawa

Proceedings of SPIE - The International Society for Optical Engineering　Vol. 11148　2019　Research paper (international conference proceedings)

Effects of an organotin compound on radiation-induced reactions of extreme ultraviolet resists utilizing polarity change and radical crosslinking,

S. Enomoto, T. Yoshino, K. Machida, and T. Kozawa,

Jpn. J. Appl. Phys.　Vol. 58　2019/01　Research paper (scientific journal)

Analysis of dissolution factor of line edge roughness formation in chemically amplified electron beam resist,

T. Kozawa,

Jpn. J. Appl. Phys.　Vol. 57　2018/12　Research paper (scientific journal)

Sensitizers in extreme ultraviolet chemically amplified resists: mechanism of sensitivity improvement

Yannick Vesters, Jing Jiang, Hiroki Yamamoto, Danilo De Simone, Takahiro Kozawa, Stefan De Gendt, Geert Vandenberghe

JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS　Vol. 17　No. 4　2018/10　Research paper (scientific journal)

Material design for the improvement of ZEP520A performance

Nakajima A, Kozawa T, Hoshino M, Hashimoto M

PHOTOMASK TECHNOLOGY 2018　Vol. 10810　2018/10　Research paper (international conference proceedings)

Synthesis of hyperbranched polyacetals containing C-(4-t-butylbenz)calix [4] resorcinarene: Resist properties for extreme ultraviolet (EUV) lithography

Hiroto Kudo, Mari Fukunaga, Kohei Shiotsuki, Hiroya Takeda, Hiroki Yamamoto, Takahiro Kozawa, Takeo Watanabe

REACTIVE & FUNCTIONAL POLYMERS　Vol. 131　p. 361-367　2018/10　Research paper (scientific journal)

Relationship between C=C double bond conversion and dissolution kinetics in cross-linking-type photoresists for display manufacture, studied by real-time Fourier transform infrared spectroscopy and quartz crystal microbalance methods,

A. Tsuneishi, S. Uchiyama, R. Hayashi, K. Taki, and T. Kozawa,

Jpn. J. Appl. Phys.　Vol. 57　2018/09　Research paper (scientific journal)

Comparison of radical generation efficiencies of the oxime-based initiator radicals using galvinoxyl radical as an indicator,

A. Tsuneishi, D. Sakamaki, Q. Gao, T. Shoda, T. Kozawa, and S. Seki,

Jpn. J. Appl. Phys.　Vol. 57　2018/08　Research paper (scientific journal)

Relationship between Resolution Blur and Shot Noise in Line Edge Roughness Formation of Chemically Amplified Resists Used for Extreme-Ultraviolet Lithography,

T. Kozawa, J. J. Santillan, and T. Itani,

J. Photopolym. Sci. Technol.　Vol. 31　p. 183-188　2018/06　Research paper (scientific journal)

Resist image quality control via acid diffusion constant and/or photodecomposable quencher concentration in the fabrication of 11nm half-pitch line-and-space patterns using extreme-ultraviolet lithography

Takahiro Kozawa, Julius Joseph Santillan, Toshiro Itani

Japanese Journal of Applied Physics　Vol. 57　No. 5　2018/05/01　Research paper (scientific journal)

Study of electron-beam and extreme-ultraviolet resist utilizing polarity change and radical crosslinking

Satoshi Enomoto, Takahiro Kozawa

Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics　Vol. 36　No. 3　2018/05/01　Research paper (scientific journal)

Dissolution behavior of negative-type photoresists for display manufacture studied by quartz crystal microbalance method

Asuka Tsuneishi, Sachiyo Uchiyama, Takahiro Kozawa

Japanese Journal of Applied Physics　Vol. 57　No. 4　2018/04/01　Research paper (scientific journal)

Reaction Intermediates of Nitric Oxide Synthase from Deinococcus radiodurans as Revealed by Pulse Radiolysis: Evidence for Intramolecular Electron Transfer from Biopterin to FeII-O2 Complex.

Yuko Tsutsui, Kazuo Kobayashi, Fusako Takeuchi, Motonari Tsubaki, Takahiro Kozawa

Biochemistry　Vol. 57　No. 10　p. 1611-1619　2018/03/13　Research paper (scientific journal)

Electron-hole pairs generated in ZrO2 nanoparticle resist upon exposure to extreme ultraviolet radiation

Takahiro Kozawa, Julius Joseph Santillan, Toshiro Itani

Japanese Journal of Applied Physics　Vol. 57　No. 2　2018/02/01　Research paper (scientific journal)

Synthesis of metal nanoparticle and patterning in polymeric films induced by electron beam

Hiroki Yamamoto, Takahiro Kozawa, Seiichi Tagawa, Jean-Louis Marignier, Mehran Mostafavi, Jacqueline Belloni

Proceedings of SPIE - The International Society for Optical Engineering　Vol. 10586　2018　Research paper (international conference proceedings)

Role of Metal Sensitizers for Sensitivity Improvement in EUV Chemically Amplified Resist

Hiroki Yamamoto, Yannick Vesters, Jing Jiang, Danilo De Simone, Geert Vandenberghe, Takahiro Kozawa

JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY　Vol. 31　No. 6　p. 747-751　2018　Research paper (scientific journal)

Sensitizers in EUV chemically amplified resist: Mechanism of sensitivity improvement

Yannick Vesters, Jing Jiang, Hiroki Yamamoto, Danilo De Simone, Takahiro Kozawa, Stefan De Gendt, Geert Vandenberghe

Proceedings of SPIE - The International Society for Optical Engineering　Vol. 10583　2018　Research paper (international conference proceedings)

Synthesis and Property of Tannic Acid Derivatives and Their Application for Extreme Ultraviolet Laser Lithography System

Hiroto Kudo, Shizuya Ohori, Hiroya Takeda, Hiroki Ogawa, Takeo Watanabe, Hiroki Yamamoto, Takahiro Kozawa

JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY　Vol. 31　No. 2　p. 221-225　2018　Research paper (scientific journal)

Dynamics of Radical Ions of Hydroxyhexafluoroisopropyl-Substituted Benzenes

Kazumasa Okamoto, Naoya Nomura, Ryoko Fujiyoshi, Kikuo Umegaki, Hiroki Yamamoto, Kazuo Kobayashi, Takahiro Kozawa

JOURNAL OF PHYSICAL CHEMISTRY A　Vol. 121　No. 49　p. 9458-9465　2017/12　Research paper (scientific journal)

Theoretical study on effects of exposure pattern width on line edge roughness and stochastic defect generation in fabrication of 16-nm-half-pitch line-And-space patterns by electron beam lithography

Takahiro Kozawa, Takao Tamura

Japanese Journal of Applied Physics　Vol. 56　No. 11　2017/11/01　Research paper (scientific journal)

Theoretical study on sensitivity enhancement in energy-deficit region of chemically amplified resists used for extreme ultraviolet lithography

Takahiro Kozawa, Julius Joseph Santillan, Toshiro Itani

Japanese Journal of Applied Physics　Vol. 56　No. 10　2017/10/01　Research paper (scientific journal)

Excluded volume effects caused by high concentration addition of acid generators in chemically amplified resists used for extreme ultraviolet lithography

Takahiro Kozawa, Kyoko Watanabe, Kyoko Matsuoka, Hiroki Yamamoto, Yoshitaka Komuro, Daisuke Kawana, Akiyoshi Yamazaki

Japanese Journal of Applied Physics　Vol. 56　No. 8　2017/08/01　Research paper (scientific journal)

Ecofriendly ethanol-developable processes for electron beam lithography using positive-tone dextrin resist material

Satoshi Takei, Naoto Sugino, Makoto Hanabata, Akihiro Oshima, Miki Kashiwakura, Takahiro Kozawa, Seiichi Tagawa

Applied Physics Express　Vol. 10　No. 7　2017/07/01　Research paper (scientific journal)

Theoretical study on relationship between exposure pattern width and chemical gradient of 16nm half-pitch line-and-space patterns in electron beam lithography used for photomask and nanoimprint mold production

Takahiro Kozawa, Shusuke Yoshitake

Japanese Journal of Applied Physics　Vol. 56　No. 7　2017/07/01　Research paper (scientific journal)

Angled etching of Si by ClF3-Ar gas cluster injection

Toshio Seki, Hiroki Yamamoto, Takahiro Kozawa, Tadashi Shojo, Kunihiko Koike, Takaaki Aoki, Jiro Matsuo

Japanese Journal of Applied Physics　Vol. 56　No. 6　2017/06/01　Research paper (international conference proceedings)

Formation of Au nanoparticle arrays on hydrogel two-dimensional patterns based on poly(vinylpyrrolidone)

Satoshi Tsukuda, Kazumasa Okamoto, Hiroki Yamamoto, Takahiro Kozawa, Takahisa Omata

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 56　No. 6　2017/06　Research paper (scientific journal)

Sensitivity enhancement of chemically amplified EUV resists by adding acid-generating promoters

Shinya Fujii, Kazumasa Okamoto, Hiroki Yamamoto, Takahiro Kozawa, Toshiro Itani

Japanese Journal of Applied Physics　Vol. 56　No. 6　2017/06/01　Research paper (international conference proceedings)

Shot noise limit of chemically amplified resists with photodecomposable quenchers used for extreme ultraviolet lithography

Takahiro Kozawa, Julius Joseph Santillan, Toshiro Itani

Japanese Journal of Applied Physics　Vol. 56　No. 6　2017/06/01　Research paper (scientific journal)

Fabrication of a Si lever structure made by double-angled etching with reactive gas cluster injection

T. Seki, H. Yamamoto, T. Kozawa, K. Koike, T. Aoki, J. Matsuo

APPLIED PHYSICS LETTERS　Vol. 110　2017/05　Research paper (scientific journal)

Theoretical study on effects of photodecomposable quenchers in line-and-space pattern fabrication with 7 nm quarter-pitch using chemically amplified electron beam resist process,

T. Kozawa,

Jpn. J. Appl. Phys.　Vol. 56　No. 4　p. 046502-46502　2017/04　Research paper (scientific journal)

Synthesis of Metal Nanoparticles and Patterning in Polymeric Films Induced by Electron Nanobeam

Hiroki Yamamoto, Takahiro Kozawa, Seiichi Tagawa, Muneyuki Naito, Jean-Louis Marignier, Mehran Mostafavi, Jacqueline Belloni

JOURNAL OF PHYSICAL CHEMISTRY C　Vol. 121　No. 9　p. 5335-5340　2017/03　Research paper (scientific journal)

The synthesis of YAG:Ce3+ phosphor by mechanical method

Kazuaki Kanai, Yoshifumi Fukui, Takahiro Kozawa, Akira Kondo, Makio Naito

Journal of the Society of Powder Technology, Japan　Vol. 54　No. 1　p. 32-36　2017　Research paper (scientific journal)

Lamellar orientation of block copolymer using polarity switch of nitrophenyl self-Assembled monolayer induced by electron beam

Hiroki Yamamoto, Guy Dawson, Takahiro Kozawa, Alex P. G. Robinson

Proceedings of SPIE - The International Society for Optical Engineering　Vol. 10146　2017　Research paper (international conference proceedings)

Study on Resist Performance of Noria Derivatives Modified with Various Protection Ratios of Acetal Moieties by means of Extreme Ultraviolet Irradiation

Hiroki Yamamoto, Hiroto Kudo, Takahiro Kozawa

JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY　Vol. 30　No. 6　p. 627-631　2017　Research paper (scientific journal)

Synthesis and property of tellurium-containing polymer for extreme ultraviolet resist material

Mari Fukunaga, Hiroki Yamamoto, Takahiro Kozawa, Takeo Watanabe, Hiroto Kudo

Journal of Photopolymer Science and Technology　Vol. 30　No. 1　p. 103-107　2017　Research paper (scientific journal)

Relationship between sensitization distance and photon shot noise in line edge roughness formation of chemically amplified resists used for extreme ultraviolet lithography

Takahiro Kozawa, Julius Joseph Santillan, Toshiro Itani

Journal of Photopolymer Science and Technology　Vol. 30　No. 2　p. 197-203　2017　Research paper (scientific journal)

Rational Tuning of Superoxide Sensitivity in SoxR, the [2Fe-2S] Transcription Factor: Implications of Species-Specific Lysine Residues

Mayu Fujikawa, Kazuo Kobayashi, Yuko Tsutsui, Takahiro Tanaka, Takahiro Kozawa

BIOCHEMISTRY　Vol. 56　No. 2　p. 403-410　2017/01　Research paper (scientific journal)

Relationship between sensitizer concentration and resist performance of chemically amplified extreme ultraviolet resists in sub-10nm half-pitch resolution region

Takahiro Kozawa, Julius Joseph Santillan, Toshiro Itani

Japanese Journal of Applied Physics　Vol. 56　No. 1　2017/01/01　Research paper (scientific journal)

A simplified reaction model and numerical analysis for Si deposition from the SiHCl3-H2 system in vertical rotating disk reactors

Soichiro Makino, Masahide Inagaki, Kenji Nakashima, Takahiro Kozawa, Nariaki Horinouchi

Journal of Crystal Growth　Vol. 454　p. 156-163　2016/11/15　Research paper (scientific journal)

Theoretical study of relationships among resolution, line width roughness, and sensitivity of chemically amplified extreme ultraviolet resists with photodecomposable quenchers

Takahiro Kozawa, Julius Joseph Santillan, Toshiro Itani

Japanese Journal of Applied Physics　Vol. 55　No. 11　2016/11/01　Research paper (scientific journal)

Theoretical study of fabrication of line-and-space patterns with 7 nm quarter-pitch using electron beam lithography with chemically amplified resist process: V. Optimum beam size

Takahiro Kozawa

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 55　No. 10　2016/10　Research paper (scientific journal)

Analysis of line-and-space resist patterns with sub-20nm half-pitch fabricated using high-numerical-aperture exposure tool of extreme ultraviolet lithography

Takahiro Kozawa, Julius Joseph Santillan, Toshiro Itani

Japanese Journal of Applied Physics　Vol. 55　No. 9　2016/09/01　Research paper (scientific journal)

Structural Control of Hybrid Colloidal Particle Surface by Plasma-etching Treatment

Akira Ohnuma, Hiroki Yamamoto, Takahiro Kozawa, Bunsho Ohtani

CHEMISTRY LETTERS　Vol. 45　No. 8　p. 979-981　2016/08　Research paper (scientific journal)

Dynamics of radical cations of poly(4-hydroxystyrene) in the presence and absence of triphenylsulfonium triflate as determined by pulse radiolysis of its highly concentrated solution

Kazumasa Okamoto, Takuya Ishida, Hiroki Yamamoto, Takahiro Kozawa, Ryoko Fujiyoshi, Kikuo Umegaki

Chemical Physics Letters　Vol. 657　p. 44-48　2016/07/16　Research paper (scientific journal)

Chemically amplified molecular resists based on noria derivatives containing adamantyl ester groups for electron beam lithography

Hiroki Yamamoto, Seiichi Tagawa, Takahiro Kozawa, Hiroto Kudo, Kazumasa Okamoto

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B　Vol. 34　No. 4　2016/07　Research paper (scientific journal)

Analysis of stochastic effects in chemically amplified poly(4-hydroxystyrene-co-t-butyl methacrylate) resist

Takahiro Kozawa, Julius Joseph Santillan, Toshiro Itani

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 55　No. 7　2016/07　Research paper (scientific journal)

Theoretical study of fabrication of line-and-space patterns with 7 nm quarter-pitch using electron beam lithography with chemically amplified resist process: IV. Comparison with experimental results

Takahiro Kozawa

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 55　No. 5　2016/05　Research paper (scientific journal)

Effect of thermalization distance on stochastic phenomena in 7-nm-half-pitch line-and-space pattern fabrication using chemically amplified extreme ultraviolet resists

Takahiro Kozawa, Julius Joseph Santillan, Toshiro Itani

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 55　No. 2　2016/02　Research paper (scientific journal)

Optical trapping of nanoparticles on a silicon subwavelength grating and their detection by an ellipsometric technique

Naoya Taki, Yasuhiro Mizutani, Tetsuo Iwata, Takao Kojima, Hiroki Yamamoto, Takahiro Kozawa

International Journal of Optomechatronics　Vol. 10　No. 1　p. 24-31　2016/01/02　Research paper (scientific journal)

Advances in fast epitaxial growth of 4H-SiC and defect reduction

Hidekazu Tsuchida, Isaho Kamata, Masahiko Ito, Tetsuya Miyazawa, Hideyuki Uehigashi, Keisuke Fukada, Hiroaki Fujibayashi, Masami Naitou, Kazukuni Hara, Hiroshi Osawa, Toshikazu Sugiura, Takahiro Kozawa

Materials Science Forum　Vol. 858　p. 119-124　2016　Research paper (international conference proceedings)

Analysis and reduction of stacking faults in fast epitaxial growth

Hideyuki Uehigashi, Keisuke Fukada, Masahiko Ito, Isaho Kamata, Hiroaki Fujibayashi, Masami Naitou, Kazukuni Hara, Hiroshi Osawa, Takahiro Kozawa, Hidekazu Tsuchida

Materials Science Forum　Vol. 858　p. 173-176　2016　Research paper (international conference proceedings)

Chemical reaction pathways for MOVPE growth of aluminum nitride

Yumi Inagaki, Takahiro Kozawa

ECS Journal of Solid State Science and Technology　Vol. 5　No. 2　p. P73-P75　2016　Research paper (scientific journal)

Requirement for Suppression of Line Width Roughness in Fabrication of Line-and-Space Patterns with 7 nm Quarter-Pitch Using Electron Beam Lithography with Chemically Amplified Resist Process

Takahiro Kozawa

JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY　Vol. 29　No. 6　p. 809-816　2016　Research paper (scientific journal)

Controlled Array of Gold Nanoparticles by Combination of Nano Imprint and Self-assembly

Hiroki Yamamoto, Akira Ohnuma, Bunsho Ohtani, Takahiro Kozawa

JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY　Vol. 29　No. 5　p. 765-768　2016　Research paper (scientific journal)

Synthesis and Resist Properties of Calixarene Polymers with Pendant Haloalkyl Groups

Hiroto Kudo, Hiroki Ogawa, Hiroki Yamamoto, Takahiro Kozawa

JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY　Vol. 29　No. 3　p. 495-500　2016　Research paper (scientific journal)

Challenges in Development of Sub-10 nm Resist Materials

Takahiro Kozawa, Julius Joseph Santillan, Toshiro Itani

JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY　Vol. 29　No. 5　p. 717-723　2016　Research paper (scientific journal)

Optimum concentration ratio of photodecomposable quencher to acid generator in chemically amplified extreme ultraviolet resists

Takahiro Kozawa

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 54　No. 12　2015/12　Research paper (scientific journal)

Shot noise limit of sensitivity of chemically amplified resists used for extreme ultraviolet lithography

Shinya Fujii, Takahiro Kozawa, Kazumasa Okamoto, Julius Joseph Santillan, Toshiro Itani

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 54　No. 11　2015/11　Research paper (scientific journal)

Quencher diffusion in chemically amplified poly(4-hydroxystyrene-co-t-butyl methacrylate) resist

Takahiro Kozawa, Julius Joseph Santillan, Toshiro Itani

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 54　No. 11　2015/11　Research paper (scientific journal)

Synthesis of hyperbranched polyacetals via a(n)+b(2)-type polyaddition (n=3, 8, 18, and 21): Candidate resists for extreme ultraviolet lithography

Hiroto Kudo, Shuhei Matsubara, Hiroki Yamamoto, Takahiro Kozawa

JOURNAL OF POLYMER SCIENCE PART A-POLYMER CHEMISTRY　Vol. 53　No. 20　p. 2343-2350　2015/10　Research paper (scientific journal)

Theoretical study of fabrication of line-and-space patterns with 7 nm quarter-pitch using electron beam lithography with chemically amplified resist process: III. Post exposure baking on quartz substrates

Takahiro Kozawa

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 54　No. 9　2015/09　Research paper (scientific journal)

Theoretical study of fabrication of line-and-space patterns with 7 nm quarter-pitch using electron beam lithography with chemically amplified resist processes: II. Stochastic effects

Takahiro Kozawa

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 54　No. 9　2015/09　Research paper (scientific journal)

Resist material options for extreme ultraviolet lithography

Takahiro Kozawa

Advanced Optical Technologies　Vol. 4　No. 4　p. 311-317　2015/08/01　Research paper (scientific journal)

Relationship between information and energy carried by photons in extreme ultraviolet lithography: Consideration from the viewpoint of sensitivity enhancement

Shinya Fujii, Takahiro Kozawa, Kazumasa Okamoto, Julius Joseph Santillan, Toshiro Itani

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 54　No. 8　2015/08　Research paper (scientific journal)

Study on radiation chemistry of fluorinated polymers for EUV resist

Naoya Nomura, Kazumasa Okamoto, Hiroki Yamamoto, Takahiro Kozawa, Ryoko Fujiyoshi, Kikuo Umegaki

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 54　No. 6　2015/06　Research paper (scientific journal)

Effect of thermalization distance on chemical gradient of line-and-space patterns with 7 nm half-pitch in chemically amplified extreme ultraviolet resists

Takahiro Kozawa, Julius Joseph Santillan, Toshiro Itani

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 54　No. 6　2015/06　Research paper (scientific journal)

High-aspect-ratio patterning by ClF3-Ar neutral cluster etching

Hiroki Yamamoto, Toshio Seki, Jiro Matsuo, Kunihiko Koike, Takahiro Kozawa

MICROELECTRONIC ENGINEERING　Vol. 141　p. 145-149　2015/06　Research paper (scientific journal)

Redox-dependent DNA distortion in a SoxR protein-promoter complex studied using fluorescent probes

Mayu Fujikawa, Kazuo Kobayashi, Takahiro Kozawa

JOURNAL OF BIOCHEMISTRY　Vol. 157　No. 5　p. 389-397　2015/05　Research paper (scientific journal)

Effects of diffusion constant of photodecomposable quencher on chemical gradient of chemically amplified extreme-ultraviolet resists

Takahiro Kozawa

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 54　No. 5　2015/05　Research paper (scientific journal)

Theoretical study of fabrication of line-and-space patterns with 7 nm quarter-pitch (7 nm space width and 21 nm line width) using electron beam lithography with chemically amplified resist processes: I. Relationship between sensitivity and chemical gradient

Takahiro Kozawa

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 54　No. 5　2015/05　Research paper (scientific journal)

Feasibility study of sub-10-nm-half-pitch fabrication by chemically amplified resist processes of extreme ultraviolet lithography: II. Stochastic effects

Takahiro Kozawa, Julius Joseph Santillan, Toshiro Itani

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 54　No. 3　2015/03　Research paper (scientific journal)

Modeling and simulation of acid generation in anion-bound chemically amplified resists used for extreme ultraviolet lithography

Yoshitaka Komuro, Daisuke Kawana, Taku Hirayama, Katsumi Ohomori, Takahiro Kozawa

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 54　No. 3　2015/03　Research paper (scientific journal)

Pulse radiolysis study of polystyrene-based polymers with added photoacid generators: Reaction mechanism of extreme-ultraviolet and electron-beam chemically amplified resist

Kazunnasa Okamoto, Hiroki Yamamoto, Takahiro Kozawa, Ryoko Fujiyoshi, Kikuo Umegaki

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 54　No. 2　2015/02　Research paper (scientific journal)

Study on resist performance of chemically amplified molecular resists based on cyclic oligomers

Hiroki Yamamoto, Hiroto Kudo, Takahiro Kozawa

MICROELECTRONIC ENGINEERING　Vol. 133　p. 16-22　2015/02　Research paper (scientific journal)

Acid generation mechanism in anion-bound chemically amplified resists used for extreme ultraviolet lithography

Yoshitaka Komuro, Hiroki Yamamoto, Kazuo Kobayashi, Katsumi Ohmori, Takahiro Kozawa

EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY VI　Vol. 9422　2015　Research paper (international conference proceedings)

Relationship between Thermalization Distance and Line Edge Roughness in Sub-10 nm Fabrication Using Extreme Ultraviolet Lithography

Takahiro Kozawa, Julius Joseph Santillan, Toshiro Itani

JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY　Vol. 28　No. 5　p. 669-675　2015　Research paper (scientific journal)

Acid Quantum Efficiency of Anion-bound Chemically Amplified Resists upon Exposure to Extreme Ultraviolet Radiation

Yoshitaka Komuro, Daisuke Kawana, Taku Hirayama, Katsumi Ohmori, Takahiro Kozawa

JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY　Vol. 28　No. 4　p. 501-505　2015　Research paper (scientific journal)

Synthesis and Resist Properties of Hyperbranched Polyacetals

Hiroto Kudo, Shuhei Matsubara, Hiroki Yamamoto, Takahiro Kozawa

JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY　Vol. 28　No. 1　p. 125-129　2015　Research paper (scientific journal)

Study on Dissolution Behavior of Poly(4-hydroxystyrene) as Model Polymer of Chemically Amplified Resists for Extreme Ultraviolet Lithography

Masaki Mitsuyasu, Hiroki Yamamoto, Takahiro Kozawa

JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY　Vol. 28　No. 1　p. 119-124　2015　Research paper (scientific journal)

Binding of Promoter DNA to SoxR Protein Decreases the Reduction Potential of the [2Fe-2S] Cluster

Kazuo Kobayashi, Maya Fujikawa, Takahiro Kozawa

BIOCHEMISTRY　Vol. 54　No. 2　p. 334-339　2015/01　Research paper (scientific journal)

Effects of dose shift on line width, line edge roughness, and stochastic defect generation in chemically amplified extreme ultraviolet resist with photodecomposable quencher

Takahiro Kozawa

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 54　No. 1　2015/01　Research paper (scientific journal)

Relationships between quencher diffusion constant and exposure dose dependences of line width, line edge roughness, and stochastic defect generation in extreme ultraviolet lithography

Takahiro Kozawa

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 54　No. 1　2015/01　Research paper (scientific journal)

Application of natural linear polysaccharide to green resist polymers for electron beam and extreme-ultraviolet lithography

Satoshi Takei, Akihiro Oshima, Tomoko G. Oyama, Kenta Ito, Kigen Sugahara, Miki Kashiwakura, Takahiro Kozawa, Seiichi Tagawa, Makoto Hanabata

Japanese Journal of Applied Physics　Vol. 53　No. 11　2014/11/01　Research paper (scientific journal)

Effects of deprotonation efficiency of protected units on line edge roughness and stochastic defect generation in chemically amplified resist processes for 11 nm node of extreme ultraviolet lithography

Takahiro Kozawa, Julius Joseph Santillan, Toshiro Itani

Japanese Journal of Applied Physics　Vol. 53　No. 11　2014/11/01　Research paper (scientific journal)

Acid generation mechanism in anion-bound chemically amplified resists used for extreme ultraviolet lithography

Yoshitaka Komuro, Hiroki Yamamoto, Kazuo Kobayashi, Yoshiyuki Utsumi, Katsumi Ohomori, Takahiro Kozawa

Japanese Journal of Applied Physics　Vol. 53　No. 11　2014/11/01　Research paper (scientific journal)

Study on dissolution behavior of polymer-bound and polymer-blended photo acid generator (PAG) resists by using quartz crystal microbalance (QCM) method

Hiroki Yamamoto, Takahiro Kozawa, Seiichi Tagawa

MICROELECTRONIC ENGINEERING　Vol. 129　p. 65-69　2014/11　Research paper (scientific journal)

A pulse radiolysis study of the dynamics of ascorbic acid free radicals within a liposomal environment.

Kazuo Kobayashi, Yumiko Seike, Akinori Saeki, Takahiro Kozawa, Fusako Takeuchi, Motonari Tsubaki

Chemphyschem : a European journal of chemical physics and physical chemistry　Vol. 15　No. 14　p. 2994-7　2014/10/06　Research paper (scientific journal)

Feasibility study of sub-10-nm half-pitch fabrication by chemically amplified resist processes of extreme ultraviolet lithography: I. Latent image quality predicted by probability density model

Takahiro Kozawa, Julius Joseph Santillan, Toshiro Itani

Japanese Journal of Applied Physics　Vol. 53　No. 10　2014/10/01　Research paper (scientific journal)

Relationships between stochastic phenomena and optical contrast in chemically amplified resist process of extreme ultraviolet lithography

Takahiro Kozawa, Julius Joseph Santillan, Toshiro Itani

Journal of Photopolymer Science and Technology　Vol. 27　No. 1　p. 11-19　2014/08/08　Research paper (scientific journal)

Organic solvent-free water-developable sugar resist material derived from biomass in green lithography

Satoshi Takei, Akihiro Oshima, Takumi Ichikawa, Atsushi Sekiguchi, Miki Kashiwakura, Takahiro Kozawa, Seiichi Tagawa, Tomoko G. Oyama, Syoji Ito, Hiroshi Miyasaka

Microelectronic Engineering　Vol. 122　p. 70-76　2014/06/25　Research paper (scientific journal)

Controlled arrangement of nanoparticles capped with protecting ligand on Au nanopatterns

Hiroki Yamamoto, Akira Ohnuma, Bunsho Ohtani, Takahiro Kozawa

MICROELECTRONIC ENGINEERING　Vol. 121　p. 108-112　2014/06　Research paper (scientific journal)

Organic solvent-free sugar-based transparency nanopatterning material derived from biomass for eco-friendly optical biochips using green lithography

Satoshi Takei, Akihiro Oshima, Tomoko G. Oyama, Kenta Ito, Kigenn Sugahara, Miki Kashiwakura, Takahiro Kozawa, Seiichi Tagawa

Proceedings of SPIE - The International Society for Optical Engineering　Vol. 9129　2014　Research paper (international conference proceedings)

EUV resist simulation based on process parameters of pattern formation reaction

Norihiko Sugie, Toshiro Itani, Takahiro Kozawa

Proceedings of SPIE - The International Society for Optical Engineering　Vol. 9048　2014　Research paper (international conference proceedings)

Electron and hole transfer in anion-bound chemically amplified resists used in extreme ultraviolet lithography

Yoshitaka Komuro, Hiroki Yamamoto, Yoshiyuki Utsumi, Katsumi Ohmori, Takahiro Kozawa

Proceedings of SPIE - The International Society for Optical Engineering　Vol. 9048　2014　Research paper (international conference proceedings)

Simulation study of high-speed wafer rotation effects in a vertical reactor for 4H-SiC epitaxial growth on 150 mm substrates

M. Ito, H. Fujibayashi, H. Ito, I. Kamata, M. Naito, K. Hara, S. Yamauchi, K. Suzuki, M. Yajima, S. Mitani, K. Suzuki, H. Aoki, K. Nishikawa, T. Kozawa, H. Tsuchida

Materials Science Forum　Vol. 778-780　p. 171-174　2014　Research paper (international conference proceedings)

Fast 4H-SiC epitaxial growth on 150 mm diameter area with high-speed wafer rotation

H. Fujibayashi, M. Ito, H. Ito, I. Kamata, M. Naito, K. Hara, S. Yamauchi, K. Suzuki, M. Yajima, S. Mitani, K. Suzuki, H. Aoki, K. Nishikawa, T. Kozawa, H. Tsuchida

Materials Science Forum　Vol. 778-780　p. 117-120　2014　Research paper (international conference proceedings)

Development of RAF quality 150mm 4H-SiC wafer

H. Kondo, H. Takaba, M. Yamada, Y. Urakami, T. Okamoto, M. Kobayashi, T. Masuda, I. Gunjishima, K. Shigeto, N. Ooya, N. Sugiyama, A. Matsuse, T. Kozawa, T. Sato, F. Hirose, S. Yamauchi, S. Onda

Materials Science Forum　Vol. 778-780　p. 17-21　2014　Research paper (international conference proceedings)

Development of a 150mm 4H-SiC epitaxial reactor with high-speed wafer rotation

Hiroaki Fujibayashi, Masahiko Ito, Hideki Ito, Isaho Kamata, Masami Naito, Kazukuni Hara, Shoichi Yamauchi, Kunihiko Suzuki, Masayoshi Yajima, Shinichi Mitani, Katsumi Suzuki, Hirofumi Aoki, Koichi Nishikawa, Takahiro Kozawa, Hidekazu Tsuchida

Applied Physics Express　Vol. 7　No. 1　2014/01　Research paper (scientific journal)

Conductivity of poly(2-methoxyaniline-5-phosphonic acid)/amine complex and its charge dissipation property in electron beam lithography

Toru Amaya, Yasushi Abe, Hiroki Yamamoto, Takahiro Kozawa, Toshikazu Hirao

Synthetic Metals　Vol. 198　p. 88-92　2014　Research paper (scientific journal)

Position control of metal nanoparticles by self-assembly

Hiroki Yamamoto, Akira Ohnuma, Bunsho Ohtani, Takahiro Kozawa

Journal of Photopolymer Science and Technology　Vol. 27　No. 2　p. 243-247　2014　Research paper (scientific journal)

Effect of molecular weight and protection ratio on line edge roughness and stochastic defect generation in chemically amplified resist processes of extreme ultraviolet lithography

Takahiro Kozawa, Julius Joseph Santillan, Toshiro Itani

Japanese Journal of Applied Physics　Vol. 53　No. 8　2014　Research paper (scientific journal)

Dependence of stochastic defect generation on quantum efficiency of acid generation and effective reaction radius for deprotection in chemically amplified resist process using extreme ultraviolet lithography

Takahiro Kozawa, Julius Joseph Santillan, Toshiro Itani

Japanese Journal of Applied Physics　Vol. 53　No. 7　2014　Research paper (scientific journal)

Effect of photodecomposable quencher on latent image quality in extreme ultraviolet lithography

Takahiro Kozawa

Japanese Journal of Applied Physics　Vol. 53　No. 6　2014　Research paper (scientific journal)

Effects of effective reaction radius for neutralization on performance of chemically amplified resists

Takahiro Kozawa, Julius Joseph Santillan, Toshiro Itani

Japanese Journal of Applied Physics　Vol. 53　No. 6　2014　Research paper (international conference proceedings)

Mechanistic studies on formation of the dinitrosyl iron complex of the [2Fe-2S] cluster of SoxR protein

Mayu Fujikawa, Kazuo Kobayashi, Takahiro Kozawa

Journal of Biochemistry　Vol. 156　No. 3　p. 163-172　2014　Research paper (scientific journal)

Relationship between stochasticity and wavelength of exposure source in lithography

Takahiro Kozawa

Japanese Journal of Applied Physics　Vol. 53　No. 6　2014　Research paper (scientific journal)

Theoretical study on stochastic defect generation in chemically amplified resist process for extreme ultraviolet lithography

Takahiro Kozawa, Julius Joseph Santillan, Toshiro Itani

Japanese Journal of Applied Physics　Vol. 53　No. 6　2014　Research paper (scientific journal)

Theoretical relationship between quencher diffusion constant and effective reaction radius for neutralization in contact hole imaging using chemically amplified extreme ultraviolet resists

Takahiro Kozawa, Taku Hirayama

Japanese Journal of Applied Physics　Vol. 53　No. 6　2014　Research paper (scientific journal)

Stochastic effects in 11nm imaging of extreme ultraviolet lithography with chemically amplified resists

Takahiro Kozawa, Julius Joseph Santillan, Toshiro Itani

Japanese Journal of Applied Physics　Vol. 53　No. 3　2014　Research paper (scientific journal)

Acid diffusion length in contact hole imaging of chemically amplified extreme ultraviolet resists

Takahiro Kozawa, Taku Hirayama

Japanese Journal of Applied Physics　Vol. 53　No. 1　2014/01　Research paper (scientific journal)

Oxidative stress sensing by the iron-sulfur cluster in the transcription factor, SoxR

Kazuo Kobayashi, Mayu Fujikawa, Takahiro Kozawa

Journal of Inorganic Biochemistry　Vol. 133　p. 87-91　2014　Research paper (scientific journal)

Formation of nanoscale reaction field using combination of top-down and bottom-up nanofabricaiton

Hiroki Yamamoto, Akira Ohnuma, Bunsho Ohtani, Takahiro Kozawa

MICROELECTRONIC ENGINEERING　Vol. 110　p. 369-373　2013/10　Research paper (scientific journal)

Radiation-induced synthesis of metal nanoparticles in ethers THF and PGMEA

H. Yamamoto, T. Kozawa, S. Tagawa, M. Naito, J. L. Marignier, M. Mostafavi, J. Belloni

Radiation Physics and Chemistry　Vol. 91　p. 148-155　2013/10　Research paper (scientific journal)

Stochastic effect on contact hole imaging of chemically amplified extreme ultraviolet resists

Takahiro Kozawa, Taku Hirayama

Japanese Journal of Applied Physics　Vol. 52　No. 8　2013/08　Research paper (scientific journal)

Acid Diffusion Length in Line-and-Space Resist Patterns Fabricated by Extreme Ultraviolet Lithography

Takahiro Kozawa, Julius Joseph Santillan, Toshiro Itani

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 52　No. 7　2013/07　Research paper (scientific journal)

Relationship between Defects and Stochastic Effect in Chemically Amplified Resists Used for Extreme Ultraviolet Lithography

Takahiro Kozawa, Julius Joseph Santillan, Toshiro Itani

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 52　No. 7　2013/07　Research paper (scientific journal)

Deprotonation of Poly(4-hydroxystyrene) Intermediates: Pulse Radiolysis Study of Extreme Ultraviolet and Electron Beam Resist

Kazumasa Okamoto, Ryo Matsuda, Hiroki Yamamoto, Takahiro Kozawa, Seiichi Tagawa, Ryoko Fujiyoshi, Takashi Sumiyoshi

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 52　No. 6　2013/06　Research paper (scientific journal)

Chemical Gradient of Contact Hole Latent Image Created in Chemically Amplified Extreme Ultraviolet Resists

Takahiro Kozawa, Taku Hirayama

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 52　No. 4　2013/04　Research paper (scientific journal)

Femtosecond pulse radiolysis study of geminate ion recombination in biphenyl-dodecane solution

Takafumi Kondoh, Jinfeng Yang, Kimihiro Norizawa, Koichi Kan, Takahiro Kozawa, Atsushi Ogata, Seiichi Tagawa, Yoichi Yoshida

Radiation Physics and Chemistry　Vol. 84　p. 30-34　2013/03　Research paper (scientific journal)

Analysis of Stochastic Effect in Line-and-Space Resist Patterns Fabricated by Extreme Ultraviolet Lithography

Takahiro Kozawa, Julius Joseph Santillan, Toshiro Itani

APPLIED PHYSICS EXPRESS　Vol. 6　No. 2　2013/02　Research paper (scientific journal)

ナノコンポジット材料の分散状態評価のためのナノ粒子検出システムの開発

滝 直也, 水谷 康弘, 岩田 哲郎, 小嶋 崇夫, 山本 洋揮, 古澤 孝弘

精密工学会学術講演会講演論文集　Vol. 2013　p. 419-420　2013

Effect of initial dispersion of protected units on line edge roughness of chemically amplified extreme ultraviolet resists

Takahiro Kozawa

Journal of Photopolymer Science and Technology　Vol. 26　No. 5　p. 643-648　2013　Research paper (scientific journal)

Controlled array of silver nanoparticles on nanopatterns

Hiroki Yamamoto, Akira Ohnuma, Bunsho Ohtani, Takahiro Kozawa

Journal of Photopolymer Science and Technology　Vol. 26　No. 4　p. 495-499　2013　Research paper (scientific journal)

Theoretical relationship between quencher diffusion constant and image quality in chemically amplified resists used for extreme ultraviolet lithography

Takahiro Kozawa

Japanese Journal of Applied Physics　Vol. 52　No. 7　2013/01　Research paper (scientific journal)

Electron and Hole Transfer in Anion-Bound Chemically Amplified Resists Used in Extreme Ultraviolet Lithography

Yoshitaka Komuro, Hiroki Yamamoto, Yoshiyuki Utsumi, Katsumi Ohomori, Takahiro Kozawa

APPLIED PHYSICS EXPRESS　Vol. 6　No. 1　2013/01　Research paper (scientific journal)

Theoretical Study on Acid Diffusion Length in Chemically Amplified Resists Used for Extreme Ultraviolet Lithography

Takahiro Kozawa

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 52　No. 1　2013/01　Research paper (scientific journal)

Resist materials and processes for extreme ultraviolet lithography

Toshiro Itani, Takahiro Kozawa

Japanese Journal of Applied Physics　Vol. 52　No. 1　2013/01　Research paper (scientific journal)

Effect of Molecular Weight and Protection Ratio on Latent Image Fluctuation of Chemically Amplified Extreme Ultraviolet Resists

Takahiro Kozawa

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 51　No. 12　2012/12　Research paper (scientific journal)

Stochastic Effect of Acid Catalytic Chain Reaction in Chemically Amplified Extreme Ultraviolet Resists

Takahiro Kozawa

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 51　No. 11　2012/11　Research paper (scientific journal)

Direct Oxidation of the [2Fe-2S] Cluster in SoxR Protein by Superoxide DISTINCT DIFFERENTIAL SENSITIVITY TO SUPEROXIDE-MEDIATED SIGNAL TRANSDUCTION

Mayu Fujikawa, Kazuo Kobayashi, Takahiro Kozawa

JOURNAL OF BIOLOGICAL CHEMISTRY　Vol. 287　No. 42　p. 35702-35708　2012/10　Research paper (scientific journal)

Resist Properties Required for 6.67 nm Extreme Ultraviolet Lithography

Takahiro Kozawa, Andreas Erdmann

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 51　No. 10　2012/10　Research paper (scientific journal)

Dependence of Dissolution Point on Pattern Size of Chemically Amplified Extreme Ultraviolet Resist

Takahiro Kozawa, Julius Joseph Santillan, Toshiro Itani

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 51　No. 10　2012/10　Research paper (scientific journal)

Effect of Ultrahigh-Density Ionization of Resist Films on Sensitivity Using Extreme-Ultraviolet Free-Electron Laser

Kazumasa Okamoto, Takahiro Kozawa, Keita Oikawa, Takaki Hatsui, Mitsuru Nagasono, Takashi Kameshima, Tadashi Togashi, Kensuke Tono, Makina Yabashi, Hiroaki Kimura, Yasunori Senba, Haruhiko Ohashi, Ryoko Fujiyoshi, Takashi Sumiyoshi

APPLIED PHYSICS EXPRESS　Vol. 5　No. 9　2012/09　Research paper (scientific journal)

Relationship between Stochastic Effect and Line Edge Roughness in Chemically Amplified Resists for Extreme Ultraviolet Lithography Studied by Monte Carlo Simulation

Takahiro Kozawa

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 51　No. 8　2012/08　Research paper (scientific journal)

Modeling and Simulation of Acid Diffusion in Chemically Amplified Resists with Polymer-Bound Acid Generator

Takahiro Kozawa, Julius Joseph Santillan, Toshiro Itani

APPLIED PHYSICS EXPRESS　Vol. 5　No. 7　2012/07　Research paper (scientific journal)

Eco-friendly electron beam lithography using water-developable resist material derived from biomass

Satoshi Takei, Akihiro Oshima, Takanori Wakabayashi, Takahiro Kozawa, Seiichi Tagawa

APPLIED PHYSICS LETTERS　Vol. 101　No. 3　2012/07　Research paper (scientific journal)

Lower Limit of Line Edge Roughness in High-Dose Exposure of Chemically Amplified Extreme Ultraviolet Resists

Takahiro Kozawa

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 51　No. 6　2012/06　Research paper (scientific journal)

Acid Generation Mechanism for Extreme Ultraviolet Resists Containing Pinanediol Monosulfonate Acid Amplifiers: A Pulse Radiolysis Study

Kazuyuki Enomoto, Koji Arimitsu, Atsutaro Yoshizawa, Ravi Joshi, Hiroki Yamamoto, Akihiro Oshima, Takahiro Kozawa, Seiichi Tagawa

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 51　No. 4　2012/04　Research paper (scientific journal)

Ellipsometerical detection of optical trapped nano-particles by periodically localized light

Naoya Taki, Yasuhiro Mizutani, Tetsuo Iwata, Takao Kojima, Hiroki Yamamoto, Takahiro Kozawa

OPTICAL MICRO- AND NANOMETROLOGY IV　Vol. 8430　2012　Research paper (international conference proceedings)

Dissolution Kinetics in Polymer-Bound and Polymer-Blended Photo-Acid Generators

Hiroki Yamamoto, Takahiro Kozawa, Seiichi Tagawa

JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY　Vol. 25　No. 5　p. 693-698　2012　Research paper (scientific journal)

Location Control of Nanoparticles Using Combination of Top-down and Bottom-up Nano-fabrication

Hiroki Yamamoto, Akira Ohnuma, Takahiro Kozawa, Bunsho Ohtani

JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY　Vol. 25　No. 4　p. 449-453　2012　Research paper (scientific journal)

Relationship between Absorption Coefficient and Line Edge Roughness of Chemically Amplified Resists Used for Extreme Ultraviolet Lithography

Takahiro Kozawa

JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY　Vol. 25　No. 5　p. 625-631　2012　Research paper (scientific journal)

Modeling and Simulation of Acid Diffusion in Chemically Amplified Resists with Polymer-Bound Acid Generator

Takahiro Kozawa, Julius Joseph Santillan, Toshiro Itani

EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY III　Vol. 8322　2012　Research paper (international conference proceedings)

Wavelength dependence of lithography resolution in extreme ultraviolet region

Takahiro Kozawa, Toshiro Itani

Applied Physics Express　Vol. 4　No. 12　2011/12　Research paper (scientific journal)

Analysis of dose-pitch matrices of line width and edge roughness of chemically amplified fullerene resist

Takahiro Kozawa, Hiroaki Oizumi, Toshiro Itani, Seiichi Tagawa

Japanese Journal of Applied Physics　Vol. 50　No. 12　2011/12　Research paper (scientific journal)

Theoretical study of exposure latitude of chemically amplified resists used for extreme ultraviolet lithography

Takahiro Kozawa, Seiichi Tagawa

Japanese Journal of Applied Physics　Vol. 50　No. 10　2011/10　Research paper (scientific journal)

Electron beam lithography using highly sensitive negative type of plant-based resist material derived from biomass on hardmask layer

Satoshi Takei, Akihiro Oshima, Atsushi Sekiguchi, Naomi Yanamori, Miki Kashiwakura, Takahiro Kozawa, Seiichi Tagawa

Applied Physics Express　Vol. 4　No. 10　2011/10　Research paper (scientific journal)

Geminate charge recombination in liquid alkane with concentrated CCl 4: Effects of CCl4 radical anion and narrowing of initial distribution of Cl-

Akinori Saeki, Naoto Yamamoto, Yoichi Yoshida, Takahiro Kozawa

Journal of Physical Chemistry A　Vol. 115　No. 36　p. 10166-10173　2011/09/15　Research paper (scientific journal)

Assessment and extendibility of chemically amplified resists for extreme ultraviolet lithography: Consideration of nanolithography beyond 22nm half-pitch

Takahiro Kozawa, Hiroaki Oizumi, Toshiro Itani, Seiichi Tagawa

Japanese Journal of Applied Physics　Vol. 50　No. 7　2011/07　Research paper (scientific journal)

Effect of acid generator decomposition during exposure on acid image quality of chemically amplified extreme ultraviolet resists

Takahiro Kozawa, Seiichi Tagawa

Japanese Journal of Applied Physics　Vol. 50　No. 7　2011/07　Research paper (scientific journal)

Dynamics of radical cation of poly(styrene acrylate)-based chemically amplified resist for extreme ultraviolet and electron beam lithography

Yasuharu Tajima, Kazumasa Okamoto, Takahiro Kozawa, Seiichi Tagawa, Ryoko Fujiyoshi, Takashi Sumiyoshi

Japanese Journal of Applied Physics　Vol. 50　No. 6　2011/06　Research paper (scientific journal)

Relationship of electron diffusion length to line edge roughness in chemically amplified extreme ultraviolet resists

Takahiro Kozawa, Seiichi Tagawa

Japanese Journal of Applied Physics　Vol. 50　No. 3　2011/03　Research paper (scientific journal)

Thermalization distance of electrons generated in poly(4-hydroxystyrene) film containing acid generator upon exposure to extreme ultraviolet radiation

Takahiro Kozawa, Seiichi Tagawa

Japanese Journal of Applied Physics　Vol. 50　No. 3　2011/03　Research paper (scientific journal)

Optimum dissolution point of chemically amplified resists in terms of trade-off relationships between resolution, line edge roughness, and sensitivity

Takahiro Kozawa, Hiroki Yamamoto, Seiichi Tagawa

Japanese Journal of Applied Physics　Vol. 50　No. 2　2011/02　Research paper (scientific journal)

Feasibility study of chemically amplified resists for short wavelength extreme ultraviolet lithography

Takahiro Kozawa, Andreas Erdmann

Applied Physics Express　Vol. 4　No. 2　2011/02　Research paper (scientific journal)

Optical trapping system for sub-nano particles using periodic localized light

Taki Naoya, Mizutani Yasuhiro, Iwata Tetsuo, Kozima Takao, Kozawa Takahiro

Proceedings of JSPE Semestrial Meeting　Vol. 2011　p. 778-779　2011

Fundamental study on reaction mechanisms in chemically amplified extreme ultraviolet resists by using 61nm free-electron laser

Kazumasa Okamoto, Takahiro Kozawa, Takaki Hatsui, Yasuharu Tajima, Keita Oikawa, Mitsuru Nagasono, Takashi Kameshima, Tadashi Togashi, Kensuke Tono, Makina Yabashi, Hiroaki Kimura, Yasunori Senba, Haruhiko Ohashi, Takashi Sumiyoshi

Proceedings of SPIE - The International Society for Optical Engineering　Vol. 7972　2011　Research paper (international conference proceedings)

Dissolution Kinetics in Chemically Amplified EUV Resist

Hiroki Yamamoto, Takahiro Kozawa, Seiichi Tagawa, Takeyoshi Mimura, Takeshi Iwai, Junichi Onodera

JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY　Vol. 24　No. 4　p. 405-410　2011　Research paper (scientific journal)

Determination of optimum thermalization distance based on trade-off relationship between resolution, line edge roughness, and sensitivity of chemically amplified extreme ultraviolet resists

Takahiro Kozawaa, Seiichi Tagawa

Journal of Photopolymer Science and Technology　Vol. 24　No. 2　p. 137-142　2011　Research paper (scientific journal)

Backexposure effect in chemically amplified resist process upon exposure to extreme ultraviolet radiation

Takahiro Kozawa, Seiichi Tagawa, Ryuji Ohnishi, Takafumi Endo, Rikimaru Sakamoto

Japanese Journal of Applied Physics　Vol. 50　No. 1　2011/01　Research paper (scientific journal)

Resist Parameter Extraction from Line-and-Space Patterns of Chemically Amplified Resist for Extreme Ultraviolet Lithography

Takahiro Kozawa, Hiroaki Oizumi, Toshiro Itani, Seiichi Tagawa

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 49　No. 11　2010/11　Research paper (scientific journal)

Simulation study of sub-femtosecond electron bunch generation using photocathode RF gun linac

K. Kan, J. Yang, T. Kondoh, K. Norizawa, A. Ogata, T. Kozawa, Y. Yoshida

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT　Vol. 622　No. 1　p. 35-40　2010/10　Research paper (scientific journal)

Formation and Decay of Fluorobenzene Radical Anions Affected by Their Isomeric Structures and the Number of Fluorine Atoms

Saki Higashino, Akinori Saeki, Kazumasa Okamoto, Seiichi Tagawa, Takahiro Kozawa

JOURNAL OF PHYSICAL CHEMISTRY A　Vol. 114　No. 31　p. 8069-8074　2010/08　Research paper (scientific journal)

Reconstruction of Latent Images from Dose-Pitch Matrices of Line Width and Edge Roughness of Chemically Amplified Resist for Extreme Ultraviolet Lithography

Takahiro Kozawa, Hiroaki Oizumi, Toshiro Itani, Seiichi Tagawa

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 49　No. 6　2010/06　Research paper (scientific journal)

Femtosecond pulse radiolysis study in radiation chemistry using a photocathode RF gun LINAC

T. Kondoh, J. Yang, K. Norizawa, K. Kan, T. Kozawa, A. Ogata, Y. Yoshida

IPAC 2010 - 1st International Particle Accelerator Conference　p. 4110-4112　2010　Research paper (international conference proceedings)

Beam dynamics in femtosecond photocathode RF gun

K. Kan, J. Yang, T. Kondoh, K. Norizawa, A. Ogata, T. Kozawa, Y. Yoshida

IPAC 2010 - 1st International Particle Accelerator Conference　p. 4107-4109　2010　Research paper (international conference proceedings)

Femtosecond electron bunch generation using photocathode RF GUN

K. Kan, J. Yang, T. Kondoh, K. Norizawa, A. Ogata, T. Kozawa, Y. Yoshida

FEL 2010 - 32nd International Free Electron Laser Conference　p. 366-369　2010　Research paper (international conference proceedings)

Radiation chemistry of resist materials and processes in lithography

Takahiro Kozawa, Seiichi Tagawa

Charged Particle and Photon Interactions with Matter: Recent Advances, Applications, and Interfaces　p. 711-736　2010/01/01　Part of collection (book)

Dynamics of Radical Cation of Poly(4-hydroxystyrene)-Based Chemically Amplified Resists for Extreme-Ultraviolet and Electron Beam Lithographies

Kazumasa Okamoto, Masafumi Tanaka, Takahiro Kozawa, Seiichi Tagawa

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 49　No. 10　2010　Research paper (scientific journal)

Relationship between Line Edge Roughness and Fluctuation of Acid Concentration in Chemically Amplified Resist

Takahiro Kozawa, Hiroki Yamamoto, Seiichi Tagawa

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 49　No. 9　2010　Research paper (scientific journal)

Radiation Chemistry of Fluoronaphthalene as a Candidate for Absorption Enhancement Component of Chemically Amplified Extreme Ultraviolet Resists

Sadatatsu Ikeda, Kazumasa Okamoto, Hiroki Yamamoto, Akinori Saeki, Seiichi Tagawa, Takahiro Kozawa

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 49　No. 9　2010　Research paper (scientific journal)

Effect of Inhomogeneous Acid Distribution on Line Edge Roughness-Relationship to Line Edge Roughness Originating from Chemical Gradient

Takahiro Kozawa, Hiroki Yamamoto, Seiichi Tagawa

JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY　Vol. 23　No. 5　p. 625-630　2010　Research paper (scientific journal)

Relationship between Normalized Image Log Slope and Chemical Gradient in Chemically Amplified Extreme Ultraviolet Resists

Takahiro Kozawa, Seiichi Tagawa

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 49　No. 6　2010　Research paper (scientific journal)

Diffusion Control Using Matrix Change during Chemical Reaction for Inducing Anisotropic Diffusion in Chemically Amplified Resists

Takahiro Kozawa, Hiroaki Oizumi, Toshiro Itani, Seiichi Tagawa

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 49　No. 3　2010　Research paper (scientific journal)

Radiation Chemistry in Chemically Amplified Resists

Takahiro Kozawa, Seiichi Tagawa

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 49　No. 3　2010　Research paper (scientific journal)

Relationship between Chemical Gradient and Line Edge Roughness of Chemically Amplified Extreme Ultraviolet Resist

Takahiro Kozawa, Hiroaki Oizumi, Toshiro Itani, Seiichi Tagawa

APPLIED PHYSICS EXPRESS　Vol. 3　No. 3　2010　Research paper (scientific journal)

Evaluation of Chemical Gradient Enhancement Methods for Chemically Amplified Extreme Ultraviolet Resists

Takahiro Kozawa, Hiroaki Oizumi, Toshiro Itani, Seiichi Tagawa

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 48　No. 12　2009/12　Research paper (scientific journal)

Latent Image Created Using Small-Field Exposure Tool for Extreme Ultraviolet Lithography

Takahiro Kozawa, Hiroaki Oizumi, Toshiro Itani, Seiichi Tagawa

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 48　No. 10　2009/10　Research paper (scientific journal)

Exposure Dose Dependence of Chemical Gradient in Chemically Amplified Extreme Ultraviolet Resists

Takahiro Kozawa, Seiichi Tagawa

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 48　No. 10　2009/10　Research paper (scientific journal)

Effects of Flare on Latent Image Formation in Chemically Amplified Extreme Ultraviolet Resists

Takahiro Kozawa, Seiichi Tagawa

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 48　No. 9　2009/09　Research paper (scientific journal)

Origin of frequency-dependent line edge roughness: Monte Carlo and fast Fourier-transform studies

Akinori Saeki, Takahiro Kozawa, Seiichi Tagawa

APPLIED PHYSICS LETTERS　Vol. 95　No. 10　2009/09　Research paper (scientific journal)

Normalized Image Log Slope with Secondary Electron Migration Effect in Chemically Amplified Extreme Ultraviolet Resists

Takahiro Kozawa, Seiichi Tagawa

APPLIED PHYSICS EXPRESS　Vol. 2　No. 9　2009/09　Research paper (scientific journal)

Relationship between Resolution, Line Edge Roughness, and Sensitivity in Chemically Amplified Resist of Post-Optical Lithography Revealed by Monte Carlo and Dissolution Simulations

Akinori Saeki, Takahiro Kozawa, Seiichi Tagawa

APPLIED PHYSICS EXPRESS　Vol. 2　No. 7　2009/07　Research paper (scientific journal)

Reactivity of Halogenated Resist Polymer with Low-Energy Electrons

Hiroki Yamamoto, Takahiro Kozawa, Akinori Saeki, Seiichi Tagawa, Takeyoshi Mimura, Hiroto Yukawa, Junichi Onodera

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 48　No. 6　2009/06　Research paper (scientific journal)

Dynamics of Radical Cation of Poly(4-hydroxystyrene) and Its Copolymer for Extreme Ultraviolet and Electron Beam Resists

Kazumasa Okamoto, Masafumi Tanaka, Takahiro Kozawa, Seiichi Tagawa

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 48　No. 6　2009/06　Research paper (scientific journal)

Correlation between C-37 Parameters and Acid Yields in Chemically Amplified Resists upon Exposure to 75 keV Electron Beam

Kenichiro Natsuda, Takahiro Kozawa, Kazumasa Okamoto, Akinori Saeki, Seiichi Tagawa

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 48　No. 6　2009/06　Research paper (scientific journal)

Effect of Molecular Structure on Depth Profile of Acid Generator Distribution in Chemically Amplified Resist Films

Takehiro Fukuyama, Takahiro Kozawa, Kazumasa Okamoto, Seiichi Tagawa, Makiko Irie, Takeyoshi Mimura, Takeshi Iwai, Junichi Onodera, Ichiro Hirosawa, Tomoyuki Koganesawa, Kazuyuki Horie

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 48　No. 6　2009/06　Research paper (scientific journal)

Bottom Extreme-Ultraviolet-Sensitive Coating for Evaluation of the Absorption Coefficient of Ultrathin Film

Hayato Hijikata, Takahiro Kozawa, Seiichi Tagawa, Satoshi Takei

APPLIED PHYSICS EXPRESS　Vol. 2　No. 6　2009/06　Research paper (scientific journal)

Difference of Spur Distribution in Chemically Amplified Resists upon Exposure to Electron Beam and Extreme Ultraviolet Radiation

Takahiro Kozawa, Kazumasa Okamoto, Akinori Saeki, Seiichi Tagawa

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 48　No. 5　2009/05　Research paper (scientific journal)

Theoretical Study on Chemical Gradient Generated in Chemically Amplified Resists Based on Polymer Deprotection upon Exposure to Extreme Ultraviolet Radiation

Takahiro Kozawa, Seiichi Tagawa

APPLIED PHYSICS EXPRESS　Vol. 2　No. 5　2009/05　Research paper (scientific journal)

Dissolution kinetics and deprotection reaction in chemically amplified resists upon exposure to extreme ultraviolet radiation

Hiroki Yamamoto, Takahiro Kozawa, Seiichi Tagawa, Takeyoshi Mimura, Takeshi Iwai, Junichi Onodera

Proceedings of SPIE - The International Society for Optical Engineering　Vol. 7273　2009　Research paper (international conference proceedings)

Effect of Polymer Protection and Film Thickness on Acid Generator Distribution in Chemically Amplified Resists

Takehiro Fukuyama, Takahiro Kozawa, Hiroki Yamamoto, Seiichi Tagawa, Makiko Irie, Takeyoshi Mimura, Takeshi Iwai, Junichi Onodera, Ichiro Hirosawa, Tomoyuki Koganesawa, Kazuyuki Horie

JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY　Vol. 22　No. 1　p. 105-109　2009　Research paper (scientific journal)

Image formation in chemically amplified resists upon exposure to extreme ultraviolet radiation

Takahiro Kozawa, Seiichi Tagawa

Journal of Photopolymer Science and Technology　Vol. 22　No. 1　p. 51-58　2009　Research paper (scientific journal)

Dissolution characteristics of chemically amplified extreme ultraviolet resist

Toshiro Itani, Koji Kaneyama, Takahiro Kozawa, Seiichi Tagawa

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B　Vol. 26　No. 6　p. 2261-2264　2008/11　Research paper (scientific journal)

Latent image formation in chemically amplified extreme ultraviolet resists with low activation energy for deprotection reaction

Takahiro Kozawa, Seiichi Tagawa, Julius Joseph Santillan, Toshiro Itani

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B　Vol. 26　No. 6　p. 2257-2260　2008/11　Research paper (scientific journal)

Effects of Polymer Interference during Acid Generation on Latent Image Quality of Extreme Ultraviolet Resists

Takahiro Kozawa, Seiichi Tagawa

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 47　No. 11　p. 8328-8332　2008/11　Research paper (scientific journal)

High-Absorption Resist Process for Extreme Ultraviolet Lithography

Takahiro Kozawa, Seiichi Tagawa

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 47　No. 11　p. 8354-8359　2008/11　Research paper (scientific journal)

Side Wall Degradation of Chemically Amplified Resists Based on Poly(4-hydroxystyrene) for Extreme Ultraviolet Lithography

Takahiro Kozawa, Seiichi Tagawa

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 47　No. 10　p. 7822-7826　2008/10　Research paper (scientific journal)

Theoretical Study on Difference between Image Quality Formed in Low- and High-Activation-Energy Chemically Amplified Resists

Takahiro Kozawa, Seiichi Tagawa

APPLIED PHYSICS EXPRESS　Vol. 1　No. 10　2008/10　Research paper (scientific journal)

Difference between acid generation mechanisms in poly (hydroxystyrene)and polyacrylate-based chemically amplified resists upon exposure to extreme ultraviolet radiation

Ryo Hirose, Takahiro Kozawa, Seiichi Tagawa, Daisuke Shimizu, Toshiyuki Kai, Tsutomu Shimokawa

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 47　No. 9　p. 7125-7127　2008/09　Research paper (scientific journal)

Theoretical Study on the Dependence of Acid Distribution on Material Properties of Chemically Amplified Extreme Ultraviolet Resists

Takahiro Kozawa, Seiichi Tagawa, Melissa Shell

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 47　No. 8　p. 6288-6292　2008/08　Research paper (scientific journal)

Formation of intramolecular poly (4-hydroxystyrene) dimer radical cation

Kazumasa Okamoto, Takahiro Kozawa, Kenichiro Natsuda, Shu Seki, Seiichi Tagawa

JOURNAL OF PHYSICAL CHEMISTRY B　Vol. 112　No. 31　p. 9275-9280　2008/08　Research paper (scientific journal)

Characteristic photocurrents in InGaN epitaxial layers coherently grown on GaN: A photovoltaic detector for 400 nm band

Jun Ohsawa, Takahiro Kozawa, Osamu Ishiguro, Tetsu Kachi

Physica Status Solidi (A) Applications and Materials Science　Vol. 205　No. 7　p. 1699-1704　2008/07　Research paper (scientific journal)

Simulation of amine concentration dependence on line edge roughness after development in electron beam lithography

Akinori Saeki, Takahiro Kozawa, Seiichi Tagawa, Heidi B. Cao, Hai Deng, Michael J. Leeson

JOURNAL OF APPLIED PHYSICS　Vol. 104　No. 2　2008/07　Research paper (scientific journal)

Quencher effects at 22 nm pattern formation in chemically amplified resists

Takahiro Kozawa, Seiichi Tagawa, Julius Joseph Santillan, Toshiro Itani

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 47　No. 7　p. 5404-5408　2008/07　Research paper (scientific journal)

Study of the reaction of acid generators with epithermal and thermalized electrons

Kenichiro Natsuda, Takahiro Kozawa, Akinori Saeki, Seiichi Tagawa, Toshiyuki Kai, Tsutomu Shimokawa

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 47　No. 6　p. 4932-4935　2008/06　Research paper (scientific journal)

Effects of rate constant for deprotection on latent image formation in chemically amplified extreme ultraviolet resists

Takahiro Kozawa, Seiichi Tagawa, Julius Joseph Santillan, Minoru Toriumi, Toshiro Itani

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 47　No. 6　p. 4926-4931　2008/06　Research paper (scientific journal)

Feasibility study of chemically amplified extreme ultraviolet resists for 22 nm fabrication

Takahiro Kozawa, Seiichi Tagawa, Julius Joseph Santillan, Minoru Toriumi, Toshiro Itani

JAPANESE JOURNAL OF APPLIED PHYSICS　Vol. 47　No. 6　p. 4465-4468　2008/06　Research paper (scientific journal)

Feasibility study on high-sensitivity chemically amplified resist by polymer absorption enhancement in extreme ultraviolet lithography

Takahiro Kozawa, Kazumasa Okamoto, Jun Nakamura, Seiichi Tagawa

APPLIED PHYSICS EXPRESS　Vol. 1　No. 6　2008/06　Research paper (scientific journal)

X-ray reflectivity study on depth profile of acid generator distribution in chemically amplified resists

Takehiro Fukuyama, Takahiro Kozawa, Seiichi Tagawa, Ryoichi Takasu, Hiroto Yukawa, Mitsuru Sato, Junichi Onodera, Ichiro Hirosawa, Tomoyuki Koganesawa, Kazuyuki Horie

APPLIED PHYSICS EXPRESS　Vol. 1　No. 6　2008/06　Research paper (scientific journal)

Relationship between sensitivities of chemically amplified resist based on adamantane derivatives upon exposure to ArF excimer laser, electron beam, and extreme ultraviolet radiation

Kikuo Furukawa, Takahiro Kozawa, Shu Seki, Seiichi Tagawa

APPLIED PHYSICS EXPRESS　Vol. 1　No. 6　2008/06　Research paper (scientific journal)

Resolution degradation caused by multispur effect in chemically amplified extreme ultraviolet resists

Takahiro Kozawa, Seiichi Tagawa, Melissa Shell

JOURNAL OF APPLIED PHYSICS　Vol. 103　No. 8　2008/04　Research paper (scientific journal)

Enhancement of acid production in chemically amplified resist for extreme ultraviolet lithography

Hiroki Yamamoto, Takahiro Kozawa, Seiichi Tagawa, Hiroto Yukawa, Mitsuru Sato, Junichi Onodera

APPLIED PHYSICS EXPRESS　Vol. 1　No. 4　2008/04　Research paper (scientific journal)

Difference in reaction schemes in photolysis of triphenylsulfonium salts between 248 nm and dry/wet 193 nm resists

Yoshinori Matsui, Hidekazu Sugawara, Shu Seki, Takahiro Kozawa, Seiichi Tagawa, Toshiro Itani

APPLIED PHYSICS EXPRESS　Vol. 1　No. 3　2008/03　Research paper (scientific journal)

Dependence of acid generation efficiency on molecular structures of acid generators upon exposure to extreme ultraviolet radiation

Ryo Hirose, Takahiro Kozawa, Seiichi Tagawa, Toshiyuki Kai, Tsutomu Shimokawa

APPLIED PHYSICS EXPRESS　Vol. 1　No. 2　2008/02　Research paper (scientific journal)

Point spread function for the calculation of acid distribution in chemically amplified resists for extreme ultraviolet lithography

Takahiro Kozawa, Akinori Saeki, Seiichi Tagawa

APPLIED PHYSICS EXPRESS　Vol. 1　No. 2　2008/02　Research paper (scientific journal)

Impact of nonconstant diffusion coefficient on latent image quality in 22 nm fabrication using extreme ultraviolet lithography

Takahiro Kozawa, Seiichi Tagawa, Julius Joseph Santillan, Toshiro Itani

JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY　Vol. 21　No. 3　p. 421-427　2008　Research paper (scientific journal)

Line edge roughness after development in a positive-tone chemically amplified resist of post-optical lithography investigated by Monte Carlo simulation and a dissolution model

Akinori Saeki, Takahiro Kozawa, Seiichi Tagawa, Heidi B. Cao, Hai Deng, Michael J. Leeson

NANOTECHNOLOGY　Vol. 19　No. 1　2008/01　Research paper (scientific journal)

Point spread function for the calculation of acid distribution in chemically amplified resists used for electron-beam lithography

Takahiro Kozawa, Seiichi Tagawa

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS　Vol. 46　No. 45-49　p. L1200-L1202　2007/12　Research paper (scientific journal)

Theoretical study on relationship between acid generation efficiency and acid generator concentration in chemically amplified extreme ultraviolet resists

Takahiro Kozawa, Seiichi Tagawa, Melissa Shell

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS　Vol. 46　No. 45-49　p. L1143-L1145　2007/12　Research paper (scientific journal)

Dissolution characteristics and reaction kinetics of molecular resists for extreme-ultraviolet lithography

Minoru Toriumi, Julius Santillan, Toshiro Itani, Takahiro Kozawa, Seiichi Tagawa

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B　Vol. 25　No. 6　p. 2486-2489　2007/11　Research paper (scientific journal)

Acid distribution in chemically amplified extreme ultraviolet resist

Takahiro Kozawa, Seiichi Tagawa

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B　Vol. 25　No. 6　p. 2481-2485　2007/11　Research paper (scientific journal)

Image contrast slope and line edge roughness of chemically amplified resists for postoptical lithography

Takahiro Kozawa, Seiichi Tagawa, Julius Joseph Santillan, Minoru Toriumi, Toshiro Itani

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B　Vol. 25　No. 6　p. 2295-2300　2007/11　Research paper (scientific journal)

Study of acid-base equilibrium in chemically amplified resist

Kenichiro Natsuda, Takahiro Kozawa, Kazumasa Okamoto, Seiichi Tagawa

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS　Vol. 46　No. 11　p. 7285-7289　2007/11　Research paper (scientific journal)

Exposure dose dependence on line edge roughness of a latent image in electron beam/extreme ultraviolet lithographies studied by Monte Carlo technique

Alkinori Saeki, Takahiro Kozawa, Seiichi Tagawa, Heidi B. Cao, Hai Deng, Michael J. Leeson

JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS　Vol. 6　No. 4　2007/10　Research paper (scientific journal)

Dependence of absorption coefficient and acid generation efficiency on acid generator concentration in chemically amplified resist for extreme ultraviolet lithography

Ryo Hirose, Takahiro Kozawa, Seiichi Tagawa, Toshiyuki Kai, Tsutomu Shimokawa

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS　Vol. 46　No. 36-40　p. L979-L981　2007/10　Research paper (scientific journal)

Effect of acid diffusion and polymer structure on line edge roughness

Hiroki Yamamoto, Takahiro Kozawa, Akinori Saeki, Kazumasa Okamoto, Seiichi Tagawa, Katsumi Ohmori, Mitsuru Sato, Hiroji Komano

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS　Vol. 46　No. 9B　p. 6187-6190　2007/09　Research paper (scientific journal)

Single-component chemically amplified resist based on dehalogenation of polymer

Hiroki Yamamoto, Takahiro Kozawa, Seiichi Tagawa, Katsumi Ohmori, Mitsuru Sato, Hiroji Komano

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS　Vol. 46　No. 25-28　p. L648-L650　2007/07　Research paper (scientific journal)

Subpicosecond pulse radiolysis in liquid methyl-substituted benzene derivatives

Kazumasa Okamoto, Takahiro Kozawa, Akinori Saeki, Yoichi Yoshida, Seiichi Tagawa

RADIATION PHYSICS AND CHEMISTRY　Vol. 76　No. 5　p. 818-826　2007/05　Research paper (scientific journal)

Reactivity between biphenyl and precursor of solvated electrons in tetrahydrofuran measured by picosecond pulse radiolysis in near-ultraviolet, visible, and infrared

Akinori Saeki, Takahiro Kozawa, Yuko Ohnishi, Seiichi Tagawa

JOURNAL OF PHYSICAL CHEMISTRY A　Vol. 111　No. 7　p. 1229-1235　2007/02　Research paper (scientific journal)

Polymer-structure dependence of acid generation in chemically amplified extreme ultraviolet resists

Hiroki Yamamoto, Takahiro Kozawa, Seiichi Tagawa, Heidi B. Cao, Hai Deng, Michael J. Leeson

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS　Vol. 46　No. 4-7　p. L142-L144　2007/02　Research paper (scientific journal)

Stroboscopic picosecond pulse radiolysis using near-ultraviolet-enhanced femtosecond continuum generated by CaF2

Akinori Saeki, Takahiro Kozawa, Kazumasa Okamoto, Seiichi Tagawa

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers　Vol. 46　No. 1　p. 407-411　2007/01/10　Research paper (scientific journal)

Study on photo-chemical analysis system (VLES) for EUV lithography

A. Sekiguchi, Y. Kono, M. Kadoi, Y. Minami, T. Kozawa, S. Tagawa, D. Gustafson, P. Blackborow

Proceedings of SPIE - The International Society for Optical Engineering　Vol. 6519　No. 2　2007　Research paper (international conference proceedings)

Sensitization distance and acid generation efficiency in a model system of chemically amplified electron beam resist with methacrylate backbone polymer

Takahiro Kozawa, Seiichi Tagawa, Toshiyuki Kai, Tsutomu Shimokawa

Journal of Photopolymer Science and Technology　Vol. 20　No. 4　p. 577-583　2007　Research paper (scientific journal)

Single component chemically amplified resist based on dehalogenation of polymer

Hiroki Yamamoto, Takahiro Kozawa, Seiichi Tagawa, Katsumi Ohmori, Mitsuru Sato, Hiroji Komano

ADVANCES IN RESIST MATERIALS AND PROCESSING TECHNOLOGY XXIV　Vol. 6519　p. L648-L650　2007　Research paper (international conference proceedings)

Protonation sites in chemically amplified resists for electron-beam lithography

Kenichiro Natsuda, Takahiro Kozawa, Kazumasa Okamoto, Seiichi Tagawa

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS　Vol. 45　No. 46-50　p. L1256-L1258　2006/12　Research paper (scientific journal)

Correlation between proton. dynamics and line edge roughness in chemically amplified resist for post-optical lithography

Akinori Saeki, Takahiro Kozawa, Seiichi Tagawa, Heidi B. Cao

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B　Vol. 24　No. 6　p. 3066-3072　2006/11　Research paper (scientific journal)

Acid generation efficiency in a model system of chemically amplified extreme ultraviolet resist

Takahiro Kozawa, Seiichi Tagawa, Hiroaki Oizumi, Iwao Nishiyama

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B　Vol. 24　No. 6　p. L27-L30　2006/11　Research paper (scientific journal)

Analysis of acid yield generated in chemically amplified electron beam resist

Takahiro Kozawa, Takumi Shigaki, Kazumasa Okamoto, Akinori Saeki, Seiichi Tagawa, Toshiyuki Kai, Tsutomu Shimokawa

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B　Vol. 24　No. 6　p. 3055-3060　2006/11　Research paper (scientific journal)

Pulse radiolysis based on a femtosecond electron beam and a femtosecond laser light with double-pulse injection technique

Jinfeng Yang, Takafumi Kondoh, Takahiro Kozawa, Youichi Yoshida, Seiichi Tagawa

RADIATION PHYSICS AND CHEMISTRY　Vol. 75　No. 9　p. 1034-1040　2006/09　Research paper (scientific journal)

Acid generation mechanism of poly(4-hydroxystyrene)-based chemically amplified resists for post-optical lithography: Acid yield and deprotonation behavior of poly(4-hydroxystyrene) and poly(4-methoxystyrene)

Atsuro Nakano, Takahiro Kozawa, Kazumasa Okamoto, Seiichi Tagawa, Toshiyuki Kai, Tsutomu Shimokawa

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS　Vol. 45　No. 9A　p. 6866-6871　2006/09　Research paper (scientific journal)

Pulse radiolysis of polystyrene in cyclohexane - Effect of carbon tetrachloride on kinetic dynamics of dimer radical cation

Kazumasa Okamoto, Takahiro Kozawa, Miyako Miki, Yoichi Yoshida, Seiichi Tagawa

CHEMICAL PHYSICS LETTERS　Vol. 426　No. 4-6　p. 306-310　2006/08　Research paper (scientific journal)

Reaction mechanism of fluorinated chemically amplified resists

Hiroki Yamamoto, Takahiro Kozawa, Kazumasa Okamoto, Akinori Saeki, Seiichi Tagawa, Tomoyuki Ando, Mitsuru Sato, Hiroji Komano

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B　Vol. 24　No. 4　p. 1833-1836　2006/07　Research paper (scientific journal)

Relationship between acid generator concentration and acid yield in chemically amplified electron beam resist

Takumi Shigaki, Kazumasa Okamoto, Takahiro Kozawa, Hiroki Yamamoto, Seiichi Tagawa, Toshiyuki Kai, Tsutomu Shimokawa

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS　Vol. 45　No. 7　p. 5735-5737　2006/07　Research paper (scientific journal)

Selective detection of blue and ultraviolet light by an InGaN/GaN schottky barrier photodiode

Jun Ohsawa, Takahiro Kozawa, Osamu Ishiguro, Hiroshi Itoh

Japanese Journal of Applied Physics, Part 2: Letters　Vol. 45　No. 24-28　p. L614-L616　2006/06/16　Research paper (scientific journal)

Dependence of acid yield on chemically amplified electron beam resist thickness

Takumi Shigaki, Kazumasa Okamoto, Takahiro Kozawa, Hiroki Yamamoto, Seiichi Tagawa

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS　Vol. 45　No. 6B　p. 5445-5449　2006/06　Research paper (scientific journal)

Line edge roughness of a latent image in post-optical lithography

A Saeki, T Kozawa, S Tagawa, HB Cao

NANOTECHNOLOGY　Vol. 17　No. 6　p. 1543-1546　2006/03　Research paper (scientific journal)

Resolution blur of latent acid image and acid generation efficiency of chemically amplified resists for electron beam lithography

T Kozawa, S Tagawa

JOURNAL OF APPLIED PHYSICS　Vol. 99　No. 5　2006/03　Research paper (scientific journal)

Reactivity of acid generators for chemically amplified resists with low-energy electrons

A Nakano, T Kozawa, S Tagawa, T Szreder, JF Wishart, T Kai, T Shimokawa

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS　Vol. 45　No. 4-7　p. L197-L200　2006/02　Research paper (scientific journal)

Narrow-band 400 nm MSM photodetectors using a thin InGaN layer on a GaN/sapphire structure

J. Ohsawa, T. Kozawa, O. Fujishima, H. Itoh

Physica Status Solidi (C) Current Topics in Solid State Physics　Vol. 3　p. 2278-2282　2006　Research paper (international conference proceedings)

Reactivity of model compounds of ArF immersion, ArF, and KrF resists with diphenylsulfinyl radical cation, a cage-escape product of photochemistry of triphenylsulfonium salts

Yoshinori Matsui, Hidekazu Sugawara, Shou Tsuji, Toshiro Itani, Shu Seki, Takahiro Kozawa, Seiichi Tagawa

Proceedings of SPIE - The International Society for Optical Engineering　Vol. 6153　2006　Research paper (international conference proceedings)

Difference between initial distributions of proton and counter anion in chemically amplified electron-beam resist

Takahiro Kozawa, Hiroki Yamamoto, Akinori Saeki, Seiichi Tagawa

Proceedings of SPIE - The International Society for Optical Engineering　Vol. 6153　2006　Research paper (international conference proceedings)

Different bias-voltage dependences of photocurrent in Pt/InGaN/GaN and Pt/GaN schottky photodetectors on sapphire

Jun Ohsawa, Takahiro Kozawa, Osamu Ishiguro, Hiroshi Itoh

Japanese Journal of Applied Physics, Part 2: Letters　Vol. 45　No. 12-16　p. L435-L437　2006　Research paper (scientific journal)

Picosecond pulse radiolysis using femtosecond white light with a high S/N spectrum acquisition system in one beam shot

A Saeki, T Kozawa, S Tagawa

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT　Vol. 556　No. 1　p. 391-396　2006/01　Research paper (scientific journal)

Femtosecond single electron bunch generation by rotating longitudinal bunch phase space in magnetic field

J Yang, T Kondoh, K Kan, T Kozawa, Y Yoshida, S Tagawa

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT　Vol. 556　No. 1　p. 52-56　2006/01　Research paper (scientific journal)

Effects of low energy electrons on pattern formation in chemically amplified resist

Takahiro Kozawa, Hiroki Yamamoto, Akinori Saeki, Seiichi Tagawa

JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY　Vol. 19　No. 3　p. 361-366　2006　Research paper (scientific journal)

Comparison of spectral responses between front- and back-incidence configurations in GaN metal-semiconductor-metal photodetector on sapphire

Jun Ohsawa, Takahiro Kozawa, Hideki Miura, Osamu Fujishima, Hiroshi Itoh

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers　Vol. 44　No. 12　p. 8441-8444　2005/12/08　Research paper (scientific journal)

Study on acid generation from polymer

H Yamamoto, T Kozawa, A Nakano, K Okamoto, S Tagawa, T Ando, M Sato, H Komano

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B　Vol. 23　No. 6　p. 2728-2732　2005/11　Research paper (scientific journal)

Proton and anion distribution and line edge roughness of chemically amplified electron beam resist

T Kozawa, H Yamamoto, A Saeki, S Tagawa

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B　Vol. 23　No. 6　p. 2716-2720　2005/11　Research paper (scientific journal)

Nanopatterning of polyfluorene derivative using electron-beam lithography

Y Doi, A Saeki, Y Koizumi, S Seki, K Okamoto, T Kozawa, S Tagawa

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B　Vol. 23　No. 5　p. 2051-2055　2005/09　Research paper (scientific journal)

Requirements for laser-induced desorption/ionization on submicrometer structures

Shoji Okuno, Ryuichi Arakawa, Kazumasa Okamoto, Yoshinori Matsui, Shu Seki, Takahiro Kozawa, Seiichi Tagawa, Yoshinao Wada

Analytical Chemistry　Vol. 77　No. 16　p. 5364-5369　2005/08/15　Research paper (scientific journal)

Synchronization of femtosecond UV-IR laser with electron beam for pulse radiolysis studies

A Saeki, T Kozawa, S Kashiwagi, K Okamoto, G Isoyama, Y Yoshida, S Tagawa

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT　Vol. 546　No. 3　p. 627-633　2005/07　Research paper (scientific journal)

Potential cause of inhomogeneous acid distribution in chemically amplified resists for post optical lithography

H Yamamoto, T Kozawa, A Nakano, K Okamoto, S Tagawa, T Ando, M Sato, H Komano

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS　Vol. 44　No. 7B　p. 5836-5838　2005/07　Research paper (scientific journal)

Dependence of acid yield on acid generator in chemically amplified resist for post-optical lithography

A Nakano, K Okamoto, Y Yamamoto, T Kozawa, S Tagawa, T Kai, H Nemoto

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS　Vol. 44　No. 7B　p. 5832-5835　2005/07　Research paper (scientific journal)

Multi spur effect on decay kinetics of geminate ion recombination using Monte Carlo technique

A Saeki, T Kozawa, Y Yoshida, S Tagawa

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS　Vol. 234　No. 3　p. 285-290　2005/06　Research paper (scientific journal)

Effects of dielectric constant on acid generation in chemically amplified resists for post-optical lithography

T Kozawa, K Okamoto, A Saeki, S Tagawa

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS　Vol. 44　No. 6A　p. 3908-3912　2005/06　Research paper (scientific journal)

Basic Aspects of Acid Generation Process in Chemically Amplified Electron Beam Resist,

T. Kozawa and S. Tagawa,

J. Photopolym. Sci. Technol.　Vol. 18　p. 471-474　2005/05　Research paper (international conference proceedings)

Low-dark-current large-area narrow-band photodetector using InGaN/GaN layers on sapphire

Jun Ohsawa, Takahiro Kozawa, Hiroyuki Hayashi, Osamu Fujishima, Hiroshi Itoh

Japanese Journal of Applied Physics, Part 2: Letters　Vol. 44　No. 20-23　p. L623-L625　2005　Research paper (scientific journal)

Reaction mechanisms of brominated chemically amplified resists

H Yamamoto, T Kozawa, A Nakano, K Okamoto, S Tagawa, T Ando, M Sato, H Komano

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS　Vol. 44　No. 24-27　p. L842-L844　2005　Research paper (scientific journal)

Resist thickness effect on acid concentration generated in poly(4-hydroxystyrene) film upon exposure to 75 keV electron beam

T Shigaki, K Okamoto, T Kozawa, H Yamamoto, S Tagawa

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS　Vol. 44　No. 42-45　p. L1298-L1300　2005　Research paper (scientific journal)

Dependence of acid generation efficiency on the protection ratio of hydroxyl groups in chemically amplified electron beam, x-ray and EUV resists

H Yamamoto, T Kozawa, A Nakano, K Okamoto, S Tagawa, T Ando, M Sato, H Komano

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B　Vol. 22　No. 6　p. 3522-3524　2004/11　Research paper (scientific journal)

Modeling and simulation of chemically amplified electron beam, x-ray, and EUV resist processes

T Kozawa, A Saeki, S Tagawa

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B　Vol. 22　No. 6　p. 3489-3492　2004/11　Research paper (scientific journal)

Pulse radiolysis study on proton and charge transfer reactions in solid poly(methyl methacrylate)

A Nakano, K Okamoto, T Kozawa, S Tagawa

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS　Vol. 43　No. 7A　p. 4363-4367　2004/07　Research paper (scientific journal)

Proton dynamics in chemically amplified electron beam resists

H Yamamoto, T Kozawa, A Nakano, K Okamoto, Y Yamamoto, T Ando, M Sato, H Komano, S Tagawa

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS　Vol. 43　No. 7A　p. L848-L850　2004/07　Research paper (scientific journal)

Effects of ester groups on proton generation and diffusion in polymethacrylate matrices

A Nakano, K Okamoto, T Kozawa, S Tagawa

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS　Vol. 43　No. 6B　p. 3981-3983　2004/06　Research paper (scientific journal)

Polymer screening method for chemically amplified electron beam and X-ray resists

H Yamamoto, A Nakano, K Okamoto, T Kozawa, S Tagawa

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS　Vol. 43　No. 6B　p. 3971-3973　2004/06　Research paper (scientific journal)

Precise control of nanowire formation based on polysilane for photoelectronic device application

Satoshi Tsukuda, Shu Seki, Akinori Saeki, Takahiro Kozawa, Seiichi Tagawa, Masaki Sugimoto, Akira Idesaki, Shigeru Tanaka

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers　Vol. 43　No. 6 B　p. 3810-3814　2004/06　Research paper (international conference proceedings)

Adjacent effect on positive charge transfer from radical cation of n-dodecane to scavenger studied by picosecond pulse radiolysis, statistical model, and Monte Carlo simulation

A Saeki, T Kozawa, Y Yoshida, S Tagawa

JOURNAL OF PHYSICAL CHEMISTRY A　Vol. 108　No. 9　p. 1475-1481　2004/03　Research paper (scientific journal)

Electron dynamics in chemically amplified resists

T Kozawa, H Yamamoto, A Nakano, A Saeki, K Okamoto, S Tagawa

JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY　Vol. 17　No. 3　p. 449-452　2004　Research paper (scientific journal)

Relation between spatial resolution and reaction mechanism of chemically amplified resists for electron beam lithography

T Kozawa, A Saeki, A Nakano, Y Yoshida, S Tagawa

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B　Vol. 21　No. 6　p. 3149-3152　2003/11　Research paper (scientific journal)

Subpicosecond pulse radiolysis study of geminate ion recombination in liquid benzene

K Okamoto, A Saeki, T Kozawa, Y Yoshida, S Tagawa

CHEMISTRY LETTERS　Vol. 32　No. 9　p. 834-835　2003/09　Research paper (scientific journal)

Nanowire formation and selective adhesion on substrates by single-ion track reaction in polysilanes

S Seki, S Tsukuda, Y Yoshida, T Kozawa, S Tagawa, M Sugimoto, S Tanaka

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS　Vol. 42　No. 6B　p. 4159-4161　2003/06　Research paper (scientific journal)

Fabrication of molecular photoelectronic device using polysilane nanowires

Satoshi Tsukuda, Shu Seki, Akinori Saeki, Takahiro Kozawa, Seiichi Tagawa, Masaki Sugimoto, Akira Idesaki, Shigeru Tanaka

Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003　p. 222-223　2003　Research paper (international conference proceedings)

Pulse radiolysis study on reactions of a hydrated electron with europium(III)-aminopolycarboxylate complexes in aqueous perchlorate media

Ryuji Nagaishi, Takaumi Kimura, Yoichi Yoshida, Takahiro Kozawa, Seiichi Tagawa

Journal of Physical Chemistry A　Vol. 106　No. 39　p. 9036-9041　2002/10/03　Research paper (scientific journal)

Study on radiation-induced reaction in microscopic region for basic understanding of electron beam patterning in lithographic process (II) - Relation between resist space resolution and space distribution of ionic species

A Saeki, T Kozawa, Y Yoshida, S Tagawa

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS　Vol. 41　No. 6B　p. 4213-4216　2002/06　Research paper (scientific journal)

Study on radiation-induced reaction in microscopic region for basic understanding of electron beam patterning in lithographic process (I) - Development of subpicosecond pulse radiolysis and relation between space resolution and radiation-induced reactions of onium salt

T Kozawa, A Saeki, Y Yoshida, S Tagawa

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS　Vol. 41　No. 6B　p. 4208-4212　2002/06　Research paper (scientific journal)

Evaluation of electron bunch shapes using the spectra of the coherent radiation

M Nakamura, M Takanaka, S Okuda, T Kozawa, R Kato, T Takahashi, SK Nam

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT　Vol. 475　No. 1-3　p. 487-491　2001/12　Research paper (scientific journal)

Radiation protection effects by addition of aromatic compounds to n-dodecane

S Tabuse, Y Izumi, T Kojima, Y Yoshida, T Kozawa, M Miki, S Tagawa

RADIATION PHYSICS AND CHEMISTRY　Vol. 62　No. 1　p. 179-187　2001/07　Research paper (scientific journal)

Development of a short-pulsed slow positron beam for application to polymer films

M Tashiro, Y Honda, T Yamaguchi, PK Pujari, N Kimura, T Kozawa, G Isoyama, S Tagawa

RADIATION PHYSICS AND CHEMISTRY　Vol. 60　No. 4-5　p. 529-533　2001/03　Research paper (scientific journal)

Study on intermediate species of polystyrene by using pulse radiolysis

K Okamoto, T Kozawa, Y Yoshida, S Tagawa

RADIATION PHYSICS AND CHEMISTRY　Vol. 60　No. 4-5　p. 417-422　2001/03　Research paper (scientific journal)

Study on geminate ion recombination in liquid dodecane using pico- and subpicosecond pulse radiolysis

A Saeki, T Kozawa, Y Yoshida, S Tagawa

RADIATION PHYSICS AND CHEMISTRY　Vol. 60　No. 4-5　p. 319-322　2001/03　Research paper (scientific journal)

Study on radiation-induced reaction in microscopic region for basic understanding of electron beam patterning in lithographic process (I) - Development of subpicosecond pulse radiolysis and relation between space resolution and radiation-induced reactions of onium salt

T. Kozawa, A. Saeki, Y. Yoshida, S. Tagawa

2001 International Microprocesses and Nanotechnology Conference, MNC 2001　p. 232-233　2001　Research paper (international conference proceedings)

Development of a new positron beam for coincident studies with laser excitation

Y Honda, M Tashiro, T Yamaguchi, PK Pujari, N Kimura, T Kozawa, S Nishijima, G Isoyama

POSITRON ANNIHILATION - ICPA-12　Vol. 363-3　p. 667-669　2001　Research paper (scientific journal)

Development of a pulsing system with the linac based slow positron beam

M Tashiro, Y Honda, T Yamaguchi, PK Pujari, N Kimura, T Kozawa, S Tagawa

POSITRON ANNIHILATION - ICPA-12　Vol. 363-3　p. 664-666　2001　Research paper (scientific journal)

Development of laser-synchronized picosecond pulse radiolysis system

Y. Yoshida, Y. Mizutani, T. Kozawa, A. Saeki, S. Seki, S. Tagawa, K. Ushida

Radiation Physics and Chemistry　Vol. 60　No. 4-5　p. 313-318　2001　Research paper (international conference proceedings)

Reaction mechanisms of excimer resists studied by laser flash photolysis

Shou Tsuji, Shu Seki, Takahiro Kozawa, Seiichi Tagawa

Journal of Photopolymer Science and Technology　Vol. 13　No. 5　p. 729-732　2000　Research paper (scientific journal)

Studies on reaction mechanisms of EB resist by pulse radiolysis

Shou Tsuji, Takahiro Kozawa, Yukio Yamamoto, Seiichi Tagawa

Journal of Photopolymer Science and Technology　Vol. 13　No. 5　p. 733-738　2000　Research paper (scientific journal)

Development of subpicosecond pulse radiolysis system

T Kozawa, Y Mizutani, M Miki, T Yamamoto, S Suemine, Y Yoshida, S Tagawa

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT　Vol. 440　No. 1　p. 251-253　2000/01　Research paper (scientific journal)

Field emission study of gated GaN and Al0.1Ga0.9N/GaN pyramidal field emitter arrays

T. Kozawa, T. Ohwaki, Y. Taga, N. Sawaki

Applied Physics Letters　Vol. 75　No. 21　p. 3330-3332　1999/11/22　Research paper (scientific journal)

Evidence of Oxidation of Aromatic Hydrocarbons by Chloromethyl Radicals: Reinvestigation of Intersolute Hole Transfer Using Pulse Radiolysis

Kiminori Ushida, Yoichi Yoshida, Takahiro Kozawa, Seiichi Tagawa, Akira Kira

Journal of Physical Chemistry A　Vol. 103　No. 24　p. 4680-4689　1999/06/17　Research paper (scientific journal)

Geminate ion recombination of electron and radical cation in non-polar liquid studied by laser-synchronized pico and subpicosecond pulse radiolysis

Y. Yoshida, Y. Mizutani, T. Kozawa, M. Miki, S. Seki, T. Yamamoto, A. Saeki, Y. Izumi, K. Ushida, S. Tagawa

IEEE International Conference on Conduction and Breakdown in Dielectric Liquids, ICDL　p. 579-582　1999　Research paper (scientific journal)

Measurement of far-infrared subpicosecond coherent radiation for pulse radiolysis

T Kozawa, Y Mizutani, K Yokoyama, S Okuda, Y Yoshida, S Tagawa

FREE ELECTRON LASERS 1998　Vol. A429　p. 471-475　1999　Research paper (international conference proceedings)

Radiation protection effects by the presence of diphenyl alkanes studied by pulse radiolysis

Yoshinobu Izumi, Hiroyuki Okawa, Takao Kojima, Tadashi Yamamoto, Yasuhiro Mizutani, Miyako Miki, Takahiro Kozawa, Yoichi Yoshida, Seiichi Tagawa

Technology Reports of the Osaka University　Vol. 48　No. 2319-2337　p. 309-316　1998/10/15　Research paper (scientific journal)

Pulse radiolysis studies on the radiation resistance of liquid n-alkane in the presence of additives

Yoshinobu Izumi, Takao Kojima, Hiroyuki Okawa, Tadashi Yamamoto, Yoichi Yoshida, Yasuhiro Mizutani, Takahiro Kozawa, Miyako Miki, Seiichi Tagawa

Technology Reports of the Osaka University　Vol. 48　No. 2319-2337　p. 317-324　1998/10/15　Research paper (scientific journal)

Precise measurement of a subpicosecond electron single bunch by the femtosecond streak camera

M Uesaka, T Ueda, T Kozawa, T Kobayashi

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT　Vol. 406　No. 3　p. 371-379　1998/04　Research paper (scientific journal)

Radiation Chemistry of Triphenylsulfonium Salts in EB and X-Ray Chemically Amplified Resists -Proton Generation Mechanisms

Seiji Nagahara, Takahiro Kozawa, Yukio Yamamoto, Seiichi Tagawa

Journal of Photopolymer Science and Technology　Vol. 11　No. 4　p. 577-580　1998　Research paper (scientific journal)

Generation of high-current (1kA) subpicosecond electron single pulse

T Kozawa, T Kobayashi, T Ueda, M Uesaka

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT　Vol. 399　No. 2-3　p. 180-184　1997/11　Research paper (scientific journal)

Radiation-induced reactions of chemically amplified x-ray and electron-beam resists based on deprotection of t-butoxycarbonyl groups

T Kozawa, S Nagahara, Y Yoshida, S Tagawa, T Watanabe, Y Yamshita

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B　Vol. 15　No. 6　p. 2582-2586　1997/11　Research paper (scientific journal)

Interaction of terawatt laser with plasma

M Kando, K Nakajima, M Arinaga, T Kawakubo, H Nakanishi, A Ogata, T Kozawa, T Ueda, M Uesaka

JOURNAL OF NUCLEAR MATERIALS　Vol. 248　p. 405-407　1997/09　Research paper (scientific journal)

Transient absorption spectra of photoconductive polyimides and their model compound by picosecond pulse radiolysis

SA Lee, T Yamashita, K Horie, T Kozawa

JOURNAL OF PHYSICAL CHEMISTRY B　Vol. 101　No. 23　p. 4520-4524　1997/06　Research paper (scientific journal)

Slow positron beam with small energy spread in the magnetic field using reflection type remoderator

Y Honda, M Maekawa, N Kimura, T Kozawa, S Nishijima, G Isoyama, S Tagawa

POSITRON ANNIHILATION　Vol. 255-2　p. 677-679　1997　Research paper (scientific journal)

Nonlinear and collective phenomena observed in plasma wakefield acceleration driven by multiple bunches

T Kozawa, T Ueda, T Kobayashi, M Uesaka, H Shibata, M Arinaga, T Kawakubo, K Nakajima, H Nakanishi, A Ogata, Y Yoshida, N Yugami, Y Nishida

NONLINEAR AND COLLECTIVE PHENOMENA IN BEAM PHYSICS　No. 395　p. 343-353　1997　Research paper (international conference proceedings)

Schottky barriers and contact resistances on p-type GaN

T. Mori, T. Kozawa, T. Ohwaki, Y. Taga, S. Nagai, S. Yamasaki, S. Asami, N. Shibata, M. Koike

Applied Physics Letters　Vol. 69　No. 23　p. 3537-3539　1996/12/02　Research paper (scientific journal)

Pulse and γ-radiolysis of concentrated perchloric acid solutions

M. Domae, Y. Katsumura, P. Y. Jiang, R. Nagaishi, K. Ishigure, T. Kozawa, Y. Yoshida

Journal of the Chemical Society - Faraday Transactions　Vol. 92　No. 12　p. 2245-2250　1996/06/21　Research paper (scientific journal)

Generation and application of high brightness subpicosecond electron single bunch

M Uesaka, T Kozawa, T Kobayashi, T Ueda, K Miya

JOURNAL OF THE ATOMIC ENERGY SOCIETY OF JAPAN　Vol. 38　No. 3　p. 219-229　1996/03　Research paper (scientific journal)

Dislocation etch pits in GaN epitaxial layers grown on sapphire substrates

Takahiro Kozawa, Tetsu Kachi, Takeshi Ohwaki, Yasunori Taga, Norikatsu Koide, Masayoshi Koike

Journal of the Electrochemical Society　Vol. 143　No. 1　p. L17-L19　1996　Research paper (scientific journal)

Femtosecond single-bunched linac for pulse radiolysis based on laser wakefield acceleration

Atsushi Ogata, K. Nakajima, Takahiro Kozawa, Y. Yoshida

IEEE Transactions on Plasma Science　Vol. 24　No. 2　p. 453-459　1996　Research paper (scientific journal)

Transient species induced in X-ray chemically amplified positive resists : post-exposure delay effect

Seiji Nagahara, Yoshio Yamashita, Takao Taguchi, Takahiro Kozawa, Seiichi Tagawa

Journal of Photopolymer Science and Technology　Vol. 9　No. 4　p. 619-626　1996　Research paper (scientific journal)

Proton Transfer to Melamine Crosslinkers in X-Ray Chemically Amplified Negative Resists Studied by Time-Resolved and Steady-State Optical Absorption Measurement,

S. Nagahara, Y. Yamashita, T. Taguchi, T. Kozawa, Y. Yoshida, and S. Tagawa,

Jpn. J. Appl. Phys.　Vol. 35　No. 12　p. 6491-6494　1996　Research paper (scientific journal)

BUNCH-SHAPE MONITOR FOR A PICOSECOND SINGLE-BUNCH BEAM OF A 35-MEV ELECTRON LINEAR-ACCELERATOR

Y HOSONO, M NAKAZAWA, T IGUCHI, T UEDA, T KOBAYASHI, T KOZAWA, M UESAKA, J OHKUMA, S OKUDA, T YAMAMOTO, S SUEMINE

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS　Vol. 34　No. 9A　p. 4974-4976　1995/09　Research paper (scientific journal)

NONDESTRUCTIVE BEAM POSITION MONITOR USING HIGH-PERMEABILITY CHIPS

T KOBAYASHI, T KOZAWA, T UEDA, M UESAKA, K MIYA, H SHIBATA

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT　Vol. 361　No. 3　p. 436-439　1995/07　Research paper (scientific journal)

Thermal stress in GaN epitaxial layers grown on sapphire substrates

T. Kozawa, T. Kachi, H. Kano, H. Nagase, N. Koide, K. Manabe

Journal of Applied Physics　Vol. 77　No. 9　p. 4389-4392　1995　Research paper (scientific journal)

SINGLE BUNCHED BEAM GENERATION WITHOUT SUBHARMONIC PREBUNCHER

T KOBAYASHI, T UEDA, Y YOSHIDA, T KOZAWA, M UESAKA, K MIYA, H KOBAYASHI, S TAGAWA

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT　Vol. 352　No. 3　p. 640-643　1995/01　Research paper (scientific journal)

Radiation-induced reactions in novolak-based chemically amplified resists

Takahiro Kozawa, Mitsuru Uesaka, Takeo Watanabe, Yoshio Yamashita, Yoichi Yoshida, Seiichi Tagawa

Journal of Photopolymer Science and Technology　Vol. 8　No. 1　p. 37-42　1995　Research paper (scientific journal)

ACID GENERATION PROCESS BY RADIATION-INDUCED REACTION IN CHEMICALLY AMPLIFIED RESIST FILMS

T WATANABE, Y YAMASHITA, T KOZAWA, Y YOSHIDA, S TAGAWA

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B　Vol. 12　No. 6　p. 3879-3883　1994/11　Research paper (scientific journal)

GENERATION OF A SUBPICOSECOND RELATIVISTIC ELECTRON SINGLE BUNCH AT THE S-BAND LINEAR-ACCELERATOR

M UESAKA, K TAUCHI, T KOZAWA, T KOBAYASHI, T UEDA, K MIYA

PHYSICAL REVIEW E　Vol. 50　No. 4　p. 3068-3076　1994/10　Research paper (scientific journal)

CHARACTERISTICS OF PICO-SECOND SINGLE BUNCH AT THE S-BAND LINEAR-ACCELERATOR

M UESAKA, T KOZAWA, T KOBAYASHI, T UEDA, K MIYA

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT　Vol. 345　No. 2　p. 219-225　1994/06　Research paper (scientific journal)

Raman scattering from LO phonon-plasmon coupled modes in gallium nitride

T. Kozawa, T. Kachi, H. Kano, Y. Taga, M. Hashimoto, N. Koide, K. Manabe

Journal of Applied Physics　Vol. 75　No. 2　p. 1098-1101　1994　Research paper (scientific journal)

RADIATION-INDUCED REACTIONS OF ONIUM SALTS IN NOVOLAK

T KOZAWA, M UESAKA, T WATANABE, Y YAMASHITA, H SHIBATA, Y YOSHIDA, S TAGAWA

POLYMERIC MATERIALS FOR MICROELECTRONIC APPLICATIONS　Vol. 579　p. 121-129　1994　Research paper (scientific journal)

ACID GENERATION IN CHEMICALLY AMPLIFIED RESIST FILMS

T WATANABE, Y YAMASHITA, T KOZAWA, Y YOSHIDA, S TAGAWA

POLYMERIC MATERIALS FOR MICROELECTRONIC APPLICATIONS　Vol. 579　p. 110-120　1994　Research paper (scientific journal)

EFFECTS OF IMPURITIES ON PROCESSES OF ACID GENERATION IN CHEMICALLY AMPLIFIED RESISTS FOR ELECTRON-BEAM AND X-RAY-LITHOGRAPHY

T KOZAWA, M UESAKA, Y YOSHIDA, S TAGAWA

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS　Vol. 32　No. 12B　p. 6049-6051　1993/12　Research paper (scientific journal)

Radiation-Induced Acid Generation Reactions in Chemically Amplified Resists for Electron Beam and X-Ray Lithography

Kozawa Takahiro, Yoshida Yoichi, Uesaka Mitsuru, Tagawa Seiichi

Jpn J Appl Phys　Vol. 31　No. 12　p. 4301-4306　1992/12/20

Mechanisms of acid generation in high sensitive electron beam resist systems

S. Tagawa, T. Kozawa, Y. Yoshida, M. Uesaka, K. Miya

Polymeric Materials Science and Engineering, Proceedings of the ACS Division of Polymeric Materials Science and Engineering　Vol. 66　p. 188-189　1992　Research paper (international conference proceedings)

Observation of a Plasma Wakefield Build-up Caused by a Train of Linac Bunches,

A. Ogata, Y. Yoshida, N. Yugami, K. Miya, Y. Nishida, H. Nakanishi, K. Nakajima, S. Tagawa, H. Shibata, T. Kozawa, T. Kobayashi, and T. Ueda

Particle Accelerators　Vol. 39　p. 33-45　1992　Research paper (scientific journal)

Study of radiation-induced reactions in chemically amplified resists for electron beam and x-ray lithography

Takahiro Kozawa, Yoichi Yoshida, Mitsuru Uesaka

Japanese Journal of Applied Physics　Vol. 31　No. 11　p. L1574-L1576　1992　Research paper (scientific journal)

DIRECT OBSERVATION OF PLASMA-LENS EFFECT

H NAKANISHI, Y YOSHIDA, T UEDA, T KOZAWA, H SHIBATA, K NAKAJIMA, T KURIHARA, N YUGAMI, Y NISHIDA, T KOBAYASHI, A ENOMOTO, T OOGOE, H KOBAYASHI, BS NEWBERGER, S TAGAWA, K MIYA, A OGATA

PHYSICAL REVIEW LETTERS　Vol. 66　No. 14　p. 1870-1873　1991/04　Research paper (scientific journal)

Electron beam effects on blue luminescence of zinc-doped GaN

Hiroshi Amano, Isamu Akasaki, Takahiro Kozawa, Kazumasa Hiramatsu, Nobuhiko Sawaki, Kousuke Ikeda, Yoshikazu Ishii

Journal of Luminescence　Vol. 40-41　No. C　p. 121-122　1988　Research paper (scientific journal)